CN106291898A - A kind of glancing incidence KBA microscopic system for ICF - Google Patents

A kind of glancing incidence KBA microscopic system for ICF Download PDF

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Publication number
CN106291898A
CN106291898A CN201610739903.0A CN201610739903A CN106291898A CN 106291898 A CN106291898 A CN 106291898A CN 201610739903 A CN201610739903 A CN 201610739903A CN 106291898 A CN106291898 A CN 106291898A
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China
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mirror
subreflector
reflecting mirror
condenser lens
kba
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CN201610739903.0A
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赵玲玲
孙德林
胡家升
王丽丽
王刚
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Ludong University
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Ludong University
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    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00Microscopes
    • G02B21/02Objectives
    • G02B21/04Objectives involving mirrors
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00Microscopes
    • G02B21/06Means for illuminating specimens
    • G02B21/08Condensers

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  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Optical Elements Other Than Lenses (AREA)

Abstract

The invention discloses a kind of glancing incidence KBA microscopic system for ICF, including He Ne laser instrument, combined lens, primary mirror, target ball and target chamber, primary mirror is arranged in target chamber, combined lens includes two condenser lenss, two reflecting mirrors, spectroscope, with alignment object lens, two condenser lenss are arranged on optical fiber and target ball, one of them reflecting mirror is arranged near a condenser lens, spectroscope is arranged on the lower section of reflecting mirror, He Ne laser instrument is arranged on spectroscopical front side, reflecting mirror is arranged on spectroscopical lower section, alignment object lens are arranged on the rear side of target ball, the both sides of alignment object lens are respectively provided with protected glass.The present invention uses four pieces of mutually perpendicular spherical reflectors, it is possible to reduce coma, reduces visual field and tilts, and processing cost is low, debug simple, experimental period is short, do not introduce extra error.

Description

A kind of glancing incidence KBA microscopic system for ICF
Technical field
The present invention relates to microscope field, a kind of glancing incidence KBA microscopic system for ICF.
Background technology
Within 1896, X-ray finds soon, and people begin to, with X-ray direct irradiation object, use contact radiant quantity Method obtains radioscopic image.But, the further development of x-ray imaging and Detection Techniques but encounters serious obstacle.Its Main reason is that X-ray wavelength is the shortest, the most several angstroms to hundreds of angstromsThan visible light wave length 1 ~4 orders of magnitude.X-ray is absorbed the most consumingly, therefore, find be appropriate to different application field x-ray source, Image-forming component and corresponding sensitive detection parts are highly difficult.And, X-ray reflects the most hardly, only exists Available reflectance is just demonstrated in the case of glancing incidence.Grazing Incidence X-Ray microscope grew a lot in the last few years, and day by day Perfect.This microscope is used for biological study by the progressively deep and recent researches personnel of ICF experimentation, has also promoted X The development of ray microscope, nearly all synchrotron radiation line is equipped with Grazing Incidence X-Ray microscope.Developed country has accomplished Close to diffraction limit level of resolution.They are mainly by improving surface surface precision and and reducing surface roughness.Mori etc. use Special process method such as elastic emission machining method (elastic emission machining, EEM) and plasmarized Learn gas processing method (chemical vaporization machining, CVM) etc., be focusing performance at 15keV at energy Reach close to diffraction limit level.Grazing incidence microscope best having reached of current surface smoothness for inertial confinement 0.13nm, the optimal resolution of system is 3 μm.Due to the needs of ICF experimentation, Rochester University of the U.S. (University of Rochester) is that its OMEGA equipment have developed two set KB microscopes respectively.A set of KB microscope is with high The coupling of electric current PJX streak camera improves research and directly drives sensitivity and the spatial resolution of hydrodynamie stability experiment.He Use 4 mirrors plating iridium/chromium duplicatures method, grazing angle is 2.1 °.This grazing angle be calculate make solid angle The angle maximum with reflectance.This system can keep the resolution of 2 μm in 120 μm visual fields.Use super-smooth surface, table Face mean square roughness reaches 0.13nm.The KB microscope of another set of 16 pictures of generation being made up of 16 pairs of concave mirrors.This is The optimal resolution of system is 3 μm, and the resolution in 400 μm visual fields is higher than 5 μm.Framing camera is connected with KB microscope, 1.5~7keV energy ranges, it is possible to the photo of shooting X-ray in limited time.The interval 1.5ns time produces and can produce 16 X-ray Picture.The substrate of concave mirror uses fused quartz, and surface mean square roughness is 0.4nm.Non-periodic multilayer structure is used from for the first time Since increasing neutron reflected spectral range near total reflection, non-periodic multilayer is increasingly used for glancing incidence feelings Condition is to obtain sufficiently stable reflectance.France F.Bridou etc. have developed the KBA being operated in 100ev~10keV energy range Microscope.The most greatly and don't reflectance, the glancing incidence on four reflecting mirrors is reduced in order to enable a system to the solid angle of reflection Angle is 2 °~3 °, and the method using plating film aperiodic, meets the requirement more than 7% of each reflectance.At inertial confinement fusion In, owing to hydrodynamics instability limits the realization of igniting plan, Ph.Troussel etc. have developed high-resolution class Wolter microscope, it uses two anchor ring reflecting mirrors, in 1~5keV energy range, visual field radius 0.4mm, spatial resolution Being 4 μm, surface roughness is 0.3nm.
The development of domestic grazing incidence microscope is started in the mid-80.Domestic China Physics Institute nuclear physics and chemistry institute Started cooperation research and development domestic First Wolter X-ray microscope with Changchun ray machine institute of the Chinese Academy of Sciences from 1988, carried out many therebetween Secondary laser target shooting imaging Efficiency testing is tested, but does not all obtain preferable X light image.Through effort in 7 years, until nineteen ninety-five 10 The moon, this equipment developed just obtained one the most essential spy of imaging system of reflection in starlight II little target chamber on-site assessment is tested The spatial resolution data of property.This set Wolter X-ray microscopical work capacity scope is 0.1keV~1keV, i.e. microscope Operation wavelength be 1.24~12.4nm, grazing angle is 1.2 °, and object distance is 230mm, enlargement ratio is 15 ×, the maximum of system Light harvesting solid angle is 1 × 10-4Sr, visual field is more than 200 μm, and the resolution of system reaches 5 μm.
Prior art: the KB type microscopes that use more, this structure two pieces of mutually perpendicular spherical reflectors of employing Composition.Having some laboratorys to have employed Wolter type microscope, this structure uses two pieces of non-spherical reflectors.
KB type microscope of the prior art tilts owing to using two pieces of mutually perpendicular spherical reflectors, coma and visual field The biggest.Wolter type microscope is owing to using two pieces of non-spherical reflectors, and processing cost is high.
Summary of the invention
It is an object of the invention to provide a kind of glancing incidence KBA microscopic system for ICF, to solve above-mentioned background skill The problem proposed in art.
For achieving the above object, the present invention provides following technical scheme:
A kind of glancing incidence KBA microscopic system for ICF, including He-Ne laser instrument, combined lens, primary mirror, target ball and target Room, described primary mirror is arranged in target chamber, and described combined lens includes the first condenser lens, second condenser lens, the first reflecting mirror, light splitting Mirror, the second reflecting mirror and alignment object lens, described first condenser lens is arranged between optical fiber and second condenser lens, second condenser lens It is arranged between the first condenser lens and target ball, and optical fiber, the first condenser lens, second condenser lens, target ball are located along the same line, institute Stating the first reflecting mirror to arrange near second condenser lens, described spectroscope is arranged on the lower section of the first reflecting mirror, described He-Ne laser Device is arranged on spectroscopical front side and is positioned at the lower section of optical fiber connector, and described second reflecting mirror is arranged on spectroscopical lower section, and First reflecting mirror, spectroscope and the second reflecting mirror are arranged point-blank, and described alignment object lens are arranged on the rear side of target ball, institute The both sides stating alignment object lens are respectively provided with protected glass;Described primary mirror includes the first principal reflection mirror and multiple subreflector, institute State and on rear side of the first principal reflection mirror, be disposed with the 5th subreflector, the first subreflector, the second subreflector, the 3rd secondary reflection Mirror, the 4th subreflector, described 5th subreflector offers a through hole completely through X-ray, described first principal reflection Mirror, the 5th subreflector, the first subreflector point-blank, described second subreflector, the 3rd subreflector, fourth officer Reflecting mirror point-blank, is provided with freely regulated angle, institute between described first subreflector and the second subreflector The side stating the first principal reflection mirror is provided with microscope.
As the further scheme of the present invention: the thickness of described first condenser lens is 4mm, the thickness of second condenser lens is 20mm, the first condenser lens is 600mm with the distance of second condenser lens.
As the further scheme of the present invention: the distance of described second condenser lens and the first reflecting mirror is 10mm, and first is anti- Penetrating the distance between mirror and spectroscope is 50mm, and the distance between the second reflecting mirror and spectroscope is 35mm.
As the further scheme of the present invention: the distance between described first reflecting mirror and target ball is 400mm, against target ball Distance between protection glass and target ball is 186~200mm.
As the further scheme of the present invention: described first reflecting mirror and the second reflecting mirror are half-reflecting half mirrors.
As the present invention further scheme: between described first subreflector and the second subreflector, angle is more than 90°。
Compared with prior art, the invention has the beneficial effects as follows:
The present invention uses four pieces of mutually perpendicular spherical reflectors, it is possible to reduce coma, reduces visual field and tilts, processing cost Low, debug simple, experimental period is short, do not introduce extra error.
Accompanying drawing explanation
Fig. 1 is the illumination optical system for alignment structure chart of present system.
Fig. 2 is the illumination optical system for alignment schematic diagram of the present invention.
Fig. 3 is the vector calculating schematic diagram for light path.
Fig. 4 is the coordinate transformation schematic diagram calculated for vector.
Fig. 5 is the two-direction X-ray figure of the nickel screen lattice of experiment target used.
Fig. 6 is the tiny grid two-direction X-ray figure that present system obtains in whole visual field.
In figure: 1-the first condenser lens;2-second condenser lens;3-the first reflecting mirror;4-spectroscope;5-the second reflecting mirror;6- Protection glass;7-is directed at object lens;8-He-Ne laser instrument;9-optical fiber;10-target ball;11-target chamber;SG1-the first principal reflection mirror;M1- First subreflector;M2-the second subreflector;M3-the three subreflector;M4-the four subreflector;M5-the five subreflector; MJ-microscope.
Detailed description of the invention
Below in conjunction with the accompanying drawing in the embodiment of the present invention, the technical scheme in the embodiment of the present invention is carried out clear, complete Describe, it is clear that described embodiment is only a part of embodiment of the present invention rather than whole embodiments wholely.Based on Embodiment in the present invention, it is every other that those of ordinary skill in the art are obtained under not making creative work premise Embodiment, broadly falls into the scope of protection of the invention.
Referring to Fig. 1~3, in the embodiment of the present invention, a kind of glancing incidence KBA microscopic system for ICF, including He- Ne laser instrument 8, combined lens, primary mirror, target ball 10 and target chamber 11, primary mirror is arranged in target chamber 11, and combined lens includes the first condenser lens 1, second condenser lens the 2, first reflecting mirror 3, spectroscope the 4, second reflecting mirror 5 and alignment object lens 7, the first reflecting mirror 3 and second is anti- Penetrating mirror 5 is half-reflecting half mirror, and the first condenser lens 1 is arranged between optical fiber 9 and second condenser lens 2, and the thickness of the first condenser lens 1 is 4mm, the thickness of second condenser lens 2 is 20mm, and the first condenser lens 1 is 600mm with the distance of second condenser lens 2, second condenser lens 2 It is arranged between the first condenser lens 1 and target ball 10, and optical fiber the 9, first condenser lens 1, second condenser lens 2, target ball 10 are positioned at same On straight line, the first reflecting mirror 3 is arranged near second condenser lens 2, and spectroscope 4 is arranged on the lower section of the first reflecting mirror 3, the second optically focused The distance of mirror 2 and the first reflecting mirror 3 is 10mm, and the distance between the first reflecting mirror 3 and spectroscope 4 is 50mm, the second reflecting mirror 5 And the distance between spectroscope 4 is 35mm;He-Ne laser instrument 8 is arranged on the front side of spectroscope 4 and is positioned under optical fiber 9 end Side, the second reflecting mirror 5 is arranged on the lower section of spectroscope 4, and the first reflecting mirror 3, spectroscope 4 and the second reflecting mirror 5 are arranged on one On bar straight line, alignment object lens 7 are arranged on the rear side of target ball 10, and the both sides of alignment object lens 7 are respectively provided with protected glass 6, and first Distance between reflecting mirror 3 and target ball 10 is 400mm, against the distance between protection glass 6 and the target ball 10 of target ball 10 is 186mm。
Primary mirror includes the first principal reflection mirror SG1With multiple subreflectors, the first principal reflection mirror SG1Rear side is disposed with the Five subreflector M5, the first subreflector M1, the second subreflector M2, the 3rd subreflector M3, the 4th subreflector M4
In order to ensure the precision of grazing angle and prevent veiling glare, at the first principal reflection mirror SG1Before installation one at 24mm The reflecting mirror M that individual and pseudo-axle is vertical5, the 5th subreflector M5On offer a through hole completely through X-ray.First principal reflection Mirror SG1, the 5th subreflector M5, the first subreflector M1Point-blank, the second subreflector M2, the 3rd subreflector M3、 4th subreflector M4Point-blank, the first subreflector M1With the second subreflector M2Between be provided with freely regulated Angle, the first principal reflection mirror SG1Side be provided with microscope MJ.
When the He-Ne laser vertical irradiating target ball incides the 5th subreflector M5Upper and can be along backtracking, Jing Guo One principal reflection mirror SG1Enter microscope MJ, if focal spot is at microscope MJ graticle center, then show that grazing angle is accurate True 1.6 °.Degree according to focus point deviation graticle center can measure the error of grazing angle, uses this set detection dress Put the precision that can ensure that grazing angle.
In order to realize conveniently installing and adjust, making actual puppet optical axis rotate 8.7485 °, so, two optical axises are with regard to phase Overlap mutually.The light sent from Halogen light and the light sent from He-Ne laser instrument all coincide together through the second reflecting mirror 5, and This two-beam part rear reflects tailing edge backtracking from reflecting mirror, if the light returned is fallen in microscope MJ graticle The heart, shows alignment accurately, and the precision of grazing angle is guaranteed.Another part light (mainly laser) enters master lens system and becomes Picture, light transmission the first reflecting mirror direct irradiation target ball sent from Halogen light, auxiliary lens to target ball imaging, if this as with Target ball imaging is overlapped by He-Ne laser above by primary mirror, then show that this system has been adjusted.
Principle is as follows: parameter relevant in the vector form of ray tracing all uses unified right-angle coordinate representation, X-axis With optical axis coincidence, zero and sphere summit overlap, as shown in Figure 4.In vector form, the geometric position of incident ray is adopted With two vector representations: one is to represent certain point p on lightbPosition vector Pb;Another is the list along light travel direction Bit vector Qb, pbPoint generally light incident point on sphere, each vector is with they components on three coordinate axess Represent:
Incident ray
I in formulax, iy, izIt is respectively the unit vector along tri-change in coordinate axis direction of X, Y, Z, due to QbIt is unit vector, Therefore its component α on coordinate axesb, βb, γbIt is exactly its three direction cosines.Birefringence light uses P accordinglyb1、Qb1Two Individual vector representation:
Refraction light
Vector form in the Calculation of Optical Path is exactly at spherical radius r, refractive index n and n ', sphere interval dbKnown condition Under, provide the coordinate P of incident rayb、QbAfter, seek the coordinate P of refraction lightb1、Qb1.This process can be divided into three steps: The first step, light incident point p on refraction sphere is obtained in position and direction according to incident ray1;Second step, obtains projection Normal direction at Dian;3rd step, according to direction and the normal direction of incident ray, utilizes the law of refraction to obtain refraction light Direction.Termination formula is as follows:
abb(db-Xb)-βbYbbZb (1)
MbX=Xb-dbbab (2)
Mb 2=(Xb-dbbab)2+(Ybbab)2+(Zbbab)2 (3)
Db=abb (5)
cosθp=| αb(1-Xb1cb)-βbYb1cbbZb1cb| (7)
gb=n ' cos θ 'p-ncosθp (9)
According to above formula, can be by Pb(Xb, Yb, Zb)、Qbb, βb, γb) progressively computing obtain Pb1(Xb1, Yb1, Zb1)、Qb1b1, βb1, γb1).Continuous application above formula, can calculate the light path of any light in any coaxial system.
KBA microscope is glancing incidence non co axial X ray reflection imaging system, and four pieces of reflecting mirrors are spatial distributions, Be not the most mutually perpendicular between front two pieces of reflecting mirrors and rear two pieces of reflecting mirrors, and be intended to along light move towards tilt one Individual low-angle, this brings sizable difficulty to calculating.The vector form of above-mentioned spherical refraction system with conjugate axis can after being adjusted To be used for KBA microscope is carried out the Calculation of Optical Path, need to do following adjustment:
(1) with coordinate translation, the not coaxial problem of solution is rotated.As it is shown in figure 5, to every piece of reflecting mirror, calculate refraction light Front elder generation is the P before refractionbPoint coordinates translation, rotate to reflecting mirror summit as initial point, Z axis coaxial with every piece of reflecting mirror respectively Under coordinate system, i.e. translated by XYZ coordinate system, rotated to X ' Y ' Z ' coordinate system.
(2) dioptric system becomes reflex system.KBA microscope is incident with grazing angle, for reflex system, so can not be The assignment method of coaxial system is directly used in KBA microscope, needs to modify.Because incident ray and reflection light institute Medium be the same, be all air, but in opposite direction, so n=-n '=1.
We are real in the diagnosis of the inertial confinement fusion (ICF) of gongwu academy's God Light III device enterprising system row In testing, obtain high-resolution image, as shown in Figure 4 with the KBA X-ray microscope of design.Target used in experiment is Cycle is 20 μm, and opening is 20 μm, and live width is the nickel screen lattice (not having gold-plated film) of 6 μm.Nickel screen lattice in Fig. 6 are high-visible, show KBA system has preferable resolution in whole visual field, otherwise cannot obtain tiny grid two-direction X-ray figure the most clearly Picture.
The advantage of present system
1, KBA X-ray microscope system is an anastigmatic system, but there is spherical aberration, coma, at the model of 2mm visual field Enclosing intrinsic resolution and can reach 5~7 μm, the resolution in 4mm visual field is better than 25~30 μm, meets use requirement.
2, composition KBA microscopical reflecting mirror focal length, imaging characteristics and reflection characteristic under the conditions of glancing incidence is carried out Research, analyzes the reasonability that KBA microscopic structure arranges, writes the Calculation of Optical Path program according to the microscopical construction features of KBA
3, utilize the Calculation of Optical Path program to carry out substantial amounts of the Calculation of Optical Path, analyze the microscopical astigmatism of KBA, image planes inclination, ball Difference and coma.The result analyzed shows, KBA microscope is that one disappears astigmatism structure, but along with the increase of visual field, image planes tilt to become Obtain increasingly severe.Owing to not having the parameter of aberration correction, there is spherical aberration and coma in KBA microscope, but compares with KB structure, as Difference is greatly reduced.
It is obvious to a person skilled in the art that the invention is not restricted to the details of above-mentioned one exemplary embodiment, Er Qie In the case of the spirit or essential attributes of the present invention, it is possible to realize the present invention in other specific forms.Therefore, no matter From the point of view of which point, all should regard embodiment as exemplary, and be nonrestrictive, the scope of the present invention is by appended power Profit requires rather than described above limits, it is intended that all by fall in the implication of equivalency and scope of claim Change is included in the present invention.Should not be considered as limiting involved claim by any reference in claim.

Claims (6)

1. for a glancing incidence KBA microscopic system of ICF, including He-Ne laser instrument, combined lens, primary mirror, target ball and target Room, described primary mirror is arranged in target chamber, it is characterised in that described combined lens includes the first condenser lens, second condenser lens, first anti- Penetrating mirror, spectroscope, the second reflecting mirror and alignment object lens, described first condenser lens is arranged between optical fiber and second condenser lens, the Two condenser lenss are arranged between the first condenser lens and target ball, and optical fiber, the first condenser lens, second condenser lens, target ball are positioned at same On straight line, described first reflecting mirror is arranged near second condenser lens, and described spectroscope is arranged on the lower section of the first reflecting mirror, described He-Ne laser instrument is arranged on spectroscopical front side and is positioned at the lower section of optical fiber connector, and described second reflecting mirror is arranged on spectroscope Lower section, and the first reflecting mirror, spectroscope and the second reflecting mirror arrange point-blank, and described alignment object lens are arranged on target ball Rear side, the both sides of described alignment object lens are respectively provided with protected glass;Described primary mirror includes the first principal reflection mirror and multiple pair Reflecting mirror, be disposed with on rear side of described first principal reflection mirror the 5th subreflector, the first subreflector, the second subreflector, 3rd subreflector, the 4th subreflector, described 5th subreflector offers a through hole completely through X-ray, described Point-blank, described second subreflector, the 3rd pair are anti-for first principal reflection mirror, the 5th subreflector, the first subreflector Penetrate mirror, the 4th subreflector point-blank, between described first subreflector and the second subreflector, be provided with free tune The angle of joint, the side of described first principal reflection mirror is provided with microscope.
Glancing incidence KBA microscopic system for ICF the most according to claim 1, it is characterised in that described first optically focused The thickness of mirror is 4mm, and the thickness of second condenser lens is 20mm, and the first condenser lens is 600mm with the distance of second condenser lens.
Glancing incidence KBA microscopic system for ICF the most according to claim 1, it is characterised in that described second optically focused The distance of mirror and the first reflecting mirror is 10mm, and the distance between the first reflecting mirror and spectroscope is 50mm, the second reflecting mirror with point Distance between light microscopic is 35mm.
Glancing incidence KBA microscopic system for ICF the most according to claim 1, it is characterised in that described first reflection Distance between mirror and target ball is 400mm, is 186~200mm against the distance between target ball protection glass and target ball.
Glancing incidence KBA microscopic system for ICF the most according to claim 1, it is characterised in that described first reflection Mirror and the second reflecting mirror are half-reflecting half mirrors.
Glancing incidence KBA microscopic system for ICF the most according to claim 1, it is characterised in that described first is secondary anti- Penetrate angle between mirror and the second subreflector and be more than 90 °.
CN201610739903.0A 2016-08-26 2016-08-26 A kind of glancing incidence KBA microscopic system for ICF Pending CN106291898A (en)

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Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102945688A (en) * 2012-10-30 2013-02-27 同济大学 X-ray KBA microscopic imaging system
CN203069533U (en) * 2013-02-05 2013-07-17 山东大学 Multi-purpose synchronous radiation coherence X-ray diffraction microimaging device
JP2013221874A (en) * 2012-04-17 2013-10-28 Osaka Univ X-ray optical system
JP2014013169A (en) * 2012-07-04 2014-01-23 Jtec Corp X-ray converging system with adjustable converging diameter

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013221874A (en) * 2012-04-17 2013-10-28 Osaka Univ X-ray optical system
JP2014013169A (en) * 2012-07-04 2014-01-23 Jtec Corp X-ray converging system with adjustable converging diameter
CN102945688A (en) * 2012-10-30 2013-02-27 同济大学 X-ray KBA microscopic imaging system
CN203069533U (en) * 2013-02-05 2013-07-17 山东大学 Multi-purpose synchronous radiation coherence X-ray diffraction microimaging device

Non-Patent Citations (4)

* Cited by examiner, † Cited by third party
Title
BAOZHONG MU ET AL.: "An auxiliary visible imaging method for alignment of x-ray Kirkpatrick-Baez optics", 《PROCEEDINGS OF SPIE》 *
张振儒等: "《近代岩矿测试新技术》", 28 February 1987 *
赵玲玲: "KBA X射线显微镜研究", 《中国博士学位论文全文数据库 工程科技II辑》 *
赵玲玲等: "KBA型X射线显微系统", 《强激光与粒子束》 *

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Application publication date: 20170104