JP6801388B2 - Ozone treatment equipment and ozone treatment method - Google Patents

Description

The present invention relates to an ozone treatment apparatus and an ozone treatment method. More specifically, the present invention relates to an ozone treatment apparatus and an ozone treatment method capable of preventing deterioration of the sealing member that airtightly seals the treatment space due to ozone.

Conventionally, for example, optical ashing treatment of resist in the manufacturing process of semiconductors and liquid crystal panels, removal treatment of resist adhering to the pattern surface of a template in a nanoimprinting apparatus, dry cleaning treatment of glass substrate and silicon wafer for liquid crystal, printed circuit board. As a light treatment apparatus and a light treatment method used for removing smears (desmear) in a manufacturing process, a light treatment apparatus and a light treatment method using ultraviolet rays are known. In particular, devices and methods using active species such as ozone and oxygen radicals generated by vacuum ultraviolet rays radiated from excimer lamps and the like can be preferably used because they can perform predetermined treatments more efficiently and in a short time. Has been done.

For example, Patent Document 1 proposes a method of irradiating a substrate with vacuum ultraviolet rays as a desmear treatment of a via hole, and proposes irradiating a substrate on which a via hole is formed with vacuum ultraviolet rays in an atmosphere containing oxygen. .. When oxygen is irradiated with vacuum ultraviolet rays, active species such as ozone and oxygen radicals are generated. Smear binds to these active species and is removed as carbon dioxide and water vapor. Then, carbon dioxide and water vapor become exhaust gas and are exhausted to the outside of the treatment room.
The processing chamber in which the object to be processed such as a substrate is arranged and the light source portion that emits vacuum ultraviolet rays are separated by a transparent window member. The distance between the window member and the object to be processed is set to a narrow space such as 1 mm or less, and the processing chamber airtightly seals the space between the window member and the stage on which the object to be processed is placed by a sealing member. It is a stopped processing space.

Japanese Unexamined Patent Publication No. 2015-12129

Since the processing space is opened each time the object to be processed is carried in and out, an elastic member such as a rubber member is used as the sealing member. However, such a sealing member may be deteriorated by ozone in the processing space, lose its elasticity, and may not function as a sealing member.
Therefore, an object of the present invention is to prevent deterioration of the sealing member that airtightly seals the processing space for ozone treatment due to ozone.

In order to solve the above problems, one aspect of the ozone treatment device according to the present invention has a window member that transmits vacuum ultraviolet rays, and a light source unit that emits the vacuum ultraviolet rays through the window member is arranged to face the window member. Then, in the space between the stage on which the object to be processed is placed and the window member and the stage, the surface of the object to be processed placed on the stage is the light source in an atmosphere containing ozone. A seal member that airtightly seals the processing space exposed to the vacuum ultraviolet rays emitted from the unit, and a barrier gas supply unit that supplies a barrier gas for protecting the seal member along at least a part of the seal member. A support member that supports the peripheral edge of the window member, and the seal member is arranged between the support member and the outer peripheral side surface of the stage, and is pressed against the outer peripheral side surface of the stage to perform the process. that abolish seal the space in an airtight manner.
By protecting the sealing member with the barrier gas in this way, it is possible to prevent the sealing member from deteriorating and failing to function due to ozone contained in the processing gas, which is the atmosphere of the processing space.
Further, since the seal member is arranged between the support member that supports the window member and the stage, it is not necessary to press the seal member against the window member in order to airtightly seal the processing space. By adopting a configuration in which the seal member is not pressed against the window member, it is possible to prevent the window member from being pushed up by the repulsive force of the seal member and to prevent the gap between the object to be processed and the window member from becoming uneven. .. As a result, the light treatment can be made uniform.

Further, in the above-mentioned ozone treatment device, the seal member may be an air expansion seal formed in a hollow cross section and whose cross section expands by injecting air into the hollow. As described above, if the air expansion seal is applied as the seal member, the processing space can be easily and appropriately airtightly sealed. Further, if the hollow air is discharged and the seal member is contracted, the stage can be moved without damaging the seal member.
Further, in the ozone treatment apparatus, the barrier gas supply unit may be arranged below the mounting surface of the object to be treated in the stage. In this case, it is possible to suppress the supply of the barrier gas between the object to be processed and the window member. Therefore, deterioration of the sealing member due to ozone can be prevented without adverse effects such as diluting the processing gas required for processing the object to be processed by the barrier gas.

Further, in the ozone treatment apparatus, a gas supply / discharge portion for flowing a treatment gas along the surface may be further provided between the surface of the object to be treated and the window member in the treatment space. By flowing the processing gas between the surface of the object to be processed and the window member in this way, the processing efficiency of the object to be processed can be improved.
Further, in the ozone treatment apparatus, the seal members are arranged in an annular shape, and the gas supply / exhaust portion includes an air supply port for supplying the treatment gas to the treatment space and the treatment space from the treatment space. An exhaust port for discharging gas may be provided, and the air supply port and the exhaust port may be arranged so as to form a flow path for the processing gas in a ring formed by the seal member. In this way, if the flow path of the processing gas is formed in the ring formed by the seal member, the flow path of the processing gas can be appropriately maintained so as to be restricted on the object to be processed by the barrier gas.

Furthermore, in the ozone treatment apparatus, the barrier gas supply unit may be arranged on the side of the flow path of the treatment gas formed by the gas supply / discharge unit. In this way, by supplying the barrier gas to the side of the flow path through which the processing gas easily flows, the seal member can be appropriately protected.
Further, in the ozone treatment apparatus, the barrier gas supply unit may be arranged on the upstream side of the flow path of the treatment gas formed by the gas supply / discharge unit. In this way, the barrier gas supplied to the upstream side of the processing gas flow path flows to the downstream side due to the pressure difference (differential pressure) between the upstream side and the downstream side, and protects the seal member arranged on the downstream side. can do. Therefore, deterioration of the sealing member due to ozone can be efficiently prevented.

Further, one aspect of the ozone treatment method in the present invention is to hermetically seal the space between the window member that transmits vacuum ultraviolet rays and the stage that is arranged to face the window member and on which the object to be processed is placed. sealed, the surface of the placed the object to be processed object on the stage, a step of forming a processing space exposed to the vacuum ultraviolet rays emitted from the light source unit in an atmosphere containing ozone, the sealing member see containing and a step of supplying a barrier gas for protecting the sealing member along at least a portion, in the step of hermetically sealed by the seal member, the support member for supporting the peripheral edge portion of said window member The sealing member arranged between the outer peripheral side surface of the stage is pressed against the outer peripheral side surface of the stage to airtightly seal the processing space .
As a result, it is possible to carry out ozone treatment on the object to be treated while preventing the sealing member from being deteriorated and not functioning due to ozone contained in the treatment gas which is the atmosphere of the treatment space.

According to the present invention, it is possible to prevent deterioration of the sealing member that airtightly seals the processing space for ozone treatment due to ozone.

It is a schematic block diagram which shows the ozone processing apparatus of this embodiment. It is a perspective view which shows the state at the time of stage descent. It is a perspective view which shows the state when the stage rises. It is sectional drawing for demonstrating the barrier gas supply part. It is a top view which shows the arrangement position of the barrier gas supply port. This is another example of arrangement of the barrier gas supply port. It is a schematic block diagram which shows another example of an ozone processing apparatus.

Hereinafter, embodiments of the present invention will be described with reference to the drawings.
FIG. 1 is a schematic configuration diagram showing an ozone treatment apparatus of this embodiment. In this embodiment, as an example of the ozone treatment device, for example, an application example to a desmear treatment device will be described.
(Configuration of ozone treatment equipment)
The ozone processing device 100 includes a light source unit 10 and a processing unit 20 that holds a substrate (work) W, which is an example of an object to be processed. The light source unit 10 houses a plurality of ultraviolet light sources 11 that emit vacuum ultraviolet rays inside, and irradiates the work W held by the processing unit 20 with the light from the ultraviolet light sources 11.

The light source unit 10 includes a box-shaped casing 14 having an opening at the bottom. A window member 12 such as quartz glass that transmits vacuum ultraviolet rays is airtightly provided in the opening of the casing 14 via the window frame member (support member) 16.
The inside of the light source unit 10 (casing 14) is maintained in an inert gas atmosphere by supplying an inert gas such as nitrogen gas from the supply port 15. Further, a reflecting mirror 13 is provided above the ultraviolet light source 11 in the light source unit 10. The reflecting mirror 13 reflects the light emitted from the ultraviolet light source 11 toward the window member 12. With such a configuration, the light of the ultraviolet light source 11 is irradiated substantially evenly to the region R substantially corresponding to the entire width of the reflector 13.

The ultraviolet light source 11 emits ultraviolet rays (vacuum ultraviolet rays) having a wavelength of 220 nm or less, preferably 190 nm or less, and various known lamps can be used. Here, the wavelength of 220 nm is set because when the wavelength of ultraviolet rays exceeds 220 nm, it becomes difficult to decompose and remove smear caused by an organic substance such as a resin.
As the ultraviolet light source 11, for example, a xenon excimer lamp (peak wavelength 172 nm) or a low-pressure mercury lamp (185 nm emission line) filled with xenon gas can be used. Among them, for example, a xenon excimer lamp is suitable for the desmear treatment.

The window frame member 16 sandwiches a portion that becomes the outer shell of the window member 12 in the vertical direction. An outer peripheral groove 16a is formed on the surface of the window frame member 16 facing the lower surface of the window member 12, and an elastic member such as an O-ring 16b is interposed between the outer peripheral groove 16a and the lower surface of the window member 12. ing. That is, the window frame member 16 is fixed so as to elastically sandwich the window member 12 via the O-ring 16b.
The processing unit 20 includes a stage 21 that adsorbs and holds the work W to be subjected to the ultraviolet irradiation treatment (desmear treatment) on the surface. The stage 21 is arranged so as to face the window member 12 of the light source unit 10. The stage 21 is provided with, for example, a suction hole (not shown) for sucking the work W. The stage 21 is made of, for example, an aluminum material in order to ensure flatness.

A mounting groove 16c for mounting the seal member 17 is formed on the surface of the window frame member 16 facing the outer peripheral surface (side surface) of the stage 21. The seal member 17 is an annular member having a hollow cross section arranged along the side surface of the stage 21, and the cross section expands to the inner peripheral side of the seal member 17 by injecting air into the hollow, and the cross section becomes larger by discharging air. An air expansion seal that contracts. The inner peripheral surface of the seal member 17 is in contact with the side surface of the stage 21 in the expanded state, and the inner peripheral surface thereof is separated from the side surface of the stage 21 in the contracted state.
FIG. 1 shows an expanded state of the seal member 17. In this way, the seal member 17 is in close contact with the side surface of the stage 21 in the expanded state, so that the processing space between the window member 12 and the stage 21 is airtightly sealed.

On the stage 21, the work W is placed and the processing area R1 capable of performing ultraviolet irradiation treatment (desmear treatment) on the work W, and the processing in the processing area R1 where the work W is prohibited from being placed. A preparation area R2 for performing preparation is formed.
The processing space between the window member 12 and the stage 21 has an atmosphere of a processing gas containing ozone, and the work W placed in the processing region R1 on the stage 21 is vacuumed in the atmosphere of the processing gas. It is designed to be treated by being exposed to ultraviolet rays.

Further, the stage 21 is supported by an actuator 51 that can move the stage 21 in a direction (Z direction) that approaches and deviates from the window member 12. The actuator 51 moves the stage 21 in the vertical direction as shown in FIGS. 2 and 3. Here, FIGS. 2 and 3 are perspective views of a portion of the ozone treatment device 100 shown in FIG. 1 below the window member 12, where FIG. 2 shows the stage 21 descending and FIG. 3 shows the stage 21 rising. It shows the state of time.
While the stage 21 is moved up and down, the seal member 17 maintains the contracted state, and it is assumed that a gap is formed between the inner peripheral surface of the seal member 17 and the side surface of the stage 21. With such a configuration, when the stage 21 moves up and down, the seal member 17 can be prevented from being rubbed while being pressed against the side surface of the stage 21, and damage to the seal member 17 can be prevented.
In the present embodiment, the case where the stage 21 is moved up and down by the actuator 51 so that the stage 21 approaches and dissociates from the window member 12 will be described. However, by moving the light source unit 10 up and down, the window The member 12 may be configured to approach and dissociate from the stage 21.

Further, an air supply path 24 for supplying the processing gas to the processing space is formed on one side edge of the stage 21 (on the right side in FIG. 1). A supply device 41 for supplying processing gas is connected to the air supply passage 24.
Further, an exhaust passage 25 for discharging the exhaust gas after the desmear treatment to the outside of the stage 21 is formed on the other side edge portion of the stage 21 (left side in FIG. 1). An ejector 42 is attached to the exhaust passage 25. The ejector 42 uses a fluid to create a decompressed state, and for example, a flow of compressed air generated by the compressor 45 can be used. When the ejector 42 is attached to the exhaust passage 25, the processing gas (processing gas) in the processing unit 20 is forcibly discharged. The pipe connecting the exhaust passage 25 and the ejector 42 is provided with a cock 46 that is opened and closed by a motor drive to adjust the opening degree of the pipe. The opening degree of the cock 46 and the drive of the actuator 51 are controlled by the control unit 52.

Here, as the processing gas, for example, oxygen gas, a mixed gas of oxygen and ozone or steam, or a gas obtained by mixing these gases with an inert gas or the like can be used. While the substrate W is irradiated with ultraviolet rays from the light source unit 10, the processing gas is supplied to the processing space from the air supply port 24a formed on the upper surface of the stage 21 through the air supply path 24, and is also supplied to the processing space. The exhaust gas is discharged to the outside of the stage 21 as exhaust gas from the exhaust port 25a formed on the upper surface of the 21 through the exhaust passage 25.
As shown in FIG. 2, the air supply port 24a and the exhaust port 25a are formed in a row along the horizontal direction (Y direction) orthogonal to the direction in which the processing gas flows (X direction). As a result, the processing gas flows through the processing space between the window member 12 and the work W from the right to the left in FIG. As described above, the ozone treatment device 100 in the present embodiment includes a gas supply / discharge unit that allows the treatment gas to flow along the surface of the work W to form a flow path for the treatment gas.

In the preparation region R2 in the treatment space, for example, the treatment gas, which is oxygen gas, is irradiated with ultraviolet rays from the light source unit 10, and active species such as ozone and oxygen radicals are generated. Since there is no work W (that is, no smear) in the preparation region R2, the active species generated in the preparation region R2 are gradually concentrated while being pushed downstream by the newly supplied processing gas. It rises and stabilizes.
That is, the processing gas is a gas supplied to the preparation region R2 in order to keep the ozone concentration of the processing gas, which is the atmosphere of the processing space, constant (for example, 3%), and ozone is generated by irradiation with ultraviolet rays. Can be gas. It can be said that the preparation region R2 is a region that irradiates the treatment gas with ultraviolet rays to stabilize the concentration of the active species. The processing gas may be ozone itself.

As described above, the ozone concentration in the treatment space during the ultraviolet irradiation treatment (during the desmear treatment) is, for example, 3%, and the temperature of the work W is maintained at about 150 ° C. by a heating mechanism (not shown).
Since the seal member 17 in the present embodiment is made of an elastic member such as rubber due to its nature, it may be significantly deteriorated by being exposed to ozone. Specifically, about 5 hours after exposure, so-called ozone cracks are formed, and the elasticity is lost, so that the sealing member does not function.
Since the ozone treatment device 100 in the present embodiment has a structure in which the seal member 17 is pressed against the side surface of the stage 21 to seal the processing space, the window frame member 16 that supports the seal member 17 is formed on the outer periphery of the stage 21. A gap (groove) is formed between the two. The width of the groove is wider than the distance between the window member 12 and the work W. Further, in the central region of the stage 21, the processing gas flows along the designed flow path and the processing gas is discharged, but in the lateral region, there is no mechanism for controlling the flow of the processing gas. Therefore, the treated gas containing ozone easily flows into the groove formed on the outer periphery of the stage 21, and the ozone contained in the treated gas may deteriorate the seal member 17.

Therefore, the ozone treatment device 100 in the present embodiment includes a barrier gas supply unit for barriering the seal member 17 with gas so that the seal member 17 does not come into contact with ozone. As shown in FIG. 4, the barrier gas supply unit includes a barrier gas supply path 16d provided in the window frame member 16. The barrier gas supply path 16d includes a barrier gas supply port 16e formed in the vicinity of the seal member 17 and above the seal member 17 at a position facing the side surface of the stage 21 along at least a part of the seal member 17.
That is, the barrier gas supply unit is below the mounting surface of the work W on the side surface of the stage 21 in a state where the stage 21 is raised to the processing position of the ultraviolet irradiation treatment shown by the broken line in FIG. The barrier gas is configured to be ejected above the contact position of the expanded seal member 17 with the stage 21 shown by the above.

Here, the processing position is a position where the Y-direction end portion on the upper surface of the work W abuts on the lower surface of the minute streak protrusion 12a formed on the lower surface of the window member 12. The thickness of the streak protrusion 12a in the Z direction is equal to the set interval between the window member 12 and the work W during the ultraviolet irradiation treatment, and is, for example, 1 mm or less. At least two streaky protrusions 12a are formed so as to abut on both ends of the work W in the Y direction. However, the number of streak protrusions 12a is not limited to two, and may be three or more. Further, the length of the streak protrusion 12a in the X direction may be equal to the length of the work W in the X direction or slightly longer than the length of the work W in the X direction.

Further, the barrier gas can be an inert gas such as nitrogen gas or CDA (clean dry air). The barrier gas may be the same gas as the processing gas as long as it does not contain ozone. However, the barrier gas supply port 16e shall be provided separately from the treatment gas supply port 24a.
As described above, the barrier gas supply unit ejects the barrier gas from the barrier gas supply port 16e toward the side surface of the stage 21 to form a barrier so that ozone does not reach the periphery of the seal member 17. As a result, deterioration of the sealing member 17 due to ozone can be prevented. In addition, the effect of reducing the amount of processing gas that leaks into the groove on the outer periphery of the stage 21 and is wasted can also be obtained.

FIG. 5 is a plan view showing the arrangement position of the barrier gas supply path 16d (barrier gas supply port 16e).
On the upstream side (right side of FIG. 5) of the processing gas in the stage 21, the processing gas supply ports 24a are bored in a row in a direction orthogonal to the flow of the processing gas, and the processing gas in the stage 21 is formed. On the downstream side (left side of FIG. 5), the exhaust ports 25a of the processing gas are similarly drilled in a row. The work W is placed at a rectangular position indicated by a broken line separating the preparation area R2 from the processing gas supply port 24a, and the processing gas flows on the work W from right to left in FIG.

The processing space is defined by the seal member 17 in a substantially rectangular shape, for example, as shown in FIG. In FIG. 5, air supply ports 24a and exhaust ports 25a for processing gas are formed at both ends in the long side direction of the rectangle along the short side direction, and the processing gas is formed along the long side direction of the rectangle. This is an example of flowing. The barrier gas supply port 16e is formed at a position facing two side surfaces corresponding to the long side of the rectangle, that is, two side surfaces parallel to the flow direction of the processing gas, among the four side surfaces of the stage 21. Further, a plurality of barrier gas supply ports 16e are formed along the direction in which the processing gas flows.

As described above, most of the processing gas supplied from the air supply port 24a is discharged from the exhaust port 25a through the flow path of the processing gas, but on the side of the flow path, the processing gas The flow cannot be controlled, and if it is left as it is, the processing gas will flow into the gap (groove) between the stage 21 and the window frame member 16. Then, the sealing member 17 may be deteriorated by ozone contained in the processing gas.
As described above, by providing the barrier gas supply port 16e so as to face the two side surfaces corresponding to the long sides of the rectangle along the flow direction of the processing gas, the sealing member 17 is exposed to ozone contained in the processing gas. It can be appropriately prevented from being done. As a result, deterioration of the sealing member 17 due to ozone can be prevented.

The arrangement positions of the barrier gas supply path 16d and the barrier gas supply port 16e are not limited to the positions shown in FIG. For example, as shown in FIG. 6A, it may be arranged on all four sides of the stage 21. As a result, it is possible to more reliably prevent the treated gas containing ozone from flowing into the gap formed on the outer periphery of the stage 21.
Further, as shown in FIG. 6 (b), it may be arranged on three side surfaces on the upstream side of the stage 21, or as shown in FIG. 6 (c), it may be arranged on one side surface on the upstream side of the stage 21. May be good. Further, as shown in FIG. 6D, it may be arranged on two opposing side surfaces on the upstream side of the stage 21. The barrier gas supplied to the upstream side flows to the downstream side due to the differential pressure between the upstream side and the downstream side. Therefore, by arranging the barrier gas supply port 16e on the upstream side, it is possible to efficiently prevent the treated gas containing ozone from flowing into the gap formed on the outer periphery of the stage 21.

Further, the barrier gas supply unit may be configured so that the flow rate for supplying the barrier gas can be adjusted. The flow of the processing gas on the work W is controlled by the pressure difference (differential pressure) between the upstream side and the downstream side. Therefore, if a barrier gas is added there, the differential pressure may change, which may hinder the flow of the processing gas.
Therefore, in order to maintain a constant differential pressure between the upstream side and the downstream side, roughly, when the barrier gas is increased, the treatment gas is reduced, and when the barrier gas is reduced, the treatment gas is increased as appropriate. You may go. By adjusting the supply amount of the barrier gas in this way, the seal does not cause adverse effects such as diluting the processing gas required for the original process or obstructing the flow of the processing gas. Deterioration of the member 17 due to ozone can be prevented.

Further, the ozone treatment device 100 in the present embodiment applies an air expansion seal as the seal member 17, and presses the seal member 17 against the side surface of the stage 21 to create a processing space between the window member 12 and the stage 21. The structure is airtightly sealed.
Conventionally, in an ozone treatment device such as a desmear processing device, an outer peripheral groove is formed on the outer peripheral portion of the upper surface of the stage on which the work W is placed, and a sealing member such as an O-ring is interposed between the outer peripheral groove and the window member. Therefore, the processing space between the window member and the stage was hermetically sealed. However, in the above-mentioned configuration of the conventional device, the window member is pushed up by the repulsive force of the seal member when the seal member is pressed against the window member, and the gap between the window member and the stage (work W) becomes non-uniform. There's a problem. Since the ultraviolet rays from the light source are absorbed by the processing gas in the processing space, if the gap between the window member and the work W is non-uniform, the amount of ultraviolet rays reaching the work W becomes non-uniform depending on the location of the work W. As a result, the processing becomes non-uniform.

On the other hand, in the present embodiment, the seal member 17 is not pressed against the window member 12, but is pressed against the side surface of the stage 21. As a result, it is possible to prevent the window member 12 from being pushed up by the repulsive force of the seal member 17, and to prevent the gap between the work W and the window member 12 from becoming non-uniform. Therefore, it is possible to prevent uneven processing due to non-uniformity of the gap.
Further, the window member 12 is a thin member in consideration of the transmittance of the irradiated light, and for example, the thickness is 1/100 or less with respect to the length of one side. Therefore, if only the peripheral edge portion of the window member 12 is supported by the window frame member 16, the window member 12 tends to bend downward in a convex manner. Therefore, in the present embodiment, as shown in FIG. 4, a streak protrusion 12a is provided on the lower surface of the window member 12, and the streak protrusion 12a abuts on the work W to provide an appropriate distance between the work W and the window member 12. It is designed to keep. As a result, the distance between the work W and the window member 12 can be appropriately defined, and the ultraviolet irradiation treatment for the work W can be appropriately performed.

Hereinafter, the operation procedure of the ozone treatment apparatus 100 will be described.
(1) The light source unit 10 and the processing unit 20 are configured to be vertically separable. The window member 12 is attached to the light source portion 10 side.
(2) With the processing unit 20 lowered, the conveyed work W is placed on the stage 21 and fixed by vacuum suction.
(3) The control unit 52 controls the actuator 51 and raises the processing unit 20 until the upper surface of the work W comes into contact with the streak projection 12a formed on the lower surface of the window member 12. As a result, the distance between the window member 12 and the work W is set to a preset distance of, for example, 1 mm or less.

(4) Air is injected into the seal member 17 formed of the air expansion seal to airtightly seal the outer periphery of the stage 21. As a result, an airtight processing space is formed between the window member 12 and the stage 21.
(5) The supply device 41 operates to introduce the processing gas into the processing space, and the ejector 42 operates to discharge the gas from the processing space (gas supply / discharge process). The barrier gas supply unit operates at the same time as or substantially at the same time as this gas supply / discharge process, and the barrier gas is supplied to the groove on the outer periphery of the stage 21.
(6) The ultraviolet light source 11 is turned on, and the ultraviolet irradiation treatment (desmear treatment) is started.

(7) When the ultraviolet irradiation treatment (desmear treatment) is completed, the ultraviolet light source 11 is turned off.
(8) The introduction of the processing gas into the processing space and the operation of the ejector are stopped. In addition, the supply of barrier gas will be stopped.
(9) Air is discharged from the seal member 17, and the light source unit 10 and the processing unit 20 are separated.
(10) The control unit 52 controls the actuator 51 and lowers the processing unit 20. As a result, the light source unit 10 and the processing unit 20 are separated vertically.
(11) Take out the work W.
By the above procedure, it is possible to perform a uniform ultraviolet irradiation treatment (desmear treatment) on the entire surface of the work W while preventing deterioration of the sealing member 17 that airtightly seals the treatment space due to ozone.

In the ozone treatment apparatus 100 described above, CDA is supplied as the treatment gas and nitrogen gas is supplied as the barrier gas, and the oxygen concentration in the gap formed on the outer periphery of the stage 21 is measured to allow the treatment gas to flow into the gap. Was measured. In addition, the above measurement was carried out a plurality of times by changing the flow rate of the barrier gas.
As a result, it was confirmed that when the flow rate of the barrier gas was 0, that is, when the barrier gas was not supplied, the oxygen concentration in the gap was equal to the oxygen concentration in the CDA, and the processing gas was flowing into the gap. Then, as the flow rate of the barrier gas is increased, the oxygen concentration in the gap becomes lower, and when the barrier gas has a constant flow rate or more, the oxygen concentration in the gap is 0, that is, the gap is filled with the barrier gas and the treatment gas flows into the gap. It was confirmed that it could be prevented.

Further, when the same measurement was performed by changing the size of the work W and the flow velocity of the processing gas, the same tendency as described above could be confirmed. It can also be confirmed that the larger the flow velocity of the processing gas (the larger the differential pressure between the upstream side and the downstream side), the larger the flow rate of the barrier gas required to keep the oxygen concentration in the gap below a predetermined value. It was.
In this way, by supplying the barrier gas at an appropriate flow rate according to the processing conditions of the work W (size of the work W, flow rate of the processing gas, etc.), the treatment gas containing ozone is surely delivered to the outer peripheral side surface of the stage 21. It was confirmed that it was possible to prevent the wraparound and surely prevent the deterioration of the sealing member 17 due to ozone.

(Modification example)
In the above embodiment, the case where the processing space is airtightly sealed by pressing the sealing member 17 against the side surface of the stage 21 has been described, but the sealing structure of the processing space is not limited to the above.
As shown in FIG. 7, a seal member 122 such as an O-ring is sandwiched between the outer peripheral portion of the stage 121 constituting the processing unit and the window member 112 forming the light source unit, so that the light source unit and the processing unit are separated from each other. It may be configured to be assembled airtightly. Note that FIG. 7 is a view of the ozone treatment device in the direction in which the treatment gas G1 flows. In such a configuration, as shown in FIG. 7, a barrier gas supply unit 123 that ejects the barrier gas G2 may be provided near the seal member 122 and closer to the center of the stage 21 than the seal member 122. Also in this case, similarly to the above embodiment, it is possible to prevent the processing gas from flowing to the side of the flow path and prevent the seal member 122 that airtightly seals the processing space from being deteriorated by ozone.
However, in this case, in order to make the light treatment uniform, the non-uniformity of the gap between the work W and the window member 112, which is caused by pushing up the window member 112 due to the repulsive force of the seal member 122, is prevented. It is necessary to take separate measures for this.

Further, in the above embodiment, an example of applying the ozone treatment device to the desmear treatment device has been described, but the present invention may be applied to a resist light ashing treatment, a resist removal treatment, a dry cleaning treatment, and the like. ..

100 ... Ozone treatment device, 10 ... Light source unit, 12 ... Window member, 16 ... Window frame member (support member), 16d ... Barrier gas supply path, 16e ... Barrier gas supply port, 17 ... Seal member, 20 ... Processing unit, 21 ... Stage, 24 ... air supply path, 25 ... exhaust path, 51 ... actuator, 52 ... control unit, W ... work

Claims (8)

A light source unit that has a window member that transmits vacuum ultraviolet rays and emits the vacuum ultraviolet rays through the window member.
A stage that is placed facing the window member and on which an object to be processed is placed,
In the space between the window member and the stage, the surface of the object to be processed placed on the stage is exposed to the vacuum ultraviolet rays emitted from the light source portion in an atmosphere containing ozone. A sealing member that airtightly seals the processing space,
A barrier gas supply unit that supplies a barrier gas for protecting the seal member along at least a part of the seal member.
A support member that supports the peripheral edge of the window member is provided .
The seal member, the disposed between the supporting member and the outer peripheral side surface of the stage, an ozone treatment device according to claim Rukoto which is pressed against the outer peripheral side surface of the stage abolish sealing the processing space airtight. The ozone treatment apparatus according to claim 1 , wherein the seal member is an air expansion seal having a hollow cross section and expanding the cross section by injecting air into the hollow. The barrier gas supply unit
The ozone treatment apparatus according to claim 1 , wherein the ozone treatment apparatus is arranged below the mounting surface of the object to be processed in the stage. The ozone treatment apparatus according to claim 1 , further comprising a gas supply / discharge portion for flowing a treatment gas along the surface between the surface of the object to be treated and the window member in the treatment space. .. The seal members are arranged in an annular shape and are arranged in an annular shape.
The gas supply / discharge unit is
An air supply port that supplies the processing gas to the processing space,
An exhaust port for discharging the processing gas from the processing space is provided.
The ozone treatment apparatus according to claim 4 , wherein the air supply port and the exhaust port are arranged so as to form a flow path of the processing gas in a ring formed by the seal member. .. The barrier gas supply unit
The ozone treatment apparatus according to claim 5 , wherein the ozone treatment apparatus is arranged on the side of the flow path of the processing gas formed by the gas supply / discharge unit. The barrier gas supply unit
The ozone treatment apparatus according to claim 5 , wherein the ozone treatment apparatus is arranged on the upstream side of the flow path of the processing gas formed by the gas supply / discharge unit. A space between a window member that transmits vacuum ultraviolet rays and a stage that is arranged opposite to the window member and on which an object to be processed is placed, and the surface of the object to be processed placed on the stage is ozone. a step of sealing the processing space exposed to the vacuum ultraviolet rays emitted from the light source unit, the sealing member hermetically in an atmosphere containing,
See containing and a step of supplying a barrier gas for protecting the sealing member along at least a portion of said sealing member,
In the step of airtightly sealing with the sealing member,
The sealing member arranged between the support member that supports the peripheral edge of the window member and the outer peripheral side surface of the stage is pressed against the outer peripheral side surface of the stage to airtightly seal the processing space. Ozone treatment method.

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