JP6444982B2 - 脱水素反応器内の傾斜底板 - Google Patents
脱水素反応器内の傾斜底板 Download PDFInfo
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- JP6444982B2 JP6444982B2 JP2016505540A JP2016505540A JP6444982B2 JP 6444982 B2 JP6444982 B2 JP 6444982B2 JP 2016505540 A JP2016505540 A JP 2016505540A JP 2016505540 A JP2016505540 A JP 2016505540A JP 6444982 B2 JP6444982 B2 JP 6444982B2
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J8/00—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
- B01J8/008—Details of the reactor or of the particulate material; Processes to increase or to retard the rate of reaction
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J8/00—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
- B01J8/02—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with stationary particles, e.g. in fixed beds
- B01J8/0207—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with stationary particles, e.g. in fixed beds the fluid flow within the bed being predominantly horizontal
- B01J8/0214—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with stationary particles, e.g. in fixed beds the fluid flow within the bed being predominantly horizontal in a cylindrical annular shaped bed
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2208/00—Processes carried out in the presence of solid particles; Reactors therefor
- B01J2208/00796—Details of the reactor or of the particulate material
- B01J2208/00884—Means for supporting the bed of particles, e.g. grids, bars, perforated plates
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2208/00—Processes carried out in the presence of solid particles; Reactors therefor
- B01J2208/00796—Details of the reactor or of the particulate material
- B01J2208/00938—Flow distribution elements
Description
図6は、別の実施形態を示す。延長板80に開口部はなく、支持板90に開口110がある。水素などの気体が、開口110および底板65の有孔部分115を通って流れる。底板の下方のプレナム(plenum)120は、反応器の全周にわたって気体を分配することができる。水素をこの気体として使用すると、硫黄をH2Sとして除去することができる。
パラフィン系炭化水素の脱水素は、炭化水素処理分野の技術者によく知られている。脱水素プロセスでは、新たな炭化水素フィードが、再循環水素および転化していない炭化水素と結合される。脱水素可能な炭化水素は、3つまたは5つの炭素原子を有するイソアルカンを含むことが好ましい。脱水素可能な炭化水素の適当なフィードはしばしば、反応の目的で汚染物の役目を果たす軽質炭化水素(すなわち1次フィード成分よりも少数の炭素原子を有する炭化水素)を含む。多くのオレフィン転化プロセスで不必要な副生物を生成するジエンの形成を防ぐため、ほとんどの場合、オレフィンは、脱水素ゾーン再循環から排除される。脱水素可能な炭化水素に加えて、脱水素ゾーンへのフィードは、H2に富むストリーム、好ましくはH2を少なくとも75モル%含むストリームを含む。このH2は、より典型的にはコークスとして知られている炭化水素質付着物が触媒の表面に形成されることを抑制する働きをし、望ましくない熱分解を抑制する働きをすることができる。脱水素反応ではH2が生成され、そのH2は流出物の一部分を構成するため、反応ゾーンに導入されるH2に富むストリームは一般に、脱水素ゾーン流出物の分離から得られた再循環H2を含む。あるいは、脱水素ゾーン流出物以外の適当な源からH2を供給してもよい。
特定の実施形態
以下の説明は特定の実施形態に関するが、この説明は例示的であることが意図されており、この説明が、上記の説明および添付の特許請求項の範囲を限定することは意図されていないことが理解される。
Claims (8)
- 傾斜底板を備えるラジアル層反応器であって、
反応器本体と、
触媒層(20)を画定する内側孔あき円筒および外側孔あき円筒(30、35)であり、前記触媒層(20)が前記触媒層の上端に入口を有し、前記触媒層の下端に出口を有し、前記外側孔あき円筒(35)の第1の部分(A)が、前記内側孔あき円筒(30)の最下部よりも下方に延び、前記第1の部分(A)が無孔セクション(125)を有する、内側孔あき円筒および外側孔あき円筒(30、35)と、
前記内側孔あき円筒(30)の前記最下部から前記外側孔あき円筒(35)の最下部に向かって延びる底板(65)であり、前記内側孔あき円筒に対して傾斜した底板(65)と、
少なくとも前記内側孔あき円筒(35)によって画定された分配空間(40)と、
前記外側孔あき円筒(35)および前記反応器本体によって画定された収集空間(45)と、
前記分配空間(40)へのフィード入口(55)と、
前記収集空間(45)からの生成物出口(60)と
を備える反応器。 - 前記外側孔あき円筒(35)の前記第1の部分(a)が有孔セクション(130)をさらに含み、前記有孔セクション(130)が前記無孔セクション(125)の下方に配置された、請求項1に記載の反応器。
- 前記内側孔あき円筒(30)が触媒層側にルーバ(70)をさらに備える、請求項1または2のいずれかに記載の反応器。
- 前記無孔セクション(125)が、最も低いルーバ(70)の最下部よりも下方に延びる、請求項3に記載の反応器。
- 前記底板(65)が、30°から85°の範囲の角度(a)で傾斜した、請求項1または2のいずれかに記載の反応器。
- 前記内側孔あき円筒(30)の触媒層側に、前記内側孔あき円筒(30)に隣接したプロフィールワイヤスクリーンをさらに備える、請求項1または2のいずれかに記載の反応器。
- 前記有孔セクション(130)の孔サイズもしくはオープンエリアの割合またはその両方が、前記外側孔あき円筒(35)の孔サイズもしくはオープンエリアの割合またはその両方とは異なる、請求項2に記載の反応器。
- 前記外側孔あき円筒(35)の第2の部分が第1のセクション(B)および第2のセクション(C)を有し、前記第2の部分の前記第1のセクション(B)が前記第1の部分の前記無孔セクション(125)の上方にあり、前記第2の部分の前記第1のセクション(B)の孔サイズもしくはオープンエリアの割合またはその両方が、前記第2の部分の前記第2のセクション(C)の孔サイズもしくはオープンエリアの割合またはその両方よりも小さい、請求項1または2のいずれかに記載の反応器。
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Application Number | Priority Date | Filing Date | Title |
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US13/852,110 | 2013-03-28 | ||
US13/852,110 US9044723B2 (en) | 2013-03-28 | 2013-03-28 | Inclined baseplate in dehydrogenation reactor |
PCT/US2014/031804 WO2014160743A1 (en) | 2013-03-28 | 2014-03-26 | Inclined baseplate in dehydrogenation reactor |
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JP2016517794A JP2016517794A (ja) | 2016-06-20 |
JP6444982B2 true JP6444982B2 (ja) | 2018-12-26 |
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US (1) | US9044723B2 (ja) |
EP (1) | EP2978521B1 (ja) |
JP (1) | JP6444982B2 (ja) |
KR (1) | KR102214897B1 (ja) |
CN (1) | CN105283243B (ja) |
AU (1) | AU2014241542B2 (ja) |
PL (1) | PL2978521T3 (ja) |
WO (1) | WO2014160743A1 (ja) |
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US10557091B2 (en) | 2016-07-28 | 2020-02-11 | Uop Llc | Process for increasing hydrocarbon yield from catalytic reformer |
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PL2978521T3 (pl) | 2020-06-15 |
AU2014241542A1 (en) | 2015-10-08 |
US9044723B2 (en) | 2015-06-02 |
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AU2014241542B2 (en) | 2017-09-14 |
EP2978521B1 (en) | 2019-12-18 |
CN105283243A (zh) | 2016-01-27 |
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JP2016517794A (ja) | 2016-06-20 |
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