JP6573381B2 - Polishing equipment - Google Patents

Description

  The present invention relates to a polishing apparatus.

  Patent Document 1 discloses a polishing apparatus that includes a polishing belt that moves linearly and a holding member that presses a circular workpiece against the polishing surface of the polishing belt. In the polishing process of this polishing apparatus, the workpiece is fixed on the polishing surface by the holding member, and in this state, the polishing belt is moved so that the polishing surface slides in one direction with respect to the workpiece. . Further, by changing the direction of the work by 90 ° at regular intervals, the polishing surface is brought into sliding contact with the work in two directions substantially perpendicular to each other.

JP 2000-094316 A

  In the above polishing apparatus, when changing the direction of the workpiece, the holding member rotates 90 ° concentrically with the center of the workpiece while pressing the workpiece against the polishing surface. Therefore, there is a possibility that the holding member and the work rotate relatively due to the frictional resistance between the work and the polishing surface. In this case, since the turning angle of the workpiece does not reach 90 °, the polishing direction with respect to the workpiece becomes an acute angle, resulting in poor polishing.

  The present invention has been completed based on the above situation, and an object of the present invention is to reliably perform a polishing process in two directions forming a predetermined angle with respect to a workpiece.

The polishing apparatus of the present invention is
A tape-shaped polishing member whose surface is a polishing surface;
A movable holding member that holds the workpiece pressed against the polishing surface;
A polishing drive mechanism for polishing the workpiece by linearly displacing the polishing surface and the movable holding member linearly in one direction or a reciprocating direction;
A swing drive mechanism for swinging the movable holding member and the work along the polishing surface with a swing shaft eccentric with respect to the work as a fulcrum;
The swinging direction of the movable holding member is a direction intersecting the length direction of the polishing member,
When the movable holding member swings, the polishing member is fixed by a stopper,
It is characterized in that the polishing process direction of the polishing surface with respect to the workpiece is switched between two different directions by swinging the workpiece by the swing driving mechanism.

By relatively displacing the polishing surface and the movable holding member without swinging the movable holding member, the workpiece is rubbed and polished in a specific direction. After that, when the movable holding member is swung with the swing shaft eccentric from the work as a fulcrum, the work turns with the swing shaft as a fulcrum with almost no rotation. If the polishing surface and the movable holding member are displaced relative to each other after turning the workpiece, the workpiece is rubbed and polished in a direction that forms a predetermined angle with respect to the direction rubbed in the previous polishing step. Therefore, it is possible to reliably perform a polishing process in two directions forming a predetermined angle with respect to the workpiece. Further, when the relative displacement direction of the polishing surface and the movable holding member is a direction intersecting with the swinging direction of the movable holding member, when the workpiece is swung by swinging the movable holding member, the workpiece is moved. Then, it can be brought into sliding contact with an unused area on the polished surface. Further, since the polishing member has a tape shape, when the movable holding member swings, the polishing member is displaced in the width direction intersecting the length direction due to the frictional resistance between the workpiece and the polishing surface. There is a concern to do. However, according to the above configuration, since the polishing member is fixed by the stopper, there is no possibility that the polishing member is displaced in the width direction.

Plan view of the polishing apparatus of Example 1 A plan view showing a state in which the movable holding member faces the work to the right in the swing drive mechanism A plan view showing a state in which the movable holding member faces the workpiece to the left in the swing drive mechanism Front view of holding mechanism An enlarged cross-sectional view showing a work holding portion for pressing and holding the work against the polishing surface in the movable holding member Front view showing stopper structure Schematic plan view showing the workpiece set on the polishing surface in the workpiece polishing process Schematic plan view showing a state where the workpiece set on the polishing surface is held by the movable holding member in the workpiece polishing step Schematic plan view showing how the movable holding member moves while holding the workpiece in the workpiece polishing process Schematic plan view showing a state where the movable holding member swings to the left while holding the workpiece in the workpiece polishing process. Schematic plan view showing how the movable holding member that swings to the left moves while holding the workpiece in the workpiece polishing process Schematic plan view showing a state in which the polishing process for one side of the workpiece is completed and the movable holding member is retracted leaving the polished workpiece on the polishing surface

(A) In the polishing apparatus of the present invention, the movable holding member may be provided with an elastic member that elastically presses the workpiece against the polishing surface.
According to this configuration, it is possible to perform an excellent polishing process by correcting the tilt of the workpiece with respect to the polishing surface by the elastic member.

(B) In the polishing apparatus of the present invention, in (a), the elastic member may be made of a synthetic resin, and a metal plate may be interposed between the elastic member and the workpiece.
According to this configuration, since the metal plate material is interposed between the elastic member and the work, there is no possibility that the work will stick to the elastic member even if a liquid adheres to the work. Further, the metal plate material is easier to manufacture than directly applying the anti-sticking process to the synthetic resin elastic member.

(C) In the polishing apparatus of the present invention, in the polishing step for the workpiece, the movable holding member may be moved substantially parallel to the length direction of the polishing member.
Since the polishing member has a tape shape, when the movable holding member moves in the width direction of the polishing member in the polishing process, the side edge of the polishing member is swollen by the frictional resistance between the workpiece and the polishing surface. Is concerned. However, according to the above configuration, in the polishing process, the movable holding member moves substantially parallel to the length direction of the polishing member, so there is no possibility that the side edge portion of the polishing member is rolled up.
(D) The polishing apparatus of the present invention may include a stopper that restricts movement of the polishing member in the polishing step for the workpiece in (c) .
According to this configuration, in the polishing step, the polishing surface can be prevented from being displaced by the stopper, so that good polishing can be performed.

<Example 1>
A first embodiment of the present invention will be described below with reference to FIGS. In the following description, in the front-rear direction, the upper direction in FIGS. 1 to 3 and 7 to 12 is defined as the front. For the left and right directions, the directions appearing in FIGS. 1 to 3 and 7 to 12 are defined as left and right as they are. About the up-down direction, the direction which appears in FIGS.

<Outline of polishing apparatus A>
The polishing apparatus A of this embodiment is for polishing by bringing the polishing surface 11 into sliding contact in two directions substantially perpendicular to the front and back surfaces of a metal workpiece W made of a thin plate having a circular ring shape. Is. As shown in FIG. 1 and FIG. 7, the polishing apparatus A includes two right and left polishing tapes 10 (the polishing member according to the claims) whose upper surface (surface) is a polishing surface 11, and two polishing surfaces. 11, two holding mechanisms 20 that hold the two workpieces W pressed at a time are provided.

  Each holding mechanism 20 includes a pair of left and right movable holding members 27 and a swing drive mechanism 37 for swinging the pair of left and right movable holding members 27 integrally. The two holding mechanisms 20 have the same configuration and the same structure. Further, the polishing apparatus A includes two right and left polishing drive mechanisms 43 for individually moving the two left and right holding mechanisms 20 (movable holding members 27) in the polishing process. Further, a reversing mechanism 48 for reversing the work W from the front to the back is provided between the two left and right holding mechanisms 20 (the polishing tape 10).

<Abrasive tape 10>
The polishing tape 10 is wound around a supply-side pulley (not shown) in advance, and the leading end portion in the supply direction of the polishing tape 10 is wound around a take-up pulley (not shown). Between the two pulleys, the polishing tape 10 is placed on the upper surface of the table 12 (see FIG. 4) with the polishing surface 11 facing horizontally upward and the length direction facing the front-rear direction. The polishing tape 10 is always fixed, but after the workpiece W has been polished a predetermined number of times, the polishing tape 10 is fed out from the feeding-side pulley by a predetermined length and wound around the winding-side pulley. . The polishing process for the workpiece W is performed in the polishing region of the polishing tape 10 placed on the table 12.

<Stopper 13>
Stoppers 13 are provided at positions near the front and rear of the polishing region, respectively. 7 to 12, for convenience, only the stopper 13 located at the rear is shown, and the stopper 13 located at the front is omitted (not shown). As shown in FIG. 6, the stopper 13 includes a table 12 that supports the polishing tape 10 from below with the axis line in the horizontal direction, a pressing bar 15 that is positioned above the table 12 with the polishing tape 10 interposed therebetween, and an air cylinder. The stopper drive member 16 is provided. The left end of the pressing bar 15 is connected to the lifting support shaft 17, and the right end of the pressing bar 15 is connected to the upper end of the stopper rod 18 of the stopper driving member 16.

  When the polishing tape 10 is moved on the table 12, the stopper rod 18 rises and retreats to an upper position where the pressing bar 15 is not in contact with the polishing tape 10. Further, in the step of polishing the workpiece W, the stopper rod 18 is always lowered, and the pressing bar 15 firmly holds the polishing tape 10 between the table 12 and the entire width. By this clamping, the polishing area of the polishing tape 10 is restricted from moving in the front-rear direction and the left-right direction.

<Holding mechanism 20>
As shown in FIG. 1, the holding mechanism 20 includes a pair of left and right guide rails 21 that are long on the left and right sides of the polishing region and that are long in the front-rear direction. A base member 22 that moves in the front-rear direction by a driving means (not shown) is attached to the guide rail 21. The base member 22 is provided with a pair of guide bars 23 which are arranged on both the left and right sides of the polishing region and whose axis is directed in the front-rear direction (parallel to the polishing surface 11 in the polishing region). A horizontal substrate 24 constituting the holding mechanism 20 is attached to the pair of guide bars 23 so as to be slidable in the front-rear direction. As shown in FIG. 4, a pair of left and right bearing members 25 is fixed to the substrate 24, and each bearing member 25 has a rocking shaft 26 with its axis extending in the vertical direction. It is attached in a state in which the relative displacement in the vertical direction is restricted. The swing shaft 26 also constitutes the holding mechanism 20.

<Movable holding member 27>
A movable holding member 27 is attached to a lower end portion of each swing shaft 26 (a position below the substrate 24 in the swing shaft 26) so as to swing integrally with the swing shaft 26. Yes. As shown in FIG. 4, the movable holding member 27 includes a swing member 28 and a work holding portion 29. The swing member 28 is fixed so as to swing integrally with the swing shaft 26. The work holding part 29 is attached to a position of the swinging member 28 that is decentered rearward in the horizontal direction with respect to the swinging shaft 26. The work holding portion 29 is provided so as to protrude downward from the swing member 28 and can swing integrally with the swing member 28 and the swing shaft 26.

  As shown in an enlarged view in FIG. 5, the work holding unit 29 has an accommodation space 30 opened on the lower surface. A disk-shaped elastic member 31 made of urethane resin is fixed to the ceiling surface of the accommodation space 30. The elastic member 31 can be elastically deformed in such a form that it contracts in the vertical direction. On the lower surface of the elastic member 31, a steel metal plate 32 having a circular shape concentric with the elastic member 31 is fixed. When the elastic member 31 is elastically deformed, the metal plate material 32 follows the elastic member 31 and changes the vertical position and posture.

  A space below the metal plate 32 in the accommodation space 30 is a circular holding space 33 for accommodating the upper end portion of the workpiece W. The inner diameter of the holding space 33 is set to be slightly larger than the outer diameter of the workpiece W. The opening on the lower surface of the holding space 33 is positioned so as to face the polishing surface 11 in close proximity.

  As shown in FIG. 4, a pair of upper and lower swing plates 34 can swing integrally with the swing shaft 26 in each of the swing shafts 26 in the region above the substrate 24. And it is attached in a state where relative displacement in the vertical direction with respect to the substrate 24 is restricted. The upper rocking plate 34 is provided with an elevating member 35 made of an air cylinder whose axis is directed in the vertical direction. An upper end portion of the swing shaft 26 is connected to a lower end portion of an elevating rod 36 of an air cylinder constituting the elevating member 35 so as to be able to move up and down integrally. The elevating member 35 has a function of moving the work holding portion 29 in the vertical direction via the swing shaft 26 and elastically moves the work W held by the work holding portion 29 downward with respect to the polishing surface 11. It also has a function to press on.

<Oscillation drive mechanism 37>
As shown in FIGS. 1 to 3, the swing drive mechanism 37 includes a swing actuator 38 formed of an air cylinder, and is disposed in front of the swing plate 34. The swinging rod 39 constituting the swinging actuator 38 is arranged with its axis line directed in the left-right direction, and the swinging rod 39 is substantially parallel to the swinging rod 39 at the left end (tip). The left end portion of the arm 40 is coupled so as to be capable of relative displacement in the horizontal direction.

  The front end portions of the pair of upper and lower swing plates 34 arranged on the left side and the front end portions of the pair of upper and lower swing plates 34 disposed on the right side are connected by a connecting shaft 41 with the axis line directed vertically. ing. Both the left connecting shaft 41 and the right connecting shaft 41 are connected to the swing arm 40 so as to be relatively displaced in the horizontal direction. In plan view, the connecting shaft 41 is located on the opposite side of the work holding portion 29 with the swing shaft 26 interposed therebetween. When the swinging actuator 38 is driven to expand and contract the swinging rod 39, the left and right movable holding members 27 swing integrally in the left-right direction with the swinging shaft 26 as a fulcrum. As the left and right movable holding members 27 swing, the left and right work holding portions 29 also turn in the horizontal direction about the swing shaft 26.

  The inter-axis dimension of both the left and right connecting shafts 41 is set to the same dimension as the inter-axis dimension of both the left and right oscillating shafts 26. The distance between the centers of the left and right holding spaces 33 is also the same as the distance between the left and right swing shafts 26. In addition, the inter-axis dimension between the swing shaft 26 and the connecting shaft 41 is set to the same dimension on the left side and the right side. The distance between the swing shaft 26 and the center of the holding space 33 is also set to the same size on the left side and the right side. Therefore, when the left and right movable holding members 27 are swung, the positional relationship is such that the left and right connecting shafts 41 and the left and right work holding portions 29 (holding spaces 33) form the apex of the parallelogram. Keep.

  As shown in FIGS. 1 to 3, a pair of left and right swing regulating members 42 are provided on the upper surface of the substrate 24 as means for defining the swing range of the left and right movable holding members 27. The swing range in the left direction is defined by the left swing plate 34 coming into contact with the left swing restriction member 42. The swing range in the right direction is defined by the right swing plate 34 coming into contact with the right swing restricting member 42. Accordingly, the maximum swing angle of the movable holding member 27 is set to 90 °.

<Polishing drive mechanism 43>
As shown in FIG. 1, the polishing drive mechanism 43 includes a servo motor 44 attached to the base member 22 and disposed in front of the substrate 24. The drive shaft 45 of the servo motor 44 is arranged with the axis line in the left-right direction. On the other hand, a connecting portion 46 constituting the polishing drive mechanism 43 is provided at the front end portion of the substrate 24. The drive shaft 45 and the connecting portion 46 are connected via a crank mechanism 47. Thereby, the rotational motion of the drive shaft 45 is transmitted to the substrate 24 (holding mechanism 20) via the crank mechanism 47, and the holding mechanism 20 reciprocates in the front-rear direction along the guide bar 23. The reciprocating direction of the holding mechanism 20 is parallel to the polishing area of the polishing surface 11.

<Reversing mechanism 48>
As shown in FIGS. 7 to 12, the reversing mechanism 48 includes a pair of front and rear reversing members 49. The upper surface of each reversing member 49 in a state where both the front and rear reversing members 49 are arranged in front and rear forms a work holding surface 50 capable of holding two works W side by side. The front reversing member 49 can be reversed so as to overlap the rear reversing member 49 from above, and the rear reversing member 49 can also be reversed so as to overlap the front reversing member 49 from above. In a state where the front and rear reversing members 49 are overlapped by the reversing operation of one reversing member 49, both work holding surfaces 50 face each other and sandwich the work W therebetween. Further, in a state where both the reversing members 49 are overlapped to hold the work W, both the reversing members 49 can be integrated and reversed forward or backward.

<Work W polishing process>
Next, the process of polishing the workpiece W will be described with reference to FIGS. 7 to 12, the shape of the movable holding member 27 is simplified, and the end portion on the oblique lower side in the drawing is the work holding portion 29. Prior to the polishing step, the workpiece W is previously cleaned on the right side of FIGS. Then, the cleaned work W is simply dried by air blow. Thereafter, the wafer is placed on the right polishing surface 11 (polishing surface 11) in a state of being arranged side by side with a chuck (not shown). At this time, the movable holding member 27 stands by at a standby position ahead of the reciprocating path in the polishing process. Further, all the movable holding members 27 are oriented so that the work holding portion 29 is located obliquely right rear with respect to the swing shaft 26 in plan view.

  In FIG. 7, the two workpieces W held by the reverse member 49 on the rear side are workpieces W that have been polished on one side on the right polishing surface 11. Transfer from the right polishing surface 11 to the reversing member 49 is also performed by a chuck (not shown). In FIG. 7, the two workpieces W placed on the left polishing surface 11 are transferred from the reversing mechanism 48 by a chuck (not shown). Further, the polishing area of the polishing tape 10 is fixed by the stopper 13 so that the movement in the front-rear direction and the left-right direction is restricted.

  After the two workpieces W are transferred to the left and right polishing surfaces 11, the left and right movable holding members 27 (holding mechanisms 20) move rearward as shown in FIG. The workpieces W are individually accommodated in the 33. When the movable holding member 27 moves rearward, the movable holding member 27 is retracted upward by the elevating member 35 so that the workpiece holding portion 29 does not interfere with the workpiece W. When the holding space 33 reaches just above the workpiece W, the movable holding member 27 descends, so that the upper end of the workpiece W is concentrically accommodated in the holding space 33.

  Thereafter, the polishing drive mechanism 43 is activated, and the left and right movable holding members 27 (holding mechanism 20) reciprocate back and forth between the position shown in FIG. 8 and the position shown in FIG. The lower surface is rubbed against the polishing surface 11. As a result, the polishing surface 11 is in sliding contact with the lower surface of the workpiece W in the front-rear direction, and the polishing process is performed. Meanwhile, in the reversing mechanism 48, the front reversing member 49 is reversed so as to overlap the rear reversing member 49, and the workpiece W is held between the front and rear reversing members 49.

  When the number of reciprocating movements of the movable holding member 27 reaches a predetermined number, the polishing drive mechanism 43 stops and the movable holding member 27 stops at the position shown in FIG. Next, the swing drive mechanism 37 is activated, and the movable holding member 27 swings 90 ° as shown in FIG. Along with this, the work holding part 29 facing diagonally right rear turns 90 degrees leftward about the swing shaft 26 and turns diagonally left rear. In this turning operation, the workpiece W does not rotate concentrically with its center, but moves to the left so that the entire workpiece W contacts the inner surface of the holding space 33 and revolves integrally with the workpiece holding portion 29. To do. Therefore, the polishing direction of the polishing surface 11 in the workpiece W is the front-rear direction before turning, but is the left-right direction after turning.

  Thereafter, the polishing drive mechanism 43 is activated, and the movable holding member 27 reciprocates back and forth between the position indicated by the solid line in FIG. 11 and the position indicated by the imaginary line in FIG. Is rubbed against the polishing surface 11. As a result, the polishing surface 11 is in sliding contact with the lower surface of the workpiece W in the front-rear direction, and the polishing process is performed. In the polishing process in a state where the work holding portion 29 is directed obliquely to the left rear, the work W is rubbed against the polishing surface 11 in the front-rear direction. At this time, the direction of polishing applied to the workpiece W in a state where the workpiece holding portion 29 faces diagonally right rear is turned in the left-right direction. Therefore, the workpiece W is polished in both the front-rear direction and the left-right direction.

  In addition, in the reversing mechanism 48, as shown in FIG. 10, the front and rear reversing members 49 overlap each other in the vertical direction until the polishing after the turning is completed after the work holding portion 29 turns to the left. While maintaining the state of holding W, it is reversed forward. Then, as shown in FIG. 11, the reverse member 49 on the rear side reverses backward. As a result, the workpiece W is exposed on the workpiece holding surface 50 of the reverse member 49 on the front side.

  When the number of reciprocating movements of the movable holding member 27 reaches a predetermined number, the polishing drive mechanism 43 stops and the movable holding member 27 stops at the position indicated by the solid line in FIG. Thereafter, the movable holding member 27 rises to a position above the workpiece W, and then the movable holding member 27 moves forward and returns to the standby position as shown in FIG. Thereafter, the two workpieces W polished on the left polishing surface 11 are transferred to the left side of the left polishing tape 10. During this time, the two workpieces W of the front reversing member 49 are transferred onto the left polishing surface 11, and the two workpieces W polished by the right polishing surface 11 are transferred to the rear reversing member 49. It is transferred and returns to the state shown in FIG. Thereafter, by repeating the above-described steps, the front and back surfaces of the workpiece W are subjected to a polishing process by rubbing in two directions substantially perpendicular to each other.

<Operation and Effect of Example 1>
As described above, the polishing apparatus A of the first embodiment includes the polishing tape 10 whose surface is the polishing surface 11, the movable holding member 27 that holds the workpiece W pressed against the polishing surface 11, and the polishing surface. The polishing drive mechanism 43 that relatively displaces the movable holding member 27 and the movable holding member 27 in the reciprocating direction; And a swing drive mechanism 37 that swings within a range of approximately 90 ° along the axis.

  By relatively displacing the polishing surface 11 and the movable holding member 27 without swinging the movable holding member 27, the workpiece W is rubbed and polished in a specific direction (front-rear direction). Thereafter, when the movable holding member 27 is swung about 90 ° with the rocking shaft 26 eccentric from the work W as a fulcrum, the work W turns around the rocking shaft 26 as a fulcrum with almost no rotation. When the polishing surface 11 and the movable holding member 27 are relatively displaced after turning the workpiece W, the workpiece W is rubbed in a direction substantially perpendicular to the direction rubbed in the previous polishing step (a direction forming a predetermined angle). And polished. Therefore, according to the polishing apparatus A of the first embodiment, it is possible to reliably perform the polishing process in two directions substantially perpendicular to the workpiece W (two directions forming a predetermined angle). Further, the relative displacement direction of the polishing surface 11 and the movable holding member 27 is a direction intersecting with the swinging direction of the movable holding member 27. Therefore, when the movable holding member 27 is swung to turn the workpiece W, the workpiece W can be brought into sliding contact with an unused area on the polishing surface 11.

  The movable holding member 27 is provided with an elastic member 31 that elastically presses the workpiece W against the polishing surface 11. According to this configuration, even if the work holding part 29 and the metal plate material 32 are inclined with respect to the polishing surface 11, the inclination of the work W with respect to the polishing surface 11 is corrected by the elastic member 31. Thereby, a favorable polishing process can be performed. Further, since the metal plate material 32 is interposed between the elastic member 31 and the workpiece W, even if the drying by air blow is insufficient and the liquid (cleaning liquid) adheres to the workpiece W, the workpiece W is elastic member 31. There is no risk of sticking to. In addition, the metal plate 32 is easier to manufacture than directly applying the anti-sticking process to the elastic member 31 made of synthetic resin.

  Further, the polishing member that is a base for forming the polishing surface 11 is made of the polishing tape 10. The swinging direction of the movable holding member 27 is a direction (generally in the left-right direction) intersecting the length direction of the polishing tape 10. Therefore, when the movable holding member 27 swings, there is a concern that the polishing tape 10 may be displaced in the width direction intersecting the length direction due to the frictional resistance between the workpiece W and the polishing surface 11. However, since the polishing tape 10 is fixed by the stopper 13 when the movable holding member 27 swings, there is no possibility that the polishing tape 10 is displaced in the width direction. Further, if the distance between the left and right workpiece holding portions 29 (holding space 33) is equal to or larger than the outer diameter of the workpiece W, after turning the workpiece W, an unused area of the polishing surface 11 is set as a new polishing surface 11. Can be used. That is, there is no significant difference in the state of the polishing surface 11 before and after the workpiece W is turned. Therefore, good polishing can be performed on the workpiece W.

  Further, the polishing member that is a base for forming the polishing surface 11 is made of the polishing tape 10. Therefore, when the movable holding member 27 moves in the width direction of the polishing tape 10 in the polishing process for the workpiece W, the side edge portion of the polishing tape 10 may swell due to the frictional resistance between the workpiece W and the polishing surface 11. Concerned. However, in the polishing process, the movable holding member 27 moves substantially parallel to the length direction of the polishing tape 10, so there is no possibility that the side edge portion of the polishing tape 10 is rolled up.

  Further, in the polishing process, there is a concern that the polishing tape 10 may be displaced in the front-rear direction due to the frictional resistance between the workpiece W and the polishing surface 11 and the workpiece W will not be polished well. However, since the stopper 13 restricts the movement of the polishing tape 10 in the front-rear direction also in the polishing step, the polishing of the polishing surface 11 can be prevented and good polishing can be performed.

<Other embodiments>
The present invention is not limited to the embodiments described with reference to the above description and drawings. For example, the following embodiments are also included in the technical scope of the present invention.
(1) In the above embodiment, the urethane resin is used as the elastic member, but the elastic member may be a synthetic resin other than urethane or other materials.
(2) In the above embodiment, steel is used as the metal plate material, but the metal plate material may be a metal other than steel.
(3) Although the elastic member is provided on the movable holding member in the above embodiment, such an elastic member may not be provided.
(4) In the above embodiment, one holding mechanism holds two workpieces at the same time. However, the number of workpieces held by one holding mechanism at a time may be only one, or three or more. But you can.
(5) In the above embodiment, the polishing member (polishing surface) is fixed and the movable holding member is reciprocated in the polishing step. However, the movable holding member is fixed and the polishing member is reciprocated or moved in one direction. You may let them.
(6) In the above embodiment, the movable holding member is moved in parallel with the length direction of the polishing member (polishing tape) during the polishing step, but the movable holding member intersects the length direction of the polishing member. It may be moved in the direction.
(7) In the above embodiment, the polishing member (polishing tape) moves in the length direction, but the polishing member may be fixed in a sheet form or a table form.
(8) In the above embodiment, the air cylinder is used as the drive source of the swing drive mechanism for swinging the movable holding member. However, the drive source of the swing drive mechanism may be a hydraulic cylinder or a motor. Good.
(9) In the above embodiment, the workpiece has a circular ring shape, but the present invention can also be applied to a case where the workpiece has a shape other than the circular ring shape.
(10) In the above embodiment, the swing angle of the movable holding member is approximately 90 °. However, according to the present invention, the swing angle of the movable holding member may be smaller than 90 ° or larger than 90 °. May be. That is, the swing angle can be appropriately set in the range of 0 ° to 180 °.
<Reference example>
(1) In the above-described embodiment, the swinging direction of the movable holding member is a direction intersecting the length direction of the polishing member, but the swinging direction of the movable holding member is a direction substantially along the length direction of the polishing member. The form to make is also conceivable.

A ... Polishing device W ... Workpiece 10 ... Polishing tape (polishing member)
DESCRIPTION OF SYMBOLS 11 ... Polishing surface 13 ... Stopper 26 ... Swing axis 27 ... Movable holding member 31 ... Elastic member 32 ... Metal plate material 37 ... Swing drive mechanism 43 ... Polishing drive mechanism

Claims (5)

A tape-shaped polishing member whose surface is a polishing surface;
A movable holding member that holds the workpiece pressed against the polishing surface;
A polishing drive mechanism for polishing the workpiece by linearly displacing the polishing surface and the movable holding member linearly in one direction or a reciprocating direction;
A swing drive mechanism for swinging the movable holding member and the work along the polishing surface with a swing shaft eccentric with respect to the work as a fulcrum;
The swinging direction of the movable holding member is a direction intersecting the length direction of the polishing member,
When the movable holding member swings, the polishing member is fixed by a stopper,
A polishing apparatus characterized in that the polishing process direction of the polishing surface with respect to the workpiece is switched between two different directions by swinging the workpiece by the swing driving mechanism.   The polishing apparatus according to claim 1, wherein the movable holding member is provided with an elastic member that elastically presses the workpiece against the polishing surface. The elastic member is made of synthetic resin;
The polishing apparatus according to claim 2, wherein a metal plate material is interposed between the elastic member and the workpiece. The polishing process for the workpiece, wherein the movable holding member moves substantially parallel to the length direction of the polishing member. Polishing equipment. The polishing apparatus according to claim 4, further comprising a stopper that restricts movement of the polishing member in a polishing step for the workpiece .

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