JP6727693B2 - 光学走査 - Google Patents
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- JP6727693B2 JP6727693B2 JP2015115322A JP2015115322A JP6727693B2 JP 6727693 B2 JP6727693 B2 JP 6727693B2 JP 2015115322 A JP2015115322 A JP 2015115322A JP 2015115322 A JP2015115322 A JP 2015115322A JP 6727693 B2 JP6727693 B2 JP 6727693B2
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- 230000003287 optical effect Effects 0.000 title claims description 45
- 238000001208 nuclear magnetic resonance pulse sequence Methods 0.000 claims description 57
- 230000010287 polarization Effects 0.000 claims description 22
- 230000005855 radiation Effects 0.000 claims description 18
- 238000000034 method Methods 0.000 claims description 17
- 238000012937 correction Methods 0.000 claims description 12
- 230000000737 periodic effect Effects 0.000 claims description 5
- 229940125730 polarisation modulator Drugs 0.000 claims description 5
- 239000013307 optical fiber Substances 0.000 claims description 2
- 239000000835 fiber Substances 0.000 description 20
- 238000002474 experimental method Methods 0.000 description 8
- 238000005259 measurement Methods 0.000 description 7
- 230000008859 change Effects 0.000 description 6
- 230000008878 coupling Effects 0.000 description 6
- 238000010168 coupling process Methods 0.000 description 6
- 238000005859 coupling reaction Methods 0.000 description 6
- 238000010586 diagram Methods 0.000 description 6
- 230000003993 interaction Effects 0.000 description 6
- 238000004611 spectroscopical analysis Methods 0.000 description 6
- 230000002123 temporal effect Effects 0.000 description 6
- 230000008901 benefit Effects 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- 230000005284 excitation Effects 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 229910052691 Erbium Inorganic materials 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 238000001311 chemical methods and process Methods 0.000 description 2
- -1 erbium ions Chemical class 0.000 description 2
- 238000011835 investigation Methods 0.000 description 2
- 230000004044 response Effects 0.000 description 2
- 230000000630 rising effect Effects 0.000 description 2
- 238000005070 sampling Methods 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 230000003044 adaptive effect Effects 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
- 230000002452 interceptive effect Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000005316 response function Methods 0.000 description 1
- 239000000523 sample Substances 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 230000001360 synchronised effect Effects 0.000 description 1
- 230000005469 synchrotron radiation Effects 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 230000001052 transient effect Effects 0.000 description 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/10038—Amplitude control
- H01S3/10046—Pulse repetition rate control
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/11—Mode locking; Q-switching; Other giant-pulse techniques, e.g. cavity dumping
- H01S3/1106—Mode locking
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/02—Details
- G01J3/10—Arrangements of light sources specially adapted for spectrometry or colorimetry
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/06—Construction or shape of active medium
- H01S3/063—Waveguide lasers, i.e. whereby the dimensions of the waveguide are of the order of the light wavelength
- H01S3/067—Fibre lasers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/06—Construction or shape of active medium
- H01S3/063—Waveguide lasers, i.e. whereby the dimensions of the waveguide are of the order of the light wavelength
- H01S3/067—Fibre lasers
- H01S3/06708—Constructional details of the fibre, e.g. compositions, cross-section, shape or tapering
- H01S3/06712—Polarising fibre; Polariser
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/08—Construction or shape of optical resonators or components thereof
- H01S3/08054—Passive cavity elements acting on the polarization, e.g. a polarizer for branching or walk-off compensation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/08—Construction or shape of optical resonators or components thereof
- H01S3/081—Construction or shape of optical resonators or components thereof comprising three or more reflectors
- H01S3/082—Construction or shape of optical resonators or components thereof comprising three or more reflectors defining a plurality of resonators, e.g. for mode selection or suppression
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/106—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity
- H01S3/107—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity using electro-optic devices, e.g. exhibiting Pockels or Kerr effect
-
- H—ELECTRICITY
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- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/11—Mode locking; Q-switching; Other giant-pulse techniques, e.g. cavity dumping
- H01S3/1106—Mode locking
- H01S3/1112—Passive mode locking
- H01S3/1115—Passive mode locking using intracavity saturable absorbers
- H01S3/1118—Semiconductor saturable absorbers, e.g. semiconductor saturable absorber mirrors [SESAMs]; Solid-state saturable absorbers, e.g. carbon nanotube [CNT] based
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/13—Stabilisation of laser output parameters, e.g. frequency or amplitude
- H01S3/1304—Stabilisation of laser output parameters, e.g. frequency or amplitude by using an active reference, e.g. second laser, klystron or other standard frequency source
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/13—Stabilisation of laser output parameters, e.g. frequency or amplitude
- H01S3/1307—Stabilisation of the phase
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/13—Stabilisation of laser output parameters, e.g. frequency or amplitude
- H01S3/136—Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling devices placed within the cavity
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
- H01S3/2383—Parallel arrangements
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- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- General Physics & Mathematics (AREA)
- Lasers (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
Description
Claims (13)
- 時間的に間隔をおいた光パルスを生じる装置であって、
第1の繰返し率で第1の光パルスシーケンス(I)を生じる第1の光源(51)と、
第2の繰返し率で第2の光パルスシーケンス(II)を生じる第2の光源(52)と、
前記第1の繰返し率および/または前記第2の繰返し率に影響する少なくとも1つの設定要素と、
前記第1の繰返し率および/または前記第2の繰返し率を周期的に変化させるために、前記設定要素に周期的な変調信号(62)を供給する制御要素(61)と
を備える装置において、
前記第1の光パルスシーケンス(I)および前記第2の光パルスシーケンス(II)から制御信号(58)を得る位相検出器(57)と、
前記制御信号(58)および前記変調信号(62)から制御偏差信号(63)を得る補正要素(59、60)と、
入力に前記制御偏差信号(63)が供給される調整器(64)であって、該調整器(64)の出力信号(65)から得られた設定信号(67)が前記設定要素に供給される調整器(64)と、
を備える制御回路が設けられたことを特徴とする装置。 - 前記変調信号(62)および前記調整器(64)の前記出力信号(65)から前記設定信号(67)を得て、該設定信号(67)を前記設定要素に供給するヘテロダイン要素(66)が設けられた、請求項1記載の装置。
- 前記設定要素が、前記繰返し率の少なくとも一方を、2つの異なる離散的な値の間で切り替えさせる偏光変調器(27)である、請求項1または2に記載の装置。
- 前記第1の光源および/または前記第2の光源(51、52)がパルスレーザを備える、請求項1〜3のいずれか1項記載の装置。
- 前記設定要素が前記パルスレーザの実効共振器長を変える、請求項4記載の装置。
- 前記パルスレーザの実効共振器長が、前記パルスレーザの共振器内で循環する放射の偏光状態に応じて異なる、請求項5記載の装置。
- 前記変調信号(62)が正弦信号または矩形信号である、請求項1〜6のいずれか1項記載の装置。
- 前記第1の光パルスシーケンス(I)および前記第2の光パルスシーケンス(II)が、高々1ナノ秒までの周期的に変化する時間的ずれを示す、請求項1〜7のいずれか1項記載の装置。
- 前記第1の光源および前記第2の光源が、共通のレーザ媒質(21)、共通の光学ファイバ部分、および/または共通のミラー(23、24)のような共通の構成要素を有するレーザである、請求項1〜8のいずれか1項記載の装置。
- 前記第2の光源の放射が、前記第1の光源の放射に対して直交偏光を示す、請求項1〜9のいずれか1項記載の装置。
- 前記第1の光源および/または前記第2の光源が複屈折要素(26、32)を含む、請求項1〜10のいずれか1項記載の装置。
- 前記第1の光源および/または前記第2の光源が、干渉計の2つのアームにおけるそれぞれの偏光に応じて前記第1の光源または前記第2の光源の放射を分割する偏光光線分割器(41)を有する、請求項1〜11のいずれか1項記載の装置。
- 時間的に間隔をおいた光パルスを生じる方法において、
第1の繰返し率を有する第1の光パルスシーケンス(I)をパルスレーザによって生じる工程と、
第2の繰返し率を有する第2の光パルスシーケンス(II)をもう1つのパルスレーザによって生じる工程と、
前記第2の光パルスシーケンスのパルス距離が、前記第1の光パルスシーケンスのパルス距離から、正負交互の所与のオフセット値だけ常に異なるように、前記両方の繰返し率の少なくとも一方を2つの値の間で周期的に切り替える工程であって、前記切り替えが、前記両方のパルスレーザの少なくとも一方の共振器内で循環する放射の偏光を2つの異なる偏光状態間で変化させることによって行われ、各偏光状態に、前記パルスレーザの異なる実効共振器長が割り当てられる工程と
を有してなる方法。
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
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DE102014007998.8 | 2014-06-05 | ||
DE102014007998 | 2014-06-05 | ||
DE102015108602.6A DE102015108602B4 (de) | 2014-06-05 | 2015-06-01 | Optische Abtastung |
DE102015108602.6 | 2015-06-01 |
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JP2016027625A JP2016027625A (ja) | 2016-02-18 |
JP6727693B2 true JP6727693B2 (ja) | 2020-07-22 |
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US (1) | US9685754B2 (ja) |
JP (1) | JP6727693B2 (ja) |
DE (1) | DE102015108602B4 (ja) |
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DE102015113355B4 (de) * | 2015-08-13 | 2019-01-24 | Toptica Photonics Ag | Optische Abtastung |
KR101907774B1 (ko) * | 2017-02-23 | 2018-10-12 | 한국과학기술원 | 레이저의 반복률을 제어하는 안정화 방법 및 이를 수행하는 장치 |
EP3534176A1 (de) | 2018-03-01 | 2019-09-04 | TOPTICA Projects GmbH | Laserbasierte distanzmessung mittels doppelkamm-laser |
WO2020089740A1 (en) * | 2018-10-31 | 2020-05-07 | Agilent Technologies, Inc. | Flash timing randomisation |
US11152757B2 (en) * | 2019-06-06 | 2021-10-19 | Coherent, Inc. | High repetition rate seed laser |
DE102020115338B3 (de) * | 2020-06-09 | 2021-11-18 | Toptica Photonics Ag | Optische Abtastung |
DE102020115877B9 (de) * | 2020-06-16 | 2022-10-06 | Toptica Photonics Ag | Schnelle Modulation der Resonanzfrequenz eines optischen Resonators |
GB2599887B (en) * | 2020-07-17 | 2022-11-30 | Toshiba Kk | An optical source, a method for generating optical pulses, a quantum communication system, and a quantum communication method |
CN113300207B (zh) * | 2021-06-24 | 2022-07-12 | 东莞理工学院 | 一种超短脉冲激光重复频率的异步锁定方法及装置 |
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DE102005050151B3 (de) | 2005-10-19 | 2006-11-02 | MAX-PLANCK-Gesellschaft zur Förderung der Wissenschaften e.V. | Verfahren und Vorrichtung zur Abtastung von sich periodisch wiederholenden Ereignissen |
DE202008009021U1 (de) * | 2008-07-07 | 2008-10-09 | Toptica Photonics Ag | Elektronisch gesteuerte optische Abtastung |
DE102009041156B4 (de) * | 2009-09-14 | 2013-04-25 | Laser Quantum Gmbh | Verfahren zur Kopplung zweier gepulster Laser mit einstellbarer und von Null verschiedener Differenz der Pulsfrequenzen |
DE102012113029A1 (de) | 2012-12-21 | 2014-06-26 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Kurzpulslasersystem |
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- 2015-06-01 DE DE102015108602.6A patent/DE102015108602B4/de active Active
- 2015-06-03 US US14/729,529 patent/US9685754B2/en active Active
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DE102015108602B4 (de) | 2022-10-27 |
US20150357788A1 (en) | 2015-12-10 |
JP2016027625A (ja) | 2016-02-18 |
DE102015108602A1 (de) | 2015-12-10 |
US9685754B2 (en) | 2017-06-20 |
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