JP6355706B2 - 磁気抵抗構造を有する磁気センサデバイス、および、磁気抵抗構造を有する磁気センサデバイスのための方法 - Google Patents
磁気抵抗構造を有する磁気センサデバイス、および、磁気抵抗構造を有する磁気センサデバイスのための方法 Download PDFInfo
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N50/00—Galvanomagnetic devices
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- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/33—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only
- G11B5/39—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects
- G11B5/3903—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects using magnetic thin film layers or their effects, the films being part of integrated structures
- G11B5/398—Specially shaped layers
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R33/00—Arrangements or instruments for measuring magnetic variables
- G01R33/0023—Electronic aspects, e.g. circuits for stimulation, evaluation, control; Treating the measured signals; calibration
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R33/00—Arrangements or instruments for measuring magnetic variables
- G01R33/02—Measuring direction or magnitude of magnetic fields or magnetic flux
- G01R33/06—Measuring direction or magnitude of magnetic fields or magnetic flux using galvano-magnetic devices
- G01R33/09—Magnetoresistive devices
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F10/00—Thin magnetic films, e.g. of one-domain structure
- H01F10/32—Spin-exchange-coupled multilayers, e.g. nanostructured superlattices
- H01F10/324—Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F10/00—Thin magnetic films, e.g. of one-domain structure
- H01F10/32—Spin-exchange-coupled multilayers, e.g. nanostructured superlattices
- H01F10/324—Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer
- H01F10/3268—Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer the exchange coupling being asymmetric, e.g. by use of additional pinning, by using antiferromagnetic or ferromagnetic coupling interface, i.e. so-called spin-valve [SV] structure, e.g. NiFe/Cu/NiFe/FeMn
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- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/33—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only
- G11B5/39—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects
- G11B2005/3996—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects large or giant magnetoresistive effects [GMR], e.g. as generated in spin-valve [SV] devices
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Description
Claims (15)
- 磁気抵抗構造(710)および磁気バイアス構造(780)を備えた磁気センサデバイス(700)であって、
前記磁気抵抗構造(710)は、磁化フリー層(770)に閉じた磁束の磁化パターン(775)を自発生成するように構成された磁化フリー層(770)と、閉じていない磁束の参照磁化パターン(755)を有する磁化参照層(750)と、を備え、
前記磁気バイアス構造(780)は、バイアス磁界を前記磁化フリー層(770)に生成するように構成され、前記バイアス磁界は、前記参照磁化パターン(755)に対して垂直方向のゼロではないバイアス磁界成分を有し、
前記磁化フリー層(770)は、中心対称性または回転対称性の形状であり、
前記磁気バイアス構造(780)は、前記磁化フリー層(770)において交換バイアス磁界を生成するための反強磁性層(781)を有し、
前記反強磁性層(781)は、前記磁化フリー層(770)に直接隣接して配置されている、
磁気センサデバイス(700)。 - 磁気抵抗構造(710)および磁気バイアス構造(780)を備えた磁気センサデバイス(700)であって、
前記磁気抵抗構造(710)は、磁化フリー層(770)に閉じた磁束の磁化パターン(775)を自発生成するように構成された磁化フリー層(770)と、閉じていない磁束の参照磁化パターン(755)を有する磁化参照層(750)と、を備え、
前記磁気バイアス構造(780)は、バイアス磁界を前記磁化フリー層(770)に生成するように構成され、前記バイアス磁界は、前記参照磁化パターン(755)に対して垂直方向のゼロではないバイアス磁界成分を有し、
前記磁化フリー層(770)は、中心対称性または回転対称性の形状であり、
前記磁気バイアス構造(780)は、電気導体(782)を有し、
前記電気導体(782)は、前記電気導体(782)内の電流(810)に応答して、前記バイアス磁界に応じて磁界を前記磁化フリー層(770)内に生成するように構成されている、
磁気センサデバイス(700)。 - 前記磁気バイアス構造(780)は、ゼロではない面内バイアス磁界成分を有するバイアス磁界を生成するように構成されている、
請求項1または2記載の磁気センサデバイス(700)。 - 前記磁気バイアス構造(780)は、方向が固定された磁界として前記バイアス磁界を生成するように構成されている、
請求項1から3までのいずれか1項記載の磁気センサデバイス(700)。 - 前記磁気バイアス構造(780)は、前記参照磁化パターン(755)に対して垂直方向に、前記磁化フリー層(770)に前記バイアス磁界を生成するように構成されている、
請求項1から4までのいずれか1項記載の磁気センサデバイス(700)。 - 前記磁化フリー層(770)の厚さと径との比は、1/500から1/5までの範囲内である、
請求項1から5までのいずれか1項記載の磁気センサデバイス(700)。 - 前記磁気バイアス構造(780)は、バイアス磁界がある場合の、前記閉じた磁束の磁化パターン(775)が自発生成される核形成磁界閾値を、バイアス磁界がないときよりも大きくするバイアス磁界強度を有するバイアス磁界を生成するように構成されている、
請求項1から6までのいずれか1項記載の磁気センサデバイス(700)。 - 前記磁気バイアス構造(780)は、バイアス磁界がある場合の前記核形成磁界閾値を、バイアス磁界がないときよりも少なくとも5Oe大きくするバイアス磁界強度を有するバイアス磁界を生成するように構成されている、
請求項7記載の磁気センサデバイス(700)。 - 前記磁気バイアス構造(780)は、前記閉じた磁束の磁化パターンが消滅する、外部磁界の消滅閾値の最大1/5であるバイアス磁界強度を有するバイアス磁界を生成するように構成されている、
請求項1から8までのいずれか1項記載の磁気センサデバイス(700)。 - 前記磁化フリー層(770)は、前記反強磁性層(781)と前記磁化参照層(750)との間に配置されている、
請求項1記載の磁気センサデバイス(700)。 - 前記磁化フリー層(770)の厚さは、前記磁化参照層(750)の厚さの少なくとも3倍である、
請求項1から10までのいずれか1項記載の磁気センサデバイス(700)。 - 前記磁気バイアス構造(780)は、前記磁化フリー層(770)にバイアス磁界を生成するように構成された1つまたは複数の永久磁石(783;784;785)または電磁石を有する、
請求項1から11までのいずれか1項記載の磁気センサデバイス(700)。 - 前記磁気バイアス構造は、少なくとも第1の永久磁石(784)と第2の永久磁石(785)とを有し、前記両永久磁石(784;785)は、前記磁化フリー層(770)のそれぞれ反対側に配置されている、
請求項12記載の磁気センサデバイス(700)。 - 前記磁気抵抗構造(710)は、巨大磁気抵抗(GMR)構造またはトンネル磁気抵抗(TMR)構造に相当する、
請求項1から13までのいずれか1項記載の磁気センサデバイス(700)。 - 請求項1から14までのいずれか1項記載の磁気センサデバイス(700)のための方法(1100)であって、
前記磁気抵抗構造の磁化参照層に閉じていない磁束の参照磁化パターンを設けるステップ(1110)と、
前記参照磁化パターンに対して垂直方向のゼロではないバイアス磁界成分を有するバイアス磁界を、前記磁気抵抗構造の磁化フリー層に生成するステップ(1120)と、
前記磁化フリー層に閉じた磁束の磁化パターンを自発生成するステップ(1130)と、
を含む方法(1100)。
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DE112020002831T5 (de) * | 2019-06-11 | 2022-03-10 | Murata Manufacturing Co., Ltd. | Magnetsensor, magnetsensorarray, magnetfeldverteilungsmessvorrichtung und positionsidentifikationsvorrichtung |
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