JP5937873B2 - フォトマスク用基板セット、フォトマスクセット、及びパターン転写方法 - Google Patents

フォトマスク用基板セット、フォトマスクセット、及びパターン転写方法 Download PDF

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Publication number
JP5937873B2
JP5937873B2 JP2012089395A JP2012089395A JP5937873B2 JP 5937873 B2 JP5937873 B2 JP 5937873B2 JP 2012089395 A JP2012089395 A JP 2012089395A JP 2012089395 A JP2012089395 A JP 2012089395A JP 5937873 B2 JP5937873 B2 JP 5937873B2
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JP
Japan
Prior art keywords
photomask
pattern
transfer
main surface
substrate
Prior art date
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JP2012089395A
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English (en)
Japanese (ja)
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JP2012230368A (ja
Inventor
雅誉 土屋
雅誉 土屋
寿美 池邊
寿美 池邊
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hoya Corp
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Hoya Corp
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Publication date
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Priority to JP2012089395A priority Critical patent/JP5937873B2/ja
Publication of JP2012230368A publication Critical patent/JP2012230368A/ja
Application granted granted Critical
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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/60—Substrates
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/76—Patterning of masks by imaging
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Optical Filters (AREA)
JP2012089395A 2011-04-13 2012-04-10 フォトマスク用基板セット、フォトマスクセット、及びパターン転写方法 Active JP5937873B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2012089395A JP5937873B2 (ja) 2011-04-13 2012-04-10 フォトマスク用基板セット、フォトマスクセット、及びパターン転写方法

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2011088781 2011-04-13
JP2011088781 2011-04-13
JP2012089395A JP5937873B2 (ja) 2011-04-13 2012-04-10 フォトマスク用基板セット、フォトマスクセット、及びパターン転写方法

Publications (2)

Publication Number Publication Date
JP2012230368A JP2012230368A (ja) 2012-11-22
JP5937873B2 true JP5937873B2 (ja) 2016-06-22

Family

ID=46992126

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012089395A Active JP5937873B2 (ja) 2011-04-13 2012-04-10 フォトマスク用基板セット、フォトマスクセット、及びパターン転写方法

Country Status (4)

Country Link
JP (1) JP5937873B2 (ko)
KR (2) KR101319800B1 (ko)
CN (2) CN102736397B (ko)
TW (1) TWI461753B (ko)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI668131B (zh) * 2018-07-17 2019-08-11 沈岳正 Positive and negative dot mixed printing method

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3250560B2 (ja) * 2000-12-11 2002-01-28 ソニー株式会社 半導体装置の製造方法
JP3627805B2 (ja) * 2001-04-20 2005-03-09 信越化学工業株式会社 フォトマスク用ガラス基板及びその製造方法
JP4340859B2 (ja) 2003-07-25 2009-10-07 信越化学工業株式会社 フォトマスクブランク用基板の選定方法
TWI329779B (en) * 2003-07-25 2010-09-01 Shinetsu Chemical Co Photomask blank substrate, photomask blank and photomask
TW200540565A (en) * 2004-06-08 2005-12-16 Sumitomo Chemical Co Photosensitive resin composition
DE102005046135B4 (de) * 2004-09-29 2017-04-13 Hoya Corp. Substrat für Maskenrohling, Maskenrohling, Belichtungsmaske und Herstellungsverfahren für Maskenrohlingssubstrat
JP4803576B2 (ja) * 2004-09-29 2011-10-26 Ｈｏｙａ株式会社 マスクブランク用基板、マスクブランク、露光用マスク、半導体デバイスの製造方法、及びマスクブランク用基板の製造方法
JP5153998B2 (ja) * 2005-02-25 2013-02-27 Ｈｏｙａ株式会社 マスクブランク用透明基板の製造方法、マスクブランクの製造方法、露光用マスクの製造方法、及び半導体デバイスの製造方法
JP4362732B2 (ja) * 2005-06-17 2009-11-11 信越化学工業株式会社 フォトマスク用大型ガラス基板及びその製造方法、コンピュータ読み取り可能な記録媒体、並びにマザーガラスの露光方法
US7608542B2 (en) * 2005-06-17 2009-10-27 Shin-Etsu Chemical Co., Ltd. Large-size glass substrate for photomask and making method, computer-readable recording medium, and mother glass exposure method
JP2009037203A (ja) * 2007-07-12 2009-02-19 Hoya Corp パターン形成方法、薄膜トランジスタ基板の製造方法及び液晶表示装置の製造方法、並びにフォトマスク
JP4971278B2 (ja) * 2008-09-25 2012-07-11 信越化学工業株式会社 フォトマスクブランクスの選択方法及び製造方法並びにフォトマスクの製造方法
JP5335351B2 (ja) * 2008-10-01 2013-11-06 Ｈｏｙａ株式会社 マスクブランク用基板セット、マスクブランクセット、フォトマスクセット、及び半導体デバイスの製造方法
JP5331638B2 (ja) * 2008-11-04 2013-10-30 Ｈｏｙａ株式会社 表示装置製造用フォトマスクの製造方法及び描画装置
KR101680866B1 (ko) * 2008-11-26 2016-11-29 호야 가부시키가이샤 마스크블랭크용 기판
JP4853684B2 (ja) * 2009-03-31 2012-01-11 信越化学工業株式会社 フォトマスクブランク及びフォトマスク
KR101270659B1 (ko) * 2009-05-27 2013-06-03 주식회사 에스앤에스텍 블랭크 마스크 기판, 블랭크 마스크 및 그의 제조 방법

Also Published As

Publication number Publication date
CN103955111A (zh) 2014-07-30
CN102736397A (zh) 2012-10-17
TW201303384A (zh) 2013-01-16
TWI461753B (zh) 2014-11-21
KR101319800B1 (ko) 2013-10-17
KR101805953B1 (ko) 2017-12-06
CN102736397B (zh) 2015-04-01
KR20130103470A (ko) 2013-09-23
JP2012230368A (ja) 2012-11-22
KR20120116875A (ko) 2012-10-23
CN103955111B (zh) 2017-07-28

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