JP5942190B2 - Oblique-incidence X-ray imaging optical device using double reflection type X-ray mirror - Google Patents
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- 230000003287 optical effect Effects 0.000 title claims description 53
- 238000003384 imaging method Methods 0.000 title claims description 33
- 239000000758 substrate Substances 0.000 claims description 30
- 230000004075 alteration Effects 0.000 claims description 24
- 206010010071 Coma Diseases 0.000 claims description 13
- 239000011521 glass Substances 0.000 claims description 8
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 7
- 229910052710 silicon Inorganic materials 0.000 claims description 7
- 239000010703 silicon Substances 0.000 claims description 7
- 230000003746 surface roughness Effects 0.000 claims description 5
- 239000013078 crystal Substances 0.000 claims description 4
- 238000009304 pastoral farming Methods 0.000 claims description 3
- 238000013461 design Methods 0.000 description 7
- 238000012545 processing Methods 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 239000010419 fine particle Substances 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 238000003754 machining Methods 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 1
- JJWKPURADFRFRB-UHFFFAOYSA-N carbonyl sulfide Chemical compound O=C=S JJWKPURADFRFRB-UHFFFAOYSA-N 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000012634 optical imaging Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 238000004088 simulation Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229910021642 ultra pure water Inorganic materials 0.000 description 1
- 239000012498 ultrapure water Substances 0.000 description 1
Description
本発明は、色収差やコマ収差なしで２００ｎｍ以下の分解能を有する斜入射Ｘ線結像光学系に用いる二重反射型Ｘ線ミラーを用いた斜入射Ｘ線結像光学装置に関するものである。 The present invention relates to an oblique incidence X-ray imaging optical apparatus using a double reflection X-ray mirror used in an oblique incidence X-ray imaging optical system having a resolution of 200 nm or less without chromatic aberration and coma.
結像型Ｘ線顕微鏡などＸ線を利用する高度なＸ線光学装置を構築するためには、高性能なＸ線結像光学素子が必要となる。その光イメージングデバイスの有望な候補としては、フレネルゾーンプレート、Ｘ線屈折レンズ、Kirkpatrick−Baez（ＫＢ）ミラー、Wolterミラーがある。フレネルゾーンプレートとＸ線屈折レンズは、サブ５０ｎｍの分解能を実現するために十分に正確に製造することができる。しかし、Ｘ線屈折レンズやフレネルゾーンプレートは、屈折と回折によって生じる色収差のため多色のイメージングには適してない。ＫＢミラーは、全反射を採用しているので色収差はないが、斜入射光学系における単枚の反射ではアッベの正弦条件を満たすことができないため、コマ収差が生じて分解能と視野（ＦＯＶ）を減少させる。 In order to construct an advanced X-ray optical apparatus using X-rays such as an imaging X-ray microscope, a high-performance X-ray imaging optical element is required. Promising candidates for the optical imaging device include a Fresnel zone plate, an X-ray refractive lens, a Kirkpatrick-Baez (KB) mirror, and a Wolter mirror. The Fresnel zone plate and the X-ray refractive lens can be manufactured sufficiently accurately to achieve sub-50 nm resolution. However, X-ray refractive lenses and Fresnel zone plates are not suitable for multicolor imaging due to chromatic aberration caused by refraction and diffraction. The KB mirror has no chromatic aberration because it employs total reflection, but a single reflection in an oblique incidence optical system cannot satisfy the Abbe's sine condition, resulting in coma and reducing resolution and field of view (FOV). Decrease.
それに対して、Wolterミラーは、円筒状の内面での２回の全反射を利用したＸ線ミラーであり、色収差はなく、しかも光軸から離れた物点の像の歪み（コマ収差）も少ないという特徴を備えている（特許文献１）。Wolter光学系は、回転楕円面と回転双曲面（若しくは回転放物面と回転双曲面）を組み合わせた斜入射光学系である。楕円と双曲の焦点を一致させることで、光路長一定と反射光がすべて同一焦点に集まるという性質を併せ持っている。重要な点はそれぞれの反射面が高い精度で配置される必要があるという点である。しかし、Wolterミラーは、円筒状内面の精密加工を必要とするため、エネルギーがkeV級のＸ線に対して回折限界を実現できる精度でミラーを作製したという報告例はないほど作製の難易度は高い。例えば、１００ｎｍ以下の分解能を達成するためには、ミラーを形状誤差数ｎｍの精度で作製する必要があるが、これを実現したという報告はない。 The Wolter mirror, on the other hand, is an X-ray mirror that uses two total reflections on the cylindrical inner surface, has no chromatic aberration, and has little distortion (coma aberration) of an image of an object point away from the optical axis. (Patent document 1). The Wolter optical system is an oblique incidence optical system that combines a spheroid and a rotating hyperboloid (or a rotating paraboloid and a rotating hyperboloid). By matching the focal points of the ellipse and the hyperbola, the optical path length is constant and the reflected light is all collected at the same focal point. The important point is that each reflecting surface needs to be arranged with high accuracy. However, since the Wolter mirror requires precision machining of the cylindrical inner surface, the degree of difficulty in fabrication is so high that there is no report of producing a mirror with an accuracy that can achieve the diffraction limit for X-rays whose energy is keV class. high. For example, in order to achieve a resolution of 100 nm or less, it is necessary to manufacture a mirror with an accuracy of a shape error of several nm, but there is no report that this has been realized.
特許文献２には、Ｘ線の反射に供しうる程度の平滑度を有するシリコンウェハを、塑性変形することによって、回転法物面の一部と回転双曲面の一部とを含む所定の曲面形状の反射面を形成し、これを光軸となる直線の周囲に平行に複数配置して宇宙空間で使用する軽量なWolterミラーを構成する点が開示されている。ここで、シリコンウェハの表面を所定の曲面形状とするには、シリコンウェハの表面に所定の曲面形状を有する母型により圧力及び熱を加えて塑性変形させるのである。しかし、このように製作したWolterミラーは、剛性に乏しく、重力、温度ドリフト、振動等がある地上で反射面形状を高精度に保つことは困難である。 Patent Document 2 discloses a predetermined curved surface shape including a part of a rotation method surface and a part of a rotation hyperboloid by plastically deforming a silicon wafer having a degree of smoothness that can be used for X-ray reflection. A light-weight Wolter mirror that is used in outer space is configured by forming a plurality of reflecting surfaces in parallel around a straight line serving as an optical axis. Here, in order to make the surface of the silicon wafer have a predetermined curved surface shape, the surface of the silicon wafer is plastically deformed by applying pressure and heat to a matrix having a predetermined curved surface shape. However, the Wolter mirror manufactured in this way has poor rigidity, and it is difficult to maintain the shape of the reflecting surface with high precision on the ground where gravity, temperature drift, vibration, etc. exist.
一方では、非特許文献１では、色収差、コマ収差、波面収差の問題を克服するため、２枚の楕円ミラーと２枚の双曲ミラーを、ＫＢミラーのように互いに垂直に配向させて構成されるAdvanced Kirkpatrick-Baez（ＡＫＢ）ミラーが提案されている。ＡＫＢミラーは、４枚の全反射非球面ミラーで構成された光学系であり、アッベの正弦条件を満たし、前述の収差の問題は解消される。最近の高精度な加工技術を用いれば、各々のＸ線ミラーを形状誤差が５ｎｍ以下で作製することは比較的容易であるが、４枚のミラーを高精度にアライメントすることは難しい。非特許文献１では、μｍオーダの分解能を達成することを目的としているが、１００ｎｍ以下の分解能を達成するためには、４枚のミラーを高精度(位置精度がμｍオーダ、角度精度がμradオーダ)に配置する必要があるため、取り扱いの煩雑さ並びに安定性（温度ドリフト、振動）に問題がある。尚、ＫＢミラーでは、２枚の水平楕円ミラーと垂直楕円ミラーを正確に直交するように調節でき、Ｘ線光学系のアライメント作業を簡単にできるＸ線集光装置が提案されている（特許文献３）。 On the other hand, in Non-Patent Document 1, in order to overcome the problems of chromatic aberration, coma aberration, and wavefront aberration, two elliptical mirrors and two hyperbolic mirrors are oriented perpendicular to each other like a KB mirror. Advanced Kirkpatrick-Baez (AKB) mirrors have been proposed. The AKB mirror is an optical system composed of four total reflection aspherical mirrors, satisfies Abbe's sine condition, and eliminates the aforementioned aberration problem. If a recent high-precision processing technique is used, it is relatively easy to manufacture each X-ray mirror with a shape error of 5 nm or less, but it is difficult to align the four mirrors with high accuracy. Non-Patent Document 1 aims to achieve a resolution of the order of μm, but in order to achieve a resolution of 100 nm or less, four mirrors are highly accurate (position accuracy is on the order of μm, angle accuracy is on the order of μrad). ), There is a problem in handling complexity and stability (temperature drift, vibration). As the KB mirror, an X-ray condensing device has been proposed in which two horizontal ellipsoidal mirrors and vertical ellipsoidal mirrors can be adjusted so as to be accurately orthogonal to each other, and the alignment work of the X-ray optical system can be simplified (Patent Document). 3).
そこで、本発明が前述の状況に鑑み、解決しようとするところは、エネルギーがkeV級のＸ線に対して回折限界を実現できる精度で作製できるＡＫＢミラーの特性を生かしつつ、色収差やコマ収差がないWolterミラーの特徴を兼ね備え、しかも取り扱いが容易で、高精度にアライメントすることが比較的容易な二重反射型Ｘ線ミラーを用いた斜入射Ｘ線結像光学装置を提供する点にある。 Therefore, in view of the above-mentioned situation, the present invention intends to solve the problem that chromatic aberration and coma aberration are obtained while taking advantage of the characteristics of an AKB mirror that can be manufactured with an accuracy capable of realizing a diffraction limit for X-rays with energy of keV. The present invention provides a grazing incidence X-ray imaging optical apparatus using a double reflection X-ray mirror that has the characteristics of a Wolter mirror that is not easy to handle, and that is easy to handle and relatively easy to align with high accuracy.
本発明は、前述の課題解決のために、斜入射Ｘ線結像光学系に用いる一次元一体型のＸ線ミラーであって、同一基板上にＸ線反射面となる楕円形状ミラー又は放物線形状ミラーの何れか一方からなる第１ミラー部と双曲線形状ミラーからなる第２ミラー部が、幾何学的な焦点が一致するように光軸方向に沿って直列に配置されるとともに、反射面の形状精度が５ｎｍ以下且つ表面粗さが０．５ｎｍＲＭＳ以下の精度で作製され、Ｘ線が第１ミラー部と第２ミラー部とで連続的に二重反射する二重反射型Ｘ線ミラーを２枚用い、１枚は水平方向と平行な反射面を有し、垂直面内で集光するための水平Ｘ線ミラーであり、もう１枚は垂直方向と平行な反射面を有し、水平面内で集光するための垂直Ｘ線ミラーであり、前記水平Ｘ線ミラーと垂直Ｘ線ミラーは同一の焦点を持ち、互いに直交するように光軸方向に直列に配置し、色収差やコマ収差なしで２００ｎｍ以下の分解能を有することを特徴とする二重反射型Ｘ線ミラーを用いた斜入射Ｘ線結像光学装置を構成した（請求項１）。 In order to solve the above-mentioned problems, the present invention is a one-dimensional integrated X-ray mirror used in an oblique incidence X-ray imaging optical system, and an elliptical mirror or a parabolic shape serving as an X-ray reflecting surface on the same substrate. The first mirror part made of either one of the mirrors and the second mirror part made of a hyperbolic mirror are arranged in series along the optical axis direction so that the geometric focal points coincide with each other, and the shape of the reflection surface Two double-reflective X-ray mirrors with an accuracy of 5 nm or less and a surface roughness of 0.5 nm RMS or less, and X-rays are continuously double-reflected by the first mirror part and the second mirror part One is a horizontal X-ray mirror that has a reflective surface parallel to the horizontal direction and collects light in the vertical plane, and the other has a reflective surface parallel to the vertical direction, and is in a horizontal plane. A vertical X-ray mirror for condensing the horizontal X-ray mirror and the vertical X-ray mirror; Mirrors have the same focus with double reflection type X-ray mirror, characterized in that arranged in series, having the following resolution without chromatic aberration and coma aberration 200nm in the optical axis direction so as to be perpendicular to each other obliquely An incident X-ray imaging optical device was constructed (claim 1).
ここで、点光源又は実質的に点光源と見なせるスリットを第１焦点とした楕円と、該楕円のもう一方の第２焦点と双曲線の第２焦点を一致させ、前記楕円と双曲線が交差する部分を含む該楕円と双曲線の曲線形状を持つ二つのＸ線反射面を同一基板上に作り込み、前記楕円の第１焦点から出射されたＸ線が楕円部分に対応する第１ミラー部に反射した後、双曲線部分に対応する第２ミラー部で反射し、該双曲線の第１焦点に集光されるように設定した（請求項２）。 Here, an ellipse whose first focus is a point light source or a slit that can be regarded as a point light source substantially coincides with the other second focus of the ellipse and the second focus of the hyperbola, and the ellipse and the hyperbola intersect. Two X-ray reflecting surfaces having the elliptical shape and the hyperbolic curved shape are formed on the same substrate, and the X-ray emitted from the first focal point of the ellipse is reflected to the first mirror portion corresponding to the elliptical portion. Thereafter, the light is reflected by the second mirror portion corresponding to the hyperbola portion and focused on the first focal point of the hyperbola (claim 2).
あるいは、放物線の焦点と双曲線の第２焦点を一致させ、前記放物線と双曲線が交差する部分を含む該放物線と双曲線の曲線形状を持つ二つのＸ線反射面を同一基板上に作り込み、無限遠から出射されたＸ線あるいは平行なＸ線が放物線部分に対応する第１ミラー部に反射した後、双曲線部分に対応する第２ミラー部で反射し、該双曲線の第１焦点に集光されるように設定した（請求項３）。 Alternatively, two X-ray reflecting surfaces having a parabolic and hyperbolic curve shape including a portion where the parabola and the hyperbola intersect with each other are made on the same substrate by matching the focal point of the parabola with the second focal point of the hyperbola. The emitted X-rays or parallel X-rays are reflected by the first mirror part corresponding to the parabola part, then reflected by the second mirror part corresponding to the hyperbola part, and condensed on the first focal point of the hyperbola. (Claim 3).
そして、前記第１ミラー部と第２ミラー部の境界に、両面に連続する緩衝部を設け、該緩衝部で反射されるＸ線が迷光とならないようにしてなることがより好ましい（請求項４）。 It is more preferable that a buffer part continuous on both surfaces is provided at the boundary between the first mirror part and the second mirror part so that X-rays reflected by the buffer part do not become stray light. ).
また、前記基板が、ガラス基板又はシリコン単結晶基板である（請求項５）。 The substrate is a glass substrate or a silicon single crystal substrate.
以上にしてなる本発明に用いる二重反射型Ｘ線ミラーは、色収差やコマ収差なしで２００ｎｍ以下の分解能を有する斜入射Ｘ線結像光学系に用いる一次元一体型のＸ線ミラーであって、同一基板上にＸ線反射面となる楕円形状ミラー又は放物線形状ミラーの何れか一方からなる第１ミラー部と双曲線形状ミラーからなる第２ミラー部が、幾何学的な焦点が一致するように光軸方向に沿って直列に配置されるとともに、反射面の形状精度が５ｎｍ以下且つ表面粗さが０．５ｎｍＲＭＳ以下の精度で作製され、Ｘ線が第１ミラー部と第２ミラー部とで連続的に二重反射するので、エネルギーがkeV級のＸ線に対して回折限界を実現できる精度で作製できるＡＫＢミラーの特性を生かしつつ、色収差やコマ収差がないWolterミラーの特徴を兼ね備え、しかも取り扱いが容易で、高精度にアライメントすることが比較的容易であるという優れた効果を有する。 The double reflection type X-ray mirror used in the present invention as described above is a one-dimensional integrated X-ray mirror used in an oblique incidence X-ray imaging optical system having a resolution of 200 nm or less without chromatic aberration and coma aberration. The geometrical focal point of the first mirror part composed of either an elliptical mirror or a parabolic mirror serving as an X-ray reflecting surface on the same substrate and the second mirror part composed of a hyperbolic mirror are aligned. In addition to being arranged in series along the optical axis direction, the reflective surface has a shape accuracy of 5 nm or less and a surface roughness of 0.5 nm RMS or less, and X-rays are produced by the first mirror unit and the second mirror unit. Since it continuously reflects twice, it has the characteristics of a Wolter mirror that has no chromatic aberration and coma while taking advantage of the characteristics of an AKB mirror that can be manufactured with an accuracy that can achieve the diffraction limit for X-rays with keV energy. Is easy to handle, it has an excellent effect that it is relatively easy to align with high accuracy.
つまり、本発明に用いる二重反射型Ｘ線ミラーは、同一基板上に作製された第１ミラー部と第２ミラー部とで連続的に二重反射するので、アッベの正弦条件を満たようにすることが可能で、結像性能はWolterミラーと同等であり、また第１ミラー部を構成する楕円形状ミラー又は放物線形状ミラーと、第２ミラー部を構成する双曲線形状ミラーは一次元形状ミラーであるので、Wolterミラーとは異なり、ほとんど平坦な形状を持つミラーであるため、ＥＥＭ（Elastic Emission Machining）等の従来技術によって超高精度（形状誤差約２ｎｍ）に作製することが比較的容易である。加工条件が良ければ、反射面の形状精度を１ｎｍ以下且つ表面粗さを０．１ｎｍＲＭＳ以下の精度で作製することも可能であるので、サブ５０ｎｍの分解能を有する斜入射Ｘ線結像光学系を構築できるのである。 That is, the double reflection type X-ray mirror used in the present invention continuously double reflects between the first mirror portion and the second mirror portion manufactured on the same substrate, so that the Abbe sine condition is satisfied. The imaging performance is equivalent to the Wolter mirror, and the elliptical mirror or parabolic mirror constituting the first mirror part and the hyperbola shaped mirror constituting the second mirror part are one-dimensional shape mirrors. Therefore, unlike the Wolter mirror, it is a mirror with an almost flat shape, so it is relatively easy to fabricate with ultra-high accuracy (shape error about 2 nm) by conventional techniques such as EEM (Elastic Emission Machining). . If the processing conditions are good, it is possible to manufacture the reflecting surface with a shape accuracy of 1 nm or less and a surface roughness of 0.1 nm RMS or less. Therefore, an oblique incident X-ray imaging optical system having a sub-50 nm resolution is provided. It can be built.
本発明に用いる二重反射型Ｘ線ミラーは、ガラス基板やシリコン単結晶基板等の同一の基板上に第１ミラー部と第２ミラー部の２つの曲面を作製したため、取り扱いが容易であるとともに安定性の向上を可能にする。これを用いたＸ線顕微鏡は、取り扱い・安定性が向上するため、アライメント時間の短縮と長時間撮像が可能となる。 The double reflection type X-ray mirror used in the present invention is easy to handle because the two curved surfaces of the first mirror portion and the second mirror portion are formed on the same substrate such as a glass substrate or a silicon single crystal substrate. Enables improved stability. Since the X-ray microscope using this improves handling and stability, the alignment time can be shortened and imaging can be performed for a long time.
そして、本発明の二重反射型Ｘ線ミラーを用いた斜入射Ｘ線結像光学装置は、二重反射型Ｘ線ミラーを２枚用い、１枚は水平方向と平行な反射面を有し、垂直面内で集光するための水平Ｘ線ミラーであり、もう１枚は垂直方向と平行な反射面を有し、水平面内で集光するための垂直Ｘ線ミラーであり、前記水平Ｘ線ミラーと垂直Ｘ線ミラーは同一の焦点を持ち、互いに直交するように光軸方向に直列に配置したので、エネルギーがkeV級のＸ線に対して回折限界を実現できる精度で作製できるＡＫＢミラーの特性を生かしつつ、色収差やコマ収差がないWolterミラーの結像性能を備えたものとなる。４枚の非球面Ｘ線ミラーで構成するＡＫＢミラー光学系とは異なり、一次元Wolterミラーが同一の基板上に作製されているため、同一基板上の２つの曲面を高精度にアライメントする必要はなく、この結果、高い安定性（温度ドリフト、振動）が期待でき、Ｘ線顕微鏡で長時間撮像することを可能にする。 The oblique incidence X-ray imaging optical device using the double reflection type X-ray mirror of the present invention uses two double reflection type X-ray mirrors, one of which has a reflection surface parallel to the horizontal direction. , A horizontal X-ray mirror for condensing in a vertical plane, and another one having a reflecting surface parallel to the vertical direction and a vertical X-ray mirror for condensing in a horizontal plane, The X-ray mirror and the vertical X-ray mirror have the same focal point and are arranged in series in the optical axis direction so as to be orthogonal to each other. This makes it possible to have the imaging performance of a Wolter mirror without chromatic aberration and coma while taking advantage of the above characteristics. Unlike the AKB mirror optical system consisting of four aspherical X-ray mirrors, the one-dimensional Wolter mirror is fabricated on the same substrate, so it is necessary to align two curved surfaces on the same substrate with high accuracy. As a result, high stability (temperature drift, vibration) can be expected, and imaging with an X-ray microscope can be performed for a long time.
本発明の光学系を集光光学系として使用した場合、コマ収差がないためアライメント時に入射角誤差が生じたとしても、集光サイズに大きな影響を与えない。コマ収差が存在する単純な楕円形状ミラーの場合、入射角は１μradレベルでアライメントすることが必要であり、ミスアライメントは集光サイズに甚大な影響を与える。また、温度変化に起因するミラーマニピュレータのドリフトにおいても、入射角のアライメントが最も大きく影響する傾向がある。つまり、提案する二重反射型Ｘ線ミラーを集光素子として使用した場合は、入射角のアライメント誤差に対してロバストにすることが可能となり、簡単にアライメントすることができるだけでなく、長時間ビームサイズを安定して使用することが可能となる。 When the optical system of the present invention is used as a condensing optical system, there is no coma aberration, so even if an incident angle error occurs during alignment, the condensing size is not greatly affected. In the case of a simple elliptical mirror in which coma aberration exists, it is necessary to align the incident angle at the 1 μrad level, and misalignment greatly affects the light collection size. In addition, the alignment of the incident angle tends to have the largest influence on the drift of the mirror manipulator caused by the temperature change. In other words, when the proposed double reflection type X-ray mirror is used as a condensing element, it is possible to make robust against the alignment error of the incident angle, and not only can be easily aligned but also the long-time beam. It becomes possible to use the size stably.
次に、添付図面に示した実施形態に基づき、本発明を更に詳細に説明する。本発明は、色収差やコマ収差なしで２００ｎｍ以下の分解能を有する斜入射Ｘ線結像光学系に用いる一次元一体型のＸ線ミラー（Wolterミラー）である。図１は本発明に係る二重反射型Ｘ線ミラーを用いた斜入射Ｘ線結像光学装置におけるミラー配置を示している。この斜入射Ｘ線結像光学装置は、Ｘ線の入射方向によって縮小光学系となったり、拡大光学系となり、主にＸ線を照射した試料からの透過Ｘ線や蛍光Ｘ線や散乱Ｘ線を色収差なく拡大結像させて分析する用途に用いる。 Next, the present invention will be described in more detail based on the embodiments shown in the accompanying drawings. The present invention is a one-dimensional integrated X-ray mirror (Wolter mirror) used in an oblique incidence X-ray imaging optical system having a resolution of 200 nm or less without chromatic aberration and coma. FIG. 1 shows a mirror arrangement in an oblique incidence X-ray imaging optical apparatus using a double reflection type X-ray mirror according to the present invention. This oblique incidence X-ray imaging optical device becomes a reduction optical system or an enlargement optical system depending on the X-ray incident direction, and mainly transmits X-rays, fluorescent X-rays, and scattered X-rays from a sample irradiated with X-rays. Is used for the purpose of analyzing the enlarged image without chromatic aberration.
本発明の斜入射Ｘ線結像光学装置は、二重反射型Ｘ線ミラー１，２を２枚用い、１枚は水平方向と平行な反射面を有し、垂直面内で集光するための水平Ｘ線ミラー１であり、もう１枚は垂直方向と平行な反射面を有し、水平面内で集光するための垂直Ｘ線ミラー２であり、前記水平Ｘ線ミラー１と垂直Ｘ線ミラー２は同一の焦点を持ち、互いに直交するように光軸方向に直列に配置している。即ち、本発明はＫＢミラーの配置と同じであり、ＫＢミラー用に開発されたミラーマニピュレータをそのまま使用して２枚の二重反射型Ｘ線ミラー１，２を高精度にアライメントすることができる。 The oblique incidence X-ray imaging optical apparatus of the present invention uses two double reflection type X-ray mirrors 1 and 2, and one has a reflecting surface parallel to the horizontal direction and is focused in a vertical plane. The other horizontal X-ray mirror 1 is a vertical X-ray mirror 2 having a reflecting surface parallel to the vertical direction and condensing in a horizontal plane. The mirrors 2 have the same focal point and are arranged in series in the optical axis direction so as to be orthogonal to each other. That is, the present invention is the same as the arrangement of the KB mirror, and the mirror manipulator developed for the KB mirror can be used as it is to align the two double reflection type X-ray mirrors 1 and 2 with high accuracy. .
一般的に、Ｘ線は、エネルギーによって、軟Ｘ線（約０．１〜２ｋｅＶ）、Ｘ線（約２〜２０ｋｅＶ）、硬Ｘ線（約２０〜１００ｋｅＶ）と分類されるが、利用分野によってその分類はまちまちであり、Ｘ線の一部を軟Ｘ線に入れたり硬Ｘ線に入れる場合もある。本発明では、軟Ｘ線から硬Ｘ線を対象とし、特に区別せず単にＸ線と表している。 In general, X-rays are classified into soft X-rays (about 0.1 to 2 keV), X-rays (about 2 to 20 keV), and hard X-rays (about 20 to 100 keV) depending on energy. The classification varies, and some X-rays may be put into soft X-rays or hard X-rays. In the present invention, soft X-rays to hard X-rays are targeted, and are simply expressed as X-rays without distinction.
本発明の二重反射型Ｘ線ミラーＷＭは、図２に示すように、同一基板上にＸ線反射面となる楕円形状ミラー又は放物線形状ミラーの何れか一方からなる第１ミラー部５と双曲線形状ミラーからなる第２ミラー部６が、幾何学的な焦点が一致するように光軸方向に沿って直列に配置されるとともに、反射面の形状精度が５ｎｍ以下且つ表面粗さが０．５ｎｍＲＭＳ以下の精度で作製され、Ｘ線が第１ミラー部５と第２ミラー部６とで連続的に二重反射するように構成している。 As shown in FIG. 2, the double reflection type X-ray mirror WM of the present invention includes a first mirror unit 5 formed of either an elliptical mirror or a parabolic mirror serving as an X-ray reflection surface on the same substrate, and a hyperbola. The second mirror section 6 made of a shape mirror is arranged in series along the optical axis direction so that the geometrical focal points coincide with each other, the shape accuracy of the reflecting surface is 5 nm or less, and the surface roughness is 0.5 nm RMS The X-ray is produced with the following accuracy, and is configured such that X-rays are continuously double-reflected by the first mirror unit 5 and the second mirror unit 6.
ここで、前記二重反射型Ｘ線ミラーＷＭとして、第１ミラー部５と第２ミラー部６を作り込む基板には、ガラス基板又はシリコン単結晶基板を用いる。実際には、前記第１ミラー部５と第２ミラー部６の境界に、両面に連続する緩衝部７を設け、該緩衝部７で反射されるＸ線が迷光とならないようにしている。 Here, as the double reflection X-ray mirror WM, a glass substrate or a silicon single crystal substrate is used as a substrate on which the first mirror unit 5 and the second mirror unit 6 are formed. Actually, a buffer part 7 continuous on both surfaces is provided at the boundary between the first mirror part 5 and the second mirror part 6 so that X-rays reflected by the buffer part 7 do not become stray light.
前記二重反射型Ｘ線ミラーＷＭは、一次元一体型のWolterミラーと見ることができる。ここで、一次元とは、反射面の形状が１変数多項式の関数で表現できることを意味し、一体型とは、同一基板上に第１ミラー部５と第２ミラー部６を作り込んだことを意味する。図１は、２組の一次元Wolterミラーが縦横の結像を担うように配置されていることを表している。これによって従来は作製の難しかったWolterミラーや、アライメントが煩雑であったＡＫＢミラー光学系の代替光学系として、色収差なく高分解能（分解能２００ｎｍ以下）な結像が可能となる。 The double reflection type X-ray mirror WM can be regarded as a one-dimensional integrated Wolter mirror. Here, one-dimensional means that the shape of the reflecting surface can be expressed by a function of a one-variable polynomial, and the integrated type means that the first mirror part 5 and the second mirror part 6 are formed on the same substrate. Means. FIG. 1 shows that two sets of one-dimensional Wolter mirrors are arranged so as to carry out vertical and horizontal imaging. As a result, high resolution (resolution of 200 nm or less) without chromatic aberration can be realized as an alternative optical system to the Wolter mirror, which has been difficult to manufacture in the past, and the AKB mirror optical system, which has been complicated to align.
本発明の二重反射型Ｘ線ミラーＷＭは、斜入射光学系であり、それぞれ反射面が平面に近い全反射Ｘ線ミラーである。図３に示すように、点光源又は実質的に点光源と見なせるスリットを第１焦点Ｅ１とした楕円と、該楕円のもう一方の第２焦点Ｅ２と双曲線の第２焦点Ｈ２を一致させ、前記楕円と双曲線が交差する部分を含む該楕円と双曲線の曲線形状を持つ二つのＸ線反射面を同一基板上に作り込み、前記楕円の第１焦点Ｅ１から出射されたＸ線が楕円部分に対応する第１ミラー部５に反射した後、双曲線部分に対応する第２ミラー部６で反射し、該双曲線の第１焦点Ｈ１に集光されるように設定した。 The double reflection type X-ray mirror WM according to the present invention is a grazing incidence optical system, and is a total reflection X-ray mirror in which each reflecting surface is close to a plane. As shown in FIG. 3, an ellipse having a first light source E1 as a point light source or a slit that can be regarded as a point light source substantially coincides with the other second focal point E2 of the ellipse and a second focal point H2 of a hyperbola, Two X-ray reflecting surfaces having a curved shape of the ellipse and the hyperbola including a portion where the ellipse and the hyperbola intersect are formed on the same substrate, and the X-ray emitted from the first focal point E1 of the ellipse corresponds to the ellipse portion. After being reflected by the first mirror unit 5, the second mirror unit 6 corresponding to the hyperbola portion is reflected and condensed to the first focal point H1 of the hyperbola.
このように、楕円３と双曲線４の焦点を一致させることで、光路長一定と反射光がすべて同一焦点に集まるという性質を併せ持っている。図３において、ここで、楕円３の第１焦点Ｅ１と第２焦点Ｅ２及び双曲線４の第２焦点Ｈ１と第２焦点Ｈ２を同一直線上に設定するとともに、楕円３の第２焦点Ｅ２と双曲線４の第２焦点Ｈ２を一致させる。そして、楕円３と双曲線４の交点を挟んで接近した位置の曲線を用いて一次元の楕円形状ミラー（第１ミラー部５）と双曲線形状ミラー（第２ミラー部６）の反射面を決定する。 In this way, by matching the focal points of the ellipse 3 and the hyperbola 4, the optical path length is constant and the reflected light is all collected at the same focal point. In FIG. 3, the first focal point E1 and the second focal point E2 of the ellipse 3 and the second focal point H1 and the second focal point H2 of the hyperbola 4 are set on the same straight line, and the second focal point E2 and the hyperbola of the ellipse 3 are set. Four second focal points H2 are made to coincide. Then, the reflection surfaces of the one-dimensional elliptical mirror (first mirror unit 5) and the hyperbolic mirror (second mirror unit 6) are determined using a curve at a position close to the intersection of the ellipse 3 and the hyperbola 4. .
例えば、縮小光学系で説明すれば、楕円３の一方の第１焦点Ｅ１から放射されたＸ線は、楕円３と双曲線４の前記交点の手前に形成した前記楕円形状ミラー（第１ミラー部５）で反射させれば、他方の第２焦点Ｅ２の方向へ反射する。楕円形状ミラーの中心部で反射されたＸ線と前記双曲線４の交点を中心として前記双曲線形状ミラー（第２ミラー部６）を形成すれば、この面で反射されたＸ線は第１焦点Ｈ１に到達する。つまり、楕円３の第１焦点Ｅ１を物点すれば、双曲線４の第１焦点Ｈ１は結像点となる。逆に、拡大光学系であれば、双曲線４の第１焦点Ｈ１を物点とし、焦楕円３の第１点Ｅ１を結像点とする。 For example, in the case of a reduction optical system, X-rays radiated from one first focal point E1 of the ellipse 3 are the elliptical mirror (first mirror unit 5) formed before the intersection of the ellipse 3 and the hyperbola 4. ), The light is reflected in the direction of the other second focal point E2. If the hyperbolic mirror (second mirror section 6) is formed around the intersection of the X-ray reflected at the center of the elliptical mirror and the hyperbola 4, the X-ray reflected at this surface is the first focal point H1. To reach. That is, if the first focal point E1 of the ellipse 3 is pointed, the first focal point H1 of the hyperbola 4 becomes the image point. On the other hand, in the case of the magnifying optical system, the first focal point H1 of the hyperbola 4 is an object point, and the first point E1 of the focal ellipse 3 is an imaging point.
そして、図３において、Ｅ１から楕円形状ミラー５の中心までの距離をａ、Ｅ２から楕円形状ミラー５の中心までの距離をａ’とし、Ｈ１から双曲線形状ミラー６の中心までの距離をｂ、Ｈ２から双曲線形状ミラー６の中心までの距離をｂ’とすれば、楕円３と双曲線４の定義（ａ＋ａ’＝一定、ｂ−ｂ’＝一定）を用いれば、
光路長＝ａ＋（ａ’−ｂ’）＋ｂ＝（ａ＋ａ’）＋（ｂ−ｂ’）＝一定
となる。つまり、光源Ｅ１から放出されたＸ線が楕円形状ミラー５と双曲線形状ミラー６で反射されて焦点Ｈ１に至る光路長は全て同じになり、アッベの正弦条件も満たしているという特長を備えている。
In FIG. 3, the distance from E1 to the center of the elliptical mirror 5 is a, the distance from E2 to the center of the elliptical mirror 5 is a ', and the distance from H1 to the center of the hyperbolic mirror 6 is b, If the distance from H2 to the center of the hyperbolic mirror 6 is b ′, the definition of the ellipse 3 and the hyperbola 4 (a + a ′ = constant, b−b ′ = constant) is used.
Optical path length = a + (a′−b ′) + b = (a + a ′) + (b−b ′) = constant. In other words, the X-rays emitted from the light source E1 are reflected by the elliptical mirror 5 and the hyperbolic mirror 6 and all the optical path lengths to the focal point H1 are the same, and the Abbe sine condition is also satisfied. .
ここで、前記楕円３の代わりに放物線を用いることも可能である。図示しないが、他の実施形態の二重反射型Ｘ線ミラーＷＭは、放物線の焦点と双曲線の第２焦点を一致させ、前記放物線と双曲線が交差する部分を含む該放物線と双曲線の曲線形状を持つ二つのＸ線反射面を同一基板上に作り込み、無限遠から出射されたＸ線あるいは平行なＸ線が放物線部分に対応する第１ミラー部５に反射した後、双曲線部分に対応する第２ミラー部６で反射し、該双曲線の第１焦点に集光されるように設定する。この場合、放物線は楕円３の第１焦点Ｅ１が無限遠にあるのと同じと見なされ、例えば宇宙のＸ線発生源を観測するために用いるＸ線光学系となる。 Here, it is also possible to use a parabola instead of the ellipse 3. Although not shown, the double-reflection X-ray mirror WM according to another embodiment has a parabolic and hyperbolic curved shape including a portion where the parabola and the hyperbola intersect with each other so that the focal point of the parabola coincides with the second focal point of the hyperbola. Two X-ray reflecting surfaces are formed on the same substrate, and X-rays emitted from infinity or parallel X-rays are reflected by the first mirror portion 5 corresponding to the parabolic portion, and then the second corresponding to the hyperbolic portion. It is set so as to be reflected by the mirror unit 6 and condensed at the first focal point of the hyperbola. In this case, the parabola is considered to be the same as the first focal point E1 of the ellipse 3 at infinity, and becomes an X-ray optical system used for observing the cosmic X-ray generation source, for example.
縦８０ｍｍ、横５０ｍｍ、厚さ×３０ｍｍのガラス基板の表面を通常の精密加工した後、ＥＥＭにて仕上げ加工を行った。図４に、本発明の二重反射型Ｘ線ミラーの設計形状を示している。作製したＸ線ミラーは、有効ミラー長は７９ｍｍ、有効楕円形状ミラー長は３９ｍｍ、有効双曲線形状ミラー長は３０ｍｍ、ミラー間の間隔１０ｍｍである。図４中に楕円形状ミラー（第１ミラー部５）と双曲線形状ミラー（第２ミラー部６）、及び緩衝部７を表示している。本実施形態のＸ線ミラーは、最も深いところで約２００μｍである。 The surface of a glass substrate having a length of 80 mm, a width of 50 mm, and a thickness of 30 mm was subjected to normal precision processing, and then finished with EEM. FIG. 4 shows a design shape of the double reflection type X-ray mirror of the present invention. The produced X-ray mirror has an effective mirror length of 79 mm, an effective elliptical mirror length of 39 mm, an effective hyperbolic mirror length of 30 mm, and an interval between the mirrors of 10 mm. In FIG. 4, an elliptical mirror (first mirror unit 5), a hyperbolic mirror (second mirror unit 6), and a buffer unit 7 are displayed. The X-ray mirror of this embodiment is about 200 μm at the deepest position.
図５に楕円形状ミラー（第１ミラー部５）の設計形状を示し、図６に双曲線形状ミラー（第２ミラー部６）の設計形状を示している。楕円形状ミラーは両端部に対して中央部が約４μｍだけ凹んだ形状であり（図５参照）、双曲線形状ミラーは両端部に対して中央部が約２．５μｍだけ凹んだ形状であるので、殆ど平面に近い形状である。図４でも分かるように、楕円形状ミラー５及び双曲線形状ミラー６は殆ど直線であり、所定角度に設定された二つの基準直線からの変位として図５及び図６が表されている。 FIG. 5 shows the design shape of the elliptical mirror (first mirror portion 5), and FIG. 6 shows the design shape of the hyperbolic mirror (second mirror portion 6). The elliptical mirror has a shape in which the central part is recessed by about 4 μm with respect to both ends (see FIG. 5), and the hyperbolic mirror has a shape in which the central part is recessed by about 2.5 μm with respect to both ends. The shape is almost flat. As can be seen from FIG. 4, the elliptical mirror 5 and the hyperbolic mirror 6 are almost straight lines, and FIGS. 5 and 6 are shown as displacements from two reference straight lines set at a predetermined angle.
ＥＥＭは、シリカ微粒子を超純水に分散させた加工液を、液中で被加工物の表面に所定ギャップを設けたノズルから噴射し、被加工物の表面に沿った高せん断流を生じさせて、シリカ微粒子と被加工物表面原子との一種の化学結合を利用して表面原子を除去する加工方法であり、現在最も高精度に仕上げ加工できる加工技術である。 EEM sprays a processing liquid in which silica fine particles are dispersed in ultrapure water from a nozzle having a predetermined gap on the surface of the work piece in the liquid, thereby generating a high shear flow along the surface of the work piece. This is a processing method for removing surface atoms using a kind of chemical bond between silica fine particles and workpiece surface atoms, and is currently a processing technique that can be finished with the highest precision.
ガラス基板をＥＥＭにより超精密に加工して楕円形状ミラー５と双曲線形状ミラー６を作り込んだＸ線ミラーを作製し、その形状を大阪大学で開発されたＭＳＩ（microstitching interferometer）とＲＡＤＳＩ（relative angle determinable stitching interferometer）を用いて測定した結果を図７及び図８に示す。図７は楕円形状ミラー５の設計形状からの誤差（形状誤差）を示し、図８は双曲線形状ミラー６の設計形状からの誤差（形状誤差）を示している。何れもＸ線反射面の全領域にわたってＰ−Ｖ値が２ｎｍ以内の精度で加工されていることが分かる。特に、双曲線形状ミラー６はＰ−Ｖ値が約１ｎｍの形状精度になっている。 An X-ray mirror with an elliptical mirror 5 and a hyperbolic mirror 6 is fabricated by ultra-precision processing of a glass substrate by EEM. The results of measurement using a determinable stitching interferometer are shown in FIGS. FIG. 7 shows an error (shape error) from the design shape of the elliptical mirror 5, and FIG. 8 shows an error (shape error) from the design shape of the hyperbolic mirror 6. In any case, it is understood that the PV value is processed with an accuracy within 2 nm over the entire region of the X-ray reflection surface. In particular, the hyperbolic mirror 6 has a shape accuracy with a PV value of about 1 nm.
また、作製した前記Ｘ線ミラーの全体の形状について、非接触三次元形状計測機（三鷹光器株式会社のＮＨ−５Ｎ、Ｚ方向分解能１０ｎｍ）によって計測した結果を図９に示す。設計形状に対して楕円形状ミラー５と双曲線形状ミラー６の並進のアライメント誤差は２０ｎｍ以下であり、相対角のアライメント精度は０．５μrad以下であり、それぞれは測定精度と一致した。これらの結果は，シミュレーションによって予想された許容アライメント誤差・許容形状誤差を上回るものであり、結像性能に影響しないことが確認された。ここで、並進アライメント誤差は、楕円形状ミラー５と双曲線形状ミラー６の図４のグラフにおける上下方向のアライメント、相対角アライメント誤差は、楕円形状ミラー５と双曲線形状ミラー６の図４のグラフの紙面に垂直軸周りの回転のアライメントに係わる。 Moreover, the result of having measured the whole shape of the produced said X-ray mirror with the non-contact three-dimensional shape measuring device (NH-5N of Mitaka Kogyo Co., Ltd., Z direction resolution 10nm) is shown in FIG. The translational alignment error between the elliptical mirror 5 and the hyperbolic mirror 6 with respect to the design shape is 20 nm or less, and the alignment accuracy of the relative angle is 0.5 μrad or less, and each coincides with the measurement accuracy. These results exceeded the allowable alignment error and allowable shape error predicted by the simulation, and it was confirmed that the imaging performance was not affected. Here, the translational alignment error is the vertical alignment of the elliptical mirror 5 and the hyperbolic mirror 6 in the graph of FIG. 4, and the relative angle alignment error is the paper surface of the elliptical mirror 5 and the hyperbolic mirror 6 of the graph of FIG. It relates to the alignment of rotation around the vertical axis.
このように作製した二重反射型Ｘ線ミラーを、SPring-8のビームライン（BL29XUL 第二ハッチ）に縮小光学系配置で設置し、エネルギーが１１．５keVのＸ線を集光する実験を行った。図１０に、本発明の二重反射型Ｘ線ミラーの視野中心での結像特性をワイヤースキャン法で測定した結果を示している。１枚のＸ線ミラーを用いた一次元の縮小結像であるが、回折限界に近い半値全幅（FWHM）が３３ｎｍの鋭いピークを持ち、サテライトピークが小さい良質な結像特性となっている。 The double-reflective X-ray mirror produced in this way is installed on the SPring-8 beamline (BL29XUL second hatch) with a reduction optical system, and an experiment is conducted to collect X-rays with an energy of 11.5 keV. It was. FIG. 10 shows the result of measuring the imaging characteristics at the center of the field of view of the double reflection type X-ray mirror of the present invention by the wire scan method. Although it is one-dimensional reduction imaging using one X-ray mirror, the full width at half maximum (FWHM) close to the diffraction limit has a sharp peak of 33 nm and has good imaging characteristics with a small satellite peak.
ＷＭ 二重反射型Ｘ線ミラー、
ＸＲ Ｘ線に軌跡
１ 水平Ｘ線ミラー、
２ 垂直Ｘ線ミラー、
３ 楕円
４ 双曲線
５ 第１ミラー部（楕円形状ミラー）
６ 第２ミラー部（双曲線形状ミラー）
７ 緩衝部
Ｅ１ 楕円の第１焦点
Ｅ２ 楕円の第２焦点
Ｈ１ 双曲線の第１焦点
Ｈ２ 双曲線の第２焦点
WM double-reflection X-ray mirror,
XR X-ray trace 1 horizontal X-ray mirror,
2 Vertical X-ray mirror,
3 Ellipse 4 Hyperbola 5 First mirror part (elliptical mirror)
6 Second mirror (hyperbolic mirror)
7 Buffer E1 Ellipse first focus E2 Ellipse second focus H1 Hyperbola first focus H2 Hyperbola second focus
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