JP6588125B2 - 蒸着マスクの製造方法、蒸着マスク、および有機半導体素子の製造方法 - Google Patents
蒸着マスクの製造方法、蒸着マスク、および有機半導体素子の製造方法 Download PDFInfo
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- JP6588125B2 JP6588125B2 JP2018085753A JP2018085753A JP6588125B2 JP 6588125 B2 JP6588125 B2 JP 6588125B2 JP 2018085753 A JP2018085753 A JP 2018085753A JP 2018085753 A JP2018085753 A JP 2018085753A JP 6588125 B2 JP6588125 B2 JP 6588125B2
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- magnetic metal
- vapor deposition
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- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
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Images
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- Physical Vapour Deposition (AREA)
- Electroluminescent Light Sources (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2018085753A JP6588125B2 (ja) | 2018-04-26 | 2018-04-26 | 蒸着マスクの製造方法、蒸着マスク、および有機半導体素子の製造方法 |
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| JP2018085753A JP6588125B2 (ja) | 2018-04-26 | 2018-04-26 | 蒸着マスクの製造方法、蒸着マスク、および有機半導体素子の製造方法 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2017566424A Division JP6410247B1 (ja) | 2017-01-31 | 2017-01-31 | 蒸着マスクの製造方法、蒸着マスク、および有機半導体素子の製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2018138698A JP2018138698A (ja) | 2018-09-06 |
| JP2018138698A5 JP2018138698A5 (enrdf_load_stackoverflow) | 2018-10-18 |
| JP6588125B2 true JP6588125B2 (ja) | 2019-10-09 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2018085753A Expired - Fee Related JP6588125B2 (ja) | 2018-04-26 | 2018-04-26 | 蒸着マスクの製造方法、蒸着マスク、および有機半導体素子の製造方法 |
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| Country | Link |
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| JP (1) | JP6588125B2 (enrdf_load_stackoverflow) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US12116660B2 (en) | 2020-11-03 | 2024-10-15 | Samsung Display Co., Ltd. | Mask, mask fabrication method, and mask assembly |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109609902B (zh) * | 2018-10-26 | 2020-08-11 | 武汉华星光电半导体显示技术有限公司 | 一种掩模板及显示面板封装方法 |
| WO2020194629A1 (ja) * | 2019-03-27 | 2020-10-01 | 堺ディスプレイプロダクト株式会社 | 微細パターンを有する樹脂フィルムの製造方法及び有機ｅｌ表示装置の製造方法並びに微細パターン形成用基材フィルム、及びサポート部材付き樹脂フィルム |
| CN109778116B (zh) * | 2019-03-28 | 2021-03-02 | 京东方科技集团股份有限公司 | 一种掩膜版及其制作方法、掩膜版组件 |
| JP7473298B2 (ja) * | 2019-03-29 | 2024-04-23 | マクセル株式会社 | 蒸着マスク |
| CN110846614B (zh) | 2019-11-21 | 2022-03-25 | 昆山国显光电有限公司 | 一种掩膜版和蒸镀系统 |
| KR102716371B1 (ko) * | 2023-01-20 | 2024-10-15 | 주식회사 오럼머티리얼 | 밀착 지지부 및 그 제조 방법 |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5899585B2 (ja) * | 2011-11-04 | 2016-04-06 | 株式会社ブイ・テクノロジー | マスクの製造方法 |
| JP6142386B2 (ja) * | 2012-12-21 | 2017-06-07 | 株式会社ブイ・テクノロジー | 蒸着マスクの製造方法 |
| JP6217197B2 (ja) * | 2013-07-11 | 2017-10-25 | 大日本印刷株式会社 | 蒸着マスク、樹脂層付き金属マスク、および有機半導体素子の製造方法 |
| JP6769692B2 (ja) * | 2015-01-14 | 2020-10-14 | 大日本印刷株式会社 | 蒸着マスクの製造方法、及び有機半導体素子の製造方法 |
| WO2017006821A1 (ja) * | 2015-07-03 | 2017-01-12 | 大日本印刷株式会社 | 蒸着マスクの製造方法、蒸着マスク準備体、有機半導体素子の製造方法、有機ｅｌディスプレイの製造方法、及び蒸着マスク |
| JP6341434B2 (ja) * | 2016-03-29 | 2018-06-13 | 株式会社ブイ・テクノロジー | 成膜マスク、その製造方法及び成膜マスクのリペア方法 |
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- 2018-04-26 JP JP2018085753A patent/JP6588125B2/ja not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US12116660B2 (en) | 2020-11-03 | 2024-10-15 | Samsung Display Co., Ltd. | Mask, mask fabrication method, and mask assembly |
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| Publication number | Publication date |
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| JP2018138698A (ja) | 2018-09-06 |
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