JP6142915B2 - Fluorinated ether composition, surface modifier, surfactant, liquid composition, article - Google Patents
Fluorinated ether composition, surface modifier, surfactant, liquid composition, article Download PDFInfo
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- JP6142915B2 JP6142915B2 JP2015500261A JP2015500261A JP6142915B2 JP 6142915 B2 JP6142915 B2 JP 6142915B2 JP 2015500261 A JP2015500261 A JP 2015500261A JP 2015500261 A JP2015500261 A JP 2015500261A JP 6142915 B2 JP6142915 B2 JP 6142915B2
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- fluorine
- group
- compound
- containing ether
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- 239000000203 mixture Substances 0.000 title claims description 139
- 239000007788 liquid Substances 0.000 title claims description 53
- 150000002170 ethers Chemical class 0.000 title claims description 27
- 239000003607 modifier Substances 0.000 title claims description 24
- 239000004094 surface-active agent Substances 0.000 title claims description 14
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims description 206
- 150000001875 compounds Chemical class 0.000 claims description 146
- 229910052731 fluorine Inorganic materials 0.000 claims description 144
- 239000011737 fluorine Substances 0.000 claims description 131
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims description 130
- -1 ether compound Chemical class 0.000 claims description 85
- 238000000034 method Methods 0.000 claims description 45
- 239000000758 substrate Substances 0.000 claims description 42
- 125000004430 oxygen atom Chemical group O* 0.000 claims description 33
- 125000003709 fluoroalkyl group Chemical group 0.000 claims description 32
- 125000005647 linker group Chemical group 0.000 claims description 31
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 29
- 239000003960 organic solvent Substances 0.000 claims description 27
- 239000000314 lubricant Substances 0.000 claims description 24
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 21
- IUHFWCGCSVTMPG-UHFFFAOYSA-N [C].[C] Chemical group [C].[C] IUHFWCGCSVTMPG-UHFFFAOYSA-N 0.000 claims description 20
- 150000005846 sugar alcohols Polymers 0.000 claims description 13
- 125000000962 organic group Chemical group 0.000 claims description 11
- 125000003545 alkoxy group Chemical group 0.000 claims description 10
- 238000009826 distribution Methods 0.000 claims description 10
- 125000005843 halogen group Chemical group 0.000 claims description 8
- 235000019227 E-number Nutrition 0.000 claims description 3
- 239000004243 E-number Substances 0.000 claims description 3
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 1
- 239000002344 surface layer Substances 0.000 description 53
- 150000002430 hydrocarbons Chemical group 0.000 description 51
- 125000001153 fluoro group Chemical group F* 0.000 description 38
- 229930195734 saturated hydrocarbon Natural products 0.000 description 35
- 239000010408 film Substances 0.000 description 34
- 229910052799 carbon Inorganic materials 0.000 description 24
- 239000000047 product Substances 0.000 description 24
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 23
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 17
- 238000004519 manufacturing process Methods 0.000 description 16
- 239000000463 material Substances 0.000 description 14
- 238000005481 NMR spectroscopy Methods 0.000 description 13
- 125000004432 carbon atom Chemical group C* 0.000 description 12
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 10
- 238000004833 X-ray photoelectron spectroscopy Methods 0.000 description 10
- 125000000217 alkyl group Chemical group 0.000 description 10
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 8
- 125000004429 atom Chemical group 0.000 description 8
- 238000005259 measurement Methods 0.000 description 8
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- 238000005227 gel permeation chromatography Methods 0.000 description 7
- 229910052710 silicon Inorganic materials 0.000 description 7
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 6
- 125000005010 perfluoroalkyl group Chemical group 0.000 description 6
- 230000001681 protective effect Effects 0.000 description 6
- 238000003786 synthesis reaction Methods 0.000 description 6
- 238000005160 1H NMR spectroscopy Methods 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 5
- 238000000354 decomposition reaction Methods 0.000 description 5
- 238000001035 drying Methods 0.000 description 5
- 239000007789 gas Substances 0.000 description 5
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 5
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- 125000002947 alkylene group Chemical group 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 4
- 238000004458 analytical method Methods 0.000 description 4
- 150000001450 anions Chemical class 0.000 description 4
- UORVGPXVDQYIDP-UHFFFAOYSA-N borane Chemical compound B UORVGPXVDQYIDP-UHFFFAOYSA-N 0.000 description 4
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- 239000012043 crude product Substances 0.000 description 4
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- ZQBFAOFFOQMSGJ-UHFFFAOYSA-N hexafluorobenzene Chemical compound FC1=C(F)C(F)=C(F)C(F)=C1F ZQBFAOFFOQMSGJ-UHFFFAOYSA-N 0.000 description 4
- 239000012264 purified product Substances 0.000 description 4
- 239000002994 raw material Substances 0.000 description 4
- 239000011347 resin Substances 0.000 description 4
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- BYEAHWXPCBROCE-UHFFFAOYSA-N 1,1,1,3,3,3-hexafluoropropan-2-ol Chemical compound FC(F)(F)C(O)C(F)(F)F BYEAHWXPCBROCE-UHFFFAOYSA-N 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
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- GPLRAVKSCUXZTP-UHFFFAOYSA-N diglycerol Chemical compound OCC(O)COCC(O)CO GPLRAVKSCUXZTP-UHFFFAOYSA-N 0.000 description 3
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- 238000011156 evaluation Methods 0.000 description 3
- 238000000605 extraction Methods 0.000 description 3
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- CMVFABYKWZDQMC-UHFFFAOYSA-N 1,1,3,4-tetrachloro-1,2,2,3,4,4-hexafluorobutane Chemical compound FC(F)(Cl)C(F)(Cl)C(F)(F)C(F)(Cl)Cl CMVFABYKWZDQMC-UHFFFAOYSA-N 0.000 description 2
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 2
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical group [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 2
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 2
- 239000004215 Carbon black (E152) Substances 0.000 description 2
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 238000013459 approach Methods 0.000 description 2
- 229910000085 borane Inorganic materials 0.000 description 2
- 238000005266 casting Methods 0.000 description 2
- 239000007822 coupling agent Substances 0.000 description 2
- 125000004494 ethyl ester group Chemical group 0.000 description 2
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- 229930195733 hydrocarbon Natural products 0.000 description 2
- 229910052740 iodine Inorganic materials 0.000 description 2
- 229910021645 metal ion Inorganic materials 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- LQNUZADURLCDLV-UHFFFAOYSA-N nitrobenzene Chemical compound [O-][N+](=O)C1=CC=CC=C1 LQNUZADURLCDLV-UHFFFAOYSA-N 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
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- 239000010702 perfluoropolyether Substances 0.000 description 2
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- 125000004437 phosphorous atom Chemical group 0.000 description 2
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- 125000001424 substituent group Chemical group 0.000 description 2
- ZUHZGEOKBKGPSW-UHFFFAOYSA-N tetraglyme Chemical compound COCCOCCOCCOCCOC ZUHZGEOKBKGPSW-UHFFFAOYSA-N 0.000 description 2
- 238000005809 transesterification reaction Methods 0.000 description 2
- 238000001771 vacuum deposition Methods 0.000 description 2
- GETTZEONDQJALK-UHFFFAOYSA-N (trifluoromethyl)benzene Chemical compound FC(F)(F)C1=CC=CC=C1 GETTZEONDQJALK-UHFFFAOYSA-N 0.000 description 1
- RIQRGMUSBYGDBL-UHFFFAOYSA-N 1,1,1,2,2,3,4,5,5,5-decafluoropentane Chemical compound FC(F)(F)C(F)C(F)C(F)(F)C(F)(F)F RIQRGMUSBYGDBL-UHFFFAOYSA-N 0.000 description 1
- CWIFAKBLLXGZIC-UHFFFAOYSA-N 1,1,2,2-tetrafluoro-1-(2,2,2-trifluoroethoxy)ethane Chemical compound FC(F)C(F)(F)OCC(F)(F)F CWIFAKBLLXGZIC-UHFFFAOYSA-N 0.000 description 1
- USPWUOFNOTUBAD-UHFFFAOYSA-N 1,2,3,4,5-pentafluoro-6-(trifluoromethyl)benzene Chemical compound FC1=C(F)C(F)=C(C(F)(F)F)C(F)=C1F USPWUOFNOTUBAD-UHFFFAOYSA-N 0.000 description 1
- XXZOEDQFGXTEAD-UHFFFAOYSA-N 1,2-bis(trifluoromethyl)benzene Chemical compound FC(F)(F)C1=CC=CC=C1C(F)(F)F XXZOEDQFGXTEAD-UHFFFAOYSA-N 0.000 description 1
- NBUKAOOFKZFCGD-UHFFFAOYSA-N 2,2,3,3-tetrafluoropropan-1-ol Chemical compound OCC(F)(F)C(F)F NBUKAOOFKZFCGD-UHFFFAOYSA-N 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- FBPFZTCFMRRESA-FSIIMWSLSA-N D-Glucitol Natural products OC[C@H](O)[C@H](O)[C@@H](O)[C@H](O)CO FBPFZTCFMRRESA-FSIIMWSLSA-N 0.000 description 1
- FBPFZTCFMRRESA-JGWLITMVSA-N D-glucitol Chemical compound OC[C@H](O)[C@@H](O)[C@H](O)[C@H](O)CO FBPFZTCFMRRESA-JGWLITMVSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- 239000004386 Erythritol Substances 0.000 description 1
- UNXHWFMMPAWVPI-UHFFFAOYSA-N Erythritol Natural products OCC(O)C(O)CO UNXHWFMMPAWVPI-UHFFFAOYSA-N 0.000 description 1
- WQZGKKKJIJFFOK-GASJEMHNSA-N Glucose Natural products OC[C@H]1OC(O)[C@H](O)[C@@H](O)[C@@H]1O WQZGKKKJIJFFOK-GASJEMHNSA-N 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- 229910004013 NO 2 Inorganic materials 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- RHQDFWAXVIIEBN-UHFFFAOYSA-N Trifluoroethanol Chemical compound OCC(F)(F)F RHQDFWAXVIIEBN-UHFFFAOYSA-N 0.000 description 1
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- 125000005073 adamantyl group Chemical group C12(CC3CC(CC(C1)C3)C2)* 0.000 description 1
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- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
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- UNXHWFMMPAWVPI-ZXZARUISSA-N erythritol Chemical compound OC[C@H](O)[C@H](O)CO UNXHWFMMPAWVPI-ZXZARUISSA-N 0.000 description 1
- 235000019414 erythritol Nutrition 0.000 description 1
- 229940009714 erythritol Drugs 0.000 description 1
- 230000032050 esterification Effects 0.000 description 1
- 238000005886 esterification reaction Methods 0.000 description 1
- 238000000105 evaporative light scattering detection Methods 0.000 description 1
- 150000002221 fluorine Chemical class 0.000 description 1
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- 125000005842 heteroatom Chemical group 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- AQYSYJUIMQTRMV-UHFFFAOYSA-N hypofluorous acid Chemical compound FO AQYSYJUIMQTRMV-UHFFFAOYSA-N 0.000 description 1
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- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
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- GKTNLYAAZKKMTQ-UHFFFAOYSA-N n-[bis(dimethylamino)phosphinimyl]-n-methylmethanamine Chemical compound CN(C)P(=N)(N(C)C)N(C)C GKTNLYAAZKKMTQ-UHFFFAOYSA-N 0.000 description 1
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- RVZRBWKZFJCCIB-UHFFFAOYSA-N perfluorotributylamine Chemical compound FC(F)(F)C(F)(F)C(F)(F)C(F)(F)N(C(F)(F)C(F)(F)C(F)(F)C(F)(F)F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F RVZRBWKZFJCCIB-UHFFFAOYSA-N 0.000 description 1
- JAJLKEVKNDUJBG-UHFFFAOYSA-N perfluorotripropylamine Chemical compound FC(F)(F)C(F)(F)C(F)(F)N(C(F)(F)C(F)(F)C(F)(F)F)C(F)(F)C(F)(F)C(F)(F)F JAJLKEVKNDUJBG-UHFFFAOYSA-N 0.000 description 1
- 238000009832 plasma treatment Methods 0.000 description 1
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- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
- C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
- C10M105/00—Lubricating compositions characterised by the base-material being a non-macromolecular organic compound
- C10M105/50—Lubricating compositions characterised by the base-material being a non-macromolecular organic compound containing halogen
- C10M105/54—Lubricating compositions characterised by the base-material being a non-macromolecular organic compound containing halogen containing carbon, hydrogen, halogen and oxygen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
- C08G65/002—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from unsaturated compounds
- C08G65/005—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from unsaturated compounds containing halogens
- C08G65/007—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from unsaturated compounds containing halogens containing fluorine
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L71/00—Compositions of polyethers obtained by reactions forming an ether link in the main chain; Compositions of derivatives of such polymers
- C08L71/02—Polyalkylene oxides
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D171/00—Coating compositions based on polyethers obtained by reactions forming an ether link in the main chain; Coating compositions based on derivatives of such polymers
- C09D171/02—Polyalkylene oxides
-
- C—CHEMISTRY; METALLURGY
- C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
- C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
- C10M107/00—Lubricating compositions characterised by the base-material being a macromolecular compound
- C10M107/38—Lubricating compositions characterised by the base-material being a macromolecular compound containing halogen
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/62—Record carriers characterised by the selection of the material
- G11B5/72—Protective coatings, e.g. anti-static or antifriction
- G11B5/725—Protective coatings, e.g. anti-static or antifriction containing a lubricant, e.g. organic compounds
- G11B5/7253—Fluorocarbon lubricant
- G11B5/7257—Perfluoropolyether lubricant
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C43/00—Ethers; Compounds having groups, groups or groups
- C07C43/02—Ethers
- C07C43/03—Ethers having all ether-oxygen atoms bound to acyclic carbon atoms
- C07C43/04—Saturated ethers
- C07C43/13—Saturated ethers containing hydroxy or O-metal groups
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- C08G2650/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
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- C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
- C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
- C10M2207/00—Organic non-macromolecular hydrocarbon compounds containing hydrogen, carbon and oxygen as ingredients in lubricant compositions
- C10M2207/02—Hydroxy compounds
- C10M2207/021—Hydroxy compounds having hydroxy groups bound to acyclic or cycloaliphatic carbon atoms
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- C10M2211/00—Organic non-macromolecular compounds containing halogen as ingredients in lubricant compositions
- C10M2211/04—Organic non-macromolecular compounds containing halogen as ingredients in lubricant compositions containing carbon, hydrogen, halogen, and oxygen
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Description
本発明は、表面改質剤、界面活性剤等として有用な含フッ素エーテル組成物、該含フッ素エーテル組成物を含む表面改質剤または界面活性剤、該含フッ素エーテル組成物と溶剤とを含む液状組成物、基材上に該含フッ素エーテル組成物からなる膜を有する物品に関する。 The present invention includes a fluorine-containing ether composition useful as a surface modifier, a surfactant, and the like, a surface modifier or surfactant containing the fluorine-containing ether composition, the fluorine-containing ether composition and a solvent. The present invention relates to an article having a liquid composition and a film comprising the fluorine-containing ether composition on a substrate.
磁気ディスクには、情報が記録される磁気記録層の上に、記録された情報を保護する目的で、炭素保護膜が形成されている。また、さらにその上に、磁気ディスク、読取ヘッドを保護する目的で、潤滑剤を塗布して被膜(以下、「表面層」ともいう。)を形成することが行われている。該潤滑剤としては、従来、修飾されたペルフルオロポリエーテル構造を有する化合物が使用されている。
近年のハードディスクドライブ(以下、「HDD」ともいう。)の記憶容量の増大にともない、記録媒体である磁気ディスクと読取ヘッドの距離は両者が接触するほど接近してきている。また、磁気ディスクは1分間に10,000回転を超える速度で回転している。この磁気ディスクと読取ヘッドの接近、高速回転化によって、表面層に対する要求性能はさらに高いものになってきている。たとえば、ディスクとヘッドとをより接近させるために、表面層の膜厚を薄膜化することが重要となる。また、接近により接触頻度が高まるため、より潤滑性の高い表面層が求められる。一方で、高速回転化により表面層が磁気ディスク上から飛散しないように磁気ディスクとの高密着化が必要となっている。In the magnetic disk, a carbon protective film is formed on a magnetic recording layer on which information is recorded for the purpose of protecting the recorded information. Further, for the purpose of protecting the magnetic disk and the read head, a lubricant is applied thereon to form a film (hereinafter also referred to as “surface layer”). As the lubricant, a compound having a modified perfluoropolyether structure has been conventionally used.
As the storage capacity of a recent hard disk drive (hereinafter also referred to as “HDD”) increases, the distance between the magnetic disk, which is a recording medium, and the read head is getting closer as they come into contact with each other. The magnetic disk rotates at a speed exceeding 10,000 rotations per minute. As the magnetic disk and the read head approach each other and the rotation speed is increased, the required performance for the surface layer has been further increased. For example, in order to bring the disk and the head closer, it is important to reduce the thickness of the surface layer. Further, since the contact frequency increases due to the approach, a surface layer with higher lubricity is required. On the other hand, high-speed rotation requires high adhesion to the magnetic disk so that the surface layer does not scatter from the magnetic disk.
しかし、高潤滑性と高密着性とは相反する性質であることが多く、それらの両立は難しい。
たとえば、表面層の潤滑性を高める手法としては、分子量が低く、粘度が低い潤滑剤を用いる方法や、極性官能基の含有量が少ない、もしくは極性官能基を持たない低極性の潤滑剤を用いる方法が挙げられる。しかし、分子量が低く、粘度が低い潤滑剤を用いた場合、蒸気圧が高いために潤滑剤が揮発してしまい、表面層と炭素保護膜との密着性は低い。また、低極性の潤滑剤を用いた場合、極性が低いために磁気ディスクとの密着性が低く、磁気ディスクの回転によって潤滑剤が飛散する等、表面層の耐久性が著しく低下する懸念がある。
表面層の磁気ディスクへの密着性を高める手法としては、極性官能基の含有量が多い潤滑剤を用いる方法が挙げられる。しかし、このような潤滑剤を用いた場合、表面層の粘度が高く、潤滑性が著しく低下し、磁気ディスクが摩耗してしまう懸念がある。
このような問題に対し、たとえば特許文献1、2には、特定の含フッ素エーテル化合物を潤滑剤として用いることが提案されている。特許文献1の実施例には、−CF2CH2OH末端を3つ有する3官能の含フッ素エーテル化合物や、−CH2CH(OH)CH2OH末端を3つ有する6官能の含フッ素エーテル化合物が開示されている。特許文献2には、−CF2−CH2OH末端を2、3または4つ有する2〜4官能の含フッ素エーテル化合物が開示されている。However, high lubricity and high adhesion are often contradictory properties, and it is difficult to achieve both.
For example, as a method for improving the lubricity of the surface layer, a method using a lubricant having a low molecular weight and a low viscosity, or a low-polarity lubricant having a low content of polar functional groups or no polar functional groups is used. A method is mentioned. However, when a lubricant having a low molecular weight and a low viscosity is used, the lubricant is volatilized due to the high vapor pressure, and the adhesion between the surface layer and the carbon protective film is low. In addition, when a low-polarity lubricant is used, there is a concern that the durability of the surface layer may be significantly reduced, such as low adhesion due to low polarity and low-level adhesion of the lubricant due to rotation of the magnetic disk. .
As a method for improving the adhesion of the surface layer to the magnetic disk, a method using a lubricant having a high content of polar functional groups can be mentioned. However, when such a lubricant is used, there is a concern that the viscosity of the surface layer is high, the lubricity is remarkably lowered, and the magnetic disk is worn.
For such problems, for example, Patent Documents 1 and 2 propose using a specific fluorine-containing ether compound as a lubricant. Examples of Patent Document 1 include trifunctional fluorine-containing ether compounds having three —CF 2 CH 2 OH ends, and hexafunctional fluorine-containing ethers having three —CH 2 CH (OH) CH 2 OH ends. Compounds are disclosed. Patent Document 2 discloses a 2- to 4-functional fluorine-containing ether compound having 2, 3 or 4 —CF 2 —CH 2 OH terminals.
特許文献1、2等に開示される潤滑剤によれば、高潤滑性と高密着性とをある程度両立し得るとされている。しかしその効果には未だ改善の余地がある。
本発明者らの検討によれば、−CF2CH2OH末端を有する2〜4官能の含フッ素エーテル化合物は、潤滑性には優れるが、密着性は充分とはいえない。−CH2CH(OH)CH2OH末端を3つ有する6官能の含フッ素エーテル化合物は、形成される表面層の粘度が高く、潤滑性が低くなる。また、薄膜の表面層を形成することが難しい問題もある。According to the lubricant disclosed in Patent Documents 1 and 2, etc., it is said that high lubricity and high adhesion can be achieved to some extent. However, there is still room for improvement in the effect.
According to the study by the present inventors, a bifunctional to tetrafunctional fluorine-containing ether compound having a —CF 2 CH 2 OH terminal is excellent in lubricity but not sufficient in adhesion. The hexafunctional fluorine-containing ether compound having three —CH 2 CH (OH) CH 2 OH ends has a high viscosity of the formed surface layer and low lubricity. There is also a problem that it is difficult to form a thin surface layer.
本発明は、上記事情に鑑みなされたものであり、高潤滑性と高密着性とを両立できる含フッ素エーテル組成物、該含フッ素エーテル組成物を用いた表面改質剤、界面活性剤、液状組成物および物品を提供することを目的とする。 The present invention has been made in view of the above circumstances, and includes a fluorinated ether composition capable of achieving both high lubricity and high adhesion, a surface modifier, a surfactant, and a liquid state using the fluorinated ether composition. It is an object to provide compositions and articles.
本発明は、以下の[1]〜[14]の構成を有する含フッ素エーテル組成物、表面改質剤、界面活性剤、液状組成物および物品を提供する。
[1]下式(A)で表される含フッ素エーテル化合物(A)と、下式(B)で表される含フッ素エーテル化合物(B)とを含有し、
前記含フッ素エーテル化合物(A)の含有量が、前記含フッ素エーテル化合物(A)と前記含フッ素エーテル化合物(B)との合計量に対して15〜80質量%であることを特徴とする含フッ素エーテル組成物。
(X)n−YA−(Z)m …(A)
(X)s−YB−(Z)t …(B)
ただし、式中の符号は以下の意味を示す。
前記式(A)中、Xは下式(X)で表される基であり、Zは下式(Z)で表される基であり、nは5または6であり、mは0または1であり、n+mは5または6であり、YAは、5または6価の多価アルコールからヒドロキシ基を除いた構造の基をペルフルオロ化した、ペルフルオロ有機基である。
前記式(B)中、XおよびYはそれぞれ前記と同じ意味であり、sは0〜4の整数であり、tは0〜10の整数であり、s+tは2〜14の整数であり、YBは(s+t)価の連結基である。
HO−CH2−P1−[(CaF2aO) b ]− …(X)
R−P2−[(CdF2dO) e ]− …(Z)
前記式(X)中、aは1〜5の整数であり、bは1〜100の整数であり、P 1はヒドロキシ基およびアルコキシ基のいずれも含まない2価の連結基または単結合である。bが2以上である場合、同一分子内に存在するb個のaはそれぞれ同一でも異なってもよい。分子内でのb個の(CaF2aO)単位の並びはいかなる順序であってもよい。
前記式(Z)中、dは1〜5の整数であり、eは1〜100の整数であり、P 2はヒドロキシ基およびアルコキシ基のいずれも含まない2価の連結基または単結合であり、Rは水素原子、ハロゲン原子、1価の炭化水素基、フルオロアルキル基、または炭素−炭素原子間にエーテル性酸素原子が挿入されたフルオロアルキル基である。eが2以上である場合、同一分子内に存在するe個のdはそれぞれ同一でも異なってもよい。分子内でのe個の(CdF2dO)単位の並びはいかなる順序であってもよい。
The present invention provides a fluorinated ether composition, a surface modifier, a surfactant, a liquid composition, and an article having the following configurations [1] to [ 14 ].
[1] A fluorine-containing ether compound (A) represented by the following formula (A) and a fluorine-containing ether compound (B) represented by the following formula (B):
The content of the fluorine-containing ether compound (A) is 15 to 80% by mass with respect to the total amount of the fluorine-containing ether compound (A) and the fluorine-containing ether compound (B). Fluorine ether composition.
(X) n -Y A- (Z) m (A)
(X) s -Y B- (Z) t (B)
However, the symbols in the formulas have the following meanings.
In the formula (A), X is a group represented by the following formula (X), Z is a group represented by the following formula (Z), n is 5 or 6, and m is 0 or 1 N + m is 5 or 6 , and Y A is a perfluoro organic group obtained by perfluorinating a group having a structure in which a hydroxy group is removed from a pentavalent or hexavalent polyhydric alcohol .
In the formula (B), X and Y have the same meanings as described above, s is an integer of 0 to 4, t is an integer of 0 to 10, s + t is an integer of 2 to 14, Y B is a (s + t) -valent linking group.
HO—CH 2 —P 1 — [(C a F 2a O) b ] — (X)
R-P 2 - [(C d F 2d O) e] - ... (Z)
In the formula (X), a is an integer of 1 to 5, b is an integer of 1 to 100, P 1 is a divalent linking group or a single bond does not contain any hydroxy groups and alkoxy groups . When b is 2 or more, b a existing in the same molecule may be the same or different . Of b pieces in the molecular (C a F 2a O) sequence of Unit may be any order.
In the formula (Z), d is an integer of 1 to 5, e is an integer of 1 to 100, and P 2 is a divalent linking group or a single bond that does not contain any hydroxy group or alkoxy group. , R is a hydrogen atom, a halogen atom, a monovalent hydrocarbon group, a fluoroalkyl group, or a fluoroalkyl group in which an etheric oxygen atom is inserted between carbon-carbon atoms. When e is 2 or more, e ds present in the same molecule may be the same or different . The e-number in the molecular (C d F 2d O) sequence of Unit may be any order.
[2]前記含フッ素エーテル化合物(A)と前記含フッ素エーテル化合物(B)との合計での数平均分子量が500〜50,000である、[1]の含フッ素エーテル組成物。
[3]前記含フッ素エーテル化合物(A)の数平均分子量が2,000〜50,000であり、分子量分布(Mw/Mn)が1.00〜1.65である、[1]または[2]の含フッ素エーテル組成物。
[4]前記含フッ素エーテル化合物(B)の数平均分子量が500〜10,000であり、分子量分布(Mw/Mn)が1.00〜1.65である、[1]〜[3]のいずれかの含フッ素エーテル組成物。[2] The fluorine-containing ether composition according to [1], wherein the total number average molecular weight of the fluorine-containing ether compound (A) and the fluorine-containing ether compound (B) is 500 to 50,000.
[3] The number average molecular weight of the fluorine-containing ether compound (A) is 2,000 to 50,000, and the molecular weight distribution (Mw / Mn) is 1.00 to 1.65. [1] or [2 ] A fluorine-containing ether composition.
[4] The number average molecular weight of the fluorine-containing ether compound (B) is 500 to 10,000, and the molecular weight distribution (Mw / Mn) is 1.00 to 1.65. Any fluorine-containing ether composition.
[5]前記含フッ素エーテル化合物(A)が、前記式(A)中のmが0または1、Xが下式(X−1)で表される基、Zが下式(Z−1)で表される基である化合物である、[1]〜[4]のいずれかの含フッ素エーテル組成物。
HO−CH2−CF2O−(CF2CF2O)b−1− …(X−1)
R−O−(CF2CF2O)e− …(Z−1)
ただし、式中の符号は以下の意味を示す。
前記式(X−1)中、bは1〜100の整数である。
前記式(Z−1)中、eは1〜100の整数であり、Rは前記と同じ意味である。
[5] In the fluorine-containing ether compound (A), m in the formula (A) is 0 or 1 , X is a group represented by the following formula (X-1), and Z is the following formula (Z-1). The fluorine-containing ether composition in any one of [1]-[4] which is a compound which is group represented by these.
HO—CH 2 —CF 2 O— (CF 2 CF 2 O) b-1 − (X-1)
R—O— (CF 2 CF 2 O) e − (Z-1)
However, the symbols in the formulas have the following meanings.
In said formula (X-1), b is an integer of 1-100.
In the formula (Z-1), e is an integer of 1 to 100, and R has the same meaning as described above .
[6]前記含フッ素エーテル化合物(B)が、前記式(B)中のsが4、tが0〜2、Xが下式(X−1)で表される基、Zが下式(Z−1)で表される基である化合物である、[1]〜[5]のいずれかの含フッ素エーテル組成物。
HO−CH2−CF2O−(CF2CF2O)b−1− …(X−1)
R−O−(CF2CF2O)e− …(Z−1)
ただし、式中の符号は以下の意味を示す。
前記式(X−1)中、bは1〜100の整数である。
前記式(Z−1)中、eは1〜100の整数であり、Rは前記と同じ意味である。
[7]前記YBが、4〜6価の多価アルコールからヒドロキシ基を除いた構造の基をフルオロ化した、ペルフルオロ有機基である、[6]の含フッ素エーテル組成物。
[ 6 ] In the fluorine-containing ether compound (B), s in the formula (B) is 4, t is 0 to 2, X is a group represented by the following formula (X-1), and Z is the following formula ( The fluorine-containing ether composition according to any one of [1] to [ 5 ], which is a compound which is a group represented by Z-1).
HO—CH 2 —CF 2 O— (CF 2 CF 2 O) b-1 − (X-1)
R—O— (CF 2 CF 2 O) e − (Z-1)
However, the symbols in the formulas have the following meanings.
In said formula (X-1), b is an integer of 1-100.
In the formula (Z-1), e is an integer of 1 to 100, and R has the same meaning as described above.
[7] The Y B is a structure of groups obtained by removing hydroxy group from 4-6 monovalent polyhydric alcohol was fluorinated, is perfluorinated organic group, fluorine-containing ether composition of [6].
[8]前記[1]〜[7]のいずれかの含フッ素エーテル組成物を含むことを特徴とする表面改質剤または界面活性剤。
[9]前記[1]〜[7]のいずれかの含フッ素エーテル組成物を含むことを特徴とする磁気記録媒体用潤滑剤。
[10]前記[1]〜[7]のいずれかの含フッ素エーテル組成物と、液体媒体とを含むことを特徴とする液状組成物。
[11]前記含フッ素エーテル組成物の濃度が0.005〜50質量%である、[10]の液状組成物。
[12]前記液体媒体がフルオロアルカン、フルオロ芳香族化合物およびフルオロアルキルエーテルから選ばれるフッ素系有機溶剤である、[10]または[11]の液状組成物。
[13]前記[10]〜[12]のいずれかの液状組成物を基材表面に塗布し、次いで液体媒体を除去して基材表面に前記含フッ素エーテル組成物からなる膜を形成することを特徴とする塗布方法。
[14]基材上に、[1]〜[7]のいずれかの含フッ素エーテル組成物からなる膜を有することを特徴とする物品。
[ 8 ] A surface modifier or surfactant comprising the fluorine-containing ether composition of any one of [1] to [ 7 ].
[ 9 ] A magnetic recording medium lubricant comprising the fluorine-containing ether composition according to any one of [1] to [ 7 ].
[ 10 ] A liquid composition comprising the fluorinated ether composition of any one of [1] to [ 7 ] and a liquid medium.
[ 11 ] The liquid composition according to [ 10 ], wherein the concentration of the fluorine-containing ether composition is 0.005 to 50% by mass.
[ 12 ] The liquid composition according to [ 10 ] or [ 11 ], wherein the liquid medium is a fluorinated organic solvent selected from fluoroalkanes, fluoroaromatic compounds and fluoroalkyl ethers.
[ 13 ] Applying the liquid composition of any one of [ 10 ] to [ 12 ] to the surface of the substrate, and then removing the liquid medium to form a film made of the fluorine-containing ether composition on the surface of the substrate. A coating method characterized by the above.
[ 14 ] An article comprising a film made of the fluorinated ether composition of any one of [1] to [ 7 ] on a substrate.
本発明によれば、高潤滑性と高密着性とを両立できる含フッ素エーテル組成物、該含フッ素エーテル組成物を用いた表面改質剤、界面活性剤、液状組成物および物品を提供できる。 ADVANTAGE OF THE INVENTION According to this invention, the fluorine-containing ether composition which can make high lubricity and high adhesiveness compatible, and the surface modifier, surfactant, liquid composition, and article | item using this fluorine-containing ether composition can be provided.
本明細書においては、式(A)で表される化合物を化合物(A)と記す。他の式で表される化合物も同様に記す。
本明細書においては、式(X)で表される基を基(X)と記す。他の式で表される基も同様に記す。
本発明における「含フッ素エーテル組成物」とは、2以上の含フッ素エーテル化合物から構成される組成物である。含フッ素エーテル化合物から構成されるとは、不可避の不純物を除き、含フッ素エーテル化合物以外の成分を含まないことを示す。
本発明における「含フッ素エーテル化合物」とは、ポリ(オキシペルフルオロアルキレン)鎖を有するエーテル化合物である。
本発明における「フルオロアルキル基」とは、アルキル基の水素原子の一部またはすべてがフッ素原子に置換された基であり、「ペルフルオロアルキル基」とは、アルキル基の水素原子のすべてがフッ素原子に置換された基である。
本発明における「フルオロアルキレン基」とは、アルキレン基の水素原子の一部またはすべてがフッ素原子に置換された基であり、「ペルフルオロアルキレン基」とは、アルキレン基の水素原子のすべてがフッ素原子に置換された基である。
本発明における数平均分子量および分子量分布は、ゲルパーミエーションクロマトグラフィにより測定される値である。測定条件は、後述する実施例中に記載した条件が採用できる。In this specification, a compound represented by the formula (A) is referred to as a compound (A). The same applies to compounds represented by other formulas.
In the present specification, a group represented by the formula (X) is referred to as a group (X). Groups represented by other formulas are also described in the same manner.
The “fluorinated ether composition” in the present invention is a composition composed of two or more fluorine-containing ether compounds. Being composed of a fluorine-containing ether compound means that it contains no components other than the fluorine-containing ether compound except for inevitable impurities.
The “fluorinated ether compound” in the present invention is an ether compound having a poly (oxyperfluoroalkylene) chain.
The “fluoroalkyl group” in the present invention is a group in which some or all of the hydrogen atoms of the alkyl group are substituted with fluorine atoms, and the “perfluoroalkyl group” means that all of the hydrogen atoms of the alkyl group are fluorine atoms. Is a group substituted.
The “fluoroalkylene group” in the present invention is a group in which some or all of the hydrogen atoms of the alkylene group are substituted with fluorine atoms, and the “perfluoroalkylene group” means that all of the hydrogen atoms of the alkylene group are fluorine atoms. Is a group substituted.
The number average molecular weight and molecular weight distribution in the present invention are values measured by gel permeation chromatography. As the measurement conditions, the conditions described in Examples described later can be adopted.
〔含フッ素エーテル組成物〕
本発明の含フッ素エーテル組成物は、含フッ素エーテル化合物(A)(以下、「化合物(A)」ともいう。)と、下式(B)で表される含フッ素エーテル化合物(B)(以下、「化合物(B)」ともいう。)とを含有し、
前記化合物(A)の含有量が、前記化合物(A)と前記化合物(B)との合計量に対して15〜80質量%であることを特徴とする。[Fluorine-containing ether composition]
The fluorine-containing ether composition of the present invention comprises a fluorine-containing ether compound (A) (hereinafter also referred to as “compound (A)”) and a fluorine-containing ether compound (B) represented by the following formula (B) (hereinafter referred to as “the compound (A)”). , Also referred to as “compound (B)”),
Content of the said compound (A) is 15-80 mass% with respect to the total amount of the said compound (A) and the said compound (B), It is characterized by the above-mentioned.
(化合物(A))
化合物(A)は、YAにn個の1価の基(X)およびm個の1価の基(Z)が結合した化合物である。
(X)n−YA−(Z)m …(A)(Compound (A))
Compound (A) is a compound of n monovalent group (X) and the m univalent groups (Z) is bonded to Y A.
(X) n -Y A- (Z) m (A)
式(A)中、Xは下式(X)で表される基である。
HO−CH2−P1−[(CaF2aO)b(CFQ1CF2O)c]− …(X)In formula (A), X is a group represented by the following formula (X).
HO—CH 2 —P 1 — [(C a F 2a O) b (CFQ 1 CF 2 O) c ] — (X)
式(X)中、aは1〜5の整数であり、2〜4の整数が好ましく、2が特に好ましい。aが3〜5の整数の場合、CaF2aは直鎖構造でも分岐鎖構造でもよい。
bは、(CaF2aO)単位の数を表し、1〜100の整数であり、5〜50の整数が好ましく、5〜30の整数が特に好ましい。
cは、(CFQ1CF2O)単位の数を表し、0〜100の整数であり、0〜50の整数が好ましく、0〜10が特に好ましい。In Formula (X), a is an integer of 1-5, the integer of 2-4 is preferable and 2 is especially preferable. When a is an integer of 3 to 5, C a F 2a may have a linear structure or a branched structure.
b represents the number of (C a F 2a O) units, and is an integer of 1 to 100, preferably an integer of 5 to 50, and particularly preferably an integer of 5 to 30.
c represents the number of (CFQ 1 CF 2 O) units, and is an integer of 0 to 100, preferably an integer of 0 to 50, and particularly preferably 0 to 10.
bが2以上である場合、同一分子内に存在するb個のaはそれぞれ同一でも異なってもよい。すなわちb個の(CaF2aO)単位はそれぞれ同一でも異なってもよい。
cが2以上である場合、同一分子内に存在するc個のQ1はそれぞれ同一でも異なってもよい。すなわちc個の(CFQ1CF2O)単位はそれぞれ同一でも異なってもよい。When b is 2 or more, b a existing in the same molecule may be the same or different. That is, the b (C a F 2a O) units may be the same or different.
When c is 2 or more, c Q 1 existing in the same molecule may be the same or different. That is, the c (CFQ 1 CF 2 O) units may be the same or different.
b+cが2以上である場合、分子内での−[(CaF2aO)b(CFQ1CF2O)c]−におけるb個の(CaF2aO)単位およびc個の(CFQ1CF2O)単位の並びはいかなる順序であってもよい。
たとえば、(CaF2aO)単位および(CFQ1CF2O)単位がそれぞれ1つずつ存在する場合には、HO−CH2−P1−が結合する単位は、(CaF2aO)単位であっても(CFQ1CF2O)単位であってもよい。
(CaF2aO)単位および(CFQ1CF2O)単位が存在し、かつ、少なくとも一方の単位が2単位以上存在する場合には、これらの単位の配列はブロック状であってもランダム状であってもよい。When b + c is 2 or more, b (C a F 2a O) units and c (CFQs) in-[(C a F 2a O) b (CFQ 1 CF 2 O) c ]-in the molecule The order of 1 CF 2 O) units may be in any order.
For example, when one (C a F 2a O) unit and one (CFQ 1 CF 2 O) unit are present, the unit to which HO—CH 2 —P 1 — is bonded is (C a F 2a O). ) Unit or (CFQ 1 CF 2 O) unit.
When (C a F 2a O) units and (CFQ 1 CF 2 O) units are present and at least one unit is present in two or more units, the arrangement of these units may be random even if it is in a block form It may be a shape.
式(X)中、P1は、ヒドロキシ基およびアルコキシ基のいずれも含まない2価の連結基であるか、または単結合である。
ヒドロキシ基およびアルコキシ基のいずれも含まない2価の連結基としては、ヒドロキシ基およびアルコキシ基のいずれも含まない2価の有機基が好ましく、具体例としては、アルキレン基、炭素−炭素原子間にエーテル性酸素原子が挿入されたアルキレン基、フルオロアルキレン基、炭素−炭素原子間にエーテル性酸素原子が挿入されたフルオロアルキレン基、フォスファゼン等ヘテロ原子を有するもの、不飽和炭化水素基等が挙げられる。
P1としては、単結合が好ましい。In formula (X), P 1 is a divalent linking group containing neither a hydroxy group nor an alkoxy group, or a single bond.
The divalent linking group containing neither a hydroxy group nor an alkoxy group is preferably a divalent organic group containing neither a hydroxy group nor an alkoxy group. Specific examples include an alkylene group and a carbon-carbon atom. Examples include an alkylene group having an etheric oxygen atom inserted, a fluoroalkylene group, a fluoroalkylene group having an etheric oxygen atom inserted between carbon-carbon atoms, a phosphazene-containing heteroatom, an unsaturated hydrocarbon group, etc. .
P 1 is preferably a single bond.
式(X)中、Q1はフッ素原子以外のハロゲン原子、水素原子、1価の炭化水素基、フルオロアルキル基、または炭素−炭素原子間にエーテル性酸素原子が挿入されたフルオロアルキル基である。
フッ素原子以外のハロゲン原子としては、塩素原子、ヨウ素原子、臭素原子等が挙げられ、製造しやすさの点で、塩素原子が好ましい。
1価の炭化水素基は、飽和でも不飽和でもよく、飽和の炭化水素基(アルキル基)であることが好ましい。該炭化水素基の構造は、直鎖構造、分岐鎖構造、環構造、部分的に環構造を有する構造のいずれでもよく、直鎖構造または分岐鎖構造が好ましく、直鎖構造が特に好ましい。該炭化水素基の炭素数は1〜10が好ましい。
フルオロアルキル基は、アルキル基の水素原子の一部がフッ素原子に置換されたフルオロアルキル基でもぺルフルオロアルキル基でもよい。フルオロアルキル基の炭素数は、1〜100が好ましく、1〜20が特に好ましい。
炭素−炭素原子間にエーテル性酸素原子が挿入されたフルオロアルキル基におけるフルオロアルキル基は、アルキル基の水素原子の一部がフッ素原子に置換されたフルオロアルキル基でもぺルフルオロアルキル基でもよい。該フルオロアルキル基の炭素数は、2〜100が好ましく、2〜20が特に好ましい。
炭素−炭素原子間にエーテル性酸素原子が挿入されたフルオロアルキル基の具体例として、たとえば、下記の基(Q−1)が挙げられる。
R1−(OChF2h)j− …(Q−1)
式中、R1はフルオロアルキル基であり、hは1〜5の整数であり、jは1〜100であって基(Q−1)全体の炭素数が100以下となる整数である。
hが3〜5の整数の場合、ChF2hは直鎖構造でも分岐鎖構造でもよい。
R1は、アルキル基の水素原子の一部がフッ素原子に置換されたフルオロアルキル基でもぺルフルオロアルキル基でもよい。該フルオロアルキル基の炭素数は、1以上であって基(Q−1)全体の炭素数が100以下となる整数であり、1〜6が好ましい。In formula (X), Q 1 is a halogen atom other than a fluorine atom, a hydrogen atom, a monovalent hydrocarbon group, a fluoroalkyl group, or a fluoroalkyl group in which an etheric oxygen atom is inserted between carbon-carbon atoms. .
Examples of the halogen atom other than the fluorine atom include a chlorine atom, an iodine atom, and a bromine atom, and a chlorine atom is preferable from the viewpoint of easy production.
The monovalent hydrocarbon group may be saturated or unsaturated, and is preferably a saturated hydrocarbon group (alkyl group). The structure of the hydrocarbon group may be any of a straight chain structure, a branched chain structure, a ring structure, and a structure having a partial ring structure, preferably a linear structure or a branched chain structure, and particularly preferably a linear structure. As for carbon number of this hydrocarbon group, 1-10 are preferred.
The fluoroalkyl group may be a fluoroalkyl group in which a part of hydrogen atoms of the alkyl group is substituted with a fluorine atom or a perfluoroalkyl group. 1-100 are preferable and, as for carbon number of a fluoroalkyl group, 1-20 are especially preferable.
The fluoroalkyl group in the fluoroalkyl group in which an etheric oxygen atom is inserted between carbon-carbon atoms may be a fluoroalkyl group in which a part of hydrogen atoms of the alkyl group is substituted with a fluorine atom or a perfluoroalkyl group. 2-100 are preferable and, as for carbon number of this fluoroalkyl group, 2-20 are especially preferable.
Specific examples of the fluoroalkyl group in which an etheric oxygen atom is inserted between carbon-carbon atoms include the following group (Q-1).
R 1 − (OC h F 2h ) j − (Q−1)
In the formula, R 1 is a fluoroalkyl group, h is an integer of 1 to 5, j is 1 to 100, and the total number of carbon atoms of the group (Q-1) is 100 or less.
When h is an integer of 3 to 5, C h F 2h may be a straight chain structure or a branched chain structure.
R 1 may be a fluoroalkyl group or a perfluoroalkyl group in which a part of hydrogen atoms of the alkyl group is substituted with a fluorine atom. Carbon number of this fluoroalkyl group is 1 or more and it is an integer from which carbon number of the whole group (Q-1) becomes 100 or less, and 1-6 are preferable.
基(X)としては、式(X)中のaが2(ただし、P1に結合した(CaF2aO)のみ、aは1)、bが1〜100の整数、cが0〜10、P1が単結合または−CH2OCH2−であるものが好ましい。
基(X)としては、以下の基(X−1)または(X−2)がより好ましい。
HO−CH2−CF2O−(CF2CF2O)b−1− …(X−1)
HO−CH2−CH2OCH2−CF2O−(CF2CF2O)bー1− …(X−2)As the group (X), a in formula (X) is 2 (provided that only (C a F 2a O) bonded to P 1 , a is 1), b is an integer of 1 to 100, and c is 0 to 0 10, P 1 is preferably a single bond or —CH 2 OCH 2 —.
As group (X), the following groups (X-1) or (X-2) are more preferable.
HO—CH 2 —CF 2 O— (CF 2 CF 2 O) b-1 − (X-1)
HO—CH 2 —CH 2 OCH 2 —CF 2 O— (CF 2 CF 2 O) b-1 − (X-2)
式(X−1)〜(X−2)中、bは1〜100の整数であり、5〜50の整数が好ましく、5〜30の整数が特に好ましい。
これらのなかでも、基(X)としては、製造しやすい点、化合物が分解しにくく、安定である点で、基(X−1)が特に好ましい。In formulas (X-1) to (X-2), b is an integer of 1 to 100, preferably an integer of 5 to 50, and particularly preferably an integer of 5 to 30.
Among these, as the group (X), the group (X-1) is particularly preferable because it is easy to produce and the compound is hardly decomposed and is stable.
式(A)中、Zは下式(Z)で表される基である。
R−P2−[(CdF2dO)e(CFQ2CF2O)f]− …(Z)In the formula (A), Z is a group represented by the following formula (Z).
R-P 2 - [(C d F 2d O) e (CFQ 2 CF 2 O) f] - ... (Z)
式(Z)中、dは1〜5の整数であり、2〜4の整数が好ましく、2が特に好ましい。dが3〜5の整数の場合、CdF2dは直鎖構造でも分岐鎖構造でもよい。
eは、(CdF2dO)単位の数を表し、1〜100の整数であり、5〜50の整数が好ましく、5〜30の整数が特に好ましい。
fは、(CFQ2CF2O)単位の数を表し、0〜100の整数であり、0〜50の整数が好ましく、0〜10が特に好ましい。In formula (Z), d is an integer of 1 to 5, an integer of 2 to 4 is preferable, and 2 is particularly preferable. When d is an integer of 3 to 5, C d F 2d may have a linear structure or a branched structure.
e is, (C d F 2d O) represents the number of units is an integer of 1 to 100, preferably an integer of 5 to 50, particularly preferably an integer of 5-30.
f represents the number of (CFQ 2 CF 2 O) units, and is an integer of 0 to 100, preferably an integer of 0 to 50, and particularly preferably 0 to 10.
eが2以上である場合、同一分子内に存在するe個のdはそれぞれ同一でも異なってもよい。すなわちe個の(CdF2dO)単位はそれぞれ同一でも異なってもよい。
fが2以上である場合、同一分子内に存在するf個のQ2はそれぞれ同一でも異なってもよい。すなわちf個の(CFQ2CF2O)単位はそれぞれ同一でも異なってもよい。When e is 2 or more, e ds present in the same molecule may be the same or different. That is, the e (C d F 2d O) units may be the same or different.
If f is 2 or more, f-number of Q 2 to which exist in the same molecule may be the same as or different from each other. That is, the f (CFQ 2 CF 2 O) units may be the same or different.
e+fが2以上である場合、分子内での−[(CdF2dO)e(CFQ2CF2O)f]−におけるe個の(CdF2dO)単位およびf個の(CFQ2CF2O)単位の並びはいかなる順序であってもよい。
たとえば、(CdF2dO)単位および(CFQ2CF2O)単位がそれぞれ1つずつ存在する場合には、R−P2−が結合する単位は、(CdF2dO)単位であっても(CFQ2CF2O)単位であってもよい。
(CdF2dO)−単位および(CFQ2CF2O)単位が存在し、かつ、少なくとも一方の単位が2単位以上存在する場合には、これらの単位の配列はブロック状であってもランダム状であってもよい。When e + f is 2 or more, in the molecule - [(C d F 2d O ) e (CFQ 2 CF 2 O) f] - in the e-number (C d F 2d O) units and f-number of (CFQ sequence of 2 CF 2 O) units may be any order.
For example, when one (C d F 2d O) unit and one (CFQ 2 CF 2 O) unit are present, the unit to which R—P 2 — is bonded is (C d F 2d O) unit. It may be a (CFQ 2 CF 2 O) unit.
(C d F 2d O) - is present units and (CFQ 2 CF 2 O) units, and, when at least one of the units are present or 2 units, even sequences of these units blocky It may be random.
式(Z)中、P2は、ヒドロキシ基およびアルコキシ基のいずれも含まない2価の連結基または単結合である。
ヒドロキシ基およびアルコキシ基のいずれも含まない2価の連結基としては、ヒドロキシ基およびアルコキシ基のいずれも含まない2価の有機基、−O−等が挙げられる。該有機基の具体例としては、P1で挙げたものと同様のものが挙げられる。
P2としては、−O−が好ましい。In formula (Z), P 2 is a divalent linking group or a single bond that does not contain either a hydroxy group or an alkoxy group.
Examples of the divalent linking group containing neither a hydroxy group nor an alkoxy group include a divalent organic group containing neither a hydroxy group nor an alkoxy group, -O-, and the like. Specific examples of the organic group include the same ones as mentioned in P 1.
P 2 is preferably —O—.
式(Z)中、Q2はフッ素原子以外のハロゲン原子、水素原子、1価の炭化水素基、フルオロアルキル基、または炭素−炭素原子間にエーテル性酸素原子が挿入されたフルオロアルキル基である。
フッ素原子以外のハロゲン原子、1価の炭化水素基、フルオロアルキル基、炭素−炭素原子間にエーテル性酸素原子が挿入されたフルオロアルキル基としてはそれぞれ、Q1で挙げたものと同様のものが挙げられる。In formula (Z), Q 2 is a halogen atom other than a fluorine atom, a hydrogen atom, a monovalent hydrocarbon group, a fluoroalkyl group, or a fluoroalkyl group in which an etheric oxygen atom is inserted between carbon-carbon atoms. .
Halogen atoms other than fluorine atoms, monovalent hydrocarbon groups, fluoroalkyl groups, and fluoroalkyl groups in which an etheric oxygen atom is inserted between carbon-carbon atoms are the same as those listed for Q 1. Can be mentioned.
式(Z)中、Rは水素原子、ハロゲン原子、1価の炭化水素基、フルオロアルキル基、または炭素−炭素原子間にエーテル性酸素原子が挿入されたフルオロアルキル基である。
ハロゲン原子としては、フッ素原子、塩素原子、ヨウ素原子、臭素原子等が挙げられ、フッ素原子が好ましい。
1価の炭化水素基は、飽和でも不飽和でもよく、飽和の炭化水素基(アルキル基)であることが好ましい。該炭化水素基の構造は、直鎖構造、分岐鎖構造、環構造、部分的に環構造を有する構造のいずれでもよく、直鎖構造または分岐鎖構造が好ましく、直鎖構造が特に好ましい。該炭化水素基の炭素数は1〜20が好ましい。該炭化水素基としては、アルキル基が好ましい。
フルオロアルキル基は、アルキル基の水素原子の一部がフッ素原子に置換されたフルオロアルキル基でもぺルフルオロアルキル基でもよい。フルオロアルキル基の構造は、直鎖構造、分岐鎖構造、環構造、部分的に環構造を有する構造のいずれでもよく、直鎖構造または分岐鎖構造が好ましく、直鎖構造が特に好ましい。フルオロアルキル基の炭素数は、1〜100が好ましく、1〜10が特に好ましい。
炭素−炭素原子間にエーテル性酸素原子が挿入されたフルオロアルキル基におけるフルオロアルキル基は、アルキル基の水素原子の一部がフッ素原子に置換されたフルオロアルキル基でもぺルフルオロアルキル基でもよい。該フルオロアルキル基の炭素数は、2〜100が好ましく、2〜10が特に好ましい。
Rの具体例としては、以下の基(R−1)〜(R−4)等が挙げられ、基(R−1)が好ましい。
CF3(CF2)p− …(R−1)
CF3CF(CF3)− …(R−2)
Cy F−(CF2)q− …(R−3)
Ad F−(CF2)r− …(R−4)
ただし、pは0〜15の整数(好ましくは0〜9の整数)を示し、Cy Fはペルフルオロシクロヘキシル基を示し、qは0〜15の整数を示し、Ad Fはペルフルオロアダマンチル基を示し、rは0〜15の整数を示す。In formula (Z), R is a hydrogen atom, a halogen atom, a monovalent hydrocarbon group, a fluoroalkyl group, or a fluoroalkyl group in which an etheric oxygen atom is inserted between carbon-carbon atoms.
Examples of the halogen atom include a fluorine atom, a chlorine atom, an iodine atom, and a bromine atom, and a fluorine atom is preferable.
The monovalent hydrocarbon group may be saturated or unsaturated, and is preferably a saturated hydrocarbon group (alkyl group). The structure of the hydrocarbon group may be any of a straight chain structure, a branched chain structure, a ring structure, and a structure having a partial ring structure, preferably a linear structure or a branched chain structure, and particularly preferably a linear structure. As for carbon number of this hydrocarbon group, 1-20 are preferred. As the hydrocarbon group, an alkyl group is preferable.
The fluoroalkyl group may be a fluoroalkyl group in which a part of hydrogen atoms of the alkyl group is substituted with a fluorine atom or a perfluoroalkyl group. The structure of the fluoroalkyl group may be any of a straight chain structure, a branched chain structure, a ring structure, and a structure having a partial ring structure, preferably a linear structure or a branched chain structure, and particularly preferably a linear structure. 1-100 are preferable and, as for carbon number of a fluoroalkyl group, 1-10 are especially preferable.
The fluoroalkyl group in the fluoroalkyl group in which an etheric oxygen atom is inserted between carbon-carbon atoms may be a fluoroalkyl group in which a part of hydrogen atoms of the alkyl group is substituted with a fluorine atom or a perfluoroalkyl group. 2-100 are preferable and, as for carbon number of this fluoroalkyl group, 2-10 are especially preferable.
Specific examples of R include the following groups (R-1) to (R-4), and the group (R-1) is preferable.
CF 3 (CF 2 ) p − (R-1)
CF 3 CF (CF 3 ) − (R-2)
C y F - (CF 2) q - ... (R-3)
Ad F- (CF 2 ) r- (R-4)
Here, p is an integer (preferably an integer from 0 to 9) of 0 to 15, C y F represents a perfluorinated cyclohexyl group, q represents an integer of 0 to 15, A d F represents a perfluorinated adamantyl group , R represents an integer of 0-15.
式(Z)においては、dが2、eが1〜100の整数、fが0〜10、P2が−O−であることが好ましい。すなわち、基(Z)が、以下の基(Z−1)であることが好ましい。
R−O−(CF2CF2O)e− …(Z−1)In formula (Z), d is preferably 2, e is an integer of 1 to 100, f is 0 to 10, and P 2 is —O—. That is, the group (Z) is preferably the following group (Z-1).
R—O— (CF 2 CF 2 O) e − (Z-1)
式(Z−1)中、eは1〜100の整数であり、5〜50の整数が好ましく、5〜30の整数が特に好ましい。
Rは前記と同じ意味であり、基(R−1)〜(R−4)のいずれかであることが好ましく、基(R−1)が特に好ましい。In formula (Z-1), e is an integer of 1 to 100, an integer of 5 to 50 is preferable, and an integer of 5 to 30 is particularly preferable.
R has the same meaning as described above, preferably any one of groups (R-1) to (R-4), and particularly preferably group (R-1).
基(Z−1)としては、以下の基(Z−11)〜(Z−14)のいずれかであることが特に好ましい。
CF3−O−(CF2CF2O)g− …(Z−11)
CF3CF2−O−(CF2CF2O)g− …(Z−12)
CF3(CF2)2−O−(CF2CF2O)g− …(Z−13)
CF3(CF2)5−O−(CF2CF2O)g− …(Z−14)The group (Z-1) is particularly preferably any of the following groups (Z-11) to (Z-14).
CF 3 —O— (CF 2 CF 2 O) g − (Z-11)
CF 3 CF 2 -O- (CF 2 CF 2 O) g - ... (Z-12)
CF 3 (CF 2) 2 -O- (CF 2 CF 2 O) g - ... (Z-13)
CF 3 (CF 2) 5 -O- (CF 2 CF 2 O) g - ... (Z-14)
式(A)中、nは5または6である。
mは0〜10の整数であり、0〜3の整数が好ましく、0または1が特に好ましい。
n+mは5〜16の整数であり、5〜9の整数が好ましく、5〜7の整数が特に好ましい。n+m(YAの価数)が上記範囲であると、基材との密着性に優れる。
化合物(A)が有するn個の基(X)はそれぞれ同一でも異なってもよい。mが2以上である場合、化合物(A)が有するm個の基(Z)はそれぞれ同一でも異なってもよい。In the formula (A), n is 5 or 6.
m is an integer of 0 to 10, an integer of 0 to 3 is preferable, and 0 or 1 is particularly preferable.
n + m is an integer of 5 to 16, an integer of 5 to 9 is preferable, and an integer of 5 to 7 is particularly preferable. When n + m (the valence of Y A ) is in the above range, the adhesion to the substrate is excellent.
The n groups (X) possessed by the compound (A) may be the same or different. When m is 2 or more, m groups (Z) of the compound (A) may be the same or different.
式(A)中、YAは(n+m)価の連結基である。
YAとしては、たとえば、(n+m)価のフルオロ飽和炭化水素基、炭素−炭素原子間にエーテル性酸素原子が挿入された(n+m)価のフルオロ飽和炭化水素基、(n+m)価のシクロホスファゼン基等が挙げられる。これらの中でも、(n+m)価のフルオロ飽和炭化水素基、または炭素−炭素原子間にエーテル性酸素原子が挿入された(n+m)価のフルオロ飽和炭化水素基が好ましい。In formula (A), Y A is an (n + m) -valent linking group.
The Y A, for example, (n + m) valent fluoro saturated hydrocarbon group, a carbon - etheric oxygen atom between carbon atoms are inserted (n + m) valent fluoro saturated hydrocarbon group, (n + m) valent Cyclophosphazene Groups and the like. Among these, a (n + m) -valent fluoro saturated hydrocarbon group or a (n + m) -valent fluoro saturated hydrocarbon group in which an etheric oxygen atom is inserted between carbon-carbon atoms is preferable.
フルオロ飽和炭化水素基は、飽和炭化水素基の水素原子の一部がフッ素原子に置換されたフルオロ飽和炭化水素基でもぺルフルオロ飽和炭化水素基でもよく、ぺルフルオロ飽和炭化水素基が好ましい。ぺルフルオロ飽和炭化水素基の構造は、分岐鎖構造、環構造、部分的に環構造を有する構造のいずれでもよく、分岐鎖構造が好ましい。ぺルフルオロ飽和炭化水素基の炭素数は2〜50が好ましく、2〜20がより好ましく、5〜20が特に好ましい。 The fluoro saturated hydrocarbon group may be a fluoro saturated hydrocarbon group or a perfluoro saturated hydrocarbon group in which a part of hydrogen atoms of the saturated hydrocarbon group is substituted with a fluorine atom, and a perfluoro saturated hydrocarbon group is preferred. The structure of the perfluoro saturated hydrocarbon group may be any of a branched chain structure, a ring structure and a structure having a partial ring structure, and a branched chain structure is preferred. 2-50 are preferable, as for carbon number of a perfluoro saturated hydrocarbon group, 2-20 are more preferable, and 5-20 are especially preferable.
炭素−炭素原子間にエーテル性酸素原子が挿入されたぺルフルオロ飽和炭化水素基におけるぺルフルオロ飽和炭化水素基は、前記と同様のものが挙げられる。炭素−炭素原子間にエーテル性酸素原子が挿入されたぺルフルオロ飽和炭化水素基が有するエーテル性酸素原子の数は特に限定されないが、1〜3個が好ましい。
なお、エーテル性酸素原子は炭素−炭素原子間に存在することから、基(X)、基(Y)それぞれに結合するYAの末端部分にはエーテル性酸素原子は存在しない。Examples of the perfluoro saturated hydrocarbon group in the perfluoro saturated hydrocarbon group in which an etheric oxygen atom is inserted between carbon-carbon atoms are the same as those described above. The number of etheric oxygen atoms in the perfluoro saturated hydrocarbon group having an etheric oxygen atom inserted between carbon-carbon atoms is not particularly limited, but 1 to 3 is preferable.
Incidentally, etheric oxygen atom is a carbon - since there between carbon atoms, group (X), groups (Y) do not exist etheric oxygen atoms in the terminal portion of Y A to bind to each.
化合物(A)の安定性の点から、化合物(A)中には−OCF2O−構造が存在しないことが好ましい。したがって、YAが、(n+m)価のフルオロ飽和炭化水素基、または炭素−炭素原子間にエーテル性酸素原子が挿入された(n+m)価のフルオロ飽和炭化水素基である場合、YAは、−OCF2O−構造が存在しないことが好ましい。
−OCF2O−構造が存在しないとは、通常の分析手法(19F−NMR等)では該構造の存在が検出できないことを意味する。From the viewpoint of stability of the compound (A), it is preferred that no -OCF 2 O-structure in the compound (A). Therefore, when Y A is a (n + m) -valent fluoro saturated hydrocarbon group or a (n + m) -valent fluoro saturated hydrocarbon group in which an etheric oxygen atom is inserted between carbon-carbon atoms, Y A is Preferably no —OCF 2 O— structure is present.
The absence of the —OCF 2 O— structure means that the presence of the structure cannot be detected by a normal analysis method ( 19 F-NMR or the like).
YAの具体例としては、たとえば、(n+m)価の多価アルコールからヒドロキシ基を除いた構造の基をフルオロ化した基、シクロホスファゼン化合物からリン原子に結合した置換基を除いた構造の基等が挙げられる。
(n+m)価の多価アルコールはエーテル性酸素原子を有していてもよい。(n+m)価の多価アルコールからヒドロキシ基を除いた構造の基をフルオロ化した基としては、ペルフルオロ有機基が好ましい。
(n+m)価の多価アルコールとしては、たとえばグルコース、ジペンタエリスリトール、ソルビトール等の糖アルコール等が挙げられる。
(n+m)価の多価アルコールからヒドロキシ基を除いた構造の基をフルオロ化した基の具体例としては、以下の基(Y5−1)、(Y6−1)等が挙げられる。
シクロホスファゼン化合物からリン原子に結合した置換基を除いた構造の基の具体例としては、以下の基(Y6−2)等が挙げられる。Specific examples of Y A, for example, (n + m) valent polyhydric based on fluorinated and groups of the structure obtained by removing a hydroxy group from an alcohol, group of the structure excluding the substituents attached to the phosphorus atom of cyclophosphazene compound Etc.
The (n + m) -valent polyhydric alcohol may have an etheric oxygen atom. As a group obtained by fluorinating a group having a structure obtained by removing a hydroxy group from an (n + m) -valent polyhydric alcohol, a perfluoro organic group is preferable.
Examples of the (n + m) -valent polyhydric alcohol include sugar alcohols such as glucose, dipentaerythritol and sorbitol.
Specific examples of the group obtained by fluorinating a group having a structure obtained by removing a hydroxy group from an (n + m) -valent polyhydric alcohol include the following groups (Y5-1) and (Y6-1).
Specific examples of the group having a structure obtained by removing a substituent bonded to a phosphorus atom from a cyclophosphazene compound include the following group (Y6-2).
化合物(A)としては、式(A)中のmが0〜3の整数、Xが基(X−1)、Zが基(Z−1)である化合物、すなわち以下に示す化合物(A−1)であることが好ましい。
HO−CH2−CF2O−(CF2CF2O)b−1− …(X−1)
R−O−(CF2CF2O)e− …(Z−1)
式(X−1)中、bは1〜100の整数であり、5〜50の整数が好ましく、5〜30の整数が特に好ましい。
式(Z−1)中、eは1〜100の整数であり、5〜50の整数が好ましく、5〜30の整数が特に好ましい。
Rは前記と同じ意味である。As the compound (A), m in the formula (A) is an integer of 0 to 3, X is a group (X-1), Z is a group (Z-1), that is, a compound (A- 1) is preferable.
HO—CH 2 —CF 2 O— (CF 2 CF 2 O) b-1 − (X-1)
R—O— (CF 2 CF 2 O) e − (Z-1)
In formula (X-1), b is an integer of 1-100, the integer of 5-50 is preferable and the integer of 5-30 is especially preferable.
In formula (Z-1), e is an integer of 1 to 100, an integer of 5 to 50 is preferable, and an integer of 5 to 30 is particularly preferable.
R has the same meaning as described above.
(X1)n−YA1−(Z1)m1 …(A−1)
式(A−1)中、X1は基(X−1)であり、Z1は基(Z−1)であり、nは前記と同じ意味であり、m1は0〜3の整数(好ましくは0または1)であり、YA1は(n+m1)価の連結基である。
式中のn個の基(X−1)はそれぞれ同一でも異なってもよい。m1が2以上である場合、式中のm1個の基(Z−1)はそれぞれ同一でも異なってもよい。
YA1における(n+m1)価の連結基としては、YAで挙げたものと同様のものが挙げられる。(X 1 ) n -Y A1- (Z 1 ) m1 (A-1)
In the formula (A-1), X 1 is a group (X-1), Z 1 is a group (Z-1), n has the same meaning as described above, and m1 is an integer of 0 to 3 (preferably Is 0 or 1), and Y A1 is a (n + m1) -valent linking group.
The n groups (X-1) in the formula may be the same or different. When m1 is 2 or more, m1 groups (Z-1) in the formula may be the same or different.
Examples of the (n + m1) -valent linking group in Y A1 include the same groups as those described for Y A.
化合物(A−1)としては、下記の化合物(A−11)〜(A−14)等が好ましい。
(X1)5−Y5 …(A−11)
(X1)5−Y6−Z1 …(A−12)
(X1)6−Y6 …(A−13)
(X1)6−Y7−Z1 …(A−14)
式中、X1およびZ1はそれぞれ前記と同じ意味であり、好ましい範囲も同様である。Y5は5価の連結基であり、Y6は6価の連結基であり、Y7は7価の連結基である。
Y5、Y6、Y7としてはそれぞれ、YAで挙げた連結基のうち、5、6または7価のものと同様であってよい。5価の連結基の具体例としては、たとえば基(Y5−1)が挙げられる。6価の連結基の具体例としては、たとえば基(Y6−1)、基(Y6−2)が挙げられる。As the compound (A-1), the following compounds (A-11) to (A-14) and the like are preferable.
(X 1 ) 5 -Y 5 (A-11)
(X 1 ) 5 -Y 6 -Z 1 (A-12)
(X 1 ) 6 -Y 6 (A-13)
(X 1 ) 6 -Y 7 -Z 1 (A-14)
In the formula, X 1 and Z 1 have the same meanings as described above, and preferred ranges thereof are also the same. Y 5 is a pentavalent linking group, Y 6 is a hexavalent linking group, and Y 7 is a 7 valent linking group.
Y 5 , Y 6 , and Y 7 may each be the same as the 5- , 6-, or 7-valent linking groups listed for Y A. Specific examples of the pentavalent linking group include a group (Y5-1). Specific examples of the hexavalent linking group include a group (Y6-1) and a group (Y6-2).
化合物(A)の数平均分子量(Mn)は、500〜50,000であることが好ましく、2,000〜20,000が特に好ましい。
化合物(A)の分子量分布(Mw/Mn)は、1.00〜1.65であることが好ましく、1.00〜1.50が特に好ましい。
数平均分子量および分子量分布が上記の範囲内にあると、基材との密着性、耐久性に優れ、揮発性が低い。The number average molecular weight (Mn) of the compound (A) is preferably 500 to 50,000, particularly preferably 2,000 to 20,000.
The molecular weight distribution (Mw / Mn) of the compound (A) is preferably 1.00 to 1.65, and particularly preferably 1.00 to 1.50.
When the number average molecular weight and the molecular weight distribution are within the above ranges, the adhesion to the substrate and the durability are excellent, and the volatility is low.
本発明の含フッ素エーテル組成物が含む化合物(A)は1種でも2種以上でもよい。
本発明の含フッ素エーテル組成物中の化合物(A)の含有量は、化合物(A)と化合物(B)との合計量に対して15〜80質量%であり、40〜60質量%が好ましい。該含有量が上記範囲の下限値以上であると、本発明の含フッ素エーテル組成物の磁気ディスク等に対する密着性が優れたものとなる。該含有量が上記範囲の上限値以下であると、化合物(B)の比率が高くなることで、本発明の含フッ素エーテル組成物の潤滑性が優れたものとなる。1 type or 2 types or more may be sufficient as the compound (A) which the fluorine-containing ether composition of this invention contains.
Content of the compound (A) in the fluorine-containing ether composition of this invention is 15-80 mass% with respect to the total amount of a compound (A) and a compound (B), and 40-60 mass% is preferable. . When the content is at least the lower limit of the above range, the adhesion of the fluorine-containing ether composition of the present invention to a magnetic disk or the like is excellent. When the content is not more than the upper limit of the above range, the ratio of the compound (B) becomes high, whereby the lubricity of the fluorinated ether composition of the present invention becomes excellent.
(化合物(B))
化合物(B)は、YBにs個の1価の基(X)およびt個の1価の基(Z)が結合した化合物である。
(X)s−YB−(Z)t …(B)(Compound (B))
Compound (B) is a compound the s monovalent group (X) and t pieces of monovalent groups (Z) is bonded to Y B.
(X) s -Y B- (Z) t (B)
基(X)、基(Y)はそれぞれ、化合物(A)の説明で挙げた基(X)、基(Y)と同様である。
化合物(B)が有する基(X)、基(Y)はそれぞれ、化合物(A)が有する基(X)、基(Y)と同一でも異なってもよい。The group (X) and the group (Y) are the same as the group (X) and the group (Y) mentioned in the description of the compound (A), respectively.
The group (X) and group (Y) included in the compound (B) may be the same as or different from the group (X) and group (Y) included in the compound (A).
式(B)中、sは0〜4の整数であり、2〜4の整数が好ましく、3または4が特に好ましい。
tは0〜10の整数であり、0〜3の整数が好ましい。
s+tは2〜14の整数であり、2〜10の整数が好ましく、3〜6の整数が特に好ましい。s+t(YBの価数)が上記範囲であると、製造がしやすく、沸点も適切であり、かつ潤滑性に優れる。
sが2以上である場合、化合物(B)が有するs個の基(X)はそれぞれ同一でも異なってもよい。tが2以上である場合、化合物(B)が有するt個の基(Z)はそれぞれ同一でも異なってもよい。In the formula (B), s is an integer of 0 to 4, an integer of 2 to 4 is preferable, and 3 or 4 is particularly preferable.
t is an integer of 0 to 10, and an integer of 0 to 3 is preferable.
s + t is an integer of 2 to 14, an integer of 2 to 10 is preferable, and an integer of 3 to 6 is particularly preferable. If s + t (valence of Y B) is in the above range, easier to manufacture, boiling also suitable, and excellent lubricity.
When s is 2 or more, the s groups (X) of the compound (B) may be the same or different. When t is 2 or more, t groups (Z) of the compound (B) may be the same or different.
YBは(s+t)価の連結基である。
YBとしては、たとえば、(s+t)価のフルオロ飽和炭化水素基、炭素−炭素原子間にエーテル性酸素原子が挿入された(s+t)価のフルオロ飽和炭化水素基、(s+t)価のシクロホスファゼン基等が挙げられる。これらの中でも、(s+t)価のフルオロ飽和炭化水素基、または炭素−炭素原子間にエーテル性酸素原子が挿入された(s+t)価のフルオロ飽和炭化水素基が好ましい。Y B is a (s + t) -valent linking group.
Y B includes, for example, (s + t) -valent fluoro saturated hydrocarbon group, (s + t) -valent fluoro saturated hydrocarbon group in which an etheric oxygen atom is inserted between carbon-carbon atoms, and (s + t) -valent cyclophosphazene. Groups and the like. Among these, a (s + t) -valent fluoro saturated hydrocarbon group or a (s + t) -valent fluoro saturated hydrocarbon group in which an etheric oxygen atom is inserted between carbon-carbon atoms is preferable.
フルオロ飽和炭化水素基は、飽和炭化水素基の水素原子の一部がフッ素原子に置換されたフルオロ飽和炭化水素基でもぺルフルオロ飽和炭化水素基でもよく、ぺルフルオロ飽和炭化水素基が好ましい。ぺルフルオロ飽和炭化水素基の構造は、分岐鎖構造、環構造、部分的に環構造を有する構造のいずれでもよく、分岐鎖構造が好ましい。ぺルフルオロ飽和炭化水素基の炭素数は2〜50が好ましく、2〜20がより好ましく、5〜20が特に好ましい。 The fluoro saturated hydrocarbon group may be a fluoro saturated hydrocarbon group or a perfluoro saturated hydrocarbon group in which a part of hydrogen atoms of the saturated hydrocarbon group is substituted with a fluorine atom, and a perfluoro saturated hydrocarbon group is preferred. The structure of the perfluoro saturated hydrocarbon group may be any of a branched chain structure, a ring structure and a structure having a partial ring structure, and a branched chain structure is preferred. 2-50 are preferable, as for carbon number of a perfluoro saturated hydrocarbon group, 2-20 are more preferable, and 5-20 are especially preferable.
炭素−炭素原子間にエーテル性酸素原子が挿入されたぺルフルオロ飽和炭化水素基におけるぺルフルオロ飽和炭化水素基は、前記と同様のものが挙げられる。炭素−炭素原子間にエーテル性酸素原子が挿入されたぺルフルオロ飽和炭化水素基が有するエーテル性酸素原子の数は特に限定されないが、1〜3個が好ましい。
なお、エーテル性酸素原子は炭素−炭素原子間に存在することから、基(X)、基(Y)それぞれに結合するYBの末端部分にはエーテル性酸素原子は存在しない。Examples of the perfluoro saturated hydrocarbon group in the perfluoro saturated hydrocarbon group in which an etheric oxygen atom is inserted between carbon-carbon atoms are the same as those described above. The number of etheric oxygen atoms in the perfluoro saturated hydrocarbon group having an etheric oxygen atom inserted between carbon-carbon atoms is not particularly limited, but 1 to 3 is preferable.
Incidentally, etheric oxygen atom is a carbon - since there between carbon atoms, group (X), groups (Y) do not exist etheric oxygen atoms in the terminal portion of the Y B binding, respectively.
化合物(B)の安定性の点から、化合物(B)中には−OCF2O−構造が存在しないことが好ましい。したがって、YBが、(s+t)価のフルオロ飽和炭化水素基、または炭素−炭素原子間にエーテル性酸素原子が挿入された(s+t)価のフルオロ飽和炭化水素基である場合、YBは、−OCF2O−構造が存在しないことが好ましい。From the viewpoint of the stability of the compound (B), it is preferable that no —OCF 2 O— structure exists in the compound (B). Therefore, when Y B is a (s + t) -valent fluoro saturated hydrocarbon group or a (s + t) -valent fluoro saturated hydrocarbon group in which an etheric oxygen atom is inserted between carbon-carbon atoms, Y B is Preferably no —OCF 2 O— structure is present.
YBが3価の連結基である場合、YBとしては、ペルフルオロアルカン−トリイル基が好ましい。ペルフルオロアルカン−トリイル基の炭素数は、1〜20が好ましく、3〜5が特に好ましい。たとえば、グリセリンなどの3価アルコールからヒドロキシ基を除いた構造の基をペルフルオロ化した、ペルフルオロ有機基等が挙げられる。
3価の連結基の具体例としては、以下の基(Y3−1)〜(Y3−3)等が挙げられる。式(Y3−2)〜(Y3−3)中、kは1〜10の整数を示す。同一分子中に存在する3個のkは互いに同一であっても異なっていてもよい。If Y B is a trivalent linking group, the Y B, perfluoroalkanes - triyl group. 1-20 are preferable and, as for carbon number of a perfluoroalkane-triyl group, 3-5 are especially preferable. For example, a perfluoro organic group in which a group having a structure in which a hydroxy group is removed from a trihydric alcohol such as glycerin is perfluorinated is exemplified.
Specific examples of the trivalent linking group include the following groups (Y3-1) to (Y3-3). In formulas (Y3-2) to (Y3-3), k represents an integer of 1 to 10. The three k present in the same molecule may be the same or different from each other.
YBが4価の連結基である場合、YBとしては、ペルフルオロアルカン−テトライル基、または炭素−炭素原子間にエーテル性酸素原子が挿入されたペルフルオロアルカン−テトライル基が好ましい。ペルフルオロアルカン−テトライル基の炭素数は、1〜20が好ましく、3〜5が特に好ましい。たとえば、エリスリトール、ペンタエリスリトール、ジグリセリンなどの4価アルコールからヒドロキシ基を除いた構造の基をペルフルオロ化したペルフルオロ有機基等が挙げられる。
4価の連結基の具体例としては、以下の基(Y4−1)〜(Y4−3)等が挙げられる。If Y B is a tetravalent linking group, the Y B, perfluoroalkanes - tetrayl group or a carbon, - perfluoroalkanes etheric oxygen atom inserted between carbon atom - tetrayl group. 1-20 are preferable and, as for carbon number of a perfluoro alkane- tetrayl group, 3-5 are especially preferable. For example, a perfluoro organic group obtained by perfluorinating a group having a structure obtained by removing a hydroxy group from a tetrahydric alcohol such as erythritol, pentaerythritol, and diglycerin can be used.
Specific examples of the tetravalent linking group include the following groups (Y4-1) to (Y4-3).
YBが5価の連結基である場合の連結基の具体例としては、たとえば前記の基(Y5−1)が挙げられる。
YBが6価の連結基である場合の具体例としては、たとえば前記の基(Y6−1)、基(Y6−2)が挙げられる。Specific examples of the linking group when Y B is a 5 divalent linking group, for example the group (Y5-1) and the like.
Specific examples of the case where Y B is a hexavalent linking group, for example the group (Y6-1), group (Y6-2) and the like.
化合物(B)としては、式(B)中のsが4、Xが基(X−1)、Zが基(Z−1)である化合物、すなわち以下に示す化合物(B−1)であることが好ましい。
HO−CH2−CF2O−(CF2CF2O)b―1− …(X−1)
R−O−(CF2CF2O)e− …(Z−1)
基(X−1)、基(Z−1)はそれぞれ前記化合物(A−1)における基(X−1)、基(Z−1)と同じである。
化合物(B−1)が有する基(X−1)、基(Y−1)はそれぞれ、化合物(A−1)が有する基(X−1)、基(Y−1)と同一でも異なってもよい。The compound (B) is a compound in which s in the formula (B) is 4, X is a group (X-1), and Z is a group (Z-1), that is, the compound (B-1) shown below. It is preferable.
HO—CH 2 —CF 2 O— (CF 2 CF 2 O) b-1 − (X-1)
R—O— (CF 2 CF 2 O) e − (Z-1)
The group (X-1) and the group (Z-1) are the same as the group (X-1) and the group (Z-1) in the compound (A-1), respectively.
The group (X-1) and group (Y-1) of the compound (B-1) are the same as or different from the group (X-1) and group (Y-1) of the compound (A-1). Also good.
(X1)4−YB1−(Z1)t …(B−1)
式(B−1)中、X1は基(X−1)であり、Z1は基(Z−1)であり、tは前記と同じ意味であり、YB1は(4+t)価の連結基である。式(B−1)中のtは0〜2が好ましい。
式中の4個の基(X−1)はそれぞれ同一でも異なってもよい。tが2以上である場合、式中のt個の基(Z−1)はそれぞれ同一でも異なってもよい。
YB1における(4+t)価の連結基としては、YBで挙げたものと同様のものが挙げられる。特に、前記の4〜6価の多価アルコールからヒドロキシ基を除いた構造の基をフルオロ化した、ペルフルオロ有機基が好ましい。(X 1 ) 4 -Y B1- (Z 1 ) t (B-1)
In formula (B-1), X 1 is a group (X-1), Z 1 is a group (Z-1), t has the same meaning as described above, and Y B1 is a (4 + t) -valent linkage. It is a group. As for t in Formula (B-1), 0-2 are preferable.
The four groups (X-1) in the formula may be the same or different. When t is 2 or more, t groups (Z-1) in the formula may be the same or different.
Examples of the (4 + t) -valent linking group in Y B1 include the same groups as those described above for Y B. In particular, a perfluoro organic group obtained by fluorinating a group having a structure in which a hydroxy group is removed from the above-described tetravalent to hexavalent polyhydric alcohol is preferable.
化合物(B−1)としては、下記の化合物(B−11)、(B−12)が好ましい。
(X1)4−Y4 …(B−11)
(X1)4−Y5−Z1 …(B−12)
式中、X1およびZ1はそれぞれ前記と同じ意味であり、Y4は4価の連結基であり、Y5は5価の連結基である。
Y4、Y5としてはそれぞれ、YBで挙げた4または5価の連結基と同様のものが挙げられる。As the compound (B-1), the following compounds (B-11) and (B-12) are preferable.
(X 1 ) 4 -Y 4 (B-11)
(X 1 ) 4 -Y 5 -Z 1 (B-12)
In the formula, each of X 1 and Z 1 has the same meaning as described above, Y 4 is a tetravalent linking group, and Y 5 is a pentavalent linking group.
Examples of Y 4 and Y 5 include the same as the tetravalent or pentavalent linking group exemplified for Y B.
化合物(B)の数平均分子量(Mn)は、500〜10,000であることが好ましく、1,000〜10,000が特に好ましい。
化合物(A)の分子量分布(Mw/Mn)は、1.00〜1.65であることが好ましく、1.00〜1.50が特に好ましい。
数平均分子量および分子量分布が上記の範囲内にあると、基材との密着性に優れ、揮発性が低い。The number average molecular weight (Mn) of the compound (B) is preferably 500 to 10,000, particularly preferably 1,000 to 10,000.
The molecular weight distribution (Mw / Mn) of the compound (A) is preferably 1.00 to 1.65, and particularly preferably 1.00 to 1.50.
When the number average molecular weight and molecular weight distribution are in the above ranges, the adhesion to the substrate is excellent and the volatility is low.
本発明の含フッ素エーテル組成物が含む化合物(B)は1種でも2種以上でもよい。
本発明の含フッ素エーテル組成物中の化合物(B)の含有量は、化合物(A)と化合物(B)との合計量に対して20〜85質量%であり、40〜60質量%が好ましい。The compound (B) contained in the fluorine-containing ether composition of the present invention may be one type or two or more types.
Content of the compound (B) in the fluorine-containing ether composition of this invention is 20-85 mass% with respect to the total amount of a compound (A) and a compound (B), and 40-60 mass% is preferable. .
本発明の含フッ素エーテル組成物中、化合物(A)と化合物(B)との合計の含有量は、含フッ素エーテル組成物の総質量に対し、80〜100質量%以上が好ましく、90〜100質量%以上がより好ましく、100質量%が特に好ましい。化合物(A)と化合物(B)との合計の含有量が上記下限値以上であると、基材への密着性および潤滑性に優れる。 In the fluorine-containing ether composition of the present invention, the total content of the compound (A) and the compound (B) is preferably 80 to 100% by mass or more based on the total mass of the fluorine-containing ether composition, and 90 to 100 More preferably, it is more preferably 100% by mass or more. When the total content of the compound (A) and the compound (B) is not less than the above lower limit, the adhesion to the substrate and the lubricity are excellent.
本発明の含フッ素エーテル組成物においては、化合物(A)と化合物(B)との合計での数平均分子量が、500〜50,000であることが好ましく、1,000〜20,000であることが特に好ましい。該合計での数平均分子量が上記範囲内にあると、基材への密着性、潤滑性に優れ、揮発性も低く長期耐久性に優れる。
該合計での数平均分子量は、化合物(A)と化合物(B)とを、当該含フッ素エーテル組成物における化合物(A)と化合物(B)との含有量の比で混合し、得られる混合物について数平均分子量を測定することにより確認できる。含フッ素エーテル組成物が化合物(A)と化合物(B)とからなる場合、該合計での数平均分子量は、該含フッ素エーテル組成物について測定される数平均分子量と同じでる。In the fluorine-containing ether composition of the present invention, the total number average molecular weight of the compound (A) and the compound (B) is preferably 500 to 50,000, and preferably 1,000 to 20,000. It is particularly preferred. When the total number average molecular weight is within the above range, adhesion to a substrate and lubricity are excellent, volatility is low, and long-term durability is excellent.
The total number average molecular weight is obtained by mixing the compound (A) and the compound (B) in a ratio of the content of the compound (A) and the compound (B) in the fluorine-containing ether composition. Can be confirmed by measuring the number average molecular weight. When the fluorinated ether composition comprises the compound (A) and the compound (B), the total number average molecular weight is the same as the number average molecular weight measured for the fluorinated ether composition.
(他の含フッ素エーテル化合物)
本発明の含フッ素エーテル組成物は、化合物(A)と化合物(B)とからなるものであってもよく、化合物(A)および化合物(B)以外の他の含フッ素エーテル化合物(以下、「化合物(C)」ともいう。)をさらに含有してもよい。
化合物(C)としては、潤滑剤等として使用され得る含フッ素エーテル化合物として公知のものを用いることができ、たとえばFONBLIN Z TETRAOL(Solvay社製)、A−20H(MORESCO社製)等が挙げられる。(Other fluorine-containing ether compounds)
The fluorine-containing ether composition of the present invention may be composed of the compound (A) and the compound (B), and other fluorine-containing ether compounds other than the compound (A) and the compound (B) (hereinafter, “ (It may also be referred to as “compound (C)”).
As the compound (C), a known fluorine-containing ether compound that can be used as a lubricant or the like can be used, and examples thereof include FONBLIN Z TETRAOL (manufactured by Solvay), A-20H (manufactured by MORESCO), and the like. .
(含フッ素エーテル組成物の製造方法)
本発明の含フッ素エーテル組成物は、たとえば、化合物(A)と化合物(B)と(必要に応じて化合物(C))を所定の質量比で混合することにより製造できる。
化合物(A)、(B)はそれぞれ、市販のものを用いてもよく、公知の製造方法を利用して製造したものを用いてもよい。
化合物(A)の製造方法を以下に示す。化合物(B)は、製造原料を、化合物(B)に対応する化学構造を有する原料に変更する以外は同様の製造方法により製造できる。(Method for producing fluorine-containing ether composition)
The fluorine-containing ether composition of the present invention can be produced, for example, by mixing the compound (A), the compound (B) and (optionally the compound (C)) at a predetermined mass ratio.
As the compounds (A) and (B), commercially available compounds may be used, or compounds manufactured using a known manufacturing method may be used.
The manufacturing method of a compound (A) is shown below. Compound (B) can be produced by the same production method except that the production raw material is changed to a raw material having a chemical structure corresponding to compound (B).
<化合物(A)の製造方法>
化合物(A)は、たとえば、国際公開第2005/068534号、国際公開第2010/027096号等に記載の方法における製造原料を、化合物(A)に対応する化学構造を有する原料に変更することにより製造できる。
たとえばYAが(n+m)価のぺルフルオロ飽和炭化水素基または炭素−炭素原子間にエーテル性酸素原子が挿入された(n+m)価のぺルフルオロ飽和炭化水素基である化合物は、国際公開第2005/068534号に記載される、化合物(A−4)を得る方法と同様にして製造できる。具体的には、多価アルコールのエチレンオキシド付加体のエステル化、液相フッ素化、エステル分解反応によって末端がCOFである化合物を得て、該化合物に下記の方法1−1または1−2の処理を行うことにより製造できる。
(方法1−1)該末端がCOFである化合物を、アルコール類または水と反応させて末端をエステルまたはカルボン酸とした後に還元することによる方法。
(方法1−2)該末端がCOFである化合物を、アルコール類とエステル交換することにより末端をエステル化した後に還元することによる方法。
このうち、本発明においては、方法1−2に記載するエステル交換による方法を採用するのが、生産効率の点から好ましい。<Method for Producing Compound (A)>
Compound (A) can be obtained, for example, by changing the production raw material in the method described in International Publication No. 2005/068534, International Publication No. 2010/027096 or the like to a raw material having a chemical structure corresponding to Compound (A). Can be manufactured.
For example Y A is (n + m) valent Bae Rufuruoro saturated hydrocarbon group or a carbon - etheric oxygen atom between carbon atoms are inserted (n + m) valent Bae Rufuruoro saturated compound is a hydrocarbon group, WO 2005 / 068534, which can be produced in the same manner as the method for obtaining compound (A-4). Specifically, a compound having a terminal COF is obtained by esterification, liquid phase fluorination, or ester decomposition reaction of an ethylene oxide adduct of a polyhydric alcohol, and the compound is treated by the following method 1-1 or 1-2. It can manufacture by performing.
(Method 1-1) A method in which a compound having COF at its terminal is reacted with alcohol or water to form a terminal or ester or carboxylic acid and then reduced.
(Method 1-2) A method in which a compound having COF at its terminal is esterified by transesterification with an alcohol and then reduced.
Among these, in the present invention, it is preferable from the viewpoint of production efficiency to employ the method by transesterification described in Method 1-2.
上記の方法において、出発原料である多価アルコールのエチレンオキシド付加体が、エチレンオキシドが付加したヒドロキシ基のほかに、フッ素化されていない状態の基(Z)を有する場合、基(X)と基(Z)とを併有する化合物が得られる。
出発原料である多価アルコールのエチレンオキシド付加体が、フッ素化されていない状態の基(Z)を有さない場合でも、液相フッ素化反応の条件が厳しい場合、分子の末端の切断反応が起こり、基(X)と基(Z)とを併有する化合物が副生することがある。In the above method, when the ethylene oxide adduct of polyhydric alcohol as a starting material has a group (Z) in a non-fluorinated state in addition to the hydroxy group to which ethylene oxide has been added, the group (X) and the group ( Z) is obtained.
Even when the ethylene oxide adduct of polyhydric alcohol, which is the starting material, does not have a non-fluorinated group (Z), if the conditions of the liquid phase fluorination reaction are severe, a molecular end cleavage reaction occurs. A compound having both the group (X) and the group (Z) may be by-produced.
出発原料となるエチレンオキシド付加体としては、種々の構造、分子量の化合物が安価に市販されており、容易に入手できる。
液相フッ素化反応におけるフッ素ガス濃度が高濃度になると、基(Z)の生成割合が高くなる傾向がある。基(Z)を有する化合物の生成を抑制したい場合には、フッ素ガス濃度は5.0〜50体積%が好ましく、10〜30体積%が特に好ましい。
反応により生成した生成物は、必要により精製工程を行い、不用な化合物を精製により除くことが好ましい。精製方法としては、イオン吸着ポリマーによって金属不純物、陰イオン不純物等を除去する方法、超臨界抽出法、カラムクロマトグラフィ法が挙げられ、これらを組み合わせた方法が好ましい。As ethylene oxide adducts used as starting materials, compounds having various structures and molecular weights are commercially available at low cost and can be easily obtained.
When the fluorine gas concentration in the liquid phase fluorination reaction becomes high, the production ratio of the group (Z) tends to increase. When it is desired to suppress the production of the compound having the group (Z), the fluorine gas concentration is preferably 5.0 to 50% by volume, particularly preferably 10 to 30% by volume.
The product produced by the reaction is preferably subjected to a purification step as necessary, and unnecessary compounds are preferably removed by purification. Examples of the purification method include a method of removing metal impurities, anion impurities, and the like with an ion-adsorbing polymer, a supercritical extraction method, and a column chromatography method, and a combination of these methods is preferable.
(作用効果)
化合物(A)は、基(X)に由来するヒドロキシ基を5または6個有する5〜6官能化合物であり、潤滑性に劣るが磁気ディスク等への密着性に優れる。化合物(B)は、基(X)に由来するヒドロキシ基を0〜4個有する0〜4官能化合物であり、密着性に劣るが潤滑性に優れる。本発明の含フッ素エーテル組成物は、化合物(A)の含有量が化合物(A)と化合物(B)との合計量に対して15〜80質量%となる比率で化合物(A)と化合物(B)とを含有することにより、化合物(A)の優れた密着性と、化合物(B)の優れた潤滑性とを両立できる。
したがって、磁気ディスク等の基材上に、本発明の含フッ素エーテル組成物を含む被膜(表面層)を設けることで、優れた潤滑性、およびその優れた耐久性を付与できる。たとえば、本発明の含フッ素エーテル組成物を潤滑剤として含む表面層を磁気ディスクの炭素保護膜上に設けることで、磁気ディスクと読み取りヘッドとの接近により接触頻度が高まっても充分に磁気ディスクおよび読み取りヘッドを保護し得る潤滑性を付与できる。また、磁気ディスクを回転させる際に潤滑剤が揮発したり、磁気ディスクの回転速度を高速化(たとえば1分間に10,000回転超)した際に潤滑剤が飛散して、潤滑性能が低下または消失する不具合が生じにくい。(Function and effect)
The compound (A) is a 5-6 functional compound having 5 or 6 hydroxy groups derived from the group (X), and is inferior in lubricity but excellent in adhesion to a magnetic disk or the like. The compound (B) is a 0 to 4 functional compound having 0 to 4 hydroxy groups derived from the group (X), and is inferior in adhesion but excellent in lubricity. In the fluorine-containing ether composition of the present invention, the compound (A) and the compound (A) have a ratio of 15 to 80% by mass with respect to the total amount of the compound (A) and the compound (B). By containing B), it is possible to achieve both excellent adhesion of the compound (A) and excellent lubricity of the compound (B).
Therefore, by providing a film (surface layer) containing the fluorine-containing ether composition of the present invention on a substrate such as a magnetic disk, excellent lubricity and excellent durability can be imparted. For example, by providing a surface layer containing the fluorine-containing ether composition of the present invention as a lubricant on the carbon protective film of the magnetic disk, even if the contact frequency increases due to the proximity of the magnetic disk and the read head, the magnetic disk and Lubricity that can protect the read head can be provided. Further, when the magnetic disk is rotated, the lubricant is volatilized, or when the rotational speed of the magnetic disk is increased (for example, more than 10,000 rotations per minute), the lubricant is scattered and the lubrication performance is reduced. Difficult to disappear.
また、本発明の含フッ素エーテル組成物によれば、薄膜(たとえば膜厚1nm以下)の表面層の形成も容易である。
これは、化合物(A)、(B)、特に化合物(A)が有するヒドロキシ基が基(X)に由来するものであることによると考えられる。すなわち、ヒドロキシ基が基(X)に由来することで、たとえば特許文献1に開示される6官能の含フッ素エーテル化合物のように−CH2CH(OH)CH2OH末端を3つ有する場合に比べて、分岐している鎖の1本あたりの長さが短い。(たとえば化合物(A)がヒドロキシ基を6個有し、該化合物と数平均分子量が同様であった場合、該化合物は−CH2CH(OH)CH2OH末端に2個のヒドロキシ基を有するため、該末端を有する基の長さはほぼ基(X)の2倍となる。)ヒドロキシ基末端間の距離が短くなるため、すべてのヒドロキシ基が基材上に結合したときに基材上の分子の高さが低くなるためと考えられる。Moreover, according to the fluorine-containing ether composition of the present invention, it is easy to form a surface layer of a thin film (for example, a film thickness of 1 nm or less).
This is considered to be due to the fact that the hydroxy groups of the compounds (A) and (B), particularly the compound (A) are derived from the group (X). That is, when the hydroxy group is derived from the group (X), for example, when it has three —CH 2 CH (OH) CH 2 OH ends like a hexafunctional fluorine-containing ether compound disclosed in Patent Document 1. In comparison, the length of one branched chain is short. (For example, when the compound (A) has 6 hydroxy groups and the number average molecular weight is the same as that of the compound, the compound has 2 hydroxy groups at the ends of —CH 2 CH (OH) CH 2 OH. Therefore, the length of the group having the terminal is almost twice as long as the group (X).) Since the distance between the hydroxyl group terminals is shortened, when all the hydroxy groups are bonded on the substrate, This is probably because the height of the molecule becomes lower.
(用途)
本発明の含フッ素エーテル組成物は、表面改質剤または界面活性剤として有用である。表面改質剤としては、潤滑剤等が挙げられる。
本発明の含フッ素エーテル組成物は、上記以外の他の用途にも用い得る。他の用途としては、電線被覆材、撥インク剤(たとえば塗装用、インクジェット等の印刷機器用)、半導体素子用接着剤(たとえばLOC(リードオンチップ)テープ用接着剤、半導体用保護コート(たとえば防湿コート剤、半田用這い上がり防止剤)、光学分野に用いる薄膜(たとえばペリクル膜等)への添加剤、ディスプレイ用反射防止膜の潤滑剤、レジスト用反射防止膜)等が挙げられる。(Use)
The fluorine-containing ether composition of the present invention is useful as a surface modifier or a surfactant. Examples of the surface modifier include a lubricant.
The fluorine-containing ether composition of the present invention can be used for applications other than those described above. Other uses include wire covering materials, ink repellents (for example, for printing equipment such as painting and inkjet), semiconductor element adhesives (for example, LOC (lead-on-chip) tape adhesives, semiconductor protective coatings (for example, Moisture-proof coating agent, anti-cracking agent for solder), additives for thin films used in the optical field (for example, pellicle film), lubricants for antireflection films for displays, antireflection films for resists, and the like.
本発明の含フッ素エーテル組成物は、基材上に、含フッ素エーテル組成物を含む被膜(表面層)を形成する用途に好適に用いられる。
本発明の含フッ素エーテル組成物を含む表面層は、分子末端に−CH2−OHを有する含フッ素エーテル化合物(化合物(A)等)を含むことから、高い潤滑性を保持する。そのため、該表面層を基材上に設けることで、潤滑性等の機能を付与することができる。また、形成された表面層は、基材に対する密着性が高く、耐久性に優れる。
また、該表面層は、透明であり、屈折率が低く、または耐熱性もしくは耐薬品性に優れる。The fluorine-containing ether composition of the present invention is suitably used for applications in which a film (surface layer) containing a fluorine-containing ether composition is formed on a substrate.
Since the surface layer containing the fluorine-containing ether composition of the present invention contains a fluorine-containing ether compound (compound (A) or the like) having —CH 2 —OH at the molecular end, high lubricity is maintained. Therefore, functions such as lubricity can be imparted by providing the surface layer on the substrate. Moreover, the formed surface layer has high adhesion to the substrate and is excellent in durability.
The surface layer is transparent, has a low refractive index, and is excellent in heat resistance or chemical resistance.
表面層を設ける基材の形状および材質は特に限定されず、該表面層を設けた基材の用途に応じたものを適宜用いることができる。該表面層を設けた基材の用途としては、磁気ディスク、光ファイバ、鏡、太陽電池、光ディスク、タッチパネル、感光および定着ドラム、フィルムコンデンサ、ガラス窓用反射防止フィルム等の各種フィルム等が挙げられる。
基材としては、本発明の有用性の点で、磁気ディスクが好ましい。磁気ディスクとしては、たとえば、NiPメッキされた基板(アルミニウム、ガラス等。)上に、下地層、記録層、ダイヤモンド状炭素保護膜(DLC膜)を順に有するものが挙げられる。DLC膜の厚さは、5.0nm以下が好ましい。DLC膜の平均表面粗さ(Ra)は、2.0nm以下が好ましい。The shape and material of the base material on which the surface layer is provided are not particularly limited, and those according to the application of the base material on which the surface layer is provided can be used as appropriate. Examples of the use of the substrate provided with the surface layer include various films such as magnetic disks, optical fibers, mirrors, solar cells, optical disks, touch panels, photosensitive and fixing drums, film capacitors, and antireflection films for glass windows. .
As the substrate, a magnetic disk is preferable from the viewpoint of the usefulness of the present invention. As the magnetic disk, for example, a magnetic disk having a base layer, a recording layer, and a diamond-like carbon protective film (DLC film) in this order on a NiP plated substrate (aluminum, glass, etc.) can be mentioned. The thickness of the DLC film is preferably 5.0 nm or less. The average surface roughness (Ra) of the DLC film is preferably 2.0 nm or less.
表面層の膜厚は、用途に応じて適宜設定される。たとえば磁気ディスクのDLC膜上に形成される表面層の場合、その膜厚は、0.1〜2nmが好ましく、0.5〜1nmが特に好ましい。該表面層の膜厚が前記範囲の下限値以上であれば、表面層による潤滑効果等が充分に得られる。前記範囲の上限値以下であれば、磁気記録媒体の高密度記録化に高く寄与できる。
本発明の含フッ素エーテル組成物によれば、薄膜化しても充分な潤滑性を発揮する表面層を形成し得る。そのため、表面層の膜厚が薄いほど本発明の有用性が高い。
表面層の膜厚は、たとえば薄膜解析用X線回折計ATX−G(RIGAKU社製)を用いて、X線反射率法によって反射X線の干渉パターンを得て、該干渉パターンの振動周期から算出できる。The film thickness of the surface layer is appropriately set according to the application. For example, in the case of a surface layer formed on a DLC film of a magnetic disk, the film thickness is preferably from 0.1 to 2 nm, particularly preferably from 0.5 to 1 nm. If the film thickness of the surface layer is not less than the lower limit of the above range, the lubricating effect by the surface layer can be sufficiently obtained. If it is below the upper limit of the said range, it can contribute highly to high-density recording of a magnetic recording medium.
According to the fluorine-containing ether composition of the present invention, it is possible to form a surface layer that exhibits sufficient lubricity even if it is thinned. Therefore, the thinner the surface layer, the higher the utility of the present invention.
The film thickness of the surface layer is determined by obtaining an interference pattern of reflected X-rays by an X-ray reflectivity method using, for example, an X-ray diffractometer ATX-G for thin film analysis (manufactured by Rigaku), and It can be calculated.
本発明の含フッ素エーテル組成物に液体媒体を加えて液状組成物としてもよい。特に、本発明の含フッ素エーテル組成物を、表面改質剤として基材上に表面層を形成する用途に使用する場合には、本発明の含フッ素エーテル組成物に液体媒体を加えて液状組成物として用いることが好ましい。 A liquid medium may be added to the fluorine-containing ether composition of the present invention to form a liquid composition. In particular, when the fluorine-containing ether composition of the present invention is used for the purpose of forming a surface layer on a substrate as a surface modifier, a liquid composition is added to the fluorine-containing ether composition of the present invention by adding a liquid medium. It is preferable to use it as a product.
〔表面改質剤または界面活性剤〕
本発明の表面改質剤または界面活性剤(以下、これらをまとめて「表面改質剤等」ともいう。)は、本発明の含フッ素エーテル組成物を含むものである。
本発明の表面改質剤等は、本発明の含フッ素エーテル組成物のみからなるものでもよく、他の成分をさらに含むものであってもよい。
本発明の表面改質剤等における本発明の含フッ素エーテル組成物の含有量は、表面改質剤等の総質量に対し、90〜100質量%が好ましく、100質量%が特に好ましい。すなわち、本発明の表面改質剤等は、本発明の含フッ素エーテル組成物からなるのが特に好ましい。
さらに含んでもよい他の成分としては、表面改質剤または界面活性剤として使用可能なものであって含フッ素エーテル化合物に該当しない任意の化合物を使用でき、たとえばシラン系、エポキシ系、チタン系、アルミニウム系等のカップリング剤等が挙げられる。本発明の含フッ素エーテル組成物を表面改質剤として用いる場合、該カップリング剤を使用することで基材と化合物(A)との密着性を向上させ得る。[Surface modifier or surfactant]
The surface modifier or surfactant of the present invention (hereinafter collectively referred to as “surface modifier etc.”) includes the fluorinated ether composition of the present invention.
The surface modifier or the like of the present invention may consist only of the fluorine-containing ether composition of the present invention, or may further contain other components.
90-100 mass% is preferable with respect to the total mass of a surface modifier etc., and, as for content of the fluorine-containing ether composition of this invention in the surface modifier of this invention, 100 mass% is especially preferable. That is, it is particularly preferable that the surface modifier or the like of the present invention comprises the fluorine-containing ether composition of the present invention.
Furthermore, as other components that may be included, any compound that can be used as a surface modifier or a surfactant and does not correspond to a fluorine-containing ether compound can be used, for example, silane-based, epoxy-based, titanium-based, Examples include aluminum-based coupling agents. When using the fluorine-containing ether composition of this invention as a surface modifier, the adhesiveness of a base material and a compound (A) can be improved by using this coupling agent.
表面改質剤は、潤滑剤用途に用いることができる。また、その他、樹脂製のフィルムやシート上に塗布して樹脂の屈折率を制御する用途、または樹脂の耐薬品性を改善する用途等に用いることができる。
潤滑剤としては、磁気ディスク用、特に磁気ディスクのダイヤモンド状炭素保護膜(DLC膜)上に塗布して潤滑性を付与する用途に用いられることが好ましい。
界面活性剤としては、たとえば、塗料の表面張力を低下させる添加剤またはレベリング剤、研磨液のレベリング剤等に用いることができる。塗料に添加する場合には、塗料に対する本発明の含フッ素エーテル組成物の量が0.01〜5質量%程度になるように添加するのが好ましい。The surface modifier can be used for lubricant applications. In addition, it can be applied to a resin film or sheet and used to control the refractive index of the resin, or to improve the chemical resistance of the resin.
The lubricant is preferably used for a magnetic disk, in particular, for use in application on a diamond-like carbon protective film (DLC film) of a magnetic disk to impart lubricity.
As the surfactant, for example, it can be used as an additive or leveling agent for lowering the surface tension of a paint, a leveling agent for a polishing liquid, and the like. When added to the paint, it is preferable to add so that the amount of the fluorinated ether composition of the present invention relative to the paint is about 0.01 to 5% by mass.
〔液状組成物〕
本発明の液状組成物は、本発明の含フッ素エーテル組成物と、液体媒体とを含むものである。
本発明の液状組成物は、溶液、懸濁液、または乳化液のいずれであってもよく、溶液であるのが好ましい。
液状組成物中の本発明の含フッ素エーテル組成物の濃度は、用途に応じて適宜調節でき、液状組成物の総質量に対し、0.005〜50質量%であることが好ましく、0.005〜5質量%がより好ましく、0.01〜1質量%が特に好ましい。含フッ素エーテル組成物の濃度が上記範囲であると、均一な表面層が形成できる。[Liquid composition]
The liquid composition of the present invention includes the fluorinated ether composition of the present invention and a liquid medium.
The liquid composition of the present invention may be a solution, a suspension, or an emulsion, and is preferably a solution.
The concentration of the fluorine-containing ether composition of the present invention in the liquid composition can be appropriately adjusted according to the use, and is preferably 0.005 to 50% by mass with respect to the total mass of the liquid composition, 0.005 -5% by mass is more preferable, and 0.01-1% by mass is particularly preferable. A uniform surface layer can be formed when the concentration of the fluorine-containing ether composition is within the above range.
液体媒体としては、本発明の含フッ素エーテル組成物を溶解または分散し得るものであればよく、有機溶剤が好ましい。有機溶剤は、フッ素系有機溶剤であってもよく、非フッ素系有機溶剤であってもよく、これら両溶剤を含んでもよい。 Any liquid medium may be used as long as it can dissolve or disperse the fluorine-containing ether composition of the present invention, and an organic solvent is preferable. The organic solvent may be a fluorinated organic solvent, a non-fluorinated organic solvent, or may contain both of these solvents.
フッ素系有機溶剤としては、フルオロアルカン、フルオロ芳香族化合物、フルオロアルキルエーテル、フルオロアルキルアミン、フルオロアルコール等が挙げられる。
フルオロアルカンとしては、炭素数4〜8の化合物が好ましい。市販品としては、たとえばC6F13H(AC−2000:製品名、旭硝子社製)、C6F13C2H5(AC−6000:製品名、旭硝子社製)、C2F5CHFCHFCF3(バートレルXF:製品名、デュポン社製)等が挙げられる。
フルオロ芳香族化合物としては、たとえばヘキサフルオロベンゼン、トリフルオロメチルベンゼン、ペルフルオロトルエン、ビス(トリフルオロメチル)ベンゼン等が挙げられる。
フルオロアルキルエーテルとしては、炭素数4〜12の化合物が好ましい。フルオロアルキルエーテルとしては、ヒドロフルオロアルキルエーテルが好ましい。市販品としては、たとえばCF3CH2OCF2CF2H(AE−3000:製品名、旭硝子社製)、C4F9OCH3(ノベック−7100:製品名、3M社製)、C4F9OC2H5(ノベック−7200:製品名、3M社製)、C6F13OCH3(ノベック−7300:製品名、3M社製)等が挙げられる。
フルオロアルキルアミンとしては、ペルフルオロアルキルアミンが好ましく、たとえばペルフルオロトリプロピルアミン、ペルフルオロトリブチルアミン等が挙げられる。
フルオロアルコールとしては、たとえば2,2,3,3−テトラフルオロプロパノール、2,2,2−トリフルオロエタノール、ヘキサフルオロイソプロパノール等が挙げられる。
フッ素系有機溶剤としては、含フッ素エーテル化合物の溶解性の点で、フルオロアルカン、フルオロ芳香族化合物、フルオロアルキルエーテルが好ましい。これらの中でも、オゾン破壊係数が低い点で、ヒドロフルオロアルキルエーテルが特に好ましい。Examples of the fluorine-based organic solvent include fluoroalkanes, fluoroaromatic compounds, fluoroalkyl ethers, fluoroalkylamines, and fluoroalcohols.
As the fluoroalkane, a compound having 4 to 8 carbon atoms is preferable. Examples of commercially available products include C 6 F 13 H (AC-2000: product name, manufactured by Asahi Glass Co., Ltd.), C 6 F 13 C 2 H 5 (AC-6000: product name, manufactured by Asahi Glass Co., Ltd.), C 2 F 5 CHFCHFCCF. 3 (Bertrel XF: product name, manufactured by DuPont).
Examples of the fluoroaromatic compound include hexafluorobenzene, trifluoromethylbenzene, perfluorotoluene, bis (trifluoromethyl) benzene, and the like.
As the fluoroalkyl ether, a compound having 4 to 12 carbon atoms is preferable. As the fluoroalkyl ether, hydrofluoroalkyl ether is preferable. Examples of commercially available products include CF 3 CH 2 OCF 2 CF 2 H (AE-3000: product name, manufactured by Asahi Glass Co., Ltd.), C 4 F 9 OCH 3 (Novec-7100: product name, manufactured by 3M Company), C 4 F 9 OC 2 H 5 (Novec-7200: product name, manufactured by 3M), C 6 F 13 OCH 3 (Novec-7300: product name, manufactured by 3M) and the like.
As the fluoroalkylamine, perfluoroalkylamine is preferable, and examples thereof include perfluorotripropylamine and perfluorotributylamine.
Examples of the fluoroalcohol include 2,2,3,3-tetrafluoropropanol, 2,2,2-trifluoroethanol, hexafluoroisopropanol and the like.
As the fluorine-based organic solvent, fluoroalkanes, fluoroaromatic compounds, and fluoroalkyl ethers are preferable from the viewpoint of solubility of the fluorine-containing ether compound. Among these, hydrofluoroalkyl ether is particularly preferable because it has a low ozone depletion coefficient.
非フッ素系有機溶剤としては、水素原子および炭素原子のみからなる化合物と、水素原子、炭素原子および酸素原子のみからなる化合物が好ましく、炭化水素系有機溶剤、アルコール系有機溶剤、ケトン系有機溶剤、エーテル系有機溶剤、エステル系有機溶剤が挙げられる。
炭化水素系有機溶剤としては、ヘキサン、へプタン、シクロヘキサン等が好ましい。
アルコール系有機溶剤としては、メタノール、エタノール、プロパノール、イソプロパノール等が好ましい。
ケトン系有機溶剤としては、アセトン、メチルエチルケトン、メチルイソブチルケトン等が好ましい。
エーテル系有機溶剤としては、ジエチルエーテル、テトラヒドロフラン、テトラエチレングリコールジメチルエーテル等が好ましい。
エステル系有機溶剤としては、酢酸エチル、酢酸ブチル等が好ましい。
非フッ素系有機溶剤としては、含フッ素エーテル化合物の溶解性の点で、ケトン系有機溶剤が特に好ましい。As the non-fluorine organic solvent, a compound consisting only of hydrogen atoms and carbon atoms and a compound consisting only of hydrogen atoms, carbon atoms and oxygen atoms are preferred, hydrocarbon organic solvents, alcohol organic solvents, ketone organic solvents, Examples include ether organic solvents and ester organic solvents.
As the hydrocarbon organic solvent, hexane, heptane, cyclohexane and the like are preferable.
As the alcohol organic solvent, methanol, ethanol, propanol, isopropanol and the like are preferable.
As the ketone organic solvent, acetone, methyl ethyl ketone, methyl isobutyl ketone and the like are preferable.
As the ether organic solvent, diethyl ether, tetrahydrofuran, tetraethylene glycol dimethyl ether and the like are preferable.
As the ester organic solvent, ethyl acetate, butyl acetate and the like are preferable.
As the non-fluorine organic solvent, a ketone organic solvent is particularly preferable from the viewpoint of the solubility of the fluorine-containing ether compound.
液体媒体としては、フルオロアルカン、フルオロ芳香族化合物、フルオロアルキルエーテル、水素原子および炭素原子のみからなる化合物、ならびに、水素原子、炭素原子および酸素原子のみからなる化合物からなる群から選択される少なくとも1種の有機溶剤が好ましい。特に、フルオロアルカン、フルオロ芳香族化合物およびフルオロアルキルエーテルから選ばれるフッ素系有機溶剤が好ましい。
液体媒体としては、フッ素系有機溶剤であるフルオロアルカン、フルオロ芳香族化合物、フルオロアルキルエーテル、非フッ素系有機溶剤である水素原子、炭素原子および酸素原子のみからなる化合物からなる群から選択される少なくとも1種の有機溶剤を、合計で液体媒体全体の90質量%以上含むことが、含フッ素エーテル化合物の溶解性を高める点で好ましい。The liquid medium is at least one selected from the group consisting of fluoroalkanes, fluoroaromatic compounds, fluoroalkyl ethers, compounds consisting only of hydrogen atoms and carbon atoms, and compounds consisting only of hydrogen atoms, carbon atoms and oxygen atoms. Some organic solvents are preferred. In particular, a fluorinated organic solvent selected from fluoroalkanes, fluoroaromatic compounds and fluoroalkyl ethers is preferred.
The liquid medium is at least selected from the group consisting of fluoroalkanes that are fluorine-based organic solvents, fluoroaromatic compounds, fluoroalkyl ethers, and compounds that consist of only hydrogen atoms, carbon atoms, and oxygen atoms that are non-fluorine-based organic solvents. One type of organic solvent is preferably contained in a total amount of 90% by mass or more of the entire liquid medium from the viewpoint of enhancing the solubility of the fluorinated ether compound.
液状組成物は、必要に応じて、本発明の効果を損なわない範囲で、本発明の含フッ素エーテル組成物および溶剤以外の他の成分をさらに含んでもよい。
本発明の含フッ素エーテル組成物を潤滑剤として用いる場合の他の成分としては、ラジカルスカベンジャー(たとえばDow Chemicals社製、商品名:X−1p)等が挙げられる。The liquid composition may further contain other components other than the fluorine-containing ether composition of the present invention and the solvent, as necessary, as long as the effects of the present invention are not impaired.
Examples of other components when the fluorine-containing ether composition of the present invention is used as a lubricant include radical scavengers (for example, trade name: X-1p manufactured by Dow Chemicals).
液状組成物は、所望の性能を達成できないおそれがあることから、金属イオン類、陰イオン類、水分、低分子極性化合物等を含まないことが好ましい。
金属イオン類(Na、K、Ca、Al等。)は、陰イオンと結合してルイス酸触媒を生成し、含フッ素エーテル化合物の分解反応を促進する場合がある。陰イオン類(F、Cl、NO2、NO3、PO4、SO4、C2O4等。)および水分は、基材の表面を腐食させる場合がある。よって、液状組成物中の含水率は、2,000ppm以下が好ましい。低分子極性化合物(アルコール類;樹脂から溶出する可塑剤等。)は、基材と表面層との密着性を低減させる場合がある。Since the liquid composition may not achieve the desired performance, it is preferable that the liquid composition does not contain metal ions, anions, moisture, low-molecular polar compounds, and the like.
Metal ions (Na, K, Ca, Al, etc.) may combine with an anion to produce a Lewis acid catalyst and promote the decomposition reaction of the fluorinated ether compound. Anions (F, Cl, NO 2 , NO 3 , PO 4 , SO 4 , C 2 O 4 etc.) and moisture may corrode the surface of the substrate. Therefore, the water content in the liquid composition is preferably 2,000 ppm or less. Low molecular polar compounds (alcohols; plasticizers eluted from the resin, etc.) may reduce the adhesion between the substrate and the surface layer.
液状組成物の使用方法は、目的に応じ公知の方法を適用できる。
たとえば本発明の含フッ素エーテル組成物を、表面改質剤として使用する場合には、本発明の含フッ素エーテル組成物を含む液状組成物を基材上に塗布し、乾燥することによって、本発明の含フッ素エーテル組成物を含む被膜(表面層)を形成させて、目的とする機能を発現させるのが好ましい。
本発明の液状組成物を塗布する基材は特に限定されず、たとえば表面層を設ける基材として前記で挙げたものと同様のものが挙げられる。基材としては、本発明の有用性の点で、磁気ディスクが好ましい。As a method of using the liquid composition, a known method can be applied depending on the purpose.
For example, when the fluorine-containing ether composition of the present invention is used as a surface modifier, the liquid composition containing the fluorine-containing ether composition of the present invention is applied on a substrate and dried, whereby the present invention is obtained. It is preferable to form a film (surface layer) containing the fluorine-containing ether composition to develop the intended function.
The base material which apply | coats the liquid composition of this invention is not specifically limited, For example, the thing similar to what was mentioned above as a base material which provides a surface layer is mentioned. As the substrate, a magnetic disk is preferable from the viewpoint of the usefulness of the present invention.
液状組成物の塗布方法としては、たとえば、ロールコート法、キャスト法、ディップコート法、スピンコート法、水上キャスト法、ダイコート法、ラングミュア・プロジェット法、真空蒸着法等が挙げられ、スピンコート法、ディップコート法、または真空蒸着法が好ましい。
乾燥方法としては、たとえば自然乾燥、真空乾燥、遠心乾燥、加熱乾燥等が挙げられる。Examples of the coating method of the liquid composition include a roll coating method, a casting method, a dip coating method, a spin coating method, a water casting method, a die coating method, a Langmuir-projet method, a vacuum deposition method, and the like. The dip coating method or the vacuum deposition method is preferable.
Examples of the drying method include natural drying, vacuum drying, centrifugal drying, and heat drying.
基材上に液状組成物を塗布して表面層を形成した後、含フッ素エーテル化合物を基材上(たとえば磁気ディスクの炭素保護膜上)に強固に密着させるために、密着処理を行ってもよい。
密着処理としては、加熱処理、赤外線照射処理、紫外線照射処理、プラズマ処理等が挙げられ、加熱処理または紫外線照射処理が好ましく、加熱処理が特に好ましい。乾燥処理が密着処理を兼ねてもよい。
さらに、密着処理後の基材を、付着物の除去、余剰の含フッ素エーテル化合物の除去を目的に、フッ素系有機溶剤にて洗浄してもよい。After the liquid composition is applied on the substrate to form a surface layer, an adhesion treatment may be performed to firmly adhere the fluorine-containing ether compound to the substrate (for example, the carbon protective film of the magnetic disk). Good.
Examples of the adhesion treatment include heat treatment, infrared irradiation treatment, ultraviolet irradiation treatment, and plasma treatment. Heat treatment or ultraviolet irradiation treatment is preferable, and heat treatment is particularly preferable. The drying process may also serve as an adhesion process.
Furthermore, the substrate after the adhesion treatment may be washed with a fluorinated organic solvent for the purpose of removing deposits and excess fluorine-containing ether compound.
〔物品〕
本発明の物品は、基材上に、本発明の含フッ素エーテル組成物からなる膜を有するものである。
本発明の液状組成物を塗布する基材は特に限定されず、たとえば表面層を設ける基材として前記で挙げたものと同様のものが挙げられる。基材としては、本発明の有用性の点で、磁気ディスクが好ましい。
該膜を基材上に設ける方法としては、含フッ素エーテル組成物からなる膜の形成方法として公知の方法が利用できる。たとえば前述した本発明の液状組成物を基材上に液状組成物を塗布して表面層を形成する方法等によって該膜を形成できる。[Articles]
The article of the present invention has a film made of the fluorine-containing ether composition of the present invention on a substrate.
The base material which apply | coats the liquid composition of this invention is not specifically limited, For example, the thing similar to what was mentioned above as a base material which provides a surface layer is mentioned. As the substrate, a magnetic disk is preferable from the viewpoint of the usefulness of the present invention.
As a method of providing the film on the substrate, a known method can be used as a method of forming a film made of the fluorine-containing ether composition. For example, the film can be formed by a method of forming the surface layer by applying the liquid composition of the present invention described above onto a substrate.
以下、実施例を示して本発明を詳細に説明する。ただし本発明はこれらの例によって限定されない。なお、例1、例5および例6が実施例、例2〜4が比較例である。
各例で使用した評価方法を以下に示す。Hereinafter, the present invention will be described in detail with reference to examples. However, the present invention is not limited by these examples. Examples 1, 5 and 6 are examples, and examples 2 to 4 are comparative examples.
The evaluation method used in each example is shown below.
〔評価方法〕
(GPC分析)
数平均分子量(Mn)および分子量分布(Mw/Mn)は、ゲルパーミエーションクロマトグラフィ(以下、「GPC」ともいう。)によって測定した。なお、Mwは質量平均分子量を示す。
GPCによる測定は、特開2001−208736号公報に記載の方法に従い、下記条件にて行った。
移動相:R−225(旭硝子社製、アサヒクリンAK−225SECグレード1)およびヘキサフルオロイソプロピルアルコールの混合溶媒(R−225:ヘキサフルオロイソプロピルアルコール=99:1(体積比))。
分析カラム:PLgel MIXED−Eカラム(ポリマーラボラトリーズ社製)を2本直列に連結したもの。
分子量測定用標準試料:Mw/Mnが1.1未満で、Mnが2,000〜10,000のペルフルオロポリエーテル4種、およびMw/Mnが1.1以上で、Mnが1,300のペルフルオロポリエーテル1種。
移動相流速:1.0mL/分。
カラム温度:37℃。
検出器:蒸発光散乱検出器。〔Evaluation method〕
(GPC analysis)
The number average molecular weight (Mn) and the molecular weight distribution (Mw / Mn) were measured by gel permeation chromatography (hereinafter also referred to as “GPC”). In addition, Mw shows a mass average molecular weight.
The measurement by GPC was performed under the following conditions according to the method described in JP-A No. 2001-208736.
Mobile phase: Mixed solvent of R-225 (Asahi Glass Co., Ltd., Asahi Clin AK-225 SEC grade 1) and hexafluoroisopropyl alcohol (R-225: hexafluoroisopropyl alcohol = 99: 1 (volume ratio)).
Analytical column: Two PLgel MIXED-E columns (manufactured by Polymer Laboratories) connected in series.
Standard sample for molecular weight measurement: 4 types of perfluoropolyethers with Mw / Mn of less than 1.1 and Mn of 2,000 to 10,000, and perfluoro with Mw / Mn of 1.1 or more and Mn of 1,300 1 type of polyether.
Mobile phase flow rate: 1.0 mL / min.
Column temperature: 37 ° C.
Detector: Evaporative light scattering detector.
(NMR分析)
NMR分析は、下記条件にて行った。
1H−NMR(300.4MHz)の基準物質にはニトロベンゼンを7.5ppmとして使用した。
19F−NMR(282.7MHz)の基準物質にはペルフルオロベンゼンを−162.5ppmとして使用した。
NMRの溶媒は特に記載しない限りR−113(CCl2FCClF2)を用いた。(NMR analysis)
NMR analysis was performed under the following conditions.
Nitrobenzene was used as 7.5 ppm as a reference material for 1 H-NMR (300.4 MHz).
As a reference substance for 19 F-NMR (282.7 MHz), perfluorobenzene was used at −162.5 ppm.
Unless otherwise stated, R-113 (CCl 2 FCClF 2 ) was used as the NMR solvent.
(動摩擦係数測定)
基材上に表面層を設けた物品の最表面(物品の表面のうち表面層を設けた場所)の動摩擦係数は、摩擦測定器(Heidon社製、Tribogear)を用いて測定した。接触子としてはφ10mmのSUS製の球を用い、荷重100g、移動距離20mm、移動速度1mm/秒にて測定した。(Dynamic friction coefficient measurement)
The dynamic friction coefficient of the outermost surface of the article provided with the surface layer on the base material (the place where the surface layer was provided among the surfaces of the article) was measured using a friction measuring device (manufactured by Heidon, Tribogear). As a contact, a SUS ball having a diameter of 10 mm was used, and measurement was performed at a load of 100 g, a moving distance of 20 mm, and a moving speed of 1 mm / second.
(F/Siの測定)
基材(シリコンウェハ)上に設けた表面層の被覆率は、X線光電子分光法(XPS:X−ray Photoelectron Spectroscopy)により下記の測定条件にて測定されるF/Siにより評価した。
XPSは、Al、Mg等の特性X線を試料に入射し、光電効果により放出される光電子の運動エネルギーおよび強度を測定することで、固体表面に存在する原子の種類や量・化学結合状態等を知る方法である。
試料より放出される光電子の運動エネルギーEkは、入射X線のエネルギーhν(h:プランク定数、ν:振動数)から結合エネルギーEbおよび仕事関数Wを減じた値(Ek=hν−Eb−W)である。結合エネルギーEbは、光電子が試料中で捕獲されていた原子の種類・電子軌道・化学結合状態に依存する値である。入射X線のエネルギーhνおよび仕事関数Wは既知である。そのため、運動エネルギーEkを測定すれば、結合エネルギーEbを求めることができ、試料中の原子の種類・電子軌道・化学結合状態を知ることができる。
入射X線は試料の深さ数μm程度まで侵入する。しかし、深い場所にある原子より放出された電子は、試料中の他の原子に束縛されている電子との非弾性散乱等によりエネルギーを失い、試料より放出されない。そのため、非弾性平均自由行程(電子が非弾性散乱を起こさずに進める距離)で決まる、数nm程度の深さの極く最表面から放出された電子が、光電子として観測される。したがって、XPSは、試料の最表面に存在する原子の種類や量・化学結合状態を高感度に測定する方法であり、基材上に塗布された極く薄い膜を高感度に検出でき、薄膜の被覆率を評価するのに有効な方法である。
後述する各例で得た物品(基材としてシリコンウェハを用い、基材上に、含フッ素エーテル化合物を含む表面改質剤で表面層を設けた物品)の最表面のXPS測定を行うと、基材上において表面層で被覆されている箇所では、表面層中のフッ素原子の1s軌道から放出される光電子強度(以下、F1sピーク強度と記載)は強く検出され、基材中のシリコン原子のSi2p軌道から放出される光電子強度(以下Si2pピーク強度と記載)は弱く検出されるかあるいは検出されない。これに対し、基材上において表面層で被覆されていない箇所では、フッ素原子から放出される光電子は検出されず、シリコン原子のSi2p軌道から放出される光電子強度が強く検出される。したがって、XPS測定により得られたF1sピーク強度とSi2pピーク強度とから算出されるF原子濃度とSi原子濃度の比は、基材上に設けた表面層の被覆率と正の相関があると考えることができる。(Measurement of F / Si)
The coverage of the surface layer provided on the substrate (silicon wafer) was evaluated by F / Si measured under the following measurement conditions by X-ray photoelectron spectroscopy (XPS).
XPS makes it possible to enter characteristic X-rays such as Al and Mg into a sample and measure the kinetic energy and intensity of photoelectrons emitted by the photoelectric effect. Is a way to know.
The kinetic energy Ek of the photoelectrons emitted from the sample is a value obtained by subtracting the binding energy Eb and the work function W from the incident h-ray energy hν (h: Planck constant, ν: frequency) (Ek = hν-Eb-W). It is. The bond energy Eb is a value that depends on the type, electron orbit, and chemical bond state of the atoms in which the photoelectrons are captured in the sample. The energy hν and work function W of the incident X-ray are known. Therefore, if the kinetic energy Ek is measured, the bond energy Eb can be obtained, and the type, electron orbit, and chemical bond state of atoms in the sample can be known.
Incident X-rays penetrate to a depth of about several μm. However, electrons emitted from atoms in deep locations lose energy due to inelastic scattering with electrons bound to other atoms in the sample, and are not emitted from the sample. For this reason, electrons emitted from the outermost surface with a depth of about several nanometers determined by the inelastic mean free path (the distance traveled without causing inelastic scattering) are observed as photoelectrons. Therefore, XPS is a method for measuring the type, amount, and chemical bonding state of atoms existing on the outermost surface of a sample with high sensitivity, and can detect an extremely thin film coated on a substrate with high sensitivity. This is an effective method for evaluating the coverage of the material.
When the XPS measurement of the outermost surface of an article obtained by each example described later (an article in which a silicon wafer is used as a base material and a surface layer is provided on the base material with a surface modifier containing a fluorine-containing ether compound) At the place covered with the surface layer on the substrate, the photoelectron intensity (hereinafter referred to as F1s peak intensity) emitted from the 1s orbit of fluorine atoms in the surface layer is detected strongly, and the silicon atoms in the substrate The photoelectron intensity emitted from the Si2p orbit (hereinafter referred to as Si2p peak intensity) is weakly detected or not detected. On the other hand, photoelectrons emitted from fluorine atoms are not detected at locations not covered with the surface layer on the substrate, and the intensity of photoelectrons emitted from Si2p orbitals of silicon atoms is detected strongly. Therefore, the ratio of F atom concentration and Si atom concentration calculated from the F1s peak intensity and Si2p peak intensity obtained by XPS measurement is considered to have a positive correlation with the coverage of the surface layer provided on the substrate. be able to.
<XPS測定条件>
XPS装置としてはアルバック・ファイ社製PHI Quantera SXMを用いた。X線源として径50μm程度に集光されたAlKα線(1486.6eV)を用い、照射X線強度12.4W、検出器のパスエネルギー224eV、光電子取り出し角度45°にて測定した。照射X線はスキャンせずに固定して測定し、また試料最表面の測定を行い、試料のエッチングは行わなかった。なお、試料からの光電子放出に伴う帯電補正のため、装置に付属の電子線およびAr+中和銃を用いた。F1sピーク強度の算出には結合エネルギー682〜691eV、Si2pピーク強度の算出には結合エネルギー96〜107eVのエネルギー範囲でバックグラウンドを除去したピークの積分強度を用いた。さらに、装置固有の各元素の相対感度係数を用いてF原子濃度およびSi原子濃度を算出した。<XPS measurement conditions>
As the XPS apparatus, PHI Quantera SXM manufactured by ULVAC-PHI was used. Using an AlK α ray (1486.6 eV) focused to a diameter of about 50 μm as an X-ray source, measurement was performed at an irradiation X-ray intensity of 12.4 W, a detector pass energy of 224 eV, and a photoelectron extraction angle of 45 °. Irradiation X-rays were fixed and measured without scanning, and the outermost surface of the sample was measured, and the sample was not etched. Note that an electron beam attached to the apparatus and an Ar + neutralization gun were used for charge correction accompanying photoelectron emission from the sample. The F1s peak intensity was calculated using the binding energy of 682 to 691 eV, and the Si2p peak intensity was calculated using the integrated intensity of the peak with the background removed in the energy range of the binding energy of 96 to 107 eV. Furthermore, F atom concentration and Si atom concentration were calculated using the relative sensitivity coefficient of each element unique to the apparatus.
〔合成例1:含フッ素エーテル化合物(A)の合成〕
下記化合物(A6−1)を以下の手順で合成した。
ジペンタエリスリトールに、公知の方法でエチレンオキシドを付加してエチレンオキシド付加体を得た。
該エチレンオキシド付加体にFCOCF(CF3)OCF2CF(CF3)O(CF2)3F(以下、「RfF」ともいう。)を反応させてエステル化体を得た。
該エステル化体(30g)を、R−113(270g)に溶解させ、窒素ガスで20%に希釈したフッ素ガス(以下、「20%フッ素ガス」ともいう。)を用いて、フッ素化した。生成物から溶媒を減圧にて留去して、室温で液体のフッ素化体を得た。
該フッ素化体に1,1,3,4−テトラクロロヘキサフルオロブタン、KFを加えて激しく撹拌し、120℃で加水分解反応させて、室温で液体の分解生成物を得た。
該分解生成物にKFとR−113を投入し、エタノールを加えて25℃以下にならないように温度を保ちながら8時間反応させた後、KF、R−113およびエタノールを除去してエチルエステル体を得た。
該エチルエステル体にR−225とテトラヒドロフラン(200mL)とを混合し、ボラン・テトラヒドロフラン錯体を窒素気流下で加え、室温で一夜反応(還元反応)させた。その後、溶媒をエバポレータで留去し、残存物に2moL/Lの塩酸を加えて、R−225で抽出し、抽出物を濃縮して粗生成物(59.71g)を得た。[Synthesis Example 1: Synthesis of fluorinated ether compound (A)]
The following compound (A6-1) was synthesized by the following procedure.
Ethylene oxide was added to dipentaerythritol by a known method to obtain an ethylene oxide adduct.
The ethylene oxide adduct was reacted with FCOCF (CF 3 ) OCF 2 CF (CF 3 ) O (CF 2 ) 3 F (hereinafter also referred to as “RfF”) to obtain an esterified product.
The esterified product (30 g) was dissolved in R-113 (270 g) and fluorinated using a fluorine gas diluted to 20% with nitrogen gas (hereinafter also referred to as “20% fluorine gas”). The solvent was distilled off from the product under reduced pressure to obtain a liquid fluorinated product at room temperature.
1,1,3,4-Tetrachlorohexafluorobutane and KF were added to the fluorinated product, and the mixture was vigorously stirred and hydrolyzed at 120 ° C. to obtain a liquid decomposition product at room temperature.
KF and R-113 were added to the decomposition product, and ethanol was added to react for 8 hours while maintaining the temperature so that the temperature did not fall below 25 ° C. Then, KF, R-113 and ethanol were removed to remove ethyl ester. Got.
R-225 and tetrahydrofuran (200 mL) were mixed with the ethyl ester compound, and borane / tetrahydrofuran complex was added under a nitrogen stream, followed by reaction (reduction reaction) at room temperature overnight. Thereafter, the solvent was distilled off with an evaporator, 2 mol / L hydrochloric acid was added to the residue, extraction was performed with R-225, and the extract was concentrated to obtain a crude product (59.71 g).
得られた粗生成物をシリカゲルカラム(特開2009−197210号公報の実施例記載の方法)で精製したのちに、超臨界精製(特開2009−197210号公報の実施例記載の方法)を行った。
得られた精製物(化合物(A6−1))について、NMR分析(1H−NMRおよび19F−NMR)およびGPC分析を行った。NMR分析結果を以下に示す。精製物のMnは5,867(b1〜b6の平均値:7.1)、Mw/Mnは1.10であった。
1H−NMR δ(ppm):3.94。
19F−NMR δ(ppm):−80.1、−88.2〜−90.5、−135.0〜−139.0。The obtained crude product is purified by a silica gel column (method described in the examples of JP2009-197210A) and then supercritically purified (method described in the examples of JP2009-197210A). It was.
The purified product (compound (A6-1)) was subjected to NMR analysis ( 1 H-NMR and 19 F-NMR) and GPC analysis. The NMR analysis results are shown below. Mn of the purified product was 5,867 (average value of b1 to b6: 7.1), and Mw / Mn was 1.10.
1 H-NMR δ (ppm): 3.94.
19 F-NMR δ (ppm): −80.1, −88.2 to −90.5, −135.0 to −139.0.
〔合成例2:含フッ素エーテル化合物(B)の合成〕
下記化合物(B4−1)を以下の手順で合成した。
ジグリセリン開始ポリオキシエチレンテトラオール(阪本薬品工業社製、「ジグリセリン開始ポリオキシエチレングリセリルエーテル SC−E1500」)に、RfFを反応させてエステル化体を得た。
該エステル化体(30g)を、R−113(270g)に溶解させ、20%フッ素ガスを用いて、フッ素化した。生成物から溶媒を減圧にて留去して、室温で液体のフッ素化体を得た。
該フッ素化体に1,1,3,4−テトラクロロヘキサフルオロブタン、KFを加えて激しく撹拌し、120℃で加水分解反応させて、室温で液体の分解生成物を得た。
該分解性生物にKFとR−113を投入し、エタノールを加えて25℃以下にならないように温度を保ちながら8時間反応させた後、KF、R−113およびエタノールを除去してエチルエステル体を得た。
該エチルエステル体にR−225とテトラヒドロフラン(200mL)を混ぜ、ボラン・テトラヒドロフラン錯体を窒素気流下で加え、室温で一夜反応(還元反応)させた。溶媒をエバポレータで留去し、残存物に2moL/Lの塩酸を加えて、R−225で抽出し、抽出物を濃縮して粗生成物(51.58g)を得た。[Synthesis Example 2: Synthesis of fluorinated ether compound (B)]
The following compound (B4-1) was synthesized by the following procedure.
Diglycerin-initiated polyoxyethylenetetraol (Sakamoto Yakuhin Kogyo Co., Ltd., “Diglycerin-initiated polyoxyethylene glyceryl ether SC-E1500”) was reacted with RfF to obtain an esterified product.
The esterified product (30 g) was dissolved in R-113 (270 g) and fluorinated using 20% fluorine gas. The solvent was distilled off from the product under reduced pressure to obtain a liquid fluorinated product at room temperature.
1,1,3,4-Tetrachlorohexafluorobutane and KF were added to the fluorinated product, and the mixture was vigorously stirred and hydrolyzed at 120 ° C. to obtain a liquid decomposition product at room temperature.
KF and R-113 are added to the degradable organism, and ethanol is added to react for 8 hours while maintaining the temperature so that the temperature does not fall below 25 ° C. Then, KF, R-113 and ethanol are removed to remove the ethyl ester. Got.
R-225 and tetrahydrofuran (200 mL) were mixed with the ethyl ester compound, and borane / tetrahydrofuran complex was added under a nitrogen stream, followed by reaction (reduction reaction) at room temperature overnight. The solvent was distilled off with an evaporator, 2 mol / L hydrochloric acid was added to the residue, extraction was performed with R-225, and the extract was concentrated to obtain a crude product (51.58 g).
得られた粗生成物をシリカゲルカラム(特開2009−197210号公報の実施例記載の方法)で精製したのちに、超臨界精製(特開2009−197210号公報の実施例記載の方法)を行った。
得られた精製物(化合物(B4−1))について、NMR分析(1H−NMRおよび19F−NMR)およびGPC分析を行った。NMR分析結果を以下に示す。精製物のMnは2,593(b7〜b10の平均値:3.9)、Mw/Mnは1.07であった。
1H−NMR δ(ppm):3.94。
19F−NMR δ(ppm):−80.1、−88.2〜−90.5、−135.0〜−139.0。The obtained crude product is purified by a silica gel column (method described in the examples of JP2009-197210A) and then supercritically purified (method described in the examples of JP2009-197210A). It was.
The purified product (compound (B4-1)) was subjected to NMR analysis ( 1 H-NMR and 19 F-NMR) and GPC analysis. The NMR analysis results are shown below. Mn of the purified product was 2,593 (average value of b7 to b10: 3.9), and Mw / Mn was 1.07.
1 H-NMR δ (ppm): 3.94.
19 F-NMR δ (ppm): −80.1, −88.2 to −90.5, −135.0 to −139.0.
〔例1〕
(含フッ素エーテル組成物1の製造)
合成例1で得た化合物(A6−1)と、合成例2で得た化合物(B4−1)とを、(A6−1):(B4−1)=55:45の質量比で混合し、充分に攪拌して、含フッ素エーテル組成物1を製造した。[Example 1]
(Production of fluorinated ether composition 1)
The compound (A6-1) obtained in Synthesis Example 1 and the compound (B4-1) obtained in Synthesis Example 2 were mixed at a mass ratio of (A6-1) :( B4-1) = 55: 45. The fluorinated ether composition 1 was produced by sufficiently stirring.
(液状組成物1の製造)
含フッ素エーテル組成物1を、濃度が0.05質量%となるようにVertrel−XF(DuPont社製)に溶解して液状組成物1を製造した。(Manufacture of liquid composition 1)
The fluorinated ether composition 1 was dissolved in Vertrel-XF (manufactured by DuPont) so as to have a concentration of 0.05% by mass to produce a liquid composition 1.
(物品1の製造)
液状組成物1をシリコンウェハにディップコートで塗布して物品(表面層付き基材)1を得た。ディップコータはSDI社製のマイクロスピードディップコータを使用し、10mm/秒の速さでディッピングし、60秒間浸漬した後に、2mm/秒の速さで引き揚げた。引き揚げたシリコンウェハを150℃のオーブンで10分間加熱して表面層を形成し、物品1を得た。(Manufacture of article 1)
The liquid composition 1 was applied to a silicon wafer by dip coating to obtain an article (substrate with a surface layer) 1. The dip coater used was a micro speed dip coater manufactured by SDI, dipped at a speed of 10 mm / second, dipped for 60 seconds, and then pulled up at a speed of 2 mm / second. The pulled silicon wafer was heated in an oven at 150 ° C. for 10 minutes to form a surface layer, whereby an article 1 was obtained.
(評価)
物品1について、最表面(物品の表面のうち表面層を設けた場所)の動摩擦係数、F/Siを測定した。結果を表1に示す。また、XPSにより測定した物品1の最表面組成(原子%)を表2に示す。(Evaluation)
For article 1, the dynamic friction coefficient, F / Si, of the outermost surface (the place where the surface layer was provided on the article surface) was measured. The results are shown in Table 1. Table 2 shows the outermost surface composition (atomic%) of the article 1 measured by XPS.
〔例2〜6〕
化合物(A6−1)と化合物(B4−1)との質量比を表1に示す値とした以外は例1と同様にして含フッ素エーテル組成物2〜6を得た。
含フッ素エーテル組成物1の代わりに含フッ素エーテル組成物2〜6を用いた以外は例1と同様にして液状組成物2〜6を製造し、これを用いて物品2〜6を得、物品2〜4について動摩擦係数、F/Siを測定した。結果を表1に示す。また、XPSにより測定した物品2〜4の最表面組成(原子%)を表2に示す。[Examples 2 to 6]
Fluorinated ether compositions 2 to 6 were obtained in the same manner as in Example 1 except that the mass ratio of the compound (A6-1) to the compound (B4-1) was changed to the values shown in Table 1.
A liquid composition 2-6 was produced in the same manner as in Example 1 except that the fluorinated ether composition 2-6 was used in place of the fluorinated ether composition 1, and the articles 2-6 were obtained using this. The dynamic friction coefficient and F / Si were measured for 2-4. The results are shown in Table 1. Table 2 shows the outermost surface composition (atomic%) of articles 2 to 4 measured by XPS.
例1で得た物品1は、最表面の動摩擦係数が低く、表面層が高い潤滑性を有していた。また、物品1は、最表面組成のF原子濃度が25.6原子%、Si原子濃度が29.7原子%であり、F/Siの値が例2と比較して有意に高く、表面層による基材表面の被覆率が高かった。被覆率が高いことから、含フッ素エーテル組成物1の基材表面への付着量が充分で、基材への密着性に優れることが確認できた。これらの結果から、含フッ素エーテル組成物1によれば、優れた潤滑性と密着性とを発現できることが確認できた。
一方、化合物(A)の含有割合が10質量%の含フッ素エーテル組成物2を用いて得た例2の物品2は、表面層の潤滑性は高かったが、F/Siの値が小さく、含フッ素エーテル組成物2の基材表面への付着量が少なく、密着性に劣っていた。
含フッ素エーテル化合物として化合物(A)の含有割合がそれぞれ85および98質量%の含フッ素エーテル組成物3および4を用いて得た例3および4の物品3および4は、F/Siの値は大きかったが、動摩擦係数が大きく、表面層の潤滑性が不充分であった。
さらに、含フッ素エーテル化合物として化合物(A)の含有割合がそれぞれ45および70質量%の含フッ素エーテル組成物5および6を用いて得た例5および6の物品5および6では、F/Siの値が物品1、2と比較して大きい(物品3、4と同程度)ものの、物品1よりもさらに動摩擦係数が小さいことより、含フッ素エーテル組成物5および6は、特に高い潤滑性が必要とされる用途に適している。The article 1 obtained in Example 1 had a low coefficient of dynamic friction on the outermost surface, and the surface layer had high lubricity. Further, the article 1 has an F atom concentration of 25.6 atomic% and an Si atom concentration of 29.7 atomic% in the outermost surface composition, and the F / Si value is significantly higher than that of Example 2, and the surface layer The coverage of the substrate surface due to was high. Since the coverage was high, it was confirmed that the amount of the fluorine-containing ether composition 1 adhered to the substrate surface was sufficient, and the adhesion to the substrate was excellent. From these results, it was confirmed that the fluorine-containing ether composition 1 can exhibit excellent lubricity and adhesion.
On the other hand, the article 2 of Example 2 obtained using the fluorine-containing ether composition 2 having a content of the compound (A) of 10% by mass had high surface layer lubricity, but the F / Si value was small. There was little adhesion amount to the base-material surface of the fluorine-containing ether composition 2, and it was inferior to adhesiveness.
Articles 3 and 4 of Examples 3 and 4 obtained by using the fluorine-containing ether compositions 3 and 4 having a content ratio of the compound (A) of 85 and 98% by mass as the fluorine-containing ether compound have a F / Si value of Although it was large, the coefficient of dynamic friction was large, and the lubricity of the surface layer was insufficient.
Further, in the articles 5 and 6 of Examples 5 and 6 obtained by using the fluorinated ether compositions 5 and 6 in which the content ratio of the compound (A) is 45 and 70% by mass as the fluorinated ether compound, F / Si Although the value is larger than Articles 1 and 2 (similar to Articles 3 and 4), the fluorinated ether compositions 5 and 6 require particularly high lubricity because the dynamic friction coefficient is smaller than that of Article 1. Suitable for intended use.
本発明の含フッ素エーテル組成物は、表面改質剤や界面活性剤として有用であり、特にハードディスク等の磁気記録媒体用潤滑剤として有用である。
なお、2013年2月13日に出願された日本特許出願2013−025906号の明細書、特許請求の範囲及び要約書の全内容をここに引用し、本発明の明細書の開示として、取り入れるものである。The fluorine-containing ether composition of the present invention is useful as a surface modifier and a surfactant, and particularly useful as a lubricant for magnetic recording media such as hard disks.
In addition, the entire content of the specification, claims and abstract of Japanese Patent Application No. 2013-025906 filed on February 13, 2013 is incorporated herein as the disclosure of the specification of the present invention. It is.
Claims (14)
前記含フッ素エーテル化合物(A)の含有量が、前記含フッ素エーテル化合物(A)と前記含フッ素エーテル化合物(B)との合計量に対して15〜80質量%であることを特徴とする含フッ素エーテル組成物。
(X)n−YA−(Z)m …(A)
(X)s−YB−(Z)t …(B)
ただし、式中の符号は以下の意味を示す。
前記式(A)中、Xは下式(X)で表される基であり、Zは下式(Z)で表される基であり、nは5または6であり、mは0または1であり、n+mは5または6であり、YAは、5または6価の多価アルコールからヒドロキシ基を除いた構造の基をペルフルオロ化した、ペルフルオロ有機基である。
前記式(B)中、XおよびYはそれぞれ前記と同じ意味であり、sは0〜4の整数であり、tは0〜10の整数であり、s+tは2〜14の整数であり、YBは(s+t)価の連結基である。
HO−CH2−P1−[(CaF2aO) b ]− …(X)
R−P2−[(CdF2dO) e ]− …(Z)
前記式(X)中、aは1〜5の整数であり、bは1〜100の整数であり、P 1はヒドロキシ基およびアルコキシ基のいずれも含まない2価の連結基または単結合である。bが2以上である場合、同一分子内に存在するb個のaはそれぞれ同一でも異なってもよい。分子内でのb個の(CaF2aO)単位の並びはいかなる順序であってもよい。
前記式(Z)中、dは1〜5の整数であり、eは1〜100の整数であり、P 2はヒドロキシ基およびアルコキシ基のいずれも含まない2価の連結基または単結合であり、Rは水素原子、ハロゲン原子、1価の炭化水素基、フルオロアルキル基、または炭素−炭素原子間にエーテル性酸素原子が挿入されたフルオロアルキル基である。eが2以上である場合、同一分子内に存在するe個のdはそれぞれ同一でも異なってもよい。分子内でのe個の(CdF2dO)単位の並びはいかなる順序であってもよい。 A fluorine-containing ether compound (A) represented by the following formula (A) and a fluorine-containing ether compound (B) represented by the following formula (B),
The content of the fluorine-containing ether compound (A) is 15 to 80% by mass with respect to the total amount of the fluorine-containing ether compound (A) and the fluorine-containing ether compound (B). Fluorine ether composition.
(X) n -Y A- (Z) m (A)
(X) s -Y B- (Z) t (B)
However, the symbols in the formulas have the following meanings.
In the formula (A), X is a group represented by the following formula (X), Z is a group represented by the following formula (Z), n is 5 or 6, and m is 0 or 1 N + m is 5 or 6 , and Y A is a perfluoro organic group obtained by perfluorinating a group having a structure in which a hydroxy group is removed from a pentavalent or hexavalent polyhydric alcohol .
In the formula (B), X and Y have the same meanings as described above, s is an integer of 0 to 4, t is an integer of 0 to 10, s + t is an integer of 2 to 14, Y B is a (s + t) -valent linking group.
HO—CH 2 —P 1 — [(C a F 2a O) b ] — (X)
R-P 2 - [(C d F 2d O) e] - ... (Z)
In the formula (X), a is an integer of 1 to 5, b is an integer of 1 to 100, P 1 is a divalent linking group or a single bond does not contain any hydroxy groups and alkoxy groups . When b is 2 or more, b a existing in the same molecule may be the same or different . Of b pieces in the molecular (C a F 2a O) sequence of Unit may be any order.
In the formula (Z), d is an integer of 1 to 5, e is an integer of 1 to 100, and P 2 is a divalent linking group or a single bond that does not contain any hydroxy group or alkoxy group. , R is a hydrogen atom, a halogen atom, a monovalent hydrocarbon group, a fluoroalkyl group, or a fluoroalkyl group in which an etheric oxygen atom is inserted between carbon-carbon atoms. When e is 2 or more, e ds present in the same molecule may be the same or different . The e-number in the molecular (C d F 2d O) sequence of Unit may be any order.
HO−CH2−CF2O−(CF2CF2O)b−1− …(X−1)
R−O−(CF2CF2O)e− …(Z−1)
ただし、式中の符号は以下の意味を示す。
前記式(X−1)中、bは1〜100の整数である。
前記式(Z−1)中、eは1〜100の整数であり、Rは前記と同じ意味である。 In the fluorine-containing ether compound (A), m in the formula (A) is 0 or 1 , X is a group represented by the following formula (X-1), and Z is represented by the following formula (Z-1). The fluorine-containing ether composition according to any one of claims 1 to 4, which is a compound which is a group.
HO—CH 2 —CF 2 O— (CF 2 CF 2 O) b-1 − (X-1)
R—O— (CF 2 CF 2 O) e − (Z-1)
However, the symbols in the formulas have the following meanings.
In said formula (X-1), b is an integer of 1-100.
In the formula (Z-1), e is an integer of 1 to 100, and R has the same meaning as described above.
HO−CH2−CF2O−(CF2CF2O)b−1− …(X−1)
R−O−(CF2CF2O)e− …(Z−1)
ただし、式中の符号は以下の意味を示す。
前記式(X−1)中、bは1〜100の整数である。
前記式(Z−1)中、eは1〜100の整数であり、Rは前記と同じ意味である。 In the fluorine-containing ether compound (B), s in the formula (B) is 4, t is 0 to 2, X is a group represented by the following formula (X-1), Z is the following formula (Z-1 The fluorine-containing ether composition according to any one of claims 1 to 5 , which is a compound which is a group represented by:
HO—CH 2 —CF 2 O— (CF 2 CF 2 O) b-1 − (X-1)
R—O— (CF 2 CF 2 O) e − (Z-1)
However, the symbols in the formulas have the following meanings.
In said formula (X-1), b is an integer of 1-100.
In the formula (Z-1), e is an integer of 1 to 100, and R has the same meaning as described above.
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