JP6015738B2 - 処理装置、処理方法及び記憶媒体 - Google Patents

処理装置、処理方法及び記憶媒体 Download PDF

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JP6015738B2
JP6015738B2 JP2014238132A JP2014238132A JP6015738B2 JP 6015738 B2 JP6015738 B2 JP 6015738B2 JP 2014238132 A JP2014238132 A JP 2014238132A JP 2014238132 A JP2014238132 A JP 2014238132A JP 6015738 B2 JP6015738 B2 JP 6015738B2
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processing
processing container
loading
substrate
lid
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JP2015039040A (ja
JP2015039040A5 (enExample
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源太郎 五師
源太郎 五師
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Tokyo Electron Ltd
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JP2015039040A5 JP2015039040A5 (enExample) 2015-06-18
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Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6734918B2 (ja) 2016-04-28 2020-08-05 ギガフォトン株式会社 タンク、ターゲット生成装置、及び、極端紫外光生成装置
JP7362300B2 (ja) * 2019-06-04 2023-10-17 東京エレクトロン株式会社 基板処理装置及びその制御方法
JP7406385B2 (ja) 2020-01-31 2023-12-27 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置および基板処理システム
JP7353213B2 (ja) * 2020-02-28 2023-09-29 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置および基板処理方法
JP7557352B2 (ja) 2020-11-30 2024-09-27 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置および基板処理方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000340540A (ja) * 1999-05-31 2000-12-08 Hitachi Koki Co Ltd 超臨界乾燥装置
JP2003056703A (ja) * 2001-08-10 2003-02-26 Itec Co Ltd 高圧流体容器
US6666928B2 (en) * 2001-09-13 2003-12-23 Micell Technologies, Inc. Methods and apparatus for holding a substrate in a pressure chamber
JP5708506B2 (ja) * 2011-04-20 2015-04-30 東京エレクトロン株式会社 処理装置

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