JP6608631B2 - Filtration device and filter cleaning method for filtration device - Google Patents

Description

  The present invention relates to a filtration device that filters a fluid using a filter, and in particular, a filtration device that can remove deposits inside the filter medium and the filtrate chamber side surface generated by backwashing and the like without removing the filter, and The present invention relates to a filter cleaning method for a filtration device.

  Conventionally, filtration of water such as seawater, lake water, river water, water supply, sewerage, filtration of liquids used in general industries such as cooling water or process liquid of various devices, filtration of gases of various raw materials used in chemical factories, etc. In order to capture and remove fine particles, dust and the like contained therein, various filtering devices are used.

  When filtration by the filtration device is continued for a long period of time, solid matter trapped in the filter medium, gel-like dust, etc. accumulates in the filter medium, and the resistance to the fluid passing through the filter medium increases. It becomes difficult to filter the resulting fluid. In order to cope with this, for example, an operation called “back washing” is performed to periodically remove the trapped material adhering to the filter medium through the fluid in a direction opposite to that during filtration, thereby restoring the filter medium's filtration performance. This method of “back washing” is a method that can easily reduce the passage resistance of the filter medium and bring it close to the initial passage resistance without decomposing the filter medium. In particular, the filtration device provided with the backwash fluid discharge pipe is excellent in that the backwash can be performed without interrupting the filtration.

  As such a “backwashing” filtering device, a cylindrical strainer (casing) body having an inlet and an outlet has a cylindrical filtering element built in, and the fluid passes from the inside to the outside of the filtering element. In the filtration device that performs filtration, a suction pipe having a brushed foreign substance suction mechanism (suction head) is rotatably provided in the filtration element, and a discharge pipe (backwash fluid) is connected to the suction pipe via a communication mechanism. There is a filtration device in which a discharge pipe is connected (for example, see Patent Document 1).

  Also, a filtration device that performs filtration by allowing fluid to pass from the inside to the outside of the cylindrical filter element, wherein a back-washing nozzle that communicates with the low-pressure discharge port is disposed inside the filter element. Yes, the nozzle scans the inner peripheral surface of the filter element, and the filter element can be backwashed by flowing the fluid from the outside of the filter element through the filter element and flowing into the nozzle to be discharged from the discharge port. (For example, refer to Patent Document 2).

JP 2012-16672 A Special table 2008-507391

  As in each of the filtration devices described above, the surface of the filter on the side of the undiluted solution chamber is obtained by performing “backwashing” in which the fluid is periodically passed through the filter medium in the direction opposite to that during filtration, particularly backwashing using a suction head with a brush. The trapped substance adhering to the filter can be removed, but it may be difficult to remove the deposit on the inside of the filter medium or the filtrate chamber side surface. Such deposits on the inside of the filter medium or on the filtrate chamber side surface may occur, for example, when fine particles get caught in the gaps of the mesh during filtration, or fibrous substances get entangled with the mesh. Also, fine particles contained in the filtered fluid used for backwashing are trapped and adhered to the surface of the filter chamber or inside the filter medium when passing from the filtrate chamber side to the stock solution chamber side during backwashing. There is a case. This is also the case in the filtered fluid, even if it passes during filtration, depending on the orientation of the fine particles and fibers when passing, such as fine particles with a size close to the eyes of the filter medium, elongated fine particles, and fibers. This is because there are some that are captured without passing through.

  For example, as shown in FIG. 7, the conventional filter medium has a fine mesh for filtration, an intermediate mesh for flow dispersion and intermediate reinforcement, a thick and coarse mesh for reinforcement, etc., arranged from the stock solution chamber side. It may have a multilayer structure. When such a filter is back-washed, a part of the fine particles contained in the filtered fluid passing from the filtrate chamber side to the stock solution chamber side is captured at the interface between the fine mesh and the intermediate mesh inside the filter medium. There is a case. Part of the trapped particulates can be removed by the flow of fluid from the stock solution chamber side to the filtrate chamber side during normal filtration, but some may get stuck or stick between the two meshes. is there. Deposits such as fine particles clogged from the filtrate chamber side of the filter can be removed by the flow of fluid from the filtrate chamber side to the stock solution chamber side by further backwashing, or by the sliding contact of the brush from the stock solution chamber side. There is a problem that accumulation of deposits causes an increase in fluid passage resistance. In order to cope with this problem, it has conventionally been necessary to periodically remove and clean the filter to remove the deposits on the inside of the filter medium and the filtrate chamber side surface of such a filter.

  The present invention addresses the above problems and provides a filtration device and a filter washing method for the filtration device that can remove the deposits inside the filter medium and the filtrate chamber side surface generated by backwashing and the like without removing the filter. Its purpose is to provide.

In order to solve the above-mentioned problems, a filtration device according to the present invention has a fluid inlet and a fluid outlet, communicates with the fluid inlet inside the raw liquid chamber for containing the fluid before filtration, and communicates with the fluid outlet after filtration. A casing having a filtrate chamber for containing the fluid, and a filter installed inside the casing and filtering the fluid by passing the fluid from the stock solution chamber side to the filtrate chamber side. In a filtration device capable of backwashing to remove the trapped substance adhering to the filter by passing from the side to the stock solution chamber side, a high-pressure fluid is passed through the filter from the stock solution chamber side to the filtrate chamber side. A high-pressure cleaning mechanism is provided to remove deposits on the inside of the filter and the surface of the filtrate chamber by high-pressure cleaning, and is arranged so as to contact a part of the filter from the stock solution chamber side. Backwashing head for sucking the fluid in the filtrate chamber through the filter, contact surface position moving means for moving the contact surface position of the backwashing head with respect to the filter, and the backwashing head sucked A backwashing means including a backwashing fluid discharge pipe for discharging the fluid to the outside of the casing, and is provided at a portion of the backwashing head that is in contact with a part of the filter. A removal brush planted around a slit-like suction hole covering the entire length is provided.

Further, the filter cleaning method for a filtration device according to the present invention has a fluid inlet and a fluid outlet, and is connected to the fluid inlet and accommodates an unfiltered fluid chamber therein, and a fluid after filtration connected to the fluid outlet. And a filter that is installed inside the casing and filters the fluid by passing the fluid from the stock solution chamber side to the filtrate chamber side, and the fluid from the filtrate chamber side. A filter cleaning method for cleaning the filter of a filtration device capable of backwashing to separate the trapped matter attached to the filter by passing it to the stock solution chamber side, and attached to the surface of the filter on the stock solution chamber side The removal of the trapped substance is sucked by passing the fluid in the filtrate chamber through the filter by a backwash head arranged so as to be in contact with a part of the filter from the stock solution chamber side, The contact surface position of the backwash head with respect to the filter is moved by a contact surface position moving means, and the fluid sucked by the backwash head is discharged to the outside of the casing by a backwash fluid discharge pipe. When the filter medium of the filter is back-washed using a removal brush provided around the slit-like suction hole that is provided in a portion contacting the part of the filter and covers the entire length of the filter medium of the filter, while seeking collected scraped the scavenger by removing brush, done by backwashing the entire surface of the filter medium, the removal of deposits of the internal and the filtrate chamber side of the surface of the filter, the filtrate chamber side from the stock solution chamber side This is performed by high-pressure washing in which a high-pressure fluid is jetted and washed so as to pass through the filter.

  In the filtration device and the filter cleaning method of the filtration device according to the present invention, the high-pressure cleaning mechanism or the high-pressure cleaning is performed by injecting fluid obliquely with respect to the surface of the filter on the stock solution chamber side. The part may be a jet along the surface to remove the deposits on the surface.

According to the filtering device of the present invention, the trapped material adhered to the filter by passing the fluid from the filtrate chamber side to the filtrate chamber side while filtering the fluid from the filtrate chamber side to the filtrate chamber side. In the filtration device capable of backwashing, the high pressure fluid is sprayed from the stock solution chamber side to the filtrate chamber side so as to pass through the filter, and the deposits on the inside of the filter and the surface of the filtrate chamber side are washed with high pressure. And a backwash head that is disposed so as to contact a part of the filter from the stock solution chamber side and sucks the fluid in the filtrate chamber through the filter, and a filter for the filter. Contact surface position moving means for moving the contact surface position of the backwash head, and a backwash fluid discharge pipe for discharging the fluid sucked by the backwash head to the outside of the casing. Nde provided configured backwashing means, and the backwash is provided in the filter portion contact facing portion of the head, has been removed bristles around the slit-like suction holes covering the entire length of the filter medium of the filter By providing a brush, deposits on the inside of the filter and the surface of the filtrate chamber generated by backwashing can be removed by high-pressure washing without removing the filter, and the captured matter is scraped off by the removal brush. Can do.

According to the filter cleaning method of the filtration device of the present invention, the backwash head is arranged so that the trapped substances adhering to the surface of the filter on the stock solution chamber side are in contact with a part of the filter from the stock solution chamber side. The fluid in the filtrate chamber is sucked through the filter, the contact surface position of the backwash head with respect to the filter is moved by the contact surface position moving means, and the fluid sucked by the backwash head is backwashed. Removal removed by discharging to the outside of the casing by a discharge pipe , and planted around a slit-like suction hole provided on a part of the backwashing head that contacts a part of the filter and covers the entire length of the filter medium of the filter with a brush, carried by the removing brush when backwashing the filter medium of the filter the capture was scraped taken while seeking, by backwashing the entire surface of the filter medium, The removal of deposits on the inside of the filter and the surface of the filtrate chamber side is performed by high-pressure washing in which a high-pressure fluid is jetted and washed so as to pass through the filter from the stock solution chamber side to the filtrate chamber side, Deposits generated inside the filter and the surface on the filtrate chamber side caused by backwashing can be removed by high-pressure washing without removing the filter, and the trapped matter can be scraped off by the removal brush.

  In the filtering device and the filter cleaning method of the filtering device according to the present invention, high-pressure cleaning is performed by injecting fluid obliquely with respect to the surface of the filter on the side of the stock solution chamber, and a part of the fluid is jetted along the surface As a result, the deposits on the surface of the filter on the stock solution chamber side can also be removed. Therefore, while avoiding the problem that this deposit is pushed into the filter medium by the fluid jet and causes clogging, it is possible to remove the deposit inside the filter medium and the surface of the filtrate chamber with the fluid passing through the filter. .

It is explanatory drawing which shows the whole structure of 1st Embodiment of the filtration apparatus by this invention, (a) is a cross-sectional view, (b) is a longitudinal cross-sectional view. It is a longitudinal cross-sectional view which shows an example of the high pressure washing | cleaning mechanism of the filtration apparatus of FIG. It is explanatory drawing which shows the example of piping in the case of arrange | positioning two or more filtration apparatuses of FIG. It is explanatory drawing which shows the whole structure of 2nd Embodiment of the filtration apparatus by this invention, (a) is a cross-sectional view, (b) is a longitudinal cross-sectional view. It is explanatory drawing which shows the whole structure of 3rd Embodiment of the filtration apparatus by this invention, (a) is a cross-sectional view, (b) is a longitudinal cross-sectional view. It is a longitudinal cross-sectional view which shows the whole structure of 4th Embodiment of the filtration apparatus by this invention. It is sectional drawing which shows an example of the filter medium structure of a filter.

Hereinafter, embodiments of the present invention will be described with reference to the accompanying drawings.
[First Embodiment]
FIG. 1 is an explanatory diagram showing the overall configuration of a first embodiment of a filtration device according to the present invention. (A) is the BB sectional drawing of (b), (b) is the AA sectional view of (a). This filtering device is for filtering ballast water of a ship, for example, and performs filtration by flowing a fluid from a fluid inlet through a filter and flowing out from a fluid outlet, and without using a backwash head or the like to be described later. The flow path of the fluid is switched by a piping system, and the filter is backwashed by flowing the fluid from the fluid outlet through the filter to the fluid inlet. The filtration device includes a casing 1, a partition wall 2, and a filter element 3, and further includes a high-pressure cleaning mechanism 5.

  The casing 1 forms an outer shell of the filtration device, and includes a casing body 1a and a casing lid 1b. The casing body 1a has a bottomed cylindrical shape (for example, a cylindrical shape), a rectangular parallelepiped shape, and the like. For example, the casing main body 1a has a fluid inlet 6 through which fluid flows from the outside to the upper portion of the side wall, It has a fluid outlet 7 that flows out to the outside. The casing lid 1b is a lid that is placed on the casing body 1a and seals the inside of the casing 1. The lid 1b is provided with a through hole 1c for installing the high-pressure washing mechanism 5, which is sealed by a small flange 57 described later. The material of the casing 1 is metal or synthetic resin, and the shape and size thereof may be appropriately determined according to the purpose of use of the filtration device, the type and amount of fluid to be passed, the installation location, and the like.

  A partition wall 2 is horizontally provided at a lower portion inside the casing 1. The partition wall 2 includes a raw liquid chamber 8 (upper side) that communicates the inside of the casing 1 with the fluid inlet 6 and accommodates a fluid before filtration, and a filtrate chamber 9 that communicates with the fluid outlet 7 and accommodates a fluid after filtration. It is a wall that is isolated on the lower side. A through-hole is provided in the central portion of the partition wall 2, and the cylindrical portion 10 is provided so as to project upward from the through hole.

  A cylindrical filter element 3 is vertically provided in the stock solution chamber 8 on the upper side of the partition wall 2 inside the casing 1, and a lower end of the filter element 3 penetrates the cylindrical portion 10 and can be rotated. And communicated with the stock solution chamber 8 through the inside of the cylindrical portion 10. The filter element 3 serves as a filter for passing a fluid from the stock solution chamber side to the filtrate chamber side to be filtered, and includes a filter medium 31 having a cylindrical surface, a lower closing plate 32 forming the lower end portion, and an upper end. An upper closing plate 33 that forms a part, and passes the target fluid from the outside to the inside, passes through the filter medium 31, captures and filters solid content, gel-like dust, and the like contained in the fluid. .

  Similarly to the conventional filter medium shown in FIG. 7, the filter medium 31 may be any layer as long as it is laminated in a plurality of layers and the outermost layer has the finest mesh. There are ones that are shaped and sintered into a cylindrical shape, those that are made of cylindrical notch wires, and those that are made of wedge wires. In the case of the sintered material, the innermost mesh has a mesh size of 10 to 200 μm, and the inner layer has a mesh size of 200 to 5000 μm. In this case, the reinforcing mesh and the protective mesh other than the outermost layer are related to the strength of the filter element 3, and the number of layers, the size of the mesh, and the wire diameter are selected so that the required strength can be obtained. Moreover, plain weave, twill weave, satin weave, tatami weave, twill tatami weave and the like can be applied as the mesh weave. In addition, the innermost layer is a metal mesh and sintered with a cylindrical punching plate having numerous square holes formed on the outer side and a reinforcing member in which a plurality of thin rods are arranged in the vertical and horizontal directions. May be.

  The lower closing plate 32 has a disc shape, and the outer periphery is fitted and fixed to the cylindrical filter medium 31, and a through hole 34 is provided in the center portion thereof, and the tube The shaped part 10 is fitted so as to be rotatable. A groove is provided on the inner periphery of the through hole 34 to provide an O-ring 12, and a seal is formed between the outer periphery of the cylindrical portion 10. A bearing 11 is provided between the lower surface of the lower blocking plate 32 and the upper surface of the partition wall 2, and supports the weight of the filter element 3 and rotatably holds it.

  On the other hand, the upper closing plate 33 also has a disk shape, and its outer periphery is fitted and fixed to the tubular filter medium 31. A central portion of the upper closing plate 33 is connected to a rotating shaft 14 extending from the geared motor 13 provided on the upper side of the casing lid 1b through the through hole 1d of the casing lid portion 1b. Thereby, the filter element 3 can be rotated by the geared motor 13. A bearing 15 is also provided between the upper surface of the upper closing plate 33 and the lower surface of the casing lid 1b, and an O-ring 16 is provided on the inner periphery of the through hole 1d. The seal is formed.

  Here, in the present invention, the high pressure washing mechanism 5 is provided inside the filtrate chamber 9. The high-pressure washing mechanism 5 injects a high-pressure fluid from the stock solution chamber 8 side so as to pass through the filter medium 31, and the inside of the filter medium 31 and the surface of the filtrate chamber 9, that is, the inner side of the filter element 3 communicating with the filtrate chamber 9. In this embodiment, fluid (clean water) pressurized by a high pressure pump or the like is ejected from two nozzles 53a and 53b provided on the stock solution chamber side. The nozzles 53 a and 53 b are reciprocated in a direction parallel to the axis of the cylindrical filter element 3 so that fluid can be ejected over the entire length of the filter medium 31. As in the case of backwashing, the entire surface of the filter medium 31 can be washed at high pressure by ejecting fluid while rotating the filter element 3 with the geared motor 13.

  As shown in FIG. 2, the high-pressure cleaning mechanism 5 includes an inner tube 51, a moving cylinder 52, two nozzles 53a and 53b, and two fluid supply paths 54a and 54b.

  The inner tube 51 is a cylindrical member and includes guide portions 51a and 51b on both sides in the length direction and a piston portion 51c projecting in a disc shape at the center. The lower end of the lower guide portion 51b is detachably fitted and fixed to a seat 56 provided on the upper surface of the partition wall 2. Further, a disk-shaped small flange 57 is fitted to the outer periphery near the upper end of the upper guide portion 51a, and the small flange 57 is fixed to the upper surface of the casing lid 1b so as to cover the through hole 1c. The entire cleaning mechanism 5 is fixed to the casing 1. With this structure, the entire high-pressure washing mechanism 5 is configured to be detachable from the casing 1 through the through hole 1c without disassembling the casing 1. Both ends of the inner pipe 51 are sealed, and the inside is a cavity and two fluid supply paths 54a and 54b are accommodated.

  The moving cylinder 52 is fitted to the outer periphery of the piston portion 51c, and both outer ends are closed and the outer circumferences of the guide portions 51a and 51b are fitted into through holes formed in the closed portions. It is provided so as to be movable in the axial direction of the inner tube 51. These fitting portions are sealed with O-rings or the like, and fluid chambers 55a and 55b communicating with the fluid supply paths 54a and 54b are formed on both sides of the piston portion 51c inside the moving cylinder 52. .

  Two nozzles 53a and 53b communicating with the fluid chambers 55a and 55b are attached to both ends of the moving cylinder 52, respectively.

The two fluid supply paths 54a and 54b are provided so as to communicate with the fluid chambers 55a and 55b from the outside through the inside of the inner pipe 51. For example, a fluid such as high-pressure (P _H ) clean water pressurized by a pressurizing pump or the like is controlled by a three-way valve V _H and is alternately supplied to the two fluid supply paths 54a and 54b, and fluid chambers 55a and 55b. The fluid is ejected from the nozzles 53a and 53b attached to the moving cylinder 52 while moving the moving cylinder 52 upward and downward, respectively. The pipe resistance of the fluid supply paths 54a and 54b is sufficiently lower than the pipe resistance of the nozzles 53a and 53b.

The high-pressure cleaning can be performed in a state where the fluid in the filtration device, particularly the stock solution chamber 8, is removed so that the injection speed is not reduced. When the position of the fluid inlet 6 is high as shown in FIG. 1, the fluid in the stock solution chamber 8 may not be completely removed from the fluid inlet 6, so the high-pressure washing discharge port that discharges the fluid in the stock solution chamber 8 to the outside of the filtration device. 17 is provided near the lower end of the stock solution chamber 8 of the casing body 1a. The high-pressure cleaning discharge port 17 is also provided with an open / close valve (high-pressure cleaning discharge valve V _E ), and is opened only during high-pressure cleaning. In the present embodiment, the valve _VE is a manual valve, but may be an automatic valve. However, as will be described later, it is possible to perform high-pressure cleaning without draining the fluid in the stock solution chamber 8, and in this case or when the position of the fluid inlet 6 is low, the high-pressure cleaning discharge port 17 or the high-pressure cleaning discharge valve _VE. Is not necessarily required.

  Further, in the present embodiment, the nozzles 53a and 53b of the high-pressure cleaning mechanism 5 are provided so as to inject fluid obliquely with respect to the surface of the filter medium 31 on the side of the stock solution chamber 8 when viewed from above (FIG. )reference). This is because if the fluid is ejected vertically, the deposits remaining on the surface of the filter medium 31 on the side of the stock solution chamber 8 may be pushed into the filter medium 31 to cause clogging. For this reason, the fluid is ejected obliquely with respect to the surface of the filter medium 31 on the side of the stock solution chamber 8, and a part of the fluid does not pass through the filter medium 31 and becomes a jet along the surface. The surface deposits are also removed. Thereby, while avoiding the problem that this deposit is pushed into the inside of the filter medium 31 by the fluid jet and causes clogging, the deposit on the surface of the filter medium 31 and the filtrate chamber 9 side is removed by the jet fluid passing through the filter medium 31. Can be removed. When fluid ejection is performed while rotating the filter element 3 as in the present embodiment, the fluid ejection direction is preferably inclined so as to be “head wind” with respect to the movement direction of the surface of the filter medium 31 by the rotation (see FIG. 1 (a)). The ejected fluid normally spreads in a conical shape from the nozzles 53a and 53b, so that the adhering material on the surface of the rotating filter medium 31 on the side of the stock solution chamber 8 first has a shallow angle (slightly inside the tangent to the cylindrical surface). Direction) and then, a larger angle of the jet fluid is passed through the portion of the filter medium 31 having no deposit on the surface, so that the inside of the filter medium 31 or the filtrate chamber 39 side, that is, the inside of the filter element 3 is passed. This is because the deposit on the side surface can be removed.

  However, the nozzles 53a and 53b may be provided so as to inject the fluid perpendicularly to the surface of the filter medium 31, and particularly when the surface of the filter medium 31 on the side of the stock solution chamber 8 is sufficiently clean, the surface of the filter medium 31 is provided. In some cases, it may be better to eject the fluid perpendicularly.

The distance between the filter medium 31 and the nozzles 53a and 53b, the pressure of the high-pressure cleaning fluid, and the jet shape are appropriately set according to the properties of the filter medium to be cleaned. Generally, the higher the pressure of the high-pressure cleaning fluid is set, the higher the effect of removing trapped substances. However, if the pressure is too high, the filter medium is damaged or a large pressure pump is required, which is not preferable. The pressure of the high-pressure cleaning fluid supplied to the high-pressure cleaning mechanism 5 is to remove the fluid (seawater) in the stock solution chamber 8 and clean it when high-pressure cleaning is performed on a filter medium obtained by sintering a plurality of laminated metal meshes with the filtration device of this embodiment. 5~150kg / cm ² if you, preferably when cleaning not remove the fluid 10 to 100 kg / cm ^2, the stock solution chamber 8 is 10 to 200 / cm ^2, preferably set to 20~150kg / cm ² .

Filtration device as an external piping system be filtered fluid connection to the the fluid inlet 6 of the casing 1, it is connected to the inlet side branch pipe 21, while branch 21a is closed the inlet side valve V _I midway is connected to a stock solution supply source having a primary pressure (P ₁₎ and the other branch 21b is midway connected with a drain valve V _B for example to the opened drain side to the atmospheric pressure (P ₀₎ ing. On the other hand, the fluid outlet 7 of the casing 1 is connected outlet pipe 22, the outlet pipe 22 has an outlet-side valve V _O in the middle, the filtrate storage tank having a secondary pressure (P ₂₎ Etc. are connected. Accordingly, opening the inlet-side valve V _I and the outlet valve V _O, to close the drain valve V _B, the fluid was closed and filtered state to flow from the fluid inlet 6 to the fluid outlet 7, an inlet-side valve V _I , by opening the outlet valve V _O and the drain valve V _B, it can be switched and backwash to flow back fluid from the fluid outlet 7 into the fluid inlet 6.

FIG. 3 shows an example of piping when a plurality of filtration devices are provided in parallel. In this case, the one branch 21a of each filtration device joins and is connected to a fluid supply source, and the other branch 21b. Are joined and connected to the drain, and the outlet side pipe 22 is joined and connected to a filtrate storage tank or the like. The outlet side pipe 22 before joining is provided with a line pressure adjusting mechanism during backwashing (not shown). By _switching the inlet side valves V _{I1 to 3} , the outlet side valves V _{O1 to 3} and the drain valves V _B1 to 3 of each filtration device, the operation of each filtration device (filtration, backwashing, high pressure washing) is individually switched. It is supposed to be.

  Next, operation | movement of the filtration apparatus of 1st Embodiment comprised as mentioned above is demonstrated with reference to FIG. The filter element 3 stops rotating both during filtration and backwashing.

During filtration, the inlet-side valve V _I and the outlet valve V _O of the filter is opened, the drain valve V _B is closed. The inlet side of the fluid pressure (primary pressure P ₁₎ is pressurized by a pump (centrifugal pump, etc.), since higher than the pressure on the outlet side (secondary pressure P _2), thereby, the fluid to be filtered As shown by the solid line arrow, by flowing into the stock solution chamber 8 of the casing 1 from the fluid inlet 6, passing through the cylindrical filter medium 31 and flowing into the filter element 3 communicating with the filtrate chamber 9, Filtered. The fluid filtered through the filter medium 31 flows out from the filtrate chamber 9 through the fluid outlet 7 to the outside.

During backwashing, the inlet-side valve V _I of the filtering device is closed, the outlet-side valve V _O and the drain valve VB is opened. As a result, the fluid inlet 6 of the filtration device is communicated with the low pressure side opened to the atmospheric pressure P ₀ through the drain pipe, and the pressure is reduced, and is lower than the pressure (secondary pressure P ₂ ) of the fluid outlet 7 of the filtration device. Therefore, the fluid passes through the filtrate chamber 9 and the filter element 3 from the fluid outlet 7 as shown by the white arrow, and flows back to the fluid inlet 6 through the stock solution chamber 8. The entire surface of the filter medium 31 is backwashed by the backwash flow passing through the filter element 3. Backwashing is performed at a predetermined frequency for a predetermined time in accordance with the use conditions of the filtration device (filtration speed, amount of foreign matter in the fluid, pressure loss, etc.).

The high-pressure cleaning is effective when the backwashing is performed and the trapped material on the surface of the filter medium 31 on the stock solution chamber side is removed. This is because it is possible to reduce the above-mentioned problem of causing clogging by pushing the trapped material on the surface of the filter medium 31 on the side of the stock solution chamber 8 into the filter medium 31 during high-pressure cleaning. The high-pressure cleaning can be performed without draining the fluid of the filtration device, or can be performed with the fluid of the filtration device being drained. That is, when high pressure cleaning is performed without draining the fluid, it can be performed during normal filtration, so that the downtime of the apparatus can be reduced. On the other hand, when the filtration operation is stopped and the fluid in the filtration device is removed, the spraying speed is not reduced and the cleaning effect can be enhanced. Incidentally, the pull fluid filtration device, closes the inlet-side valve V _I and the outlet valve V _O, undiluted open to filtering device pressure washing discharge valve V _{E (and} not shown in Eabe cement valve) The fluid in the chamber 8 is discharged.

  In either case, the high-pressure washing mechanism 5 is operated to inject fluid (clean water) from the two nozzles 53a, 53b provided on the stock solution chamber 8 side so as to pass through the filter medium 31 of the filter element 3. During the injection, the nozzles 53 a and 53 b are reciprocated in the direction parallel to the axis of the cylindrical filter element 3 to perform the fluid injection over the entire length of the filter medium 31. By performing fluid ejection while rotating the filter element 3 with the geared motor 13, the entire surface of the filter medium 31 is washed with high pressure. As described above, in this embodiment, the fluid ejection direction is inclined so as to be “head wind” with respect to the moving direction of the surface of the filter medium 31 by rotation (see FIG. 1A). Since the jetted fluid spreads in a conical shape from the nozzles 53a and 53b, the deposits on the surface of the rotating filter medium 31 on the side of the stock solution chamber 8 are first removed with a jet fluid at a shallow angle, and then A jet fluid having a larger angle is allowed to pass through the portion of the filter medium 31 having no deposit on the surface, and the deposit on the surface of the filter medium 31 or the filtrate chamber 9 side, that is, the filter element 3 is removed.

The operations of the reciprocating movement and the fluid ejection will be specifically described with reference to FIG. First closes the port of the fluid supply channel 54b side of the three-way valve V _H, to open the port of the fluid supply passage 54a side. Then, the high-pressure (P _H ) fluid is supplied to the upper fluid chamber 55a through the fluid supply path 54a and is ejected from the nozzle 53a, and at the same time, the moving cylinder 52 moves upward due to the pressure of the fluid. Further, since the volume of the lower fluid chamber 55b is thereby reduced, the fluid in the lower fluid chamber 55b is also ejected from the nozzle 53b communicating therewith. FIG. 2 shows this state. When the moving cylinder 52 reaches the upper end of the movable range, the three-way valve _VH is switched to close the port on the fluid supply path 54a and open the port on the fluid supply path 54b. Then, the fluid is supplied to the lower fluid chamber 55b through the fluid supply path 54b and is ejected from the nozzle 53b. At the same time, the moving cylinder 52 moves downward by the pressure of the fluid. Moreover, since the volume of the upper fluid chamber 55a is thereby reduced, the fluid in the upper fluid chamber 55a is also ejected from the nozzle 53a communicating therewith. Thus, the fluid can be ejected while reciprocating the position of the moving cylinder 52.

As described above, the pipe resistance of the fluid supply paths 54a and 54b is sufficiently lower than the pipe resistance of the nozzles 53a and 53b. Therefore, when the moving cylinder 52 shown in FIG. becomes substantially supply pressure P _H, because the balance of vertical force to the moving cylinder 52, the pressure of the pressure in the lower fluid chamber 55b also becomes substantially P _H. Accordingly, unless the supply pressure P _H is constant, the injection flow rate of the fluid from the nozzles 53a, 53b is constant. When the fluid injection flow rate from the lower nozzle 53b is constant, the volume reduction speed of the lower fluid chamber 55b is constant, and the movement speed of the moving cylinder 52 is also constant (therefore, the movement speed of the ejection position is also constant). become. Similarly, when the moving cylinder 52 is lowered, the flow rate of the fluid from each nozzle 53a, 53b is constant, and the moving speed of the moving cylinder 52 is also constant.

  The high-pressure cleaning is also performed at a predetermined frequency for a predetermined time according to the use conditions of the filtration device (filtration speed, amount of foreign matter in the fluid, frequency of backwashing, pressure loss, etc.). However, the frequency of performing high pressure cleaning may be much lower than the frequency of backwashing.

  The high-pressure cleaning mechanism 5 is not limited to the above configuration, and any mechanism that can move the entire range of the filter medium 31 of the filter element 3 and eject the fluid at a predetermined pressure may be used. For example, the movement of the nozzle position may be performed using a drive source separate from the fluid for injection, for example, an air cylinder, a hydraulic cylinder, or a motor-driven feed screw mechanism.

  In the present embodiment, the high-pressure washing mechanism 5 is always fixed in the filtration device. However, as described above, the entire high-pressure washing mechanism 5 can be detached from the casing 1 without disassembling the casing 1. Only at times may the high pressure cleaning mechanism 5 be mounted in the filtration device for high pressure cleaning.

  Further, as the high-pressure cleaning fluid, clean water is used in the present embodiment as described above. However, the fluid is not limited to this, and for example, a filtered fluid may be used. Fine particles removed by high-pressure washing flow into the filtrate chamber along with the high-pressure washing fluid, but these adhered to the backwash after passing through the filter once, and there was assistance for high-pressure fluid injection. Since it was able to pass through the filter, there is usually no problem even if it is mixed into the filtrate afterwards.

  According to the first embodiment, even in the case of a filtration device that performs backwashing by backflowing fluid from the fluid outlet 7 to the fluid inlet 6, the backwashing is performed by the injection of fluid from the stock solution chamber 8 side by the high-pressure washing mechanism 5. It is possible to remove deposits on the inside of the filter medium 31 of the filter element 3 and the surface on the side of the filtrate chamber 9 generated by the above process without removing the filter element 3.

[Second Embodiment]
FIG. 4 is an explanatory diagram showing the overall configuration of the second embodiment of the filtration device according to the present invention.
(A) is the DD sectional view taken on the line of (b), (b) is the CC sectional view taken on the line of (a). The filtering device, for the first embodiment, using the backwash mechanism consisting placed backwash heads to face contact with the portion of the filter as backwash means, high strong suction force and removing brush It has a backwashing effect. Since this filtration apparatus is the same as that of the first embodiment except for the backwashing means, common elements are denoted by the same reference numerals, and detailed description thereof is omitted.

  This filtration apparatus includes a casing 1, a partition wall 2, a filter element 3, and a backwashing mechanism 104, and further includes a high-pressure washing mechanism 5. Here, the casing 1, the partition wall 2, and the filter element 3 are the same as those in the first embodiment.

  The backwashing mechanism 104 is arranged so as to contact a part of the filter medium 31 of the filter element 3 from the stock solution chamber 8 side, sucks the fluid on the filtrate chamber 9 side through the filter medium 31, and sucks the sucked fluid. By discharging to the outside of the casing 1, the filter medium 31 is backwashed and includes a backwash head 141 and a backwash fluid discharge pipe 142. In the present specification, “suction” is not necessarily limited to drawing the fluid at a pressure lower than atmospheric pressure, but generally refers to drawing the fluid to a relatively low pressure side when there is a pressure difference. . The back washing mechanism 104 and the rotating mechanism of the filter element 3 including the geared motor 13 as the contact surface position moving means constitute the back washing means of the present embodiment. The backwash head 141 is arranged so as to be in contact with a part of the filter medium 31 and sucks the fluid on the filtrate chamber side through the filter medium 31 and is a substantially tubular member closed at both ends. It is in contact with the outside and is provided parallel to the axis. A slit-like suction hole 143 that covers the substantially entire length with the filter medium 31 is provided on the contact surface portion, and a removal brush 144 is planted around the suction hole 143. When the filter element 3 is backwashed while being rotated by the geared motor 13, the entire surface of the filter medium 31 can be backwashed while scraping off the trapped material with the removal brush 144.

  The material of the bristles of the removal brush 144 is, for example, natural or synthetic fiber, or a metal wire such as steel, copper, or brass, and is selected according to the purpose of use of the filtration device and the fluid to be passed. Further, instead of the removal brush 144, a scraper made of metal, resin or rubber formed in a blade shape or a spatula shape is provided around the suction hole 143, and is in sliding contact with the surface of the cylindrical filter medium 31. The trapped material may be removed.

On the other hand, in the vicinity of the lower end portion of the backwash head 141, a backwash fluid discharge pipe 142 is branched on the side opposite to the contact surface side with the filter medium 31. The backwash fluid discharge pipe 142 discharges the fluid sucked by the backwash head 141 to the outside of the casing 1, extends through the through-hole provided in the side surface of the casing body 1 a, and has a flange. Is connected to an external discharge pipe 145. This discharge pipe 145, the opening and closing valve _{V F} are provided. The opening and closing valve V _F is for controlling the outflow and stopping of backwash fluid, is opened during backwashing of the filter, and is closed when otherwise. The discharge side of the opening and closing valve V _F is low than the pressure of the fluid outlet 7, for example, is connected to the atmospheric pressure P ₀ is open to the drain side.

  The high-pressure washing mechanism 5 ejects fluid from the stock solution chamber side so as to pass through the filter, and removes deposits inside the filter and the filtrate chamber side. Since the configuration is the same as that of the high-pressure cleaning mechanism 5 of the first embodiment, the description thereof is omitted.

As a piping system outside the fluid to be filtered connected to the filtration device, an inlet side pipe 121 is connected to the fluid inlet 6 of the casing 1, and the inlet side pipe 121 has an inlet side valve V _I on the way. Connected to a stock solution source having a primary pressure (P ₁ ). On the other hand, the fluid outlet 7 of the casing 1 is connected outlet pipe 122, the outlet pipe 122, an outlet-side valve V _O in the middle, the filtrate storage tank having a secondary pressure (P ₂₎ Etc. are connected. The other branch 21b and the drain valve V _B of the first embodiment are not provided. Instead, as described above, an external discharge pipe 145 is connected to the backwash fluid discharge pipe 142, and the discharge pipe 145 is opened and closed on the way. It has V _F and is connected to the drain side opened to, for example, atmospheric pressure (P ₀ ).

  The operation of the filtration device of the second embodiment configured as described above is basically the same as that of the first embodiment except during backwashing.

That is, when filtered, the rotation of the filter element 3 is stopped, the inlet side valve V _I and the outlet valve V _O is opened, the opening and closing valve V _F of backwashing fluid discharge system is closed. The fluid to be filtered flows from the fluid inlet 6 into the stock solution chamber 8 of the casing 1 as indicated by the solid line arrow, and passes through the portion of the cylindrical filter medium 31 where the backwash head 141 is not in contact with the filter. By flowing into the element 3, it is filtered. The filtered fluid flows into the filtrate chamber 9 and flows out through the fluid outlet 7 as indicated by an arrow B.

During backwashing, the inlet side valve V _I and the outlet valve V _O together with is subsequently opened, the opening and closing valve V _F of the backwash fluid discharge system is opened, communicating via the backwash fluid discharge pipe 142 Thus, the pressure inside the backwash head 141 decreases, and the fluid inside the filter element 3 passes through the filter medium 31 and flows from the suction hole 143 as shown by the white arrow. Thereby, the linear portion of the filter medium 31 that contacts the suction hole 143 is back-washed. Further, since the rotation of the filter element 3 by the geared motor 13 is also started, the entire surface of the filter medium 31 is back-washed while scraping off the trapped matter with the removal brush 144. However, even during backwashing, the fluid to be filtered flows into the stock solution chamber 8 from the fluid inlet 6 as indicated by the solid arrow, and therefore does not contact the backwashing head 141 in the cylindrical filter medium 31. In part, filtration continues. Backwashing is performed at a predetermined frequency for a predetermined time according to the use conditions of the filtration device (filtration speed, amount of foreign matter in the fluid, etc.).

  Similarly to the first embodiment, the high-pressure cleaning can be performed without draining the fluid of the filtering device, or can be performed with the fluid of the filtering device being drained. That is, when high pressure cleaning is performed without draining the fluid, it can be performed during normal filtration, so that the downtime of the apparatus can be reduced. In the case of this embodiment, filtration is continued at the portion of the filter medium 31 that is not in contact with the backwash head 141 even during backwashing as described above, so that high pressure washing can also be performed during backwashing. On the other hand, when the filtration operation is stopped and the fluid in the filtration device is removed, the spraying speed is not reduced and the cleaning effect can be enhanced. In either case, the high-pressure washing mechanism 5 is operated to inject fluid (clean water) from the two nozzles 53a, 53b provided on the stock solution chamber 8 side so as to pass through the filter medium 31 of the filter element 3. During the ejection, the nozzles 53a and 53b are reciprocated in a direction parallel to the axis of the cylindrical filter element, and fluid ejection is performed on the entire length of the filter medium 31. By performing fluid ejection while rotating the filter element 3 with the geared motor 13, the entire surface of the filter medium 31 is washed with high pressure.

  According to the second embodiment, even in the case of a filtration device that performs backwashing using the backwashing head 141 or the like, the filter generated by the backwashing or the like by the injection of fluid from the stock solution chamber 8 side by the high pressure washing mechanism 5 Deposits on the inside of the filter medium 31 of the element 3 and the surface on the filtrate chamber 9 side can be removed without removing the filter element 3. In a filtration device that performs backwashing using the backwashing head 141 or the like, the suction force at the time of backwashing is large, and fine particles and the like may be easily clogged from the filtrate chamber 9 side of the filter medium 31 by backwashing. High pressure cleaning with is effective.

[Third Embodiment]
FIG. 5 is an explanatory diagram showing the overall configuration of the third embodiment of the filtration device according to the present invention. (A) is the FF sectional view taken on the line of (b), (b) is the EE sectional view taken on the line of (a). The filtering device, for the second embodiment, by placing the filter element into four parallel, in the form of increasing the processing speed. Since the other configuration is the same as that of the second embodiment, its detailed description is omitted. This filtering apparatus also filters, for example, ship ballast water, and includes a casing 201, a partition wall 202, a cylindrical filter element 203, a backwashing mechanism 204, and a high-pressure washing mechanism 205.

  The casing 201 and the partition wall 202 are basically the same as the casing 1 and the partition wall 2 of the first and second embodiments, respectively, but are configured to accommodate four filter elements 203. Each filter element 203 is the same as the filter element 3 of the first embodiment. The backwashing mechanism 204 is the same as the backwashing mechanism 104 of the second embodiment, but two backwashing mechanisms 204 are provided, and each backwashing head 241 contacts the two filter elements 203 to backwash the filter medium 231. It is configured as follows. The high-pressure cleaning mechanism 205 is the same as the high-pressure cleaning mechanism 5 of the second embodiment, but two high-pressure cleaning mechanisms 205 are provided, and each high-pressure cleaning mechanism 205 has two sets of nozzles 253a and 253b provided in two directions. The fluid is jetted onto the filter medium 231 of the two filter elements 203. In other respects, the configuration of the present filtration device is the same as that of the filtration device of the second embodiment.

The operation of the filtration device of the third embodiment configured as described above is basically the same as that of the second embodiment.
That is, at the time of filtration, as in the second embodiment, the fluid to be filtered flows into the stock solution chamber 208 of the casing 201 from the fluid inlet 206 as shown by the solid line arrow, and the reverse of each cylindrical filter medium 231. The washing head 241 is filtered by passing through a portion where the washing head 241 is not in contact and flowing into the filter element 203. The filtered fluid flows into the filtrate chamber 209 and flows out through the fluid outlet 207.

  At the time of backwashing, in this embodiment, each backwashing head 241 is in contact with the two filter elements 203, so that the fluid inside each filter element 203 passes through the filter medium 231 as indicated by white arrows. Then, it flows from the suction hole 243 and backwashes. Further, since each filter element 203 is rotated by the geared motor 213, the entire surface of the filter medium 231 is backwashed while scraping off the trapped matter with the removal brush 244. However, even at the time of backwashing, filtration is continued at a portion of the cylindrical filter medium 231 that is not in contact with the backwashing head 241.

  Similarly to the first and second embodiments, the high-pressure cleaning can be performed during the filtering operation without draining the fluid of the filtering device, or can be performed with the fluid of the filtering device being drained. As described above, in this embodiment, two high-pressure cleaning mechanisms 205 are provided, and each high-pressure cleaning mechanism 205 has two sets of nozzles 253a and 253b provided in two directions, and the two filter elements 203 adjacent to each other. The filter medium 231 is configured to eject fluid. The high-pressure washing mechanism 205 is operated to inject fluid (clean water) from the two nozzles 253a and 253b onto the filter medium 231 of each filter element 203, and the nozzles 253a and 253b are ejected from the shaft of the cylindrical filter element 203. The fluid is ejected over the entire length of the filter medium 231 by reciprocating in the parallel direction. Similar to the backwashing, the entire surface of the filter medium 231 is washed at high pressure by performing fluid ejection while rotating each filter element 203 by the geared motor 213.

  In order to maintain the injection speed, the high-pressure cleaning mechanism 205 provides the nozzles 253a and 253b in only one direction to perform high-pressure cleaning on the filter medium 231 of one filter element 203, and changes the direction of the nozzles 253a and 253b after completion. The filter medium 231 of another filter element 203 may be washed with high pressure. Also in this embodiment, the high-pressure washing mechanism 205 is always fixed in the filtration device, but a set of high-pressure washing mechanisms 205 may be attached to the filtration device only during maintenance to perform high-pressure washing. The same applies to the devices of other embodiments. Further, the two backwashing mechanisms 204 and the two high-pressure washing mechanisms 205 may be operated simultaneously or at different timings.

  According to the third embodiment, even when the plurality of filter elements 203 are arranged in parallel and the processing speed is increased, the high pressure cleaning mechanism 205 ejects fluid from the stock solution chamber 208 side, which is caused by backwashing or the like. Deposits on the inside of the filter medium 231 and the surface of the filtrate chamber 209 of the filter element 203 can be removed without removing the filter element.

[Fourth Embodiment]
FIG. 6 is a longitudinal sectional view showing the overall configuration of the fourth embodiment of the filtration device according to the present invention. This filtering device also filters ballast water of a ship, for example, and has a filter element placed horizontally to correspond to an installation place where there is no space in the vertical direction. The basic configuration of this filtration device is the same as that of the second embodiment, and includes a casing 301, a partition wall 302, a filter element 303, a backwashing mechanism 304, and a high-pressure washing mechanism 305.

The casing 301 is formed in a cylindrical shape with both ends closed, and is disposed horizontally so that the axis is horizontal. The fluid inlet 306 is eccentric with respect to the axis of the casing 301 at one end 301b of the casing 301. The fluid outlet 307 and the fluid inlet 306 are provided at the other end 301 c of the casing 301. By arranging the fluid inlet 306 eccentrically with respect to the axis of the casing 301, a space on the outer surface of the one end 301b is secured, and a geared motor 313 described later can be arranged there. In this embodiment, the fluid outlet 307 is provided on the same axis as the fluid inlet 306. As a result, the filtering device can be inserted in the middle of the straight piping. Specifically, the casing 301 includes a cylindrical casing body 301a, a left end plate 301b that forms the one end, and a right end plate 301c that forms the other end, and a fluid inlet 306 is provided in the left end plate 301b, A fluid outlet 307 is provided in the plate 301c. The position of the fluid outlet 307 can be changed within the range of the right end plate 301c. The partition wall 302 is provided vertically and separates the inside of the casing 301 into a stock solution chamber 308 on the fluid inlet 306 side and a filtrate chamber 309 on the fluid outlet 307 side.

  The filter element 303 has a cylindrical shape and the internal structure is the same as in the first to third embodiments, but is provided horizontally in the stock solution chamber 308 so that the rotation axis is in the same direction as the axis of the casing, One end portion is penetrated and supported by the cylindrical portion 310 and communicates with the filtrate chamber 309 via the cylindrical portion 310, and a rotating shaft 314 is provided at the other end portion, which is supported by the support frame 315. The support frame 315 does not hinder the flow of fluid in the left-right direction in FIG. A gear 316 is provided on the rotation shaft 314. Meanwhile, a geared motor 313 for rotating the filter element 303 is provided on the outer surface of the one end 301b of the casing 1, and an output shaft 317 extends through the one end 301b into the casing 301. A gear 318 is provided on the output shaft 317. A chain 319 is stretched between the gear 318 and the gear 316, whereby the rotation of the geared motor 313 is propagated so that the filter element 303 rotates.

  Similarly to the second embodiment, the backwashing mechanism 304 is also provided horizontally, and the backwashing head 341 is configured to contact the filter element 303 and backwash the filter medium.

  The high-pressure cleaning mechanism 305 is also provided in the horizontal direction as in the first and second embodiments, and is configured to inject fluid from the nozzles 353a and 353b to the filter medium 331 of the filter element 303. The high pressure cleaning mechanism 305 is also configured to be detachable from the casing 301. In other words, the right end of the right guide portion 351b is detachably fitted and fixed to a seat 356 provided to hang from the inner surface of the casing body 301a. A disc-shaped small flange (not shown) is fitted to the outer periphery of the left guide portion 351a in the vicinity of the left end portion, and this small flange is passed through the outer surface of the left end plate 301b and provided in the left end plate 301. By fixing so as to cover the hole (not shown), the entire high-pressure cleaning mechanism 305 is fixed to the casing 1. With this structure, the entire high-pressure cleaning mechanism 305 can be attached to and detached from the casing 301 through the through hole (not shown) without disassembling the casing 301. In other respects, the configuration of the present filtration device is the same as that of the filtration device of the second embodiment.

  The operation of the filtration device of the fourth embodiment configured as described above is basically the same as that of the second embodiment. That is, at the time of filtration, the fluid to be filtered flows into the stock solution chamber 308 in the casing 301 from the fluid inlet 306 as shown by the solid line arrow, and the backwash head 341 of the cylindrical filter medium 331 contacts the surface. Filtering is performed by passing through the non-passing portion and flowing into the filter element 303. The filtered fluid flows into the filtrate chamber 309 and flows out through the fluid outlet 307.

  At the time of backwashing, the filter medium 331 is backwashed by the fluid inside the filter element 303 passing through the filter medium 331 and flowing into the backwash head 341 as indicated by white arrows. Since the filter element 303 is rotated by the geared motor 313, the entire surface of the filter medium 331 is backwashed while scraping off the trapped material with the removal brush 344. However, even at the time of backwashing, filtration is continued at a portion of the cylindrical filter medium 331 that is not in contact with the backwashing head 341.

  Similarly to the first to third embodiments, the high-pressure cleaning can be performed during the filtering operation without draining the fluid of the filtration device, or can be performed with the fluid of the filtration device being drained. The high-pressure cleaning mechanism 305 is operated to inject fluid (clean water) from two nozzles 353a and 353b provided on the stock solution chamber side, and the nozzles 353a and 353b are parallel to the axis of the cylindrical filter element 303. The fluid is ejected over the entire length of the filter medium 331. As with backwashing, the entire surface of the filter medium 331 is washed at high pressure by performing fluid ejection while rotating the filter element 303 with the geared motor 313.

  According to the fourth embodiment, even in a configuration in which the filter element 303 is arranged horizontally, the inside of the filter medium 331 of the filter element 303 generated by backwashing or the like due to the injection of fluid from the stock solution chamber 308 side by the high-pressure cleaning mechanism 305 Deposits on the filtrate chamber 309 side surface can be removed without removing the filter element 303. In such a horizontal configuration, it may be difficult to remove the filter element 303. Therefore, it is very advantageous not to remove the filter element 303 for cleaning.

In the first to fourth embodiments, the filter is a cylindrical filter that allows a fluid to pass from the outside to the inside to be filtered. However, the present invention is not limited to this, and the inside to the outside is used. It is good also as a structure using the cylindrical filter which lets a fluid pass and filters. In that case, the nozzle of the high-pressure cleaning mechanism is disposed inside the cylindrical filter.
In addition, a flat filter may be used instead of the cylindrical filter. In that case, the high-pressure cleaning mechanism has, for example, an XY moving mechanism so that the nozzle can be scanned in the XY direction so that the entire surface of the flat filter can be high-pressure cleaned. May be. Furthermore, the nozzle position of the high pressure cleaning mechanism may be fixed, and the entire filter surface may be cleaned with high pressure by moving the filter side.
Furthermore, in the filter cleaning method of the filtration device of the present invention, the high pressure cleaning may be performed manually using a commercially available high pressure cleaning instrument without using the high pressure cleaning mechanism as in the first to fourth embodiments. Good.

DESCRIPTION OF SYMBOLS 1 ... Casing 2 ... Bulkhead 3 ... Filter element (filter)
5 ... High-pressure washing mechanism 6 ... Fluid inlet 7 ... Fluid outlet 8 ... Stock solution chamber 9 ... Filtrate chamber 13 ... Geared motor (contact surface position moving means)
31 ... Filter medium 52 ... Moving cylinder (fluid injection position moving means)
53a, 53b ... Nozzle 104 ... Backwash mechanism 141 ... Backwash head 142 ... Backwash fluid discharge pipe

Claims (13)

A casing having a fluid inlet and a fluid outlet, and having an undiluted solution chamber communicating with the fluid inlet and containing a fluid before filtration and a filtrate chamber communicating with the fluid outlet and containing a fluid after filtration;
A filter that is installed inside the casing and that passes a fluid from the stock solution chamber side to the filtrate chamber side for filtration.
In the filtration device capable of backwashing, which allows fluid to pass from the filtrate chamber side to the stock solution chamber side to peel off the trapped matter adhering to the filter,
A high-pressure washing mechanism is provided for injecting high-pressure fluid from the stock solution chamber side to the filtrate chamber side so as to pass through the filter, and removing deposits on the inside of the filter and the surface of the filtrate chamber side by high-pressure washing. ,
A backwash head that is arranged so as to be in contact with a part of the filter from the stock solution chamber side and sucks the fluid in the filtrate chamber through the filter, and moves the contact surface position of the backwash head with respect to the filter A backwashing means configured to include a contact surface position moving means to be discharged and a backwashing fluid discharge pipe for discharging the fluid sucked by the backwashing head to the outside of the casing;
The backwash provided in the filter portion contact facing portion of the head, with a removing brush, which is planted around the slit-like suction holes covering the entire length of the filter medium of the filter,
A filtering device characterized by that. The filtration apparatus according to claim 1 , wherein the high-pressure cleaning mechanism includes a nozzle that ejects fluid and a fluid ejection position moving unit that moves a fluid ejection position on the filter surface. The filter is a cylindrical filter that is rotatably provided in the stock solution chamber, and has an inner side communicating with the filtrate chamber to allow fluid to pass from the outside to the inside for filtration.
The fluid ejection position moving means of the high-pressure washing mechanism moves the fluid ejection position in the axial direction of the cylindrical filter,
3. The filtration device according to claim 2 , wherein fluid is ejected onto the entire surface of the cylindrical filter by movement of the fluid ejection position and rotation of the cylindrical filter. The casing is formed in a cylindrical shape closed at both ends, and is placed horizontally so that the axis is horizontal,
The fluid inlet is provided at a position eccentric to the axis of the casing at one end of the casing;
The fluid outlet is provided at the other end of the casing;
The filter is provided horizontally so that the rotation axis is in the same direction as the axis of the casing,
The outer surface of the end portion of the casing, filtering device of claim 3, wherein a motor for rotating the filter is provided. The high-pressure cleaning mechanism injects fluid obliquely with respect to the surface of the filter on the side of the stock solution chamber, and a part of the fluid becomes a jet along the surface to remove deposits on the surface. The filtration device according to any one of claims 1 to 4 , wherein the filtration device is configured as described above. The high pressure cleaning mechanism according to any one of claims 1 to 5, wherein the supply pressure of the fluid to the high-pressure cleaning mechanism is any value within a range of 5~200kg / cm ² Filtration equipment. The filtration device according to any one of claims 1 to 6 , wherein the high-pressure washing mechanism is detachable from the casing. A casing having a fluid inlet and a fluid outlet, and having an undiluted solution chamber communicating with the fluid inlet and containing a fluid before filtration and a filtrate chamber communicating with the fluid outlet and containing a fluid after filtration;
A filter that is installed inside the casing and that passes a fluid from the stock solution chamber side to the filtrate chamber side for filtration.
A filter cleaning method for cleaning the filter of the filtration device capable of backwashing to pass the fluid from the filtrate chamber side to the stock solution chamber side and peel off the trapped matter attached to the filter,
Removal of trapped substances adhering to the surface of the filter on the side of the stock solution chamber passes the fluid in the filtrate chamber through the filter by a backwash head arranged so as to contact a part of the filter from the side of the stock solution chamber. A suction surface, the contact surface position of the backwash head with respect to the filter is moved by a contact surface position moving means, and the fluid sucked by the backwash head is discharged outside the casing through a backwash fluid discharge pipe, The filter medium of the filter is reversed using a removal brush provided around the slit-like suction hole provided on a part of the backwash head that is in contact with a part of the filter and covering the entire length of the filter medium of the filter. while seeking collected scraped the scavenger by the removing brush when washing, done by backwashing the entire surface of the filter medium,
The removal of deposits on the inside of the filter and the surface on the filtrate chamber side is performed by high-pressure washing in which a high-pressure fluid is jetted and washed so as to pass through the filter from the stock solution chamber side to the filtrate chamber side. A filter cleaning method for a filtration device. 9. The filter cleaning method for a filter device according to claim 8 , wherein the fluid injection in the high-pressure cleaning is performed in a state where there is no fluid to be filtered in the stock solution chamber. 10. The filter cleaning method for a filter device according to claim 9 , wherein the supply pressure of the fluid in the high-pressure cleaning is any value within a range of 5 to 150 kg / cm < ² >. 9. The filter cleaning method for a filtration apparatus according to claim 8 , wherein the ejection of the fluid in the high-pressure cleaning is performed in a state where a fluid to be filtered exists in the stock solution chamber. 12. The filter cleaning method for a filtration device according to claim 11 , wherein a supply pressure of the fluid in the high-pressure cleaning is any value within a range of 10 to 200 kg / cm < ² >. In the high-pressure cleaning, a fluid is ejected obliquely with respect to the surface of the filter on the side of the stock solution chamber, and a part of the fluid becomes a jet along the surface so as to remove deposits on the surface. The filter cleaning method for a filtration device according to any one of claims 8 to 12 , wherein the method is performed.