JP6718245B2 - フィルムの検査方法 - Google Patents
フィルムの検査方法 Download PDFInfo
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- JP6718245B2 JP6718245B2 JP2016020609A JP2016020609A JP6718245B2 JP 6718245 B2 JP6718245 B2 JP 6718245B2 JP 2016020609 A JP2016020609 A JP 2016020609A JP 2016020609 A JP2016020609 A JP 2016020609A JP 6718245 B2 JP6718245 B2 JP 6718245B2
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/958—Inspecting transparent materials or objects, e.g. windscreens
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T7/00—Image analysis
- G06T7/0002—Inspection of images, e.g. flaw detection
- G06T7/0004—Industrial image inspection
- G06T7/0008—Industrial image inspection checking presence/absence
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
- G01N2021/8854—Grading and classifying of flaws
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
- G01N2021/8854—Grading and classifying of flaws
- G01N2021/888—Marking defects
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
- G01N2021/8887—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges based on image processing techniques
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
- G01N2021/8887—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges based on image processing techniques
- G01N2021/889—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges based on image processing techniques providing a bare video image, i.e. without visual measurement aids
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T2207/00—Indexing scheme for image analysis or image enhancement
- G06T2207/10—Image acquisition modality
- G06T2207/10004—Still image; Photographic image
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T2207/00—Indexing scheme for image analysis or image enhancement
- G06T2207/30—Subject of image; Context of image processing
- G06T2207/30108—Industrial image inspection
Description
フィルムの検査方法
偏光フィルムに対して自動光学検査を行い、群集性輝点欠陥、一糸欠陥、輝点欠陥、スター欠陥、スクラッチ欠陥、ブラック筋欠陥、糊ピンホール欠陥、気泡性欠陥、異物気泡欠陥、白点異物欠陥及び異物欠陥を検出した。
フィルムの検査方法
偏光フィルムに対して自動光学検査を行い、群集性輝点欠陥、一糸欠陥、輝点欠陥、スター欠陥、スクラッチ欠陥、ブラック筋欠陥、糊ピンホール欠陥、気泡性欠陥、異物気泡欠陥、白点異物欠陥及び異物欠陥を検出した。
フィルムの検査方法
偏光フィルムに対して自動光学検査を行い、群集性輝点欠陥、一糸欠陥、輝点欠陥、スター欠陥、スクラッチ欠陥、ブラック筋欠陥、糊ピンホール欠陥、気泡性欠陥、異物気泡欠陥、白点異物欠陥及び異物欠陥を検出した。
Claims (6)
- 分類された複数の欠陥グループからの各単一欠陥画像情報を多次元ベクトルに変換する段階と、
前記ベクトルを多次元座標系にマッピングし、前記ベクトルを前記欠陥グループによって区分する最適超平面を決定する段階と、
判定対象のフィルムで検出された欠陥から得られた欠陥画像情報を多次元ベクトルに変換後、変換された多次元ベクトルを前記最適超平面が決定された多次元座標系にマッピングし、該当する欠陥グループを得る段階と、を含み、
欠陥として認識された部分を中央に含む長方形のピクセルグループにおいて、各ピクセルごとに下記の数式1又は数式2で表される値によって前記ベクトルにおける軸が定まり、dx及びdyと比例する所定値によって当該軸の成分が決まる、フィルムの検査方法。
- 前記最適超平面を決定する段階は、互いに異なる種類の前記欠陥グループから得られたベクトルの境界に超平面を形成し、前記超平面のうち、互いに異なる前記欠陥グループから得られた最近接の2つのベクトルからの距離の和が最大となる前記超平面を前記最適超平面として決定する、請求項1に記載のフィルムの検査方法。
- 前記長方形のピクセルグループにおいて欠陥として認識された部分と背景に該当する部分とを分離し、背景に該当する部分のみを含むピクセルの明るさ値を0に設定する段階をさらに含む、請求項1に記載のフィルムの検査方法。
- 2ピクセル以下のサイズのノイズを含むピクセルの明るさ値を0に設定する段階をさらに含む、請求項1に記載のフィルムの検査方法。
- 前記欠陥画像情報を正規化して前記多次元ベクトルに変換する、請求項1に記載のフィルムの検査方法。
- 前記判定対象のフィルムで検出された欠陥の前記欠陥グループごとに良品判定基準が異なるように設定してフィルムの良否を判定する、請求項1に記載のフィルムの検査方法。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2015-0018146 | 2015-02-05 | ||
KR1020150018146A KR101694337B1 (ko) | 2015-02-05 | 2015-02-05 | 필름의 검사 방법 |
Publications (2)
Publication Number | Publication Date |
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JP2016142739A JP2016142739A (ja) | 2016-08-08 |
JP6718245B2 true JP6718245B2 (ja) | 2020-07-08 |
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Application Number | Title | Priority Date | Filing Date |
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JP2016020609A Active JP6718245B2 (ja) | 2015-02-05 | 2016-02-05 | フィルムの検査方法 |
Country Status (4)
Country | Link |
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JP (1) | JP6718245B2 (ja) |
KR (1) | KR101694337B1 (ja) |
CN (1) | CN105869143B (ja) |
TW (1) | TWI679611B (ja) |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4267103B2 (ja) | 1998-09-18 | 2009-05-27 | 株式会社日立製作所 | 外観画像分類装置およびその方法 |
JP4992081B2 (ja) * | 2006-09-20 | 2012-08-08 | 国立大学法人山口大学 | 画像処理により対象物の表面状態を検査する方法及びそのための画像処理プログラム |
JP5084911B2 (ja) * | 2008-09-09 | 2012-11-28 | 株式会社メガトレード | 外観検査装置 |
KR101188756B1 (ko) | 2008-09-18 | 2012-10-10 | 주식회사 엘지화학 | 편광판 얼룩 자동 검사 시스템 및 이를 이용한 편광판 얼룩검사 방법 |
JP2010159979A (ja) * | 2009-01-06 | 2010-07-22 | Hitachi Ltd | 外観検査方法及び外観検査システム |
JP5498189B2 (ja) * | 2010-02-08 | 2014-05-21 | 株式会社日立ハイテクノロジーズ | 欠陥検査方法及びその装置 |
CN102136061B (zh) * | 2011-03-09 | 2013-05-08 | 中国人民解放军海军航空工程学院 | 一种矩形石英晶片缺陷自动检测分类识别方法 |
JP2013098267A (ja) * | 2011-10-31 | 2013-05-20 | Hitachi High-Technologies Corp | 半導体パターン検査装置 |
US20130173179A1 (en) * | 2011-12-30 | 2013-07-04 | Weyerhaeuser Nr Company | Method for predicting whether a wood product originated from a butt log |
JP2013167596A (ja) * | 2012-02-17 | 2013-08-29 | Honda Motor Co Ltd | 欠陥検査装置、欠陥検査方法及びプログラム |
KR101328204B1 (ko) * | 2012-03-27 | 2013-11-14 | 주식회사 포스코 | 열간 슬라브의 스크래치 검출 장치 및 방법 |
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2015
- 2015-02-05 KR KR1020150018146A patent/KR101694337B1/ko active IP Right Grant
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2016
- 2016-01-29 TW TW105102853A patent/TWI679611B/zh active
- 2016-02-03 CN CN201610077455.2A patent/CN105869143B/zh active Active
- 2016-02-05 JP JP2016020609A patent/JP6718245B2/ja active Active
Also Published As
Publication number | Publication date |
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CN105869143A (zh) | 2016-08-17 |
CN105869143B (zh) | 2020-06-05 |
KR101694337B1 (ko) | 2017-01-09 |
TW201629906A (zh) | 2016-08-16 |
TWI679611B (zh) | 2019-12-11 |
JP2016142739A (ja) | 2016-08-08 |
KR20160096461A (ko) | 2016-08-16 |
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