JP6069617B2 - 窒化アルミニウム部分を除去した素子 - Google Patents

窒化アルミニウム部分を除去した素子 Download PDF

Info

Publication number
JP6069617B2
JP6069617B2 JP2012170932A JP2012170932A JP6069617B2 JP 6069617 B2 JP6069617 B2 JP 6069617B2 JP 2012170932 A JP2012170932 A JP 2012170932A JP 2012170932 A JP2012170932 A JP 2012170932A JP 6069617 B2 JP6069617 B2 JP 6069617B2
Authority
JP
Japan
Prior art keywords
substrate
aln substrate
heterostructure
layer
light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2012170932A
Other languages
English (en)
Japanese (ja)
Other versions
JP2013046062A (ja
JP2013046062A5 (https=
Inventor
クリストファー・エル・チュア
ブレント・エス・クルーサー
トーマス・ウンデラー
ノーブル・エム・ジョンソン
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Palo Alto Research Center Inc
Original Assignee
Palo Alto Research Center Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Palo Alto Research Center Inc filed Critical Palo Alto Research Center Inc
Publication of JP2013046062A publication Critical patent/JP2013046062A/ja
Publication of JP2013046062A5 publication Critical patent/JP2013046062A5/ja
Application granted granted Critical
Publication of JP6069617B2 publication Critical patent/JP6069617B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/01Manufacture or treatment
    • H10H20/011Manufacture or treatment of bodies, e.g. forming semiconductor layers
    • H10H20/018Bonding of wafers
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/50Bond wires
    • H10W72/531Shapes of wire connectors
    • H10W72/536Shapes of wire connectors the connected ends being ball-shaped
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/50Bond wires
    • H10W72/531Shapes of wire connectors
    • H10W72/5363Shapes of wire connectors the connected ends being wedge-shaped
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/851Dispositions of multiple connectors or interconnections
    • H10W72/874On different surfaces
    • H10W72/879Bump connectors and bond wires
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/24Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24802Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]

Landscapes

  • Led Devices (AREA)
  • Semiconductor Lasers (AREA)
  • Weting (AREA)
JP2012170932A 2011-08-25 2012-08-01 窒化アルミニウム部分を除去した素子 Expired - Fee Related JP6069617B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US13/217,844 US9064980B2 (en) 2011-08-25 2011-08-25 Devices having removed aluminum nitride sections
US13/217,844 2011-08-25

Publications (3)

Publication Number Publication Date
JP2013046062A JP2013046062A (ja) 2013-03-04
JP2013046062A5 JP2013046062A5 (https=) 2015-09-17
JP6069617B2 true JP6069617B2 (ja) 2017-02-01

Family

ID=47076081

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012170932A Expired - Fee Related JP6069617B2 (ja) 2011-08-25 2012-08-01 窒化アルミニウム部分を除去した素子

Country Status (3)

Country Link
US (1) US9064980B2 (https=)
EP (1) EP2562826B1 (https=)
JP (1) JP6069617B2 (https=)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9444224B2 (en) * 2014-12-08 2016-09-13 Palo Alto Research Center Incorporated Nitride laser diode with engineered non-uniform alloy composition in the n-cladding layer
KR102742153B1 (ko) * 2016-10-21 2024-12-12 삼성전자주식회사 갈륨 질화물 기판의 제조 방법
US10170312B2 (en) * 2017-04-20 2019-01-01 Taiwan Semiconductor Manufacturing Company Ltd. Semiconductor substrate and manufacturing method of the same
WO2019079239A1 (en) * 2017-10-16 2019-04-25 Crystal Is, Inc. ELECTROCHEMICAL REMOVAL OF ALUMINUM NITRIDE SUBSTRATES FOR ELECTRONIC AND OPTOELECTRONIC DEVICES
US10483430B1 (en) 2018-05-01 2019-11-19 Facebook Technologies, Llc Micron-sized light emitting diode designs
JP7570424B2 (ja) * 2020-09-17 2024-10-21 日機装株式会社 窒化物半導体紫外線発光素子

Family Cites Families (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5739945A (en) 1995-09-29 1998-04-14 Tayebati; Parviz Electrically tunable optical filter utilizing a deformable multi-layer mirror
FR2765347B1 (fr) 1997-06-26 1999-09-24 Alsthom Cge Alcatel Reflecteur de bragg en semi-conducteur et procede de fabrication
US6841808B2 (en) * 2000-06-23 2005-01-11 Toyoda Gosei Co., Ltd. Group III nitride compound semiconductor device and method for producing the same
US7638346B2 (en) * 2001-12-24 2009-12-29 Crystal Is, Inc. Nitride semiconductor heterostructures and related methods
US6831302B2 (en) * 2003-04-15 2004-12-14 Luminus Devices, Inc. Light emitting devices with improved extraction efficiency
FR2859312B1 (fr) 2003-09-02 2006-02-17 Soitec Silicon On Insulator Scellement metallique multifonction
TW200610150A (en) * 2004-08-30 2006-03-16 Kyocera Corp Sapphire baseplate, epitaxial substrate and semiconductor device
US20070045638A1 (en) * 2005-08-24 2007-03-01 Lumileds Lighting U.S., Llc III-nitride light emitting device with double heterostructure light emitting region
TWI307175B (en) * 2006-01-11 2009-03-01 Ind Tech Res Inst Non-substrate light emitting diode and fabrication method thereof
US7452739B2 (en) 2006-03-09 2008-11-18 Semi-Photonics Co., Ltd. Method of separating semiconductor dies
US7560364B2 (en) * 2006-05-05 2009-07-14 Applied Materials, Inc. Dislocation-specific lateral epitaxial overgrowth to reduce dislocation density of nitride films
US7872272B2 (en) * 2006-09-06 2011-01-18 Palo Alto Research Center Incorporated Nitride semiconductor ultraviolet LEDs with tunnel junctions and reflective contact
US7700962B2 (en) * 2006-11-28 2010-04-20 Luxtaltek Corporation Inverted-pyramidal photonic crystal light emitting device
TWI370555B (en) 2006-12-29 2012-08-11 Epistar Corp Light-emitting diode and method for manufacturing the same
CN101652832B (zh) * 2007-01-26 2011-06-22 晶体公司 厚的赝晶氮化物外延层
US8110425B2 (en) * 2007-03-20 2012-02-07 Luminus Devices, Inc. Laser liftoff structure and related methods
US20080303033A1 (en) 2007-06-05 2008-12-11 Cree, Inc. Formation of nitride-based optoelectronic and electronic device structures on lattice-matched substrates
US20090278233A1 (en) * 2007-07-26 2009-11-12 Pinnington Thomas Henry Bonded intermediate substrate and method of making same
US20110018104A1 (en) 2008-01-16 2011-01-27 Toru Nagashima METHOD FOR PRODUCING A LAMINATED BODY HAVING Al-BASED GROUP-III NITRIDE SINGLE CRYSTAL LAYER, LAMINATED BODY PRODUCED BY THE METHOD, METHOD FOR PRODUCING Al-BASED GROUP-III NITRIDE SINGLE CRYSTAL SUBSTRATE EMPLOYING THE LAMINATED BODY, AND ALUMINUM NITRIDE SINGLE CRYSTAL SUBSTRATE
US7960743B2 (en) * 2008-12-05 2011-06-14 Jds Uniphase Corporation Multi-electrode light emitting device
US7749782B1 (en) * 2008-12-17 2010-07-06 Palo Alto Research Center Incorporated Laser roughening to improve LED emissions
US8124993B2 (en) * 2008-12-17 2012-02-28 Palo Alto Research Center Incorporated Selective decomposition of nitride semiconductors to enhance LED light extraction
US8227791B2 (en) * 2009-01-23 2012-07-24 Invenlux Limited Strain balanced light emitting devices
US8178427B2 (en) * 2009-03-31 2012-05-15 Commissariat A. L'energie Atomique Epitaxial methods for reducing surface dislocation density in semiconductor materials
TW201118946A (en) * 2009-11-24 2011-06-01 Chun-Yen Chang Method for manufacturing free-standing substrate and free-standing light-emitting device

Also Published As

Publication number Publication date
JP2013046062A (ja) 2013-03-04
EP2562826B1 (en) 2017-06-28
US9064980B2 (en) 2015-06-23
EP2562826A1 (en) 2013-02-27
US20130049005A1 (en) 2013-02-28

Similar Documents

Publication Publication Date Title
JP6069617B2 (ja) 窒化アルミニウム部分を除去した素子
JP5833988B2 (ja) 窒化アルミニウム部分の除去
US6593595B2 (en) Semiconductor light-emitting device and method for producing same
Wunderer et al. Pseudomorphically grown ultraviolet C photopumped lasers on bulk AlN substrates
JP6676578B2 (ja) 半導体チップの製造方法
JP2009224397A (ja) 発光装置およびこれを利用した照明装置、表示装置
KR20150110765A (ko) 단결정 알루미늄 질화물 기판을 포함하는 광전자 소자들
US6709881B2 (en) Method for manufacturing semiconductor and method for manufacturing semiconductor device
Morkoç Wurtzite GaN-based heterostructures by molecular beam epitaxy
US7566579B2 (en) Method of fabricating semiconductor devices with a multi-role facilitation layer
JP4425376B2 (ja) シリコン基板を用いたZnO系化合物半導体発光素子およびその製法
US8306083B2 (en) High performance ZnO-based laser diodes
TW200522460A (en) MBE growth of a semiconductor laser diode
US20080181267A1 (en) Optical device and method for manufacturing the same
Li-Qun et al. Continuous-wave operation of GaN based multi-quantum-well laser diode at room temperature
JP2007329487A (ja) レーザ素子および光記録再生装置
JP2005322944A (ja) 窒化ガリウム系半導体発光素子の評価方法および製造方法
Tan et al. High-power and long-lifetime InGaN blue–violet laser diodes grown by molecular beam epitaxy
US20150200521A1 (en) Nitride semiconductor light emitting element
KR101076723B1 (ko) 반도체 발광소자의 열처리 제어 장치 및 방법
JP4935591B2 (ja) Iii族窒化物半導体光素子を作製する方法、およびフォトルミネッセンススペクトルを測定する方法
Lian et al. Fabrication and characterization of high power InGaN blue-violet lasers with an array structure
JP2022153164A (ja) 光デバイス
JP2004158660A (ja) 窒化物半導体レーザ
JP2002075865A (ja) 赤外領域で透明な基板を用いた半導体装置の製法

Legal Events

Date Code Title Description
RD04 Notification of resignation of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7424

Effective date: 20131209

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20150803

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20150803

A871 Explanation of circumstances concerning accelerated examination

Free format text: JAPANESE INTERMEDIATE CODE: A871

Effective date: 20150803

A975 Report on accelerated examination

Free format text: JAPANESE INTERMEDIATE CODE: A971005

Effective date: 20151113

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20151118

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20151208

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20160307

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20160510

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20160909

A911 Transfer to examiner for re-examination before appeal (zenchi)

Free format text: JAPANESE INTERMEDIATE CODE: A911

Effective date: 20160916

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20161108

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20161129

R150 Certificate of patent or registration of utility model

Ref document number: 6069617

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

LAPS Cancellation because of no payment of annual fees