JP6772442B2 - 顕微鏡装置および観察方法 - Google Patents

顕微鏡装置および観察方法 Download PDF

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Publication number
JP6772442B2
JP6772442B2 JP2015180297A JP2015180297A JP6772442B2 JP 6772442 B2 JP6772442 B2 JP 6772442B2 JP 2015180297 A JP2015180297 A JP 2015180297A JP 2015180297 A JP2015180297 A JP 2015180297A JP 6772442 B2 JP6772442 B2 JP 6772442B2
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sample
aberration
light
unit
detection unit
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JP2015180297A
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Japanese (ja)
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JP2017058386A5 (enExample
JP2017058386A (ja
Inventor
一郎 佐瀬
一郎 佐瀬
啓作 浜田
啓作 浜田
秀太朗 大西
秀太朗 大西
久美子 松爲
久美子 松爲
佑介 大嶋
佑介 大嶋
今村　健志
健志 今村
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Nikon Corp
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Nikon Corp
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JP2015180297A 2015-09-14 2015-09-14 顕微鏡装置および観察方法 Expired - Fee Related JP6772442B2 (ja)

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JP2015180297A JP6772442B2 (ja) 2015-09-14 2015-09-14 顕微鏡装置および観察方法

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JP2017058386A JP2017058386A (ja) 2017-03-23
JP2017058386A5 JP2017058386A5 (enExample) 2018-08-23
JP6772442B2 true JP6772442B2 (ja) 2020-10-21

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Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3611549B1 (en) * 2017-04-14 2024-05-29 Hamamatsu Photonics K.K. Aberration correction method and optical device
DE102019007066A1 (de) * 2019-10-11 2021-04-15 Abberior Instruments Gmbh Verfahren und Vorrichtung zur Aberrationskorrektur in der Fluoreszenzmikroskopie
KR102870720B1 (ko) * 2023-10-25 2025-10-15 울산과학기술원 대면적 고해상도 영상을 촬영하는 방법, 장치 및 현미경

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5673306A (en) * 1979-11-20 1981-06-18 Rikagaku Kenkyusho Differential pattern display device for displacement and oscillation amplitude of object
JP3327998B2 (ja) * 1993-04-29 2002-09-24 オリンパス光学工業株式会社 形状測定方法及び装置
DE19733193B4 (de) * 1997-08-01 2005-09-08 Carl Zeiss Jena Gmbh Mikroskop mit adaptiver Optik
GB9820664D0 (en) * 1998-09-23 1998-11-18 Isis Innovation Wavefront sensing device
US20040257360A1 (en) * 2001-10-22 2004-12-23 Frank Sieckmann Method and device for producing light-microscopy, three-dimensional images
JP2005062155A (ja) * 2003-07-25 2005-03-10 Olympus Corp コヒーレントラマン散乱顕微鏡
JP2007101268A (ja) * 2005-09-30 2007-04-19 Fujifilm Corp 光断層画像化装置
JP4997334B2 (ja) * 2007-11-02 2012-08-08 ウェイヴフロント アナリシス インコーポレイテッド 超解像を達成するための新規なデジタル方法を有する光学顕微鏡
JP2013011856A (ja) * 2011-06-01 2013-01-17 Canon Inc 撮像システムおよびその制御方法
JP2013034127A (ja) * 2011-08-02 2013-02-14 Canon Inc 撮像装置
CN104769481B (zh) * 2012-10-12 2018-12-18 统雷有限公司 紧凑、低色散以及低像差自适应光学扫描系统
JP6196825B2 (ja) * 2013-07-09 2017-09-13 オリンパス株式会社 顕微鏡システム、及び、試料の屈折率測定方法
JP2015022073A (ja) * 2013-07-17 2015-02-02 オリンパス株式会社 顕微鏡と収差補正方法
JP6127818B2 (ja) * 2013-08-02 2017-05-17 株式会社ニコン 補償光学素子の設定方法及び顕微鏡
JP6178656B2 (ja) * 2013-08-02 2017-08-09 株式会社ニコン 補償光学素子の設定方法及び顕微鏡
JP2015102537A (ja) * 2013-11-28 2015-06-04 キヤノン株式会社 光干渉断層計
JP6518041B2 (ja) * 2014-05-21 2019-05-22 浜松ホトニクス株式会社 光刺激装置及び光刺激方法

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