JP6641976B2 - Substrate temperature controller - Google Patents

Substrate temperature controller Download PDF

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JP6641976B2
JP6641976B2 JP2015247359A JP2015247359A JP6641976B2 JP 6641976 B2 JP6641976 B2 JP 6641976B2 JP 2015247359 A JP2015247359 A JP 2015247359A JP 2015247359 A JP2015247359 A JP 2015247359A JP 6641976 B2 JP6641976 B2 JP 6641976B2
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substrate
temperature
temperature control
support pin
support pins
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JP2017112304A (en
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朋江 安士
朋江 安士
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Toppan Inc
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本発明は、液晶ディスプレイ装置やプラズマディスプレイ装置用のガラス基板等の基板を加工用に熱処理する基板温調装置に関する。   The present invention relates to a substrate temperature control apparatus for performing a heat treatment for processing a substrate such as a glass substrate for a liquid crystal display device or a plasma display device.

近年の液晶表示ディスプレイ(LCD)装置の画面の高精細化に伴い、高感度レジスト液が用いられるようになってきており、LCD基板に形成される画素の開口率が40%以下に小さくなる低開口率化と、カラーフィルタパターンの線幅が3μm程度に細線化が進んできている。   With the recent increase in definition of the screen of a liquid crystal display (LCD) device, a highly sensitive resist solution has been used, and the aperture ratio of pixels formed on the LCD substrate has been reduced to 40% or less. The aperture ratio and the line width of the color filter pattern have been reduced to about 3 μm.

このようなカラーフィルタの色画素パターンの製造工程では、被処理体である矩形状のLCD基板にレジスト塗布装置にてフォトレジスト膜を塗布形成する。その後、フォトレジスト膜を塗布したLCD基板を基板温調装置にて加熱するプリベーク処理を施した後冷却し、露光装置にて所定のパターンを露光し、露光後のLCD基板を現像装置にて現像した後に基板温調装置にて加熱するポストベーク処理を施した後冷却する等の一連の加工処理を行う。   In the manufacturing process of such a color pixel pattern of a color filter, a photoresist film is applied and formed on a rectangular LCD substrate as a processing object by a resist application device. After that, the LCD substrate coated with the photoresist film is subjected to a pre-bake process of heating with a substrate temperature controller, cooled, exposed to a predetermined pattern by an exposure device, and developed by exposure with a developing device. After that, a series of processing processes such as performing a post-bake process of heating with a substrate temperature control device and then cooling the substrate are performed.

これらの基板温調装置は従来、例えば特許文献1に示すような構成の装置を用いており、LCD基板を載置して加熱する温度調整盤と、基板受け渡し機構を有するものが使用されている。基板受け渡し機構は、温度調整盤を垂直方向に貫通する支持ピン引き出し穴に通した基板支持ピンと、この基板支持ピンを昇降する支持ピン昇降機構とで構成する。   Conventionally, for these substrate temperature control devices, for example, a device having a configuration as shown in Patent Document 1 is used, and a device having a temperature control panel for mounting and heating an LCD substrate and a substrate transfer mechanism is used. . The substrate transfer mechanism includes a substrate support pin that passes through a support pin draw-out hole that vertically penetrates the temperature control panel, and a support pin lifting mechanism that raises and lowers the substrate support pin.

この基板温調装置の基板受け渡し機構は、LCD基板を、温度調整盤上に突出する基板支持ピンにて受け取る。そして、基板支持ピンが下降してLCD基板を温度調整盤に載置する。そして、基板温調装置の温度調整盤は例えば50℃〜180℃の所定温度に加熱してLCD基板の熱処理を行う。   The substrate transfer mechanism of the substrate temperature control device receives the LCD substrate with substrate support pins protruding above the temperature control panel. Then, the substrate support pins are lowered to place the LCD substrate on the temperature control panel. Then, the temperature control panel of the substrate temperature controller heats the LCD substrate to a predetermined temperature of, for example, 50 ° C. to 180 ° C. to perform heat treatment.

特開2000−243687号公報JP-A-2000-243687

その熱処理を行うレジスト塗布装置用の基板温調装置では、基板を温度調整盤上に基板を設置してレジスト液を塗布するのであるが、基板上に塗布されたレジスト液の膜厚や硬化具合が、基板受け渡し機構の支持ピン引き出し穴の熱伝導により、支持ピン引き出し穴に接しない部分と異なる状態となり、プリベーク後の露光、現像処理を経て、パターン上に転写跡(ピンムラ)を生じてしまう問題があった。   In a substrate temperature control device for a resist coating device that performs the heat treatment, the substrate is placed on a temperature control panel and the resist solution is applied. However, the thickness and curing condition of the resist solution applied on the substrate are controlled. However, due to the heat conduction of the support pin draw-out hole of the substrate transfer mechanism, the state becomes different from that of the portion not in contact with the support pin draw-out hole. There was a problem.

この転写跡を生じる原因は、支持ピン引き出し穴位置の部分の温度が、温度調整盤の他の部分と温度差があることが原因である。この転写跡はレジストパターンの現像後に生じる場合もあり、転写跡は、最終製品での不良の原因となる。   This transfer trace is caused by the fact that the temperature at the position of the support pin draw-out hole has a temperature difference from the other portions of the temperature adjustment plate. This transfer mark may occur after development of the resist pattern, and the transfer mark causes a defect in a final product.

特許文献1では、この転写跡の対策として、基板を温度調整盤には直接接触させずに処理する技術が提案されているが、基板を温度調整盤に直接接触させないため、基板の温度の調整の効率が悪い問題があった。   Patent Document 1 proposes a technique for treating a substrate without directly contacting the temperature control panel as a measure against the transfer mark. However, since the substrate is not directly contacted with the temperature control panel, the temperature of the substrate is adjusted. There was a problem of inefficiency.

また、特許文献1では、基板の加熱処理中に基板支持ピンが移動することで、基板上の一箇所のみに接してその箇所の温度のみが突出して他と基板面と異なる状態は避けることができるが、それでも、他の基板面と同じ温度にするわけではない問題があった。   Further, in Patent Document 1, by moving the substrate support pins during the heat treatment of the substrate, it is possible to avoid contact with only one location on the substrate and to protrude only the temperature at that location, thereby avoiding a state different from the other substrate surface. Although possible, there is still a problem that the temperature is not always the same as the other substrate surface.

そのため、本発明の課題は、基板面に、支持ピン引き出し穴を起因とする基板面の温度差による転写跡等の不具合を基板に発生させない基板温調装置を得ることにある。   Therefore, an object of the present invention is to provide a substrate temperature control apparatus which does not cause a defect such as a transfer mark on a substrate surface due to a temperature difference of the substrate surface due to a support pin drawing hole on the substrate surface.

上記の課題を解決するために、本発明は、基板を載せて温調する温度調整盤と、前記基板を先端部に載置して該基板を温度調整盤の表面に載置する上下移動をさせる基板支持ピンを有、前記基板支持ピンの先端部からガスを噴出させて前記基板を支えさせ、前記基板支持ピンの軸方向を前記基板の面の垂直方向から傾け、前記温度調整盤の前記基板を載置する表面の前記基板の製品領域の外の支持ピン引き出し穴に、前記基板支持ピンを引き込ませて収納する基板温調装置であって、前記基板支持ピンの先端部に前記基板支持ピンの直径よりも大きい基板保持部を備えたことを特徴とする基板温調装置である。 In order to solve the above-described problems, the present invention provides a temperature control panel for mounting and controlling the temperature of a substrate, and a vertical movement for mounting the substrate on the tip and mounting the substrate on the surface of the temperature control panel. have a substrate support pin which, with the gas to the jet from the tip portion of the substrate support pins let supporting said substrate, tilt the axial direction of the substrate support pins from the vertical direction of the surface of said substrate, said temperature control board the support pins drawer hole outside the product area of the substrate surface for placing said substrate, said a substrate temperature controller you housed retract the substrate supporting pins, the a tip portion of the substrate support pins A substrate temperature control device comprising a substrate holding portion larger than a diameter of a substrate support pin .

本発明は、この構成により、基板支持ピンを温度調整盤内に収納させる位置が基板の製品領域の外になるため、基板の製品領域内には転写跡を生じないようにすることができる効果がある。   According to the present invention, the position at which the substrate support pins are housed in the temperature adjustment panel is outside the product area of the substrate, so that transfer marks can be prevented from being generated in the product area of the substrate. There is.

また、本発明は、上記の基板温調装置であって、前記支持ピンの先端部から噴出させるガスの温度を、前記基板の周囲のガスの温度と同じ温度に調整して噴出させるガス温度制御手段を有することを特徴とする基板温調装置である。   Further, the present invention is the above-described substrate temperature control apparatus, wherein the temperature of the gas ejected from the tip of the support pin is adjusted to the same temperature as the temperature of the gas around the substrate, and the temperature of the gas is controlled. It is a substrate temperature control apparatus characterized by having means.

また、本発明は、上記の基板温調装置であって、前記基板支持ピンの軸方向を前記基板の面の垂直方向から傾ける角度を、前記基板支持ピンの先端部の前記基板を支える位置に応じて異なる角度に設定したことを特徴とする基板温調装置である。   Further, the present invention is the above-described substrate temperature control device, wherein an angle of inclining an axial direction of the substrate support pins from a vertical direction of a surface of the substrate is set at a position for supporting the substrate at a tip end of the substrate support pins. A substrate temperature control device characterized in that different angles are set according to the angle.

本発明は、基板支持ピンの軸方向が基板面の垂直方向から傾いた角度を持ち、基板支持ピンが、前記温度調整盤の前記基板を載置する表面の前記基板の製品領域の外の支持ピン引き出し穴に引き込まれて温度調整盤に収納される基板受け渡し機構を有する。   According to the present invention, the axial direction of the substrate support pins has an angle inclined from the vertical direction of the substrate surface, and the substrate support pins support the temperature control panel outside the product area of the substrate on the surface on which the substrate is mounted. It has a board delivery mechanism that is drawn into the pin draw-out hole and housed in the temperature adjustment board.

本発明は、この構成によって、基板支持ピンを温度調整盤内に収納させる位置が基板の製品領域の外になるため、基板の製品領域内には転写跡を生じないようにすることができる効果がある。   According to the present invention, the position at which the substrate support pins are housed in the temperature control panel is outside the product area of the substrate, so that transfer marks can be prevented from being generated in the product area of the substrate. There is.

また、本発明は、支持ピンの先端部からガスを噴出させて基板を支え、その噴出させるガスの温度を基板の周囲のガスの温度と同じ温度に調整して噴出させるガス温度制御手段を用いることで、基板に生じる転写痕を弱くすることができる効果がある。   Further, the present invention uses gas temperature control means for ejecting gas from the tip of the support pin to support the substrate, adjusting the temperature of the ejected gas to the same temperature as the gas surrounding the substrate, and ejecting the gas. Thereby, there is an effect that transfer marks generated on the substrate can be weakened.

(a)本発明の第1の実施形態の基板温調装置の第1の側面模式図、(b)第1の実施形態の基板温調装置の第2の側面模式図(b)第1の実施形態の基板温調装置の平面模式図である。(A) A first side view schematic diagram of the substrate temperature control apparatus according to the first embodiment of the present invention, (b) a second side view schematic view of the substrate temperature control apparatus according to the first embodiment, and (b) a first side view. It is a plane schematic diagram of a substrate temperature control device of an embodiment. (a)本発明の第1の実施形態の基板支持ピンの側面図である。(b)、(c)、(d)第1の実施形態の基板支持ピンの先端部に設置する基板保持部の平面図である。(A) It is a side view of the board | substrate support pin of 1st Embodiment of this invention. (B), (c), (d) It is a top view of the board | substrate holding part installed in the front-end | tip part of the board | substrate support pin of 1st Embodiment. 本発明の第1の実施形態の基板温調装置の基板受け渡し機構の動作を説明する側面の部分的模式図である。FIG. 4 is a partial side view schematically illustrating the operation of the substrate transfer mechanism of the substrate temperature control apparatus according to the first embodiment of the present invention. (a)本発明の第2の実施形態の基板温調装置の側面模式図、(b)第2の実施形態の基板温調装置の平面模式図である。FIG. 4A is a schematic side view of a substrate temperature control device according to a second embodiment of the present invention, and FIG. 4B is a schematic plan view of the substrate temperature control device according to the second embodiment. (a)本発明の第3の実施形態の基板支持ピンの側面図である。(b)第3の実施形態の基板支持ピンの先端部に設置する基板保持部の平面図である。(A) It is a side view of the board | substrate support pin of 3rd Embodiment of this invention. (B) It is a top view of the board | substrate holding part installed in the front-end | tip part of the board | substrate support pin of 3rd Embodiment. 本発明の第3の実施形態の基板温調装置の基板受け渡し機構の動作を説明する側面の部分的模式図である。It is a partial side view explaining operation of a substrate delivery mechanism of a substrate temperature control device of a 3rd embodiment of the present invention.

次に、この発明の実施の形態を詳細に説明する。この実施の形態では、この発明をLCD用のガラス基板などの基板1をプリベーク処理する基板温調装置に適用する場合について説明する。   Next, embodiments of the present invention will be described in detail. In this embodiment, a case will be described in which the present invention is applied to a substrate temperature control device for pre-baking a substrate 1 such as an LCD glass substrate.

<第1の実施形態>
本発明の第1の実施形態の基板温調装置を、図1から図3を参照して説明する。本実施形態の基板温調装置は、図1(a)の様に、温度調整盤10と、基板1を温度調整盤10に載置する基板受け渡し機構を構成する基板支持ピン20と、温度調整盤10に形成した支持ピン引き出し穴11と支持ピン昇降機構14で構成する。
<First embodiment>
A substrate temperature controller according to a first embodiment of the present invention will be described with reference to FIGS. As shown in FIG. 1A, the substrate temperature control device of the present embodiment includes a temperature control panel 10, a substrate support pin 20 that constitutes a substrate transfer mechanism for mounting the substrate 1 on the temperature control panel 10, and a temperature control panel. It comprises a support pin pull-out hole 11 formed in the board 10 and a support pin elevating mechanism 14.

基板受け渡し機構の基板支持ピン20が最初に基板1を受け取り、基板支持ピン20が基板1を支持しつつ下降し、温度調整盤10内に収納されることで、温度調整盤10の表面に基板1を載置する。   The substrate support pins 20 of the substrate transfer mechanism first receive the substrate 1, and the substrate support pins 20 descend while supporting the substrate 1, and are stored in the temperature control panel 10. 1 is placed.

図2は基板支持ピン20の構造を示す図であり、図3は、基板温調装置の基板受け渡し機構の動作を説明する、基板温調装置の側面の部分的模式図である。図1(a)又は図3(a)の側面図は、基板支持ピン20の先端部が最も上昇した位置で基板1を支持する場合を示す。   FIG. 2 is a diagram showing the structure of the substrate support pin 20, and FIG. 3 is a partial schematic diagram of a side surface of the substrate temperature control device for explaining the operation of the substrate transfer mechanism of the substrate temperature control device. The side view of FIG. 1A or FIG. 3A shows a case where the substrate 1 is supported at a position where the tip end of the substrate support pin 20 is most raised.

図3(b)の側面図に、基板支持ピン20が基板1を支持したまま途中まで降下した状態を示す。   FIG. 3B is a side view showing a state in which the substrate support pins 20 have been lowered halfway while supporting the substrate 1.

図1(b)又は図3(c)の側面図に、基板支持ピン20が温度調整盤10の支持ピン引き出し穴11に収納されて、基板1を温度調整盤10の表面に載置した場合を示す。図1(c)の平面図に、基板支持ピン20が温度調整盤10の支持ピン引き出し穴11に収納され、基板1が温度調整盤10の表面に載置された状態を示す   In the side view of FIG. 1B or FIG. 3C, when the substrate support pins 20 are stored in the support pin draw-out holes 11 of the temperature control panel 10 and the substrate 1 is placed on the surface of the temperature control panel 10. Is shown. FIG. 1C is a plan view showing a state where the substrate support pins 20 are housed in the support pin draw-out holes 11 of the temperature control panel 10 and the substrate 1 is placed on the surface of the temperature control panel 10.

(温度調整盤)
温度調整盤10の上面には、図1(c)の様に、複数の支持ピン引き出し穴11を設ける。図1(a)の様に、支持ピン引き出し穴11から基板支持ピン20を引き出し、また、基板支持ピン20を支持ピン引き出し穴11から温度調整盤10内に引き込んで収納する。
(Temperature control panel)
On the upper surface of the temperature control panel 10, a plurality of support pin draw-out holes 11 are provided as shown in FIG. As shown in FIG. 1A, the board support pins 20 are pulled out from the support pin draw-out holes 11, and the board support pins 20 are drawn into the temperature control panel 10 from the support pin draw-out holes 11 and stored.

また、温度調整盤10の内部にプレートヒーター12とステージ温度測定器13を埋設し、温度調整盤10の温度が低下した場合にステージ温度測定器13で温度低下を検知し、プレートヒーター12で加熱することで温度調整盤10の温度を一定に保つように制御する。   Further, a plate heater 12 and a stage temperature measuring device 13 are buried inside the temperature adjusting plate 10, and when the temperature of the temperature adjusting plate 10 decreases, the temperature decrease is detected by the stage temperature measuring device 13 and heated by the plate heater 12. Thus, the temperature of the temperature control panel 10 is controlled to be kept constant.

(基板支持ピン)
図2(a)に基板支持ピン20の側面図を示す。基板支持ピン20の先端に、基板支持ピン20の直径より大きい寸法で、基板1に平行に対向して基板1を支える基板保持部2
1を設ける。
(Board support pin)
FIG. 2A shows a side view of the substrate support pin 20. At the tip of the substrate support pin 20, a substrate holding part 2 having a size larger than the diameter of the substrate support pin 20 and supporting the substrate 1 in parallel with the substrate 1.
1 is provided.

基板保持部21の平面形状は、図2(b)から図2(d)の様に、矩形や円形や台形等の種々の平面形状を用いることができる。   As the planar shape of the substrate holding portion 21, various planar shapes such as a rectangle, a circle, and a trapezoid can be used as shown in FIGS. 2B to 2D.

また、基板支持ピン20を、中空パイプで構成し、その基板支持ピン20の基板保持部21を設置した先端部分に、空気あるいは窒素等のガスを噴出するエアー噴出孔22を設ける。そのエアー噴出孔22から噴出したガスが基板1と基板保持部21の間に気体の層を形成して基板1を基板保持部21上に浮上させて支える。   Further, the substrate support pin 20 is formed of a hollow pipe, and an air ejection hole 22 for ejecting a gas such as air or nitrogen is provided at a tip portion of the substrate support pin 20 where the substrate holding portion 21 is installed. The gas ejected from the air ejection holes 22 forms a gas layer between the substrate 1 and the substrate holding unit 21 and floats and supports the substrate 1 on the substrate holding unit 21.

また、基板支持ピン20の先端のエアー噴出孔22から噴出するガスが、基板保持部21と基板1の間に形成した気体の層が、基板保持部21を基板1に直接には触れない様にする効果がある。   In addition, the gas ejected from the air ejection holes 22 at the tips of the substrate support pins 20 prevents the gas layer formed between the substrate holding portion 21 and the substrate 1 from directly touching the substrate holding portion 21 with the substrate 1. Has the effect of

それが、基板保持部21から基板1への熱伝導を少なくし、基板支持ピン20の先端の基板保持部21の温度が基板1の周囲のガスと温度差が有る場合も、それが基板1に生じる転写痕を弱くすることができる効果がある。   This reduces the heat conduction from the substrate holding unit 21 to the substrate 1. Even when the temperature of the substrate holding unit 21 at the tip of the substrate support pin 20 has a temperature difference with the gas around the substrate 1, this is also This has the effect of making it possible to weaken the transfer marks generated in the image.

基板1を支えたガスは、基板1の下面と温度調整盤10の上面の間の開放空間に流出して除去される。この開放空間は、基板支持ピン20が基板1を温度調整盤10の上方に持ち上げることで形成されている。   The gas supporting the substrate 1 flows out into an open space between the lower surface of the substrate 1 and the upper surface of the temperature control panel 10 and is removed. This open space is formed by the substrate support pins 20 lifting the substrate 1 above the temperature control panel 10.

噴出したガスが流れ込む開放空間を形成することで、基板1が、基板支持ピン20の先端のエアー噴出孔22から噴出したガスによって、基板保持部21との間に一定の間隙の空気の層を保った状態で浮上することができる。   By forming an open space into which the ejected gas flows, the substrate 1 forms a layer of air with a certain gap between the substrate 1 and the substrate holding unit 21 by the gas ejected from the air ejection holes 22 at the tips of the substrate support pins 20. It is possible to levitate while keeping it.

基板1を浮上させるためにエアー噴出孔22から噴出させるガスは、通常は一定温度に管理されたクリーンルーム内の空気を取り入れてブロアで供給する、あるいは、クリーンドライエアー製造装置から一定温度で供給される清浄乾燥空気を用いることができる。エアー供給源の温度が常に一定であり、温度調整盤10の温度とも一致している場合には、特にエアーの温度を調節する必要はない。   The gas ejected from the air ejection holes 22 to float the substrate 1 is usually supplied at a constant temperature from a clean dry air producing apparatus by taking in air in a clean room controlled at a constant temperature and supplying it with a blower. Clean and dry air can be used. When the temperature of the air supply source is always constant and coincides with the temperature of the temperature control panel 10, it is not particularly necessary to adjust the temperature of the air.

(変形例1)
しかし、温度調整盤10の温度が基板1の周囲のガスの温度と異なる場合は、基板1を、温度調整盤10の上方の基板支持ピン20の先端部の位置から、温度調整盤10の表面に基板1を載置するために基板支持ピン20を下降させて基板1を下降させるにつれ、基板1の周囲の温度が変化する。
(Modification 1)
However, when the temperature of the temperature control panel 10 is different from the temperature of the gas around the substrate 1, the substrate 1 is moved from the position of the tip of the substrate support pin 20 above the temperature control panel 10 to the surface of the temperature control panel 10. The temperature around the substrate 1 changes as the substrate 1 is lowered by lowering the substrate support pins 20 to place the substrate 1 on the substrate 1.

そのため、変形例1として、基板1の周囲のガスの温度を測定しつつ、基板支持ピン20の先端のエアー噴出孔22から噴出させるガスの温度をガス温度制御手段で制御する。それにより、エアー噴出孔22から噴出させるガスの温度を基板1の周囲のガスの温度と同じ温度にしてエアー噴出孔22から噴出させる。   Therefore, as a first modification, while measuring the temperature of the gas around the substrate 1, the temperature of the gas ejected from the air ejection holes 22 at the tips of the substrate support pins 20 is controlled by gas temperature control means. Thus, the temperature of the gas ejected from the air ejection holes 22 is set to the same temperature as the temperature of the gas around the substrate 1 and ejected from the air ejection holes 22.

(支持ピン引き出し穴)
図1(a)の様に、基板支持ピン20は、温度調整盤10の基板1の設置領域の端部に設けた支持ピン引き出し穴11に差し込んで、基板1の面の垂直方向から斜めに傾けて支える。支持ピン引き出し穴11は、基板支持ピン20を、基板1の面の垂直方向、すなわち、温度調整盤10の面の垂直方向から斜めに傾けた方向に出し入れさせ、支持ピン引き出し穴11の上に出る基板支持ピン20の長さを可変にする。
(Support pin draw-out hole)
As shown in FIG. 1A, the substrate support pins 20 are inserted into support pin draw-out holes 11 provided at the end of the installation area of the substrate 1 of the temperature adjustment panel 10 and obliquely from the vertical direction of the surface of the substrate 1. Tilt and support. The support pin pull-out hole 11 allows the substrate support pin 20 to be put in and out in the direction perpendicular to the surface of the substrate 1, that is, in a direction inclined obliquely from the direction perpendicular to the surface of the temperature control panel 10. The length of the substrate support pin 20 to be output is made variable.

図1(b)の側面図と図1(c)の平面図、又は図3(c)の側面図は、基板支持ピン20を最も下降させた状況の側面図を示す。すなわち、基板支持ピン20の先端部に設置した基板保持部21を温度調整盤10の上面の高さより低くなる位置まで下降させ温度調整盤10内に収納させる。そして、基板1を温度調整盤10の上面に載置する。   The side view of FIG. 1B and the plan view of FIG. 1C or the side view of FIG. 3C show a side view in a state where the substrate support pins 20 are lowered most. That is, the substrate holding unit 21 installed at the tip of the substrate support pin 20 is lowered to a position lower than the height of the upper surface of the temperature adjustment panel 10 and housed in the temperature adjustment panel 10. Then, the substrate 1 is placed on the upper surface of the temperature control panel 10.

(支持ピン昇降機構)
支持ピン昇降機構14は、温度調整盤10内の支持ピン引き出し穴11の下に設ける。支持ピン昇降機構14は、基板支持ピン20を支持ピン引き出し穴11内に、基板支持ピン20の軸にそった斜めの方向に引き込み、また、送り出すことで、基板支持ピン20を温度調整盤10対して相対的に上下に昇降させる。
(Support pin lifting mechanism)
The support pin elevating mechanism 14 is provided below the support pin draw-out hole 11 in the temperature adjustment panel 10. The support pin elevating mechanism 14 pulls the substrate support pins 20 into the support pin draw-out holes 11 in an oblique direction along the axis of the substrate support pins 20 and sends them out, so that the substrate support pins 20 are moved to the temperature adjustment panel 10. It is raised and lowered relatively up and down.

支持ピン昇降機構14は、各基板支持ピン20の先端部の高さを支持ピン先端高さ検出手段(図示せず)で測定しつつ、複数の基板支持ピン20の先端部の高さを、基板1の下面を支える1つの平面上に置くように制御することが望ましい。   The support pin elevating mechanism 14 measures the height of the tip of each of the substrate support pins 20 while measuring the height of the tip of each of the substrate support pins 20 with a support pin tip height detection unit (not shown). It is desirable to control the substrate 1 so that it is placed on one flat surface that supports the lower surface.

(支持ピン引き出し穴)
基板支持ピン20を温度調整盤10に収納する支持ピン引き出し穴11は、図1(c)の平面図のように、基板1の領域の端に、基板1の製品領域の外に設ける。
(Support pin draw-out hole)
As shown in the plan view of FIG. 1C, the support pin pullout hole 11 for accommodating the substrate support pins 20 in the temperature adjustment panel 10 is provided at the end of the area of the substrate 1 and outside the product area of the substrate 1.

支持ピン引き出し穴11を基板1の製品領域の外に設けることにより、基板1を温度調整盤10に載置させた後に、基板保持部21を温度調整盤10内に収納させる位置が基板1の製品領域の外になる。   By providing the support pin withdrawal hole 11 outside the product area of the substrate 1, after the substrate 1 is placed on the temperature adjustment panel 10, the position where the substrate holding unit 21 is stored in the temperature adjustment panel 10 is the position of the substrate 1. Out of product area.

そして、基板1が接する温度調整盤10表面の温度と支持ピン引き出し穴11部分の温度とが異なることにより基板1に生じる転写跡は、基板1の製品領域外になる。そのため、基板1の製品領域内には転写跡を生じないようにすることができる効果がある。   Then, the transfer mark generated on the substrate 1 due to the difference between the temperature of the surface of the temperature adjusting plate 10 in contact with the substrate 1 and the temperature of the portion of the support pin drawing hole 11 is outside the product area of the substrate 1. Therefore, there is an effect that transfer marks can be prevented from being generated in the product area of the substrate 1.

(基板温調装置の基板の載置動作)
次に、基板温調装置が、基板支持ピン20を用いて基板1を温度調整盤10上に載置する動作について説明する。
(Substrate mounting operation of substrate temperature controller)
Next, an operation in which the substrate temperature adjusting device places the substrate 1 on the temperature adjustment panel 10 using the substrate support pins 20 will be described.

基板温調装置は、温度調整盤10を予め、例えば50℃〜180℃程度の所定の温度に設定しておく。   In the substrate temperature control device, the temperature control panel 10 is set in advance to a predetermined temperature of, for example, about 50 ° C. to 180 ° C.

次に、図3(a)の様に、支持ピン昇降機構14が、基板支持ピン20を温度調整盤10の上に上昇させる。基板支持ピン20は、温度調整盤10の面上に、その面に垂直な方向から傾いた角度で、基板1の下面の中ほどの位置の下面を先端部で支える様に突出する。   Next, as shown in FIG. 3A, the support pin elevating mechanism 14 raises the substrate support pins 20 above the temperature adjustment board 10. The substrate support pins 20 protrude from the surface of the temperature control panel 10 at an angle inclined from a direction perpendicular to the surface so as to support the lower surface at a middle position of the lower surface of the substrate 1 at the tip.

次に、基板1を基板支持ピン20上に載置し、図2の様な基板支持ピン20のエアー噴出孔22から噴出すエアーで基板1を支える。   Next, the substrate 1 is placed on the substrate support pins 20, and the substrate 1 is supported by air jetted from the air jet holes 22 of the substrate support pins 20 as shown in FIG.

次に、図3(b)の様に、支持ピン昇降機構14が、基板支持ピン20を温度調整盤10の周囲の支持ピン引き出し穴11に収納する下降動作をさせる。   Next, as shown in FIG. 3B, the support pin elevating mechanism 14 performs a lowering operation of storing the substrate support pins 20 in the support pin draw-out holes 11 around the temperature adjustment panel 10.

その基板支持ピン20の下降につれて、基板支持ピン20の先端部分が基板1の下面の中ほどの位置から、基板1の下面の端部にまで移動する。   As the substrate support pins 20 descend, the tip of the substrate support pins 20 moves from a position in the middle of the lower surface of the substrate 1 to an end of the lower surface of the substrate 1.

そして、最終的に、図3(c)の様に、基板支持ピン20の先端部が温度調整盤10の表面より下方に移動して基板支持ピン20が温度調整盤10の支持ピン引き出し穴11に
収納され、基板1が温度調整盤10の表面に載置される。
Finally, as shown in FIG. 3 (c), the tip of the substrate support pin 20 moves below the surface of the temperature control panel 10, and the substrate support pin 20 is pulled out of the support pin extraction hole 11 of the temperature control panel 10. The substrate 1 is placed on the surface of the temperature control panel 10.

ここで、基板1の基板支持ピン20から温度調整盤10への受け渡し動作の際に、基板支持ピン20の先端部が支える基板1の下面の位置が時間的に変化する。それにより、基板1が接する基板支持ピン20の先端部の温度による基板1へ転写痕が生じないようにできるので、ガラス基板とほぼ同じサイズの均一な塗膜面が得られるという効果がある。   Here, during the transfer operation from the substrate support pins 20 of the substrate 1 to the temperature adjustment panel 10, the position of the lower surface of the substrate 1 supported by the tip of the substrate support pins 20 changes with time. As a result, transfer marks can be prevented from being formed on the substrate 1 due to the temperature of the tip of the substrate support pins 20 with which the substrate 1 is in contact, so that a uniform coating surface having substantially the same size as the glass substrate can be obtained.

<第2の実施形態>
本発明の第2の実施形態の基板温調装置は、図4の様に、傾きが異なる複数の基板支持ピン20を用いて大型の基板1の全面に基板支持ピン20の先端部を分散して配置して基板1の下面を均等に支える。
<Second embodiment>
As shown in FIG. 4, the substrate temperature control apparatus according to the second embodiment of the present invention disperses the tips of the substrate support pins 20 over the entire surface of the large substrate 1 using a plurality of substrate support pins 20 having different inclinations. To uniformly support the lower surface of the substrate 1.

支持ピン昇降機構14は、基板支持ピン20を軸方向に移動させて下降させ、基板1を支える基板支持ピン20の先端部の基板保持部21を温度調整盤10に収納することで、基板支持ピン20で支えた基板1を温度調整盤10の表面に載置する。   The support pin elevating mechanism 14 moves the substrate support pins 20 in the axial direction and lowers them, and stores the substrate holding portion 21 at the tip end of the substrate support pins 20 supporting the substrate 1 in the temperature adjustment panel 10, thereby supporting the substrate. The substrate 1 supported by the pins 20 is placed on the surface of the temperature control panel 10.

ここで、傾きが異なる基板支持ピン20同士は異なる支持ピン昇降機構14により、異なる速度で支持ピン引き出し穴11に引き込むことで、基板1の下面を複数の基板支持ピン20の先端部で形成した平面で支える。   Here, the substrate support pins 20 having different inclinations are drawn into the support pin draw-out holes 11 at different speeds by the different support pin lifting / lowering mechanisms 14, so that the lower surface of the substrate 1 is formed by the tip portions of the plurality of substrate support pins 20. Support on a flat surface.

ここで、支持ピン昇降機構14は、複数の基板支持ピン20の先端部の高さを支持ピン先端高さ検出手段(図示せず)で測定して、複数の基板支持ピン20の先端部の高さを、基板1の下面を支える1つの平面上に置くように制御しつつ、複数の基板支持ピン20の先端部の高さを揃えて同時に下降させる。   Here, the support pin elevating mechanism 14 measures the heights of the tip portions of the plurality of substrate support pins 20 with support pin tip height detecting means (not shown), and detects the heights of the tip portions of the plurality of substrate support pins 20. While controlling the height to be placed on one plane supporting the lower surface of the substrate 1, the tip portions of the plurality of substrate support pins 20 are made uniform and lowered at the same time.

<第3の実施形態>
第3の実施形態を図5と図6を参照して説明する。第3の実施形態では、図6の様に、基板支持ピン20を支える支持ピン昇降機構14が、基板支持ピン20を下降させるとともに、基板支持ピン20の軸の傾きを変える軸方向回転手段15を設ける。
<Third embodiment>
A third embodiment will be described with reference to FIGS. In the third embodiment, as shown in FIG. 6, a support pin elevating mechanism 14 that supports the substrate support pins 20 lowers the substrate support pins 20 and changes the inclination of the axis of the substrate support pins 20. Is provided.

また、図5の様に、第3の実施形態では、基板支持ピン20の先端に設置する基板保持部21の上面の方向と基板支持ピン20の軸の方向との角度を変える基板保持部配向方向回転手段23を設ける。   Further, as shown in FIG. 5, in the third embodiment, the orientation of the substrate holding unit that changes the angle between the direction of the upper surface of the substrate holding unit 21 installed at the tip of the substrate supporting pin 20 and the direction of the axis of the substrate supporting pin 20. Direction rotating means 23 is provided.

(基板温調装置の基板の載置動作)
第3の実施形態では、支持ピン昇降機構14が基板支持ピン20を支持ピン引き出し穴11に引き込み下降させて基板1を温度調整盤10の表面に載置した状況において、基板支持ピン20の軸方向の傾きを垂直方向に変える。
(Substrate mounting operation of substrate temperature controller)
In the third embodiment, in a situation where the support pin elevating mechanism 14 draws the substrate support pins 20 into the support pin draw-out holes 11 and lowers the substrate 1 on the surface of the temperature control panel 10, the shaft of the substrate support pins 20 is moved. Change the tilt of the direction to the vertical direction.

それにより、その状況において、基板支持ピン20の後端部が水平面の方向で温度調整盤10の外に突出しないように、温度調整盤10の範囲内に基板支持ピン20を収納できる効果がある。   Accordingly, in such a situation, there is an effect that the substrate support pins 20 can be stored within the range of the temperature adjustment panel 10 so that the rear end of the substrate support pins 20 does not protrude out of the temperature adjustment panel 10 in the horizontal plane direction. .

なお、本発明は、以上の実施形態に限定されず、すなわち、本発明の基板温調装置は、基板1をプリベーク処理する基板温調装置以外に限定されず、基板1にレジスト液を塗布するレジスト塗布装置用の基板温調装置に用いることができる。   Note that the present invention is not limited to the above-described embodiment. That is, the substrate temperature controlling apparatus of the present invention is not limited to a substrate temperature controlling apparatus that performs a pre-bake process on the substrate 1, and applies a resist liquid to the substrate 1. It can be used for a substrate temperature control device for a resist coating device.

すなわち、基板1の面の垂直方向から傾けた基板支持ピン20と支持ピン昇降機構14で構成した基板受け渡し機構を用いて、基板1を、温度調整された温度調整盤10上に載置する基板温調装置に適用することができる。   That is, the substrate 1 is placed on the temperature-adjusted temperature control panel 10 by using the substrate transfer mechanism including the substrate support pins 20 inclined from the vertical direction of the surface of the substrate 1 and the support pin elevating mechanism 14. It can be applied to a temperature control device.

本発明の基板温調装置をレジスト塗布装置に用いて基板1にレジスト液を塗布することで、基板1の製品領域内に転写痕を生じない様にできるので、ガラス基板とほぼ同じサイズの均一な塗膜面が得られるという効果が得られる。   By applying the resist liquid to the substrate 1 by using the substrate temperature control device of the present invention as a resist coating device, it is possible to prevent transfer marks from being formed in the product area of the substrate 1, so that a uniform size of approximately the same size as the glass substrate can be obtained. The effect that a good coating surface can be obtained is obtained.

1・・・基板
10・・・温度調整盤
11・・・支持ピン引き出し穴
12・・・プレートヒーター
13・・・ステージ温度測定器
14・・・支持ピン昇降機構
15・・・軸方向回転手段
20・・・基板支持ピン
21・・・基板保持部
22・・・エアー噴出孔
23・・・基板保持部配向方向回転手段
DESCRIPTION OF SYMBOLS 1 ... Substrate 10 ... Temperature adjustment board 11 ... Support pin draw-out hole 12 ... Plate heater 13 ... Stage temperature measuring device 14 ... Support pin elevating mechanism 15 ... Axial rotation means Reference numeral 20: substrate support pin 21: substrate holding part 22: air ejection hole 23: substrate holding part orientation direction rotating means

Claims (3)

基板を載せて温調する温度調整盤と、前記基板を先端部に載置して該基板を温度調整盤の表面に載置する上下移動をさせる基板支持ピンを有、前記基板支持ピンの先端部からガスを噴出させて前記基板を支えさせ、前記基板支持ピンの軸方向を前記基板の面の垂直方向から傾け、前記温度調整盤の前記基板を載置する表面の前記基板の製品領域の外の支持ピン引き出し穴に、前記基板支持ピンを引き込ませて収納する基板温調装置であって、前記基板支持ピンの先端部に前記基板支持ピンの直径よりも大きい基板保持部を備えたことを特徴とする基板温調装置。 A temperature adjustment panel for temperature control by placing the substrate, by placing the substrate in the distal portion have a substrate support pin for the up and down movement for placing the substrate on the surface of the temperature control board, the substrate support pins A gas is ejected from a tip portion to support the substrate, an axial direction of the substrate support pins is inclined from a direction perpendicular to a surface of the substrate, and a product area of the substrate on the surface of the temperature adjustment plate on which the substrate is mounted. the outside of the support pins drawer hole, wherein a substrate support pin substrate temperature controller you housed retract and includes a large substrate holder than said substrate support pin diameter at the tip portion of the substrate support pins A substrate temperature control device, characterized in that: 請求項1に記載の基板温調装置であって、前記支持ピンの先端部から噴出させるガスの温度を、前記基板の周囲のガスの温度と同じ温度に調整して噴出させるガス温度制御手段を有することを特徴とする基板温調装置。 2. The substrate temperature controller according to claim 1 , further comprising: a gas temperature controller configured to adjust a temperature of a gas ejected from a tip portion of the support pin to be equal to a temperature of a gas around the substrate and eject the gas. A substrate temperature control device, comprising: 請求項1又は2に記載の基板温調装置であって、前記基板支持ピンの軸方向を前記基板の面の垂直方向から傾ける角度を、前記基板支持ピンの先端部の前記基板を支える位置に応じて異なる角度に設定したことを特徴とする基板温調装置。 3. The substrate temperature control device according to claim 1, wherein an angle at which an axial direction of the substrate support pins is inclined from a direction perpendicular to a surface of the substrate is set at a position where the tip of the substrate support pins supports the substrate. A substrate temperature adjusting device, wherein the substrate temperature adjusting device is set at a different angle according to the angle.
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