JP6509009B2 - Bismaleimide compound, composition containing the same, and cured product - Google Patents
Bismaleimide compound, composition containing the same, and cured product Download PDFInfo
- Publication number
- JP6509009B2 JP6509009B2 JP2015070102A JP2015070102A JP6509009B2 JP 6509009 B2 JP6509009 B2 JP 6509009B2 JP 2015070102 A JP2015070102 A JP 2015070102A JP 2015070102 A JP2015070102 A JP 2015070102A JP 6509009 B2 JP6509009 B2 JP 6509009B2
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- JP
- Japan
- Prior art keywords
- group
- alkyl group
- bismaleimide compound
- imide
- resin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- -1 Bismaleimide compound Chemical class 0.000 title claims description 51
- 239000000203 mixture Substances 0.000 title claims description 30
- 229920003192 poly(bis maleimide) Polymers 0.000 title claims description 28
- 150000003949 imides Chemical class 0.000 claims description 25
- 125000000217 alkyl group Chemical group 0.000 claims description 17
- 239000003431 cross linking reagent Substances 0.000 claims description 11
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 10
- 238000004132 cross linking Methods 0.000 claims description 4
- 239000012776 electronic material Substances 0.000 claims description 4
- 238000002156 mixing Methods 0.000 claims description 4
- 125000004433 nitrogen atom Chemical group N* 0.000 claims description 2
- 125000006273 (C1-C3) alkyl group Chemical group 0.000 claims 1
- 239000000463 material Substances 0.000 description 24
- 229920005989 resin Polymers 0.000 description 24
- 239000011347 resin Substances 0.000 description 24
- 239000003822 epoxy resin Substances 0.000 description 19
- 229920000647 polyepoxide Polymers 0.000 description 19
- 239000000758 substrate Substances 0.000 description 14
- 239000003566 sealing material Substances 0.000 description 13
- 150000002989 phenols Chemical class 0.000 description 11
- 150000001412 amines Chemical class 0.000 description 10
- 229920006015 heat resistant resin Polymers 0.000 description 9
- CMLFRMDBDNHMRA-UHFFFAOYSA-N 2h-1,2-benzoxazine Chemical compound C1=CC=C2C=CNOC2=C1 CMLFRMDBDNHMRA-UHFFFAOYSA-N 0.000 description 7
- 230000000052 comparative effect Effects 0.000 description 7
- XLJMAIOERFSOGZ-UHFFFAOYSA-M cyanate Chemical compound [O-]C#N XLJMAIOERFSOGZ-UHFFFAOYSA-M 0.000 description 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- 239000013078 crystal Substances 0.000 description 6
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical class O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- 239000000047 product Substances 0.000 description 6
- 238000005979 thermal decomposition reaction Methods 0.000 description 6
- AYKYXWQEBUNJCN-UHFFFAOYSA-N 3-methylfuran-2,5-dione Chemical compound CC1=CC(=O)OC1=O AYKYXWQEBUNJCN-UHFFFAOYSA-N 0.000 description 5
- BTBUEUYNUDRHOZ-UHFFFAOYSA-N Borate Chemical compound [O-]B([O-])[O-] BTBUEUYNUDRHOZ-UHFFFAOYSA-N 0.000 description 5
- 125000003277 amino group Chemical group 0.000 description 5
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 5
- 238000006243 chemical reaction Methods 0.000 description 5
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 5
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 5
- 229910052757 nitrogen Inorganic materials 0.000 description 5
- 239000005011 phenolic resin Substances 0.000 description 5
- 238000012360 testing method Methods 0.000 description 5
- 239000004593 Epoxy Substances 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 125000003710 aryl alkyl group Chemical group 0.000 description 4
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 4
- 239000004918 carbon fiber reinforced polymer Substances 0.000 description 4
- 230000009477 glass transition Effects 0.000 description 4
- 229920003986 novolac Polymers 0.000 description 4
- QWVGKYWNOKOFNN-UHFFFAOYSA-N o-cresol Chemical compound CC1=CC=CC=C1O QWVGKYWNOKOFNN-UHFFFAOYSA-N 0.000 description 4
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 4
- 239000000049 pigment Substances 0.000 description 4
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 4
- 125000004169 (C1-C6) alkyl group Chemical group 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- SJRJJKPEHAURKC-UHFFFAOYSA-N N-Methylmorpholine Chemical compound CN1CCOCC1 SJRJJKPEHAURKC-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 125000003545 alkoxy group Chemical group 0.000 description 3
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 3
- 125000003118 aryl group Chemical group 0.000 description 3
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 3
- 238000001723 curing Methods 0.000 description 3
- 125000004122 cyclic group Chemical group 0.000 description 3
- 150000002118 epoxides Chemical class 0.000 description 3
- 125000005843 halogen group Chemical group 0.000 description 3
- 230000000977 initiatory effect Effects 0.000 description 3
- 239000011810 insulating material Substances 0.000 description 3
- 238000002844 melting Methods 0.000 description 3
- 230000008018 melting Effects 0.000 description 3
- 125000000962 organic group Chemical group 0.000 description 3
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N phenylbenzene Natural products C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 125000001424 substituent group Chemical group 0.000 description 3
- 125000000547 substituted alkyl group Chemical group 0.000 description 3
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 3
- 230000004580 weight loss Effects 0.000 description 3
- 150000003923 2,5-pyrrolediones Chemical class 0.000 description 2
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 2
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical class C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 description 2
- NVKGJHAQGWCWDI-UHFFFAOYSA-N 4-[4-amino-2-(trifluoromethyl)phenyl]-3-(trifluoromethyl)aniline Chemical compound FC(F)(F)C1=CC(N)=CC=C1C1=CC=C(N)C=C1C(F)(F)F NVKGJHAQGWCWDI-UHFFFAOYSA-N 0.000 description 2
- ULKLGIFJWFIQFF-UHFFFAOYSA-N 5K8XI641G3 Chemical compound CCC1=NC=C(C)N1 ULKLGIFJWFIQFF-UHFFFAOYSA-N 0.000 description 2
- 229930185605 Bisphenol Natural products 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- PEEHTFAAVSWFBL-UHFFFAOYSA-N Maleimide Chemical compound O=C1NC(=O)C=C1 PEEHTFAAVSWFBL-UHFFFAOYSA-N 0.000 description 2
- 238000007259 addition reaction Methods 0.000 description 2
- 229920003180 amino resin Polymers 0.000 description 2
- 239000004305 biphenyl Substances 0.000 description 2
- 235000010290 biphenyl Nutrition 0.000 description 2
- IMHDGJOMLMDPJN-UHFFFAOYSA-N biphenyl-2,2'-diol Chemical compound OC1=CC=CC=C1C1=CC=CC=C1O IMHDGJOMLMDPJN-UHFFFAOYSA-N 0.000 description 2
- 239000011203 carbon fibre reinforced carbon Substances 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 150000004985 diamines Chemical class 0.000 description 2
- 239000003989 dielectric material Substances 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 125000003700 epoxy group Chemical group 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- NAQMVNRVTILPCV-UHFFFAOYSA-N hexane-1,6-diamine Chemical compound NCCCCCCN NAQMVNRVTILPCV-UHFFFAOYSA-N 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 239000011256 inorganic filler Substances 0.000 description 2
- 229910003475 inorganic filler Inorganic materials 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- NXPPAOGUKPJVDI-UHFFFAOYSA-N naphthalene-1,2-diol Chemical class C1=CC=CC2=C(O)C(O)=CC=C21 NXPPAOGUKPJVDI-UHFFFAOYSA-N 0.000 description 2
- 150000004780 naphthols Chemical class 0.000 description 2
- 150000003003 phosphines Chemical class 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 239000009719 polyimide resin Substances 0.000 description 2
- 238000001226 reprecipitation Methods 0.000 description 2
- 239000011342 resin composition Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 239000013008 thixotropic agent Substances 0.000 description 2
- 238000001721 transfer moulding Methods 0.000 description 2
- IMNIMPAHZVJRPE-UHFFFAOYSA-N triethylenediamine Chemical compound C1CN2CCN1CC2 IMNIMPAHZVJRPE-UHFFFAOYSA-N 0.000 description 2
- 239000003981 vehicle Substances 0.000 description 2
- NAWXUBYGYWOOIX-SFHVURJKSA-N (2s)-2-[[4-[2-(2,4-diaminoquinazolin-6-yl)ethyl]benzoyl]amino]-4-methylidenepentanedioic acid Chemical compound C1=CC2=NC(N)=NC(N)=C2C=C1CCC1=CC=C(C(=O)N[C@@H](CC(=C)C(O)=O)C(O)=O)C=C1 NAWXUBYGYWOOIX-SFHVURJKSA-N 0.000 description 1
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 description 1
- QEFMDEFYYCMJPY-UHFFFAOYSA-N 1-(chloromethyl)-2-phenylbenzene Chemical group ClCC1=CC=CC=C1C1=CC=CC=C1 QEFMDEFYYCMJPY-UHFFFAOYSA-N 0.000 description 1
- XQUPVDVFXZDTLT-UHFFFAOYSA-N 1-[4-[[4-(2,5-dioxopyrrol-1-yl)phenyl]methyl]phenyl]pyrrole-2,5-dione Chemical class O=C1C=CC(=O)N1C(C=C1)=CC=C1CC1=CC=C(N2C(C=CC2=O)=O)C=C1 XQUPVDVFXZDTLT-UHFFFAOYSA-N 0.000 description 1
- KJCVRFUGPWSIIH-UHFFFAOYSA-N 1-naphthol Chemical compound C1=CC=C2C(O)=CC=CC2=C1 KJCVRFUGPWSIIH-UHFFFAOYSA-N 0.000 description 1
- HECLRDQVFMWTQS-RGOKHQFPSA-N 1755-01-7 Chemical compound C1[C@H]2[C@@H]3CC=C[C@@H]3[C@@H]1C=C2 HECLRDQVFMWTQS-RGOKHQFPSA-N 0.000 description 1
- 238000005160 1H NMR spectroscopy Methods 0.000 description 1
- VILCJCGEZXAXTO-UHFFFAOYSA-N 2,2,2-tetramine Chemical compound NCCNCCNCCN VILCJCGEZXAXTO-UHFFFAOYSA-N 0.000 description 1
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 1
- MFGALGYVFGDXIX-UHFFFAOYSA-N 2,3-Dimethylmaleic anhydride Chemical compound CC1=C(C)C(=O)OC1=O MFGALGYVFGDXIX-UHFFFAOYSA-N 0.000 description 1
- AHDSRXYHVZECER-UHFFFAOYSA-N 2,4,6-tris[(dimethylamino)methyl]phenol Chemical compound CN(C)CC1=CC(CN(C)C)=C(O)C(CN(C)C)=C1 AHDSRXYHVZECER-UHFFFAOYSA-N 0.000 description 1
- PFHTYDZPRYLZHX-UHFFFAOYSA-N 2-(2,5-dihydroxyphenyl)benzene-1,4-diol Chemical compound OC1=CC=C(O)C(C=2C(=CC=C(O)C=2)O)=C1 PFHTYDZPRYLZHX-UHFFFAOYSA-N 0.000 description 1
- YTWBFUCJVWKCCK-UHFFFAOYSA-N 2-heptadecyl-1h-imidazole Chemical compound CCCCCCCCCCCCCCCCCC1=NC=CN1 YTWBFUCJVWKCCK-UHFFFAOYSA-N 0.000 description 1
- LXBGSDVWAMZHDD-UHFFFAOYSA-N 2-methyl-1h-imidazole Chemical compound CC1=NC=CN1 LXBGSDVWAMZHDD-UHFFFAOYSA-N 0.000 description 1
- ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 2-phenyl-1h-imidazole Chemical compound C1=CNC(C=2C=CC=CC=2)=N1 ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 0.000 description 1
- YBRVSVVVWCFQMG-UHFFFAOYSA-N 4,4'-diaminodiphenylmethane Chemical compound C1=CC(N)=CC=C1CC1=CC=C(N)C=C1 YBRVSVVVWCFQMG-UHFFFAOYSA-N 0.000 description 1
- QYIMZXITLDTULQ-UHFFFAOYSA-N 4-(4-amino-2-methylphenyl)-3-methylaniline Chemical compound CC1=CC(N)=CC=C1C1=CC=C(N)C=C1C QYIMZXITLDTULQ-UHFFFAOYSA-N 0.000 description 1
- HLBLWEWZXPIGSM-UHFFFAOYSA-N 4-Aminophenyl ether Chemical compound C1=CC(N)=CC=C1OC1=CC=C(N)C=C1 HLBLWEWZXPIGSM-UHFFFAOYSA-N 0.000 description 1
- DZIHTWJGPDVSGE-UHFFFAOYSA-N 4-[(4-aminocyclohexyl)methyl]cyclohexan-1-amine Chemical compound C1CC(N)CCC1CC1CCC(N)CC1 DZIHTWJGPDVSGE-UHFFFAOYSA-N 0.000 description 1
- HDPBBNNDDQOWPJ-UHFFFAOYSA-N 4-[1,2,2-tris(4-hydroxyphenyl)ethyl]phenol Chemical compound C1=CC(O)=CC=C1C(C=1C=CC(O)=CC=1)C(C=1C=CC(O)=CC=1)C1=CC=C(O)C=C1 HDPBBNNDDQOWPJ-UHFFFAOYSA-N 0.000 description 1
- WFCQTAXSWSWIHS-UHFFFAOYSA-N 4-[bis(4-hydroxyphenyl)methyl]phenol Chemical compound C1=CC(O)=CC=C1C(C=1C=CC(O)=CC=1)C1=CC=C(O)C=C1 WFCQTAXSWSWIHS-UHFFFAOYSA-N 0.000 description 1
- TYOXIFXYEIILLY-UHFFFAOYSA-N 5-methyl-2-phenyl-1h-imidazole Chemical compound N1C(C)=CN=C1C1=CC=CC=C1 TYOXIFXYEIILLY-UHFFFAOYSA-N 0.000 description 1
- IXCOKTMGCRJMDR-UHFFFAOYSA-N 9h-fluorene;phenol Chemical compound OC1=CC=CC=C1.OC1=CC=CC=C1.C1=CC=C2CC3=CC=CC=C3C2=C1 IXCOKTMGCRJMDR-UHFFFAOYSA-N 0.000 description 1
- 239000004135 Bone phosphate Substances 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229920000049 Carbon (fiber) Polymers 0.000 description 1
- MQJKPEGWNLWLTK-UHFFFAOYSA-N Dapsone Chemical compound C1=CC(N)=CC=C1S(=O)(=O)C1=CC=C(N)C=C1 MQJKPEGWNLWLTK-UHFFFAOYSA-N 0.000 description 1
- RPNUMPOLZDHAAY-UHFFFAOYSA-N Diethylenetriamine Chemical compound NCCNCCN RPNUMPOLZDHAAY-UHFFFAOYSA-N 0.000 description 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 1
- 239000004606 Fillers/Extenders Substances 0.000 description 1
- 239000002841 Lewis acid Substances 0.000 description 1
- UEEJHVSXFDXPFK-UHFFFAOYSA-N N-dimethylaminoethanol Chemical compound CN(C)CCO UEEJHVSXFDXPFK-UHFFFAOYSA-N 0.000 description 1
- ISKQADXMHQSTHK-UHFFFAOYSA-N [4-(aminomethyl)phenyl]methanamine Chemical compound NCC1=CC=C(CN)C=C1 ISKQADXMHQSTHK-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 125000002723 alicyclic group Chemical group 0.000 description 1
- 150000008431 aliphatic amides Chemical class 0.000 description 1
- 150000004982 aromatic amines Chemical class 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 235000012216 bentonite Nutrition 0.000 description 1
- 150000005130 benzoxazines Chemical class 0.000 description 1
- 150000001638 boron Chemical class 0.000 description 1
- 150000001642 boronic acid derivatives Chemical class 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- CREMABGTGYGIQB-UHFFFAOYSA-N carbon carbon Chemical compound C.C CREMABGTGYGIQB-UHFFFAOYSA-N 0.000 description 1
- 239000004917 carbon fiber Substances 0.000 description 1
- 239000004359 castor oil Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
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- 150000001896 cresols Chemical class 0.000 description 1
- 229910002026 crystalline silica Inorganic materials 0.000 description 1
- 229960002887 deanol Drugs 0.000 description 1
- XXBDWLFCJWSEKW-UHFFFAOYSA-N dimethylbenzylamine Chemical compound CN(C)CC1=CC=CC=C1 XXBDWLFCJWSEKW-UHFFFAOYSA-N 0.000 description 1
- GPAYUJZHTULNBE-UHFFFAOYSA-N diphenylphosphine Chemical compound C=1C=CC=CC=1PC1=CC=CC=C1 GPAYUJZHTULNBE-UHFFFAOYSA-N 0.000 description 1
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- 239000011521 glass Substances 0.000 description 1
- 238000000892 gravimetry Methods 0.000 description 1
- 125000005842 heteroatom Chemical group 0.000 description 1
- 150000002460 imidazoles Chemical class 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
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- 239000012774 insulation material Substances 0.000 description 1
- 150000007517 lewis acids Chemical class 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 229940018564 m-phenylenediamine Drugs 0.000 description 1
- 125000005439 maleimidyl group Chemical group C1(C=CC(N1*)=O)=O 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 1
- UJNZOIKQAUQOCN-UHFFFAOYSA-N methyl(diphenyl)phosphane Chemical compound C=1C=CC=CC=1P(C)C1=CC=CC=C1 UJNZOIKQAUQOCN-UHFFFAOYSA-N 0.000 description 1
- 239000010445 mica Substances 0.000 description 1
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- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
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- 229920001296 polysiloxane Polymers 0.000 description 1
- XDOBJOBITOLMFI-UHFFFAOYSA-N pyrrole-2,5-dione;toluene Chemical compound CC1=CC=CC=C1.O=C1NC(=O)C=C1 XDOBJOBITOLMFI-UHFFFAOYSA-N 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 1
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- 235000012239 silicon dioxide Nutrition 0.000 description 1
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- 238000001228 spectrum Methods 0.000 description 1
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- 150000003512 tertiary amines Chemical class 0.000 description 1
- BJQWBACJIAKDTJ-UHFFFAOYSA-N tetrabutylphosphanium Chemical compound CCCC[P+](CCCC)(CCCC)CCCC BJQWBACJIAKDTJ-UHFFFAOYSA-N 0.000 description 1
- USFPINLPPFWTJW-UHFFFAOYSA-N tetraphenylphosphonium Chemical compound C1=CC=CC=C1[P+](C=1C=CC=CC=1)(C=1C=CC=CC=1)C1=CC=CC=C1 USFPINLPPFWTJW-UHFFFAOYSA-N 0.000 description 1
- 230000000930 thermomechanical effect Effects 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- TUQOTMZNTHZOKS-UHFFFAOYSA-N tributylphosphine Chemical compound CCCCP(CCCC)CCCC TUQOTMZNTHZOKS-UHFFFAOYSA-N 0.000 description 1
- 229960001124 trientine Drugs 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 239000001993 wax Substances 0.000 description 1
- 150000003739 xylenols Chemical class 0.000 description 1
Images
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- Pyrrole Compounds (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
Description
本発明は、新規なビスマレイミド化合物、硬化性イミド組成物、イミド硬化物に関するものである。ビスマレイミド化合物は、単独で架橋させるか、または各種のマレイミド化合物もしくは架橋剤と反応させることにより、耐熱性、難燃性に優れた材料を与えることができ、封止材料、基板材料、絶縁材料各種用途に使用できる。特に極めて高い耐熱性及び成形性を両立することが必要な、高耐熱基板材料、フレキシブル基板材料、高耐熱低誘電材料、高耐熱CFRP材料(炭素繊維複合材料)、車載向けSiCパワーデバイス用高耐熱封止材料用途に使用できる。 The present invention relates to a novel bismaleimide compound, a curable imide composition, and a cured imide product. A bismaleimide compound can give a material excellent in heat resistance and flame retardance by being crosslinked alone or reacted with various maleimide compounds or crosslinking agents, and a sealing material, a substrate material, an insulating material It can be used for various applications. Particularly, high heat resistant substrate material, flexible substrate material, high heat resistant low dielectric material, high heat resistant CFRP material (carbon fiber composite material), high heat resistance for automotive SiC power devices, which requires extremely high heat resistance and moldability to be compatible. It can be used for sealing material applications.
耐熱性樹脂は、無機材料と比較して、有機材料の短所であった耐熱性を有するとともに、長所である加工性を併せ持つことから、封止材料、基板材料、絶縁材料等の分野に広く実用化されている。
しかし、高温プロセス対応フレキシブル基板材料、高速高周波対応高耐熱基板材料、高耐熱CFRP用材料、車載向けSiCパワーデバイス封止材料等、従来にない極めて高い耐熱性を要求する新しい材料が現れてきている。例えば、SiCパワーデバイスでは、250℃以上での高温領域での動作が想定されるが、従来の耐熱性樹脂を用いた封止材では、耐熱性が十分でないため、200℃での動作が限界であった。そのため、250℃での動作に耐え得る封止材料が切望されている。つまり、従来の耐熱性樹脂では、車載向けSiCパワーデバイス用封止材料等の新しい材料への適用が困難になってきた。
The heat-resistant resin has heat resistance, which is a disadvantage of organic materials compared to inorganic materials, and also has excellent processability, so it is widely used in the fields of sealing materials, substrate materials, insulating materials, etc. It has been
However, new materials that require extremely high heat resistance, such as flexible substrate materials for high-temperature processes, high-temperature high-frequency heat-resistant substrate materials, high-heat-resistant CFRP materials, and automotive SiC power device sealing materials, are emerging. . For example, in a SiC power device, operation in a high temperature region at 250 ° C. or higher is assumed, but in a sealing material using a conventional heat resistant resin, operation at 200 ° C. is limited because the heat resistance is not sufficient. Met. Therefore, a sealing material that can withstand operation at 250 ° C. is desired. That is, with conventional heat-resistant resins, application to new materials such as sealing materials for SiC power devices for vehicles has become difficult.
従来の耐熱性樹脂は、成形性に優れるエポキシ樹脂を高耐熱化したものが主に使用されてきた。例えば、フェノール樹脂を含むエポキシ樹脂組成物、ベンゾオキサジン、アミン系樹脂またはシアネート樹脂を含むエポキシ樹脂組成物、マレイミド樹脂を含むエポキシ樹脂組成物が挙げられる。その他、ポリイミド樹脂等が挙げられる。しかし、これらの従来の樹脂では、上記の極めて高い耐熱性及び成形性の両立が難しい。また、ガラス転移温度(Tg)が高い反面、熱分解開始温度が不十分であった。 As conventional heat resistant resins, those obtained by increasing the heat resistance of epoxy resins having excellent moldability have been mainly used. For example, an epoxy resin composition containing a phenol resin, an epoxy resin composition containing benzoxazine, an amine resin or a cyanate resin, and an epoxy resin composition containing a maleimide resin can be mentioned. Other examples include polyimide resins and the like. However, with these conventional resins, it is difficult to simultaneously achieve the above-mentioned extremely high heat resistance and moldability. Moreover, while the glass transition temperature (Tg) was high, the thermal decomposition start temperature was inadequate.
例えば、エポキシ樹脂では、高耐熱化の手法として、多環芳香族基の導入(特許文献1)、ヘテロ基の導入(特許文献2)、架橋密度の向上(特許文献3)等が検討されてきた。これらは、ガラス転移温度の向上や寸法安定性の向上には効果がみられるが、熱分解開始温度の向上には限界があった。
エポキシ樹脂組成物にマレイミド樹脂を配合したもの(特許文献4)は、熱分解開始温度は改善されたが250℃の長期耐熱には不十分であり、成型性が課題となる。
エポキシ樹脂にアミン系樹脂(特許文献5)またはベンゾオキサジン樹脂を配合したもの(特許文献6)は、ガラス転移温度(Tg)は向上するが、熱分解開始温度はエポキシ樹脂よりも低く、また、硬化物は脆いという欠点があった。
シアネート樹脂を含むエポキシ組成物(特許文献7)は、硬化時の温度制御が難しく成型性に課題があり、高価になるという問題もあった。
ポリイミド樹脂は、熱分解開始温度には優れるが、厚膜成型が困難であり、封止材などの成型材料には適用が困難であった。
For example, in the case of epoxy resin, introduction of polycyclic aromatic group (patent document 1), introduction of hetero group (patent document 2), improvement of crosslink density (patent document 3), etc. have been studied as methods for increasing heat resistance. The Although these are effective for improving the glass transition temperature and the dimensional stability, there is a limit to the improvement of the thermal decomposition initiation temperature.
Although the thing which mix | blended maleimide resin with the epoxy resin composition (patent document 4) has improved thermal decomposition start temperature, it is inadequate for long-term heat resistance of 250 degreeC, and a moldability becomes a subject.
An epoxy resin mixed with an amine resin (Patent Document 5) or a benzoxazine resin (Patent Document 6) improves the glass transition temperature (Tg) but has a thermal decomposition initiation temperature lower than that of the epoxy resin, and Cured products have the disadvantage of being brittle.
The epoxy composition containing a cyanate resin (Patent Document 7) has a problem in that the temperature control at the time of curing is difficult, there is a problem in moldability, and it becomes expensive.
The polyimide resin is excellent in the thermal decomposition initiation temperature, but it is difficult to form a thick film, and its application to a molding material such as a sealing material is difficult.
本発明の目的は、従来の耐熱性樹脂では困難であった極めて高い耐熱性とエポキシ樹脂並みの成型性が両立した材料を提供することである。 An object of the present invention is to provide a material in which extremely high heat resistance, which is difficult in conventional heat resistant resins, and moldability comparable to epoxy resins are compatible.
本発明者等は、鋭意検討により、特定のイミド化合物が、上記の課題を解決することが期待されること、そしてこれが極めて高い耐熱性及び熱成形性を両立することを見出した。 The inventors of the present invention have found that a specific imide compound is expected to solve the above-mentioned problems, and that it is compatible with extremely high heat resistance and thermoformability by intensive studies.
すなわち本発明は、下記一般式(1)で表されるビスマレイミド化合物に関する。
また、本発明は上記のビスマレイミド化合物と、下記一般式(2)で表されるマレイミド化合物を含有することを特徴とするイミド組成物に関する。
更に本発明は、上記のビスマレイミド化合物と、架橋剤を含有することを特徴とする硬化性イミド組成物、又は上記のイミド組成物に、更に架橋剤を配合してなる硬化性イミド組成物に関する。また、本発明はこれら硬化性イミド組成物を架橋硬化してなるイミド硬化物に関する。このイミド硬化物は電子材料用として適する。 Furthermore, the present invention relates to a curable imide composition comprising the above-mentioned bismaleimide compound and a crosslinking agent, or a curable imide composition obtained by further blending a crosslinking agent into the above-mentioned imide composition. . The present invention also relates to an imide cured product obtained by crosslinking and curing these curable imide compositions. This imide cured product is suitable for electronic materials.
本発明のビスマレイミド化合物は、エポキシ樹脂を超える耐熱性を有するとともに、エポキシ樹脂と同等の成形性を有する。更に、低線膨張係数、高Tgという性質も有する。そのため、高耐熱基板材料、高温プロセス対応フレキシブル基板材料、高耐熱CFRP用材料、車載向けSiCパワーデバイス用封止材料等の、極めて高い耐熱性を有する材料に好適に使用できる。また、従来の耐熱性樹脂で適用可能な、封止材料、基板材料、絶縁材料等に対しても、従来の耐熱性樹脂以上の高い耐久性を付与できる。 The bismaleimide compound of the present invention has heat resistance exceeding that of the epoxy resin, and has the same formability as the epoxy resin. Furthermore, it also has properties of low linear expansion coefficient and high Tg. Therefore, it can be suitably used as a material having extremely high heat resistance, such as a high heat resistant substrate material, a high temperature process flexible substrate material, a high heat resistant CFRP material, and a sealing material for automotive SiC power devices. Moreover, high durability more than conventional heat resistant resins can be imparted to sealing materials, substrate materials, insulating materials, etc., which can be applied using conventional heat resistant resins.
まず、本発明のビスマレイミド化合物について説明する。
本発明のビスマレイミド化合物は、上記一般式(1)で表される。
First, the bismaleimide compound of the present invention will be described.
The bismaleimide compound of the present invention is represented by the above general formula (1).
ここで、R1及びR2は、それぞれ独立して、置換または無置換のアルキル基を表す。置換のアルキル基の場合、置換基には特に制限はないが、例えば、アリール基、アラルキル基、アミノ基、アルコキシ基、水酸基、カルボキシル基、ビニル基、ハロゲン基等が挙げられる。より好ましくは、無置換またはフェニル基若しくはハロゲン基置換のアルキル基である。さらに好ましくは、無置換またはフッ素置換のアルキル基である。 Here, R 1 and R 2 each independently represent a substituted or unsubstituted alkyl group. In the case of a substituted alkyl group, the substituent is not particularly limited, and examples thereof include an aryl group, an aralkyl group, an amino group, an alkoxy group, a hydroxyl group, a carboxyl group, a vinyl group and a halogen group. More preferably, it is an unsubstituted or phenyl group- or halogen-substituted alkyl group. More preferably, it is an unsubstituted or fluorine-substituted alkyl group.
前記置換または無置換のアルキル基は、直鎖構造、分岐構造、環状構造のいずれでも良い。好ましくはC1〜C6のアルキル基であり、より好ましくはC1〜C3であり、さらに好ましくはC1である。 The substituted or unsubstituted alkyl group may have any of a linear structure, a branched structure, and a cyclic structure. Preferably it is a C1-C6 alkyl group, More preferably, it is C1-C3, More preferably, it is C1.
M1、M2、M3及びM4は、それぞれ独立して、水素原子または置換もしくは無置換のアルキル基を表す。置換のアルキル基の場合、置換基には特に制限はないが、例えば、アリール基、アラルキル基、アミノ基、アルコキシ基、水酸基、カルボキシル基、ビニル基、ハロゲン基等が挙げられる。より好ましくは、水素原子または無置換のアルキル基である。さらに好ましくは、M1、M2、M3及びM4の少なくとも1つが無置換のアルキル基である。 M 1 , M 2 , M 3 and M 4 each independently represent a hydrogen atom or a substituted or unsubstituted alkyl group. In the case of a substituted alkyl group, the substituent is not particularly limited, and examples thereof include an aryl group, an aralkyl group, an amino group, an alkoxy group, a hydroxyl group, a carboxyl group, a vinyl group and a halogen group. More preferably, it is a hydrogen atom or an unsubstituted alkyl group. More preferably, at least one of M 1 , M 2 , M 3 and M 4 is an unsubstituted alkyl group.
M1〜M4における前記置換または無置換のアルキル基は、直鎖構造、分岐構造、環状構造のいずれでも良い。より好ましくは、C1〜C6のアルキル基であり、より好ましくはC1〜C3であり、さらに好ましくはC1のアルキル基である。 The substituted or unsubstituted alkyl group in M 1 to M 4 may be any of linear structure, branched structure and cyclic structure. More preferably, it is a C1-C6 alkyl group, more preferably, it is C1-C3 and still more preferably a C1 alkyl group.
上記一般式(1)で表されるビスマレイミド化合物は、上記R1、R2、M1、M2、M3及びM4が異なるビスマレイミド化合物の混合物であっても良い。 The bismaleimide compound represented by the above general formula (1) may be a mixture of bismaleimide compounds different in the above R 1 , R 2 , M 1 , M 2 , M 3 and M 4 .
上記一般式(1)で表されるビスマレイミド化合物の好ましい具体例を表1に示す。 Preferred specific examples of the bismaleimide compound represented by the above general formula (1) are shown in Table 1.
また、上記一般式(1)で表されるビスマレイミド化合物は、上記一般式(2)で表されるマレイミド化合物(以下、「他のマレイミド化合物」という。)を含むイミド組成物とすることができる。 In addition, the bismaleimide compound represented by the above general formula (1) may be an imide composition containing the maleimide compound represented by the above general formula (2) (hereinafter referred to as "other maleimide compound"). it can.
一般式(2)において、Qはm価の有機基を表す。mは1〜10の整数であるが、好ましくは2〜8の整数である。
Qの構造に制限はないが、2価の有機基である場合、以下の式(3)〜(7)の構造が好ましく挙げられる。ここで、下記式(3)〜(7)において、*は、上記一般式(2)における2つの窒素原子へのそれぞれの結合部位である。Z1及びZ2は、それぞれ独立して、水素原子、C1〜C6のアルキル基、又はC1〜C6のハロゲン置換アルキル基を表す。なお、下記式(3)〜(7)において、Z1、Z2及び上記結合部位*の置換位置は一例であり、これに限定されない。
In the general formula (2), Q represents an m-valent organic group. m is an integer of 1 to 10, preferably 2 to 8.
The structure of Q is not limited, but in the case of a divalent organic group, structures of the following formulas (3) to (7) are preferably mentioned. Here, in the following formulas (3) to (7), * is a bonding site to each of two nitrogen atoms in the above general formula (2). Z 1 and Z 2 each independently represent a hydrogen atom, an alkyl group of C1 -C6, or a halogen-substituted alkyl group of C1 -C6. In Formula (3) to (7), the substitution position of Z 1, Z 2 and the binding sites * are exemplary, but are not limited thereto.
また、M5およびM6は、それぞれ独立して、置換もしくは無置換のアルキル基、または水素原子を表す。置換のアルキル基の場合、置換基には特に制限はないが、例えば、アリール基、アラルキル基、アミノ基、アルコキシ基、水酸基、カルボキシル基、ビニル基、ハロゲン基等が挙げられる。より好ましくは、無置換のアルキル基または水素原子である。 M 5 and M 6 each independently represent a substituted or unsubstituted alkyl group or a hydrogen atom. In the case of a substituted alkyl group, the substituent is not particularly limited, and examples thereof include an aryl group, an aralkyl group, an amino group, an alkoxy group, a hydroxyl group, a carboxyl group, a vinyl group and a halogen group. More preferably, it is an unsubstituted alkyl group or a hydrogen atom.
M5およびM6における前記アルキル基は、直鎖構造、分岐構造、環状構造のいずれでも良い。より好ましくは、C1〜C6のアルキル基であり、より好ましくはC1〜C3であり、さらに好ましくはC1である。 The alkyl group in M 5 and M 6 may be any of linear structure, branched structure and cyclic structure. More preferably, it is a C1-C6 alkyl group, more preferably C1-C3 and still more preferably C1.
本発明のビスマレイミド化合物には、架橋剤を配合することにより硬化性イミド組成物とすることができる。同様に他のマレイミド化合物を含む上記イミド組成物にも、架橋剤を配合することにより硬化性イミド組成物とすることができる。 A curable imide composition can be obtained by adding a crosslinking agent to the bismaleimide compound of the present invention. Similarly, the above imide composition containing another maleimide compound can be made a curable imide composition by blending a crosslinking agent.
ここで、架橋剤は、公知の架橋剤を用いることができるが、例えば、フェノール樹脂、エポキシ樹脂、シアネート樹脂、アミノ樹脂、ベンゾオキサジン樹脂が挙げられる。これらの架橋剤が有する活性基(フェノール性水酸基、エポキシ基、シアネート基、アミノ基、又はベンゾオキサジンの脂環部位が開環してなるフェノール性水酸基)が、マレイミド基を構成する炭素−炭素二重結合と付加反応して架橋する他、本発明のビスマレイミド化合物が有する2つの炭素−炭素二重結合が重合して架橋する。 Here, as the crosslinking agent, known crosslinking agents can be used, and examples thereof include phenol resin, epoxy resin, cyanate resin, amino resin, benzoxazine resin. An active group (phenolic hydroxyl group, epoxy group, cyanate group, amino group, or phenolic hydroxyl group formed by ring-opening of an alicyclic moiety of benzoxazine) possessed by these crosslinking agents forms a maleimide group on carbon-carbon In addition to crosslinking by addition reaction with heavy bonds, the two carbon-carbon double bonds possessed by the bismaleimide compound of the present invention are polymerized and crosslinked.
フェノール樹脂としては、公知のものが使用できる。例えば、フェノール類としては、フェノールの他、クレゾール類、キシレノール類等のアルキルフェノール類、ヒドロキノン等の多価フェノール類、ナフトール類、ナフタレンジオール類等の多環フェノール類、ビスフェノールA、ビスフェノールF等のビスフェノール類、あるいはフェノールノボラック、フェノールアラルキル樹脂等の多官能性フェノール化合物等が挙げられる。好ましくは、耐熱性及び成型性の点から、アラルキル型フェノール樹脂が望ましい。 A well-known thing can be used as a phenol resin. For example, as phenols, in addition to phenols, cresols, alkylphenols such as xylenols, polyhydric phenols such as hydroquinone, naphthols, polycyclic phenols such as naphthalenediols, bisphenols such as bisphenol A and bisphenol F And polyfunctional phenol compounds such as phenol novolak and phenol aralkyl resin. Preferably, from the viewpoint of heat resistance and moldability, aralkyl type phenolic resins are desirable.
エポキシ樹脂としては、公知のものが使用でき、1分子中にエポキシ基を2個以上有するもの中から選択される。例えばビスフェノールA、ビスフェノールF、3,3',5,5’−テトラメチル−ビスフェノールF、ビスフェノールS、フルオレンビスフェノール、2,2' −ビフェノール、3,3',5,5’−テトラメチル−4,4’−ジヒドロキシビフェノール、レゾルシン、ナフタレンジオール類等の2価のフェノール類のエポキシ化物、トリス−(4−ヒドロキシフェニル)メタン、1,1,2,2−テトラキス(4−ヒドロキシフェニル)エタン、フェノールノボラック、o−クレゾールノボラック等の3価以上のフェノール類のエポキシ化物、ジシクロペンタジエンとフェノール類の共縮合樹脂のエポキシ化物、フェノール類とパラキシリレンジクロライド等から合成されるフェノールアラルキル樹脂類のエポキシ化物、フェノール類とビスクロロメチルビフェニル等から合成されるビフェニルアラルキル型フェノール樹脂のエポキシ化物、ナフトール類とパラキシリレンジクロライド等から合成されるナフトールアラルキル樹脂類のエポキシ化物等が挙げられる。これらのエポキシ樹脂は、単独でもよいし、2種以上を併用してもよい。好ましくは、耐熱性と成形性という点から、フェノールアラルキル樹脂類、ビフェニルアラルキル樹脂類から得られるエポキシ樹脂等の常温で固体状エポキシ樹脂である。 As an epoxy resin, a well-known thing can be used and it selects from what has 2 or more of epoxy groups in 1 molecule. For example, bisphenol A, bisphenol F, 3,3 ', 5,5'-tetramethyl-bisphenol F, bisphenol S, fluorene bisphenol, 2,2'-biphenol, 3,3', 5,5'-tetramethyl-4 Epoxides of dihydric phenols such as 4,4′-dihydroxybiphenol, resorcin and naphthalenediols, tris- (4-hydroxyphenyl) methane, 1,1,2,2-tetrakis (4-hydroxyphenyl) ethane, Epoxides of trivalent or higher phenols such as phenol novolac and o-cresol novolac, epoxidates of co-condensed resin of dicyclopentadiene and phenols, phenol aralkyl resins synthesized from phenols and paraxylylene dichloride, etc. Epoxides, phenols and bis The epoxy compound of a biphenylaralkyl type phenol resin synthesized from chloromethylbiphenyl etc., the epoxy compound of a naphthol aralkyl resin synthesized from naphthols and paraxylylene dichloride, etc. may be mentioned. These epoxy resins may be used alone or in combination of two or more. From the viewpoint of heat resistance and moldability, epoxy resins which are solid at normal temperature, such as epoxy resins obtained from phenol aralkyl resins and biphenyl aralkyl resins are preferable.
シアネート樹脂としては、ビスフェノール型シアネート樹脂、ナフトール型シアネート樹脂等が挙げられる。 As cyanate resin, bisphenol type cyanate resin, naphthol type cyanate resin, etc. are mentioned.
アミノ樹脂としては、4,4’-ジアミノジフェニルメタン、4,4’-ジアミノジフェニルプロパン、4,4’-ジアミノジフェニルスルホン、m-フェニレンジアミン、p-キシリレンジアミン等の芳香族アミン類、エチレンジアミン、ヘキサメチレンジアミン、ジエチレントリアミン、トリエチレンテトラミン等の脂肪族アミン類等が挙げられる。 As amino resins, aromatic amines such as 4,4'-diaminodiphenylmethane, 4,4'-diaminodiphenylpropane, 4,4'-diaminodiphenylsulfone, m-phenylenediamine, p-xylylenediamine, etc., ethylenediamine, Aliphatic amines such as hexamethylene diamine, diethylene triamine, triethylene tetramine and the like can be mentioned.
ベンゾオキサジン樹脂としては、二官能性ジアミン類と単官能フェノール類から得られるP−d型ベンゾオキサジン、単官能性ジアミン類と二官能性フェノール類から得られるF−a型ベンゾオキサジン等が挙げられる。 Examples of benzoxazine resins include P-d-type benzoxazines obtained from difunctional diamines and monofunctional phenols, and Fa-type benzooxazines obtained from monofunctional diamines and difunctional phenols. .
上記硬化性イミド組成物には、必要に応じて上記付加反応を促進させる促進剤を用いることができる。例を挙げれば、アミン類、イミダゾール類、有機ホスフィン類、ルイス酸等があり、具体的には、1,8−ジアザビシクロ(5,4,0)ウンデセン−7、トリエチレンジアミン、ベンジルジメチルアミン、トリエタノールアミン、ジメチルアミノエタノール、トリス(ジメチルアミノメチル)フェノールなどの三級アミン、2−メチルイミダゾール、2−フェニルイミダゾール、2−エチル−4−メチルイミダゾール、2−フェニル−4−メチルイミダゾール、2−へプタデシルイミダゾールなどのイミダゾール類、トリブチルホスフィン、メチルジフェニルホスフイン、トリフェニルホスフィン、ジフェニルホスフィン、フェニルホスフィンなどの有機ホスフィン類、テトラフェニルホスホニウム・テトラフェニルボレート、テトラフェニルホスホニウム・エチルトリフェニルボレート、テトラブチルホスホニウム・テトラブチルボレートなどのテトラ置換ホスホニウム・テトラ置換ボレート、2−エチル−4−メチルイミダゾール・テトラフェニルボレート、N−メチルモルホリン・テトラフェニルボレートなどのテトラフェニルボロン塩などがある。添加量としては、通常、組成物中のビスマレイミド化合物100重量部に対して、0.1から5重量部の範囲である。 In the curable imide composition, an accelerator which accelerates the addition reaction can be used, if necessary. Examples include amines, imidazoles, organic phosphines, Lewis acids, etc. Specifically, 1,8-diazabicyclo (5,4,0) undecen-7, triethylenediamine, benzyldimethylamine, tribasic Ethanolamine, dimethylaminoethanol, tertiary amines such as tris (dimethylaminomethyl) phenol, 2-methylimidazole, 2-phenylimidazole, 2-ethyl-4-methylimidazole, 2-phenyl-4-methylimidazole, 2- Imidazoles such as heptadecyl imidazole, organic phosphines such as tributyl phosphine, methyl diphenyl phosphine, triphenyl phosphine, diphenyl phosphine, phenyl phosphine, etc., tetraphenyl phosphonium tetraphenyl borate, tetrafe Tetra-substituted phosphonium tetra-substituted borate such as tetraphosphorous phosphonium ethyltriphenyl borate and tetrabutyl phosphonium tetrabutyl borate tetraphenyl such as 2-ethyl-4-methylimidazole tetraphenyl borate and N-methylmorpholine tetraphenyl borate There is a boron salt etc. The addition amount is usually in the range of 0.1 to 5 parts by weight with respect to 100 parts by weight of the bismaleimide compound in the composition.
また、本発明の硬化性イミド組成物には、無機充填剤、顔料、難然剤、揺変性付与剤、カップリング剤、流動性向上剤等の添加剤を配合できる。無機充填剤としては、例えば、球状あるいは、破砕状の溶融シリカ、結晶シリカ等のシリカ粉末、アルミナ粉末、ガラス粉末、又はマイカ、タルク、炭酸カルシウム、アルミナ、水和アルミナ等が挙げられ、半導体封止材に用いる場合の好ましい配合量は70重量%以上であり、更に好ましくは80重量%以上である。 Moreover, additives, such as an inorganic filler, a pigment, a flame retardant, a thixotropic agent, a coupling agent, and a fluidity improver, can be mix | blended with the curable imide composition of this invention. Examples of the inorganic filler include spherical or crushed fused silica, silica powder such as crystalline silica, alumina powder, glass powder, mica, talc, calcium carbonate, alumina, hydrated alumina, etc. The preferable blending amount in the case of using as a stopper is 70% by weight or more, more preferably 80% by weight or more.
顔料としては、有機系又は、無機系の体質顔料、鱗片状顔料、等がある。揺変性付与剤としては、シリコン系、ヒマシ油系、脂肪族アマイドワックス、酸化ポリエチレンワックス、有機ベントナイト系等を挙げることができる。 Examples of the pigment include organic or inorganic extender pigments and scale-like pigments. Examples of the thixotropic agent include silicones, castor oils, aliphatic amide waxes, oxidized polyethylene waxes, organic bentonites, and the like.
また、本発明のビスマレイミド化合物は、単独で、または上記硬化性イミド組成物とすることで、公知の方法で架橋、硬化させて、本発明のイミド硬化物とすることができる。架橋方法としては、熱硬化、光硬化が挙げられる。 In addition, the bismaleimide compound of the present invention can be crosslinked or cured by a known method by itself or by using the above-described curable imide composition to obtain the cured imide of the present invention. As a crosslinking method, thermosetting and photocuring may be mentioned.
本発明のイミド硬化物は、エポキシ樹脂を超える耐熱性を有するとともに、エポキシ樹脂と同等の成形性を有する。例えば、5wt%重量減が400℃以上であり、かつ、200℃以下でトランスファー成型可能である。さらに、寸法安定性、難燃性という性質も有する。そのため、低誘電材料、透明耐熱基板材料、高耐熱封止材料、高耐熱基板材料等の電子材料に好適に使用できる。特に、高温プロセス対応フレキシブル基板材料、高速高周波対応高耐熱基板材料、高耐熱CFRP用材料、車載向けSiCパワーデバイス用封止材料等の、極めて高い耐熱性を有する電子材料に好適に使用できる。また、従来の耐熱性樹脂で適用可能な、封止材料、基板材料、絶縁材料に対しても、従来の耐熱性樹脂以上の高い耐久性を付与できる。 The imide cured product of the present invention has heat resistance exceeding that of the epoxy resin, and has the same formability as the epoxy resin. For example, 5 wt% weight loss is 400 ° C. or more, and transfer molding is possible at 200 ° C. or less. Furthermore, it has properties such as dimensional stability and flame retardancy. Therefore, it can be suitably used for electronic materials such as low dielectric materials, transparent heat resistant substrate materials, high heat resistant sealing materials, and high heat resistant substrate materials. In particular, it can be suitably used as an electronic material having extremely high heat resistance, such as a flexible substrate material compatible with high temperature processes, a high heat resistant substrate material compatible with high speed and high frequency, a high heat resistant CFRP material, and a sealing material for SiC power devices for vehicles. Moreover, high durability more than the conventional heat resistant resin can be provided also to the sealing material, the board | substrate material, and the insulation material which can be applied with the conventional heat resistant resin.
本発明のイミド化合物の製造方法の一例について、以下に説明する。 An example of the method for producing the imide compound of the present invention will be described below.
本発明のイミド化合物(c-1)は、例えば、下記反応式(8)に示すように、ビフェニル型ジアミン化合物(a-1)と無水マレイン酸誘導体(b-1)、(b-2)を反応させることで製造できる。 The imide compound (c-1) of the present invention is, for example, as shown in the following reaction formula (8), a biphenyl type diamine compound (a-1) and a maleic anhydride derivative (b-1), (b-2) Can be produced by reacting
さらに、無水マレイン酸誘導体が1種類である場合は、下記反応式(9)に示すように、イミド化合物(c-2)が得られる。
また、この反応の際、一部、式(10)に示すような反応が生じ、オリゴマー成分(d-1)が得られる。このオリゴマー成分は樹脂の靭性を向上させる効果があるため、樹脂中に含んでもよいが、再沈殿により取り除くこともできる。熱分解安定性を向上させるという点では、このオリゴマー成分は少ない方が望ましい。
以下、実施例及び比較例を用いて本発明の実施の形態をより詳細に説明するが、本発明の技術的範囲は下記の形態のみには制限されない。なお、「%」は重量基準を示す。 Hereinafter, the embodiments of the present invention will be described in more detail using Examples and Comparative Examples, but the technical scope of the present invention is not limited to only the following embodiments. In addition, "%" shows a weight standard.
実施例1
セパラブルフラスコに、2,2'‐ジメチルビフェニル−4,4'−ジアミン(m−TB、和歌山精化工業株式会社製)を 50g(0.234mol)、酢酸を71g(1.18mol)、トルエンを120gを仕込み、窒素を導入しながら 50℃に加熱攪拌しながら溶解させた。無水シトラコン酸を52.8g(0.472mol)滴下し、系外に生成水を除去しながら徐々に加熱させ、還流下で1時間反応させた。反応生成物を再沈殿により精製後、白色結晶のビスマレイミド化合物(e-1)を90g得た。収率96%。アミン当量は10万以上であり、アミノ基がほぼ全量反応していることを確認した。生成物の融点は142℃であった。
Example 1
In a separable flask, 50 g (0.234 mol) of 2,2'-dimethylbiphenyl-4,4'-diamine (m-TB, manufactured by Wakayama Seika Kogyo Co., Ltd.), 71 g (1.18 mol) of acetic acid, toluene The mixture was heated to 50.degree. C. and dissolved while introducing nitrogen. 52.8 g (0.472 mol) of citraconic anhydride was dropped, and the system was gradually heated while removing generated water out of the system, and reaction was performed under reflux for 1 hour. The reaction product was purified by reprecipitation to obtain 90 g of bismaleimide compound (e-1) as white crystals. 96% yield. The amine equivalent was over 100,000, and it was confirmed that almost all the amino groups had reacted. The melting point of the product was 142 ° C.
実施例2
無水シトラコン酸の代わりに無水マレイン酸を45.9g加えた他は、実施例1と同様の方法で淡黄色結晶のビスマレイミド化合物(e-2)を60g得た。収率69%。アミン当量は10万以上。
Example 2
In the same manner as in Example 1, except that 45.9 g of maleic anhydride was added instead of citraconic anhydride, 60 g of bismaleimide compound (e-2) as pale yellow crystals was obtained. 69% yield. Amine equivalent is over 100,000.
実施例3
無水シトラコン酸の代わりに無水2,3−ジメチルマレイン酸を29.5gと無水マレイン酸を23.9g加えた他は、実施例1と同様の方法で淡黄色結晶のビスマレイミド化合物(e-3)を84g得た。収率89%。アミン当量は10万以上。
Example 3
A bismaleimide compound (e-3) was obtained in the same manner as in Example 1 except that 29.5 g of 2,3-dimethylmaleic anhydride and 23.9 g of maleic anhydride were added instead of citraconic anhydride. ) Was obtained. 89% yield. Amine equivalent is over 100,000.
実施例4
m−TBの代わりに、2,2'‐ビス(トリフルオロメチル)ビフェニル−4,4'−ジアミンを74.9g用いた他は、実施例1と同様の方法で白色結晶のビスマレイミド化合物(e-5)を97g得た。収率82%。アミン当量は10万以上。
Example 4
In the same manner as in Example 1, bismaleimide compound (white crystal) was used in the same manner as in Example 1 except that 74.9 g of 2,2′-bis (trifluoromethyl) biphenyl-4,4′-diamine was used instead of m-TB. Obtained 97 g of e-5). 82% yield. Amine equivalent is over 100,000.
実施例5
m−TBの代わりに、2,2'‐ビス(トリフルオロメチル)ビフェニル−4,4'−ジアミンを74.9g用い、無水シトラコン酸の代わりに無水マレイン酸を45.9g加えた他は、実施例1と同様の方法で淡黄色結晶のビスマレイミド化合物(e-6)を94g得た。収率84%。アミン当量は10万以上。
Example 5
Instead of m-TB, 74.9 g of 2,2'-bis (trifluoromethyl) biphenyl-4,4'-diamine was used, and 45.9 g of maleic anhydride was added instead of citraconic anhydride, In the same manner as in Example 1, 94 g of bismaleimide compound (e-6) as pale yellow crystals was obtained. 84% yield. Amine equivalent is over 100,000.
比較例1
m−TBの代わりに、4,4’−ジアミノジシクロヘキシルメタンを50g加えた他は、実施例1と同様の方法で白色結晶のビスマレイミド化合物(f-1)90gを得た。収率95%。アミン当量は10万以上、融点189℃であった。
Comparative Example 1
In the same manner as in Example 1 except that 50 g of 4,4′-diaminodicyclohexylmethane was added instead of m-TB, 90 g of a bismaleimide compound (f-1) as white crystals was obtained. 95% yield. The amine equivalent was over 100,000 and melting point 189 ° C.
比較例2
無水シトラコン酸の代わりに無水マレイン酸を46.5g加えた他は、比較例1と同様の方法で白色結晶のビスマレイミド化合物(f-2)を81g得た。収率93%。アミン当量は10万以上、融点189℃であった。
Comparative example 2
In the same manner as in Comparative Example 1 except that 46.5 g of maleic anhydride was added instead of citraconic anhydride, 81 g of bismaleimide compound (f-2) as white crystals was obtained. 93% yield. The amine equivalent was over 100,000 and melting point 189 ° C.
実施例6〜12及び比較例3〜7
ビスマレイミド化合物として上記実施例、比較例で得たe−1、e−2、e−5、e−6、f−1又はf−2を用いた。また、他のマレイミド化合物として、N,N’‐ジフェニルメタンビスマレイミド(BMI;大和化成工業製)、フェニルメタンマレイミドオリゴマー(BMIオリゴマー;BMI−3200、m=8、大和化成工業製)を使用した。また、架橋剤として、o-クレゾールノボラック型エポキシ樹脂(OCNE;エポキシ当量200、軟化点65℃)、フェノールアラルキル樹脂(PA;三井化学株式会社製、MILEX XLC−4L、OH当量168、軟化点61℃)、4,4’−ジアミノジフェニルエーテル(DPE;和歌山精化工業株式会社製)、ベンゾオキサジン(BF−BXZ;小西化学工業株式会社製)を使用し、促進剤としてトリフェニルホスフィンを樹脂成分に対して1重量部配合して混練し、樹脂組成物を得た。この樹脂組成物を用いて175℃にて成形し、ポストキュアを200℃にて4時間、ポストキュアを行い、硬化物試験片を得た後、各種物性測定に供した。
Examples 6 to 12 and Comparative Examples 3 to 7
As a bismaleimide compound, e-1, e-2, e-5, e-6, f-1 or f-2 obtained in the above examples and comparative examples were used. Further, as other maleimide compounds, N, N′-diphenylmethane bismaleimide (BMI; manufactured by Daiwa Kasei Kogyo Co., Ltd.) and phenylmethane maleimide oligomer (BMI oligomer; BMI-3200, m = 8, manufactured by Daiwa Kasei Kogyo Co., Ltd.) were used. Further, as a crosslinking agent, o-cresol novolac type epoxy resin (OCNE; epoxy equivalent 200, softening point 65 ° C.), phenol aralkyl resin (PA; Mitsui Chemicals, Inc., MILEX XLC-4L, OH equivalent 168, softening point 61 C), 4,4'-diaminodiphenyl ether (DPE; made by Wakayama Seika Kogyo Co., Ltd.), benzoxazine (BF-BXZ; made by Konishi Chemical Industry Co., Ltd.) and using triphenylphosphine as a resin component as an accelerator On the other hand, 1 part by weight was blended and kneaded to obtain a resin composition. The resin composition was molded at 175 ° C., post cured at 200 ° C. for 4 hours, post cured for 4 hours to obtain a cured test piece, and then used for various physical property measurements.
以上の実施例及び比較例で得られた硬化物試験片について、熱安定性試験およびトランスファー成型性評価を実施した。
耐熱性評価は、示差熱熱重量同時測定装置(装置名:エスアイアイ・ナノテクノロジー製TG/DTA7300)を用いて、200mL/minの窒素気流下、10℃/minの昇温速度の条件で、5%重量減少温度(Td 5)及び600℃における重量減少(残炭率)を測定した。
ガラス転移点(Tg)及び線膨張係数(CTE)の測定は、熱機械測定装置(装置名:エスアイアイ・ナノテクノロジー製TMA/SS7100)を用いて、200mL/minの窒素気流下、5℃/minの昇温速度で求めた。Tgは、線膨張係数の変化する変曲点より求めた。CTEは、40〜60℃における試験片の寸法変化より算出した。
成形性の判定は、トランスファー成型機にて曲げ試験片を作成した際に、膨れやクラックのない均一な試験片が得られたものを○とし、そうではないものを×とした。
これら測定により得られた結果を表2に示した。配合の比率はモル比とする。
The heat stability test and transfer moldability evaluation were implemented about the cured | curing material test piece obtained by the above Example and the comparative example.
The heat resistance evaluation is performed under the conditions of a temperature rising rate of 10 ° C./min under a nitrogen stream of 200 mL / min using a differential thermal thermal gravimetry simultaneous measuring apparatus (apparatus name: TG / DTA7300 manufactured by SII Nano Technology). The 5% weight loss temperature (T d 5 ) and the weight loss at 600 ° C. (residual carbon percentage) were measured.
The glass transition temperature (Tg) and the coefficient of linear expansion (CTE) were measured at 5 ° C. under a nitrogen stream of 200 mL / min using a thermomechanical measuring device (device name: TM / SS7100 manufactured by SII Nano Technology). It calculated | required by the temperature increase rate of min. Tg was determined from the inflection point at which the linear expansion coefficient changes. CTE was computed from the dimensional change of the test piece in 40-60 degreeC.
When a bending test piece was produced by a transfer molding machine, the formability was evaluated as ○ when a uniform test piece without blisters and cracks was obtained, and as × when not.
The results obtained by these measurements are shown in Table 2. The ratio of the formulation is the molar ratio.
Claims (6)
The bismaleimide compound represented by following General formula (1).
An imide composition comprising the bismaleimide compound according to claim 1 and a maleimide compound represented by the following general formula (2).
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