JP6697961B2 - Ultraviolet sterilizer, ultraviolet sterilization method, and ultrapure water production system - Google Patents

Ultraviolet sterilizer, ultraviolet sterilization method, and ultrapure water production system Download PDF

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JP6697961B2
JP6697961B2 JP2016123371A JP2016123371A JP6697961B2 JP 6697961 B2 JP6697961 B2 JP 6697961B2 JP 2016123371 A JP2016123371 A JP 2016123371A JP 2016123371 A JP2016123371 A JP 2016123371A JP 6697961 B2 JP6697961 B2 JP 6697961B2
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JP2017225925A (en
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徹 天谷
徹 天谷
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Nomura Micro Science Co Ltd
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J47/00Ion-exchange processes in general; Apparatus therefor
    • B01J47/02Column or bed processes
    • B01J47/04Mixed-bed processes
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00Treatment of water, waste water, or sewage
    • C02F1/30Treatment of water, waste water, or sewage by irradiation
    • C02F1/32Treatment of water, waste water, or sewage by irradiation with ultraviolet light
    • C02F1/325Irradiation devices or lamp constructions
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00Treatment of water, waste water, or sewage
    • C02F1/30Treatment of water, waste water, or sewage by irradiation
    • C02F1/32Treatment of water, waste water, or sewage by irradiation with ultraviolet light
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00Treatment of water, waste water, or sewage
    • C02F1/42Treatment of water, waste water, or sewage by ion-exchange
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/48Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
    • H01L33/58Optical field-shaping elements

Description

本発明は、紫外線殺菌装置及び紫外線殺菌方法に係り、特に、純水製造装置の流路の分岐部の殺菌に用いられる紫外線殺菌装置及び紫外線殺菌方法に関する。   The present invention relates to an ultraviolet sterilizer and an ultraviolet sterilization method, and more particularly to an ultraviolet sterilizer and an ultraviolet sterilization method used for sterilizing a branch portion of a flow path of a pure water producing device.

近年、半導体素子(LSI)の集積度の向上にともない、シリコン基板等の基板表面上への超純水中の極微量物質による汚染の影響が問題となっており、イオン状物質、微粒子、有機物、金属、溶存ガス等の不純物質の極めて少ない超純水が要求されている。特に、半導体製造工程において、洗浄水中の有機物は、熱処理工程で炭化して線間短絡や絶縁不良を起こす原因となるため、全有機炭素濃度(TOC)の特に少ない超純水が求められている。   In recent years, as the degree of integration of semiconductor devices (LSIs) has improved, the influence of contamination of ultrapure water on the surface of a substrate such as a silicon substrate has become a problem, and ionic substances, fine particles, and organic substances have become a problem. , Ultrapure water containing very few impurities such as metals and dissolved gases is required. In particular, in the semiconductor manufacturing process, the organic substances in the cleaning water are carbonized in the heat treatment process to cause short circuits between lines and insulation failure. Therefore, ultrapure water with a particularly low total organic carbon concentration (TOC) is required. ..

一般に、超純水製造システムは、前処理部と、一次純水製造部と、二次純水製造部とから構成されている。前処理部は、凝集・沈澱・ろ過装置などによって原水中の濁質やコロイド物質を除去して前処理水を生成する区画である。一次純水製造部は、例えば、逆浸透膜装置(RO)や2床3塔型装置等により、前処理水中の大部分のイオンなどの溶解性物質や微粒子を除去する区画である。二次純水製造部は、一次純水製造部で得られた一次純水の精密仕上げを目的とした最終段階の区画である。   In general, an ultrapure water production system is composed of a pretreatment section, a primary pure water production section, and a secondary pure water production section. The pretreatment section is a section that removes suspended solids and colloidal substances in raw water by a flocculation/precipitation/filtration device or the like to generate pretreated water. The primary pure water production section is a section for removing most of soluble substances such as ions and fine particles in pretreated water by means of a reverse osmosis membrane device (RO), a two-bed, three-column device, or the like. The secondary pure water producing section is a final stage section for the purpose of precision finishing of the primary pure water obtained in the primary pure water producing section.

このような超純水製造システムにおいては、イオン性の有機物は、イオン交換樹脂装置等によって吸着除去される。非イオン性の有機物は、紫外線酸化装置等によって、二酸化炭素と低分子量の有機酸に分解された後、生成した有機酸がイオン交換樹脂装置等によって吸着除去される。超純水の製造において除去対象となる有機物としては、原水由来の有機物の他、装置内の配管や、各装置内で生じる細菌や微生物由来の有機物がある。   In such an ultrapure water production system, ionic organic substances are adsorbed and removed by an ion exchange resin device or the like. The nonionic organic substance is decomposed into carbon dioxide and a low molecular weight organic acid by an ultraviolet oxidation device or the like, and then the generated organic acid is adsorbed and removed by an ion exchange resin device or the like. The organic substances to be removed in the production of ultrapure water include organic substances derived from raw water, as well as organic substances derived from bacteria and microorganisms generated in pipes in each device and in each device.

有機物を分解する紫外線酸化装置としては、例えば、180〜190nmあるいは250〜260nmの波長の紫外線を放射する低圧紫外線ランプを用いた装置が一般的である。また、360〜400nmの波長を含む紫外線を放射する発光ダイオードと、光触媒を用いた紫外線酸化装置も提案されている(例えば、特許文献1参照。)。   As an ultraviolet oxidation device for decomposing organic substances, for example, a device using a low-pressure ultraviolet lamp that emits ultraviolet light having a wavelength of 180 to 190 nm or 250 to 260 nm is generally used. Further, a light emitting diode that emits ultraviolet rays having a wavelength of 360 to 400 nm and an ultraviolet oxidation device using a photocatalyst have also been proposed (for example, refer to Patent Document 1).

また、光触媒を用いずに紫外線によって水の殺菌を行う方法として、加圧空間内を通流する液体又は気体に、紫外線を照射することで、大量のガスや加圧状態の液体を効率よく紫外線殺菌するための紫外線殺菌装置を用いる方法が提案されている(例えば、特許文献2参照。)。   Further, as a method of sterilizing water by ultraviolet rays without using a photocatalyst, by irradiating a liquid or gas flowing in the pressurized space with ultraviolet rays, a large amount of gas or liquid under pressure can be efficiently emitted by ultraviolet rays. A method using an ultraviolet sterilizer for sterilization has been proposed (for example, refer to Patent Document 2).

特開2007−136372号公報JP, 2007-136372, A 特開2016−64111号公報JP, 2016-64111, A

ところで、一般的に、超純水製造システムは、被処理水の流路に分岐配管を有していることがあるが、この分岐配管の分岐部には、流速の低下や渦による水の滞留部分、いわゆる溜まり水が生じるおそれがある。このような溜まり水に細菌や微生物が滞留した場合、これらが配管壁面に付着して増殖し、やがてコロニーを形成し、さらにはバイオフィルムを生じ、洗浄によって除去することが困難になる。   By the way, generally, an ultrapure water production system may have a branch pipe in the flow path of the water to be treated. There is a possibility that a part, so-called accumulated water will be generated. When bacteria and microorganisms accumulate in such pooled water, they adhere to the wall surface of the pipes and proliferate, eventually forming colonies and further forming biofilms, which are difficult to remove by washing.

従来の紫外線殺菌装置では、このような溜まり水を確実に殺菌できていないことがあり、効果が限定的であるという難点があった。また、紫外線を発する光源の形状が限られているうえに、分岐配管の溜まり水の領域に確実に紫外線を照射するための配慮がなされていないため、分岐配管内の微細空間内の溜まり水を殺菌することが極めて困難であった。   In the conventional ultraviolet sterilizer, such accumulated water may not be surely sterilized, and there is a drawback that the effect is limited. In addition, since the shape of the light source that emits ultraviolet rays is limited and no consideration is given to reliably irradiate the area of the accumulated water of the branch pipe with ultraviolet rays, the accumulated water in the minute space in the branch pipe is It was extremely difficult to sterilize.

本発明は、上記した課題を解決するためになされたものであって、分岐配管接続部等の微細空間の溜まり水を効果的に殺菌することのできる、紫外線殺菌装置、紫外線殺菌方法及び超純水製造システムを提供することを目的とする。   The present invention has been made in order to solve the above problems, it is possible to effectively sterilize the pooled water of the fine space such as branch pipe connection portion, an ultraviolet sterilizer, an ultraviolet sterilization method and ultra pure. The purpose is to provide a water production system.

本発明の紫外線殺菌装置は、被処理水の流路となる主配管と前記主配管に接続された分岐配管とを有するとともに、前記主配管の前記分岐配管の接続部の開口を臨む位置に取付け孔の形成された被処理水配管と、前記被処理水配管の前記取付け孔に水密的に取付けられたレンズと、230〜290nmに発光ピーク波長を有する紫外線を放射する紫外線発光ダイオードを光源とする紫外線照射装置とを備え、前記紫外線発光ダイオードは、その光放出面を前記レンズ側に向けて、前記レンズの背面側に配置され、前記レンズは、前記紫外線照射装置の光源から放射された前記紫外線の所定の光量が前記分岐配管の開口内に照射されるように前記紫外線を拡散又は収束させる光学特性を有することを特徴とする。   The ultraviolet sterilizer of the present invention has a main pipe that serves as a flow path for the water to be treated and a branch pipe connected to the main pipe, and is attached to a position facing the opening of the connection portion of the branch pipe of the main pipe. The light source is a treated water pipe having a hole, a lens watertightly attached to the attachment hole of the treated water pipe, and an ultraviolet light emitting diode that emits ultraviolet rays having an emission peak wavelength in the range of 230 to 290 nm. An ultraviolet irradiation device, the ultraviolet light emitting diode is disposed on the back side of the lens, with the light emitting surface thereof facing the lens side, the lens is the ultraviolet light emitted from the light source of the ultraviolet irradiation device. It has an optical characteristic of diffusing or converging the ultraviolet rays so that the predetermined amount of light is irradiated into the opening of the branch pipe.

本発明の紫外線殺菌装置において、前記主配管に形成された取付け孔は、前記主配管と、前記分岐配管の末端部近傍の軸線とが交差する位置に形成されていることが好ましい。   In the ultraviolet sterilizer of the present invention, it is preferable that the attachment hole formed in the main pipe is formed at a position where the main pipe intersects with an axis near the end of the branch pipe.

本発明の紫外線殺菌装置は、前記分岐管内に、被処理水の抵抗率を測定する抵抗率測定セルが配置されたことが好ましい。   In the ultraviolet sterilizer of the present invention, it is preferable that a resistance measuring cell for measuring the resistivity of the water to be treated is arranged in the branch pipe.

本発明の紫外線殺菌装置において、前記分岐配管は、前記分岐配管の末端部近傍の軸線が前記主配管の軸線に対して傾斜させて前記主配管に接続されていることが好ましい。   In the ultraviolet sterilizer of the present invention, it is preferable that the branch pipe is connected to the main pipe with the axis near the end of the branch pipe being inclined with respect to the axis of the main pipe.

本発明の紫外線殺菌装置において、前記レンズは、前記紫外線発光ダイオードの放射する前記紫外線を拡散させる光学特性を有することが好ましい。また、前記レンズは、石英ガラスからなることが好ましい。   In the ultraviolet sterilizer of the present invention, it is preferable that the lens has an optical characteristic of diffusing the ultraviolet light emitted from the ultraviolet light emitting diode. Further, the lens is preferably made of quartz glass.

本発明の紫外線殺菌装置において、前記主配管は、超純水を製造する超純水製造システムに備えられることが好ましい。   In the ultraviolet sterilizer of the present invention, it is preferable that the main pipe is provided in an ultrapure water production system that produces ultrapure water.

本発明の紫外線殺菌方法は、被処理水の流路となる主配管と前記主配管に接続された分岐配管を有する被処理水配管の内壁面、及び前記被処理水配管内の被処理水を殺菌する紫外線殺菌方法であって、前記主配管の、前記分岐配管の接続部の開口を臨む位置に取付け孔を形成し、前記取付け孔にレンズを水密的に取付け、230〜290nmに発光ピーク波長を有する紫外線発光ダイオードを光源として、前記光源から放射される紫外線を前記レンズによって拡散又は収束させて、前記光源から放射された前記紫外線の所定の光量を前記分岐配管の開口内に照射することを特徴とする。   The ultraviolet sterilization method of the present invention, the inner wall surface of the treated water pipe having a main pipe to be a flow path of the treated water and a branch pipe connected to the main pipe, and the treated water in the treated water pipe An ultraviolet sterilization method for sterilizing, wherein a mounting hole is formed in the main pipe at a position facing an opening of a connecting portion of the branch pipe, a lens is watertightly mounted in the mounting hole, and an emission peak wavelength is 230 to 290 nm. Using an ultraviolet light emitting diode having a light source, the ultraviolet light emitted from the light source is diffused or converged by the lens, and a predetermined amount of the ultraviolet light emitted from the light source is irradiated into the opening of the branch pipe. Characterize.

本発明の超純水製造システムは、前処理部、一次純水製造部及び二次純水製造部を備え、前記一次純水製造部及び前記二次純水製造部がそれぞれ混床式イオン交換樹脂装置を備えた超純水製造システムであって、前記混床式イオン交換樹脂装置の処理水を排出する主配管と前記主配管の少なくとも1つに接続された分岐配管とを有するとともに、前記主配管の、前記分岐配管の接続部の開口を臨む位置に取付け孔の形成された被処理水配管と、前記被処理水配管の前記取付け孔に水密的に取付けられたレンズと、230〜290nmに発光ピーク波長を有する紫外線を放射する紫外線発光ダイオードを光源とする紫外線照射装置とを備え、前記紫外線発光ダイオードは、その光放出面を前記レンズ側に向けて、前記レンズの背面側に配置され、前記レンズは、前記紫外線照射装置の光源から放射された前記紫外線の所定の光量が前記分岐配管の開口内に照射されるように前記紫外線を拡散又は収束させる光学特性を有することを特徴とする。   The ultrapure water production system of the present invention includes a pretreatment unit, a primary pure water production unit, and a secondary pure water production unit, and the primary pure water production unit and the secondary pure water production unit are mixed-bed ion exchange systems, respectively. An ultrapure water production system equipped with a resin device, comprising: a main pipe for discharging treated water of the mixed bed ion exchange resin device; and a branch pipe connected to at least one of the main pipes, 230 to 290 nm, a treated water pipe having a mounting hole formed at a position of the main pipe facing the opening of the connection portion of the branch pipe, a lens watertightly mounted in the mounting hole of the treated water pipe, And an ultraviolet irradiation device having an ultraviolet light emitting diode that emits ultraviolet light having an emission peak wavelength as a light source, and the ultraviolet light emitting diode is disposed on the back side of the lens with its light emitting surface facing the lens side. The lens has an optical characteristic of diffusing or converging the ultraviolet light so that a predetermined amount of the ultraviolet light emitted from the light source of the ultraviolet irradiation device is irradiated into the opening of the branch pipe. ..

本発明の紫外線殺菌装置、紫外線殺菌方法及び超純水製造システムによれば、分岐配管接続部等の微細空間の溜まり水を効果的に殺菌することができる。   ADVANTAGE OF THE INVENTION According to the ultraviolet sterilization apparatus, the ultraviolet sterilization method, and the ultrapure water production system of the present invention, it is possible to effectively sterilize the accumulated water in the microscopic space such as the branch pipe connection portion.

実施形態に係る紫外線殺菌装置を表す概略図である。It is the schematic showing the ultraviolet sterilization apparatus which concerns on embodiment. 分岐配管内に抵抗率測定セルが挿入された場合の紫外線殺菌装置を表す概略図である。It is a schematic diagram showing an ultraviolet sterilizer when a resistivity measurement cell is inserted in a branch pipe. 実施形態に係る超純水製造システムを表わす概略図である。It is a schematic diagram showing the ultrapure water manufacturing system concerning an embodiment.

以下、図面を参照して、実施形態を詳細に説明する。   Hereinafter, embodiments will be described in detail with reference to the drawings.

図1は、本発明の実施形態に係る紫外線殺菌装置1を概略的に示す図である。紫外線殺菌装置1は、例えば、超純水製造システムにおいて、被処理水の流路となる主配管13aと、主配管13aに分岐して設けられた分岐配管13bとを有する被処理水配管13に備えられる。   FIG. 1 is a diagram schematically showing an ultraviolet sterilizer 1 according to an embodiment of the present invention. The ultraviolet sterilizer 1 is, for example, in an ultrapure water production system, in a treated water pipe 13 that includes a main pipe 13a that serves as a flow path for the treated water and a branch pipe 13b that is branched from the main pipe 13a. Be prepared.

主配管13aと分岐配管13bの接続部の配管内に溜まり水が生じた場合、この溜まり水に細菌類18が滞留し、配管壁面に付着して増殖するおそれがある。紫外線殺菌装置1は、紫外線発光ダイオードからの紫外線によってこの溜まり水中に混入する細菌類18を分解、死滅させて、被処理水及び配管内壁面を殺菌するものである。   When accumulated water is generated in the pipe at the connecting portion between the main pipe 13a and the branch pipe 13b, bacteria 18 may accumulate in the accumulated water and adhere to the wall surface of the pipe to grow. The ultraviolet sterilizer 1 decomposes and kills the bacteria 18 mixed in the accumulated water by the ultraviolet light from the ultraviolet light emitting diode to sterilize the water to be treated and the inner wall surface of the pipe.

紫外線殺菌装置1は、波長230〜290nmの発光ピーク波長を有する紫外線を放射する紫外線発光ダイオード11を光源とする紫外線照射装置と、レンズ12とを備えている。紫外線照射装置は、紫外線発光ダイオード11を駆動させる電源装置15を備えている。   The ultraviolet sterilizer 1 is provided with an ultraviolet irradiator that uses an ultraviolet light emitting diode 11 that emits ultraviolet light having an emission peak wavelength of 230 to 290 nm as a light source, and a lens 12. The ultraviolet irradiation device includes a power supply device 15 that drives the ultraviolet light emitting diode 11.

紫外線発光ダイオード11は、光放出面11aが、主配管13a内に露出するように、主配管13aの壁面に設けられる。紫外線発光ダイオード11は、主配管13aと、分岐配管13bの接続部に紫外線を照射するように配置される。   The ultraviolet light emitting diode 11 is provided on the wall surface of the main pipe 13a so that the light emitting surface 11a is exposed inside the main pipe 13a. The ultraviolet light emitting diode 11 is arranged so as to irradiate the connecting portion between the main pipe 13a and the branch pipe 13b with ultraviolet light.

紫外線発光ダイオード11は、電源装置15によって電力が供給されて紫外線を放射するものである。細菌類は、230〜290nmの紫外線により分解あるいは死滅させることができる。そのため、紫外線発光ダイオード11は、230〜290nmに発光ピーク波長を有する紫外線を放射するものであればよい。紫外線発光ダイオード11は、250〜260nmに発光ピーク波長を有する紫外線を放射することが好ましい。また、紫外線発光ダイオード11は、上記波長の紫外線以外にも、200nm付近に発光ピーク波長を有する紫外線を放射してもよい。   The ultraviolet light emitting diode 11 is supplied with electric power by the power supply device 15 and emits ultraviolet light. Bacteria can be decomposed or killed by ultraviolet rays of 230 to 290 nm. Therefore, the ultraviolet light emitting diode 11 may be any one that emits ultraviolet light having an emission peak wavelength in the range of 230 to 290 nm. The ultraviolet light emitting diode 11 preferably emits ultraviolet light having an emission peak wavelength in the range of 250 to 260 nm. Further, the ultraviolet light emitting diode 11 may emit ultraviolet light having an emission peak wavelength near 200 nm, in addition to the ultraviolet light having the above wavelength.

紫外線発光ダイオード11は、例えば、紫外線を発光する半導体素子と、当該半導体素子を内包する透明封止樹脂を有している。この、透明封止樹脂の外表面が、光放出面11aを構成する。光放出面11aの形状は特に限定されず、略平面状であってもよく、ドーム状等の曲率を有する形状であってもよい。紫外線発光ダイオード11は、チップ型、砲弾型のいずれであってもよいが、砲弾型であると、主配管13aに設置し易い。紫外線発光ダイオード11の大きさは、例えば、光放出面11aの大きさが、4〜16mm程度である。光放出面11aの大きさが、上記範囲であると、主配管13aに設置し易く、また、発光ダイオード11の放射する紫外線を照射領域外に拡散させずに、そのほとんどを、照射領域に向けて照射することができ、効率的である。 The ultraviolet light emitting diode 11 has, for example, a semiconductor element that emits ultraviolet rays and a transparent sealing resin that encloses the semiconductor element. The outer surface of this transparent sealing resin constitutes the light emitting surface 11a. The shape of the light emitting surface 11a is not particularly limited and may be a substantially flat shape or a shape having a curvature such as a dome shape. The ultraviolet light emitting diode 11 may be of a chip type or a bullet type, but if it is a bullet type, it can be easily installed in the main pipe 13a. Regarding the size of the ultraviolet light emitting diode 11, for example, the size of the light emitting surface 11 a is about 4 to 16 mm 2 . When the size of the light emitting surface 11a is in the above range, it is easy to install in the main pipe 13a, and most of the ultraviolet rays emitted from the light emitting diode 11 are directed to the irradiation area without being diffused to the outside of the irradiation area. It can be irradiated and is efficient.

紫外線発光ダイオード11の放射する紫外線は直進性が高い、すなわち、紫外線の広がり角が小さい方が好ましい。紫外線の直進性が高い方が、単位面積当たりの紫外線照射量を大きくして、殺菌効率を高めることができるためである。また、紫外線発光ダイオード11の放射する紫外線の直進性が高いほど、後述のレンズ12による光量及び照射領域の調節がし易くなる。紫外線発光ダイオード11の放射する紫外線の広がり角は、紫外線を、照射領域に効率的に照射するために、例えば、4〜20°とすることが好ましい。   It is preferable that the ultraviolet light emitted from the ultraviolet light emitting diode 11 has a high straightness, that is, the spread angle of the ultraviolet light is small. This is because the higher the straightness of ultraviolet rays, the greater the amount of ultraviolet rays irradiated per unit area and the higher the sterilization efficiency. Further, the higher the straightness of the ultraviolet light emitted from the ultraviolet light emitting diode 11, the easier the adjustment of the light amount and the irradiation area by the lens 12 described later. The spread angle of the ultraviolet light emitted from the ultraviolet light emitting diode 11 is preferably, for example, 4 to 20° in order to efficiently irradiate the irradiation region with the ultraviolet light.

紫外線発光ダイオード11の紫外線放射量は、照射領域において細菌類を殺菌するのに必要な光量を得られる出力に調整することができる。照射領域における細菌類の増殖を防止するように、例えば、細菌類が2倍に増殖する時間内に、細菌類が死滅する光量の紫外線を照射できるように紫外線発光ダイオード11の紫外線放射量を調整する。このとき、例えば、レンズ12及び被処理水配管13内の水による紫外線の減衰や散乱による光量の損失は40〜60%に設定することができる。紫外線発光ダイオード11の紫外線放射量は、紫外線殺菌装置1の設置個所や、主配管13a、分岐配管13bの内径、被処理水の流量等にもよるが、照射領域における後述の光量を得るために、例えば、1mW〜30mWである。   The amount of ultraviolet radiation of the ultraviolet light emitting diode 11 can be adjusted to an output that can obtain the amount of light necessary for sterilizing bacteria in the irradiation region. In order to prevent the growth of bacteria in the irradiation area, for example, the ultraviolet radiation amount of the ultraviolet light emitting diode 11 is adjusted so that the bacteria can be irradiated with the amount of ultraviolet light that kills the bacteria within a time period in which the bacteria multiply twice. To do. At this time, for example, the loss of the amount of light due to the attenuation and scattering of ultraviolet rays due to the water in the lens 12 and the water to be treated 13 can be set to 40 to 60%. The amount of ultraviolet radiation of the ultraviolet light emitting diode 11 depends on the installation location of the ultraviolet sterilizer 1, the inner diameters of the main pipe 13a and the branch pipe 13b, the flow rate of the water to be treated, etc. , 1 mW to 30 mW, for example.

レンズ12は、紫外線発光ダイオード11から放射される紫外線を収束又は発散させる光学特性を有する。これにより、レンズ12は、紫外線発光ダイオード11から放射される紫外線を所定の照射領域に所定の光量で照射する。照射領域は、細菌類の付着し易い領域であり、具体的には、分岐配管13bの主配管13aとの接続部の開口内、及び当該開口の近傍である。レンズ12により照射領域に照射される紫外線の光量は、照射領域に存在する細菌類を殺菌できる光量であり、例えば、5000μW・sec/cm〜500000μW・sec/cmである。照射領域に照射される紫外線の光量は、小さすぎると、殺菌効果が不十分となることがあり、大きすぎると紫外線が照射される配管が劣化するおそれがある。 The lens 12 has an optical property of converging or diverging the ultraviolet light emitted from the ultraviolet light emitting diode 11. As a result, the lens 12 irradiates the ultraviolet light emitted from the ultraviolet light emitting diode 11 to a predetermined irradiation region with a predetermined light amount. The irradiation region is a region where bacteria easily attach, and specifically, is inside the opening of the connection portion of the branch pipe 13b with the main pipe 13a and in the vicinity of the opening. The light amount of the ultraviolet rays applied to the irradiation region by the lens 12 is a light amount capable of sterilizing the bacteria existing in the irradiation region, and is, for example, 5000 μW·sec/cm 2 to 500,000 μW·sec/cm 2 . If the amount of ultraviolet rays applied to the irradiation area is too small, the bactericidal effect may be insufficient, and if it is too large, the piping irradiated with ultraviolet rays may deteriorate.

レンズ12は、紫外線発光ダイオード11の光放出面11a上に配置されて、主配管13a内に露出した光放出面11aを水密的に封止する。レンズ12の材質は、耐水性を有し、かつ、紫外線発光ダイオード11の放射する230〜290nmに発光ピーク波長を有する紫外線を透過するものであり、例えば、天然石英ガラス、合成石英ガラス等の石英ガラスである。   The lens 12 is disposed on the light emitting surface 11a of the ultraviolet light emitting diode 11, and seals the light emitting surface 11a exposed in the main pipe 13a in a watertight manner. The material of the lens 12 is water resistant and transmits ultraviolet rays having an emission peak wavelength in the range of 230 to 290 nm emitted from the ultraviolet light emitting diode 11, and is made of, for example, quartz such as natural quartz glass or synthetic quartz glass. It is glass.

レンズ12の形状は、上記光学特性を有する形状であり、紫外線を照射しようとする照射領域の範囲や位置、照射領域に照射する紫外線の光量に応じて、適宜設計することができる。   The shape of the lens 12 is a shape having the above-mentioned optical characteristics, and can be appropriately designed according to the range and position of the irradiation area to be irradiated with ultraviolet rays, and the amount of ultraviolet rays irradiated to the irradiation area.

レンズ12の形状は、例えば、両主面を球面にしたレンズ、主面の一方を球面、他方を平面としたレンズ、主面の一方又は両者を球面及び平面以外の形状とした非球面レンズ等であるが、これに限定されない。例えば、レンズ12は、紫外線発光ダイオード11の放射する紫外線を収束させる凸レンズ、紫外線を発散させる凹レンズ等である。例えば、より直進性の高い紫外線発光ダイオード11を用いる場合、紫外線発光ダイオード11の放射する紫外線が、照射領域の全体に照射されるように、紫外線を発散させる凹レンズが使用可能である。   The shape of the lens 12 is, for example, a lens having both main surfaces spherical, a lens having one of the main surfaces spherical and the other surface flat, and an aspherical lens having one or both of the main surfaces other than spherical and flat. However, the present invention is not limited to this. For example, the lens 12 is a convex lens that converges the ultraviolet light emitted from the ultraviolet light emitting diode 11, a concave lens that diverges the ultraviolet light, or the like. For example, in the case of using the ultraviolet light emitting diode 11 having a higher straightness, it is possible to use a concave lens that diverges the ultraviolet light so that the ultraviolet light emitted from the ultraviolet light emitting diode 11 is applied to the entire irradiation area.

また、レンズ12は、紫外線発光ダイオード11から放射された紫外線の所定の光量が照射領域に照射されるように、厚みや大きさが設計される。   The thickness and size of the lens 12 are designed so that a predetermined amount of ultraviolet light emitted from the ultraviolet light emitting diode 11 is applied to the irradiation area.

紫外線殺菌装置1は、例えば、被処理水配管13の、分岐配管13bの接続部の開口を臨む位置に取付け孔を設け、当該取付け孔にレンズ12をはめ込み固定して、さらに、レンズ12を介して紫外線が照射されるように、紫外線発光ダイオード11を配置、固定することで設置される。   The ultraviolet sterilizer 1 is provided with, for example, a mounting hole in the treated water pipe 13 at a position facing the opening of the connecting portion of the branch pipe 13b, and a lens 12 is fitted and fixed in the mounting hole. It is installed by disposing and fixing the ultraviolet light emitting diode 11 so that the ultraviolet light is emitted.

取付け孔は、主配管13aと、分岐配管13bの末端部近傍の軸線Lが交差する位置に形成されることが好ましい。これにより、紫外線殺菌装置1は、分岐配管13bの軸線Lと略平行方向に紫外線を照射するため、照射領域に、より大きな照射量の紫外線を照射することができる。 Mounting hole is mainly a pipe 13a, the axis L b of the end portion near the branch pipe 13b is preferably formed at the intersection. Thereby, the ultraviolet sterilizer 1 irradiates the ultraviolet rays in a direction substantially parallel to the axis L b of the branch pipe 13b, and thus can irradiate the irradiation region with a larger amount of ultraviolet rays.

被処理水配管13に設置される紫外線殺菌装置1の数は1つであっても2つ以上であってもよい。2つ以上の紫外線殺菌装置1を設置する場合には、所望の照射領域に集中して紫外線が照射されるように、各々レンズ12の形状を設計する。2つ以上の紫外線殺菌装置1を用いることで、照射領域に照射される光量を増やすことができるので、殺菌効果の向上を得ることができる。   The number of the ultraviolet sterilizers 1 installed in the treated water pipe 13 may be one or two or more. When two or more ultraviolet ray sterilizers 1 are installed, the shape of each lens 12 is designed so that the ultraviolet rays are concentrated on a desired irradiation area. By using two or more ultraviolet sterilizers 1, the amount of light applied to the irradiation area can be increased, and thus the sterilization effect can be improved.

また、被処理水配管13に2つ以上の紫外線殺菌装置1を設置する場合には、これらの紫外線殺菌装置1は、例えば、主配管13aの外周に沿って配置してもよいし、主配管13aの軸線Lと平行に配置してもよい。また、2つ以上の紫外線殺菌装置1を設置する場合には、これら2つ以上の紫外線殺菌装置の紫外線放射量が上記好ましい範囲になるように設計する。 When two or more ultraviolet ray sterilizers 1 are installed in the treated water pipe 13, the ultraviolet ray sterilizers 1 may be arranged along the outer periphery of the main pipe 13a, for example. it may be arranged parallel to the axis L a of 13a. When two or more ultraviolet sterilizers 1 are installed, the ultraviolet sterilizers of these two or more ultraviolet sterilizers are designed so that the amount of ultraviolet radiation falls within the above preferable range.

被処理水配管13の主配管13a及び分岐配管13bは、超純水中への成分の溶出の少ない材料で構成される。このような材料は、例えば、ポリ塩化ビニル(PVC)、ポリフェニレンサルファイド(PPS)、ポリフッ化ビニリデン(PVDF)、繊維強化プラスチック(FRP)、テトラフルオロエチレン・パーフルオロアルキルビニルエーテル共重合体(PFA)、ステンレス鋼等であるが、これらに限定されない。   The main pipe 13a and the branch pipe 13b of the to-be-treated water pipe 13 are made of a material that hardly elutes components into the ultrapure water. Examples of such a material include polyvinyl chloride (PVC), polyphenylene sulfide (PPS), polyvinylidene fluoride (PVDF), fiber reinforced plastic (FRP), tetrafluoroethylene/perfluoroalkyl vinyl ether copolymer (PFA), Examples of the material include, but are not limited to, stainless steel.

分岐配管13bは、例えば、主配管13aに設けられた接続口に、継手等によって接続される。また、上記材料によって、主配管13aと分岐配管13bを有する形状の被処理水配管13を作成して、使用してもよい。   The branch pipe 13b is connected to a connection port provided in the main pipe 13a by a joint or the like, for example. Moreover, you may create and use the to-be-processed water piping 13 of the shape which has the main piping 13a and the branch piping 13b with the said material.

被処理水配管13において、分岐配管13bには必要に応じて被処理水が通流されるように、バルブなどが介挿される。このバルブは例えば、水質を測定するためのサンプル水を採取するサンプリングバルブである。また、被処理水の水質を測定するために、分岐配管13bに抵抗率計、導電率計、温度計等の水質測定機器が挿入されることもある。水質測定用のサンプル水に細菌類が混入した場合、水質を正確に測定できない。そのため、本実施形態の紫外線殺菌装置1は、水質測定用のサンプル水を採取する箇所や、主配管13aの、水質を測定する箇所に設置すると効果的である。   In the treated water pipe 13, a valve or the like is inserted so that the treated water flows through the branch pipe 13b as necessary. This valve is, for example, a sampling valve that collects sample water for measuring water quality. Further, in order to measure the water quality of the water to be treated, a water quality measuring device such as a resistivity meter, a conductivity meter, or a thermometer may be inserted in the branch pipe 13b. If bacteria are mixed in the sample water for water quality measurement, the water quality cannot be measured accurately. Therefore, it is effective to install the ultraviolet sterilizer 1 of the present embodiment at a location where sample water for water quality measurement is collected or at a location of the main pipe 13a where water quality is measured.

主配管13aと分岐配管13bの接続態様は、例えば、分岐配管13bの末端近傍の軸線Lが主配管13aの軸線Lに対して略垂直の配置、分岐配管13bの末端近傍の軸線Lが主配管13aの軸線Lに対して傾斜させて接続された配置等であり、特に限定されない。 Connection mode of the main pipe 13a and the branch pipe 13b, for example, arranged substantially perpendicular to the axis L a of the axis L b is the main pipe 13a of the end near the branch pipe 13b, the axis L b terminus near the branch pipe 13b Is an arrangement in which the main pipe 13a is connected with being inclined with respect to the axis L a of the main pipe 13a, and is not particularly limited.

主配管13a及び分岐配管13bの内径は、主配管13aを設置する装置の構造に応じて適宜設定される。例えば、超純水製造装置では、主配管13aの内径は例えば10〜200mmである。分岐配管13bの内径は主配管13aより小さいと、溜まり水を生じやすいため、多大な効果が得られる。分岐配管13bの内径は、例えば、5〜50mmである。   The inner diameters of the main pipe 13a and the branch pipe 13b are appropriately set according to the structure of the apparatus in which the main pipe 13a is installed. For example, in the ultrapure water production system, the inner diameter of the main pipe 13a is, for example, 10 to 200 mm. If the inner diameter of the branch pipe 13b is smaller than that of the main pipe 13a, accumulated water is likely to be generated, so that a great effect can be obtained. The inner diameter of the branch pipe 13b is, for example, 5 to 50 mm.

本実施形態の紫外線殺菌装置1によれば、主配管13aと分岐配管13bの接続部分の溜まり水等を効果的に殺菌することができる。そのため、溜まり水での細菌や微生物の滞殖を防ぐことができる。また、紫外線の光源として、低圧紫外線ランプ等に比べて極めて小型の紫外線発光ダイオードを用いるため、設置個所や設置方法の自由度が高く、所望の照射領域を効果的に殺菌することができる。   According to the ultraviolet sterilizer 1 of the present embodiment, it is possible to effectively sterilize the accumulated water and the like at the connection portion between the main pipe 13a and the branch pipe 13b. Therefore, it is possible to prevent bacteria and microorganisms from accumulating in the accumulated water. Further, since an ultraviolet light emitting diode, which is extremely small in size as compared with a low-pressure ultraviolet lamp or the like, is used as a light source of ultraviolet light, there is a high degree of freedom in installation location and installation method, and a desired irradiation area can be effectively sterilized.

図2に、抵抗率計等の水質測定器機の測定セルが分岐配管13b内に挿入された被処理水配管13に設置される紫外線殺菌装置2を概略的に示す図である。図2において、図1に示す紫外線殺菌装置1と同様の機能を奏する構成には同一の符号を付して重複する説明を省略する。   FIG. 2 is a diagram schematically showing the ultraviolet sterilizer 2 installed in the treated water pipe 13 in which the measurement cell of a water quality measuring instrument such as a resistivity meter is inserted into the branch pipe 13b. In FIG. 2, components having the same functions as those of the ultraviolet sterilizer 1 shown in FIG. 1 are designated by the same reference numerals, and redundant description will be omitted.

紫外線殺菌装置2の設置される被処理水配管131では、分岐配管131bの末端近傍の軸線Lが主配管131aの軸線Lに対して傾斜して接続されている。分岐配管131bには抵抗率計19が配置されている。 In the treated water pipe 131 in which the ultraviolet sterilizer 2 is installed, the axis L c near the end of the branch pipe 131 b is connected to the main pipe 131 a with an inclination with respect to the axis L d . A resistivity meter 19 is arranged in the branch pipe 131b.

抵抗率計19は、被処理水と接触して抵抗率を測定する測定セル19aを備えており、測定セル19aが、分岐配管131b内に挿入されて配置される。測定セル19aの近傍で細菌類が発生、増殖した場合、水質を正確に測定できなくなる。実施形態の紫外線殺菌装置2を設置することで、このような懸念を解消することができる。また、紫外線殺菌装置2は、紫外線発光ダイオード11を光源としているため、小型化が容易であり、消費電力も小さい。そのため、分岐配管接続部等の微細空間の溜まり水を効率的かつ効果的に、殺菌することができる。   The resistivity meter 19 includes a measuring cell 19a that contacts the water to be treated to measure the resistivity, and the measuring cell 19a is inserted and arranged in the branch pipe 131b. When bacteria are generated and proliferated in the vicinity of the measurement cell 19a, the water quality cannot be measured accurately. By installing the ultraviolet sterilizer 2 of the embodiment, such a concern can be eliminated. Further, since the ultraviolet sterilizer 2 uses the ultraviolet light emitting diode 11 as a light source, it is easy to miniaturize and the power consumption is small. Therefore, it is possible to efficiently and effectively sterilize the accumulated water in the fine space such as the branch pipe connecting portion.

(超純水製造システム)
図3は、第1の実施形態の紫外線殺菌装置1を備えた超純水製造システム3を概略的に示す図である。超純水製造システム3は、前処理部31、一次純水製造部41、二次純水製造部51を備えている。
(Ultrapure water production system)
FIG. 3 is a diagram schematically showing an ultrapure water production system 3 including the ultraviolet sterilization apparatus 1 of the first embodiment. The ultrapure water production system 3 includes a pretreatment unit 31, a primary pure water production unit 41, and a secondary pure water production unit 51.

前処理部31は、凝集・ろ過・沈殿装置等を備えて、原水中の濁質分等を除去し、前処理水を生成するものである。原水は、市水、井水、工業用水等や、半導体製造工場で使用された超純水を回収して処理した使用済み超純水であるが、これらに限定されない。   The pretreatment unit 31 includes a coagulation/filtration/precipitation device and the like, and removes suspended matter and the like in the raw water to generate pretreated water. Raw water is, for example, city water, well water, industrial water, and used ultrapure water obtained by collecting and treating ultrapure water used in semiconductor manufacturing plants, but is not limited thereto.

一次純水製造部41は、前処理水中のほとんどのイオン成分及び非イオン成分を除去して、一次純水を生成する。一次純水製造部41は、陽イオン交換樹脂装置、脱炭酸塔及び陰イオン交換樹脂装置からなる2床3塔型装置(2B3T)42、逆浸透膜装置(RO)43、紫外線酸化装置(TOC−UV)44、混床式イオン交換樹脂装置(MB)45を備えている。一次純水製造部41において、2床3塔型装置(2B3T)42に代えて逆浸透膜装置(RO)を配置した、2段RO装置を用いてもよい。紫外線酸化装置44は、例えば、被処理水に、低圧紫外線ランプ又は発光ダイオードによって、波長180〜190nmにピーク波長を有する紫外線を照射して有機物を分解するものである。一次純水製造部41で製造された一次純水はタンク46に貯留される。   The primary pure water producing unit 41 removes most of the ionic components and non-ionic components in the pretreated water to generate primary pure water. The primary pure water production unit 41 includes a two-bed, three-tower type device (2B3T) 42, a reverse osmosis membrane device (RO) 43, an ultraviolet oxidation device (TOC), which is composed of a cation exchange resin device, a decarboxylation tower and an anion exchange resin device. -UV) 44 and a mixed bed type ion exchange resin device (MB) 45. In the primary pure water production unit 41, a two-stage RO device in which a reverse osmosis membrane device (RO) is arranged instead of the two-bed, three-column type device (2B3T) 42 may be used. The ultraviolet oxidizer 44 irradiates the water to be treated with ultraviolet rays having a peak wavelength of 180 to 190 nm by a low-pressure ultraviolet lamp or a light emitting diode to decompose organic substances. The primary pure water produced by the primary pure water producing unit 41 is stored in the tank 46.

二次純水製造部51は、タンク46内の一次純水を供給して、該一次純水中の微量有機物や微量微粒子を除去する。二次純水製造部51は、紫外線酸化装置(TOC−UV)52、膜脱気装置(MDG)53、非再生型混床式イオン交換樹脂装置(Polisher)54、限外ろ過装置(UF)55を組み合わせて構成される。二次純水製造部51で得られた超純水は使用場所であるユースポイント(POU)56に供給される。二次純水製造部51で得られる超純水は、例えば、TOC濃度が5μgC/L以下、抵抗率が17.5MΩ・cm以上である。   The secondary pure water producing unit 51 supplies the primary pure water in the tank 46 to remove a trace amount of organic substances and a trace amount of fine particles in the primary pure water. The secondary pure water producing unit 51 includes an ultraviolet oxidation device (TOC-UV) 52, a membrane degassing device (MDG) 53, a non-regeneration type mixed bed type ion exchange resin device (Polisher) 54, and an ultrafiltration device (UF). It is configured by combining 55. The ultrapure water obtained in the secondary pure water production unit 51 is supplied to a point of use (POU) 56, which is the place of use. The ultrapure water obtained in the secondary pure water producing unit 51 has, for example, a TOC concentration of 5 μg C/L or less and a resistivity of 17.5 MΩ·cm or more.

超純水製造システム3は、一次純水製造部41の混床式イオン交換樹脂装置(MB)45の後段と、二次純水製造部51の、非再生型混床式イオン交換樹脂装置(Polisher)54の後段に、抵抗率計19を備えている。混床式イオン交換樹脂装置(MB)45の処理水の排出管(主配管13a)及び非再生型混床式イオン交換樹脂装置(Polisher)54の処理水の排出管(主配管13a)に、分岐配管13bが接続され、分岐配管13bにそれぞれ、測定セル19aが挿入されることで、抵抗率計19が設置されている。   The ultrapure water production system 3 includes a non-regeneration type mixed-bed ion exchange resin device (in the secondary pure water production unit 51, which is provided in the subsequent stage of the mixed bed ion exchange resin device (MB) 45 of the primary pure water production unit 41. A resistivity meter 19 is provided after the Polisher 54. To the discharge pipe (main pipe 13a) of the mixed-bed ion exchange resin device (MB) 45 and the treated water discharge pipe (main pipe 13a) of the non-regeneration type mixed-bed ion-exchange resin device (Polisher) 54, The branch pipe 13b is connected, and the measuring cell 19a is inserted into each of the branch pipes 13b, whereby the resistivity meter 19 is installed.

また、超純水製造システム3は、上記実施形態の紫外線殺菌装置1を備えている。紫外線殺菌装置1は、主配管13aの、分岐配管13bの接続口と対向する壁面に、紫外線発光ダイオード11の光放出面11aが位置するように設置されている。   Further, the ultrapure water production system 3 includes the ultraviolet sterilizer 1 of the above embodiment. The ultraviolet sterilizer 1 is installed so that the light emitting surface 11a of the ultraviolet light emitting diode 11 is located on the wall surface of the main pipe 13a facing the connection port of the branch pipe 13b.

超純水製造システム3における水質の測定に際して、測定セル19aの近傍で細菌類が発生、増殖した場合、水質を正確に測定できない。実施形態の紫外線殺菌装置1を設置することで、このような懸念を解消することができ、効果的である。また、紫外線殺菌装置1は、紫外線発光ダイオード11を光源としているため、小型化が容易であり、消費電力も小さい。特に、極めて純度の高い超純水を製造する場合、分岐配管接続部等の微細空間の溜まり水を効果的に殺菌することで、水質向上効果も得られる。また、純度の高い超純水を製造する場合には、超純水製造システムのユニット数が多くなるが、実施形態の紫外線殺菌装置1によれば、設置態様の自由度が高く、設置スペースも小さくできるので、このような大型の超純水製造システムにも適している。   When measuring the water quality in the ultrapure water production system 3, if bacteria are generated and proliferated in the vicinity of the measurement cell 19a, the water quality cannot be accurately measured. By installing the ultraviolet sterilizer 1 of the embodiment, such a concern can be eliminated and it is effective. Further, since the ultraviolet sterilizer 1 uses the ultraviolet light emitting diode 11 as a light source, it is easy to miniaturize and the power consumption is small. In particular, in the case of producing ultrapure water of extremely high purity, the effect of improving the water quality can be obtained by effectively sterilizing the pooled water in the fine space such as the branch pipe connecting portion. Further, in the case of producing high-purity ultrapure water, the number of units of the ultrapure water production system increases, but according to the ultraviolet sterilizer 1 of the embodiment, the degree of freedom of installation is high and the installation space is also large. Since it can be made small, it is also suitable for such a large-scale ultrapure water production system.

なお、超純水製造システム3では、混床式イオン交換樹脂装置(MB)45の後段と、非再生型混床式イオン交換樹脂装置(Polisher)54の後段に、抵抗率計19を設けた態様を示したが、抵抗率計19の設置個所はこれに限られず、限外ろ過装置55の後段に配置されてもよい。また、超純水製造システム3における抵抗率計19の設置台数は、1台でもよく、2台以上であってもよい。抵抗率計19の設置台数は、必要に応じて適宜設定される。また、必要に応じて、紫外線殺菌装置1の設置台数も適宜変更することができる。   In the ultrapure water production system 3, the resistivity meter 19 was provided at the subsequent stage of the mixed bed type ion exchange resin device (MB) 45 and the non-regeneration type mixed bed type ion exchange resin device (Polisher) 54. Although the embodiment has been described, the location of the resistivity meter 19 is not limited to this, and the resistivity meter 19 may be disposed at the subsequent stage of the ultrafiltration device 55. The number of resistivity meters 19 installed in the ultrapure water production system 3 may be one or two or more. The number of installed resistivity meters 19 is appropriately set as necessary. Moreover, the number of installed ultraviolet sterilizers 1 can be changed as appropriate.

また、超純水製造システム3では、抵抗率計19の配置個所に紫外線殺菌装置1を設置する態様を示したが、例えば、水質測定機器として、導電率計を使用する場合には、逆浸透膜装置43の後段等に、導電率計と紫外線殺菌装置1を組み合わせて設置される。水質測定機器として、温度計を使用する場合には、例えば、タンク46の後段に設置される熱交換器(図示せず)の後段等に、温度計と紫外線殺菌装置1を組み合わせて設置される。これらの場合も、上記抵抗率計19と紫外線殺菌装置1を組み合わせて用いた場合と同様の効果が得られる。   Further, in the ultrapure water production system 3, the mode in which the ultraviolet sterilizer 1 is installed at the location where the resistivity meter 19 is arranged is shown. For example, when a conductivity meter is used as the water quality measuring device, reverse osmosis is performed. The conductivity meter and the ultraviolet sterilizer 1 are installed in combination at the subsequent stage of the membrane device 43. When a thermometer is used as the water quality measuring device, for example, the thermometer and the ultraviolet sterilizer 1 are installed in combination in the subsequent stage of a heat exchanger (not shown) installed in the subsequent stage of the tank 46. .. In these cases as well, the same effect as when the resistivity meter 19 and the ultraviolet sterilizer 1 are used in combination is obtained.

1,2…紫外線殺菌装置、3…超純水製造システム、11…紫外線発光ダイオード、11a…光放出面、12…レンズ、13,131…被処理水配管、13a,131a…主配管、13b,131b…分岐配管、15…電源装置、18…細菌類、19…抵抗率計、19a…測定セル、31…前処理部、41…一次純水製造部、42…2床3塔型装置装置(2B3T)、43…逆浸透膜装置(RO)、44…紫外線酸化装置(TOC−UV)、45…混床式イオン交換樹脂装置、46…タンク、51…二次純水製造部、52…紫外線酸化装置(TOC−UV)、53…膜脱気装置(MDG)、54…非再生型混床式イオン交換樹脂装置(Polisher)、55…限外ろ過装置(UF)、56…ユースポイント(POU)。   1, 2... Ultraviolet sterilizer, 3... Ultrapure water production system, 11... Ultraviolet light emitting diode, 11a... Light emitting surface, 12... Lens, 13, 131... Treated water pipe, 13a, 131a... Main pipe, 13b, 131b... Branch pipe, 15... Power supply device, 18... Bacteria, 19... Resistivity meter, 19a... Measuring cell, 31... Pretreatment unit, 41... Primary pure water production unit, 42... Two-bed, three-tower type device device ( 2B3T), 43... Reverse osmosis membrane device (RO), 44... Ultraviolet oxidation device (TOC-UV), 45... Mixed bed type ion exchange resin device, 46... Tank, 51... Secondary pure water production section, 52... UV ray Oxidizer (TOC-UV), 53... Membrane deaerator (MDG), 54... Non-regenerative mixed bed type ion exchange resin device (Polisher), 55... Ultrafiltration device (UF), 56... Use point (POU) ).

Claims (9)

被処理水の流路となる主配管と前記主配管に接続された分岐配管とを有するとともに、前記主配管において、前記分岐配管と前記主配管との接続部の開口を臨む位置に取付け孔が形成された被処理水配管と、
前記被処理水配管の前記取付け孔に水密的に取付けられたレンズと、
230〜290nmに発光ピーク波長を有する紫外線を放射する紫外線発光ダイオードを光源とする紫外線照射装置とを備え、
前記紫外線発光ダイオードは、その光放出面を前記レンズ側に向けて、前記レンズの背面側に配置され、
前記レンズは、前記紫外線発光ダイオードから放射された前記紫外線を拡散又は収束させる光学特性を有し、かつ、前記紫外線の所定の光量が前記分岐配管の開口内に照射されるように配置され、
前記分岐配管に、前記被処理水の水質測定を行うための水質測定器が配置されていることを特徴とする紫外線殺菌装置。
While having a main pipe that serves as a flow path for the water to be treated and a branch pipe connected to the main pipe, in the main pipe, a mounting hole is provided at a position facing an opening of a connecting portion between the branch pipe and the main pipe. The treated water pipe formed,
A lens watertightly mounted in the mounting hole of the water pipe to be treated,
An ultraviolet irradiation device using an ultraviolet light emitting diode that emits ultraviolet light having an emission peak wavelength of 230 to 290 nm as a light source,
The ultraviolet light emitting diode is arranged on the back side of the lens, with its light emitting surface facing the lens side,
The lens has an optical characteristic of diffusing or converging the ultraviolet light emitted from the ultraviolet light emitting diode, and is arranged so that a predetermined amount of the ultraviolet light is irradiated into the opening of the branch pipe,
The branch piping, the ultraviolet sterilizer, characterized in that the water quality measuring device is arranged for performing quality measurements of the water to be treated.
前記水質測定器が、前記被処理水の抵抗率を測定する抵抗率測定セルであることを特徴とする請求項1に記載の紫外線殺菌装置。   The said water quality measuring device is a resistivity measuring cell which measures the resistivity of the said to-be-processed water, The ultraviolet sterilizer of Claim 1 characterized by the above-mentioned. 前記レンズは、前記紫外線発光ダイオードの放射する紫外線を拡散させる光学特性を有することを特徴とする請求項1又は2に記載の紫外線殺菌装置。   3. The ultraviolet sterilizer according to claim 1, wherein the lens has an optical characteristic of diffusing the ultraviolet light emitted from the ultraviolet light emitting diode. 前記主配管に形成された取付け孔は、前記主配管と、前記分岐配管の前記主配管との接続部近傍の軸線とが交差する位置に形成されていることを特徴とする請求項1乃至3のいずれか1項に記載の紫外線殺菌装置。 Mounting holes formed in the main pipe, the main pipe and, according to claim 1 to 3 wherein the axis of the connecting portion near to the main pipe of the branch pipe, characterized in that it is formed at the intersection The ultraviolet sterilizer according to any one of 1. 前記分岐配管は、前記分岐配管の前記主配管との接続部近傍の軸線が前記主配管の軸線に対して傾斜させて、前記主配管に接続されていることを特徴とする請求項1乃至4のいずれか1項に記載の紫外線殺菌装置。 The branch pipe, according to claim 1 to 4 the axis of the connecting portion near to the main pipe of the branch pipe is tilted with respect to the axis of the main pipe, characterized in that it is connected to the main pipe The ultraviolet sterilizer according to any one of 1. 前記レンズは、石英ガラスからなることを特徴とする請求項1乃至5のいずれか1項に記載の紫外線殺菌装置。 The ultraviolet sterilizer according to any one of claims 1 to 5 , wherein the lens is made of quartz glass. 前記主配管は、超純水を製造する超純水製造システムに備えられることを特徴とする請求項1乃至6のいずれか1項に記載の紫外線殺菌装置。 The ultraviolet sterilizer according to any one of claims 1 to 6 , wherein the main pipe is provided in an ultrapure water production system that produces ultrapure water. 被処理水の流路となる主配管と前記主配管に接続された分岐配管を有する被処理水配管の内壁面、及び前記被処理水配管内の被処理水を殺菌する紫外線殺菌方法であって、
前記主配管において、前記分岐配管と前記主配管との接続部の開口を臨む位置に取付け孔が形成され、前記取付け孔にレンズが水密的に取付けられており、
230〜290nmに発光ピーク波長を有する紫外線発光ダイオードを光源として、前記光源から紫外線を放射し、
前記放射された紫外線を前記レンズによって拡散又は収束させて、前記紫外線の所定の光量を前記分岐配管の開口内に照射し、
前記分岐配管内に配置された、前記被処理水の水質測定を行うための水質測定器を用い、前記被処理水の水質を測定することを特徴とする紫外線殺菌方法。
An inner wall surface of a treated water pipe having a main pipe that is a flow path of the treated water and a branch pipe connected to the main pipe, and an ultraviolet sterilization method for sterilizing the treated water in the treated water pipe. ,
In the main pipe, a mounting hole is formed at a position facing an opening of a connecting portion between the branch pipe and the main pipe, and a lens is watertightly mounted in the mounting hole.
Using an ultraviolet light emitting diode having an emission peak wavelength in the range of 230 to 290 nm as a light source, emitting ultraviolet light from the light source,
The emitted ultraviolet rays are diffused or converged by the lens, and a predetermined amount of the ultraviolet rays is irradiated into the opening of the branch pipe,
Wherein disposed in the branch pipe, the use of a water quality measuring instrument for performing quality measurements of the water to be treated, prior Symbol ultraviolet sterilization method characterized by measuring the water quality of the water to be treated.
前処理部、一次純水製造部及び二次純水製造部を備え、
前記一次純水製造部及び前記二次純水製造部がそれぞれ混床式イオン交換樹脂装置を備えた超純水製造システムであって、
前記混床式イオン交換樹脂装置で処理された処理水の流路となる主配管と前記主配管の少なくとも1つに接続された分岐配管とを有するとともに、前記主配管において、前記分岐配管と前記主配管との接続部の開口を臨む位置に取付け孔が形成された被処理水配管と、
前記被処理水配管の前記取付け孔に水密的に取付けられたレンズと、
230〜290nmに発光ピーク波長を有する紫外線を放射する紫外線発光ダイオードを光源とする紫外線照射装置とを備え、
前記紫外線発光ダイオードは、その光放出面を前記レンズ側に向けて、前記レンズの背面側に配置され、
前記レンズは、前記紫外線発光ダイオードから放射された前記紫外線を拡散又は収束させる光学特性を有し、かつ、前記紫外線の所定の光量が前記分岐配管の開口内に照射されるように配置され、
前記分岐配管内に、前記被処理水の水質測定を行うための水質測定器が配置されていることを特徴とする超純水製造システム。
A pretreatment unit, a primary pure water production unit and a secondary pure water production unit are provided.
The primary pure water production section and the secondary pure water production section are ultra pure water production systems each equipped with a mixed bed type ion exchange resin device,
While having a main pipe serving as a flow path of treated water treated by the mixed bed ion exchange resin device and a branch pipe connected to at least one of the main pipes, in the main pipe, the branch pipe and the A treated water pipe in which a mounting hole is formed at a position facing the opening of the connection portion with the main pipe;
A lens watertightly mounted in the mounting hole of the water pipe to be treated,
An ultraviolet irradiation device using an ultraviolet light emitting diode that emits ultraviolet light having an emission peak wavelength of 230 to 290 nm as a light source,
The ultraviolet light emitting diode is arranged on the back side of the lens, with its light emitting surface facing the lens side,
The lens has an optical characteristic of diffusing or converging the ultraviolet light emitted from the ultraviolet light emitting diode, and is arranged so that a predetermined amount of the ultraviolet light is irradiated into the opening of the branch pipe,
The branch in the piping, the ultrapure water production system, characterized in that the water quality measuring device for performing quality measurements of the water to be treated is arranged.
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CN104803445B (en) * 2015-04-09 2016-08-17 国家海洋技术中心 Ultraviolet sterilizer under water
CN204625248U (en) * 2015-04-09 2015-09-09 国家海洋技术中心 Ultraviolet sterilizer under water
JP6571460B2 (en) * 2015-09-07 2019-09-04 日機装株式会社 Sterilizer

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JP2017225925A (en) 2017-12-28

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