JP6043906B2 - X-ray condensing system with variable condensing diameter and method of using the same - Google Patents

Description

The present invention relates to an X-ray condensing system having a variable condensing diameter and a method of using the same, and more particularly, an X-ray condensing system capable of changing a condensing diameter over a wide range using the same condensing optical system and a method of using the same. It is about.

  Since the discovery of X-rays by X-rays, X-ray analysis technology has become indispensable for the advancement of cutting-edge research in all fields such as medicine, biology, and materials science. In particular, the trend of increasing the resolution of X-ray analysis has been remarkable recently, and an X-ray microscope having a resolution of 100 nm has already been routinely used. The development of a condensing optical system for use in an X-ray microscope is also progressing, and there is an attempt to achieve a diffraction limit by correcting a shape error of a reflecting surface using a variable shape X-ray mirror.

  For example, Patent Document 1 discloses a Kirkpatrick-Baez (KB) mirror system in which a vertical elliptical condensing mirror and a horizontal elliptical condensing mirror having an ultra-precision reflecting surface are arranged at right angles to each other in the optical axis direction. Then, in the X-ray condensing method of reflecting the hard X-rays by each elliptical condensing mirror and condensing, the reflecting surface of the ellipse condensing mirror corresponding to the ellipsoidal condensing mirror which is a front stage of the elliptical condensing mirror and performs wavefront correction An X-ray condensing optical system in which a deformable plane mirror having a deformable function is disposed and the X-rays reflected by the deformable plane mirror are focused on a focal point by an elliptical condensing mirror is provided near the focus. The X-ray intensity distribution in a plane perpendicular to the optical axis of the X-ray, and the X-ray intensity distribution in the plane perpendicular to the optical axis of the incident X-ray or the known X-ray intensity distribution of the incident X-ray From the X-ray intensity distribution in the vicinity and the incident X-ray intensity distribution The complex amplitude distribution on the reflecting surface is calculated using the recovery method, the wavefront aberration of the X-ray focusing optical system is calculated from the complex amplitude distribution, and the shape variable type plane is set so as to minimize the calculated wavefront aberration. An X-ray condensing method using a phase recovery method characterized by controlling the shape of a reflecting surface of a mirror is disclosed.

  Patent Document 2 discloses a reflection surface shape control mirror device for reflecting an X-ray beam from a soft X-ray to a hard X-ray region to change it to an ideal wavefront, and a belt-like X at the center of the surface of the substrate. A line reflection surface is formed, a reference plane is formed along both sides of the X-ray reflection surface, and a plurality of piezoelectric elements are arranged at least on the front and back sides on both sides of the substrate in the longitudinal direction of the X-ray reflection surface. A reflecting surface shape control mirror device comprising a bonded reflecting surface shape control mirror and a multi-channel control system for applying a voltage to each piezoelectric element is disclosed. Here, the reflection surface shape control mirror is arranged on both sides of the substrate so that the piezoelectric elements are arranged symmetrically with respect to the X-ray reflection surface, and the piezoelectric elements are arranged in the same arrangement pattern on both the front and back surfaces of the substrate. The point which arranged the element in a line is also indicated.

  There are two types of X-ray microscopes, one is a scanning X-ray microscope, and the other is an X-ray diffraction microscope. A scanning X-ray microscope irradiates a sample with X-rays with a small condensing diameter, scans it over a predetermined area, and detects fluorescent X-rays, scattered X-rays, and transmitted X-rays generated from the sample. Since it analyzes, resolution | decomposability depends on the condensing diameter of X-rays. Therefore, in a scanning X-ray microscope, the smaller the condensed diameter of X-rays, the better. On the other hand, the X-ray diffraction microscope simultaneously irradiates the entire sample or a wide area with X-rays having a large condensing diameter, acquires a diffraction image of forward scattered X-rays transmitted through the sample, and information on each part of the sample based on it. To get. For this reason, in the X-ray diffraction microscope, the condensed X-ray diameter is relatively large, but brightness is also required, so it cannot be made too large. For example, the scanning X-ray microscope has a sub-50 nm diameter, and the X-ray diffraction microscope has an X-ray focusing diameter on the order of μm.

Japanese Patent No. 4814782 JP 2011-137710 A

  However, the X-ray optical system does not have the flexibility (variable magnification and various microscopic methods) of the electromagnetic lens of an electron microscope, and only one experiment can be performed at a fixed magnification. The X-ray condensing optical system using a deformable mirror that has been developed so far is simply a deformable mirror deformed into an elliptical shape and arranged so that two of them are orthogonal (KB layout). . In this case, in order to change the condensing diameter, the focal length must be changed, and the sample position has to be adjusted again when performing sample analysis with such a condensing beam. Therefore, development of a new X-ray microscope system that can freely change optical parameters is required.

In view of the above-mentioned situation, the present invention intends to solve the problem that the diameter of the condensed X-ray is 50 nm or less suitable for use in a scanning X-ray microscope under the diffraction limit using the same condensing optical system. The object of the present invention is to provide an X-ray condensing system with a variable condensing diameter that can be changed over a wide range up to a μm order suitable for use in an X-ray diffraction microscope, and a method of using the same.

  In order to solve the above-mentioned problems, the present invention reflects the X-rays emitted from the light source by the one-dimensional first and second mirrors having a variable reflecting surface shape and condensing them at a fixed focal point. A linear optical system in which one focal point of the first ellipse is a light source, the other focal point is a common focal point, one focal point of the second ellipse is a fixed focal point of the entire optical system, and the other focal point is the common focal point The reflection surface of the first mirror is formed by a part of the first ellipse, the reflection surface of the second mirror is formed by a part of the second ellipse, The X-ray is reflected by the reflecting surface of the first mirror and passes through the common focal point, and then reflected by the reflecting surface of the second mirror and condensed on a fixed focus, and the position of the light source and the fixed focus The position of the common focus is changed and the first mirror is correspondingly changed. By changing the over the shape of the reflecting surface of the second mirror, to constitute a condensing diameter variable X-ray focusing system characterized by changing the focused diameter in the fixed focus (claim 1).

Here, two pairs of the first mirror and the second mirror are used, and one pair is oriented in the horizontal direction to form a horizontal first mirror and a horizontal second mirror, and one pair is oriented in the vertical direction to obtain a vertical second One mirror and a vertical second mirror, the horizontal first mirror and the vertical first mirror are arranged at the front and back to form the first stage KB arrangement, and the horizontal second mirror and the vertical second mirror are arranged at the front and rear. It is preferable that the second-stage KB arrangement be used.

Further, the present invention provides the above-described X-ray condensing system with a variable condensing diameter, the distance from the light source to the center point of the reflecting surface of the first mirror, and the center of the reflecting surface of the second mirror from the fixed focal point. The distance to the point, the incident angle with respect to the center point of the reflecting surface of the first mirror, and the incident angle with respect to the center point of the reflecting surface of the second mirror are set in advance as initial conditions, and the condensing diameter is minimized at a fixed focus. Thus, the combination of the distance from the common focus to the center point of the reflection surface of the first mirror and the distance from the common focus to the center point of the reflection surface of the second mirror is found, and the reflection surface of the first mirror is further detected. By determining the coordinates of the center point, the coordinates of the fixed focus, the coordinates of the center point of the reflecting surface of the second mirror, and the coordinates of the common focus are determined so that the condensing diameter is minimum at the fixed focus. Fix coordinates other than the common focus. The methods for using the condensing diameter varying X-ray focusing system characterized (claim 3).

In the method of using the X-ray condensing system having a variable condensing diameter, the optical system having the maximum numerical aperture (NA) determined so as to minimize the condensing diameter at the fixed focal point is used as a reference. Maintaining the central point of the reflecting surface of the first mirror, the common focal point, the central point of the reflecting surface of the second mirror and the center locus of the X-rays connecting the fixed focal point, and the common focal point of the first mirror and the second mirror More preferably, the condensing diameter under the diffraction limit is changed in a manner inversely proportional to the change in the numerical aperture by moving along the central locus.

Thereby , the condensing diameter at the fixed focus can be changed in the range of 30 nm to 10 μm.

  The X-ray condensing system having a variable condensing diameter according to the present invention configured as described above uses a pair of elliptical shape variable mirrors for condensing in the horizontal direction or the vertical direction. By changing, the condensing diameter can be easily changed using the same condensing optical system without changing the position of the fixed focal point where the light source and the sample are arranged, and there is no flux loss. Condensation is always at the diffraction limit, and the dark field required by the diffraction microscope can be maximized. With X-rays in the long wavelength (low energy) region, both the virtual light source size and the condensing size increase in proportion to the wavelength, but it is possible to always maintain the condensing condition at the diffraction limit.

  Further, by using four variable shape mirrors that can be deformed freely and with high accuracy, a condensing optical system with a variable condensing diameter can be constructed. A specific application of this is the development of a new microscope that integrates a scanning X-ray microscope and a diffraction microscope that have been separately developed. In such a microscope, local analysis is performed by spectroscopy (scanning X-ray microscope mode), but the entire sample can be visualized by reconstructing scattered X-rays from the entire sample by a computer. In this sense, a general-purpose X-ray microscope can be realized.

It is explanatory drawing which shows the relationship between a pair of shape variable X-ray mirror in this invention, a light source, a common focus, and a fixed focus. It is explanatory drawing which shows the basic principle of this invention. It is a whole perspective view of the variable shape X-ray mirror used in this embodiment. It is a fragmentary perspective view which similarly shows the structure of a shape variable X-ray mirror. It is a graph which similarly shows the result of having tested the deformation reproducibility of the variable shape X-ray mirror. It is a layout for explanation of an X-ray condensing system with variable condensing diameter of the present invention. It is a graph which shows the simulation result in the one-dimensional condensing using a pair of shape variable X-ray mirror, and shows the shape of the 1st mirror MU of an upstream. It is a graph which similarly shows the shape of the 2nd mirror MD of the downstream. It is a graph which similarly shows the condensing intensity profile in the common focus B by a 1st mirror. It is a graph which similarly shows the condensing intensity profile in the fixed focus C by a 2nd mirror. It is explanatory drawing which shows the simulation result in the one-dimensional condensing similarly using a pair of shape variable X-ray mirror, and shows the diffraction pattern in the sample surface in a fixed focus.

  Next, the present invention will be described in more detail based on the embodiments shown in the accompanying drawings. 1 and 2 are explanatory views showing the basic principle of the present invention, and explain one-dimensional light collection in either the horizontal direction or the vertical direction.

  In the present optical system, as shown in FIG. 1, X-rays emitted from the focal point (light source A) of the first ellipse E1 are reflected by the first mirror MU, gather at the common focal point B, and reflected by the second mirror MD. After that, it gathers at the fixed focal point C of the second ellipse E2. The first mirror MU and the second mirror MD are variable shape mirrors, fixed at the position A of the light source and the fixed focus C (sample position), and deformed so that the common focus B of the two ellipses E1 and E2 coincides. Thus, all the light can be collected at the fixed focal point C. By changing the numerical aperture (NA) of the optical system without changing the focal length, the condensing diameter (beam size) can be changed in the range of 30 nm to 10 μm under the diffraction limit. In addition, when an ellipse and a parabola are combined, a larger condensing diameter can be obtained.

  As described above, the two mirrors MU and MD are deformed so as to have some shapes of the two ellipses E1 and E2, respectively. When the deformable mirrors MU and MD are fixed to the two focal points (A and C) as described above, and are deformed into different elliptical shapes while matching the common focal point B, the size of the light beam irradiated to the second mirror MD. Changes. Since the numerical aperture can be changed by this, the condensing diameter under the diffraction limit can be changed in inverse proportion to the numerical aperture. In the figure, reference symbol E1A indicates the major axis of the first ellipse E1, and E2A indicates the major axis of the second ellipse E2. Further, the center point of the reflection surface R1 of the first mirror MU is represented by P1, and the center point of the reflection surface R2 of the second mirror MD is represented by P2. CL is a center locus of the X-ray and represents the center position of the X-ray beam.

  FIG. 2 shows an arrangement for explaining the basic principle of the X-ray condensing optical system of the present invention. The pair of variable shape mirrors, that is, the first mirror MU and the second mirror MD are arranged so that the reflection surfaces R1 and R2 face each other. The light source A corresponds to a slit that allows third-generation and 3.5-generation radiation, for example, coherent X-rays cut out from SPring-8 to pass through. A sample surface is placed at the position of the fixed focal point C, and scattered X-rays and diffracted X-rays transmitted through the sample surface are detected by an X-ray CCD arranged downstream. In addition, fluorescent X-rays generated on the sample surface are detected by an X-ray detector XD.

  3 and 4 show the variable shape mirror 1 used in this embodiment. The variable shape mirror 1 is composed of piezoelectric elements 3 and 3 attached to the front and back of a synthetic quartz substrate 2 and electrodes 4 formed on the piezoelectric elements 3 and 3. More specifically, an X-ray reflecting surface 5 is formed with high precision flatness at the center along the longitudinal direction on the surface of the rectangular plate-like substrate 2 having a predetermined thickness of 100 mm × 50 mm. The strip-shaped piezoelectric elements 3 and 3 are attached along the surface of the piezoelectric element 3, and a large number of surface electrodes 4 are laminated on each piezoelectric element 3 at regular intervals. A back electrode 6 is laminated under the piezoelectric element 3 over the entire surface. A voltage can be applied independently from the power source 7 between the back electrode 6 and the front electrodes 4. The piezoelectric element 3 is deformed by applying a predetermined voltage to each of the surface electrodes 4,..., Thereby deforming the shape of the reflecting surface 5 and creating a free-form surface. Note that the initial reflecting surface 5 may be flat because the shape may be flat. Of course, if the shape of the reflecting surface 5 is processed into a spherical shape or an arbitrary arc shape in advance, the amount of deformation by the piezoelectric element 3 can be reduced.

  Next, a specific process for actually determining the shapes of the reflecting surfaces R1, R2 of the first mirror MU and the second mirror MD will be described with reference to FIGS. First, the coordinates of the light source A are predetermined. In addition, the distance from the light source A to the center point P1 of the reflection surface R1 of the first mirror MU, the distance from the fixed focal point C to the center point P2 of the reflection surface R2 of the second mirror MD, the reflection surface of the first mirror MU The X-ray incident angle with respect to the center point P1 of R1 and the X-ray incident angle with respect to the center point P2 of the reflecting surface R2 of the second mirror MD are determined in advance. These values are the initial conditions.

  When an appropriate value is input to the distance L1 from the common focal point B to the center point P1 of the reflecting surface of the first mirror MU and the distance L2 from the common focal point B to the center point P2 of the reflecting surface of the second mirror MD. The first ellipse E1 and the second ellipse E2 are uniquely determined, and the shapes of the reflection surface R1 of the first mirror MU and the reflection surface R2 of the second mirror MD are determined. In this optical system, the combination of the distances L1 and L2 is found by repeated calculation so that the condensing diameter is the smallest at the fixed focal point C and the NA is the largest. As a result, if the coordinates of the center point P1 of the reflecting surface R1 of the first mirror MU are determined, the coordinates of the fixed focal point C, the center point P2 of the reflecting surface R2 of the second mirror MD, and the coordinates of the common focal point B are determined. From now on, these coordinates are fixed. The coordinate of the common focal point B at this time is B1. Thus, the center locus CL of the X-ray connecting the light source A to the center point P1 of the reflection surface R1 of the first mirror MU, the common focal point B (B1), the center point P2 of the reflection surface R2 of the second mirror MD and the fixed focus C. Thereafter, the central locus CL is not changed. That is, the X-ray incident angle with respect to the center point P1 of the reflecting surface R1 of the first mirror MU and the X-ray incident angle with respect to the center point P2 of the reflecting surface R2 of the second mirror MD are the initial values even if the shape of the reflecting surface is changed. The determined value is maintained. It is advantageous in experiments to fix the incident angle of X-rays.

  Next, the common focal point B is changed from B1 to B3 in the direction approaching the second mirror MD along the central locus CL between the first mirror MU and the second mirror MD. That is, the distance L1 is increased, and the distance L2 is decreased by the increase. If the coordinates of the new common focal point B are determined, the coordinates of the two focal points and one point on the ellipse, that is, the coordinates of (A, B, P1) and the coordinates of (C, B, P2) are determined. The shape of E2 can be uniquely determined. Then, the reflection surface R1 of the first mirror MU having a variable shape and the reflection surface R2 of the second mirror MD according to the shapes of the ellipses E1 and E2 are predetermined on the surface electrodes 4 of the piezoelectric element 3, respectively. This voltage is applied to deform into a desired shape.

  Here, an X-ray intensity profile is measured at the fixed focal point C, and when the intensity profile is disturbed, a reflection surface shape correction method using a phase recovery method described in Japanese Patent No. 4814782 is used. Then, the shape can be corrected by finely adjusting the voltage applied to each piezoelectric element of the first mirror MU and the second mirror MD. Alternatively, the shape of the reflecting surface of the mirror can be corrected by the pencil beam method proposed by O. Hignette et al. (SPIE Proc. 3152, 188-199 (1997)). In this pencil beam method, an X-ray beam is narrowed by a slit immediately before entering the mirror, the slit is displaced in a direction perpendicular to the beam, and the reflection surface of the mirror is scanned with a thin X-ray beam. If there is, the X-ray reflection angle is greatly shifted, so the slope error is measured by an X-ray detector. A curvature error is calculated from the slope error, and a voltage applied to the piezoelectric element of the deformable mirror is calculated based on the curvature error. This method can be measured even with a large shape error.

  As described above, when two ellipses are combined, there is a limit to extremely increasing the condensing diameter. On the other hand, by combining an ellipse and a parabola and making one focal point of the ellipse coincide with the focal point of the parabola, the condensing diameter can be further increased. In other words, by using a parabola, it can be considered that the fixed focus of the second ellipse is at infinity, and by using this, the NA can be reduced to zero. By combining an ellipse and a parabola, a variable-size parallel beam can be created instead of a focused beam.

  FIG. 5 shows the results of testing the deformation reproducibility of the deformable mirror 1 used in the present embodiment. First, at Osaka University, with the deformable mirror 1 set in a dedicated holder, a predetermined voltage is applied to each surface electrode 4 of the piezoelectric element 3, and the shape of the reflecting surface 5 is changed to a Fizeau interferometer (GPI). ) And the deviation from the predetermined curved surface was acquired as a shape error. Next, with the deformable mirror 1 set in a dedicated holder, it is transported to the Harima Gakken city where SPring-8 is located, and then the same voltage is applied to each surface electrode 4,. The shape was measured with a Fizeau interferometer (GPI), and a deviation from a predetermined curved surface was obtained as a shape error. From FIG. 5, it can be seen that the shape errors of both agree very well in the range of several nm. That is, it was confirmed that the deformation reproducibility of the reflecting surface 5 of the deformable mirror 1 was very excellent. Accordingly, the shape of the reflecting surface 5 of the deformable mirror 1 can be corrected almost accurately without measuring it in a state of being incorporated in the X-ray condensing optical system.

  FIG. 6 shows the overall arrangement of the X-ray condensing system having a variable condensing diameter according to the present invention, and two pairs of the first mirror MU and the second mirror MD are used, and one pair is oriented in the horizontal direction. One mirror M1 and a horizontal second mirror M3 are used, and a pair is vertically oriented to form a vertical first mirror M2 and a vertical second mirror M4. The horizontal first mirror M1 and the vertical first mirror M2 are moved forward and backward. The first-stage KB arrangement 8 is arranged, and the horizontal second mirror M3 and the vertical second mirror M4 are arranged in front and rear to form a second-stage KB arrangement 9.

  In other words, the present invention is an optical system using two pairs of deformable mirrors arranged in KB, and using a total of four deformable mirrors. In other words, a pair of deformable mirror M1 and deformable mirror M2 are arranged so as to be orthogonal to each other to form a first stage KB arrangement 8, and another pair of deformable mirror M3 and deformable mirror M4 are orthogonal to each other. Thus, the second-stage KB arrangement 9 is configured. Here, M1 and M3, and M2 and M4 constitute the pair of the first mirror MU and the second mirror MD, respectively. When the mirror of the example shown in FIGS. 1 and 2 is used, the horizontal first mirror (M1) in the first-stage KB arrangement 8 and the horizontal second mirror (M3) in the second-stage KB arrangement 9 are reflection surfaces. Are vertically reversed, and the reflecting surfaces of the vertical first mirror (M2) in the first-stage KB arrangement 8 and the vertical second mirror (M4) in the second-stage KB arrangement 9 are reversed left and right. In the first-stage KB arrangement 8, the conventional mirror manipulator can be used as it is. In the second-stage KB arrangement 9, the horizontal second mirror (M3) is inverted upside down. Although some contrivance is required, a conventional mirror manipulator can be used. In this way, by arranging the two deformable mirrors so as to be orthogonal to each other and using two pairs, X-rays can be condensed in two dimensions in the horizontal direction and the vertical direction. In addition, by arranging the second ellipse E2 well, it is possible to face the reflecting surface of the horizontal second mirror (M3) upward. In this case, the conventional mirror manipulator can be used as it is.

  Further, a fluorescent screen 10 and a mirror 11 are arranged in the vicinity of the common focus, a microscope 12 is arranged at a position facing them, and a beam trajectory monitor 13 is configured. A condensing diameter evaluation system 16 is configured by disposing the X-ray detector 15 in FIG.

  Specific design parameters for the second hatch of BL29XUL at SPring-8 are as follows. The energy of X-rays can be adapted to 14 keV or less. The mirror lengths of the mirrors M1 to M4 were 100 mm, and the incident angles of X-rays were all 4.0 mrad. The distance from the light source A to the center of the mirror M1 is 45 m, the distance from the center of the mirror M1 to the common focus B is 0.8 m, the distance from the center of the mirror M2 to the common focus B is 0.7 m, and the distance of the mirror M3 The distance from the center to the common focus B is 0.7 m, the distance from the center of the mirror M4 to the common focus B is 0.8 m, the distance from the center of the mirror M3 to the fixed focus C is 255 mm, and the center of the mirror M4 to the fixed focus. The distance to C is 150 mm.

  Next, results of simulating the operation of the present optical system by calculation based on the Fresnel Kirchhoff diffraction integral are shown in FIGS. The simulation is a one-dimensional condensing of only the pair of first mirror MU and second mirror MD. When the common focus B was shifted downstream by 0 mm (B1), 200 mm (B2), and 400 mm (B3), the elliptical shape was changed under the condition for matching the common focus. FIG. 7 shows the shape of the reflecting surface of the first mirror MU, and FIG. 8 shows the shape of the reflecting surface of the second mirror MD. FIG. 9 shows a light collection intensity profile at the common focus B, and FIG. 10 shows a light collection intensity profile at the fixed focus C. 9 and 10 also show the full width at half maximum (FWHM) value of the condensed light intensity profile. As a result, at the fixed focal point C, the condensing diameter could be changed from 36 nm to 322 nm. FIG. 11 shows a diffraction pattern on the sample surface placed at the fixed focal point C. The NA is maximum at the common focal point B1, the NA is small at the common focal point B2, and the NA is very small at the common focal point B3.

The variable field-of-view optical system built here cuts out coherent X-rays from the 3rd generation and 3.5th generation synchrotron radiation, and an optical system that can irradiate the sample with an arbitrary condensing diameter while preserving the total flux. realizable. Then, when combining two ellipses, the variable region of the visual field is 30nm~10μm levels, the illumination intensity is ¹⁰⁵ times the maximum at SPring-8 light. A larger beam size can be obtained by combining an ellipse and a parabola. The optical system is composed of two variable shape mirrors for each axis, and adopting a total reflection optical system can collect X-rays without chromatic aberration. Further, the light received by the first mirror MU having a constant opening can be irradiated onto the sample surface without flux loss. At this time, if the distance L1 from the first mirror MU to the common focal point B and the distance L2 from the second mirror MD to the common focal point B are used, the NA and the reduction magnification of the second mirror MD are proportional to L1 / L2. Condensation is always limited at the diffraction limit, and the dark field that is important in a diffraction microscope can be maximized. And even if a wavelength changes, it becomes a condensing diameter according to a wavelength, and said relationship is unchanged. As a result, it is always 10 ⁹ photons / s or more for coherence illumination with X-rays of 10 keV energy, and incoherent illumination for fluorescence analysis or XAFS is a maximum of 10 ¹² photons / s or more without moving the position on the sample. Is possible.

  If an X-ray microscope is constructed using the optical system of the present invention, a resolution approaching 1 nm can be achieved while changing the magnification. Furthermore, simultaneous measurement such as elemental distribution XAFS analysis can be performed with a resolution of 30 nm. Become. Since these are realized in the same microscope system, a great contribution can be made to the field of using synchrotron radiation.

  Further, the present invention can be expanded to the life science field. For example, it contributes to elucidation of the action and side effect mechanism of platinum preparations (anticancer agents) which can be said to be the only effective anticancer agent. With regard to platinum preparations, elucidation of this mechanism and development of new drugs are considered indispensable for improving QOL of cancer patients due to serious side effects. Another problem is that the cancer cells themselves acquire resistance. It has already been determined from X-ray microscopic analysis that the protein GSH is effective for resistance.

  In general, in order to elucidate the metabolism, toxicity and side effects of foreign substances in living bodies, it is important to identify the dynamics of foreign substances at the cellular level with high resolution, and identification at the organelle level is the key. Then, tissue separation and target protein identification are the first steps in elucidating the effects and side effects. In cells to which three types of Pt preparations have been administered, platinum preparations are generally attached to DNA and its transcription mechanism is considered to be the mechanism of action, but the details are not yet clear. In addition to this, there is also knowledge that it accumulates in the Golgi and the endoplasmic reticulum, but the truth is unknown. Based on these findings, the correspondence with intracellular tissues becomes clear by observing the intracellular dynamics of Pt with an X-ray microscope using the present invention at high resolution. And the purification and specific research of Pt binding protein advances.

A Light source (focal point of first ellipse E1)
B, B1, B2, B3 Common focus C Fixed focus (sample surface)
CL Center locus MU 1st mirror (upstream side)
MD Second mirror (downstream)
E1 First ellipse E2 Second ellipse L1 Distance L2 between first mirror MU and common focal point B Distances M1, M2, M3, and M4 between second mirror MD and common focal point B Shape variable mirror P1 Center of reflection surface of first mirror MU Point P2 Center point R1 of the reflecting surface of the second mirror MD Reflecting surface R2 of the first mirror MU Reflecting surface XD of the second mirror MD X-ray detector 1 Shape variable mirror 2 Synthetic quartz substrate 3 Piezoelectric element 4 Surface electrode 5 Reflecting surface 6 Back electrode 7 Power supply 8 First stage KB arrangement 9 Second stage KB arrangement 10 Fluorescent screen 11 Mirror 12 Microscope 13 Beam trajectory monitor 14 Knife edge 15 X-ray detector 16 Condensed diameter evaluation system

Claims (5)

  An oblique-incidence X-ray optical system that reflects X-rays emitted from a light source by a one-dimensional first mirror and a second mirror having a variable reflecting surface shape and condenses them on a fixed focal point. The focal point is a light source, the other focal point is a common focal point, one focal point of the second ellipse is a fixed focal point of the entire optical system, the other focal point is coincident with the common focal point, and the reflecting surface of the first mirror is The shape is formed by a part of the first ellipse, the shape of the reflection surface of the second mirror is formed by a part of the second ellipse, and the X-ray from the light source is reflected by the reflection surface of the first mirror. After passing through the common focus, the light is reflected by the reflecting surface of the second mirror and condensed on a fixed focus, and the position of the common focus is changed while the positions of the light source and the fixed focus are fixed. Correspondingly, the shapes of the reflecting surfaces of the first mirror and the second mirror are changed. By, condensing diameter varying X-ray focusing system characterized by changing the focused diameter in the fixed focus. Using two pairs of the first mirror and the second mirror, one pair is horizontally oriented to form a horizontal first mirror and a horizontal second mirror, and one pair is vertically oriented to form a vertical first mirror. A vertical second mirror is used, and the horizontal first mirror and the vertical first mirror are arranged at the front and back to form a first-stage KB arrangement, and the horizontal second mirror and the vertical second mirror are arranged at the front and rear to form a second stage. The X-ray condensing system having a variable condensing diameter according to claim 1, wherein the X-ray condensing system has a KB arrangement of eyes. In the X-ray condensing system with variable condensing diameter according to claim 1 or 2,
The distance from the light source to the center point of the reflecting surface of the first mirror, the distance from the fixed focus to the center point of the reflecting surface of the second mirror, the incident angle with respect to the center point of the reflecting surface of the first mirror, and the The incident angle with respect to the center point of the reflecting surface of the second mirror is determined in advance as an initial condition, and the distance from the common focus to the center point of the reflecting surface of the first mirror is set so that the condensing diameter is minimum at the fixed focus. By finding a combination of distances from the common focal point to the center point of the reflecting surface of the second mirror, and further determining the coordinates of the center point of the reflecting surface of the first mirror, the condensing diameter is minimized at the fixed focal point. X-rays with variable condensing diameter , wherein coordinates of the fixed focus, coordinates of the central point of the reflecting surface of the second mirror and coordinates of the common focus are determined, and thereafter coordinates other than the common focus are fixed. How to use the light collection system. Based on the optical system having the maximum numerical aperture (NA) determined so that the condensing diameter is minimized at the fixed focal point, the central point of the reflecting surface of the first mirror from the light source, the common focal point, and the reflecting surface of the second mirror The X-ray center trajectory connecting the center point and the fixed focus is maintained, and the common focus is moved along the center trajectory between the first mirror and the second mirror so as to be inversely proportional to the change in numerical aperture. 4. The method of using an X-ray condensing system with variable condensing diameter according to claim 3, wherein the condensing diameter under the diffraction limit is changed . The method of using an X-ray condensing system with variable condensing diameter according to claim 3 or 4, wherein the condensing diameter at the fixed focus can be changed within a range of 30 nm to 10 µm.