JP6526568B2 - プラズマ装置用部品およびその製造方法 - Google Patents

プラズマ装置用部品およびその製造方法 Download PDF

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Publication number
JP6526568B2
JP6526568B2 JP2015550947A JP2015550947A JP6526568B2 JP 6526568 B2 JP6526568 B2 JP 6526568B2 JP 2015550947 A JP2015550947 A JP 2015550947A JP 2015550947 A JP2015550947 A JP 2015550947A JP 6526568 B2 JP6526568 B2 JP 6526568B2
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Japan
Prior art keywords
oxide
particles
yttrium oxide
lanthanoid
film
Prior art date
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Active
Application number
JP2015550947A
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English (en)
Japanese (ja)
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JPWO2015080134A1 (ja
Inventor
佐藤　道雄
道雄 佐藤
高志 日野
高志 日野
仁 中谷
仁 中谷
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Toshiba Materials Co Ltd
Original Assignee
Toshiba Corp
Toshiba Materials Co Ltd
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Publication of JPWO2015080134A1 publication Critical patent/JPWO2015080134A1/ja
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C24/00—Coating starting from inorganic powder
    • C23C24/02—Coating starting from inorganic powder by application of pressure only
    • C23C24/04—Impact or kinetic deposition of particles
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/009—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone characterised by the material treated
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/45—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
    • C04B41/50—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements with inorganic materials
    • C04B41/5025—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements with inorganic materials with ceramic materials
    • C04B41/5045—Rare-earth oxides
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/80—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone of only ceramics
    • C04B41/81—Coating or impregnation
    • C04B41/85—Coating or impregnation with inorganic materials
    • C04B41/87—Ceramics

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Metallurgy (AREA)
  • Mechanical Engineering (AREA)
  • Plasma & Fusion (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Drying Of Semiconductors (AREA)
  • Compounds Of Alkaline-Earth Elements, Aluminum Or Rare-Earth Metals (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
  • Coating By Spraying Or Casting (AREA)
JP2015550947A 2013-11-29 2014-11-26 プラズマ装置用部品およびその製造方法 Active JP6526568B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2013248235 2013-11-29
JP2013248235 2013-11-29
PCT/JP2014/081189 WO2015080134A1 (fr) 2013-11-29 2014-11-26 Pièce de dispositif à plasma et son procédé de fabrication

Publications (2)

Publication Number Publication Date
JPWO2015080134A1 JPWO2015080134A1 (ja) 2017-03-16
JP6526568B2 true JP6526568B2 (ja) 2019-06-05

Family

ID=53199074

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2015550947A Active JP6526568B2 (ja) 2013-11-29 2014-11-26 プラズマ装置用部品およびその製造方法

Country Status (3)

Country Link
JP (1) JP6526568B2 (fr)
KR (1) KR101807444B1 (fr)
WO (1) WO2015080134A1 (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20210069837A (ko) * 2019-12-04 2021-06-14 한국세라믹기술원 내플라즈마 침식성 및 기계적 특성이 우수한 반도체 부품의 코팅방법

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI715004B (zh) * 2018-04-03 2021-01-01 日商京瓷股份有限公司 電漿處理裝置用構件及具備其之電漿處理裝置以及電漿處理裝置用構件之製造方法
KR102209860B1 (ko) * 2020-10-20 2021-01-29 와이엠씨 주식회사 디스플레이 패널 제조에 사용되는 플라즈마 처리장치용 내부부품의 표면처리방법
KR102439674B1 (ko) * 2022-07-25 2022-09-02 주식회사 코닉스 내플라즈마성이 향상된 알루미나 세라믹 소재 및 내플라즈마성이 향상된 알루미나 세라믹 소재의 제조 장치

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3619330B2 (ja) * 1996-07-31 2005-02-09 京セラ株式会社 プラズマプロセス装置用部材
JP4510358B2 (ja) 2002-03-27 2010-07-21 太平洋セメント株式会社 静電チャックおよびその製造方法
JP4780932B2 (ja) * 2004-05-25 2011-09-28 京セラ株式会社 耐食性部材とその製造方法および半導体・液晶製造装置用部材
JP2010064937A (ja) * 2008-09-12 2010-03-25 Covalent Materials Corp プラズマ処理装置用セラミックス
JP5284227B2 (ja) 2009-09-07 2013-09-11 日本特殊陶業株式会社 静電チャック及び静電チャックの製造方法
US20120216955A1 (en) * 2011-02-25 2012-08-30 Toshiba Materials Co., Ltd. Plasma processing apparatus
KR101637801B1 (ko) * 2012-05-22 2016-07-07 가부시끼가이샤 도시바 플라즈마 처리 장치용 부품 및 플라즈마 처리 장치용 부품의 제조 방법

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20210069837A (ko) * 2019-12-04 2021-06-14 한국세라믹기술원 내플라즈마 침식성 및 기계적 특성이 우수한 반도체 부품의 코팅방법
KR102371936B1 (ko) 2019-12-04 2022-03-08 한국세라믹기술원 내플라즈마 침식성 및 기계적 특성이 우수한 반도체 부품의 코팅방법

Also Published As

Publication number Publication date
WO2015080134A1 (fr) 2015-06-04
JPWO2015080134A1 (ja) 2017-03-16
KR20160075725A (ko) 2016-06-29
KR101807444B1 (ko) 2017-12-08

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