CN108051908B - An imaging optical system - Google Patents

An imaging optical system Download PDF

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CN108051908B
CN108051908B CN201711251541.1A CN201711251541A CN108051908B CN 108051908 B CN108051908 B CN 108051908B CN 201711251541 A CN201711251541 A CN 201711251541A CN 108051908 B CN108051908 B CN 108051908B
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CN108051908A (en
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何锋赟
赵楠
王延杰
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Changchun Institute of Optics Fine Mechanics and Physics of CAS
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    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
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Abstract

The present invention relates to optical image technology fields, a kind of imaging optical system is disclosed, including the first off axis reflector mirror, the first lens group, DMD micro mirror array, the second off axis reflector mirror, imaging microscope group and detector, the light that target object issues is assembled through the first off axis reflector mirror, into first lens group, it images on the DMD micro mirror array, imaging beam again passes by first lens group after being reflected by the DMD micro mirror array, then after the second off axis reflector mirror collimation, into the imaging microscope group, then image on the detector.Above system is designed using the optical texture that DMD makees intermediate image plane and partial symmetry, DMD micro mirror array and detector pixel spatially one-to-one relationship is dexterously realized, to reach the processing to imaging system admission light.Using the corresponding imaging relations of DMD device and detector pixel, the gray scale of adjustable detector target surface, to expand the dynamic range of photo electric imaging system.

Description

一种成像光学系统An imaging optical system

技术领域technical field

本发明涉及光学成像技术领域,特别涉及一种成像光学系统。The invention relates to the technical field of optical imaging, in particular to an imaging optical system.

背景技术Background technique

DMD是一种近年来比较热门的空间光调制器,主要用于投影仪、目标发生器等光学系统。DMD对光强的调制是通过控制它上面上百万个微镜的翻转实现的,每一个微镜可以单独的控制。通过改变微镜所对应的数据单元中的数据,可以控制微镜的状态。DMD is a popular spatial light modulator in recent years, mainly used in optical systems such as projectors and target generators. The DMD modulates the light intensity by controlling the flipping of millions of micromirrors on it, and each micromirror can be individually controlled. The state of the micromirror can be controlled by changing the data in the data unit corresponding to the micromirror.

图像传感器作为一种主要的光电成像设备,其可探测动态范围一般为48~60dB,成为制约光电成像系统探测范围的主要因素。高动态范围成像技术在深空探测、医学成像、军事观测等领域有着紧迫的需求。通常情况下,可采用多次曝光的软件处理方法或增加探测器数量的硬件方法来提高光电系统的动态范围,然而,前者基于时域的多次曝光技术无法探测高速动态目标,后者增加探测器的硬件方法大大增加系统的成本且需要大量的事后处理来完成图像融合。As a main optoelectronic imaging device, the image sensor has a detectable dynamic range of 48-60dB, which is the main factor restricting the detection range of the optoelectronic imaging system. High dynamic range imaging technology has an urgent demand in deep space exploration, medical imaging, military observation and other fields. Usually, the software processing method of multiple exposures or the hardware method of increasing the number of detectors can be used to improve the dynamic range of the photoelectric system. However, the former multiple exposure technology based on time domain cannot detect high-speed dynamic targets, and the latter increases the detection The hardware method of the processor greatly increases the cost of the system and requires a lot of post-processing to complete the image fusion.

发明内容Contents of the invention

本发明旨在克服现有图像传感器动态范围对光电系统探测动态范围的制约,提供一种满足高动态辐射能量特性场景测量和观察需求的成像光学系统。The present invention aims to overcome the limitation of the dynamic range of the existing image sensor on the detection dynamic range of the photoelectric system, and provides an imaging optical system that meets the requirements for scene measurement and observation of high dynamic radiation energy characteristics.

为实现上述目的,本发明采用以下技术方案:To achieve the above object, the present invention adopts the following technical solutions:

本发明提供一种成像光学系统,包括第一离轴反射镜、第一透镜组、DMD微镜阵列、第二离轴反射镜、成像镜组和探测器,目标物体发出的光经所述第一离轴反射镜会聚,进入所述第一透镜组,成像于所述DMD微镜阵列上,成像光束由所述DMD微镜阵列反射后再次经过所述第一透镜组,然后经所述第二离轴反射镜准直后,进入所述成像镜组,然后成像于所述探测器上;The present invention provides an imaging optical system, including a first off-axis reflector, a first lens group, a DMD micromirror array, a second off-axis reflector, an imaging mirror group and a detector. The light emitted by a target object passes through the first An off-axis reflector converges, enters the first lens group, and is imaged on the DMD micromirror array. After being reflected by the DMD micromirror array, the imaging beam passes through the first lens group again, and then passes through the second lens group. After the two off-axis mirrors are collimated, they enter the imaging mirror group, and then image on the detector;

所述成像光学系统的设计遵循右手坐标法则,Z轴为系统光轴,且与所述DMD微镜阵列的基底法线相重合,光线入射方向与Z轴平行,指向正方向;The design of the imaging optical system follows the right-hand coordinate rule, the Z axis is the system optical axis, and coincides with the base normal of the DMD micromirror array, and the light incident direction is parallel to the Z axis and points to the positive direction;

所述第一离轴反射镜在YOZ平面内,以口径离轴的方式,沿Y方向偏置,偏置量不小于所述第一离轴反射镜的通光口径,所述第二离轴反射镜在XOZ平面内,以口径离轴的方式,沿X方向偏置,所述第二离轴反射镜沿X方向的偏置量与所述第一离轴反射镜沿Y方向的偏置量相同,所述第一离轴反射镜与所述第二离轴反射镜具有相同的面型参数,光线在两块离轴反射镜之间所经过的光学路径关于所述DMD微镜阵列的法线对称,所述第二离轴反射镜绕所述DMD微镜阵列的法线顺时针旋转90°后与所述第一离轴反射镜重合。The first off-axis reflector is offset along the Y direction with an aperture off-axis in the YOZ plane, and the offset amount is not less than the light aperture of the first off-axis reflector, and the second off-axis reflector The reflector is offset along the X direction in an off-axis manner in the XOZ plane, and the offset amount of the second off-axis reflector along the X direction is the same as the offset of the first off-axis reflector along the Y direction The amount is the same, the first off-axis reflector and the second off-axis reflector have the same surface parameters, and the optical path that the light passes between the two off-axis reflectors is about the DMD micromirror array The normal is symmetrical, and the second off-axis reflector coincides with the first off-axis reflector after rotating clockwise by 90° around the normal of the DMD micromirror array.

一些实施例中,所述成像光学系统的入瞳位于光束入射方向上所述第一离轴反射镜之后。In some embodiments, the entrance pupil of the imaging optical system is located behind the first off-axis mirror in the incident direction of the light beam.

一些实施例中,所述第一离轴反射镜和所述第二离轴反射镜均为凹面的二次曲面,具有负光焦度。In some embodiments, both the first off-axis reflector and the second off-axis reflector are concave quadric surfaces with negative optical power.

一些实施例中,所述第一离轴反射镜与所述第二离轴反射镜的二次曲面的面型表达式均为:In some embodiments, the surface expressions of the quadric surfaces of the first off-axis reflector and the second off-axis reflector are both:

Figure BDA0001491842620000021
Figure BDA0001491842620000021

其中,Z为面型矢高,C为顶点曲率半径,K为二次曲面系数,r为径向坐标。Among them, Z is the surface sagittal height, C is the curvature radius of the vertex, K is the quadratic surface coefficient, and r is the radial coordinate.

一些实施例中,所述第一透镜组由依次设置的4片透镜构成,所述4片透镜均为球面镜,所述第一透镜组具有负光焦度。In some embodiments, the first lens group is composed of 4 lenses arranged in sequence, and the 4 lenses are all spherical mirrors, and the first lens group has negative refractive power.

一些实施例中,所述DMD微镜阵列的尺寸为2560×1600、1920×1080或1024×768。In some embodiments, the size of the DMD micromirror array is 2560×1600, 1920×1080 or 1024×768.

一些实施例中,所述成像镜组为折反射式结构,包括沿光路设置第三离轴反射镜和第二透镜组,所述第三离轴反射镜和所述第一离轴反射镜具有相同的参数,所述第二透镜组和所述第一透镜组具有相同的参数。In some embodiments, the imaging mirror group is a catadioptric structure, including a third off-axis mirror and a second lens group arranged along the optical path, the third off-axis mirror and the first off-axis mirror have The same parameters, the second lens group and the first lens group have the same parameters.

一些实施例中,所述成像镜组为共轴折反射式结构,包括依次设置的第一透镜、第二透镜、第一反射镜、第三透镜、第四透镜、第五透镜、第六透镜和第二反射镜。In some embodiments, the imaging lens group is a coaxial catadioptric structure, including a first lens, a second lens, a first mirror, a third lens, a fourth lens, a fifth lens, and a sixth lens arranged in sequence and the second reflector.

一些实施例中,所述第一离轴反射镜和所述第二离轴反射镜的材料均为微晶、融石英或碳化硅。In some embodiments, the materials of the first off-axis reflector and the second off-axis reflector are microcrystalline, fused silica or silicon carbide.

本发明的有益效果在于:上述DMD微镜阵列作为中间像面的成像光学系统,利用DMD微镜阵列的工作特性,实现了DMD微镜阵列与探测器像元的一一匹配,达到调整探测器像面灰度的目的,从而扩大光电成像系统的探测动态范围,满足高动态辐射能量特性场景测量和观察的需求,可应用于深空探测,医学成像,军事观测等领域。上述成像光学系统,在DMD微镜阵列所在的一次像面上,各视场光学调制传递函数在Nyquist频率处均大于0.70,畸变接近于0。此外,上述成像光学系统将DMD微镜阵列置于中间像面且采用了部分对称的结构形式,使得从一次像面出射的光束为近准直光,实现了成像镜组的可替换性,扩展了上述成像光学系统的适用性,用户可根据实际需求来选择适合的成像镜组结构形式。与此同时,上述成像光学系统具有成像质量好,结构紧凑,加工、装调难度低等特点。The beneficial effect of the present invention is that: the above-mentioned DMD micromirror array is used as the imaging optical system of the intermediate image plane, utilizes the working characteristics of the DMD micromirror array, realizes the one-to-one matching between the DMD micromirror array and the detector pixel, and achieves the adjustment of the detector The purpose of the image plane gray scale is to expand the detection dynamic range of the photoelectric imaging system and meet the needs of scene measurement and observation of high dynamic radiation energy characteristics. It can be applied to deep space detection, medical imaging, military observation and other fields. In the above-mentioned imaging optical system, on the primary image plane where the DMD micromirror array is located, the optical modulation transfer function of each field of view is greater than 0.70 at the Nyquist frequency, and the distortion is close to 0. In addition, the above-mentioned imaging optical system places the DMD micromirror array on the intermediate image plane and adopts a partially symmetrical structure, so that the beam emitted from the primary image plane is nearly collimated light, which realizes the replaceability of the imaging lens group and expands Considering the applicability of the above-mentioned imaging optical system, the user can choose the appropriate structural form of the imaging lens group according to actual needs. At the same time, the above-mentioned imaging optical system has the characteristics of good imaging quality, compact structure, and low difficulty in processing and assembly.

附图说明Description of drawings

图1示意性示出根据本发明的实施例1的成像光学系统的光学结构示意图。FIG. 1 schematically shows a schematic diagram of the optical structure of an imaging optical system according to Embodiment 1 of the present invention.

图2示意性示出根据本发明的实施例1的成像光学系统的光学结构中光线方向示意图。FIG. 2 schematically shows a schematic view of light directions in the optical structure of the imaging optical system according to Embodiment 1 of the present invention.

图3为根据本发明的实施例1的成像光学系统中第一透镜组的光学结构示意图。3 is a schematic diagram of the optical structure of the first lens group in the imaging optical system according to Embodiment 1 of the present invention.

图4为本发明的实施例1的成像光学系统的中间像面的光学调制传递函数曲线。FIG. 4 is an optical modulation transfer function curve of the intermediate image plane of the imaging optical system according to Embodiment 1 of the present invention.

图5为本发明的实施例1的成像光学系统的二次像面的光学调制传递函数曲线。FIG. 5 is an optical modulation transfer function curve of the secondary image plane of the imaging optical system according to Embodiment 1 of the present invention.

图6示意性示出根据本发明的实施例2的成像光学系统的光学结构示意图。FIG. 6 schematically shows the optical structure of the imaging optical system according to Embodiment 2 of the present invention.

图7示意性示出根据本发明的实施例2的成像光学系统的光学结构中光线方向示意图。FIG. 7 schematically shows the direction of light in the optical structure of the imaging optical system according to Embodiment 2 of the present invention.

图8为本发明的实施例2的成像光学系统的成像镜组的光学结构示意图。FIG. 8 is a schematic diagram of the optical structure of the imaging lens group of the imaging optical system according to Embodiment 2 of the present invention.

图9为本发明的实施例2的成像光学系统的二次像面的光学调制传递函数曲线。9 is an optical modulation transfer function curve of the secondary image plane of the imaging optical system according to Embodiment 2 of the present invention.

具体实施方式Detailed ways

为了使本发明的目的、技术方案及优点更加清楚明白,以下结合附图及具体实施例,对本发明进行进一步详细说明。应当理解,此处所描述的具体实施例仅用以解释本发明,而不构成对本发明的限制。In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be further described in detail below in conjunction with the accompanying drawings and specific embodiments. It should be understood that the specific embodiments described here are only used to explain the present invention, but not to limit the present invention.

首先参考图1和图2,示出了根据本发明一个实施例的成像光学系统100,包括第一离轴反射镜110、第一透镜组120、DMD微镜阵列130、第二离轴反射镜140、成像镜组和探测器160。目标物体发出的光经第一离轴反射镜110会聚,进入第一透镜组120,成像于DMD微镜阵列130上,成像光束由DMD微镜阵列130反射后再次经过第一透镜组120,然后经第二离轴反射镜140准直后,进入成像镜组,然后成像于探测器160上。Referring first to Fig. 1 and Fig. 2, there is shown an imaging optical system 100 according to one embodiment of the present invention, comprising a first off-axis reflector 110, a first lens group 120, a DMD micromirror array 130, a second off-axis reflector 140. Imaging mirror group and detector 160. The light emitted by the target object is converged by the first off-axis reflector 110, enters the first lens group 120, and is imaged on the DMD micromirror array 130. After being reflected by the DMD micromirror array 130, the imaging beam passes through the first lens group 120 again, and then After being collimated by the second off-axis mirror 140 , it enters the imaging mirror group and is imaged on the detector 160 .

成像光学系统100的设计遵循右手坐标法则,Z轴为系统光轴,且与DMD微镜阵列130的基底法线相重合,光线入射方向与Z轴平行,指向正方向。The design of the imaging optical system 100 follows the right-handed coordinate rule. The Z-axis is the system optical axis and coincides with the base normal of the DMD micromirror array 130. The incident direction of the light is parallel to the Z-axis and points to the positive direction.

第一离轴反射镜110在YOZ平面内,以口径离轴的方式,沿Y方向偏置,偏置量不小于第一离轴反射镜110的通光口径。第二离轴反射镜140在XOZ平面内,以口径离轴的方式,沿X方向偏置,第二离轴反射镜140沿X方向的偏置量与第一离轴反射镜110沿Y方向的偏置量相同。第一离轴反射镜110与第二离轴反射镜140具有相同的面型参数,光线在两块离轴反射镜之间所经过的光路关于DMD微镜阵列130的法线对称,第二离轴反射镜140绕DMD微镜阵列130的法线顺时针旋转90°后与第一离轴反射镜110重合。The first off-axis reflector 110 is offset along the Y direction with an aperture off-axis in the YOZ plane, and the offset amount is not less than the light aperture of the first off-axis reflector 110 . The second off-axis reflector 140 is offset along the X direction in an off-axis manner in the XOZ plane, and the offset amount of the second off-axis reflector 140 along the X direction is the same as that of the first off-axis reflector 110 along the Y direction. The offset is the same. The first off-axis reflector 110 and the second off-axis reflector 140 have the same surface parameters, and the optical path of light between the two off-axis reflectors is symmetrical about the normal of the DMD micromirror array 130, and the second off-axis reflector The off-axis mirror 140 is rotated 90° clockwise around the normal of the DMD micromirror array 130 and coincides with the first off-axis mirror 110 .

成像光学系统100的入瞳位于光束入射方向上第一离轴反射镜110之后。The entrance pupil of the imaging optical system 100 is located behind the first off-axis mirror 110 in the incident direction of the light beam.

在一个实施例中,第一离轴反射镜110和第二离轴反射镜140均为凹面的二次曲面,具有负光焦度。进一步的,第一离轴反射镜110与第二离轴反射镜140的二次曲面的面型表达式均为:In one embodiment, both the first off-axis reflector 110 and the second off-axis reflector 140 are concave quadric surfaces with negative optical power. Further, the surface expressions of the quadric surfaces of the first off-axis reflector 110 and the second off-axis reflector 140 are both:

Figure BDA0001491842620000051
Figure BDA0001491842620000051

其中,Z为面型矢高,C为顶点曲率半径,K为二次曲面系数,r为径向坐标。Among them, Z is the surface sagittal height, C is the curvature radius of the vertex, K is the quadratic surface coefficient, and r is the radial coordinate.

在一个实施例中,第一透镜组120由依次设置的4片透镜构成,4片透镜均为球面镜,第一透镜组120具有负光焦度。In one embodiment, the first lens group 120 is composed of four lenses arranged in sequence, and the four lenses are all spherical mirrors, and the first lens group 120 has a negative refractive power.

DMD微镜阵列130单元与探测器160像元在空间上一一对应。DMD微镜阵列130的尺寸可以为2560×1600、1920×1080或1024×768等尺寸,以实现与探测器160像元阵列的匹配。The units of the DMD micromirror array 130 correspond to the pixels of the detector 160 one by one in space. The size of the DMD micromirror array 130 can be 2560×1600, 1920×1080 or 1024×768 to achieve matching with the detector 160 pixel array.

进一步的,在YOZ平面内,光束在经过第一透镜组120后,轴上主光线以与系统光轴约17°夹角入射到DMD微镜阵列130上,光束经DMD微镜阵列130反射后,轴上主光线在XOZ平面内以与系统光轴约17°夹角出射。Further, in the YOZ plane, after the light beam passes through the first lens group 120, the principal ray on the axis is incident on the DMD micromirror array 130 at an angle of about 17° with the optical axis of the system, and the light beam is reflected by the DMD micromirror array 130 , the chief ray on the axis emerges in the XOZ plane at an angle of about 17° with the optical axis of the system.

成像镜组具有可替换性,用户可根据实际需求来选择适合的成像镜组的结构形式,扩展了成像光学系统100的适用性。The imaging lens group is replaceable, and the user can select a suitable structural form of the imaging lens group according to actual needs, which expands the applicability of the imaging optical system 100 .

在图1所示的实施例中,成像镜组为折反射式结构,包括沿光路设置第三离轴反射镜152和第二透镜组154,第三离轴反射镜152和第一离轴反射镜110具有相同的参数,第二透镜组154和第一透镜组120具有相同的参数。In the embodiment shown in FIG. 1, the imaging lens group is a catadioptric structure, including a third off-axis reflector 152 and a second lens group 154 arranged along the optical path, the third off-axis reflector 152 and the first off-axis reflector The mirror 110 has the same parameters, and the second lens group 154 and the first lens group 120 have the same parameters.

在图6及图7所示的实施例中,成像镜组250为共轴折反射式结构。请同时参考图8,成像镜组250包括依次设置的第一透镜251、第二透镜252、第一反射镜253、第三透镜254、第四透镜255、第五透镜256、第六透镜257和第二反射镜258。第一透镜251、第二透镜252、第一反射镜253、第三透镜254、第四透镜255、第五透镜256、第六透镜257和第二反射镜258均为球面镜。In the embodiment shown in FIG. 6 and FIG. 7 , the imaging lens group 250 is a coaxial catadioptric structure. Please refer to FIG. 8 at the same time, the imaging lens group 250 includes a first lens 251, a second lens 252, a first reflection mirror 253, a third lens 254, a fourth lens 255, a fifth lens 256, a sixth lens 257 and The second reflector 258 . The first lens 251 , the second lens 252 , the first reflecting mirror 253 , the third lens 254 , the fourth lens 255 , the fifth lens 256 , the sixth lens 257 and the second reflecting mirror 258 are all spherical mirrors.

进一步的,第一离轴反射镜110和第二离轴反射镜140的材料可为微晶、融石英或碳化硅等常用反射镜材料。第一透镜组120和成像镜组中所采用的透镜的材料均使用常用玻璃。Further, the materials of the first off-axis reflector 110 and the second off-axis reflector 140 may be commonly used reflector materials such as microcrystalline, fused silica, or silicon carbide. The materials of the lenses used in the first lens group 120 and the imaging lens group are all commonly used glass.

下面为具体实施例。The following are specific examples.

实施例1Example 1

本实施例选取DMD微镜阵列130的尺寸为1920×1080,单个微镜尺寸10.8μm,选取探测器160的分辨率为1920×1080,像元尺寸为10.8μm。设计了一个长焦距,小相对孔径的折反射式成像光学系统100,工作波段为可见光波段,系统参数见表1。该成像光学系统100可视为由两部分组成,第一部分为放大倍率为-1的望远系统,由第一离轴反射镜110,第一透镜组120、DMD微镜阵列130、第二离轴反射镜140组成,第二部分为二次成像系统,由成像镜组和探测器160组成。In this embodiment, the size of the DMD micromirror array 130 is selected to be 1920×1080, and the size of a single micromirror is 10.8 μm. The resolution of the detector 160 is selected to be 1920×1080, and the pixel size is 10.8 μm. A catadioptric imaging optical system 100 with a long focal length and a small relative aperture is designed, and the operating wavelength is the visible light band. The system parameters are shown in Table 1. This imaging optical system 100 can be regarded as being made up of two parts, and the first part is the telescopic system that magnification is-1, by the first off-axis mirror 110, the first lens group 120, the DMD micromirror array 130, the second off-axis The second part is a secondary imaging system, which is composed of an imaging mirror group and a detector 160.

本实施例中成像光学系统的设计如图1和图2所示,遵循右手坐标法则,Z轴为系统光轴,且与DMD微镜阵列130的基底法线相重合。光线入射方向与Z轴平行,指向正方向。The design of the imaging optical system in this embodiment is shown in FIG. 1 and FIG. 2 , following the right-handed coordinate rule, and the Z axis is the optical axis of the system, and coincides with the base normal of the DMD micromirror array 130 . The light incident direction is parallel to the Z axis and points in the positive direction.

目标物体发出的光经第一离轴反射镜110会聚,进入第一透镜组120,成像于DMD微镜阵列130上。成像光束由DMD微镜阵列130反射后再次经过第一透镜组120,经第二离轴反射镜140准直,进入成像镜组,经其会聚,最终成像于探测器160上。第一离轴反射镜110以口径离轴的方式在YOZ平面内沿+Y方向偏置300mm。第一透镜组120由4片透镜组成,均为球面镜,结构布局见图2。光束在经过第一透镜组120后,在YOZ平面内,轴上主光线以与系统光轴约17°夹角入射到DMD微镜阵列130上。DMD微镜阵列130的法线与系统光轴的夹角为12°。光束经DMD微镜阵列130反射后,轴上主光线在XOZ平面内以与系统光轴约17°夹角出射,再次经过第一透镜组120和第二离轴反射镜140的准直,进入成像组件,最终成像于探测器160上。第二离轴反射镜140在XOZ平面内,以口径离轴的方式,沿+X方向偏置300mm。第一离轴反射镜110与第二离轴反射镜140具有完全一致的面型参数,光线在两块离轴反射镜之间所经光路关于DMD微镜阵列130的法线对称,第二离轴反射镜140绕DMD微镜阵列130的法线顺时针旋转90°后与第一离轴反射镜110重合。成像镜组为折反射式结构,包括沿光路设置第三离轴反射镜152和第二透镜组154。第三离轴反射镜152和第一离轴反射镜110具有相同的参数,第二透镜组154和第一透镜组120具有相同的参数。The light emitted by the target object is converged by the first off-axis mirror 110 , enters the first lens group 120 , and is imaged on the DMD micromirror array 130 . The imaging beam is reflected by the DMD micromirror array 130 and passes through the first lens group 120 again, collimated by the second off-axis mirror 140 , enters the imaging mirror group, converges thereon, and finally forms an image on the detector 160 . The first off-axis mirror 110 is offset by 300 mm along the +Y direction in the YOZ plane in an aperture off-axis manner. The first lens group 120 is composed of 4 lenses, all of which are spherical mirrors. The structural layout is shown in FIG. 2 . After the light beam passes through the first lens group 120, in the YOZ plane, the on-axis chief ray is incident on the DMD micromirror array 130 at an angle of about 17° to the system optical axis. The included angle between the normal of the DMD micromirror array 130 and the optical axis of the system is 12°. After the light beam is reflected by the DMD micromirror array 130, the principal ray on the axis exits at an angle of about 17° with the optical axis of the system in the XOZ plane, and is collimated by the first lens group 120 and the second off-axis mirror 140 again, and enters the The imaging component is finally imaged on the detector 160 . The second off-axis mirror 140 is offset in the +X direction by 300mm in the XOZ plane in an off-axis manner. The first off-axis reflector 110 and the second off-axis reflector 140 have completely consistent surface parameters, and the light path between the two off-axis reflectors is symmetrical about the normal of the DMD micromirror array 130, and the second off-axis reflector The off-axis mirror 140 is rotated 90° clockwise around the normal of the DMD micromirror array 130 and coincides with the first off-axis mirror 110 . The imaging mirror group is a catadioptric structure, including a third off-axis mirror 152 and a second lens group 154 arranged along the optical path. The third off-axis mirror 152 has the same parameters as the first off-axis mirror 110 , and the second lens group 154 has the same parameters as the first lens group 120 .

本实施例中,DMD微镜阵列130作为中间像面的成像光学系统的中间像面(一次像面)的光学调制传递函数曲线见图4。本实施例的成像光学系统的二次像面的光学调制传递函数曲线见图5。In this embodiment, the optical modulation transfer function curve of the intermediate image plane (primary image plane) of the imaging optical system in which the DMD micromirror array 130 is used as the intermediate image plane is shown in FIG. 4 . The optical modulation transfer function curve of the secondary image plane of the imaging optical system of this embodiment is shown in FIG. 5 .

表1实施例1中成像光学系统参数Imaging optical system parameters in Table 1 Embodiment 1

参数parameter 数值Numerical value 工作波段working band 0.46~0.65μm0.46~0.65μm 视场角Field of view ±0.8°±0.8° 系统焦距System focal length 1000mm1000mm F数F number 55

实施例2Example 2

本实施例与实施例1选取相同的DMD微镜阵列230与探测器260,成像光学系统200参数与实施例1相同,见表1。二次成像系统使用共轴的折反射式结构,区别于实施例1,以此说明DMD微镜阵列作为中间像面的成像光学系统中的成像镜组具有可替代性,以满足不同使用需求。In this embodiment and embodiment 1, the same DMD micromirror array 230 and detector 260 are selected, and the parameters of the imaging optical system 200 are the same as those in embodiment 1, see Table 1. The secondary imaging system uses a coaxial catadioptric structure, which is different from Embodiment 1. This shows that the DMD micromirror array is replaceable as the imaging mirror group in the imaging optical system of the intermediate image plane to meet different application requirements.

本实施例中成像光学系统200的设计如图6所示,遵循右手坐标法则,Z轴为系统光轴,且与DMD微镜阵列230的基底法线相重合。光线入射方向与Z轴平行,指向正方向。The design of the imaging optical system 200 in this embodiment is shown in FIG. 6 , following the right-handed coordinate rule, and the Z axis is the optical axis of the system, which coincides with the base normal of the DMD micromirror array 230 . The light incident direction is parallel to the Z axis and points in the positive direction.

目标物体发出的光经第一离轴反射镜210会聚,进入第一透镜组220,成像于DMD微镜阵列230上。成像光束由DMD微镜阵列230反射后再次经过第一透镜组220,经第二离轴反射镜240准直,进入成像镜组250,经其会聚,最终成像于探测器260。第一离轴反射镜210以口径离轴的方式在YOZ平面内沿+Y方向偏置300mm。第一透镜组220由4片透镜组成,均为球面镜,结构布局见图2。光束在经过第一透镜组220后,在YOZ平面内,轴上主光线以与系统光轴约17°夹角入射到DMD微镜阵列230上。DMD微镜阵列230的法线与系统光轴的夹角为12°。光束经DMD微镜阵列230反射后,轴上主光线在XOZ平面内以与系统光轴约17°夹角出射,再次经过第一透镜组220和第二离轴反射镜240的准直,进入成像组件250,最终成像于探测器260上。第二离轴反射镜240在XOZ平面内,以口径离轴的方式,沿+X方向偏置300mm。第一离轴反射镜210与第二离轴反射镜240具有完全一致的面型参数,光线在两块离轴反射镜之间所经光路关于DMD微镜阵列230的法线对称,第二离轴反射镜240绕DMD微镜阵列230的法线顺时针旋转90°后与第一离轴反射镜210重合。成像镜组250为共轴折反射式结构,结构如图6所示,成像镜组250包括依次设置的第一透镜251、第二透镜252、第一反射镜253、第三透镜254、第四透镜255、第五透镜256、第六透镜257和第二反射镜258。第一透镜251、第二透镜252、第一反射镜253、第三透镜254、第四透镜255、第五透镜256、第六透镜257和第二反射镜258均为球面镜。The light emitted by the target object is converged by the first off-axis mirror 210 , enters the first lens group 220 , and is imaged on the DMD micromirror array 230 . The imaging beam is reflected by the DMD micromirror array 230 and passes through the first lens group 220 again, collimated by the second off-axis mirror 240 , enters the imaging mirror group 250 , converges there, and finally images on the detector 260 . The first off-axis mirror 210 is offset by 300 mm along the +Y direction in the YOZ plane in an aperture off-axis manner. The first lens group 220 is composed of 4 lenses, all of which are spherical mirrors. The structural layout is shown in FIG. 2 . After the light beam passes through the first lens group 220, in the YOZ plane, the on-axis chief ray is incident on the DMD micromirror array 230 at an angle of about 17° to the system optical axis. The included angle between the normal of the DMD micromirror array 230 and the optical axis of the system is 12°. After the light beam is reflected by the DMD micromirror array 230, the on-axis chief ray exits in the XOZ plane at an angle of about 17° with the system optical axis, and is collimated by the first lens group 220 and the second off-axis mirror 240 again, and enters the The imaging component 250 is finally imaged on the detector 260 . The second off-axis mirror 240 is offset by 300 mm along the +X direction in the XOZ plane in an off-axis manner. The first off-axis reflector 210 and the second off-axis reflector 240 have completely consistent surface parameters, and the light path between the two off-axis reflectors is symmetrical about the normal of the DMD micromirror array 230, and the second off-axis reflector The on-axis mirror 240 is rotated clockwise by 90° around the normal of the DMD micromirror array 230 and coincides with the first off-axis mirror 210 . The imaging mirror group 250 is a coaxial catadioptric structure. lens 255 , fifth lens 256 , sixth lens 257 and second mirror 258 . The first lens 251 , the second lens 252 , the first reflecting mirror 253 , the third lens 254 , the fourth lens 255 , the fifth lens 256 , the sixth lens 257 and the second reflecting mirror 258 are all spherical mirrors.

实施例2的成像光学系统200的二次像面的光学调制传递函数曲线见图9。The optical modulation transfer function curve of the secondary image plane of the imaging optical system 200 of Embodiment 2 is shown in FIG. 9 .

本发明提供的DMD微镜阵列作为中间像面的成像光学系统,利用DMD微镜阵列的工作特性,实现了DMD微镜阵列与探测器像元的一一匹配,达到调整探测器像面灰度的目的,从而扩大光电成像系统的探测动态范围,满足高动态辐射能量特性场景测量和观察的需求,可应用于深空探测,医学成像,军事观测等领域。上述成像光学系统,在DMD微镜阵列所在的一次像面上,各视场光学调制传递函数在Nyquist频率处均大于0.70,畸变接近于0。此外,上述成像光学系统将DMD微镜阵列置于中间像面且采用了部分对称的结构形式,使得从一次像面出射的光束为近准直光,实现了成像镜组的可替换性,扩展了上述成像光学系统的适用性,用户可根据实际需求来选择适合的成像镜组结构形式。与此同时,上述成像光学系统具有成像质量好,结构紧凑,加工、装调难度低等有点。The DMD micromirror array provided by the present invention is used as the imaging optical system of the intermediate image plane, and utilizes the working characteristics of the DMD micromirror array to realize the one-to-one matching between the DMD micromirror array and the detector pixel, so as to adjust the gray scale of the detector image plane The purpose of this is to expand the detection dynamic range of the photoelectric imaging system and meet the needs of scene measurement and observation of high dynamic radiation energy characteristics. It can be applied to deep space detection, medical imaging, military observation and other fields. In the above-mentioned imaging optical system, on the primary image plane where the DMD micromirror array is located, the optical modulation transfer function of each field of view is greater than 0.70 at the Nyquist frequency, and the distortion is close to 0. In addition, the above-mentioned imaging optical system places the DMD micromirror array on the intermediate image plane and adopts a partially symmetrical structure, so that the beam emitted from the primary image plane is nearly collimated light, which realizes the replaceability of the imaging lens group and expands Considering the applicability of the above-mentioned imaging optical system, the user can choose the appropriate structural form of the imaging lens group according to actual needs. At the same time, the above-mentioned imaging optical system has the advantages of good imaging quality, compact structure, and low difficulty in processing and assembly.

以上所述本发明的具体实施方式,并不构成对本发明保护范围的限定。任何根据本发明的技术构思所作出的各种其他相应的改变与变形,均应包含在本发明权利要求的保护范围内。The specific embodiments of the present invention described above do not constitute a limitation to the protection scope of the present invention. Any other corresponding changes and modifications made according to the technical concept of the present invention shall be included in the protection scope of the claims of the present invention.

Claims (8)

1.一种成像光学系统,其特征在于,包括第一离轴反射镜、第一透镜组、DMD微镜阵列、第二离轴反射镜、成像镜组和探测器,目标物体发出的光经所述第一离轴反射镜会聚,进入所述第一透镜组,成像于所述DMD微镜阵列上,成像光束由所述DMD微镜阵列反射后再次经过所述第一透镜组,然后经所述第二离轴反射镜准直后,进入所述成像镜组,然后成像于所述探测器上;1. an imaging optical system, is characterized in that, comprises the first off-axis reflector, the first lens group, DMD micromirror array, the second off-axis reflector, imaging mirror group and detector, and the light that target object sends passes through The first off-axis reflector converges, enters the first lens group, and is imaged on the DMD micromirror array, and the imaging beam passes through the first lens group again after being reflected by the DMD micromirror array, and then passes through the first lens group. After the second off-axis mirror is collimated, it enters the imaging mirror group, and then forms an image on the detector; 所述成像光学系统的设计遵循右手坐标法则,Z轴为系统光轴,且与所述DMD微镜阵列的基底法线相重合,光线入射方向与Z轴平行,指向正方向;The design of the imaging optical system follows the right-hand coordinate rule, the Z axis is the system optical axis, and coincides with the base normal of the DMD micromirror array, and the light incident direction is parallel to the Z axis and points to the positive direction; 所述第一离轴反射镜在YOZ平面内,以口径离轴的方式,沿Y方向偏置,偏置量不小于所述第一离轴反射镜的通光口径,所述第二离轴反射镜在XOZ平面内,以口径离轴的方式,沿X方向偏置,所述第二离轴反射镜沿X方向的偏置量与所述第一离轴反射镜沿Y方向的偏置量相同,所述第一离轴反射镜与所述第二离轴反射镜具有相同的面型参数,光线在两块离轴反射镜之间所经过的光路关于所述DMD微镜阵列的法线对称,所述第二离轴反射镜绕所述DMD微镜阵列的法线顺时针旋转90°后与所述第一离轴反射镜重合。The first off-axis reflector is offset along the Y direction with an aperture off-axis in the YOZ plane, and the offset amount is not less than the light aperture of the first off-axis reflector, and the second off-axis reflector The reflector is offset along the X direction in an off-axis manner in the XOZ plane, and the offset amount of the second off-axis reflector along the X direction is the same as the offset of the first off-axis reflector along the Y direction The amount is the same, the first off-axis reflector and the second off-axis reflector have the same surface parameters, and the light path passed between the two off-axis reflectors is about the law of the DMD micromirror array. Line symmetry, the second off-axis reflector coincides with the first off-axis reflector after rotating 90° clockwise around the normal of the DMD micromirror array. 2.根据权利要求1所述的成像光学系统,其特征在于,所述成像光学系统的入瞳位于光束入射方向上所述第一离轴反射镜之后。2 . The imaging optical system according to claim 1 , wherein an entrance pupil of the imaging optical system is located behind the first off-axis mirror in the incident direction of the light beam. 3 . 3.根据权利要求1所述的成像光学系统,其特征在于,所述第一离轴反射镜和所述第二离轴反射镜均为凹面的二次曲面,具有负光焦度。3 . The imaging optical system according to claim 1 , wherein both the first off-axis reflector and the second off-axis reflector are concave quadric surfaces with negative refractive power. 4 . 4.根据权利要求3所述的成像光学系统,其特征在于,所述第一离轴反射镜与所述第二离轴反射镜的二次曲面的面型表达式均为:4. The imaging optical system according to claim 3, wherein the surface expressions of the quadric surfaces of the first off-axis mirror and the second off-axis mirror are:
Figure FDA0002153678910000011
Figure FDA0002153678910000011
其中,Z为面型矢高,C为顶点曲率半径,K为二次曲面系数,r为径向坐标。Among them, Z is the surface sagittal height, C is the curvature radius of the vertex, K is the quadratic surface coefficient, and r is the radial coordinate.
5.根据权利要求1所述的成像光学系统,其特征在于,所述第一透镜组由依次设置的4片透镜构成,所述4片透镜均为球面镜,所述第一透镜组具有负光焦度。5. The imaging optical system according to claim 1, wherein the first lens group is composed of 4 lenses arranged in sequence, and the 4 lenses are all spherical mirrors, and the first lens group has negative light Focus. 6.根据权利要求1所述的成像光学系统,其特征在于,所述DMD微镜阵列的尺寸为2560×1600、1920×1080或1024×768。6. The imaging optical system according to claim 1, wherein the size of the DMD micromirror array is 2560×1600, 1920×1080 or 1024×768. 7.根据权利要求1所述的成像光学系统,其特征在于,所述成像镜组为折反射式结构,包括沿光路设置的第三离轴反射镜和第二透镜组,所述第三离轴反射镜和所述第一离轴反射镜具有相同的参数,所述第二透镜组和所述第一透镜组具有相同的参数。7. The imaging optical system according to claim 1, wherein the imaging mirror group is a catadioptric structure, comprising a third off-axis reflector and a second lens group arranged along the optical path, the third off-axis The on-axis mirror has the same parameters as the first off-axis mirror, and the second lens group has the same parameters as the first lens group. 8.根据权利要求1所述的成像光学系统,其特征在于,所述第一离轴反射镜和所述第二离轴反射镜的材料均为微晶、融石英或碳化硅。8 . The imaging optical system according to claim 1 , wherein materials of the first off-axis reflector and the second off-axis reflector are both microcrystalline, fused silica or silicon carbide.
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