JP6446457B2 - ガスのシロキサン含有量を求めるための方法および装置 - Google Patents
ガスのシロキサン含有量を求めるための方法および装置 Download PDFInfo
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- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 title claims description 103
- 238000000034 method Methods 0.000 title claims description 63
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 claims description 102
- 239000007789 gas Substances 0.000 claims description 84
- 238000010521 absorption reaction Methods 0.000 claims description 65
- 229910002092 carbon dioxide Inorganic materials 0.000 claims description 51
- 239000001569 carbon dioxide Substances 0.000 claims description 49
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 claims description 36
- 238000004458 analytical method Methods 0.000 claims description 13
- 230000000694 effects Effects 0.000 claims description 12
- 238000005286 illumination Methods 0.000 claims description 9
- 125000004122 cyclic group Chemical group 0.000 claims description 8
- 238000000746 purification Methods 0.000 claims description 8
- 239000003345 natural gas Substances 0.000 claims description 7
- 238000002347 injection Methods 0.000 claims description 6
- 239000007924 injection Substances 0.000 claims description 6
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 2
- 229910052799 carbon Inorganic materials 0.000 claims description 2
- 238000005259 measurement Methods 0.000 description 45
- -1 siloxanes Chemical class 0.000 description 25
- 238000000862 absorption spectrum Methods 0.000 description 9
- 238000002835 absorbance Methods 0.000 description 8
- 150000001875 compounds Chemical class 0.000 description 7
- 238000005033 Fourier transform infrared spectroscopy Methods 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- 230000029087 digestion Effects 0.000 description 4
- 239000000446 fuel Substances 0.000 description 4
- 230000031700 light absorption Effects 0.000 description 4
- 238000012544 monitoring process Methods 0.000 description 4
- 230000003287 optical effect Effects 0.000 description 4
- 230000002829 reductive effect Effects 0.000 description 4
- 230000035945 sensitivity Effects 0.000 description 4
- 230000001276 controlling effect Effects 0.000 description 3
- 238000001514 detection method Methods 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 238000001228 spectrum Methods 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 238000000295 emission spectrum Methods 0.000 description 2
- 230000006870 function Effects 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 230000002452 interceptive effect Effects 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 238000001745 non-dispersive infrared spectroscopy Methods 0.000 description 2
- 150000003961 organosilicon compounds Chemical class 0.000 description 2
- 230000036961 partial effect Effects 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 238000005070 sampling Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 239000010865 sewage Substances 0.000 description 2
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 2
- 229910010271 silicon carbide Inorganic materials 0.000 description 2
- 230000003595 spectral effect Effects 0.000 description 2
- 238000004611 spectroscopical analysis Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 239000002699 waste material Substances 0.000 description 2
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical compound S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 1
- 229910002808 Si–O–Si Inorganic materials 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 230000003321 amplification Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000002485 combustion reaction Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 239000002537 cosmetic Substances 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 238000004817 gas chromatography Methods 0.000 description 1
- 238000011065 in-situ storage Methods 0.000 description 1
- 238000002329 infrared spectrum Methods 0.000 description 1
- 230000000670 limiting effect Effects 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000004949 mass spectrometry Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000000615 nonconductor Substances 0.000 description 1
- 238000003199 nucleic acid amplification method Methods 0.000 description 1
- 239000005416 organic matter Substances 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 230000002441 reversible effect Effects 0.000 description 1
- SCPYDCQAZCOKTP-UHFFFAOYSA-N silanol Chemical compound [SiH3]O SCPYDCQAZCOKTP-UHFFFAOYSA-N 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 238000004065 wastewater treatment Methods 0.000 description 1
Classifications
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
- G01N21/35—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light
- G01N21/3504—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light for analysing gases, e.g. multi-gas analysis
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/59—Transmissivity
- G01N21/61—Non-dispersive gas analysers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/30—Controlling by gas-analysis apparatus
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/02—Details
- G01J3/0205—Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows
- G01J3/0227—Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows using notch filters
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/02—Details
- G01J3/10—Arrangements of light sources specially adapted for spectrometry or colorimetry
- G01J3/108—Arrangements of light sources specially adapted for spectrometry or colorimetry for measurement in the infrared range
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/28—Investigating the spectrum
- G01J3/42—Absorption spectrometry; Double beam spectrometry; Flicker spectrometry; Reflection spectrometry
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N33/00—Investigating or analysing materials by specific methods not covered by groups G01N1/00 - G01N31/00
- G01N33/0004—Gaseous mixtures, e.g. polluted air
- G01N33/0009—General constructional details of gas analysers, e.g. portable test equipment
- G01N33/0027—General constructional details of gas analysers, e.g. portable test equipment concerning the detector
- G01N33/0036—General constructional details of gas analysers, e.g. portable test equipment concerning the detector specially adapted to detect a particular component
- G01N33/0047—Organic compounds
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/02—Details
- G01J3/10—Arrangements of light sources specially adapted for spectrometry or colorimetry
- G01J2003/102—Plural sources
- G01J2003/104—Monochromatic plural sources
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- Medicinal Chemistry (AREA)
- Combustion & Propulsion (AREA)
- Food Science & Technology (AREA)
- Organic Chemistry (AREA)
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- Oil, Petroleum & Natural Gas (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
Description
Claims (18)
- 非分散赤外分析法によってガスのシロキサン含有量を求める方法であって:
前記シロキサンの吸収帯域により選択された限定波数帯域(F1、F2)の赤外光(3)を供給するステップと、
分析されるある体積のガス(8)に前記限定波数帯域の前記赤外光を送るステップと、
分析される前記体積のガスを通過した前記限定波数帯域の前記赤外光の強度を検出するステップと、
前記限定波数帯域の前記赤外光の吸収に基づいて前記シロキサン含有量を求めるステップとを含み、
前記限定波数帯域が800〜860cm−1の範囲内にあり、
前記限定波数帯域が2つ以上の副帯域(F1、F2)を含み、前記シロキサン含有量を求める前記ステップにおいて、前記シロキサン含有量が、それぞれの前記副帯域の前記赤外光の吸収に基づいて求められることを特徴とする、方法。 - 前記方法が分析される前記ガス中の二酸化炭素含有量を規定するステップをも含み、前記シロキサンを求めるステップが、前記限定波数帯域の前記赤外光の前記吸収に対する二酸化炭素の影響を補償するステップを含む、請求項1に記載の方法。
- 前記二酸化炭素含有量を規定する前記ステップが:
二酸化炭素の吸収帯域により選択された補償波数帯域の赤外光(3)を供給するステップと、
分析される前記体積の前記ガス(8)に前記補償波数帯域の前記赤外光を送るステップと、
分析される前記体積の前記ガスを通過した前記補償波数帯域の前記赤外光の強度を検出するステップと、
前記補償波数帯域の前記赤外光の吸収に基づいて前記二酸化炭素含有量を求めるステップとを含む、請求項2に記載の方法。 - 前記補償波数帯域が800〜860cm−1の範囲外にある、請求項3に記載の方法。
- 前記シロキサン含有量を求める前記ステップが、それぞれの前記副帯域の前記赤外光の吸収に基づいて環状および直鎖のシロキサンの含有量を求めるステップを含む、請求項1〜4のいずれか一項に記載の方法。
- 前記限定波数帯域の前記赤外光を供給する前記ステップが:
赤外光(3)を発生させるステップと、
前記赤外光が前記限定波数帯域(F1、F2)に限定されるように前記赤外光をフィルターに通すステップとを含む、請求項1〜5のいずれか一項に記載の方法。 - 前記赤外光をフィルターに通す前記ステップが、分析される前記体積の前記ガスに前記限定波数帯域の前記赤外光を送る前記ステップの前に行われる、請求項6に記載の方法。
- 求められたシロキサン含有量に基づいて、バイオガス取り扱いプロセスを制御するための制御信号を発生させるステップをさらに含む、請求項1〜7のいずれか一項に記載の方法。
- 前記バイオガス取り扱いプロセスが、バイオガス精製プロセス、およびバイオガスを天然ガスパイプライン中に注入するためのバイオガス注入プロセスの一方である、請求項6に記載の方法。
- 非分散赤外分析法によってガスのシロキサン含有量を求めるための装置(1)であって:
分析されるガスを受け取るための試料室(5)、
前記シロキサンの吸収帯域により選択された限定波数帯域(F1、F2)の赤外光(3)を発生させ前記限定波数帯域の前記赤外光が前記試料室を透過するように構成された照明配列(2、4、10)、
前記試料室を通過した前記限定波数帯域の前記赤外光の強度を検出するための検出器(11)、ならびに
メモリ、および前記メモリに結合したプロセッサ(13)を含み、前記メモリは、前記プロセッサによって実行されると、前記装置が前記限定波数帯域の前記赤外光の吸収に基づいて前記シロキサン含有量を求めるように構成されたプログラムコード命令を含み、
前記限定波数帯域が800〜860cm−1の範囲内にあり、
前記限定波数帯域が2つ以上の副帯域(F1、F2)を含み、前記プログラムコード命令は、前記装置がそれぞれの前記副帯域の前記赤外光の吸収に基づいて前記シロキサン含有量を求めるように構成される、装置。 - 分析される前記ガス(8)中の二酸化炭素含有量が得られるようにさらに構成され、前記プログラムコード命令は、前記装置が前記限定波数帯域(F1、F2)の前記赤外光の吸収に対する二酸化炭素の影響を補償するように構成される、請求項10に記載の装置(1)。
- 前記照明配列(2、4、10)が、二酸化炭素の吸収帯域により選択された補償波数帯域の赤外光を発生させ前記補償波数帯域の前記赤外光が前記試料室を透過するようにさらに構成され、
前記検出器(11)が、分析される前記ガスを通過した前記補償波数帯域の前記赤外光の強度を検出するようにさらに構成され、
前記プログラムコード命令は、前記装置が前記補償波数帯域の前記赤外光の吸収に基づいて前記二酸化炭素含有量を求めるように構成される、請求項11に記載の装置(1)。 - 前記補償波数帯域が800〜860cm−1の範囲外にある、請求項12に記載の装置(1)。
- 前記プログラムコード命令は、前記装置がそれぞれの前記副帯域の前記赤外光の吸収に基づいて環状および直鎖のシロキサンの含有量を求めるように構成される、請求項10〜13のいずれか一項に記載の装置(1)。
- 前記照明配列が、
赤外光を発生させるための光源(2)と、
前記赤外光が前記限定波数帯域に限定されるように前記赤外光をフィルターに通すように構成されるフィルター配列(9、10)とを含む、請求項10〜14のいずれか一項に記載の装置(1)。 - 前記フィルター配列(9、10)は、前記赤外光が前記試料室(5)を透過する前に前記赤外光がフィルターを通るように構成される、請求項15に記載の装置(1)。
- 前記プログラムコード命令は、前記装置が、求められたシロキサン含有量に基づいてバイオガス取り扱いプロセスを制御するための制御信号を発生するようにさらに構成される、請求項10〜16のいずれか一項に記載の装置(1)。
- 前記バイオガス取り扱いプロセスが、バイオガス精製プロセス、およびバイオガスを天然ガスパイプライン中に注入するためのバイオガス注入プロセスの一方である、請求項15に記載の装置。
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FI20135884 | 2013-09-02 | ||
FI20135884A FI125535B (en) | 2013-09-02 | 2013-09-02 | Method and apparatus for determining the siloxane content of a gas |
PCT/FI2014/050670 WO2015028720A1 (en) | 2013-09-02 | 2014-09-02 | Method and apparatus for determining siloxane content of a gas |
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JP6446457B2 true JP6446457B2 (ja) | 2018-12-26 |
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US (1) | US10222326B2 (ja) |
EP (1) | EP3042181B1 (ja) |
JP (1) | JP6446457B2 (ja) |
CN (1) | CN105637346A (ja) |
BR (1) | BR112016004599B1 (ja) |
ES (1) | ES2811253T3 (ja) |
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FR3039898B1 (fr) | 2015-08-05 | 2017-07-28 | Deltalys | Procede de quantification du silicium total issu de composes organiques volatils silicies presents dans un gaz |
CN106525991A (zh) * | 2016-09-08 | 2017-03-22 | 深圳市华保科技有限公司 | 气体中的硅氧烷的测定方法 |
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GB2079262B (en) | 1980-07-02 | 1984-03-28 | Central Glass Co Ltd | Process of preparing silicon tetrafluoride by using hydrogen fluoride gas |
US5448070A (en) * | 1993-05-17 | 1995-09-05 | The Foxboro Company | Identification of unknown gases using infrared absorption spectroscopy |
JP4096528B2 (ja) | 2001-06-26 | 2008-06-04 | Jfeエンジニアリング株式会社 | シロキサン化合物含有ガスの精製方法 |
JP3909385B2 (ja) * | 2001-07-12 | 2007-04-25 | 昭和電工株式会社 | テトラフルオロシランの製造方法およびその用途 |
US20040045096A1 (en) * | 2002-04-22 | 2004-03-11 | General Electric Company | Chemical-specific sensor for monitoring amounts of volatile solvent during a drying cycle of a dry cleaning process |
JP4660273B2 (ja) * | 2004-09-02 | 2011-03-30 | 大阪瓦斯株式会社 | シロキサン含有ガス中のシロキサンの分析装置および分析方法 |
US9001335B2 (en) | 2005-09-30 | 2015-04-07 | Mks Instruments Inc. | Method and apparatus for siloxane measurements in a biogas |
US8462347B2 (en) * | 2005-09-30 | 2013-06-11 | Mks Instruments, Inc. | Method and apparatus for siloxane measurements in a biogas |
JP5025627B2 (ja) * | 2008-12-12 | 2012-09-12 | 信越化学工業株式会社 | シリコーンゴム硬化物中の低分子シロキサン濃度をリアルタイムで評価できる乾燥機システム及び評価方法 |
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ES2811253T3 (es) | 2021-03-11 |
WO2015028720A1 (en) | 2015-03-05 |
FI125535B (en) | 2015-11-13 |
FI20135884A (fi) | 2015-03-03 |
CN105637346A (zh) | 2016-06-01 |
EP3042181A1 (en) | 2016-07-13 |
BR112016004599B1 (pt) | 2021-01-19 |
EP3042181A4 (en) | 2017-04-19 |
BR112016004599A8 (pt) | 2020-02-11 |
JP2016532116A (ja) | 2016-10-13 |
US10222326B2 (en) | 2019-03-05 |
EP3042181B1 (en) | 2020-05-13 |
US20160195471A1 (en) | 2016-07-07 |
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