JP6536403B2 - Composition for film formation and single layer coating type horizontal alignment film - Google Patents
Composition for film formation and single layer coating type horizontal alignment film Download PDFInfo
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- JP6536403B2 JP6536403B2 JP2015532837A JP2015532837A JP6536403B2 JP 6536403 B2 JP6536403 B2 JP 6536403B2 JP 2015532837 A JP2015532837 A JP 2015532837A JP 2015532837 A JP2015532837 A JP 2015532837A JP 6536403 B2 JP6536403 B2 JP 6536403B2
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- polymer
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- 230000015572 biosynthetic process Effects 0.000 title claims description 61
- 239000000203 mixture Substances 0.000 title claims description 41
- 239000011248 coating agent Substances 0.000 title claims description 19
- 238000000576 coating method Methods 0.000 title claims description 19
- 239000002356 single layer Substances 0.000 title claims description 15
- 229920000642 polymer Polymers 0.000 claims description 47
- 125000004432 carbon atom Chemical group C* 0.000 claims description 15
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 11
- 125000000217 alkyl group Chemical group 0.000 claims description 9
- 230000003287 optical effect Effects 0.000 claims description 9
- 239000003960 organic solvent Substances 0.000 claims description 9
- 125000003545 alkoxy group Chemical group 0.000 claims description 8
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 8
- 125000005843 halogen group Chemical group 0.000 claims description 5
- 125000004093 cyano group Chemical group *C#N 0.000 claims description 4
- 150000001875 compounds Chemical class 0.000 description 60
- 238000003786 synthesis reaction Methods 0.000 description 45
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 41
- 239000000243 solution Substances 0.000 description 38
- 239000007787 solid Substances 0.000 description 31
- 239000002904 solvent Substances 0.000 description 26
- 239000000758 substrate Substances 0.000 description 26
- 238000005160 1H NMR spectroscopy Methods 0.000 description 22
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 21
- QOSSAOTZNIDXMA-UHFFFAOYSA-N Dicylcohexylcarbodiimide Chemical compound C1CCCCC1N=C=NC1CCCCC1 QOSSAOTZNIDXMA-UHFFFAOYSA-N 0.000 description 20
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 20
- 238000006243 chemical reaction Methods 0.000 description 19
- 238000000034 method Methods 0.000 description 19
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 18
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 18
- -1 acryl group Chemical group 0.000 description 16
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 15
- 239000004973 liquid crystal related substance Substances 0.000 description 15
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 15
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 14
- 238000003756 stirring Methods 0.000 description 13
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 12
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 12
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 12
- VHYFNPMBLIVWCW-UHFFFAOYSA-N 4-Dimethylaminopyridine Chemical compound CN(C)C1=CC=NC=C1 VHYFNPMBLIVWCW-UHFFFAOYSA-N 0.000 description 11
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 11
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 10
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 9
- 239000011521 glass Substances 0.000 description 9
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 8
- 238000005259 measurement Methods 0.000 description 8
- 239000000843 powder Substances 0.000 description 8
- 239000004094 surface-active agent Substances 0.000 description 8
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 7
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 6
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
- NLZUEZXRPGMBCV-UHFFFAOYSA-N Butylhydroxytoluene Chemical compound CC1=CC(C(C)(C)C)=C(O)C(C(C)(C)C)=C1 NLZUEZXRPGMBCV-UHFFFAOYSA-N 0.000 description 6
- IAZDPXIOMUYVGZ-WFGJKAKNSA-N Dimethyl sulfoxide Chemical compound [2H]C([2H])([2H])S(=O)C([2H])([2H])[2H] IAZDPXIOMUYVGZ-WFGJKAKNSA-N 0.000 description 6
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 229910052731 fluorine Inorganic materials 0.000 description 6
- 238000010438 heat treatment Methods 0.000 description 6
- 238000001953 recrystallisation Methods 0.000 description 6
- 238000004528 spin coating Methods 0.000 description 6
- 229960000549 4-dimethylaminophenol Drugs 0.000 description 5
- DHKHKXVYLBGOIT-UHFFFAOYSA-N acetaldehyde Diethyl Acetal Natural products CCOC(C)OCC DHKHKXVYLBGOIT-UHFFFAOYSA-N 0.000 description 5
- 239000000706 filtrate Substances 0.000 description 5
- 229910052943 magnesium sulfate Inorganic materials 0.000 description 5
- 235000019341 magnesium sulphate Nutrition 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 229920006395 saturated elastomer Polymers 0.000 description 5
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 5
- 235000017557 sodium bicarbonate Nutrition 0.000 description 5
- HPALAKNZSZLMCH-UHFFFAOYSA-M sodium;chloride;hydrate Chemical class O.[Na+].[Cl-] HPALAKNZSZLMCH-UHFFFAOYSA-M 0.000 description 5
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 5
- NOOYFQLPKUQDNE-UHFFFAOYSA-N 2-(bromomethyl)prop-2-enoic acid Chemical compound OC(=O)C(=C)CBr NOOYFQLPKUQDNE-UHFFFAOYSA-N 0.000 description 4
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 4
- 150000001241 acetals Chemical class 0.000 description 4
- YXVFYQXJAXKLAK-UHFFFAOYSA-N biphenyl-4-ol Chemical group C1=CC(O)=CC=C1C1=CC=CC=C1 YXVFYQXJAXKLAK-UHFFFAOYSA-N 0.000 description 4
- 239000004202 carbamide Substances 0.000 description 4
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 4
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 4
- 230000001747 exhibiting effect Effects 0.000 description 4
- 230000001678 irradiating effect Effects 0.000 description 4
- 229910052757 nitrogen Inorganic materials 0.000 description 4
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 3
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 3
- 239000002318 adhesion promoter Substances 0.000 description 3
- BTANRVKWQNVYAZ-UHFFFAOYSA-N butan-2-ol Chemical compound CCC(C)O BTANRVKWQNVYAZ-UHFFFAOYSA-N 0.000 description 3
- 229920001429 chelating resin Polymers 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- IJKVHSBPTUYDLN-UHFFFAOYSA-N dihydroxy(oxo)silane Chemical compound O[Si](O)=O IJKVHSBPTUYDLN-UHFFFAOYSA-N 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 239000003480 eluent Substances 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- 238000000605 extraction Methods 0.000 description 3
- 239000011737 fluorine Substances 0.000 description 3
- 125000001153 fluoro group Chemical group F* 0.000 description 3
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 3
- 150000002576 ketones Chemical class 0.000 description 3
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 3
- 239000012044 organic layer Substances 0.000 description 3
- 150000002989 phenols Chemical class 0.000 description 3
- 230000010287 polarization Effects 0.000 description 3
- 239000003505 polymerization initiator Substances 0.000 description 3
- 238000006116 polymerization reaction Methods 0.000 description 3
- 238000002360 preparation method Methods 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 3
- 238000011084 recovery Methods 0.000 description 3
- 238000010898 silica gel chromatography Methods 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 238000001308 synthesis method Methods 0.000 description 3
- NAWXUBYGYWOOIX-SFHVURJKSA-N (2s)-2-[[4-[2-(2,4-diaminoquinazolin-6-yl)ethyl]benzoyl]amino]-4-methylidenepentanedioic acid Chemical compound C1=CC2=NC(N)=NC(N)=C2C=C1CCC1=CC=C(C(=O)N[C@@H](CC(=C)C(O)=O)C(O)=O)C=C1 NAWXUBYGYWOOIX-SFHVURJKSA-N 0.000 description 2
- YXIWHUQXZSMYRE-UHFFFAOYSA-N 1,3-benzothiazole-2-thiol Chemical compound C1=CC=C2SC(S)=NC2=C1 YXIWHUQXZSMYRE-UHFFFAOYSA-N 0.000 description 2
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 2
- BBMCTIGTTCKYKF-UHFFFAOYSA-N 1-heptanol Chemical compound CCCCCCCO BBMCTIGTTCKYKF-UHFFFAOYSA-N 0.000 description 2
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 2
- IOHPVZBSOKLVMN-UHFFFAOYSA-N 2-(2-phenylethyl)benzoic acid Chemical compound OC(=O)C1=CC=CC=C1CCC1=CC=CC=C1 IOHPVZBSOKLVMN-UHFFFAOYSA-N 0.000 description 2
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 2
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 2
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 description 2
- CETWDUZRCINIHU-UHFFFAOYSA-N 2-heptanol Chemical compound CCCCCC(C)O CETWDUZRCINIHU-UHFFFAOYSA-N 0.000 description 2
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical group O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 2
- FCMCSZXRVWDVAW-UHFFFAOYSA-N 6-bromo-1-hexanol Chemical compound OCCCCCCBr FCMCSZXRVWDVAW-UHFFFAOYSA-N 0.000 description 2
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 2
- 229920002284 Cellulose triacetate Polymers 0.000 description 2
- RGSFGYAAUTVSQA-UHFFFAOYSA-N Cyclopentane Chemical compound C1CCCC1 RGSFGYAAUTVSQA-UHFFFAOYSA-N 0.000 description 2
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 2
- ROSDSFDQCJNGOL-UHFFFAOYSA-N Dimethylamine Chemical compound CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- YNQLUTRBYVCPMQ-UHFFFAOYSA-N Ethylbenzene Chemical compound CCC1=CC=CC=C1 YNQLUTRBYVCPMQ-UHFFFAOYSA-N 0.000 description 2
- RZKSECIXORKHQS-UHFFFAOYSA-N Heptan-3-ol Chemical compound CCCCC(O)CC RZKSECIXORKHQS-UHFFFAOYSA-N 0.000 description 2
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 2
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 2
- AMQJEAYHLZJPGS-UHFFFAOYSA-N N-Pentanol Chemical compound CCCCCO AMQJEAYHLZJPGS-UHFFFAOYSA-N 0.000 description 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 2
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 2
- 239000004793 Polystyrene Substances 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- 235000002597 Solanum melongena Nutrition 0.000 description 2
- DKGAVHZHDRPRBM-UHFFFAOYSA-N Tert-Butanol Chemical compound CC(C)(C)O DKGAVHZHDRPRBM-UHFFFAOYSA-N 0.000 description 2
- NNLVGZFZQQXQNW-ADJNRHBOSA-N [(2r,3r,4s,5r,6s)-4,5-diacetyloxy-3-[(2s,3r,4s,5r,6r)-3,4,5-triacetyloxy-6-(acetyloxymethyl)oxan-2-yl]oxy-6-[(2r,3r,4s,5r,6s)-4,5,6-triacetyloxy-2-(acetyloxymethyl)oxan-3-yl]oxyoxan-2-yl]methyl acetate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](OC(C)=O)[C@H]1OC(C)=O)O[C@H]1[C@@H]([C@@H](OC(C)=O)[C@H](OC(C)=O)[C@@H](COC(C)=O)O1)OC(C)=O)COC(=O)C)[C@@H]1[C@@H](COC(C)=O)O[C@@H](OC(C)=O)[C@H](OC(C)=O)[C@H]1OC(C)=O NNLVGZFZQQXQNW-ADJNRHBOSA-N 0.000 description 2
- 150000001299 aldehydes Chemical class 0.000 description 2
- MTHSVFCYNBDYFN-UHFFFAOYSA-N anhydrous diethylene glycol Natural products OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 2
- RDOXTESZEPMUJZ-UHFFFAOYSA-N anisole Chemical compound COC1=CC=CC=C1 RDOXTESZEPMUJZ-UHFFFAOYSA-N 0.000 description 2
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 2
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 2
- IJOOHPMOJXWVHK-UHFFFAOYSA-N chlorotrimethylsilane Chemical compound C[Si](C)(C)Cl IJOOHPMOJXWVHK-UHFFFAOYSA-N 0.000 description 2
- 125000004122 cyclic group Chemical group 0.000 description 2
- DIOQZVSQGTUSAI-UHFFFAOYSA-N decane Chemical compound CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- 150000002170 ethers Chemical class 0.000 description 2
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 2
- 229940116333 ethyl lactate Drugs 0.000 description 2
- FKRCODPIKNYEAC-UHFFFAOYSA-N ethyl propionate Chemical compound CCOC(=O)CC FKRCODPIKNYEAC-UHFFFAOYSA-N 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 238000005227 gel permeation chromatography Methods 0.000 description 2
- CATSNJVOTSVZJV-UHFFFAOYSA-N heptan-2-one Chemical compound CCCCCC(C)=O CATSNJVOTSVZJV-UHFFFAOYSA-N 0.000 description 2
- FFUAGWLWBBFQJT-UHFFFAOYSA-N hexamethyldisilazane Chemical compound C[Si](C)(C)N[Si](C)(C)C FFUAGWLWBBFQJT-UHFFFAOYSA-N 0.000 description 2
- ZSIAUFGUXNUGDI-UHFFFAOYSA-N hexan-1-ol Chemical compound CCCCCCO ZSIAUFGUXNUGDI-UHFFFAOYSA-N 0.000 description 2
- FUZZWVXGSFPDMH-UHFFFAOYSA-M hexanoate Chemical compound CCCCCC([O-])=O FUZZWVXGSFPDMH-UHFFFAOYSA-M 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- UAEPNZWRGJTJPN-UHFFFAOYSA-N methylcyclohexane Chemical compound CC1CCCCC1 UAEPNZWRGJTJPN-UHFFFAOYSA-N 0.000 description 2
- GDOPTJXRTPNYNR-UHFFFAOYSA-N methylcyclopentane Chemical compound CC1CCCC1 GDOPTJXRTPNYNR-UHFFFAOYSA-N 0.000 description 2
- LXCFILQKKLGQFO-UHFFFAOYSA-N methylparaben Chemical compound COC(=O)C1=CC=C(O)C=C1 LXCFILQKKLGQFO-UHFFFAOYSA-N 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- LQNUZADURLCDLV-UHFFFAOYSA-N nitrobenzene Chemical compound [O-][N+](=O)C1=CC=CC=C1 LQNUZADURLCDLV-UHFFFAOYSA-N 0.000 description 2
- BKIMMITUMNQMOS-UHFFFAOYSA-N nonane Chemical compound CCCCCCCCC BKIMMITUMNQMOS-UHFFFAOYSA-N 0.000 description 2
- SJWFXCIHNDVPSH-UHFFFAOYSA-N octan-2-ol Chemical compound CCCCCCC(C)O SJWFXCIHNDVPSH-UHFFFAOYSA-N 0.000 description 2
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 2
- JYVLIDXNZAXMDK-UHFFFAOYSA-N pentan-2-ol Chemical compound CCCC(C)O JYVLIDXNZAXMDK-UHFFFAOYSA-N 0.000 description 2
- AQIXEPGDORPWBJ-UHFFFAOYSA-N pentan-3-ol Chemical compound CCC(O)CC AQIXEPGDORPWBJ-UHFFFAOYSA-N 0.000 description 2
- 229920006254 polymer film Polymers 0.000 description 2
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- 229910000027 potassium carbonate Inorganic materials 0.000 description 2
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 2
- LEHBURLTIWGHEM-UHFFFAOYSA-N pyridinium chlorochromate Chemical compound [O-][Cr](Cl)(=O)=O.C1=CC=[NH+]C=C1 LEHBURLTIWGHEM-UHFFFAOYSA-N 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 238000010526 radical polymerization reaction Methods 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 2
- 239000008096 xylene Substances 0.000 description 2
- WYTZZXDRDKSJID-UHFFFAOYSA-N (3-aminopropyl)triethoxysilane Chemical compound CCO[Si](OCC)(OCC)CCCN WYTZZXDRDKSJID-UHFFFAOYSA-N 0.000 description 1
- NMRPBPVERJPACX-UHFFFAOYSA-N (3S)-octan-3-ol Natural products CCCCCC(O)CC NMRPBPVERJPACX-UHFFFAOYSA-N 0.000 description 1
- WBYWAXJHAXSJNI-VOTSOKGWSA-M .beta-Phenylacrylic acid Natural products [O-]C(=O)\C=C\C1=CC=CC=C1 WBYWAXJHAXSJNI-VOTSOKGWSA-M 0.000 description 1
- SCYULBFZEHDVBN-UHFFFAOYSA-N 1,1-Dichloroethane Chemical compound CC(Cl)Cl SCYULBFZEHDVBN-UHFFFAOYSA-N 0.000 description 1
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- 235000019260 propionic acid Nutrition 0.000 description 1
- 125000006239 protecting group Chemical group 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- HBCQSNAFLVXVAY-UHFFFAOYSA-N pyrimidine-2-thiol Chemical compound SC1=NC=CC=N1 HBCQSNAFLVXVAY-UHFFFAOYSA-N 0.000 description 1
- HNJBEVLQSNELDL-UHFFFAOYSA-N pyrrolidin-2-one Chemical compound O=C1CCCN1 HNJBEVLQSNELDL-UHFFFAOYSA-N 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
- 229920005604 random copolymer Polymers 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- CHQMHPLRPQMAMX-UHFFFAOYSA-L sodium persulfate Substances [Na+].[Na+].[O-]S(=O)(=O)OOS([O-])(=O)=O CHQMHPLRPQMAMX-UHFFFAOYSA-L 0.000 description 1
- 125000006850 spacer group Chemical group 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 235000011150 stannous chloride Nutrition 0.000 description 1
- 150000003440 styrenes Chemical class 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- CIHOLLKRGTVIJN-UHFFFAOYSA-N tert‐butyl hydroperoxide Chemical compound CC(C)(C)OO CIHOLLKRGTVIJN-UHFFFAOYSA-N 0.000 description 1
- ZEMGGZBWXRYJHK-UHFFFAOYSA-N thiouracil Chemical compound O=C1C=CNC(=S)N1 ZEMGGZBWXRYJHK-UHFFFAOYSA-N 0.000 description 1
- 229950000329 thiouracil Drugs 0.000 description 1
- 150000003585 thioureas Chemical class 0.000 description 1
- AXZWODMDQAVCJE-UHFFFAOYSA-L tin(II) chloride (anhydrous) Chemical compound [Cl-].[Cl-].[Sn+2] AXZWODMDQAVCJE-UHFFFAOYSA-L 0.000 description 1
- GQIUQDDJKHLHTB-UHFFFAOYSA-N trichloro(ethenyl)silane Chemical compound Cl[Si](Cl)(Cl)C=C GQIUQDDJKHLHTB-UHFFFAOYSA-N 0.000 description 1
- ILWRPSCZWQJDMK-UHFFFAOYSA-N triethylazanium;chloride Chemical compound Cl.CCN(CC)CC ILWRPSCZWQJDMK-UHFFFAOYSA-N 0.000 description 1
- HQYALQRYBUJWDH-UHFFFAOYSA-N trimethoxy(propyl)silane Chemical compound CCC[Si](OC)(OC)OC HQYALQRYBUJWDH-UHFFFAOYSA-N 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- KXFSUVJPEQYUGN-UHFFFAOYSA-N trimethyl(phenyl)silane Chemical compound C[Si](C)(C)C1=CC=CC=C1 KXFSUVJPEQYUGN-UHFFFAOYSA-N 0.000 description 1
- 239000005051 trimethylchlorosilane Substances 0.000 description 1
- 150000003672 ureas Chemical class 0.000 description 1
- 239000005050 vinyl trichlorosilane Substances 0.000 description 1
- 239000013585 weight reducing agent Substances 0.000 description 1
Images
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
- G02B5/3025—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
- G02B5/3033—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state in the form of a thin sheet or foil, e.g. Polaroid
- G02B5/3041—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state in the form of a thin sheet or foil, e.g. Polaroid comprising multiple thin layers, e.g. multilayer stacks
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- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
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- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
- C08F220/30—Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety
- C08F220/303—Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety and one or more carboxylic moieties in the chain
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- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
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- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
- G02F1/133711—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by organic films, e.g. polymeric films
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Description
本発明は、膜形成用組成物及び単層塗布型水平配向フィルムに関する。詳しくは、表示装置や記録材料等の用途に好適な光学特性を有する材料、特に、液晶ディスプレイ用の偏光板及び位相差板等の光学補償フィルムに好適に利用できる膜を与える膜形成用組成物、及び該組成物から得られる単層塗布型水平配向フィルムに関する。 The present invention relates to a film forming composition and a single-layer coating type horizontal alignment film. Specifically, a film-forming composition which provides a film having a suitable optical property for applications such as display devices and recording materials, particularly an optical compensation film such as a polarizing plate for liquid crystal display and a retardation plate And a single layer coating type horizontally oriented film obtained from the composition.
液晶表示装置の表示品位の向上や軽量化等の要求から、偏光板や位相差板等の光学補償フィルムとして、内部の分子配向構造が制御された高分子フィルムの要求が高まっている。この要求に応えるべく、重合性液晶化合物が有する光学異方性を利用したフィルムの開発がなされている。ここで用いられる重合性液晶化合物は、一般に、重合性基と液晶構造部位(スペーサ部とメソゲン部とを有する構造部位)とを有する液晶化合物であり、この重合性基としてアクリル基が広く用いられている。 From the demand for improvement in display quality and weight reduction of liquid crystal display devices, there is an increasing demand for polymer films in which the molecular orientation structure inside is controlled as optical compensation films such as polarizing plates and retardation plates. In order to meet this demand, development of a film utilizing the optical anisotropy of a polymerizable liquid crystal compound has been made. The polymerizable liquid crystal compound used herein is generally a liquid crystal compound having a polymerizable group and a liquid crystal structural site (a structural site having a spacer portion and a mesogenic portion), and an acryl group is widely used as this polymerizable group. ing.
このような重合性液晶化合物は、一般的に、紫外線等の放射線を照射して重合する方法で重合体(フィルム)とされる。例えば、アクリル基を有する特定の重合性液晶化合物を支持体間に担持し、この化合物を液晶状態に保持しつつ放射線を照射して重合体を得る方法(特許文献1)や、アクリル基を有する2種類の重合性液晶化合物の混合物又はこの混合物にカイラル液晶を混合した組成物に光重合開始剤を添加し、紫外線を照射して重合体を得る方法(特許文献2)が知られている。 Such a polymerizable liquid crystal compound is generally converted to a polymer (film) by a method of irradiation by irradiation with radiation such as ultraviolet light. For example, there is a method of supporting a specific polymerizable liquid crystal compound having an acrylic group between supports and irradiating the radiation while maintaining the compound in a liquid crystal state to obtain a polymer (Patent Document 1), or having an acrylic group There is known a method (Patent Document 2) in which a photopolymerization initiator is added to a mixture of two kinds of polymerizable liquid crystal compounds or a composition obtained by mixing a chiral liquid crystal with this mixture, and irradiating ultraviolet light.
また、液晶配向膜を必要としない重合性液晶化合物や重合体を用いた配向フィルム(特許文献3、4)、光架橋部位を含有した重合体を用いた配向フィルム(特許文献5、6)等、様々な単層塗布型配向フィルムが報告されてきた。しかし、これらのフィルムに用いる重合体は、溶解性が低く、溶媒としてN−メチル−2−ピロリドン、クロロホルム、クロロベンゼン等の溶解力に優れた溶媒を使う必要があるため、これらの溶液から得られたフィルムの屈折率異方性(Δn)、ヘイズ値等の特性が悪化することがあるという問題があった。また、簡単なプロセスによって低ヘイズ値を示す配向フィルムを得ることができる材料はこれまでに見出されていなかった。 In addition, polymerizable liquid crystal compounds that do not require a liquid crystal alignment film, alignment films using polymers (patent documents 3 and 4), alignment films using polymers containing photocrosslinking sites (patent documents 5 and 6), etc. A variety of single layer coated oriented films have been reported. However, since the polymers used for these films have low solubility and it is necessary to use a solvent having excellent solubility such as N-methyl-2-pyrrolidone, chloroform, chlorobenzene as a solvent, they can be obtained from these solutions. There is a problem that the characteristics such as refractive index anisotropy (.DELTA.n) and haze value of the film may be deteriorated. Also, no material has been found so far that can obtain an oriented film exhibiting a low haze value by a simple process.
本発明は、上記問題に鑑みなされたものであり、より簡単なプロセスで低ヘイズ値を示す単層塗布型水平配向フィルム作製を可能とする膜形成用組成物、及び該組成物から得られる単層塗布型水平配向フィルムを提供することを目的とする。 The present invention has been made in view of the above problems, and a film forming composition capable of producing a single layer coating type horizontal alignment film exhibiting a low haze value by a simpler process, and a single material obtained from the composition It is an object of the present invention to provide a layer-coated horizontally oriented film.
本発明者は、上記課題を解決すべく鋭意検討を重ねた結果、γ−ブチロラクトン骨格を主鎖に含有するとともに、ラクトン環のγ位から延びる側鎖上にケイ皮酸エステル構造を有する重合体を用いることで、偏光紫外線露光後に安定なネットワーク構造が形成されるためか、液晶配向膜を使用することなく、屈折率異方性(Δn)を有する水平配向フィルムが得られること、低いヘイズ値を示す水平配向フィルムを低温条件下で作製可能となることを見出し、本発明を完成した。 As a result of intensive studies to solve the above problems, the present inventor has found that a polymer having a cinnamic acid ester structure on the side chain extending from the γ position of the lactone ring while containing the γ-butyrolactone skeleton in the main chain. The reason is that a horizontal alignment film having refractive index anisotropy (Δn) can be obtained without using a liquid crystal alignment film, because a stable network structure is formed after exposure to polarized ultraviolet light. The present invention has been completed by finding that a horizontally-oriented film exhibiting the following can be produced under low temperature conditions.
すなわち、本発明は、下記膜形成用組成物及び単層塗布型水平配向フィルムを提供する。
1.式[1a]及び[1b]で表される繰り返し単位を含む少なくとも1種の重合体と有機溶媒とを含有することを特徴とする膜形成用組成物。
M1は式[4]で表される基であり、M2は式[5]で表される基であり、
m及びnはそれぞれ0<m<100、0<n<100、かつ、m+n≦100を満たす数であり、
q及びrはそれぞれ独立に2〜9の整数である。]
2.上記重合体の重量平均分子量が、3,000〜200,000である1の膜形成用組成物。
3.m及びnが、20≦m≦90、10≦n≦80、かつ、m+n≦100を満たす数である1又は2の膜形成用組成物。
4.上記有機溶媒が、組成物中60〜95質量%含まれる1〜3のいずれかの膜形成用組成物。
5.1〜4のいずれかの膜形成用組成物から得られる単層塗布型水平配向フィルム。
6.5の単層塗布型水平配向フィルムを備える光学部材。
That is, the present invention provides the following composition for film formation and a single-layer coating type horizontal alignment film.
1. What is claimed is: 1. A composition for forming a film, which comprises at least one polymer containing repeating units represented by the formulas [1a] and [1b] and an organic solvent.
M 1 is a group represented by the formula [4], and M 2 is a group represented by the formula [5]
m and n are numbers satisfying 0 <m <100, 0 <n <100, and m + n ≦ 100, respectively
q and r are each independently an integer of 2-9. ]
2. The composition for film formation of 1, wherein the weight average molecular weight of the polymer is 3,000 to 200,000.
3. The composition for film formation of 1 or 2 whose m and n are numbers which satisfy | fill 20 <= m <= 90, 10 <= n <= 80, and m + n <= 100.
4. The composition for film formation in any one of 1-3 in which the said organic solvent is contained 60 to 95 mass% in a composition.
The single layer coating type horizontal alignment film obtained from the composition for film formation in any one of 5.1-4.
6 . An optical member provided with the single layer coating type horizontal alignment film of 5 .
本発明の重合体は、γ−ブチロラクトン骨格を主鎖に含有する。そのため、この重合体を含有する膜形成用組成物を塗布し、室温にて直線偏光を照射し、ポストベークを行うプロセスにより、低ヘイズ値を示す単層塗布型水平配向フィルムを作製することが可能である。 The polymer of the present invention contains a γ-butyrolactone skeleton in the main chain. Therefore, a film-forming composition containing this polymer is applied, linearly polarized light is irradiated at room temperature, and post-baking is performed to produce a single layer coating type horizontally oriented film exhibiting a low haze value. It is possible.
[膜形成用組成物]
本発明の膜形成用組成物は、少なくとも1種の下記重合体と有機溶媒とを含有する。[Composition for film formation]
The composition for film formation of the present invention contains at least one of the following polymers and an organic solvent.
[重合体]
本発明の膜形成用組成物に含まれる重合体は、式[1a]及び[1b]で表される繰り返し単位を含む。
The polymer contained in the composition for film formation of the present invention contains repeating units represented by the formulas [1a] and [1b].
式[1a]中、Xは式[2]又は[3]で表される基である。
式[1a]中、M1は式[4]で表される基であり、式[1b]中、M2は式[5]で表される基である。
ここで、ハロゲン原子としては、フッ素、塩素、臭素、ヨウ素原子が挙げられるが、本発明においては、フッ素原子が好ましい。 Here, as a halogen atom, although a fluorine, chlorine, a bromine, and an iodine atom are mentioned, a fluorine atom is preferable in this invention.
アルキル基としては、直鎖状、分岐状、環状のいずれでもよく、その炭素数も特に限定されない。上記アルキル基の具体例としては、メチル基、エチル基、n−プロピル基、イソプロピル基、シクロプロピル基、n−ブチル基、イソブチル基、s−ブチル基、t−ブチル基、シクロブチル基、n−ペンチル基、シクロペンチル基、n−ヘキシル基、シクロヘキシル基、n−ヘプチル基、n−オクチル基、n−ノニル基、n−デシル基等が挙げられる。これらのうち、R2としては、直鎖状の炭素数1〜10のアルキル基が好ましく、炭素数1〜3のアルキル基がより好ましく、特にメチル基、エチル基等が好ましい。R3としては、炭素数1〜3のアルキル基が好ましく、特にメチル基、エチル基等が好ましい。The alkyl group may be linear, branched or cyclic, and the carbon number is also not particularly limited. Specific examples of the above alkyl group include methyl group, ethyl group, n-propyl group, isopropyl group, cyclopropyl group, n-butyl group, isobutyl group, s-butyl group, t-butyl group, cyclobutyl group, n- A pentyl group, a cyclopentyl group, an n-hexyl group, a cyclohexyl group, an n-heptyl group, an n-octyl group, an n-nonyl group, an n-decyl group and the like can be mentioned. Among these, as R 2 , a linear alkyl group having 1 to 10 carbon atoms is preferable, an alkyl group having 1 to 3 carbon atoms is more preferable, and a methyl group, an ethyl group and the like are particularly preferable. As R 3 , an alkyl group having 1 to 3 carbon atoms is preferable, and a methyl group, an ethyl group and the like are particularly preferable.
アルコキシ基としては、直鎖状、分岐状、環状のいずれでもよく、その炭素数も特に限定されないが、本発明においては、直鎖状の炭素数1〜10のアルコキシ基が好ましい。上記アルコキシ基の具体例としては、メトキシ基、エトキシ基、n−プロポキシ基、イソプロポキシ基、n−ブトキシ基、イソブトキシ基、s−ブトキシ基、t−ブトキシ基、n−ペンチルオキシ基、n−ヘキシルオキシ基、n−ヘプチルオキシ基、n−オクチルオキシ基、n−ノニルオキシ基、n−デシルオキシ基等が挙げられる。これらのうち、炭素数1〜3のアルコキシ基が更に好ましく、特にメトキシ基、エトキシ基等が好ましい。 The alkoxy group may be linear, branched or cyclic, and the number of carbon atoms is not particularly limited, but in the present invention, a linear alkoxy group having 1 to 10 carbon atoms is preferable. Specific examples of the above alkoxy group include methoxy group, ethoxy group, n-propoxy group, isopropoxy group, n-butoxy group, isobutoxy group, s-butoxy group, t-butoxy group, n-pentyloxy group, n- A hexyloxy group, n-heptyloxy group, n-octyloxy group, n-nonyloxy group, n-decyloxy group etc. are mentioned. Among these, an alkoxy group having 1 to 3 carbon atoms is more preferable, and a methoxy group, an ethoxy group and the like are particularly preferable.
なお、上記アルキル基、アルコキシ基において、その水素原子の一部又は全部がフッ素原子等のハロゲン原子で置換されていてもよい。 In the above alkyl group and alkoxy group, part or all of the hydrogen atoms may be substituted with a halogen atom such as a fluorine atom.
R2として更に好ましくは、水素原子、フッ素原子、シアノ基、メチル基、メトキシ基等である。R3として更に好ましくは、メチル基である。More preferably, R 2 is a hydrogen atom, a fluorine atom, a cyano group, a methyl group, a methoxy group or the like. More preferably, R 3 is a methyl group.
G1としては、−COO−又は−OCO−が好ましい。As G 1 , -COO- or -OCO- is preferable.
式[1a]及び[1b]中、m及びnは、各繰り返し単位の含有率(mol%)を表し、それぞれ0<m<100、0<n<100、かつ、m+n≦100を満たす数であるが、Δnの向上や重合体の溶解性の向上等の点から、それぞれ20≦m≦90、10≦n≦80を満たす数であることが好ましく、50≦m≦80、20≦n≦50を満たす数であることがより好ましい。 In the formulas [1a] and [1b], m and n each represent the content (mol%) of each repeating unit, and in a number satisfying 0 <m <100, 0 <n <100, and m + n ≦ 100, respectively. However, it is preferable that the numbers satisfy 20 ≦ m ≦ 90 and 10 ≦ n ≦ 80, respectively, and 50 ≦ m ≦ 80 and 20 ≦ n ≦ from the viewpoint of improvement of Δn and improvement of the solubility of the polymer. It is more preferable that the number is 50.
式[1a]及び[1b]中、q及びrは、それぞれ独立に2〜9の整数であるが、3〜6が好ましく、特にqとしては5又は6がより好ましい。 In the formulas [1a] and [1b], q and r each independently represent an integer of 2 to 9, preferably 3 to 6 and particularly preferably 5 or 6 as q.
上記重合体は、重量平均分子量が3,000〜200,000であることが好ましく、4,000〜150,000であることがより好ましく、5,000〜100,000であることが更に好ましい。重量平均分子量が200,000を超えると、溶剤に対する溶解性が低下しハンドリング性が低下する場合があり、重量平均分子量が3,000未満であると、熱硬化時に硬化不足になり溶剤耐性及び耐熱性が低下する場合がある。
なお、重量平均分子量は、ゲルパーミエーションクロマトグラフィー(GPC)によるポリスチレン換算測定値である。The weight average molecular weight of the polymer is preferably 3,000 to 200,000, more preferably 4,000 to 150,000, and still more preferably 5,000 to 100,000. If the weight average molecular weight exceeds 200,000, the solubility in solvents may decrease and the handling properties may decrease, and if the weight average molecular weight is less than 3,000, the curing becomes insufficient at the time of heat curing, and the solvent resistance and heat resistance Gender may decrease.
In addition, a weight average molecular weight is a polystyrene conversion measurement value by gel permeation chromatography (GPC).
また、上記重合体は、本発明の効果を損なわない限り、式[1a]及び[1b]以外の他の繰り返し単位を含んでもよい。上記他の繰り返し単位を与える重合性化合物としては、アクリル酸エステル化合物、メタクリル酸エステル化合物、マレイミド化合物、アクリルアミド化合物、アクリロニトリル、マレイン酸無水物、スチレン化合物等が挙げられる。 Moreover, the said polymer may also contain other repeating units other than Formula [1a] and [1b], unless the effect of this invention is impaired. Examples of the polymerizable compound giving the other repeating unit include acrylic acid ester compounds, methacrylic acid ester compounds, maleimide compounds, acrylamide compounds, acrylonitrile, maleic anhydride, styrene compounds and the like.
上記他の繰り返し単位の含有率は、全繰り返し単位中、0〜10mol%が好ましい。上記他の繰り返し単位の含有率が大きすぎると、本発明の重合体の特性、例えば液晶性等の特性が低下する場合がある。 As for the content rate of the said other repeating unit, 0-10 mol% is preferable in all the repeating units. When the content of the other repeating unit is too large, properties of the polymer of the present invention, for example, properties such as liquid crystallinity may be deteriorated.
なお、本発明の重合体は、ランダム共重合体、交互共重合体、ブロック共重合体のいずれでもよい。 The polymer of the present invention may be any of a random copolymer, an alternating copolymer and a block copolymer.
[重合性化合物]
本発明で用いる重合体の原料となる重合性化合物は、式[6]及び[7]で表される。
The polymerizable compound used as the raw material of the polymer used by this invention is represented by Formula [6] and [7].
[重合性化合物の合成]
上記重合性化合物は、有機合成化学における手法を組み合わせることによって合成することができ、その合成法は特に限定されない。[Synthesis of Polymerizable Compound]
The above polymerizable compounds can be synthesized by combining the methods in organic synthetic chemistry, and the synthesis method is not particularly limited.
例えば、式[6]で表される重合性化合物は下記方法にて製造される。
G1が−COO−の場合、下記スキームで表されるように、式[10]で表される安息香酸誘導体とフェノール誘導体とを、溶媒中、縮合剤の存在下で縮合させることにより製造される。
When G 1 is —COO—, it is produced by condensing a benzoic acid derivative represented by the formula [10] and a phenol derivative in a solvent in the presence of a condensing agent as represented by the following scheme: Ru.
G1が−OCO−の場合、下記スキームで表されるように、式[11]で表されるフェノール誘導体と安息香酸誘導体とを、溶媒中、縮合剤の存在下で縮合させることにより製造される。
また、式[7]で表される化合物は、下記合成スキームで表されるように、式[12]で表される化合物とフェノール誘導体とを、溶媒中、縮合剤の存在下で縮合させることにより製造される。
式[10]及び[11]で表される化合物は、X'が式[8]で表される基の場合は、SYNTHON Chemicals社又はみどり化学(株)から市販品として入手可能である。
また、式[10]及び[11]で表される化合物であってX'が式[9]で表される基であるもの、及び式[12]で表される化合物は、例えば、Talaga等(P. Talaga, M. Schaeffer, C. Benezra and J. L. Stampf, Synthesis, 530 (1990))が提案する手法を用いて合成することができる。この手法は、下記合成スキームA1で表されるように、SnCl2を用いて2−(ブロモメチル)アクリル酸とアルデヒド又はケトンとを反応させる方法である。なお、2−(ブロモメチル)アクリル酸は、Ramarajan等が提案する方法で得ることができる(K.Ramarajan, K.Kamalingam, D. J. O'Donnell and K. D. Berlin, Organic Synthesis, vol. 61,pp. 56-59 (1983))。The compounds represented by the formulas [10] and [11] are commercially available from SYNTHON Chemicals or Green Chemical Co., Ltd. when X ′ is a group represented by the formula [8].
In addition, compounds represented by the formulas [10] and [11], wherein X ′ is a group represented by the formula [9], and a compound represented by the formula [12] are, for example, Talaga et al. It can synthesize | combine using the method which (P. Talaga, M. Schaeffer, C. Benezra and JL Stampf, Synthesis, 530 (1990)) proposes. This method is a method in which 2- (bromomethyl) acrylic acid is reacted with an aldehyde or a ketone using SnCl 2 as represented by the following synthesis scheme A1. 2- (bromomethyl) acrylic acid can be obtained by the method proposed by Ramarajan et al. (K. Ramarajan, K. Kamalingam, DJ O'Donnell and KD Berlin, Organic Synthesis, vol. 61, pp. 56- 59 (1983)).
また、SnCl2を用いた2−(ブロモメチル)アクリル酸の反応では、アルデヒド又はケトンの代わりに対応するアセタール又はケタールとの反応により、α−メチレン−γ−ブチロラクトン構造を得ることもできる。アセタール又はケタールとしては、ジメチルアセタール基、ジエチルアセタール基、1,3−ジオキサン基、1,3−ジオキソラン基等を有する化合物が挙げられる。下記合成スキームA2に、アセタール又はケタールを用いた場合の合成法及び保護基を示す。In addition, in the reaction of 2- (bromomethyl) acrylic acid using SnCl 2 , an α-methylene-γ-butyrolactone structure can also be obtained by reaction with the corresponding acetal or ketal instead of aldehyde or ketone. Examples of the acetal or ketal include compounds having a dimethylacetal group, a diethylacetal group, a 1,3-dioxane group, a 1,3-dioxolane group and the like. The following synthesis scheme A2 shows a synthesis method and a protecting group when using an acetal or ketal.
上記合成スキームA1又はA2の手法を応用した下記合成スキームB又はCの手法により、式[10]、[11]又は[12]で表される化合物を合成することができる。 The compound represented by the formula [10], [11] or [12] can be synthesized by the method of the following synthesis scheme B or C to which the method of the above synthesis scheme A1 or A2 is applied.
[重合体の合成]
上記重合体を合成する方法としては、特に限定されず、ラジカル重合、アニオン重合、カチオン重合等を採用し得る。これらのうち、特にラジカル重合が好ましく、具体的には、溶媒中、上記重合性化合物を重合開始剤の存在下で加熱し、重合させればよい。[Synthesis of polymer]
It does not specifically limit as method to synthesize | combine the said polymer, Radical polymerization, anion polymerization, cationic polymerization etc. are employable. Among these, radical polymerization is particularly preferable, and specifically, the above-mentioned polymerizable compound may be heated and polymerized in the presence of a polymerization initiator in a solvent.
重合開始剤としては、従来公知のものから適宜選択して用いることができる。例えば、過酸化ベンゾイル、クメンハイドロパーオキサイド、t−ブチルハイドロパーオキサイド等の過酸化物;過硫酸ナトリウム、過硫酸カリウム、過硫酸アンモニウム等の過硫酸塩;アゾビスイソブチロニトリル(AIBN)、アゾビスメチルブチロニトリル、アゾビスイソバレロニトリル等のアゾ系化合物等が挙げられる。これらは1種単独で又は2種以上組み合わせて使用することができる。 The polymerization initiator can be appropriately selected and used from conventionally known ones. For example, peroxides such as benzoyl peroxide, cumene hydroperoxide and t-butyl hydroperoxide; persulfates such as sodium persulfate, potassium persulfate and ammonium persulfate; azobisisobutyronitrile (AIBN), azo Examples include azo compounds such as bismethyl butyronitrile and azobisisovaleronitrile. These can be used singly or in combination of two or more.
重合開始剤の使用量は、重合性化合物1molに対して、0.01〜0.05mol程度が好ましい。
反応温度は、0℃から使用する溶媒の沸点までで適宜設定すればよいが、20〜100℃程度が好ましい。反応時間は、0.1〜30時間程度が好ましい。The amount of the polymerization initiator used is preferably about 0.01 to 0.05 mol with respect to 1 mol of the polymerizable compound.
The reaction temperature may be appropriately set from 0 ° C. to the boiling point of the solvent used, but about 20 to 100 ° C. is preferable. The reaction time is preferably about 0.1 to 30 hours.
重合反応に用いられる溶媒としては、特に限定されず、上記重合反応で一般的に使用されている各種溶媒から適宜選択して用いればよい。具体的には、水;メタノール、エタノール、1−プロパノール、2−プロパノール、1−ブタノール、2−ブタノール、i−ブタノール、t−ブタノール、1−ペンタノール、2−ペンタノール、3−ペンタノール、i−ペンタノール、t−ペンタノール、1−ヘキサノール、1−ヘプタノール、2−ヘプタノール、3−ヘプタノール、2−オクタノール、2−エチル−1−ヘキサノール、ベンジルアルコール、シクロヘキサノール等のアルコール類;ジエチルエーテル、ジイソプロピルエーテル、ジブチルエーテル、シクロペンチルメチルエーテル、テトラヒドロフラン、1,4−ジオキサン等のエーテル類;クロロホルム、ジクロロメタン、ジクロロエタン、四塩化炭素等のハロゲン化炭化水素類;メチルセロソルブ、エチルセロソルブ、イソプロピルセロソルブ、ブチルセロソルブ、ジエチレングリコールモノブチルエーテル等のエーテルアルコール類;アセトン、メチルエチルケトン、メチルイソブチルケトン、シクロヘキサノン等のケトン類;酢酸エチル、酢酸ブチル、プロピオン酸エチル、セロソルブアセテート等のエステル類;n−ペンタン、n−ヘキサン、n−ヘプタン、n−オクタン、n−ノナン、n−デカン、シクロペンタン、メチルシクロペンタン、シクロヘキサン、メチルシクロヘキサン、ベンゼン、トルエン、キシレン、エチルベンゼン、アニソール等の脂肪族又は芳香族炭化水素類;メチラール、ジエチルアセタール等のアセタール類;ギ酸、酢酸、プロピオン酸等の脂肪酸類;ニトロプロパン、ニトロベンゼン、ジメチルアミン、モノエタノールアミン、ピリジン、N−メチル−2−ピロリドン(NMP)、N,N−ジメチルホルムアミド、ジメチルスルホキシド、アセトニトリル等が挙げられる。これらは1種単独で又は2種以上混合して用いることができる。 It does not specifically limit as a solvent used for a polymerization reaction, What is necessary is just to select suitably from various solvents generally used by the said polymerization reaction, and just to use. Specifically, water; methanol, ethanol, 1-propanol, 2-propanol, 1-butanol, 2-butanol, i-butanol, t-butanol, 1-pentanol, 2-pentanol, 3-pentanol, Alcohols such as i-pentanol, t-pentanol, 1-hexanol, 1-heptanol, 2-heptanol, 3-heptanol, 2-octanol, 2-ethyl-1-hexanol, benzyl alcohol, cyclohexanol; diethyl ether , Ethers such as diisopropyl ether, dibutyl ether, cyclopentyl methyl ether, tetrahydrofuran, 1,4-dioxane; halogenated hydrocarbons such as chloroform, dichloromethane, dichloroethane, carbon tetrachloride; methyl cellosolve, ethyl cellosolve, Ether alcohols such as isopropyl cellosolve, butyl cellosolve and diethylene glycol monobutyl ether; ketones such as acetone, methyl ethyl ketone, methyl isobutyl ketone and cyclohexanone; esters such as ethyl acetate, butyl acetate, ethyl propionate and cellosolve acetate; n-pentane, n -Aliphatic or aromatic hydrocarbons such as hexane, n-heptane, n-octane, n-nonane, n-decane, cyclopentane, methylcyclopentane, cyclohexane, methylcyclohexane, benzene, toluene, xylene, ethylbenzene, anisole, etc. Acetals such as methylal and diethyl acetal; fatty acids such as formic acid, acetic acid and propionic acid; nitropropane, nitrobenzene, dimethylamine, monoethanolamide , Pyridine, N- methyl-2-pyrrolidone (NMP), N, N- dimethylformamide, dimethyl sulfoxide, acetonitrile and the like. These can be used individually by 1 type or in mixture of 2 or more types.
上記重合体が式[1a]及び[1b]以外の他の繰り返し単位を含む場合は、その合成方法としては、上記重合の際に、上記他の繰り返し単位を与える重合性化合物を共存させて重合すればよい。 In the case where the above polymer contains other repeating units other than those of the formulas [1a] and [1b], as the synthesis method thereof, a polymerizing compound which gives the above other repeating unit is made to coexist in the above polymerization. do it.
[有機溶媒]
本発明の膜形成用組成物に含まれる有機溶媒としては、例えば、テトラヒドロフラン、ジオキサン等のエーテル類;ベンゼン、トルエン、キシレン等の芳香族炭化水素類;N,N−ジメチルホルムアミド、N−メチル−2−ピロリドン等の極性溶媒;酢酸エチル、酢酸ブチル、乳酸エチル等のエステル類;3−メトキシプロピオン酸メチル、2−メトキシプロピオン酸メチル、3−メトキシプロピオン酸エチル、2−メトキシプロピオン酸エチル、3−エトキシプロピオン酸エチル、2−エトキシプロピオン酸エチル等のアルコキシエステル類;エチレングリコールジメチルエーテル、プロピレングリコールジメチルエーテル等のグリコールジアルキルエーテル類;ジエチレングリコールジメチルエーテル、ジエチレングリコールジエチルエーテル、ジエチレングリコールメチルエチルエーテル、ジプロピレングリコールジメチルエーテル等のジグリコールジアルキルエーテル類;エチレングリコールモノメチルエーテル、エチレングリコールモノエチルエーテル、プロピレングリコールモノメチルエーテル、プロピレングリコールモノエチルエーテル等のグリコールモノアルキルエーテル類;ジエチレングリコールモノメチルエーテル、ジエチレングリコールモノエチルエーテル、ジプロピレングリコールモノメチルエーテル、ジプロピレングリコールモノエチルエーテル等のジグリコールモノアルキルエーテル類;プロピレングリコールモノメチルエーテルアセテート、カルビトールアセテート、エチルセロソルブアセテート等のグリコールモノアルキルエーテルエステル類;シクロヘキサノン、メチルエチルケトン、メチルイソブチルケトン、2−ヘプタノン等のケトン類等を挙げることができる。これらの有機溶媒は1種単独で又は2種以上混合して用いることができる。[Organic solvent]
Examples of the organic solvent contained in the composition for film formation of the present invention include ethers such as tetrahydrofuran and dioxane; aromatic hydrocarbons such as benzene, toluene and xylene; N, N-dimethylformamide, N-methyl- Polar solvents such as 2-pyrrolidone; esters such as ethyl acetate, butyl acetate and ethyl lactate; methyl 3-methoxypropionate, methyl 2-methoxypropionate, ethyl 3-methoxypropionate, ethyl 2-methoxypropionate, 3 -Alkoxy esters such as ethyl ethoxypropionate and ethyl 2-ethoxypropionate; glycol dialkyl ethers such as ethylene glycol dimethyl ether and propylene glycol dimethyl ether; diethylene glycol dimethyl ether, diethylene glycol diethyl ether Diglycol dialkyl ethers such as diethylene glycol methyl ethyl ether and dipropylene glycol dimethyl ether; glycol monoalkyl ethers such as ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, propylene glycol monomethyl ether and propylene glycol monoethyl ether; diethylene glycol monomethyl Diglycol monoalkyl ethers such as ether, diethylene glycol monoethyl ether, dipropylene glycol monomethyl ether, dipropylene glycol monoethyl ether; glycol monoalkyl ether esters such as propylene glycol monomethyl ether acetate, carbitol acetate, ethyl cellosolve acetate; The Rohekisanon, methyl ethyl ketone, methyl isobutyl ketone and 2-heptanone. These organic solvents can be used singly or in combination of two or more.
これらの中でも、プロピレングリコールモノメチルエーテル、プロピレングリコールモノメチルエーテルアセテート、乳酸エチル、シクロヘキサノン等が好ましい。
有機溶媒の使用量は、組成物中60〜95質量%程度とすることが好適である。Among these, propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, ethyl lactate, cyclohexanone and the like are preferable.
The amount of the organic solvent used is preferably about 60 to 95% by mass in the composition.
[その他の成分]
本発明の膜形成用組成物には、基板との親和性を向上させる目的で界面活性剤を添加してもよい。界面活性剤としては、特に限定されないが、フッ素系界面活性剤、シリコーン系界面活性剤、ノニオン系界面活性剤等が挙げられる。これらのうち、基板との親和性改善効果の高いフッ素系界面活性剤が好ましい。[Other ingredients]
A surfactant may be added to the composition for film formation of the present invention for the purpose of improving the affinity to the substrate. Although it does not specifically limit as surfactant, A fluorine-type surfactant, a silicone type surfactant, a nonionic surfactant etc. are mentioned. Among these, fluorine-based surfactants having a high effect of improving the affinity to the substrate are preferable.
フッ素系界面活性剤の具体例としては(以下、商品名)、エフトップEF301、EF303、EF352((株)トーケムプロダクツ製)、メガファックF171、F173、R−30(DIC(株)製)、フロラードFC430、FC431(住友スリーエム(株)製)、アサヒガードAG710、サーフロンS−382、SC101、SC102、SC103、SC104、SC105、SC106(旭硝子(株)製)等が挙げられるが、これらに限定されない。なお、界面活性剤は1種単独でも2種以上を組み合わせて用いることもでき、その添加量は重合体100質量部に対して5質量部以下が好ましい。 Specific examples of the fluorine-based surfactant (hereinafter, trade names): F-top EF301, EF303, EF352 (manufactured by Tochem Products), Megafac F171, F173, R-30 (manufactured by DIC Corporation) , Florard FC430, FC431 (Sumitomo 3M Co., Ltd.), Asahi Guard AG710, Surfron S-382, SC101, SC102, SC103, SC104, SC105, SC106 (Asahi Glass Co., Ltd.), etc., but these are limited thereto I will not. The surfactant may be used singly or in combination of two or more, and the amount thereof is preferably 5 parts by mass or less with respect to 100 parts by mass of the polymer.
更に、本発明の膜形成用組成物には、基板との密着性を向上させる目的で密着促進剤を添加してもよい。 Further, an adhesion promoter may be added to the composition for film formation of the present invention for the purpose of improving the adhesion to the substrate.
密着促進剤としては、トリメチルクロロシラン、ジメチルビニルクロロシラン、メチルジフェニルクロロシラン、クロロメチルジメチルクロロシラン等のクロロシラン類;トリメチルメトキシシラン、ジメチルジエトキシシラン、メチルジメトキシシラン、ジメチルビニルエトキシシラン、ジフェニルジメトキシシラン、フェニルトリエトキシシラン等のアルコキシシラン類;ヘキサメチルジシラザン、N,N'−ビス(トリメチルシリル)ウレア、ジメチルトリメチルシリルアミン、トリメチルシリルイミダゾール等のシラザン類;ビニルトリクロロシラン、γ−クロロプロピルトリメトキシシラン、γ−アミノプロピルトリエトキシシラン、γ−メタクリロキシプロピルトリメトキシシラン、γ−グリシドキシプロピルトリメトキシシラン、γ−(N−ピペリジニル)プロピルトリメトキシシラン等のシラン類;ベンゾトリアゾール、ベンズイミダゾール、インダゾール、イミダゾール、2−メルカプトベンズイミダゾール、2−メルカプトベンゾチアゾール、2−メルカプトベンゾオキサゾール、ウラゾール、チオウラシル、メルカプトイミダゾール、メルカプトピリミジン等の複素環状化合物;1,1−ジメチルウレア、1,3−ジメチルウレア等の尿素化合物;チオ尿素化合物等が挙げられる。 As adhesion promoters, chlorosilanes such as trimethylchlorosilane, dimethylvinylchlorosilane, methyldiphenylchlorosilane, chloromethyldimethylchlorosilane, etc .; trimethylmethoxysilane, dimethyldiethoxysilane, methyldimethoxysilane, dimethylvinylethoxysilane, diphenyldimethoxysilane, phenyltrimethylsilane Alkoxysilanes such as ethoxysilane; Hexamethyldisilazane, N, N'-bis (trimethylsilyl) urea, dimethyltrimethylsilylamine, silazanes such as trimethylsilylimidazole; Vinyltrichlorosilane, γ-chloropropyltrimethoxysilane, γ-amino Propyltriethoxysilane, γ-methacryloxypropyltrimethoxysilane, γ-glycidoxypropyltrimethoxysilane, γ- ( -Piperidinyl) silanes such as propyltrimethoxysilane; benzotriazole, benzimidazole, indazole, imidazole, 2-mercaptobenzimidazole, 2-mercaptobenzothiazole, 2-mercaptobenzoxazole, urazole, thiouracil, mercaptoimidazole, mercaptopyrimidine etc. Heterocyclic compounds; urea compounds such as 1,1-dimethylurea and 1,3-dimethylurea; thiourea compounds and the like.
密着促進剤は1種単独でも2種以上を組み合わせて用いることもでき、その添加量は重合体100質量部に対して1質量部以下が好ましい。 The adhesion promoter may be used singly or in combination of two or more, and the amount thereof is preferably 1 part by mass or less with respect to 100 parts by mass of the polymer.
[単層塗布型水平配向フィルム]
以上説明した本発明の膜形成用組成物を基板(例えば、シリコン/二酸化シリコン被覆基板、シリコンナイトライド基板、金属、例えば、アルミニウム、モリブデン、クロム等が被覆された基板、ガラス基板、石英基板、ITO基板等)やフィルム(例えば、トリアセチルセルロース(TAC)フィルム、シクロオレフィンポリマーフィルム、ポリエチレンテレフタレートフィルム、アクリルフィルム等の樹脂フィルム)等の上に、バーコート、スピンコート、フローコート、ロールコート、スリットコート、スリットコートに続いたスピンコート、インクジェット法、印刷法等の方法によって塗布して塗膜を形成し、その後、ホットプレート又はオーブン等で加熱乾燥することにより、膜を形成することができる。[Single-layer coating type horizontal alignment film]
The composition for film formation of the present invention described above can be used as a substrate (for example, a silicon / silicon dioxide coated substrate, a silicon nitride substrate, a substrate coated with a metal such as aluminum, molybdenum or chromium, a glass substrate, a quartz substrate, Bar coat, spin coat, flow coat, roll coat, etc. on ITO substrate etc. and films (eg, resin films such as triacetyl cellulose (TAC) film, cycloolefin polymer film, polyethylene terephthalate film, acrylic film etc) A film can be formed by coating by a method such as slit coating, spin coating following slit coating, an inkjet method, a printing method, etc. to form a coating film, and then heat drying in a hot plate or an oven etc. .
加熱乾燥の条件としては、例えば、40〜100℃及び0.1〜60分間の範囲の中から適宜選択された加熱温度及び加熱時間が採用される。上記加熱温度及び加熱時間は、好ましくは40〜80℃、0.1〜2分間である。 As the conditions of the heating and drying, for example, a heating temperature and a heating time appropriately selected from the range of 40 to 100 ° C. and 0.1 to 60 minutes are employed. The heating temperature and the heating time are preferably 40 to 80 ° C. and 0.1 to 2 minutes.
このようにして形成された膜に対して、直線偏光照射を行い、ポストベークを行うことにより、単層塗布型水平配向フィルムが得られる。
直線偏光の照射方法としては、通常150〜450nmの波長の紫外線〜可視光線が用いられ、室温又は加熱した状態で、直線偏光を照射することによって行われる。照射線量は、用いる光によって異なるが、概ね100〜2,000mJ/cm2が好ましい。The film thus formed is irradiated with linearly polarized light and post-baked to obtain a single layer coating type horizontally oriented film.
As a method of irradiating linearly polarized light, ultraviolet to visible light having a wavelength of 150 to 450 nm is generally used, and irradiation is performed by irradiating linearly polarized light at room temperature or in a heated state. The irradiation dose varies depending on the light used, but is preferably about 100 to 2,000 mJ / cm 2 .
また、ポストベークは、ホットプレート又はオーブン等で加熱すればよく、その温度及び時間は、好ましくは90〜150℃、2〜20分間であり、より好ましくは95〜120℃、5〜20分間である。 Also, post-baking may be carried out by heating on a hot plate or an oven, and the temperature and time thereof are preferably 90 to 150 ° C. for 2 to 20 minutes, more preferably 95 to 120 ° C. for 5 to 20 minutes is there.
本発明の単層塗布型水平配向フィルムの膜厚は、使用する基板の段差や光学的、電気的性質を考慮し適宜選択することができ、例えば、0.1〜3μmが好適である。 The film thickness of the single layer coating type horizontal alignment film of the present invention can be appropriately selected in consideration of the level difference of the substrate to be used, the optical property and the electrical property, and preferably 0.1 to 3 μm, for example.
このようにして得られた本発明の単層塗布型水平配向フィルムは、表示装置や記録材料等の用途に好適な光学特性を有する材料であり、特に、液晶ディスプレイ用の偏光板及び位相差板等の光学補償フィルムとして好適である。 The single-layer coating type horizontal alignment film of the present invention thus obtained is a material having optical properties suitable for applications such as display devices and recording materials, and in particular, a polarizing plate and a retardation plate for liquid crystal displays. Etc. are suitable as an optical compensation film.
以下、合成例、実施例及び比較例を挙げて本発明をより具体的に説明するが、本発明は下記の実施例に限定されない。なお、実施例における各物性の測定方法及び測定条件は、以下のとおりである。
[1]1H−NMR
化合物を重水素化クロロホルム(CDCl3)に溶解し、核磁気共鳴装置(300MHz、ジオール社製)を用いて1H−NMRを測定した。
[2]平均分子量測定
昭和電工(株)製Shodex GPC−101(溶媒:テトラヒドロフラン、検量線:標準ポリスチレン)を用いて、数平均分子量(Mn)、重量平均分子量(Mw)を測定した。
[3]ヘイズ値
(有)東京電色製Spectral Haze Meter(TC-1800H)を用いてフィルムのヘイズ値を測定した。
[4]フィルムのリタデーション値(Δnd)
リタデーション測定装置(RETS−100、大塚電子(株)製)を用いて波長550nmのΔndを測定した。
[5]偏光顕微鏡観察
(株)ニコン製の偏光顕微鏡E600−Polを用いて観察を行った。Hereinafter, the present invention will be more specifically described by way of synthesis examples, examples and comparative examples, but the present invention is not limited to the following examples. In addition, the measuring method and measuring conditions of each physical property in an Example are as follows.
[1] 1 H-NMR
The compound was dissolved in deuterated chloroform (CDCl 3 ), and 1 H-NMR was measured using a nuclear magnetic resonance apparatus (300 MHz, manufactured by Diol Co., Ltd.).
[2] Measurement of Average Molecular Weight A number average molecular weight (Mn) and a weight average molecular weight (Mw) were measured using Shodex GPC-101 (solvent: tetrahydrofuran, calibration curve: standard polystyrene) manufactured by Showa Denko KK.
[3] Haze Value The haze value of the film was measured using Spectral Haze Meter (TC-1800H) manufactured by Tokyo Denshoku Co., Ltd.
[4] Retardation value of film (Δnd)
(DELTA) nd of wavelength 550nm was measured using the retardation measurement apparatus (RETS-100, Otsuka Electronics Co., Ltd. product).
[5] Polarized light microscope observation It observed using polarized light microscope E600-Pol made from Nikon Corporation.
[合成例1]重合性化合物(M1)の合成
[1]中間体化合物(A1)の合成
冷却管付き200mLナスフラスコに、4−ヒドロキシ安息香酸メチル7.61g(50.0mmol)、6−ブロモ−1−ヘキサノール9.1g(50.0mmol)、炭酸カリウム13.8g(100mmol)、及びアセトン70mLを加えて混合物とし、64℃で24時間攪拌しながら反応させた。反応終了後、減圧下で反応液から溶媒を留去し、黄色の湿潤固体を得た。この固体を、シリカゲルカラムクロマトグラフィ(カラム:シリカゲル60、0.063−0.200mm、メルク社製、溶出液:へキサン/酢酸エチル=1/1)により精製した。得られた溶液から溶媒を留去し、白色の固体11.3gを得た。この固体を1H−NMRで測定した結果を以下に示す。この結果から、この白色固体が目的の中間体化合物(A1)であることが確認された(収率90%)。
1H-NMR (CDCl3) δ:1.3-1.7(m, 8H), 3.67(m, 2H), 3.88(s, 3H), 4.03(t, 2H), 6.91(d, 2H), 7.99(d, 2H).In a 200 mL recovery flask with a condenser, 7.61 g (50.0 mmol) of methyl 4-hydroxybenzoate, 9.1 g (50.0 mmol) of 6-bromo-1-hexanol, 13.8 g (100 mmol) of potassium carbonate, and acetone 70 mL was added to make a mixture, and reacted while stirring at 64 ° C. for 24 hours. After completion of the reaction, the solvent was distilled off from the reaction liquid under reduced pressure to obtain a yellow wet solid. The solid was purified by silica gel column chromatography (column: silica gel 60, 0.063 to 0.200 mm, manufactured by Merck, eluent: hexane / ethyl acetate = 1/1). The solvent was distilled off from the resulting solution to obtain 11.3 g of a white solid. The results of measuring this solid by 1 H-NMR are shown below. From this result, it was confirmed that this white solid is the target intermediate compound (A1) (yield 90%).
1 H-NMR (CDCl 3 ) δ: 1.3 to 1.7 (m, 8 H), 3.67 (m, 2 H), 3. 88 (s, 3 H), 4.03 (t, 2 H), 6. 91 (d, 2 H), 7.99 (d , 2H).
[2]中間体化合物(B1)の合成
次に、冷却管付き100mL三口フラスコに、PCC2.2g(10.0mmol)及びジクロロメタン15.0mLを入れて攪拌混合した状態で、中間体化合物(A1)2.5g(10.0mmol)をジクロロメタン15.0mLに溶解した溶液を滴下し、室温で6時間更に攪拌した。その後、フラスコの壁に付着したオイル状物を除いた溶液に、ジエチルエーテル90mLを加えて減圧ろ過した後、減圧下で溶媒を留去して、濃緑色の湿潤な固体を得た。
この固体をシリカゲルカラムクロマトグラフィ(カラム:シリカゲル60、0.063−0.200mm、メルク社製、溶出液:ヘキサン/酢酸エチル=2/1)で精製した。得られた溶液から溶媒を留去して、無色の固体1.3gを得た。この固体を1H−NMRで測定した結果を以下に示す。この結果から、この無色の固体が目的の中間体化合物(B1)であることが確認された(収率50%)。
1H-NMR (CDCl3) δ:1.3-1.8(m, 6H), 2.49(t, 2H), 3.88(s, 3H), 3.99(t, 2H), 6.87(d, 2H), 7.99(d, 2H), 9.78(s, 1H).Next, 2.2 g (10.0 mmol) of PCC and 15.0 mL of dichloromethane are placed in a 100 mL three-necked flask with a condenser, and while stirring and mixing, 2.5 g (10.0 mmol) of the intermediate compound (A1) in dichloromethane 15 The solution dissolved in .0 mL was added dropwise and further stirred at room temperature for 6 hours. Thereafter, 90 mL of diethyl ether was added to a solution from which oil attached to the wall of the flask was removed, followed by filtration under reduced pressure, and then the solvent was distilled off under reduced pressure to obtain a dark green wet solid.
The solid was purified by silica gel column chromatography (column: silica gel 60, 0.063 to 0.200 mm, manufactured by Merck, eluent: hexane / ethyl acetate = 2/1). The solvent was distilled off from the resulting solution to obtain 1.3 g of a colorless solid. The results of measuring this solid by 1 H-NMR are shown below. From this result, it was confirmed that this colorless solid is the target intermediate compound (B1) (yield 50%).
1 H-NMR (CDCl 3 ) δ: 1.3-1.8 (m, 6 H), 2. 49 (t, 2 H), 3. 88 (s, 3 H), 3.99 (t, 2 H), 6. 87 (d, 2 H), 7.99 (d , 2H), 9.78 (s, 1 H).
[3]中間体化合物(C1)の合成
次に、冷却管付き50mLナスフラスコに、中間体化合物(B1)1.25g(5.0mmol)、2−(ブロモメチル)アクリル酸0.83g(5.0mmol)、Amberlyst(登録商標)15(ロームアンドハース社製)0.8g、THF8.0mL、塩化スズ(II)0.95g(5.0mmol)、及び純水2.0mLを加えて混合物とし、70℃で5時間攪拌して反応させた。反応終了後、反応液を減圧ろ過して純水40mLと混合し、そこにジエチルエーテル50mLを加えて抽出した。抽出は3回行った。
抽出後の有機層に、無水硫酸マグネシウムを加えて乾燥し、減圧ろ過した後の溶液から溶媒を留去し、無色固体1.5gを得た。この固体を1H−NMRで測定した結果を以下に示す。この結果から、この無色固体が目的の中間体化合物(C1)であることが確認された(収率94%)。
1H-NMR (DMSO-d6) δ:1.3-1.8(m, 8H), 2.62(m, 1H), 3.04(s, 1H), 3.81(s, 3H), 4.05(t, 2H), 4.54(m, 1H), 5.70(s, 1H), 6.01(s, 1H), 7.03(d, 2H), 7.89(d, 2H).Next, in a 50 mL recovery flask equipped with a condenser, 1.25 g (5.0 mmol) of the intermediate compound (B1), 0.83 g (5.0 mmol) of 2- (bromomethyl) acrylic acid, Amberlyst (registered trademark) 15 (Rome 0.8g, THF 8.0 mL, 0.95 g (5.0 mmol) of tin (II) chloride, and 2.0 mL of pure water were added to make a mixture, and the mixture was reacted by stirring at 70 ° C. for 5 hours. . After completion of the reaction, the reaction solution was filtered under reduced pressure, mixed with 40 mL of pure water, and extracted with 50 mL of diethyl ether added thereto. Extraction was performed three times.
Anhydrous magnesium sulfate was added to the organic layer after extraction, it dried, the solvent was distilled off from the solution after filtering under reduced pressure, and 1.5 g of colorless solid was obtained. The results of measuring this solid by 1 H-NMR are shown below. From this result, it was confirmed that this colorless solid is the target intermediate compound (C1) (yield: 94%).
1 H-NMR (DMSO-d6) δ: 1.3 to 1.8 (m, 8 H), 2.62 (m, 1 H), 3.04 (s, 1 H), 3.81 (s, 3 H), 4.05 (t, 2 H), 4.54 ( m, 1 H), 5.70 (s, 1 H), 6.01 (s, 1 H), 7.03 (d, 2 H), 7. 89 (d, 2 H).
[4]中間体化合物(D1)の合成
冷却管付き100mLナスフラスコに、エタノール35mL、中間体化合物(C1)1.5g(4.7mmol)、及び10質量%水酸化ナトリウム水溶液5mLを加えて混合物とし、85℃で3時間攪拌しながら反応させた。反応終了後、500mLのビーカーに水300mLと反応液とを加えて、30分間室温で攪拌した後、10質量%HCl水溶液5mLを滴下した後、ろ過して白色固体1.3gを得た。
次に、冷却管付き50mLナスフラスコに、得られた白色固体1.1g、Amberlyst(登録商標)15(ロームアンドハース社製)1.0g、及びテトラヒドロフラン20.0mLを加えて混合物とし、70℃で5時間攪拌して反応させた。反応終了後、反応液を減圧ろ過した後の溶液から溶媒を留去し黄色固体を得た。この黄色固体を再結晶(ヘキサン/酢酸エチル=1/1)で精製した後、白色固体0.9gを得た。この固体を1H−NMRで測定した結果を以下に示す。この結果から、この白色固体が目的の中間体化合物(D1)であることが確認された(収率71%)。
1H-NMR (DMSO-d6) δ:1.2-1.8(m, 8H), 2.60(m, 1H), 3.09(m, 1H), 4.04(m, 2H), 4.55(m, 1H), 5.69(s, 1H), 6.02(s, 1H), 6.99(d, 2H), 7.88(d, 2H), 12.5(s, broad, 1H).35 mL of ethanol, 1.5 g (4.7 mmol) of an intermediate compound (C1), and 5 mL of a 10% by mass aqueous solution of sodium hydroxide are added to a 100 mL eggplant flask with a condenser to form a mixture, and the mixture is reacted at 85 ° C. for 3 hours I did. After completion of the reaction, 300 mL of water and the reaction solution were added to a 500 mL beaker and stirred at room temperature for 30 minutes, then 5 mL of 10% by mass aqueous HCl solution was added dropwise and filtered to obtain 1.3 g of a white solid.
Next, 1.1 g of the obtained white solid, 1.0 g of Amberlyst (registered trademark) 15 (manufactured by Rohm and Haas Co., Ltd.), and 20.0 mL of tetrahydrofuran are added to a 50 mL eggplant flask with a condenser to obtain a mixture at 70 ° C. The reaction was allowed to stir for 5 hours. After completion of the reaction, the reaction solution was filtered under reduced pressure and the solvent was distilled off from the solution to obtain a yellow solid. The yellow solid was purified by recrystallization (hexane / ethyl acetate = 1/1) to obtain 0.9 g of a white solid. The results of measuring this solid by 1 H-NMR are shown below. From this result, it was confirmed that this white solid is the target intermediate compound (D1) (yield 71%).
1 H-NMR (DMSO-d6) δ: 1.2-1.8 (m, 8 H), 2.60 (m, 1 H), 3.09 (m, 1 H), 4.04 (m, 2 H), 4.55 (m, 1 H), 5.69 ( s, 1 H), 6.02 (s, 1 H), 6.99 (d, 2 H), 7. 88 (d, 2 H), 12.5 (s, broad, 1 H).
[5]重合性化合物(M1)の合成
中間体化合物(D1)3.0g(10.0mmol)、メチル4−ヒドロキシシナメート1.8g(10.0mmol)、DMAP0.05g、及び少量のブチルヒドロキシトルエン(BHT)を室温にて攪拌下、ジクロロメタン45mLに懸濁させ、そこにDCC2.7g(13.0mmol)をジクロロメタン15mLに溶解させた溶液を加えて終夜攪拌した。析出したDCCウレアをろ別し、そのろ液を0.5mol/L塩酸50mL、飽和炭酸水素ナトリウム水溶液50mL、飽和食塩水100mLにて順次2回ずつ洗浄し、硫酸マグネシウムで乾燥後、減圧下で溶媒を留去して、黄色固体を得た。この固体をエタノールによる再結晶で精製した。目的の重合性化合物(M1)2.6gを得た(収率56%)。1H−NMRの測定結果を以下に示す。
1H-NMR (CDCl3) δ:1.40-1.90(m, 8H), 2.58(m, 1H), 3.08(m, 1H), 3.80(s, 3H), 4.05(t, 2H), 4.55(m, 1H), 5.64(s, 1H), 6.22(s, 1H), 6.42(d, 1H), 6.97(d, 2H), 7.22(d, 2H), 7.60(d, 2H), 7.70(d, 1H), 8.15(d, 2H).Under stirring at room temperature, 3.0 g (10.0 mmol) of intermediate compound (D1), 1.8 g (10.0 mmol) of methyl 4-hydroxycinamate, 0.05 g of DMAP, and a small amount of butylhydroxytoluene (BHT) The solution was suspended in 45 mL of dichloromethane, and a solution of 2.7 g (13.0 mmol) of DCC dissolved in 15 mL of dichloromethane was added thereto and stirred overnight. The precipitated DCC urea is filtered off, and the filtrate is washed successively twice with 50 mL of 0.5 mol / L hydrochloric acid, 50 mL of saturated aqueous sodium hydrogen carbonate solution and 100 mL of saturated brine, dried over magnesium sulfate, and then dried under reduced pressure. The solvent was evaporated to give a yellow solid. The solid was purified by recrystallization from ethanol. 2.6g of target polymeric compounds (M1) were obtained (yield 56%). The measurement results of 1 H-NMR are shown below.
1 H-NMR (CDCl 3 ) δ: 1.40-1.90 (m, 8 H), 2.58 (m, 1 H), 3.08 (m, 1 H), 3.80 (s, 3 H), 4.05 (t, 2 H), 4.55 (m , 1H), 5.64 (s, 1H), 6.22 (s, 1H), 6.42 (d, 1H), 6.97 (d, 2H), 7.22 (d, 2H), 7.60 (d, 2H), 7.70 (d, 1H), 8.15 (d, 2H).
[合成例2]重合性化合物(M2)の合成
[1]中間体化合物(A2)の合成
冷却管付き100mLナスフラスコに、4−シアノ−4'−ヒドロキシビフェニル5.0g(25.6mmol)、6−ブロモ−1−ヘキサノール4.6g(25.6mmol)、炭酸カリウム7.0g(50mmol)、及びアセトン50mLを加えて混合物とし、64℃で24時間攪拌しながら反応させた。反応終了後、減圧下で溶媒を留去し、黄色の湿潤固体を得た。その後、この固体と水70mLを混合し、ジエチルエーテル50mLを加えて抽出した。抽出は3回行った。
分液した有機層は、無水硫酸マグネシウムを加えて乾燥し、ろ過した後に減圧下で溶媒を留去し、黄色の固体を得た。この固体を酢酸エチル3mLに溶解し、シリカゲルカラムクロマトグラフィ(カラム:シリカゲル60、0.063−0.200mm、メルク社製、溶出液:へキサン/酢酸エチル=1/1)により精製した。得られた溶液から溶媒を留去し、白色の固体6.9gを得た。この固体を1H−NMRで測定した結果を以下に示す。この結果から、この白色固体が目的の中間体化合物(A2)であることが確認された(収率91%)。
1H-NMR(DMSO-d6) δ:1.26(m, 6H), 1.69(m, 2H), 3.37(t, 2H), 4.03(t, 2H), 7.06(d, 2H), 7.69(d, 2H), 7.85(m, 4H).In a 100 mL recovery type flask equipped with a condenser, 5.0 g (25.6 mmol) of 4-cyano-4'-hydroxybiphenyl, 4.6 g (25.6 mmol) of 6-bromo-1-hexanol, 7.0 g (50 mmol) of potassium carbonate And 50 mL of acetone were added to make a mixture, and reacted while stirring at 64 ° C. for 24 hours. After completion of the reaction, the solvent was evaporated under reduced pressure to obtain a yellow wet solid. Thereafter, the solid and 70 mL of water were mixed, and extracted by adding 50 mL of diethyl ether. Extraction was performed three times.
The separated organic layer was dried over anhydrous magnesium sulfate, filtered, and the solvent was evaporated under reduced pressure to give a yellow solid. The solid was dissolved in 3 mL of ethyl acetate and purified by silica gel column chromatography (column: silica gel 60, 0.063 to 0.200 mm, manufactured by Merck, eluent: hexane / ethyl acetate = 1/1). The solvent was distilled off from the resulting solution to obtain 6.9 g of a white solid. The results of measuring this solid by 1 H-NMR are shown below. From this result, it was confirmed that this white solid is the target intermediate compound (A2) (yield 91%).
1 H-NMR (DMSO-d6) δ: 1.26 (m, 6H), 1.69 (m, 2H), 3.37 (t, 2H), 4.03 (t, 2H), 7.06 (d, 2H), 7.69 (d, 2H), 7.85 (m, 4H).
[2]重合性化合物(M2)の合成
中間体化合物(A2)3.0g(10.2mmol)を、トリエチルアミン1.5mLと少量のBHTと共にTHF10mLに溶解させて室温にて攪拌し、水浴による冷却下、THF10mLに溶解した0.9mLの塩化アクリロイルを15分間かけて滴下した。滴下後、反応溶液を30分間攪拌し、水浴を除去して室温に戻しながら終夜攪拌を続けて析出したトリエチルアミン塩酸塩をろ過した。得られたろ液からTHFを約3/4留去してジクロロメタン50mLを添加し、その有機層を飽和炭酸水素ナトリウム水溶液50mL、0.5mol/L塩酸50mL、飽和食塩水50mLにて順次洗浄し、硫酸マグネシウムで乾燥後、溶媒を留去して生成物を得た。メタノールによる再結晶後、目的の重合性化合物(M2)1.7gを得た。1H−NMRの測定結果を以下に示す。
1H-NMR(CDCl3) δ:1.50(m, 4H), 1.73(m, 2H), 1.85(m, 2H), 4.05(t, 2H), 4.20(t, 2H), 5.82(d, 1H), 6.15(m, 1H), 6.41(d, 1H), 6.99(d, 2H), 7.55(d, 2H), 7.66(m, 4H).Intermediate compound (A2) 3.0 g (10.2 mmol) was dissolved in 10 mL of THF with 1.5 mL of triethylamine and a small amount of BHT, stirred at room temperature, 0.9 mL of chloride dissolved in 10 mL of THF under cooling by a water bath Acryloyl was added dropwise over 15 minutes. After the dropwise addition, the reaction solution was stirred for 30 minutes, stirred overnight while removing the water bath and returning to room temperature, and the precipitated triethylamine hydrochloride was filtered. About 3/4 of THF is distilled off from the obtained filtrate, 50 mL of dichloromethane is added, and the organic layer is washed successively with 50 mL of saturated aqueous sodium hydrogen carbonate solution, 50 mL of 0.5 mol / L hydrochloric acid and 50 mL of saturated brine. After drying over magnesium sulfate, the solvent was distilled off to obtain the product. After recrystallization from methanol, 1.7 g of the target polymerizable compound (M2) was obtained. The measurement results of 1 H-NMR are shown below.
1 H-NMR (CDCl 3 ) δ: 1.50 (m, 4H), 1.73 (m, 2H), 1.85 (m, 2H), 4.05 (t, 2H), 4.20 (t, 2H), 5.82 (d, 1H) 6.15 (m, 1 H), 6.41 (d, 1 H), 6.99 (d, 2 H), 7.55 (d, 2 H), 7. 66 (m, 4 H).
[合成例3]重合性化合物(M3)の合成
合成例1で得られた中間体化合物(D1)0.6g(2.0mmol)、4−ヒドロキシビフェニル0.3g(2.0mmol)、DMAP0.008g、及び少量のBHTを室温にて攪拌下、ジクロロメタン10mLに懸濁させ、そこにジクロロメタン5mLにDCC0.5g(2.5mmol)を溶解させた溶液を加えて終夜攪拌した。析出したDCCウレアをろ別し、そのろ液を0.5mol/L塩酸50mL、飽和炭酸水素ナトリウム水溶液50mL、飽和食塩水50mLにて順次2回ずつ洗浄し、硫酸マグネシウムで乾燥後、溶媒を留去し、エタノールによる再結晶で精製し、目的の重合性化合物(M3)0.6gを得た(収率62%)。1H−NMRの測定結果を以下に示す。
1H-NMR (CDCl3) δ:1.56(m, 4H), 1.75(m, 2H), 1.85(m, 2H), 2.61(m, 1H), 3.07(m, 1H), 4.06(t, 2H), 4.54(m, 1H), 5.63(d, 1H), 6.24(d, 1H), 6.97(d, 2H), 7.29(d, 2H), 7.35(m, 1H), 7.45(m, 2H), 7.62(m, 4H), 8.17(d, 2H).Under stirring at room temperature, 0.6 g (2.0 mmol) of the intermediate compound (D1) obtained in Synthesis Example 1, 0.3 g (2.0 mmol) of 4-hydroxybiphenyl, 0.008 g of DMAP, and a small amount of BHT. The solution was suspended in 10 mL of dichloromethane, and a solution of 0.5 g (2.5 mmol) of DCC dissolved in 5 mL of dichloromethane was added thereto and stirred overnight. The precipitated DCC urea is filtered off, and the filtrate is washed successively twice with 50 mL of 0.5 mol / L hydrochloric acid, 50 mL of saturated aqueous sodium hydrogencarbonate solution and 50 mL of saturated brine, dried over magnesium sulfate, and the solvent is distilled off. It was removed and purified by recrystallization with ethanol to obtain 0.6 g of the objective polymerizable compound (M3) (yield 62%). The measurement results of 1 H-NMR are shown below.
1 H-NMR (CDCl 3 ) δ: 1.56 (m, 4 H), 1.75 (m, 2 H), 1. 85 (m, 2 H), 2.61 (m, 1 H), 3.07 (m, 1 H), 4.06 (t, 2 H) ), 4.54 (m, 1 H), 5.63 (d, 1 H), 6. 24 (d, 1 H), 6. 97 (d, 2 H), 7. 29 (d, 2 H), 7. 35 (m, 1 H), 7. 45 (m, 2 H) , 7.62 (m, 4H), 8.17 (d, 2H).
[合成例4]重合性化合物(M4)の合成
4−(6−アクリロイルオキシ−1−ヘキシルオキシ)安息香酸(SYNTHON Chemicals社製)29.2g(100mmol)、4−ヒドロキシビフェニル17.0g(100mmol)、DMAP0.6g、及び少量のBHTを室温にて攪拌下、ジクロロメタン200mLに懸濁させ、そこにジクロロメタン100mLにDCC24.0g(116mmol)を溶解させた溶液を加えて終夜攪拌した。析出したDCCウレアをろ別し、そのろ液を0.5mol/L塩酸150mL、飽和炭酸水素ナトリウム水溶液150mL、飽和食塩水150mLにて順次2回ずつ洗浄し、硫酸マグネシウムで乾燥後、溶媒を留去し、エタノールによる再結晶で精製し、目的の重合性化合物(M4)39.6gを得た(収率89%)。1H−NMRの測定結果を以下に示す。
1H-NMR (CDCl3) δ: 1.57(m, 4H), 1.70(m, 2H), 1.86(m, 2H), 4.00(m, 2H), 4.19(m, 2H), 5.82(m, 1H), 6.12(m, 1H), 6.39(m, 1H), 6.97(d, 2H), 7.29(m, 2H), 7.36(m, 1H), 7.47(m, 2H), 7.62(m, 4H), 8.18(m, 2H)29.2 g (100 mmol) of 4- (6-acryloyloxy-1-hexyloxy) benzoic acid (SYNTHON Chemicals), 17.0 g (100 mmol) of 4-hydroxybiphenyl, 0.6 g of DMAP, and a small amount of BHT at room temperature Under stirring, the solution was suspended in 200 mL of dichloromethane, and a solution of 24.0 g (116 mmol) of DCC dissolved in 100 mL of dichloromethane was added thereto and stirred overnight. The precipitated DCC urea is filtered off, and the filtrate is washed successively twice with 150 mL of 0.5 mol / L hydrochloric acid, 150 mL of saturated aqueous sodium hydrogen carbonate solution and 150 mL of saturated brine, dried over magnesium sulfate, and the solvent is distilled off. It was removed and purified by recrystallization with ethanol to obtain 39.6 g of the target polymerizable compound (M4) (yield 89%). The measurement results of 1 H-NMR are shown below.
1 H-NMR (CDCl 3 ) δ: 1.57 (m, 4H), 1.70 (m, 2H), 1.86 (m, 2H), 4.00 (m, 2H), 4.19 (m, 2H), 5.82 (m, 1H) ), 6.12 (m, 1 H), 6. 39 (m, 1 H), 6. 97 (d, 2 H), 7. 29 (m, 2 H), 7. 36 (m, 1 H), 7. 47 (m, 2 H), 7.62 (m, 4 H) , 8.18 (m, 2H)
[合成例5]重合性化合物(M5)の合成
4−(6−アクリロイルオキシ−1−ヘキシル)安息香酸(SYNTHON Chemicals社製)2.9g(10mmol)、メチル4−ヒドロキシシナメート1.8g(10mmol)、DMAP0.06g、及び少量のBHTを室温にて攪拌下、ジクロロメタン30mLに懸濁させ、そこにDCC2.4g(12mmol)をジクロロメタン10mLに溶解させた溶液を加えて終夜攪拌した。析出したDCCウレアをろ別し、そのろ液を、0.5mol/L塩酸20mL、飽和炭酸水素ナトリウム水溶液20mL、飽和食塩水30mLにて順次2回ずつ洗浄し、硫酸マグネシウムで乾燥後、減圧下で溶媒を留去して、黄色固体を得た。この固体をエタノールによる再結晶で精製した。目的の重合性化合物(M5)3.4gを得た(収率72%)。1H−NMRの測定結果を以下に示す。
1H-NMR (CDCl3) δ: 1.56(m, 4H), 1.76(m, 2H), 1.86(m, 2H), 3.81(s, 3H), 4.04(m, 2H), 4.19(m, 2H), 5.84(d, 1H), 6.14(m, 1H), 6.40(m, 1H), 6.97(d, 2H), 7.22(m, 3H), 7.57(d, 2H), 7.70(d, 1H), 8.17(d, 2H).2.9 g (10 mmol) of 4- (6-acryloyloxy-1-hexyl) benzoic acid (manufactured by SYNTHON Chemicals), 1.8 g (10 mmol) of methyl 4-hydroxycinamate, 0.06 g of DMAP, and a small amount of BHT at room temperature Under stirring, the reaction solution was suspended in 30 mL of dichloromethane, and a solution of 2.4 g (12 mmol) of DCC dissolved in 10 mL of dichloromethane was added thereto and stirred overnight. The precipitated DCC urea was filtered off, and the filtrate was washed successively twice with 0.5 mol /
1 H-NMR (CDCl 3 ) δ: 1.56 (m, 4 H), 1. 76 (m, 2 H), 1. 86 (m, 2 H), 3.81 (s, 3 H), 4.04 (m, 2 H), 4.19 (m, 2 H) ), 5.84 (d, 1 H), 6.14 (m, 1 H), 6. 40 (m, 1 H), 6. 97 (d, 2 H), 7.22 (m, 3 H), 7.57 (d, 2 H), 7. 70 (d, 1 H) , 8.17 (d, 2H).
[合成例6]重合体(1)の合成
冷却管を備えたフラスコに、合成例1で得られた重合性化合物(M1)0.98g(2.1mmol)、合成例2で得られた重合性化合物(M2)1.7g(4.9mmol)、NMP24g、及びAIBN57mgを仕込み、フラスコ内を窒素置換した後、60℃で20時間攪拌して反応した。得られた反応溶液を300mLのメタノールに投入し、白色粉末を沈殿した。この白色粉末をろ過した後、室温で真空乾燥を行い、重合体(1)を2.6g得た(収率96%)。
得られた重合体(1)のMnは20,643、Mwは64,612であった(Mw/Mn=3.13)。In a flask equipped with a condenser, 0.98 g (2.1 mmol) of the polymerizable compound (M1) obtained in Synthesis Example 1 and 1.7 g (4.9 mmol) of the polymerizable compound (M2) obtained in Synthesis Example 2 ), NMP 24 g, and AIBN 57 mg were charged, and the inside of the flask was purged with nitrogen, and then reacted by stirring at 60 ° C. for 20 hours. The resulting reaction solution was poured into 300 mL of methanol to precipitate a white powder. The white powder was filtered and vacuum dried at room temperature to obtain 2.6 g of a polymer (1) (yield: 96%).
Mn of the obtained polymer (1) was 20,643 and Mw was 64,612 (Mw / Mn = 3.13).
[合成例7]重合体(2)の合成
冷却管を備えたフラスコに、合成例1で得られた重合性化合物(M1)0.40g(0.9mmol)、合成例3で得られた重合性化合物(M3)0.91g(2.0mmol)、NMP11.8g、及びAIBN25mgを仕込み、フラスコ内を窒素置換した後、60℃で20時間攪拌して反応した。得られた反応溶液を300mLのメタノールに投入し、白色粉末を沈殿した。この白色粉末をろ過した後、室温で真空乾燥を行い、重合体(2)を0.95g得た(収率73%)。
得られた重合体(1)のMnは23,432、Mwは52,956であった(Mw/Mn=2.26)。In a flask equipped with a condenser, 0.40 g (0.9 mmol) of the polymerizable compound (M1) obtained in Synthesis Example 1 and 0.91 g (2.0 mmol) of the polymerizable compound (M3) obtained in Synthesis Example 3 ), NMP 11.8 g, and AIBN 25 mg were charged, and the inside of the flask was purged with nitrogen, and then reacted by stirring at 60 ° C. for 20 hours. The resulting reaction solution was poured into 300 mL of methanol to precipitate a white powder. The white powder was filtered and vacuum dried at room temperature to obtain 0.95 g of a polymer (2) (yield: 73%).
Mn of the obtained polymer (1) was 23,432, Mw was 52,956 (Mw / Mn = 2.26).
[合成例8]重合体(3)の合成
冷却管を備えたフラスコに、合成例1で得られた重合性化合物(M1)0.20g(0.4mmol)、合成例4で得られた重合性化合物(M4)0.44g(1.0mmol)、NMP5.8g、及びAIBN12mgを仕込み、フラスコ内を窒素置換した後、60℃で20時間攪拌して反応した。得られた反応溶液を200mLのメタノールに投入し、白色粉末を沈殿した。この白色粉末をろ過した後、室温で真空乾燥を行い、重合体(3)を0.5g得た(収率78%)。
得られた重合体(1)のMnは15,877、Mwは51,759であった(Mw/Mn=3.26)。In a flask equipped with a condenser, 0.20 g (0.4 mmol) of the polymerizable compound (M1) obtained in Synthesis Example 1 and 0.44 g (1.0 mmol) of the polymerizable compound (M4) obtained in Synthesis Example 4 ), NMP 5.8 g, and AIBN 12 mg were charged, and the inside of the flask was purged with nitrogen and then reacted by stirring at 60 ° C. for 20 hours. The resulting reaction solution was poured into 200 mL of methanol to precipitate a white powder. The white powder was filtered and vacuum dried at room temperature to obtain 0.5 g of a polymer (3) (yield: 78%).
Mn of the obtained polymer (1) was 15,877, and Mw was 51,759 (Mw / Mn = 3.26).
[合成例9]重合体(4)の合成
冷却管を備えたフラスコに、合成例5で得られた重合性化合物(M5)0.54g(1.2mmol)、合成例4で得られた重合性化合物(M4)1.3g(2.8mmol)、NMP16g、及びAIBN34mgを仕込み、フラスコ内を窒素置換した後、60℃で20時間攪拌して反応した。得られた反応溶液を300mLのメタノールに投入し、白色粉末を沈殿した。この白色粉末をろ過した後、室温で真空乾燥を行い、重合体(4)を1.6g得た(収率89%)。
得られた重合体(1)のMnは12,678、Mwは22,313であった(Mw/Mn=1.76)。In a flask equipped with a condenser, 0.54 g (1.2 mmol) of the polymerizable compound (M5) obtained in Synthesis Example 5 and 1.3 g (2.8 mmol) of the polymerizable compound (M4) obtained in Synthesis Example 4 ), NMP 16 g, and AIBN 34 mg were charged, and the inside of the flask was replaced with nitrogen and then reacted by stirring at 60 ° C. for 20 hours. The resulting reaction solution was poured into 300 mL of methanol to precipitate a white powder. The white powder was filtered and vacuum dried at room temperature to obtain 1.6 g of a polymer (4) (yield 89%).
Mn of the obtained polymer (1) was 12,678, Mw was 22,313 (Mw / Mn = 1.76).
[膜形成用組成物の調製及びフィルム作製・評価]
上記合成例で得られた重合体を用いて膜形成用組成物を調製し、下記条件にしたがってフィルムを作製し、その特性を検討した。
フィルム作製条件:
スピンコート:300rpm/5sec、500−1000rpm/20sec
プリベーク:50℃/30sec(ホットプレート)
露光:直線偏光紫外線、垂直照射、照射線量1,000mJ/cm2(波長313nm)
ポストベーク:100℃又は120℃/20分(ホットプレート)[Preparation of film-forming composition and film preparation / evaluation]
The composition for film formation was prepared using the polymer obtained by the said synthesis example, the film was produced according to the following conditions, and the characteristic was examined.
Film preparation conditions:
Spin coating: 300rpm / 5sec, 500-1000rpm / 20sec
Prebaking: 50 ° C / 30 sec (hot plate)
Exposure: linear polarized ultraviolet light, vertical irradiation, irradiation dose 1,000 mJ / cm 2 (wavelength 313 nm)
Post bake: 100 ° C or 120 ° C / 20 minutes (hot plate)
[実施例1]
重合体(1)150mg及びR−30(DIC(株)製界面活性剤、以下同じ。)0.3mgをシクロヘキサノン850mgに溶解し、重合体(1)の溶液を得た。
この溶液を、ガラス基板にスピンコートにより塗布し、プリベークした後、室温まで放冷した。このとき、基板上に得られた膜は透明であった。
次に、ガラス基板に形成された塗膜を露光した後、ポストベークした。得られたフィルムは、膜厚は1.4μmであり、偏光顕微鏡でそれを観察したところ、フィルムが基板面に対して水平配向していることを確認した。そして、そのΔndは43nmであり、ヘイズ値は0.3%であった。図1に、上記フィルムのΔndの角度依存性を示す。Example 1
A solution of polymer (1) was obtained by dissolving 150 mg of polymer (1) and 0.3 mg of R-30 (surfactant manufactured by DIC Corporation, hereinafter the same) in 850 mg of cyclohexanone.
This solution was applied to a glass substrate by spin coating, prebaked, and allowed to cool to room temperature. At this time, the film obtained on the substrate was transparent.
Next, the coated film formed on the glass substrate was exposed and then post-baked. The obtained film had a thickness of 1.4 μm, and when observed with a polarization microscope, it was confirmed that the film was horizontally oriented with respect to the substrate surface. And, the Δnd was 43 nm and the haze value was 0.3%. FIG. 1 shows the angular dependence of Δnd of the above-mentioned film.
[実施例2]
重合体(2)150mg及びR−30 0.3mgをシクロヘキサノン850mgに溶解し、重合体(2)の溶液を得た。
この溶液を、ガラス基板にスピンコートにより塗布し、プリベークした後、室温まで放冷した。このとき、基板上の得られた膜は透明であった。
次に、ガラス基板に形成された塗膜を露光した後、ポストベークした。得られたフィルムは、膜厚は1.6μmであり、偏光顕微鏡でそれを観察したところ、フィルムが基板面に対して水平配向していることを確認した。そして、そのΔndは53nmであり、ヘイズ値は0.0%であった。図2に上記フィルムのΔndの角度依存性を示す。Example 2
150 mg of polymer (2) and 0.3 mg of R-30 were dissolved in 850 mg of cyclohexanone to obtain a solution of polymer (2).
This solution was applied to a glass substrate by spin coating, prebaked, and allowed to cool to room temperature. At this time, the obtained film on the substrate was transparent.
Next, the coated film formed on the glass substrate was exposed and then post-baked. The obtained film had a thickness of 1.6 μm, and when observed with a polarization microscope, it was confirmed that the film was horizontally oriented with respect to the substrate surface. And, the Δnd was 53 nm, and the haze value was 0.0%. FIG. 2 shows the angular dependence of Δnd of the above-mentioned film.
[実施例3]
重合体(3)150mg及びR−30 0.3mgをシクロヘキサノン850mgに溶解し、重合体(3)の溶液を得た。
この溶液を、ガラス基板にスピンコートにより塗布し、プリベークした後、室温まで放冷した。このとき、基板上の得られた膜は透明であった。
次に、ガラス基板に形成された塗膜を露光した後、ポストベークした。得られたフィルムは、膜厚は1.8μmであり、偏光顕微鏡でそれを観察したところ、フィルムが基板面に対して水平配向していることを確認した。そして、そのΔndは79nmであり、ヘイズ値は0.4%であった。図3に上記フィルムのΔndの角度依存性を示す。[Example 3]
150 mg of polymer (3) and 0.3 mg of R-30 were dissolved in 850 mg of cyclohexanone to obtain a solution of polymer (3).
This solution was applied to a glass substrate by spin coating, prebaked, and allowed to cool to room temperature. At this time, the obtained film on the substrate was transparent.
Next, the coated film formed on the glass substrate was exposed and then post-baked. The obtained film had a thickness of 1.8 μm, and when observed with a polarization microscope, it was confirmed that the film was horizontally oriented with respect to the substrate surface. And, the Δnd was 79 nm, and the haze value was 0.4%. FIG. 3 shows the angular dependence of Δnd of the above-mentioned film.
[比較例1]
重合体(4)150mg及びR−30 0.3mgをシクロヘキサノン850mgに溶解し、重合体(4)の溶液を得た。
この溶液を、ガラス基板にスピンコートにより塗布し、プリベークした後、室温まで放冷した。このとき、基板上の得られた膜は透明であった。
次に、ガラス基板に形成された塗膜を露光した後、100℃のホットプレート上で20分間ポストベークした。得られたフィルムは、膜厚は1.5μmであり、偏光顕微鏡でそれを観察したところ、水平配向フィルムが得られず、そのΔndは25nmであり、ヘイズ値は4.0%であった。図4に上記フィルムのΔndの角度依存性を示す。Comparative Example 1
150 mg of polymer (4) and 0.3 mg of R-30 were dissolved in 850 mg of cyclohexanone to obtain a solution of polymer (4).
This solution was applied to a glass substrate by spin coating, prebaked, and allowed to cool to room temperature. At this time, the obtained film on the substrate was transparent.
Next, the coating film formed on the glass substrate was exposed and then post-baked on a hot plate at 100 ° C. for 20 minutes. The obtained film had a thickness of 1.5 μm, and when observed with a polarizing microscope, a horizontally oriented film was not obtained, its Δnd was 25 nm, and its haze value was 4.0%. FIG. 4 shows the angular dependency of .DELTA.nd of the above-mentioned film.
以上の結果をまとめて、下記表1に示す。 The above results are summarized in Table 1 below.
Claims (6)
M1は式[4]で表される基であり、M2は式[5]で表される基であり、
m及びnはそれぞれ0<m<100、0<n<100、かつ、m+n≦100を満たす数であり、
q及びrはそれぞれ独立に2〜9の整数である。] What is claimed is: 1. A composition for forming a film, which comprises at least one polymer containing repeating units represented by the formulas [1a] and [1b] and an organic solvent.
M 1 is a group represented by the formula [4], and M 2 is a group represented by the formula [5]
m and n are numbers satisfying 0 <m <100, 0 <n <100, and m + n ≦ 100, respectively
q and r are each independently an integer of 2-9. ]
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