JP6308749B2 - Exposure equipment - Google Patents
Exposure equipment Download PDFInfo
- Publication number
- JP6308749B2 JP6308749B2 JP2013225235A JP2013225235A JP6308749B2 JP 6308749 B2 JP6308749 B2 JP 6308749B2 JP 2013225235 A JP2013225235 A JP 2013225235A JP 2013225235 A JP2013225235 A JP 2013225235A JP 6308749 B2 JP6308749 B2 JP 6308749B2
- Authority
- JP
- Japan
- Prior art keywords
- optical member
- region
- optical
- amount
- light
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Description
本発明は、露光装置に関する。 The present invention relates to an exposure apparatus.
従来の露光装置は、マスクからの光をワークに投影する、光学薄板を含む投影光学系を有する。マスクからの光によってワークに投影されるパターン像は、マスクの変形、投影光学系の変形・製造誤差によって、歪みを生じている。かかる歪みを補正するために、前記光学薄板を支持する複数の支持部材と、前記投影光学系の光軸の方向に前記複数の支持部材を個別に移動する駆動機構とを設け、前記駆動機構によって前記光学薄板を曲げている(特許文献１参照）。 A conventional exposure apparatus has a projection optical system including an optical thin plate that projects light from a mask onto a workpiece. The pattern image projected onto the workpiece by the light from the mask is distorted due to the deformation of the mask and the deformation / manufacturing error of the projection optical system. In order to correct such distortion, a plurality of support members that support the optical thin plate and a drive mechanism that individually moves the plurality of support members in the direction of the optical axis of the projection optical system are provided. The optical thin plate is bent (see Patent Document 1).
しかし、従来の露光装置では、支持部材を光学薄板の光線透過領域内には配置できず、光線透過領域外に配置していたため、光学薄板の光線透過領域の変位量を正確にコントロールすることが困難であった。よって、光学薄板の光線透過領域をパターン像の歪みを補正するための理想形状にするために、駆動機構を複数回駆動する必要があった。もしくは、光線透過領域の変位量を測定するセンサを設けなければならなかった。 However, in the conventional exposure apparatus, the support member cannot be disposed in the light transmission region of the optical thin plate and is disposed outside the light transmission region, so that the amount of displacement of the light transmission region of the optical thin plate can be accurately controlled. It was difficult. Therefore, it is necessary to drive the drive mechanism a plurality of times in order to make the light transmission region of the optical thin plate an ideal shape for correcting the distortion of the pattern image. Alternatively, a sensor for measuring the amount of displacement of the light transmission region had to be provided.
そこで、本発明は、板状の光学部材の変形量の計測結果を用いることなく光学部材を変形させる駆動機構を駆動するだけで、光学部材を目標形状に変形してマスクのパターン像の歪みを制御することが可能な露光装置を提供することを目的とする。 In view of this, the present invention merely deforms the optical member into the target shape and drives the distortion of the mask pattern image only by driving the driving mechanism that deforms the optical member without using the measurement result of the deformation amount of the plate-like optical member. An object of the present invention is to provide an exposure apparatus that can be controlled .
その目的を達成するために、本発明の一側面としての露光装置は、マスクのパターンを基板に投影して基板を露光する露光装置であって、前記マスクのパターンを前記基板に投影する投影光学系の光路内に配置され、変形可能な板状の光学部材と、前記光学部材を透過する光の領域外に配置され、前記光学部材を透過する光の領域外における第１位置で前記光学部材を支持する第１支持部材と、前記光学部材を透過する光の領域外に配置され、前記第１位置とは異なり、前記光学部材を透過する光の領域外における第２位置で前記光学部材を支持する第２支持部材と、前記光学部材を透過する光の領域外に配置された、前記第１支持部材を移動させる第１駆動機構と、前記光学部材を透過する光の領域外に配置された、前記第２支持部材を移動させる第２駆動機構と、を有し、前記第１駆動機構の駆動量に対する、前記光学部材を透過する光の領域内の複数の位置のそれぞれにおける前記光学部材の移動量と、前記第２駆動機構の駆動量に対する、前記光学部材を透過する光の領域内の複数の位置のそれぞれにおける前記光学部材の移動量と、を含む情報を用いて、前記光学部材が目標形状になるように前記第１駆動機構及び前記第２駆動機構を制御することによって、前記マスクのパターンの像の歪みを制御する、ことを特徴とする。 In order to achieve the object, an exposure apparatus according to one aspect of the present invention is an exposure apparatus that projects a mask pattern onto a substrate to expose the substrate, and projects the mask pattern onto the substrate. A deformable plate-like optical member disposed in the optical path of the system; and the optical member disposed at a first position outside the region of the light transmitted through the optical member and disposed outside the region of the light transmitted through the optical member. a first support member for supporting the said is placed outside the area of the light transmitted through the optical member, the first Unlike position, the second position that put the region out of the light transmitted through the optical member A second support member that supports the optical member; a first drive mechanism that moves the first support member disposed outside a region of light that passes through the optical member; and an outside region of light that passes through the optical member. disposed with, move the second supporting member And a second drive mechanism for the, for driving amount of the first drive mechanism, the moving amount of the optical member in each of a plurality of positions in the area of light transmitted through the optical member, the second drive The information including the amount of movement of the optical member at each of a plurality of positions in the region of the light transmitted through the optical member with respect to the driving amount of the mechanism is used so that the optical member has a target shape. The distortion of the image of the mask pattern is controlled by controlling the first driving mechanism and the second driving mechanism.
本発明によれば、板状の光学部材の変形量の計測結果を用いることなく光学部材を変形させる駆動機構を駆動するだけで、光学部材を目標形状に変形してマスクのパターン像の歪みを制御することが可能な露光装置を提供することができる。 According to the present invention, the optical member is deformed into the target shape by simply driving the driving mechanism that deforms the optical member without using the measurement result of the deformation amount of the plate-like optical member, and the mask pattern image is distorted. An exposure apparatus that can be controlled can be provided.
以下に、本発明の好ましい実施形態を添付の図面に基づいて詳細に説明する。 Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings.
〔第1実施形態〕
図１は、従来例であり、本発明の適用対象の一例でもある走査型露光装置の構成を示す。同図において、１はスリット状に整形された照明光を照射する照明系、２はマスク３とワーク１０のアライメントマークを検出する検出系である。また、４は照明系１により照明されるマスク３上のパターン像をワーク１０上に投影する投影光学系、５は投影光学系４の出口側の光路上に配置した光学薄板である。なお、ここでは、投影光学系４としてミラー光学系を用いている。また、光学薄板５は投影光学系４の入口側の光路上に配置してもよい。
[First embodiment]
FIG. 1 shows a configuration of a scanning exposure apparatus which is a conventional example and is also an example of an application target of the present invention. In the figure, reference numeral 1 denotes an illumination system for irradiating illumination light shaped in a slit shape, and 2 denotes a detection system for detecting alignment marks of the mask 3 and the workpiece 10. Reference numeral 4 denotes a projection optical system for projecting a pattern image on the mask 3 illuminated by the illumination system 1 onto the workpiece 10, and 5 denotes an optical thin plate disposed on the optical path on the exit side of the projection optical system 4. Here, a mirror optical system is used as the projection optical system 4. Further, the optical thin plate 5 may be disposed on the optical path on the entrance side of the projection optical system 4.
図２は本発明の一実施例に係る露光装置における光学薄板部分を示す斜視図である。この露光装置は、光学薄板１３を変形させる機構以外は、図１のものと同じ構成を有する。 FIG. 2 is a perspective view showing an optical thin plate portion in an exposure apparatus according to an embodiment of the present invention. This exposure apparatus has the same configuration as that of FIG. 1 except for a mechanism for deforming the optical thin plate 13.
図２において、投影光学系４は、その結像位置のずれ以外の結像性能に対し実質的に影響を与えない程度の光学的厚さで、かつ変形自在な光学薄板５を光路中に有する。本実施形態の調整機構１３は、図２に示すように、光学薄板５と、支持部材１１と、駆動機構１２を有する。支持部材１１は、光学薄板５の光線透過領域外を複数の箇所（例えば、１１ａ〜１１ｌの１２箇所）で保持する。支持部材１１は駆動機構１２に取り付けられている。前記支持部材１１は光学薄板５に対してＺ軸（投影光学系４の光軸）方向に駆動可能であり、光学薄板５の変位量を制御する。光学薄板５は、変形することで露光光の入射方向（Ｚ方向）に対する傾きに応じて結像位置をＸ軸とＹ軸（投影光学系４の光軸に垂直）方向に変化させる。 In FIG. 2, the projection optical system 4 has an optical thin plate 5 in the optical path that has an optical thickness that does not substantially affect the imaging performance other than the shift of the imaging position and that is deformable. . As shown in FIG. 2, the adjustment mechanism 13 of this embodiment includes an optical thin plate 5, a support member 11, and a drive mechanism 12. The support member 11 holds the outside of the light transmission region of the optical thin plate 5 at a plurality of locations (for example, 12 locations 11a to 11l). The support member 11 is attached to the drive mechanism 12. The support member 11 can be driven in the Z-axis (optical axis of the projection optical system 4) direction with respect to the optical thin plate 5 and controls the amount of displacement of the optical thin plate 5. The optical thin plate 5 is deformed to change the imaging position in the X-axis and Y-axis (perpendicular to the optical axis of the projection optical system 4) direction according to the inclination with respect to the incident direction (Z direction) of the exposure light.
図３は、本発明に係る光学薄板および支持部材を含む調整手段を搭載しない露光装置において、歪みを有するパターン像１５が投影されている状態を示す。一方、図２の構成では、支持部材１１によって保持された光学薄板５をワーク１０と投影光学系４との間に配置し、駆動機構としてのアクチュエータで支持部材１１を駆動することにより、光学薄板の局所的な傾きを調整している。アクチュエータは、例えばパルスモーターとボールねじからなる。このように構成することで、パターン像の歪み、または、マスク上のパターンとワーク上のパターンとの間の位置ずれが補正できる。また、別の露光装置での露光を経て形成されたワーク上のパターンに対する重ね合わせ精度を向上させることもできる。 FIG. 3 shows a state in which a distorted pattern image 15 is projected in an exposure apparatus not equipped with an adjusting means including an optical thin plate and a support member according to the present invention. On the other hand, in the configuration of FIG. 2, the optical thin plate 5 held by the support member 11 is disposed between the workpiece 10 and the projection optical system 4, and the support member 11 is driven by an actuator as a drive mechanism, thereby the optical thin plate The local inclination of is adjusted. The actuator is composed of, for example, a pulse motor and a ball screw. With this configuration, the distortion of the pattern image or the positional deviation between the pattern on the mask and the pattern on the workpiece can be corrected. It is also possible to improve the overlay accuracy with respect to the pattern on the workpiece formed through exposure by another exposure apparatus.
そして、本調整機構は、駆動機構１２の駆動量に対する光学薄板の変位量の比例定数を有する。図４に示すように一つの駆動機構１２aの駆動量に対する、光学薄板の光線透過領域内の点１４aの移動量を、駆動機構１２aに対する光線透過領域１４aの比例定数として計測する。全ての駆動機構１２a〜１２lそれぞれに対する光線透過領域全点１４a〜１４eについて、比例定数を計測する。 The adjustment mechanism has a proportional constant of the displacement amount of the optical thin plate with respect to the drive amount of the drive mechanism 12. As shown in FIG. 4, the movement amount of the point 14a in the light transmission region of the optical thin plate with respect to the drive amount of one drive mechanism 12a is measured as a proportionality constant of the light transmission region 14a with respect to the drive mechanism 12a. Proportional constants are measured for all points 14a to 14e in the light transmission region for all the driving mechanisms 12a to 12l.
図２のマスク３上のアライメントマークと投影光学系を介したワーク１０上のアライメントマークの像との相対位置関係を検出系２により検出する。そして、これにより、パターン像の歪み量を計算する。計算されたパターン像の歪みから、パターン像の歪みを補正するための光学薄板の理想形状を算出する。そして比例定数を用いて最適化計算を行うことで、光学薄板が理想形状となる駆動機構１２の駆動量を算出する。算出した駆動量で駆動機構１２を駆動し支持部材１１を駆動することで、光学薄板５を理想形状とする。理想形状となった光学薄板５を通過したパターン像は、歪み成分が補正されたパターン像となり、ワーク１０に転写される。 The relative positional relationship between the alignment mark on the mask 3 in FIG. 2 and the image of the alignment mark on the workpiece 10 via the projection optical system is detected by the detection system 2. Thus, the distortion amount of the pattern image is calculated. An ideal shape of the optical thin plate for correcting the distortion of the pattern image is calculated from the calculated distortion of the pattern image. Then, by performing optimization calculation using the proportional constant, the driving amount of the driving mechanism 12 in which the optical thin plate has an ideal shape is calculated. By driving the drive mechanism 12 with the calculated drive amount and driving the support member 11, the optical thin plate 5 is brought into an ideal shape. The pattern image that has passed through the optical thin plate 5 having an ideal shape becomes a pattern image in which the distortion component is corrected, and is transferred to the workpiece 10.
［実施例１］
図５は本発明の実施例１の調整機構１３の図である。
[Example 1]
FIG. 5 is a diagram of the adjusting mechanism 13 according to the first embodiment of the present invention.
光学薄板５は、縦２６０ｍｍ、横４５０ｍｍ、厚さ３ｍｍの石英ガラスである。支持部材１１は、光線透過領域外で光学薄板５を保持する。支持部材の数は２０個ある。図示しない駆動部は、支持部材１１をＺ軸方向に駆動する。これにより、支持部材１１をＺ軸方向に駆動することで光学薄板５を変形させる。 The optical thin plate 5 is quartz glass having a length of 260 mm, a width of 450 mm, and a thickness of 3 mm. The support member 11 holds the optical thin plate 5 outside the light transmission region. There are 20 support members. A drive unit (not shown) drives the support member 11 in the Z-axis direction. Thereby, the optical thin plate 5 is deformed by driving the support member 11 in the Z-axis direction.
従来の方式では、光線透過領域の任意の点（例えば１４a）を変位させるために、光線透過領域１４ａに最も近い支持部１１aのみを駆動していた。また、支持部１１ａの駆動量は、光学薄板５を理想形状とする時の光線透過領域１４ａの変位量と一致させていた。しかしこの方式では、光学薄板５の弾性変形により支持部１１aの駆動量と光線透過領域１４aの変位量は一致せず、理想形状に対して誤差が生じ、パターン像の歪みを補正することが出来なかった。よって従来の方式では、光学薄板５が理想形状となるまで駆動機構１２を複数回繰り返して駆動する必要があり、パターン像の歪みの補正に時間がかかっていた。もしくは、１度の駆動で理想形状とするためには、光線透過領域の変位量を測定するセンサを取り付けその計測値をフィードバックして駆動機構１２を駆動する必要があり、コストがかかっていた。 In the conventional method, in order to displace an arbitrary point (for example, 14a) in the light transmission region, only the support portion 11a closest to the light transmission region 14a is driven. Further, the driving amount of the support portion 11a was made to coincide with the displacement amount of the light transmission region 14a when the optical thin plate 5 was made into an ideal shape. However, in this system, due to the elastic deformation of the optical thin plate 5, the driving amount of the support portion 11a and the displacement amount of the light transmission region 14a do not coincide with each other. There wasn't. Therefore, in the conventional method, it is necessary to repeatedly drive the drive mechanism 12 a plurality of times until the optical thin plate 5 becomes an ideal shape, and it takes time to correct the distortion of the pattern image. Alternatively, in order to obtain an ideal shape by driving once, it is necessary to attach a sensor for measuring the amount of displacement of the light transmission region and feed back the measured value to drive the drive mechanism 12, which is costly.
本特許では、まずシミュレーションで支持部材１１aに対しＺ方向に駆動量Ｚ１１ａの変位を与えることで、光学薄板５の光線透過領域の点１４ａの変位量Ｚ１４ａを算出する。そして、Ｚ１４ａ/Ｚ１１ａを支持部材１１aに対する光線透過領域１４ａの比例定数Ａ１１ａ１４ａとする。支持部材１１aに対して、全ての光線透過領域の点（１４ａ〜１４ｔ）について、比例定数（Ａ１１ａ１４ａ〜Ａ１１ａ１４t）を算出する。同様に、残りの全ての支持部（１１ｂ〜１１ｔ）に対して、全ての光線透過領域の点（１４ａ〜１４ｔ）について、比例定数（Ａ１１ｂ１４ａ〜Ａ１１ｂ１４t、Ａ１１ｃ１４ａ〜Ａ１１ｃ１４t、・・・、Ａ１１ｔ１４ａ〜Ａ１１ｔ１４t）を算出する。この比例定数の算出は、変位センサによる実測値でもよい。この比例定数を図６に示す行列式で表わし、その行列式から図７に示す逆行列式を算出する。光学薄板を理想形状とするための全ての光線透過領域の駆動量（Ｚ１４ａ〜Ｚ１４ｔ）から、図７の逆行列式を用いることで、全ての支持部材の駆動量（Ｚ１１ａ〜Ｚ１１ｔ）を算出する。そして、算出した支持部材の駆動量（Ｚ１１ａ〜Ｚ１１ｔ）で駆動機構１２を駆動することで、光学薄板５を理想形状とすることが出来、パターン像の歪みを補正することが可能となる。本実施例では、支持部材の数と光線透過領域の点の数を一致させ、逆行列式を用いて支持部材の駆動量を算出している。しかし、支持部材の数と光線透過領域の点の数は一致させなくてもよく、支持部材の駆動量の算出は線形計画法等の最適化計算手法を用いてもよい。 In this patent, first, the displacement Z14a of the point 14a of the light transmission region of the optical thin plate 5 is calculated by giving a displacement of the driving amount Z11a in the Z direction to the support member 11a by simulation. Z14a / Z11a is set as a proportional constant A11a14a of the light transmission region 14a with respect to the support member 11a. For the support member 11a, proportional constants ( A11a14a to A11a14t ) are calculated for all the points (14a to 14t) in the light transmission region. Similarly, proportional constants ( A11b14a to A11b14t , A11c14a to A11c14t ,...) For all the light transmission region points (14a to 14t) with respect to all the remaining support portions (11b to 11t). , A 11t14a to A 11t14t ). The calculation of the proportionality constant may be an actual measurement value by a displacement sensor. This proportionality constant is represented by the determinant shown in FIG. 6, and the inverse determinant shown in FIG. 7 is calculated from the determinant. The drive amounts (Z11a to Z11t) of all the support members are calculated from the drive amounts (Z14a to Z14t) of all the light transmission regions for making the optical thin plate an ideal shape by using the inverse determinant of FIG. . Then, by driving the drive mechanism 12 with the calculated drive amounts (Z11a to Z11t) of the support member, the optical thin plate 5 can be formed into an ideal shape, and the distortion of the pattern image can be corrected. In this embodiment, the number of support members and the number of points in the light transmission region are matched, and the drive amount of the support members is calculated using an inverse determinant. However, the number of support members and the number of points in the light transmission region do not have to coincide with each other, and an optimization calculation method such as linear programming may be used to calculate the drive amount of the support member.
図８は本特許と従来方式を用いた光学薄板５の変形シミュレーション結果である。光学薄板５のＸ軸方向中央部Ｚ変位量が０ｍｍ、両端部（１４ａ、１４ｋ、１４ｊ、１４ｔ）Ｚ変位量が０．１ｍｍとなるサインカーブを理想形状とした。従来方式よりも本特許の方が理想形状に近いことを確認できる。また、パターン像の歪みを補正するためには、光学薄板５を変形させた際の理想形状に対する誤差量を２．５％以下にすることが必要である。従来方式では、誤差量は最大８.３％となった。本特許では、誤差量は最大０.２％となった。よって本特許では、光線透過領域の変位量を測定するセンサを設ける必要無しに、１度の駆動でパターン像の歪みを補正することが可能となる。 FIG. 8 shows the result of deformation simulation of the optical thin plate 5 using this patent and the conventional method. The sine curve in which the X-axis direction central Z displacement amount of the optical thin plate 5 is 0 mm and both end portions (14a, 14k, 14j, 14t) Z displacement amount is 0.1 mm is an ideal shape. It can be confirmed that this patent is closer to the ideal shape than the conventional method. Further, in order to correct the distortion of the pattern image, it is necessary to set the error amount with respect to the ideal shape when the optical thin plate 5 is deformed to 2.5% or less. In the conventional method, the maximum error amount is 8.3%. In this patent, the maximum error amount was 0.2%. Therefore, in this patent, it is possible to correct the distortion of the pattern image by one driving without the need to provide a sensor for measuring the displacement amount of the light transmission region.
〔第２実施形態〕
つぎに、図９に基づいて本発明の一実施形態のパターン像の歪み補正方法について説明する。図９は本発明の一実施形態のパターン像の歪み補正方法のフローチャートである。本実施形態の補正方法は、図９に示すように、まずマスク３上のアライメントマークと投影光学系を介したワーク１０上のアライメントマークの像との相対位置関係を検出系２により検出する。そして、これにより、パターン像の歪み（ディストーション）量を測定する（ステップ１００１）。次に、測定されたパターン像の歪みが許容値の範囲内であるか判断する（ステップ１００２）。測定されたパターン像の歪み許容値の範囲外である場合、歪みを補正するように、支持部材１１の駆動量を算出する（ステップ１００３）。そして、算出した支持部材１１の駆動量に基づいて駆動機構１２を駆動し、光学薄板５を変形させる。（ステップ１００４）。なお、ステップ１００１で測定したパターン像の歪みが許容値の範囲内になるまで、ステップ１００１以下を繰り返す。これにより、パターン像の歪みを補正させることができる。
[Second Embodiment]
Next, a pattern image distortion correction method according to an embodiment of the present invention will be described with reference to FIG. FIG. 9 is a flowchart of a pattern image distortion correction method according to an embodiment of the present invention. In the correction method of the present embodiment, as shown in FIG. 9, first, the detection system 2 detects the relative positional relationship between the alignment mark on the mask 3 and the image of the alignment mark on the workpiece 10 via the projection optical system. Thus, the amount of distortion (distortion) of the pattern image is measured (step 1001). Next, it is determined whether the measured distortion of the pattern image is within the allowable range (step 1002). If the measured pattern image is out of the allowable distortion range, the driving amount of the support member 11 is calculated so as to correct the distortion (step 1003). Then, the drive mechanism 12 is driven based on the calculated drive amount of the support member 11 to deform the optical thin plate 5. (Step 1004). Step 1001 and subsequent steps are repeated until the distortion of the pattern image measured in step 1001 falls within the allowable value range. Thereby, distortion of a pattern image can be corrected.
１ 照明系
２ 検出系
３ マスク
４ 投影光学系
５ 光学薄板
６ ミラー
７ ミラー
８ 凸面ミラー
９ 凹面ミラー
１０ ワーク
１１ 光学薄板の支持部材
１２ 駆動機構
１３ 調整機構
１４ 光線透過領域の点
１５ 補正前のパターン像
DESCRIPTION OF SYMBOLS 1 Illumination system 2 Detection system 3 Mask 4 Projection optical system 5 Optical thin plate 6 Mirror 7 Mirror 8 Convex mirror 9 Concave mirror 10 Work 11 Optical thin plate support member 12 Drive mechanism 13 Adjustment mechanism 14 Light transmission region point 15 Pattern before correction image
Claims (4)
前記マスクのパターンを前記基板に投影する投影光学系の光路内に配置され、変形可能な板状の光学部材と、
前記光学部材を透過する光の領域外に配置され、前記光学部材を透過する光の領域外における第１位置で前記光学部材を支持する第１支持部材と、
前記光学部材を透過する光の領域外に配置され、前記第１位置とは異なり、前記光学部材を透過する光の領域外における第２位置で前記光学部材を支持する第２支持部材と、
前記光学部材を透過する光の領域外に配置された、前記第１支持部材を移動させる第１駆動機構と、
前記光学部材を透過する光の領域外に配置された、前記第２支持部材を移動させる第２駆動機構と、を有し、
前記第１駆動機構の駆動量に対する、前記光学部材を透過する光の領域内の複数の位置のそれぞれにおける前記光学部材の移動量と、前記第２駆動機構の駆動量に対する、前記光学部材を透過する光の領域内の複数の位置のそれぞれにおける前記光学部材の移動量と、を含む情報を用いて、前記光学部材が目標形状になるように前記第１駆動機構及び前記第２駆動機構を制御することによって、前記マスクのパターンの像の歪みを制御する、ことを特徴とする露光装置。 An exposure apparatus that exposes a substrate by projecting a mask pattern onto the substrate,
A plate-like optical member that is disposed in an optical path of a projection optical system that projects the pattern of the mask onto the substrate, and is deformable;
A first support member that is disposed outside a region of light that passes through the optical member and supports the optical member at a first position outside the region of light that passes through the optical member ;
Wherein arranged in the region outside of the light transmitted through the optical member, the first Unlike position, the second support member supporting the optical member at a second position that put the region out of the light transmitted through the optical member When,
A first drive mechanism that moves the first support member and is disposed outside a region of light that passes through the optical member ;
A second drive mechanism arranged outside the region of the light transmitted through the optical member and moving the second support member;
For driving amount of the first drive mechanism, the amount of movement of the said optical member in each of a plurality of positions in the region of light transmitted through the optical member, for driving amount of the second drive mechanism, transmitted through the optical member The first drive mechanism and the second drive mechanism are controlled so that the optical member has a target shape using information including the amount of movement of the optical member at each of a plurality of positions in the region of the light to be transmitted An exposure apparatus characterized by controlling distortion of an image of the mask pattern.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2013225235A JP6308749B2 (en) | 2013-10-30 | 2013-10-30 | Exposure equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2013225235A JP6308749B2 (en) | 2013-10-30 | 2013-10-30 | Exposure equipment |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2015088586A JP2015088586A (en) | 2015-05-07 |
| JP2015088586A5 JP2015088586A5 (en) | 2016-12-15 |
| JP6308749B2 true JP6308749B2 (en) | 2018-04-11 |
Family
ID=53051073
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2013225235A Active JP6308749B2 (en) | 2013-10-30 | 2013-10-30 | Exposure equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP6308749B2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102015220537A1 (en) * | 2015-10-21 | 2016-10-27 | Carl Zeiss Smt Gmbh | Projection exposure system with at least one manipulator |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4875765A (en) * | 1988-07-29 | 1989-10-24 | Eastman Kodak Company | Method for correction of distortions of a mirror |
| JP4753009B2 (en) * | 2005-05-24 | 2011-08-17 | 株式会社ニコン | Measuring method, exposure method, and exposure apparatus |
| US7715107B2 (en) * | 2006-04-25 | 2010-05-11 | Asml Netherlands B.V. | Optical element for correction of aberration, and a lithographic apparatus comprising same |
| DE102008042356A1 (en) * | 2008-09-25 | 2010-04-08 | Carl Zeiss Smt Ag | Projection exposure system with optimized adjustment option |
-
2013
- 2013-10-30 JP JP2013225235A patent/JP6308749B2/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| JP2015088586A (en) | 2015-05-07 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US8472009B2 (en) | Exposure apparatus and device manufacturing method | |
| US20090059297A1 (en) | Calibration method for image rendering device and image rendering device | |
| JP2785146B2 (en) | Automatic focus adjustment controller | |
| JP5264915B2 (en) | Calibration of optical device position measuring device | |
| TW200944968A (en) | Method and lithographic apparatus for measuring and acquiring height data relating to a substrate surface | |
| JP6535197B2 (en) | Exposure apparatus and exposure method | |
| TW201719300A (en) | Projection exposure device by transferring the mask pattern to a substrate with an allowable error | |
| JP2006268032A (en) | Drawing device and calibrating method for drawing device | |
| JP5494755B2 (en) | Mark detection method and apparatus, position control method and apparatus, exposure method and apparatus, and device manufacturing method | |
| JP6308749B2 (en) | Exposure equipment | |
| JP2006235204A (en) | Correction method of drawing apparatus | |
| JP2012133122A (en) | Proximity exposing device and gap measuring method therefor | |
| US20080220344A1 (en) | Drawing Method and Apparatus | |
| JPH11121372A (en) | Projection aligner and method therefor | |
| JP2007129101A (en) | Method for calculating correction information, method for controlling movable stage, and exposure apparatus | |
| JP2840314B2 (en) | Projection exposure equipment | |
| JP2018004860A (en) | Alignment device, exposure device, and alignment method | |
| JP2009206323A (en) | Projection aligner | |
| JP6551562B2 (en) | Sheet substrate transfer device | |
| KR20170128599A (en) | Exposure device, method for producing flat panel display, method for producing device, and exposure method | |
| KR20090128338A (en) | Exposure apparatus and device manufacturing method | |
| JP2005129785A (en) | Aligner | |
| JP2009237255A (en) | Exposure apparatus and exposure method | |
| TW201602733A (en) | Photolithography apparatus comprising projection system for control of image size | |
| JP5632685B2 (en) | Exposure apparatus and device manufacturing method |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| RD01 | Notification of change of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7421 Effective date: 20150703 |
|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20161026 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20161026 |
|
| A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20170707 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20170718 |
|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20170915 |
|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20180213 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20180313 |
|
| R151 | Written notification of patent or utility model registration |
Ref document number: 6308749 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R151 |