JP5956975B2 - 液処理装置及び液処理方法 - Google Patents

液処理装置及び液処理方法 Download PDF

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JP5956975B2
JP5956975B2 JP2013259068A JP2013259068A JP5956975B2 JP 5956975 B2 JP5956975 B2 JP 5956975B2 JP 2013259068 A JP2013259068 A JP 2013259068A JP 2013259068 A JP2013259068 A JP 2013259068A JP 5956975 B2 JP5956975 B2 JP 5956975B2
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supply
liquid
pump
valve
processing liquid
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JP2014082513A (ja
JP2014082513A5 (enExample
Inventor
吉原　孝介
孝介 吉原
克憲 一野
克憲 一野
智伸 古庄
智伸 古庄
卓志 佐々
卓志 佐々
勝裕 土屋
勝裕 土屋
寺下　裕一
裕一 寺下
博史 竹口
博史 竹口
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Tokyo Electron Ltd
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Tokyo Electron Ltd
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  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
JP2013259068A 2012-02-27 2013-12-16 液処理装置及び液処理方法 Active JP5956975B2 (ja)

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JP2013259068A JP5956975B2 (ja) 2012-02-27 2013-12-16 液処理装置及び液処理方法

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JP2012039538 2012-02-27
JP2012039538 2012-02-27
JP2013259068A JP5956975B2 (ja) 2012-02-27 2013-12-16 液処理装置及び液処理方法

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JP2012288515A Division JP5439579B2 (ja) 2012-02-27 2012-12-28 液処理装置及び液処理方法

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JP2014082513A JP2014082513A (ja) 2014-05-08
JP2014082513A5 JP2014082513A5 (enExample) 2015-02-19
JP5956975B2 true JP5956975B2 (ja) 2016-07-27

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Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6420604B2 (ja) * 2014-09-22 2018-11-07 株式会社Ｓｃｒｅｅｎホールディングス 塗布装置
JP6987649B2 (ja) * 2018-01-12 2022-01-05 株式会社Ｓｃｒｅｅｎホールディングス 処理液供給装置及びその脱気方法
JP7190291B2 (ja) * 2018-09-04 2022-12-15 東京エレクトロン株式会社 フィルタユニット、液処理システム及び液処理方法
KR102622445B1 (ko) * 2020-04-24 2024-01-09 세메스 주식회사 기판 처리 장치 및 액 공급 방법

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05267149A (ja) * 1992-03-19 1993-10-15 Fujitsu Ltd レジスト送液装置
JP3461725B2 (ja) * 1998-06-26 2003-10-27 東京エレクトロン株式会社 処理液供給装置及び処理液供給方法
JP2000068197A (ja) * 1998-08-20 2000-03-03 Ishikawa Seisakusho Ltd 気泡発生防止兼用気泡除去装置
JP4011210B2 (ja) * 1998-10-13 2007-11-21 株式会社コガネイ 薬液供給方法および薬液供給装置
JP3686822B2 (ja) * 2000-05-19 2005-08-24 東京エレクトロン株式会社 現像処理装置および現像処理方法
JP3947398B2 (ja) * 2001-12-28 2007-07-18 株式会社コガネイ 薬液供給装置および薬液供給方法
JP4879253B2 (ja) * 2008-12-04 2012-02-22 東京エレクトロン株式会社 処理液供給装置
JP5439579B2 (ja) * 2012-02-27 2014-03-12 東京エレクトロン株式会社 液処理装置及び液処理方法

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