JP6048604B1 - Line pattern, light control member, and optical imaging member manufacturing method - Google Patents

Abstract

In a method for manufacturing a line pattern composed of a plurality of linear members arranged in parallel to each other by an imprint method, a thermoplastic resin film on which the pattern is formed, and an uneven pattern corresponding to the shape of the pattern are provided. A method excellent in separability from an uneven member is provided. A method for producing a line pattern in a light control member, comprising a thermoplastic resin film having a concavo-convex pattern corresponding to the shape of the line pattern and comprising at least one selected from fluorine atoms and silicon atoms Pressing the concavo-convex member whose surface is subjected to surface treatment of the concavo-convex pattern surface in contact with the resin film, wherein the pressing is performed while the resin film is heated or while the resin film is heated, And the manufacturing method of the line pattern which has the process (b) which isolate | separates the said uneven | corrugated member from the said resin film, and obtains the said line pattern. [Selection] Figure 1

Description

  The present invention relates to a method for manufacturing a line pattern included in a light control member, and more specifically, a method for manufacturing a line pattern included in a light control member having a plurality of planar light reflecting portions (light reflecting surfaces) arranged in parallel to each other. About.

  A stereoscopic image display device that forms an image of the object in the air using light emitted from the object surface is known (see Patent Document 1). An example of the stereoscopic image display device includes two light control members each having a plurality of planar light reflecting portions arranged in parallel with each other at regular intervals. These light control members (first and second light control members) are arranged to face each other in a state where the respective planar light reflection portions are orthogonal to each other.

  Light from the object is incident on the planar light reflecting portion of the first light control member, and the reflected light reflected by the light reflecting portion is reflected again by the planar light reflecting portion of the second light control member. The image of the object is displayed on the opposite side of the stereoscopic image display device by the reflected light obtained here.

  In the stereoscopic image display device, it is necessary to prepare a light control member having a plurality of planar light reflecting portions at regular intervals. The said light control member can be obtained by laminating | stacking the transparent substrate which has a light reflection part on both surfaces or one side using an adhesive agent, and cut | disconnecting the obtained laminated body by fixed width. However, the method is expensive.

To solve the above problem, a method is proposed in which a plurality of convex portions are formed on a substrate by an imprint method in which a concavo-convex member is pressed against a target coating film to form a pattern, and a light reflecting portion is formed on a side surface of the convex portion (See Patent Document 2). In the method described in Patent Document 2, a thermoplastic resin plate that is processed into a plurality of convex portions by an imprint method is prepared, and a brittle hard coating made of SiO ₂ is formed on the surface of the resin plate. Describes a method of pressing a member having a concavo-convex pattern on the resin plate on which is formed. However, the above method requires further improvement in that the line pattern is deformed upon separation from the concavo-convex portion.

Japanese Patent No. 4865088 Japanese Patent Laying-Open No. 2015-014777

  The present invention relates to a method for producing a line pattern composed of a plurality of linear members arranged in parallel to each other by an imprint method, and a thermoplastic resin film on which the pattern is formed, and an uneven pattern corresponding to the shape of the line pattern It is an object of the present invention to provide a method excellent in releasability (releasability) from a concavo-convex member having a surface.

  The present inventors have intensively studied to solve the above problems. As a result, the inventors have found that the above problems can be solved by the method described below, and have completed the present invention. That is, the present invention relates to the following [1] to [12], for example.

  [1] A method for producing the line pattern in a light control member having a line pattern composed of a plurality of linear members arranged in parallel to each other and a light reflecting surface formed on a side surface of the linear member, and having thermoplasticity A concavo-convex member having a concavo-convex pattern corresponding to the shape of the line pattern on the resin film, the concavo-convex pattern surface contacting the resin film with a compound containing at least one selected from fluorine atoms and silicon atoms. Pressing step (a), wherein the pressing is performed while heating the resin film or while the resin film is heated; and the concavo-convex members are separated from the resin film and arranged parallel to each other. A method for producing a line pattern comprising the step (b) of obtaining a line pattern comprising a plurality of linear members.

  [2] The thermoplastic resin constituting the resin film is at least one selected from cyclic olefin resins, (meth) acrylic resins, polyester resins, polystyrene resins, polycarbonate resins, and polyvinyl chloride resins. Line pattern manufacturing method.

  [3] The method for producing a line pattern according to [1] or [2], wherein the compound is at least one selected from a fluorine atom-containing compound, a silicon atom-containing compound, and a fluorine atom and a silicon atom-containing compound.

  [4] Any one of the above-mentioned [1] to [3], wherein the surface-treated uneven pattern surface has a dynamic friction coefficient according to JIS K7125 under conditions of a load of 200 g and a tensile speed of 100 mm / min of 0.30 or less. Line pattern manufacturing method.

  [5] The method for producing a line pattern according to any one of [1] to [4], wherein the uneven member having the uneven pattern is pressed against the resin film in a range of 0.1 to 30.0 MPa.

  [6] In the step (a), the resin film is heated to a temperature equal to or higher than the glass transition temperature of the thermoplastic resin constituting the resin film, and the resin film is separated from the resin before separation in the step (b). The method for producing a line pattern according to any one of [1] to [5], wherein the thermoplastic resin constituting the film is cooled to a temperature lower than the glass transition temperature.

  [7] The line pattern manufacturing method according to any one of [1] to [6], wherein the linear member has a height of 50 μm or more.

  [8] The method for producing a line pattern according to any one of [1] to [7], wherein the cross-sectional shape of the linear member is rectangular.

  [9] The method includes the step (1) of forming a line pattern by the method according to any one of [1] to [8] and the step (2) of forming a light reflecting surface on the side surface of the linear member. A method of manufacturing a light control member.

  [10] The method for manufacturing a light control member according to [9], further including a step (3) of forming a transparent member between the linear members.

  [11] A method for producing an optical imaging member comprising a light control member having a line pattern composed of a plurality of linear members arranged in parallel to each other and a light reflecting surface formed on a side surface of the linear member, A method of manufacturing an optical imaging member, wherein the light control member is manufactured by the method of [9] or [10].

  [12] A method of manufacturing an optical imaging member comprising a first light control member and a second light control member, wherein the first light control member and the second light control member are arranged in parallel with each other. A line pattern composed of a plurality of linear members and a light reflecting surface formed on a side surface of the linear member, and at least one of the first light control member and the second light control member , Manufactured by the method of [9] or [10], and then intersecting the first light control member and the second light control member when the line pattern of each of the first light control member and the second light control member is viewed from above the light control member. A method for producing an optical imaging member, wherein the optical imaging member is arranged in a state where the optical imaging member is disposed.

  According to the present invention, in a method of manufacturing a line pattern composed of a plurality of linear members arranged in parallel to each other by an imprint method, the thermoplastic resin film on which the pattern is formed and the shape of the line pattern correspond to A method excellent in separability (releasing properties) from the concavo-convex member having the concavo-convex pattern can be provided, and thus a linear member having a high aspect ratio can be formed. By forming a light reflecting surface on the side surface of the linear member, it is possible to provide a light control member having a plurality of planar light reflecting portions (light reflecting surfaces) arranged in parallel to each other.

FIG. 1A is a perspective view of a member having a transparent substrate and a line pattern formed on the transparent substrate, FIG. 1B is a top view of the member, and FIG. 1C is the top view. It is AA sectional view. FIG. 2 is a cross-sectional view of an embodiment of a light control member. 3A is a perspective view of the optical imaging member, FIG. 3B is a cross-sectional view of the optical imaging member in the YZ plane for cutting the transparent member of the first light control member, and FIG. It is sectional drawing of the said optical imaging member in the XZ plane which cut | disconnects the transparent member of the light control member.

Hereinafter, modes for carrying out the present invention will be described.
[Line pattern manufacturing method]
The method for producing a line pattern according to the present invention includes: a line pattern composed of a plurality of linear members arranged in parallel to each other; and a light pattern formed on a side surface of the linear member. A production method, preferably a production method of the line pattern in an optical imaging member comprising the light control member,
A step (a) of pressing the concavo-convex member against the thermoplastic resin film, wherein the pressing is performed while the resin film is heated or while the resin film is heated; and from the resin film to the concavo-convex member. (B) to obtain a line pattern composed of a plurality of linear members arranged in parallel to each other. The uneven member has an uneven pattern corresponding to the shape of the line pattern. The concavo-convex pattern surface in contact with the resin film is surface-treated with a compound containing at least one selected from fluorine atoms and silicon atoms.

  The linear member may have any configuration as long as each linear member has at least one side surface parallel to each other, and examples of the cross-sectional shape thereof include a rectangular shape and a triangular shape. From the viewpoint of yield, the linear member has a rectangular shape. Preferably there is. In the case of a triangular shape, for example, a shape having a vertical surface with respect to the substrate surface can be mentioned.

  Hereinafter, the structure of the linear member, its cross section and side surfaces, and the structure of the line pattern will be described with reference to FIG. FIG. 1A is a perspective view of a member 1 having a transparent substrate 10 and a line pattern 20 made of a plurality of linear members 21 formed on the transparent substrate 10, and FIG. FIG. 1C is a cross-sectional view taken along line AA in the top view.

  The cross section of the linear member 21 is a cross section (YZ plane in FIG. 1A) perpendicular to the extending direction of the linear member 21 (X-axis direction in FIG. 1A). The cross-sectional shape of the linear member 21 is preferably rectangular. The side surface of the linear member 21 is a surface where the linear members 21 face each other, the side surface in the longitudinal direction in FIG. 1A, and the surface indicated by reference numeral 22 in FIGS. The plurality of linear members 21 are arranged so that their longitudinal directions are parallel to each other. The line pattern 20 has a plurality of linear members 21. The number of the linear members 21 is not particularly limited.

  In the present invention, since a so-called thermal imprint method is used, a desired line pattern can be formed without performing a development step required in the photolithography method, and the linear member has an aspect ratio higher than that of the photolithography method. It is easy to form a line pattern consisting of

[Step (a)]
In the step (a), a concavo-convex pattern corresponding to the shape of the line pattern, that is, a member having a complementary pattern of the line pattern (hereinafter also referred to as “concave member”) is pressed against the thermoplastic resin film. The concavo-convex pattern is transferred to the thermoplastic resin film through the steps (a) to (b).

<Uneven member>
As the concavo-convex member, for example, a member (mold) having a plurality of convex portions and concave portions corresponding to the shape of the line pattern is used. As for the convex part and concave part of an uneven | corrugated member, although rectangular shape and a triangular shape are mentioned, for example, it is preferable that it is a rectangular shape.

  The concavo-convex member can be made of, for example, a metal material such as iron, copper, aluminum, titanium, nickel, silicon, or an alloy of two or more of these (eg, stainless steel), and can be made of resin, glass, quartz It can also be made of a non-metallic material such as ceramic. A resin replica mold obtained by using an uneven member made of silicon, quartz or the like as a master mold may be used. The uneven member may be plate-shaped or roll-shaped.

The uneven member can be produced by a conventionally known method.
The concavo-convex member is a surface treatment (releasing mold) with a compound (hereinafter also referred to as “releasing compound”) in which the surface in contact with the thermoplastic resin film, that is, the concavo-convex pattern surface, contains at least one selected from fluorine atoms and silicon atoms. Processing). In one embodiment of the concavo-convex member, the surface in contact with the thermoplastic resin film is a release film, the thickness of the release film derived from the release compound is, for example, 1 to 100 nm, and the thickness is X-ray. It can be measured by photoelectron spectroscopy (XPS). By subjecting the surface of the concavo-convex member to the surface treatment, even a thermoplastic resin film can be easily separated from the concavo-convex member.

  The surface treatment is performed, for example, by bringing a release compound into contact with the surface of the concavo-convex pattern by a method such as dip coating, spin coating, spraying or vapor deposition. Here, you may use what the said compound diluted or melt | dissolved with organic solvents, such as a hydrocarbon solvent, alcohol solvent, ester solvent, and a fluorine-type solvent with which a mold release compound is compatible or melt | dissolved. For example, a releasable compound or a solution thereof is applied to the concavo-convex pattern surface, and heat treatment is performed at 50 to 200 ° C. for 1 to 60 minutes. Subsequent to the contact treatment, the concavo-convex pattern surface may be further rinsed. For the rinsing treatment, for example, a fluorine-based solvent such as perfluorohexane or hydrofluoroether, or an organic solvent such as an ester solvent such as ethyl acetate can be used.

  After the surface treatment of the concavo-convex member, the dynamic friction coefficient of the concavo-convex pattern surface according to JIS K7125 (load 200 g, tensile speed 100 mm / min) is preferably 0.30 or less, more preferably 0.25 or less, and still more preferably 0.00. 20 or less. Although the minimum of a dynamic friction coefficient is not specifically limited, For example, it is 0.01. The coefficient of dynamic friction on the surface of the concavo-convex pattern can be measured and evaluated, for example, for a flat portion after the surface treatment in which the pattern on the concavo-convex member is not formed. When the dynamic friction coefficient is within the above range, the separability between the resin film and the concavo-convex member is further improved. The dynamic friction coefficient can be adjusted to the above range by, for example, the type of the releasable compound and the release treatment time.

  The contact surface with the thermoplastic resin film after the surface treatment of the concavo-convex member preferably has a surface fluorine concentration of 35 atomic% or more, more preferably 40 to 90 atomic%, still more preferably 50 to 90 atomic%, Alternatively, the surface silicon concentration is preferably 15 atomic% or more, more preferably 18 to 90 atomic%, and still more preferably 20 to 90 atomic%. Here, at least one of the surface fluorine concentration and the surface silicon concentration at the contact surface is preferably equal to or higher than the lower limit value. The surface concentration can be measured using an X-ray photoelectron spectrometer. When the surface concentration is in the above range, the separation between the resin film and the concavo-convex member is further improved.

  Examples of the releasable compound include a fluorine atom-containing compound, a silicon atom-containing compound, a fluorine atom and a silicon atom-containing compound. These compounds may be used individually by 1 type, and may use 2 or more types together.

As a fluorine atom containing compound which does not contain a silicon atom, fluoride vinyl ether and its polymer are mentioned, for example. Specific examples of the vinyl fluoride ether include compounds represented by CF ₂ ═CF—O— (R ¹ —O) _n —R ² . In the above formula, R ¹ is an alkylene group having 2 to 8 carbon atoms in which at least a part of hydrogen atoms may be substituted with fluorine atoms, and R ² may be substituted with at least a part of hydrogen atoms by fluorine atoms. It is a good alkyl group having 1 to 18 carbon atoms, and n is 0 or 1. For example, perfluorovinyl ethyl ether, perfluoro vinyl propyl ether, perfluoro-2-propoxy-propyl vinyl ether may be mentioned.

  Polyfluoropolyether is also mentioned. The terminal of the polyfluoropolyether may have, for example, a hydroxyl group, a hydroxyalkyl group, a dihydroxyalkoxyalkyl group, a hydroxy (polyalkyleneoxy) alkyl group, a carboxyl group, and an esterified product thereof. Specifically, the polyfluoropolyether has a fluorinated alkyleneoxy group having 1 to 8 carbon atoms as a repeating structure. The weight average molecular weight of the polyfluoropolyether is measured by a gel permeation chromatography method and is usually 100 to 5,000. Examples of commercially available products of polyfluoropolyether include the FLUOROLINK (registered trademark) series manufactured by Solvay.

  Examples of silicon atom-containing compounds that do not contain fluorine atoms include non-fluorinated silane compounds that do not contain fluorine atoms. Specifically, in the following formula (1), a = 0 and b = 0 to 3 are integers. Modified compounds are mentioned.

  Moreover, silicone is also exemplified, and examples thereof include unmodified or modified silicone oil, silicone rubber, silicone resin, and silicone oligomer which is a low molecular weight product of the resin. Examples of the unmodified silicone oil include polysiloxanes such as dimethylpolysiloxane. The modified silicone oil is preferably a modified silicone oil in which the side chain and / or terminal of polysiloxane such as dimethylpolysiloxane is modified, such as amino modification, epoxy modification, carboxyl modification, carbinol modification, (meth) acryl modification, Examples include reactive silicone oils modified with vinyl, mercapto or phenol, or modified with two or more of these; non-reactive silicone oils such as polyether-modified silicone oils. As a silicone oligomer, a silicone alkoxy oligomer is mentioned, for example, The upper limit of the weight average molecular weight is 50000, for example, and in one embodiment, an upper limit is 20000.

  Commercially available silicone products include, for example, Silaplane FM-33 series, FM-44 series, FM-77 series, FM-04 series, FM-DA series, FM-07 series (manufactured by JNC Corporation), KR- 500, KR-510, KR-513, KR-515, KR-516, KR-517, X-40 series, X-41 series (manufactured by Shin-Etsu Silicone Co., Ltd.).

  As a fluorine atom and a silicon atom containing compound, a fluorine-type silane compound is mentioned, for example, Specifically, the compound represented by following formula (1) is mentioned.

式（１）中、Ｒ¹およびＲ³は、それぞれ独立に炭素数１〜１０のアルキル基または炭素数３〜１０のシクロアルキル基であり；Ｒ²は、含フッ素アルキル基、含フッ素シクロアルキル基、含フッ素アルコキシアルキル基、含フッ素シクロアルキルオキシアルキル基または含フッ素ポリ（アルキレンオキシ）アルキル基であり；ａは１〜３の整数であり、ｂは０〜２の整数であり、ただし、ａ＋ｂ＝１〜３である。Ｒ¹〜Ｒ³がそれぞれ複数存在する場合には、その複数のＲ¹〜Ｒ³は、それぞれ同一であっても異なっていてもよい。

In formula (1), R ¹ and R ³ are each independently an alkyl group having 1 to 10 carbon atoms or a cycloalkyl group having 3 to 10 carbon atoms; R ² is a fluorine-containing alkyl group or fluorine-containing cycloalkyl. A group, a fluorine-containing alkoxyalkyl group, a fluorine-containing cycloalkyloxyalkyl group or a fluorine-containing poly (alkyleneoxy) alkyl group; a is an integer of 1 to 3, and b is an integer of 0 to 2, provided that a + b = 1-3. When a plurality of R ^{1 to} R ³ are present, the plurality of R ^{1 to} R ³ may be the same as or different from each other.

Each fluorine-containing group described above is a group in which one or more hydrogen atoms in an alkyl group, a cycloalkyl group, an alkoxyalkyl group, a cycloalkyloxyalkyl group, and a poly (alkyleneoxy) alkyl group are substituted with fluorine atoms. Means. The fluorine-containing alkyl group preferably has 1 to 20 carbon atoms, the fluorine-containing cycloalkyl group preferably has 3 to 20 carbon atoms, the fluorine-containing alkoxyalkyl group preferably has 2 to 20 carbon atoms, and the fluorine-containing cycloalkyloxyalkyl group. As for carbon number of group, 4-20 are preferable. The fluorine-containing poly (alkyleneoxy) alkyl group is, for example,-(AO) _n -R (wherein n is an integer of 2 or more, preferably an integer of 5 to 50, and A is 1 or more carbon atoms, preferably 1 A group in which one or two or more hydrogen atoms are substituted with fluorine atoms in a group represented by -6 alkylene group, R is an alkyl group having 1 to 18 carbon atoms, preferably a methyl group, an ethyl group, or a propyl group. Is preferred.

  Specific examples of the fluorine-based silane compound include perfluorododecyl-1H, 1H, 2H, 2H-trimethoxysilane, perfluorotetradecyl-1H, 1H, 2H, 2H-trimethoxysilane, (heptadecafluoro- 1,1,2,2-tetrahydrodecyl) -trimethoxysilane, (tridecafluoro-1,1,2,2-tetrahydrooctyl) -trimethoxysilane, (nonafluoro-1,1,2,2-tetrahydrohexyl) ) -Trimethoxysilane, (heptafluoro-1,1,2,2-tetrahydropentyl) -trimethoxysilane, (3,3,3-trifluoropropyl) dimethylmethoxysilane, (3,3,3-trifluoro) Propyl) methyldimethoxysilane, (3,3,3-trifluoropropyl) trimethoxysilane, perfluoropropyltrimethoxy Silane, 5,5,6,6,7,7,8,8,9,9,10,10,10-tridecafluoro-2- (perfluorohexyl) decyltrimethoxysilane, 3- (perfluorocyclohexyl) Examples thereof include oxy) propyltrimethoxysilane and perfluoropolyether-based trimethoxysilane, and compounds in which “methoxy” in the above compounds is changed to “ethoxy”. As a brand name of a fluorine-type silane compound, Daikin Industries Co., Ltd. product OPTOOL HD-1100TH is mentioned, for example.

<< Thermoplastic resin film >>
The film thickness of the thermoplastic resin film is, for example, 50 μm or more, preferably 75 μm or more, and more preferably 75 to 500 μm.

  The thermoplastic resin film is preferably formed on the substrate. For example, a thermoplastic resin film such as a thermoplastic resin film is formed on the substrate. Although it does not specifically limit as a board | substrate, When using as a part of light control member, without removing a board | substrate, a transparent substrate is used. As a transparent substrate, transparent resin substrates, such as a glass substrate, a quartz substrate, a polyester film, a polycarbonate film, a polyacryl film, are mentioned, for example. In the case of removing the substrate, for example, a ceramic substrate, a metal substrate such as aluminum or SUS can be used in addition to the transparent substrate. The thickness of a board | substrate is not specifically limited, For example, it is 200-1500 micrometers.

  Examples of the thermoplastic resin constituting the resin film include cyclic olefin resin, (meth) acrylic resin, polyester resin, polystyrene resin, polycarbonate resin, and polyvinyl chloride resin. Examples of the cyclic olefin resin include polycycloolefins such as norbornene-based polycycloolefin, examples of the (meth) acrylic resin include polymethyl methacrylate, and examples of the polyester resin include polyethylene terephthalate. From the viewpoint of the optical characteristics of the light control member, a thermoplastic transparent resin is particularly preferable.

  As the thermoplastic resin, a cyclic olefin resin is particularly preferable, and the transparency of the thermoplastic resin film and the softening property of the thermoplastic resin film by heating can be improved. Thereby, a precise transfer pattern can be formed on the thermoplastic resin film, and a light control member having excellent transparency can be formed.

  In the thermoplastic resin film, the average value of the total light transmittance at a wavelength of 380 to 780 nm is preferably 70% or more, more preferably 80% or more. The thermoplastic resin film preferably has a refractive index at a wavelength of 589 nm of 1.40 to 1.75, more preferably 1.45 to 1.70, and still more preferably 1.50 to 1.65. A refractive index in the above range is preferable in terms of image quality. These can be measured under the conditions described in the examples.

A thermoplastic resin may be used individually by 1 type, and may use 2 or more types together.
The glass transition temperature (Tg) of the thermoplastic resin is usually 40 to 300 ° C, preferably 60 to 200 ° C. By setting it as such an aspect, it is preferable at the point of production efficiency. Tg can be measured with a differential scanning calorimeter (temperature rising rate of 20 ° C./min) according to JIS-K7121.

  The weight average molecular weight (Mw) in terms of polystyrene measured by a gel permeation chromatography (GPC) method of the thermoplastic resin is usually 10,000 to 2,000,000, preferably 50,000 to 1,500,000. By setting it as such an aspect, it is preferable at the point of the intensity | strength of a linear member.

The conditions of the GPC method are as follows, for example.
・ Apparatus: manufactured by Tosoh Corporation, trade name: HLC-8020
Column: Tosoh Co., Ltd. guard column H _XL- H, TSK gel G7000H _XL , TSK gel GMH _XL , TSK gel G2000H _XL sequentially connected Solvent: Tetrahydrofuran Sample concentration: 0.7% by mass
・ Injection volume: 70 μL
・ Flow rate: 1mL / min

<< Conditions for Step (a) >>
In the step (a), the pressing is performed while heating the resin film or in a state where the resin film is heated. Thus, in the present invention, the thermoplastic resin film is formed by the thermal imprint method. Either heating or pressing may be performed first or may be performed simultaneously.

  It is preferable that the resin film is heated and softened to a temperature equal to or higher than the glass transition temperature (Tg) of the thermoplastic resin constituting the resin film and pressed. The temperature is preferably a temperature higher by 5 to 100 ° C., more preferably a temperature higher by 10 to 50 ° C. than the Tg. Specifically, the heating temperature is usually 60 ° C. or higher, preferably 60 to 350 ° C., more preferably 80 to 250 ° C.

  Examples of the method for heating the resin film include a method of pressing an uneven member heated to the temperature range against the resin film and / or directly heating the resin film. The resin film may be heated in advance before contact with the concavo-convex member.

  The concavo-convex member is preferably pressed against the resin film with a press pressure of 0.1 to 30.0 MPa, more preferably with a press pressure of 2.0 to 10.0 MPa. The pressing time is usually 1 to 180 seconds, preferably 1 to 120 seconds, and more preferably 1 to 60 seconds. Such an embodiment is preferable in terms of production efficiency.

[Step (b)]
In the step (b), the concavo-convex member is separated from the resin film to obtain a line pattern composed of a plurality of linear members arranged in parallel to each other. The linear member only needs to have a configuration in which each linear member has at least one side surface parallel to each other. For example, a rectangular shape or a triangular shape can be mentioned, but a rectangular shape is preferable.

  Before the separation, the resin film is cooled to a temperature lower than the glass transition temperature (Tg) of the thermoplastic resin constituting the resin film. Specifically, the temperature is usually less than 100 ° C, preferably 0 to 60 ° C, more preferably 0 to 40 ° C.

  In the present invention, since the surface (concave / convex surface) in contact with the resin film is an uneven member whose surface is treated with a releasable compound, the deformation of the linear member is small, and there are few traces of defective peeling. The concavo-convex member and the line pattern can be easily separated.

As described above, a line pattern composed of a plurality of linear members can be obtained.
The height of the linear member is, for example, the maximum thickness of the linear member in the Z-axis direction in FIG. 1A, and is usually 50 μm or more, preferably 50 to 500 μm. When the height of the linear member is 50 μm or more, a sufficiently high light reflecting surface can be secured, and therefore it is preferable in terms of optical characteristics.

  When the cross-sectional shape of the linear member is rectangular, the width of the linear member at a position of 10% from the bottom surface with respect to the height of the linear member is the Bottom width, and the bottom surface with respect to the height of the linear member. The width of the linear member at the 90% position is defined as the Top width, and the absolute value of the difference between the Top width and the Bottom width (Top-Bottom) is defined as the Δ width of the linear member. The Δ width of the linear member is 18% or less of the larger value of the Top width and Bottom width, preferably 15% or less, more preferably 10% or less, still more preferably 5% or less, and particularly preferably 3% or less.

  The width of the linear member is, for example, the maximum thickness of the linear member in the Y-axis direction in FIG. 1A and is usually 10 to 500 μm, preferably 15 to 250 μm; the interval between the linear members (at the bottom of the linear member) Space width) is usually 50 to 400 μm, preferably 50 to 300 μm.

  The aspect ratio (height / width) of the linear member is preferably 0.5 or more, more preferably 0.5 to 10, and further preferably 1 to 5. In the present invention, since the thermal imprint method having excellent releasability described above is used, a linear member having a high aspect ratio can be formed, and thus a light control member having excellent optical characteristics can be obtained.

  The height, width, and space width of the linear member are measured by observation with a scanning electron microscope (SEM). Such a line pattern can be formed by performing thermal imprinting using a member having an uneven pattern corresponding to the height, width, and space width described above.

[Method for Manufacturing Light Control Member]
The manufacturing method of the light control member of the present invention includes:
A step (1) of forming a line pattern by the above [line pattern manufacturing method];
Forming a light reflecting surface on a side surface of the linear member constituting the line pattern (2);
If necessary,
And (3) forming a transparent member between the linear members.

[Step (1)]
In step (1), a line pattern is formed by the method described above.
[Step (2)]
In the step (2), a light reflecting surface is selectively formed on the side surface of the linear member by evaporating or sputtering metal, for example, on the side surface of the linear member. The side surface is a surface which each linear member has parallel to each other, for example, a surface perpendicular to the flat plate surface of the light control member. When the cross-sectional shape of the linear member is rectangular, the light reflecting surface may be formed on one side surface or both side surfaces of each linear member. It is preferable to form.

Examples of the metal include at least one selected from aluminum, chromium, nickel, titanium, and silver.
For example, a metal film is formed by vapor-depositing metal on the surface of the linear member, a resist layer is formed on the side surface of the linear member, for example, by photolithography, the metal film is etched, and the resist layer is removed. . Thereby, a light reflection surface can be formed on the side surface of the linear member.

  Alternatively, the top surface of the linear member and the bottom surface of the space portion are covered with a resin that can be peeled off by light irradiation (in this case, the side surface of the linear member is exposed), and the top surface, side surface, and bottom surface of the space portion of the linear member A metal film is formed by vapor-depositing metal on the transparent substrate, and the resin formed on the top surface of the linear member and the bottom surface of the space portion is removed together with the metal film formed on the surface by irradiating ultraviolet rays from the transparent substrate side. To do. Thereby, a light reflection part can be formed in the side surface of a linear member.

[Step (3)]
In step (3), a linear member is obtained by filling a space portion of a line pattern with a photocurable and / or thermosetting transparent resin composition and curing the composition by light irradiation and / or heating. A transparent member is formed in the space (space part).

  Thereby, the difference in refractive index between the linear member and the space portion in the line pattern can be reduced, and the linear member can be prevented from falling, and thus the optical performance and strength of the light control member can be increased. When the surface of the linear member and the transparent member is uneven, the surface may be ground or polished. Thereby, the optical performance of the light control member can be enhanced.

The transparent member has an average value of total light transmittance at a wavelength of 380 to 780 nm, preferably 70% or more, and more preferably 80% or more.
The refractive index difference between the transparent member and the linear member at a wavelength of 589 nm is an absolute value, preferably 0.1 or less, more preferably 0.05 or less, and further preferably 0.02 or less. When the refractive index difference is in the above range, it is preferable in that a good image can be formed in the air.

  After forming the transparent member in the space portion, the substrate may be removed to obtain a light control member composed of a linear member, a light reflecting surface, and a transparent member. Subsequently, the surface of the light control member that has been in contact with the substrate may be ground or polished. Thereby, the optical performance of the light control member can be enhanced.

  As described above, a light control member can be obtained. The light control member has a line pattern composed of a plurality of linear members arranged in parallel to each other, and a light reflecting surface formed on a side surface of the linear member. For this reason, the light control member has a plurality of planar light reflecting portions (light reflecting surfaces) arranged in parallel with each other at regular intervals. One embodiment of the light control member has, for example, a flat plate shape, and has a plurality of the light reflection surfaces substantially perpendicular to the flat plate surface at regular intervals, and the light reflection surfaces are arranged in parallel to each other.

The size of the vertical and horizontal in plan view of the light control member is appropriately determined by the size of the image to be projected, for example, 5000 mm ² or more, preferably 5000~700000mm ^2.
FIG. 2 shows a cross-sectional view of one embodiment of the light control member. The light control member 100 includes a transparent substrate 10, a line pattern 20 formed on the transparent substrate 10 and including a plurality of rectangular linear members 21, and a transparent member 25 formed between the linear members 21. Have Light reflecting surfaces 30 and 30 are formed on both side surfaces 22 and 22 of the linear member 21.

[Method of manufacturing optical imaging member]
The optical imaging member of the present invention includes the light control member manufactured by the above-mentioned [Method for manufacturing light control member], and preferably includes a first light control member and a second light control member. The light control members are arranged so that the flat plate surfaces overlap. At least one of the first and second light control members is a light control member manufactured by the above-described [Method for manufacturing light control member].

  The method of manufacturing an optical imaging member of the present invention includes a step of manufacturing the light control member by the above-described [Method of manufacturing light control member], preferably at least one of the first and second light control members. One side is manufactured by the above [Method for manufacturing light control member], and the first and second light control members are crossed when the line pattern of each of them is viewed from above the light control member. Arranging.

  One of the first and second light control members may be manufactured or prepared by a conventionally known method, but both are preferably manufactured from the above [Method for manufacturing light control member] from the viewpoint of optical characteristics. .

  Here, the first light control member and the second light control member intersect when the line pattern of each light control member is viewed from above the light control member (when viewed in the XY plane in FIG. 3A). In this state, that is, in a state where the light reflecting surfaces formed on the side surfaces of the linear members of each light control member intersect.

  The first light control member and the second light control member are preferably stacked and arranged such that the line patterns that each has are opposed to each other. The first light control member and the second light control member are laminated using, for example, a transparent adhesive.

  The intersection angle between the line pattern of the first light control member and the line pattern of the second light control member is appropriately set depending on the position where the image is formed in the stereoscopic image display device, but these line patterns are orthogonal to each other. Preferably it is.

FIG. 3 shows an embodiment of the optical imaging member. FIG. 3A shows an optical imaging member in which a first light control member 101 and a second light control member 102 are stacked in a state where the line patterns of each are orthogonal to each other when viewed from above the light control member. 3B is a cross-sectional view of the first light control member 101 taken along the YZ plane, and FIG. 3C is a cross-sectional view of the second light control member 102 taken along the XZ plane. It is sectional drawing in a plane.
Although FIG. 3 shows the optical imaging member having the transparent substrate 10, the optical imaging member not having the transparent substrate 10 may be used.

[3D image display device]
The stereoscopic image display device includes the above-described optical imaging member, and includes, for example, a light emitting unit and an optical imaging member. The stereoscopic image display device can combine light radiated from a light emitting unit such as a liquid crystal display in the air, and can clearly display images such as still images and moving images, that is, functions as an aerial display.

  In the three-dimensional image display device, light from the light emitting unit is obliquely incident on a plurality of parallel light reflecting surfaces of the first light control member, and reflected light reflected by the light reflecting unit is second. An image can be displayed in the air by being incident on a plurality of light reflecting surfaces arranged in parallel in the light control member.

  In one embodiment of the stereoscopic image display device, the light reflection surface of the first light control member and the light reflection surface of the second light control member are orthogonal to each other, and the flat surfaces of the respective light control members face each other. Has been placed. Therefore, the light incident obliquely on the optical imaging member is reflected on the light reflecting surface of the first light control member for the first time, and the reflected light is reflected on the light reflecting surface of the second light control member for the second time. Reflect. The second reflected light is emitted at the same angle as the incident angle of the incident light on the optical imaging member. For this reason, among the light incident on the optical imaging member from the light emitting portion, the reflected light continuously reflected by the light reflecting surface converges at a symmetrical position with respect to the light emitting portion with respect to the optical imaging member, An image is formed in the air.

The present invention will be specifically described based on examples, but the present invention is not limited to the examples.
[Example 1]
As the concavo-convex member, a 4-inch silicon mold in which a rectangular pattern of line / space width = 100/100 μm and height = 100 μm was formed was used. Here, the rectangular pattern was subjected to a mold release treatment by heating at 150 ° C. for 30 minutes using a perfluoropolyether silane compound (Optool HD-1100TH manufactured by Daikin Industries, Ltd.), and a rinse solution (Daikin Industries, Ltd.). The rinse treatment was performed using Optool HD-TH (manufactured by Co., Ltd.). Specifically, the mold release treatment was performed by immersing a silicon mold in a perfluoropolyether silane compound, drawing it up, and heating it at 150 ° C. for 30 minutes. The surface fluorine concentration of the silicon mold after the treatment as measured with an X-ray photoelectron spectrometer (Quantum 2000, ULVAC PHI, Quantum 2000, 45 ° incidence, 25 W, 15 kV) was 55 atomic%. Moreover, the dynamic friction coefficient of the flat part without a pattern by JIS K7125 (load 200g, tensile speed 100mm / min) was 0.10.

  A glass substrate on which a 100 μm-thick cyclic olefin resin film (“ARTON G7810” manufactured by JSR Corporation, Tg = 170 ° C.) is formed is fixed to an imprint apparatus (FLAN200 manufactured by SCIVAX), and the silicon The mold was placed in an imprinting apparatus, and the film was pressed against the silicon mold previously heated to 200 ° C. at a pressure of 4 MPa for 30 seconds to perform imprinting. Thereafter, the resin film was cooled to 30 ° C., and the resin film and the silicon mold were separated.

  In addition, the average value of the total light transmittance in wavelength 380-780 nm of the said resin film was 80%, and the refractive index in wavelength 589nm was 1.51. The total light transmittance and refractive index were measured as follows. The total light transmittance (%) of the resin film was measured according to JIS K7105 using a color haze meter (SC-3H manufactured by Suga Test Instruments Co., Ltd.). For the refractive index of the resin film, the refractive index (nD25) at a wavelength of 589 nm at 25 ° C. was measured using an Abbe refractometer (DR-M2 manufactured by Atago Co., Ltd.).

As described above, a line pattern composed of a plurality of linear members was produced.
The width of the linear member at the position of 10% from the glass substrate surface with respect to the height of the linear member is the Bottom width, and the width of the linear member at the position of 90% from the glass substrate surface with respect to the height of the linear member. Was defined as Top width, and the Bottom width and Top width of the obtained linear member were measured with a scanning electron microscope (manufactured by Hitachi High-Technologies Corporation, model “S-4200”). As a result, it was confirmed that a line pattern composed of a linear member having a Bottom width = 99 μm, a Top width = 99 μm, and a height = 100 μm was obtained without peeling defects and pattern deformation.

[Example 2]
The same procedure as in Example 1 was performed except that the cyclic olefin resin film was changed to a polycarbonate resin film ("Iupilon FE2000" manufactured by Mitsubishi Gas Chemical Co., Inc., Tg = 150 ° C). In addition, the average value of the total light transmittance in wavelength 380-780 nm of the said resin film was 75%, and the refractive index in wavelength 589nm was 1.58. When the cross section of the obtained linear member was observed with the scanning electron microscope, a line pattern composed of a linear member with Bottom width = 99 μm, Top width = 99 μm, and height = 100 μm was obtained without peeling defects and pattern deformation. I confirmed.

[Example 3]
As the concavo-convex member, a 4-inch quartz mold on which a rectangular pattern of line / space width = 100/100 μm and height = 100 μm was formed was used. Here, the rectangular pattern was subjected to a mold release treatment using a solution obtained by diluting FM-0425 (manufactured by JNC Co., Ltd.) to 50 wt% using ethyl acetate, and 150 ° C. for the purpose of fixing the mold release compound. Then, heat treatment was performed for 30 minutes, and rinse treatment was performed using ethyl acetate. As a result of evaluation in the same manner as in Example 1, the surface silicon concentration of the quartz mold after the treatment was 25 atomic%, and the dynamic friction coefficient of the flat portion without the pattern was 0.10.

  Imprinting was carried out in the same manner as in Example 1, and it was confirmed that a line pattern composed of a linear member having a Bottom width = 99 μm, a Top width = 99 μm, and a height = 100 μm was obtained without peeling defect traces and pattern deformation.

[Example 4]
A solution obtained by diluting FLUOROLINK D10-H (hydroxyl group-containing perfluoropolyether, manufactured by Solvay) to 50 wt% using Novec 7300 (manufactured by 3M) was used for the mold release treatment of the silicon mold, and Novec 7300 was rinsed. Evaluation was performed in the same manner as in Example 1 except that the above was used. The surface fluorine concentration of the silicon mold after the mold release treatment was 35 atomic%, and the dynamic friction coefficient was 0.30. Imprinting was performed in the same manner as in Example 1, and a line pattern made of a linear member having a Bottom width = 97 μm, a Top width = 95 μm, and a height = 100 μm was obtained in a state where there were some peeling defect traces and pattern deformation. It was confirmed.

[Example 5]
As a concavo-convex member, a KR-500 (Shin-Etsu Chemical Co., Ltd. silicone alkoxy oligomer) was used, using a 4-inch nickel mold on which a rectangular pattern of line / space width = 100/100 μm and height = 100 μm was formed. Evaluation was performed in the same manner as in Example 1 except that a solution diluted to 50 wt% with ethyl acetate was used for the mold release treatment and ethyl acetate was used for the rinse treatment. The surface silicon concentration of the nickel mold after the release treatment was 15 atomic%, and the dynamic friction coefficient was 0.26. Imprinting was performed in the same manner as in Example 1, and a line pattern composed of a linear member having a Bottom width = 98 μm, a Top width = 95 μm, and a height = 100 μm was obtained in a state where there were some peeling defect traces and pattern deformation. It was confirmed.

[Comparative Example 1]
The same operation as in Example 3 was performed except that a 4-inch quartz mold that was not subjected to the above-described mold release treatment and the above-described rinse treatment was used as the uneven member. The surface fluorine concentration of the 4-inch quartz mold was 0 atomic%, the surface silicon concentration was 0 atomic%, and the dynamic friction coefficient was 0.50. The resin film could not be separated from the concavo-convex member without large peeling defect traces and pattern deformation.

DESCRIPTION OF SYMBOLS 1 ... Member 10 ... Transparent substrate 20 ... Line pattern 21 ... Linear member 22 ... Side surface 25 of a linear member ... Transparent member 30 ... Light reflection surface 100 ... Light control member 101 ... Light control member 102 ... Light control member 200 ... Optical Imaging member

Claims (11)

A method for producing the line pattern in a light control member having a line pattern composed of a plurality of linear members arranged in parallel to each other and a light reflecting surface formed on a side surface of the linear member,
The thermoplastic resin film has a concavo-convex pattern corresponding to the shape of the line pattern, and the concavo-convex pattern surface of the concavo-convex pattern contacting the resin film with a compound containing at least one selected from fluorine atoms and silicon atoms is surface-treated. a step of pressing a member (a), where, in a state where front Symbol resin film is heated performs the pressing, the surface-treated uneven pattern surface, load 200 g, JIS under conditions of a tensile speed 100 mm / min K7125 A coefficient of dynamic friction is 0.30 or less ; and a step of separating the concavo-convex member from the resin film to obtain a line pattern composed of a plurality of linear members having a height of 50 to 500 μm arranged in parallel to each other (B)
A method for producing a line pattern, comprising:   The production of the line pattern according to claim 1, wherein the thermoplastic resin constituting the resin film is at least one selected from a cyclic olefin resin, a (meth) acrylic resin, a polyester resin, a polystyrene resin, a polycarbonate resin, and a polyvinyl chloride resin. Method.   The method for producing a line pattern according to claim 1, wherein the compound is at least one selected from a fluorine atom-containing compound, a silicon atom-containing compound, and a fluorine atom and a silicon atom-containing compound. The contact surface with the thermoplastic resin film after the surface treatment of the concavo-convex member has a surface fluorine concentration of 35 atomic% or more and / or a surface silicon concentration of 15 atomic% or more . The manufacturing method of the line pattern of 1 term | claim.   The manufacturing method of the line pattern of any one of Claims 1-4 which presses the uneven | corrugated member which has the said uneven | corrugated pattern to the said resin film in the range of 0.1-30.0 MPa.   In the step (a), the resin film is heated to a temperature equal to or higher than the glass transition temperature of the thermoplastic resin constituting the resin film, and the resin film is constituted before the separation in the step (b). The method for producing a line pattern according to any one of claims 1 to 5, wherein the thermoplastic resin is cooled to a temperature lower than a glass transition temperature of the thermoplastic resin. Method for producing a line pattern of any one of claims 1 to 6 cross-sectional shape of the linear member has a rectangular shape. A step (1) of forming a line pattern by the method according to any one of claims 1 to 7 ,
And (2) forming a light reflecting surface on a side surface of the linear member. Forming a transparent member between the linear members (3)
The method for producing a light control member according to claim 8 , further comprising: A method of manufacturing an optical imaging member comprising a light control member having a line pattern composed of a plurality of linear members arranged in parallel to each other and a light reflecting surface formed on a side surface of the linear member,
A method for manufacturing an optical imaging member, wherein the light control member is manufactured by the method according to claim 8 or 9 . A method for manufacturing an optical imaging member comprising a first light control member and a second light control member, wherein the first light control member and the second light control member are each provided in parallel with each other. A line pattern composed of a linear member, and a light reflecting surface formed on a side surface of the linear member,
Producing at least one of the first light control member and the second light control member by the method of claim 8 or 9 ,
A method of manufacturing an optical imaging member, wherein the first light control member and the second light control member are arranged in a state where the line patterns of the first light control member and the second light control member intersect each other when viewed from above the light control member.

Images