JP2015039040A5 - - Google Patents

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Publication number
JP2015039040A5
JP2015039040A5 JP2014238132A JP2014238132A JP2015039040A5 JP 2015039040 A5 JP2015039040 A5 JP 2015039040A5 JP 2014238132 A JP2014238132 A JP 2014238132A JP 2014238132 A JP2014238132 A JP 2014238132A JP 2015039040 A5 JP2015039040 A5 JP 2015039040A5
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JP
Japan
Prior art keywords
substrate
processed
loading
processing container
unloading port
Prior art date
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Application number
JP2014238132A
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English (en)
Japanese (ja)
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JP2015039040A (ja
JP6015738B2 (ja
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Priority to JP2014238132A priority Critical patent/JP6015738B2/ja
Priority claimed from JP2014238132A external-priority patent/JP6015738B2/ja
Publication of JP2015039040A publication Critical patent/JP2015039040A/ja
Publication of JP2015039040A5 publication Critical patent/JP2015039040A5/ja
Application granted granted Critical
Publication of JP6015738B2 publication Critical patent/JP6015738B2/ja
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JP2014238132A 2014-11-25 2014-11-25 処理装置、処理方法及び記憶媒体 Active JP6015738B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2014238132A JP6015738B2 (ja) 2014-11-25 2014-11-25 処理装置、処理方法及び記憶媒体

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2014238132A JP6015738B2 (ja) 2014-11-25 2014-11-25 処理装置、処理方法及び記憶媒体

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP2011163430A Division JP5655735B2 (ja) 2011-07-26 2011-07-26 処理装置、処理方法及び記憶媒体

Publications (3)

Publication Number Publication Date
JP2015039040A JP2015039040A (ja) 2015-02-26
JP2015039040A5 true JP2015039040A5 (enExample) 2015-06-18
JP6015738B2 JP6015738B2 (ja) 2016-10-26

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ID=52631906

Family Applications (1)

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JP2014238132A Active JP6015738B2 (ja) 2014-11-25 2014-11-25 処理装置、処理方法及び記憶媒体

Country Status (1)

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JP (1) JP6015738B2 (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6734918B2 (ja) 2016-04-28 2020-08-05 ギガフォトン株式会社 タンク、ターゲット生成装置、及び、極端紫外光生成装置
JP7362300B2 (ja) * 2019-06-04 2023-10-17 東京エレクトロン株式会社 基板処理装置及びその制御方法
JP7406385B2 (ja) 2020-01-31 2023-12-27 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置および基板処理システム
JP7353213B2 (ja) 2020-02-28 2023-09-29 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置および基板処理方法
JP7557352B2 (ja) 2020-11-30 2024-09-27 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置および基板処理方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000340540A (ja) * 1999-05-31 2000-12-08 Hitachi Koki Co Ltd 超臨界乾燥装置
JP2003056703A (ja) * 2001-08-10 2003-02-26 Itec Co Ltd 高圧流体容器
US6666928B2 (en) * 2001-09-13 2003-12-23 Micell Technologies, Inc. Methods and apparatus for holding a substrate in a pressure chamber
JP5708506B2 (ja) * 2011-04-20 2015-04-30 東京エレクトロン株式会社 処理装置

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