JP6494912B2 - 1つ以上の遠位アセンブリ内に配設された異なる長さの多重スパインを備えたカテーテル - Google Patents
1つ以上の遠位アセンブリ内に配設された異なる長さの多重スパインを備えたカテーテル Download PDFInfo
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- JP6494912B2 JP6494912B2 JP2014000805A JP2014000805A JP6494912B2 JP 6494912 B2 JP6494912 B2 JP 6494912B2 JP 2014000805 A JP2014000805 A JP 2014000805A JP 2014000805 A JP2014000805 A JP 2014000805A JP 6494912 B2 JP6494912 B2 JP 6494912B2
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Description
(1) カテーテルであって、
細長いカテーテル本体と、
前記カテーテル本体の遠位の遠位アセンブリであって、少なくとも2つのスパインを備え、それぞれのスパインは、前記カテーテル本体の前記遠位端及び自由遠位端に取り付けられる近位端を有する、遠位アセンブリと、を備え、
それぞれのスパインが、
形状記憶を有する支持アームと、
前記支持アームと包囲関係にある非導電性被覆と、
少なくとも1つの電極と、を備え、
前記少なくとも2つのスパインのそれぞれは、それぞれ異なる長さを有する、カテーテル。
(2) 前記少なくとも1つの電極が、前記スパインの遠位端において又はその近くに搭載され、前記支持アームから電気的に絶縁される、実施態様1に記載のカテーテル。
(3) 前記少なくとも1つの電極が、前記非導電性被覆に包囲関係で搭載された少なくとも1つの環電極を含む、実施態様1に記載のカテーテル。
(4) それぞれの支持アームがニチノールを含む、実施態様1に記載のカテーテル。
(5) 前記遠位アセンブリが、それぞれのスパインが前記カテーテル本体から放射状外向きに延在する伸張された配設と、それぞれのスパインが前記カテーテル本体の長手方向軸に概して沿って配置される畳み込まれた配設との間で移動可能である、実施態様1に記載のカテーテル。
(7) 前記遠位アセンブリがその伸張された配設にあるとき、それぞれのスパインが前記カテーテル本体から放射状外向きに延在し、実質的に真っ直ぐな線を形成する、実施態様5に記載のカテーテル。
(8) 前記遠位端が、管状領域の内側組織表面に沿って螺旋のパターンを描くように適合される、実施態様1に記載のカテーテル。
(9) 前記螺旋のパターンが、約180度〜360度の範囲である、実施態様8に記載のカテーテル。
(10) 前記スパインを偏向するためのカム表面を有するプランジャを更に備える、実施態様8に記載のカテーテル。
細長いカテーテル本体と、
前記カテーテル本体の遠位の第1の遠位アセンブリ及び前記第1のアセンブリの遠位の第2の遠位アセンブリであって、前記第1の遠位アセンブリ及び第2の遠位アセンブリのそれぞれが搭載アセンブリ及び少なくとも2つのスパインを備え、それぞれのスパインは前記搭載アセンブリ及び自由遠位端に取り付けられる近位端を有する、第1の遠位アセンブリ及び第2の遠位アセンブリと、を備え、
それぞれのスパインが、
形状記憶を有する支持アームと、
前記支持アームと包囲関係にある非導電性被覆と、
少なくとも1つの電極と、を備え、
遠位アセンブリのそれぞれのスパインが異なる長さを有する、カテーテル。
(12) 前記第2の遠位アセンブリが、前記第1の遠位アセンブリの前記搭載アセンブリから延在する概して真っ直ぐな近位部分を有する、実施態様11に記載のカテーテル。
(13) 前記概して真っ直ぐな近位部分が、前記第1の遠位アセンブリの前記搭載アセンブリへの定着した関連性を有する、実施態様11に記載のカテーテル。
(14) 前記概して真っ直ぐな近位部分が、前記第1の遠位アセンブリの前記搭載アセンブリに対する入れ子式の動きに適合される、実施態様11に記載のカテーテル。
(15) 前記第1の遠位アセンブリ及び前記第2の遠位アセンブリの前記スパインの前記遠位端が、概して螺旋のパターンを描く、実施態様11に記載のカテーテル。
(17) 前記第1のアセンブリ及び前記第2のアセンブリの前記スパインの前記遠位端が、複数の周径を管状領域の内側組織表面に沿って描く、実施態様11に記載のカテーテル。
(18) 前記第2の遠位アセンブリの前記概して真っ直ぐな近位部分が、前記第1の遠位アセンブリの前記スパインを偏向するように適合されるカム表面を有するプランジャを含む、実施態様11に記載のカテーテル。
(19) 前記遠位アセンブリのそれぞれが、少なくとも5つのスパインを有する、実施態様11に記載のカテーテル。
(20) 前記遠位アセンブリのうち少なくとも1つが、一体型支持構造体(unibody support structure)を有する、実施態様11に記載のカテーテル。
Claims (19)
- カテーテルであって、
細長いカテーテル本体と、
前記カテーテル本体の遠位の遠位アセンブリであって、少なくとも2つのスパインを備え、それぞれのスパインは、前記カテーテル本体の遠位端に取り付けられる近位端、及び自由遠位端を有する、遠位アセンブリと、を備え、
それぞれのスパインが、
形状記憶を有する支持アームと、
前記支持アームと包囲関係にある非導電性被覆と、
少なくとも1つの電極と、を備え、
前記少なくとも2つのスパインのそれぞれは、異なる長さを有し、
前記少なくとも2つのスパインの遠位端が、管状領域の内側組織表面に沿って螺旋のパターンを描くように適合される、カテーテル。 - 前記少なくとも1つの電極が、前記スパインの遠位端において又はその近くに搭載され、前記支持アームから電気的に絶縁される、請求項1に記載のカテーテル。
- 前記少なくとも1つの電極が、前記非導電性被覆に包囲関係で搭載された少なくとも1つの環電極を含む、請求項1に記載のカテーテル。
- それぞれの支持アームがニチノールを含む、請求項1に記載のカテーテル。
- 前記遠位アセンブリが、それぞれのスパインが前記カテーテル本体から放射状外向きに延在する伸張された配設と、それぞれのスパインが前記カテーテル本体の長手方向軸に概して沿って配置される畳み込まれた配設との間で移動可能である、請求項1に記載のカテーテル。
- 前記遠位アセンブリがその伸張された配設にあるとき、それぞれのスパインが前記カテーテル本体から放射状外向きに延在し、湾曲した形状を形成する、請求項5に記載のカテーテル。
- 前記遠位アセンブリがその伸張された配設にあるとき、それぞれのスパインが前記カテーテル本体から放射状外向きに延在し、実質的に真っ直ぐな線を形成する、請求項5に記載のカテーテル。
- 前記螺旋のパターンが、180度〜360度の範囲である、請求項1に記載のカテーテル。
- 前記スパインを偏向するためのカム表面を有するプランジャを更に備える、請求項1に記載のカテーテル。
- 請求項1に記載のカテーテルであって、
前記遠位アセンブリが第1の遠位アセンブリであり、
前記カテーテルが、前記第1の遠位アセンブリの遠位の第2の遠位アセンブリを更に備え、
前記第1の遠位アセンブリ及び第2の遠位アセンブリのそれぞれが搭載アセンブリを備え、
前記第2の遠位アセンブリが少なくとも2つのスパインを備え、それぞれのスパインは近位端、及び自由遠位端を有し、
前記第1の遠位アセンブリ及び第2の遠位アセンブリの前記近位端は前記搭載アセンブリに取り付けられ、
前記第2の遠位アセンブリのそれぞれのスパインが、
形状記憶を有する支持アームと、
前記支持アームと包囲関係にある非導電性被覆と、
少なくとも1つの電極と、を備え、
前記第2の遠位アセンブリのそれぞれのスパインが異なる長さを有する、カテーテル。 - 前記第2の遠位アセンブリが、前記第1の遠位アセンブリの前記搭載アセンブリから延在する概して真っ直ぐな近位部分を有する、請求項10に記載のカテーテル。
- 前記概して真っ直ぐな近位部分が、前記第1の遠位アセンブリの前記搭載アセンブリへの定着した関連性を有する、請求項11に記載のカテーテル。
- 前記概して真っ直ぐな近位部分が、前記第1の遠位アセンブリの前記搭載アセンブリに対する入れ子式の動きに適合される、請求項11に記載のカテーテル。
- 前記第2の遠位アセンブリの前記少なくとも2つのスパインの前記遠位端が、概して螺旋のパターンを描く、請求項10に記載のカテーテル。
- 前記第1の遠位アセンブリの前記スパインの前記遠位端が、前記螺旋のパターンを0度〜360度描き、前記第2の遠位アセンブリの前記スパインの前記遠位端が、前記概して螺旋のパターンを360度〜720度描く、請求項14に記載のカテーテル。
- 前記第1の遠位アセンブリ及び前記第2の遠位アセンブリの前記スパインの前記遠位端が、複数の周径を管状領域の内側組織表面に沿って描く、請求項10に記載のカテーテル。
- 前記第2の遠位アセンブリの前記概して真っ直ぐな近位部分が、前記第1の遠位アセンブリの前記スパインを偏向するように適合されるカム表面を有するプランジャを含む、請求項11に記載のカテーテル。
- 前記遠位アセンブリのそれぞれが、少なくとも5つのスパインを有する、請求項10に記載のカテーテル。
- 前記遠位アセンブリのうち少なくとも1つが、一体型支持構造体を有する、請求項10に記載のカテーテル。
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