JP6485627B2 - Exposure apparatus and exposure method - Google Patents

Description

  The present invention relates to an exposure apparatus and an exposure method. More specifically, the present invention relates to a mask pattern on a workpiece by exposing the workpiece coated with a photosensitive agent by irradiating exposure light through a mask having a mask pattern formed thereon. The present invention relates to an exposure apparatus and an exposure method for transferring the image.

Conventionally, an illumination optical system having a plurality of light source units, an exposure control shutter, an integrator lens, and a collimation mirror is provided, and a plurality of light sources are measured based on a gap distribution between a mask and a substrate measured by a gap sensor. A proximity exposure apparatus and an exposure method are disclosed in which the illuminance variation on the exposure surface due to the gap distribution is reduced by controlling the illuminance of the light source unit (see, for example, Patent Document 1).
As another proximity exposure apparatus, it is known that a mirror bending mechanism for correcting the curvature of a reflecting mirror provided in the illumination optical system is provided, and an exposure pattern is corrected by mirror bending to obtain a highly accurate exposure result. It has been.

JP 2013-97310 A

  By the way, when the curvature of the reflecting mirror is corrected by the mirror bending mechanism, the illuminance distribution on the exposure surface is deteriorated, which may affect the exposure accuracy. The proximity exposure apparatus described in Patent Document 1 is an apparatus that controls the illuminance of the light source unit based on the gap distribution between the mask and the substrate to suppress variations in illuminance on the exposure surface, and corrects the curvature of the reflecting mirror. The deterioration of the illuminance distribution due to the above is not taken into consideration.

  The present invention has been made in view of the above-described problems, and an object of the present invention is to control the illuminance of a plurality of light source units based on the curvature correction of the reflecting mirror, thereby illuminance distribution on the exposure surface by mirror bending. It is an object of the present invention to provide an exposure apparatus and an exposure method that can suppress the deterioration of the exposure.

The above object of the present invention can be achieved by the following constitution.
(1) a work support part for supporting the work;
A mask support for supporting the mask;
An illumination optical system having a plurality of light sources and a reflecting mirror that reflects exposure light from the light sources;
A mirror bending mechanism capable of correcting the curvature of the reflecting mirror;
An exposure apparatus that irradiates the work with exposure light from the light source through the mask and transfers the pattern of the mask to the work,
A control device capable of controlling the irradiation intensity of the light source;
The control device controls the irradiation intensity of the plurality of light sources on the basis of an illuminance distribution obtained by correcting the curvature of the reflecting mirror in a state in which light having a substantially uniform illuminance is irradiated from the plurality of light sources. An exposure apparatus for controlling the illuminance of the exposure light irradiated to the surface.
(2) The control device includes storage means for storing a plurality of illuminance distributions according to a plurality of lighting patterns when the plurality of light sources are turned on or off.
The control device includes a plurality of lighting patterns respectively corresponding to the plurality of illuminance distributions based on the illuminance distribution obtained by correcting the curvature of the reflecting mirror in a state where light having substantially uniform illuminance is irradiated from the plurality of light sources. The exposure apparatus according to (1), wherein irradiation intensity of the plurality of light sources is controlled in accordance with a desired lighting pattern to be selected or calculated.
(3) The illumination optical system includes an integrator in which a plurality of lenses are arranged in a matrix between the light source and the reflecting mirror,
Lens of the integrator, in the longitudinal direction 3 or more 7 or less, claims, characterized in that arranged to laterally arranged in three or more 7 or less (1) or (2) the exposure according apparatus.
(4) Using the exposure apparatus according to any one of (1) to (3) , the work is irradiated with exposure light from the light source through the mask, and the pattern of the mask is transferred to the work. An exposure method comprising:
Correcting the curvature of the reflecting mirror by the mirror bending mechanism;
Controlling the irradiation intensity of the plurality of light sources by the control device based on the illuminance distribution by the curvature correction of the reflecting mirror in a state in which light of substantially uniform illuminance is irradiated from the plurality of light sources;
And an illuminance of the exposure light applied to the workpiece is controlled.

According to the exposure apparatus and the exposure method of the present invention, the control device includes a plurality of light sources based on an illuminance distribution obtained by correcting the curvature of the reflecting mirror in a state where light having a substantially uniform illuminance is emitted from the plurality of light sources. By controlling the irradiation intensity of each, the deterioration of the illuminance distribution on the exposure surface due to mirror bending correction can be suppressed, and the exposure accuracy can be improved.

It is a front view of the exposure apparatus which concerns on this invention. It is a figure which shows the structure of the illumination optical system which concerns on this invention. It is a front view of the cassette with which the several light source part was attached. It is a front view of the flame | frame with which the some cassette shown in FIG. 3 was attached. It is the schematic which shows the distance from the output surface of each light source part to the entrance surface of an integrator. It is a figure for showing the control composition of each light source part. (A) is a top view which shows the reflecting mirror support structure of an illumination optical system, (b) is sectional drawing along the VII-VII line of (a), (c) is VII of (a). It is sectional drawing along a '-VII' line. (A) is a figure which shows the illumination intensity in the exposure surface of each light source part at the time of radiate | emitting the light of substantially uniform illumination intensity from a light source part, (b) is a figure which shows the image of the whole illumination intensity in an exposure surface. It is. (A) is a figure which shows the illumination intensity in the exposure surface of each light source part at the time of raising the illumination intensity of a part of light source part, (b) is a figure which shows the image of the whole illumination intensity in an exposure surface. . It is a figure which shows the relationship between the position of a lighting lamp, and illumination intensity, (a) is when one lamp of an upper right corner is lighted, (b) is when all the lamps are lighted, (c) is upper left It is a figure at the time of turning off four lamps in the corner. It is a figure which shows the relationship between the position of a lighting lamp, and illumination intensity, (a) is a case where the lamp | ramp of 2 columns on the left is lighted, (b) is a case where four center lamps are extinguished, (c) These are figures at the time of lighting the lower two rows of lamps.

Hereinafter, an embodiment of an exposure apparatus according to the present invention will be described in detail with reference to the drawings. FIG. 1 shows an exposure apparatus according to the present invention.
As shown in FIG. 1, the proximity exposure apparatus PE uses a mask M smaller than a workpiece W as a material to be exposed, holds the mask M on a mask stage 1, and holds the workpiece W on a workpiece stage (work support unit) 2. The pattern of the mask M is irradiated by irradiating the mask M with light for pattern exposure from the illumination optical system 3 in a state where the mask M and the workpiece W are placed close to each other with a predetermined exposure gap. The exposure is transferred onto the workpiece W. Further, the work stage 2 is moved stepwise with respect to the mask M in the two axial directions of the X axis direction and the Y axis direction, and exposure transfer is performed for each step.

  In order to move the work stage 2 stepwise in the X-axis direction, an X-axis stage feed mechanism 5 for moving the X-axis feed base 5a stepwise in the X-axis direction is installed on the apparatus base 4. On the X-axis feed base 5a of the X-axis stage feed mechanism 5, a Y-axis stage feed mechanism 6 for moving the Y-axis feed base 6a stepwise in the Y-axis direction is installed in order to move the work stage 2 stepwise in the Y-axis direction. Has been. The work stage 2 is installed on the Y-axis feed base 6 a of the Y-axis stage feed mechanism 6. On the upper surface of the work stage 2, the work W is held in a state of being sucked by a work chuck or the like. Further, a substrate side displacement sensor 15 for measuring the lower surface height of the mask M is disposed on the side portion of the work stage 2. Therefore, the substrate side displacement sensor 15 can move in the X and Y axis directions together with the work stage 2.

  On the apparatus base 4, a plurality of (four in the embodiment shown in the figure) X-axis linear guide rails 51 are arranged in the X-axis direction, and each guide rail 51 has a lower surface of the X-axis feed base 5 a. A slider 52 fixed to the bridge is straddled. Thereby, the X-axis feed base 5 a is driven by the first linear motor 20 of the X-axis stage feed mechanism 5 and can reciprocate along the guide rail 51 in the X-axis direction. A plurality of guide rails 53 for Y-axis linear guides are arranged on the X-axis feed base 5a in the Y-axis direction. Each guide rail 53 has a slider 54 fixed to the lower surface of the Y-axis feed base 6a. Is straddled. Accordingly, the Y-axis feed base 6 a is driven by the second linear motor 21 of the Y-axis stage feed mechanism 6 and can reciprocate in the Y-axis direction along the guide rail 53.

  Between the Y-axis stage feed mechanism 6 and the work stage 2, since the work stage 2 is moved in the vertical direction, the vertical coarse motion device 7 having a relatively coarse positioning resolution but a large moving stroke and moving speed, and the vertical coarse motion Positioning with high resolution is possible compared with the apparatus 7, and a vertical fine movement apparatus 8 is provided for finely adjusting the gap between the opposing surfaces of the mask M and the work W to a predetermined amount by finely moving the work stage 2 up and down. .

  The vertical coarse movement device 7 moves the work stage 2 up and down with respect to the fine movement stage 6b by an appropriate drive mechanism provided on the fine movement stage 6b described later. The stage coarse movement shafts 14 fixed at four positions on the bottom surface of the work stage 2 are engaged with linear motion bearings 14a fixed to the fine movement stage 6b, and are guided in the vertical direction with respect to the fine movement stage 6b. In addition, it is desirable that the vertical coarse motion device 7 has high repeated positioning accuracy even if the resolution is low.

  The vertical fine movement device 8 includes a fixed base 9 fixed to the Y-axis feed base 6a, and a linear guide guide rail 10 attached to the fixed base 9 with its inner end inclined obliquely downward. A ball screw nut (not shown) is coupled to a slide body 12 that reciprocates along the guide rail 10 via a slider 11 straddling the guide rail 10, and an upper end surface of the slide body 12. Is in contact with the flange 12a fixed to the fine movement stage 6b so as to be slidable in the horizontal direction.

Then, when the screw shaft of the ball screw is rotationally driven by the motor 17 attached to the fixed base 9, the nut, the slider 11 and the slide body 12 are integrally moved along the guide rail 10 in an oblique direction. The flange 12a is finely moved up and down.
Note that the vertical fine movement device 8 may drive the slide body 12 by a linear motor instead of driving the slide body 12 by the motor 17 and the ball screw.

The vertical fine movement device 8 is installed on one end side (left end side in FIG. 1) in the Y-axis direction of the Z-axis feed base 6a and two on the other end side, for a total of three units, and each is independently driven and controlled. It has become so. Accordingly, the vertical fine movement device 8 independently finely adjusts the heights of the three flanges 12 a based on the measurement results of the gap amounts between the mask M and the workpiece W at a plurality of locations by the gap sensor 27, and the workpiece stage 2. Fine-tune the height and inclination of
In addition, when the height of the work stage 2 can be sufficiently adjusted by the vertical fine movement device 8, the vertical coarse movement device 7 may be omitted.

  On the Y-axis feed base 6a, a bar mirror 19 facing the Y-axis laser interferometer 18 that detects the position of the work stage 2 in the Y direction, and an X-axis laser that detects the position of the work stage 2 in the X-axis direction. A bar mirror (both not shown) facing the interferometer is installed. The bar mirror 19 facing the Y-axis laser interferometer 18 is arranged along the X-axis direction on one side of the Y-axis feed base 6a, and the bar mirror facing the X-axis laser interferometer is located on the Y-axis feed base 6a. It is arranged along the Y-axis direction on one end side.

  The Y-axis laser interferometer 18 and the X-axis laser interferometer are arranged so as to always face the corresponding bar mirrors and supported by the apparatus base 4. Two Y-axis laser interferometers 18 are installed apart from each other in the X-axis direction. The two Y-axis laser interferometers 18 detect the position of the Y-axis feed base 6a and consequently the work stage 2 in the Y-axis direction and the yawing error via the bar mirror 19. In addition, the X-axis laser interferometer detects the position of the X-axis feed base 5a and eventually the work stage 2 in the X-axis direction via the opposing bar mirror.

  The mask stage 1 is inserted in a X, Y, θ direction (in the X, Y plane) by inserting a mask base frame 24 composed of a substantially rectangular frame body and a gap into a central opening of the mask base frame 24. The mask base frame 24 is held at a fixed position above the work stage 2 by a support column 4a protruding from the apparatus base 4.

  A frame-shaped mask holder (mask support portion) 26 is provided on the lower surface of the central opening of the mask frame 25. That is, a plurality of mask holder suction grooves connected to a vacuum suction device (not shown) are provided on the lower surface of the mask frame 25, and the mask holder 26 is sucked to the mask frame 25 through the plurality of mask holder suction grooves. Retained.

  A plurality of mask suction grooves (not shown) are provided on the lower surface of the mask holder 26 for sucking the peripheral portion of the mask M on which the mask pattern is not drawn. The mask M passes through the mask suction grooves. Then, it is detachably held on the lower surface of the mask holder 26 by a vacuum suction device (not shown).

  As shown in FIG. 2, the illumination optical system 3 of the exposure apparatus PE of this embodiment includes, for example, a high-pressure mercury lamp 61 that is a light source for ultraviolet irradiation, and a reflector that collects light emitted from the high-pressure mercury lamp 61. A light irradiation device 80 having a plurality of lamp units 60 (see FIG. 3) each having 62, a plane mirror 63 for changing the direction of the optical path EL, an exposure control shutter unit 64 for controlling opening and closing of the irradiation optical path, and an exposure. An optical integrator 65 that is arranged downstream of the control shutter unit 64 and emits the light collected by the reflector 62 so as to have as uniform an illuminance distribution as possible in the irradiation region, and an optical path EL emitted from the optical integrator 65 The light from the plane mirror 66 for changing the direction of the light and the high-pressure mercury lamp 61 is made into parallel light. Comprises a collimation mirror 67 to be irradiated, a plane mirror 68 for irradiating the the parallel light to the mask M, the. Note that a DUV cut filter, a polarization filter, and a band pass filter may be disposed between the optical integrator 65 and the exposure surface. Further, the light source may be a single lamp as a high-pressure mercury lamp, or may be constituted by an LED.

  When the exposure control shutter unit 64 is controlled to be opened during exposure, the light emitted from the lamp unit 60 passes through the plane mirror 63, the optical integrator 65, the plane mirror 66, the collimation mirror 67, and the plane mirror 68. The mask M held by the mask holder 26 and the surface of the workpiece W are irradiated as light for pattern exposure, and the exposure pattern of the mask M is exposed and transferred onto the workpiece W.

  As shown in FIGS. 3 and 4, the light irradiation device 80 includes a total of 24 cassettes 81 with six lamp units 60 in the α direction and four stages in the β direction. Nine of them are attached to the support 82 and are composed of a total of 216 lamp units 60. In the lamp unit 60 of the present embodiment, the opening of the reflector 62 is formed in a substantially square shape, and the four sides are arranged along the α and β directions.

  As shown in FIG. 5, the lamp unit 60 has an intersection point p between the irradiation surface (here, the opening surface 62 a of the reflector 62) that irradiates the light of the lamp unit 60 and the optical axis L of the lamp unit 60. , Β is attached to the cassette 81 so as to be positioned on a single curved surface, for example, a spherical surface r. Further, in the cassette 81, the intersection point p between the irradiation surface for irradiating the light of all the lamp units 60 and the optical axis L of the lamp unit 60 is on a single curved surface, for example, a spherical surface r in each α and β directions. It is attached to the support body 82 so as to intersect at a predetermined angle γ. Therefore, the distance of each optical axis L from each irradiation surface irradiated with the light of all lamp units 60 positioned on the support 82 to the incident surface of the optical integrator 65 on which the light of the lamp unit 60 is incident is substantially constant. It becomes. Further, the optical axes L of all the lamp units 60 intersect at the optical integrator 65.

  Further, as shown in FIG. 6, a lighting power source 95 and a control circuit 96 for supplying power to the high-pressure mercury lamp 61 are individually connected to the lamp units 60 of the respective cassettes 81, and rearward from the respective lamp units 60. Each extending wiring 97 is connected to and integrated with at least one connector 98 provided in each cassette 81. The connector 98 of each cassette 81 and the optical control unit 77 provided outside the support 82 are connected by another wiring 99, respectively. As a result, the optical control unit 77 transmits a control signal to the control circuit 96 of each high-pressure mercury lamp 61, and performs voltage control for adjusting the voltage, including turning on and off, for each high-pressure mercury lamp 61.

  The lighting power supply 95 and the control circuit 96 of each lamp unit 60 may be provided collectively in the cassette 81 or may be provided outside the cassette 81. Further, although the lighting power supply 95 and the control circuit 96 are provided for each lamp unit 60, one lamp power supply may be provided for each cassette 81, and each lamp unit 60 in the cassette 81 may be managed collectively.

  As shown in FIG. 7, the plane mirror 68 is made of a glass material formed in a rectangular shape when viewed from the front. The plane mirror 68 is supported on the mirror deformation unit holding frame 71 by a plurality of mirror deformation units (mirror bending mechanisms) 70 provided on the back side of the plane mirror 68.

  Each mirror deformation unit 70 includes a pad 72 that is fixed to the back surface of the flat mirror 68 with an adhesive, a support member 73 that is fixed to the pad 72 at one end, and an actuator 74 that is a drive device that drives the support member 73. Is provided.

  The support member 73 is provided with a ball joint 76 as a bending mechanism that allows bending of ± 0 · 5 deg or more at a position close to the pad 72 with respect to the holding frame 71, and is opposite to the holding frame 71. An actuator 74 is attached to the other end.

  Further, a plurality of contact sensors 83 are attached to the back surface of each position of the flat mirror 68 that reflects the exposure light at the position of an alignment mark (not shown) on the mask side.

  Thereby, the plane mirror 68 senses the displacement amount of the plane mirror 68 by the contact sensor 83 based on a command from the mirror control unit 94 connected to each actuator 74 by the signal line 91 (see FIG. 2). By driving the actuator 74 of each mirror deformation unit 70 and changing the length of each support member 73, the curvature of the plane mirror 68 is locally corrected, and the declination angle of the plane mirror 68 is corrected. Can do.

  At this time, each mirror deformation unit 70 is provided with a ball joint 76, so that the portion on the support side can be rotated three-dimensionally, and each pad 72 is placed on the surface of the plane mirror 68. Can be tilted along. For this reason, the adhesive peeling between each pad 72 and the plane mirror 68 is prevented, and the stress of the plane mirror 68 between the pads 72 having different movement amounts is suppressed, and the average fracture stress value is made of a small glass material. Even when the curvature of the plane mirror 68 is locally corrected, the plane mirror 68 can be bent on the order of 10 mm without damaging the plane mirror 68, and the curvature can be greatly changed.

  In the exposure apparatus PE configured as described above, when the exposure control shutter unit 64 is controlled to be opened during exposure in the illumination optical system 3, the light emitted from the high-pressure mercury lamp 61 is reflected by the plane mirror 63. The light is incident on the incident surface of the integrator 65. Then, the light emitted from the exit surface of the integrator 65 is converted into parallel light by the plane mirror 66, the collimation mirror 67, and the plane mirror 68 while the traveling direction thereof is changed. Then, this parallel light is irradiated as light for pattern exposure substantially perpendicularly to the surface of the mask M held on the mask stage 1 and further the work W held on the work stage 2, and the pattern P of the mask M is irradiated. Is transferred onto the workpiece W by exposure.

  Here, when a drive signal is transmitted from the mirror controller 94 to each actuator 74 of the plane mirror 68 in order to correct the pattern of the mask M exposed and transferred onto the work W in accordance with the pattern of the work W, The actuator 74 of the mirror deformation unit 70 corrects the declination angle of the plane mirror 68 by changing the length of each support member 73 to locally correct the curvature of the plane mirror 68.

  At this time, the illuminance of the exposure light applied to the mask M also locally changes due to the local curvature correction of the plane mirror 68. That is, the illuminance distribution on the exposure surface is not uniform, which may affect the exposure accuracy of the workpiece W. Specifically, the plane mirror 68 is pushed from the back surface by the actuator 74 and the reflection surface of the plane mirror 68 becomes convex, so that the reflected light diffuses and the illuminance decreases (darkens). In addition, in the portion where the back surface of the plane mirror 68 is pulled by the actuator 74 and the reflection surface of the plane mirror 68 is concave, the reflected light converges and the illuminance increases (becomes brighter).

  The exposure apparatus PE of the present embodiment adjusts the voltage of each high-pressure mercury lamp 61 including turning on and off from the optical control unit 77 based on the curvature correction of the plane mirror 68 by the mirror deformation unit 70. To correct the illuminance distribution. The optical control unit 77 increases the irradiation intensity of the high-pressure mercury lamp 61 when the actuator 74 pushes the flat mirror 68 from the back surface to make the reflection surface convex, and the actuator 74 pulls the flat mirror 68 from the back surface to make the reflection surface concave. In order to make it uniform, the irradiation intensity of the high-pressure mercury lamp 61 is lowered to make the illuminance distribution uniform on the exposure surface.

  For example, as shown in FIG. 8, when light having substantially uniform illuminance is irradiated from a plurality of lamp units 60 (for example, four lamp units 60a,..., 60d), Each of these illuminances is also uniform, and the light distribution is uniformed by overlapping these lights (FIG. 8B).

  On the other hand, as shown in FIG. 9, when the power of a part of the plurality of lamp units 60 (for example, the four lamp units 60a,..., 60d) is increased (for example, the lamp unit 60b), The illuminance of the light emitted to the exposure surface through the integrator 65 also increases, and the illuminance distribution on the exposure surface changes (FIG. 9B).

  When the number of lenses (number of eyes) arranged in a matrix of the integrator 65 increases, the light from the lamp unit 60 with increased illuminance is also averaged by the integrator 65, and the change in illuminance distribution on the exposure surface also occurs. Get smaller. For this reason, the lenses for effectively correcting the illuminance distribution by turning on and off the lamp unit 60 are arranged in a line of 3 to 7 in the vertical direction and 3 to 7 in the horizontal direction. (Ie, the number of lenses is 9 to 49), more preferably 5 or less in the vertical direction and 5 or less in the horizontal direction.

  The optical control unit 77 stores, in a storage unit (not shown), a relationship between a plurality of lighting patterns and a plurality of illuminance distributions respectively corresponding to the plurality of lighting patterns when the plurality of lamp units 60 are turned on or off. I remember it.

  10 and 11 show the relationship between the lighting patterns of the plurality of lamp units 60 stored in the optical control unit 77 and the plurality of illuminance distributions corresponding thereto. In addition, here, in order to simplify the description, it is assumed that the lamp unit 60 has a total of 16 lamp units 60 each having four vertical and horizontal lines.

FIG. 10A shows the illuminance distribution F when one lamp in the upper right corner is turned on. FIG. 10B shows the illuminance distribution F when all the 16 lamps are turned on, and FIG. 10C shows the illuminance distribution F when the four lamps at the upper left corner are turned off. Further, FIG. 11A shows a case where the left two vertical lamps are turned on, FIG. 11B shows a case where the central four lamps are turned off, and FIG. 11C shows a lower two rows of lamps. Is the respective illuminance distribution F when. The relationship between the lighting pattern LP of the lamp unit 60 and the illuminance distribution F stored in the optical control unit 77 is not limited to the six patterns described above, and can be arbitrarily set.
In the case of the present embodiment, a predetermined number of lighting patterns LP of 216 lamp units 60 and a plurality of illuminance distributions F corresponding thereto are stored in the storage means.
Further, the control of the irradiation intensity of the plurality of lamp units 60 may be performed for each cassette 81. Therefore, a plurality of lighting patterns LP controlled for each cassette 81 and a plurality of illuminance distributions F corresponding thereto are provided. You may memorize | store in a memory | storage means.

  The optical control unit 77 is an illuminance meter (not shown) showing the illuminance distribution when the curvature of the plane mirror 68 is locally corrected by the mirror deformation unit 70 in a state where light having a substantially uniform illuminance is irradiated from the plurality of lamp units 60. Use to get. Based on the result of the illuminance distribution, a desired lighting pattern selected or calculated from the plurality of lighting patterns LP respectively corresponding to the plurality of illuminance distributions F is determined, and a plurality of illuminance distributions are made uniform. The irradiation intensity of the lamp unit 60 is controlled.

  As another method, the optical control unit 77 determines the irradiation intensity of each lamp unit 60 for each driving state of each actuator 74 of the mirror deformation unit 70, and from the driving state of all actuators 74, By determining the irradiation intensity of each lamp unit 60 by calculation, the illuminance distribution may be made uniform.

  Alternatively, the illuminance distribution in the driving state of the plurality of actuators 74 is acquired in a state where light having substantially uniform illuminance is irradiated from the plurality of lamp units 60, and the storage unit stores the illuminance distribution based on the illuminance distribution F. A desired lighting pattern to be selected or calculated from the plurality of lighting patterns LP respectively corresponding to the plurality of illuminance distributions stored is determined, and the irradiation intensity of the plurality of lamp units 60 is controlled so that the illuminance distribution is uniform. .

  The lighting pattern LP may be selected based on the driving force of the plurality of actuators 74 as described above, or may be selected based on the amount of displacement of the plane mirror 68 measured by the contact sensor 83. Good.

  As described above, according to the exposure apparatus PE of the present embodiment, the illumination optical system 3 having the plurality of lamp units 60 and the plane mirror 68 that reflects the exposure light from the lamp unit 60 has the curvature of the plane mirror 68. A mirror deformation unit 70 capable of correcting the light intensity, and an optical control unit 77 capable of controlling the irradiation intensity of the lamp unit 60. The optical control unit 77 has a curvature correction magnitude of the plane mirror 68 by the mirror deformation unit 70. Based on this, the irradiation intensity of the lamp unit 60 is controlled to control the illuminance of the exposure light irradiated onto the workpiece W. Therefore, by controlling the illuminance of the plurality of lamp units 60 according to the curvature correction of the plane mirror 68 by the mirror deformation unit 70, the illuminance distribution on the exposure surface accompanying the pattern correction of the mask M by the mirror deformation unit 70 is controlled. Deterioration can be suppressed and exposure accuracy can be improved.

  Further, the optical control unit 77 is based on the illuminance distribution obtained by correcting the curvature of the plane mirror 68 in a state where light having a substantially uniform illuminance is irradiated from the plurality of lamp units 60, or the plurality of actuators of the mirror deformation unit 70. Since the irradiation intensity of the lamp unit 60 is controlled on the basis of the drive amount of 74 to control the illuminance of the exposure light irradiated to the workpiece, the irradiation intensity of each lamp unit 60 can be controlled relatively easily. In addition, the irradiation distribution on the exposure surface can be made uniform.

  The optical control unit 77 includes a plurality of illuminance distributions F corresponding to a plurality of lighting patterns LP when the plurality of lamp units 60 are turned on or off, and based on the curvature correction of the plane mirror 68 by the mirror deformation unit 70. Since the irradiation intensity of the lamp unit 60 is controlled in accordance with a desired lighting pattern selected or calculated from a plurality of lighting patterns LP respectively corresponding to the plurality of illuminance distributions F, the irradiation distribution on the exposure surface is made uniform. Can do.

  Further, the illumination optical system 3 includes an integrator 65 in which a plurality of lenses are arranged in a matrix between the lamp unit 60 and the plane mirror 68, and the integrator 65 has three or more lenses in the vertical direction and three to seven in the horizontal direction. Since they are arranged in the direction of 3 or more and 7 or less in the direction, the illumination distribution on the exposure surface can be effectively changed by changing the illuminance of some of the lamp units 60 among the plurality of lamp units 60. can do.

  And a step of correcting the curvature of the plane mirror 68 by the mirror deformation unit 70 and a step of controlling the irradiation intensity of the lamp unit 60 by the optical control unit 77 in accordance with the curvature correction of the plane mirror 68. Since the illuminance of the exposure light irradiated onto the mask is controlled, deterioration of the illuminance distribution on the exposure surface due to the pattern correction of the mask M by the mirror deformation unit 70 can be suppressed, and the exposure accuracy can be improved.

  In addition, this invention is not limited to embodiment mentioned above, A deformation | transformation, improvement, etc. are possible suitably. For example, in the above-described embodiment, the lighting pattern LP for turning on or off the plurality of lamp units 60 has been described. However, the lighting pattern LP is not limited to the lighting or turning off of the lamp units 60, and the voltage supplied to each lamp unit 60 is adjusted. The irradiation illuminance of each lamp unit 60 may be changed.

  In the above embodiment, the pattern of the mask M is corrected by changing the curvature of the plane mirror 68. However, the pattern correction of the mask M is not limited to the plane mirror 68, and is a curved mirror (concave mirror, convex mirror). ). In this case, when the mirror deformation unit 70 acts in the direction to increase the curvature of the curved mirror, the irradiation intensity of the lamp unit 60 is increased, and when the mirror deformation unit 70 acts in the direction to decrease the curvature of the curved mirror, the lamp unit 60 irradiation intensity is lowered.

1 Mask stage (mask support part)
2 Work stage (work support part)
3 Illumination optical system 60, 60a, ..., 60d Lamp unit (light source)
65 Optical integrator (integrator)
68 Flat mirror
70 Mirror deformation unit (mirror bending mechanism)
74 Actuator 77 Optical Control Unit (Control Device)
94 Mirror controller F Illuminance distribution LP Lighting pattern M Mask P Mask pattern PE Proximity exposure device W Workpiece

Claims (4)

A workpiece support section for supporting the workpiece;
A mask support for supporting the mask;
An illumination optical system having a plurality of light sources and a reflecting mirror that reflects exposure light from the light sources;
A mirror bending mechanism capable of correcting the curvature of the reflecting mirror;
An exposure apparatus that irradiates the work with exposure light from the light source through the mask and transfers the pattern of the mask to the work,
A control device capable of controlling the irradiation intensity of the light source;
The control device controls the irradiation intensity of the plurality of light sources on the basis of an illuminance distribution obtained by correcting the curvature of the reflecting mirror in a state in which light having a substantially uniform illuminance is irradiated from the plurality of light sources. An exposure apparatus for controlling the illuminance of the exposure light irradiated to the surface. The control device includes storage means for storing a plurality of illuminance distributions according to a plurality of lighting patterns when the plurality of light sources are turned on or off.
The control device includes a plurality of lighting patterns respectively corresponding to the plurality of illuminance distributions based on the illuminance distribution obtained by correcting the curvature of the reflecting mirror in a state where light having substantially uniform illuminance is irradiated from the plurality of light sources. 2. The exposure apparatus according to claim 1, wherein irradiation intensity of the plurality of light sources is controlled in accordance with a desired lighting pattern to be selected or calculated. The illumination optical system includes an integrator in which a plurality of lenses are arranged in a matrix between the light source and the reflecting mirror,
Lens of the integrator, vertically three or more 7 or less, the exposure apparatus according to claim 1 or 2, characterized in that it is arranged side by side in the horizontal direction by three or more 7 or less. Using an exposure apparatus according to any one of claims 1 to 3 and the pattern of the mask with exposure light from the light source irradiating the workpiece through the mask in an exposure method of transferring the workpiece There,
Correcting the curvature of the reflecting mirror by the mirror bending mechanism;
Controlling the irradiation intensity of the plurality of light sources by the control device based on the illuminance distribution by the curvature correction of the reflecting mirror in a state in which light of substantially uniform illuminance is irradiated from the plurality of light sources;
And an illuminance of the exposure light applied to the workpiece is controlled.

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