JP6196429B2 - Copper alloy sheet with excellent heat dissipation and repeated bending workability - Google Patents
Copper alloy sheet with excellent heat dissipation and repeated bending workability Download PDFInfo
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- JP6196429B2 JP6196429B2 JP2012184514A JP2012184514A JP6196429B2 JP 6196429 B2 JP6196429 B2 JP 6196429B2 JP 2012184514 A JP2012184514 A JP 2012184514A JP 2012184514 A JP2012184514 A JP 2012184514A JP 6196429 B2 JP6196429 B2 JP 6196429B2
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- 229910000881 Cu alloy Inorganic materials 0.000 title claims description 28
- 238000005452 bending Methods 0.000 title description 29
- 230000017525 heat dissipation Effects 0.000 title description 11
- 239000000463 material Substances 0.000 claims description 31
- 239000010949 copper Substances 0.000 claims description 26
- 238000005096 rolling process Methods 0.000 claims description 18
- 229910052698 phosphorus Inorganic materials 0.000 claims description 8
- 229910052710 silicon Inorganic materials 0.000 claims description 8
- 229910052804 chromium Inorganic materials 0.000 claims description 7
- 238000010438 heat treatment Methods 0.000 claims description 7
- 229910052738 indium Inorganic materials 0.000 claims description 7
- 229910052742 iron Inorganic materials 0.000 claims description 7
- 229910052718 tin Inorganic materials 0.000 claims description 7
- 229910052726 zirconium Inorganic materials 0.000 claims description 7
- 229910052759 nickel Inorganic materials 0.000 claims description 6
- 229910052725 zinc Inorganic materials 0.000 claims description 6
- 229910052719 titanium Inorganic materials 0.000 claims description 5
- 229910052709 silver Inorganic materials 0.000 claims description 4
- 239000012535 impurity Substances 0.000 claims description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 28
- 229910052802 copper Inorganic materials 0.000 description 21
- 238000005097 cold rolling Methods 0.000 description 19
- 238000000137 annealing Methods 0.000 description 12
- 238000001953 recrystallisation Methods 0.000 description 10
- 238000012545 processing Methods 0.000 description 9
- 230000000052 comparative effect Effects 0.000 description 8
- 239000011889 copper foil Substances 0.000 description 7
- 239000000654 additive Substances 0.000 description 6
- 230000000996 additive effect Effects 0.000 description 6
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 6
- 229910052760 oxygen Inorganic materials 0.000 description 6
- 239000001301 oxygen Substances 0.000 description 6
- 238000012423 maintenance Methods 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- 230000020169 heat generation Effects 0.000 description 4
- 238000009864 tensile test Methods 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- 229910045601 alloy Inorganic materials 0.000 description 3
- 239000000956 alloy Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000011156 evaluation Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000000465 moulding Methods 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000005286 illumination Methods 0.000 description 2
- 230000003252 repetitive effect Effects 0.000 description 2
- 238000005275 alloying Methods 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 238000005098 hot rolling Methods 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000002250 progressing effect Effects 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000003892 spreading Methods 0.000 description 1
- 238000005482 strain hardening Methods 0.000 description 1
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- Parts Printed On Printed Circuit Boards (AREA)
- Conductive Materials (AREA)
- Non-Insulated Conductors (AREA)
Description
本発明は、照明用などのLED実装基板をはじめとするフレキシブルプリント基板(FPC)として好適な銅合金板、特に放熱性及び繰返し曲げ加工性に優れた銅合金板、ならびにこれを用いた電子機器部品等に関する。 The present invention relates to a copper alloy plate suitable as a flexible printed circuit board (FPC) including an LED mounting substrate for illumination and the like, particularly a copper alloy plate excellent in heat dissipation and repetitive bending workability, and an electronic apparatus using the same It relates to parts.
LED照明は、従来の白熱電球や蛍光灯などと比較して低消費電力、超寿命、高速応答性等の長所を有し、製品価格の低下と共に、急速に普及が進んでおり、室内用照明に加えて、液晶テレビや液晶モニターなどのバックライト、自動車の照明用など、各種用途も広がっている。 LED lighting has advantages such as low power consumption, long life, and high-speed response compared to conventional incandescent bulbs and fluorescent lamps, etc., and it is rapidly spreading as product prices decrease. In addition, various applications such as backlights for LCD TVs and LCD monitors, and lighting for automobiles are also expanding.
LED自体は半導体であるため、定格範囲内での使用では発光素子自身は長寿命であるが、発光素子を覆う樹脂材料は熱により劣化しやすく、発熱により容易に透明度が低下して照明用の使用に適さなくなる。また、LEDは、発光特性や放熱性に配慮して、種々のパッケージ形状のものが製造されているが、小さなスペースで使用する場合には、省スペース化や成形方法など、様々な工夫が必要である。 Since the LED itself is a semiconductor, the light emitting element itself has a long life when used within the rated range. However, the resin material covering the light emitting element is easily deteriorated by heat, and the transparency is easily lowered by heat generation. Unsuitable for use. In addition, LEDs are manufactured in various package shapes in consideration of light emission characteristics and heat dissipation. However, when used in a small space, various devices such as space saving and molding methods are required. It is.
発熱の問題への対応として、FPCから効率良く放熱するため、FPCに放熱板を張り合わせることが提案されており、また、省スペース化については、FPC上にLEDを配置することが試みられている(特許文献1)。 In order to deal with the problem of heat generation, in order to efficiently dissipate heat from the FPC, it has been proposed to attach a heat sink to the FPC, and for space saving, an attempt has been made to place an LED on the FPC. (Patent Document 1).
また、照明装置として、LEDを配置した回路基板に複雑な加工を行い、立体成形を行うことも提案されている(特許文献2)。 In addition, as a lighting device, it has been proposed to perform complicated processing on a circuit board on which LEDs are arranged to perform three-dimensional molding (Patent Document 2).
LEDをFPC上に実装した場合、基板である樹脂の放熱性が十分でないため、長時間の使用で発光素子を覆う樹脂が熱劣化し、照明としての寿命が短くなってしまう。
発熱への対応として、FPCに放熱板としてアルミニウム板を張り合わせた場合、FPCの回路を構成している銅配線との線熱膨張係数の違いにより、FPC回路にそりが生じるという問題がある。さらに、熱による膨張、収縮を繰り返すことで、FPCの銅配線が繰返し引張り応力を受け、破断に至る問題もある。
放熱板として銅板を用いた場合には上記問題は発生しないが、銅はアルミニウムよりも加工硬化係数が大きいため、複雑な形状にFPCを成型する際に、曲げ部、あるいは曲げ戻しと再曲げ加工を行う等の成形条件では、曲げ部にクラックが発生し易い。クラックが発生すると、これを車載などの繰返し振動が加わる環境下で使用する場合、クラックが進展して破断に至るなどの問題が生じる。
FPCの基板として銅板を用いて照明装置を立体成形する方法も考えられるが、一般的なタフピッチ銅は、照明装置に使用されている間に発熱により銅板自体が軟化し、初期の形状を維持することが困難である。
すなわち、本発明は上記の課題を解決するためになされたものであり、放熱性、繰返し曲げ加工性、形状維持性、及び、耐熱性に優れたFPC基板用銅合金板を提供することを課題とする。
When the LED is mounted on the FPC, the heat dissipation of the resin that is the substrate is not sufficient, so that the resin that covers the light emitting element is deteriorated by heat for a long time, and the lifetime as illumination is shortened.
As a countermeasure to heat generation, when an aluminum plate is bonded to the FPC as a heat dissipation plate, there is a problem that warpage occurs in the FPC circuit due to a difference in linear thermal expansion coefficient from the copper wiring constituting the FPC circuit. Furthermore, by repeatedly expanding and contracting due to heat, there is a problem that the copper wiring of the FPC is repeatedly subjected to tensile stress and breaks.
The above problem does not occur when a copper plate is used as the heat sink, but copper has a higher work hardening coefficient than aluminum, so when forming FPC into a complex shape, bending part or bending back and rebending Under molding conditions such as performing cracks, cracks are likely to occur in the bent portion. When a crack occurs, when it is used in an environment where repeated vibration is applied, such as in-vehicle, a problem such as the crack progressing and breaking occurs.
Although a method of three-dimensionally forming a lighting device using a copper plate as an FPC substrate is conceivable, general tough pitch copper softens the copper plate itself due to heat generation while it is used in the lighting device, and maintains the initial shape. Is difficult.
That is, the present invention has been made to solve the above problems, and it is an object to provide a copper alloy plate for an FPC board that is excellent in heat dissipation, repeated bending workability, shape maintenance, and heat resistance. And
本発明者は上記課題を解決するために研究を重ねたところ、銅合金板の材料厚みの所定範囲における、せん断帯の存在密度を制御することで、繰返し曲げ加工性等を制御することができることを見出した。 The present inventor has conducted research to solve the above problems, and can control the bending workability and the like by controlling the existence density of the shear band in a predetermined range of the material thickness of the copper alloy plate. I found.
以上の知見を背景にして完成した本発明は一側面において、Ag、Cr、Fe、In、Ni、P、Si、Sn、Ti、Zn及びZrからなる群から選択された一種以上を合計で0.01質量%以上含有し、Agは1.0質量%以下、Tiは0.08質量%以下、Niは2.0質量%以下、Znは3.5質量%以下、Cr、Fe、In、P、Si、Sn、及びZrは、これらの群から選択された一種類以上を合計で0.5質量%以下含有し、残部Cu及び不純物からなり、
導電率が60%IACS以上であり、
引張強さが350MPa以上であり、
圧延平行断面において、材料厚みTを4等分する厚み方向に垂直な3本の直線の内、中心線を除いた残り2本の直線について、各々の長さ100Tの観察範囲において、各直線と交差するせん断帯の個数nが、
n≦300
を満たし、材料厚みTが0.05〜0.3mmである銅合金板である。
In one aspect, the present invention completed on the basis of the above knowledge is one or more selected from the group consisting of Ag, Cr, Fe, In, Ni, P, Si, Sn, Ti, Zn, and Zr. .01 mass% or more, Ag is 1.0 mass% or less, Ti is 0.08 mass% or less, Ni is 2.0 mass% or less, Zn is 3.5 mass% or less, Cr, Fe, In, P, Si, Sn, and Zr contain at least 0.5% by mass in total of one or more selected from these groups, and are composed of the balance Cu and impurities,
Conductivity is 60% IACS or higher,
The tensile strength is 350 MPa or more,
In the rolling parallel cross section, among the three straight lines perpendicular to the thickness direction that divide the material thickness T into four equal parts, the remaining two straight lines excluding the center line, The number of intersecting shear bands n is
n ≦ 300
Meets the material thickness T is a copper alloy sheet is 0.05 to 0.3 mm.
本発明に係る銅合金板は一実施形態において、引張強さが200℃で30分間加熱後に250MPa以上になる。 Copper alloy sheet according to the present invention in one embodiment, the tensile strength is more than 250MPa after heating at 200 ° C. 30 min.
本発明に係る銅合金板は一実施形態において、FPC基板用である。 In one embodiment, the copper alloy plate according to the present invention is for an FPC board.
本発明に係る銅合金板は別の一実施形態において、LED照明を実装したFPC基板用である。 In another embodiment, the copper alloy plate according to the present invention is for an FPC board on which LED lighting is mounted.
本発明は別の一側面において、本発明の銅合金板を用いた電子機器部品である。 Another aspect of the present invention is an electronic device component using the copper alloy plate of the present invention.
本発明は更に別の一側面において、本発明の銅合金板を用いたLED照明を実装したFPCである。 In still another aspect, the present invention is an FPC in which LED lighting using the copper alloy plate of the present invention is mounted.
本発明によれば、放熱性、繰返し曲げ加工性、形状維持性、及び、耐熱性に優れたFPC基板用銅合金板を提供することができる。 ADVANTAGE OF THE INVENTION According to this invention, the copper alloy plate for FPC boards excellent in heat dissipation, repeated bending workability, shape maintenance property, and heat resistance can be provided.
(銅箔の成分)
本発明では、銅箔の耐熱性を改善するために、銅にAg、Cr、Fe、In、Ni、P、Si、Sn、Ti、Zn及びZrからなる群から選択された一種以上を合計で0.01質量%以上添加する。添加元素の合計濃度が0.01質量%を下回ると、添加元素の効果が発現せず耐熱性が不足する。また、添加元素の合計濃度の上限については、次の通りである。
Agは添加による導電率の低下の影響が小さいため、特に制限はないが、添加濃度が高くなると共にコストが増加するため、1.0質量%以下が好ましい。
添加による導電率低下の影響が大きいCr、Fe、In、P、Si、Sn、及びZrは、これら元素の合計につき、0.5質量%以下が、また、特に影響が大きいTiは、0.08質量%以下が好ましい。
また、Niは2.0質量%以下、Znは3.5質量%以下が好ましい。
(Copper foil components)
In the present invention, in order to improve the heat resistance of the copper foil, at least one selected from the group consisting of Ag, Cr, Fe, In, Ni, P, Si, Sn, Ti, Zn and Zr is added to the copper. Add 0.01% by mass or more. When the total concentration of the additive elements is less than 0.01% by mass, the effect of the additive elements is not exhibited and the heat resistance is insufficient. Further, the upper limit of the total concentration of the additive elements is as follows.
Ag is not particularly limited because it is less affected by the decrease in conductivity due to the addition, but is preferably 1.0% by mass or less because the concentration increases and the cost increases.
Cr, Fe, In, P, Si, Sn, and Zr, which have a large effect on the decrease in conductivity due to the addition, are 0.5% by mass or less of the total of these elements. 08 mass% or less is preferable.
Ni is preferably 2.0% by mass or less, and Zn is preferably 3.5% by mass or less.
合金元素添加のベースのCuとしてはJIS H3100 C1020に規格する無酸素銅又はJIS H3100 C1100に規格するタフピッチ銅が適する。酸素濃度は、タフピッチ銅溶湯では0.01〜0.05質量%、無酸素銅溶湯では0.001質量%以下が通常である。
Cuと比較し酸化しやすいCr、Fe、In、Ni、P、Si、Sn、Ti、Zn及びZrは、無酸素銅溶湯中に添加するのが一般的である。酸素を含有する溶銅にP、Si等の脱酸剤を添加して酸素濃度を10ppm以下に下げた後、これら合金元素を添加しても良い。AgはCuより酸化しにくいので、タフピッチ銅溶湯中、無酸素銅溶湯中ともに添加できる。
As the base Cu to which the alloy element is added, oxygen free copper standardized to JIS H3100 C1020 or tough pitch copper standardized to JIS H3100 C1100 is suitable. The oxygen concentration is usually 0.01 to 0.05% by mass for a tough pitch copper melt and 0.001% by mass or less for an oxygen free copper melt.
In general, Cr, Fe, In, Ni, P, Si, Sn, Ti, Zn, and Zr, which are easily oxidized as compared with Cu, are added to the oxygen-free copper melt. After adding a deoxidizer such as P or Si to the molten copper containing oxygen to reduce the oxygen concentration to 10 ppm or less, these alloy elements may be added. Since Ag is less susceptible to oxidation than Cu, it can be added both in the tough pitch copper melt and in the oxygen free copper melt.
(放熱性)
加熱された材料を放熱するには、熱伝導が良い材料が求められる。熱伝導は、材料の導電率が高いものが良い。LED照明点灯時の発熱を考えると、LEDの実装密度や照明装置の形状などの影響要因もあるが、材料の導電率は60%IACS以上であればよく、70%IACS以上であればより好ましい。
(Heat dissipation)
In order to dissipate the heated material, a material having good heat conduction is required. The heat conduction is preferably a material having a high electrical conductivity. Considering the heat generated when the LED lighting is on, there are influential factors such as the LED mounting density and the shape of the lighting device, but the conductivity of the material may be 60% IACS or more, and more preferably 70% IACS or more. .
(繰返し曲げ加工性)
繰返し曲げ加工性については、金属組織との関係を調べたところ、せん断帯の存在密度と関係があり、圧延平行断面において、材料厚みTを4等分する厚み方向に垂直な3本の直線の内、中心線を除いた残り2本の直線について、各々の長さ100Tの観察範囲、すなわち、合計で長さ200Tの観察範囲において、各直線と交差するせん断帯の個数nがn≦300の場合に、繰返し曲げ加工性が良好であった。nの値は、好ましくは250以下、より好ましくは150以下である。
せん断帯は、材料を強加工した場合に、せん断変形が集中的に起こって形成される組織が観察面に現れたものであり、圧延加工では、圧延組織の不連続面として観察され、圧延面に対して30度から60度傾いた線として識別可能である。また、せん断帯は厚み方向に広がっており、材料の厚みや加工度などにより、その広がり、すなわち厚み方向の長さが異なる場合がある。
せん断帯は、最終圧延後の銅箔圧延平行断面を、例えば集束イオンビーム(FIB:Focused Ion Beam)で加工し、走査イオン顕微鏡(SIM:Scanning Ion Microscopy)や走査型電子顕微鏡(SEM:Scanning Electron Microscopy)にて観察する、あるいはクロスセクションポリッシャ(CP:Cross Section Polisher)で加工し、SEMにて観察することが可能である。
(Repeated bending workability)
As for the repetitive bending workability, the relationship with the metal structure was examined, and it was related to the existence density of the shear band. In the rolling parallel section, the three straight lines perpendicular to the thickness direction dividing the material thickness T into four equal parts. Among the remaining two straight lines excluding the center line, the number n of shear bands intersecting with each straight line is n ≦ 300 in the observation range of each length 100T, that is, the total observation range of length 200T. In some cases, the repeated bending workability was good. The value of n is preferably 250 or less, more preferably 150 or less.
A shear band is a structure in which shear deformation occurs intensively when a material is strongly processed, and appears on the observation surface. In rolling, the structure is observed as a discontinuous surface of the rolling structure. Can be identified as a line inclined by 30 to 60 degrees. Further, the shear band spreads in the thickness direction, and the spread, that is, the length in the thickness direction may vary depending on the thickness of the material, the degree of processing, and the like.
For the shear band, the copper foil rolled parallel section after the final rolling is processed by, for example, a focused ion beam (FIB), a scanning ion microscope (SIM) or a scanning electron microscope (SEM). It can be observed with a Microscope or processed with a cross section polisher (CP) and observed with an SEM.
(形状維持性)
材料を所定の形状に成形した後、初期の加工形状を維持するには、ある程度の材料強度が必要である。加工形状などの構造の影響もあるが、材料強度である引張強さにつき、これが350MPa未満の場合には、加わる力で材料が容易に変形するため、引張強さは350MPa以上であり、400MPa以上であるのがより好ましい。強度の上限については特に設定しないが、材料の加工度を上げることで強度を高くした場合には、一般に曲げ加工性が劣化することが知られており、従って、曲げ加工性とのバランスを考慮して材料を加工すれば良い。
(Shape maintenance)
After the material is formed into a predetermined shape, a certain level of material strength is required to maintain the initial processed shape. Although there is an influence of the structure such as the processing shape, the tensile strength is 350 MPa or more and 400 MPa or more because the material is easily deformed by the applied force when the tensile strength which is the material strength is less than 350 MPa. It is more preferable that The upper limit of strength is not particularly set, but it is generally known that when the strength is increased by increasing the workability of the material, bending workability is generally deteriorated. Therefore, the balance with bending workability is considered. Then, the material can be processed.
(耐熱性)
耐熱性については、LED照明の特性から、照明機器として長時間使用できるよう、通常は150℃未満の温度で使用されるように設計される。150℃未満であっても、一般的なタフピッチ銅は長時間の使用によって軟化する事は避けられず、軟化した場合には初期の加工形状を維持することができない。このような現象を避けるため、耐熱性を確保することは重要である。一方、照明機器としては数万時間程度の使用が想定されるが、これをそのまま再現する長時間の加熱試験は現実的ではないため、目安として、実使用条件よりも高温で短時間、ここでは200℃で30分間保持する条件で加熱し、引張強さ250MPa以上の場合に耐熱性が良好と判断した。また、200℃で30分間加熱後に300MPa以上を維持するのがより好ましい。
(Heat-resistant)
About heat resistance, from the characteristic of LED lighting, it is designed so that it may be normally used at the temperature of less than 150 degreeC so that it can be used as lighting equipment for a long time. Even if the temperature is lower than 150 ° C., it is inevitable that general tough pitch copper is softened by long-term use, and when it is softened, the initial processed shape cannot be maintained. In order to avoid such a phenomenon, it is important to ensure heat resistance. On the other hand, it is assumed that the lighting equipment will be used for several tens of thousands of hours, but a long-time heating test that reproduces this as it is is not realistic. Heating was performed at 200 ° C. for 30 minutes, and when the tensile strength was 250 MPa or more, the heat resistance was judged to be good. Moreover, it is more preferable to maintain 300 MPa or more after heating at 200 ° C. for 30 minutes.
本発明に係る銅合金板の厚みは、0.05〜0.3mmであるのが好ましい。銅合金板の厚みが0.05mm未満であると、材料が薄いために形状を維持するのが困難という問題が生じることがあり、0.3mmを超えると、材料が厚すぎるために製品の重量が重くなりすぎるという問題が生じることがある。また、このように、本発明に係る銅合金板は銅箔の形態も含んでいる。 The thickness of the copper alloy plate according to the present invention is preferably 0.05 to 0.3 mm. If the thickness of the copper alloy plate is less than 0.05 mm, there is a problem that it is difficult to maintain the shape because the material is thin. May become too heavy. In addition, as described above, the copper alloy plate according to the present invention includes a form of copper foil.
銅合金板のせん断帯の存在密度が上記の特性範囲にあれば、成分および製造条件によらず、本発明の効果は発現する。本発明の銅合金板は、例えば、次のようなプロセスによって製造することができる。 If the existence density of the shear band of the copper alloy plate is in the above characteristic range, the effect of the present invention is exhibited regardless of the components and the production conditions. The copper alloy plate of the present invention can be manufactured, for example, by the following process.
圧延銅箔の製造プロセスは、電気銅を純銅の原料に使用し、必要に応じて合金元素を添加した後、鋳造して厚み100〜300mmのインゴットを製造する。このインゴットを熱間圧延して厚み5〜20mm程度とした後、冷間圧延と焼鈍を繰り返して、冷間圧延で所定の厚みに仕上げる。
先述の繰返し曲げ加工性、引張強さおよびせん断帯の存在密度につき、規定範囲を満たす銅箔は、最終再結晶焼鈍の昇温速度、ならびに最終再結晶焼鈍の直後に行われる最終冷間圧延の加工条件である総加工度、及び、1パス目の加工度を調整することで得られる。ここで、最終再結晶焼鈍とは、製品の厚みまで加工する最終冷間圧延の前の再結晶焼鈍である。また、最終冷間圧延では、一対のロール間に材料を繰返し通過させ(以下「パス」とする)、厚みを仕上げていく。ここで、1パス目とは、最終再結晶焼鈍後の材料を製品の厚みに仕上げる最終冷間圧延における最初のパスを示す。
最終再結晶焼鈍の昇温速度は12〜50℃/sであれば良い。昇温速度が12℃/s未満である場合、及び、50℃/s超である場合は、先述の繰返し曲げ加工性を満たすことが困難である。
最終冷間圧延の総加工度は85%以下であれば良い。ここで、加工度は、圧延前と圧延後との厚みの差を圧延前の厚みで除した値を百分率で表わしたものである。最終冷間圧延の総加工度が85%を超える場合は、先述の繰返し曲げ加工性を満たすことが困難である。また、総加工度の下限値については、合金成分や濃度により異なるが、引張強さの下限値を超えるように設定すれば良い。
最終冷間圧延の1パス目の加工度は20%以下であれば良い。最終冷間圧延の1パス目の加工度が20%を超える場合は、せん断帯が生じやすくなることで、規定のせん断帯の存在密度を満たすことができず、先述の繰り返し曲げ加工性を満たすことが困難である。
The manufacturing process of a rolled copper foil uses electrolytic copper as a raw material for pure copper, adds an alloying element as necessary, and casts to produce an ingot having a thickness of 100 to 300 mm. This ingot is hot-rolled to a thickness of about 5 to 20 mm, and then cold-rolling and annealing are repeated to finish it to a predetermined thickness by cold-rolling.
A copper foil that satisfies the specified ranges for the above-mentioned repeated bending workability, tensile strength, and density of shear bands is determined by the temperature increase rate of the final recrystallization annealing and the final cold rolling performed immediately after the final recrystallization annealing. It is obtained by adjusting the total processing degree, which is a processing condition, and the processing degree of the first pass. Here, the final recrystallization annealing is a recrystallization annealing before the final cold rolling for processing to the thickness of the product. In the final cold rolling, the material is repeatedly passed between a pair of rolls (hereinafter referred to as “pass”) to finish the thickness. Here, the first pass indicates the first pass in the final cold rolling in which the material after the final recrystallization annealing is finished to the product thickness.
The temperature increase rate of the final recrystallization annealing may be 12 to 50 ° C./s. When the rate of temperature increase is less than 12 ° C./s and when it exceeds 50 ° C./s, it is difficult to satisfy the above-described repeated bending workability.
The total work degree of final cold rolling should just be 85% or less. Here, the degree of work represents a percentage obtained by dividing the difference in thickness between before and after rolling by the thickness before rolling. When the total workability of final cold rolling exceeds 85%, it is difficult to satisfy the above-described repeated bending workability. Further, the lower limit value of the total workability may be set so as to exceed the lower limit value of the tensile strength, although it varies depending on the alloy components and the concentration.
The degree of processing in the first pass of the final cold rolling may be 20% or less. When the degree of work in the first pass of the final cold rolling exceeds 20%, a shear band is likely to be generated, so that the specified density of the shear band cannot be satisfied, and the above-described repeated bending workability is satisfied. Is difficult.
本発明の銅合金板は、リードフレーム、コネクタ、ピン、端子、リレー、スイッチ、二次電池用箔材等の電子機器部品等に使用することができる。また、特に、本発明の銅合金板は、LED照明を実装したFPCの材料として好適である。 The copper alloy plate of the present invention can be used for electronic device parts such as lead frames, connectors, pins, terminals, relays, switches, and foil materials for secondary batteries. In particular, the copper alloy plate of the present invention is suitable as an FPC material on which LED lighting is mounted.
以下に本発明の実施例を示すが、これらの実施例は本発明及びその利点をよりよく理解するために提供するものであり、発明が限定されることを意図するものではない。 Examples of the present invention are shown below, but these examples are provided for better understanding of the present invention and its advantages, and are not intended to limit the invention.
[圧延銅箔の製造]
無酸素銅に各種元素を添加し、厚み100mmのインゴットを鋳造した。次に、インゴットを熱間圧延にて5mmまで圧延し、酸化スケールを除去した後、冷間圧延と焼鈍を繰り返し、最終冷間圧延にて表1、2に記載の条件で0.05〜0.3mmまで圧延した。最終再結晶焼鈍は表1、2に記載の昇温速度で、材料温度が最高で500℃となるよう加熱し、室温(25℃)から500℃まで到達する時間から、昇温速度を算出した。そして、材料温度が500℃に到達後、直ちに冷却を行った。
[Manufacture of rolled copper foil]
Various elements were added to oxygen-free copper to cast an ingot having a thickness of 100 mm. Next, the ingot is rolled to 5 mm by hot rolling, and after removing the oxide scale, cold rolling and annealing are repeated, and 0.05 to 0 under the conditions shown in Tables 1 and 2 by final cold rolling. Rolled to 3 mm. The final recrystallization annealing was performed at the rate of temperature increase described in Tables 1 and 2, and the material temperature was heated to 500 ° C. at maximum, and the rate of temperature increase was calculated from the time to reach 500 ° C. from room temperature (25 ° C.). . And it cooled immediately after material temperature reached | attained 500 degreeC.
[形状維持性]
JIS Z 2241に準じて、圧延平行方向が長手方向となるように採取したJIS13B号試験片を供試材とし、引張り試験により引張強さを求めた。引張り試験では、ORIENTEC社製のUTM−10Tを用い、引張り速度5mm/分にて、同一試料につきn=2で測定した平均値を測定値とした。形状維持性は、引張強さ350MPa以上の場合、良好(○)と評価した。また、350MPa未満の場合形状維持性は不良(×)と評価した。
[Shape maintenance]
In accordance with JIS Z 2241, a JIS No. 13B test piece collected so that the rolling parallel direction was the longitudinal direction was used as a test material, and the tensile strength was obtained by a tensile test. In the tensile test, UTM-10T manufactured by ORIENTEC Co., Ltd. was used, and the average value measured at n = 2 for the same sample at a tensile speed of 5 mm / min was used as the measured value. The shape maintainability was evaluated as good (◯) when the tensile strength was 350 MPa or more. In addition, when the pressure was less than 350 MPa, the shape maintainability was evaluated as poor (x).
[放熱性]
最終冷間圧延後の板厚にて、JIS H 0505に準拠した四端子法により測定した導電率(%IACS)にて評価した。
[Heat dissipation]
The plate thickness after the final cold rolling was evaluated by the conductivity (% IACS) measured by the four-terminal method based on JIS H 0505.
[せん断帯存在密度]
最終冷間圧延後の材料につき、CPにて圧延平行方向に材料を切断して、SEMによる断面像を得た。圧延面に対して30〜60度傾いた圧延組織との不連続な部分をせん断帯と判定した。材料厚みを4等分する厚み方向に垂直な3本の直線の内、中心線を除いた残り2本の直線について、各々の長さ100T、すなわち、合計長さ200Tを観察範囲として、各直線と交差するせん断帯の個数を電子顕微鏡のモニター上で目視にて評価した。せん断帯の個数の評価を例示すると、図1に示す模式図のように観察された場合、材料厚みを4等分する厚み方向に垂直な3本の直線の内、中心線を除いた残り2本の直線に交差するせん断帯の個数は4である。また、図2に、銅合金板を圧延平行方向に切断して観察したときのSEM断面写真を示す。図2において、点線で示す部分がせん断帯である。
[Shear band density]
About the material after the last cold rolling, material was cut | disconnected in the rolling parallel direction by CP, and the cross-sectional image by SEM was obtained. A discontinuous portion with the rolling structure inclined by 30 to 60 degrees with respect to the rolling surface was determined as a shear band. Among the three straight lines perpendicular to the thickness direction that divide the material thickness into four equal parts, the remaining two straight lines excluding the center line are each length 100T, that is, the total length 200T is used as the observation range. The number of shear bands intersecting with was visually evaluated on an electron microscope monitor. As an example of the evaluation of the number of shear bands, when observed as in the schematic diagram shown in FIG. 1, the remaining 2 excluding the center line among the three straight lines perpendicular to the thickness direction dividing the material thickness into four equal parts. The number of shear bands that intersect the straight line of the book is four. Moreover, the SEM cross-section photograph when a copper alloy plate is cut | disconnected in the rolling parallel direction and observed in FIG. 2 is shown. In FIG. 2, the portion indicated by the dotted line is a shear band.
[耐熱性]
上記のJIS13B号試験片を用い、これを加熱炉に入れて温度が200℃に達した後に30分間保持して試料を取り出し、空冷して引張り試験に供した。引張り試験は、上記の形状維持性と同じ条件で実施した。耐熱性は、引張強さ250MPa以上を「○」、250MPa未満を「×」とした。
表1及び2に評価条件及び結果を示す。
[Heat-resistant]
Using the above JIS13B test piece, the sample was put in a heating furnace and, after the temperature reached 200 ° C., held for 30 minutes, the sample was taken out, air-cooled, and subjected to a tensile test. The tensile test was performed under the same conditions as the above shape maintainability. As for heat resistance, a tensile strength of 250 MPa or more was indicated by “◯”, and a tensile strength of less than 250 MPa was indicated by “x”.
Tables 1 and 2 show the evaluation conditions and results.
[繰返し曲げ加工性]
以下の手順で、繰返し曲げ加工性を評価した。
(1)圧延平行方向および直角方向につき、長さ50mm×幅10mmに試料を切り出した。
(2)曲げR=0.5mmにて、90°にV曲げ加工し、これを元の短冊状に曲げ戻した後、90°V曲げ加工と曲げ戻しを繰り返した。
(3)上記操作を繰り返して、1回毎に90°V曲げした時の曲げ加工部を50倍に拡大観察し、クラックまたは破断発生の有無を確認した。そして、クラックまたは破断が発生しない最大曲げ回数を調査した。クラックが発生しない最大曲げ回数が5回以上を「◎」、4回を「○」、3回を「△」、3回未満を「×」として評価した。
以上の評価条件とその結果を表1、2に示す。
[Repeated bending workability]
Repeated bending workability was evaluated by the following procedure.
(1) A sample was cut into a length of 50 mm and a width of 10 mm in the rolling parallel direction and the perpendicular direction.
(2) V-bending was performed at 90 ° at a bending R = 0.5 mm, and this was bent back to the original strip shape, and then 90 ° V bending and bending back were repeated.
(3) The above operation was repeated, and the bent portion when bent 90 ° V every time was magnified 50 times to confirm whether cracks or breakage occurred. Then, the maximum number of bendings at which cracks or breakage did not occur was investigated. The maximum number of bendings at which cracks did not occur was evaluated as “」 ”for 4 times or more,“ ◯ ”for 4 times,“ Δ ”for 3 times, and“ x ”for less than 3 times.
The above evaluation conditions and the results are shown in Tables 1 and 2.
実施例1〜33は、いずれも添加元素濃度が0.01質量%以上、且つ、各元素の濃度が上限値以下であり、引張強さが350MPa以上、200℃で30分間加熱後の引張強さが250MPa以上、せん断帯の存在密度が300以下であることから、いずれも放熱性(導電率)、繰返し曲げ加工性、形状維持性及び耐熱性に優れていた。
比較例1は、添加元素の無い純銅であり、耐熱性が悪かった。
比較例2は、Snを添加しているが、濃度が0.01質量%未満であるため、耐熱性が悪かった。
比較例3は最終冷間圧延の総加工度が85%を超えているため、せん断帯密度が規定数を満たしておらず、繰返し曲げ加工性が悪かった。
比較例4は、添加元素濃度が高すぎるため、導電率が低くて放熱性が悪かった。
比較例5と9は、最終冷間圧延における圧延総加工度は85%以下であるが、最終冷間圧延における1パス目の加工度が20%を超えているため、せん断帯密度が規定数を満たしておらず、繰返し曲げ加工性が悪かった。
比較例6は、最終冷間圧延における圧延総加工度は85%以下であるが、最終再結晶焼鈍における昇温速度が12℃/s未満となっているいため、せん断帯密度が規定数を満たしておらず、繰返し曲げ加工性が悪かった。
比較例7は、最終冷間圧延における圧延総加工度は85%以下であるが、最終再結晶焼鈍における昇温速度が50℃/sを超えているため、せん断帯密度が規定数を満たしておらず、繰返し曲げ加工性が悪かった。
比較例8は、最終再結晶焼鈍における総加工度が低すぎるため、引張り強さが350MPa未満となっており、形状維持性が悪かった。
In Examples 1 to 33, the additive element concentration is 0.01% by mass or more, the concentration of each element is not more than the upper limit value, the tensile strength is 350 MPa or more, and the tensile strength after heating at 200 ° C. for 30 minutes. Since the thickness is 250 MPa or more and the existence density of the shear band is 300 or less, all of them were excellent in heat dissipation (conductivity), repeated bending workability, shape maintenance, and heat resistance.
Comparative Example 1 was pure copper with no additive elements and had poor heat resistance.
In Comparative Example 2, Sn was added, but the heat resistance was poor because the concentration was less than 0.01% by mass.
In Comparative Example 3, the total workability of final cold rolling exceeded 85%, so the shear band density did not satisfy the specified number, and the repeated bending workability was poor.
In Comparative Example 4, the additive element concentration was too high, so the conductivity was low and the heat dissipation was poor.
In Comparative Examples 5 and 9, the total degree of rolling in the final cold rolling is 85% or less, but since the degree of processing in the first pass in the final cold rolling exceeds 20%, the shear band density is the specified number. The repeated bending workability was poor.
In Comparative Example 6, the total degree of rolling in the final cold rolling is 85% or less, but since the temperature increase rate in the final recrystallization annealing is less than 12 ° C./s, the shear band density satisfies the specified number. The repeated bending workability was poor.
In Comparative Example 7, the total degree of rolling in the final cold rolling is 85% or less, but since the temperature increase rate in the final recrystallization annealing exceeds 50 ° C./s, the shear band density satisfies the specified number. The repeated bending workability was poor.
In Comparative Example 8, since the total degree of work in final recrystallization annealing was too low, the tensile strength was less than 350 MPa, and the shape maintainability was poor.
Claims (6)
導電率が60%IACS以上であり、
引張強さが350MPa以上であり、
圧延平行断面において、材料厚みTを4等分する厚み方向に垂直な3本の直線の内、中心線を除いた残り2本の直線について、各々の長さ100Tの観察範囲において、各直線と交差するせん断帯の個数nが、
n≦300
を満たし、
材料厚みTが0.05〜0.3mmである銅合金板。 It contains 0.01% by mass or more in total of at least one selected from the group consisting of Ag, Cr, Fe, In, Ni, P, Si, Sn, Ti, Zn and Zr, and Ag is 1.0% by mass or less. , Ti is 0.08 mass% or less, Ni is 2.0 mass% or less, Zn is 3.5 mass% or less, and Cr, Fe, In, P, Si, Sn, and Zr are selected from these groups 1 type or more in total, containing 0.5% by mass or less, consisting of the balance Cu and impurities,
Conductivity is 60% IACS or higher,
The tensile strength is 350 MPa or more,
In the rolling parallel cross section, among the three straight lines perpendicular to the thickness direction that divide the material thickness T into four equal parts, the remaining two straight lines excluding the center line, The number of intersecting shear bands n is
n ≦ 300
Meet the,
A copper alloy plate having a material thickness T of 0.05 to 0.3 mm .
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