JP6227643B2 - 大きな装填容量を有する化学気相浸透装置 - Google Patents
大きな装填容量を有する化学気相浸透装置 Download PDFInfo
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- JP6227643B2 JP6227643B2 JP2015522145A JP2015522145A JP6227643B2 JP 6227643 B2 JP6227643 B2 JP 6227643B2 JP 2015522145 A JP2015522145 A JP 2015522145A JP 2015522145 A JP2015522145 A JP 2015522145A JP 6227643 B2 JP6227643 B2 JP 6227643B2
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/04—Coating on selected surface areas, e.g. using masks
- C23C16/045—Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/26—Deposition of carbon only
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/46—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for heating the substrate
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/54—Apparatus specially adapted for continuous coating
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- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Manufacture, Treatment Of Glass Fibers (AREA)
Description
平行六面体形状の反応チャンバであって、該反応チャンバの側壁が加熱手段を備えている反応チャンバと、
前記反応チャンバに配置された、それぞれが複数の装填装置から成る複数の積層体とを備え、該装填装置はそれぞれ、浸透処理の対象である繊維プリフォームを受けるための支持要素が設けられた平行六面体形状の筐体形状である、
設備によって達成される。
・高さ0.52メートル(m)、幅0.26m、長さ14.6mの有効装填空間の場合、本発明を用いれば、長さ約10センチメートル(cm)のブレードプリフォームをそれぞれ7個収容している直方体形状の装填装置をそれぞれ7体備える積層体を65体1列に配列することによって、3185個のブレードプリフォームを装填できる。
・高さ0.74m、幅0.34m、長さ7.2mの有効装填空間の場合、本発明を用いれば、ブレードプリフォームをそれぞれ10個収容している直方体形状の装填装置をそれぞれ10体備える積層体を32体1列に配列することによって、3200個のブレードプリフォームを装填できる。
・高さ0.74m、幅1m、長さ2.5mの有効装填空間の場合、本発明を用いれば、ブレードプリフォームをそれぞれ10個収容している直方体形状の装填装置をそれぞれ10体備える積層体を各列に11体で3列に配列することによって、3300個のブレードプリフォームを装填できる。
Claims (9)
- 主として長手方向に延びる三次元形状の多孔質プリフォーム(20)の化学気相浸透処理のための設備(600)であって、前記設備は、
平行六面体形状の反応チャンバであって、該反応チャンバの側壁(611〜614)が加熱手段(615)を備えている反応チャンバ(610)と、
前記反応チャンバ(610)に配置された、それぞれが複数の装填装置(10)から成る複数の積層体(50)とを備え、前記装填装置(10)はそれぞれ、浸透処理の対象である多孔質プリフォーム(20)を受けるための支持要素(1100、1110)が設けられた平行六面体形状の筐体(11)形状である、
設備。 - 前記反応チャンバ(610)は直方体形状であり、前記反応チャンバ(610)は前記装填装置(10)の前記複数の積層体(50)から成る列を少なくとも1列収容し、前記列は前記反応チャンバの長手方向に延びる、
請求項1に記載の設備。 - 前記装填装置(10)はそれぞれ直方体形状の筐体(11)によって構成され、前記積層体(50)は、前記装填装置(10)のそれぞれの長辺が前記反応チャンバ内において前記チャンバの前記長手方向に垂直な方向に延びるように、前記チャンバ(610)に配置される、
請求項2に記載の設備。 - 前記反応チャンバ(10)は、前記反応チャンバの前記長手方向に延びる前記装填装置(10)の前記積層体(50)の列を複数列(510、520、530)収容し、加熱手段(717)が前記装填装置の前記積層体の2つの列の間に配置される、
請求項2に記載の設備。 - 前記積層体(50)はそれぞれ、その両端部に、前記多孔質プリフォーム(20)が装填されない緩衝部(540;550)を備える、
請求項1に記載の設備。 - 前記反応チャンバの水平壁(620、630)は、加熱手段を備えている、
請求項5に記載の設備。 - 前記多孔質プリフォーム(20)が、航空機エンジンブレード用繊維プリフォーム(20)であって、
前記積層体のそれぞれの前記装填装置(10)は、前記航空機エンジンブレード用繊維プリフォーム(20)を収容する、
請求項6に記載の設備。 - 前記装填装置(10)のそれぞれにおいて、前記ブレード用繊維プリフォーム(20)は、それらの加圧側の面(123)または吸気側の面(122)が同じ方向を向くようにして互いに隣り合って配列される、
請求項7に記載の設備。 - 前記装填装置(10)の前記積層体(50)のそれぞれにおいて、第1装填装置の前記繊維プリフォーム(20)は、それらの加圧側の面(123)または吸気側の面(122)が第1方向を向くようにして互いに隣り合って配列され、前記第1装置に隣接する第2装填装置(10)の前記繊維プリフォーム(20)は、それらの加圧側の面(123)または吸気側の面(122)が前記第1方向とは反対の第2方向を向くようにして互いに隣り合って配列される、
請求項8に記載の設備。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR1257012 | 2012-07-19 | ||
FR1257012A FR2993555B1 (fr) | 2012-07-19 | 2012-07-19 | Installation d'infiltration chimique en phase vapeur a haute capacite de chargement |
PCT/FR2013/051674 WO2014013168A1 (fr) | 2012-07-19 | 2013-07-12 | Installation d'infiltration chimique en phase vapeur à haute capacité de chargement |
Publications (2)
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JP2015524514A JP2015524514A (ja) | 2015-08-24 |
JP6227643B2 true JP6227643B2 (ja) | 2017-11-08 |
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JP2015522145A Active JP6227643B2 (ja) | 2012-07-19 | 2013-07-12 | 大きな装填容量を有する化学気相浸透装置 |
Country Status (9)
Country | Link |
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US (1) | US10392696B2 (ja) |
EP (1) | EP2875167B1 (ja) |
JP (1) | JP6227643B2 (ja) |
CN (1) | CN104540980B (ja) |
BR (1) | BR112015001190B1 (ja) |
CA (1) | CA2879223C (ja) |
FR (1) | FR2993555B1 (ja) |
RU (1) | RU2635051C2 (ja) |
WO (1) | WO2014013168A1 (ja) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
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CA2974387A1 (en) * | 2016-08-30 | 2018-02-28 | Rolls-Royce Corporation | Swirled flow chemical vapor deposition |
US11624287B2 (en) | 2020-02-21 | 2023-04-11 | Raytheon Technologies Corporation | Ceramic matrix composite component having low density core and method of making |
US12000046B1 (en) * | 2021-12-29 | 2024-06-04 | Rolls-Royce High Temperature Composites, Inc. | Load assemblies for loading parts in a furnace |
US11932941B1 (en) | 2021-12-29 | 2024-03-19 | Rolls-Royce High Temperature Composites, Inc. | Load assemblies for loading parts in a furnace |
US20240110281A1 (en) * | 2022-09-30 | 2024-04-04 | Raytheon Technologies Corporation | Stacking tool fixture for forced flow chemical vapor infiltration |
US20240173890A1 (en) * | 2022-11-29 | 2024-05-30 | Raytheon Technologies Corporation | Fixture with grooves for processing cmc article |
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Publication number | Priority date | Publication date | Assignee | Title |
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US5480678A (en) | 1994-11-16 | 1996-01-02 | The B. F. Goodrich Company | Apparatus for use with CVI/CVD processes |
FR2733254B1 (fr) * | 1995-04-18 | 1997-07-18 | Europ Propulsion | Procede d'infiltration chimique en phase vapeur pour la densification de substrats poreux disposes en piles annulaires |
EP1072693A1 (en) | 1999-07-27 | 2001-01-31 | Iljin Nanotech Co., Ltd. | Chemical vapor deposition apparatus and method of synthesizing carbon nanotubes using the apparatus |
US6953605B2 (en) * | 2001-12-26 | 2005-10-11 | Messier-Bugatti | Method for densifying porous substrates by chemical vapour infiltration with preheated gas |
FR2834713B1 (fr) * | 2002-01-15 | 2004-04-02 | Snecma Moteurs | Procede et installation pour la densification de substrats par infiltration chimique en phase vapeur |
DE60321535D1 (de) * | 2002-10-24 | 2008-07-24 | Goodrich Corp | Verfahren und Vorrichtung zur stückweisen und zur kontinuierlichen Verdichtung durch chemische Dampfphaseninfitration (CVI) |
TWI274978B (en) * | 2004-02-25 | 2007-03-01 | Advanced Display Proc Eng Co | Apparatus for manufacturing flat-panel display |
FR2882064B1 (fr) * | 2005-02-17 | 2007-05-11 | Snecma Propulsion Solide Sa | Procede de densification de substrats poreux minces par infiltration chimique en phase vapeur et dispositif de chargement de tels substrats |
FR2900226B1 (fr) * | 2006-04-25 | 2017-09-29 | Messier Bugatti | Four de traitement ou analogue |
US8282334B2 (en) * | 2008-08-01 | 2012-10-09 | Picosun Oy | Atomic layer deposition apparatus and loading methods |
FR2980486B1 (fr) * | 2011-09-28 | 2013-10-11 | Snecma Propulsion Solide | Dispositif de chargement pour la densification par infiltration chimique en phase vapeur en flux dirige de substrats poreux de forme tridimensionnelle |
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2012
- 2012-07-19 FR FR1257012A patent/FR2993555B1/fr active Active
-
2013
- 2013-07-12 EP EP13744739.7A patent/EP2875167B1/fr active Active
- 2013-07-12 BR BR112015001190-0A patent/BR112015001190B1/pt active IP Right Grant
- 2013-07-12 RU RU2015101588A patent/RU2635051C2/ru active
- 2013-07-12 JP JP2015522145A patent/JP6227643B2/ja active Active
- 2013-07-12 CA CA2879223A patent/CA2879223C/en active Active
- 2013-07-12 WO PCT/FR2013/051674 patent/WO2014013168A1/fr active Application Filing
- 2013-07-12 CN CN201380042644.0A patent/CN104540980B/zh active Active
- 2013-07-12 US US14/415,042 patent/US10392696B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
US20150218693A1 (en) | 2015-08-06 |
FR2993555B1 (fr) | 2015-02-20 |
WO2014013168A1 (fr) | 2014-01-23 |
CA2879223A1 (en) | 2014-01-23 |
CN104540980A (zh) | 2015-04-22 |
RU2015101588A (ru) | 2016-09-10 |
JP2015524514A (ja) | 2015-08-24 |
RU2635051C2 (ru) | 2017-11-08 |
BR112015001190A2 (pt) | 2017-07-04 |
BR112015001190B1 (pt) | 2021-06-08 |
CA2879223C (en) | 2020-08-18 |
CN104540980B (zh) | 2018-02-02 |
EP2875167B1 (fr) | 2017-09-06 |
EP2875167A1 (fr) | 2015-05-27 |
FR2993555A1 (fr) | 2014-01-24 |
US10392696B2 (en) | 2019-08-27 |
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