JP6747154B2 - Fuse-insulated electric wire and method for manufacturing fusible insulated wire - Google Patents

Fuse-insulated electric wire and method for manufacturing fusible insulated wire Download PDF

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JP6747154B2
JP6747154B2 JP2016153948A JP2016153948A JP6747154B2 JP 6747154 B2 JP6747154 B2 JP 6747154B2 JP 2016153948 A JP2016153948 A JP 2016153948A JP 2016153948 A JP2016153948 A JP 2016153948A JP 6747154 B2 JP6747154 B2 JP 6747154B2
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insulating layer
resin
fusible
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conductor
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JP2018022636A (en
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三浦 剛
剛 三浦
百生 秀人
秀人 百生
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Hitachi Metals Ltd
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F5/00Coils
    • H01F5/06Insulation of windings
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/02Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets
    • H01F41/04Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets for manufacturing coils
    • H01F41/06Coil winding
    • H01F41/064Winding non-flat conductive wires, e.g. rods, cables or cords
    • H01F41/066Winding non-flat conductive wires, e.g. rods, cables or cords with insulation

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  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Coils Of Transformers For General Uses (AREA)
  • Insulated Conductors (AREA)

Description

本発明は、絶縁電線および融着性絶縁電線、並びにこれらの製造方法に関する。 The present invention relates to an insulated electric wire, a fusible insulated electric wire, and a method for manufacturing them.

回転電機や変圧器等の電気機器のコイルに使用される絶縁電線は、一般に、コイルの用途や形状に対応する断面形状に成形された導体の外周上に絶縁層が形成された構造を有している。 Insulated wires used for coils of electrical equipment such as rotating electrical machines and transformers generally have a structure in which an insulating layer is formed on the outer periphery of a conductor molded into a cross-sectional shape corresponding to the application and shape of the coil. ing.

近年、電気機器は効率化のためにインバータ制御されるようになっている。それに伴い、電気機器のコイルにはインバータサージ電圧等の高い電圧が印加されることから、部分放電が発生しやすくなり、絶縁層が劣化したり損傷したりすることがある。そこで、絶縁層においては部分放電による劣化や損傷を抑制するため、部分放電開始電圧(PDIV)を高くする方法が検討されている。この方法としては、例えば、比誘電率が低い樹脂で絶縁層を形成する方法や、絶縁層の厚さを厚くする方法が挙げられる。 In recent years, electric devices have come to be inverter-controlled for efficiency. Along with this, since a high voltage such as an inverter surge voltage is applied to the coil of the electric device, partial discharge is likely to occur, and the insulating layer may be deteriorated or damaged. Therefore, in order to suppress the deterioration and damage due to partial discharge in the insulating layer, a method of increasing the partial discharge inception voltage (PDIV) is being studied. Examples of this method include a method of forming an insulating layer with a resin having a low relative dielectric constant, and a method of increasing the thickness of the insulating layer.

絶縁層を形成する方法としては、有機溶剤に樹脂を溶解させてなる絶縁塗料を導体の外周に塗布して焼き付ける焼付法、予め調合した樹脂組成物を導体の外周に押出被覆する押出法、およびこれらを併用する方法がある。絶縁層を厚く形成する場合、焼付法では塗布および焼付の回数が増えてコストが高く、また絶縁層の厚さが周方向でばらつくことがあるため、一般に押出法が用いられる。 As a method for forming the insulating layer, a baking method in which an insulating paint obtained by dissolving a resin in an organic solvent is applied to the outer circumference of a conductor and baked, an extrusion method in which a preliminarily prepared resin composition is extrusion-coated on the outer circumference of the conductor, There is a method of using these together. When the insulating layer is formed thickly, the baking method increases the number of times of coating and baking, resulting in high cost, and the thickness of the insulating layer may vary in the circumferential direction. Therefore, the extrusion method is generally used.

押出法で用いる樹脂として種々のスーパーエンジニアリングプラスチックが検討されており、その中でも比誘電率が低いことからポリフェニレンサルファイド樹脂(以下、PPS樹脂ともいう)が着目されている(例えば、特許文献1を参照)。PPS樹脂によれば、PDIVが高いうえに耐熱性や機械的特性など諸特性に優れる絶縁層を形成することができる。 Various super engineering plastics have been studied as resins used in the extrusion method, and among them, polyphenylene sulfide resin (hereinafter, also referred to as PPS resin) has attracted attention because of its low dielectric constant (for example, refer to Patent Document 1). ). According to the PPS resin, it is possible to form an insulating layer having a high PDIV and excellent in various properties such as heat resistance and mechanical properties.

特開2014−136738号公報JP, 2014-136738, A

ところで、絶縁電線をコイルに加工するときには、絶縁電線のコイル形状を維持したり、コイル形状としたときに隣接する絶縁電線同士が擦れることによって絶縁層が摩耗や損傷することを抑制したりする目的で、絶縁電線をコイル状に加工した後に融着処理を施すことがある。 By the way, when the insulated electric wire is processed into a coil, the purpose is to maintain the coil shape of the insulated electric wire and to prevent the insulating layer from being worn or damaged by rubbing adjacent insulated electric wires when the coiled shape is adopted. In some cases, the insulated wire is processed into a coil shape and then subjected to a fusion treatment.

融着処理の方法としては、絶縁電線を巻回したコイルにエポキシや不飽和ポリエステルなどの熱硬化性の融着性樹脂を含有するワニスを塗布し焼き固める方法や、予め絶縁電線の絶縁層の外周上に融着性樹脂組成物からなる融着層を形成した融着性絶縁電線を巻回によりコイル状とした後に融着層間を融着させる方法がある。 As a method of fusion treatment, a method of applying a varnish containing a thermosetting fusible resin such as epoxy or unsaturated polyester to a coil wound with an insulated wire and baking it, or a pre-insulating layer of the insulated wire There is a method in which a fusible insulated electric wire having a fusible layer made of a fusible resin composition formed on the outer periphery is wound into a coil shape and then the fusible layers are fused.

しかしながら、特許文献1に示すようなPPS樹脂を含む絶縁層が設けられた絶縁電線では融着処理を施しても絶縁電線同士を十分に融着させることが困難である。PPS樹脂は絶縁性や耐熱性などに優れる反面、化学的に安定で融着性樹脂組成物(融着層)との化学的親和性が低い傾向にあり、PPS樹脂を含む絶縁層は融着層との密着力が弱くなるためである。そのため、特許文献1の絶縁電線では電気機器の信頼性が損なわれることがある。 However, with an insulated wire provided with an insulating layer containing a PPS resin as disclosed in Patent Document 1, it is difficult to sufficiently fuse the insulated wires together even if a fusion treatment is performed. Although PPS resin has excellent insulation and heat resistance, it tends to be chemically stable and have a low chemical affinity with the fusible resin composition (fusion layer), and the insulation layer containing PPS resin is fused. This is because the adhesion with the layer is weakened. Therefore, the insulated wire of Patent Document 1 may impair the reliability of the electric device.

本発明は、上記課題に鑑みて成されたものであり、ポリフェニレンサルファイド樹脂を含む絶縁層を備える絶縁電線を好適に融着させる技術を提供することを目的とする。 The present invention has been made in view of the above problems, and an object of the present invention is to provide a technique for suitably fusing an insulated electric wire including an insulating layer containing a polyphenylene sulfide resin.

本発明の一態様によれば、
導体と、
前記導体の外周に配置され、ポリフェニレンサルファイド樹脂を含む樹脂組成物からなる絶縁層と、を備え、
前記絶縁層は、表面における硫黄Sに対する酸素Oの質量濃度比O/Sが0.2以上である、絶縁電線が提供される。
According to one aspect of the invention,
A conductor,
An insulating layer disposed on the outer periphery of the conductor, the insulating layer comprising a resin composition containing a polyphenylene sulfide resin,
There is provided an insulated wire in which the insulating layer has a mass concentration ratio O/S of oxygen O to sulfur S of 0.2 or more on the surface.

本発明の他の態様によれば、
導体の外周に、ポリフェニレンサルファイド樹脂を含む樹脂組成物からなる絶縁層を形成する絶縁層形成工程と、
前記絶縁層の表面における硫黄Sに対する酸素Oの質量濃度比O/Sが0.2以上となるように前記絶縁層を表面改質する表面改質工程と、を有する絶縁電線の製造方法が提供される。
According to another aspect of the invention,
An insulating layer forming step of forming an insulating layer made of a resin composition containing a polyphenylene sulfide resin on the outer periphery of the conductor;
And a surface modification step of modifying the surface of the insulating layer so that the mass concentration ratio O/S of oxygen O to sulfur S on the surface of the insulating layer becomes 0.2 or more. To be done.

本発明によれば、ポリフェニレンサルファイド樹脂を含む絶縁層を備える絶縁電線を好適に融着させることができる。 ADVANTAGE OF THE INVENTION According to this invention, the insulated wire provided with the insulating layer containing polyphenylene sulfide resin can be fuse|melted suitably.

本発明の一実施形態に係る融着性絶縁電線の長さ方向に垂直な断面図である。It is a sectional view perpendicular to the length direction of the fusible insulated wire concerning one embodiment of the present invention. 本発明の他の実施形態に係る融着性絶縁電線の長さ方向に垂直な断面図である。It is sectional drawing perpendicular|vertical to the length direction of the fusible insulated wire which concerns on other embodiment of this invention. ポリフェニレンサルファイド樹脂を含む絶縁層のプラズマ処理前後での表面におけるFT−IRスペクトルを示す図である。It is a figure which shows FT-IR spectrum in the surface of the insulating layer containing a polyphenylene sulfide resin before and after plasma processing. 融着性絶縁電線を製造する製造装置の構成概略図である。It is a structure schematic diagram of the manufacturing apparatus which manufactures a fusion-bonded insulated wire. 融着性絶縁電線の融着後の接着力を評価するための試験片の斜視図である。It is a perspective view of the test piece for evaluating the adhesive force after fusion bonding of a fusion-bondable insulated wire.

<本発明の一実施形態>
以下、本発明の一実施形態について説明する。
<One Embodiment of the Present Invention>
An embodiment of the present invention will be described below.

〔融着性絶縁電線の構成〕
本発明に係る融着性絶縁電線の一実施形態について図面を用いて説明する。図1は、本発明の一実施形態に係る融着性絶縁電線の長さ方向に垂直な断面図である。図2は、本発明の他の実施形態に係る融着性絶縁電線の長さ方向に垂直な断面図である。なお、本明細書において「〜」を用いて表される数値範囲は、「〜」の前後に記載される数値を下限値および上限値として含む範囲を意味する。
[Structure of fusible insulated wire]
An embodiment of the fusible insulated wire according to the present invention will be described with reference to the drawings. FIG. 1 is a cross-sectional view perpendicular to the length direction of a fusible insulated wire according to an embodiment of the present invention. FIG. 2 is a cross-sectional view perpendicular to the length direction of the fusible insulated wire according to another embodiment of the present invention. In addition, in this specification, the numerical range represented using "-" means the range which includes the numerical value described before and after "-" as a lower limit and an upper limit.

図1に示すように、融着性絶縁電線1は、導体11の外周に絶縁層12が設けられた絶縁電線10の外周を被覆するように融着層13を備えて構成されている。 As shown in FIG. 1, the fusible insulated electric wire 1 is configured to include a fusible layer 13 so as to cover the outer circumference of an insulated electric wire 10 in which an insulating layer 12 is provided on the outer circumference of a conductor 11.

(導体)
導体11としては、導電性の高い金属からなる金属線、例えば、低酸素銅や無酸素銅からなる銅線、アルミニウム線などを用いることができる。図1では、導体11が略矩形断面を有する平角線の場合を示すが、導体11としては平角線に限定されず、例えば図2に示すような円形断面を有する丸線を用いることもできる。また、導体11としては、複数の丸線を撚り合わせて形成された撚り線を用いることもできる。なお、導体11は表面に錫やニッケル等の金属メッキが施されていてもよい。
(conductor)
As the conductor 11, a metal wire made of a metal having high conductivity, for example, a copper wire made of low oxygen copper or oxygen free copper, an aluminum wire, or the like can be used. Although FIG. 1 shows the case where the conductor 11 is a rectangular wire having a substantially rectangular cross section, the conductor 11 is not limited to a rectangular wire, and a round wire having a circular cross section as shown in FIG. 2 can also be used, for example. As the conductor 11, a twisted wire formed by twisting a plurality of round wires can be used. The surface of the conductor 11 may be plated with a metal such as tin or nickel.

(絶縁層)
導体11の外周には、導体11を被覆するように絶縁層12が設けられている。絶縁層12は、詳細を後述するように、ポリフェニレンサルファイド樹脂(PPS樹脂)を含む樹脂組成物を溶融させ導体11の外周上に押し出して被覆し、所定の表面処理を施すことにより形成されている。表面処理により、絶縁層12は、表面における硫黄Sに対する酸素Oの質量濃度比O/Sが0.2以上となるように構成されている。
(Insulating layer)
An insulating layer 12 is provided on the outer periphery of the conductor 11 so as to cover the conductor 11. The insulating layer 12 is formed by melting a resin composition containing a polyphenylene sulfide resin (PPS resin), extruding the resin composition onto the outer periphery of the conductor 11 to cover the resin composition, and performing a predetermined surface treatment, as will be described in detail later. .. By the surface treatment, the insulating layer 12 is configured such that the mass concentration ratio O/S of oxygen O to sulfur S on the surface is 0.2 or more.

ここで、絶縁層12の表面における硫黄Sに対する酸素Oの質量濃度比O/Sについて図3を用いて説明する。 Here, the mass concentration ratio O/S of oxygen O to sulfur S on the surface of the insulating layer 12 will be described with reference to FIG.

本発明者らは、PPS樹脂を含む絶縁層12と融着層13との密着性を高め、絶縁電線10同士を十分に融着させる方法について検討を行った。その検討の過程で、PPS樹脂を含む絶縁層12に所定の表面処理を施して表面改質したところ、絶縁層12の融着層13との密着性が向上することを見出した。なお、図3では、表面処理の方法としてプラズマ処理を用いた場合を示す。 The present inventors have studied a method of increasing the adhesion between the insulating layer 12 containing the PPS resin and the fusion bonding layer 13 to sufficiently fuse the insulated electric wires 10 to each other. In the process of the investigation, it was found that when the insulating layer 12 containing the PPS resin was subjected to a predetermined surface treatment for surface modification, the adhesion of the insulating layer 12 to the fusion layer 13 was improved. Note that FIG. 3 shows a case where plasma treatment is used as the surface treatment method.

絶縁層12の表面改質前後での化学構造の違いを解析すべく、FT−IR(Fourier Transform Infrared Spectroscopy)によりGeプリズムを用いてATR(Attenuated Total Reflection、全反射吸収)法で測定したところ、図3に示すようなFT−IRスペクトルが得られた。図3は、ポリフェニレンサルファイド樹脂を含む絶縁層のプラズマ処理前後での表面におけるFT−IRスペクトルを示す図である。図3において、横軸は照射した赤外線の波長[cm−1]を、縦軸は吸光度を、それぞれ示し、細線がプラズマ処理前のFT−IRスペクトルを、太線がプラズマ処理後のFT−IRスペクトルを、それぞれ示す。 In order to analyze the difference in the chemical structure before and after the surface modification of the insulating layer 12, the FT-IR (Fourier Transform Infrared Spectroscopy) was used to measure the ATR (Attenuated Total Reflection) method using a Ge prism. The FT-IR spectrum as shown in FIG. 3 was obtained. FIG. 3 is a diagram showing FT-IR spectra on the surface of an insulating layer containing a polyphenylene sulfide resin before and after plasma treatment. In FIG. 3, the horizontal axis represents the wavelength of irradiated infrared light [cm −1 ] and the vertical axis represents the absorbance, respectively. The thin line shows the FT-IR spectrum before plasma treatment, and the thick line shows the FT-IR spectrum after plasma treatment. Are shown respectively.

図3に示すように、絶縁層12のプラズマ処理前後でのスペクトルを比べると、プラズマ処理後は、プラズマ処理前と比べて、−OH基の分子構造の吸収帯である波長3000〜3200cm−1と、−SO基および−SO基の分子構造の吸収帯である波長1000〜1200cm−1とで吸光度が増加することが確認された。このことから、絶縁層12を表面改質することにより、絶縁層12を形成するPPS樹脂には−OH基や−SO基、−SO基などの活性な官能基が導入され、融着性樹脂との化学的相互作用が向上するため、絶縁層12と融着層13との密着性が向上するものと推測された。 As shown in FIG. 3, comparing the spectra of the insulating layer 12 before and after the plasma treatment, the wavelength after the plasma treatment is 3000 to 3200 cm −1, which is the absorption band of the molecular structure of the —OH group, as compared with before the plasma treatment. It was confirmed that the absorbance increased at a wavelength of 1000 to 1200 cm -1 , which is the absorption band of the molecular structure of -SO group and -SO 2 group. From this, by modifying the surface of the insulating layer 12, active functional groups such as —OH group, —SO group, and —SO 2 group are introduced into the PPS resin forming the insulating layer 12, and the fusion property is improved. It was speculated that the chemical interaction with the resin is improved, and thus the adhesion between the insulating layer 12 and the fusion bonding layer 13 is improved.

そこで、本発明者らは、絶縁層12について、表面処理前後でそれぞれ元素分析を行い、絶縁層12の表面における酸素濃度と、絶縁層12の融着層13への密着性との相関について検討を行った。具体的には、エネルギー分散型X線分析(EDX: Energy Dispersive X-ray Spectroscopy)により、絶縁層12について、プラズマ処理前およびプラズマ処理後それぞれの状態で元素分析を行い、酸素濃度として、PPS樹脂が有する硫黄Sに対する酸素Oの質量濃度比O/Sを求めた。その結果、質量濃度比O/Sが大きくなると、融着層13との密着性が大きくなることが分かった。そして、絶縁層12において、融着層13と接触する表面における質量濃度比O/Sが0.2未満では、絶縁層12と融着層13との密着性が不十分であるが、質量濃度比O/Sが0.2以上となるように絶縁層12を表面改質することにより、絶縁層12と融着層13との密着性を向上させ、絶縁電線10を好適に融着できる。なお、質量濃度比O/Sの上限値は、特に限定されないが、0.5以下であるとよい。 Therefore, the present inventors conducted elemental analysis on the insulating layer 12 before and after the surface treatment, and examined the correlation between the oxygen concentration on the surface of the insulating layer 12 and the adhesion of the insulating layer 12 to the fusion layer 13. I went. Specifically, the energy dispersive X-ray spectroscopy (EDX) is used to perform elemental analysis on the insulating layer 12 before and after the plasma treatment to obtain the oxygen concentration of the PPS resin. The mass concentration ratio O/S of oxygen O with respect to the sulfur S contained in was determined. As a result, it was found that when the mass concentration ratio O/S increases, the adhesion with the fusion layer 13 increases. When the mass concentration ratio O/S on the surface of the insulating layer 12 that contacts the fusion layer 13 is less than 0.2, the adhesion between the insulation layer 12 and the fusion layer 13 is insufficient, but the mass concentration By surface-modifying the insulating layer 12 so that the ratio O/S is 0.2 or more, the adhesion between the insulating layer 12 and the fusion layer 13 is improved, and the insulated wire 10 can be fused appropriately. The upper limit of the mass concentration ratio O/S is not particularly limited, but is preferably 0.5 or less.

絶縁層12を形成するPPS樹脂は、例えばp−フェニレンサルファイドからなる繰り返し単位を含み、電気特性、耐熱性、機械特性だけでなく、耐溶剤性や耐油性などにも優れるポリマである。PPS樹脂は、絶縁層12の耐熱性の観点からは、p−フェニレンサルファイドからなる繰り返し単位を85%以上含むことが好ましく、90%以上含むことがより好ましい。なお、PPS樹脂は、p−フェニレンサルファイドからなる繰り返し単位以外に、スルフォキシド基やエーテル基を含んでもよく、またベンゼン環に置換基を含んでもよい。さらに、分子鎖にチオエーテル基やエーテル基などを介して分岐構造や架橋構造を有していてもよい。例えば、PPS樹脂の市販品としては、東レ株式会社製の「トレリナT1881」などを用いることができる。 The PPS resin forming the insulating layer 12 is a polymer that includes a repeating unit made of, for example, p-phenylene sulfide, and is excellent not only in electrical characteristics, heat resistance and mechanical characteristics, but also in solvent resistance, oil resistance and the like. From the viewpoint of the heat resistance of the insulating layer 12, the PPS resin preferably contains 85% or more, and more preferably 90% or more, of repeating units of p-phenylene sulfide. The PPS resin may contain a sulfoxide group or an ether group in addition to the repeating unit composed of p-phenylene sulfide, and may contain a substituent on the benzene ring. Further, the molecular chain may have a branched structure or a crosslinked structure via a thioether group or an ether group. For example, as a commercially available product of PPS resin, "Torelina T1881" manufactured by Toray Industries, Inc. can be used.

また、絶縁層12を形成する樹脂組成物は、PPS樹脂以外の成分を含んでもよく、例えば、ポリアミド樹脂、ポリエステル樹脂、ポリイミド樹脂、ポリアミドイミド樹脂、ポリエステルイミド樹脂、シリコーン樹脂からなる群から選択される1種以上の樹脂を含むことができる。この中でも、絶縁層12の耐熱性を高く維持しつつ、絶縁層12の導体11との密着性を向上できることから、シリコーン樹脂(例えばシリコーンゴム)を用いることが好ましい。 The resin composition forming the insulating layer 12 may contain a component other than the PPS resin, and is selected from the group consisting of polyamide resin, polyester resin, polyimide resin, polyamideimide resin, polyesterimide resin, and silicone resin, for example. One or more resins can be included. Among these, it is preferable to use a silicone resin (for example, silicone rubber) because the adhesiveness between the insulating layer 12 and the conductor 11 can be improved while keeping the heat resistance of the insulating layer 12 high.

PPS樹脂とシリコーン樹脂との混合比率は、特に限定されないが、質量比で90:10〜98:2であることが好ましい。このような比率とすれば、PPS樹脂が本来有する特性を損なうことなく、シリコーン樹脂により絶縁層12の導体11との密着性を向上させることができる。 The mixing ratio of the PPS resin and the silicone resin is not particularly limited, but the mass ratio is preferably 90:10 to 98:2. With such a ratio, the adhesion of the insulating layer 12 to the conductor 11 can be improved by the silicone resin without deteriorating the inherent properties of the PPS resin.

また、絶縁層12を形成する樹脂組成物は、樹脂以外の添加剤を含んでもよく、例えば、無機フィラーなどの充填剤を含んでもよい。これらの配合量は本発明の効果を損ねない範囲で適宜変更することができる。 Further, the resin composition forming the insulating layer 12 may include an additive other than the resin, for example, a filler such as an inorganic filler. The blending amount of these can be appropriately changed within a range not impairing the effects of the present invention.

絶縁層12の厚さは、絶縁電線10に求められる絶縁性などに応じて適宜変更することができ、特に限定されないが、高い部分放電開始電圧(PDIV)を得る観点からは160μm以上であることが好ましい。一方、絶縁層12の厚さが過度に大きくなると、融着性絶縁電線1をコイル加工したときに導体11の曲げ変形に対して絶縁層12が追従しにくくなり、絶縁層12が導体11から剥離することがある。そのため、導体11との密着性の観点からは、絶縁層12の厚さは240μm以下であることが好ましい。すなわち、絶縁層12の厚さを160μm以上240μm以下とすることにより、PDIVを高くできるとともに導体11との高い密着性を実現することができる。なお、絶縁層12の厚さは、後述の実施例で示すように周方向での平均値を示す。 The thickness of the insulating layer 12 can be appropriately changed according to the insulation required for the insulated wire 10 and is not particularly limited, but is 160 μm or more from the viewpoint of obtaining a high partial discharge inception voltage (PDIV). Is preferred. On the other hand, when the thickness of the insulating layer 12 becomes excessively large, the insulating layer 12 becomes difficult to follow the bending deformation of the conductor 11 when the fusible insulated electric wire 1 is coiled, and the insulating layer 12 is separated from the conductor 11. May peel off. Therefore, from the viewpoint of adhesion with the conductor 11, the thickness of the insulating layer 12 is preferably 240 μm or less. That is, by setting the thickness of the insulating layer 12 to 160 μm or more and 240 μm or less, PDIV can be increased and high adhesion to the conductor 11 can be realized. The thickness of the insulating layer 12 indicates an average value in the circumferential direction, as will be shown in Examples described later.

絶縁層12は、化学的、機械的および熱的な性能を向上させる観点からは結晶化度が高いことが好ましく、例えば95%以上100%以下であることが好ましい。このような結晶化度とすることにより、絶縁層12において絶縁性や耐摩耗性、耐薬品性、耐油性などの諸特性を向上させることができる。
なお、結晶化度は以下のように定義される。すなわち、示差走査熱量測定により昇温させながら測定した結晶化時の結晶化熱をHc、示差走査熱量測定による融解熱をHmとしたとき、結晶化度αは下記式(1)で示される。
結晶化度α=(1−Hc/Hm)×100・・・(1)
The insulating layer 12 preferably has a high degree of crystallinity from the viewpoint of improving chemical, mechanical and thermal performance, and is preferably 95% or more and 100% or less, for example. With such a crystallinity, various characteristics such as insulation, abrasion resistance, chemical resistance, and oil resistance can be improved in the insulating layer 12.
The crystallinity is defined as follows. That is, when the heat of crystallization during crystallization measured while raising the temperature by the differential scanning calorimetry is Hc and the heat of fusion by the differential scanning calorimetry is Hm, the crystallinity α is represented by the following formula (1).
Crystallinity α=(1-Hc/Hm)×100 (1)

(融着層)
絶縁層12の外周には、絶縁層12を被覆するように融着層13が設けられている。融着層13は、融着性樹脂組成物からなり、融着性絶縁電線1を巻回してコイル状に加工したときに隣接する融着性絶縁電線1同士を融着させて固着させるものである。融着層13は、表面改質によりO/S比が0.2以上となる絶縁層12上に設けられており、絶縁層12との密着性が高くなるように形成されている。
(Fusion layer)
A fusion-bonding layer 13 is provided on the outer periphery of the insulating layer 12 so as to cover the insulating layer 12. The fusible layer 13 is made of a fusible resin composition, and when the fusible insulated electric wires 1 are wound and processed into a coil, the fusible insulated electric wires 1 adjacent to each other are fused and fixed. is there. The fusion layer 13 is provided on the insulating layer 12 having an O/S ratio of 0.2 or more due to surface modification, and is formed so as to have high adhesiveness with the insulating layer 12.

融着層13を形成する融着性樹脂組成物は、加熱により融着性を示す樹脂、例えば、熱可塑性樹脂を含む。このような熱可塑性樹脂としては、ガラス転移温度が室温(例えば25℃)以上で、融点が155℃以上、絶縁層12を形成する熱可塑性樹脂(PPS樹脂)の融点以下であるものが好ましい。融着層13を形成する熱可塑性樹脂のガラス転移温度を室温以上とすることで、融着層13の室温環境での変形を抑制することができる。また、熱可塑性樹脂の融点を155℃以上PPS樹脂の融点以下とすることで、PPS樹脂を含む絶縁層12の周囲に溶融させた熱可塑性樹脂を押出被覆して融着層13を形成するときに、溶融した熱可塑性樹脂の熱によって絶縁層12が溶融変形することを抑制することができる。このような樹脂としては、例えば、フェノキシ樹脂、ポリエステル樹脂、ポリアミド樹脂などを用いることができる。なお、融着性樹脂として熱可塑性樹脂を用いる場合、融着層13は押出により形成するとよい。 The fusible resin composition forming the fusible layer 13 contains a resin that exhibits fusible properties by heating, for example, a thermoplastic resin. Such a thermoplastic resin preferably has a glass transition temperature of room temperature (for example, 25° C.) or higher, a melting point of 155° C. or higher, and a melting point of the thermoplastic resin (PPS resin) forming the insulating layer 12 or lower. By setting the glass transition temperature of the thermoplastic resin forming the fusion bonding layer 13 to room temperature or higher, the deformation of the fusion bonding layer 13 in a room temperature environment can be suppressed. When the melting point of the thermoplastic resin is set to 155° C. or higher and the melting point of the PPS resin or lower to extrude the melted thermoplastic resin around the insulating layer 12 containing the PPS resin to form the fusion bonding layer 13. In addition, it is possible to prevent the insulating layer 12 from being melted and deformed by the heat of the melted thermoplastic resin. As such a resin, for example, a phenoxy resin, a polyester resin, a polyamide resin, or the like can be used. When a thermoplastic resin is used as the fusible resin, the fusible layer 13 may be formed by extrusion.

フェノキシ樹脂としては、ビスフェノールA、ビスフェノールS、ビスフェノールFを主成分とした樹脂やエポキシ変性フェノキシ樹脂を用いることができる。例えば、フェノキシ樹脂の市販品としては、新日鉄住金化学株式会社製の「YP−70」や「ZX−1356−2」等の、ビスフェノールAエポキシとビスフェノールFエポキシからなる共重合体、もしくは、新日鉄住金化学株式会社製の「YP−50」及び「FX−316」等の、ビスフェノールAフェノキシ樹脂およびビスフェノールFフェノキシ樹脂を用いることができる。 As the phenoxy resin, a resin containing bisphenol A, bisphenol S, or bisphenol F as a main component or an epoxy-modified phenoxy resin can be used. For example, as a commercially available product of phenoxy resin, a copolymer of bisphenol A epoxy and bisphenol F epoxy such as "YP-70" and "ZX-1356-2" manufactured by Nippon Steel & Sumikin Chemical Co., Ltd., or Nippon Steel & Sumikin A bisphenol A phenoxy resin and a bisphenol F phenoxy resin such as "YP-50" and "FX-316" manufactured by Kagaku Co., Ltd. can be used.

ポリエステル樹脂の市販品としては、例えば、東レ株式会社製の「トレコン1401X06」等のポリブチレンテレフタラートや、ポリエチレンテレフタラートなどを用いることができる。 As a commercial product of the polyester resin, for example, polybutylene terephthalate such as “Trecon 1401X06” manufactured by Toray Industries, Inc., polyethylene terephthalate, or the like can be used.

ポリアミド樹脂としては、例えば。各種共重合ポリアミド、6−ナイロン、6,6−ナイロン、6,10−ナイロンなどを用いることができる。 As the polyamide resin, for example. Various copolyamides, 6-nylon, 6,6-nylon, 6,10-nylon, etc. can be used.

〔融着性絶縁電線の製造方法〕
次に、上述した融着性絶縁電線1の製造方法について図4を用いて説明する。図4は、融着性絶縁電線を製造する製造装置の構成概略図である。本実施形態の融着性絶縁電線1の製造方法は、準備工程S10と、予備加熱工程S20と、絶縁層形成工程S30と、表面改質工程S40と、搬送工程S50と、融着層形成工程S60とを有する。
[Method for manufacturing fusible insulated wire]
Next, a method for manufacturing the above-described fusible insulated wire 1 will be described with reference to FIG. FIG. 4 is a schematic configuration diagram of a manufacturing apparatus for manufacturing the fusible insulated wire. The manufacturing method of the fusible insulated wire 1 of the present embodiment includes a preparatory step S10, a preheating step S20, an insulating layer forming step S30, a surface modifying step S40, a carrying step S50, and a fusion layer forming step. S60 and.

(準備工程S10)
まず、図1に示すような断面が略矩形状の導体11(以下、単に平角導体11ともいう)を準備する。
(Preparing step S10)
First, a conductor 11 having a substantially rectangular cross section as shown in FIG. 1 (hereinafter, also simply referred to as a rectangular conductor 11) is prepared.

(予備加熱工程S20)
続いて、平角導体11と絶縁層12との密着性を高めるために、絶縁層12を形成する前に平角導体11を予備加熱する。具体的には、送出機101から送り出した平角導体11を予備加熱炉102に導入し、平角導体11を予備加熱する。これにより、後述の絶縁層形成工程S30にて、溶融する樹脂組成物を平角導体11の外周上に押し出す際に、樹脂組成物が平角導体11により冷却されてしまうことを抑制でき、形成される絶縁層12の密着性を高めることが可能となる。
(Preliminary heating step S20)
Then, in order to improve the adhesion between the flat conductor 11 and the insulating layer 12, the flat conductor 11 is preheated before forming the insulating layer 12. Specifically, the rectangular conductor 11 sent from the feeder 101 is introduced into the preheating furnace 102 to preheat the rectangular conductor 11. Thereby, when the resin composition to be melted is extruded onto the outer periphery of the rectangular conductor 11 in the insulating layer forming step S30 described later, the resin composition can be prevented from being cooled by the rectangular conductor 11 and formed. It is possible to improve the adhesion of the insulating layer 12.

平角導体11を予備加熱する温度は、PPS樹脂の融点以上とするとよい。具体的には、280℃以上とすることが好ましく、300℃以上320℃以下とすることがより好ましい。このような温度で平角導体11を予備加熱することにより、平角導体11と絶縁層12との密着性を高めることができる。 The temperature at which the rectangular conductor 11 is preheated may be equal to or higher than the melting point of the PPS resin. Specifically, the temperature is preferably 280° C. or higher, and more preferably 300° C. or higher and 320° C. or lower. By preheating the rectangular conductor 11 at such a temperature, the adhesion between the rectangular conductor 11 and the insulating layer 12 can be enhanced.

予備加熱炉102では、平角導体11を不活性ガス雰囲気下で加熱することが好ましい。予備加熱炉102では、平角導体11が高温環境下に曝されて表面が酸化することで、絶縁層12の密着性が低下するおそれがあるが、予備加熱炉102内を不活性ガス雰囲気とすることで、平角導体11の酸化、そして、酸化被膜の形成に伴う絶縁層12の密着性の低下を抑制することができる。不活性ガスとしては、例えば、低コストな汎用気体である窒素ガスや、熱伝導性に優れたヘリウムガスなど、公知のガスを用いることができる。 In the preheating furnace 102, it is preferable to heat the rectangular conductor 11 in an inert gas atmosphere. In the preheating furnace 102, the rectangular conductor 11 is exposed to a high temperature environment and its surface is oxidized, so that the adhesion of the insulating layer 12 may be deteriorated. However, the inside of the preheating furnace 102 is set to an inert gas atmosphere. As a result, it is possible to suppress the oxidation of the rectangular conductor 11 and the decrease in the adhesiveness of the insulating layer 12 due to the formation of the oxide film. As the inert gas, for example, a known gas such as nitrogen gas, which is a low-cost general-purpose gas, or helium gas, which has excellent thermal conductivity, can be used.

(絶縁層形成工程S30)
続いて、絶縁層形成工程S30を行う。絶縁層形成工程S30は、押出被覆工程S31および冷却工程S32を有する。
(Insulating layer forming step S30)
Then, the insulating layer forming step S30 is performed. The insulating layer forming step S30 includes an extrusion coating step S31 and a cooling step S32.

具体的には、押出被覆工程S31として、加熱された平角導体11を第1の押出機103に導入し、平角導体11の外周にPPS樹脂を含む樹脂組成物を所定の厚さで押し出して被覆させる。なお、第1の押出機での押出温度は、PPS樹脂の融点である280℃以上、好ましくは300℃以上320℃以下とするとよい。 Specifically, in the extrusion coating step S31, the heated rectangular conductor 11 is introduced into the first extruder 103, and the outer periphery of the rectangular conductor 11 is extruded with a predetermined thickness to coat the resin composition containing the PPS resin. Let The extrusion temperature in the first extruder is 280° C. or higher, which is the melting point of the PPS resin, preferably 300° C. or higher and 320° C. or lower.

続いて、冷却工程S32として、PPS樹脂を含む樹脂組成物で被覆された平角導体11を第1の冷却装置104に導入して冷却することにより、PPS樹脂の結晶化を促進させ、所望の結晶化度を有する絶縁層12を形成する。 Subsequently, in the cooling step S32, the rectangular conductor 11 coated with the resin composition containing the PPS resin is introduced into the first cooling device 104 and cooled to promote crystallization of the PPS resin and obtain desired crystals. An insulating layer 12 having a degree of conversion is formed.

冷却工程S32では、絶縁層12の結晶化度が95%以上となるように冷却することが好ましい。このような結晶化度とするには、例えば、PPS樹脂を含む樹脂組成物を、PPS樹脂の融点(例えば280℃)未満の温度で、かつPPS樹脂が結晶化する温度(例えば200℃)まで冷却した後、PPS樹脂の結晶化温度(例えば200℃)を維持するように冷却するとよい。これにより、PPS樹脂の結晶化を促し、得られる絶縁層12におけるPPS樹脂の結晶化度を高め、例えば95%以上とすることができる。なお、冷却方法としては、水槽で水冷する等、公知の方法を用いることができる。 In the cooling step S32, it is preferable to cool the insulating layer 12 so that the crystallinity is 95% or more. In order to obtain such crystallinity, for example, a resin composition containing a PPS resin is treated at a temperature below the melting point of the PPS resin (eg, 280° C.) and at a temperature at which the PPS resin is crystallized (eg, 200° C.). After cooling, it may be cooled so as to maintain the crystallization temperature of the PPS resin (for example, 200° C.). Thereby, the crystallization of the PPS resin is promoted, and the crystallinity of the PPS resin in the obtained insulating layer 12 can be increased to, for example, 95% or more. As a cooling method, a known method such as water cooling in a water tank can be used.

(表面改質工程S40)
続いて、表面改質工程S40として、絶縁層12が形成された平角導体11を表面処理装置105に導入し、絶縁層12に表面処理を施す。これにより、絶縁層12の表面に−OH基や−SO基、−SO基などの活性な官能基を導入し、絶縁層12の表面における硫黄Sに対する酸素Oの質量濃度比O/Sを0.2以上となるように表面改質する。これにより、絶縁電線10を得る。
(Surface modification step S40)
Subsequently, in the surface modification step S40, the rectangular conductor 11 on which the insulating layer 12 is formed is introduced into the surface treatment device 105, and the insulating layer 12 is subjected to surface treatment. As a result, active functional groups such as —OH groups, —SO groups, and —SO 2 groups are introduced into the surface of the insulating layer 12, and the mass concentration ratio O/S of oxygen O to sulfur S on the surface of the insulating layer 12 is increased. The surface is modified so as to be 0.2 or more. Thereby, the insulated wire 10 is obtained.

表面改質工程S40では、表面処理として、例えばプラズマ処理を行う。このプラズマ処理としては、大気圧下で行う大気圧プラズマ処理が好ましい。表面処理条件は、絶縁層12の表面における質量濃度比O/Sを0.2以上とするような条件であれば特に限定されない。表面処理としてプラズマ処理を行う場合、絶縁層12表面に吹き付けるガスとしては例えば窒素や空気などを用いることができるが、窒素が好ましい。窒素を供給する場合、空気を供給する場合と比べて絶縁層12の表面に活性な官能基を効率的に導入することができ、質量濃度比O/Sを大きくしやすいためである。また、プラズマ処理の時間は0.2秒〜0.6秒とするとよい。また、表面改質工程S40では、絶縁層12の表面から少なくとも20μmまでの深さの範囲において、質量濃度比O/Sが0.2以上となるような条件で表面処理を行うとよい。 In the surface modification step S40, for example, plasma treatment is performed as the surface treatment. As this plasma treatment, atmospheric pressure plasma treatment performed under atmospheric pressure is preferable. The surface treatment condition is not particularly limited as long as the mass concentration ratio O/S on the surface of the insulating layer 12 is 0.2 or more. When plasma treatment is performed as the surface treatment, for example, nitrogen or air can be used as the gas blown onto the surface of the insulating layer 12, but nitrogen is preferable. This is because, when nitrogen is supplied, active functional groups can be efficiently introduced to the surface of the insulating layer 12 and the mass concentration ratio O/S can be easily increased, as compared with the case of supplying air. Further, the plasma treatment time is preferably 0.2 seconds to 0.6 seconds. In the surface modification step S40, the surface treatment may be performed under the condition that the mass concentration ratio O/S is 0.2 or more in the depth range from the surface of the insulating layer 12 to at least 20 μm.

なお、表面処理装置105としてプラズマ処理装置を用いる場合には、大気圧プラズマ照射ノズルが配置されるが、その配置は特に限定されない。例えば、2つの大気圧プラズマ照射ノズルを、絶縁層12が形成された平角導体11を挟むようにして配置してもよく、また例えば、複数の大気圧プラズマ照射ノズルを平角導体11に沿って配置してもよい。 When the plasma processing apparatus is used as the surface processing apparatus 105, the atmospheric pressure plasma irradiation nozzle is arranged, but the arrangement is not particularly limited. For example, two atmospheric pressure plasma irradiation nozzles may be arranged so as to sandwich the flat conductor 11 on which the insulating layer 12 is formed. Alternatively, for example, a plurality of atmospheric pressure plasma irradiation nozzles may be arranged along the flat conductor 11. Good.

(搬送工程S50)
続いて、搬送工程S50として、表面改質した絶縁層12上に融着層13を形成するため、絶縁電線10を第2の押出機106まで搬送し導入する。
(Transportation step S50)
Subsequently, in a carrying step S50, in order to form the fusion bonding layer 13 on the surface-modified insulating layer 12, the insulated wire 10 is carried to the second extruder 106 and introduced.

搬送工程S50では、表面改質により活性化した絶縁層12が失活しないように、表面改質工程S40から後述の融着層形成工程S60までの経過時間が短くなるように搬送することが好ましい。具体的には、経過時間を10秒以下とすることが好ましい。すなわち、表面改質工程S40の後、融着層形成工程S60を10秒以内に行うように絶縁電線10を搬送することが好ましい。表面改質による効果は時間の経過とともに失活するため、表面改質してから融着層13の形成までの時間が長くなると、表面改質による効果が低下するおそれがある。そうなると、絶縁層12表面での質量濃度比O/Sを0.2以上に維持しにくくなり、融着層13を形成しても絶縁層12との間で十分な密着性を確保できないおそれがある。これに対して、経過時間が10秒以下となるように搬送することで、絶縁層12と融着層13との密着性を高く維持することができる。 In the carrying step S50, it is preferable that the insulating layer 12 activated by the surface modification is carried so that the elapsed time from the surface modifying step S40 to a fusion layer forming step S60 described later is shortened so that the insulating layer 12 is not deactivated. .. Specifically, the elapsed time is preferably 10 seconds or less. That is, it is preferable to convey the insulated wire 10 such that the fusion layer formation step S60 is performed within 10 seconds after the surface modification step S40. Since the effect of the surface modification is deactivated over time, if the time from the surface modification to the formation of the fusion layer 13 is long, the effect of the surface modification may be reduced. Then, it becomes difficult to maintain the mass concentration ratio O/S on the surface of the insulating layer 12 at 0.2 or more, and even if the fusion layer 13 is formed, sufficient adhesion with the insulating layer 12 may not be secured. is there. On the other hand, by conveying so that the elapsed time is 10 seconds or less, the adhesion between the insulating layer 12 and the fusion bonding layer 13 can be maintained high.

なお、本実施形態のように融着性絶縁電線1を連続的に製造する場合、搬送速度を速くすることで経過時間を短縮するとよい。搬送速度を上げると、絶縁層12表面の単位面積あたりの表面処理量が減り、質量濃度比O/Sが小さくなる傾向があるが、このような場合、例えばプラズマ照射機を増設するなどして表面処理面積を増やして処理するとよい。 When the fusible insulated electric wire 1 is continuously manufactured as in the present embodiment, the elapsed time may be shortened by increasing the transportation speed. When the transport speed is increased, the amount of surface treatment per unit area of the surface of the insulating layer 12 is reduced, and the mass concentration ratio O/S tends to be small. In such a case, for example, a plasma irradiator is added. It is advisable to increase the surface treatment area for treatment.

(融着層形成工程S60)
続いて、融着層形成工程S60として、第2の押出機106において絶縁層12の外周に融着性樹脂組成物を押し出して被覆する。融着性樹脂組成物の押出温度としては、融着性を有する熱可塑性樹脂の融点以上の温度とするとよい。その後、第2の冷却装置107に導入して融着性樹脂組成物を室温まで冷却し、融着層13を形成する。本実施形態では、絶縁層12表面の質量濃度比O/Sを0.2以上として活性化させているので、絶縁層12上に融着層14を密着性よく形成することができる。これにより、本実施形態の融着性絶縁電線1を得る。
(Fusing layer forming step S60)
Subsequently, as the fusion layer forming step S60, the outer periphery of the insulating layer 12 is extruded and coated with the fusible resin composition in the second extruder 106. The extruding temperature of the fusible resin composition may be a temperature equal to or higher than the melting point of the fusible thermoplastic resin. Then, it is introduced into the second cooling device 107 to cool the fusible resin composition to room temperature to form the fusible layer 13. In this embodiment, since the mass concentration ratio O/S on the surface of the insulating layer 12 is 0.2 or more for activation, the fusion bonding layer 14 can be formed on the insulating layer 12 with good adhesiveness. Thereby, the fusible insulated electric wire 1 of the present embodiment is obtained.

最終的に、融着性絶縁電線1を引取機108を通じて巻取機109にてボビンで巻き取る。このようにして融着性絶縁電線1を製造することができる。 Finally, the fusible insulated electric wire 1 is wound by a bobbin by a winder 109 through a winder 108. In this way, the fusible insulated wire 1 can be manufactured.

〔コイルおよびその製造方法〕
次に、上述した融着性絶縁電線1を用いて製造されるコイルについて説明する。
コイルは、例えば、融着性絶縁電線1を所定形状のコイル状に巻回した後、加熱することで、融着性絶縁電線1の表面にある融着層13を溶融させ、隣接する融着性絶縁電線1同士を接着して固化させることにより製造することができる。
融着性絶縁電線1を用いて製造されるコイルは、融着層13と絶縁層12との密着性が高く、隣接する絶縁電線10同士が好適に融着されている。そのため、コイルは、コイル形状を長期にわたって維持することができ、絶縁性の信頼性に優れたものとなる。
[Coil and manufacturing method thereof]
Next, a coil manufactured using the above-mentioned fusible insulated wire 1 will be described.
For example, the coil is formed by winding the fusible insulated electric wire 1 into a coil having a predetermined shape, and then heating the fused fusible insulated wire 1 to melt the fusion layer 13 on the surface of the fusible insulated electric wire 1 to form an adjacent fusion bond. It can be manufactured by bonding and solidifying the electrically insulated wires 1.
The coil manufactured using the fusible insulated electric wire 1 has high adhesion between the fusible layer 13 and the insulating layer 12, and the adjacent insulated electric wires 10 are preferably fused. Therefore, the coil can maintain the coil shape for a long period of time, and has excellent insulation reliability.

<本実施形態に係る効果>
本実施形態によれば、以下に示す1つ又は複数の効果を奏する。
<Effects of this embodiment>
According to this embodiment, one or more of the following effects are exhibited.

本実施形態の融着性絶縁電線1では、PPS樹脂を含む絶縁層12の融着層13と接する表面にプラズマ処理を施すことにより、PPS樹脂に−OH基や−SO基、−SO基などの活性な官能基を導入し、絶縁層12の表面における硫黄Sに対する酸素Oの質量濃度比O/Sが0.2以上、好ましくは0.2以上0.5以下となるようにしている。これにより、PPS樹脂を含む絶縁層12と融着層13との間で高い密着性を実現することができる。したがって、本実施形態の融着性絶縁電線1によれば、コイルに加工したときに、PPS樹脂により高い部分放電開始電圧(PDIV)を実現するとともに、コイル形状を維持して高い信頼性を得ることができる。 In the fusible insulated electric wire 1 of the present embodiment, the surface of the insulating layer 12 containing the PPS resin that is in contact with the fusible layer 13 is subjected to plasma treatment, so that the -OH group, the -SO group, the -SO 2 group are added to the PPS resin. By introducing an active functional group such as, the mass concentration ratio O/S of oxygen O to sulfur S on the surface of the insulating layer 12 is 0.2 or more, preferably 0.2 or more and 0.5 or less. .. Thereby, high adhesion can be realized between the insulating layer 12 containing the PPS resin and the fusion bonding layer 13. Therefore, according to the fusible insulated wire 1 of the present embodiment, when processed into a coil, a high partial discharge inception voltage (PDIV) is realized by the PPS resin, and the coil shape is maintained to obtain high reliability. be able to.

また、融着性絶縁電線1において、絶縁層12の厚さを160μm〜240μmとすることが好ましい。このような厚さとすることにより、高いPDIVを実現できるとともに、融着性絶縁電線1に曲げ加工を施してコイルに作製するときに、導体11の曲げ変形に対して絶縁層12の追従性を維持し、絶縁層12の導体11への密着性を高く維持することができる。 In the fusible insulated electric wire 1, the thickness of the insulating layer 12 is preferably 160 μm to 240 μm. With such a thickness, a high PDIV can be realized, and when the fusible insulated electric wire 1 is bent to produce a coil, the insulating layer 12 can follow the bending deformation of the conductor 11. It is possible to maintain the high adhesion of the insulating layer 12 to the conductor 11.

また、絶縁層12を形成する樹脂組成物がシリコーンゴムを含み、PPS樹脂とシリコーンゴムとを質量比で90:10〜98:2の範囲内で含有することが好ましい。シリコーンゴムを上記比率で配合することにより、PPS樹脂が本来有する特性を損なうことなく、絶縁層12の導体11との密着性を向上させることができる。 Further, it is preferable that the resin composition forming the insulating layer 12 contains silicone rubber, and contains the PPS resin and the silicone rubber in a mass ratio of 90:10 to 98:2. By blending the silicone rubber in the above ratio, the adhesion of the insulating layer 12 to the conductor 11 can be improved without deteriorating the inherent properties of the PPS resin.

また、絶縁層12は結晶化度が95%以上であることが好ましい。結晶化度を95%以上とすることにより、絶縁層12において絶縁性や耐摩耗性、耐薬品性、耐油性などの諸特性を向上させることができる。 The crystallinity of the insulating layer 12 is preferably 95% or more. By setting the crystallinity to 95% or more, it is possible to improve various properties such as insulation, abrasion resistance, chemical resistance, and oil resistance in the insulating layer 12.

また、融着性絶縁電線1において、PPS樹脂を含む樹脂組成物で絶縁層12を形成することにより、溶融させた樹脂組成物を所望の厚さで押出成形できるので、絶縁層12の厚さを均一に形成することができる。 Further, in the fusible insulated wire 1, by forming the insulating layer 12 with the resin composition containing the PPS resin, the melted resin composition can be extruded to a desired thickness. Can be formed uniformly.

<本発明の他の実施形態>
以上、本発明の一実施形態を具体的に説明したが、本発明は上述の実施形態に限定されるものではなく、その要旨を逸脱しない範囲で適宜変更可能である。
<Other Embodiments of the Present Invention>
Although one embodiment of the present invention has been specifically described above, the present invention is not limited to the above-described embodiment and can be appropriately modified without departing from the scope of the invention.

上述の実施形態では、表面改質工程S40にて、絶縁層12にプラズマを照射して表面処理を施す場合について説明したが、本発明はこれに限定されない。例えば、絶縁層12に紫外線を照射し、表面処理を施すようにしてもよい。 In the above-described embodiment, the case where the insulating layer 12 is irradiated with plasma to perform the surface treatment in the surface modification step S40 has been described, but the present invention is not limited to this. For example, the insulating layer 12 may be irradiated with ultraviolet rays to be surface-treated.

また、上述の実施形態では、融着層13を、融着性樹脂として熱可塑性樹脂を含む融着性樹脂組成物を押し出して形成する場合について説明したが、本発明はこれに限定されない。例えば、融着性樹脂組成物を含む塗料を、表面改質された絶縁層12の外周に塗布し焼き付けることで融着層13を形成してもよい。この場合、融着性樹脂としては、エポキシ樹脂や不飽和ポリエステル樹脂などの熱硬化性樹脂を用いるとよい。 Moreover, although the said embodiment demonstrated the case where the fusion bonding layer 13 was formed by extruding the fusion bonding resin composition containing a thermoplastic resin as a fusion bonding resin, this invention is not limited to this. For example, the fusing layer 13 may be formed by applying a paint containing a fusing resin composition to the outer periphery of the surface-modified insulating layer 12 and baking it. In this case, a thermosetting resin such as an epoxy resin or an unsaturated polyester resin may be used as the fusible resin.

また、上述の実施形態では、コイルを製造する際、融着層13を備える融着性絶縁電線1を用いたが、本発明はこれに限定されない。例えば、上記表面改質工程S40で得られる絶縁電線10を巻回して、巻回された絶縁電線10に粘着性樹脂組成物を含む塗料を塗布し、これを焼き付けて固化させることにより、隣接する絶縁電線10の間を融着層で融着させてコイルを製造するようにしてもよい。 Further, in the above-described embodiment, the fusible insulated electric wire 1 including the fusible layer 13 is used when manufacturing the coil, but the present invention is not limited to this. For example, the insulated electric wire 10 obtained in the surface modification step S40 is wound, the wound insulated electric wire 10 is coated with a coating material containing an adhesive resin composition, and this is baked to solidify, thereby adjoining each other. A coil may be manufactured by fusing the insulated wires 10 with a fusing layer.

また、上述の実施形態では、導体11の表面に直接、絶縁層12を設ける場合について説明したが、本発明はこれに限定されない。例えば、導体11と絶縁層12との間に、ポリアミドイミド樹脂、ポリイミド樹脂およびポリエステルイミド樹脂から選択される樹脂を含む中間層を1層もしくは複数層、設けてもよい。中間層の厚さとしては、例えば20μm〜60μmとするとよい。 Moreover, although the case where the insulating layer 12 is directly provided on the surface of the conductor 11 has been described in the above-described embodiment, the present invention is not limited to this. For example, one or more intermediate layers containing a resin selected from polyamideimide resin, polyimide resin, and polyesterimide resin may be provided between the conductor 11 and the insulating layer 12. The thickness of the intermediate layer may be, for example, 20 μm to 60 μm.

次に、本発明について実施例に基づき、さらに詳細に説明するが、本発明はこれらの実施例に限定されない。 Next, the present invention will be described in more detail based on examples, but the present invention is not limited to these examples.

<融着性絶縁電線の作製>
(実施例1)
実施例1では、図4に示す製造装置100を用いて図1に示す構造を有する融着性絶縁電線を作製した。
実施例1では、平角銅線を予備加熱炉に導入して窒素雰囲気中で約300℃に予備加熱した。その後、加熱された平角銅線を第1の押出機に導入し、表1に示すように、PPS樹脂を95質量部とシリコーンゴムを5質量部とを混練してなる樹脂組成物を平角銅線の外周に平均厚さが0.16mm(160μm)となるように押出被覆した。その後、第1の冷却装置にて、押出被覆した樹脂組成物をPPS樹脂の結晶化温度である約200℃まで冷却した。そして、樹脂組成物で押出被覆された平角銅線を第1の冷却装置からプラズマ処理装置まで搬送する間にPPS樹脂の結晶化を促進させ、平均厚さ160μmの絶縁層を形成した。それから、プラズマ処理装置にて、絶縁層の表面に対してプラズマ処理を0.23秒間施し、絶縁層を表面改質し、絶縁電線を得た。その後、10秒以内に第2の押出機に導入し、表面改質した絶縁層の表面に、フェノキシ樹脂を99質量部と硬化剤を1質量部とを混合した融着性樹脂組成物を平均厚さ0.04mm(40μm)で押出被覆し、第2の冷却装置にて冷却することで、厚さ40μmの融着層を形成した。これにより、実施例1の融着性絶縁電線を得た。なお、本実施例では、平角銅線として、断面が矩形であって、長辺が約3.2mm、短辺が約1.5mmのものを用いた。作製条件を下記表1に示す。
<Production of fusible insulated wire>
(Example 1)
In Example 1, a fusible insulated wire having the structure shown in FIG. 1 was produced using the manufacturing apparatus 100 shown in FIG.
In Example 1, a rectangular copper wire was introduced into a preheating furnace and preheated to about 300° C. in a nitrogen atmosphere. Then, the heated rectangular copper wire was introduced into the first extruder, and as shown in Table 1, a resin composition obtained by kneading 95 parts by mass of PPS resin and 5 parts by mass of silicone rubber was prepared as rectangular copper. The outer circumference of the wire was extrusion-coated so that the average thickness was 0.16 mm (160 μm). Then, the extrusion-coated resin composition was cooled to about 200° C., which is the crystallization temperature of the PPS resin, in the first cooling device. Then, while the rectangular copper wire extrusion-coated with the resin composition was conveyed from the first cooling device to the plasma processing device, crystallization of the PPS resin was promoted to form an insulating layer having an average thickness of 160 μm. Then, the surface of the insulating layer was subjected to plasma treatment for 0.23 seconds in a plasma processing apparatus to modify the surface of the insulating layer to obtain an insulated wire. After that, it was introduced into the second extruder within 10 seconds, and an average of the fusible resin composition obtained by mixing 99 parts by mass of the phenoxy resin and 1 part by mass of the curing agent on the surface of the surface-modified insulating layer. By extrusion coating with a thickness of 0.04 mm (40 μm) and cooling with a second cooling device, a fusion layer having a thickness of 40 μm was formed. Thereby, the fusible insulated electric wire of Example 1 was obtained. In addition, in this example, as the rectangular copper wire, a wire having a rectangular cross section with a long side of about 3.2 mm and a short side of about 1.5 mm was used. The production conditions are shown in Table 1 below.

(実施例2)
実施例2では、表1に示すように、絶縁層の厚さを0.24mm(240μm)に、プラズマ処理時間を0.55秒にそれぞれ変更した以外は、実施例1と同様に融着性絶縁電線を作製した。
(Example 2)
In Example 2, as shown in Table 1, the fusion property was the same as in Example 1 except that the thickness of the insulating layer was changed to 0.24 mm (240 μm) and the plasma treatment time was changed to 0.55 seconds. An insulated wire was produced.

(実施例3)
実施例3では、表1に示すように、エポキシ樹脂を100質量部含む塗料を絶縁層の表面に塗布して焼付することにより、平均厚さが0.02mm(200μm)の融着層を形成した以外は、実施例1と同様に融着性絶縁電線を作製した。
(Example 3)
In Example 3, as shown in Table 1, a coating material containing 100 parts by mass of an epoxy resin was applied to the surface of the insulating layer and baked to form a fusion layer having an average thickness of 0.02 mm (200 μm). A fusion-bondable insulated electric wire was produced in the same manner as in Example 1 except that the above was performed.

(実施例4)
実施例4では、表1に示すように、絶縁層の厚さを0.35mm(350μm)に変更した以外は、実施例1と同様に融着性絶縁電線を作製した。
(Example 4)
In Example 4, as shown in Table 1, a fusible insulated wire was produced in the same manner as in Example 1 except that the thickness of the insulating layer was changed to 0.35 mm (350 μm).

(比較例1)
比較例1では、プラズマ処理を施さない以外は、実施例1と同様に融着性絶縁電線を作製した。
(Comparative Example 1)
In Comparative Example 1, a fusible insulated wire was produced in the same manner as in Example 1 except that plasma treatment was not performed.

(比較例2)
比較例2では、プラズマ処理を施さない以外は、実施例3と同様に融着性絶縁電線を作製した。
(Comparative example 2)
In Comparative Example 2, a fusible insulated wire was produced in the same manner as in Example 3 except that plasma treatment was not performed.

(比較例3,4)
比較例3,4では、絶縁層を、PPS樹脂を含む樹脂組成物を押し出す代わりに、ポリアミドイミド樹脂を100質量部含む塗料を塗布・焼付により形成した以外は、実施例3と同様に融着性絶縁電線を作製した。
(Comparative Examples 3 and 4)
In Comparative Examples 3 and 4, fusion bonding was performed in the same manner as in Example 3 except that the insulating layer was formed by applying and baking a coating material containing 100 parts by mass of a polyamideimide resin instead of extruding the resin composition containing the PPS resin. An electrically insulated wire was produced.

<評価方法>
実施例1〜4、および比較例1〜4の融着性絶縁電線を以下の方法により評価した。
<Evaluation method>
The fusible insulated wires of Examples 1 to 4 and Comparative Examples 1 to 4 were evaluated by the following methods.

(質量濃度比O/S)
絶縁層の表面における硫黄Sに対する酸素Oの質量濃度比O/Sは、融着性絶縁電線の長手方向に垂直な断面において、絶縁層における、融着層との界面から20μmの深さの10μm四方の領域をEDXにより元素分析を行い、硫黄Sに対する酸素Oの質量濃度比O/Sを算出した。なお、X線出力は7kVとした。
(Mass concentration ratio O/S)
The mass concentration ratio O/S of oxygen O to sulfur S on the surface of the insulating layer is 10 μm at a depth of 20 μm from the interface with the fusion layer in the insulation layer in a cross section perpendicular to the longitudinal direction of the fusible insulated wire. Elemental analysis was performed on the four regions by EDX, and the mass concentration ratio O/S of oxygen O to sulfur S was calculated. The X-ray output was 7 kV.

(融着後の接着力)
まず、融着後の接着力を計測するための試験片を作製した。
具体的には、まず、融着性絶縁電線を40cmの長さに切断し、融着層の外表面をエチルアルコールで洗浄して油膜等を除去した。続いて、融着性絶縁電線を5%伸長して平坦にし、10cmの長さに切断して、4本のサンプルを準備した。この4本のサンプルを、JIS C 2103:2013の付属書JCに規定された常温での固着力(ストラッカ法)を参考にして、図5に示すように配置した。図5は、融着性絶縁電線の融着後の接着力を評価するための試験片の斜視図である。図5に示すように、4本のサンプル51を配置した後、各サンプル51がずれないように粘着テープで仮固定し、図5に示す上下方向から加圧しながら、150℃の温度で15分間加熱した。これにより、各サンプル51を融着させ、試験片50を作製した。
続いて、試験片50について、JIS C 2103:2013に記載された電気絶縁用ワニス試験方法を参考にして、融着後の接着力を計測した。
具体的には、図5に示す試験片50の両端をオートグラフのクランプでつかみ、5m/minの速度で引っ張り、各サンプル51の接着が破壊される最大引張強度を測定した。そして、図5に示す試験片の被覆接触面積(100mm×3.2mm×2)に対する最大引張強度から、絶縁層と融着層のせん断接着強度(最大引張強度/被覆接触面積)を得た。このときのせん断接着強度が1.5N/mm以上を○とし、1.5N/mm未満を×とした。
(Adhesive strength after fusion)
First, a test piece for measuring the adhesive force after fusion bonding was prepared.
Specifically, first, the fusible insulated wire was cut into a length of 40 cm, and the outer surface of the fusible layer was washed with ethyl alcohol to remove the oil film and the like. Subsequently, the fusible insulated wire was stretched 5% to be flat, and cut into a length of 10 cm to prepare four samples. The four samples were arranged as shown in FIG. 5 with reference to the fixing force (Stracker method) at room temperature specified in Annex JC of JIS C 2103:2013. FIG. 5 is a perspective view of a test piece for evaluating the adhesive strength of the fusible insulated wire after fusing. As shown in FIG. 5, after arranging the four samples 51, each sample 51 is temporarily fixed with an adhesive tape so as not to be displaced, and is pressed from the vertical direction shown in FIG. Heated. Thereby, each sample 51 was fused and the test piece 50 was produced.
Subsequently, with respect to the test piece 50, the adhesive force after fusion bonding was measured with reference to the varnish test method for electrical insulation described in JIS C 2103:2013.
Specifically, both ends of the test piece 50 shown in FIG. 5 were grasped by an autograph clamp and pulled at a speed of 5 m/min, and the maximum tensile strength at which the adhesion of each sample 51 was broken was measured. Then, the shear adhesive strength (maximum tensile strength/coated contact area) of the insulating layer and the fusion bonding layer was obtained from the maximum tensile strength with respect to the coated contact area (100 mm×3.2 mm×2) of the test piece shown in FIG. The shear adhesive strength at this time was evaluated as ◯ when it was 1.5 N/mm 2 or more, and as x when it was less than 1.5 N/mm 2 .

(電気絶縁性)
融着層を設ける前の絶縁電線を2本準備し、これらを長辺の絶縁層同士が長さ150mmに渡って隙間が無いように密着させて、試料を作製した。この試料の2本の導体間に50Hzの交流電流で電圧を10V/sで昇圧させながら50pCの部分放電が50回以上発生する電圧を測定し、1550V以上となるものを○、1550V未満となるものを×とした。
(Electrical insulation)
Two insulated electric wires before the provision of the fusion bonding layer were prepared, and the insulating layers on the long sides were adhered to each other so that there was no gap over a length of 150 mm to prepare a sample. The voltage at which 50 pC partial discharge is generated 50 times or more while measuring the voltage between the two conductors of this sample with an alternating current of 50 Hz at 10 V/s, and the voltage of 1550 V or more is ◯ and less than 1550 V. The thing was marked as x.

(絶縁層の厚さの均一さ)
融着性絶縁電線をエポキシ樹脂内に包埋し、融着性絶縁電線の長手方向に垂直な面で断面研磨し、融着性絶縁電線の長手方向に垂直な断面を得て、長辺中央2か所、短辺中央2か所、角部4か所の計8か所の絶縁層12の厚さを計測し、その平均値を算出した。前記8か所の厚さと平均値との差がすべて平均値の10%未満であれば○とし、1か所でも平均値の10%以上であれば×とした。
(Insulation layer thickness uniformity)
Embed the fusible insulated wire in epoxy resin and polish the cross-section along a plane perpendicular to the longitudinal direction of the fusible insulated wire to obtain a cross section perpendicular to the longitudinal direction of the fusible insulated wire. The thickness of the insulating layer 12 was measured at two places, two at the center of the short side, and four at the corners, and the average value was calculated. When all the differences between the thicknesses at the eight locations and the average value were less than 10% of the average value, the result was ◯.

<評価結果>
評価結果を上記表1に示す。
<Evaluation result>
The evaluation results are shown in Table 1 above.

実施例1〜4では、絶縁層の表面における質量濃度比O/Sが0.2以上であり、PPS樹脂を含む絶縁層の表面に活性な官能基を十分に導入できたことから、絶縁層と融着層との密着性が高く、融着後の接着力が良好であることが確認された。
また、実施例1〜4ではいずれも、絶縁層を、PPS樹脂を含む樹脂組成物を押し出して形成しているため、電気絶縁性および絶縁層の厚さの均一さも良好であることが確認された。
In Examples 1 to 4, the mass concentration ratio O/S on the surface of the insulating layer was 0.2 or more, and the active functional group could be sufficiently introduced to the surface of the insulating layer containing the PPS resin. It was confirmed that the adhesiveness between the adhesive layer and the fusion layer was high and the adhesive force after fusion was good.
In addition, in all of Examples 1 to 4, since the insulating layer was formed by extruding a resin composition containing a PPS resin, it was confirmed that the electrical insulating property and the uniformity of the thickness of the insulating layer were good. It was

一方、比較例1,2では、PPS樹脂を含む絶縁層をプラズマ処理で表面改質しなかったため、絶縁層表面での質量濃度比O/Sが0.2未満と小さく、絶縁層と融着層との密着性が低いことが確認された。これは、PPS樹脂を含む絶縁層が化学的に安定で、融着層を形成するフェノキシ樹脂やエポキシ樹脂との化学的親和性が低いことによるものと考えられる。 On the other hand, in Comparative Examples 1 and 2, since the insulating layer containing the PPS resin was not surface-modified by plasma treatment, the mass concentration ratio O/S on the surface of the insulating layer was as small as less than 0.2, and fusion with the insulating layer It was confirmed that the adhesion to the layer was low. It is considered that this is because the insulating layer containing the PPS resin is chemically stable and has a low chemical affinity with the phenoxy resin or the epoxy resin forming the fusion bonding layer.

比較例3では、PPS樹脂の代わりにポリアミドイミド樹脂で絶縁層を形成することにより、融着層と絶縁層との間で高い密着性を得られたが、電気絶縁性が不十分となることが確認された。これは、ポリアミドイミド樹脂の比誘電率がPPS樹脂に比べて高く、ポリアミドイミド樹脂を用いて、PPS樹脂で形成する場合と同じような厚さで絶縁層を形成すると、十分な電気絶縁性を得られないためと考えられる。
比較例4では、比較例3と同様にポリアミドイミド樹脂で絶縁層を形成するとともに、その厚さを0.16mmと比較例3よりも厚くしたが、絶縁層の厚さが周方向でばらつき、均一とならないことが確認された。また、絶縁層の厚さが不均一であることから、電気絶縁性も低くなることが確認された。
なお、比較例3および比較例4では、絶縁層にSを含まないポリアミドイミド樹脂を用いているため、質量濃度比O/Sは算出せず、「−」と表記した。
In Comparative Example 3, by forming the insulating layer of the polyamide-imide resin instead of the PPS resin, high adhesion was obtained between the fusion bonding layer and the insulating layer, but the electrical insulating property was insufficient. Was confirmed. This is because the relative dielectric constant of the polyamide-imide resin is higher than that of the PPS resin, and when the polyamide-imide resin is used to form the insulating layer with a thickness similar to that of the PPS resin, sufficient electrical insulation is obtained. It is considered that it is not possible to obtain.
In Comparative Example 4, the insulating layer was formed of polyamide-imide resin as in Comparative Example 3 and the thickness thereof was set to 0.16 mm, which was thicker than that of Comparative Example 3. However, the thickness of the insulating layer varied in the circumferential direction, It was confirmed that it was not uniform. In addition, it was confirmed that the electrical insulating property was also reduced because the thickness of the insulating layer was non-uniform.
In addition, in Comparative Example 3 and Comparative Example 4, since the polyamide-imide resin containing no S was used for the insulating layer, the mass concentration ratio O/S was not calculated and was represented as “−”.

このように、PPS樹脂を含み、化学的に安定で他の物質との化学的親和性の低い絶縁層であっても、表面改質により当該絶縁層の表面における質量濃度比O/Sを0.2以上とすることで、融着性樹脂との化学的親和性を高め、絶縁層と融着層との密着性を向上できる。 As described above, even if the insulating layer contains the PPS resin and is chemically stable and has a low chemical affinity with other substances, the mass concentration ratio O/S on the surface of the insulating layer is 0 due to the surface modification. By setting the ratio to 2 or more, the chemical affinity with the fusible resin can be increased and the adhesion between the insulating layer and the fusible layer can be improved.

<本発明の好ましい態様>
以下に、本発明の好ましい態様について付記する。
<Preferred embodiment of the present invention>
Hereinafter, the preferred embodiments of the present invention will be additionally described.

[付記1]
本発明の一態様によれば、
導体と、
前記導体の外周に配置され、ポリフェニレンサルファイド樹脂を含む樹脂組成物からなる絶縁層と、を備え、
前記絶縁層は、表面における硫黄Sに対する酸素Oの質量濃度比O/Sが0.2以上となるように形成されている、絶縁電線が提供される。
[Appendix 1]
According to one aspect of the invention,
A conductor,
An insulating layer disposed on the outer periphery of the conductor, the insulating layer comprising a resin composition containing a polyphenylene sulfide resin,
There is provided an insulated wire in which the insulating layer is formed so that the mass concentration ratio O/S of oxygen O to sulfur S on the surface is 0.2 or more.

[付記2]
付記1の絶縁電線において、好ましくは、
前記絶縁層を形成する前記樹脂組成物はシリコーンゴムを含み、前記ポリフェニレンサルファイド樹脂と前記シリコーンゴムとを質量比で90:10〜98:2の範囲内で含有する。
[Appendix 2]
In the insulated wire of Appendix 1, preferably,
The resin composition forming the insulating layer contains silicone rubber, and contains the polyphenylene sulfide resin and the silicone rubber in a mass ratio of 90:10 to 98:2.

[付記3]
付記1又は2の絶縁電線において、好ましくは、
前記絶縁層は、結晶化度が95%以上である。
[Appendix 3]
In the insulated wire of Supplementary Note 1 or 2, preferably
The insulating layer has a crystallinity of 95% or more.

[付記4]
付記1〜3のいずれかの絶縁電線において、好ましくは、
前記絶縁層の厚さは160μm以上240μm以下である。
[Appendix 4]
In the insulated wire according to any one of appendices 1 to 3, preferably,
The insulating layer has a thickness of 160 μm or more and 240 μm or less.

[付記5]
本発明の他の態様によれば、
付記1〜4のいずれかの絶縁電線の前記絶縁層の外周に融着性樹脂組成物からなる融着層を備える、融着性絶縁電線が提供される。
[Appendix 5]
According to another aspect of the invention,
There is provided a fusible insulated electric wire comprising the insulated electric wire according to any one of appendices 1 to 4, comprising a fusible layer made of a fusible resin composition on the outer periphery of the insulating layer.

[付記6]
本発明の他の態様によれば、
絶縁電線を巻回し、隣接する前記絶縁電線が融着性樹脂組成物からなる融着層で融着されるコイルであって、
前記絶縁電線は、
導体と、前記導体の外周に配置され、ポリフェニレンサルファイド樹脂を含む樹脂組成物からなる絶縁層と、を備え、
前記絶縁層は、前記融着層と接する表面における硫黄Sに対する酸素Oの質量濃度比O/Sが0.2以上である、コイルが提供される。
[Appendix 6]
According to another aspect of the invention,
A coil in which an insulated electric wire is wound, and the adjacent insulated electric wires are fused by a fusion layer made of a fusible resin composition,
The insulated wire is
A conductor and an insulating layer disposed on the outer periphery of the conductor and made of a resin composition containing a polyphenylene sulfide resin,
A coil is provided, wherein the insulating layer has a mass concentration ratio O/S of oxygen O to sulfur S of 0.2 or more on the surface in contact with the fusion layer.

[付記7]
本発明の他の態様によれば、
導体の外周に、ポリフェニレンサルファイド樹脂を含む樹脂組成物からなる絶縁層を形成する絶縁層形成工程と、
前記絶縁層の表面における硫黄Sに対する酸素Oの質量濃度比O/Sが0.2以上となるように前記絶縁層を表面改質する表面改質工程と、を有する絶縁電線の製造方法が提供される。
[Appendix 7]
According to another aspect of the invention,
An insulating layer forming step of forming an insulating layer made of a resin composition containing a polyphenylene sulfide resin on the outer periphery of the conductor;
And a surface modification step of modifying the surface of the insulating layer so that the mass concentration ratio O/S of oxygen O to sulfur S on the surface of the insulating layer becomes 0.2 or more. To be done.

[付記8]
付記7の絶縁電線の製造方法において、好ましくは、
前記表面改質工程では、前記絶縁層の表面にプラズマおよび紫外線の少なくとも1つを照射する。
[Appendix 8]
In the method for producing an insulated wire according to Appendix 7, preferably,
In the surface modification step, the surface of the insulating layer is irradiated with at least one of plasma and ultraviolet rays.

[付記9]
本発明の他の態様によれば、
付記7又は8に記載の絶縁電線の製造方法により絶縁電線を製造した後、表面改質された前記絶縁層の外周に、融着性樹脂組成物からなる融着層を形成する融着層形成工程を有する、融着性絶縁電線の製造方法が提供される。
[Appendix 9]
According to another aspect of the invention,
After forming an insulated wire by the method for producing an insulated wire according to appendix 7 or 8, a fused layer is formed on the outer periphery of the surface-modified insulating layer, the fused layer comprising a fusible resin composition. Provided is a method for manufacturing a fusible insulated wire, which has steps.

[付記10]
付記9の融着性絶縁電線の製造方法において、好ましくは、
前記融着層形成工程を、前記表面改質工程の後、10秒以内に行う。
[Appendix 10]
In the method for producing a fusible insulated wire of Supplementary Note 9, preferably,
The fusion layer formation step is performed within 10 seconds after the surface modification step.

[付記11]
本発明の他の態様によれば、
導体の外周に、ポリフェニレンサルファイド樹脂を含む樹脂組成物からなる絶縁層を形成する絶縁層形成工程と、
前記絶縁層の表面における硫黄Sに対する酸素Oの質量濃度比O/Sが0.2以上となるように前記絶縁層を表面改質し、絶縁電線を得る表面改質工程と、
表面改質された前記絶縁層の外周に、融着性樹脂組成物からなる融着層を形成して融着性絶縁電線を得る融着層形成工程と、
前記融着性絶縁電線を巻回する巻回工程と、
巻回により隣接する前記融着性絶縁電線を前記融着層で融着させる融着工程と、を有する、コイルの製造方法が提供される。
[Appendix 11]
According to another aspect of the invention,
An insulating layer forming step of forming an insulating layer made of a resin composition containing a polyphenylene sulfide resin on the outer periphery of the conductor;
A surface modification step of modifying the surface of the insulating layer so that the mass concentration ratio O/S of oxygen O to sulfur S on the surface of the insulating layer becomes 0.2 or more to obtain an insulated wire;
On the outer periphery of the surface-modified insulating layer, a fusion layer forming step of forming a fusion layer made of a fusion resin composition to obtain a fusion insulated wire,
A winding step of winding the fusible insulated wire,
The present invention provides a method for manufacturing a coil, which comprises a fusion step of fusion-bonding the adjacent fusible insulated wires by winding at the fusion layer.

1 融着性絶縁電線
10 絶縁電線
11 導体
12 絶縁層
13 融着層
1 Fusing Insulated Electric Wire 10 Insulated Electric Wire 11 Conductor 12 Insulating Layer 13 Fusing Layer

Claims (5)

導体と、
前記導体の外周に配置され、ポリフェニレンサルファイド樹脂を含む樹脂組成物からなる絶縁層と、
前記絶縁層の外周に熱可塑性樹脂を含む融着性樹脂組成物からなる融着層と、を備え、
前記絶縁層は、表面における硫黄Sに対する酸素Oの質量濃度比O/Sが0.2以上0.5以下である、融着性絶縁電線。
A conductor,
An insulating layer, which is arranged on the outer periphery of the conductor and is made of a resin composition containing a polyphenylene sulfide resin,
A fusible layer made of a fusible resin composition containing a thermoplastic resin on the outer periphery of the insulating layer ,
The insulating layer is a fusible insulated electric wire in which a mass concentration ratio O/S of oxygen O to sulfur S on the surface is 0.2 or more and 0.5 or less .
前記絶縁層を形成する前記樹脂組成物はシリコーンゴムを含み、前記ポリフェニレンサルファイド樹脂と前記シリコーンゴムとを質量比で90:10〜98:2の範囲内で含有する、請求項1に記載の融着性絶縁電線。 The melt according to claim 1, wherein the resin composition forming the insulating layer contains a silicone rubber, and contains the polyphenylene sulfide resin and the silicone rubber in a mass ratio of 90:10 to 98:2. Adhesive insulated wire. 前記絶縁層は、結晶化度が95%以上である、請求項1又は2に記載の融着性絶縁電線。 The fusible insulated electric wire according to claim 1, wherein the insulating layer has a crystallinity of 95% or more. 前記絶縁層の厚さは160μm以上240μm以下である、請求項1〜3のいずれかに記載の融着性絶縁電線。 The thickness of the insulating layer is less 240μm least 160 .mu.m, bonding insulated wire according to claim 1. 導体の外周に、ポリフェニレンサルファイド樹脂を含む樹脂組成物からなる絶縁層を形成する絶縁層形成工程と、
前記絶縁層の表面における硫黄Sに対する酸素Oの質量濃度比O/Sが0.2以上0.5以下となるように前記絶縁層を表面改質する表面改質工程と、
表面改質された前記絶縁層の外周に、熱可塑性樹脂を含む融着性樹脂組成物からなる融着層を形成する融着層形成工程と、を有する融着性絶縁電線の製造方法。
An insulating layer forming step of forming an insulating layer made of a resin composition containing a polyphenylene sulfide resin on the outer periphery of the conductor;
A surface modification step of modifying the surface of the insulating layer such that the mass concentration ratio O/S of oxygen O to sulfur S on the surface of the insulating layer is 0.2 or more and 0.5 or less ;
The outer periphery of the surface modified the insulating layer, the manufacturing method of bonding insulated wire having a bonding layer forming step of forming a fusion bonded layer comprising a fusible resin composition comprising a thermoplastic resin.
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JP5306742B2 (en) * 2008-08-28 2013-10-02 古河電気工業株式会社 Insulated wire
JP2012109061A (en) * 2010-11-16 2012-06-07 Kurabe Industrial Co Ltd Coil wire and induction heating coil
CN105378857A (en) * 2013-07-22 2016-03-02 株式会社日立制作所 Insulated wire and rotary electrical machine using same

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