JP6612123B2 - Capacitive input device - Google Patents

Description

The present invention relates to an electrostatic capacitive input device is transparent detection electrode that detects an input operation from the variation in the stray capacitance inconspicuous.

  As a pointing device for pointing and inputting icons displayed on the display of electronic devices, the input operation area such as a finger approaches the detection electrode wired to the input detection area, and changes to the input detection area. There is known a capacitance type input device that detects the input operation position.

  Among the capacitive input devices, a touch panel for detecting a two-dimensional input operation position in the orthogonal XY direction on the input detection area has a large number of X detection electrodes along the Y direction and a large number of Y along the X direction. The detection electrodes are wired on opposite surfaces of two insulating sheets laminated with a predetermined insulation interval, and the capacitances of all X detection electrodes and Y detection electrodes are monitored, and the capacitance changes. The two-dimensional input operation position is detected from the wiring position of the X detection electrode and the Y detection electrode at the intersection position, assuming that the input operation body such as a finger approaches the intersection position of the X detection electrode and the Y detection electrode.

  Hereinafter, a touch panel 100 that detects a two-dimensional input operation position using this detection principle will be described with reference to FIG. The touch panel 100 includes two insulating sheets 103 (upper side) in which a large number of X detection electrodes 101 along the Y direction and a large number of Y detection electrodes 102 along the X direction are stacked with a predetermined insulation interval. These insulating sheets are respectively wired to the input detection areas on the opposite surface of the sheet. The switching control circuit 107 controls switching of the Y-axis input switch 104 connected to a large number of Y detection electrodes 102, switches the oscillation circuit 105 to all the Y detection electrodes 102 in sequence, and connects the Y detection electrodes 102 to the switching connection. The detection signal of the pulse waveform is output. The switching control circuit 107 is also connected to an X-axis input switch 106 connected to a large number of X detection electrodes 101. While the detection signal is being output to any Y detection electrode 102, all X detections are sequentially performed. The electrode 101 is switched and connected to the arithmetic circuit 108, and the detection signal potential of the connected X detection electrode 101 is read.

  In the detection electrodes 101 and 102 that the input operation body such as a finger approaches, the stray capacitance with the input operation body increases. Therefore, a part of the detection signal of the pulse waveform flowing through the detection electrodes 101 and 102 is input through the stray capacitance. The potential of the detection signal that leaks to the body side and is detected by the arithmetic circuit 108 is lower than the potential before the input operation body is approached. Since a large number of X detection electrodes 101 and Y detection electrodes 102 intersect and are arranged in a matrix on the insulating sheet 103, the input operation body is either the X detection electrode 101 or the Y detection electrode 102 of the insulating sheet 103. When the crossing position is approached, the potential of the detection signal detected by the arithmetic circuit 108 when the switching control circuit 107 switches and connects the X detection electrode 101 and the Y detection electrode 102 wired at the crossing position decreases most. The arithmetic circuit 108 detects an input operation position represented by XY coordinates from the X-direction wiring position of the X detection electrode 101 and the Y-direction wiring position of the Y detection electrode 102, and processes the input operation position. To 109.

  In general, the capacitance type input device configured as described above is used together with a display device such as a liquid crystal display panel arranged on the back side thereof, and an operator observes an icon or the like displayed on the display device. Input operation to the input detection area of the capacitive input device. Accordingly, in each component arranged in at least the input detection region of the capacitive input device, for example, the touch panel 100, the two insulating sheets 103, the X detection electrode 101, and the Y detection electrode 102 are formed of a transparent material. .

  In particular, since the X detection electrode 101 and the Y detection electrode 102 are required to have transparency and low resistance conductivity, the materials thereof are limited, and ITO (indium tin oxide), PEDOT / PSS (polyethylenedioxythiophene / It is made of a conductive polymer such as polystyrene sulfonic acid) or a nanosize conductor such as silver nanowire. However, although these materials have transparency, conductive polymers such as ITO and PEDOT / PSS are light blue, and silver nanowires are light yellow. When it is visually observed and wired in a grid pattern, it appears as a grid pattern and impairs aesthetics.

  If the thickness of the detection electrode itself made of a conductive transparent material is reduced, it can be made transparent. However, since the electrical resistance of the detection electrode increases, the static detection of detecting the input operation position from a minute voltage change is possible. Capacitive input devices have limitations.

  Therefore, the conventional capacitive touch panel disclosed in Patent Document 1 is a transparent electrode in which a detection electrode formed by PEDOT / PSS is coated with a glass plate coated with a light blue ink of the same color, a design sheet, and the like. It overlaps with the insulating sheet so that the outline of the detection electrode is not noticeable.

  Further, as shown in FIG. 9, the conventional capacitive touch panel 110 disclosed in Patent Document 2 has a gap of about 200 μm in width where the X detection electrode 111 and the Y detection electrode 112 do not overlap in the stacking direction of the insulating sheets. A large number of dummy patterns 114 that are not connected to either the X detection electrode 111 or the Y detection electrode 112 are formed on the front and back sides of the insulating sheet. By forming the dummy pattern 114 from ITO, which is the same transparent conductive material as the X detection electrode 111 and the Y detection electrode 112, the gap 113 between the X detection electrode 111 and the Y detection electrode 112 and the contours of the electrodes 111, 112 are formed. It is difficult to see.

JP2011-3169A JP 2010-9456 A

  The conventional capacitive touch panel disclosed in Patent Document 1 has a light blue detection electrode formed of PEDOT / PSS and a glass plate coated with the same color ink, a design sheet, and the like, so that the input detection area The transparency of the display deteriorates and it becomes difficult to see the display of the display device disposed inside.

  Furthermore, in this capacitive touch panel, glass plates, design sheets, etc., which are separate members are laminated in order to make it difficult to see the outline of the detection electrode, which increases the number of parts and hinders the thinning of the touch panel. .

  In addition, the conventional capacitive touch panel 110 includes a plurality of X detection electrodes 111 and a plurality of Y detection electrodes 112 that complement each other in order to increase the facing area of the input operation body that approaches the input detection area. As the pattern shape, either the X detection electrode 111 or the Y detection electrode 112 covers almost the entire input detection region, but a slight gap 113 having a width of about 200 μm between the X detection electrode 111 and the Y detection electrode 112 is used. In addition, since the dummy pattern 114 that is not connected to either the X detection electrode 111 or the Y detection electrode 112 is formed, high manufacturing accuracy is required for patterning the X detection electrode 111, the Y detection electrode 112, and the dummy pattern 114.

  Therefore, in general, the X detection electrode 111, the Y detection electrode 112, and the dummy pattern 114 formed on the insulating sheet are formed by patterning by photoetching. However, many processes are required and etching is performed using a strong acid etching solution. It can cause damage to the natural environment.

The present invention has been made in consideration of such conventional problems, and an object thereof is to provide a capacitance type input device in which the outline of the transparent detection electrode is not conspicuous without overlapping another member. .

It is another object of the present invention to provide a capacitance type input device that forms a transparent detection electrode whose outline is not conspicuous without requiring high manufacturing accuracy.

In order to achieve the above object, the capacitive input device according to claim 1 is orthogonal to the first direction at a predetermined interval in the first direction in the first input detection region of the first transparent insulating sheet. A plurality of first transparent detection electrodes wired along the second direction, and a second input detection region of the second transparent insulation sheet facing the first input detection region of the first transparent insulation sheet with an insulation interval, A plurality of second transparent detection electrodes wired along the first direction at a predetermined interval in the second direction, and a plurality of first transparent detection electrodes and a plurality of second transparent detection electrodes intersect at all intersection positions. A first transparent detection electrode and a second transparent detection electrode, each having a capacitance detection means for detecting a change in stray capacitance between the first transparent detection electrode and the second transparent detection electrode, intersecting at an intersection position when the input operation body approaches. First transparent detection electrode and second transparent detection electrode in which stray capacitance between detection electrodes changes The 1 direction wiring position in the second direction, an electrostatic capacitive input device for detecting the input operation position in the first direction and the second direction input operation member,
The transparent conductive layer formed on the entire surface of the first input detection region is divided into a plurality of transparent conductive layers by a plurality of first slits from which the transparent conductive layer is removed with a line width of 100 μm or less along the second direction. The plurality of first transparent detection electrodes and the plurality of first dummy patterns are alternately formed in the first direction by the transparent conductive layer between the first slits adjacent in the first direction, and the second input detection region The transparent conductive layer formed on the entire surface is divided into a plurality of transparent conductive layers along a first direction by a plurality of second slits from which the transparent conductive layer has been removed, and each second transparent detection electrode has a second direction. Formed by a transparent conductive layer between a pair of adjacent second slits,
In each of the first dummy patterns formed along the second direction, the transparent conductive layer is removed with a line width of 100 μm or less along both sides of the projected shape in which the second slit is projected onto the first input detection region. The pattern is divided into a plurality of patterns insulated from each other by a plurality of insulating slits .

  By simply forming a plurality of first slits along the second direction in the transparent conductive layer, the first transparent detection electrode wired along the second direction can be formed between them, and the shape thereof is somewhat different. Even if this error occurs, it does not affect the detection of the input operation position in the first direction, and therefore high processing accuracy is not required for forming the first slit.

  By only forming a plurality of second slits along the first direction in the transparent conductive layer, a second transparent detection electrode wired along the first direction is formed therebetween. Further, even if a slight error occurs in the shape of the second transparent detection electrode, it does not affect the detection of the input operation position in the second direction, and therefore high processing accuracy is not required for forming the second slit.

Since a first dummy pattern formed of the same material as the first transparent detection electrode is disposed between the plurality of first transparent detection electrodes via a first slit having a line width of 100 μm or less , the first transparent detection The outline of the electrode is not noticeable.

  In addition, the first dummy pattern that is insulated and adjacent to the first transparent detection electrode has a plurality of insulation slits along both sides of the second slit projected onto the first input detection area in units of the second transparent detection electrode. Since it is divided into a plurality of patterns, even if the divided first dummy pattern is capacitively coupled to the second transparent detection electrode wired at the opposing position, the detection accuracy of the input operation position in the second direction is not affected.

Since the insulating slit is formed with a line width of 100 μm or less, the outline of the first dummy pattern divided by the insulating slit is inconspicuous.

The capacitance-type input device according to claim 2 is wired along a second direction perpendicular to the first direction at a predetermined interval in the first direction in the first input detection region on the surface side of the transparent insulating sheet. A plurality of first transparent detection electrodes and a plurality of second transparent detections wired along the first direction at a predetermined interval in the second direction to the second input detection region on the back side of the transparent insulating sheet Electrodes,
A first transparent detection electrode that intersects at all intersecting positions of the plurality of first transparent detection electrodes and the plurality of second transparent detection electrodes; and a capacitance detection means that detects a change in stray capacitance between the second transparent detection electrodes. Prepared,
The first transparent detection electrode and the second transparent detection electrode in which the stray capacitance changes between the first transparent detection electrode and the second transparent detection electrode intersected at the crossing position when the input operation body approaches and in the first direction and the second direction of the second transparent detection electrode A capacitance type input device that detects an input operation position in a first direction and a second direction of an input operation body from a wiring position,
The transparent conductive layer formed on the entire surface of the first input detection region is divided into a plurality of transparent conductive layers by a plurality of first slits from which the transparent conductive layer is removed with a line width of 100 μm or less along the second direction. The plurality of first transparent detection electrodes and the plurality of first dummy patterns are alternately formed in the first direction by the transparent conductive layer between the first slits adjacent in the first direction, and the second input detection region The transparent conductive layer formed on the entire surface is divided into a plurality of transparent conductive layers by a plurality of second slits from which the transparent conductive layer has been removed along the first direction, and each second transparent detection electrode is formed in the second direction. Formed by a transparent conductive layer between a pair of adjacent second slits,
In each of the first dummy patterns formed along the second direction, the transparent conductive layer is removed with a line width of 100 μm or less along both sides of the projected shape in which the second slit is projected onto the first input detection region. The pattern is divided into a plurality of patterns insulated from each other by a plurality of insulating slits .

  Since the first transparent detection electrode has a pair of first slits having a line width that is not visually recognized as an outline, the outline is not conspicuous.

  A first transparent detection electrode wired in an orthogonal direction by simply forming a plurality of first slits and a plurality of second slits orthogonal to each other on the transparent conductive layer formed on the front surface side and the back surface side of the insulating sheet. And the second transparent detection electrode can be formed, and even if a slight error occurs in the shape of the second transparent detection electrode, it does not affect the detection of the input operation position. Accuracy is not required.

  According to the first or second aspect of the present invention, the contours of the first transparent detection electrode and the second transparent detection electrode are not overlapped without overlapping another member coated with the same color ink, without deteriorating the transparency. It can be set as the electrostatic capacitance type input device which does not stand out and does not impair aesthetics.

  Moreover, a 1st transparent detection electrode can be formed inside a pair of 1st slit which adjoins in a 1st direction only by forming several 1st slits which do not require high-precision process precision.

  In addition, the second transparent detection electrode wired along the first direction in the meantime is insulated from the orthogonal first transparent detection electrode only by forming a plurality of second slits along the first direction in the transparent conductive layer. The first transparent detection electrode and the second transparent detection electrode for detecting a two-dimensional input operation position can be easily formed.

  Further, the gap between the first transparent detection electrodes generated by setting the first transparent detection electrodes to an arbitrary width is not noticeable due to the formation of the first dummy pattern, and further, the first dummy detection pattern is formed on the first transparent detection electrode. Even if it is arranged between them, since it is divided into a plurality of patterns by the unit of the second transparent detection electrode by the insulating slit, the detection accuracy of the input operation position is not affected.

1 is a plan view of a capacitive input device 1 according to an embodiment of the present invention. 1 is a side view of a capacitive input device 1. FIG. It is a partial enlarged bottom view of laminated input detection areas 2A and 3A. It is a partial enlarged bottom view of the input detection area 2A. It is a partial enlarged plan view of the input detection area 3A. FIG. 4 is a sectional view taken along line AA in FIG. 3. 2 is a circuit diagram showing a basic configuration of a touch panel 100. FIG. It is a partial enlarged plan view of input detection area 3A concerning other embodiments. It is the top view to which the intersection part of the detection electrodes 111 and 112 of the conventional electrostatic capacitance type input device 100 was expanded.

  Hereinafter, a method for forming the capacitance type input device 1 and the transparent detection electrodes 10X and 10Y of the capacitance type input device 1 according to an embodiment of the present invention will be described with reference to FIGS. The capacitive input device according to the present embodiment is a capacitive touch panel (hereinafter simply referred to as a touch panel) 1 and detects an input operation position on the same operating principle as the touch panel 100 shown in FIG. Therefore, the same number is used for the same function, and the detailed description is omitted. Moreover, although the whole laminated structure shown in FIG. 2 of the touch panel 1 is formed of a transparent body as will be described later, in each of the drawings excluding FIG. 2, for easy understanding, the upper transparent insulating sheet 2 and the lower transparent body The outline of the insulating sheet 3, each slit, and the lead wire 5 are represented by solid lines.

  The touch panel 1 includes a plurality of X-side transparent detection electrodes 10X along the Y direction in the input detection region 2A of the upper transparent insulating sheet 2 and the upper transparent insulating sheet in order to detect an input operation position in the orthogonal XY directions. A number of Y-side transparent detection electrodes 10Y are wired along the X direction in the input detection region 3A of the lower transparent insulating sheet 3 that faces the two input detection regions 2A via the insulating spacer sheet 4.

  The two transparent insulating sheets 2 and 3 are various materials such as plastic sheets such as polyethylene terephthalate (PET) and polyimide, glass substrates, etc., as long as the material can form a thin transparent conductive layer in the input detection areas 2A and 3A. Here, it is made of PET which has transparency and flexibility and can be easily laminated. In the structure shown in FIG. 2, the upper transparent insulating sheet 2 and the lower transparent insulating sheet 3 are similarly laminated in three layers vertically with an insulating spacer sheet 4 formed of PET interposed therebetween. A hard glass substrate that protects the input detection areas 2A and 3A and a transparent design sheet that indicates that the input detection areas 2A and 3A are input operation areas may be stacked on the sheet 2 in an overlapping manner.

  As shown in FIG. 1, the input detection areas 2A and 3A overlap with the same rectangular outline in the vertical direction in a state where the upper transparent insulating sheet 2 and the lower transparent insulating sheet 3 are laminated, and the input detection areas 2A and 3A. A lead-out line 5 made of a thin silver wire that connects each X-side transparent detection electrode 10X and each Y-side transparent detection electrode 10Y to the X-axis input switch 106 and Y-axis input switch 104, respectively, is printed and formed in a blank area 6 around ing.

  A number of X-side transparent detection electrodes 10X wired to the input detection region 2A can be formed of any transparent conductive material, but here, PEDOT / PSS (polyethylenedioxythiophene / polystyrene sulfonic acid capable of forming a thin film on PET) ). As shown in FIG. 4, a thin film conductive layer in which PEDOT / PSS is formed with a thickness of several tens of nanometers is formed on the entire surface of the input detection region 2A by sputtering, vacuum evaporation, CVD, screen printing, or the like. Each X-side transparent detection electrode 10X is between a pair of X-side slits 11X and 11X adjacent in the X direction, among a number of X-side slits 11X from which a part of the thin film conductive layer is removed along the Y direction. The thin film conductive layer is formed.

  By alternately changing the pitch between adjacent X-side slits 11X along the X direction, X-side slits 11X and dummy patterns 13 are alternately formed from the thin film conductive layers divided in the X direction. Here, each X-side transparent detection electrode 10X has an X-direction width D (10X) determined to be a constant width based on the X-direction width of the input operation body and the X-direction resolution of the touch panel 1, and adjacent X-side transparent detections. Since the pitch P (10X) between the electrodes 10X is also determined to be a constant width from the X-direction width of the input detection area 2A and the number of switching terminals of the X-axis input switch 106, the pitch P (10X) to the X-direction width D ( 10X) and the dummy pattern 13 is formed in the remaining width excluding the width of the X-side slits 11X for two rows.

  The groove width in the X direction of the X-side slit 11X is set between 20 μm and 100 μm. Here, a laser beam having a spot diameter of 40 μm is irradiated along the Y direction, and the thin film conductive layer is removed with a width of 40 μm. The X-side slit 11X is formed. Since the groove width visible to an operator with a visual acuity of 1.0 at a distance of 43 cm from the input detection area 2A is 120 μm, if the groove width in the X direction of the X-side slit 11X is 100 μm or less, normal use In the state, the X-side slit 11X is not visually recognized. On the other hand, when the thickness is less than 20 μm, the capacitance with the adjacent dummy pattern 13 is increased and capacitively coupled, thereby affecting the input position detection accuracy in the X direction. It becomes.

  The outline of the X-side transparent detection electrode 10X surrounded by the pair of X-side slits 11X having a width of 40 μm is not visually recognized, and in the gap between the adjacent X-side transparent detection electrodes 10X, the X-side transparent detection electrode 10X Since the dummy pattern 13 made of the same transparent conductive material is formed, the gap is inconspicuous.

  Each dummy pattern 13 is further divided into a plurality of dummy patterns 13 in the Y direction by a plurality of insulating slits 14 obtained by removing a part of the thin film conductive layer of the dummy pattern 13 along the X direction. As shown in FIG. 3, the plurality of insulating slits 14 are irradiated with laser light having a spot diameter of 40 μm along both sides of a projected shape obtained by projecting a Y-side slit 11 </ b> Y described later onto the input detection region 2 </ b> A. The thin film conductive layer is removed at 40 μm. Therefore, each dummy pattern 13 divided by the plurality of insulating slits 14 is divided in the Y direction in units of a Y-side transparent detection electrode 10Y described later divided by the Y-side slit 11Y. Since the groove width of the insulating slit 14 is also 40 μm, it is not visually observed and the outline of the divided dummy pattern 13 is not conspicuous. On the other hand, each dummy pattern 13 is divided into a plurality of Y-direction transparent detection electrodes 10Y in the Y direction, so that the large-area dummy pattern 13 does not face the input operation body and affects the detection of the input operation position. do not do. Moreover, as shown in FIG. 6, since the insulating slit 14 and the Y-side slit 11Y are stacked without overlapping in the vertical direction, portions with extremely different transparency do not appear linearly.

  A number of Y-side transparent detection electrodes 10Y wired in the input detection region 3A are also formed of the same PEDOT / PSS as the X-side transparent detection electrode 10X. As with the X-side transparent detection electrode 10X, each Y-side transparent detection electrode 10Y has a PEDOT / VD method formed on the entire surface of the input detection region 3A by sputtering, vacuum deposition, CVD, screen printing, or the like, as shown in FIG. Thin film conduction between a pair of Y side slits 11Y and 11Y adjacent in the Y direction from a large number of Y side slits 11Y obtained by removing a part of the thin film conductive layer formed of PSS with a thickness of several tens of nm along the X direction. Formed by layers.

  The X-side transparent detection electrode 10 </ b> X and the Y-side transparent detection electrode 10 </ b> Y wired on the opposing surfaces of the transparent insulating sheets 2 and 3 are stacked by interposing the transparent insulating sheets 2 and 3 through the spacer sheet 4. And is wired in a lattice shape when viewed from above the plane side. Since the spacer sheet 4 is interposed between the Y-side transparent detection electrode 10Y and the input operation body that performs an input operation from above, a change in stray capacitance due to the approach of the input operation body is caused by the X-side transparent detection electrode 10X. Thus, without forming the dummy pattern 13 between them like the X-side transparent detection electrode 10X, the Y-side transparent detection electrode 10Y has a pair of Y-side slits 11Y formed at equal intervals in the Y direction, 11Y is formed wider than the X-side transparent detection electrode 10X.

  The Y-side slit 11Y is also formed by irradiating a laser beam with a spot diameter of 40 μm along the X direction and removing the thin film conductive layer in the input detection region 3A with a width of 40 μm. When the groove width in the Y direction of the Y-side slit 11Y is formed so as not to be visible, the outline of the Y-side transparent detection electrode 10Y becomes inconspicuous.

  The manufacturing process of the input detection unit shown in FIG. 1 of the touch panel 1 configured as described above is as follows. First, on the entire surface of the rectangular input detection region 2A on the back surface side of the upper transparent insulating sheet 2, for example, PEDOT / PSS by screen printing. A thin film conductive layer is formed. Subsequently, with respect to the formed thin-film conductive layer, the spot diameter is 40 μm along the Y direction at positions on both sides of the X-side transparent detection electrode 10X separated from the left side of the input detection region 2A by the X-direction width D (10X). Until the right side of the input detection area 2A is reached with a pitch P (10X) between the X-side transparent detection electrodes 10X. This laser processing step is repeated to form a predetermined number of X-side transparent detection electrodes 10X at equal intervals in the X direction.

  At the same time, since the dummy pattern 13 is formed between the X-side transparent detection electrodes 10X adjacent in the X direction, for each dummy pattern 13, the Y-side slit 11Y is projected on both sides of the projection shape projected onto the input detection area 2A. Along with this, a laser beam having a spot diameter of 40 μm is irradiated to form an insulating slit 14 having a width of 40 μm from which the thin film conductive layer has been removed, and the dummy pattern 13 is divided in the Y direction in units of the Y-side transparent detection electrode 10Y.

  Subsequently, the lead-out line 5 that connects each X-side transparent detection electrode 10X formed on the input detection area 2A to each switching terminal of the X-axis input switch 106 is a blank area 6 of the upper transparent insulating sheet 2 by screen printing or the like. And processing on the upper transparent insulating sheet 2 side is completed.

  A plurality of Y-side transparent detection electrodes 10Y are also formed in the rectangular input detection region 3A on the surface side of the lower transparent insulating sheet 3 by the same method. That is, a thin film conductive layer made of PEDOT / PSS is formed on the entire surface of the force detection region 3A by screen printing, and the pitch between the upper end of the input detection region 3A and the Y-side transparent detection electrode 10Y with respect to the formed thin film conductive layer. At the position of P (10Y), a laser beam having a spot diameter of 40 μm is irradiated along the X direction to form a Y-side slit 11Y from which the thin film conductive layer is removed with a width of 40 μm, and reaches the lower end of the input detection region 3A. This laser processing step is repeated until a predetermined number of Y-side transparent detection electrodes 10Y wired in the X direction at equal intervals in the Y direction are formed.

  Thereafter, the lead lines 5 connecting the Y-side transparent detection electrodes 10Y formed on the input detection area 3A to the switching terminals of the Y-axis input switch 104 are formed in the blank area 6 of the lower transparent insulating sheet 3 by screen printing or the like. Wiring is completed and processing on the lower transparent insulating sheet 2 side is also completed.

  Subsequently, the upper transparent insulating sheet 2 and the lower transparent insulating sheet 3 subjected to the above processing are overlapped on the front and back surfaces of the spacer sheet 4 with the transparent adhesive attached to the front and back surfaces, respectively, and the spacer sheet 4 is interposed therebetween. The whole is laminated in a state where the input detection area 2A and the input detection area 3A face each other and the outlines overlap, and the manufacturing process of the input detection unit of the touch panel 1 is completed.

  In the touch panel 1 configured as described above, the switching control circuit 107 controls switching of the switching terminal of the Y-axis input switch 104 at a constant scanning cycle, and sequentially connects the oscillation circuit 105 to all the Y-side transparent detection electrodes 10Y. Then, an AC detection signal having a predetermined pulse waveform is output to the Y-side transparent detection electrode 10Y that is switched and connected.

  In the present embodiment, the other switching terminals of the Y-axis input switch 104 that are not controlled to be switched by the switching control circuit 107 are connected to a constant potential, here, to the ground potential. Therefore, all other Y-side transparent detection electrodes 10Y to which no AC detection signal is applied are grounded and act as shield plates, and high-frequency noise generated inside the device on which the touch panel 1 is disposed is grounded. It is shielded by the Y-side transparent detection electrode 10Y and does not overlap with the X-side transparent detection electrode 10X that detects the potential of the high-frequency detection signal.

  The switching control circuit 107 sequentially controls switching of the switching terminals of the X-axis input switch 106 while switching control of any switching terminal of the Y-axis input switch 104 connected to the Y-side transparent detection electrode 10Y. The X-side transparent detection electrode 10X is switched and connected to the arithmetic circuit 108, and the potential of the detection signal of the connected X-side transparent detection electrode 10X is read.

  When an input operation body such as a finger approaches the input detection areas 2A and 3A, the floating capacitance between the input operation body of the X-side transparent detection electrode 10X and the Y-side transparent detection electrode 10Y whose wiring position in the XY direction is closest to the input operation body Therefore, a part of the AC detection signal flowing through the X-side transparent detection electrode 10X and the Y-side transparent detection electrode 10Y leaks to the input operating body side through the stray capacitance, and the potential of the AC detection signal detected by the arithmetic circuit 108 is , Lower than the potential before the input operating body approaches. Accordingly, the arithmetic circuit 108 detects the input detection region 2A of the X-side transparent detection electrode 10X that has detected the lowest AC detection potential during the one scanning period and the Y-side transparent detection electrode 10Y to which an AC detection signal has been applied. 3A, an input operation position represented by XY coordinates is detected from the wiring position on 3A, and is output to the control circuit 109 that processes the input operation position.

  In the above-described embodiment, as shown in FIG. 5, a dummy pattern like the first dummy pattern 13 in the input detection region 2A is not formed between the Y-side transparent detection electrodes 10Y to which the AC detection signal is applied. Although it is formed in a width, the facing area between the X-side transparent detection electrode 10X facing at the crossing position is enlarged, and for example, the insulation interval between the X-side transparent detection electrode 10X and the Y-side transparent detection electrode 10Y is 100 μm or less. Then, the capacitance formed in the meantime increases, and the amount of change in the stray capacitance of the X-side transparent detection electrode 10X and the Y-side transparent detection electrode 10Y due to the relative proximity of the input operation body decreases, and the input The detection accuracy of the operation position decreases.

  Therefore, the second dummy pattern 16 surrounded by the ring-shaped insulating slit 15 is formed on either the X-side transparent detection electrode 10X or the Y-side transparent detection electrode 10Y facing each other at the intersecting position to reduce the facing area between the two. It may be a thing. Hereinafter, another embodiment of the present invention in which the second dummy pattern 16 is formed on a part of the Y-side transparent detection electrode 10Y will be described with reference to FIG. In FIG. 8, the same or similar components as those in the above embodiment are denoted by the same reference numerals, and the description thereof is omitted.

  In this embodiment, with respect to the thin-film conductive layer in the input detection region 3A, between the Y-side transparent detection electrode 10Y partitioned by the Y-side slit 11Y and the X-side transparent detection electrode 10X indicated by a broken line in the figure A ring-shaped insulating slit 15 is formed by irradiating a laser beam having a rectangular outline with a spot diameter of 40 μm at the intersection position, and the thin-film conductive layer is removed with a width of 40 μm, and the thin-film conductive is formed inside the ring-shaped insulating slit 15. A second dummy pattern 16 composed of layers is formed.

  As a result, the Y-side transparent detection electrode 10Y at the position intersecting with the X-side transparent detection electrode 10X becomes narrow by forming the ring-shaped insulating slits 15 above and below in the Y direction, and the X-side transparent detection at the intersection position is performed. The capacitance formed with the electrode 10X decreases, the amount of change in the stray capacitance between the X-side transparent detection electrode 10X and the Y-side transparent detection electrode 10Y relatively increases, and the input operation sensitivity increases.

  Even when the second dummy pattern 16 is formed in this way, it is formed of a transparent conductive layer made of the same material as that of the Y-side transparent detection electrode 10Y and is surrounded by the ring-shaped insulating slit 15 having a line width that is not visually recognized. Absent.

  Further, since the second dummy pattern 16 is formed in the input detection region 3A so as to be insulated from the Y-side transparent detection electrode 10Y, it does not affect the detection of the input operation position.

  In the above-described embodiment, since the X-side transparent detection electrode 10X and the Y-side transparent detection electrode 10Y are formed in a strip-like rectangle, the X-side slit 11X and the Y-side slit 11Y are formed along a straight line. However, a part or all of the X-side slit 11X and the Y-side slit 11Y can be formed in a curved line, and the X-side transparent detection electrode 10X or the Y-side transparent detection electrode 10Y can have various shapes.

  Further, the process of forming the slits 11X, 11Y, and 14 by removing the thin transparent conductive layer with a width of 20 μm to 100 μm is performed by laser processing that irradiates laser light, but mechanical cutting processing, etching, etc. You may form with another processing method.

  The touch panel 1 described above is a mutual capacitance type (two-wire type) electrostatic that applies an AC detection signal to one of two types of detection electrodes and detects an input operation from the potential of the AC detection signal of the other detection electrode. As described in the capacitive input detection device, a self-capacitance system (one line) such as a touch switch or a touch sensor that detects an increase in stray capacitance for one type of detection electrode and detects an input operation to the detection electrode. The present invention can also be applied to a capacitance type input detection device of formula (1).

  In the above-described embodiment, two types of X-side transparent detection electrode 10X and Y-side transparent detection electrode 10Y that are insulated from each other in the orthogonal XY directions are wired to detect a two-dimensional input operation position. As described above, a capacitance type input detection device that arranges a large number of transparent detection electrodes in one direction and detects an input operation position in one direction may be used.

  Two types of X-side transparent detection electrode 10X and Y-side transparent detection electrode 10Y are formed on the upper transparent insulating sheet 2 and the lower transparent insulating sheet 3, respectively. Two types of X-side transparent detection electrode 10X and Y-side transparent detection electrode 10Y may be formed separately.

  This is suitable for a capacitance type input device that detects an input operation position from a minute change in the stray capacitance of a transparent detection electrode caused by approaching an input operation body.

1 Capacitive Input Device 2 Upper Transparent Insulating Sheet (First Transparent Insulating Sheet)
2A Input detection area (first input detection area)
3 Lower transparent insulation sheet (second transparent insulation sheet)
3A input detection area (second input detection area)
10X X-side transparent detection electrode (first transparent detection electrode)
10Y Y side transparent detection electrode (second transparent detection electrode)
11X X side slit (first slit)
11Y Y side slit (second slit)
13 Dummy pattern 14 Insulation slit

Claims (2)

A plurality of first transparent detection electrodes wired along a second direction orthogonal to the first direction at a predetermined interval in the first direction in the first input detection region of the first transparent insulating sheet;
Wiring is performed along the first direction at a predetermined interval in the second direction to the second input detection region of the second transparent insulating sheet facing the first input detection region of the first transparent insulating sheet with an insulation interval. A plurality of second transparent detection electrodes;
A first transparent detection electrode that intersects at all intersecting positions of the plurality of first transparent detection electrodes and the plurality of second transparent detection electrodes; and a capacitance detection means that detects a change in stray capacitance between the second transparent detection electrodes. Prepared,
The first transparent detection electrode and the second transparent detection electrode in which the stray capacitance changes between the first transparent detection electrode and the second transparent detection electrode intersected at the crossing position when the input operation body approaches and in the first direction and the second direction of the second transparent detection electrode A capacitance type input device that detects an input operation position in a first direction and a second direction of an input operation body from a wiring position,
The transparent conductive layer formed on the entire surface of the first input detection region is divided into a plurality of transparent conductive layers by a plurality of first slits from which the transparent conductive layer is removed with a line width of 100 μm or less along the second direction. The plurality of first transparent detection electrodes and the plurality of first dummy patterns are alternately formed in the first direction by the transparent conductive layer between the first slits adjacent in the first direction,
The transparent conductive layer formed on the entire surface of the second input detection region is divided into a plurality of transparent conductive layers along the first direction by a plurality of second slits from which the transparent conductive layer has been removed. The electrode is formed by a transparent conductive layer between a pair of second slits adjacent in the second direction,
In each of the first dummy patterns formed along the second direction, the transparent conductive layer is removed with a line width of 100 μm or less along both sides of the projected shape in which the second slit is projected onto the first input detection region. The electrostatic capacitance type input device is divided into a plurality of mutually insulated patterns by a plurality of insulating slits . A plurality of first transparent detection electrodes wired along a second direction orthogonal to the first direction at a predetermined interval in the first direction on the first input detection region on the surface side of the transparent insulating sheet
A plurality of second transparent detection electrodes wired along the first direction at a predetermined interval in the second direction on the second input detection region on the back side of the transparent insulating sheet;
A first transparent detection electrode that intersects at all intersecting positions of the plurality of first transparent detection electrodes and the plurality of second transparent detection electrodes; and a capacitance detection means that detects a change in stray capacitance between the second transparent detection electrodes. Prepared,
The first transparent detection electrode and the second transparent detection electrode in which the stray capacitance changes between the first transparent detection electrode and the second transparent detection electrode intersected at the crossing position when the input operation body approaches and in the first direction and the second direction of the second transparent detection electrode A capacitance type input device that detects an input operation position in a first direction and a second direction of an input operation body from a wiring position,
The transparent conductive layer formed on the entire surface of the first input detection region is divided into a plurality of transparent conductive layers by a plurality of first slits from which the transparent conductive layer is removed with a line width of 100 μm or less along the second direction. The plurality of first transparent detection electrodes and the plurality of first dummy patterns are alternately formed in the first direction by the transparent conductive layer between the first slits adjacent in the first direction,
The transparent conductive layer formed on the entire surface of the second input detection region is divided into a plurality of transparent conductive layers along the first direction by a plurality of second slits from which the transparent conductive layer has been removed. An electrode is formed by a transparent conductive layer between a pair of second slits adjacent in the second direction;
In each of the first dummy patterns formed along the second direction, the transparent conductive layer is removed with a line width of 100 μm or less along both sides of the projected shape in which the second slit is projected onto the first input detection region. The electrostatic capacitance type input device is divided into a plurality of mutually insulated patterns by a plurality of insulating slits .

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