JP6791017B2 - Gas chromatograph - Google Patents

Description

The present invention relates to a gas chromatograph provided with a substrate provided outside the column oven.

The gas chromatograph includes a column and a column oven that houses the column. During the analysis in the gas chromatograph, the column is heated by the column oven, and the temperature inside the column oven becomes high. Since the column oven is arranged inside the housing, the heat of the column oven also causes the housing to become hot. In addition, the housing may be touched by the user. Therefore, it is necessary to cool the high temperature housing so that it is not dangerous even if the user touches the housing.
From this point of view, a configuration for taking in outside air is provided inside the housing of the gas chromatograph. As this configuration, for example, a fan for taking in outside air is provided in the housing of the gas chromatograph (see, for example, Patent Document 1 below).

In such a gas chromatograph, an air flow (air flow) is generated in the housing by appropriately driving a fan, and the housing can be cooled by this air flow.

Japanese Patent No. 3824148

However, in the above gas chromatograph, the air flow generated in the housing may adversely affect the analysis result. Specifically, various substrates are arranged in the housing. When the substrate is arranged in the flow path of the air flow in the housing (when the substrate is exposed to the air flow), the air hits the substrate and adversely affects the input / output of the electric signal through the substrate. there is a possibility.

The present invention has been made in view of the above circumstances, and an object of the present invention is to provide a gas chromatograph capable of cooling a housing by outside air taken in from the outside and suppressing an adverse effect of the outside air on a substrate. To do.

(1) The gas chromatograph according to the present invention includes a column oven, a column, a detector, a substrate, and a housing. The inside of the column oven is heated. The column is housed inside the column oven. The detector detects the sample components separated by the column. The substrate is provided outside the column oven, and an amplifier circuit that amplifies the output signal from the detector is mounted. The housing houses the column oven and the substrate inside. Inside the housing, a ventilation flow path for passing outside air taken in from the outside of the housing is formed between the column oven and the substrate.

According to such a configuration, the outside air taken in from the outside of the housing passes through the ventilation flow path formed between the column oven and the substrate.
Therefore, it is possible to prevent the substrate from being exposed to the flow of the outside air while cooling the housing by the outside air taken in from the outside of the housing.
That is, while the housing can be cooled by the outside air taken in from the outside, it is possible to suppress the adverse effect of the outside air on the substrate.

(2) Further, a first partition wall for partitioning the substrate installation space on which the substrate is installed and the ventilation flow path may be provided inside the housing.

According to such a configuration, by partitioning the substrate installation space and the ventilation flow path by the first partition wall, it is possible to suppress the outside air taken in from the outside of the housing from flowing into the substrate installation space.

(3) Further, a second partition wall may be provided inside the housing between the outer surface of the column oven and the ventilation flow path. The space between the outer surface of the column oven and the second partition wall may function as a heat insulating layer.

According to such a configuration, the column oven becomes excessive due to the influence of the outside air taken into the ventilation flow path by the space (insulation layer) between the outer surface of the column oven and the second partition wall and the second partition wall. It is possible to suppress the cooling to the oven.

(4) Further, the gas chromatograph may further include a fan and a first rectifying member. At least a part of the fan is provided in the ventilation flow path, and is rotationally driven into the ventilation flow path in order to take in outside air from the outside of the housing. The first rectifying member is provided around the fan in the ventilation flow path and rectifies the outside air passing through the fan.

According to such a configuration, by rotationally driving the fan, it is possible to take in outside air from the outside and supply the outside air to the ventilation flow path. Then, the outside air flowing through the ventilation flow path can be rectified by the first rectifying member and passed through the fan.
Therefore, the flow of the outside air moving in the ventilation flow path can be kept smooth.

(5) Further, the gas chromatograph may further include a motor and a second rectifying member. At least a part of the motor is provided in the ventilation flow path, and the fan is rotationally driven. The second rectifying member is provided in the ventilation flow path and rectifies the outside air toward the motor.

According to such a configuration, the outside air moving in the ventilation flow path can be rectified by the second rectifying member, and the rectified outside air can be supplied to the motor.
Therefore, the motor can be cooled efficiently.

(6) Further, an introduction flow path for introducing outside air into the ventilation flow path from the outside of the housing may be formed below the substrate installation space.

According to such a configuration, the outside air can be smoothly taken into the ventilation flow path through the introduction flow path.

According to the present invention, the outside air taken in from the outside of the housing passes through the ventilation flow path formed between the column oven and the substrate. Therefore, it is possible to prevent the substrate from being exposed to the flow of the outside air while cooling the housing by the outside air taken in from the outside of the housing. Then, it is possible to suppress the adverse effect of the outside air on the substrate.

It is sectional drawing which showed schematic composition example of the gas chromatograph which concerns on one Embodiment of this invention, and shows the state seen from the side. FIG. 5 is a cross-sectional view showing a state in which the gas chromatograph of FIG. 1 is viewed from above. It is sectional drawing which showed the state which a part of the gas chromatograph of FIG. 1 was seen from the front side.

1. 1. Overall Configuration of Gas Chromatograph FIG. 1 is a cross-sectional view schematically showing a configuration example of a gas chromatograph 1 according to an embodiment of the present invention, and shows a state viewed from the side.

The gas chromatograph 1 is for performing analysis by supplying a sample gas together with a carrier gas into the column 2, and in addition to the column 2, the column oven 3, the sample introduction unit 4, the detector 5, the heater 6, and the like. It includes a motor 7, a first fan 8, a second fan 9, and the like. In the gas chromatograph 1, these members are arranged in the housing 10.
The column 2 is composed of, for example, a capillary column. The column 2 is housed in the column oven 3.
The column oven 3 is for heating the column 2. A heater 6 and a first fan 8 are arranged together with the column 2 in the column oven 3.

The sample introduction section 4 is provided on the upper part of the column oven 3. The sample introduction unit 4 is for introducing a carrier gas and a sample gas into the column 2, and a sample vaporization chamber (not shown) is formed inside the sample introduction unit 4. A liquid sample is injected into the sample vaporization chamber, and the sample vaporized in the sample vaporization chamber is introduced into the column 2 together with the carrier gas. Further, the gas supply flow path 11 and the split flow path 12 communicate with each other in the sample vaporization chamber.
The gas supply flow path 11 is a flow path for supplying carrier gas to the sample vaporization chamber of the sample introduction unit 4.

When the carrier gas and the sample gas are introduced into the column 2 by the split introduction method, the split flow path 12 externally removes a part of the gas (mixed gas of the carrier gas and the sample gas) in the sample vaporization chamber at a predetermined split ratio. It is a flow path for discharging to.

The detector 5 is provided on the upper part of the column oven 3 and is arranged at a distance from the sample introduction unit 4. The detector 5 is composed of, for example, a hydrogen flame ionization detector (FID) and a flame photometric detector (FPD). The detector 5 sequentially detects each sample component contained in the carrier gas introduced from the column 2.
The heater 6 is arranged in the column oven 3 and is arranged behind the column 2.
The motor 7 is attached to the central portion of the back surface (back plate 31) of the column oven 3.

The first fan 8 is housed in the column oven 3. The first fan 8 is arranged behind the heater 6. The first fan 8 is configured to apply the driving force of the motor 7.

The second fan 9 is arranged in the housing 10, and specifically, is arranged between the back plate 31 of the column oven 3 and the back plate 101 of the housing 10. The second fan 9 is configured to apply the driving force of the motor 7. That is, when the motor 7 is driven, the second fan 9 rotates together with the first fan 8.

When analyzing a sample in the gas chromatograph 1, the heater 6 is operated and the motor 7 is driven to rotate the first fan 8. As a result, the temperature inside the column oven 3 rises, and the column 2 is heated. Then, the sample to be analyzed is injected into the sample introduction unit 4. The sample is vaporized in the sample introduction section 4. Further, the carrier gas is supplied to the sample introduction unit 4 via the gas supply flow path 11.

The sample vaporized in the sample introduction unit 4 is introduced into the column 2 together with the carrier gas. Each sample component contained in the sample is separated in the process of passing through the heated column 2 and sequentially introduced into the detector 5.

Then, in the detector 5, each sample component contained in the carrier gas introduced from the column 2 is sequentially detected. In the gas chromatograph 1, a chromatogram is generated based on the detection signal of the detector 5. The user confirms the obtained chromatogram and performs various analyzes.

Further, during the analysis, the second fan 9 also rotates by driving the motor 7. As a result, the air (outside air) outside the housing 10 is taken into the housing 10. Then, an air flow (air flow) is generated in the housing 10. This air flow cools the housing 10 and prevents the housing 10 from becoming hot. The details of the air flow in the housing 10 will be described later.

2. 2. Configuration of the flow path in the housing FIG. 2 is a cross-sectional view showing a state in which the gas chromatograph 1 is viewed from above.
The column oven 3 is formed in a box shape. The column oven 3 includes a back plate 31 and a pair of side plates 33 as a peripheral wall. As described above, the motor 7 is provided on the back plate 31 of the column oven 3. The rear end of the motor 7 projects rearward from the back plate 31 of the column oven 3.

The housing 10 is formed in a box shape and houses the column oven 3 inside. The housing 10 includes a back plate 101, a front plate 102, and a pair of side plates 103 as peripheral walls. The front plate 102 includes a door 107 that can be opened and closed. The door 107 is for opening and closing the inside of the column oven 3. A certain distance is provided between the back plate 101 of the housing 10 and the back plate 31 of the column oven 3, and between the side plate 103 of the housing 10 and the side plate 33 of the column oven 3. ..

An exhaust port 101a is formed in the central portion of the back plate 101 of the housing 10. A plurality of holes (gap) are provided in a portion of the front plate 102 of the housing 10 on one side (right side in FIG. 2) in the width direction from the center, specifically, on the side or end of the door 107. It is formed. A plurality of holes (gap) are formed in the side plate 103 on the opposite side in the width direction (the side plate 33 on the left side in FIG. 2) of the housing 10.

In the housing 2, a first partition wall 41, a second partition wall 42, a first rectifying member 51, and a second rectifying member 52 are provided in a region between the outer surface of the column oven 3 and the inner surface of the housing 2. Has been done.

The first partition wall 41 includes a side plate 103 on one side in the width direction (right side in FIG. 2) of the housing 10 and a side plate 33 on one side in the width direction (right side in FIG. 2) of the column oven 3. It is placed between. The first partition wall 41 extends in the front-rear direction from the front plate 102 to the back plate 101 in the housing 10. Specifically, the first partition wall 41 extends rearward from a portion of the front plate 102 on one side (right side) in the width direction, then bends on one side (right side) in the width direction, and then bends. , Extends rearward to the back plate 101. The first partition wall 41 is arranged on one side (right side) in the width direction with respect to the plurality of holes (gap) formed in the front plate 102. The area (space) partitioned by the first partition wall 41, the side plate 103 on one side (right side) in the width direction, the front plate 102, and the back plate 101 is the substrate installation space 111.

A substrate 70 is provided on one side (right side) of the first partition wall 41 in the width direction. The substrate 70 is arranged in the substrate installation space 111. The board 70 is mounted with an amplifier circuit that amplifies the output signal from the detector 5. The board 70 is connected to a main board (not shown) via wiring. The first partition wall 41 partitions the substrate installation space 111 and the ventilation flow path 113 (described later).

The second partition wall 42 is provided in the housing 10 on the column oven 3 side of the first partition wall 41. Specifically, the second partition wall 42 extends from the side plate 33 on one side (right side) in the width direction of the column oven 3 to one side (right side) in the width direction, and then extends rearward. After that, it extends to the vicinity of the motor 7 toward the other side in the width direction (the left side in FIG. 2). As described above, the second partition wall 42 is provided around the column oven 3, and a part thereof faces the first partition wall 41. The second partition wall 42 is provided between the outer surface of the column oven 3 and the ventilation flow path 113 (described later). The area (space) partitioned by the second partition wall 42 and the outer surface of the column oven 3 is the heat insulating space 112.

The first rectifying member 51 and the second rectifying member 52 are arranged on the rear side in the housing 2. The first rectifying member 51 is formed in a tubular shape and protrudes forward from the central portion of the back plate 101 of the housing 2. The first rectifying member 51 is arranged around the second fan 9 and covers the second fan 9. The space on the inner side of the first rectifying member 51 communicates with the exhaust port 101a.

The second rectifying member 52 extends from the rear end of the first partition wall 41 toward the other side in the width direction (left side in FIG. 2). The tip of the second rectifying member 51 is located in the vicinity of the first rectifying member 51.

3. 3. Flow of outside air In the housing 10, the side plate 33 on one side (right side) in the width direction of the column oven 3, the first partition wall 41, the second partition wall 42, the second rectifying member 52, and the first rectifying member 51. The area (space) partitioned by is the ventilation flow path 113. Further, an introduction flow path 114 is formed below the housing 10.
FIG. 3 is a cross-sectional view showing a state in which a part of the gas chromatograph 1 (a part on one side in the width direction) is viewed from the front side.

The housing 10 of the gas chromatograph 1 is provided with a leg portion 104. The leg portion 104 projects downward from the lower end portion of the bottom plate 105 of the housing 10. Although not shown in FIG. 3, the leg portion 104 located on the lower side of the substrate installation space 111 is formed with a passage port for passing outside air. Further, a plurality of introduction holes 105a are formed in the portion of the bottom plate 105 located below the ventilation flow path 113.

The introduction flow path 114 is a flow path of air that passes below the housing 10 and flows toward the ventilation flow path 113. Specifically, the introduction flow path 114 is formed by a passage port of the leg portion 104, a space on the lower side of the bottom plate 105, and an introduction hole 105a.

In the gas chromatograph 1, when the second fan 9 rotates, outside air is taken in from the holes (gap) of the front plate 102 as shown in FIG. Then, the outside air passes through the ventilation flow path 113 and is exhausted from the exhaust port 101a. The outside air is rectified toward the motor 7 by the second rectifying member 52 in the process of passing through the ventilation flow path 113, and then passes through the second fan 9 while being rectified by the first rectifying member 51, and passes through the exhaust port 101a. Is exhausted from. As described above, the flow of the outside air is generated in the ventilation flow path 113 and does not affect the substrate 70 arranged in the substrate installation space 111.
At this time, as shown in FIG. 3, the outside air on the lower side of the housing 10 passes through the introduction flow path 114 and is introduced into the ventilation flow path 113.
In this way, the outside air on the front side of the housing 10 and the outside air on the lower side of the housing 10 are introduced into the ventilation flow path 113.

Further, as shown in FIG. 2, the outside air on the other side (left side) in the width direction of the housing 10 enters the housing 10 from the hole (gap) of the side plate 103 on the other side (left side) in the width direction. It flows in, passes through the second fan 9, and is exhausted from the exhaust port 101a while being rectified by the first rectifying member 51.
The housing 10 is efficiently cooled by the air flow in the housing 10.

Further, a heat insulating space 112 and a second partition wall 42 are interposed between the ventilation flow path 113 and the outer surface of the column oven 3. The heat insulating space 112 functions as a heat insulating layer. In the insulated space 112, air naturally convects. Therefore, the heat insulating space 112 and the second partition wall 42 suppress the heat from the column oven 3 from being transferred to the outside (ventilation flow path 113).

4. Action / Effect (1) According to the present embodiment, as shown in FIG. 2, the rotation of the second fan 9 causes the outside air taken in from the outside of the housing 10 to be between the column oven 3 and the substrate 70. It passes through the formed ventilation flow path 113.

Therefore, it is possible to prevent the substrate 70 from being exposed to the flow of the outside air while cooling the housing 10 by the outside air taken in from the outside of the housing 10.
That is, while the housing 10 can be cooled by the outside air taken in from the outside, it is possible to prevent the outside air from adversely affecting the substrate 70.

(2) Further, according to the present embodiment, as shown in FIG. 2, inside the housing 10, a first partition wall for partitioning the substrate installation space 111 on which the substrate 70 is installed and the ventilation flow path 113 is provided. 41 is provided.

Therefore, by partitioning the substrate installation space 111 and the ventilation flow path 113 by the first partition wall 41, it is possible to prevent the outside air taken in from the outside of the housing 10 from flowing into the substrate installation space 111.

(3) Further, according to the present embodiment, as shown in FIG. 2, a second partition wall 42 is provided inside the housing 10 between the outer surface of the column oven 3 and the ventilation flow path 113. There is. Then, the heat insulating space 112, which is the space between the column oven 3 and the second partition wall 42, functions as a heat insulating layer.

Therefore, the heat insulating space 112 and the second partition wall 42 can prevent the column oven 3 from being excessively cooled by the influence of the outside air taken into the ventilation flow path 113.

(4) Further, according to the present embodiment, as shown in FIG. 2, in the gas chromatograph 1, the first rectifying member 51 is provided around the second fan 9 in the ventilation flow path 113, and the second fan 9 is provided. Rectify the outside air passing through.

That is, by rotationally driving the second fan 9, the outside air can be taken in from the outside and the outside air can be supplied to the ventilation flow path 113. Then, the outside air flowing through the ventilation flow path 113 can be rectified by the first rectifying member 51 and passed through the fan.
Therefore, the flow of the outside air moving in the ventilation flow path 113 can be kept smooth.

(5) Further, according to the present embodiment, as shown in FIG. 2, in the gas chromatograph 1, the second rectifying member 52 is provided in the ventilation flow path 113 and rectifies the outside air toward the motor 7.

That is, the outside air moving in the ventilation flow path 113 can be rectified by the second rectifying member 52, and the rectified outside air can be supplied to the motor 7.
Therefore, the motor 7 can be cooled efficiently.

(6) Further, according to the present embodiment, as shown in FIG. 3, below the substrate installation space 111, an introduction flow path 114 for introducing outside air into the ventilation flow path 113 from the outside of the housing 10. Is formed.

Therefore, the outside air can be smoothly taken into the ventilation flow path 113 through the introduction flow path 114.

5. Deformation Example In the above-described embodiment, the ventilation flow path 113 has been described as being arranged between the side plate 33 of the column oven 3 and the side plate 103 of the housing 10. However, the ventilation flow path 113 may be arranged between the column oven 3 and the housing 10. Further, the configuration may be such that the outside air passing through the ventilation flow path 113 does not hit the substrate 70. For example, the ventilation flow path 113 may be provided between another wall surface such as the upper surface plate of the housing 10 and the column oven 3.

Further, the shape and arrangement of the first partition wall 41 and the second partition wall 42 are not limited to those of the above-described embodiment. At least a part of the first partition wall 41 and the second partition wall 42 may be omitted.

Further, the shape and arrangement of the first rectifying member 51 and the second rectifying member 52 are not limited to those of the above-described embodiment.

Further, in the above-described embodiment, it has been described that outside air is taken in from the front plate 102 and the bottom plate 105 of the housing 10. However, the outside air may be taken in from a portion other than the front plate 102 and the bottom plate 105 of the housing 10.

1 Gas chromatograph 2 Column 3 Column oven 5 Detector 7 Motor 9 2nd fan 10 Housing 41 1st compartment wall 42 2nd compartment wall 51 1st rectifying member 52 2nd rectifying member 70 Board 111 Board installation space 112 Insulation space 113 Ventilation flow path 114 Introduction flow path

Claims (6)

A column oven that heats the inside and
The column housed inside the column oven and
A detector that detects the sample components separated by the column, and
A substrate provided outside the column oven and on which an amplifier circuit for amplifying an output signal from the detector is mounted.
The column oven and the housing for accommodating the substrate are provided.
Inside the housing, a ventilation flow path for passing outside air taken in from the outside of the housing is formed between the column oven and the substrate, and the substrate installation space on which the substrate is installed is formed. By providing the first partition wall for partitioning the ventilation flow path, the flow of the outside air is generated in the ventilation flow path and affects the substrate arranged in the substrate installation space. A gas chromatograph characterized by not reaching the above. Inside the housing, a second partition wall is provided between the outer surface of the column oven and the ventilation flow path.
The gas chromatograph according to claim 1 , wherein the space between the outer surface of the column oven and the second partition wall functions as a heat insulating layer. A fan provided with at least a part of the ventilation flow path and rotationally driven into the ventilation flow path to take in outside air from the outside of the housing.
The gas chromatograph according to claim 1 or 2 , further comprising a first rectifying member provided around the fan in the ventilation flow path and rectifying the outside air passing through the fan. A motor provided with at least a part of the ventilation flow path and rotationally driving the fan,
The gas chromatograph according to claim 3 , further comprising a second rectifying member provided in the ventilation flow path and rectifying the outside air toward the motor. Any one of claims 1 to 4 , wherein an introduction flow path for introducing outside air into the ventilation flow path from the outside of the housing is formed below the substrate installation space. The gas chromatograph described in. A column oven that heats the inside and
The column housed inside the column oven and
A detector that detects the sample components separated by the column, and
A substrate provided outside the column oven and on which an amplifier circuit for amplifying an output signal from the detector is mounted.
The column oven and the housing for accommodating the substrate are provided.
Inside the housing, a ventilation flow path for passing outside air taken in from the outside of the housing is formed between the column oven and the substrate.
A fan provided with at least a part of the ventilation flow path and rotationally driven into the ventilation flow path to take in outside air from the outside of the housing.
A motor provided with at least a part of the ventilation flow path and rotationally driving the fan,
A gas chromatograph further provided with a second rectifying member provided in the ventilation flow path and rectifying the outside air toward the motor.

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