JP6294419B2 - Optical semiconductor device and method of manufacturing optical semiconductor device - Google Patents

Optical semiconductor device and method of manufacturing optical semiconductor device Download PDF

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JP6294419B2
JP6294419B2 JP2016171232A JP2016171232A JP6294419B2 JP 6294419 B2 JP6294419 B2 JP 6294419B2 JP 2016171232 A JP2016171232 A JP 2016171232A JP 2016171232 A JP2016171232 A JP 2016171232A JP 6294419 B2 JP6294419 B2 JP 6294419B2
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metal layer
optical semiconductor
metal
package substrate
light
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JP2018037583A (en
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啓慈 一ノ倉
啓慈 一ノ倉
彰一 新関
彰一 新関
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Nikkiso Co Ltd
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Priority to PCT/JP2017/029117 priority patent/WO2018043096A1/en
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/48Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
    • H01L33/483Containers
    • H01L33/486Containers adapted for surface mounting
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/48Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
    • H01L33/52Encapsulations
    • H01L33/56Materials, e.g. epoxy or silicone resin
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/02Containers; Seals
    • H01L23/04Containers; Seals characterised by the shape of the container or parts, e.g. caps, walls
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/36Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes
    • H01L33/40Materials therefor
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/48Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
    • H01L33/58Optical field-shaping elements
    • H01L33/60Reflective elements
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • H01L2224/161Disposition
    • H01L2224/16151Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/16221Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/16225Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/161Cap
    • H01L2924/1615Shape
    • H01L2924/16195Flat cap [not enclosing an internal cavity]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2933/00Details relating to devices covered by the group H01L33/00 but not provided for in its subgroups
    • H01L2933/0008Processes
    • H01L2933/0033Processes relating to semiconductor body packages
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2933/00Details relating to devices covered by the group H01L33/00 but not provided for in its subgroups
    • H01L2933/0008Processes
    • H01L2933/0033Processes relating to semiconductor body packages
    • H01L2933/005Processes relating to semiconductor body packages relating to encapsulations

Description

本発明は、光半導体装置に関し、特に、光半導体素子を有する光半導体装置に関する。   The present invention relates to an optical semiconductor device, and more particularly to an optical semiconductor device having an optical semiconductor element.

近年、青色光を出力する発光ダイオードやレーザダイオード等の半導体発光素子が実用化されており、さらに波長の短い深紫外光を出力する発光素子の開発が進められている。深紫外光は高い殺菌能力を有することから、深紫外光の出力が可能な半導体発光素子は、医療や食品加工の現場における水銀フリーの殺菌用光源として注目されている。また、出力波長を問わず、より発光強度の高い半導体発光素子の開発が進められている。   In recent years, semiconductor light-emitting elements such as light-emitting diodes and laser diodes that output blue light have been put into practical use, and development of light-emitting elements that output deep ultraviolet light having a shorter wavelength is being promoted. Since deep ultraviolet light has a high sterilizing ability, semiconductor light-emitting elements capable of outputting deep ultraviolet light have attracted attention as mercury-free light sources for sterilization in medical and food processing sites. In addition, development of semiconductor light emitting devices with higher emission intensity is underway regardless of the output wavelength.

発光素子は、外部環境から素子を保護するためのパッケージ内に収容される。例えば、発光素子が実装される基板と、その基板上に配置される蓋体とを接合することで発光素子が封止される。蓋体は、金属枠体の開口部に透光性の窓部材が嵌め込まれ、基板の外周には金属製のシールリングが設けられ、金属枠体とシールリングの間でろう材を介して取り付けされる(例えば、特許文献1参照)。   The light emitting element is accommodated in a package for protecting the element from the external environment. For example, the light emitting element is sealed by bonding a substrate on which the light emitting element is mounted and a lid body disposed on the substrate. The lid is fitted with a translucent window member in the opening of the metal frame, a metal seal ring is provided on the outer periphery of the substrate, and is attached via a brazing material between the metal frame and the seal ring (See, for example, Patent Document 1).

特開2005−191314号公報JP 2005-191314 A

基板と蓋体をろう材を介して接合する際、接合性を向上させるために基板と蓋体の間でろう材に荷重をかけながら封止することが望ましい。このとき、基板と蓋体の間から押し出されたろう材の一部が発光素子の実装面に向けて流れ出してしまうと、配線間をショートさせてしまい、製造歩留まりを低下させてしまう懸念がある。   When joining a board | substrate and a cover body through a brazing material, in order to improve bondability, it is desirable to seal, applying a load to a brazing material between a board | substrate and a cover body. At this time, if a part of the brazing material pushed out from between the substrate and the lid flows out toward the mounting surface of the light emitting element, there is a concern that the wiring is short-circuited and the manufacturing yield is lowered.

本発明はこうした課題に鑑みてなされたものであり、その例示的な目的のひとつは、光半導体装置の信頼性および製造歩留まりを向上させる技術を提供することにある。   The present invention has been made in view of these problems, and one of exemplary purposes thereof is to provide a technique for improving the reliability and manufacturing yield of an optical semiconductor device.

上記課題を解決するために、本発明のある態様の光半導体装置は、上面に開口する凹部を有するパッケージ基板と、凹部に収容される光半導体素子と、凹部の開口を覆うように配置される窓部材と、パッケージ基板と窓部材の間を封止する金属接合部と、を備える。パッケージ基板は、光半導体素子が実装される金属電極が設けられる実装面と、実装面の外側に枠状に設けられる分離面と、分離面から上面に向けて傾斜する光反射面とを有し、分離面を避けて光反射面上に金属層が設けられる。   In order to solve the above-described problems, an optical semiconductor device according to an aspect of the present invention is disposed so as to cover a package substrate having a recess opened on an upper surface, an optical semiconductor element accommodated in the recess, and the opening of the recess. A window member, and a metal joint that seals between the package substrate and the window member. The package substrate has a mounting surface on which a metal electrode on which an optical semiconductor element is mounted is provided, a separation surface provided in a frame shape outside the mounting surface, and a light reflection surface that is inclined from the separation surface toward the upper surface. The metal layer is provided on the light reflecting surface while avoiding the separation surface.

この態様によると、傾斜する光反射面上に金属層を設けることにより、光半導体素子の側方に出力される光を金属層で反射させて窓部材に向かわせることができ、光半導体装置の光出力を高めることができる。また、光反射面と実装面の間に金属層で被覆されていない分離面を設けることにより、パッケージ基板と窓部材の間を金属接合材で封止する際に、傾斜する光反射面をつたって流れる金属接合材の流れを分離面で食い止めることができる。これにより、金属接合材が実装面に流れ落ちることによる歩留まりの低下を抑えることができる。   According to this aspect, by providing the metal layer on the inclined light reflecting surface, the light output to the side of the optical semiconductor element can be reflected by the metal layer and directed to the window member. The light output can be increased. In addition, by providing a separation surface that is not covered with a metal layer between the light reflection surface and the mounting surface, an inclined light reflection surface is connected when the package substrate and the window member are sealed with a metal bonding material. It is possible to stop the flow of the metal bonding material that flows by the separation surface. Thereby, the fall of the yield by a metal bonding material flowing down to a mounting surface can be suppressed.

分離面は、実装面より一段高い位置に設けられてもよい。   The separation surface may be provided at a position one step higher than the mounting surface.

金属層は、実装面と分離面との間の側面を避けて設けられてもよい。   The metal layer may be provided to avoid a side surface between the mounting surface and the separation surface.

金属層はさらに、パッケージ基板の上面に枠状に設けられてもよく、金属接合部は、上面に設けられる金属層と接合してもよい。   Further, the metal layer may be provided in a frame shape on the upper surface of the package substrate, and the metal bonding portion may be bonded to the metal layer provided on the upper surface.

分離面は、100μm以上の幅を有してもよい。   The separation surface may have a width of 100 μm or more.

光半導体素子は、深紫外光を発する発光素子であってよく、窓部材は、深紫外光の透過率が80%以上のガラス板を含んでもよい。金属層は、金(Au)を含み、金属接合部は、金錫(AuSn)を含んでもよい。   The optical semiconductor element may be a light emitting element that emits deep ultraviolet light, and the window member may include a glass plate having a deep ultraviolet light transmittance of 80% or more. The metal layer may include gold (Au), and the metal joint may include gold tin (AuSn).

本発明の別の態様は、光半導体装置の製造方法である。この方法は、上面に開口する凹部を有するパッケージ基板の凹部に光半導体素子を収容するステップと、凹部の開口を覆うように窓部材を配置するステップと、パッケージ基板と窓部材の間を金属接合材により封止するステップと、を備える。パッケージ基板は、光半導体素子が実装される金属電極が設けられる実装面と、実装面の外側に枠状に設けられる分離面と、分離面から上面に向けて傾斜する光反射面とを有し、分離面を避けるようにして光反射面および上面に金属層が設けられ、封止するステップは、パッケージ基板と窓部材の間で荷重を加えながら金属接合材を加熱するステップを含む。   Another aspect of the present invention is a method for manufacturing an optical semiconductor device. The method includes a step of accommodating an optical semiconductor element in a concave portion of a package substrate having a concave portion opened on an upper surface, a step of arranging a window member so as to cover the opening of the concave portion, and metal bonding between the package substrate and the window member. Sealing with a material. The package substrate has a mounting surface on which a metal electrode on which an optical semiconductor element is mounted is provided, a separation surface provided in a frame shape outside the mounting surface, and a light reflection surface that is inclined from the separation surface toward the upper surface. The metal layer is provided on the light reflection surface and the upper surface so as to avoid the separation surface, and the step of sealing includes heating the metal bonding material while applying a load between the package substrate and the window member.

この態様によると、パッケージ基板の上面と枠体の間で荷重をかけながら金属接合材を加熱溶融させる際、傾斜する光反射面をつたって流れる金属接合材の流れを分離面で食い止めることができる。これにより金属接合材が実装目に流れ落ちることによる歩留まりの低下を抑えつつ、荷重を加えた接合プロセスによって信頼性の高い封止構造を実現できる。   According to this aspect, when the metal bonding material is heated and melted while applying a load between the upper surface of the package substrate and the frame, the flow of the metal bonding material flowing along the inclined light reflecting surface can be stopped by the separation surface. . As a result, a highly reliable sealing structure can be realized by a bonding process in which a load is applied while suppressing a decrease in yield due to the metal bonding material flowing into the mounting.

本発明によれば、光半導体素子を有する光半導体装置の信頼性を高めることができる。   ADVANTAGE OF THE INVENTION According to this invention, the reliability of the optical semiconductor device which has an optical semiconductor element can be improved.

実施の形態に係る発光装置を概略的に示す断面図である。It is sectional drawing which shows schematically the light-emitting device which concerns on embodiment. 図1の発光装置を概略的に示す上面図である。FIG. 2 is a top view schematically showing the light emitting device of FIG. 1. 実施の形態に係る発光装置の製造方法を示すフローチャートである。It is a flowchart which shows the manufacturing method of the light-emitting device which concerns on embodiment. 発光装置の製造工程を概略的に示す断面図である。It is sectional drawing which shows the manufacturing process of a light-emitting device roughly. 変形例に係る発光装置を概略的に示す断面図である。It is sectional drawing which shows schematically the light-emitting device which concerns on a modification.

以下、図面を参照しながら、本発明を実施するための形態について詳細に説明する。説明において同一の要素には同一の符号を付し、重複する説明を適宜省略する。説明の理解を助けるため、各図面における各構成要素の寸法比は必ずしも実際の装置の寸法比と一致しない。   Hereinafter, embodiments for carrying out the present invention will be described in detail with reference to the drawings. In the description, the same elements are denoted by the same reference numerals, and overlapping descriptions are omitted as appropriate. In order to facilitate understanding of the description, the dimensional ratio of each component in each drawing does not necessarily match the dimensional ratio of the actual device.

図1は、実施の形態に係る発光装置10を概略的に示す断面図であり、図2は、図1の発光装置10を概略的に示す上面図である。発光装置10は、発光素子20と、パッケージ基板30と、窓部材40と、封止構造50とを備える。発光装置10は、光半導体素子である発光素子20を有する光半導体装置である。   FIG. 1 is a sectional view schematically showing a light emitting device 10 according to the embodiment, and FIG. 2 is a top view schematically showing the light emitting device 10 of FIG. The light emitting device 10 includes a light emitting element 20, a package substrate 30, a window member 40, and a sealing structure 50. The light emitting device 10 is an optical semiconductor device having a light emitting element 20 that is an optical semiconductor element.

発光素子20は、中心波長λが約360nm以下となる「深紫外光」を発するように構成されるLED(Light Emitting Diode)チップである。このような波長の深紫外光を出力するため、発光素子20は、バンドギャップが約3.4eV以上となる窒化アルミニウムガリウム(AlGaN)系半導体材料で構成される。本実施の形態では、特に、中心波長λが約240nm〜350nmの深紫外光を発する場合について示す。   The light emitting element 20 is an LED (Light Emitting Diode) chip configured to emit “deep ultraviolet light” having a center wavelength λ of about 360 nm or less. In order to output deep ultraviolet light having such a wavelength, the light emitting element 20 is made of an aluminum gallium nitride (AlGaN) based semiconductor material having a band gap of about 3.4 eV or more. In this embodiment, particularly, a case where deep ultraviolet light having a center wavelength λ of about 240 nm to 350 nm is emitted is shown.

発光素子20は、半導体積層構造22と、光出射面24と、第1素子電極26と、第2素子電極27とを有する。   The light emitting element 20 includes a semiconductor multilayer structure 22, a light emitting surface 24, a first element electrode 26, and a second element electrode 27.

半導体積層構造22は、光出射面24となる基板上に積層されるテンプレート層、n型クラッド層、活性層、p型クラッド層などを含む。発光素子20が深紫外光を出力するように構成される場合、光出射面24となる基板としてサファイア(Al)基板が用いられ、半導体積層構造22のテンプレート層として窒化アルミニウム(AlN)層が用いられる。また、半導体積層構造22のクラッド層や活性層はAlGaN系半導体材料で構成される。 The semiconductor multilayer structure 22 includes a template layer, an n-type cladding layer, an active layer, a p-type cladding layer, and the like that are stacked on a substrate that becomes the light emitting surface 24. When the light emitting element 20 is configured to output deep ultraviolet light, a sapphire (Al 2 O 3 ) substrate is used as a substrate that becomes the light emitting surface 24, and aluminum nitride (AlN) is used as a template layer of the semiconductor multilayer structure 22. Layers are used. The cladding layer and the active layer of the semiconductor multilayer structure 22 are made of an AlGaN-based semiconductor material.

第1素子電極26および第2素子電極27は、半導体積層構造22の活性層にキャリアを供給するための電極であり、それぞれがアノード電極またはカソード電極である。第1素子電極26および第2素子電極27は、光出射面24と反対側に設けられる。第1素子電極26は、基板30の第1内側電極36に取り付けられ、第2素子電極27は、基板30の第2内側電極37に取り付けられる。   The first element electrode 26 and the second element electrode 27 are electrodes for supplying carriers to the active layer of the semiconductor multilayer structure 22, and each is an anode electrode or a cathode electrode. The first element electrode 26 and the second element electrode 27 are provided on the side opposite to the light emitting surface 24. The first element electrode 26 is attached to the first inner electrode 36 of the substrate 30, and the second element electrode 27 is attached to the second inner electrode 37 of the substrate 30.

パッケージ基板30は、上面31と下面32を有する矩形状の部材である。パッケージ基板30は、アルミナ(Al)や窒化アルミニウム(AlN)などを含むセラミック基板であり、いわゆる高温焼成セラミック多層基板(HTCC、High Temperature Co-fired Ceramic)である。 The package substrate 30 is a rectangular member having an upper surface 31 and a lower surface 32. The package substrate 30 is a ceramic substrate containing alumina (Al 2 O 3 ), aluminum nitride (AlN), or the like, and is a so-called high temperature fired ceramic multilayer substrate (HTCC, High Temperature Co-fired Ceramic).

パッケージ基板30の上面31には、発光素子20を収容するための凹部34が設けられる。凹部34には、実装面61と、分離面62と、光反射面63とが設けられる。実装面61は、凹部34の中央部に設けられ、発光素子20を取り付けるための第1内側電極36および第2内側電極37が設けられる。分離面62は、実装面61の外側または外周を囲むように設けられ、実装面61よりも一段高い位置に設けられる。光反射面63は、分離面62の外側に設けられ、分離面62から上面31に向けて傾斜している。パッケージ基板30の下面32には、発光装置10を外部基板などに実装するための第1外側電極38および第2外側電極39が設けられる。   A recess 34 for accommodating the light emitting element 20 is provided on the upper surface 31 of the package substrate 30. The recess 34 is provided with a mounting surface 61, a separation surface 62, and a light reflecting surface 63. The mounting surface 61 is provided at the center of the recess 34, and the first inner electrode 36 and the second inner electrode 37 for attaching the light emitting element 20 are provided. The separation surface 62 is provided so as to surround the outer side or the outer periphery of the mounting surface 61, and is provided at a position higher than the mounting surface 61. The light reflecting surface 63 is provided outside the separation surface 62 and is inclined from the separation surface 62 toward the upper surface 31. A first outer electrode 38 and a second outer electrode 39 for mounting the light emitting device 10 on an external substrate or the like are provided on the lower surface 32 of the package substrate 30.

窓部材40は、凹部34の開口を覆うように設けられる板状の保護部材である。窓部材40は、発光素子20が発する紫外光を透過する材料で構成され、例えば、ガラス、石英、水晶、サファイアなどを用いることができる。窓部材40は、特に深紫外光の透過率が高く、耐熱性および気密性の高い材料で構成されることが好ましく、パッケージ基板30に比べて熱膨張係数の小さい材料で構成されることが好ましい。このような特性を備える材料として石英ガラスを窓部材40に用いることが望ましい。発光素子20が発する紫外光は、窓部材40を介して窓部材40の外面43からパッケージの外部へと出力される。   The window member 40 is a plate-shaped protection member provided so as to cover the opening of the recess 34. The window member 40 is made of a material that transmits ultraviolet light emitted from the light emitting element 20, and for example, glass, quartz, quartz, sapphire, or the like can be used. The window member 40 is preferably made of a material that has a particularly high transmittance of deep ultraviolet light, high heat resistance, and high airtightness, and is preferably made of a material having a smaller thermal expansion coefficient than the package substrate 30. . It is desirable to use quartz glass for the window member 40 as a material having such characteristics. The ultraviolet light emitted from the light emitting element 20 is output from the outer surface 43 of the window member 40 to the outside of the package through the window member 40.

封止構造50は、第1金属層51と、第2金属層52と、金属接合部53とを有する。   The sealing structure 50 includes a first metal layer 51, a second metal layer 52, and a metal joint portion 53.

第1金属層51は、パッケージ基板30の上面31に枠状に設けられる。第1金属層51は、矩形のパッケージ基板30に対応した矩形枠形状を有し、四隅がR面取りされている。第1金属層51は、例えばセラミック基板へのメタライズ処理により形成される。第1金属層51は、タングステン(W)やモリブデン(Mo)等を含む基材にニッケル(Ni)や金(Au)等がメッキされて形成され、例えば、W/Ni/Auの積層構造を有する。第1金属層51は、金属接合部53と接合される。   The first metal layer 51 is provided in a frame shape on the upper surface 31 of the package substrate 30. The first metal layer 51 has a rectangular frame shape corresponding to the rectangular package substrate 30, and four corners are rounded. The first metal layer 51 is formed, for example, by a metallization process on a ceramic substrate. The first metal layer 51 is formed by plating a base material containing tungsten (W), molybdenum (Mo), or the like with nickel (Ni), gold (Au), or the like. For example, the first metal layer 51 has a laminated structure of W / Ni / Au. Have. The first metal layer 51 is bonded to the metal bonding portion 53.

第1金属層51は、パッケージ基板30の光反射面63上にも設けられる。傾斜する光反射面63の上に金属層を設けることにより、発光素子20の側方に出力される深紫外光を窓部材40に向けて反射させ、パッケージの外部に出射させることができる。一方、第1金属層51は、分離面62を避けて設けられる。つまり、分離面62上には金属層が形成されず、第1金属層51が形成されない領域が分離面62であるということもできる。また、実装面61と分離面62の間に位置する側面64にも第1金属層51は形成されない。   The first metal layer 51 is also provided on the light reflecting surface 63 of the package substrate 30. By providing the metal layer on the inclined light reflecting surface 63, the deep ultraviolet light output to the side of the light emitting element 20 can be reflected toward the window member 40 and emitted to the outside of the package. On the other hand, the first metal layer 51 is provided to avoid the separation surface 62. That is, it can be said that the metal layer is not formed on the separation surface 62 and the region where the first metal layer 51 is not formed is the separation surface 62. In addition, the first metal layer 51 is not formed on the side surface 64 located between the mounting surface 61 and the separation surface 62.

第2金属層52は、窓部材40の内面44に枠状に設けられる。第2金属層52は、矩形の窓部材40に対応した矩形枠形状を有し、四隅がR面取りされている。第2金属層52は、真空蒸着やスパッタリングなどの方法により形成される。第2金属層52は、窓部材40の内面44上にチタン(Ti)、白金(Pt)、金(Au)が順に積層される多層膜である。なお、チタンの代わりにクロム(Cr)を用いてもよいし、白金(Pt)の代わりに銅(Cu)およびニッケル(Ni)を用いてもよい。第2金属層52は、金属接合部53と接合される。   The second metal layer 52 is provided in a frame shape on the inner surface 44 of the window member 40. The second metal layer 52 has a rectangular frame shape corresponding to the rectangular window member 40, and four corners are rounded. The second metal layer 52 is formed by a method such as vacuum deposition or sputtering. The second metal layer 52 is a multilayer film in which titanium (Ti), platinum (Pt), and gold (Au) are sequentially laminated on the inner surface 44 of the window member 40. Note that chromium (Cr) may be used instead of titanium, and copper (Cu) and nickel (Ni) may be used instead of platinum (Pt). The second metal layer 52 is bonded to the metal bonding portion 53.

金属接合部53は、第1金属層51と第2金属層52の間に設けられ、パッケージの外周部においてパッケージ基板30と窓部材40の間を接合して封止する。金属接合部53は、第1金属層51と第2金属層52の間を充填するとともに、第2金属層52を挟んだ両側(パッケージの内側および外側の双方)に位置するよう構成される。金属接合部53は、低融点の金属材料で構成され、例えば金錫(AuSn)や銀錫(AgSn)の合金を含む。金属接合部53は、溶融状態において第1金属層51と第2金属層52の間に広がって共晶接合を形成する。金属接合部53は、高い封止信頼性を有するとともに溶融温度が300℃以下の低温となるように、錫(Sn)の含有量が20%wt〜24%wtの金錫で構成されることが好ましい。   The metal joint portion 53 is provided between the first metal layer 51 and the second metal layer 52 and joins and seals between the package substrate 30 and the window member 40 at the outer peripheral portion of the package. The metal joint portion 53 is configured to fill between the first metal layer 51 and the second metal layer 52 and to be located on both sides (both inside and outside the package) sandwiching the second metal layer 52. The metal joint portion 53 is made of a low melting point metal material and includes, for example, an alloy of gold tin (AuSn) or silver tin (AgSn). The metal bonding part 53 spreads between the first metal layer 51 and the second metal layer 52 in a molten state to form a eutectic bond. The metal joint portion 53 is composed of gold tin having a tin (Sn) content of 20% wt to 24% wt so as to have high sealing reliability and a low melting temperature of 300 ° C. or lower. Is preferred.

封止構造50は、第1金属層51の上に第2金属層52の全体が重なるよう構成され、第1金属層51が設けられる領域内に第2金属層52の全体が位置するよう構成されている。つまり、第1金属層51が設けられていない領域上に第2金属層52が位置しないように構成され、第1金属層51と第2金属層52がずれて配置されていない。具体的には、第1金属層51および第2金属層52のそれぞれの外形寸法および内形寸法が下記に詳述されるような所定のサイズに調整される。   The sealing structure 50 is configured such that the entire second metal layer 52 overlaps the first metal layer 51, and the entire second metal layer 52 is positioned in a region where the first metal layer 51 is provided. Has been. That is, the second metal layer 52 is configured not to be positioned on the region where the first metal layer 51 is not provided, and the first metal layer 51 and the second metal layer 52 are not shifted from each other. Specifically, the outer dimensions and inner dimensions of the first metal layer 51 and the second metal layer 52 are adjusted to predetermined sizes as described in detail below.

図2は、パッケージ基板30および窓部材40の寸法を概略的に示す。図示されるように、第1金属層51の外形寸法w11は、第2金属層52の外形寸法w21よりも大きく、第1金属層51の内形寸法w12は、第2金属層52の内形寸法w22よりも小さい。したがって、第1金属層51の外形寸法w11と内形寸法w12の差に対応する幅w13は、第2金属層52の外形寸法w21と内形寸法w22の差に対応する幅w23よりも大きい。また、第1金属層51の幅w13は、第2金属層52の幅w23の2倍以上となるよう構成されている。 FIG. 2 schematically shows the dimensions of the package substrate 30 and the window member 40. As illustrated, the outer dimension w 11 of the first metal layer 51 is larger than the outer dimension w 21 of the second metal layer 52, and the inner dimension w 12 of the first metal layer 51 is equal to the second metal layer 52. smaller than the inner dimensions w 22 of. Therefore, the width w 13 corresponding to the difference between inner dimensions w 12 and external dimensions w 11 of the first metal layer 51 has a width corresponding to the difference between external dimensions w 21 with inner dimensions w 22 of the second metal layer 52 greater than w 23. Further, the width w 13 of the first metal layer 51 is configured to be at least twice the width w 23 of the second metal layer 52.

ある実施例において、パッケージ基板30の外形寸法w10は3.5mmであり、第1金属層51の外形寸法w11は3.2mmであり、第1金属層51の内形寸法w12は2.3mmであり、第1金属層51の幅w13は0.45mmである。また、窓部材40の外形寸法w20は3.4mmであり、第2金属層52の外形寸法w21は3.0mmであり、第2金属層52の内形寸法w22は2.6mmであり、第2金属層52の幅w23は0.2mmである。この実施例において、第1金属層51と第2金属層52の内形寸法差(0.3mm)は、第1金属層51と第2金属層52の外形寸法差(0.2mm)より大きい。 In an embodiment, the outer dimension w 10 of the package substrate 30 is 3.5 mm, the outer dimension w 11 of the first metal layer 51 is 3.2 mm, and the inner dimension w 12 of the first metal layer 51 is 2. 3 mm, and the width w 13 of the first metal layer 51 is 0.45 mm. The outer dimension w 20 of the window member 40 is 3.4 mm, the outer dimension w 21 of the second metal layer 52 is 3.0 mm, and the inner dimension w 22 of the second metal layer 52 is 2.6 mm. The width w 23 of the second metal layer 52 is 0.2 mm. In this embodiment, the inner dimension difference (0.3 mm) between the first metal layer 51 and the second metal layer 52 is larger than the outer dimension difference (0.2 mm) between the first metal layer 51 and the second metal layer 52. .

分離面62は、実装面61の外周を囲む幅wが100μm以上となるように設けられ、好ましくは幅wが150μm以上となるように設けられる。分離面62の幅wをある程度以上とすることにより、溶融状態の金属接合材が上面31から光反射面63に向けて流れ落ちたとしても、第1金属層51が設けられていない分離面62によりその流れを食い止め、分離面62上に金属接合材が留まるようにできる。 The separation surface 62 is provided so that the width w 3 surrounding the outer periphery of the mounting surface 61 is 100 μm or more, and preferably the width w 3 is 150 μm or more. With the width w 3 of the separation film 62 to some extent or more, even as the metal bonding material in a molten state is run down toward the upper surface 31 to the light reflecting surface 63, the separation surface 62 of the first metal layer 51 is not provided This prevents the flow and allows the metal bonding material to remain on the separation surface 62.

つづいて、発光装置10の製造方法について説明する。
図3は、実施の形態に係る発光装置10の製造方法を示すフローチャートである。パッケージ基板30の凹部34に発光素子20を収容し(S10)、パッケージ基板30の第1金属層51と窓部材40の第2金属層52を位置合わせして第1金属層51と第2金属層52の間に金属接合材56(後述の図4参照)が配置されるようにする(S12)。つづいて、パッケージ基板30と窓部材40の間で荷重をかけながら金属接合材を加熱して溶融状態とする(S14)。その後、パッケージ基板30と窓部材40の間で荷重をかけながら金属接合部53を冷却して固化させる(S16)。
Next, a method for manufacturing the light emitting device 10 will be described.
FIG. 3 is a flowchart showing a method for manufacturing the light emitting device 10 according to the embodiment. The light emitting element 20 is accommodated in the recess 34 of the package substrate 30 (S10), and the first metal layer 51 and the second metal are aligned by aligning the first metal layer 51 of the package substrate 30 and the second metal layer 52 of the window member 40. A metal bonding material 56 (see FIG. 4 described later) is disposed between the layers 52 (S12). Subsequently, the metal bonding material is heated to a molten state while applying a load between the package substrate 30 and the window member 40 (S14). Thereafter, the metal joint 53 is cooled and solidified while applying a load between the package substrate 30 and the window member 40 (S16).

図4は、発光装置10の製造工程を概略的に示す断面図であり、金属接合材56を配置してパッケージ基板30および窓部材40を位置合わせする工程を示している。パッケージ基板30および窓部材40は、第1金属層51の領域上に第2金属層52が全体が位置するように位置合わせされる。例えば、パッケージ基板30と窓部材40の中心位置が揃うように位置合わせすることにより第1金属層51の上に第2金属層52の全体を配置することができる。その他、パッケージ基板30の四隅のいずれかと窓部材40の四隅のいずれかが揃うように位置合わせしてもよい。この場合、上述した寸法の実施例によれば、パッケージ基板30と窓部材40の中心位置が±50μmの範囲でずれてしまうが、そのずれがあったとしても、第1金属層51の上に第2金属層52の全体が位置するように配置することができる。   FIG. 4 is a cross-sectional view schematically showing a manufacturing process of the light emitting device 10, and shows a process of arranging the metal bonding material 56 and aligning the package substrate 30 and the window member 40. The package substrate 30 and the window member 40 are aligned so that the second metal layer 52 is entirely located on the region of the first metal layer 51. For example, the entire second metal layer 52 can be disposed on the first metal layer 51 by aligning the center positions of the package substrate 30 and the window member 40. In addition, the positioning may be performed so that any of the four corners of the package substrate 30 and any of the four corners of the window member 40 are aligned. In this case, according to the embodiment having the dimensions described above, the center positions of the package substrate 30 and the window member 40 are displaced within a range of ± 50 μm. It can arrange | position so that the whole 2nd metal layer 52 may be located.

位置合わせされた第1金属層51と第2金属層52の間には金属接合材56が配置される。金属接合材56は、第2金属層52に対応した矩形枠形状を有する金錫のプリフォームである。金属接合材56は、例えば、第2金属層52と同じ外形寸法および内形寸法を有する。金属接合材56は、第1金属層51または第2金属層52にあらかじめ仮止めされていてもよい。金属接合材56の厚さは10〜50μm程度であり、好ましくは15〜30μm程度である。このような形状および厚さのプリフォームを用いて荷重60をかけながら封止することで、厚さが5〜20μm程度の金属接合部53を形成することができる。なお、封止時に加える荷重60は50g以上であり、好ましくは100g以上、より好ましくは200g以上である。   A metal bonding material 56 is disposed between the aligned first metal layer 51 and second metal layer 52. The metal bonding material 56 is a gold-tin preform having a rectangular frame shape corresponding to the second metal layer 52. The metal bonding material 56 has, for example, the same outer dimensions and inner dimensions as those of the second metal layer 52. The metal bonding material 56 may be temporarily fixed to the first metal layer 51 or the second metal layer 52 in advance. The thickness of the metal bonding material 56 is about 10 to 50 μm, preferably about 15 to 30 μm. By sealing using a preform having such a shape and thickness while applying a load 60, the metal joint 53 having a thickness of about 5 to 20 μm can be formed. The load 60 applied at the time of sealing is 50 g or more, preferably 100 g or more, more preferably 200 g or more.

金属接合材56は荷重60をかけながら加熱溶融され、第1金属層51と第2金属層52の間で広がっていく。金属接合材56は、パッケージ基板30と窓部材40の間で押し出されるため、金属接合材56の一部は、傾斜した光反射面63を伝って凹部34の内側に流れ落ちるかもしれない。しかしながら、光反射面63と実装面61の間には金属層で被覆されていない分離面62が設けられるため、溶融金属に対する濡れ性の違いを利用して接合材の流れを分離面62にて留めることができる。例えば、溶融金属は濡れ性の低い分離面62においてボール状に膨らむようにしてその場所にとどまる。   The metal bonding material 56 is heated and melted while applying a load 60 and spreads between the first metal layer 51 and the second metal layer 52. Since the metal bonding material 56 is pushed out between the package substrate 30 and the window member 40, a part of the metal bonding material 56 may flow down to the inside of the recess 34 along the inclined light reflecting surface 63. However, since the separation surface 62 that is not covered with the metal layer is provided between the light reflection surface 63 and the mounting surface 61, the flow of the bonding material is made to flow on the separation surface 62 using the difference in wettability with respect to the molten metal. Can be fastened. For example, the molten metal stays at the place so as to swell in a ball shape on the separation surface 62 having low wettability.

金属接合材56を加熱溶融させる工程は、窒素(N)などの不活性ガスの雰囲気下でなされることが好ましい。これにより、溶融状態となった金錫プリフォームの酸化を防ぐとともに、パッケージの内部に不活性ガスを充填できる。しかしながら、本実施の形態に係る加熱溶融工程は、酸素(O)を含む乾燥空気の雰囲気下でなされてもよい。荷重をかけながら金錫プリフォームを加熱溶融させることで、第1金属層51と第2金属層52の間での金属接合材56の酸化を防ぎつつ封止することが可能となる。 The step of heating and melting the metal bonding material 56 is preferably performed in an atmosphere of an inert gas such as nitrogen (N 2 ). As a result, the gold-tin preform in a molten state can be prevented from being oxidized, and the inside of the package can be filled with an inert gas. However, the heating and melting step according to the present embodiment may be performed in an atmosphere of dry air containing oxygen (O 2 ). By heating and melting the gold-tin preform while applying a load, the metal bonding material 56 can be sealed while preventing oxidation between the first metal layer 51 and the second metal layer 52.

以上の構成により、本実施の形態によれば、発光装置10の光取出効率および封止信頼性を高めるとともに封止工程における歩留まり低下を防ぐことができる。一実施例によれば、比較的低温(300℃程度)で封止ができるよう金属接合材56として金錫を使用し、光反射面63に金めっきを施している。金(Au)は深紫外光に対する反射率が比較的高い材料であるため、金めっきの光反射面63を形成することにより光取出効率をより高めることができる。また、光反射面63に金属接合材56の一部が流れ出したとしても接合材の主成分は金(Au)であるため、金錫接合材の付着による光反射面63の反射率への影響は少ない。したがって、封止信頼性を高めるために金属接合材56の量を多めにし、光反射面63へ流れ出る接合材の量が増えたとしても、光反射面63の比較的高い反射率を維持できる。   With the above configuration, according to the present embodiment, it is possible to increase the light extraction efficiency and sealing reliability of the light emitting device 10 and to prevent a decrease in yield in the sealing process. According to one embodiment, gold tin is used as the metal bonding material 56 so that sealing can be performed at a relatively low temperature (about 300 ° C.), and the light reflecting surface 63 is plated with gold. Since gold (Au) is a material having a relatively high reflectivity with respect to deep ultraviolet light, the light extraction efficiency can be further increased by forming the light reflecting surface 63 of gold plating. Further, even if a part of the metal bonding material 56 flows out to the light reflecting surface 63, the main component of the bonding material is gold (Au). Therefore, the influence of the adhesion of the gold tin bonding material on the reflectance of the light reflecting surface 63 is affected. There are few. Therefore, even if the amount of the metal bonding material 56 is increased to increase the sealing reliability and the amount of the bonding material flowing out to the light reflecting surface 63 is increased, the relatively high reflectance of the light reflecting surface 63 can be maintained.

図5は、変形例に係る発光装置110を概略的に示す断面図である。本変形例では、パッケージ基板130の実装面161の外側に第1光反射層163と第2光反射層164が設けられ、第1光反射層163と第2光反射層164の間に分離面162が設けられる点で上述の実施の形態と相違する。つまり本変形例では、実装面161の外周に第1光反射層163が設けられ、第1光反射層163の外周に分離面162が設けられる。第1光反射層163および第2光反射層164には金属層が設けられる一方、分離面162には金属層が設けられていない。本変形例においても上述の実施の形態と同様の効果を奏することができる。   FIG. 5 is a cross-sectional view schematically showing a light emitting device 110 according to a modification. In the present modification, a first light reflection layer 163 and a second light reflection layer 164 are provided outside the mounting surface 161 of the package substrate 130, and a separation surface is provided between the first light reflection layer 163 and the second light reflection layer 164. The difference from the above-described embodiment is that 162 is provided. That is, in this modification, the first light reflection layer 163 is provided on the outer periphery of the mounting surface 161, and the separation surface 162 is provided on the outer periphery of the first light reflection layer 163. The first light reflection layer 163 and the second light reflection layer 164 are provided with a metal layer, while the separation surface 162 is not provided with a metal layer. Also in this modification, the same effect as the above-mentioned embodiment can be produced.

以上、本発明を実施の形態にもとづいて説明した。本発明は上記実施の形態に限定されず、種々の設計変更が可能であり、様々な変形例が可能であること、またそうした変形例も本発明の範囲にあることは、当業者に理解されるところである。   The present invention has been described based on the embodiments. It is understood by those skilled in the art that the present invention is not limited to the above-described embodiment, and various design changes are possible, and various modifications are possible, and such modifications are within the scope of the present invention. It is a place.

上述の実施の形態および変形例では、発光装置のパッケージ内に発光素子のみを含める場合を示した。さらなる変形例においては、付加的な機能を持たせるために発光素子以外の電子部品をパッケージ内に組み込むこととしてもよい。例えば、電気的サージから発光素子を保護するためのツェナーダイオードを筐体内に組み込むこととしてもよい。また、発光素子が出力する光の波長を変換するための蛍光体を組み込んでもよいし、発光素子が発する光の配向を制御するための光学素子を組み込んでもよい。   In the above-described embodiment and modification, the case where only the light-emitting element is included in the package of the light-emitting device has been described. In a further modification, an electronic component other than the light emitting element may be incorporated in the package in order to provide an additional function. For example, a Zener diode for protecting the light emitting element from an electrical surge may be incorporated in the housing. Further, a phosphor for converting the wavelength of light output from the light emitting element may be incorporated, or an optical element for controlling the orientation of light emitted from the light emitting element may be incorporated.

上述の実施の形態および変形例では、半導体発光素子をパッケージ内に封止した発光装置について示した。さらなる変形例においては、受光素子を封止するために上述の封止構造を用いてもよい。例えば、深紫外光を受光するための受光素子の封止に上述のパッケージ構造を用いてもよい。つまり、上記パッケージを光半導体素子の封止に用いてもよい。   In the above-described embodiments and modifications, the light-emitting device in which the semiconductor light-emitting element is sealed in the package is shown. In a further modification, the above-described sealing structure may be used to seal the light receiving element. For example, the above-described package structure may be used for sealing a light receiving element for receiving deep ultraviolet light. That is, the package may be used for sealing an optical semiconductor element.

上述の実施の形態および変形例では、窓部材の外周に金属層を設けて接合させる構成について示した。さらなる変形例においては、窓部材の外周に金属枠を設け、その枠体とパッケージ基板の間を金属接合してもよい。窓部材の外周に設けられる金属枠は、熱膨張係数が窓部材と近似した材料であってもよく、例えば、コバール合金であってもよい。コバールの金属枠の表面に金めっきが施され、金錫合金との接合性が高められてもよい。   In the above-described embodiment and modification, the configuration in which the metal layer is provided on the outer periphery of the window member and bonded is shown. In a further modification, a metal frame may be provided on the outer periphery of the window member, and metal bonding may be performed between the frame body and the package substrate. The metal frame provided on the outer periphery of the window member may be a material having a thermal expansion coefficient similar to that of the window member, and may be, for example, a Kovar alloy. Gold plating may be applied to the surface of the Kovar metal frame to improve the bondability with the gold-tin alloy.

10…発光装置、20…発光素子、30…パッケージ基板、31…上面、34…凹部、40…窓部材、53…金属接合部、56…金属接合材、60…荷重、61…実装面、62…分離面、63…光反射面、64…側面。   DESCRIPTION OF SYMBOLS 10 ... Light-emitting device, 20 ... Light emitting element, 30 ... Package board | substrate, 31 ... Upper surface, 34 ... Recessed part, 40 ... Window member, 53 ... Metal joining part, 56 ... Metal joining material, 60 ... Load, 61 ... Mounting surface, 62 ... separation surface, 63 ... light reflection surface, 64 ... side surface.

Claims (7)

上面に開口する凹部を有するパッケージ基板と、
前記凹部に収容される光半導体素子と、
前記凹部の開口を覆うように配置される窓部材と、
前記パッケージ基板と前記窓部材の間を封止する金属接合部と、を備え、
前記パッケージ基板は、前記光半導体素子が実装される金属電極が設けられる実装面と、前記実装面の外側に枠状に設けられる分離面と、前記分離面から前記上面に向けて傾斜する光反射面とを有し、前記分離面を避けて前記光反射面から前記上面にわたって金属層が設けられ、
前記金属接合部は、前記上面に設けられる前記金属層と接合することを特徴とする光半導体装置。
A package substrate having a recess opening on the upper surface;
An optical semiconductor element housed in the recess;
A window member arranged to cover the opening of the recess,
A metal joint for sealing between the package substrate and the window member,
The package substrate includes a mounting surface on which a metal electrode on which the optical semiconductor element is mounted is provided, a separation surface provided in a frame shape outside the mounting surface, and light reflection inclined from the separation surface toward the upper surface. A metal layer is provided from the light reflecting surface to the upper surface avoiding the separation surface,
The metal junction, an optical semiconductor device which is characterized that you bonded to the metal layer provided on the top surface.
前記分離面は、前記実装面より一段高い位置に設けられることを特徴とする請求項1に記載の光半導体装置。   The optical semiconductor device according to claim 1, wherein the separation surface is provided at a position one step higher than the mounting surface. 前記金属層は、前記実装面と前記分離面との間の側面を避けて設けられることを特徴とする請求項2に記載の光半導体装置。   The optical semiconductor device according to claim 2, wherein the metal layer is provided to avoid a side surface between the mounting surface and the separation surface. 前記パッケージ基板は、前記実装面から前記分離面に向けて傾斜し、金属層が設けられる別の光反射面をさらに有することを特徴とする請求項1または2に記載の光半導体装置。The optical semiconductor device according to claim 1, wherein the package substrate further includes another light reflecting surface that is inclined from the mounting surface toward the separation surface and provided with a metal layer. 前記分離面は、100μm以上の幅を有することを特徴とする請求項1から4のいずれか一項に記載の光半導体装置。   The optical semiconductor device according to claim 1, wherein the separation surface has a width of 100 μm or more. 前記光半導体素子は深紫外光を発する発光素子であり、前記窓部材は、前記深紫外光の透過率が80%以上のガラス板を含み、
前記金属層は、金(Au)を含み、前記金属接合部は、金錫(AuSn)を含むことを特徴とする請求項1から5のいずれか一項に記載の光半導体装置。
The optical semiconductor element is a light emitting element that emits deep ultraviolet light, and the window member includes a glass plate having a transmittance of the deep ultraviolet light of 80% or more.
The optical semiconductor device according to claim 1, wherein the metal layer includes gold (Au), and the metal joint includes gold tin (AuSn).
上面に開口する凹部を有するパッケージ基板の前記凹部に光半導体素子を収容するステップと、
前記凹部の開口を覆うように窓部材を配置するステップと、
前記パッケージ基板と前記窓部材の間を金属接合材により封止するステップと、を備え、
前記パッケージ基板は、前記光半導体素子が実装される金属電極が設けられる実装面と、前記実装面の外側に枠状に設けられる分離面と、前記分離面から前記上面に向けて傾斜する光反射面とを有し、前記分離面を避けて前記光反射面から前記上面にわたって金属層が設けられ、
前記封止するステップは、前記パッケージ基板と前記窓部材の間で荷重を加えながら前記金属接合材を加熱するステップを含み、
前記金属接合材は、前記上面に設けられる前記金属層と接合されることを特徴とする光半導体装置の製造方法。
Accommodating an optical semiconductor element in the recess of the package substrate having a recess opening on the upper surface;
Arranging a window member so as to cover the opening of the recess;
Sealing between the package substrate and the window member with a metal bonding material,
The package substrate includes a mounting surface on which a metal electrode on which the optical semiconductor element is mounted is provided, a separation surface provided in a frame shape outside the mounting surface, and light reflection inclined from the separation surface toward the upper surface. A metal layer is provided from the light reflecting surface to the upper surface avoiding the separation surface,
The step of sealing is seen including the step of heating said metal bonding material while applying a load between the package substrate and the window member,
The method for manufacturing an optical semiconductor device, wherein the metal bonding material is bonded to the metal layer provided on the upper surface .
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