JP6089298B2 - パターン形成方法、スチレン系ポリマー薄膜付き基材、表面撥水性材料、パスワード生成装置、培養器、パターン形成剤、及び反転パターン形成方法。 - Google Patents
パターン形成方法、スチレン系ポリマー薄膜付き基材、表面撥水性材料、パスワード生成装置、培養器、パターン形成剤、及び反転パターン形成方法。 Download PDFInfo
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Description
スチレン系ポリマーと、酢酸、酢酸メチル及びアセチルアセトンのうち少なくとも1つの添加剤と、溶媒と、を含むパターン形成溶液を、湿度10%〜80%の条件下で、基材上に付着させる付着工程と、
湿度10%〜80%の条件下で、前記パターン形成溶液を付着させた前記基材から、前記溶媒を除去する溶媒除去工程と、
を含む。
スチレン系ポリマーと、
酢酸、酢酸メチル、及びアセチルアセトンのうち少なくとも1つの添加剤と、
溶媒と、
を含む。
スチレン系ポリマーと、酢酸、酢酸メチル、及びアセチルアセトンのうち少なくとも1つの添加剤と、アクリル系樹脂と、溶媒と、を含む反転パターン形成溶液を、湿度10%〜80%の条件下で、基材上に付着させる付着工程と、
湿度10%〜80%の条件下で、前記反転パターン形成溶液を付着させた前記基材から、前記溶媒を除去する溶媒除去工程と、
前記溶媒除去工程の後に、前記反転パターン形成溶液を付着させた前記基材を、現像溶媒に浸漬させて、スチレン系ポリマーを溶解させる現像工程と、
を含む。
本実施例では、種々の条件設定のもとで、基材上にパターンを形成できるかどうかについて検討した。
本実施例では、基材上にパターン形成溶液を滴下し、延伸させることで、パターンを形成できるかどうかについて検討した。
本実施例では、種々の条件設定のもとで、アクリル樹脂(ポリメチルメタクリレート(PMMA))を含有する溶液でパターンを形成できるかどうかについて検討した。
本実施例では、ポリスチレンのパターンを反転させたアクリル系樹脂(ポリメチルメタクリレート(PMMA))のパターン及びポリスチレンのパターンがエッチングされたシリコン酸化膜付きシリコン基材が得られるかどうかについて検討した。
本実施例では、インクにポリスチレン及び酢酸を加えて噴射した場合に、ドット内にパターンを形成させることができるかどうかについて検討した。
本実施例では、パターン形成溶液を長期間保存した後においても、パターン形成が可能かどうかついて検討した。
本実施例では、パターン形成された基板を細胞足場として備えた培養器において、細胞を培養できるかどうかについて検証した。
2 ポリスチレン
3 シリコン酸化膜
4 シリコン
5 基材(シリコン酸化膜付きシリコン)
Claims (8)
- スチレン系ポリマーと、酢酸、酢酸メチル及びアセチルアセトンのうち少なくとも1つの添加剤と、溶媒と、を含むパターン形成溶液を、湿度10%〜80%の条件下で、基材上に付着させる付着工程と、
湿度10%〜80%の条件下で、前記パターン形成溶液を付着させた前記基材から、前記溶媒を除去する溶媒除去工程と、
を含む、パターン形成方法。 - 前記溶媒除去工程の前に、前記基材上に付着した前記パターン形成溶液を延伸させる延伸工程をさらに含む、請求項1に記載のパターン形成方法。
- 請求項1又は2に記載のパターン形成方法によりパターン形成されたスチレン系ポリマー薄膜付き基材。
- 請求項3に記載のスチレン系ポリマー薄膜付き基材を備える表面撥水性材料。
- 請求項3に記載のスチレン系ポリマー薄膜付き基材を備えるパスワード生成装置。
- 請求項3に記載のスチレン系ポリマー薄膜付き基材を備える培養器。
- スチレン系ポリマーと、
酢酸、酢酸メチル、及びアセチルアセトンのうち少なくとも1つの添加剤と、
溶媒と、
を含む、基材上にパターンを形成するためのパターン形成剤。 - スチレン系ポリマーと、酢酸、酢酸メチル、及びアセチルアセトンのうち少なくとも1つの添加剤と、アクリル系樹脂と、溶媒と、を含む反転パターン形成溶液を、湿度10%〜80%の条件下で、基材上に付着させる付着工程と、
湿度10%〜80%の条件下で、前記反転パターン形成溶液を付着させた前記基材から、前記溶媒を除去する溶媒除去工程と、
前記溶媒除去工程の後に、前記反転パターン形成溶液を付着させた前記基材を、現像溶媒に浸漬させて、スチレン系ポリマーを溶解させる現像工程と、
を含む、反転パターン形成方法。
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