JP6241322B2 - Electrophotographic photosensitive member, process cartridge, and image forming apparatus - Google Patents

Description

  The present invention relates to an electrophotographic photosensitive member, a process cartridge, and an image forming apparatus.

  An electrophotographic image forming apparatus generally has the following configuration and process. That is, the surface of the electrophotographic photosensitive member is charged to a predetermined polarity and potential by a charging unit, and the surface of the electrophotographic photosensitive member after charging is selectively neutralized by image exposure to form an electrostatic latent image, The toner is attached to the electrostatic latent image by the developing means, whereby the latent image is developed as a toner image, and the toner image is transferred to a transfer medium by the transfer means, and discharged as an image formed product. .

In recent years, it has been proposed to improve the strength by providing a protective layer on the surface of the electrophotographic photoreceptor. For example, the following materials have been proposed for the protective layer material system.
Patent Document 1 proposes an organic-inorganic hybrid material.
Patent Document 2 proposes a chain polymerizable material.
Patent Document 3 proposes an acrylic material.
Patent Documents 4 and 5 propose a radiation cross-linked material composed of a radiation cross-linking agent and a charge transport material.
Patent Document 6 proposes a copolymer obtained by copolymerizing a trifunctional or higher functional monomer and a monofunctional monomer having a charge transporting skeleton.
As another aspect of the outermost surface layer of the electrophotographic photosensitive member, for example, Patent Document 6 proposes a conductive powder dispersed in a phenol resin.

JP 2000-019749 A JP 2005-234546 A JP 2000-66424 A Japanese Patent Laid-Open No. 2004-240079 JP 2007-156081 A Japanese Patent No. 3287678

  An object of the present invention is to provide an electrophotographic photosensitive member that suppresses deterioration of electrical characteristics even when the outermost surface layer is thickened.

  The above problem is solved by the following means.

The invention according to claim 1
A conductive substrate, and a photosensitive layer provided on the conductive substrate,
The outermost layer is composed of a cured film of a composition comprising a reactive charge transport material,
The thickness of the outermost surface layer is 7 μm or more and 30 μm or less,
An electrophotographic photoreceptor in which a peak of the thermally stimulated current spectrum of the outermost surface layer obtained by thermally stimulated current measurement is present at 27 ° C. or lower.

In the invention according to claim 1,
The reactive charge transport material, Ru least 1 Tanedea selected from the group consisting of the reactive compound represented by the following general formula (I) and (II).

[In general formula (I), F represents a charge transporting skeleton. L represents a divalent linking group containing two or more selected from the group consisting of an alkylene group, an alkenylene group, -C (= O)-, -N (R)-, -S-, and -O-. Show. R represents a hydrogen atom, an alkyl group, an aryl group, or an aralkyl group. m represents an integer of 1 or more and 8 or less. ]

[In General Formula (II), F represents a charge transporting skeleton. L ′ represents a trivalent or tetravalent group derived from an alkane or alkene, and an alkylene group, alkenylene group, —C (═O) —, —N (R) —, —S—, and —O—. (N + 1) -valent linking groups containing two or more selected from the group consisting of: R represents a hydrogen atom, an alkyl group, an aryl group, or an aralkyl group. m ′ represents an integer of 1 to 6. n represents an integer of 2 or more and 3 or less. ]

The invention according to claim 2
The reactive compound represented by the general formula (I) is represented by the following general formula (Ia), the following general formula (Ib), the following general formula (Ic), or the following general formula (Id). The electrophotographic photosensitive member according to claim 1 , which is at least one reactive compound selected from the group consisting of reactive compounds represented by the formula:

[In the general formula (Ia), Ar ^{a1 to} Ar ^a4 each independently represent a substituted or unsubstituted aryl group. Ar ^a5 and Ar ^a6 each independently represent a substituted or unsubstituted arylene group. Xa represents a divalent linking group formed by combining groups selected from an alkylene group, —O—, —S—, and an ester group. Da represents a group represented by the following general formula (IA-a). ac1 to ac4 each independently represents an integer of 0 or more and 2 or less. However, the total number of Da is 1 or 2. ]

[In the general formula ^{(IA-a), L} a _{is, * - (CH 2) an} -O-CH 2 - is represented by the linking divalent linked to a group represented by ^Ar a1 ^{to Ar a4} at * Indicates a group. an represents an integer of 1 or 2. ]

[In the general formula (Ib), Ar ^{b1 to} Ar ^b4 each independently represents a substituted or unsubstituted aryl group. Ar ^b5 represents a substituted or unsubstituted aryl group or a substituted or unsubstituted arylene group. Db represents a group represented by the following general formula (IA-b). bc1 to bc5 each independently represent an integer of 0 or more and 2 or less. bk represents 0 or 1. However, the total number of Db is 1 or 2. ]

[In General Formula (IA-b), L ^b includes a group represented by * — (CH ₂ ) _bn —O—, and is a divalent linkage linked to a group represented by Ar ^{b1 to} Ar ^b5 at *. Indicates a group. bn represents an integer of 3 to 6. ]

[In the general formula (Ic), Ar ^{c1 to} Ar ^c4 each independently represent a substituted or unsubstituted aryl group. Ar ^c5 represents a substituted or unsubstituted aryl group or a substituted or unsubstituted arylene group. Dc represents a group represented by the following general formula (IA-c). cc1 to cc5 each independently represents an integer of 0 or more and 2 or less. ck represents 0 or 1. However, the total number of Dc is 1 or more and 8 or less. ]

[In the general formula (IA-c), ^{L C} is, -C (= O) -, - N (R) -, - S-, or -C (= O) - and -O -, - N (R )-Or -S- represents a divalent linking group containing one or more groups selected from the group consisting of groups. R represents a hydrogen atom, an alkyl group, an aryl group, or an aralkyl group. ]

[In the general formula (Id), Ar ^{d1 to} Ar ^d4 each independently represent a substituted or unsubstituted aryl group. Ar ^d5 represents a substituted or unsubstituted aryl group or a substituted or unsubstituted arylene group. Dd represents a group represented by the following general formula (IA-d). dc1 to dc5 each independently represents an integer of 0 or more and 2 or less. dk represents 0 or 1. However, the total number of Dd is 3 or more and 8 or less. ]

[In General Formula (IA-d), L ^d includes a group represented by * — (CH ₂ ) _dn —O—, and is a divalent linkage linked to a group represented by Ar ^{d1 to} Ar ^d5 at *. Indicates a group. dn represents an integer of 1 to 6. ]

The invention according to claim 3
The compound represented by the general formula (II) is an electrophotographic photosensitive member according to claim 1 or claim 2 which is a compound represented by the following formula (II-a).

[In the general formula (II-a), Ar ^{k1 to} Ar ^k4 each independently represents a substituted or unsubstituted aryl group. Ar ^k5 represents a substituted or unsubstituted aryl group, or a substituted or unsubstituted arylene group. Dk represents a group represented by the following general formula (IIA-a). kc1 to kc5 each independently represents an integer of 0 or more and 2 or less. kk represents 0 or 1. However, the total number of Dk is 1 or more and 8 or less. ]

[In the general formula (IIA-a), L ^k represents a trivalent or tetravalent group derived from an alkane or alkene, an alkylene group, an alkenylene group, —C (═O) —, —N (R) A (kn + 1) -valent linking group containing two or more selected from the group consisting of-, -S-, and -O- is shown. R represents a hydrogen atom, an alkyl group, an aryl group, or an aralkyl group. kn represents an integer of 2 or more and 3 or less. ]

The invention according to claim 4
Group linked to the charge transporting skeleton represented by F of the compound represented by the general formula (II) is, according to claim 1 is a group represented by the following general formula (IIA-a1) or (IIA-a2) Electrophotographic photoreceptor.

[In general formula (IIA-a1) or (IIA-a2), ^Xk1 represents a divalent linking group. kq1 represents an integer of 0 or 1. X ^k2 represents a divalent linking group. kq2 represents an integer of 0 or 1. ]

The invention according to claim 5
Group linked to the charge transporting skeleton represented by F of the compound represented by the general formula (II) is, according to claim 1 is a group represented by the following general formula (IIA-a3) or (IIA-a4) Electrophotographic photoreceptor.

[In general formula (IIA-a3) or (IIA-a4), ^Xk3 represents a divalent linking group. kq3 represents an integer of 0 or 1. X ^k4 represents a divalent linking group. kq4 represents an integer of 0 or 1. ]

The invention according to claim 6
The electrophotographic photoreceptor according to any one of claims 1 to 5 ,
A process cartridge that can be attached to and detached from an image forming apparatus.

The invention according to claim 7 provides:
The electrophotographic photosensitive member according to any one of claims 1 to 5 ,
Charging means for charging the surface of the electrophotographic photosensitive member;
An electrostatic latent image forming means for forming an electrostatic latent image on the surface of the charged electrophotographic photosensitive member;
Developing means for developing the electrostatic latent image formed on the surface of the electrophotographic photosensitive member with a developer containing toner to form a toner image;
Transfer means for transferring the toner image to the surface of the recording medium;
An image forming apparatus comprising:

According to the invention according to claim 1, 2, 3, 4, or 5 , compared with the case where the peak of the thermally stimulated current spectrum of the outermost surface layer obtained by thermally stimulated current measurement exceeds 27 ° C. An electrophotographic photosensitive member is provided in which deterioration of electrical characteristics is suppressed even when the layer is thickened.

According to the invention of claim 6 , repeated image formation can be achieved as compared with the case where an electrophotographic photosensitive member having a thermally stimulated current spectrum peak of the outermost surface layer obtained by thermally stimulated current measurement exceeding 27 ° C. is provided. A process cartridge is provided that suppresses degradation in image quality even when the process is performed.

According to the invention of claim 7 , repeated image formation can be performed as compared with the case where an electrophotographic photosensitive member having a thermally stimulated current spectrum peak of the outermost surface layer obtained by thermally stimulated current measurement exceeding 27 ° C. is provided. There is provided an image forming apparatus that suppresses the deterioration of image quality even if it is performed.

1 is a schematic partial cross-sectional view illustrating an example of a layer configuration of an electrophotographic photoreceptor according to an exemplary embodiment. FIG. 6 is a schematic partial cross-sectional view illustrating another example of the layer configuration of the electrophotographic photosensitive member according to the exemplary embodiment. FIG. 6 is a schematic partial cross-sectional view illustrating another example of the layer configuration of the electrophotographic photosensitive member according to the exemplary embodiment. 1 is a schematic configuration diagram illustrating an example of an image forming apparatus according to an exemplary embodiment. It is a schematic block diagram which shows another example of the image forming apparatus which concerns on this embodiment. FIG. 3 is a schematic diagram illustrating an image pattern to be printed by image quality evaluation according to an embodiment.

  Hereinafter, the present embodiment which is an example of the present invention will be described.

[Electrophotographic photoconductor]
The electrophotographic photoreceptor according to the exemplary embodiment includes a conductive substrate and a photosensitive layer provided on the conductive substrate.
The outermost surface layer is composed of a cured film of a composition containing a reactive charge transport material. Moreover, the thickness of the outermost surface layer is 7 μm or more and 30 μm or less.
And the peak of the thermally stimulated current spectrum of the outermost surface layer obtained by thermally stimulated current measurement exists at 27 degrees C or less.

  Here, when the outermost surface layer is composed of a cured film of a composition containing a reactive charge transport material, the mechanical properties are improved, but the non-reactive charge transport material is dispersed in the binder resin to form the outermost layer. It is known that charges are more likely to be accumulated and electrical characteristics are likely to be worse than when a surface layer is formed. In particular, if the outermost surface layer is made thick within a range of 7 μm or more and 30 μm or less, charges are accumulated and electrical characteristics are likely to deteriorate.

Thermally stimulated current measurement (TSC), on the other hand, accumulates charge traps existing inside, on the surface, and at the interface with injected carriers by applying an electric field to the sample, and heat from the trap site during the temperature rising process. This is a measurement technique for detecting thermally stimulated current generated by the emission (detrapping) phenomenon.
The thermally stimulated current spectrum of the sample obtained by this thermally stimulated current measurement shows that in which temperature range the charge is released.

  That is, in the outermost surface layer having a film thickness of 7 μm or more and 30 μm or less, the peak of the thermally stimulated current spectrum of the outermost surface layer obtained by thermal stimulation current measurement is 27 ° C. or less in an environment of room temperature or lower such as 27 ° C. It is shown that the charges in the outermost surface layer are easily released even in the range of the film thickness. Specifically, in an environment where the electrophotographic photosensitive member is used, the outermost surface layer hardly accumulates charges even in the above-described thickness range, or is easily released even when accumulated.

  The characteristics of the outermost surface layer are determined based on the type and amount of the reactive charge transport material, the type and amount of other components (non-reactive charge transport material, compound having an unsaturated bond, polymerization initiator, etc.), It has been found that it can be applied by selecting the type of solvent, the curing method, the thickness of the lower layer of the outermost surface layer, and the like.

  From the above, in the electrophotographic photoreceptor according to the exemplary embodiment, the above configuration suppresses deterioration of electrical characteristics even when the outermost surface layer is thickened. In addition, the image forming apparatus (or process cartridge) provided with the electrophotographic photosensitive member according to the present embodiment can suppress deterioration in image quality even when image formation is repeated.

Here, the thickness of the outermost surface layer is preferably 7 μm or more and 30 μm or less, and more preferably 7 μm or more and 25 μm or less from the viewpoint of suppressing deterioration of electrical characteristics.
On the other hand, the peak of the thermally stimulated current spectrum of the outermost surface layer measured by the thermally stimulated current measuring device is preferably present at −150 ° C. or more and 27 ° C. or less from the viewpoint of electrical characteristics. When two or more peaks are present, at least one peak may be present at 27 ° C. or lower, and all peaks are preferably present at 27 ° C. or lower from the viewpoint of suppressing deterioration of electrical characteristics. Hereinafter, the temperature at which this peak exists may be referred to as “peak temperature”.

The thermally stimulated current spectrum of the outermost surface layer is obtained by the following thermally stimulated current measurement.
A gold electrode is prepared on an aluminum substrate by a sputtering method, and a coating liquid (composition) for forming the outermost surface layer is applied thereon, followed by curing to provide a cured film. Next, a translucent gold electrode was produced on the surface of the cured film by a sputtering method, and used as a sample for measuring thermally stimulated current. Then, the thermal stimulation current measurement is performed using the thermal stimulation current measurement sample.
Thermally stimulated current measurement is performed using a thermally stimulated current measuring device (TS-FETT) manufactured by Rigaku under a normal temperature and normal humidity of 20 ° C./40% RH. Specifically, first, the trap difference in the sample was filled with electrons by irradiation with ultraviolet light of 380 nm and 100 nW / cm ² and application of a voltage of 132 V while the sample was cooled and held at −150 ° C. Then, the heating rate is set to 10 ° C./min, and a 3V collecting bias is applied in the opposite direction to that at the time of initialization to measure the thermal stimulation current and obtain the thermal stimulation current spectrum. The peak temperature is detected from the obtained thermally stimulated current spectrum.
When obtaining the thermally stimulated current spectrum of the outermost surface layer from the electrophotographic photoreceptor, the outermost surface layer is cut out and used to obtain a thermally stimulated current measurement sample.

In the electrophotographic photoreceptor according to the exemplary embodiment, the reactive charge transport material includes a reactive compound represented by the general formulas (I) and (II) (hereinafter also referred to as “specific reactive charge transport material”). A cured film of a composition containing at least one selected from the group may be used as the outermost layer. When the cured film of this composition is used as the outermost surface layer, it is considered that the outermost surface layer has excellent electrical properties and mechanical strength, and that the outermost surface layer is thickened (for example, 7 μm or more). It is done. Thereby, the life of the photoreceptor is improved. Since the lifetime of the photoreceptor is determined when the outermost surface layer is worn, increasing the thickness of the outermost surface layer is effective for extending the lifetime.
This is because the specific reactive charge transport material itself is excellent in charge transport performance, has few polar groups that hinder carrier transport such as -OH and -NH-, and is a styryl group having π electrons effective for carrier transport. This is because, since the materials are connected by polymerization, residual strain is suppressed, and formation of a structural trap for trapping charges is suppressed. In addition, the specific reactive charge transport material is more hydrophobic and less moisture-resistant than the reactive charge transport material having a (meth) acryl group as a reactive group, so that electric characteristics are maintained over a long period of time. This is probably because of this.

  In addition, the electrophotographic photosensitive member is used by being charged by electric discharge. At that time, the constituent material of the outermost surface layer is deteriorated by an electric load or a load by a discharge gas (for example, ozone). As a result, a discharge product ( For example, it becomes easier to adsorb ionic substances such as ammonium nitrate). For this reason, in particular, moisture is adsorbed under high humidity, the surface resistance of the outermost surface layer is reduced, and latent image bleeding occurs, resulting in an image flow of the image. In order to suppress this, it is necessary to moderately wear the outermost surface layer and suppress the latent image blur. This amount of wear is greatly affected by the charging method, cleaning method, toner shape, and the like, and greatly depends on the system. Therefore, it is necessary to adjust the strength of the outermost surface layer. In this regard, in the electrophotographic photoreceptor according to the exemplary embodiment, for example, the mechanical strength of the outermost surface layer is selected by selecting the type and amount of the unreacted reactive compound, the type and amount of other components, and the curing method. Adjustment is realized. As a result, even when image formation is repeatedly performed, deterioration in image quality is easily suppressed.

For this reason, in the electrophotographic photoreceptor according to the exemplary embodiment, a specific reactive charge transport material (reactive compound represented by the general formulas (I) and (II)) is used as the reactive charge transport material. The peak temperature of the thermally stimulated current spectrum of the outermost surface layer is preferably within the above range. Examples of the method or configuration include the following method or configuration.
・ As a specific reactive charge transport material, a triarylamine compound having a styryl group (a compound having a triarylamine structure having a styryl group), a benzidine compound having a styryl group (a compound having a benzidine structure having a styryl group) ).
-Use a triarylamine compound (compound having a triarylamine structure) or a benzidine compound (compound having a benzidine structure) as a component other than a specific reactive charge transport material.
-Use an acetic acid ester solvent as the solvent.
・ Curing conditions are heated at 100 ° C. or higher and 180 ° C. or lower and the oxygen concentration is 10000 ppm or lower. The lower layer in contact with the outermost surface layer is 5 μm or more and 50 μm or less (preferably 15 μm or more and 30 μm or less). A non-cured film (for example, a non-cured film in which a non-reactive charge transport material is dispersed in a binder resin).

In the electrophotographic photosensitive member according to this embodiment, the outermost surface layer only needs to form the uppermost surface of the electrophotographic photosensitive member itself, and the layer that functions as a protective layer or the layer that functions as a charge transport layer. As provided. When the outermost surface layer is a layer functioning as a protective layer, a photosensitive layer composed of a charge transport layer and a charge generation layer or a single-layer type photosensitive layer is provided under the protective layer.
Specifically, in the case where the outermost surface layer functions as a protective layer, a photosensitive layer (a charge generation layer and a charge transport layer or a single-layer type photosensitive layer) is formed on the conductive substrate, and a protective layer is formed as the outermost surface layer. Are formed sequentially. On the other hand, in the case where the outermost surface layer functions as a charge transport layer, an embodiment in which a charge generation layer and a charge transport layer as the outermost surface layer are sequentially formed on a conductive substrate can be mentioned.

  Hereinafter, the electrophotographic photoreceptor according to the exemplary embodiment in the case where the outermost surface layer functions as a protective layer will be described in detail with reference to the drawings. In the drawings, the same or corresponding parts are denoted by the same reference numerals, and redundant description is omitted.

  FIG. 1 is a schematic cross-sectional view showing an example of the electrophotographic photosensitive member according to the present embodiment. 2 to 3 are schematic sectional views showing other examples of the electrophotographic photosensitive member according to this embodiment.

  An electrophotographic photoreceptor 7A shown in FIG. 1 is a so-called function-separated photoreceptor (or laminated photoreceptor), and an undercoat layer 1 is provided on a conductive substrate 4, on which a charge generation layer 2 and a charge are formed. The transport layer 3 and the protective layer 5 have a structure formed sequentially. In the electrophotographic photoreceptor 7A, the charge generation layer 2 and the charge transport layer 3 constitute a photosensitive layer.

An electrophotographic photoreceptor 7B shown in FIG. 2 is a function-separated type photoreceptor in which the functions are separated into the charge generation layer 2 and the charge transport layer 3 like the electrophotographic photoreceptor 7A shown in FIG.
In the electrophotographic photoreceptor 7B shown in FIG. 2, a structure in which an undercoat layer 1 is provided on a conductive substrate 4, and a charge transport layer 3, a charge generation layer 2, and a protective layer 5 are sequentially formed thereon. It is what has. In the electrophotographic photoreceptor 7B, the charge transport layer 3 and the charge generation layer 2 constitute a photosensitive layer.

  The electrophotographic photoreceptor 7C shown in FIG. 3 contains a charge generation material and a charge transport material in the same layer (single layer type photosensitive layer 6). The electrophotographic photoreceptor 7C shown in FIG. 3 has a structure in which an undercoat layer 1 is provided on a conductive substrate 4, and a single-layer type photosensitive layer 6 and a protective layer 5 are sequentially formed thereon. .

In the electrophotographic photoreceptors 7A, 7B and 7C shown in FIGS. 1, 2 and 3, the protective layer 5 is the outermost surface layer disposed on the side farthest from the conductive substrate 4, and The surface layer has the above-described configuration.
In the electrophotographic photosensitive member shown in FIGS. 1, 2, and 3, the undercoat layer 1 may or may not be provided.

  Hereinafter, each element will be described based on the electrophotographic photosensitive member 7A shown in FIG. 1 as a representative example. Note that the reference numerals are omitted.

(Conductive substrate)
Examples of the conductive substrate include metal plates (eg, aluminum, copper, zinc, chromium, nickel, molybdenum, vanadium, indium, gold, platinum, etc.) or alloys (stainless steel, etc.), metal drums, metal belts, etc. Is mentioned. In addition, as the conductive substrate, for example, paper, resin film, belt, etc. coated, vapor-deposited or laminated with a conductive compound (for example, conductive polymer, indium oxide, etc.), metal (for example, aluminum, palladium, gold, etc.) or an alloy, etc. Also mentioned. Here, “conductive” means that the volume resistivity is less than 10 ¹³ Ωcm.

  When the electrophotographic photosensitive member is used in a laser printer, the surface of the conductive substrate has a center line average roughness Ra of 0.04 μm or more and 0.5 μm for the purpose of suppressing interference fringes generated when laser light is irradiated. The surface is preferably roughened below. When non-interfering light is used as a light source, roughening for preventing interference fringes is not particularly required, but it is suitable for extending the life because it suppresses generation of defects due to irregularities on the surface of the conductive substrate.

  Examples of roughening methods include wet honing by suspending an abrasive in water and spraying the conductive substrate, centerless grinding in which the conductive substrate is pressed against a rotating grindstone, and grinding is performed continuously. And anodizing treatment.

  As a roughening method, without roughening the surface of the conductive substrate, conductive or semiconductive powder is dispersed in the resin to form a layer on the surface of the conductive substrate. The method of roughening by the particle | grains disperse | distributed in a layer is also mentioned.

  In the roughening treatment by anodic oxidation, a metal (for example, aluminum) conductive substrate is used as an anode, and an oxide film is formed on the surface of the conductive substrate by anodizing in an electrolyte solution. Examples of the electrolyte solution include a sulfuric acid solution and an oxalic acid solution. However, the porous anodic oxide film formed by anodic oxidation is chemically active as it is, easily contaminated, and has a large resistance fluctuation due to the environment. Therefore, the pores of the oxide film are blocked by the volume expansion due to the hydration reaction in pressurized water vapor or boiling water (a metal salt such as nickel may be added) against the porous anodic oxide film, and more stable hydration oxidation It is preferable to perform a sealing treatment for changing to a product.

  The thickness of the anodized film is preferably, for example, 0.3 μm or more and 15 μm or less. When this film thickness is within the above range, the barrier property against implantation tends to be exhibited, and the increase in residual potential due to repeated use tends to be suppressed.

The conductive substrate may be treated with an acidic treatment liquid or boehmite treatment.
The treatment with the acidic treatment liquid is performed as follows, for example. First, an acidic treatment liquid containing phosphoric acid, chromic acid and hydrofluoric acid is prepared. The mixing ratio of phosphoric acid, chromic acid and hydrofluoric acid in the acidic treatment liquid is, for example, in the range of 10% by mass to 11% by mass of phosphoric acid, in the range of 3% by mass to 5% by mass of chromic acid, The concentration of these acids is preferably in the range of 13.5% by mass or more and 18% by mass or less. The treatment temperature is preferably 42 ° C. or higher and 48 ° C. or lower, for example. The film thickness is preferably from 0.3 μm to 15 μm.

  The boehmite treatment is performed, for example, by immersing in pure water of 90 ° C. or more and 100 ° C. or less for 5 minutes to 60 minutes or by contacting with heated steam of 90 ° C. or more and 120 ° C. or less for 5 minutes to 60 minutes. The film thickness is preferably 0.1 μm or more and 5 μm or less. This may be further anodized using an electrolyte solution with low film solubility such as adipic acid, boric acid, borate, phosphate, phthalate, maleate, benzoate, tartrate, citrate, etc. Good.

(Undercoat layer)
The undercoat layer is, for example, a layer containing inorganic particles and a binder resin.

Examples of the inorganic particles include inorganic particles having a powder resistance (volume resistivity) of 10 ² Ωcm or more and 10 ¹¹ Ωcm or less.
Among these, as the inorganic particles having the resistance value, for example, metal oxide particles such as tin oxide particles, titanium oxide particles, zinc oxide particles, and zirconium oxide particles are preferable, and zinc oxide particles are particularly preferable.

The specific surface area of the inorganic particles by the BET method is preferably 10 m ² / g or more, for example.
The volume average particle diameter of the inorganic particles is, for example, preferably from 50 nm to 2000 nm (preferably from 60 nm to 1000 nm).

  For example, the content of the inorganic particles is preferably 10% by mass or more and 80% by mass or less, and more preferably 40% by mass or more and 80% by mass or less with respect to the binder resin.

  The inorganic particles may be subjected to a surface treatment. Two or more inorganic particles having different surface treatments or particles having different particle diameters may be mixed and used.

  Examples of the surface treatment agent include a silane coupling agent, a titanate coupling agent, an aluminum coupling agent, and a surfactant. In particular, a silane coupling agent is preferable, and a silane coupling agent having an amino group is preferable.

  Examples of the silane coupling agent having an amino group include 3-aminopropyltriethoxysilane, N-2- (aminoethyl) -3-aminopropyltrimethoxysilane, and N-2- (aminoethyl) -3-amino. Examples include, but are not limited to, propylmethyldimethoxysilane, N, N-bis (2-hydroxyethyl) -3-aminopropyltriethoxysilane, and the like.

  Two or more silane coupling agents may be used in combination. For example, a silane coupling agent having an amino group and another silane coupling agent may be used in combination. Other silane coupling agents include, for example, vinyltrimethoxysilane, 3-methacryloxypropyl-tris (2-methoxyethoxy) silane, 2- (3,4-epoxycyclohexyl) ethyltrimethoxysilane, 3-glycol. Sidoxypropyltrimethoxysilane, vinyltriacetoxysilane, 3-mercaptopropyltrimethoxysilane, 3-aminopropyltriethoxysilane, N-2- (aminoethyl) -3-aminopropyltrimethoxysilane, N-2- ( Aminoethyl) -3-aminopropylmethyldimethoxysilane, N, N-bis (2-hydroxyethyl) -3-aminopropyltriethoxysilane, 3-chloropropyltrimethoxysilane, and the like, but are not limited thereto. It is not a thing.

  The surface treatment method using the surface treatment agent may be any method as long as it is a known method, and may be either a dry method or a wet method.

  The treatment amount of the surface treatment agent is preferably 0.5% by mass or more and 10% by mass or less with respect to the inorganic particles, for example.

  Here, the undercoat layer may contain an electron-accepting compound (acceptor compound) together with the inorganic particles from the viewpoint of enhancing the long-term stability of the electric characteristics and the carrier blocking property.

Examples of the electron accepting compound include quinone compounds such as chloranil and bromoanil; tetracyanoquinodimethane compounds; 2,4,7-trinitrofluorenone, 2,4,5,7-tetranitro-9-fluorenone, and the like. 2- (4-biphenyl) -5- (4-t-butylphenyl) -1,3,4-oxadiazole, 2,5-bis (4-naphthyl) -1,3,4- Oxadiazole compounds such as oxadiazole and 2,5-bis (4-diethylaminophenyl) -1,3,4 oxadiazole; xanthone compounds; thiophene compounds; 3,3 ′, 5,5 ′ tetra- electron transporting substances such as diphenoquinone compounds such as t-butyldiphenoquinone;
In particular, the electron-accepting compound is preferably a compound having an anthraquinone structure. As the compound having an anthraquinone structure, for example, a hydroxyanthraquinone compound, an aminoanthraquinone compound, an aminohydroxyanthraquinone compound, and the like are preferable, and specifically, for example, anthraquinone, alizarin, quinizarin, anthralfin, and purpurin are preferable.

  The electron-accepting compound may be dispersed and included in the undercoat layer together with the inorganic particles, or may be included in a state of being attached to the surface of the inorganic particles.

  Examples of the method for attaching the electron accepting compound to the surface of the inorganic particles include a dry method or a wet method.

  In the dry method, for example, while stirring inorganic particles with a mixer having a large shearing force or the like, an electron-accepting compound dissolved directly or in an organic solvent is dropped and sprayed with dry air or nitrogen gas. It is a method of adhering to the surface of inorganic particles. When the electron-accepting compound is dropped or sprayed, it is preferably performed at a temperature not higher than the boiling point of the solvent. After dropping or spraying the electron-accepting compound, baking may be performed at 100 ° C. or higher. The baking is not particularly limited as long as it is a temperature and time for obtaining electrophotographic characteristics.

  In the wet method, for example, an electron-accepting compound is added while dispersing inorganic particles in a solvent by stirring, ultrasonic waves, a sand mill, an attritor, a ball mill, etc., and after stirring or dispersing, the solvent is removed to remove electrons. This is a method of attaching a receptive compound to the surface of inorganic particles. The solvent removal method is distilled off by filtration or distillation, for example. After removing the solvent, baking may be performed at 100 ° C. or higher. The baking is not particularly limited as long as it is a temperature and time for obtaining electrophotographic characteristics. In the wet method, the water content of the inorganic particles may be removed before adding the electron-accepting compound. Examples thereof include a method of removing while stirring and heating in a solvent, and a method of removing by azeotropic distillation with a solvent. Can be mentioned.

  The attachment of the electron-accepting compound may be performed before or after the surface treatment with the surface treatment agent is performed on the inorganic particles, or may be performed simultaneously with the attachment of the electron-accepting compound and the surface treatment with the surface treatment agent.

  The content of the electron-accepting compound is, for example, from 0.01% by mass to 20% by mass with respect to the inorganic particles, and preferably from 0.01% by mass to 10% by mass.

Examples of the binder resin used for the undercoat layer include acetal resins (eg, polyvinyl butyral), polyvinyl alcohol resins, polyvinyl acetal resins, casein resins, polyamide resins, cellulose resins, gelatin, polyurethane resins, polyester resins, and unsaturated polyesters. Resin, methacrylic resin, acrylic resin, polyvinyl chloride resin, polyvinyl acetate resin, vinyl chloride-vinyl acetate-maleic anhydride resin, silicone resin, silicone-alkyd resin, urea resin, phenol resin, phenol-formaldehyde resin, melamine resin, Known polymer compounds such as urethane resin, alkyd resin, epoxy resin; zirconium chelate compound; titanium chelate compound; aluminum chelate compound; titanium alkoxide compound ; Organic titanium compounds; known materials silane coupling agent, and the like.
Examples of the binder resin used for the undercoat layer include a charge transport resin having a charge transport group, a conductive resin (for example, polyaniline) and the like.

Among these, as the binder resin used for the undercoat layer, a resin insoluble in the upper coating solvent is preferable, and in particular, a urea resin, a phenol resin, a phenol-formaldehyde resin, a melamine resin, a urethane resin, and an unsaturated polyester. Thermosetting resins such as resins, alkyd resins, and epoxy resins; at least one resin selected from the group consisting of polyamide resins, polyester resins, polyether resins, methacrylic resins, acrylic resins, polyvinyl alcohol resins, and polyvinyl acetal resins; Resins obtained by reaction with curing agents are preferred.
When these binder resins are used in combination of two or more, the mixing ratio is set as necessary.

The undercoat layer may contain various additives for improving electrical characteristics, improving environmental stability, and improving image quality.
Additives include known materials such as electron transport pigments such as polycyclic condensation systems and azo systems, zirconium chelate compounds, titanium chelate compounds, aluminum chelate compounds, titanium alkoxide compounds, organic titanium compounds, and silane coupling agents. It is done. The silane coupling agent is used for the surface treatment of the inorganic particles as described above, but may be further added to the undercoat layer as an additive.

  Examples of the silane coupling agent as the additive include vinyltrimethoxysilane, 3-methacryloxypropyl-tris (2-methoxyethoxy) silane, 2- (3,4-epoxycyclohexyl) ethyltrimethoxysilane, 3- Glycidoxypropyltrimethoxysilane, vinyltriacetoxysilane, 3-mercaptopropyltrimethoxysilane, 3-aminopropyltriethoxysilane, N-2- (aminoethyl) -3-aminopropyltrimethoxysilane, N-2- (Aminoethyl) -3-aminopropylmethylmethoxysilane, N, N-bis (2-hydroxyethyl) -3-aminopropyltriethoxysilane, 3-chloropropyltrimethoxysilane and the like can be mentioned.

  Examples of the zirconium chelate compound include zirconium butoxide, zirconium zirconium acetoacetate, zirconium triethanolamine, acetylacetonate zirconium butoxide, ethyl acetoacetate butoxide, zirconium acetate, zirconium oxalate, zirconium lactate, zirconium phosphonate, zirconium octoate, Zirconium naphthenate, zirconium laurate, zirconium stearate, zirconium isostearate, methacrylate zirconium butoxide, stearate zirconium butoxide, isostearate zirconium butoxide and the like.

  Examples of the titanium chelate compound include tetraisopropyl titanate, tetranormal butyl titanate, butyl titanate dimer, tetra (2-ethylhexyl) titanate, titanium acetylacetonate, polytitanium acetylacetonate, titanium octylene glycolate, and titanium lactate ammonium salt. , Titanium lactate, titanium lactate ethyl ester, titanium triethanolamate, polyhydroxy titanium stearate and the like.

  Examples of the aluminum chelate compound include aluminum isopropylate, monobutoxy aluminum diisopropylate, aluminum butyrate, diethyl acetoacetate aluminum diisopropylate, aluminum tris (ethyl acetoacetate) and the like.

  These additives may be used alone or as a mixture or polycondensate of a plurality of compounds.

The undercoat layer preferably has a Vickers hardness of 35 or more.
The surface roughness (ten-point average roughness) of the undercoat layer is adjusted from 1 / 4n (n is the refractive index of the upper layer) to 1 / 2λ of the exposure laser wavelength λ used to suppress moire images. It should be done.
Resin particles or the like may be added to the undercoat layer for adjusting the surface roughness. Examples of the resin particles include silicone resin particles and cross-linked polymethyl methacrylate resin particles. Further, the surface of the undercoat layer may be polished for adjusting the surface roughness. Examples of the polishing method include buffing, sandblasting, wet honing, and grinding.

  There is no particular limitation on the formation of the undercoat layer, and a well-known formation method is used. For example, a coating film for forming an undercoat layer in which the above components are added to a solvent is formed, and the coating film is dried. And heating as necessary.

Solvents for preparing the coating solution for forming the undercoat layer include known organic solvents such as alcohol solvents, aromatic hydrocarbon solvents, halogenated hydrocarbon solvents, ketone solvents, ketone alcohol solvents, ether solvents. Examples include solvents and ester solvents.
Specific examples of these solvents include methanol, ethanol, n-propanol, iso-propanol, n-butanol, benzyl alcohol, methyl cellosolve, ethyl cellosolve, acetone, methyl ethyl ketone, cyclohexanone, methyl acetate, ethyl acetate, Examples include ordinary organic solvents such as n-butyl acetate, dioxane, tetrahydrofuran, methylene chloride, chloroform, chlorobenzene, and toluene.

  Examples of the dispersion method of the inorganic particles when preparing the coating liquid for forming the undercoat layer include known methods such as a roll mill, a ball mill, a vibration ball mill, an attritor, a sand mill, a colloid mill, and a paint shaker.

  Examples of the method for applying the coating liquid for forming the undercoat layer onto the conductive substrate include, for example, a blade coating method, a wire bar coating method, a spray coating method, a dip coating method, a bead coating method, an air knife coating method, and a curtain coating method. The usual methods, such as these, are mentioned.

  The thickness of the undercoat layer is, for example, preferably set in the range of 15 μm or more, more preferably 20 μm or more and 50 μm or less.

(Middle layer)
Although illustration is omitted, an intermediate layer may be further provided between the undercoat layer and the photosensitive layer.
An intermediate | middle layer is a layer containing resin, for example. Examples of the resin used for the intermediate layer include an acetal resin (for example, polyvinyl butyral), polyvinyl alcohol resin, polyvinyl acetal resin, casein resin, polyamide resin, cellulose resin, gelatin, polyurethane resin, polyester resin, methacrylic resin, acrylic resin, Polymer compounds such as polyvinyl chloride resin, polyvinyl acetate resin, vinyl chloride-vinyl acetate-maleic anhydride resin, silicone resin, silicone-alkyd resin, phenol-formaldehyde resin, melamine resin, and the like can be given.
The intermediate layer may be a layer containing an organometallic compound. Examples of the organometallic compound used for the intermediate layer include organometallic compounds containing metal atoms such as zirconium, titanium, aluminum, manganese, and silicon.
The compounds used for these intermediate layers may be used alone or as a mixture or polycondensate of a plurality of compounds.

  Among these, the intermediate layer is preferably a layer containing an organometallic compound containing a zirconium atom or a silicon atom.

The formation of the intermediate layer is not particularly limited, and a well-known formation method is used. For example, a coating film of an intermediate layer forming coating solution in which the above components are added to a solvent is formed, and the coating film is dried and necessary. It is performed by heating according to.
As the coating method for forming the intermediate layer, usual methods such as a dip coating method, a push-up coating method, a wire bar coating method, a spray coating method, a blade coating method, a knife coating method, and a curtain coating method are used.

  For example, the thickness of the intermediate layer is preferably set in a range of 0.1 μm to 3 μm. An intermediate layer may be used as the undercoat layer.

(Charge generation layer)
The charge generation layer is, for example, a layer containing a charge generation material and a binder resin. The charge generation layer may be a vapor deposition layer of a charge generation material. The vapor-deposited layer of the charge generation material is suitable when an incoherent light source such as an LED (Light Emitting Diode) or an organic EL (Electro-Luminescence) image array is used.

  Examples of the charge generating material include azo pigments such as bisazo and trisazo; fused aromatic pigments such as dibromoanthanthrone; perylene pigments; pyrrolopyrrole pigments; phthalocyanine pigments; zinc oxide;

  Among these, in order to cope with near-infrared laser exposure, it is preferable to use a metal phthalocyanine pigment or a metal-free phthalocyanine pigment as the charge generation material. Specifically, for example, hydroxygallium phthalocyanine disclosed in JP-A-5-263007, JP-A-5-279591, etc .; chlorogallium phthalocyanine disclosed in JP-A-5-98181; More preferred are dichlorotin phthalocyanines disclosed in JP-A No. 140472, JP-A No. 5-140473 and the like; and titanyl phthalocyanine disclosed in JP-A No. 4-189873.

  On the other hand, in order to cope with laser exposure in the near-ultraviolet region, as the charge generation material, condensed aromatic pigments such as dibromoanthanthrone; thioindigo pigments; porphyrazine compounds; zinc oxide; trigonal selenium; Bisazo pigments and the like disclosed in 2004-78147 and JP-A-2005-181992 are preferred.

  The above-described charge generation material may also be used in the case of using an incoherent light source such as an LED having a central wavelength of light emission of 450 nm to 780 nm and an organic EL image array. However, from the viewpoint of resolution, the photosensitive layer is 20 μm or less. When the thin film is used, the electric field strength in the photosensitive layer is increased, and a charge reduction due to charge injection from the base material, so-called image defects called black spots are likely to occur. This becomes conspicuous when a charge generating material that easily generates a dark current is used in a p-type semiconductor such as trigonal selenium or a phthalocyanine pigment.

On the other hand, when an n-type semiconductor such as a condensed ring aromatic pigment, perylene pigment, azo pigment or the like is used as the charge generation material, dark current hardly occurs and even a thin film can suppress image defects called black spots. . Examples of the n-type charge generation material include compounds (CG-1) to (CG-27) described in paragraphs [0288] to [0291] of JP2012-155282A. It is not limited.
The n-type determination is performed by using a time-of-flight method that is usually used, and is determined by the polarity of the flowing photocurrent, and an n-type is more likely to flow electrons as carriers than holes.

The binder resin used for the charge generation layer is selected from a wide range of insulating resins, and the binder resin is selected from organic photoconductive polymers such as poly-N-vinylcarbazole, polyvinyl anthracene, polyvinyl pyrene, and polysilane. You may choose.
As the binder resin, for example, polyvinyl butyral resin, polyarylate resin (polycondensate of bisphenol and aromatic divalent carboxylic acid, etc.), polycarbonate resin, polyester resin, phenoxy resin, vinyl chloride-vinyl acetate copolymer, Examples thereof include polyamide resin, acrylic resin, polyacrylamide resin, polyvinyl pyridine resin, cellulose resin, urethane resin, epoxy resin, casein, polyvinyl alcohol resin, polyvinyl pyrrolidone resin, and the like. Here, “insulating” means that the volume resistivity is 10 ¹³ Ωcm or more.
These binder resins are used singly or in combination of two or more.

  The mixing ratio of the charge generation material and the binder resin is preferably in the range of 10: 1 to 1:10 by mass ratio.

  In addition, the charge generation layer may contain a known additive.

  The formation of the charge generation layer is not particularly limited, and a known formation method is used. For example, a coating film of a charge generation layer forming coating solution in which the above components are added to a solvent is formed, and the coating film is dried. And heating as necessary. The charge generation layer may be formed by vapor deposition of a charge generation material. Formation of the charge generation layer by vapor deposition is particularly suitable when a condensed ring aromatic pigment or perylene pigment is used as the charge generation material.

  Solvents for preparing the charge generation layer forming coating solution include methanol, ethanol, n-propanol, n-butanol, benzyl alcohol, methyl cellosolve, ethyl cellosolve, acetone, methyl ethyl ketone, cyclohexanone, methyl acetate, n-acetate. -Butyl, dioxane, tetrahydrofuran, methylene chloride, chloroform, chlorobenzene, toluene and the like. These solvents are used alone or in combination of two or more.

Examples of a method for dispersing particles (for example, a charge generation material) in a coating solution for forming a charge generation layer include, for example, a media disperser such as a ball mill, a vibrating ball mill, an attritor, a sand mill, a horizontal sand mill, a stirring, an ultrasonic disperser, etc. Medialess dispersers such as roll mills and high-pressure homogenizers are used. Examples of the high-pressure homogenizer include a collision method in which a dispersion liquid is dispersed by liquid-liquid collision or liquid-wall collision in a high pressure state, and a penetration method in which a fine flow path is dispersed in a high pressure state.
In this dispersion, it is effective that the average particle size of the charge generation material in the coating solution for forming the charge generation layer is 0.5 μm or less, preferably 0.3 μm or less, more preferably 0.15 μm or less. .

  Examples of methods for applying the charge generation layer forming coating solution on the undercoat layer (or on the intermediate layer) include blade coating, wire bar coating, spray coating, dip coating, bead coating, and air knife coating. And usual methods such as a curtain coating method.

  The film thickness of the charge generation layer is, for example, preferably set in the range of 0.1 μm to 5.0 μm, more preferably 0.2 μm to 2.0 μm.

(Charge transport layer)
The charge transport layer is, for example, a layer containing a charge transport material and a binder resin. The charge transport layer may be a layer containing a polymer charge transport material.

  Examples of charge transport materials include quinone compounds such as p-benzoquinone, chloranil, bromanyl and anthraquinone; tetracyanoquinodimethane compounds; fluorenone compounds such as 2,4,7-trinitrofluorenone; xanthone compounds; benzophenone compounds A cyanovinyl compound; an electron transporting compound such as an ethylene compound; Examples of the charge transporting material include hole transporting compounds such as triarylamine compounds, benzidine compounds, arylalkane compounds, aryl-substituted ethylene compounds, stilbene compounds, anthracene compounds, and hydrazone compounds. These charge transport materials may be used alone or in combination of two or more, but are not limited thereto.

  As the charge transport material, from the viewpoint of charge mobility, a triarylamine derivative represented by the following structural formula (a-1) and a benzidine derivative represented by the following structural formula (a-2) are preferable.

In Structural Formula (a-1), Ar ^T1 , Ar ^T2 , and Ar ^T3 are each independently a substituted or unsubstituted aryl group, —C ₆ H ₄ —C (R ^T4 ) ═C (R ^T5 ) (R ^T6), or _{-C 6 H 4 -CH = CH-} CH = C (R T7) shows the ^{(R T8).} R ^T4 , R ^T5 , R ^T6 , R ^T7 , and R ^T8 each independently represent a hydrogen atom, a substituted or unsubstituted alkyl group, or a substituted or unsubstituted aryl group.
Examples of the substituent for each group include a halogen atom, an alkyl group having 1 to 5 carbon atoms, and an alkoxy group having 1 to 5 carbon atoms. Examples of the substituent of each group also include a substituted amino group substituted with an alkyl group having 1 to 3 carbon atoms.

In Structural Formula (a-2), R ^T91 and R ^T92 each independently represent a hydrogen atom, a halogen atom, an alkyl group having 1 to 5 carbon atoms, or an alkoxy group having 1 to 5 carbon atoms. R ^T101 , R ^T102 , R ^T111 and R ^T112 are each independently ^substituted with a halogen atom, an alkyl group having 1 to 5 carbon atoms, an alkoxy group having 1 to 5 carbon atoms, or an alkyl group having 1 to 2 carbon atoms. A substituted amino group, a substituted or unsubstituted aryl group, —C (R ^T12 ) ═C (R ^T13 ) (R ^T14 ), or —CH═CH— ^CH═C (R ^T15 ) (R ^T16 ), R ^T12 , R ^T13 , R ^T14 , R ^T15 and R ^T16 each independently represent a hydrogen atom, a substituted or unsubstituted alkyl group, or a substituted or unsubstituted aryl group. Tm1, Tm2, Tn1, and Tn2 each independently represent an integer of 0 or more and 2 or less.
Examples of the substituent for each group include a halogen atom, an alkyl group having 1 to 5 carbon atoms, and an alkoxy group having 1 to 5 carbon atoms. Examples of the substituent of each group also include a substituted amino group substituted with an alkyl group having 1 to 3 carbon atoms.

Here, among the triarylamine derivative represented by the structural formula (a-1) and the benzidine derivative represented by the structural formula (a-2), in particular, “—C ₆ H ₄ —CH═CH—CH═ Triarylamine derivatives having “C (R ^T7 ) (R ^T8 )” and benzidine derivatives having “—CH═CH— ^CH═C (R ^T15 ) (R ^T16 )” are preferable from the viewpoint of charge mobility.

  As the polymer charge transporting material, known materials having charge transporting properties such as poly-N-vinylcarbazole and polysilane are used. In particular, polyester-based polymer charge transport materials disclosed in JP-A-8-176293, JP-A-8-208820 and the like are particularly preferable. The polymer charge transport material may be used alone or in combination with a binder resin.

The binder resin used for the charge transport layer is polycarbonate resin, polyester resin, polyarylate resin, methacrylic resin, acrylic resin, polyvinyl chloride resin, polyvinylidene chloride resin, polystyrene resin, polyvinyl acetate resin, styrene-butadiene copolymer, Vinylidene chloride-acrylonitrile copolymer, vinyl chloride-vinyl acetate copolymer, vinyl chloride-vinyl acetate-maleic anhydride copolymer, silicone resin, silicone alkyd resin, phenol-formaldehyde resin, styrene-alkyd resin, poly-N -Vinylcarbazole, polysilane, etc. are mentioned. Among these, as the binder resin, a polycarbonate resin or a polyarylate resin is preferable. These binder resins are used alone or in combination of two or more.
The mixing ratio of the charge transport material and the binder resin is preferably 10: 1 to 1: 5 by mass ratio.

  In addition, the charge transport layer may contain a known additive.

  The formation of the charge transport layer is not particularly limited, and a known formation method is used. For example, a coating film of a charge transport layer forming coating solution in which the above components are added to a solvent is formed, and the coating film is dried. This is done by heating as necessary.

  Solvents for preparing the coating solution for forming the charge transport layer include aromatic hydrocarbons such as benzene, toluene, xylene and chlorobenzene; ketones such as acetone and 2-butanone; methylene chloride, chloroform and ethylene chloride. Halogenated aliphatic hydrocarbons: Usual organic solvents such as cyclic or linear ethers such as tetrahydrofuran and ethyl ether. These solvents are used alone or in combination of two or more.

  Coating methods for applying the charge transport layer forming coating solution on the charge generation layer include blade coating method, wire bar coating method, spray coating method, dip coating method, bead coating method, air knife coating method, curtain A usual method such as a coating method may be mentioned.

The thickness of the charge transport layer is, for example, preferably set in the range of 5 μm to 50 μm, more preferably 10 μm to 30 μm.
.

(Protective layer)
The protective layer (outermost surface layer) is the outermost surface layer in the electrophotographic photosensitive member, and is composed of a cured film of a composition containing a reactive charge transport material. That is, the protective layer includes a polymer or a crosslinked product of a reactive charge transport material.
The protective layer may be composed of a composition further including other additives such as a non-reactive charge transport material and a compound having an unsaturated bond (unsaturated double bond). That is, the protective layer may further contain other additives such as a polymer or a crosslinked product of a reactive charge transporting material and a compound having an unsaturated bond, and a non-reactive charge transporting material.

  The cured film is cured by radical polymerization using heat, light, radiation, or the like. Adjusting the reaction so that it does not progress too quickly improves the mechanical strength and electrical properties of the protective layer (outermost surface layer), and also suppresses the occurrence of film unevenness and wrinkles, so that radical generation is relatively slow. It is preferred to polymerize under the conditions that occur. From this point, thermal polymerization that allows easy adjustment of the polymerization rate is preferred. That is, the composition for forming the cured film constituting the protective layer (outermost surface layer) preferably contains a thermal radical generator or a derivative thereof.

-Reactive charge transport material-
The reactive charge transport material is selected from known materials as long as the compound has a charge transport skeleton and a reactive group in the same molecule. Here, examples of the reactive group include a chain polymerizable group, which may be a functional group capable of radical polymerization, for example, a functional group having a group containing at least a carbon double bond. Specifically, as the chain polymerizable group, for example, at least selected from vinyl group, propenyl group, vinyl ether group, vinyl thioether group, allyl ether group, acryloyl group, methacryloyl group, styryl group, and derivatives thereof. Examples thereof include a functional group containing one kind.

  As a reactive charge transport material, specifically, from the viewpoint of electrical properties and mechanical strength, from the group consisting of reactive compounds (specific reactive charge transport materials) represented by the general formulas (I) and (II) It is good that it is at least one selected.

In general formula (I), F represents a charge transporting skeleton.
L represents a divalent linking group containing two or more selected from the group consisting of an alkylene group, an alkenylene group, -C (= O)-, -N (R)-, -S-, and -O-. Show. R represents a hydrogen atom, an alkyl group, an aryl group, or an aralkyl group.
m represents an integer of 1 or more and 8 or less.

In general formula (II), F represents a charge transporting skeleton.
L ′ represents a trivalent or tetravalent group derived from an alkane or alkene, and an alkylene group, alkenylene group, —C (═O) —, —N (R) —, —S—, and —O—. And an (n + 1) -valent linking group containing two or more selected from the group consisting of: R represents a hydrogen atom, an alkyl group, an aryl group, or an aralkyl group. The trivalent or tetravalent group derived from alkane or alkene means a group obtained by removing three or four hydrogen atoms from alkane or alkene. The same applies hereinafter.
m ′ represents an integer of 1 to 6. n represents an integer of 2 or more and 3 or less.

  In general formulas (I) and (II), F represents a charge transporting skeleton, that is, a structure having charge transporting properties. Specifically, phthalocyanine compounds, porphyrin compounds, azobenzene compounds, triarylamine compounds Examples thereof include structures having charge transporting properties such as compounds, benzidine compounds, arylalkane compounds, aryl-substituted ethylene compounds, stilbene compounds, anthracene compounds, hydrazone compounds, quinone compounds, and fluorenone compounds.

In general formula (I), examples of the linking group represented by L include:
A divalent linking group in which —C (═O) —O— is interposed in the alkylene group,
A divalent linking group in which —C (═O) —N (R) — is interposed in an alkylene group,
A divalent linking group in which —C (═O) —S— is interposed in the alkylene group,
A divalent linking group in which -O- is interposed in the alkylene group,
A divalent linking group in which -N (R)-is interposed in the alkylene group,
A divalent linking group in which -S- is interposed in the alkylene group,
Is mentioned.
The linking group represented by L is an alkylene group, -C (= O) -O-, -C (= O) -N (R)-, -C (= O) -S-, -O. Two groups of-or -S- may be present.

Specific examples of the linking group represented by L in the general formula (I) include:
* — (CH ₂ ) _p —C (═O) —O— (CH ₂ ) _q —,
_{* - (CH 2) p -O} -C (= O) - (CH 2) r -C (= O) -O- (CH 2) q -,
* — (CH ₂ ) _p —C (═O) —N (R) — (CH ₂ ) _q —,
_{* - (CH 2) p -C} (= O) -S- (CH 2) q -,
_{* - (CH 2) p -O-} (CH 2) q -,
_{* - (CH 2) p -N} (R) - (CH 2) q -,
_{* - (CH 2) p -S-} (CH 2) q -,
_{* - (CH 2) p -O-} (CH 2) r -O- (CH 2) q -
Etc.
Here, in the linking group represented by L, p represents 0 or an integer of 1 to 6 (preferably 1 to 5). q represents an integer of 1 to 6 (preferably 1 to 5). r represents an integer of 1 to 6 (preferably 1 to 5).
In the linking group represented by L, “*” represents a site linked to F.

On the other hand, in the general formula (II), as the linking group represented by L ′, for example,
A (n + 1) -valent linking group in which —C (═O) —O— is interposed in a branchedly linked alkylene group,
A (n + 1) -valent linking group in which —C (═O) —N (R) — is interposed in a branchedly linked alkylene group,
A (n + 1) -valent linking group in which —C (═O) —S— is interposed in a branchedly linked alkylene group,
(N + 1) -valent linking group in which —O— is interposed in a branched alkylene group,
A (n + 1) -valent linking group in which —N (R) — is interposed in a branchedly linked alkylene group,
A (n + 1) -valent linking group in which -S- is interposed in a branched alkylene group;
Is mentioned.
In addition, the linkage represented by L ′ is in a branched alkylene group, —C (═O) —O—, —C (═O) —N (R) —, —C (═O). Two groups of -S-, -O-, or -S- may be present.

In the general formula (II), as the linking group represented by L ′, for example,
* — (CH ₂ ) _p —CH [C (═O) —O— (CH ₂ ) _q —] ₂ ,
* — (CH ₂ ) _p —CH═C [C (═O) —O— (CH ₂ ) _q —] ₂ ,
_{* - (CH 2) p -CH} [C (= O) -N (R) - (CH 2) q -] 2,
_{* - (CH 2) p -CH} [C (= O) -S- (CH 2) q -] 2,
* — (CH ₂ ) _p —CH [(CH ₂ ) _r —O— (CH ₂ ) _q —] ₂ ,
_{* - (CH 2) p -CH} = C [(CH 2) r -O- (CH 2) q -] 2,
_{* - (CH 2) p -CH} [(CH 2) r -N (R) - (CH 2) q -] 2,
_{* - (CH 2) p -CH} [(CH 2) r -S- (CH 2) q -] 2,


* — (CH ₂ ) _p —O—C [(CH ₂ ) _r —O— (CH ₂ ) _q —] ₃
* — (CH ₂ ) _p —C (═O) —O—C [(CH ₂ ) _r —O— (CH ₂ ) _q —] ₃
Etc.
Here, in the linking group represented by L ′, p represents 0 or an integer of 1 to 6 (preferably 1 to 5). q represents an integer of 1 to 6 (preferably 1 to 5). r represents an integer of 1 to 6 (preferably 1 to 5). s represents an integer of 1 to 6 (preferably 1 to 5).
In the linking group represented by L ′, “*” represents a site linked to F.

Among these, in the general formula (II), as the linking group represented by L ′,
* — (CH ₂ ) _p —CH [C (═O) —O— (CH ₂ ) _q —] ₂ ,
* — (CH ₂ ) _p —CH═C [C (═O) —O— (CH ₂ ) _q —] ₂ ,
* — (CH ₂ ) _p —CH [(CH ₂ ) _r —O— (CH ₂ ) _q —] ₂ ,
_{* - (CH 2) p -CH} = C [(CH 2) r -O- (CH 2) q -] 2,
Is good.
Specifically, the group connected to the charge transporting skeleton represented by F of the reactive compound represented by the general formula (II) (corresponding to the group represented by the general formula (IIA-a)) is represented by the following general formula ( It may be a group represented by IIA-a1), the following general formula (IIA-a2), the following general formula (IIA-a3), or the following general formula (IIA-a4).

In general formula (IIA-a1) or (IIA-a2), ^Xk1 represents a divalent linking group. kq1 represents an integer of 0 or 1. X ^k2 represents a divalent linking group. kq2 represents an integer of 0 or 1.
Here, the divalent linking group represented by X ^k1 and X ^k2 is, for example, — (CH ₂ ) _p — (wherein p represents an integer of 1 to 6 (preferably 1 to 5))). Can be mentioned. Examples of the divalent linking group also include an alkyleneoxy group.

In general formula (IIA-a3) or (IIA-a4), ^Xk3 represents a divalent linking group. kq3 represents an integer of 0 or 1. X ^k4 represents a trivalent linking group. kq4 represents an integer of 0 or 1.
Here, the divalent linking group represented by X ^k3 and X ^k4 is, for example, — (CH ₂ ) _p — (wherein p represents an integer of 1 to 6 (preferably 1 to 5))). Can be mentioned. Examples of the divalent linking group also include an alkyleneoxy group.

In general formulas (I) and (II), in the linking group represented by L or L ′, the alkyl group represented by R of “—N (R) —” has 1 to 5 carbon atoms (preferably 1 4 or less) linear and branched alkyl groups, and specific examples include a methyl group, an ethyl group, a propyl group, and a butyl group.
Examples of the aryl group represented by R in “—N (R) —” include aryl groups having 6 to 15 carbon atoms (preferably 6 to 12 carbon atoms). Specific examples include phenyl groups and toluyl groups. Group, xylidyl group, naphthyl group and the like.
Examples of the aralkyl group include aralkyl groups having 7 to 15 carbon atoms (preferably 7 to 14 carbon atoms). Specific examples include a benzyl group, a phenethyl group, and a biphenylmethylene group.

In general formulas (I) and (II), m preferably represents an integer of 1 to 6.
m ′ preferably represents an integer of 1 to 6.
n preferably represents an integer of 2 or more and 3 or less.

Next, preferred compounds of the reactive compounds represented by the general formulas (I) and (II) will be described.
As the reactive compound represented by the general formulas (I) and (II), a reactive compound having a charge transporting skeleton (structure having charge transporting property) derived from a triarylamine compound as F is preferable.
Specifically, the reactive compound represented by the general formula (I) includes the general formula (Ia), the general formula (Ib), the general formula (Ic), and the general formula (Id). At least one compound selected from the group consisting of reactive compounds represented by
On the other hand, as the reactive compound represented by the general formula (II), the reactive compound represented by the general formula (II-a) is preferable.

-Reactive compound shown by general formula (Ia) The reactive compound shown by general formula (Ia) is demonstrated.
When the reactive compound represented by the general formula (Ia) is applied as the specific reactive charge transport material, it is easy to suppress deterioration of electrical characteristics due to environmental changes. The reason is not clear, but is thought to be as follows.
First, since the reactive compound having a (meth) acrylic group that has been used conventionally has a strong hydrophilicity of the (meth) acrylic group with respect to a skeleton part that expresses charge transport performance during polymerization, It is considered that a certain kind of layer separation state is formed, which hinders hopping conduction. For this reason, a charge transporting film containing a polymer of a reactive compound having a (meth) acrylic group or a crosslinked product has a reduced efficiency of charge transport, and further has a reduced environmental stability due to partial moisture adsorption or the like. It is considered a thing.
On the other hand, the reactive compound represented by the general formula (Ia) has a vinyl-based chain polymerizable group that is not strongly hydrophilic, and further has a skeleton that exhibits charge transport performance within one molecule. The skeletons are linked by a flexible linking group that does not have a conjugated bond such as an aromatic ring or a conjugated double bond. Since it has such a structure, it is considered that efficient charge transport performance and high strength can be achieved, and formation of a layer separation state during polymerization is suppressed. As a result, the protective layer (outermost surface layer) containing the polymer or cross-linked product of the reactive compound represented by the general formula (Ia) is excellent in both charge transport performance and mechanical strength. It is thought that the environment dependence (temperature and humidity dependence) of transport performance can be reduced.
From the above, it is considered that when the reactive compound represented by the general formula (Ia) is applied, deterioration of electrical characteristics due to environmental changes is easily suppressed.

In the general formula (Ia), Ar ^{a1 to} Ar ^a4 each independently represent a substituted or unsubstituted aryl group. Ar ^a5 and Ar ^a6 each independently represent a substituted or unsubstituted arylene group. Xa represents a divalent linking group formed by combining groups selected from an alkylene group, -O-, -S-, and an ester. Da represents a group represented by the following general formula (IA-a). ac1 to ac4 each independently represents an integer of 0 or more and 2 or less. However, the total number of Da is 1 or 2.

In the general formula ^{(IA-a), L} a _{is, * - (CH 2) an} -O-CH 2 - is represented by the divalent linking group linked to the group represented by ^Ar a1 ^{to Ar a4} at * Indicates. an represents an integer of 1 or 2.

Details of the general formula (Ia) will be described below.
In general formula (Ia), the substituted or unsubstituted aryl groups represented by Ar ^{a1 to} Ar ^a4 may be the same or different.
Here, as a substituent in the substituted aryl group, other than “Da”, an alkyl group having 1 to 4 carbon atoms, an alkoxy group having 1 to 4 carbon atoms, and an alkoxy group having 1 to 4 carbon atoms. Examples thereof include a substituted phenyl group, an unsubstituted phenyl group, an aralkyl group having 7 to 10 carbon atoms, and a halogen atom.

In general formula (Ia), Ar ^{a1 to} Ar ^a4 are preferably any one of the following structural formulas (1) to (7).
In addition, the following structural formulas (1) to (7) collectively indicate “— (Da) _ac1 ” to “— (Da) _ac1 ” that can be connected to each of Ar ^{a1 to} Ar ^a4. ) _C ”.

In the structural formulas (1) to (7), R ¹¹ is substituted with a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, an alkyl group having 1 to 4 carbon atoms, or an alkoxy group having 1 to 4 carbon atoms. And a phenyl group, an unsubstituted phenyl group, and an aralkyl group having 7 to 10 carbon atoms. R ¹² and R ¹³ are each independently a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, an alkoxy group having 1 to 4 carbon atoms, or a phenyl group substituted with an alkoxy group having 1 to 4 carbon atoms. 1 group selected from the group consisting of an unsubstituted phenyl group, an aralkyl group having 7 to 10 carbon atoms, and a halogen atom. R ¹⁴ each independently represents an alkyl group having 1 to 4 carbon atoms, an alkoxy group having 1 to 4 carbon atoms, a phenyl group substituted with an alkoxy group having 1 to 4 carbon atoms, an unsubstituted phenyl group, 1 type chosen from the group which consists of a C7-C10 aralkyl group and a halogen atom is shown. Ar represents a substituted or unsubstituted arylene group. s represents 0 or 1. t represents an integer of 0 or more and 3 or less. Z ′ represents a divalent organic linking group.

  Here, in the formula (7), Ar is preferably one represented by the following structural formula (8) or (9).

In structural formulas (8) and (9), R ¹⁵ and R ¹⁶ are each independently an alkyl group having 1 to 4 carbon atoms, an alkoxy group having 1 to 4 carbon atoms, or an alkoxy group having 1 to 4 carbon atoms. Represents one selected from the group consisting of a phenyl group substituted with a group, an unsubstituted phenyl group, an aralkyl group having 7 to 10 carbon atoms, and a halogen atom, and t1 and t2 each represent an integer of 0 to 3 Show.

  In the formula (7), Z ′ is preferably one represented by any of the following structural formulas (10) to (17).

In Structural Formulas (10) to (17), R ¹⁷ and R ¹⁸ are each independently an alkyl group having 1 to 4 carbon atoms, an alkoxy group having 1 to 4 carbon atoms, or an alkoxy group having 1 to 4 carbon atoms. 1 type selected from the group consisting of a phenyl group substituted with a group, an unsubstituted phenyl group, an aralkyl group having 7 to 10 carbon atoms, and a halogen atom. W represents a divalent group. q1 and r1 each independently represents an integer of 1 or more and 10 or less. t3 and t4 each represent an integer of 0 or more and 3 or less.

  In the structural formulas (16) to (17), W is preferably any one of divalent groups represented by the following structural formulas (18) to (26). However, in Formula (25), u shows the integer of 0-3.

In the general formula (Ia), in the substituted or unsubstituted arylene group represented by Ar ^a5 and Ar ^a6 , the arylene group is a target position from the aryl group exemplified in the description of Ar ^{a1 to} Ar ^a4. And an arylene group in which one hydrogen atom is removed.
Moreover, as a substituent in a substituted arylene group, it is the same as that of what is mentioned as substituents other than "Da" in a substituted aryl group by description of Ar < ^a1 > -Ar < ^a4 >.

In general formula (Ia), the divalent linking group represented by Xa is an alkylene group or a divalent group formed by combining alkylene groups, —O—, —S—, and groups selected from esters. Thus, the linking group does not contain a conjugated bond such as an aromatic ring or a conjugated double bond.
Specifically, examples of the divalent linking group represented by Xa include an alkylene group having 1 to 10 carbon atoms, and an alkylene group having 1 to 10 carbon atoms and —O—, —S—, and —O. A divalent group formed by combining a group selected from —C (═O) — and —C (═O) —O— is also included.
When the divalent linking group represented by Xa is an alkylene group, the alkylene group may have a substituent such as alkyl, alkoxy, halogen, etc., and two of these substituents are bonded to each other, A structure such as a divalent linking group represented by Structural Formula (26) described as a specific example of W in Structural Formulas (16) to (17) may be used.

-Reactive compound shown by general formula (Ib) The reactive compound shown by general formula (Ib) is demonstrated.
When the reactive compound represented by the general formula (Ib) is applied as a specific reactive charge transporting material, wear of the protective layer (outermost surface layer) is suppressed and occurrence of density unevenness in the image is easily suppressed. Become. The reason is not clear, but is thought to be as follows.
First, the bulky charge-transporting skeleton and the polymerization site (styryl group) are structurally close, and if it is rigid, the polymerization sites will not move easily, and residual strain due to the curing reaction tends to remain. It is considered that the HOMO (highest occupied orbit) level that causes carrier transport occurs due to the distortion of the carrier, and as a result, the energy distribution is likely to be widened (energy disorder: σ is large).
On the other hand, through a methylene group and an ether group, flexibility is obtained in the molecular structure, and a small σ is easily obtained. Further, the methylene group and the ether group are compared with an ester group, an amide group, etc. The dipole moment (dipole moment) is small, and this effect also contributes to the reduction of σ and is considered to improve the electrical characteristics. In addition, it is thought that the addition of flexibility to the molecular structure increases the degree of freedom of reaction site (reaction site) movement and improves the reaction rate, resulting in a strong film. A structure in which a flexible connecting chain is interposed between the polymerization site and the polymerization site is preferable.
For this reason, it is considered that the reactive compound represented by the general formula (Ib) increases the molecular weight of the molecule itself due to the curing reaction, makes the center of gravity difficult to move, and has a high degree of freedom of the styryl group. As a result, the protective layer (outermost surface layer) containing the polymer or crosslinked product of the reactive compound represented by the general formula (Ib) is considered to have excellent electrical properties and high strength.
From the above, it is considered that when the reactive compound represented by the general formula (Ib) is applied, wear of the protective layer (outermost surface layer) is suppressed and occurrence of uneven density in the image is easily suppressed.

In the general formula (Ib), Ar ^{b1 to} Ar ^b4 each independently represent a substituted or unsubstituted aryl group. Ar ^b5 represents a substituted or unsubstituted aryl group or a substituted or unsubstituted arylene group. Db represents a group represented by the following general formula (IA-b). bc1 to bc5 each independently represent an integer of 0 or more and 2 or less. bk represents 0 or 1. However, the total number of Db is 1 or 2.

In General Formula (IA-b), L ^b includes a group represented by * — (CH ₂ ) _bn —O—, and is a divalent linking group linked to a group represented by Ar ^{b1 to} Ar ^b5 at *. Indicates. bn represents an integer of 3 to 6.

Hereinafter, the details of the general formula (Ib) will be described.
In general formula (Ib), the substituted or unsubstituted aryl group represented by Ar ^{b1 to} Ar ^b4 is the substituted or unsubstituted aryl group represented by Ar ^{a1 to} Ar ^a4 in general formula (Ia). It is the same.
Ar ^b5 represents a substituted or unsubstituted aryl group when bk is 0, and examples of the substituted or unsubstituted aryl group include substituted or unsubstituted Ar ^{a1 to} Ar ^a4 in the general formula (Ia) Same as unsubstituted aryl group.
Ar ^b5 represents a substituted or unsubstituted arylene group when bk is 1, and the substituted or unsubstituted arylene group includes a substituent represented by Ar ^a5 and Ar ^a6 in the general formula (Ia) or The same as the unsubstituted arylene group.

Next, the details of the general formula (IA-b) will be described.
In the general formula (IA-b), examples of the divalent linking group represented by ^{L b,} for example,
* — (CH ₂ ) _bp —O—,
* — (CH ₂ ) _bp —O— (CH ₂ ) _bq —O—
Etc.
Here, in the linking group represented by L ^b, bp represents an integer of 3 to 6 (preferably 3 to 5). bq represents an integer of 1 to 6 (preferably 1 to 5).
Incidentally, in the linking group represented by ^{L b, "*"} represents a site connecting to a group represented by Ar b1 ^{to Ar b5.}

-Reactive compound shown by general formula (Ic) The reactive compound shown by general formula (Ic) is demonstrated.
When the reactive compound represented by the general formula (Ic) is applied as the specific reactive charge transporting material, scratches are hardly generated on the surface even when used repeatedly, and image quality deterioration is easily suppressed. The reason is not clear, but is thought to be as follows.
First, when forming the outermost surface layer containing a polymer or cross-linked product of a specific reactive charge transport material, film shrinkage accompanying the polymerization reaction or cross-linking reaction, and structure around the charge transport structure and chain polymerizable group It is thought that aggregation occurs. Therefore, when the surface of the electrophotographic photosensitive member is subjected to a mechanical load by repeated use, the film itself is worn or the chemical structure in the molecule is cut, so that the film contraction and aggregation state change, and the electrophotographic photosensitive member changes. It is considered that the electrical characteristics of the image change and cause image quality degradation.
On the other hand, since the reactive compound represented by the general formula (Ic) has a styrene skeleton as a chain polymerizable group, it has good compatibility with the aryl group which is the main skeleton of the charge transport material, and the film shrinks. It is considered that the aggregation of the charge transport structure and the structure around the chain polymerizable group due to polymerization reaction or crosslinking reaction is suppressed. As a result, the electrophotographic photosensitive member having a protective layer (outermost surface layer) containing a polymer or crosslinked product of the reactive compound represented by the general formula (Ic) is considered to suppress image quality deterioration due to repeated use. It is done.
In addition, the reactive compound represented by the general formula (Ic) includes a charge transporting skeleton and a styrene skeleton, a specific group such as —C (═O) —, —N (R) —, and —S—. It is thought that the interaction between the specific group and the nitrogen atom in the charge transporting skeleton, the interaction between the specific groups, and the like are caused by linking via the linking group including, as a result, the general formula (I- It is thought that the strength of the protective layer (outermost surface layer) containing the polymer or crosslinked product of the reactive compound represented by c) is further improved.
From the above, it is considered that when the reactive compound represented by the general formula (Ic) is applied, scratches are hardly generated on the surface even when used repeatedly, and image quality deterioration is easily suppressed.
Note that specific groups such as -C (= O)-, -N (R)-, and -S- are attributed to the polarity and hydrophilicity, causing the charge transportability and image quality deterioration under high humidity conditions. However, since the reactive compound represented by the general formula (Ic) has a styrene skeleton having higher hydrophobicity than (meth) acryl or the like as a chain polymerizable group, the charge transportability is deteriorated or the previous cycle is deteriorated. It is considered that image quality deterioration such as an afterimage phenomenon (ghost) due to the history hardly occurs.

In the general formula (Ic), Ar ^{c1 to} Ar ^c4 each independently represent a substituted or unsubstituted aryl group. Ar ^c5 represents a substituted or unsubstituted aryl group or a substituted or unsubstituted arylene group. Dc represents a group represented by the following general formula (IA-c). cc1 to cc5 each independently represents an integer of 0 or more and 2 or less. ck represents 0 or 1. However, the total number of Dc is 1 or more and 8 or less.

In the general formula (IA-c), ^{L C} is, -C (= O) -, - N (R) -, - S-, and, -C (= O) - and -O -, - N (R )-Or -S- represents a divalent linking group containing one or more groups selected from the group consisting of groups. R represents a hydrogen atom, an alkyl group, an aryl group, or an aralkyl group.

Details of the general formula (Ic) will be described below.
In general formula (Ic), the substituted or unsubstituted aryl group represented by Ar ^{c1 to} Ar ^c4 is a substituted or unsubstituted aryl group represented by Ar ^{a1 to} Ar ^a4 in general formula (Ia). It is the same.
Ar ^c5 represents a substituted or unsubstituted aryl group when ck is 0, and examples of the substituted or unsubstituted aryl group include a substituted group represented by Ar ^{a1 to} Ar ^a4 in formula (Ia) or Same as unsubstituted aryl group.
Ar ^c5 represents a substituted or unsubstituted arylene group when ck is 1, and the substituted or unsubstituted arylene group includes a substituent represented by Ar ^a5 and Ar ^a6 in formula (Ia) or The same as the unsubstituted arylene group.
The total number of Dc is preferably 2 or more, more preferably 4 or more, from the viewpoint of obtaining a protective layer (outermost surface layer) with higher strength. In general, if the number of chain polymerizable groups in one molecule is too large, as the polymerization (crosslinking) reaction proceeds, the molecules become difficult to move and the chain polymerization reactivity decreases, and the proportion of unreacted chain polymerizable groups increases. Therefore, the total number of Dc is preferably 7 or less, more preferably 6 or less.

Next, the details of the general formula (IA-c) will be described.
In the general formula (IA-c), ^examples of the divalent linking group represented by L ^c include —C (═O) —, —N (R) —, —S—, and —C (═O) —. And a divalent linking group containing a group in which —O—, —N (R) —, or —S— is combined (hereinafter referred to as “specific linking group”).
Here, the specific linking group includes, for example, —C (═O) —, —N (R) —, and —S— from the viewpoint of the balance between the strength and polarity (hydrophobicity) of the protective layer (outermost surface layer). , -C (= O) -O-, -C (= O) -N (R)-, -C (= O) -S-, -O-C (= O) -O-, -O-C (═O) —N (R) — is preferred, preferably —N (R) —, —S—, —C (═O) —O—, —C (═O) —N (H) —, — C (= O) -O-, more preferably -C (= O) -O-.
The divalent linking group represented by L ^c includes, for example, a specific linking group, a saturated hydrocarbon (including any of linear, branched, and cyclic) or aromatic hydrocarbon residues, and an oxygen atom. And a divalent linking group formed by combining a specific linking group, a linear saturated hydrocarbon residue, and an oxygen atom. The linking group is preferable.
The total number of carbon atoms contained in the divalent linking group represented by L ^c is, for example, from 1 to 20 in terms of the density of the styrene skeleton in the molecule and chain polymerization reactivity, and preferably from 2 to 10 It is as follows.

Specific examples of the divalent linking group represented by L ^c in the general formula (IA-c) include, for example,
_{* - (CH 2) cp -C} (= O) -O- (CH 2) cq -,
* — (CH ₂ ) _cp —O—C (═O) — (CH ₂ ) _cr —C (═O) —O— (CH ₂ ) _cq —,
* — (CH ₂ ) _cp —C (═O) —N (R) — (CH ₂ ) _cq —,
_{* - (CH 2) cp -C} (= O) -S- (CH 2) cq -,
_{* - (CH 2) cp -N} (R) - (CH 2) cq -,
_{* - (CH 2) cp -S-} (CH 2) cq -,
Etc.
Here, in the linking group represented by ^{L c,} cp is 0, or 1 to 6 (preferably 1 to 5) represents an integer of. cq represents an integer of 1 to 6 (preferably 1 to 5). cr represents an integer of 1 to 6 (preferably 1 to 5).
In the linking group represented by L ^c , “*” represents a site linked to the group represented by Ar ^{c1 to} Ar ^c5 .

Among these, in the general formula (IA-c), the divalent linking group represented by ^{_{L c, * - (CH 2}} ) cp -C (= O) -O-CH 2 - is preferred. That is, the group represented by the general formula (IA-c) is preferably a group represented by the following general formula (IA-c1). However, in general formula (IA-c1), cp1 shows the integer of 0-4.

-Reactive compound shown by general formula (Id) The reactive compound shown by general formula (Id) is demonstrated.
When the reactive compound represented by the general formula (Id) is applied as the specific reactive charge transporting material, wear of the protective layer (outermost surface layer) is suppressed and generation of density unevenness in the image is easily suppressed. Become. Although the reason is not certain, it is thought to be due to the same reason as the reactive compound represented by the general formula (Ib).
In particular, the reactive compound represented by the general formula (Id) has a higher total number of Dd of 3 or more and 8 or less than the general formula (Ib). It is considered that a crosslinked network is easily formed, and wear of the protective layer (outermost surface layer) is more easily suppressed.

In the general formula (Id), Ar ^{d1 to} Ar ^d4 each independently represent a substituted or unsubstituted aryl group. Ar ^d5 represents a substituted or unsubstituted aryl group or a substituted or unsubstituted arylene group. Dd represents a group represented by the following general formula (IA-d). dc1 to dc5 each independently represents an integer of 0 or more and 2 or less. dk represents 0 or 1. However, the total number of Dd is 3 or more and 8 or less.

In General Formula (IA-d), L ^d includes a group represented by * — (CH ₂ ) _dn —O—, and represents a divalent linking group that is coupled to Ar ^{d1 to} Ar ^d5 by *. Show. dn represents an integer of 1 to 6.

Details of the general formula (Id) will be described below.
In general formula (Id), the substituted or unsubstituted aryl group represented by Ar ^{d1 to} Ar ^d4 is the substituted or unsubstituted aryl group represented by Ar ^{a1 to} Ar ^a4 in general formula (Ia). It is the same.
Ar ^d5 represents a substituted or unsubstituted aryl group when dk is 0, and examples of the substituted or unsubstituted aryl group include substituted or unsubstituted Ar ^{a1 to} Ar ^a4 in the general formula (Ia) Same as unsubstituted aryl group.
Ar ^d5 represents a substituted or unsubstituted arylene group when dk is 1, and the substituted or unsubstituted arylene group includes a substituent represented by Ar ^a5 and Ar ^a6 in the general formula (Ia) or The same as the unsubstituted arylene group.
The total number of Dd is preferably 4 or more from the viewpoint of obtaining a protective layer (outermost surface layer) with higher strength.

Next, the details of the general formula (IA-d) will be described.
In the general formula (IA-d), examples of the divalent linking group represented by L ^d include:
* — (CH ₂ ) _dp —O—,
_{* - (CH 2) dp -O-} (CH 2) dq -O-
Etc.
Here, in the linking group represented by L ^d , dp represents an integer of 1 to 6 (preferably 1 to 5). dq represents an integer of 1 to 6 (preferably 1 to 5).
In the linking group represented by L ^d , “*” represents a site linked to the group represented by Ar ^{d1 to} Ar ^d5 .

-Reactive compound shown by general formula (II-a) The reactive compound shown by general formula (II-a) is demonstrated.
When a reactive compound represented by the general formula (II) (particularly the general formula (II-a)) is applied as a specific reactive charge transport material, it is easy to suppress deterioration of electrical characteristics even when used repeatedly over a long period of time. Become. The reason is not clear, but is thought to be as follows.
First, the reactive compound represented by the general formula (II) (particularly the general formula (II-a)) has two or three chain polymerizable reactive groups from a charge transporting skeleton through one linking group. It is a compound having (styrene group).
Therefore, the reactive compound represented by the general formula (II) (particularly the general formula (II-a)) was polymerized or cross-linked by the presence of this linking group while maintaining a high degree of curing and the number of cross-linking sites. At this time, it is difficult to cause distortion in the charge transporting skeleton, and it is considered that it is easy to realize both high curing degree and excellent charge transport performance.
In addition, conventionally used charge transporting compounds having a (meth) acryl group are likely to be distorted as described above, and the reactive sites are highly hydrophilic and the charge transporting sites are highly hydrophobic. Therefore, the reactive compound represented by the general formula (II) (particularly the general formula (II-a)) has a styrene group as a reactive group, whereas microscopic phase separation (microphase separation) is likely to occur. Furthermore, the structure has a linking group that is difficult to cause distortion in the charge transporting skeleton when cured (crosslinked), and both the reactive site and the charge transporting site are hydrophobic. Since separation is difficult to occur, it is considered that efficient charge transport performance and high strength can be achieved. As a result, the protective layer (outermost surface layer) containing a polymer or a crosslinked product of the reactive compound represented by the general formula (II) (particularly the general formula (II-a)) has excellent mechanical strength and charge. It is considered that the transport performance (electrical characteristics) is more excellent.
From the above, it is considered that when the reactive compound represented by the general formula (II) (particularly, the general formula (II-a)) is applied, deterioration of electric characteristics is easily suppressed even when used repeatedly over a long period of time.

In the general formula (II-a), Ar ^{k1 to} Ar ^k4 each independently represents a substituted or unsubstituted aryl group. Ar ^k5 represents a substituted or unsubstituted aryl group, or a substituted or unsubstituted arylene group. Dk represents a group represented by the following general formula (IIA-a). kc1 to kc5 each independently represents an integer of 0 or more and 2 or less. kk represents 0 or 1. However, the total number of Dk is 1 or more and 8 or less.

In the general formula (IIA-a), L ^k represents a trivalent or tetravalent group derived from an alkane or alkene, an alkylene group, an alkenylene group, -C (= O)-, -N (R)- A (kn + 1) -valent linking group containing two or more selected from the group consisting of, -S-, and -O-. R represents a hydrogen atom, an alkyl group, an aryl group, or an aralkyl group. kn represents an integer of 2 or more and 3 or less.

Hereinafter, the details of the general formula (II-a) will be described.
In general formula (II-a), the substituted or unsubstituted aryl group represented by Ar ^{k1 to} Ar ^k4 is the substituted or unsubstituted aryl group represented by Ar ^{a1 to} Ar ^a4 in general formula (Ia). It is the same.
Ar ^k5 represents a substituted or unsubstituted aryl group when kk is 0. ^Examples of the substituted or unsubstituted aryl group include substituted or unsubstituted Ar ^{a1 to} Ar ^a4 in the general formula (Ia) Same as unsubstituted aryl group.
Ar ^k5 represents a substituted or unsubstituted arylene group when kk is 1, and the substituted or unsubstituted arylene group includes a substituent represented by Ar ^a5 and Ar ^a6 in the general formula (Ia) or The same as the unsubstituted arylene group.
The total number of Dk is preferably 2 or more, more preferably 4 or more, from the viewpoint of obtaining a protective layer (outermost surface layer) with higher strength. In general, if the number of chain polymerizable groups in one molecule is too large, as the polymerization (crosslinking) reaction proceeds, the molecules become difficult to move and the chain polymerization reactivity decreases, and the proportion of unreacted chain polymerizable groups increases. Therefore, the total number of Dc is preferably 7 or less, more preferably 6 or less.

Next, the detail of general formula (IIA-a) is demonstrated.
In the general formula (IIA-a), the (kn + 1) -valent linking group ^represented by L ^k is, for example, the same as the (n + 1) -valent linking group represented by L ′ in the general formula (II).

Specific examples of the specific reactive charge transport material are shown below.
Specifically, the charge transporting skeleton F of the general formulas (I) and (II) (for example, a portion corresponding to the skeleton excluding Da in the general formula (Ia) and Dk of the general formula (II-a)). Together with specific examples of functional groups linked to the charge transporting skeleton F (for example, a site corresponding to Da in the general formula (Ia) or Dk in the general formula (II-a)). Specific examples of the reactive compound represented by (II) and (II) are shown below, but are not limited thereto.
In the specific examples of the charge transporting skeleton F in the general formulas (I) and (II), the “*” part means that the “*” part of the functional group linked to the charge transporting skeleton F is linked. To do.
That is, for example, the exemplary compound (Ib) -1 is shown as a specific example of the charge transporting skeleton F: (M1) -1, and a specific example of the functional group: (R2) -1. The typical structure shows the following structure.

  First, specific examples of the charge transporting skeleton F are shown below.

  Next, specific examples of the functional group linked to the charge transporting skeleton F are shown.

  Next, specific examples of the compound represented by the general formula (I), specifically, the general formula (Ia) are shown.

  Next, specific examples of the compound represented by the general formula (I), specifically, the general formula (Ib) are shown.

  Next, specific examples of the compound represented by the general formula (I), specifically, the general formula (Ic) are shown.

  Next, specific examples of the compound represented by the general formula (I), specifically, the general formula (Id) will be shown.

  Next, specific examples of the compound represented by the general formula (II), specifically, the general formula (II-a) are shown.

A specific reactive charge transport material (in particular, the reactive compound represented by the general formula (I)) is synthesized, for example, as follows.
That is, a specific reactive charge transport material is synthesized by etherification with a carboxylic acid or alcohol as a precursor and a corresponding chloromethylstyrene or the like.

  The synthesis route of exemplary compound (Id) -22 of a specific reactive charge transport material is shown below as an example.

The arylamine compound carboxylic acid is an ester group of an arylamine compound, for example, as described in Experimental Chemistry Course, 4th edition, volume 20, p. As described in No. 51 and the like, it can be obtained by hydrolysis using a basic catalyst (NaOH, K ₂ CO ₃ etc.) and an acidic catalyst (eg phosphoric acid, sulfuric acid etc.).
In this case, various solvents can be used, and it is preferable to use alcohols such as methanol, ethanol, ethylene glycol, or a mixture of water.
Furthermore, when the solubility of the arylamine compound is low, methylene chloride, chloroform, toluene, dimethyl sulfoxide, ether, tetrahydrofuran or the like may be added.
Although there is no restriction | limiting in particular in the quantity of a solvent, For example, it is 1 mass part or more and 100 mass parts or less with respect to 1 mass part of arylamine compounds containing an ester group, Preferably it is used by 2 mass parts or more and 50 mass parts or less. Good.
The reaction temperature is set, for example, in the range from room temperature (for example, 25 ° C.) to the boiling point of the solvent, and is preferably 50 ° C. or higher in view of the reaction rate.
Although there is no restriction | limiting in particular about the quantity of a catalyst, For example, 0.001 mass part or more and 1 mass part or less with respect to 1 mass part of arylamine compounds containing an ester group, Preferably it is 0.01 mass part or more and 0.5 It is good to use below mass parts.
When hydrolysis is performed with a basic catalyst after the hydrolysis reaction, the generated salt is neutralized with an acid (for example, hydrochloric acid or the like) and released. Furthermore, after washing thoroughly with water, use after drying, or if necessary, recrystallize and purify with an appropriate solvent such as methanol, ethanol, toluene, ethyl acetate, acetone, etc. Also good.

  The alcohol form of the arylamine compound may be prepared by reacting the ester group of the arylamine compound with, e.g. As described in No. 10 and the like, it is synthesized by reducing to the corresponding alcohol using lithium aluminum hydride, sodium borohydride or the like.

  For example, when a reactive group is introduced by an ester bond, normal esterification in which an arylamine compound carboxylic acid and hydroxymethylstyrene are dehydrated and condensed with an acid catalyst, an arylamine compound carboxylic acid, and a halogenated methylstyrene are combined. , Pyridine, piperidine, triethylamine, dimethylaminopyridine, trimethylamine, DBU, sodium hydride, sodium hydroxide, potassium hydroxide, and other methods of condensation can be used. This is preferred because the product is suppressed.

The halogenated methylstyrene is preferably added in an amount of 1 equivalent or more, preferably 1.2 equivalents or more, more preferably 1.5 equivalents or more with respect to the acid of the arylamine compound carboxylic acid. It is preferably used in an amount of from 8 equivalents to 2.0 equivalents, preferably from 1.0 equivalents to 1.5 equivalents.
Solvents include aprotic polar solvents such as N-methylpyrrolidone, dimethyl sulfoxide, N, N-dimethylformamide, ketone solvents such as acetone and methyl ethyl ketone, ether solvents such as diethyl ether and tetrahydrofuran, toluene, chlorobenzene, 1 An aromatic solvent such as chloronaphthalene is effective, and is in the range of 1 to 100 parts by weight, preferably 2 to 50 parts by weight, based on 1 part by weight of the arylamine compound carboxylic acid. It should be used.
The reaction temperature is not particularly limited. After completion of the reaction, the reaction solution is poured into water, extracted with a solvent such as toluene, hexane, or ethyl acetate, washed with water, and further purified using an adsorbent such as activated carbon, silica gel, porous alumina, or activated clay if necessary. May be.

In addition, when introduced by an ether bond, arylamine compound alcohol and halogenated methylstyrene are converted into bases such as pyridine, piperidine, triethylamine, dimethylaminopyridine, trimethylamine, DBU, sodium hydride, sodium hydroxide, potassium hydroxide, etc. It is preferable to use a method of condensing with.
The halogenated methylstyrene is preferably added in an amount of 1 equivalent or more, preferably 1.2 equivalents or more, more preferably 1.5 equivalents or more with respect to the alcohol of the arylamine compound alcohol. It is 8 to 2.0 equivalents, preferably 1.0 to 1.5 equivalents.
Solvents include aprotic polar solvents such as N-methylpyrrolidone, dimethyl sulfoxide, N, N-dimethylformamide, ketone solvents such as acetone and methyl ethyl ketone, ether solvents such as diethyl ether and tetrahydrofuran, toluene, chlorobenzene, 1 -Aromatic solvents such as chloronaphthalene are effective, and they are used in the range of 1 to 100 parts by mass, preferably 2 to 50 parts by mass with respect to 1 part by mass of the arylamine compound alcohol. It is good.
The reaction temperature is not particularly limited. After completion of the reaction, the reaction solution is poured into water, extracted with a solvent such as toluene, hexane, or ethyl acetate, washed with water, and further purified using an adsorbent such as activated carbon, silica gel, porous alumina, or activated clay if necessary. May be.

Specific reactive charge transport materials (especially reactive compounds represented by the general formula (II)) are prepared by, for example, the following general charge transport material synthesis methods (formylation, esterification, etherification, hydrogenation). Used to synthesize.
Formylation: A reaction suitable for introducing a formyl group into an aromatic compound, heterocyclic compound, or alkene having an electron-donating group. In general, DMF and phosphorus oxytrichloride are used, and the reaction temperature is often from room temperature (for example, 25 ° C.) to about 100 ° C.
Esterification: A condensation reaction between an organic acid and a compound containing a hydroxyl group such as alcohol or phenol. It is preferable to use a method of biasing the equilibrium toward the ester side by coexisting a dehydrating agent or removing water out of the system.
Etherification: A Williamson synthesis method in which an alkoxide and an organic halogen compound are condensed is common.
-Hydrogenation: A method in which hydrogen is reacted with an unsaturated bond using various catalysts.

  The content of the specific reactive charge transport material (content in the composition) is preferably 60% by mass or more and 95% by mass or less, and preferably 65% by mass with respect to the mass of the protective layer 5 (outermost surface layer). It is at least 93% by mass.

-Non-reactive charge transport material-
The film constituting the protective layer (outermost surface layer) may be used in combination with a non-reactive charge transport material. Since non-reactive charge transport materials do not have reactive groups that are not responsible for charge transport, when non-reactive charge transport materials are used for the protective layer (outermost surface layer), the concentration of the charge transport component is low. It is effective for further improving the electrical characteristics. Further, a non-reactive charge transport material may be added to reduce the crosslink density and adjust the strength.

The non-reactive charge transport material is a compound having a charge transport skeleton in the same molecule and having no reactive group.
As the non-reactive charge transport material, a known charge transport material may be used. Specifically, a compound having a quinone skeleton such as p-benzoquinone, chloranil, bromanyl, anthraquinone, etc .; having a tetracyanoquinodimethane skeleton Compounds: Compounds having a fluorenone skeleton such as 2,4,7-trinitrofluorenone; compounds having a xanthone skeleton, compounds having a benzophenone skeleton; compounds having a cyanovinyl skeleton, compounds having an ethylene skeleton, and the like It is done. Non-reactive charge transport materials include compounds having a triarylamine skeleton, compounds having a benzidine skeleton, compounds having an arylalkane skeleton, compounds having an aryl-substituted ethylene skeleton, compounds having a stilbene skeleton, compounds having an anthracene skeleton, Also included are hole transporting compounds such as compounds having a hydrazone skeleton.
These non-reactive charge transport materials may be used alone or in combination of two or more, but are not limited thereto.

  These non-reactive charge materials preferably have an aromatic ring. Thereby, the electrical characteristics and mechanical strength of the protective layer (outermost surface layer) are likely to increase.

  Among these, from the viewpoint of electrical characteristics and mechanical strength of the protective layer (outermost surface layer), the triarylamine derivative represented by the structural formula (a-1) and the benzidine represented by the structural formula (a-2) Derivatives are preferred.

  The non-reactive charge transport material is preferably used in an amount of 0% by mass to 30% by mass, more preferably 1% by mass to 25% by mass with respect to the total solid content in the coating liquid for layer formation. More preferably, it is 5 mass% or more and 25 mass% or less.

-Compound having an unsaturated bond-
The film constituting the protective layer (outermost surface layer) may be used in combination with a compound having an unsaturated bond (unsaturated double bond).
The compound having an unsaturated bond may be any of a monomer, an oligomer and a polymer, and may have a charge transporting skeleton.

Examples of the compound having an unsaturated bond include those having no charge transporting skeleton as follows.
Monofunctional monomers include, for example, isobutyl acrylate, t-butyl acrylate, isooctyl acrylate, lauryl acrylate, stearyl acrylate, isobornyl acrylate, cyclohexyl acrylate, 2-methoxyethyl acrylate, methoxytriethylene glycol acrylate, 2-ethoxyethyl Acrylate, tetrahydrofurfuryl acrylate, benzyl acrylate, ethyl carbitol acrylate, phenoxyethyl acrylate, 2-hydroxy acrylate, 2-hydroxypropyl acrylate, 4-hydroxybutyl acrylate, methoxy polyethylene glycol acrylate, methoxy polyethylene glycol methacrylate, phenoxy polyethylene glycol acrylate The Roh carboxymethyl polyethylene glycol methacrylate, hydroxyethyl o- phenylphenol acrylate, o- phenylphenol glycidyl ether acrylate, styrene, and the like.

Examples of the bifunctional monomer include diethylene glycol di (meth) acrylate, polyethylene glycol di (meth) acrylate, polypropylene glycol di (meth) acrylate, neopentyl glycol di (meth) acrylate, and 1,6-hexanediol di (meth). Examples thereof include acrylate, divinylbenzene, diallyl phthalate and the like.
Examples of the trifunctional monomer include trimethylolpropane tri (meth) acrylate, pentaerythritol tri (meth) acrylate, aliphatic tri (meth) acrylate, trivinylcyclohexane, and the like.
Examples of the tetrafunctional monomer include pentaerythritol tetra (meth) acrylate, ditrimethylolpropane tetra (meth) acrylate, and aliphatic tetra (meth) acrylate.
Examples of the pentafunctional or higher monomer include dipentaerythritol penta (meth) acrylate, dipentaerythritol hexa (meth) acrylate, and the like, as well as (meth) acrylate having a polyester skeleton, a urethane skeleton, and a phosphazene skeleton.

  Examples of the reactive polymer include JP-A-5-216249, JP-A-5-323630, JP-A-11-52603, JP-A-2000-264961, and JP-A-2005-2291. And the like.

  When using a compound having an unsaturated bond that does not have a charge transporting skeleton, it is used alone or as a mixture of two or more. If a compound having an unsaturated bond having no charge transporting skeleton is used for forming the outermost surface layer of the electrophotographic photosensitive member, the composition used for forming the protective layer 5 (outermost surface layer) It is preferably used in an amount of 60% by mass or less, more preferably 55% by mass or less, and further preferably 50% by mass or less, based on the total solid content of the product.

On the other hand, examples of the compound having an unsaturated bond include those having a charge transporting skeleton.
・ Chain polymerizable functional group (chain polymerizable functional group excluding styryl group) and compound having charge transporting skeleton in the same molecule Chain polymerization property in compound having chain polymerizable functional group and charge transporting skeleton in the same molecule The functional group is not particularly limited as long as it is a functional group capable of radical polymerization, and is, for example, a functional group having a group containing at least a carbon double bond. Specific examples include groups containing at least one selected from the group consisting of vinyl groups, vinyl ether groups, vinyl thioether groups, styryl groups, acryloyl groups, methacryloyl groups, and derivatives thereof. Among them, since the reactivity is excellent, the chain polymerizable functional group is a group containing at least one selected from the group consisting of vinyl group, styryl group, acryloyl group, methacryloyl group, and derivatives thereof. It is preferable that
Further, the charge transporting skeleton in the compound having a chain polymerizable functional group and a charge transporting skeleton in the same molecule is not particularly limited as long as it is a known structure in an electrophotographic photosensitive member. For example, triarylamine Examples thereof include a skeleton derived from a nitrogen-containing hole transporting compound such as a benzene compound, a benzidine compound, or a hydrazone compound, and a structure conjugated with a nitrogen atom. Among these, a triarylamine skeleton is preferable.

  The compound having a chain polymerizable functional group and a charge transporting skeleton in the same molecule may be a polymer described in paragraphs 0132 to 0155 of JP2012-159521A.

-Other additives-
The film constituting the protective layer (outermost surface layer) is further mixed with other coupling agents, especially fluorine-containing coupling agents, for the purpose of adjusting the film formability, flexibility, lubricity, and adhesion. May be used. As this compound, various silane coupling agents and commercially available silicone hard coat agents are used. Further, a silicon-containing compound or a fluorine-containing compound having a radical polymerizable group may be used.

As silane coupling agents, vinyltrichlorosilane, vinyltrimethoxysilane, vinyltriethoxysilane, 3-glycidoxypropylmethyldiethoxysilane, 3-glycidoxypropyltriethoxysilane, 3-glycidoxypropyltrimethoxy Silane, 3-aminopropyltriethoxysilane, 3-aminopropyltrimethoxysilane, 3-aminopropylmethyldimethoxysilane, N-2 (aminoethyl) -3-aminopropyltriethoxysilane, tetramethoxysilane, methyltrimethoxysilane , Dimethyldimethoxysilane, and the like.
As commercially available hard coat agents, KP-85, X-40-9740, X-8239 (above, manufactured by Shin-Etsu Chemical Co., Ltd.), AY42-440, AY42-441, AY49-208 (above, made by Toray Dow Corning) ) And the like.

  In order to impart water repellency and the like, (tridecafluoro-1,1,2,2-tetrahydrooctyl) triethoxysilane, (3,3,3-trifluoropropyl) trimethoxysilane, 3- (hepta) Fluoroisopropoxy) propyltriethoxysilane, 1H, 1H, 2H, 2H-perfluoroalkyltriethoxysilane, 1H, 1H, 2H, 2H-perfluorodecyltriethoxysilane, 1H, 1H, 2H, 2H-perfluorooctyl Fluorine-containing compounds such as triethoxysilane may be added.

Although the silane coupling agent is used in the target amount, the amount of the fluorine-containing compound should be 0.25 times or less by mass with respect to the compound containing no fluorine from the viewpoint of the film formability of the crosslinked film. Is preferred. Furthermore, you may mix the reactive fluorine compound etc. which are disclosed by Unexamined-Japanese-Patent No. 2001-166510 etc.
Examples of the silicon-containing compound and fluorine-containing compound having a radical polymerizable group include compounds described in JP-A No. 2007-11005.

It is preferable to add a deterioration inhibitor to the film constituting the protective layer (outermost surface layer). As the degradation inhibitor, hindered phenols or hindered amines are preferable, organic sulfur antioxidants, phosphite antioxidants, dithiocarbamate antioxidants, thiourea antioxidants, benzimidazole antioxidants. , Etc., may be used.
The addition amount of the deterioration inhibitor is preferably 20% by mass or less, and more preferably 10% by mass or less.

Examples of the hindered phenol antioxidant include Irganox 1076, Irganox 1010, Irganox 1098, Irganox 245, Irganox 1330, Irganox 3114, Irganox 1076 (manufactured by Ciba Japan), 3, 5 -Di-t-butyl-4-hydroxybiphenyl and the like.
Examples of the hindered amine antioxidant include Sanol LS2626, Sanol LS765, Sanol LS770, Sanol LS744 (Sanyo Lifetech Co., Ltd.), Tinuvin 144, Tinuvin 622LD (Manufactured by Ciba Japan), Mark LA57, Mark LA67, Mark LA62, Mark LA68, Mark LA63 (manufactured by Adeka Co., Ltd.), and thioethers include Sumilizer TPS and Sumitizer TP-D (manufactured by Sumitomo Chemical Co., Ltd.). Mark PEP-8, Mark PEP-24G, Mark PEP-36, Mark 329K, Mark HP-10 (manufactured by Adeka) and the like.

Fluorine-containing resin particles may be added to the film constituting the protective layer (outermost surface layer). Examples of the fluorine-containing resin particles include tetrafluoroethylene resin, trifluorinated ethylene resin, hexafluoropropylene resin, vinyl fluoride resin, vinylidene fluoride resin, difluorodiethylene chloride resin, and copolymers thereof. It is preferably at least one selected from the group consisting of Of these fluorine-containing resin particles, ethylene tetrafluoride resin and vinylidene fluoride resin are particularly preferable.
Various dispersing agents for dispersing the resin particles in the coating solution may be used in combination.

The average primary particle size of the fluorine-containing resin particles is preferably 0.05 μm or more and 1 μm or less, and more preferably 0.1 μm or more and 0.5 μm or less.
The average particle diameter of the fluorine-containing resin particles refers to a value measured using a laser diffraction particle size distribution analyzer LA-700 (manufactured by Horiba, Ltd.).

  The content of the fluorine-containing resin particles is preferably 0.1% by mass or more and 40% by mass or less, and more preferably 1% by mass or more and 30% by mass or less with respect to the mass of the protective layer (outermost surface layer). preferable.

In addition to the fluorine-containing resin particles, conductive particles, organic particles, and inorganic particles may be added to the film constituting the protective layer (outermost surface layer).
An example of such particles is silicon-containing particles. The silicon-containing particles are particles containing silicon as a constituent element, and specific examples include colloidal silica and silicone particles. The colloidal silica used as the silicon-containing particles is preferably silica having an average particle diameter of 1 nm to 100 nm, more preferably 10 nm to 30 nm, in an acidic or alkaline aqueous dispersion, or an organic solvent such as alcohol, ketone, or ester. It is selected from those dispersed in. As the particles, commercially available particles may be used.

  The solid content of colloidal silica in the protective layer (outermost surface layer) is not particularly limited, but is preferably 0.1% by mass or more and 50% by mass or less, preferably based on the total solid content of the protective layer. Is used in the range of 0.1 mass% to 30 mass%.

The silicone particles used as the silicon-containing particles may be selected from silicone resin particles, silicone rubber particles, and silicone surface-treated silica particles, and commercially available particles may be used.
These silicone particles are spherical, and the average particle diameter is preferably 1 nm to 500 nm, more preferably 10 nm to 100 nm.
The content of the silicone particles in the surface layer is preferably 0.1% by mass or more and 30% by mass or less, more preferably 0.5% by mass or more and 10% by mass, based on the total solid content of the protective layer (outermost surface layer). It is below mass%.

Other particles include particles composed of a resin obtained by copolymerizing a fluororesin and a monomer having a hydroxyl group, ZnO—Al ₂ O ₃ , SnO ₂ —Sb ₂ O ₃ , In ₂ O ₃ —SnO ₂ , Examples thereof include semiconductive metal oxides such as ZnO ₂ —TiO ₂ , ZnO—TiO ₂ , MgO—Al ₂ O ₃ , FeO—TiO ₂ , TiO ₂ , SnO ₂ , In ₂ O ₃ , ZnO, and MgO. Furthermore, various known dispersing materials may be used to disperse the particles.

Oil such as silicone oil may be added to the film constituting the protective layer (outermost surface layer).
Silicone oils include silicone oils such as dimethylpolysiloxane, diphenylpolysiloxane, and phenylmethylsiloxane; amino-modified polysiloxane, epoxy-modified polysiloxane, carboxyl-modified polysiloxane, carbinol-modified polysiloxane, methacryl-modified polysiloxane, mercapto-modified poly Reactive silicone oils such as siloxane and phenol-modified polysiloxane; cyclic dimethylcyclosiloxanes such as hexamethylcyclotrisiloxane, octamethylcyclotetrasiloxane, decamethylcyclopentasiloxane and dodecamethylcyclohexasiloxane; 1,3,5- Trimethyl-1.3.5-triphenylcyclotrisiloxane, 1,3,5,7-tetramethyl-1,3,5,7-tetraphenylcyclo Cyclic methylphenylcyclosiloxanes such as trasiloxane, 1,3,5,7,9-pentamethyl-1,3,5,7,9-pentaphenylcyclopentasiloxane; cyclic phenylcyclosiloxanes such as hexaphenylcyclotrisiloxane Fluorine-containing cyclosiloxanes such as 3- (3,3,3-trifluoropropyl) methylcyclotrisiloxane; Hydrosilyl group-containing cyclosiloxanes such as methylhydrosiloxane mixture, pentamethylcyclopentasiloxane, and phenylhydrocyclosiloxane And vinyl group-containing cyclosiloxanes such as pentavinylpentamethylcyclopentasiloxane.

Metal, metal oxide, carbon black, or the like may be added to the film constituting the protective layer (outermost surface layer). Examples of the metal include aluminum, zinc, copper, chromium, nickel, silver, and stainless steel, or those obtained by depositing these metals on the surface of resin particles. Examples of the metal oxide include zinc oxide, titanium oxide, tin oxide, antimony oxide, indium oxide, bismuth oxide, tin-doped indium oxide, antimony and tantalum-doped tin oxide, and antimony-doped zirconium oxide. .
These are used alone or in combination of two or more. When two or more types are used in combination, they may be simply mixed or mixed by solid solution or fusion. The average particle size of the conductive particles is preferably 0.3 μm or less, particularly preferably 0.1 μm or less.

-Composition-
The composition used for forming the protective layer (outermost surface layer) is preferably prepared as a coating solution for forming a protective layer obtained by dissolving or dispersing each component in a solvent.
This coating solution for forming the protective layer may be solvent-free, and if necessary, aromatics such as toluene and xylene, ketones such as methyl ethyl ketone, methyl isobutyl ketone and cyclohexanone, ethyl acetate, butyl acetate and the like. It is prepared using a solvent such as an ester solvent, an ether solvent such as tetrahydrofuran or dioxane, a cellosolv solvent such as ethylene glycol monomethyl ether, or an alcohol solvent such as isopropyl alcohol or butanol.

  In addition, when a coating liquid is obtained by reacting the above-mentioned components, each component may be simply mixed and dissolved, but preferably room temperature (20 ° C.) to 100 ° C., more preferably 30 ° C. to 80 ° C. The heating is preferably performed for 10 minutes to 100 hours, more preferably 1 hour to 50 hours. In this case, it is also preferable to irradiate ultrasonic waves.

-Formation of protective layer-
The coating liquid for forming the protective layer is applied on the surface to be coated (charge transport layer in the embodiment shown in FIG. 1) by blade coating, wire bar coating, spray coating, dip coating, bead coating, air knife coating. The coating is performed by a usual method such as a coating method, a curtain coating method, and an ink jet coating method.
Thereafter, light, electron beam or heat is applied to the obtained coating film to cause radical polymerization, thereby polymerizing and curing the coating film.

  As the curing method, heat, light, radiation or the like is used. When performing polymerization and curing with heat and light, a polymerization initiator is not necessarily required, but a photocuring catalyst or a thermal polymerization initiator may be used. Known photocuring catalysts and thermal polymerization initiators are used as the photocuring catalyst and the thermal polymerization initiator. The radiation is preferably an electron beam.

-Electron beam curing When an electron beam is used, the acceleration voltage is preferably 300 KV or less, more preferably 150 KV or less. The dose is preferably in the range of 1 Mrad to 100 Mrad, more preferably in the range of 3 Mrad to 50 Mrad. When the acceleration voltage is 300 KV or less, damage caused by electron beam irradiation on the characteristics of the photoreceptor is suppressed. Further, when the dose is 1 Mrad or more, crosslinking is performed, and when the dose is 100 Mrad or less, deterioration of the photoreceptor is suppressed.

  Irradiation is performed under an inert gas atmosphere such as nitrogen or argon at an oxygen concentration of 10,000 ppm or less, preferably 500 ppm or less, and may be further heated to 50 ° C. or more and 150 ° C. or less during or after the irradiation.

-Photocuring As a light source, a high pressure mercury lamp, a low pressure mercury lamp, a metal halide lamp, etc. are used, A suitable wavelength may be selected using filters, such as a band pass filter. Irradiation time, the light intensity is selected freely, for example, the illuminance (365 nm) is 300 mW / cm ² or more, preferably 1000 mW / cm ² or less, for example, the case of irradiation with UV light of 600 mW / cm ^2, 5 seconds or more 360 What is necessary is just to irradiate for less than a second.

  Irradiation is performed in an inert gas atmosphere such as nitrogen or argon, preferably at an oxygen concentration of 10000 ppm or less, more preferably 500 ppm or less, and may be further heated to 50 ° C. or more and 150 ° C. or less during or after the irradiation.

Examples of the photocuring catalyst include intramolecular cleavage types such as benzyl ketal, alkylphenone, aminoalkylphenone, phosphine oxide, titanocene, and oxime.
More specifically, examples of the benzyl ketal system include 2,2-dimethoxy-1,2-diphenylethane-1-one.

Examples of the alkylphenone series include 1-hydroxy-cyclohexyl-phenyl-ketone, 2-hydroxy-2-methyl-1-phenyl-propan-1-one, 1- [4- (2-hydroxyethoxy) -phenyl]. 2-hydroxy-2-methyl-1-propan-1-one, 2-hydroxy-1- {4- [4- (2-hydroxy-2-methyl-propionyl) -benzyl] phenyl} -2-methyl- Examples include propan-1-one, acetophenone, and 2-phenyl-2- (p-toluenesulfonyloxy) acetophenone.
Examples of aminoalkylphenones include p-dimethylaminoacetophenone, p-dimethylaminopropiophenone, 2-methyl-1- (4-methylthiophenyl) -2-morpholinopropan-1-one, 2-benzyl-2- Dimethylamino-1- (4-morpholinophenyl) -butanone-1,2- (dimethylamino) -2-[(4-methylphenyl) methyl] -1- [4- (4-morpholinyl) phenyl] -1 -Butanone and the like.
Examples of the phosphinoxide include 2,4,6-trimethylbenzoyl-diphenyl-phosphine oxide and bis (2,4,6-trimethylbenzoyl) -phenylphosphine oxide.
Examples of the titanocene include bis (η5-2,4-cyclopentadien-1-yl) -bis (2,6-difluoro-3- (1H-pyrrol-1-yl) -phenyl) titanium.
Examples of oxime compounds include 1,2-octanedione, 1- [4- (phenylthio)-, 2- (O-benzoyloxime)], ethanone, 1- [9-ethyl-6- (2-methylbenzoyl)- 9H-carbazol-3-yl]-, 1- (O-acetyloxime) and the like.

Examples of the hydrogen abstraction type include benzophenone series, thioxanthone series, benzyl series, and Michler ketone series.
More specifically, examples of the benzophenone series include 2-benzoylbenzoic acid, 2-chlorobenzophenone, 4,4′-dichlorobenzophenone, 4-benzoyl-4′-methyldiphenyl sulfide, p, p′-bisdiethylaminobenzophenone, and the like. Can be mentioned.
Examples of the thioxanthone series include 2,4-diethylthioxanthen-9-one, 2-chlorothioxanthone, and 2-isopropylthioxanthone.
Examples of the benzyl type include benzyl, (±) -camphorquinone, p-anisyl and the like.

  These photopolymerization initiators are used alone or in combination of two or more.

-Thermosetting Thermal polymerization initiators include thermal radical generators or derivatives thereof. Specifically, for example, V-30, V-40, V-59, V601, V65, V-70, VF- Azo initiators such as 096, VE-073, Vam-110, Vam-111 (manufactured by Wako Pure Chemical Industries, Ltd.), OTazo-15, OTazo-30, AIBN, AMBN, ADVN, ACVA (Otsuka Chemical); Perhexa HC, Perhexa C, Perhexa V, Perhexa 22, Perhexa MC, Perbutyl H, Parkmill H, Parkmill P, Permenta H, Perocta H, Perbutyl C, Perbutyl D, Perhexyl D, Parroyl IB, Parroyl 355, Parroyl L, Parroyl SA , Nyper BW, Nyper BMT-K40 / M, Parroyl IPP, Parro Il NPP, Parroyl TCP, Parroyl OPP, Parroyl SBP, Park Mill ND, Perocta ND, Perhexyl ND, Perbutyl ND, Perbutyl NHP, Perhexyl PV, Perbutyl PV, Perhexa 250, Perocta O, Perhexyl O, Perbutyl O, Perbutyl L, Perbutyl 355 Perhexyl I, perbutyl I, perbutyl E, perhexa 25Z, perbutyl A, perhexyl Z, perbutyl ZT, perbutyl Z (manufactured by NOF Chemical), Kayaketal AM-C55, Trigonox 36-C75, Laurox, Perkadox L-W75, Parkadox CH-50L, Trigonox TMBH, Kayacumen H, Kayabutyl H-70, Percadox BC-FF, Kaya Hexa AD, Parkadox 14, Kayabuchi C, Kayabutyl D, Kayahexa YD-E85, Parkadox 12-XL25, Parkadox 12-EB20, Trigonox 22-N70, Trigonox 22-70E, Trigonox D-T50, Trigonox 423-C70, Kayaester CND-C70, Kayaester CND-W50, Trigonox 23-C70, Trigonox 23-W50N, Trigonox 257-C70, Kaya ester P-70, Kaya ester TMPO-70, Trigonox 121, Kaya ester O, Kaya ester HTP-65W, Kaya ester AN, Trigonox 42 , Trigonox F-C50, Kaya Butyl B, Kaya Carbon EH-C70, Kaya Carbon EH-W60, Kaya Carbon I-20, Kaya Carbon BIC-75, Trigonok 117, Kayalen 6-70 (manufactured by Kayaku Akzo), Lupelox 610, Lupelox 188, Lupelox 844, Lupelox 259, Lupelox 10, Lupelox 701, Lupelox 11, Lupelox 26, Lupelox 80, Lupelox 7, Lupelox P, Lupelox P, Lupelox 546, Lupelox 554, Lupelox 575, Lupelox TANPO, Lupelox 555, Lupelox 570, Lupelox TAP, Lupelox TBIC, Lupelox TBEC, Lupelox JW, Lupelox TAIC, Lupelox DC, Lupelox DC, Lupelox DC , Lupelox 220, Lupelox 230, Lupelox 23 3, Lupelox 531 (manufactured by Arkema Yoshitomi) and the like.

  Among these, when an azo polymerization initiator having a molecular weight of 250 or more is used, the reaction proceeds without unevenness at a low temperature, so that formation of a high-strength film with suppressed unevenness can be achieved. More preferably, the molecular weight of the azo polymerization initiator is 250 or more, and more preferably 300 or more.

  The heating is performed under an inert gas atmosphere such as nitrogen or argon, and the oxygen concentration is preferably 1000 ppm or less, more preferably 500 ppm or less, preferably 50 ° C. or more and 170 ° C. or less, more preferably 70 ° C. or more and 150 ° C. or less. Preferably it is 10 minutes or more and 120 minutes or less, More preferably, 15 minutes or more and 100 minutes or less are heated.

  The total content of the photocuring catalyst or the thermal polymerization initiator is preferably 0.1% by mass or more and 10% by mass or less, more preferably 0.1% by mass or more, based on the total solid content in the solution for forming the layer. 8 mass% or less is more preferable, and the range of 0.1 mass% or more and 5 mass% or less is especially preferable.

In this embodiment, if the reaction proceeds too quickly, the structure of the coating film is difficult to be relaxed by crosslinking, and the generation of radicals is relatively slow because it tends to cause film unevenness and wrinkles. The curing method is adopted.
In particular, by combining a specific reactive charge transport material and curing by heat, the structure relaxation of the coating film can be promoted, and a high protective layer excellent in surface properties can be easily obtained.

  The structure of each layer in the function-separated type photosensitive layer has been described with reference to the electrophotographic photoreceptor shown in FIG. 1, but this structure is also applied to each layer in the function-separated type electrophotographic photoreceptor shown in FIG. Can be adopted. Further, in the case of the single-layer type photosensitive layer of the electrophotographic photosensitive member shown in FIG.

That is, the single-layer type photosensitive layer (charge generation / charge transport layer) includes a charge generation material, a charge transport material, and, if necessary, a binder resin and other known additives. Is good. These materials are the same as those described in the charge generation material and the charge transport layer.
In the single-layer type photosensitive layer, the content of the charge generating material is preferably 10% by mass or more and 85% by mass or less, and preferably 20% by mass or more and 50% by mass or less with respect to the total solid content. In the single-layer type photosensitive layer, the content of the charge transport material is preferably 5% by mass or more and 50% by mass or less based on the total solid content.
The method for forming the single-layer type photosensitive layer is the same as the method for forming the charge generation layer and the charge transport layer.
The film thickness of the single-layer type photosensitive layer is, for example, from 5 μm to 50 μm, and preferably from 10 μm to 40 μm.

In the electrophotographic photosensitive member according to the present embodiment, the mode in which the outermost surface layer is the protective layer has been described, but a layer configuration without the protective layer may be employed.
In the case of a layer structure without a protective layer, in the electrophotographic photoreceptor shown in FIG. 1, the charge transport layer located on the outermost surface in the layer structure becomes the outermost surface layer. And the electric charge transport layer used as the said outermost surface layer is comprised with the cured film of the said specific composition.
In the case of a layer structure without a protective layer, in the electrophotographic photoreceptor shown in FIG. 3, the single-layer type photosensitive layer located on the outermost surface in the layer structure is the outermost surface layer. And the single layer type photosensitive layer used as the said outermost surface layer is comprised with the cured film of the said specific composition. However, a charge generating material is blended in the composition.

[Image forming apparatus (and process cartridge)]
The image forming apparatus according to the present embodiment includes an electrophotographic photosensitive member, a charging unit that charges the surface of the electrophotographic photosensitive member, and an electrostatic latent image formation that forms an electrostatic latent image on the surface of the charged electrophotographic photosensitive member. Means, developing means for developing the electrostatic latent image formed on the surface of the electrophotographic photosensitive member with a developer containing toner to form a toner image, and transfer means for transferring the toner image to the surface of the recording medium; Is provided. The electrophotographic photosensitive member according to the present embodiment is applied as the electrophotographic photosensitive member.

  The image forming apparatus according to the present embodiment includes an apparatus having fixing means for fixing a toner image transferred to the surface of a recording medium; direct transfer for directly transferring the toner image formed on the surface of the electrophotographic photosensitive member to the recording medium Type apparatus; intermediate transfer in which the toner image formed on the surface of the electrophotographic photosensitive member is primarily transferred onto the surface of the intermediate transfer member, and the toner image transferred onto the surface of the intermediate transfer member is secondarily transferred onto the surface of the recording medium. Type apparatus; apparatus provided with cleaning means for cleaning the surface of the electrophotographic photosensitive member after the toner image is transferred and before charging; after the toner image is transferred, the surface of the image carrier is irradiated with a charge-removing light before charging. A known image forming apparatus, such as an apparatus provided with a static elimination means for removing electricity; an apparatus provided with an electrophotographic photosensitive member heating member for increasing the temperature of the electrophotographic photosensitive member and reducing the relative temperature is applied.

  In the case of an intermediate transfer type apparatus, the transfer means includes, for example, an intermediate transfer body on which a toner image is transferred onto the surface, and a primary transfer that primarily transfers the toner image formed on the surface of the image holding body onto the surface of the intermediate transfer body. And a secondary transfer unit that secondarily transfers the toner image transferred onto the surface of the intermediate transfer member onto the surface of the recording medium.

  The image forming apparatus according to the present embodiment may be either a dry developing type image forming apparatus or a wet developing type (developing type using a liquid developer).

  Note that in the image forming apparatus according to the present embodiment, for example, the portion including the electrophotographic photosensitive member may have a cartridge structure (process cartridge) that is detachable from the image forming apparatus. As the process cartridge, for example, a process cartridge including the electrophotographic photosensitive member according to this embodiment is preferably used. In addition to the electrophotographic photosensitive member, the process cartridge may include at least one selected from the group consisting of a charging unit, an electrostatic latent image forming unit, a developing unit, and a transfer unit.

  Hereinafter, an example of the image forming apparatus according to the present embodiment will be described, but the present invention is not limited thereto. The main parts shown in the figure will be described, and the description of the other parts will be omitted.

FIG. 4 is a schematic configuration diagram illustrating an example of an image forming apparatus according to the present embodiment.
As shown in FIG. 4, the image forming apparatus 100 according to the present embodiment includes a process cartridge 300 including an electrophotographic photosensitive member 7, an exposure device 9 (an example of an electrostatic latent image forming unit), and a transfer device 40 (primary. Transfer device) and an intermediate transfer member 50. In the image forming apparatus 100, the exposure device 9 is disposed at a position where the electrophotographic photosensitive member 7 can be exposed from the opening of the process cartridge 300, and the transfer device 40 is interposed between the electrophotographic photosensitive member via the intermediate transfer member 50. 7, and a part of the intermediate transfer member 50 is disposed in contact with the electrophotographic photosensitive member 7. Although not shown, it also has a secondary transfer device that transfers the toner image transferred to the intermediate transfer member 50 to a recording medium (for example, paper). The intermediate transfer member 50, the transfer device 40 (primary transfer device), and the secondary transfer device (not shown) correspond to an example of a transfer unit.

  In the process cartridge 300 in FIG. 4, an electrophotographic photosensitive member 7, a charging device 8 (an example of a charging unit), a developing device 11 (an example of a developing unit), and a cleaning device 13 (an example of a cleaning unit) are integrated in a housing. I support it. The cleaning device 13 includes a cleaning blade (an example of a cleaning member) 131, and the cleaning blade 131 is disposed so as to contact the surface of the electrophotographic photosensitive member 7. The cleaning member may be a conductive or insulating fibrous member instead of the cleaning blade 131, and may be used alone or in combination with the cleaning blade 131.

  In FIG. 4, as an image forming apparatus, a fibrous member 132 (roll shape) for supplying the lubricant 14 to the surface of the electrophotographic photosensitive member 7 and a fibrous member 133 (flat brush shape) for assisting cleaning are shown. Examples are provided, but these are arranged as necessary.

  Hereinafter, each configuration of the image forming apparatus according to the present embodiment will be described.

-Charging device-
As the charging device 8, for example, a contact type charger using a conductive or semiconductive charging roller, a charging brush, a charging film, a charging rubber blade, a charging tube or the like is used. Further, a non-contact type roller charger, a known charger such as a scorotron charger using a corona discharge or a corotron charger may be used.

-Exposure device-
Examples of the exposure device 9 include optical system devices that expose the surface of the electrophotographic photoreceptor 7 with light such as semiconductor laser light, LED light, and liquid crystal shutter light in a predetermined image-like manner. The wavelength of the light source is set within the spectral sensitivity region of the electrophotographic photosensitive member. As the wavelength of the semiconductor laser, near infrared having an oscillation wavelength near 780 nm is the mainstream. However, the present invention is not limited to this wavelength, and an oscillation wavelength laser in the 600 nm range or a laser having an oscillation wavelength of 400 nm to 450 nm as a blue laser may be used. In addition, a surface-emitting type laser light source that can output a multi-beam is also effective for color image formation.

-Development device-
Examples of the developing device 11 include a general developing device that performs development by bringing a developer into contact or non-contact with the developer. The developing device 11 is not particularly limited as long as it has the functions described above, and is selected according to the purpose. For example, a known developing device having a function of attaching a one-component developer or a two-component developer to the electrophotographic photosensitive member 7 using a brush, a roller, or the like can be used. Among these, those using a developing roller holding the developer on the surface are preferable.

  The developer used in the developing device 11 may be a one-component developer including a toner alone or a two-component developer including a toner and a carrier. Further, the developer may be magnetic or non-magnetic. A well-known thing is applied for these developers.

-Cleaning device-
As the cleaning device 13, a cleaning blade type device including a cleaning blade 131 is used.
In addition to the cleaning blade method, a fur brush cleaning method and a simultaneous development cleaning method may be employed.

-Transfer device-
As the transfer device 40, for example, a contact transfer charger using a belt, a roller, a film, a rubber blade, etc., or a known transfer charger such as a scorotron transfer charger using a corona discharge or a corotron transfer charger. Can be mentioned.

-Intermediate transfer member-
As the intermediate transfer member 50, a belt-like member (intermediate transfer belt) containing polyimide, polyamideimide, polycarbonate, polyarylate, polyester, rubber or the like having semiconductivity is used. Further, as the form of the intermediate transfer member, a drum-like member may be used in addition to the belt-like member.

FIG. 5 is a schematic configuration diagram illustrating another example of the image forming apparatus according to the present embodiment.
An image forming apparatus 120 shown in FIG. 5 is a tandem multicolor image forming apparatus equipped with four process cartridges 300. In the image forming apparatus 120, four process cartridges 300 are arranged in parallel on the intermediate transfer member 50, and one electrophotographic photosensitive member is used for one color. The image forming apparatus 120 has the same configuration as that of the image forming apparatus 100 except that it is a tandem system.

  EXAMPLES Hereinafter, the present invention will be described more specifically with reference to examples, but the present invention is not limited thereto. “Part” and “%” are based on mass unless otherwise specified.

[Example 1]
(Formation of undercoat layer)
Zinc oxide: (average particle diameter 70 nm: manufactured by Teica Co., Ltd .: specific surface area value 15 m 2 / g) 100 parts by mass is stirred and mixed with 500 parts by mass of tetrahydrofuran, and silane coupling agent (KBM503: manufactured by Shin-Etsu Chemical Co., Ltd.) 1.3 parts Part was added and stirred for 2 hours. Tetrahydrofuran was then distilled off under reduced pressure and baked at 120 ° C. for 3 hours to obtain zinc oxide surface-treated with a silane coupling agent.
110 parts by mass of surface-treated zinc oxide was stirred and mixed with 500 parts by mass of tetrahydrofuran, a solution prepared by dissolving 1.0 part by mass of purpurin derivative in 50 parts by mass of tetrahydrofuran was added, and the mixture was stirred at 50 ° C. for 5 hours. did. Then, the zinc oxide to which the purpurine derivative was imparted by filtration under reduced pressure was filtered off, and further dried under reduced pressure at 60 ° C. to obtain the purpurin derivative-provided zinc oxide.
60 parts by mass of purpurin derivative-provided zinc oxide, 13.5 parts by mass of a curing agent (blocked isocyanate, Sumijoule 3175, manufactured by Sumitomo Bayern Urethane Co., Ltd.) and 15 parts by mass of butyral resin (ESLEC BM-1, manufactured by Sekisui Chemical Co., Ltd.) 38 parts by mass of the solution dissolved in 85 parts by mass and 25 parts by mass of methyl ethyl ketone were mixed, and dispersed for 2 hours with a sand mill using 1 mmφ glass beads to obtain a dispersion.
As a catalyst, 0.005 part by mass of dioctyltin dilaurate and 45 parts by mass of silicone resin particles (Tospearl 145, manufactured by GE Toshiba Silicone) were added to the resulting dispersion to obtain an undercoat layer coating solution. This coating solution was applied on an aluminum substrate having a diameter of 30 mm, a length of 340 mm, and a thickness of 1 mm by a dip coating method, followed by drying and curing at 170 ° C. for 40 minutes to form an undercoat layer having a thickness of 18 μm. . The surface roughness Ra of the undercoat layer was about 0.3 μm.

(Formation of charge generation layer)
Bragg angles (2θ ± 0.2 °) of X-ray diffraction spectrum using Cukα characteristic X-ray as a charge generating material are at least 7.3 °, 16.0 °, 24.9 °, 28.0 ° A mixture comprising 15 parts by mass of hydroxygallium phthalocyanine having a diffraction peak, 10 parts by mass of vinyl chloride-vinyl acetate copolymer resin (VMCH, manufactured by Nihon Unicar) as a binder resin, and 200 parts by mass of n-butyl acetate, The glass beads having a diameter of 1 mmφ were dispersed for 4 hours by a sand mill. To the obtained dispersion, 175 parts by mass of n-butyl acetate and 180 parts by mass of methyl ethyl ketone were added and stirred to obtain a coating solution for a charge generation layer. This charge generation layer coating solution was dip-coated on the undercoat layer and dried at 100 ° C. for 5 minutes to form a charge generation layer having a thickness of 0.2 μm.

(Formation of charge transport layer)
N, N′-diphenyl-N, N′-bis (3-methylphenyl)-[1,1 ′] biphenyl-4,4′-diamine (TPD) 40 parts by mass, N, N-bis (3,4 -10 parts by mass of (dimethylphenyl) biphenyl-4-amine and PCZ / BP [polycarbonate resin (viscosity average molecular weight 50,000) made of a PCZ / BP copolymer having a molar ratio of 75/25 represented by the following structural formula]] 55 A mass part was added to and dissolved in a mixed solvent of 600 parts by mass of tetrahydrofuran and 200 parts by mass of toluene to obtain a coating solution for a charge transport layer. This coating solution was applied onto the charge generation layer and dried at 130 ° C. for 45 minutes to form a charge transport layer having a thickness of 22 μm.

(Formation of protective layer)
Illustrative compound (Ic) -121: 12 parts by mass as a reactive charge transport material, and OTazo-15 (Otsuka Chemical, molecular weight 354.4): 0.5 part by mass as a polymerization initiator, isopropyl acetate as a solvent : 29.5 parts by mass and tetrahydrofuran: dissolved in a mixed solvent of 0.5 parts by mass to obtain a coating solution for forming a protective layer.
Thereafter, the coating liquid for forming the protective layer was applied onto the charge transport layer by push-up coating. After air drying at room temperature (20 ° C.) for 30 minutes, the temperature is raised from room temperature (20 ° C.) to 160 ° C. at a rate of 10 ° C./min in a nitrogen atmosphere with an oxygen concentration of 100 ppm, and heat treatment is performed at 160 ° C. for 45 minutes. And a protective layer having a thickness of 15 μm was formed.

  Through the above steps, an electrophotographic photosensitive member was obtained.

[Examples 2 to 40, Comparative Examples 1 to 14]
According to Tables 1 to 3, the composition of the coating liquid for forming the protective layer, the curing conditions of the coating film when forming the protective layer, the film thickness of the protective layer (OCL), and the film thickness of the charge transport layer (CTL) were changed. Except for this, an electrophotographic photosensitive member was obtained in the same manner as in Example 1. However, in Comparative Examples 13 and 14, an electrophotographic photosensitive member was obtained by forming a protective layer directly on the charge generation layer without forming a charge transport layer. In Tables 1 to 3, “-” indicates that the corresponding component is not blended.

[Evaluation]
The electrophotographic photoreceptor obtained in each example was subjected to the following measurements and evaluations. The results of measurement and evaluation are shown in Tables 4-5.

(Thermal stimulation current measurement)
For the electrophotographic photoreceptor obtained in each example, a thermally stimulated current spectrum of the protective layer (outermost surface layer) was obtained by the method described above, and peak temperature (expressed as “TSC peak temperature” in Tables 4 to 5). Was detected.

(Image quality evaluation)
Evaluation was performed in the following order.
(1) Evaluation of initial image quality The electrophotographic photoreceptor obtained in each example was mounted on a 700 Digital Color Press manufactured by Fuji Xerox Co., Ltd., and an image pattern shown in FIG. 6 was printed (output) in an environment of 10 ° C. and 15% RH. And the gradation of the target image density of 0% to 20% and 80% to 100% was evaluated.
(2) Print test The electrophotographic photosensitive member obtained in each example was mounted on 700 Digital Color Press manufactured by Fuji Xerox Co., Ltd., and 50,000 sheets of 10% halftone print test were performed in an environment of 10 ° C. and 15% RH. went. The total film thickness before and after the print test was measured to determine the wear rate (amount of wear per 1000 revolutions (nm / kcyc)).
(3) Image evaluation after print test After performing the print test, the image pattern shown in FIG. 6 is printed (output) in an environment of 10 ° C. and 15% RH by being mounted on 700 Digital Color Press manufactured by Fuji Xerox Co., Ltd. The gradation of the target image density range of 0% to 20% and 80% to 100% was evaluated.

The evaluation criteria for gradation are as follows.
A: The difference between the target image density and the printed actual image density is 3% or less. B: The difference between the target image density and the printed actual image density is greater than 3% and less than 5%. C: The target image density is printed. The actual image density difference is greater than 5%. Note that the image density was measured using X-Rite 404 manufactured by X-Rite.

From the above results, it can be seen that the image quality evaluation of the tonality before and after the blind test is better in this example than in the comparative example. Thereby, it turns out that the deterioration of the electrical property of the electrophotographic photosensitive member is suppressed in this example as compared with the comparative example.
Further, in this example, it is understood that the wear amount is low and the mechanical strength of the protective layer (outermost surface layer) is also high.

  Hereinafter, it shows about the material used by each example, and the detail of each abbreviation shown in a table | surface.

(Reactive charge transport material)
(Ic) -121: Exemplified compound (Ic) -121
(Ib) -32: Exemplified compound (Ib) -32
(Ib) -33: Exemplified compound (Ib) -33
(Ic) -88: Exemplified compound (Ic) -88
(Ib) -29: Exemplified compound (Ib) -29
(II) -183: Exemplified compound (II) -183
(II) -59: Exemplified compound (II) -59
(II) -54: Exemplified compound (II) -54
(Ic) -103: Exemplified compound (Ic) -103
(Id) -24: Exemplary Compound (Id) -24
(Id) -30: Exemplified compound (Id) -30
(II) -84: Exemplified compound (II) -84
(II) -88: Exemplified compound (II) -88
(II) -62: Exemplified compound (II) -62
(II) -76: Exemplified compound (II) -76
Compound (A): Charge transport material represented by the following structural formula Compound (B): Charge transport material represented by the following structural formula

(Non-reactive charge transport material)
CTM1: Charge generation material represented by the following structural formula CTM-1 CTM2: Charge generation material represented by the following structural formula CTM-2

(Compound having an unsaturated bond)
ATMPT: Trimethylolpropane triacrylate “A-TMPT (manufactured by Shin-Nakamura Chemical Co., Ltd.)”

(Polymerization initiator)
OTazo15: thermal polymerization initiator “OTazo-15 (manufactured by Otsuka Chemical Co., Ltd., molecular weight 354.4)”

(solvent)
・ AcOiBu: Isobutyl acetate ・ TFT: Tetrahydrofuran

DESCRIPTION OF SYMBOLS 1 ... Undercoat layer, 2 ... Charge generation layer, 3 ... Charge transport layer, 4 ... Conductive substrate, 5 ... Protective layer, 6 ... Single layer type photosensitive layer, 7A, 7B, 7C, 7 ... Electrophotographic photoreceptor, DESCRIPTION OF SYMBOLS 8 ... Charging device, 9 ... Exposure device, 11 ... Developing device, 13 ... Cleaning device, 14 ... Lubricant, 40 ... Transfer device, 50 ... Intermediate transfer member, 100 ... Image forming device, 120 ... Image forming device, 300 ... Process cartridge

Claims (7)

A conductive substrate, and a photosensitive layer provided on the conductive substrate,
The outermost surface layer is composed of a cured film of a composition containing a reactive charge transport material that is at least one selected from the group consisting of reactive compounds represented by the following general formulas (I) and (II) ,
The thickness of the outermost surface layer is 7 μm or more and 30 μm or less,
An electrophotographic photoreceptor in which a peak of the thermally stimulated current spectrum of the outermost surface layer obtained by thermally stimulated current measurement is present at 27 ° C. or lower.


[In general formula (I), F represents a charge transporting skeleton. L represents a divalent linking group containing two or more selected from the group consisting of an alkylene group, an alkenylene group, -C (= O)-, -N (R)-, -S-, and -O-. Show. R represents a hydrogen atom, an alkyl group, an aryl group, or an aralkyl group. m represents an integer of 1 or more and 8 or less. ]


[In General Formula (II), F represents a charge transporting skeleton. L ′ represents a trivalent or tetravalent group derived from an alkane or alkene, and an alkylene group, alkenylene group, —C (═O) —, —N (R) —, —S—, and —O—. (N + 1) -valent linking groups containing two or more selected from the group consisting of: R represents a hydrogen atom, an alkyl group, an aryl group, or an aralkyl group. m ′ represents an integer of 1 to 6. n represents an integer of 2 or more and 3 or less. ] The reactive compound represented by the general formula (I) is represented by the following general formula (Ia), the following general formula (Ib), the following general formula (Ic), or the following general formula (Id). The electrophotographic photosensitive member according to claim 1 , which is at least one reactive compound selected from the group consisting of reactive compounds represented by the formula:


[In the general formula (Ia), Ar ^{a1 to} Ar ^a4 each independently represent a substituted or unsubstituted aryl group. Ar ^a5 and Ar ^a6 each independently represent a substituted or unsubstituted arylene group. Xa represents a divalent linking group formed by combining groups selected from an alkylene group, —O—, —S—, and an ester group. Da represents a group represented by the following general formula (IA-a). ac1 to ac4 each independently represents an integer of 0 or more and 2 or less. However, the total number of Da is 1 or 2. ]


[In the general formula ^{(IA-a), L} a _{is, * - (CH 2) an} -O-CH 2 - is represented by the linking divalent linked to a group represented by ^Ar a1 ^{to Ar a4} at * Indicates a group. an represents an integer of 1 or 2. ]


[In the general formula (Ib), Ar ^{b1 to} Ar ^b4 each independently represents a substituted or unsubstituted aryl group. Ar ^b5 represents a substituted or unsubstituted aryl group or a substituted or unsubstituted arylene group. Db represents a group represented by the following general formula (IA-b). bc1 to bc5 each independently represent an integer of 0 or more and 2 or less. bk represents 0 or 1. However, the total number of Db is 1 or 2. ]


[In General Formula (IA-b), L ^b includes a group represented by * — (CH ₂ ) _bn —O—, and is a divalent linkage linked to a group represented by Ar ^{b1 to} Ar ^b5 at *. Indicates a group. bn represents an integer of 3 to 6. ]


[In the general formula (Ic), Ar ^{c1 to} Ar ^c4 each independently represent a substituted or unsubstituted aryl group. Ar ^c5 represents a substituted or unsubstituted aryl group or a substituted or unsubstituted arylene group. Dc represents a group represented by the following general formula (IA-c). cc1 to cc5 each independently represents an integer of 0 or more and 2 or less. ck represents 0 or 1. However, the total number of Dc is 1 or more and 8 or less. ]


[In the general formula (IA-c), ^{L C} is, -C (= O) -, - N (R) -, - S-, or -C (= O) - and -O -, - N (R )-Or -S- represents a divalent linking group containing one or more groups selected from the group consisting of groups. R represents a hydrogen atom, an alkyl group, an aryl group, or an aralkyl group. ]


[In the general formula (Id), Ar ^{d1 to} Ar ^d4 each independently represent a substituted or unsubstituted aryl group. Ar ^d5 represents a substituted or unsubstituted aryl group or a substituted or unsubstituted arylene group. Dd represents a group represented by the following general formula (IA-d). dc1 to dc5 each independently represents an integer of 0 or more and 2 or less. dk represents 0 or 1. However, the total number of Dd is 3 or more and 8 or less. ]


[In General Formula (IA-d), L ^d includes a group represented by * — (CH ₂ ) _dn —O—, and is a divalent linkage linked to a group represented by Ar ^{d1 to} Ar ^d5 at *. Indicates a group. dn represents an integer of 1 to 6. ] The compound represented by the general formula (II) is an electrophotographic photosensitive member according to claim 1 or claim 2 which is a compound represented by the following formula (II-a).


[In the general formula (II-a), Ar ^{k1 to} Ar ^k4 each independently represents a substituted or unsubstituted aryl group. Ar ^k5 represents a substituted or unsubstituted aryl group, or a substituted or unsubstituted arylene group. Dk represents a group represented by the following general formula (IIA-a). kc1 to kc5 each independently represents an integer of 0 or more and 2 or less. kk represents 0 or 1. However, the total number of Dk is 1 or more and 8 or less. ]


[In the general formula (IIA-a), L ^k represents a trivalent or tetravalent group derived from an alkane or alkene, an alkylene group, an alkenylene group, —C (═O) —, —N (R) A (kn + 1) -valent linking group containing two or more selected from the group consisting of-, -S-, and -O- is shown. R represents a hydrogen atom, an alkyl group, an aryl group, or an aralkyl group. kn represents an integer of 2 or more and 3 or less. ] Group linked to the charge transporting skeleton represented by F of the compound represented by the general formula (II) is, according to claim 1 is a group represented by the following general formula (IIA-a1) or (IIA-a2) Electrophotographic photoreceptor.


[In general formula (IIA-a1) or (IIA-a2), ^Xk1 represents a divalent linking group. kq1 represents an integer of 0 or 1. X ^k2 represents a divalent linking group. kq2 represents an integer of 0 or 1. ] Group linked to the charge transporting skeleton represented by F of the compound represented by the general formula (II) is, according to claim 1 is a group represented by the following general formula (IIA-a3) or (IIA-a4) Electrophotographic photoreceptor.


[In general formula (IIA-a3) or (IIA-a4), ^Xk3 represents a divalent linking group. kq3 represents an integer of 0 or 1. X ^k4 represents a divalent linking group. kq4 represents an integer of 0 or 1. ] The electrophotographic photoreceptor according to any one of claims 1 to 5 ,
A process cartridge that can be attached to and detached from an image forming apparatus. The electrophotographic photosensitive member according to any one of claims 1 to 5 ,
Charging means for charging the surface of the electrophotographic photosensitive member;
An electrostatic latent image forming means for forming an electrostatic latent image on the surface of the charged electrophotographic photosensitive member;
Developing means for developing the electrostatic latent image formed on the surface of the electrophotographic photosensitive member with a developer containing toner to form a toner image;
Transfer means for transferring the toner image to the surface of the recording medium;
An image forming apparatus comprising: