JP6563478B2 - 光電池用途のための混合酸化および硫化ビスマスおよび銅 - Google Patents
光電池用途のための混合酸化および硫化ビスマスおよび銅 Download PDFInfo
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- JP6563478B2 JP6563478B2 JP2017503074A JP2017503074A JP6563478B2 JP 6563478 B2 JP6563478 B2 JP 6563478B2 JP 2017503074 A JP2017503074 A JP 2017503074A JP 2017503074 A JP2017503074 A JP 2017503074A JP 6563478 B2 JP6563478 B2 JP 6563478B2
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- 239000010949 copper Substances 0.000 title claims description 44
- 229910052802 copper Inorganic materials 0.000 title claims description 20
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- 230000003647 oxidation Effects 0.000 title claims description 8
- 238000007254 oxidation reaction Methods 0.000 title claims description 8
- NNLOHLDVJGPUFR-UHFFFAOYSA-L calcium;3,4,5,6-tetrahydroxy-2-oxohexanoate Chemical compound [Ca+2].OCC(O)C(O)C(O)C(=O)C([O-])=O.OCC(O)C(O)C(O)C(=O)C([O-])=O NNLOHLDVJGPUFR-UHFFFAOYSA-L 0.000 title 1
- 150000001875 compounds Chemical class 0.000 claims description 84
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- 238000003801 milling Methods 0.000 claims description 24
- 229910010272 inorganic material Inorganic materials 0.000 claims description 18
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- 150000002484 inorganic compounds Chemical class 0.000 claims description 14
- 229910052751 metal Inorganic materials 0.000 claims description 14
- 239000002184 metal Substances 0.000 claims description 14
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 claims description 13
- 229910052761 rare earth metal Inorganic materials 0.000 claims description 13
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 claims description 12
- 150000004820 halides Chemical class 0.000 claims description 12
- 229910052738 indium Inorganic materials 0.000 claims description 12
- 150000002910 rare earth metals Chemical class 0.000 claims description 12
- XTQHKBHJIVJGKJ-UHFFFAOYSA-N sulfur monoxide Chemical compound S=O XTQHKBHJIVJGKJ-UHFFFAOYSA-N 0.000 claims description 12
- 229910052725 zinc Inorganic materials 0.000 claims description 12
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 11
- 229910052793 cadmium Inorganic materials 0.000 claims description 10
- 239000002243 precursor Substances 0.000 claims description 10
- 229910052709 silver Inorganic materials 0.000 claims description 10
- 239000007787 solid Substances 0.000 claims description 10
- 229910052782 aluminium Inorganic materials 0.000 claims description 9
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- 229910052748 manganese Inorganic materials 0.000 claims description 9
- 229910052717 sulfur Inorganic materials 0.000 claims description 9
- 229910052718 tin Inorganic materials 0.000 claims description 9
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims description 8
- 229910052804 chromium Inorganic materials 0.000 claims description 8
- 229910052733 gallium Inorganic materials 0.000 claims description 8
- 229910052742 iron Inorganic materials 0.000 claims description 8
- 229910052759 nickel Inorganic materials 0.000 claims description 8
- 229910052712 strontium Inorganic materials 0.000 claims description 8
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- 238000001914 filtration Methods 0.000 claims description 2
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- 239000000243 solution Substances 0.000 description 28
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 24
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- 238000000576 coating method Methods 0.000 description 6
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- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Substances [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 6
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- 238000000151 deposition Methods 0.000 description 5
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- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 5
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- 239000000843 powder Substances 0.000 description 5
- 229910052711 selenium Inorganic materials 0.000 description 5
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- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 4
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 4
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- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 4
- VMQMZMRVKUZKQL-UHFFFAOYSA-N Cu+ Chemical compound [Cu+] VMQMZMRVKUZKQL-UHFFFAOYSA-N 0.000 description 3
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- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 3
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- HKZLPVFGJNLROG-UHFFFAOYSA-M silver monochloride Chemical compound [Cl-].[Ag+] HKZLPVFGJNLROG-UHFFFAOYSA-M 0.000 description 3
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- 229910010413 TiO 2 Inorganic materials 0.000 description 2
- WUOACPNHFRMFPN-UHFFFAOYSA-N alpha-terpineol Chemical compound CC1=CCC(C(C)(C)O)CC1 WUOACPNHFRMFPN-UHFFFAOYSA-N 0.000 description 2
- 229910021529 ammonia Inorganic materials 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 2
- 150000001768 cations Chemical class 0.000 description 2
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- 238000002425 crystallisation Methods 0.000 description 2
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- SQIFACVGCPWBQZ-UHFFFAOYSA-N delta-terpineol Natural products CC(C)(O)C1CCC(=C)CC1 SQIFACVGCPWBQZ-UHFFFAOYSA-N 0.000 description 2
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- LVTJOONKWUXEFR-FZRMHRINSA-N protoneodioscin Natural products O(C[C@@H](CC[C@]1(O)[C@H](C)[C@@H]2[C@]3(C)[C@H]([C@H]4[C@@H]([C@]5(C)C(=CC4)C[C@@H](O[C@@H]4[C@H](O[C@H]6[C@@H](O)[C@@H](O)[C@@H](O)[C@H](C)O6)[C@@H](O)[C@H](O[C@H]6[C@@H](O)[C@@H](O)[C@@H](O)[C@H](C)O6)[C@H](CO)O4)CC5)CC3)C[C@@H]2O1)C)[C@H]1[C@H](O)[C@H](O)[C@H](O)[C@@H](CO)O1 LVTJOONKWUXEFR-FZRMHRINSA-N 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 150000004763 sulfides Chemical class 0.000 description 2
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- 239000012780 transparent material Substances 0.000 description 2
- RSGQDAUWSVMQCN-UHFFFAOYSA-N 2,3-dihydroxybutanedioic acid;sodium Chemical compound [Na].[Na].OC(=O)C(O)C(O)C(O)=O RSGQDAUWSVMQCN-UHFFFAOYSA-N 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 1
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- 229910000669 Chrome steel Inorganic materials 0.000 description 1
- KRKNYBCHXYNGOX-UHFFFAOYSA-K Citrate Chemical compound [O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O KRKNYBCHXYNGOX-UHFFFAOYSA-K 0.000 description 1
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 1
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical compound S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- JVTAAEKCZFNVCJ-UHFFFAOYSA-M Lactate Chemical compound CC(O)C([O-])=O JVTAAEKCZFNVCJ-UHFFFAOYSA-M 0.000 description 1
- 229910052765 Lutetium Inorganic materials 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 229910002651 NO3 Inorganic materials 0.000 description 1
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 description 1
- 229920000144 PEDOT:PSS Polymers 0.000 description 1
- 229920001609 Poly(3,4-ethylenedioxythiophene) Polymers 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- PTFCDOFLOPIGGS-UHFFFAOYSA-N Zinc dication Chemical compound [Zn+2] PTFCDOFLOPIGGS-UHFFFAOYSA-N 0.000 description 1
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- HVMJUDPAXRRVQO-UHFFFAOYSA-N copper indium Chemical compound [Cu].[In] HVMJUDPAXRRVQO-UHFFFAOYSA-N 0.000 description 1
- JZCCFEFSEZPSOG-UHFFFAOYSA-L copper(II) sulfate pentahydrate Chemical compound O.O.O.O.O.[Cu+2].[O-]S([O-])(=O)=O JZCCFEFSEZPSOG-UHFFFAOYSA-L 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- 238000007606 doctor blade method Methods 0.000 description 1
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- 229910052731 fluorine Inorganic materials 0.000 description 1
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- QNWMNMIVDYETIG-UHFFFAOYSA-N gallium(ii) selenide Chemical compound [Se]=[Ga] QNWMNMIVDYETIG-UHFFFAOYSA-N 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
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- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 1
- 238000007641 inkjet printing Methods 0.000 description 1
- 239000002608 ionic liquid Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- OHSVLFRHMCKCQY-UHFFFAOYSA-N lutetium atom Chemical compound [Lu] OHSVLFRHMCKCQY-UHFFFAOYSA-N 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 150000002898 organic sulfur compounds Chemical class 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920001467 poly(styrenesulfonates) Polymers 0.000 description 1
- 229920005646 polycarboxylate Polymers 0.000 description 1
- 229920000123 polythiophene Polymers 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 239000012266 salt solution Substances 0.000 description 1
- 239000000523 sample Substances 0.000 description 1
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- 229910052706 scandium Inorganic materials 0.000 description 1
- SIXSYDAISGFNSX-UHFFFAOYSA-N scandium atom Chemical compound [Sc] SIXSYDAISGFNSX-UHFFFAOYSA-N 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 229910052979 sodium sulfide Inorganic materials 0.000 description 1
- GRVFOGOEDUUMBP-UHFFFAOYSA-N sodium sulfide (anhydrous) Chemical compound [Na+].[Na+].[S-2] GRVFOGOEDUUMBP-UHFFFAOYSA-N 0.000 description 1
- AKHNMLFCWUSKQB-UHFFFAOYSA-L sodium thiosulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=S AKHNMLFCWUSKQB-UHFFFAOYSA-L 0.000 description 1
- PODWXQQNRWNDGD-UHFFFAOYSA-L sodium thiosulfate pentahydrate Chemical compound O.O.O.O.O.[Na+].[Na+].[O-]S([S-])(=O)=O PODWXQQNRWNDGD-UHFFFAOYSA-L 0.000 description 1
- 235000019345 sodium thiosulphate Nutrition 0.000 description 1
- 239000008247 solid mixture Substances 0.000 description 1
- 238000000527 sonication Methods 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229940095064 tartrate Drugs 0.000 description 1
- 150000003556 thioamides Chemical class 0.000 description 1
- 150000003568 thioethers Chemical class 0.000 description 1
- 150000003573 thiols Chemical class 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- UONOETXJSWQNOL-UHFFFAOYSA-N tungsten carbide Chemical compound [W+]#[C-] UONOETXJSWQNOL-UHFFFAOYSA-N 0.000 description 1
- 238000009736 wetting Methods 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 1
- RZLVQBNCHSJZPX-UHFFFAOYSA-L zinc sulfate heptahydrate Chemical compound O.O.O.O.O.O.O.[Zn+2].[O-]S([O-])(=O)=O RZLVQBNCHSJZPX-UHFFFAOYSA-L 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G29/00—Compounds of bismuth
- C01G29/006—Compounds containing, besides bismuth, two or more other elements, with the exception of oxygen or hydrogen
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/515—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics
- C04B35/547—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on sulfides or selenides or tellurides
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/622—Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/626—Preparing or treating the powders individually or as batches ; preparing or treating macroscopic reinforcing agents for ceramic products, e.g. fibres; mechanical aspects section B
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G9/00—Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
- H01G9/20—Light-sensitive devices
- H01G9/2027—Light-sensitive devices comprising an oxide semiconductor electrode
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
- H01L31/0256—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by the material
- H01L31/0264—Inorganic materials
- H01L31/032—Inorganic materials including, apart from doping materials or other impurities, only compounds not provided for in groups H01L31/0272 - H01L31/0312
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
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Description
Bi1−xMxCu1−y−εM’yOS1−zM’’z (I)
[式中:
Mが、Pb、Sn、Hg、Ca、Sr、Ba、Sb、In、Tl、Mg、希土類金属からなる群(A)から選択される元素または元素の混合物であり、
M’が、Ag、Ti、V、Cr、Mn、Fe、Co、Ni、Zn、Ga、Mg、Al、Cdからなる群(B)から選択される元素または元素の混合物であり、
M’’がハロゲンであり、
x、yおよびzが、1より小さい、特に0.6より小さい、特に0.5より小さい、例えば0.2より小さい数であり、
x、yまたはzの少なくとも1つがゼロではなく、
0≦ε<0.2である]の少なくとも1つの化合物を含む新規な材料である。
任意選択によりBiとPb、Sn、Hg、Ca、Sr、Ba、Sb、In、Tl、Mg、希土類金属からなる群(A)からの元素とから選択される少なくとも1つの元素の少なくとも1つの酸化物、硫化物、オキシ硫化物、ハロゲン化物またはオキシハロゲン化物と、
任意選択によりCuとAg、Ti、V、Cr、Mn、Fe、Co、Ni、Zn、Ga、Mg、Al、Cdからなる群(B)からの元素とから選択される少なくとも1つの元素の少なくとも1つの酸化物、硫化物、オキシ硫化物、ハロゲン化物またはオキシハロゲン化物とを含む混合物のソリッドミリングの工程を含む、本発明による材料を調製するための第1の方法である。
(a)ビスマスの無機化合物の少なくとも1つの塩の形態の金属前駆体と、
任意選択によりBiとPb、Sn、Hg、Ca、Sr、Ba、Sb、In、Tl、Mg、希土類金属からなる群(A)からの元素とから選択される少なくとも1つの元素の少なくとも1つの酸化物、硫化物、オキシ硫化物、ハロゲン化物またはオキシハロゲン化物とを含む少なくとも1つの溶液の調製、および
(b)銅の無機化合物の少なくとも1つの塩の形態の金属前駆体と、
任意選択によりCuとAg、Ti、V、Cr、Mn、Fe、Co、Ni、Zn、Ga、Mg、Al、Cdからなる群(B)からの元素とから選択される少なくとも1つの元素の少なくとも1つの酸化物、硫化物、オキシ硫化物、ハロゲン化物またはオキシハロゲン化物とを含む少なくとも1つの溶液の調製、および
(c)任意選択により、硫黄源を含む少なくとも1つの溶液の調製、
(d)工程(a)、(b)および任意選択により(c)の結果得られる溶液を混合することによる沈殿、
(e)工程(d)の結果得られる式(I)の化合物の濾過、および必要ならば洗浄。
(a)−(b)可溶性金属前駆体の溶液の提供。例えば、塩基性pHの溶液を以下のように調製することができる:
− 元素Biと群(A)の元素が、クエン酸塩、乳酸塩、酒石酸塩などの強く錯体を形成するポリカルボン酸塩アニオンとの錯化によって安定化される、
− 銅が、過剰な還元剤(例えばチオ硫酸ナトリウム、ヒドラジン等)の添加によって銅(I)の形態で安定化される、
− 銅と群(B)の元素が、塩基性pH(Al、Zn)の作用によるかまたはアミノ配位子(アンモニア、エチレンジアミン、有機アミン等)などのイオンと錯化する配位子を加えることによって塩基性媒体中で安定化されるかどちらかで塩基性媒体中に可溶性に維持されてもよい、
(c)硫黄源、例えば硫化物イオンを含む溶液の提供、
(d)工程(a)および(b)の結果得られた溶液と工程(c)の結果得られた溶液との混合。混合速度および混合温度を調節して、得られた固体粒子のモフォロジーまたは大きさを制御してもよい。
(e)所望の化合物の結晶化を得るために十分な時間の加熱および撹拌。次に、化合物を濾過および洗浄して、固体組成物中に保持されないイオンを除去し、次いで炉内で乾燥させる。
(a’)少なくとも、分散された形態でのビスマスおよび銅の無機化合物と、
任意選択によりBiとPb、Sn、Hg、Ca、Sr、Ba、Sb、In、Tl、Mg、希土類金属からなる群(A)からの元素とから選択される少なくとも1つの元素の少なくとも1つの酸化物、硫化物、オキシ硫化物、ハロゲン化物またはオキシハロゲン化物と、
任意選択によりCuとAg、Ti、V、Cr、Mn、Fe、Co、Ni、Zn、Ga、Mg、Al、Cdからなる群(B)からの元素とから選択される少なくとも1つの元素の少なくとも1つの酸化物、硫化物、オキシ硫化物、ハロゲン化物またはオキシハロゲン化物と、
任意選択により、硫黄源とを含む混合物の提供、
(b’)水熱条件下でおよび好ましくは撹拌しながら水または水性媒体中に混合物を溶解、および
(c’)得られた溶液の冷却(それによって式(I)Bi1−xMxCu1−y−εM’yOS1−zM’’z(式中、x、y、zおよびεが上述の定義を有する)の化合物の粒子が得られる。
Bi1−xMxCu1−y−εM’yOS1−zM’’z (I)
[式中:
Mが、Pb、Sn、Hg、Ca、Sr、Ba、Sb、In、Tl、Mg、希土類金属からなる群(A)から選択される元素または元素の混合物であり、
M’が、Ag、Ti、V、Cr、Mn、Fe、Co、Ni、Zn、Ga、Mg、Al、Cdからなる群(B)から選択される元素または元素の混合物であり、
M’’がハロゲンであり、
x、yおよびzが、1より小さい、特に0.6より小さい、特に0.5より小さい、例えば0.2より小さい数であり、
x、yおよびzの少なくとも1つがゼロではなく、
0≦ε<0.2である]の少なくとも1つの化合物を含む材料の、特に光電気化学または光化学用途のための、特に光電流をもたらすための半導体としての使用である。
− pタイプの半導体の性質を有する第1の化合物と、
− nタイプの半導体の性質を有する第2の化合物とを組み合わせて使用することによって得られる。
− 式(I)の化合物をベースとした層が、n型半導体をベースとした層と接触しており、
− 式(I)の化合物をベースとした層が正孔伝導性材料に近接しており、
− n型半導体をベースとした層が電子伝導性材料に近接している。
− 入射電磁界を完全には吸収しない材料、および/または
− 電磁線の一部が、材料に当たらずにこの電磁線を通過させることができる(典型的に孔、スリットまたは隙間を含む)有孔の形態である材料であってもよい。
− 等方性物体の場合は平均直径、
− 異方性物体の場合は厚さまたは横径であってもよい。
− 上述のタイプの光活性電極(本発明に従う式(I)の化合物の粒子で覆われたITOまたは金属板)、
− 参照電極、および
− 対電極
が浸漬され、
これらの3つの電極は典型的にポテンショスタットによって一緒に連結される。
− 光活性電極として:式(I)の化合物の粒子で覆われた担体(ITO板など)、
− 参照電極として:例えば、Ag/AgCl電極、および
− 対電極として:例えば、白金線
を含んでもよく、
これらの3つの電極は典型的にポテンショスタットによって一緒に連結される。
− 2cm×1cmのITOの導電層で覆われたガラスをベースとした担体12からなり、その上に表面全体にわたり本発明に従う式(I)の化合物の粒子14をベースとした厚さ約1μmの層13が堆積される光活性電極11であって、粒子14がテルピネオール中に予め分散され、次に、導電性ガラス板11上へのコーティング(ドクターブレードコーティング)によって堆積される、光活性電極11と、
− (Ag/AgCl)参照電極15と、
− 対電極(白金線)16と、を含む光電気化学電池10を示す。
ソリッドミリングによってBiCu0.5Ag0.5OS粒子を調製するための方法
BiCu0.5Ag0.5OS粉末は、以下の手順に従って、室温での反応性ミリングによって調製された:
1.028gのBi2S3、1.864gのBi2O3、0.477gのCu2Sおよび0.744gのAg2Sを瑪瑙ミリングビーズの存在下で瑪瑙乳鉢内に置く。
ソリッドミリングによってBiCuOS0.95I0.05粒子を調製するための方法
BiCuOS 0.95 I 0.05 粉末は、以下の手順に従って、室温での反応性ミリングによって調製された:
1.028gのBi2S3、1.864gのBi2O3、0.906gのCu2Sおよび0.114gのCuIを瑪瑙ミリングビーズの存在下で瑪瑙乳鉢内に置く。
ソリッドミリングによってBiCu0.7Zn0.3OS粒子を調製するための方法
BiCu0.7Zn0.3OS粉末は、以下の手順に従って、室温での反応性ミリングによって調製された:
0.720gのBi2S3、1.584gのBi2O3、0.668gのCu2Sおよび0.349gのZnSを瑪瑙ミリングビーズの存在下で瑪瑙乳鉢内に置く。
可溶性前駆体からBiCu0.7Zn0.2OS粒子を調製するための方法
1)ビスマス前駆体溶液(0.1Mで50mL):
4mLの濃HNO3(商用52.5%)を容器内の2.425gのBiNO3.5H2Oに添加し、次に、混合物を10mLの水で希釈する。別のビーカー内で、3gの水酸化ナトリウムを3gの酒石酸二ナトリウム(C4H4Na2O6・2H2O)と混合する。
0.992gの硫酸銅五水和物(CuSO4.5H2O)および0.285gの硫酸亜鉛七水和物を30mLの蒸留水に溶解する。1.5mLの濃アンモニア(28%)が添加され、濃青色溶液が得られる。次に、15gのチオ硫酸ナトリウム五水和物が添加される。
12.25gのNa2S.9H2Oを100mLの蒸留水に溶解する。
Biおよび(Cu(+Zn)を含有する前もって調製された溶液を急速に混合する。白色沈殿物がすぐに形成され、消失する。混合物が90℃の温度に加熱される。Na2S溶液が90℃に加熱される。
光電気化学デバイス内での化合物C1〜C3の使用
図1に記載されたデバイスは、作用電極をAg/AgClに対して−0.8Vの電位に分極して使用された。システムは、白熱電球(2700Kの色温度)下で暗時と点灯時と交互で照明される。システムが照明下に置かれる時に電流の強さが増加した。これは、光電流であり、それは、化合物C1〜C3の各々が光電流を発生する能力を裏づける。この光電流はカソード電流(すなわち負側)であり、それは、これらの化合物C1〜C3の各々がp型半導体であるという事実と一致している。
Claims (11)
- 式(I):
Bi1−xMxCu1−y−εM’yOS1−zM’’z (I)
[式中:
Mが、Pb、Sn、Hg、Ca、Sr、Ba、Sb、In、Tl、Mg、希土類金属からなる群(A)から選択される元素または元素の混合物であり、
M’が、Ag、Ti、V、Cr、Mn、Fe、Co、Ni、Zn、Ga、Mg、Al、Cdからなる群(B)から選択される元素または元素の混合物であり、
M’’がハロゲンであり、
xが0.5より小さい数であり、yが0.5以下の数であり、zが0.05以下の数であり、
x、yまたはzの少なくとも1つがゼロではなく、
ε=0である]の少なくとも1つの化合物を含む材料。 - ビスマスおよび銅の無機化合物の少なくとも1つと、
任意選択によりBiと群(A)からの元素とから選択される少なくとも1つの元素の少なくとも1つの酸化物、硫化物、オキシ硫化物、ハロゲン化物またはオキシハロゲン化物と、
任意選択によりCuと群(B)からの元素とから選択される少なくとも1つの元素の少なくとも1つの酸化物、硫化物、オキシ硫化物、ハロゲン化物またはオキシハロゲン化物
とを含む混合物のソリッドミリングの工程を含む、請求項1に記載の材料を調製するための方法。 - 以下の工程:
(a)ビスマスの無機化合物の少なくとも1つの塩の形態の金属前駆体と、
任意選択によりBiとPb、Sn、Hg、Ca、Sr、Ba、Sb、In、Tl、Mg、希土類金属からなる群(A)からの元素とから選択される少なくとも1つの元素の少なくとも1つの酸化物、硫化物、オキシ硫化物、ハロゲン化物またはオキシハロゲン化物とを含む少なくとも1つの溶液の調製、
(b)銅の無機化合物の少なくとも1つの塩の形態の金属前駆体と、
任意選択によりCuとAg、Ti、V、Cr、Mn、Fe、Co、Ni、Zn、Ga、Mg、Al、Cdからなる群(B)からの元素とから選択される少なくとも1つの元素の少なくとも1つの酸化物、硫化物、オキシ硫化物、ハロゲン化物またはオキシハロゲン化物とを含む少なくとも1つの溶液の調製、
(c)任意選択により、硫黄源を含む少なくとも1つの溶液の調製、
(d)工程(a)、(b)および任意選択により(c)の結果得られる溶液を混合することによる沈殿、
(e)工程(d)の結果得られる式(I)の化合物の濾過、および必要ならば洗浄を含むことを特徴とする、沈殿反応を含む請求項1に記載の材料を調製するための方法。 - 以下の工程:
(a’)少なくとも、分散された形態でのビスマスおよび銅の無機化合物と、
任意選択によりBiと群(A)からの元素とから選択される少なくとも1つの元素の少なくとも1つの酸化物、硫化物、オキシ硫化物、ハロゲン化物またはオキシハロゲン化物と、
任意選択によりCuと群(B)からの元素とから選択される少なくとも1つの元素の少なくとも1つの酸化物、硫化物、オキシ硫化物、ハロゲン化物またはオキシハロゲン化物と、
任意選択により、硫黄源とを含む混合物の提供、
(b’)水熱条件下で撹拌しながら水または水性媒体中に混合物を溶解、および
(c’)得られた溶液の冷却(それによって式(I)Bi1−xMxCu1−y−εM’yOS1−zM’’zの化合物の粒子が得られる)を含む、請求項1に記載の材料を調製するための方法。 - 光電気化学または光化学用途のための光電流をもたらすための半導体としての、請求項1に記載の材料の使用。
- 式(I)の化合物が、50μm未満の少なくとも1つの寸法を有する等方性または異方性物体の形態で使用される、請求項5に記載の使用。
- 式(I)の化合物が、10μm未満の寸法を有する粒子の形態で使用される、請求項6に記載の使用。
- 式(I)の化合物が、プレートレットタイプの異方性粒子、またはこのタイプの数十〜数百の粒子の凝集体の形態である、請求項7に記載の使用。
- 式(I)の化合物が、その厚さが50μm未満である式(I)の化合物をベースとした連続した層の形態であり、式(I)の化合物をベースとした層が、少なくとも95質量%の比率で式(I)の化合物を含む層である、請求項6に記載の使用。
- 式(I)の化合物が、その厚さが50μm未満である式(I)の化合物をベースとした連続した層の形態であり、式(I)の化合物をベースとした層が、ポリマーマトリックスと、このマトリックス中に分散された、5μm未満の寸法を有する式(I)の化合物をベースとした粒子とを含む、請求項6に記載の使用。
- 正孔伝導性材料と電子伝導性材料との間に、請求項1に記載の式(I)のp型化合物をベースとした層と、n型半導体をベースとした層とを含む光電池デバイスであって、
− 式(I)のp型化合物をベースとした層が、n型半導体をベースとした層と接触しており、
− 式(I)のp型化合物をベースとした層が正孔伝導性材料に近接しており、
− n型半導体をベースとした層が電子伝導性材料に近接している、光電池デバイス。
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