JP6267445B2 - 検査装置 - Google Patents

検査装置 Download PDF

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Publication number
JP6267445B2
JP6267445B2 JP2013122042A JP2013122042A JP6267445B2 JP 6267445 B2 JP6267445 B2 JP 6267445B2 JP 2013122042 A JP2013122042 A JP 2013122042A JP 2013122042 A JP2013122042 A JP 2013122042A JP 6267445 B2 JP6267445 B2 JP 6267445B2
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JP
Japan
Prior art keywords
wafer
inspection
magnetic field
stage
optical system
Prior art date
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Expired - Fee Related
Application number
JP2013122042A
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English (en)
Japanese (ja)
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JP2014239012A5 (cg-RX-API-DMAC7.html
JP2014239012A (ja
Inventor
吉川　省二
省二 吉川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ebara Corp
Original Assignee
Ebara Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ebara Corp filed Critical Ebara Corp
Priority to JP2013122042A priority Critical patent/JP6267445B2/ja
Priority to US14/257,071 priority patent/US9134261B2/en
Publication of JP2014239012A publication Critical patent/JP2014239012A/ja
Priority to US14/813,768 priority patent/US9601302B2/en
Publication of JP2014239012A5 publication Critical patent/JP2014239012A5/ja
Application granted granted Critical
Publication of JP6267445B2 publication Critical patent/JP6267445B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2013122042A 2013-04-22 2013-06-10 検査装置 Expired - Fee Related JP6267445B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2013122042A JP6267445B2 (ja) 2013-06-10 2013-06-10 検査装置
US14/257,071 US9134261B2 (en) 2013-04-22 2014-04-21 Inspection apparatus
US14/813,768 US9601302B2 (en) 2013-04-22 2015-07-30 Inspection apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2013122042A JP6267445B2 (ja) 2013-06-10 2013-06-10 検査装置

Publications (3)

Publication Number Publication Date
JP2014239012A JP2014239012A (ja) 2014-12-18
JP2014239012A5 JP2014239012A5 (cg-RX-API-DMAC7.html) 2016-07-28
JP6267445B2 true JP6267445B2 (ja) 2018-01-24

Family

ID=52136003

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2013122042A Expired - Fee Related JP6267445B2 (ja) 2013-04-22 2013-06-10 検査装置

Country Status (1)

Country Link
JP (1) JP6267445B2 (cg-RX-API-DMAC7.html)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6460806B2 (ja) * 2015-01-20 2019-01-30 株式会社荏原製作所 電子光学装置及び検査装置
KR102476186B1 (ko) * 2018-12-06 2022-12-12 주식회사 히타치하이테크 하전 입자선 장치

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10172438A (ja) * 1996-12-10 1998-06-26 Sony Corp 調整装置
JP3859437B2 (ja) * 2000-08-04 2006-12-20 株式会社東芝 荷電ビーム露光装置
JP2002289506A (ja) * 2001-03-28 2002-10-04 Nikon Corp 基板処理装置
JP2003037047A (ja) * 2001-07-24 2003-02-07 Canon Inc 荷電粒子線露光装置、半導体デバイスの製造方法、半導体製造工場、荷電粒子線露光装置の保守方法
JP2007113965A (ja) * 2005-10-18 2007-05-10 Denso Corp 電流センサ
WO2011019457A1 (en) * 2009-08-11 2011-02-17 Regents Of The University Of California Time-of-flight electron energy analyzer

Also Published As

Publication number Publication date
JP2014239012A (ja) 2014-12-18

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