JP6308715B2 - Exposure drawing apparatus, movement control method, and program - Google Patents

Description

  The present invention relates to an exposure drawing apparatus that exposes and draws a desired image on an object to be processed, a program executed by the exposure drawing apparatus, and a movement control method for a conveyance unit that is a component of the exposure drawing apparatus.

  Conventionally, in manufacturing a circuit board, an exposure method has been used in which light is applied to a pattern master called a photomask made of film or glass, and the circuit is transferred to the entire photosensitive surface of the board. However, in recent years, in addition to dealing with high density and high definition of transfer patterns, there is a demand for simultaneously reducing the defect rate and further improving productivity. Therefore, a shift to a direct drawing type exposure apparatus capable of exposing a more precise circuit pattern with a high yield without using a photomask is rapidly progressing.

  In the direct drawing type exposure apparatus, since pattern formation is performed during the drawing process, it is particularly important to eliminate vibrations of the stage and the like during the drawing process. For example, Patent Document 1 describes a stage device that suppresses vibration generated on a surface plate during acceleration / deceleration driving. This stage apparatus includes a vibration isolation table having a mechanism for suppressing vibration propagation, a movement stage that moves in a predetermined direction on the vibration isolation table, and a movement stage that is installed independently of the vibration isolation table and is stopped. An acceleration thrust is applied to the approximate center of gravity position of the moving stage to accelerate and move the moving stage in a predetermined moving direction, and a deceleration thrust is applied to the approximately center of gravity position of the moving moving stage to decelerate and stop the moving stage. Acceleration / deceleration driving means and constant speed driving means installed on the moving stage and driving the moving stage at a constant speed are provided.

  Patent Document 2 describes a stage apparatus including a control unit that controls the acceleration / deceleration of the drive mechanism while avoiding the coincidence between the natural vibration period of the vibration isolation table and the acceleration time or the deceleration time of the drive mechanism.

Japanese Patent No. 3536382 JP 2005-26504 A

  An exposure drawing apparatus is known that has a substrate transport mechanism for mounting a substrate before exposure drawing processing on a moving stage and discharging the substrate after exposure drawing processing from the moving stage. The substrate transport mechanism moves between a predetermined substrate carry-in position and the moving stage and between the move stage and a predetermined carry-out position, and performs substrate carry-in / out processing. Since such a substrate transport mechanism is connected to the moving stage via a housing or a floor surface of the exposure drawing apparatus, vibration propagates to the moving stage during acceleration / deceleration in the substrate transport mechanism. Therefore, it is necessary to prevent the propagation of vibrations to the moving stage accompanying the acceleration / deceleration of the substrate transport mechanism to eliminate the adverse effect on the image quality. At this time, it is also important to secure productivity by suppressing an increase in processing time per substrate, that is, cycle time as much as possible.

  The methods described in Patent Documents 1 and 2 are for suppressing the influence associated with the driving of the moving stage, and the influence on the stage associated with the driving of the substrate transport mechanism is suppressed by the vibration isolation mechanism. However, it is difficult to sufficiently eliminate the influence on the stage due to the driving of the substrate transport mechanism only by the vibration isolation mechanism.

  The present invention has been made in view of the above points, and in an exposure drawing apparatus having a transport unit that transports an object to be processed, generation of vibration accompanying the movement of the transport unit while suppressing an increase in cycle time. An object of the present invention is to provide an exposure drawing apparatus that suppresses image quality deterioration by suppressing the program, a program executed in the exposure apparatus, and a movement control method for a conveyance unit that is a component of the exposure drawing apparatus.

In order to achieve the above object, a first exposure drawing apparatus according to the present invention includes a stage for mounting a processing object, and an exposure unit that performs exposure drawing processing on the processing object mounted on the stage. And a transfer unit provided in a state in which the movement of the object to be processed is supplied to the stage and discharged from the stage by moving, and vibrations caused by acceleration and deceleration during the movement can propagate to the stage. Determining means for determining whether or not the exposure unit is performing the exposure drawing process, and the exposure unit is not performing the exposure drawing process by the determination unit when the transport unit starts moving. when it is determined, the magnitude of the acceleration direction of the acceleration when the conveying unit starts to move, size Satoshi standard acceleration of the acceleration direction, the determining means when the conveyor unit starts to move Ri when the exposed portion is determined to be performing the pattern exposure process, the magnitude of the acceleration in the acceleration direction when the transporting unit begins to move, smaller than the size of a standard acceleration of the acceleration direction Then, when the determining unit determines that the exposure unit is not performing the exposure drawing process during the movement of the transport unit, the magnitude of acceleration in the deceleration direction when the transport unit stops moving is determined. , The standard acceleration in the deceleration direction, and when the transport unit stops moving when the determining unit determines that the exposure unit is performing the exposure drawing process while the transport unit is moving. the magnitude of the acceleration in the decelerating direction, and a control means for controlling the movement of smaller than the size of a standard acceleration of the deceleration direction.

  According to the exposure drawing apparatus according to the present invention, the transport unit is driven at a relatively small acceleration during the period in which the exposure drawing process by the exposure unit is performed. Thereby, it is possible to prevent the image quality from being deteriorated due to the vibration caused by the acceleration of the transport unit. On the other hand, in the period when the exposure drawing process by the exposure unit is not performed, the vibration accompanying the acceleration of the conveyance unit does not affect the image quality, and thus the conveyance unit is driven at a relatively large acceleration during this period. Thereby, an increase in cycle time is suppressed. As described above, according to the exposure drawing apparatus according to the present invention, it is possible to suppress the generation of vibrations accompanying the movement of the transport unit while suppressing an increase in cycle time, and to prevent a reduction in image quality.

The determination in the first exposure drawing device, whether the exposure unit is performing the pattern exposure process when the determination means that及BiUtsuri kinematic at least when the transport unit is stationary May be.

  In the first exposure drawing apparatus, the control means accelerates the transport section to a first speed when the determination means determines that the exposure section is not performing the exposure drawing processing, When it is determined by the determination means that the exposure unit is performing the exposure drawing process, the transport unit may be accelerated to a second speed smaller than the first speed.

In the first exposure drawing apparatus, the transport unit may be movable in a plurality of directions, and in this case, the control unit is configured to move the transport unit in each of the plurality of directions. Movement control may be performed.

In the first exposure / drawing apparatus, the transport unit moves to a first transport unit that supplies a processing target to the stage, and the second transport unit discharges the processing target from the stage. In this case, the control unit may perform the movement control on each of the first transport unit and the second transport unit.

The first exposure / drawing apparatus may further include an obtaining unit that obtains resolution information indicating a resolution of a drawing pattern formed on the processing object by the exposure unit in the exposure / drawing process. The control means may perform the transport control when the resolution indicated by the resolution information acquired by the acquisition means is higher than a predetermined threshold. In addition, when the resolution indicated by the resolution information acquired by the acquisition unit is lower than a predetermined threshold, the control unit sets the magnitude of acceleration when the transport unit moves to a predetermined value. Also good.

In order to achieve the above object, a program according to the present invention, a computer, and is configured to function as a definitive judgment means and control means to said first pattern exposure equipment.

In order to achieve the above object, a first movement control method according to the present invention includes a stage for mounting a processing object, and an exposure drawing process for the processing object mounted on the stage. An exposure unit to be provided, and a state in which the object to be processed is supplied to and discharged from the stage by moving, and vibrations caused by acceleration and deceleration during the movement can be propagated to the stage. A transfer control method for the transfer unit in an exposure drawing apparatus including the transfer unit, and the transfer unit when the exposure unit does not perform the exposure drawing process when the transfer unit starts moving. If There the magnitude of the acceleration direction of the acceleration at the start of movement, size Satoshi standard acceleration of the acceleration direction, in which the exposed portion at the time of the transfer unit starts to move is performing the pattern exposure process , The magnitude of the acceleration in the acceleration direction when the transporting unit begins to move, the smaller than the size of the acceleration direction of the standard acceleration, the exposure unit performs the exposure drawing process during the movement of the transport unit The acceleration in the deceleration direction when the transport unit stops moving is the standard acceleration in the deceleration direction, and the exposure unit performs the exposure drawing process while the transport unit is moving. If it is, the magnitude of the acceleration in the deceleration direction during the conveyance portion stops moving, smaller than the size of a standard acceleration of the deceleration direction, is that.

  According to the exposure drawing apparatus, the program, and the movement control method according to the present invention, it is possible to prevent the deterioration of the image quality by suppressing the generation of the vibration accompanying the movement of the transport unit while suppressing the increase of the cycle time. .

It is a perspective view which shows the structure of the exposure drawing apparatus which concerns on embodiment of this invention. It is a perspective view which shows the structure of DMD which concerns on embodiment of this invention. It is a schematic diagram which shows the internal structure of the exposure drawing apparatus which concerns on embodiment of this invention. It is a block diagram which shows the electric system of the exposure drawing apparatus which concerns on embodiment of this invention. It is a flowchart which shows the flow of a process of the exposure drawing process program which concerns on embodiment of this invention. It is a flowchart which shows the flow of a process of the movement control processing program which concerns on embodiment of this invention. It is a figure which shows the time transition of the speed at the time of movement of AC hand which concerns on embodiment of this invention. It is a figure which illustrates substrate conveyance operation by AC hand concerning an embodiment of the present invention. It is a figure which illustrates substrate conveyance operation by AC hand concerning an embodiment of the present invention. It is a figure which illustrates substrate conveyance operation by AC hand concerning an embodiment of the present invention. It is a figure which shows the time transition of the speed at the time of movement of AC hand which concerns on embodiment of this invention. It is a flowchart which shows the flow of a process of the movement control processing program which concerns on other embodiment of this invention. It is a flowchart which shows the flow of a process of the movement control processing program which concerns on other embodiment of this invention.

[First Embodiment]
Hereinafter, an exposure drawing apparatus according to an embodiment of the present invention will be described in detail with reference to the accompanying drawings. In the drawings, the same or equivalent components and parts are denoted by the same reference numerals. In the present embodiment, the exposed substrate C is exposed using a film having a photosensitive material such as a resist film on the surface, a flat substrate such as a printed wiring board and a glass substrate for a flat panel display as the exposed substrate C. An exposure drawing apparatus that performs drawing will be described as an example.

  FIG. 1 is a perspective view showing a configuration of an exposure drawing apparatus 1 according to an embodiment of the present invention. In the following, the direction in which the stage 10 moves is defined as the Y direction, the direction perpendicular to the Y direction on the horizontal plane is defined as the X direction, and the direction perpendicular to the Y direction on the vertical plane is defined as the Z direction.

  As shown in FIG. 1, the exposure drawing apparatus 1 includes a flat plate stage 10 on which a substrate to be exposed C to be subjected to exposure drawing processing is mounted. The upper surface of the stage 10 is a mounting surface on which the substrate to be exposed C is mounted, and the mounting surface has a suction mechanism (not shown) having a plurality of suction holes for sucking air in the region where the substrate C to be exposed is mounted. Is provided. The stage 10 uses this suction mechanism to hold the substrate C to be exposed by vacuum suction on its mounting surface. The exposed substrate C fixed to the mounting surface of the stage 10 moves to the exposure position as the stage 10 moves in the Y direction, and is irradiated with a light beam from the exposure unit 16 to draw a circuit pattern or the like on the exposed surface. The pattern is exposed.

  The stage 10 is supported by a flat base 12 that is movably provided on the upper surface of a table-like base 11. In addition, a stage moving mechanism (not shown) configured to include a motor or the like is provided between the base 12 and the stage 10, and the stage 10 can be translated in the Z direction by the stage moving mechanism. It is.

  The base body 11 has four leg portions 11a, and a vibration isolation portion 50 made of an elastic member such as rubber is provided on the bottom surface of each leg portion 11a. The vibration isolator 50 plays a role of mitigating vibration propagating from the floor surface to the base body 11. Two guide rails 14 are provided on the upper surface of the base 11. The base 12 is movably supported on the guard rail 14, and is moved in the Y direction along the guide rail 14 by a driving force applied by a stage driving unit (not shown) including a motor and the like. The stage 10 is supported on the upper surface of the base 12 and moves in the Y direction along the guide rail 14 together with the base 12. That is, the stage 10 moves between a transport processing position where the substrate to be exposed C is mounted on the stage 10 and discharged from the stage 10 and an exposure drawing processing position where exposure drawing is performed. The transfer processing position is a position between a substrate introduction unit 5 and a substrate discharge unit 6 described later, and the exposure drawing processing position is below the exposure unit 16.

  A gate-type gate 15 is erected on the upper surface of the base 11 so as to straddle the guide rail 14, and an exposure unit 16 is attached to the gate 15. The exposure unit 16 includes a plurality of exposure heads 16a and is disposed on a moving path of the stage 10 that moves in the Y direction. In the present embodiment, the exposure unit 16 includes 16 exposure heads 16a arranged in a matrix of 2 rows and 8 columns. An optical fiber 18 drawn from the light source unit 17 and a signal cable 20 drawn from the image processing unit 19 are connected to the exposure unit 16. Each exposure head 16a has a digital micromirror device (hereinafter referred to as DMD) 27 (refer to FIG. 2) as a reflective spatial light modulator, and DMD 27 is based on image data input from image processing unit 19. Is controlled to spatially modulate the light beam from the light source unit 17 and irradiate the substrate C to be exposed with the spatially modulated light beam. Thereby, exposure drawing of the image pattern according to the image data is performed on the substrate C to be exposed.

  FIG. 2 is a perspective view showing a configuration of the DMD 27 according to the present embodiment. The DMD 27 is configured as a mirror device in which a large number (for example, 600 × 800) of micromirrors (micromirrors) 29 constituting a pixel (pixel) are arranged in a grid pattern. Each of the rectangular micromirrors 29 is supported by a pillar including a hinge and a yoke (not shown) on an SRAM cell (memory cell) 28 made of silicon gate CMOS or the like for temporarily storing image data indicating a drawing pattern. Has been. A material having high reflectivity such as aluminum is deposited on the surface of the micromirror 29 to form a light reflecting surface. Each pixel of the drawing pattern is constituted by the light beam reflected by each of the micromirrors 29.

  In the SRAM cell 28 of the DMD 27, a digital signal indicating the on state or the off state of each micromirror 29 generated based on the image data of the drawing pattern is written. The micromirror 29 in the on state has its reflecting surface inclined with the diagonal line as the rotation axis until one corner of the micromirror 29 comes into contact with the landing pad on the SRAM cell. On the other hand, the reflective surface of the micromirror 29 in the off state is inclined with the diagonal line as the rotation axis until the corner facing the one corner contacts the other landing pad. In this way, by controlling the inclination of each micromirror 29 so as to correspond to each pixel in the image data of the drawing pattern, the light beam incident on the DMD 27 is reflected in a direction according to the inclination of the micromirror 29. Exposure drawing of a drawing pattern is performed. The on / off control of the micromirror 29 is performed by the image processing unit 19 connected to the DMD 27.

  The light source unit 17 is configured to include a laser light source and a laser driving unit (both not shown). The laser drive unit generates a drive current having a magnitude corresponding to the control signal supplied from the system control unit 40 (see FIG. 4), and supplies this to the laser light source. The laser light source is constituted by, for example, a semiconductor laser, and emits a laser beam having a light amount (intensity) corresponding to a driving current supplied from a laser driving unit. Laser light emitted from the laser light source is led out of the light source unit 17 by the optical fiber 18. The laser light emitted from the laser light source is repeatedly reflected in the optical fiber 18 as a light guide, and is emitted as random polarized light from the emission end of the optical fiber 18. Laser light emitted from the optical fiber 18 is introduced into the exposure head 16a.

  A gate-shaped gate 22 is provided on the upper surface of the base 11 so as to straddle the guide rail 14. One or a plurality of (two in the present embodiment) imaging units 23 for imaging the alignment mark of the substrate C to be exposed placed on the stage 10 are attached to the gate 22. The photographing unit 23 includes a CCD camera or the like with a built-in strobe with a very short light emission time. Each of the imaging units 23 is installed so as to be movable in a direction (X direction) perpendicular to the moving direction (Y direction) of the stage 10. When the exposure drawing apparatus 1 draws a drawing pattern on the exposed substrate C, the exposure drawing apparatus 1 measures the position of the alignment mark on the exposed substrate C photographed by the photographing unit 23, and the drawing position based on the measured position of the alignment mark. Adjust.

  The substrate introduction unit 5 includes a belt conveyor that conveys the substrate C to be exposed before exposure drawing processing, which is input to the substrate insertion port (not shown) of the exposure drawing apparatus 1, to the supply position P 1 in the vicinity of the stage 10. Has been. The substrate discharge unit 6 includes a belt conveyor that conveys the substrate C subjected to exposure drawing processing in the X direction from a discharge position P2 near the stage 10 to a substrate discharge port (not shown) of the exposure drawing apparatus 1. Has been. In the present embodiment, the substrate introduction unit 5 and the substrate discharge unit 6 are disposed to face each other in the X direction so as to sandwich the stage 10 located at the transfer processing position.

  The exposure drawing apparatus 1 is a substrate-mounting auto carrier hand that carries the substrate C to be exposed before exposure drawing processing, which has been transported to the supply position P1 by the substrate introduction unit 5, to the upper side of the stage 10 and mounts it on the upper surface of the stage 10. 24A (hereinafter referred to as an AC hand) and an AC hand 24B for discharging the substrate for picking up the exposed substrate C subjected to the exposure drawing process from the stage 10 and transporting it to the discharge position P2 on the substrate discharge unit 6.

  FIG. 3 is a schematic diagram showing an internal configuration of the exposure drawing apparatus 1, and is a plan view in the XZ plane. The AC hands 24A and 24B are supported so as to be movable in the horizontal direction (X direction) and the vertical direction (Z direction) with respect to the support portion 27 connected to the housing 2 of the exposure apparatus 1. In other words, the vibration generated along with acceleration and deceleration of the AC hands 24 </ b> A and 24 </ b> B can be propagated to the base body 11 and the stage 10 via the housing 2 of the exposure drawing apparatus 1. In the present embodiment, the AC hands 24A and 24B have independent drive mechanisms, and can operate independently.

  On the lower surfaces of the AC hands 24A and 24B, a suction unit 25 for vacuum-sucking the substrate C to be exposed and a pressing unit 26 for pressing the substrate C to be exposed downward are provided. The AC hand 24A for mounting the substrate is in a state where the substrate to be exposed C, which has been transported from the substrate insertion port of the exposure drawing apparatus 1 to the supply position P1 by the substrate introduction unit 5, before the exposure drawing process is sucked and held by the suction unit 25. The substrate C to be exposed is mounted on the mounting surface which is the upper surface of the stage 10 by moving in the direction and the Z direction. When mounting the substrate C to be exposed on the stage 10, the AC hand 24A for mounting the substrate releases the suction by the suction unit 25 while pressing the substrate C to be exposed against the upper surface of the stage 10 by the pressing unit 26. The substrate C is fixed to the stage 10 by suction. On the other hand, the AC hand 24B for discharging the substrate moves in the X direction and the Z direction in a state where the exposed substrate C that has been subjected to the exposure drawing process mounted on the stage 10 is sucked and held by the sucking unit 25, and is exposed to the substrate C. Is placed at the discharge position P <b> 2 on the substrate discharge unit 6. The exposed substrate C that has been subjected to the exposure drawing process that has been transported to the discharge position P2 is transported by the substrate discharge unit 6 to the substrate discharge port of the exposure drawing apparatus 1.

  FIG. 4 is a configuration diagram showing an electrical system of the exposure drawing apparatus 1 according to the present embodiment. The exposure drawing apparatus 1 is provided with a system control unit 40 that is electrically connected to each part of the apparatus. The system control unit 40 includes a central processing unit (CPU), a random access memory (RAM), a read only memory (ROM), and a hard disk drive (HDD), and comprehensively controls each unit of the exposure drawing apparatus 1.

  The AC hands 24 </ b> A and 24 </ b> B perform a transfer operation of the substrate C to be exposed based on a control signal supplied from the system control unit 40. Further, the system control unit 40 supplies acceleration information indicating the acceleration when the AC hands 24A and 24B move on the conveyance path together with the control signal. The AC hands 24A and 24B accelerate and decelerate according to the acceleration information supplied from the system control unit 40, and move on the transport path.

  The substrate introduction unit 5 and the substrate discharge unit 6 drive the belt conveyor based on the control signal supplied from the system control unit 40 and convey the substrate C to be exposed.

  The stage 10 has a stage driving unit (not shown), and the Y direction (scanning direction) along the guide rail 14 based on a control signal supplied from the system control unit 40 to the stage driving unit. Move to.

  The light source unit 17 includes, for example, a semiconductor laser as a light source, and the amount of light emitted from the semiconductor laser is controlled by a control signal supplied from the system control unit 40. The light generated in the light source unit 17 is introduced into the exposure unit 16 through the optical fiber 18.

  The system control unit 40 generates a digital signal corresponding to the image data of the drawing pattern at the time of exposure drawing, and transmits the generated digital signal to the image processing unit 19. The image processing unit 19 generates a drive signal for driving the micromirror 29 of the DMD 27 of each exposure head 16 a based on the received digital signal, and supplies this to the DMD 27. By synchronizing the control signal supplied to the stage 10 by the system control unit 40 and the control signal supplied to the image processing unit 19, scanning exposure in which movement of the stage 10 and driving of the micromirror 29 are interlocked is performed.

  The input unit 47 is used for an operator to input processing conditions including the substrate size of the substrate C to be exposed, the number of processed sheets, an identification number for designating a drawing pattern for exposure drawing, and the resolution of the drawing pattern for exposure drawing. It is composed of a keyboard and a touch panel. The operator can input processing conditions when the exposure drawing apparatus 1 performs exposure drawing as described above by operating the input unit 47.

  The display unit 48 is a display for displaying an initial information input screen or the like for an operator to input processing conditions when the exposure drawing apparatus 1 performs exposure drawing, and includes a liquid crystal display device. ing.

  The photographing unit 23 is moved in a direction (X direction) perpendicular to the moving direction (Y direction) of the stage 10 based on a control signal from the system control unit 40 to position the photographing position. On the other hand, the image photographed by the photographing unit 23 is supplied to the system control unit 40. The system control unit 40 measures the position of the alignment mark formed on the exposed substrate C from the image photographed by the photographing unit 23, and adjusts the drawing position based on the measured position of the alignment mark.

  FIG. 5 is a flowchart showing the flow of processing of the exposure drawing processing program executed by the system control unit 40. The program is stored in advance in a predetermined area of a ROM provided in the system control unit 40. The user inputs a plurality of exposed substrates C to be subjected to exposure drawing processing into the substrate insertion port of the exposure drawing apparatus 1, and designates the substrate size of the exposed substrate C, the number of processed substrates, and the drawing pattern for exposure drawing from the input unit 47. The processing conditions including the identification number and the resolution of the drawing pattern are input. Thereafter, when the user performs an operation input for instructing execution of the exposure drawing process via the input unit 47, the system control unit 40 executes the exposure drawing process program.

  In step S <b> 11, the system control unit 40 supplies a control signal to the substrate introducing unit 5 in order to accept the substrate C to be exposed. When receiving the control signal, the substrate introducing unit 5 drives the belt conveyor to convey the substrate C to be exposed before exposure drawing processing, which is input to the substrate insertion port of the exposure drawing apparatus 1, to a predetermined supply position P1. In the substrate receiving process, a centering process in which the substrate C to be exposed is arranged at the center on the belt conveyor may be performed to prepare for a substrate mounting preparation process to be performed later.

  In step S12, the system control unit 40 executes substrate mounting preparation processing. That is, in this step, the system control unit 40 supplies a control signal indicating that preparation for mounting the exposed substrate C before exposure drawing processing to the stage 10 is to be performed to the AC hand 24A for mounting the substrate. In addition, the system control unit 40 supplies acceleration information indicating the acceleration when the AC hand 24A moves on the conveyance path to the AC hand 24A together with the control signal. When the AC hand 24A receives the control signal and acceleration information, the AC hand 24A moves in the X direction to above the supply position P1 where the exposed substrate C is waiting, and then moves downward in the Z direction. The AC hand 24A sucks and holds the substrate C to be exposed waiting at the supply position P1 on its suction holding surface, moves upward in the Z direction, and stands by in that state. Note that the AC hand 24A may further move in the X direction to transport the substrate C to be exposed above the stage 10 and wait on the stage 10 above. In the movement of the AC hand 24A in the X direction and the Z direction in this step, the AC hand 24A performs acceleration and deceleration according to the acceleration indicated by the acceleration information supplied from the system control unit 40. Note that a measurement process (step S17) and an exposure drawing process (step S18), which will be described later, are performed on the exposure target substrate C loaded before the exposure target substrate C transported in this step. May be performed in parallel.

  In step S <b> 13, the system control unit 40 determines whether or not the substrate C to be exposed currently exists on the stage 10. In this step, when the system control unit 40 determines that the exposed substrate C exists on the stage 10, in step S14, the system control unit 40 executes a substrate stage discharge preparation process. That is, in step S15, the system control unit 40 supplies a control signal indicating that preparation for discharging the exposed substrate C after exposure drawing processing from the stage 10 is to be performed to the AC hand 24B for discharging the substrate. In addition, the system control unit 40 supplies acceleration information indicating the acceleration when the AC hand 24B moves on the conveyance path to the AC hand 24B together with the control signal. When the AC hand 24B receives the control signal and the acceleration information, the AC hand 24B moves in the X direction above the stage 10 and stands by above the stage 10. In the movement of the AC hand 24B in the X direction in this step, the AC hand 24B accelerates and decelerates at the acceleration indicated by the acceleration information supplied from the system control unit 40. Note that a measurement process (step S17) and an exposure drawing process (step S18), which will be described later, are performed in parallel with the process in this step for the substrate C to be exposed after the substrate C to be processed in this step. May be performed.

  In step S15, the system control unit 40 performs a substrate stage discharge process. That is, the system control unit 40 supplies a control signal indicating that the exposed substrate C that has been subjected to the exposure drawing process to be discharged from the stage 10 to the AC hand 24B for discharging the substrate. When the AC hand 24B waiting on the stage 10 receives the control signal, the AC hand 24B moves downward in the Z direction. The AC hand 24B sucks and holds the substrate C to be exposed on the stage 10 on its suction holding surface, and moves upward in the Z direction. In this substrate stage discharging process, the AC hand 24B is accelerated and accelerated at the maximum acceleration (standard accelerations A1 and B1 described later) that can be set in the AC hands 24A and 24B so that the cycle time of the exposure drawing process is minimized. Decelerate and move in the Z direction. When the exposed substrate C that has been subjected to the exposure drawing process is removed from the stage 10, the system control unit 40 moves the process to step S21, executes the discharge process of the exposed substrate C, and moves the process to step S16. Then, the process of mounting the subsequent substrate C to be exposed on the stage 10 is executed.

  On the other hand, if the system control unit 40 determines in step S13 that the substrate C to be exposed does not exist on the stage 10, and if the substrate stage discharge processing in step S15 described above is completed, the substrate stage in step S16. Execute the mounting process. That is, in step S16, the system control unit 40 supplies a control signal indicating that the substrate C to be exposed before exposure drawing processing should be mounted on the stage 10 to the AC hand 24A for mounting the substrate. When the AC hand 24A waiting above the supply position P1 in a state where the substrate C to be exposed is sucked and held by performing the substrate mounting preparation process in step S12 described above, Move up in the X direction, then move down in the Z direction. The AC hand 24A mounts the substrate to be exposed C on the stage 10 by releasing the suction by the suction unit 25 while pressing the substrate C to be exposed to the stage 10 by the pressing mechanism. Thereafter, the AC hand 24A moves upward in the Z direction. In this step, the AC hand 24A accelerates and decelerates at the maximum acceleration (standard accelerations A1 and B1 described later) that can be set in the AC hands 24A and 24B so that the cycle time of the exposure drawing process is minimized. And move in the Z direction. When the processing in step S16 is completed, the system control unit 40 shifts the processing to steps S11 and S17, thereby performing measurement processing and exposure drawing processing, which will be described later, and transport processing of the substrate C to be exposed by the AC hands 24A and 24B described above. Are executed in parallel.

  In step S <b> 17, the system control unit 40 executes measurement processing for the substrate to be exposed 10. The system control unit 40 supplies a control signal indicating that the movement to the exposure drawing processing position should be started to the stage driving unit constituting the stage 10. When receiving the control signal, the stage 10 moves in the Y direction to the exposure drawing processing position below the exposure unit 16 with the substrate C to be exposed mounted thereon. Thereafter, the system control unit 40 supplies a control signal to the imaging unit 23, moves each of the imaging units 23 in the X direction, and positions the exposed substrate C mounted on the stage 10 at a position where the imaging can be performed. The system control unit 40 measures the position of the alignment mark formed on the exposed substrate C from the image photographed by the photographing unit 23, and adjusts the drawing position based on the measured position of the alignment mark.

  In step S18, the system control unit 40 executes an exposure drawing process. That is, in this step, the system control unit 40 supplies the image processing unit 19 with image data indicating a drawing pattern to be exposed and drawn. The image data is temporarily stored in a memory in the image processing unit 19. This image data is data representing the density of each pixel constituting the drawing pattern in binary (whether or not dots are recorded). The image processing unit 19 sequentially reads the image data stored in the memory in the image processing unit 19 for each of a plurality of lines, and generates a digital signal for each exposure head 16a. The micromirror 29 of the DMD 27 of each exposure head 16a is turned on or off according to the digital signal. The light beam reflected by the micromirror 29 in the on state in the DMD 27 is output from the DMD 27 and imaged on the exposed surface of the substrate C to be exposed. As the substrate to be exposed C moves at a constant speed as the stage 10 moves, a strip-shaped exposed area is formed on the substrate to be exposed C for each exposure head 16a. In this way, the exposure drawing apparatus 1 performs exposure drawing on the substrate C to be exposed. When the exposure drawing by the exposure unit 16 is completed, the system control unit 40 supplies a control signal to the stage 10 to place the stage 10 on which the exposed substrate C subjected to the exposure drawing process is mounted on the substrate introduction unit 5 and the substrate discharge unit 6. Is moved in the Y direction to the conveyance processing position between Note that the substrate mounting preparation process and the substrate discharge preparation process in steps S12 and S14 described above may be performed in parallel at the timing when the measurement process in step S17 and the exposure drawing process in step S18 are executed.

  In step S19, the system control unit 40 executes a substrate discharge preparation process similar to that in step S14. That is, the system control unit 40 supplies a control signal indicating that preparation for discharge from the stage 10 of the exposure target substrate C that has been subjected to exposure drawing processing to the AC hand 24B for discharging the substrate. In addition, the system control unit 40 supplies acceleration information indicating the acceleration when the AC hand 24B moves on the conveyance path to the AC hand 24B together with the control signal. When the AC hand 24B receives the control signal and the acceleration information, the AC hand 24B moves in the X direction above the stage 10 and stands by above the stage 10. In the movement of the AC hand 24B in the X direction in this step, the AC hand 24B accelerates and decelerates at the acceleration indicated by the acceleration information supplied from the system control unit 40.

  In step S20, the system control unit 40 performs a substrate stage discharge process. That is, in this step, the system control unit 40 supplies a control signal indicating that the exposed substrate C subjected to the exposure drawing process should be discharged from the stage 10 to the AC hand 24B for discharging the substrate. When the substrate discharge preparation process in step S19 is executed, the AC hand 24B waiting above the stage 10 moves downward in the Z direction when receiving this control signal. The AC hand 24B sucks and holds the substrate C to be exposed on the stage 10 on its suction holding surface, and moves upward in the Z direction. In step S20, the AC hand 24B accelerates and decelerates at the maximum acceleration (standard accelerations A1 and B1 described later) that can be set in the AC hands 24A and 24B so that the cycle time of the exposure drawing process is minimized. Move the direction.

  In step S21, the system control unit 40 executes a substrate discharge process. That is, in this step, the system control unit 40 supplies a control signal indicating that the substrate C to be exposed should be transported to the discharge position P2 to the AC hand 24B for substrate discharge. In addition, the system control unit 40 supplies acceleration information indicating the acceleration when the AC hand 24B moves on the conveyance path to the AC hand 24B together with the control signal. Upon receiving the control signal and acceleration information, the AC hand 24B positioned above the stage 10 with the substrate to be exposed C sucked and held receives the discharge position on the substrate discharge unit 6 while holding the substrate to be exposed C. It moves in the X direction to above P2, and then moves downward in the Z direction. The AC hand 24B places the exposed substrate C on the discharge position P2 of the substrate discharge section 6 by releasing the suction by the suction section 25. In the movement of the AC hand 24B in the X direction and the Z direction in this step, the AC hand 24B accelerates and decelerates at the acceleration indicated by the acceleration information supplied from the system control unit 40. When the exposed substrate C subjected to the exposure drawing process is transported to the discharge position P <b> 2, a control signal is supplied to the system control unit 40 and the substrate discharge unit 6. When receiving the control signal, the substrate discharge unit 6 drives the belt conveyor to convey the exposed substrate C subjected to the exposure drawing process to the substrate discharge port of the exposure drawing apparatus 1. Note that the measurement process (step S17) and the exposure drawing process (step S18) may be performed in parallel on the subsequent substrate C to be exposed at the timing when this step is executed.

  As described above, the exposure / drawing apparatus 1 according to the present embodiment includes the transfer process of the substrate C to be exposed before and after the exposure / drawing process by the AC hands 24A and 24B, the measurement process and the exposure / drawing process by the photographing unit 23 and the exposure unit 16, and the like. In parallel. In addition, the system control unit 40 can perform substrate mounting preparation processing (step S12) that can be executed in parallel with the timing at which the measurement processing (step S17) by the photographing unit 23 and the exposure drawing processing (step S18) by the exposure unit 16 are executed. In the substrate discharge preparation process (steps S14 and S19) and the substrate discharge process (step S21), the movements of the AC hands 24A and 24B in the X direction and the Z direction are controlled as follows.

  FIG. 6 is a flowchart showing a flow of processing of a movement control processing program for performing movement control of the AC hands 24A and 24B executed by the system control unit 40. The program is stored in advance in a predetermined area of a ROM provided in the system control unit 40. The system control unit 40 is a timing for executing the substrate mounting preparation process (step S12), the substrate discharge preparation process (steps S14 and S19), and the substrate discharge process (step S21) in the above-described exposure drawing process flow. The movement control processing program is executed at the timing when movement of 24A and 24B is started and when the movement direction of AC hands 24A and 24B is switched from the X direction to the Z direction or from the Z direction to the X direction.

  In step S31, the system control unit 40 determines whether the measurement process in step S17 of the flowchart of FIG. 5 or the exposure drawing process in step S18 of the flowchart is currently being executed. If the system control unit 40 determines that the measurement process or the exposure drawing process is not being performed in this step, the system control unit 40 selects the standard acceleration A1 as the acceleration during acceleration of the AC hand 24A or 24B in step S32. In the present embodiment, the standard acceleration A1 is the maximum acceleration that can be set in the AC hands 24A and 24B so that the cycle time of the exposure drawing process is minimized. On the other hand, if the system control unit 40 determines that the measurement process or the exposure drawing process is being performed in step S31, the acceleration during acceleration of the AC hand 24A or 24B is smaller than the standard acceleration A1 in step S33. The low acceleration A2 is selected. In the present embodiment, the low acceleration A2 is an acceleration with such a magnitude that the influence on the image quality due to vibration generated when the AC hands 24A and 24B are driven with the low acceleration A2 can be ignored. The system control unit 40 supplies acceleration information indicating the selected acceleration (standard acceleration A1 or low acceleration A2) to the AC hand 24A or 24B. The directions of the standard acceleration A1 and the low acceleration A2 are the same as the moving directions of the AC hands 24A and 24B.

  The AC hand 24A or 24B that has received the acceleration information has a size indicated by the acceleration information in the substrate mounting preparation process (step S12), the substrate discharge preparation process (steps S14 and S19), and the substrate discharge process (step S21). Accelerate at the acceleration of. That is, the AC hand 24A for mounting a substrate is accelerated at the standard acceleration A1 when the measurement process or the exposure drawing process is not performed during the execution of the substrate mounting preparation process (step S12), and the measurement process or the exposure drawing process is performed. Is performed at a low acceleration A2. When the moving speed of the AC hand 24A reaches a predetermined speed V1, the speed V1 is maintained. On the other hand, the AC hand 24B for discharging the substrate has the standard acceleration A1 when the measurement process or the exposure drawing process is not performed during the execution of the substrate discharge preparation process (steps S14 and S19) and the substrate discharge process (step S21). When the measurement process or the exposure drawing process is performed, the acceleration is performed at the low acceleration A2. When the moving speed of the AC hand 24B reaches a predetermined speed V1, the speed V1 is maintained.

  In step S34, the system control unit 40 determines whether a predetermined time has elapsed since the AC hand 24A or 24B started moving. When the system control unit 40 determines that the predetermined time has elapsed, the system control unit 40 proceeds to step S35.

  In step S35, the system control unit 40 performs measurement processing again or exposure drawing processing at a timing when the AC hand 24A or 24B is moving at a constant speed after a predetermined time has elapsed since the AC hand 24A or 24B started moving. It is determined whether or not it is in the middle.

  If the system control unit 40 determines that the measurement process or the exposure drawing process is not being performed in this step, the acceleration (deceleration) when the AC hand 24A or 24B stops moving in the X direction or the Z direction in step S36. ) To select the standard acceleration B1. In the present embodiment, the standard acceleration B1 is the maximum acceleration that can be set in the AC hands 24A and 24B so that the cycle time of the exposure drawing process is minimized.

  On the other hand, if the system control unit 40 determines that the measurement process or the exposure drawing process is being performed in step S35, the acceleration (when the AC hand 24A or 24B stops moving in the X direction or the Z direction in step S37) ( A low acceleration B2 smaller than the standard acceleration B1 is selected as the deceleration). In the present embodiment, the low acceleration B2 is an acceleration (deceleration) that can ignore the influence on the image quality due to vibration generated when the AC hands 24A and 24B are driven with the low acceleration B2. The system control unit 40 supplies acceleration information indicating the selected acceleration (standard acceleration B1 or low acceleration B2) to the AC hand 24A or 24B. The directions of standard acceleration B1 and low acceleration B2 are opposite to the moving directions of AC hands 24A and 24B.

  The AC hand 24A or 24B that has received the acceleration information moves in the X direction or the Z direction in the substrate mounting preparation process (step S12), the substrate discharge preparation process (steps S14 and S19), and the substrate discharge process (step S21). When the vehicle is stopped, the vehicle is decelerated at the acceleration (deceleration) indicated by the acceleration information. That is, when the substrate mounting AC hand 24A stops the movement in the X direction or the Z direction when the substrate mounting preparation process (step S12) is being performed and the measurement process or the exposure drawing process is not performed. When the measurement process or the exposure drawing process is performed, the motor is decelerated at the low acceleration B2 when stopping the movement in the X direction or the Z direction. Stop at the target position. On the other hand, the AC hand 24B for discharging the substrate, when the measurement process or the exposure drawing process is not performed during the execution of the substrate discharge preparation process (steps S14 and S19) and the substrate discharge process (step S21), When the movement in the direction or the Z direction is stopped, the movement is decelerated at the standard acceleration B1 and stopped at the target position. When the measurement process or the exposure drawing process is performed, the movement in the X direction or the Z direction is performed. Is stopped at a target position by decelerating at a low acceleration B2.

  Note that the standard acceleration A1 during acceleration and the standard acceleration B1 during deceleration may be the same or different. Similarly, the magnitudes of the low acceleration A2 during acceleration and the low acceleration B2 during deceleration may be the same or different. In the configuration of the exposure drawing apparatus 1 according to the present embodiment, the measurement process (step S17) and the exposure drawing process are performed at the timing when the substrate stage discharge process (steps S15 and S20) and the substrate stage mounting process (step S16) are executed. Since it is clear that (Step S18) is not performed in parallel, the above-described movement control process is not performed at these timings, and the acceleration (acceleration and deceleration) of the AC hands 24A and 24B is the exposure drawing process. Is set to the maximum value (that is, standard accelerations A1 and B1) that can be set in the AC hands 24A and 24B.

  FIG. 7 is a graph showing the time transition of the speed from when the AC hands 24A and 24B start moving in the X direction or the Z direction until they stop. In FIG. 7, the solid line shows the case of acceleration and deceleration at standard accelerations A1 and B1, and the broken line shows the case of acceleration and deceleration at low accelerations A2 and B2. As described above, the AC hands 24A and 24B accelerate at the standard acceleration A1 or the low acceleration A2 depending on whether the measurement process or the exposure drawing process is being executed, and start moving in the X direction or the Z direction. . The determination as to whether the measurement process or the exposure drawing process is being performed is performed, for example, at time t1 immediately before the AC hands 24A and 24B start moving. The AC hands 24A and 24B move at a constant speed when the moving speed reaches a predetermined speed V1. Thereafter, the AC hands 24A and 24B decelerate at the standard acceleration B1 or the low acceleration B2 depending on whether the measurement process or the exposure drawing process is being executed, and stop the movement in the X direction or the Z direction. The second determination as to whether or not the measurement process or the exposure drawing process is being performed is performed, for example, at a time t2 within the period in which the AC hands 24A and 24B are moving at a constant speed and immediately before the start of deceleration.

  8 to 10 are diagrams illustrating an example of a series of substrate transfer operations by the AC hands 24A and 24B operating according to the flowcharts of FIGS.

  FIG. 8A shows a state where the substrate mounting AC hand 24 </ b> A is moving downward in the Z direction toward the exposed substrate C <b> 1 transported to the supply position P <b> 1 by the substrate introduction unit 5. In the example shown in FIG. 8A, since the exposure drawing process is performed on the exposure target substrate C2 that is input before the exposure target substrate C1, the AC hand 24A accelerates at the low acceleration A2. Move downward in the Z direction. Thereafter, the AC hand 24A decelerates at a low acceleration B2 and stops at a position where it comes into contact with the exposed substrate C1. Such an operation corresponds to the substrate mounting preparation process in step S12 of the flowchart shown in FIG.

  FIG. 8B shows a state where the substrate mounting AC hand 24 </ b> A holding the exposed substrate C <b> 1 is moved upward in the Z direction. In the example shown in FIG. 8B, since the exposure drawing process is performed on the substrate C2 to be exposed, the AC hand 24A accelerates at a low acceleration A2 while holding the substrate C1 by suction, and Z Move upward in the direction. Thereafter, the AC hand 24A decelerates at a low acceleration B2 and stops above the supply position P1. Such an operation corresponds to the substrate mounting preparation process in step S12 of the flowchart shown in FIG.

  8C and 8D show a state where the AC hand 24B for discharging the substrate is moved in the X direction toward the upper side of the stage 10. FIG. In the example shown in FIG. 8B, since the exposure drawing process is performed on the substrate C2 to be exposed, the AC hand 24B is accelerated at the low acceleration A2 and moves in the X direction. Thereafter, the AC hand 24B decelerates at a low acceleration B2 and stops above the stage 10. Such an operation corresponds to the substrate discharge preparation process in steps S14 and S19 of the flowchart shown in FIG.

  FIG. 9A shows a state where the AC hand 24B for discharging the substrate is moved downward in the Z direction toward the exposed substrate C2 on the stage 10 which has been subjected to the exposure drawing process. At this time, the AC hand 24B accelerates at the standard acceleration A1 and moves downward in the Z direction. Thereafter, the AC hand 24B decelerates at the standard acceleration B1 and stops at a position where it comes into contact with the exposed substrate C2. Such an operation corresponds to the substrate stage discharge processing in steps S15 and S20 of the flowchart shown in FIG.

  FIG. 9B shows a state in which the substrate discharge AC hand 24B that holds the substrate C1 to be exposed is moved upward in the Z direction. At this time, the AC hand 24B is accelerated and decelerated at the standard accelerations A1 and B1, and moves upward in the Z direction. Such an operation corresponds to the substrate stage discharge processing in steps S15 and S20 of the flowchart shown in FIG.

  FIG. 9C shows the substrate mounting AC hand 24A that sucks and holds the substrate C1 to be exposed before the exposure drawing process moves in the X direction toward the upper side of the stage 10, and the substrate to be exposed after the exposure drawing process. A state in which the AC hand 24B for discharging the substrate holding the C2 by suction is moving in the X direction toward the discharge position P2 is shown. At this time, the AC hand 24A for board mounting is accelerated at the standard acceleration A1 and moved in the X direction. Thereafter, the AC hand 24A decelerates at the standard acceleration B1 and stops above the stage 10. The operation of the AC hand 24A corresponds to the substrate stage mounting process in step S16 of the flowchart shown in FIG. Since the exposure drawing process is not performed during the substrate stage mounting process by the AC hand 24A, the AC hand 24B for discharging the substrate is accelerated at the standard acceleration A1 and moved in the X direction. Thereafter, the AC hand 24B decelerates at the standard acceleration B1 and stops above the discharge position P2. The operation of the AC hand 24B corresponds to the substrate discharging process in step S21 of the flowchart shown in FIG.

  FIG. 9D shows a substrate mounting AC hand 24A that sucks and holds the exposed substrate C1 before the exposure drawing process moves downward in the Z direction toward the stage 10, and the exposed substrate that has been subjected to the exposure drawing process. A state where the AC hand 24B for discharging the substrate holding the C2 by suction is moved downward in the Z direction toward the discharge position P2 is shown. At this time, the AC hand 24A for board mounting is accelerated at the standard acceleration A1 and moved downward in the Z direction. Thereafter, the AC hand 24A decelerates at the standard acceleration B1 and stops at a position where the substrate to be exposed C1 contacts the stage 10. The operation of the AC hand 24A corresponds to the substrate stage mounting process in step S16 of the flowchart shown in FIG. Since the exposure drawing process is not performed during the substrate stage mounting process by the AC hand 24A, the AC hand 24B for discharging the substrate is accelerated at the standard acceleration A1 and moved downward in the Z direction. Thereafter, the AC hand 24B decelerates at the standard acceleration B1 and stops at a position where the exposed substrate C2 comes into contact with the discharge position P2. The operation of the AC hand 24B corresponds to the substrate discharging process in step S21 of the flowchart shown in FIG.

  FIG. 10A shows that the substrate mounting AC hand 24A on which the substrate C1 to be exposed before exposure drawing processing is mounted on the stage 10 moves upward in the Z direction, and the substrate C2 that has been subjected to exposure drawing processing is moved. The state in which the AC hand 24B placed at the discharge position P2 of the substrate discharge unit 6 is moving upward in the Z direction is shown. At this time, the AC hand 24A for board mounting is accelerated at the standard acceleration A1 and moves upward in the Z direction. Thereafter, the AC hand 24A decelerates the standard acceleration B1 and stops above the stage 10. The operation of the AC hand 24A corresponds to the substrate stage mounting process in step S16 of the flowchart shown in FIG. Since the exposure drawing process is not performed during the substrate stage mounting process by the AC hand 24A, the AC hand 24B for discharging the substrate is accelerated at the standard acceleration A1 and moved upward in the Z direction. Thereafter, the AC hand 24B decelerates by the standard acceleration B1 and stops above the discharge position P2. The operation of the AC hand 24B corresponds to the substrate discharging process in step S21 of the flowchart shown in FIG.

  FIGS. 10B, 10C, and 10D show a state in which the substrate mounting AC hand 24A is moving in the X direction toward the upper side of the supply position P1. Further, the exposed substrate C2 subjected to the exposure drawing process is transported to the substrate discharge port (not shown) by the substrate discharge unit 6 and the newly introduced substrate C3 is transported to the supply position P1 by the substrate introduction unit 5. Has been. In the example shown in FIG. 10B, since the exposure drawing process on the substrate C1 to be exposed has not yet started, the AC hand 24A accelerates at the standard acceleration A1 and starts moving in the X direction. Thereafter, as shown in FIG. 10C, when the exposure drawing process for the substrate C1 to be exposed is started during the movement of the AC hand 24A, the AC hand 24A decelerates at the low acceleration B2 and is shown in FIG. As shown in FIG.

  As is clear from the above description, according to the exposure drawing processing apparatus 1 according to the present embodiment, the acceleration when the AC hand 24A for mounting the substrate and the AC hand 24B for discharging the substrate move in the X direction and the Z direction. Are set to different values depending on whether the measurement process or the exposure drawing process is performed or not. That is, when the measurement process or the exposure drawing process is not performed on the substrate C to be exposed, the AC hands 24A and 24B are accelerated and decelerated at the standard accelerations A1 and B1 that minimize the cycle time. On the other hand, when the measurement process or the exposure drawing process is being performed on the substrate C to be exposed, the AC hands 24A and 24B are accelerated and decelerated at low accelerations A2 and B2 that do not affect the image quality. As described above, according to the exposure drawing apparatus according to the present embodiment, the AC hands 24A and 24B are driven at the standard acceleration within a period in which the occurrence of vibration due to acceleration / deceleration does not affect the image quality. During the period in which the occurrence of vibration due to acceleration / deceleration affects the image quality, it is driven at a low acceleration. Therefore, generation of vibration accompanying acceleration and deceleration of the AC hands 24A and 24B is suppressed while suppressing an increase in cycle time. It becomes possible to suppress the image quality from being lowered.

  Further, according to the exposure drawing processing apparatus 1 according to the present embodiment, it is determined whether the measurement processing or the exposure drawing processing is performed even while the AC hands 24A and 24B are moving. Even when the measurement process or the exposure drawing process is started after the movement of 24A or 24B is started, the AC hands 24A and 24B can be decelerated at the low acceleration B2.

  In the present embodiment, if vibration occurs during the measurement process for measuring the alignment mark formed on the exposed substrate C and the exposure drawing process for exposing and drawing the drawing pattern on the exposed substrate C, the image quality is improved. Taking into account that the AC hand 24A and 24B move within the period from the start time of the measurement process to the end time of the exposure drawing process, taking into account that this will have a significant impact on the case, the acceleration is set to the low accelerations A2 and B2. did. However, it is possible to appropriately change the start time and end time of the period in which the low accelerations A2 and B2 are set. For example, the start point of the period during which the low accelerations A2 and B2 are set may be a point when the mounting of the substrate C to be exposed on the stage 10 is completed, or may be a start point of the exposure drawing process for the substrate C to be exposed. Further, the end point of the period during which the low accelerations A2 and B2 are set may be a point in time when the discharge of the substrate C to be exposed from the stage 10 is completed, or may be a point in time when the exposure drawing process for the substrate C to be exposed ends. That is, the AC hands 24A and 24B are driven with the low accelerations A2 and B2 at least during the period from the start time to the end time of the exposure drawing process on the substrate C to be exposed.

  Further, in the present embodiment, the case where the moving speed of the AC hands 24A and 24B is set to the speed V1 is illustrated regardless of whether the measurement process and the exposure drawing process are being performed, but as illustrated in FIG. When the system control unit 40 determines that the measurement process or the exposure drawing process is not performed when starting the movement of the AC hand 24A or 24B, the AC hand 24A or 24B is accelerated to the speed V1, and the system control is performed. When the unit 40 determines that the measurement process or the exposure drawing process is being performed, the AC hand 24A or 24B may be accelerated to a speed V2 smaller than the speed V1. When vibration increases as the moving speed of the AC hands 24A and 24B increases, it is possible to further suppress vibration during measurement processing and exposure drawing processing by performing speed control as well as acceleration control. It becomes possible.

[Second Embodiment]
The exposure drawing apparatus according to the second embodiment of the present invention will be described below. In the exposure drawing apparatus 1 according to the first embodiment described above, the acceleration at the time when the AC hands 24A and 24B move depends on whether the accelerometers 24A and 24B are moving in the measurement process or the exposure drawing process. It was set to either. On the other hand, the exposure drawing apparatus according to the present embodiment measures the acceleration when the AC hands 24A and 24B move during measurement processing or exposure drawing processing only when the drawing pattern to be exposed and drawn has a high resolution. Depending on whether or not, the standard acceleration or the low acceleration is set, and if the drawing pattern to be exposed and drawn has a low resolution, it is determined whether or not the measuring process or the exposure drawing process is being executed. First, the standard acceleration is set. For example, it is assumed that the stage 10 is displaced by 1.5 μm due to vibration generated when the AC hands 24A and 24B are driven with the standard accelerations A1 and B1. In this case, when the size of one pixel of the drawing pattern to be exposed and drawn is, for example, 2.5 μm × 2.5 μm, it is assumed that the standard accelerations A1 and B1 are set as accelerations when the AC hands 24A and 24B move. However, since the displacement amount of the stage 10 is smaller than the size of one pixel, it is considered that the influence on the image quality due to vibration is small. In this case, in the exposure drawing apparatus according to the present embodiment, the acceleration when the AC hands 24A and 24B move is a standard that minimizes the cycle time regardless of whether the measurement drawing process or the exposure drawing process is being performed. Accelerations A1 and B1 are set. On the other hand, when the size of one pixel of the drawing pattern to be exposed and drawn is, for example, 1 μm × 1 μm, the displacement amount of the stage 10 when the AC hands 24A and 24B are driven with the standard accelerations A1 and B1 is larger than the one pixel size. Since it becomes large, it is thought that the influence on the image quality by vibration is large. In this case, in the exposure / drawing apparatus according to the present embodiment, the AC hands 24A and 24B depend on whether the measurement process or the exposure / drawing process is being performed, as in the exposure / drawing apparatus 1 according to the first embodiment. Set the acceleration when moving to standard acceleration or low acceleration.

  FIG. 12 is a flowchart showing the flow of processing of the movement control processing program according to this embodiment executed by the system control unit 40. The program is stored in advance in a predetermined area of a ROM provided in the system control unit 40. The system control unit 40 is a timing for executing the substrate mounting preparation process (step S12), the substrate discharge preparation process (steps S14 and S19), and the substrate discharge process (step S21) in the exposure drawing process described above, and the AC hand 24A. The movement control processing program is executed at the timing when the movement of AC hands 24A and 24B starts, and when the direction of movement of the AC hands 24A and 24B switches from the X direction to the Z direction or from the Z direction to the X direction.

  In step S40, the system control unit 40 stores resolution data indicating the size per pixel of the drawing pattern to be exposed and drawn in a RAM provided in the system control unit 40. This resolution data is attached to the image data of the drawing pattern to be exposed and drawn, which is input from the input unit 47 by the user or supplied to the system control unit 40, for example.

  In step S41, the system control unit 40 determines whether the measurement process in step S17 of the flowchart of FIG. 5 or the exposure drawing process in step S18 of the flowchart is currently being executed. If the system control unit 40 determines that the measurement process or the exposure drawing process is not being performed in this step, the process proceeds to step S43.

  In step S43, the system control unit 40 selects the standard acceleration A1 as the acceleration when the AC hand 24A or 24B moves in the X direction or the Z direction. In the present embodiment, the standard acceleration A1 is the maximum acceleration that can be set in the AC hands 24A and 24B so that the cycle time of the exposure drawing process is minimized.

  On the other hand, if the system control unit 40 determines that the measurement process or the exposure drawing process is being performed in step S41, whether or not the resolution of the drawing pattern stored in the RAM in step S40 is higher than a predetermined threshold value in step S42. Determine whether. The threshold for making this determination is determined in accordance with, for example, the amount of displacement of the stage 10 due to vibration generated when the AC hands 24A and 24B are driven with the standard accelerations A1 and B1. For example, if the stage 10 is displaced by 1.5 μm due to vibration generated when the AC hands 24A and 24B are driven at the standard accelerations A1 and B1, the system control unit 40 sets the threshold value to 1.5 μm. In this case, when the size of one pixel indicated by the resolution data stored in the RAM of the system control unit 40 is, for example, 2.5 μm × 2.5 μm, the drawing pattern to be exposed and drawn in this step has a low resolution. (No determination), the process proceeds to step S43. On the other hand, when the size of one pixel indicated by the resolution data is, for example, 1 μm × 1 μm, it is determined that the drawing pattern to be exposed and drawn in this step is high resolution (positive determination), and the process proceeds to step S44. Is done.

  In step S44, the system control unit 40 selects a low acceleration A2 smaller than the standard acceleration A1 as an acceleration when the AC hand 24A or 24B moves in the X direction or the Z direction. In the present embodiment, the low acceleration A2 is an acceleration at which the influence on the image quality due to vibration generated when the AC hands 24A and 24B are driven with the low acceleration A2 can be ignored. The system control unit 40 supplies acceleration information indicating the selected acceleration (standard acceleration A1 or low acceleration A2) to the AC hand 24A or 24B.

  The AC hand 24A or 24B that has received the acceleration information uses the acceleration indicated by the acceleration information in the substrate mounting preparation process (step S12), the substrate discharge preparation process (steps S14 and S19), and the substrate discharge process (step S21). To accelerate. In other words, the AC hand 24A for mounting a substrate is exposed when the measurement process or the exposure drawing process is not performed and the exposure process is performed when the substrate mounting preparation process (step S12) is performed. When the resolution of the drawing pattern to be drawn is lower than the threshold value, acceleration is performed at the standard acceleration A1, the measurement process or the exposure drawing process is performed, and the resolution of the drawing pattern to be drawn by exposure is higher than the threshold value. In this case, the vehicle is accelerated at a low acceleration A2. When the moving speed of the AC hand 24A reaches a predetermined speed V1, the speed V1 is maintained.

  On the other hand, the AC hand 24B for discharging the substrate is used when the measurement process or the exposure drawing process is not performed when the substrate discharge preparation process (steps S14 and S19) and the substrate discharge process (step S21) are performed. When exposure drawing processing is being performed and the resolution of the drawing pattern to be exposed drawing is lower than the threshold value, acceleration is performed at the standard acceleration A1, measurement processing or exposure drawing processing is being performed, and exposure drawing is to be performed. When the resolution of the drawing pattern is higher than the threshold, acceleration is performed at a low acceleration A2. When the moving speed of the AC hand 24B reaches a predetermined speed V1, the speed V1 is maintained.

  In step S45, the system control unit 40 determines whether a predetermined time has elapsed since the AC hand 24A or 24B started moving. If the system control unit 40 determines that the predetermined time has elapsed, the system control unit 40 proceeds to step S46.

  In step S46, the system control unit 40 performs measurement processing or exposure drawing processing again at a timing when the AC hand 24A or 24B moves at a constant speed after a predetermined time has elapsed since the AC hand 24A or 24B started moving. It is determined whether or not. If the system control unit 40 determines that the measurement process or the exposure drawing process is not being performed in this step, the acceleration (deceleration) when the AC hand 24A or 24B stops moving in the X direction or the Z direction in step S48. ) To select the standard acceleration B1. In the present embodiment, the standard acceleration B1 is the maximum acceleration that can be set in the AC hands 24A and 24B so that the cycle time of the exposure drawing process is minimized.

  On the other hand, when the system control unit 40 determines in step S46 that the measurement process or the exposure drawing process is being performed, in step S47, it is determined whether or not the acceleration setting during acceleration of the AC hands 24A and 24B is the low acceleration A2. to decide. If the system control unit 47 determines that the acceleration setting during acceleration of the AC hands 24A and 24B is the low acceleration A2, the process proceeds to step S49. If the system control unit 47 determines that the acceleration is the standard acceleration A1, the process proceeds to step S48. . In this step, as in step S42, it is determined whether or not the resolution of the drawing pattern to be exposed and drawn is higher than a predetermined threshold value. If it is determined that the resolution is high, the process proceeds to step S49. However, if it is determined that the resolution is low, the process may be shifted to step S48.

  In step S49, the system control unit 40 selects a low acceleration B2 smaller than the standard acceleration B1 as an acceleration (deceleration) when the AC hand 24A or 24B stops moving in the X direction or the Z direction. In the present embodiment, the low acceleration B2 is an acceleration (deceleration) that can ignore the influence on the image quality due to vibration generated when the AC hands 24A and 24B are driven with the low acceleration B2. The system control unit 40 supplies acceleration information indicating the selected acceleration (standard acceleration B1 or low acceleration B2) to the AC hand 24A or 24B.

  The AC hand 24A or 24B that has received the acceleration information moves in the X direction or the Z direction in the substrate mounting preparation process (step S12), the substrate discharge preparation process (steps S14 and S19), and the substrate discharge process (step S21). When stopping, the vehicle decelerates at the acceleration (deceleration) indicated by the acceleration information. In other words, the AC hand 24A for mounting a substrate is exposed when the measurement process or the exposure drawing process is not performed and the exposure process is performed when the substrate mounting preparation process (step S12) is performed. When the resolution of the drawing pattern to be drawn is lower than the threshold value, when the movement in the X direction or the Z direction is stopped, it is decelerated at the standard acceleration B1 and stopped at the target position, and measurement processing or exposure drawing is performed. When the processing is performed and the resolution of the drawing pattern to be exposed and drawn is higher than the threshold value, when the movement in the X direction or the Z direction is stopped, it is decelerated at the low acceleration B2 at the target position. Stop.

  On the other hand, the AC hand 24B for discharging the substrate is used when the measurement process or the exposure drawing process is not performed when the substrate discharge preparation process (steps S14 and S19) and the substrate discharge process (step S21) are performed. When exposure drawing processing is being performed and the resolution of the drawing pattern to be exposed and drawn is lower than the threshold, the target is decelerated at the standard acceleration B1 when the movement in the X or Z direction is stopped. If the measurement process or exposure drawing process is performed at the position, and the resolution of the drawing pattern to be exposed drawing is higher than the threshold value, the acceleration is low when stopping the movement in the X direction or the Z direction. Decelerate at B2 and stop at the target position.

  As is apparent from the above description, according to the exposure drawing apparatus according to the present embodiment, the AC hands 24A and 24B while suppressing an increase in cycle time, as in the exposure drawing apparatus 1 according to the first embodiment described above. It is possible to suppress the occurrence of vibrations associated with the acceleration and deceleration of the image, and to prevent the image quality from being deteriorated. Further, according to the exposure drawing apparatus according to the present embodiment, a high-resolution drawing pattern in which the influence of vibration on the image quality when the AC hands 24A and 24B are driven at the standard accelerations A1 and B1 is relatively large is exposed. Only when drawing is performed, a movement control process is performed to set the acceleration when the AC hands 24A and 24B move to either the standard acceleration or the low acceleration depending on whether the measurement process or the exposure drawing process is being performed. According to such a control mode, when a drawing pattern with a relatively low resolution is drawn by exposure, the AC hands 24A and 24B have a standard acceleration regardless of whether the measurement process or the exposure drawing process is being executed. In this case, the cycle time can be shortened as compared with the exposure drawing apparatus 1 according to the first embodiment. In the case of exposure drawing of a low-resolution drawing pattern, the influence of vibration on the image quality when the AC hands 24A and 24B are driven at the standard accelerations A1 and B1 is relatively small, so that the image quality is lowered. There is no.

In the present embodiment, the case where the resolution of the drawing pattern to be exposed and drawn is determined based on the size of one pixel of the drawing pattern to be drawn by exposure, but the present invention is not limited to this. For example, it may be determined whether the resolution is high or low based on the required value of edge roughness indicating the linearity of the edge of the drawing line and the required value of alignment accuracy.
[Third embodiment]
The exposure drawing apparatus according to the third embodiment of the present invention will be described below. In the exposure drawing apparatus according to the first embodiment described above, the acceleration at the time when the AC hands 24A and 24B move is selected from the standard acceleration and the low acceleration depending on whether the measurement process or the exposure drawing process is being performed. It was something to set. On the other hand, the exposure drawing apparatus according to this embodiment waits until these processes are completed when the measurement process or the exposure drawing process is being executed at the timing of moving the AC hands 24A and 24B. After these processes are completed, the AC hands 24A and 24B are driven with the standard accelerations A1 and B1.

  FIG. 13 is a flowchart showing the flow of processing of the movement control processing program according to this embodiment executed by the system control unit 40. The program is stored in advance in a predetermined area of a ROM provided in the system control unit 40. The system control unit 40 is a timing for executing the substrate mounting preparation process (step S12), the substrate discharge preparation process (steps S14 and S19), and the substrate discharge process (step S21) in the exposure drawing process described above, and the AC hand 24A. The movement control processing program is executed at the timing when the movement of AC hands 24A and 24B starts, and when the direction of movement of the AC hands 24A and 24B switches from the X direction to the Z direction or from the Z direction to the X direction.

  In step S51, the system control unit 40 determines whether the measurement process in step S17 of the flowchart of FIG. 5 or the exposure drawing process in step S18 of the flowchart is currently being executed. When determining that the measurement process or the exposure drawing process is being performed in step S51, the system control unit 40 sets the AC hands 24A and 24B in a standby state in step S52, and returns the process to step S51. That is, AC hands 24A and 24B remain stationary until measurement processing and exposure drawing processing are completed.

  If the system control unit 40 determines in step S51 that the measurement process or the exposure drawing process is not being performed, the standard acceleration A1 is set as the acceleration when the AC hand 24A or 24B moves in the X direction or the Z direction in step S53. To do. In the present embodiment, the standard acceleration A1 is the maximum acceleration that can be set in the AC hands 24A and 24B so that the cycle time of the exposure drawing process is minimized. The system control unit 40 supplies acceleration information indicating the standard acceleration A1 to the AC hand 24A or 24B.

  The AC hand 24A or 24B that has received the acceleration information receives the standard acceleration indicated by the acceleration information in the substrate mounting preparation process (step S12), the substrate discharge preparation process (steps S14 and S19), and the substrate discharge process (step S21). Accelerate with A1.

  In step S54, the system control unit 40 determines whether a predetermined time has elapsed since the AC hand 24A or 24B started moving. If the system control unit 40 determines that the predetermined time has elapsed, the system control unit 40 proceeds to step S55.

  In step S55, the system control unit 40 sets the standard acceleration B1 as the acceleration (deceleration) when the AC hand 24A or 24B stops moving in the X direction or the Z direction. In the present embodiment, the standard acceleration B1 is the maximum acceleration that can be set in the AC hands 24A and 24B so that the cycle time of the exposure drawing process is minimized. The system control unit 40 supplies acceleration information indicating the set standard acceleration B1 to the AC hand 24A or 24B.

  The AC hand 24A or 24B that has received the acceleration information moves in the X direction or the Z direction in the substrate mounting preparation process (step S12), the substrate discharge preparation process (steps S14 and S19), and the substrate discharge process (step S21). Is stopped at the target position by decelerating at the standard acceleration B1 indicated by the acceleration information.

  As is apparent from the above description, according to the exposure drawing apparatus according to the present embodiment, the AC hands 24A and 24B while suppressing an increase in cycle time, as in the exposure drawing apparatus 1 according to the first embodiment described above. It is possible to suppress the occurrence of vibrations associated with the acceleration and deceleration of the image, and to prevent the image quality from being deteriorated. In the exposure drawing apparatus according to the present embodiment, the AC hands 24A and 24B maintain a stationary state during the execution of the measurement process or the exposure drawing process. Therefore, the cycle time is compared with the exposure drawing apparatus 1 according to the first embodiment. However, it is possible to completely eliminate the vibration caused by the driving of the AC hands 24A and 24B during the measurement process and the exposure drawing process. Further, according to the exposure drawing apparatus according to the present embodiment, since the acceleration set in the AC hands 24A and 24B is only the standard acceleration, the first and the first accelerations that are set by selecting either the standard acceleration or the low acceleration are selected. Compared to the exposure drawing apparatus according to the second embodiment, the movement control process can be simplified.

  The movement control process according to the present embodiment can be combined with the movement control process according to the second embodiment described above. That is, the process of setting the AC hands 24A and 24B to the standby state during the execution of the measurement process or the exposure drawing process is performed only when the drawing pattern to be exposed and drawn has a high resolution, and the drawing pattern to be exposed and drawn has a low resolution. In this case, the AC hands 24A and 24B may always be driven with the standard accelerations A1 and B1 without providing a standby period.

  In each of the above embodiments, the case where the AC hands 24A and 24B perform the transport operation independently is illustrated, but the movements of the AC hands 24A and 24B in the X direction and the Y direction may be interlocked. Further, in each of the above-described embodiments, the case where the AC hand 24A for mounting the substrate and the AC hand 24B for discharging the substrate are used is exemplified, but a single AC hand that performs both mounting and discharging of the substrate may be used. Good.

  Further, in each of the above embodiments, the case where the AC hands 24A and 24B are controlled is illustrated, but for example, the AC hands 24A and 24B are controlled in the aspect according to each of the above embodiments, and the substrate introduction unit 5 is controlled. The operation when the substrate discharge unit 6 transports the substrate C to be exposed may be controlled in the same manner as the movement control of the AC hands 24A and 24B.

  In each of the above embodiments, since there is one stage, the measurement process (step S17) is performed at the timing when the substrate stage discharge process (steps S15 and S20) and the substrate stage mounting process (step S16) are executed. ) And the exposure drawing process (step S18) are illustrated as being not performed in parallel. However, when there are a plurality of stages, the measurement process (step S17) and the exposure drawing process (step S18) are performed. Since there is no process that is not likely to be performed in parallel, the movement control process of this embodiment may be performed at all timings.

  DESCRIPTION OF SYMBOLS 1 ... Exposure drawing apparatus, 10 ... Stage, 11 ... Base | substrate, 12 ... Base, 16 ... Exposure part, 16a ... Exposure head, 17 ... Light source unit, 18 ... Optical fiber, 19 ... Image processing unit, 24A ... AC Hand, 24B ... AC hand, 27 ... DMD, 29 ... Micromirror, 40 ... System control unit, 47 ... Input unit, 48 ... Display unit, C ... Substrate to be exposed.

Claims (9)

A stage for mounting a processing object;
An exposure unit for performing an exposure drawing process on a processing object mounted on the stage;
A transfer unit provided in a state in which the movement of the object to be processed is supplied to and discharged from the stage by moving, and vibrations caused by acceleration and deceleration during movement can propagate to the stage;
Determination means for determining whether the exposure unit is performing the exposure drawing process;
The magnitude of acceleration in the acceleration direction when the transport unit starts moving when the determining unit determines that the exposure unit is not performing the exposure drawing process when the transport unit starts moving Is the magnitude of the standard acceleration in the acceleration direction, and the transport unit moves when the exposure unit determines that the exposure unit is performing the exposure drawing process when the transport unit starts moving. the magnitude of the acceleration direction of the acceleration at the start, the smaller than the size of the acceleration direction of the standard acceleration, when the exposed portion by the determining means during movement of the transport unit not performing the pattern exposure process When the determination is made, the magnitude of the acceleration in the deceleration direction when the conveyance unit stops moving is set as the standard acceleration in the deceleration direction, and the exposure unit causes the determination unit to move the exposure unit during the movement of the conveyance unit. exposure If it is determined that subjected to image processing, the magnitude of the acceleration in the deceleration direction during the conveyance portion stops moving, control means for controlling the movement of smaller than the size of a standard acceleration of the deceleration direction When,
Exposure drawing apparatus.   The exposure drawing apparatus according to claim 1, wherein the determination unit determines whether or not the exposure unit is performing the exposure drawing process at least when the transport unit is stationary and moving.   The control unit accelerates the transport unit to a first speed when the determining unit determines that the exposure unit is not performing the exposure drawing process, and the determining unit causes the exposure unit to perform the exposure drawing. The exposure drawing apparatus according to claim 1, wherein when it is determined that processing is being performed, the transport unit is accelerated to a second speed smaller than the first speed. The transport unit is movable in a plurality of directions,
4. The exposure drawing apparatus according to claim 1, wherein the control unit performs the movement control for each movement of the transport unit in the plurality of directions. 5. The transport unit includes a first transport unit that supplies a processing target to the stage by moving, and a second transport unit that discharges the processing target from the stage by moving,
The exposure drawing apparatus according to claim 1, wherein the control unit performs the movement control with respect to each of the first transport unit and the second transport unit. The exposure unit further includes acquisition means for acquiring resolution information indicating a resolution of a drawing pattern formed on a processing object in the exposure drawing process,
6. The exposure drawing apparatus according to claim 1, wherein the control unit performs the movement control when a resolution indicated by the resolution information acquired by the acquisition unit is higher than a predetermined threshold.   The said control means sets the magnitude | size of the acceleration at the time of the said conveyance part moving to a predetermined value, when the resolution shown by the resolution information acquired by the said acquisition means is lower than a predetermined threshold value. The exposure drawing apparatus described in 1.   A program for causing a computer to function as a determination unit and a control unit in the exposure drawing apparatus according to any one of claims 1 to 7. A stage for mounting the processing object; an exposure unit that performs exposure drawing processing on the processing object mounted on the stage; and supply of the processing object to the stage by moving and from the stage A transfer unit that performs discharge and includes a transfer unit that is provided in a state in which vibration caused by acceleration and deceleration during movement can propagate to the stage, and a movement control method for the transfer unit in an exposure drawing apparatus,
If the exposure unit does not perform the exposure drawing process when the transport unit starts moving, the magnitude of acceleration in the acceleration direction when the transport unit starts moving is expressed as the standard acceleration in the acceleration direction. the size Satoshi, when the transporting unit is the exposure unit when starting the movement is performing the pattern exposure process, the magnitude of the acceleration in the acceleration direction when the transporting unit begins to move, the acceleration direction The acceleration in the deceleration direction when the transport unit stops moving when the exposure unit is not performing the exposure drawing process during the movement of the transport unit. size Satoshi standard acceleration in deceleration direction, when the exposure section during the movement of the transport unit is performing the pattern exposure process, the magnitude of the acceleration in the deceleration direction during the conveyance portion stops moving standard acceleration of the deceleration direction Movement control method to be smaller than the size.

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