JP6159273B2 - Charged particle beam apparatus, charged particle beam apparatus sample observation method, and charged particle beam apparatus display control program - Google Patents

Description

  The present invention relates to a charged particle beam apparatus.

  In recent years, the use and frequency of use of a charged particle beam apparatus typified by a scanning electron microscope have increased, and the number of beginners who do not have specialized knowledge has increased as users of charged particle beam apparatuses.

  For this reason, in the techniques described in Patent Documents 1 and 2, first, photographing is performed under a plurality of simple observation conditions before the main photographing, and a plurality of simple observation images obtained are displayed in a list on the display unit. (E preview). Subsequently, the user selects a desired simple observation image from among the plurality of displayed simple observation images. Then, the computer sets the observation conditions in the simple observation image selected by the user. Thereafter, the user performs necessary manual adjustment on the selected simple observation image and performs photographing. As a result of this imaging, an image obtained is displayed on the display unit of the charged particle beam apparatus.

Japanese Patent No. 4014916 Japanese Patent No. 4014917

  As a result of investigating and investigating that the number of beginners becoming users of charged particle beam devices has increased, the inventor of the present application has not been able to effectively use charged particle beam devices, and has not been able to improve skills, but satisfied with device performance I found the problem of using the data without obtaining it. In this background, the number of skilled charged particle beam devices has decreased due to the change of generations, the number of light users who cannot spend time to acquire operating skills of charged particle beam devices has increased, and charged particle beam devices have It is speculated that there are an increasing number of companies that do not have a dedicated operator who is familiar with them, and an increased learning burden on users of charged particle beam devices.

  The conventional charged particle beam apparatus cannot cope with such a problem. For example, the techniques described in Patent Documents 1 and 2 have the following problems.

  (1) The beginner cannot recognize which one of the plurality of simple observation images is good.

  (2) Since the beginner does not notice even if a defect occurs in the obtained image, the image is acquired as it is.

(3) beginners, also aware of a problem because there do not know the solution, and as it is acquired.

  In other words, even if a plurality of simple observation images obtained are displayed in a list on the display unit before the actual photographing, a novice user still cannot effectively use the charged particle beam device and cannot improve his skill. It will continue to be used without obtaining satisfactory data commensurate with performance.

  An object of the present invention relates to the realization of a charged particle beam apparatus that can acquire good data with minimal user learning and that the user can improve through operation and feel a sense of accomplishment.

  The present invention includes a control unit that controls a charged particle source, a charged particle optical system, a detector, a sample stage, a sample chamber, and an image display device. The control unit includes a bright image in which the sample image is distorted. A message confirming to the operator whether there is a phenomenon of unevenness, no three-dimensional effect, or blurred image, and the sample image is distorted, uneven in brightness, or three-dimensional A sample image includes a first button that the operator presses when a phenomenon that does not feel is occurring, and a second button that the operator presses when a phenomenon that the image is blurred is generated on the sample screen. In addition, the present invention relates to a charged particle beam apparatus that displays on a display unit and displays a message describing the cause on the display unit according to an observation condition when a first button or a second button is pressed.

  According to the present invention, even a beginner can easily recognize whether a photographing result is good or bad and know the cause and the solution, thereby improving the skill of the charged particle device, and as a result, the image can be improved.

It is a schematic block diagram of the electron microscope apparatus concerning an Example. It is a flowchart which shows the operation procedure of the electron microscope concerning an Example. It is a figure which shows the example of the operation screen after an image preservation | save. It is a figure which shows the example of the operation screen at the time of the image confirmation by a user. It is the table | surface which put together the item displayed on the application assist solution screen concerning an Example by one apparatus version. It is the table | surface which put together the item displayed on the application assist solution screen concerning an Example by another one apparatus version. It is the table | surface which put together the item displayed on the application assist solution screen concerning an Example by another one apparatus version. It is the table | surface which put together the item displayed on the application assist solution screen concerning an Example by another one apparatus version. It is the table | surface which put together the item displayed on the application assist solution screen concerning an Example by another one apparatus version. It is a figure of the example of a screen which shows the solution method of application assistance. It is a figure of the other example of a screen which shows the solution method of application assistance. It is a figure of the other example of a screen which shows the solution method of application assistance. It is a figure which shows the example of a resolution execution operation screen. It is a figure which shows the example of the operation screen at the time of adjustment / change of the observation conditions by a user. It is a figure which shows the other example of the operation screen at the time of adjustment / change of the observation conditions by a user. It is a figure which shows the other example of the operation screen at the time of adjustment / change of the observation conditions by a user. It is a figure which shows the example of the operation screen in the focus adjustment by a user. It is a figure which shows the other example of the operation screen in the focus adjustment by a user. It is a figure which shows the other example of the operation screen in the focus adjustment by a user. It is a figure which shows the other example of the operation screen in the focus adjustment by a user. It is a figure which shows the other example of the operation screen in the focus adjustment by a user. It is a figure which shows the other example of the operation screen in the focus adjustment by a user. It is a figure which shows the other example of the operation screen in the focus adjustment by a user. It is a figure of the other example of a screen which shows the solution method of application assistance. It is a figure which shows the example of a screen which urges | changing a vacuum mode to low vacuum. It is a figure which shows the example of an application assist solution method screen. It is a figure which shows the example of a screen which urges | changing a vacuum degree to 50 Pa. It is a front view of the electron microscope apparatus concerning an Example. It is a left side surface of the electron microscope apparatus concerning an Example. It is a right view of the electron microscope apparatus concerning an Example. It is a top view of the electron microscope apparatus concerning an Example. It is a bottom view of the electron microscope apparatus concerning an Example. It is a rear view of the electron microscope apparatus concerning an Example.

  In an embodiment, a charged particle source that emits a charged particle beam, a charged particle optical system that irradiates the sample with the charged particle beam, a detector that detects a signal generated from the sample by the irradiation of the charged particle beam, and A sample stage for holding a sample and moving the sample, a sample chamber in which the sample stage is arranged, an image display device having a display unit for displaying a sample image formed based on the signal, and the charged particle source A control unit that controls the charged particle optical system, the detector, the sample stage, the sample chamber, and the image display device, and the control unit has an image distorted in the sample image. A message confirming to the operator whether there is a phenomenon of uneven brightness, no stereoscopic effect, or blurred image, and the sample image is distorted, there is uneven brightness, Ma Is a first button that the operator presses when a phenomenon without a three-dimensional effect occurs, and a second button that the operator presses when a phenomenon in which an image is blurred appears on the sample screen Is displayed on the display unit together with the sample image, and when the first button or the second button is pressed, a message describing the cause is displayed on the display unit according to the observation conditions. An apparatus is disclosed.

  In the embodiment, a signal generated from the sample by the irradiation of the charged particle beam is detected, a sample image is formed based on the detected signal and displayed on the display unit, and the image is distorted in the sample image. A message confirming to the operator whether there is a phenomenon of uneven brightness, no stereoscopic effect, or blurred image, and the sample image has a distorted brightness unevenness Or a first button that the operator presses when a phenomenon without stereoscopic effect occurs, and a second button that the operator presses when a phenomenon that the image is blurred appears on the sample screen Is displayed on the display unit together with the sample image, and when the first button or the second button is pressed, a message describing the cause is displayed on the display unit according to the observation condition. Device sample observation method To disclosure.

  In the embodiment, the sample is irradiated with a charged particle beam generated from a charged particle beam source of a charged particle beam apparatus, a sample image is formed based on a signal generated from the sample, and displayed on a display unit. A message confirming to the operator whether the image is distorted, uneven brightness, no three-dimensional effect, or a phenomenon that the image is blurred, and the sample image is distorted When there is a phenomenon in which the image is blurred on the first button and the sample screen that the operator presses when a phenomenon occurs that the brightness is uneven, or there is no stereoscopic effect. A second button pressed by the operator is displayed on the display unit together with the sample image, and when the first button or the second button is pressed, a message describing the cause is displayed according to the observation condition. Charged particles displayed on the display It discloses a computer display control program for controlling the display unit of the device.

  In the embodiment, the control unit (display control program) confirms to the operator whether he / she wants to observe the sample image with a different image quality and the operator when observing the sample image with a different image quality. A third button to be pressed is displayed on the display unit together with the sample image, and a message describing a solution is displayed on the display unit when the button is pressed.

  In the embodiment, it is disclosed that the observation condition includes an acceleration voltage, a working distance, a condenser lens, an objective movable diaphragm, a detection signal, a degree of vacuum, and an image capturing method.

  Further, in the embodiment, it is disclosed that the observation condition includes an observation purpose.

  In the embodiment, the control unit (display control program) describes the cause and the solution according to the degree of vacuum of the sample chamber that can be set by the charged particle beam device when the first button is pressed. Displaying a message on the display unit is disclosed.

  In the embodiment, the control unit (display control program) describes the cause and the solution according to the type of detector mounted on the charged particle beam device when the first button is pressed. Displaying a message on the display unit is disclosed.

  Further, in the embodiment, when the first button is pressed, the control unit (display control program) describes the charge-up as a cause and the addition of metal coding as a solution in the observation condition under high vacuum. Displaying the received message on the display unit.

  Further, in the embodiment, when the first button is pressed, the control unit (display control program) writes a charge-up as a cause in a high vacuum observation condition, and lowers the acceleration voltage as a solution. It is disclosed that a message describing the change or switching to the low vacuum mode is displayed on the display unit.

  Further, in the embodiment, when the first button is pressed, the control unit (display control program) records charge-up as a cause in a low vacuum observation condition, and as a solution to a higher degree of vacuum. It is disclosed that a message indicating a change is displayed on the display unit.

  Further, in the embodiment, when the first button is pressed, the control unit (display control program) indicates that the sample is insufficiently installed as a cause, and displays a message indicating confirmation of sample fixation as a solution. It is disclosed that it is displayed in the section.

  In the embodiment, when the second button is pressed, the control unit (display control program) indicates that the autofocus is insufficient as a cause and displays a message indicating manual focus adjustment on the display unit. To disclose.

  Further, in the embodiment, when the second button is pressed, the control unit (display control program) indicates that the sample is insufficiently attached as a cause, and displays a message indicating confirmation of sample fixation as a solution. It is disclosed that it is displayed in the section.

  Further, in the embodiment, when the second button is pressed, the control unit (display control program) writes a calibration deviation as a cause, and displays a message indicating calibration reset as a solution. It is disclosed that it is displayed in the section.

  Further, in the embodiment, when the second button is pressed, the control unit (display control program) indicates that the resolution is insufficient as the cause under the observation condition with the low acceleration voltage, and the higher acceleration is provided as a solution. It is disclosed that a message describing a change to voltage is displayed on the display unit.

  The above and other novel features and effects of the present invention will be described below with reference to the drawings. In addition, although an electron microscope is demonstrated as an example of a charged particle beam apparatus, this invention is not only an electron microscope (a scanning electron microscope, a transmission electron microscope) but the external appearance inspection apparatus using an electron beam, an ion microscope, a focused ion. The present invention can be applied to general charged particle beam apparatuses that perform measurement, inspection, and processing, such as beam (FIB) apparatuses.

  In addition, in each drawing, about the same component, the same code | symbol is attached | subjected and description is abbreviate | omitted.

[Configuration of electron microscope]
FIG. 1 is a schematic configuration diagram of an electron microscope apparatus (electron microscope) according to the present embodiment.

  In the electron microscope (charged particle beam apparatus, sample observation system) 101 of FIG. 1, a primary electron beam 2 emitted from an electron gun 1 is converged by a converging lens 3 and an objective lens 8, and an upper stage deflector 6 and a lower stage deflector. 7 irradiates the sample 9 fixed to the sample table 24. A signal generated from the sample 9 is detected by the detector 10 and supplied to a computer (processing unit) 19 via circuits 11 to 17 described later. Then, a signal recorded corresponding to the scanning position processed by the computer 19 is displayed on the display unit of the image display device 18.

  Signals include secondary electrons, reflected electrons, cathode light, transmitted electrons, scattered electrons, and the like. It is also possible to perform elemental analysis by detecting characteristic X-rays generated from the sample 9 with an X-ray detector.

  A sample stage 25 having the detector 10 and a sample moving mechanism is disposed in a sample chamber (not shown). The lower part of the sample chamber is connected to an evacuation system including a mirror body (not shown) and a vacuum pump (not shown) for venting and evacuating the sample chamber.

The electron microscope 101 includes a high-vacuum scanning electron microscope (SEM) that performs observation under a high vacuum (10 ⁻³ to 10 ⁻⁴ Pa) in the sample chamber, a normal high-vacuum observation, and a sample chamber. Are classified into low vacuum SEMs that can be observed with a low vacuum (several thousand Pa to several Pa). A detection signal generally used in high-vacuum observation is secondary electrons (SE), and the detector 10 can use the secondary electron detector to obtain an image reflecting unevenness information on the sample surface.

  Further, when backscattered electrons (BSE) are detected as a detection signal by a backscattered electron detector, an image reflecting the composition distribution on the sample surface can be obtained.

  In low-vacuum observation, secondary electrons that are usually used as detection signals during high-vacuum observation have a very low retained energy of several tens eV or less, so in a low-vacuum atmosphere, they easily lose energy by colliding with residual gas, A commonly used secondary electron detector cannot be reached. Therefore, in low vacuum observation, reflected electrons having substantially the same energy as the primary electron beam 2 are detected as signals, and an image reflecting the composition distribution on the sample surface is obtained.

  Recently, however, a detector that can detect the secondary electron gas amplification signal, such as a UV detector, has been developed so that even in a low vacuum, an image reflecting the unevenness of the sample surface that closely resembles a high vacuum secondary electron image can be obtained. became. The UV detector detects light obtained by the light emission phenomenon of gas scintillation in a low vacuum atmosphere.

  An X-direction astigmatism corrector 4 and a Y-direction astigmatism corrector 5 are provided to focus the primary electron beam 2 on the sample 9 in a point shape, and astigmatism can be corrected by adjusting these control conditions. . Further, the focus adjustment can be performed on the sample 9 by adjusting the excitation intensity of the convergent lens 3 or the objective lens 8.

  The above electron optical system is housed in the electron microscope column 100.

  Also, these are a high voltage control circuit 11, a focusing lens control circuit 12, an X direction astigmatism corrector control circuit 13, a Y direction astigmatism corrector control circuit 14, a deflector control circuit 15, an objective lens control circuit 16, and a detection. It is controlled by a computer 19 such as a CPU (Central Processing Unit) through a signal control circuit 17. The sample stage 25 and the vacuum exhaust system are also controlled by the computer 19.

  In addition, each control circuit 11-17 may be provided separately, or may be provided on one board | substrate. Further, it may be included in the computer 19. An image display device 18, a storage device (storage unit) 21, and a memory 22 are connected to the computer 19. As will be described later, via the operation screen 200 displayed on the image display device 18, the user can set the focus condition of the objective lens 8 and the astigmatism correction conditions of the X-direction astigmatism corrector 4 and the Y-direction astigmatism corrector 5. adjust. Further, the display content of the operation screen 200 in the present embodiment is stored in advance in the storage device 21 corresponding to each operation stage, as will be described later. If the computer 19 is connected to a network (not shown), the operation screen 200 may be stored in another storage device connected to the network.

  Further, an operation program (including a display control program) 31 is expanded in the memory 22, and the operation program 31 is executed by the computer 19. The operation program 31 displays an operation screen 200 on the image display device 18 and controls each unit 1 to 17 based on information input via the input device 23.

  The operation screen 200, which will be described in detail later, is each screen displayed according to the user's operation stage.

[Operating procedure]
FIG. 2 is a flowchart illustrating the operation procedure of the electron microscope according to the present embodiment. The operation procedure of the present embodiment will be described along FIG. 2 with reference to FIG. 1 as appropriate.

  First, the user (operator) starts the operation screen 200 (FIGS. 3, 4, and 10 to 27) by starting the operation program 31 stored in the memory 22 (step S101). After the sample chamber is opened to the atmosphere by clicking the atmosphere release button D152 (FIG. 13) on the operation panel screen 203 (step S102), the sample 9 is set (step S103). The sample chamber is evacuated by clicking the evacuation button D153 (FIG. 13) (step S104), and then the [beam on] button D154 (FIG. 13) is pressed (step S105). Then, the sample 9 is scanned to obtain a scanned image (image).

  In accordance with the operation program 31, the computer 19 displays the acquired image on the sample image display screen 202 of the image display device 18. Here, the observation condition is a combination of parameter setting values of the electron microscope 101. Subsequently, the user performs a field of view search, magnification adjustment, and the like on the acquired image using the operation panel screen 203 (step S106).

  The computer 19 scans the sample 9 at any time with the field of view and magnification set in step S106, acquires an image, and displays it on the image display screen 202 of the image display device 18.

  Then, after the user performs image adjustment such as focus and brightness on the operation panel screen 203 (step S107), the user clicks the “image capture / save button” to store the image displayed on the image display device 18 in the storage device 21. Save (step S108). In the present embodiment, storing an image in the storage device 21 is appropriately referred to as “photographing”.

  Subsequently, the user determines whether the acquired image is OK (step S109).

  If the result of step S109 is that the image is OK, the user ends the process.

  If the result of step S109 is that the image is not OK, that is, if the image is NG or there is a point to be worried about, the user displays a Tips screen (displays operation advice or the like) A3 in the operation guide screen 201 (FIG. 3). ) Or the like is pressed (step S110). Then, a typical NG image example B132 and its comment are displayed in a separate window on the application assist screen 300 (FIG. 4) (step S111). Alternatively, even if the user does not determine that the image is NG or a point of interest, the operation program 31 automatically determines the acquired image, and displays the Tips screen A3 in the operation guide screen 201 instead of a separate window. An “application assist” button A124 that displays a typical NG image example, its cause and solution, and a proposal for the next operation may be automatically displayed.

  The user compares the image C51 stored in FIG. 3 with the NG image example B132, and displays buttons (B131a (first button), B131b (second button) that are similar to the stored image and are displayed. ), B131c (third button)) is pressed (step S112). Then, the device version (observation of only high vacuum, both high vacuum and low vacuum can be observed), the presence / absence of optional detectors (BSE detector, UV detector) of the device version, and current observation conditions (this implementation) In the example, the observation purpose and expression, specific parameters depend on the acceleration voltage, working distance, condenser lens (expressed as spot intensity here), objective movable diaphragm, detection signal, degree of vacuum, image capturing method, etc. Several “causes” and “solutions” corresponding to each are displayed in separate windows (step S113, FIG. 10, FIG. 11, FIG. 12).

  The user performs readjustment or change of the observation purpose in accordance with a solution selected from several solutions displayed on the display screen (step S116), but the details of the solution are more detailed. If it is desired to confirm the explanation, it is also possible to confirm the contents by pressing the “I want to know” button arranged in the solution display field (step S114). When the “solve” button C142 is arranged in the solution display column, the “solve” button C142 is pressed (step S115), thereby transitioning to an operation screen for solving. The computer 19 scans the sample 9 at any time under the adjusted / changed observation conditions, acquires an image, and displays the image on the image display device 18.

  Then, the operation program 31 returns the process to step S102 or S107. The user causes the storage device 21 to store (capture) the image displayed on the image display device 18 by the computer 19 again.

  Thereafter, the electron microscope 101 repeats the processes of steps S102 to S116 or steps S109 to S116.

[Configuration of operation screen]
FIG. 3 described above shows an example of the operation screen after image storage (photographing). First, an example of the operation screen according to the present embodiment will be described with reference to FIG.

  The operation screen (display unit) 200 includes an operation guide screen 201, an image display screen (image display unit) 202, and an operation panel screen 203. Each screen 201-203 will be described later.

  The operation guide screen 201 is a screen showing an operation procedure. On the operation guide screen 201, a main item A1 and a sub item A2 of the main item are displayed as the current operation procedure. This makes it easy for beginners to grasp the operation procedure. Further, depending on the operation procedure, a Tips screen A3 for displaying operation advice or the like may be displayed. The image display screen 202 is a screen on which an image (scanned image) by the electron microscope 101 is displayed.

  The operation panel screen 203 is a screen for changing or adjusting the shooting conditions.

  Note that the content displayed on each of the screens 201 to 203 is changed depending on the stage of the operation performed by the user as will be described later.

  The operation screen 200 according to the present embodiment is based on the premise that the user is a beginner.

[Operation screens at each operation stage]
Next, with reference to FIGS. 3 to 27, display contents of the operation screen 200 related to application assist will be described. In addition, about the element which comprises each screen 201-203 in subsequent drawings, only a required element is attached | subjected in the screen used as description object, and another code | symbol is abbreviate | omitted. Further, the reference numerals of the operation screen 200 and the screens 201 to 203 are attached to almost all the drawings in FIGS. 4 to 27, but the description of the operation screen 200 and the screens 201 to 203 is omitted in each drawing. Yes.

  Also, FIG. 1 is referred to as appropriate, and step numbers indicate the step numbers in FIG.

  FIG. 3 is a diagram illustrating an example of the operation screen after image storage (step S108).

  The operation guide screen 201 indicates that the current operation stage is the “image storage” A2 stage of “4.

  A continue button A122 and an end button A123 are displayed on the screen A121 of the operation guide screen 201. When the user is satisfied with the current image and continuously observes another field of view of the same sample or another sample set on the same sample stage 24, the continuation button A122 is pressed, and “2. The screen returns to the “magnification adjustment / field search” screen (not shown in FIG. 3). Further, when ending the observation, the end button A123 is pressed, the “stop” screen of “5. end” (not shown in FIG. 3) is displayed, and the operation program 31 ends the processing.

  The image display screen 202 displays an observation history C121 along with the image C51 under the current observation conditions. The images stored so far (observation history C121) are displayed together with information (file names and observation conditions) that the user wants to set or confirm. When the user presses the observation history C121, this image is enlarged and displayed.

  Further, when the user places the mouse on an image displayed in the observation history C121, detailed observation conditions and the like in the image may be displayed.

  The operation panel screen 203 displays buttons and the like corresponding to the current operation stage, but a description thereof is omitted here.

  When the image C51 is saved, a message that causes the user to determine whether there is a point in the image C51 that the user has just saved is displayed on the Tips screen A3. If it is determined that there is a point that the user is interested in, the application assist button A124 displayed on the Tips screen A3 can be pressed to move to a step for improving the image.

  FIG. 4 is a diagram showing an example of an operation screen when the user confirms an image, and shows the image display screen 202 after the application assist button A124 is pressed. The computer 19 displays on the application assist screen 300 a typical NG image example B132 that may be expected to improve the image quality examined by the manufacturer and its comment. In other words, along with the message “Is there anything you care about in the captured image? I will teach you how to solve it. It may be a better image than the current one.” The image is distorted, the brightness is uneven, the volume is not three-dimensional, the image is blurred, and different image quality can be obtained using different conditions. A comment “I want to see with a different image quality” prompting the user to change the observation condition to know is displayed together with a typical image B132.

  In the comment “I want to use a different image quality”, the user can see that different images can be obtained by observing images under different conditions by displaying images acquired under the same field of view under different conditions or by emphasizing images B132c in parallel. Can be noticed. Since it is difficult for a beginner to determine whether or not a stored image is optimal, it is often satisfied even when an optimal image is not actually obtained. By displaying a specific NG image or the like on the application assist screen 300 as in the present embodiment, the user can notice that the obtained image is not an optimal image. The reason why the user does not notice that the image is not optimal is roughly classified into three, and therefore, an NG-weighted image is displayed as the three buttons B131a, B131b, and B131c.

  Here, although the application assist button B131a displays “the image is distorted”, “the brightness is uneven”, or “no three-dimensional effect”, these are one button that “the image is not blurred but I am interested” Then, it may be displayed on the application assist screen 300 in a classification such as “I'm worried about the image not being blurred”, “I'm worried about the image”, or “I want to see another image quality”.

  In addition, as a phenomenon that occurs when a good image cannot be obtained by the SEM displayed on the application assist screen 300, items such as “the image is rough”, “the sample structure cannot be seen”, and “the sample is deformed” may be provided.

  Here, when the user presses the buttons B131a, B131b, and B131c shown on the application assist screen 300, the computer 19 displays the application assist solution screen 400 corresponding to the button B131 pressed according to the operation program 31 (FIGS. 10 and 10). 11, FIG. 12) is displayed. In other words, the version of the device currently being observed (only high vacuum can be observed, both high vacuum and low vacuum can be observed), the presence / absence of optional detectors (BSE detector, UV detector) of the above-mentioned device version, and the present Observation conditions (in this embodiment, observation purpose and expression, specific parameters are acceleration voltage, working distance, condenser lens (expressed as spot intensity here), objective movable diaphragm, detection signal, degree of vacuum, image capture The storage device 21 stores an application assist solution screen 400 corresponding to each button B131 shown on the application assist screen 300 in accordance with the method.

  When the button B131 shown on the application assist button screen 300 is pressed, the computer 19 acquires the application assist solution screen 400 corresponding to the pressed button B131 from the storage device 21 according to the operation program 31. Then, the computer 19 displays the application assist solution screen 400 acquired according to the operation program 31 on the image display device 18.

  Although details will be described later with reference to FIGS. 10 to 12, the application assist solution screen 400 includes a “cause” and a “solution” corresponding to the phenomenon described in the button B 131 displayed on the application assist screen 300. Are displayed from the top in order of priority for the user. In addition, by displaying the list in the form of a list like the application assist solution screen 400, the user can easily confirm the “cause” and “solution” corresponding to the phenomenon, and deepen knowledge for obtaining the optimum SEM image. be able to.

  Furthermore, a “Solution” button C141 (FIG. 10) and a “Solution” button C142 (FIG. 10) are arranged in the “Solution”. When the user presses the “I want to know” button C141, more detailed contents such as the reason and matters that are the basis of the solution are displayed in another window, and the user can further deepen the knowledge about the SEM. When the “solve” button C142 is pressed, an operation screen for solving is displayed.

  5 to 9 show the items displayed on the application assist solution screen of the currently observed device version (only high vacuum can be observed, both high vacuum and low vacuum can be observed). The table is compiled for each option detector (BSE detector, UV detector). The “currently selected observation purpose” in the tables shown in FIGS. 5 to 9 is the currently used observation conditions. Specific parameters include acceleration voltage, working distance, and condenser lens. (Here, expressed as spot intensity), objective movable diaphragm, detection signal, degree of vacuum, image capturing method, and the like.

In this embodiment, instead of setting the parameters of the user viewing conditions, the optimum parameter settings in accordance with an observation purpose selected by the user is to be set automatically. The choices for the purpose of observation are the observation conditions that the user often uses or wants the user to use, and are the conditions that even a beginner can grasp and select. There are all types of observation purposes: “standard observation”, “observation that emphasizes surface structure”, “observation that emphasizes material distribution”, “observation that emphasizes surface structure and material distribution”, “observation that emphasizes structure” The observation objectives for high vacuum observation are “standard observation”, “observation that emphasizes the surface structure”, “observation that emphasizes the material distribution”, “ There are a maximum of five observations: “observation emphasizing surface structure and material distribution” and “observation analyzing elements”. The observation objectives for low-vacuum observation are "observation that emphasizes material distribution", "observation that emphasizes surface structure and material distribution", "observation that emphasizes structure", "observation that emphasizes surface structure", There are a maximum of five “observations for analyzing elements”.

  Hereinafter, the details of each observation purpose will be described with reference to FIGS.

  Observation purpose “Standard observation” is a default observation purpose, and is a basic observation condition of SEM (Scanning Electron Microscope), which is an observation condition for obtaining a sharp concavo-convex structure on a sample surface even at high magnification. It has become. In other words, “standard observation” is a condition that allows a beginner who does not know which condition is appropriate for a conductive sample to easily obtain satisfactory data.

  By using such observation conditions, beginners become more motivated to use a charged particle beam device by experiencing that shooting with a charged particle beam device is not difficult and can be easily performed. It is expected to be an opportunity for improvement.

  The observation conditions that can provide a sharp concavo-convex structure on the surface of the sample even at high magnifications are conditions that provide high resolution. By using such observation conditions, the user can acquire an image at a high magnification, for example, 100,000 times relatively easily without being aware of the magnification. Specific parameter setting values are, for example, an acceleration voltage of 15 kV, a working distance of 5 mm, a condenser lens with strong excitation, a small aperture diameter of the objective movable diaphragm, a detection signal of secondary electrons, a high degree of vacuum, and an image capture The method is Slow. Here, important parameter set values are the acceleration voltage and the detection signal. The resolution is theoretically higher as the acceleration voltage is higher.

  Further, since secondary electrons have a weak energy of several eV and can only be generated from about 10 nm of the sample surface, if secondary electrons are used as detection signals, an image that more reflects the uneven structure of the surface can be obtained. it can.

  In a scanning electron microscope, it is usually possible to observe up to an acceleration voltage of 30 kV. However, if the acceleration voltage is too high, in an actual sample, the depth of penetration of the electron beam by the primary electron beam 2 into the sample becomes deep. As a result, internal information is mixed with secondary electrons emitted by electron beam irradiation, making it difficult to obtain an image reflecting the uneven structure of the sample surface.

  The observation purpose “observation that emphasizes the surface structure” is an observation condition in which fine unevenness on the sample surface, which was difficult to observe by “standard observation”, can be displayed more three-dimensionally. Specific parameter setting values include, for example, an acceleration voltage of 5 kV, a working distance of 5 mm, a strong excitation of the condenser lens, a small aperture diameter of the objective movable aperture, a detection signal of a secondary electron or secondary electron amplification signal, and a degree of vacuum. High vacuum or low vacuum. The difference between “observation that emphasizes the surface structure” and “standard observation” is that the acceleration voltage is changed from 15 kV to 5 kV. When the acceleration voltage is changed from 15 kV to 5 kV, the resolution is lowered, and the magnification at which a sharp image can be obtained is about 50,000 times. In addition, since the depth of penetration of the electron beam by the primary electron beam 2 into the sample becomes shallow, an image in which the uneven structure on the sample surface is more emphasized is obtained.

  Furthermore, only for the purpose of observation “observation that emphasizes the surface structure”, the image capturing method is set to a method that is difficult to charge up. For example, integration that forms an image by superimposing images captured by fast scanning is used. Further, during low vacuum observation, the detection signal is a secondary electron amplification signal.

  The observation purpose “observation that emphasizes the material distribution” is an observation condition in which a difference in material can be displayed with contrast of light and dark in a sample made of different materials such as a composite material and a foreign material. Specific parameter setting values are, for example, an acceleration voltage of 15 kV, a working distance of 5 mm, a condenser lens of medium excitation, a small aperture diameter of the objective movable aperture, a detection signal of backscattered electrons, and a degree of vacuum of high or low vacuum. The image capturing method is Slow. The difference between “observation that emphasizes the material distribution” and “standard observation” is that the detection signal is backscattered electrons, and the excitation current of the condenser lens is slightly weakened to increase the irradiation current. A feature of backscattered electrons is that the difference in materials can be expressed by a contrast difference. The heavier the material, the higher the reflectivity and the more signals are generated, resulting in a brighter image and the difference in material can be displayed with a contrast of light and dark. Further, since the backscattered electrons have almost the same energy as the incident electrons, the backscattered electrons generated inside the sample are also detected. For this reason, internal information is mixed as compared with secondary electrons, resulting in poor resolution. In addition, as the degree of vacuum becomes worse during low-vacuum observation, the image becomes more noisy and the resolution becomes worse than in high vacuum.

  Observation purpose “Observation that emphasizes surface structure and material distribution” has lower resolution than the image obtained by “Observation that emphasizes material distribution”, but it can display differences in materials with contrast of light and dark. It is. Furthermore, “observation that emphasizes the surface structure and material distribution” is an observation condition in which fine irregularities on the sample surface can be observed more stereoscopically. Specific parameter setting values include, for example, an acceleration voltage of 5 kV, a working distance of 5 mm, a condenser lens of medium excitation, a small aperture diameter of the objective movable diaphragm, a detection signal of backscattered electrons, and a degree of vacuum of high or low vacuum. The image capturing method is Slow. The difference between “observation that emphasizes the surface structure and material distribution” and “standard observation” is that the detection signal is backscattered electrons and the excitation of the condenser lens is slightly weakened. When the acceleration voltage is changed from 15 kV to 5 kV, the resolution is lowered, but an image in which the uneven structure on the sample surface is more emphasized is obtained. In addition, since the observation is performed with backscattered electrons, the difference in material can be expressed by a contrast difference. In low-vacuum observation, the worse the degree of vacuum, the more noisy the image and the worse the resolution compared to high vacuum.

  The observation purpose “observation that emphasizes the structure” is an observation purpose that is used only during low-vacuum observation, and is an observation condition for obtaining an uneven structure on the sample surface similar to “standard observation” at low vacuum. Specific parameter setting values are, for example, an acceleration voltage of 15 kV, a working distance of 5 mm, a condenser lens with medium excitation, a small aperture diameter of the objective movable diaphragm, a detection signal of a secondary electron amplification signal, a vacuum degree of low vacuum, an image The capturing method is Slow. The difference from “standard observation” is that the excitation current of the condenser lens is slightly weakened to increase the irradiation current, the detection signal is a secondary electron amplification signal, and the degree of vacuum is low. In addition, as the degree of vacuum becomes worse during low-vacuum observation, the image becomes more noisy and the resolution becomes worse than in high vacuum.

  The observation purpose “observation for analyzing an element” is an observation condition for performing EDX analysis by thickening the primary electron beam 2 and increasing the irradiation current. In “observation for analyzing elements”, the difference in materials can be displayed with contrast of light and dark. Elemental analysis can be performed by searching for a location for EDX analysis under these observation conditions, adjusting the focus, etc., and then performing an operation on the EDX apparatus side. Specific parameter setting values are, for example, an acceleration voltage of 15 kV, a working distance of 10 mm, a condenser lens with weak excitation, a small aperture diameter of the objective movable aperture, a detection signal of backscattered electrons, and a degree of vacuum of high or low vacuum. is there. The difference between “observation for analyzing the element” and “standard observation” is that the excitation current of the condenser lens is made extremely weak to increase the irradiation current in order to increase the count of X-rays generated from the sample. In addition, since elemental analysis reflects the difference in materials, backscattered electrons are used as detection signals, and the working distance is changed to 10 mm in order to efficiently capture X-rays generated from the sample. However, secondary electrons may be used as the detection signal when the backscattered electron detector is not installed in an apparatus version that can observe only high vacuum.

  FIG. 5 shows that the app assist button A124 (FIG. 3) is pressed during the observation with the apparatus version of “high vacuum SEM (only high vacuum can be observed), no BSE detector”, and the app assist screen 300 (FIG. 4) is displayed. Causes and solutions displayed on the application assist solution screen 400 (FIGS. 10, 11, and 12) when the displayed buttons B131a, B131b, and B131c are pressed, and a “solve” button C142 (FIG. 10). 11 and FIG. 12) is a table in which the presence / absence and the like of each are summarized by “currently selected observation purpose”.

  In the device version of “High vacuum SEM (only high vacuum can be observed), no BSE detector”, “Currently selected observation purpose” is “standard observation”, “observation that emphasizes surface structure”, “ 3 patterns of “elemental analysis and observation”. When the button B131a of “the image is distorted, the brightness is uneven, and there is no stereoscopic effect” is pressed on the application assist screen 300 (FIG. 4), the “observation that emphasizes the surface structure” is displayed as shown in FIG. ”And“ elemental analysis and observation ”, one of the causes displayed is“ charge-up ”, and the displayed solution is to eliminate the above phenomenon caused by the charging of electrons. At that time, the “solve” button C142 is not displayed in the solution.

  The second displayed cause is "Insufficient sample mounting", and the displayed solution is to confirm whether the fixing method (fixing with carbon tape, insufficient fixing, etc.) that the sample moves Therefore, “confirm sample fixation” is displayed, and the “solve” button C142 is not displayed.

  In addition, when observing with “Standard Observation”, the cause of the display is “Charge-up” and “Insufficient sample mounting” as in “Observation that emphasizes surface structure” and “Elemental analysis and observation”. However, in “Charge-up”, “Change to“ observation that emphasizes the surface structure ”” can be added as a solution that can suppress charge-up by changing the image capture method by lowering the acceleration voltage. Is displayed. Here, the “solve” button C142 is displayed, and when the “solve” button C142 is pressed, a message prompting the user to change the observation purpose is displayed on the screen A121 of the operation guide screen 201 as shown in FIG.

  When the “image is blurred” button B131b is pressed on the application assist screen 300 (FIG. 4), the observation purposes are “standard observation” and “elemental analysis and observation” as shown in FIG. 5B. One of the causes displayed is “Insufficient autofocus”, and the displayed solution is “Manual” to obtain a sharper image for samples that are difficult to autofocus. When “Focus adjustment” is selected and the “solve” button C142 is pressed, a message for urging manual focus adjustment is displayed on the screen A121 of the operation guide screen 201 as shown in FIG.

  The second cause displayed is “Insufficient sample mounting”, and the displayed solution is “Confirm sample fixing”, and the “Solve” button C142 is not displayed.

  The third cause displayed is "Calibration (optical axis) misalignment", and the displayed solution is "Calibration reset" to improve the autofocus accuracy, and the "Resolve" button C142 is not displayed.

  In addition, when observing with “observation that emphasizes the surface structure”, the cause displayed is “insufficient resolution” in addition to “standard observation” and “elemental analysis and observation”. As a solution for “insufficient”, “change to“ standard observation ””, which can improve the resolution by increasing the acceleration voltage, is displayed. Here, the “solve” button C142 is also displayed. When the “solve” button C142 is pressed, a message prompting the user to change the observation purpose is displayed on the screen A121 of the operation guide screen 201 (FIG. 13).

  When “I want to observe with different image quality” B131c is pressed on the application assist screen 300 (FIG. 4), the observation purpose is “standard observation”, “observation that emphasizes the surface structure” as shown in FIG. ”,“ Elemental analysis and observation ”, one of the displayed causes is“ I want to observe with a different image quality ”, and the displayed solution is“ Select another observation purpose ” . In this case, when the “solve” button C142 is pressed, a message urging to change the observation purpose is displayed on the screen A121 of the operation guide screen 201, and the observation purpose is changed by pressing the “change observation purpose” button. Is possible.

  The second cause displayed is “I want to set an arbitrary condition and observe with a different image quality”, and the displayed solution is “Set to an arbitrary condition by switching to the extended function”. Can be set arbitrarily. In this case, the “solve” button C142 is not displayed.

  FIG. 6 shows an application assist screen 300 (FIG. 4) when the application assist button A124 (FIG. 3) is pressed during observation with the apparatus version of “high vacuum SEM (only high vacuum can be observed), with BSE detector”. When the button B131a, B131b, B131c displayed on the screen is pressed, the cause and solution displayed on the application assist solution screen 400 (FIGS. 10 to 12), the presence / absence of the “solve” button C142, etc. It is the table put together according to “the currently selected observation purpose”.

  In the device version of “High vacuum SEM (only high vacuum can be observed), with BSE detector”, “Currently selected observation purpose” is “standard observation”, “observation that emphasizes surface structure”, “ There are five patterns: “observation that emphasizes material distribution”, “observation that emphasizes surface structure and material distribution”, and “elemental analysis and observation”. When the button B131a of “the image is distorted, the brightness is uneven, and there is no stereoscopic effect” is pressed on the application assist screen 300 (FIG. 4), “the surface structure is observed” as shown in FIG. ”,“ Observation that emphasizes material distribution ”,“ Observation that emphasizes surface structure and material distribution ”,“ Elemental analysis and observation ”,“ Charge-up ”is one of the causes displayed, The displayed solution will be “Add metal coating”, at which time the “Resolve” button C142 will not be displayed in the solution.

  The second cause to be displayed is “Insufficient sample mounting”, and the displayed solution is “Confirm sample fixing”, and the “Solution” button C142 is not displayed.

  In addition, when observing with “Standard Observation”, the cause displayed is “Charge-up” and “Insufficient sample mounting” as with other observation purposes. "Observation that emphasizes the surface structure" is additionally displayed. Here, the “solve” button C142 is displayed, and when the “solve” button C142 is pressed, a message prompting the user to change the observation purpose is displayed on the screen A121 of the operation guide screen 201 as shown in FIG.

  Next, when the “image is blurred” button B131b is pressed on the application assist screen 300 (FIG. 4), “standard observation” and “observation that emphasizes the material distribution” as shown in FIG. 6B. ”And“ elemental analysis and observation ”, one of the displayed causes is“ insufficient autofocus ”, and the displayed solution is“ manual focus adjustment ”. Here, when the “solve” button C142 is pressed, a message prompting manual focus adjustment is displayed on the screen A121 of the operation guide screen 201 as shown in FIG.

  The second cause displayed is “Insufficient sample mounting”, and the displayed solution is “Confirm sample fixing”, and the “Solve” button C142 is not displayed.

  The third cause to be displayed is “calibration (optical axis) misalignment”, the displayed solution is “calibration reset”, and the “solve” button C142 is not displayed.

  In addition, when observing with “observation that emphasizes the surface structure”, the cause that is displayed is added when the observation purpose is “standard observation”, “observation that emphasizes material distribution”, or “elemental analysis and observation”. , “Insufficient resolution” is added, and “change to“ standard observation ”” is displayed as a solution. Here, the “solve” button C142 is displayed, and when the “solve” button C142 is pressed, a message prompting the user to change the observation purpose is displayed on the screen A121 of the operation guide screen 201.

  Furthermore, when observing with “observation that emphasizes the surface structure and material distribution”, the cause displayed is the same as when the observation purpose is “observation that emphasizes the surface structure”. The solution of “insufficient” is “change to“ observation that emphasizes material distribution ””, which can improve the resolution by increasing the acceleration voltage. Here, the “solve” button C142 is displayed, and when the “solve” button C142 is pressed, a message prompting the user to change the observation purpose is displayed on the screen A121 of the operation guide screen 201.

  When “I want to observe with different image quality” B131c is pressed on the application assist screen 300 (FIG. 4), as shown in FIG. 6C, “standard observation”, “observation that emphasizes the surface structure”, One of the causes displayed in all the patterns of “Observation emphasizing material distribution”, “Observation emphasizing surface structure and material distribution”, and “Elemental analysis and observation” is “I want to observe with different image quality” The solution to be displayed is “select another observation purpose”, and when the “solve” button C142 is pressed, a message prompting the user to change the observation purpose is displayed on the screen A121 of the operation guide screen 201.

  The second cause that is displayed is "I want to set it to an arbitrary condition and observe it with a different image quality", and the displayed solution is "Switch to the extended function and set it to an arbitrary condition" The “solve” button C142 is not displayed.

  FIG. 7 is an apparatus version of “low vacuum SEM (observation is possible for both high vacuum and low vacuum)”. At the time of high vacuum observation, the application assist button A124 (FIG. 3) is pressed to display the application assist screen 300 (FIG. 4). When the button B131a, B131b, B131c displayed on the screen is pressed, the cause and solution displayed on the application assist solution screen 400 (FIGS. 10 to 12), the presence / absence of the “solve” button C142, etc. It is the table put together according to “the currently selected observation purpose”.

  In the device version of "Low vacuum SEM (both high vacuum and low vacuum can be observed)", "Currently selected observation purpose" for high vacuum observation is "Standard observation" and "Surface structure is emphasized" There are five patterns: “observation”, “observation that emphasizes material distribution”, “observation that emphasizes surface structure and material distribution”, and “elemental analysis and observation”. On the application assist screen 300 (FIG. 4), when the button 131a of “distorted image, uneven brightness, no stereoscopic effect” is pressed, the observation purpose is “surface structure” as shown in FIG. ”Observation”, “observation emphasizing material distribution”, “observation emphasizing surface structure and material distribution”, “elemental analysis and observation”, one of the causes displayed is “charge” In “Up”, there are two displayed solutions, one of which is “Add metal coating” and the “Resolve” button C142 is not displayed. The second solution is “change to low vacuum mode” that can reduce charge-up by lowering the degree of vacuum. When the “solve” button C142 is pressed, as shown in FIG. A message prompting to change the vacuum mode is displayed on the screen A121 of the screen 201.

  The second displayed cause is “insufficient sample mounting”, and the displayed solution is “confirm sample fixing”, and the “solve” button C142 is not displayed.

  In addition, when observing with “Standard Observation”, the cause displayed is “Charge-up” and “Insufficient sample mounting” as with other observation purposes. "Observation that emphasizes the surface structure" is additionally displayed. Here, the “solve” button C142 is displayed, and when the “solve” button C142 is pressed, an operation guide screen 201 that prompts the user to change the observation purpose is displayed on the operation screen 200 as shown in FIG.

  Next, when the “image is blurred” button B131b is pressed on the application assist screen 300 (FIG. 4), the observation purpose is “standard observation”, “material distribution” as shown in FIG. When observing with `` observation that emphasizes '' and `` elemental analysis and observation '', one of the causes displayed is `` Insufficient autofocus '', and the displayed solution is `` Manual focus adjustment '' When the “solve” button C142 is pressed, a message prompting manual focus adjustment is displayed on the screen A121 of the operation guide screen 201 as shown in FIG.

  The second cause to be displayed is “Insufficient sample mounting”, and the displayed solution is “Confirm sample fixing”, and the “Solution” button C142 is not displayed.

  The third cause to be displayed is “calibration (optical axis) misalignment”, the displayed solution is “calibration reset”, and the “solve” button C142 is not displayed.

  In addition, when observing with “observation that emphasizes the surface structure”, the cause that is displayed is added when the observation purpose is “standard observation”, “observation that emphasizes material distribution”, or “elemental analysis and observation”. , “Insufficient resolution” is added, and “change to“ standard observation ”” is additionally displayed as a solution. Here, the ““ solve ”button C142” is displayed, and when the button C142 is pressed, a message urging to change the observation purpose is displayed on the screen A121 of the operation guide screen 201 (FIG. 13).

  Furthermore, when observing with “observation that emphasizes the surface structure and material distribution”, the cause of the display is the same as when the observation purpose is “observation that emphasizes the surface structure”, but “insufficient resolution” As a solution to this, “changed to“ observation that emphasizes material distribution ””. Here, the ““ solve ”button C142” is displayed, and when the button C142 is pressed, a message urging to change the observation purpose is displayed on the screen A121 of the operation guide screen 201 (FIG. 13).

  When “I want to observe with different image quality” B131c is pressed on the application assist screen 300 (FIG. 4), the observation purpose is “standard observation”, “enhance the surface structure” as shown in FIG. One of the causes displayed in all patterns of "Observation", "Observation that emphasizes material distribution", "Observation that emphasizes surface structure and material distribution", and "Elemental analysis and observation" is "Other image quality" The solution to be displayed is “select another observation purpose”, and when the “solve” button C142 is pressed, a message urging to change the observation purpose is displayed on the screen A121 of the operation guide screen 201. .

  The second cause that is displayed is "I want to set it to an arbitrary condition and observe it with a different image quality", and the displayed solution is "Switch to the extended function and set it to an arbitrary condition" The “solve” button C142 is not displayed.

  FIG. 8 shows an apparatus version of “low vacuum SEM (both high vacuum and low vacuum can be observed) without UV detector”. At the time of low vacuum observation, the application assist button A124 (FIG. 3) is pressed and the application assist screen 300 is displayed. The causes and solutions displayed on the application assist solution screen 400 when each phenomenon displayed in FIG. 4 is selected, and the “solve” button C142 are grouped by “currently selected observation purpose”. It is a table.

  In the low-vacuum SEM (both high-vacuum and low-vacuum observations are possible) device versions, during the low-vacuum observation, the “currently selected observation purpose” is “observation that emphasizes material distribution”, “surface structure and Three patterns of “observation emphasizing material distribution” and “elemental analysis and observation” are obtained. When the button B131a of “the image is distorted, the brightness is uneven, and there is no stereoscopic effect” is pressed on the application assist screen 300 (FIG. 4), the observation purpose is “material distribution” as shown in FIG. ”Observation emphasizing”, “Observation emphasizing surface structure and material distribution”, “Elemental analysis and observation”, one of the causes displayed is “charge up”, and the solution is the degree of vacuum When the “solve” button C142 is pressed, the degree of vacuum is displayed on the screen A121 of the operation guide screen 201 as shown in FIG. A message prompting you to change is displayed.

  The second displayed cause is “insufficient sample mounting”, and the displayed solution is “confirm sample fixing”, and the “solve” button C142 is not displayed.

  Next, when the “image is blurred” button B131b is pressed on the application assist screen 300 (FIG. 4), the observation purpose is “observation that emphasizes material distribution”, as shown in FIG. When observing with “elemental analysis and observation”, one of the causes displayed is “insufficient autofocus”, the displayed solution is “manual focus adjustment”, and the “solve” button C142 is pressed. When pressed, a message prompting manual focus adjustment is displayed on the screen A121 of the operation guide screen 201 as shown in FIG.

  The second cause to be displayed is “Insufficient sample mounting”, and the displayed solution is “Confirm sample fixing”, and the “Solution” button C142 is not displayed.

  The third cause to be displayed is “calibration (optical axis) misalignment”, the displayed solution is “calibration reset”, and the “solve” button C142 is not displayed.

  In addition, when observing with “observation that emphasizes the surface structure and material distribution”, the cause of display is “insufficient resolution” in addition to “observation that emphasizes material distribution” and “elemental analysis and observation”. As a solution, “change to“ observation that emphasizes material distribution ”” is additionally displayed as a solution. Here, the “solve” button C142 is also displayed. When the “solve” button C142 is pressed, a message prompting the user to change the observation purpose is displayed on the screen A121 of the operation guide screen 201.

  When the button B131c “I want to observe with different image quality” is pressed on the application assist screen 300 (FIG. 4), the observation purpose is “observation that emphasizes material distribution”, “ One of the causes displayed in all patterns of “observation that emphasizes surface structure and material distribution” and “elemental analysis and observation” is “I want to observe with a different image quality”, and the displayed solution is “ When “select another observation purpose” is selected and the “solve” button C142 is pressed, a message prompting the user to change the observation purpose is displayed on the screen A121 of the operation guide screen 201.

  The second cause that is displayed is "I want to set it to an arbitrary condition and observe it with a different image quality", and the displayed solution is "Switch to the extended function and set it to an arbitrary condition" The “solve” button C142 is not displayed.

  FIG. 9 shows an apparatus version of “low vacuum SEM (observation is possible for both high vacuum and low vacuum) UV detector”. When low vacuum observation is performed, the application assist button A124 (FIG. 3) is pressed, and the application assist screen 300 is displayed. The causes and solutions displayed on the application assist solution screen 400 when each phenomenon displayed in FIG. 4 is selected, and the “solve” button C142 are grouped by “currently selected observation purpose”. It is a table.

  In the low-vacuum SEM (both high-vacuum and low-vacuum observations are possible) device versions, during the low-vacuum observation, the “currently selected observation purpose” is “observation that emphasizes material distribution”, “surface structure and There are five patterns: “observation that emphasizes material distribution”, “observation that emphasizes structure”, “observation that emphasizes surface structure”, and “elemental analysis and observation”. When the button B131a of “the image is distorted, the brightness is uneven, and there is no stereoscopic effect” is pressed on the application assist screen 300 (FIG. 4), the observation purpose is “material distribution” as shown in FIG. Displayed in all patterns: “Observation emphasizing”, “Observation emphasizing surface structure and material distribution”, “Observation emphasizing structure”, “Observation emphasizing surface structure”, “Elemental analysis and observation” One of the causes is “charge up”. The solution is “change the degree of vacuum”. When the “solve” button C142 is pressed, a message prompting the change of the degree of vacuum is displayed on the screen A121 of the operation guide screen 201 as shown in FIG.

  The second displayed cause is “insufficient sample mounting”, and the displayed solution is “confirm sample fixing”, and the “solve” button C142 is not displayed.

  Next, when the “image is blurred” button B131b is pressed on the application assist screen 300 (FIG. 4), as shown in FIG. 9B, “observation that emphasizes material distribution”, “structure When observing with “emphasis observation” and “elemental analysis and observation”, one of the causes displayed is “insufficient autofocus”. The displayed solution is “manual focus adjustment”. When the “solve” button C142 is pressed, a message prompting manual focus adjustment is displayed on the screen A121 of the operation guide screen 201 as shown in FIG.

  The second cause to be displayed is “Insufficient sample mounting”, and the displayed solution is “Confirm sample fixing”, and the “Solution” button C142 is not displayed.

  The third cause to be displayed is “calibration (optical axis) misalignment”, the displayed solution is “calibration reset”, and the “solve” button C142 is not displayed.

  Also, when observing with “observation that emphasizes the surface structure and material distribution”, the causes displayed are the observation objectives “observation that emphasizes the material distribution”, “observation that emphasizes the structure”, “elemental analysis and In addition to “observation”, “insufficient resolution” is added. As a solution, “change to“ observation that emphasizes material distribution ”” is additionally displayed. Here, a “solve” button C142 is also displayed. When the “solve” button C142 is pressed, a message prompting the user to change the observation purpose is displayed on the screen A121 of the operation guide screen 201.

  Also, when observing with “observation that emphasizes the surface structure”, the cause displayed is the same as when the observation purpose is “observation that emphasizes the surface structure and material distribution”, but “insufficient resolution” In the above solution, “change to“ observation that emphasizes the structure ””, which can improve the resolution by increasing the acceleration voltage, is additionally displayed. Here, a “solve” button C142 is also displayed. When the “solve” button C142 is pressed, a message prompting the user to change the observation purpose is displayed on the screen A121 of the operation guide screen 201.

  When “I want to observe with a different image quality” B131c is pressed on the application assist screen 300 (FIG. 4), the observation purpose is “observation that emphasizes material distribution”, “surface structure”, as shown in FIG. 9C. One of the causes displayed in all patterns of “observation that emphasizes material distribution”, “observation that emphasizes structure”, “observation that emphasizes surface structure”, and “elemental analysis and observation” I want to observe with image quality. " The displayed solution is “select another observation purpose”, and when the “solve” button C142 is pressed, a message prompting to change the observation purpose is displayed on the screen A121 of the operation guide screen 201.

  The second cause that is displayed is "I want to set it to an arbitrary condition and observe it with a different image quality", and the displayed solution is "Switch to the extended function and set it to an arbitrary condition" The “solve” button C142 is not displayed.

  Note that the causes of “image is distorted”, “unevenness in brightness”, and “no three-dimensional effect” of the application assist button B131a shown in FIG. "Disturbance (vibration, stray magnetic field, air pressure of air conditioning, high-voltage cable contact with others)", "beam damage", and "not conducting". As these “solutions”, in addition to those shown in FIGS. 5 to 9, “displace the magnetic field source”, “install the magnetic field canceller”, “install the vibration isolation table”, “shorten the WD”, For example, “condenser lens is strongly excited”, “irradiation current is lowered”, “sample is cooled”, “conductivity is established”, and the like.

  The causes of the “image is blurred” of the application assist button B131b shown in FIG. 4 include “the magnification is too high”, “contamination”, “acceleration voltage is not displayed in FIGS. "It is too expensive". These “solutions” include “reducing magnification”, “reducing the amount of paste and tape used for sample fixation”, “paste better before observation” in addition to those shown in FIGS. Such as “drying”, “heating and degassing the sample before observation”, “focusing quickly and acquiring an image with a different field of view”, “cooling the vicinity of the sample”, “decreasing acceleration voltage”, etc. .

  5 to 9, in the solution that does not display the “solve” button C142 (FIGS. 10 to 12), the solutions are “add metal coating”, “confirm sample fixing”, “recalibration” In the case of “setting”, the observation is terminated, the atmosphere is opened, and the displayed solution is performed. Further, when the “solve” button C142 is displayed as a solution and pressed, an observation end screen not shown here may be displayed. In addition, when the solution is “switch to the extended function and set an arbitrary condition”, the user performs switching using the menu bar. However, when the “solve” button C142 is displayed and pressed in the solution, the figure is shown here. You may make it display the screen which can be switched to the extended function which is not performed.

  10 to 12 will be described. 10 to 12 are apparatus versions with a high vacuum SEM and a BSE detector shown in FIG. 6, and the application assist solution screen 400 when “currently selected observation purpose” is “standard observation”. It is a figure which shows an example.

  The application assist resolution method screen 400 of FIG. 10 is a screen when the button B131a of the application assist screen 300 of FIG. 4 is pressed “distorted image, uneven brightness, no stereoscopic effect”. The application assist solution screen 400 of FIG. 12 is a screen when the “image is blurred” button B131b is pressed, and the app assist solution screen 400 of FIG. 12 is the button B131c “I want to observe with a different image quality” This is a screen when "" is pressed. These screens 400 are displayed as separate windows on the operation screen 200.

  A typical NG image B132 displayed on the application assist screen 300 in FIG. 4 is displayed at the top of the application assist solution screen 400 in FIGS. 10 to 12 to improve the possible “cause” and its phenomenon. A number of possible “solutions” are displayed.

  10 to 12, causes and solutions are arranged from the top in descending order of priority for the user. In each item of these “solutions”, a “want to know” button C141 and a “solve” button C142 are arranged. When the user presses this “I want to know” button C141, necessary information regarding the solution, such as a reason or an item that is the basis of the solution, is displayed in another window. The user can obtain knowledge regarding the operation of the electron microscope 101 through such work.

  In addition, a “solve” button C142 is arranged for each item of the solution, and when the button is pressed, an operation screen for executing the solution is displayed. Examples of operation screens for executing the solution displayed when the “solve” button C142 is pressed are shown in FIG. 13, FIG. 17, FIG. 25, and FIG.

  FIG. 13 is a diagram illustrating an example of a “screen for prompting observation purpose change”. That is, the user looks at the image C51 in FIG. 3 (the image under the current observation conditions), the image displayed in the observation history C121 after saving the image, or the image enlarged by the user pressing the observation history C121. 4, “image is distorted”, “brightness is uneven”, and “no three-dimensional effect” are displayed, and “image is distorted”, “brightness” is displayed on the application assist screen 300. The button B131a is pressed. Then, a “solve” button for an item with a solution of “changing the observation purpose to“ observation that emphasizes the surface structure ”” arranged at the top of the application assist solution screen 400 shown in FIG. When C142 is pressed, the “screen for prompting observation purpose change” shown in FIG. 13 is displayed.

  Note that the operation guide screen 201 in FIG. 13 indicates that the current stage is “change objective” of “1. preparation”. The operation program 31 includes a step of displaying an operation panel screen 203 in accordance with the operation guide screen 201. On the operation panel screen 203, the area around the “change observation purpose” button D151 is highlighted in, for example, orange to prompt the user to change the observation purpose. On the Tips screen A3 in FIG. 13, after pressing the “Change Observation Objective” button D151, a message is displayed prompting the user to change the observation objective to “Observation that emphasizes the surface structure”.

  When the user presses the “change observation purpose” button D151 in accordance with the contents described in A121 of the operation guide screen 201, the computer 19 according to the operation program 31 causes the observation purpose change screen 500 shown in FIG. Displayed on the front of the operation screen 200, an observation purpose setting button E141 is displayed. In the observation purpose setting button E141, observation purpose change candidates are described.

  In the observation purpose setting button E141 of the observation purpose setting screen 500 of FIG. 14, the observation purpose currently used is set so that the user can easily grasp the observation purpose currently used and the observation purpose to be changed now, for example. Highlighted in blue, the observation purpose to be changed now is highlighted around the frame in, for example, oren. Here, instead of automatically changing to the next screen in accordance with the operation program 31, the user dares to press the “change observation purpose” button D151. In this way, the user can recognize the position of the “change observation purpose” button D151, and the learning effect of the user that an image with a different image quality can be obtained by changing the observation purpose. Can be increased.

  The difference in image quality when the observation purpose is selected specifically depends on the parameter setting set when the user operates the electron microscope 101. The parameter setting values include acceleration voltage, working distance, condenser lens ( Here, it is expressed as spot intensity), objective movable diaphragm, detection signal, degree of vacuum, image capturing method, and the like.

  There are various user observation purposes such as “I want to observe with the highest possible resolution”, “I want to observe the surface”, “I want to observe the material distribution”, etc., but most beginners are most suitable for each observation purpose. Currently, it is used without knowing that there is a parameter setting value.

  In addition, it is difficult for beginners to grasp what values these parameter setting values are set to obtain and what images are obtained.

  Therefore, most beginners perform observation using the currently set parameter setting values as they are without changing the parameter setting values even when the observation purpose changes. However, with such a usage, the apparatus performance cannot be fully exploited.

  Therefore, in this embodiment, the parameter setting value is not set by the user, but the optimum parameter setting value is automatically set according to the observation purpose (observation purpose change) selected by the user. . Note that the choices for the purpose of observation are observation conditions that the user often uses or wants the user to use, and it is desirable that there are about five conditions including analysis as a condition that even a beginner can grasp and select.

  In this example, as the observation purpose at the time of high vacuum, when there is no BSE detector, three types of “standard observation”, “observation that emphasizes the surface structure”, and “observation that analyzes the element” are set, With BSE detector, “standard observation”, “observation that emphasizes surface structure”, “observation that emphasizes material distribution”, “observation that emphasizes surface structure and material distribution”, “observation that analyzes elements” "5".

  In addition, there are three observation purposes at low vacuum: “observation that emphasizes material distribution”, “observation that emphasizes surface structure and material distribution”, and “observation that analyzes elements” when there is no UV detector. Set. When there is a UV detector, “observation that emphasizes material distribution”, “observation that emphasizes surface structure and material distribution”, “observation that emphasizes structure”, “observation that emphasizes surface structure”, “element” “Observation to analyze” was set.

  Note that, since the parameter setting values to be used are different between high vacuum observation and low vacuum observation, there are five observation purposes in which a clear difference appears in the images in both high vacuum observation and low vacuum observation.

  Further, a button E143 for displaying detailed observation conditions is provided on the five observation purpose setting buttons E141 shown in FIG. 14, and when this button is pressed, characteristics of the observation purpose and specific parameter setting values are displayed. Is displayed.

  FIG. 15 is a diagram illustrating a screen 501 showing the types and characteristics of observation purposes according to the present embodiment. The types and characteristics of the observation purpose on the screen shown in FIG. 15 are associated with each of the observation purpose setting buttons E141 (FIG. 14) and indicate the characteristics for each observation purpose. When the set value button E146 is pressed, parameter setting values (acceleration voltage, working distance, condenser lens (expressed as spot intensity here), objective lens movable diaphragm, detector, vacuum degree, image for each purpose selection shown in FIG. Switch to the screen that displays the import method.

  Thereby, it is possible to meet the user's request to know the specific parameter setting values of the observation conditions.

  When any one of the observation purpose setting buttons E141 in FIG. 14 is pressed, the computer 19 follows the operation program 31 and the observation conditions on the parameter setting value display screen 502 in FIG. 16 associated with the observation purpose setting buttons E141. Set the observation condition with the parameter setting value of the record in the setting table.

  Although not shown here, during low-vacuum observation, a screen showing the type and characteristics of the observation purpose corresponding to low-vacuum observation and a parameter setting value display screen for each purpose selection are displayed.

  Further, on the left side of the observation purpose change screen 500 of FIG. 14, a legend E145a of the radar chart and a schematic diagram E145b of the simulated sample of the enhanced image E142 are displayed. The radar chart legend E145a is a legend of the radar chart (observation condition feature display) E144 displayed on each observation purpose setting button E141.

  As shown in the radar chart legend E145a, it is defined that the image feature is composed of three axes: “suitable for high magnification”, “enhance surface structure”, and “enhance material differences”. Each axis is represented in four stages, and indicates that the features of each axis become more significant as it goes outside the radar chart E144. When each axis is shown in four or more stages, a more precise radar chart is obtained.

  Since the image characteristics “suitable for high magnification”, “enhance surface structure”, and “enhance material differences” are contradictory parameter setting values, all the parameter setting values of the radar chart E144 for certain observation purposes are Generally not the best. That is, if a certain parameter setting value is good, other parameter setting values are relatively poor. Therefore, as shown in the present embodiment, by displaying the characteristics of the observation purpose on the radar chart E144, it is possible to easily grasp the characteristics (merits / disadvantages) of the observation purpose visually. The enhanced image E142 is an image that emphasizes the comparison with the standard image that can be observed with the default observation purpose “standard observation”, and is an image that reflects the parameters shown in the radar chart.

  Thus, by displaying the emphasized image E142, the user can visually grasp what kind of effect can be obtained by selecting the corresponding observation purpose setting button E141. In the techniques described in Patent Documents 1 and 2 which are conventional techniques, a raw image is displayed and compared with a user, so that it is difficult for a beginner to determine a difference in image due to a difference in observation conditions.

  On the other hand, as in this embodiment, by displaying the emphasized image E142, even if the user is a beginner, the effect (selection of the characteristics of the observation purpose) obtained by selecting one of the observation purpose setting buttons E141. ) Can be easily understood by the user.

  FIG. 17 to FIG. 23 are diagrams showing examples of operation screens in the focus adjustment by the user, showing the procedure for adjusting the focus by the manual adjustment screen.

  When the user views the image C51 on the image display screen 202 in FIG. 3 or the image displayed in the observation history C121 after image storage, or the image enlarged by the user pressing the observation history C121, the image stored is shown in FIG. 4 is determined to correspond to “the image is blurred” shown in the application assist screen 300 of FIG. A case where the user presses the “image is blurred” button B131b on the application assist screen 300 in FIG. 4 will be described below.

  In accordance with the operation program 31, the computer 19 displays the application assist solution screen 400 shown in FIG. 11 in order to improve the phenomenon described in the button B 131b in the application assist screen 300 of FIG. Next, a description will be given with reference to FIG. FIG. 17 shows a screen that is displayed when the “solve” button C142 of the item for which manual focus adjustment is arranged at the top of the application assist solution screen 400 of FIG. 11 is pressed. It is an example. The operation guide screen 201 in FIG. 17 indicates that the current stage is “focus adjustment” in “3. Image adjustment”, and a message prompting the user to manually adjust the focus on the screen A 121 of the operation guide screen 201. Is displayed.

  In addition, a “learn” button E161 is displayed on the screen A121 of the operation guide screen 201. When the user wants to learn how to adjust the manual focus adjustment, he / she can press “Learn” and practice manual focus adjustment in a separate window (not shown). If learning is not necessary, the “Next” button E162 is pressed to perform focus adjustment shown in FIG.

  In FIG. 18, information indicating that the current operation stage is “focus adjustment” of “3. Confirm image” is displayed on the operation guide screen 201, and the focus button F <b> 172 is displayed on the screen A <b> 121 of the operation guide screen 201. A message prompting you to press is displayed. Furthermore, tips for performing image adjustment are displayed on the Tips screen A3.

  The focus button F172 is highlighted so that the user can see at a glance. When the user presses the focus button F172, as shown in FIG. 19, the display mode of the image operation panel screen 203 is automatically changed to the image adjustment mode F174. change. That is, as shown in FIG. 19, only the central part (part) of the image C51 (FIG. 18) is displayed (image C52). In order to ensure the image quality and followability necessary for adjustments such as the focus, the observation portion of the image C51 is reduced according to the operation program 31 to improve the image quality at a slow scanning speed while repeating scanning. This is to shorten the time (the same applies to FIGS. 19 to 23).

  The slider becomes a focus slider F171 for performing focus adjustment, and the user determines whether or not astigmatism adjustment is necessary by moving the focus slider F171. When the user moves the focus slider F <b> 171, the computer 19 controls the X-direction astigmatism corrector control circuit 13 and the Y-direction astigmatism corrector according to the movement distance of the focus slider F <b> 171 input via the input device 23. The circuit 14 controls the X direction astigmatism corrector 4 and the Y direction astigmatism corrector 5.

  The image C52 shows an image in which the focus of the image C51 is shifted as the user moves the focus slider F171.

  Here, a guideline for focus adjustment is displayed on the screen A121 of the operation guide screen 201 in FIG. Further, in the reference image F173 on the screen A121, an expected image change when the focus slider F171 is moved is displayed in a deformed manner.

  When the user confirms that the image is enlarged (expanded) only in a predetermined direction by moving the focus slider F171, the user adjusts the focus slider F171 to a focus position that does not extend, and “next” on the screen A121. Button E162 is pressed. Then, according to the operation program 31, the computer 19 finishes the focus adjustment process and displays the display content for stigma X adjustment on the image display device 18.

  If the image does not expand even when the focus slider F171 is moved, the user may end the image adjustment in accordance with the focus position where the sharpest appears, without performing the stigma X adjustment and the stigma Y adjustment.

  20 and 21 are diagrams showing display contents of stigma X adjustment on the manual adjustment screen. In the stigma X adjustment, first, as shown in FIG. 20, a message prompting the user to press the stigma X button F176 is displayed on the screen A121 of the operation guide screen 201, and the tips of operation are displayed on the Tips screen A3. The stigma X button F176 is highlighted so that the user can see at a glance. When the user presses the stigma X button F176, the screen is switched to the screen shown in FIG. The slider in the screen shown in FIG. 21 is a stigma X slider F175.

  When the user moves the stigma X slider F175 in accordance with the message on the screen A121, the computer 19 sends an X direction astigmatism corrector control circuit 13 to the X direction astigmatism corrector control circuit 13 in accordance with the movement distance of the stigma X slider F175 input via the input device 23. The direction astigmatism corrector 4 is controlled.

  Then, the user thinks that the image has become substantially sharp, and the user presses the “next” button E162, so that the stigma X adjustment is finished according to the operation program 31, and the process proceeds to the next stigma Y adjustment.

  Although not shown in the drawing, the stigma Y adjustment is performed in the same manner as the stigma X adjustment, and the user thinks that the image is substantially sharpened. When the user presses the “Next” button, the stigma Y adjustment is performed according to the operation program 31. Then, the display content of the next slider adjustment screen is displayed on the image display device 18.

  FIG. 22 is a diagram showing the display contents of the focus confirmation after the stigma Y adjustment.

  In FIG. 22, on the screen A121 of the operation guide screen 201, a message for prompting confirmation of whether or not focus adjustment has been completed (and whether or not focus adjustment is necessary) is displayed. The user performs focus adjustment in the same procedure as in FIGS. 18 to 19, and confirms whether or not focus readjustment is necessary. As a result, when it is determined by the user that focus readjustment is necessary, the user presses the “readjustment” button F177 to perform the processes of FIGS. 19 to 22 again to perform focus confirmation.

  If it is determined by the user that the focus readjustment is unnecessary, the screen is switched to the screen shown in FIG. 23 by pressing a “Next” button (not shown in FIG. 22), and the user moves the focus slider F171. Adjust the focus position so that it looks the sharpest. Thereafter, the magnification is adjusted to a desired magnification, and the automatic brightness button F178 on the operation panel screen 203 is pressed. Then, an “image capture and save” button F179 on the operation panel screen 203 is pressed to perform image capture and save. In this way, the user can focus the focus slider F171 (FIGS. 18 and 19), the stigma X slider F175 (FIG. 20), and the stigma Y slider (not shown) displayed in the vicinity of the images C51 and C52 (FIGS. 18 and 19). The image can be adjusted easily while viewing the images C51 and C52.

  Next, with the apparatus version of the low vacuum SEM, the “image is distorted”, “brightness is uneven”, or “no three-dimensional effect” buttons b131a on the application assist screen 300 (FIG. 4) when observing in high vacuum. FIG. 24 shows an application assist solution method screen example 400 displayed when the button is pressed.

  In low-vacuum observation, observation is possible with reduced charge-up. When the user presses the “solve” button C142 on the screen shown in FIG. 24, the screen shown in FIG. 25 is displayed, and the screen A121 of the operation guide screen 201 changes the vacuum mode to low vacuum (30 Pa). Switch to the prompt screen. The mode switching method can be easily switched even by a beginner by highlighting the low vacuum mode switching button G181 on the operation panel screen 203. After switching the vacuum degree to low vacuum (30 Pa), the user performs image adjustment (step S107) according to screen A121 of the operation guide screen 201, and improves the image by acquiring an image under new observation conditions. It is possible to improve the skills of the charged particle device.

  Next, in the device version of the low vacuum SEM, the “image is distorted”, “unevenness in brightness”, and “no three-dimensional effect” buttons on the application assist screen 300 (FIG. 4) when observing in a low vacuum FIG. 26 shows an example of the application assist solution method screen 400 that is displayed when the button is pressed.

  In low-vacuum observation, if the pressure is increased, observation is possible with reduced charge-up. When the “solve” button C142 in the screen shown in FIG. 26 is pressed, FIG. 27 is displayed, and the screen A121 of the operation guide screen 201 is switched to a screen that prompts the user to change the degree of vacuum to 50 Pa. Further, the vacuum degree changing method can be easily switched even by a beginner by highlighting the vacuum degree changing button H191 on the operation panel screen 203 shown in FIG.

  After changing the degree of vacuum to 50 Pa, the user adjusts the image according to screen A121 of the operation guide screen 201 (step S107), obtains an image under new observation conditions, improves the image, and uses the charged particle device. Improve skills.

  Next, the position, range, and size of the operation screen 200 of the image display device 18 with respect to the entire electron microscope apparatus according to the embodiment of the present invention will be described. 28 is a front view of the electron microscope apparatus in the present embodiment, FIG. 29 is a left side view of the electron microscope apparatus in the present embodiment, FIG. 30 is a right side view of the electron microscope apparatus in the present embodiment, and FIG. FIG. 32 is a bottom view of the electron microscope apparatus in the present embodiment, and FIG. 33 is a rear view of the electron microscope apparatus in the present embodiment.

  28 to 33, the operation screen 200 is indicated by a solid line, and other portions are indicated by broken lines.

  On the operation screen 200 shown in FIGS. 28 to 33, the operation screen 200 shown in FIGS. 3, 4, and 10 to 27 is displayed.

  As described above, according to the present embodiment, the computer 19 first acquires an image based on the default observation conditions in accordance with the operation program 31. Then, according to the operation program 31, the computer 19 displays typical images and phenomena that need improvement on the acquired image on the application assist screen 300, and determines to the user whether the obtained images are optimal images. Develop skills to make

  Furthermore, in the application assist solution screen 400, the device version (high vacuum only, switchable between high vacuum and low vacuum is possible), the presence / absence of optional detectors (BSE detector, UV detector) of the device version described above, and which one is currently Depending on whether you are observing for the purpose of observation (observation conditions), present the cause and solution, and guide the direction of correction.

  As a result, even if a user is a beginner, the user can efficiently obtain an optimal image that matches the device performance, and can acquire the characteristics of the image taken under the set observation conditions. The effect can be expected and the skill of the user can be improved.

In the present embodiment described above, the first image is acquired under the default viewing conditions. However, the computer 19 performs the setting according to the operation program 31 after the user performs the setting. After that, the user may be caused to adjust observation conditions and the like according to messages on the application assist screen 300 and the application assist solution screen 400.

  DESCRIPTION OF SYMBOLS 1 ... Electron gun, 2 ... Primary electron beam, 3 ... Condensing lens, 4 ... X direction astigmatism corrector, 5 ... Y direction astigmatism corrector, 6 ... Upper stage deflection 7 ... lower deflector, 8 ... objective lens, 9 ... sample, 10 ... detector, 11 ... high voltage control circuit, 12 ... focusing lens control circuit, 13 ... ..X direction astigmatism corrector control circuit, 14... Direction astigmatism corrector control circuit, 15... Deflector control circuit, 16... Objective lens control circuit, 17. DESCRIPTION OF SYMBOLS 18 ... Image display apparatus, 19 ... Computer (processing part), 21 ... Memory | storage device (memory | storage part), 22 ... Memory, 23 ... Input device, 24 ... Sample stand, 25 ... Sample stage, 31 ... Operation program, 100 ... Electron microscope column (charged particle beam device), 101 Electron microscope (charged particle beam device, charged particle beam device system), 200 ... operation screen, 201 ... operation guide screen, 202 ... image display screen (image display unit), 203 ... operation panel screen , 300 ... Application assist screen, 400 ... Application assist solution screen, 500 ... Observation purpose change screen, 501 ... Types and characteristics of observation purpose, 502 ... Parameter setting value for each purpose selection Display screen, A3 ... Tips screen, A121 ... Message display screen, A122 ... Continue button, A123 ... End button, A124 ... App assist button, B131, B131a-B131c ... App assist Buttons in the screen, B132, 132c ... typical NG image, C51 ... image under current viewing conditions, C52 Images in the image adjustment mode, C121, observation history, C141, “I want to know” button, C142, “solve” button, D151, “change observation purpose” button, E141, .. Observation purpose setting button, E142 ... Emphasized image, E143 ... Observation condition display button, E144 ... Radar chart (observation condition feature display), E145a ... Legend of radar chart, E145b ... Simulation Schematic diagram of the sample, E146 ... set value button, E161 ... "learn" button, E162 ... "next" button, F171 ... focus slider, F172 ... focus button, F173 ... Reference image, F174: Image adjustment mode, F175: Stigma X slider, F176: Stigma X button, F1 7 ... re-adjustment button, F178 ··· auto-brightness button, F179 ··· image capture and save button, G181 ··· low vacuum mode switching button, H191 ··· vacuum degree change button

Claims (21)

A charged particle source that emits a charged particle beam;
A charged particle optical system that irradiates the sample with the charged particle beam; and
A detector for detecting a signal generated from the sample by irradiation of the charged particle beam;
A sample stage for holding the sample and moving the sample;
A sample chamber in which the sample stage is disposed;
A display unit for displaying a sample image formed based on the signal ;
A controller that controls the charged particle source, the charged particle optical system, the detector, the sample stage, the sample chamber, and the display unit ;
With
The controller is
To the sample image, the image is distorted, there is a brightness unevenness, there is no stereoscopic effect, or images is blurred, of the following symptoms, the operator when at least any one is occurring Display the button to be pressed on the display unit,
When the button is pressed, in accordance with the observation conditions, and displays a message that describes the cause on the display unit, the charged particle beam device. The button is
The sample image is blurred on the sample screen and the first button that the operator presses when the image is distorted, uneven in brightness, or has no three-dimensional effect. The charged particle beam device according to claim 1, wherein the charged particle beam device indicates a second button that is pressed by an operator when the phenomenon occurs. The control unit further includes:
A message confirming to the operator whether the sample image should be observed with a different image quality;
A third button that the operator presses when observing the sample image with a different image quality;
The charged particle according to claim 2, wherein a message indicating a solution is displayed on the display unit when any one of the first to third buttons is pressed together with the sample image. Wire device. The charged particle beam apparatus according to claim 1, wherein the observation conditions include an acceleration voltage, a working distance, a condenser lens, an objective movable diaphragm, a detection signal, a degree of vacuum, and an image capturing method. The charged particle beam apparatus according to claim 1 , wherein the observation condition includes an observation purpose. Wherein, when the first button is pressed, in accordance with the degree of vacuum can sample chamber configured charged particle beam device, displays a message that describes the causes and solutions to the display unit, wherein Item 3. A charged particle beam device according to Item 2 . Wherein, when the first button is pressed, depending on the type of detector mounted on the charged particle beam device, displays a message that describes the causes and solutions to the display unit, wherein Item 3. A charged particle beam device according to Item 2 . When the first button is pressed, the control unit writes a charge-up as a cause in a high vacuum observation condition, and displays a message describing the addition of metal coding as a solution on the display unit . The charged particle beam apparatus according to claim 2 . When the first button is pressed, the control unit records charge-up as a cause in a high vacuum observation condition, and changes to a lower acceleration voltage or a switch to a low vacuum mode as a solution. The charged particle beam apparatus of Claim 2 which displays the described message on the said display part. When the first button is pressed, the control unit displays a charge-up message as a cause in a low-vacuum observation condition and a message describing a change to a lower vacuum as a solution on the display unit. The charged particle beam device according to claim 2 . 3. The control unit according to claim 2, wherein, when the first button is pressed, the control unit displays a message indicating that the sample is insufficiently attached as a cause and confirming the fixation of the sample as a solution on the display unit . Charged particle beam device. Wherein, when the second button is pressed, the image adjustment noted insufficient cause, displays a message describing the manual focus adjustment on the display unit, a charged particle beam apparatus according to claim 2, wherein . Wherein, when the second button is pressed, it shows information about the sample mounting insufficient cause, a message with a verification of the sample fixing as a solution for displaying on the display unit, according to claim 2, wherein Charged particle beam device. Wherein, when the second button is pressed, describing the deviation of the calibration as the cause, the solution displays a message describing the resetting of the calibration on the display unit as, according to claim 2, wherein Charged particle beam device. When the second button is pressed, the control unit indicates that the resolution is insufficient as a cause in the observation condition at a low acceleration voltage, and a message indicating a change to a higher acceleration voltage as a solution. The charged particle beam apparatus according to claim 2, wherein the charged particle beam apparatus is displayed on a display unit. Detect the signal generated from the sample by the irradiation of the charged particle beam,
A sample image is formed based on the detected signal and displayed on the display unit,
To the sample image, the image is distorted, there is a brightness unevenness, there is no stereoscopic effect, or images is blurred, of the following symptoms, the operator when at least any one is occurring Display the button to be pressed on the display unit,
A method for observing a sample of a charged particle beam apparatus, wherein when the button is pressed, a message describing the cause is displayed on the display unit according to an observation condition. The button is
The sample image is blurred on the sample screen and the first button that the operator presses when the image is distorted, uneven in brightness, or has no three-dimensional effect. The sample observation method of the charged particle beam apparatus according to claim 16, wherein a second button pressed by an operator when a phenomenon occurs is indicated. A message confirming of whether the operator wishes to observe the specimen image in another image quality, the display unit and a third button which the operator presses when observing the specimen image in another image quality together with the sample images The charged particle beam apparatus sample observation method according to claim 17, wherein a message describing a solution is displayed on the display unit when any one of the first to third buttons is pressed. 18. When the first button is pressed, in a high vacuum observation condition, a message indicating charge up as a cause and a message indicating addition of metal coding as a solution is displayed on the display unit . Sample observation method for charged particle beam apparatus. 18. The sample observation method for a charged particle beam apparatus according to claim 17, wherein when the second button is pressed, a message indicating that image adjustment is insufficient as a cause and a message indicating manual focus adjustment is displayed on the display unit. Irradiating a sample with a charged particle beam generated from a charged particle beam source of a charged particle beam device, forming a sample image based on a signal generated from the sample, and displaying it on a display unit;
To the sample image, the image is distorted, there is a brightness unevenness, there is no stereoscopic effect, or images is blurred, of the following symptoms, depression operator when at least any one is occurring Button to display on the display section,
A display control program for a computer for controlling the display unit , which displays a message describing the cause on the display unit according to an observation condition when the button is pressed.

Images