JP6337486B2 - 基板処理装置 - Google Patents

基板処理装置 Download PDF

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Publication number
JP6337486B2
JP6337486B2 JP2014018844A JP2014018844A JP6337486B2 JP 6337486 B2 JP6337486 B2 JP 6337486B2 JP 2014018844 A JP2014018844 A JP 2014018844A JP 2014018844 A JP2014018844 A JP 2014018844A JP 6337486 B2 JP6337486 B2 JP 6337486B2
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Prior art keywords
substrate
pattern
curved surface
detection probe
processing apparatus
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JP2014018844A
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Japanese (ja)
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JP2015145971A (ja
JP2015145971A5 (enExample
Inventor
智行 渡辺
智行 渡辺
加藤　正紀
正紀 加藤
鈴木　智也
智也 鈴木
義昭 鬼頭
義昭 鬼頭
正和 堀
堀　　正和
洋祐 林田
洋祐 林田
弘樹 小宮山
弘樹 小宮山
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Nikon Corp
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Nikon Corp
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  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2014018844A 2014-02-03 2014-02-03 基板処理装置 Active JP6337486B2 (ja)

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JP2014018844A JP6337486B2 (ja) 2014-02-03 2014-02-03 基板処理装置

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JP2014018844A JP6337486B2 (ja) 2014-02-03 2014-02-03 基板処理装置

Related Child Applications (1)

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JP2017228415A Division JP6500968B2 (ja) 2017-11-28 2017-11-28 基板処理装置

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JP2015145971A JP2015145971A (ja) 2015-08-13
JP2015145971A5 JP2015145971A5 (enExample) 2017-02-09
JP6337486B2 true JP6337486B2 (ja) 2018-06-06

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2019109546A (ja) * 2019-03-12 2019-07-04 株式会社ニコン 基板処理装置

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102277364B1 (ko) * 2015-09-29 2021-07-15 가부시키가이샤 니콘 제조 시스템
JP6551175B2 (ja) * 2015-11-10 2019-07-31 株式会社ニコン 回転円筒体の計測装置、基板処理装置及びデバイス製造方法
JP7148289B2 (ja) * 2018-06-20 2022-10-05 芝浦メカトロニクス株式会社 基板検出装置及び基板処理装置
JP6787447B2 (ja) * 2019-06-27 2020-11-18 株式会社ニコン 基板処理装置

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6018383A (en) * 1997-08-20 2000-01-25 Anvik Corporation Very large area patterning system for flexible substrates
JP2008098325A (ja) * 2006-10-11 2008-04-24 Nikon Corp 露光装置及び露光方法
JP6074898B2 (ja) * 2012-03-26 2017-02-08 株式会社ニコン 基板処理装置
CN104204956B (zh) * 2012-03-26 2017-03-08 株式会社尼康 基板处理装置、处理装置以及元件制造方法
WO2013157356A1 (ja) * 2012-04-19 2013-10-24 株式会社ニコン マスクユニット及び基板処理装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2019109546A (ja) * 2019-03-12 2019-07-04 株式会社ニコン 基板処理装置

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