JP6240531B2 - Method for manufacturing piezoelectric vibrator - Google Patents

Method for manufacturing piezoelectric vibrator Download PDF

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JP6240531B2
JP6240531B2 JP2014033215A JP2014033215A JP6240531B2 JP 6240531 B2 JP6240531 B2 JP 6240531B2 JP 2014033215 A JP2014033215 A JP 2014033215A JP 2014033215 A JP2014033215 A JP 2014033215A JP 6240531 B2 JP6240531 B2 JP 6240531B2
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piezoelectric
piezoelectric vibrating
vibrator
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vibrating piece
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JP2015159437A (en
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隆雄 岡田
隆雄 岡田
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Citizen Watch Co Ltd
Citizen Fine Device Co Ltd
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Description

本発明は、携帯電話などの発振回路に用いられる圧電振動子の製造方法に関する。   The present invention relates to a method for manufacturing a piezoelectric vibrator used in an oscillation circuit such as a mobile phone.

圧電振動子は、水晶などの圧電材料からなり、発振周波数に応じて、矩形の厚みすべり水晶振動子や、複数の振動腕を備え屈曲振動する音叉型水晶振動子などが用いられている。図1は、音叉型水晶振動子の概略図である。音叉型水晶振動子1は、2つの振動腕2と音叉基部3とからなり、振動腕2の表裏面、及び側面には励振電極4が形成され、音叉基部3にはマウントパッド5が形成され、励振電極4に電圧を印加することで電界が発生し、屈曲振動をする。圧電振動子の電極パターンを形成する手法として、フォトリソグラフィを用いた手法が知られている。   Piezoelectric vibrators are made of a piezoelectric material such as quartz, and rectangular thickness-slip quartz vibrators or tuning-fork crystal vibrators that are flexibly vibrated with a plurality of vibrating arms are used according to the oscillation frequency. FIG. 1 is a schematic view of a tuning fork type crystal resonator. The tuning fork type crystal resonator 1 includes two vibrating arms 2 and a tuning fork base 3, excitation electrodes 4 are formed on the front and back surfaces and side surfaces of the vibrating arm 2, and a mount pad 5 is formed on the tuning fork base 3. By applying a voltage to the excitation electrode 4, an electric field is generated, causing bending vibration. As a technique for forming an electrode pattern of a piezoelectric vibrator, a technique using photolithography is known.

圧電材料からなるウエハに形成された圧電振動子は、連結部分を介して、ウエハのフレームと連結し、フレームには、圧電振動子の特性測定や周波数調整を行うための測定用パッドが形成されている。   A piezoelectric vibrator formed on a wafer made of a piezoelectric material is connected to a wafer frame via a connecting portion, and a measurement pad for measuring characteristics and adjusting a frequency of the piezoelectric vibrator is formed on the frame. ing.

水晶などの圧電材料をウエットエッチングする際、結晶面毎にエッチングレートが異なり異方性エッチングとなるため、振動腕の付け根部分に形成される叉部には傾斜面が生じ、特許文献1に記載されているように、叉部に対して照射光を垂直に照射する方向に近づくように光源を傾斜させて露光を行う手法が提案されている。   When wet etching a piezoelectric material such as quartz, the etching rate differs for each crystal plane and anisotropic etching is performed. Therefore, an inclined surface is formed at the fork formed at the base of the vibrating arm. As described above, there has been proposed a method in which exposure is performed by inclining a light source so as to approach a direction in which irradiation light is irradiated perpendicularly to the fork.

特開2006−339729公報JP 2006-339729 A

従来、ウエハ状態において圧電振動子の特性測定や周波数調整を行う場合には素子のマウントパッドを使用してプロービングを行なっていたが、素子の小型化が進むにつれてプローブピッチの狭小化、プローブ位置の高精度化が必要となり、マウントパッドでのプロービングが困難になってきている。そのため、小型圧電振動子ではパッドを大きくできる様にウエハのフレームに測定用パッドを形成することが必要であるが、フレーム側面の金属膜が正確にパターニングされないと、フレーム側面の金属膜を介して隣接素子と電極が導通することにより複数個同時発振させる場合に周波数干渉が起こり、正確な発振周波数が測定できないという問題が生じる。   Conventionally, when performing characteristic measurement and frequency adjustment of a piezoelectric vibrator in a wafer state, probing has been performed using an element mounting pad. However, as the element becomes smaller, the probe pitch becomes narrower and the probe position becomes smaller. High accuracy is required, and probing with mount pads is becoming difficult. Therefore, in a small piezoelectric vibrator, it is necessary to form a measurement pad on the wafer frame so that the pad can be enlarged. However, if the metal film on the side surface of the frame is not accurately patterned, When a plurality of elements oscillate simultaneously due to conduction between adjacent elements and electrodes, there is a problem that frequency interference occurs, and an accurate oscillation frequency cannot be measured.

本発明は、生産工程の工程数を増やすことなく、ウエハ状態での測定において隣接素子の影響を受けない圧電振動子の製造方法を提供することを目的とする。   An object of the present invention is to provide a method of manufacturing a piezoelectric vibrator that is not affected by adjacent elements in measurement in a wafer state without increasing the number of production steps.

少なくとも、圧電ウエハ上に所望の形状のマスク層を形成するマスク層パターニング工程と、マスク層を形成した圧電ウエハをエッチングして、複数の圧電振動片が連結して備わる圧電振動片基板を形成する圧電振動片基板形成工程と、圧電振動片基板に連結する複数の圧電振動片上に電極を形成する電極形成工程とを有し、圧電振動片基板に形成した隣接する圧電振動片を同時発振させる特性測定工程、または、周波数調整工程のいずれかを含む圧電振動子の製造方法であって、圧電基板形成工程では、圧電振動片の外形を有する圧電振動片と、圧電振動片を支持するためのフレームと、圧電振動片の基部とフレームとを連結する連結部が形成された圧電ウエハを形成し、電極形成工程では、圧電ウエハの少なくとも一方の主面に対してフォトリソグラフィで用いる光源を傾斜させ、光源からの照射光を圧電振動片、フレーム、連結部の主面及び、少なくとも連結部と連結可能な圧電振動片の基部の側面と対向するフレームの側面にあたるように照射する圧電振動子の製造方法とする。 At least a mask layer patterning step for forming a mask layer of a desired shape on the piezoelectric wafer, and etching the piezoelectric wafer on which the mask layer is formed to form a piezoelectric vibrating piece substrate having a plurality of piezoelectric vibrating pieces connected to each other. The piezoelectric vibrating reed substrate forming step and the electrode forming step of forming electrodes on a plurality of piezoelectric vibrating reeds connected to the piezoelectric vibrating reed substrate, and simultaneously oscillating adjacent piezoelectric vibrating reeds formed on the piezoelectric vibrating reed substrate A method of manufacturing a piezoelectric vibrator including either a measurement process or a frequency adjustment process, wherein in the piezoelectric substrate forming process, a piezoelectric vibrating piece having an outer shape of a piezoelectric vibrating piece and a frame for supporting the piezoelectric vibrating piece If, to form a piezoelectric wafer connecting portion is formed for connecting the base and the frame of the piezoelectric vibrating piece, the electrode forming step, full to at least one principal surface of the piezoelectric wafer Tilting the light source used in the preparative lithography, the piezoelectric vibrating piece irradiation light from the light source, the frame, the principal surface of the connecting portion and, as corresponding to the side surface of the frame facing the side surface of the base of at least connecting portions allow connection piezoelectric vibrating reed A method for manufacturing a piezoelectric vibrator that irradiates the laser beam .

圧電振動子が、音叉型水晶振動子、または、厚み滑り水晶振動子である圧電振動子の製造方法とする。   A method for manufacturing a piezoelectric vibrator in which the piezoelectric vibrator is a tuning fork type crystal vibrator or a thickness-sliding crystal vibrator.

本発明の方法によれば、生産工程の工程数を増やすことなく、ウエハ状態での測定において隣接素子の影響を受けない圧電振動子の製造方法を提供することができる。   According to the method of the present invention, it is possible to provide a method for manufacturing a piezoelectric vibrator that is not affected by adjacent elements in measurement in a wafer state without increasing the number of production steps.

音叉型水晶振動子の概略図Schematic diagram of tuning fork crystal unit 圧電振動片基板の上面図Top view of piezoelectric vibrating piece substrate 本発明における露光プロセスを説明する概略図Schematic explaining the exposure process in the present invention

本発明の実施形態を、音叉型水晶振動子を例に、図を用いて説明する。   An embodiment of the present invention will be described with reference to the drawings, taking a tuning fork type crystal resonator as an example.

まず、マスク層パターニング工程では、圧電ウエハの表裏に例えばAu/Crからなる耐蝕膜を成膜後、フォトレジストを塗布する。次に音叉型水晶振動子の形状に対応したフォトマスクを利用して露光・現像する。その後、Au膜、Cr膜をエッチングすることにより、音叉型水晶振動子の外形形状に対応したマスク層を形成する。   First, in the mask layer patterning step, a photoresist is applied after forming a corrosion resistant film made of, for example, Au / Cr on the front and back of the piezoelectric wafer. Next, exposure and development are performed using a photomask corresponding to the shape of the tuning fork crystal unit. Thereafter, the Au film and the Cr film are etched to form a mask layer corresponding to the outer shape of the tuning fork crystal unit.

次に、圧電振動片基板形成工程では、マスク層を形成した圧電ウエハをフッ酸・フッ化アンモニウム・バッファードフッ酸等のエッチャントによりエッチングした後、不要となったフォトレジスト、耐蝕膜を剥離することにより、図2に示す様に複数の圧電振動片が連結して備わる圧電振動片基板を形成する。音叉型水晶振動子1は圧電振動片基板9のフレーム6に連結部7を介して連結されている。   Next, in the piezoelectric vibrating reed substrate forming step, the piezoelectric wafer on which the mask layer is formed is etched with an etchant such as hydrofluoric acid, ammonium fluoride, buffered hydrofluoric acid, and then the unnecessary photoresist and corrosion resistant film are peeled off. Thus, as shown in FIG. 2, a piezoelectric vibrating reed substrate in which a plurality of piezoelectric vibrating reeds are connected is formed. The tuning fork type crystal resonator 1 is connected to the frame 6 of the piezoelectric vibrating piece substrate 9 through a connecting portion 7.

次に、電極形成工程では、複数の音叉型水晶振動子1が連結された状態の圧電振動片基板9に、例えばAu/Crからなる金属膜を成膜した後、前記金属膜上にフォトレジストを塗布し、その後、図3に示すように、音叉型水晶振動子1上に配線するための電極パターン、及び測定用パッドに対応したフォトマスク(不図示)を介して、光源10を傾斜させ、照射光がウエハに対して斜めに当たる様にして露光し、現像を行うことによりフォトレジストパターンを形成する。次に、前記フォトレジストパターンをマスクとして、露出している金属膜をエッチング除去し、残存するフォトレジストを剥離することにより、音叉型水晶振動子1に励振電極4やマウントパッド5などの電極パターンとフレーム6に測定用パッド8とを形成する。この様にフレーム6の側面に光源10を傾斜させ照射光を当てることで、測定用パッド8は隣接素子の測定用パッド8と確実に電気的に分離できる。   Next, in the electrode forming step, a metal film made of, for example, Au / Cr is formed on the piezoelectric vibrating piece substrate 9 in a state where a plurality of tuning fork type crystal resonators 1 are connected, and then a photoresist is formed on the metal film. Then, as shown in FIG. 3, the light source 10 is tilted through an electrode pattern for wiring on the tuning fork type crystal resonator 1 and a photomask (not shown) corresponding to the measurement pad. Then, exposure is performed so that the irradiation light strikes the wafer obliquely, and development is performed to form a photoresist pattern. Next, using the photoresist pattern as a mask, the exposed metal film is removed by etching, and the remaining photoresist is peeled off, so that the tuning fork crystal unit 1 is provided with electrode patterns such as the excitation electrode 4 and the mount pad 5. Then, a measurement pad 8 is formed on the frame 6. In this way, by tilting the light source 10 on the side surface of the frame 6 and applying irradiation light, the measurement pad 8 can be reliably electrically separated from the measurement pad 8 of the adjacent element.

以上の工程により製造された圧電振動片基板では、特性測定工程、または、周波数調整工程において、隣接する圧電振動片を同時発振させる際に周波数干渉等、隣接素子の影響を受けずに正確な発振周波数を測定することができる。   In the piezoelectric vibrating reed substrate manufactured by the above steps, accurate oscillation is not affected by adjacent elements such as frequency interference when simultaneously oscillating adjacent piezoelectric vibrating reeds in the characteristic measurement step or frequency adjustment step. The frequency can be measured.

本実施例では、音叉型水晶振動子を例にしたが、これに限定されるものではなく、厚み滑り振動子をウエハにフォトリソグラフィを用いて形成する場合においても、同様に適用できる。   In this embodiment, the tuning fork type crystal resonator is taken as an example. However, the present invention is not limited to this, and the present invention can be similarly applied to the case where the thickness shear resonator is formed on the wafer by photolithography.

1音叉型水晶振動子
2振動腕
3音叉基部
4励振電極
5マウントパッド
6フレーム
7連結部
8測定用パッド
9圧電振動片基板
10光源
1 tuning fork type crystal resonator 2 vibrating arm 3 tuning fork base 4 excitation electrode 5 mount pad 6 frame 7 connecting part 8 measuring pad 9 piezoelectric vibrating piece substrate 10 light source

Claims (2)

少なくとも、圧電ウエハ上に所望の形状のマスク層を形成するマスク層パターニング工程と、前記マスク層を形成した前記圧電ウエハをエッチングして、複数の圧電振動片が連結して備わる圧電振動片基板を形成する圧電振動片基板形成工程と、前記圧電振動片基板に連結する複数の前記圧電振動片上に電極を形成する電極形成工程とを有し、前記圧電振動片基板に形成した隣接する前記圧電振動片を同時発振させる特性測定工程、または、周波数調整工程のいずれかを含む圧電振動子の製造方法であって、前記圧電基板形成工程では、圧電振動片の外形を有する前記圧電振動片と、前記圧電振動片を支持するためのフレームと、前記圧電振動片の基部と前記フレームとを連結する連結部が形成された前記圧電ウエハを形成し、前記電極形成工程では、前記圧電ウエハの少なくとも一方の主面に対してフォトリソグラフィで用いる光源を傾斜させ、前記光源からの照射光を前記圧電振動片、前記フレーム、前記連結部の主面及び、少なくとも前記連結部と連結可能な前記圧電振動片の基部の側面と対向する前記フレームの側面にあたるように照射することを特徴とする圧電振動子の製造方法。 At least, a mask layer patterning step of forming a mask layer having a desired shape on the piezoelectric wafer, by etching the piezoelectric wafer formed with the mask layer, the piezoelectric resonator element substrate having a plurality of piezoelectric vibrating pieces facilities linked a piezoelectric vibrating piece substrate forming step of forming, said and an electrode forming step of forming a plurality of the piezoelectric vibrating electrode on a piece for connecting the piezoelectric resonator element substrate, the piezoelectric vibrating adjacent formed on the piezoelectric vibrating piece substrate A method of manufacturing a piezoelectric vibrator including either a characteristic measuring step for simultaneously oscillating pieces or a frequency adjusting step, wherein in the piezoelectric substrate forming step, the piezoelectric vibrating piece having an outer shape of a piezoelectric vibrating piece; forming a frame for supporting the piezoelectric resonator element, the piezoelectric wafer on which connecting portion is formed for connecting the said frame with the base of the piezoelectric vibrating reed, wherein the electrode formed The extent, the tilting the light source used in photolithography to at least one principal surface of the piezoelectric wafer, the piezoelectric vibrating piece irradiation light from the light source, the frame, the main surface and, at least the connection of the connecting portion A method of manufacturing a piezoelectric vibrator , comprising: irradiating a side surface of the frame facing a side surface of a base portion of the piezoelectric vibrating piece connectable to a portion . 請求項1記載の圧電振動子が、音叉型水晶振動子、または、厚み滑り水晶振動子であることを特徴とする圧電振動子の製造方法。   The method of manufacturing a piezoelectric vibrator, wherein the piezoelectric vibrator according to claim 1 is a tuning fork type crystal vibrator or a thickness-shearing crystal vibrator.
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