JP5910657B2 - Inspection chip and inspection system - Google Patents

Description

  The present invention relates to an inspection chip and an inspection system for cleaning beads in multiple stages.

  Conventionally, a test chip including beads for antigen-antibody reaction is known. For example, the analysis chip described in Patent Document 1 includes a fluid circuit including a plurality of tanks and a fine channel that connects the plurality of tanks to each other. When a centrifugal force acts on the analysis chip, liquids such as a specimen, a reagent, and a cleaning liquid move in the fluid circuit. The inspection process using the analysis chip includes a process of washing the beads in multiple stages. Beads are arranged in the seventh tank among the plurality of tanks, and a cleaning liquid is arranged in the first tank. In the path from the first tank to the seventh tank, a second layer, a third layer, a ninth tank, and a tenth tank are provided as buffer tanks. When centrifugal force acts on the analysis chip, the cleaning solution passes through the buffer tank continuously and is supplied to the seventh tank holding the beads. For this reason, the beads are washed. When the action of the centrifugal force on the analysis chip is stopped, the washing solution is divided by the buffer tank. That is, the multistage washing of the beads in the seventh tank is executed by repeatedly performing the action of the centrifugal force and stopping the action.

JP 2013-50435 A

  However, in the conventional analysis chip, in order to perform multi-stage washing of beads, a process of stopping the action of centrifugal force is included in the inspection process. When the action of the centrifugal force is stopped, the liquid held in each tank may diffuse. When the liquid diffuses, a reaction such as coloration occurs at an unexpected timing, which may reduce the inspection accuracy.

  The objective of this invention is providing the test | inspection chip and test | inspection system which reduce possibility that a test | inspection precision falls.

  The inspection chip according to the first aspect of the present invention includes a substrate solution injection part into which a substrate solution for an enzyme reaction is injected, and a cleaning liquid injection part that is arranged downstream of the substrate solution injection part and into which a cleaning liquid is injected. And a test liquid injection part that is arranged downstream of the cleaning liquid injection part and into which a test liquid containing a test target substance is injected, and is arranged downstream of the test liquid injection part and injected into the substrate solution injection part The substrate solution, the cleaning liquid injected into the cleaning liquid injection part, the receiving part into which the test liquid injected into the test liquid injection part flows, and arranged downstream of the receiving part, the antigen antibody A bead holding unit for holding beads for reaction, a measurement unit that is arranged downstream of the bead holding unit and that measures a reaction solution containing the substrate solution that has reacted with the test liquid and the beads, Measurement The substrate solution injection part, the cleaning liquid injection part, the inspection liquid injection part, the receiving part, and the measuring part are recessed in the same forming direction, and the receiving part The portion includes a plurality of supply channels connected to the bead holding unit and arranged in the forming direction, and the plurality of supply channels are larger in the forming direction as the supply channel on the forming direction side. Extends at an angle.

  The cleaning liquid flows into the receiving part. The plurality of supply channels extend at a larger angle with respect to the formation direction as the supply channel on the formation direction side. For this reason, by gradually increasing the swing width between the forming direction and the vertical direction perpendicular to the forming direction while applying a centrifugal force to the inspection chip, the supply flow path on the opposite direction side to the forming direction side is used in turn. The cleaning liquid can be supplied to the bead holding unit. Therefore, the beads can be washed in multiple stages without stopping the action of the centrifugal force. Therefore, the action of the centrifugal force is stopped, the reagent does not diffuse, and the possibility that the inspection accuracy is lowered can be reduced.

  In the inspection chip, the bead holding unit includes a take-out channel connected to the measurement unit on the formation direction side, and a first angle formed by a direction in which the take-out channel extends and the formation direction is the plurality of Of the supply flow paths, the second flow path may be smaller than the second angle formed by the direction in which the second supply flow path extends from the direction opposite to the formation direction and the formation direction.

  In the inspection chip, a third angle formed by a direction in which a forming surface forming a flow path connected to the receiving portion extends and a forming direction among surfaces forming the inspection liquid injection portion is the plurality of supply flow paths. Of these, the second supply channel extending from the formation direction side may be larger than a fourth angle formed by the direction in which the supply channel extends and the formation direction.

  In the inspection chip, a fifth angle formed by a direction in which a waste liquid flow channel surface that forms a flow channel connected to the waste liquid portion extends and a formation direction among the surfaces that form the measurement unit is equal to or less than the first angle. May be.

  The inspection chip is a surface that is provided between the surplus portion provided on the opposite side of the supply flow channel side with respect to the receiving portion, the inspection liquid injection portion, and the receiving portion, and is connected to the receiving portion. A first guide surface; a second guide surface extending from the receiving portion toward the surplus portion; a first end portion on the receiving portion side of the first guide surface; and a receiving portion side of the second guide surface. A second end portion, and a hexagonal degree formed by the direction from the second end portion toward the first end portion and the forming direction is determined by the first supply channel on the opposite side of the forming direction. It may be larger than a seventh angle formed by the extending direction and the forming direction.

  In the inspection chip, an eighth angle formed by the first guide surface and the forming direction may be smaller than the seventh angle.

  In the inspection chip, each of the plurality of supply channels includes a first supply wall surface on the forming direction side and a second supply wall surface on the opposite direction side of the forming direction, and among the plurality of supply channels The (n−1) th supply flow path extends from the upstream inlet end of the second supply wall surface of the nth supply flow path from the direction opposite to the formation direction from the direction opposite to the formation direction. The inlet imaginary line drawn parallel to the direction may intersect the first supply wall surface in the nth supply channel.

  The inspection chip includes an outlet wall surface connected to a downstream outlet end portion of the first supply wall surface, and the outlet wall surface is pulled in a direction orthogonal to a direction in which the supply flow path extends from the outlet end portion. You may incline to the said receiving part side rather than an exit virtual line.

  In the inspection chip, the first supply wall surface in the nth supply channel from the opposite side of the forming direction is from the exit virtual line drawn from the outlet end portion in the n−1th supply channel. You may be located in the said receiving part side.

  The inspection system according to the second aspect of the present invention includes an inspection chip, a centrifugal force acting on the inspection chip by rotating the inspection chip about a predetermined first axis, and the first axis. Is an inspection system configured to change the direction of the centrifugal force by rotating the inspection chip around a different second axis, and the inspection chip has a substrate solution for an enzyme reaction. A substrate solution injection part to be injected, a cleaning liquid injection part which is arranged downstream of the substrate solution injection part and into which a cleaning liquid is injected, and a test liquid which is arranged downstream of the cleaning liquid injection part and which includes a test target substance. An inspection liquid injection part to be injected; the substrate solution which is disposed downstream of the inspection liquid injection part and injected into the substrate solution injection part; the cleaning liquid injected into the cleaning liquid injection part; From the receiving part into which the test liquid injected into the inspection liquid injection part flows, a bead holding part arranged downstream of the receiving part and holding beads for antigen-antibody reaction, from the bead holding part And a measuring part for measuring a reaction liquid containing the substrate solution reacted with the test liquid and the beads, and a waste liquid part arranged downstream of the measuring part, and the substrate solution The injection part, the cleaning liquid injection part, the inspection liquid injection part, the receiving part, and the measurement part are recessed in the same forming direction, and the receiving part is connected to the bead holding part and arranged in the forming direction. A plurality of supply channels, and the plurality of supply channels extend at a larger angle with respect to the forming direction as the supply channel on the forming direction side, and the inspection apparatus holds the beads from the receiving portion. To the part When supplying the cleaning liquid via any of the supply flow paths, a first operation for applying the centrifugal force to the inspection chip in the formation direction and the inspection in a direction different from the formation direction An action means for repeatedly executing the second operation for applying the centrifugal force to the chip, and the action means includes a direction for applying the centrifugal force and a forming direction when performing the second operation of the second time. Is at least an angle formed by a direction perpendicular to the direction in which the nth supply channel extends from the opposite side of the formation direction and the formation direction, and in a direction in which the n + 1th supply channel extends. The centrifugal force is applied in a direction that is smaller than an angle formed by a vertical direction and the forming direction.

  In this case, the cleaning liquid flows into the receiving portion. The plurality of supply channels extend at a larger angle with respect to the formation direction as the supply channel on the formation direction side. The action means of the inspection apparatus repeats the first operation and the second operation, and causes the cleaning liquid to flow out from the supply channel to the bead holding unit. At this time, when the action means performs the n-th second operation, the angle formed by the direction in which the centrifugal force is applied and the forming direction is a direction in which the n-th supply flow channel extends from the opposite side of the forming direction. The centrifugal force is applied in a direction that is equal to or greater than the angle formed by the direction perpendicular to the forming direction and the direction formed by the direction perpendicular to the direction in which the (n + 1) th supply channel extends and the forming direction. For this reason, a washing | cleaning liquid can be sequentially supplied to a bead holding part from the supply flow path of the opposite direction side of a formation direction side. Therefore, the beads can be washed in multiple stages without stopping the action of the centrifugal force. Therefore, the action of the centrifugal force is stopped, the reagent does not diffuse, and the possibility that the inspection accuracy is lowered can be reduced.

It is a figure which shows the structure of the test | inspection system 3 containing the test | inspection apparatus 1 and the control apparatus 90. FIG. It is a front view of the test | inspection chip 2. FIG. It is a principal part enlarged view of the test | inspection chip 2. FIG. It is a flowchart of a centrifugation process. It is a state transition diagram of the test | inspection chip 2 in a centrifugation process. FIG. 6 is a continuation state transition diagram of FIG. 5. FIG. 7 is a state transition diagram continued from FIG. 6. FIG. 8 is a state transition diagram continued from FIG. 7. FIG. 4 is an enlarged view of a main part of the inspection chip 2 showing a state in which a cleaning liquid 93 flows into the receiving unit 20. 3 is an enlarged view of a main part of the inspection chip 2 showing a state in which a cleaning liquid 93 flows from a supply flow path 21. FIG. FIG. 4 is an enlarged view of a main part of the inspection chip 2 showing a state in which a cleaning liquid 931 flows from a take-out channel 412. FIG. 4 is an enlarged view of a main part of the inspection chip 2 showing a state in which a cleaning liquid 93 flows from a supply channel 22. FIG. 4 is an enlarged view of a main part of the inspection chip 2 showing a state in which a cleaning liquid 93 flows from a supply channel 23. 3 is an enlarged view of a main part of the inspection chip 2 showing a state in which a cleaning liquid 93 flows from a supply flow path 24. FIG.

  DESCRIPTION OF EMBODIMENTS Embodiments embodying the present invention will be described with reference to the drawings. FIG. 1 shows a plane of the inspection apparatus 1 constituting the inspection system 3 and functional blocks inside the control apparatus 90.

<1. Schematic structure of inspection system 3>
A schematic structure of the inspection system 3 will be described with reference to FIG. The inspection system 3 of the present embodiment includes an inspection chip 2 that can store a reagent that is a liquid, and an inspection device 1 that performs inspection using the inspection chip 2. When the inspection device 1 rotates the inspection chip 2 around the vertical axis A <b> 1 separated from the inspection chip 2, centrifugal force acts on the inspection chip 2. When the inspection apparatus 1 rotates the inspection chip 2 around the horizontal axis A2, the centrifugal direction, which is the direction of the centrifugal force acting on the inspection chip 2, is switched. In addition, since the inspection system 3 and the inspection apparatus 1 of this embodiment have a known structure as described in JP 2012-78107 A, in the following description, an outline of the structure of the inspection apparatus 1 will be described. To do.

<2. Structure of the inspection apparatus 1>
The structure of the inspection apparatus 1 will be described with reference to FIG. In the following description, the upper side, the lower side, the right side, the left side, the front side of the paper surface, and the rear side of the paper surface in FIG. . In the present embodiment, the direction of the vertical axis A1 is the vertical direction of the inspection apparatus 1, and the direction of the horizontal axis A2 is the direction of the speed when the inspection chip 2 is rotated about the vertical axis A1. FIG. 1 shows a state in which the top plate of the upper housing 30 of the inspection apparatus 1 has been removed.

  As shown in FIG. 1, the inspection apparatus 1 includes an upper housing 30, a lower housing 29, an upper plate 32, a turntable 33, an angle changing mechanism 34, and a control device 90. The turntable 33 is a disk rotatably provided on the upper side of an upper plate 32 described later. The inspection chip 2 is held above the turntable 33. The angle changing mechanism 34 is a drive mechanism provided on the turntable 33. The angle changing mechanism 34 rotates the inspection chip 2 around the horizontal axis A2. The upper housing 30 is fixed to an upper plate 32 described later, and a measurement unit 7 that performs optical measurement on the inspection chip 2 is provided inside. The control device 90 is a controller that controls various processes of the inspection device 1.

  A schematic structure of the lower housing 29 will be described. The lower housing 29 has a box-like frame structure in which frame members are combined. An upper plate 32 that is a rectangular plate material is provided on the upper surface of the lower housing 29. A drive mechanism for rotating the turntable 33 around the vertical axis A1 is provided in the lower housing 29 as follows.

  A spindle motor 35 that supplies a driving force for rotating the turntable 33 is installed on the left side of the lower housing 29. A shaft 36 of the main shaft motor 35 protrudes upward, and a pulley 37 is fixed. A vertical main shaft 57 extending upward from the inside of the lower housing 29 is provided at the center of the lower housing 29. The main shaft 57 passes through the upper plate 32 and protrudes above the lower housing 29. The upper end portion of the main shaft 57 is connected to the center portion of the turntable 33.

  The main shaft 57 is rotatably held by a support member (not shown) provided immediately below the upper plate 32. A pulley 38 is fixed to the main shaft 57 below the support member. A belt 39 is stretched over the pulley 37 and the pulley 38. When the main shaft motor 35 rotates the shaft 36, the driving force is transmitted to the main shaft 57 via the pulley 37, the belt 39, and the pulley 38. At this time, the turntable 33 rotates around the main shaft 57 in conjunction with the rotation of the main shaft 57.

  A guide rail (not shown) extending in the vertical direction inside the lower housing 29 is provided on the right side in the lower housing 29. A T-shaped plate (not shown) is movable in the vertical direction in the lower housing 29 along the guide rail.

  The aforementioned main shaft 57 is a cylindrical body having a hollow inside. An inner shaft (not shown) is a shaft that can move in the vertical direction inside the main shaft 57. The upper end portion of the inner shaft passes through the main shaft 57 and is connected to the rack gear 43. A bearing (not shown) is provided at the left end of the T-shaped plate. Inside the bearing, the lower end portion of the inner shaft is rotatably held.

  A stepping motor 51 for moving the T-shaped plate up and down is fixed in front of the T-shaped plate. The shaft 58 of the stepping motor 51 protrudes rearward, that is, downward in FIG. A disc-shaped cam plate (not shown) is fixed to the tip of the shaft 58. A cylindrical projection (not shown) is provided on the rear surface of the cam plate. The tip of the protrusion is inserted into a groove (not shown). The protrusion can slide in the groove. When the stepping motor 51 rotates the shaft 58, the protrusion moves up and down in conjunction with the rotation of the cam plate. At this time, the T-shaped plate moves up and down along the guide rail in conjunction with the protrusion inserted in the groove.

  The detailed structure of the angle changing mechanism 34 will be described. The angle changing mechanism 34 has a pair of L-shaped plates 60 fixed to the upper surface of the turntable 33. Each L-shaped plate 60 extends upward from a base portion fixed in the vicinity of the center of the turntable 33, and its upper end portion extends outward in the radial direction of the turntable 33. A rack gear 43 (not shown) fixed to the inner shaft is provided between the pair of L-shaped plates 60. The rack gear 43 is a metal plate-like member that is long in the vertical direction, and gears are respectively carved on both end faces.

  On the front end side in the extending direction of each L-shaped plate 60, a horizontal support shaft 46 having a gear 45 is rotatably supported. The support shaft 46 is fixed to the inspection chip 2 via a mounting holder (not shown). For this reason, the inspection chip 2 also rotates around the support shaft 46 in conjunction with the rotation of the gear 45. Between the gear 45 and the rack gear 43, a pinion gear 44 supported by an L-shaped plate 60 so as to be rotatable about a horizontal axis (not shown) is interposed. The pinion gear 44 meshes with the gear 45 and the rack gear 43, respectively. In conjunction with the vertical movement of the rack gear 43, the pinion gear 44 and the gear 45 are driven to rotate, and the inspection chip 2 is rotated about the support shaft 46.

  In the present embodiment, as the main shaft motor 35 rotationally drives the turntable 33, the inspection chip 2 rotates around the main shaft 57 that is a vertical axis, and a centrifugal force acts on the inspection chip 2. The rotation around the vertical axis A1 of the inspection chip 2 is referred to as revolution. On the other hand, as the stepping motor 51 moves the inner shaft up and down, the inspection chip 2 rotates about the support shaft 46 which is a horizontal axis, and the direction of the centrifugal force acting on the inspection chip 2 changes relatively. The rotation around the horizontal axis A2 of the inspection chip 2 is called autorotation.

  In a state where the T-shaped plate is lowered to the lowermost end of the movable range, the rack gear 43 is also lowered to the lowermost end of the movable range. At this time, the inspection chip 2 is in a steady state where the rotation angle is 0 degree. Further, in the state where the T-shaped plate is raised to the uppermost end of the movable range, the rack gear 43 is also raised to the uppermost end of the movable range. At this time, the test | inspection chip 2 will be in the state rotated 180 degree | times centering on the horizontal axis line A2 from the steady state. That is, in this embodiment, the angle width that the test chip 2 can rotate is the rotation angle of 0 degrees to 180 degrees.

  The detailed structure of the upper housing 30 will be described. As shown in FIG. 1, the upper housing 30 has a box-like frame structure in which frame members are combined, and is installed on the upper left side of the upper plate 32. More specifically, the upper housing 30 is provided outside the range in which the inspection chip 2 is rotated as viewed from the main shaft 57 at the rotation center of the turntable 33.

  The measurement unit 7 provided inside the upper housing 30 includes a light source 71 that emits measurement light, and an optical sensor 72 that detects the measurement light emitted from the light source 71. The light source 71 and the optical sensor 72 are disposed on both the front and rear sides of the turntable 33 outside the rotation range of the inspection chip 2. In the present embodiment, the position on the left side of the main shaft 57 in the reciprocable range of the inspection chip 2 is the measurement position at which the inspection chip 2 is irradiated with the measurement light. When the inspection chip 2 is at the measurement position, the measurement light connecting the light source 71 and the optical sensor 72 intersects the front surface and the rear surface of the inspection chip 2 substantially perpendicularly.

<3. Electrical configuration of control device 90>
The electrical configuration of the control device 90 will be described with reference to FIG. The control device 90 includes a CPU 101 that controls the main control of the inspection device 1, a RAM 102 that temporarily stores various data, and a ROM 103 that stores a control program. Connected to the CPU 101 are an operation unit 104 for a user to input an instruction to the control device 90, a hard disk device 105 for storing various data and programs, and a display 106 for displaying various information. As the control device 90, a personal computer may be used, or a dedicated control device may be used.

  Further, a revolution controller 97, a rotation controller 98, and a measurement controller 99 are connected to the CPU 101. The revolution controller 97 controls the revolution of the inspection chip 2 by transmitting a control signal for rotating the spindle motor 35 to the spindle motor 35. The rotation controller 98 controls the rotation of the inspection chip 2 by transmitting a control signal for rotating the stepping motor 51 to the stepping motor 51. The measurement controller 99 performs the optical measurement of the inspection chip 2 by driving the measurement unit 7. Specifically, the measurement controller 99 transmits a control signal for executing light emission of the light source 71 and light detection of the optical sensor 72 to the light source 71 and the optical sensor 72. The CPU 101 controls the revolution controller 97, the rotation controller 98, and the measurement controller 99.

<4. Structure of inspection chip 2>
With reference to FIG.2 and FIG.3, the detailed structure of the test | inspection chip 2 which concerns on this embodiment is demonstrated. In the following description, the upper, lower, left, right, front side, and back side of FIG. 2 are the upper, lower, left, right, front, and rear sides of the inspection chip 2, respectively. . In the present embodiment, the inspection chip 2 is used, and the inspection is performed by the ELISA method. ELISA is an abbreviation for Enzyme-linked immunosorbent assay.

  As shown in FIG. 2, the inspection chip 2 has a square shape having an upper side portion 81, a lower side portion 84, a right side portion 82, and a left side portion 83 when viewed from the front as an example, and is a transparent composite having a predetermined thickness. Resin plate 19 is mainly used. As shown in FIG. 2, the front surface 203 of the plate 19 is sealed with a sheet 291 made of a transparent synthetic resin thin plate. Between the plate material 19 and the sheet 291, a liquid flow path 25 is formed through which the liquid sealed in the inspection chip 2 can flow. The liquid channel 25 is a recess formed at a predetermined depth on the front surface 203 of the plate material 19 and extends in a direction orthogonal to the front-rear direction, which is the thickness direction of the plate material 19. The sheet 291 seals the flow path forming surface of the plate material 19. The sheet 291 is not shown except in FIG.

  The liquid channel 25 includes four measurement channels 251 to 254. The measurement channels 251 to 254 are provided side by side from the left to the right, respectively. Since the measurement flow paths 251 to 254 have the same flow path, the measurement flow path 251 will be described in the following description.

  The measurement flow path 251 includes a reaction stop liquid injection section 310, a substrate solution injection section 330, a cleaning liquid injection section 350, a test liquid injection section 370, a receiving section 20, a surplus section 390, a bead holding section 410, an extraction flow path 412, and a measurement section. 430, a waste liquid section 440, and supply sections 320, 340, 360, 380, 400, 420, and the like. The reaction stop liquid injection unit 310, the substrate solution injection unit 330, the cleaning liquid injection unit 350, the test liquid injection unit 370, the bead holding unit 410, and the measurement unit 430 are formed to be recessed downward in the same direction. In the following description, the reaction stop liquid injection unit 310, the substrate solution injection unit 330, the cleaning liquid injection unit 350, the test liquid injection unit 370, the receiving unit 20, the bead holding unit 410, and the measurement unit 430 are in the downward direction. , Sometimes referred to as the formation direction. Further, the upward direction may be referred to as a direction opposite to the forming direction.

  The reaction stop solution injection unit 310, the substrate solution injection unit 330, the cleaning solution injection unit 350, the test liquid injection unit 370, and the bead holding unit 410 are respectively a reaction stop solution 91, a substrate solution 92, a cleaning solution 93, a test liquid 94, and This is a site where the bead dispersion 95 is stored. The bead dispersion 95 is a liquid containing beads 31 for antigen-antibody reaction. The beads 31 are spherical and have antibodies immobilized on the surface. In this embodiment, as an example, it is assumed that the beads 31 are polystyrene beads having a diameter of 100 μm. The test liquid 94 is a liquid containing components such as blood, plasma, blood cells, bone marrow, urine, vaginal tissue, epithelial tissue, tumor, semen, saliva, or food. The test liquid 94 includes an enzyme-labeled antibody. The enzyme-labeled antibody is an antibody labeled with an enzyme that specifically binds to a conjugate of the substance to be examined and the antibody of the beads 31. When the test liquid 94 comes into contact with the bead 31, the test target substance contained in the test liquid 94 is bound to the antibody solid-phased on the bead 31, and further, the test target substance and the antibody of the bead 31 are bound. The enzyme-labeled antibody specifically binds to the body.

  The cleaning liquid 93 is a liquid for cleaning the beads 31 and removes components of the test liquid 94 that are not bound to the antibodies of the beads 31. Although details will be described later, in this embodiment, multi-stage cleaning is performed in which cleaning is performed a plurality of times with the cleaning liquid 93. The substrate solution 92 is a liquid that comes into contact with the beads 31 after being washed with the washing solution 93 and undergoes an enzyme reaction with the enzyme-labeled antibody. The reaction stop liquid 91 is a liquid mixed with the substrate solution 92 and is a liquid that stops the progress of the enzyme reaction. In the present embodiment, in the optical measurement described later, a fluorescent substance or a colored substance generated by the enzyme reaction of the substrate solution 92 can be detected to measure the substance to be inspected. In the following description, the reaction stop solution 91, the substrate solution 92, the cleaning solution 93, the test solution 94, and the bead dispersion 95 are collectively referred to as “reagent 9” or when any of them is not specified.

  The reaction stop liquid injection unit 310 is provided in the upper left part of the inspection chip 2. The reaction stop liquid injection unit 310 is a recess that opens upward. The supply unit 320 is a flow path that extends downward from the upper right portion of the reaction stop liquid injection unit 310. The lower left portion of the supply unit 320 is connected to the substrate solution injection unit 330. That is, the substrate solution injection unit 330 is disposed downstream of the reaction stop solution injection unit 310.

  The substrate solution injection part 330 is a concave part that opens upward. The supply unit 340 is a flow path extending downward from the upper right part of the substrate solution injection unit 330. The lower left portion of the supply unit 340 is connected to the cleaning liquid injection unit 350. That is, the cleaning liquid injection unit 350 is disposed downstream of the substrate solution injection unit 330.

  The cleaning liquid injection unit 350 is a recess that opens upward. Of the surfaces on which the cleaning liquid injection portion 350 is formed, the surface connected to the test liquid injection portion 370 described later is referred to as a formation surface 351. The supply unit 360 is a flow path extending downward from the upper right part of the cleaning liquid injection unit 350. The lower left portion of the supply unit 360 is connected to the test liquid injection unit 370. That is, the test liquid injection part 370 is arranged downstream of the cleaning liquid injection part 350.

  The inspection liquid injection part 370 is a recess that opens upward. Of the surfaces on which the test liquid injection part 370 is formed, the surface connected to the receiving part 20 described later is referred to as a formation surface 371. The supply unit 380 is a flow path that extends downward from the upper right portion of the test liquid injection unit 370. The lower left portion of the supply unit 380 is connected to the receiving unit 20. That is, the receiving part 20 is disposed downstream of the test liquid injection part 370.

  The receiving part 20 is a part into which the reaction stop liquid 91, the substrate solution 92, the cleaning liquid 93, and the test liquid 94 flow. The receiving unit 20 includes a storage unit 201 and n supply channels 200. Note that n is a natural number of 2 or more, and a plurality of supply flow paths 200 are provided. In the present embodiment, n is 4, and each supply channel 200 is referred to as a supply channel 21 to 24. The storage unit 201 is a recess that opens upward and is recessed downward to the right. The supply flow paths 21 to 24 are arranged in order in the formation direction from the opposite side of the formation direction, and extend to the upper right. The supply flow paths 21 to 24 are connected to a bead holding unit 410 described later via a supply unit 400 described later.

  As shown in FIG. 3, angles formed by the extending direction of the supply flow paths 21 to 24 and the forming direction are angles R1 to R4, respectively. The supply flow paths 21 to 24 extend at a larger angle with respect to the formation direction as the supply flow path is closer to the formation direction. That is, the relationship of angle R1 <angle R2 <angle R3 <angle R4 is established. In the present embodiment, as an example, it is assumed that the angles R1 to R4 are 135 degrees, 150 degrees, 160 degrees, and 170 degrees, respectively. In addition, an angle R20 formed by the formation surface 371 of the test liquid injection unit 370 and the formation direction is the direction in which the second supply flow path 23 extends from the formation direction side and the formation direction among the plurality of supply flow paths 21 to 24. Is greater than the angle R3 formed by. In the present embodiment, as an example, the angle R20 is assumed to be 170 degrees, which is the same as the angle R4. Further, an angle R41 shown in FIG. 2 formed by the formation surface 351 of the cleaning liquid injection portion 350 and the formation direction is larger than the angle R3. In the present embodiment, as an example, the angle R41 is assumed to be 170 degrees, which is the same as the angle R4.

  As shown in FIGS. 2 and 3, the surplus portion 390 is provided on the left side, which is the opposite side to the supply flow paths 21 to 24 with respect to the receiving portion 20. The surplus part 390 is a part where the surplus reagent 9 overflowing from the receiving part 20 is stored.

  As shown in FIG. 3, a surface connecting the supply unit 380 to the receiving unit 20 is referred to as a first guide surface 41. The first guide surface 41 is located between the test liquid injection part 370 and the receiving part 20. An end portion on the receiving portion 20 side in the first guide surface 41 is referred to as a first end portion 411.

  A surface extending from the upper portion of the receiving portion 20 toward the surplus portion 390 is referred to as a second guide surface 42. The second guide surface 42 extends downward from the upper portion of the receiving portion 20. An end portion on the receiving portion 20 side in the second guide surface 42 is referred to as a second end portion 421. An angle formed by the direction from the second end 421 toward the first end 411 and the forming direction is referred to as an angle R21. An angle formed by the first guide surface 41 and the formation direction is referred to as an angle R22. The angle R21 is larger than the angle R1 formed by the direction in which the first supply channel 21 on the side opposite to the formation direction extends and the formation direction. Further, the angle R22 is smaller than the angle R1.

  As shown in FIG. 2, the supply unit 400 is a flow channel that extends downward from the right part of the supply flow channels 21 to 24. The lower left portion of the supply unit 400 is connected to the bead holding unit 410. That is, the bead holding unit 410 is provided downstream of the receiving unit 20. The bead holding part 410 is a recessed part having an opening upward. The bead holding unit 410 is a part that holds a plurality of beads 31. The beads 31 are included in the bead dispersion 95.

  The bead holding unit 410 includes an extraction channel 412 in which the channel is narrowly formed at the end on the formation direction side. The take-out flow path 412 extends to the upper right. The take-out channel 412 has a channel width of 100 μm or less, which is the diameter of the beads 31. The take-out channel 412 is connected to a measurement unit 430 described later via a supply unit 420 described later. An angle formed by the direction in which the take-out flow path 412 extends and the formation direction is referred to as an angle R23. The angle R23 is smaller than the angle R2 formed by the direction in which the second supply channel 22 extends from the direction opposite to the formation direction and the formation direction among the plurality of supply channels 21 to 24.

  The supply unit 420 is a channel that extends downward from the upper right part of the extraction channel 412. The lower left portion of the supply unit 420 is connected to the measurement unit 430. That is, the measurement unit 430 is disposed downstream of the bead holding unit 410. The measurement unit 430 is a recess that opens upward. When optical measurement to be described later is performed, measurement light is transmitted through the measurement unit 430, and a measurement solution 921 to be described later shown in FIG.

  The upper right part of the measurement part 430 is connected to the waste liquid part 440. That is, the waste liquid part 440 is disposed downstream of the measurement part 430. The waste liquid part 440 is a part where the reagent 9 that is not measured by the measurement part 430 is drained from the measurement part 430.

  Of the surfaces on which the measurement unit 430 is formed, a surface that forms a channel connected to the waste liquid unit 440 is referred to as a waste liquid channel surface 431. The waste liquid channel surface 431 extends in the upper right direction. An angle R24 formed by the direction in which the waste liquid flow path surface 431 extends and the formation direction is larger than the angle R23 shown in FIG.

  The supply channels 21 to 24 will be described in detail. As shown in FIG. 3, the surfaces on the formation direction side in the supply flow paths 21 to 24 are referred to as first supply wall surfaces 211, 221, 231, 241 respectively. The upper surface on the opposite side of the formation direction in the supply flow paths 21 to 24 is referred to as second supply wall surfaces 212, 222, 232, and 242. The downstream end portions of the first supply wall surfaces 211, 221, 231, and 241 are referred to as outlet end portions 215, 225, 235, and 245, respectively.

  Exit wall surfaces 214, 224, 234, and 244 are connected to the exit ends 215, 225, 235, and 245, respectively. The exit wall surfaces 214, 224, 234, 244 respectively extend obliquely downward to the right. Virtual lines drawn from the outlet end portions 215, 225, 235, and 245 in a direction orthogonal to the direction in which the supply flow paths 21, 22, 23, and 24 extend are referred to as outlet virtual lines 219, 229, 239, and 249, respectively. The outlet wall surfaces 214, 224, 234, and 244 are inclined to the left side, which is the receiving portion 20 side, with respect to the outlet virtual lines 219, 229, 239, and 249, respectively.

  The first supply wall surfaces 221, 231, 241 in the nth supply flow paths 22-24 from the direction opposite to the forming direction are drawn from the outlet ends 215, 225, 235 in the n-1th supply flow paths 21-23. The exit imaginary lines 219, 229, and 239 are on the receiving portion 20 side. For this reason, the first supply wall surface 221 is on the left side of the virtual exit line 219. The first supply wall surface 231 is on the left side of the virtual exit line 229. The first supply wall surface 241 is on the left side of the exit virtual line 239.

  The upstream end portions of the second supply wall surfaces 212, 222, 232, and 242 are referred to as inlet end portions 213, 223, 233, and 243, respectively. Further, an imaginary line drawn in parallel with the direction in which the (n-1) th supply flow paths 21 to 23 extend from the inlet end portions 223, 233, 243 in the nth supply flow path 200 from the direction opposite to the forming direction, It is called entrance virtual lines 228, 238, 248. That is, the entrance virtual line 228 is parallel to the direction in which the supply flow path 21 extends. The inlet virtual line 238 is parallel to the direction in which the supply flow path 22 extends. The entrance virtual line 248 is parallel to the direction in which the supply flow path 23 extends. The virtual entry lines 228, 238, and 248 intersect with the nth first supply wall surfaces 221, 231, and 241 from the direction opposite to the formation direction, respectively.

<5. Other structures of inspection chip 2>
As shown in FIG. 1, the support shaft 46 extending from the L-shaped plate 60 is vertically connected to the center of the rear surface of the plate member 19 via a mounting holder (not shown). As the support shaft 46 rotates, the inspection chip 2 rotates around the support shaft 46. When the inspection chip 2 is in the steady state shown in FIG. 2, the upper side portion 81 and the lower side portion 84 are orthogonal to the direction of gravity G, the right side portion 82 and the left side portion 83 are parallel to the direction of gravity G, and the left side portion 83. Is disposed closer to the main shaft 57 than the right side portion 82. In a state where the inspection chip 2 in the steady state is arranged at the measurement position, the inspection apparatus 1 performs inspection by optical measurement by passing the measurement light connecting the light source 71 and the optical sensor 72 through the measurement unit 430.

<6. Example of inspection method>
An inspection method using the inspection apparatus 1 and the inspection chip 2 will be described. As shown in FIG. 2, the reaction stop solution 91 is injected into the reaction stop solution injection section 310 of the measurement flow channels 251 to 254. The substrate solution 92 is injected into the substrate solution injection section 330 of the measurement flow paths 251 to 254. The cleaning liquid 93 is injected into the cleaning liquid injection section 350 of the measurement channels 251 to 254. The test liquid 94 is injected into the test liquid injection part 370 of the measurement channel 251. Reference inspection liquids 941 to 943 are injected into the inspection liquid injection portions 370 of the measurement flow paths 252 to 254, respectively. The reference inspection liquids 941 to 943 are inspection liquids for obtaining measurement data to be compared with measurement data using the inspection liquid 94. In the optical measurement described later, measurement data of a measurement solution 921 described later using the test liquid 94 and measurement data of the measurement solution 921 using the reference test liquids 941 to 943 are compared to calculate a measurement result. Is done.

  The arrangement method of the reagent 9 is not limited. For example, a hole is opened at a position corresponding to the reaction stop liquid injection unit 310, the substrate solution injection unit 330, the cleaning liquid injection unit 350, and the test liquid injection unit 370 in the sheet 291, and the user injects the reagent 9 from the hole, Further, sealing may be performed. Alternatively, the reagent 9 may be disposed in advance in the reaction stop liquid injection unit 310, the substrate solution injection unit 330, the cleaning liquid injection unit 350, and the test liquid injection unit 370 and sealed with the sheet 291. In this case, a hole may be opened at a position corresponding to the test liquid injection part 370 of the measurement channel 251 in the sheet 291, and the user may inject the test liquid 94 from the hole and then seal and seal. Further, a hole may be formed in the left wall portion of the test liquid injection part 370 of the measurement channel 251, and the test liquid 94 may be injected from the hole and sealed by sealing the hole.

  The user attaches the inspection chip 2 to a mounting holder (not shown) and inputs a processing start command from the operation unit 104. As a result, the CPU 101 executes the centrifugal process shown in FIG. 4 based on the control program stored in the ROM 103. The inspection apparatus 1 can inspect two inspection chips 2 at the same time. For convenience of explanation, a procedure for inspecting one inspection chip 2 will be described below. Moreover, since the flow of the reagent 9 in the measurement flow paths 251 to 254 is the same, only the measurement flow path 251 is illustrated in FIGS. Moreover, the steady state of the test | inspection chip 2 shown to FIG.2 and FIG.5 (A) is called rotation angle 0 degree, and the state rotated 90 degree | times counterclockwise from the steady state is called rotation angle 90 degree | times. In the following description, when the CPU 101 rotates the inspection chip 2 from the rotation angle 0 degree, 40 degrees, 45 degrees, 60 degrees, or 70 degrees to 90 degrees, the inspection chip 2 rotates counterclockwise as viewed from the front. Rotate to. When the CPU 101 rotates the inspection chip 2 from the rotation angle of 90 degrees to 0 degree, 40 degrees, 45 degrees, 60 degrees, or 70 degrees, the inspection chip 2 rotates clockwise as viewed from the front.

  As shown in FIG. 4, the CPU 101 reads the motor drive information stored in advance in the HDD 105, sets the drive information of the spindle motor 35 in the revolution controller 97, and sets the drive information of the stepping motor 51 in the rotation controller 98. (S1). At this time, as shown in FIGS. 2 and 5A, the inspection chip 2 is in a steady state and has a rotation angle of 0 degree. Next, the CPU 101 shown in FIG. 1 controls the revolution controller 97 to start driving the spindle motor 35 (S2). As a result, the inspection chip 2 having a rotation angle of 0 degrees revolves. The spindle motor 35 increases the rotation speed of the turntable 33 to the speed V based on an instruction from the revolution controller 97. The speed V is, for example, 3000 rpm. When the turntable 33 is rotated at this speed V, a centrifugal force X of several hundred G acts on the inspection chip 2.

  The CPU 101 maintains the rotation speed of the spindle motor 35 at the speed V (S3). As shown in FIG. 5B, the centrifugal force X acts on the test chip 2 from the left side portion 83 toward the right side portion 82 shown in FIG. Due to the action of the centrifugal force X, the reaction stop liquid 91, the substrate solution 92, the cleaning liquid 93, and the test liquid 94 are changed into a reaction stop liquid injection section 310, a substrate solution injection section 330, a cleaning liquid injection section 350, and a test liquid injection section, respectively. Move from 370 to supply units 320, 340, 360 and 380. Further, in the bead dispersion 95, the liquid other than the beads 31 is referred to as a bead dispersion 951. The bead dispersion 951 is removed from the bead holding unit 410 and moved to the supply unit 420 via the flow path 412. Since the channel width of the extraction channel 412 is 100 μm or less which is the diameter of the bead 31, the bead 31 remains in the bead holding unit 410. In the following description, the rotation speed of the turntable 33 is assumed to be constant at the speed V, but the value of the speed V may be changed during the centrifugal process.

  Next, the CPU 101 controls the rotation controller 98 to drive and control the stepping motor 51, and rotates the inspection chip 2 up to a rotation angle of 90 degrees as shown in FIG. 5C (S4). As a result, the centrifugal force X acts on the test chip 2 from the upper side portion 81 toward the lower side portion 84. Due to the action of the centrifugal force X, the reaction stop liquid 91, the substrate solution 92, and the cleaning liquid 93 are transferred from the supply units 320, 340, and 360 to the substrate solution injection unit 330, the cleaning liquid injection unit 350, and the test liquid injection unit 370, respectively. Moving. Further, the test liquid 94 moves from the supply unit 380 to the receiving unit 20. The bead dispersion 951 moves from the supply unit 420 to the measurement unit 430.

  Next, the CPU 101 controls the rotation controller 98 to drive and control the stepping motor 51, and as shown in FIG. 5D, the inspection chip 2 is rotated to a rotation angle of 0 degrees (S5). As a result, the centrifugal force X acts on the test chip 2 from the left side portion 83 toward the right side portion 82 shown in FIG. Due to the action of the centrifugal force X, the reaction stop liquid 91, the substrate solution 92, and the cleaning liquid 93 are supplied from the substrate solution injection unit 330, the cleaning liquid injection unit 350, and the test liquid injection unit 370 to the supply units 340, 360, and 380, respectively. Moving. In addition, the test liquid 94 moves to the supply unit 400 via the supply channel 200. The bead dispersion 951 moves from the measurement unit 430 to the waste liquid unit 440.

  Next, the CPU 101 controls the rotation controller 98 to drive and control the stepping motor 51, and as shown in FIG. 5E, the inspection chip 2 is rotated to a rotation angle of 90 degrees (S6). As shown in FIG. 9, in the process in which the CPU 101 rotates the inspection chip 2 to the rotation angle of 90 degrees, the cleaning liquid 93 flows into the receiving unit 20 when the centrifugal force X acts perpendicularly to the first guide surface 41. Since the angle R22 is smaller than the angles R1 to R4, when the cleaning liquid 93 flows into the receiving unit 20, the cleaning liquid 93 hardly flows out to the supply unit 400 through the supply channels 21 to 24.

  As shown in FIG. 5E, when the inspection chip 2 rotates to a rotation angle of 90 degrees, centrifugal force X acts on the inspection chip 2 from the upper side portion 81 toward the lower side portion 84. Due to the action of the centrifugal force X, the reaction stop solution 91 and the substrate solution 92 move from the supply units 340 and 360 to the cleaning liquid injection unit 350 and the test liquid injection unit 370, respectively. The cleaning liquid 93 moves to the receiving unit 20. The cleaning liquid 93 overflowing from the receiving part 20 moves to the surplus part 390 through the second guide surface 42. The inspection liquid 94 moves to the bead holding unit 410. When the inspection liquid 94 comes into contact with the beads 31, the substance to be inspected contained in the inspection liquid 94 is bound to the antibody solid-phased on the beads 31, and further, a conjugate of the substance to be inspected and the antibody of the beads 31. The enzyme-labeled antibody specifically binds to the.

  The CPU 101 supplies the cleaning liquid 93 from the receiving unit 20 to the bead holding unit 410 a plurality of times via any one of the plurality of supply channels 21 to 24 to wash the beads 31 in multiple stages. The CPU 101 supplies the cleaning liquid 93 to the bead holding unit 410 in multiple stages by repeatedly executing the first operation and the second operation. The first operation is an operation in which the centrifugal force X is applied to the inspection chip 2 in the forming direction. The second operation is an operation in which the centrifugal force X is applied to the inspection chip 2 in a direction different from the forming direction. When the CPU 101 performs the n-th second operation, the angle formed between the direction in which the centrifugal force X is applied and the formation direction is the direction perpendicular to the direction in which the n-th supply channel 200 extends and the formation direction. Centrifugal force X is applied in a direction that is equal to or larger than the angle and smaller than the angle formed by the direction perpendicular to the direction in which the (n + 1) th supply flow path 200 extends and the formation direction. In the present embodiment, as an example, the second operation is an operation in which a centrifugal force is applied in a direction perpendicular to the direction in which the supply flow path 200 extends. Further, when the CPU 101 performs the n-th second operation, it is assumed that the centrifugal force is applied in a direction perpendicular to the direction in which the n-th supply flow path 200 extends from the direction opposite to the formation direction.

  The CPU 101 controls the rotation controller 98 to drive and control the stepping motor 51, and as shown in FIGS. 6F and 10, performs the first second operation of rotating the inspection chip 2 to the rotation angle of 45 degrees ( S7). As a result, the centrifugal force X acts in a direction perpendicular to the direction in which the first supply channel 21 extends from the side opposite to the formation direction. As shown in FIG. 10, the cleaning liquid 93 flows from the supply channel 21 to the supply unit 400 by the action of the centrifugal force X. At this time, the cleaning liquid 93 flows along the exit virtual line 219. The exit wall surface 214 is inclined to the left side, which is the receiving portion 20 side, with respect to the exit virtual line 219. For this reason, compared with the case where the outlet wall surface 214 is inclined to the right side opposite to the receiving portion 20 side from the outlet virtual line 219, the cleaning liquid 93 flowing from the supply flow path 21 to the bead holding portion 410 side is Difficult to travel along the wall 214.

  In addition, the first supply wall surface 221 is located on the left side, which is the receiving portion 20 side, from the exit virtual line 219. For this reason, compared with the case where the 1st supply wall surface 221 crosses the exit virtual line 219, the washing | cleaning liquid 93 which flows along the exit virtual line 219 does not hit the 1st supply wall surface 221 easily. Further, the liquid level 93 </ b> A of the cleaning liquid 93 flowing into the second supply flow path 22 from the side opposite to the formation direction intersects the first supply wall surface 221 along the entrance virtual line 228. For this reason, it is difficult for the cleaning liquid 93 to flow from the supply channel 22 to the supply unit 400. Further, since the liquid level of the cleaning liquid 93 flowing into the supply flow paths 23 and 24 also intersects the first supply wall surfaces 231 and 241, the cleaning liquid 93 hardly flows from the supply flow paths 23 and 24 to the supply unit 400.

  The angle R20 shown in FIG. 3 and the angle R41 shown in FIG. 2 are larger than the angle R1 shown in FIG. For this reason, as shown in FIG. 6F, even if the test chip 2 rotates to a rotation angle of 45 degrees and the centrifugal force X acts in the direction perpendicular to the direction in which the supply flow path 21 extends, the reaction stop solution 91 The substrate solution 92 is held in the cleaning liquid injection unit 350 and the test liquid injection unit 370, respectively. Further, the test liquid 94 moves to the supply unit 420 through the take-out flow path 412. In addition, the cleaning liquid 93 that has partially moved from the supply channel 21 to the supply unit 400 remains in the receiving unit 20. In the following description, the cleaning liquid 93 that has moved from the supply channel 21 to the supply unit 400 is referred to as a cleaning liquid 931.

  Next, the CPU 101 controls the rotation controller 98 to drive and control the stepping motor 51, and as shown in FIG. 6G, performs a first operation for rotating the test chip 2 to a rotation angle of 90 degrees (S8). As a result, the centrifugal force X acts on the test chip 2 from the upper side portion 81 toward the lower side portion 84. The cleaning liquid 931 moves to the bead holding unit 410 by the action of the centrifugal force X. The first cleaning of the beads 31 is performed with the cleaning liquid 931. Further, the test liquid 94 moves to the measurement unit 430. The reaction stop solution 91 and the substrate solution 92 are held in the cleaning liquid injection unit 350 and the test liquid injection unit 370, respectively.

  Next, the CPU 101 controls the rotation controller 98 to drive and control the stepping motor 51, and as shown in FIGS. 6 (H) and 12, the second operation of rotating the inspection chip 2 to the rotation angle 60 degrees is performed. Perform (S9). As a result, the centrifugal force X acts in a direction perpendicular to the direction in which the second supply flow path 22 extends from the side opposite to the formation direction. As shown in FIG. 11, in the process in which the CPU 101 rotates the inspection chip 2 to a rotation angle of 60 degrees, the centrifugal force X acts in a direction perpendicular to the direction in which the take-out flow path 412 extends. Since the angle R23 is smaller than the angle R2, the cleaning liquid 931 remaining in the bead holding part 410 passes through the take-out flow path 412 before the cleaning liquid 93 flows from the supply flow path 22 to the supply part 400 on the bead holding part 410 side. Flow to the supply unit 420 on the measurement unit 430 side.

  Then, as shown in FIG. 12, when the centrifugal force X acts in a direction perpendicular to the direction in which the supply flow path 22 extends, the cleaning liquid 93 flows from the supply flow path 22 to the supply unit 400 by the action of the centrifugal force X. At this time, the cleaning liquid 93 flows along the exit virtual line 229. The outlet wall surface 224 is inclined to the left side, which is the receiving unit 20 side, with respect to the outlet virtual line 229. For this reason, compared with the case where the outlet wall surface 224 is inclined to the right side opposite to the receiving portion 20 side with respect to the outlet virtual line 229, the cleaning liquid 93 flowing from the supply flow path 22 to the bead holding portion 410 side is It is difficult to travel along the wall surface 224.

  In addition, the first supply wall surface 231 is located on the left side, which is the receiving portion 20 side, from the exit virtual line 229. For this reason, compared with the case where the 1st supply wall surface 231 cross | intersects the exit virtual line 229, the washing | cleaning liquid 93 which flows along the exit virtual line 229 hardly hits the 1st supply wall surface 231. The liquid surface 93 </ b> B of the cleaning liquid 93 flowing into the third supply channel 23 from the side opposite to the formation direction intersects the first supply wall surface 231 along the entrance virtual line 238. For this reason, it is difficult for the cleaning liquid 93 to flow from the supply channel 23 to the supply unit 400. Further, since the liquid level of the cleaning liquid 93 flowing into the supply flow path 24 also intersects the first supply wall surface 241, it is difficult for the cleaning liquid 93 to flow from the supply flow path 24 to the supply unit 400.

  The angle R20 shown in FIG. 3 and the angle R41 shown in FIG. 2 are larger than the angle R2 shown in FIG. For this reason, as shown in FIG. 6H, even when the inspection chip 2 rotates to a rotation angle of 60 degrees and the centrifugal force X acts in the direction perpendicular to the direction in which the supply flow path 22 extends, The substrate solution 92 is held in the cleaning liquid injection unit 350 and the test liquid injection unit 370, respectively. The inspection liquid 94 moves from the measurement unit 430 to the waste liquid unit 440. In addition, the cleaning liquid 93 that has partially moved from the supply channel 22 to the supply unit 400 remains in the receiving unit 20. In the following description, the cleaning liquid 93 that has moved from the supply flow path 22 to the supply unit 400 is referred to as a cleaning liquid 932.

  Next, the CPU 101 controls the rotation controller 98 to drive and control the stepping motor 51, and as shown in FIG. 6 (I), performs a first operation for rotating the inspection chip 2 to a rotation angle of 90 degrees (S10). As a result, the centrifugal force X acts on the test chip 2 from the upper side portion 81 toward the lower side portion 84. Due to the action of the centrifugal force X, the cleaning liquid 932 moves to the bead holding unit 410. The beads 31 are washed a second time with the washing liquid 932. In addition, the cleaning liquid 931 moves to the measurement unit 430. The reaction stop solution 91 and the substrate solution 92 are held in the cleaning liquid injection unit 350 and the test liquid injection unit 370, respectively.

  Next, the CPU 101 controls the rotation controller 98 to drive and control the stepping motor 51, and as shown in FIGS. 6 (J) and 13, the CPU 101 performs a second second operation for rotating the inspection chip 2 to a rotation angle of 70 degrees. Perform (S11). As a result, the centrifugal force X acts in a direction perpendicular to the direction in which the third supply flow path 23 extends from the side opposite to the formation direction. As shown in FIG. 13, the cleaning liquid 93 flows from the supply channel 23 to the supply unit 400 by the action of the centrifugal force X. At this time, the cleaning liquid 93 flows along the exit virtual line 239. The outlet wall surface 234 is inclined to the left side which is the receiving portion 20 side with respect to the outlet virtual line 239. For this reason, compared with the case where the outlet wall surface 234 is inclined to the right side opposite to the receiving portion 20 side from the outlet virtual line 239, the cleaning liquid 93 flowing from the supply flow path 23 to the bead holding portion 410 side is It is difficult to travel along the wall surface 234.

  Further, the first supply wall surface 241 is located on the left side that is the receiving portion 20 side from the virtual exit line 239. For this reason, compared with the case where the 1st supply wall surface 241 crosses the exit virtual line 239, the washing | cleaning liquid 93 which flows along the exit virtual line 239 does not hit the 1st supply wall surface 241 easily. Further, the liquid level 93 </ b> C of the cleaning liquid 93 flowing into the fourth supply flow path 23 from the side opposite to the formation direction intersects the first supply wall surface 241 along the virtual inlet line 248. For this reason, it is difficult for the cleaning liquid 93 to flow from the supply channel 24 to the supply unit 400.

  The angle R20 shown in FIG. 3 and the angle R41 shown in FIG. 2 are larger than the angle R3 shown in FIG. For this reason, as shown in FIG. 6J, even if the inspection chip 2 rotates to a rotation angle of 70 degrees and the centrifugal force X acts in a direction perpendicular to the direction in which the supply flow path 23 extends, the reaction stop solution 91 The substrate solution 92 is held in the cleaning liquid injection unit 350 and the test liquid injection unit 370, respectively. Since the angle R23 is smaller than the angle R3, the cleaning liquid 932 remaining in the bead holding unit 410 flows to the supply unit 420 through the extraction channel 412 before the cleaning liquid 93 flows from the supply channel 23 to the supply unit 400. . The cleaning liquid 931 moves from the measurement unit 430 to the waste liquid unit 440. In addition, the cleaning liquid 93 that has partially moved from the supply channel 21 to the supply unit 400 remains in the receiving unit 20. In the following description, the cleaning liquid 93 that has moved from the supply flow path 23 to the supply unit 400 is referred to as a cleaning liquid 933.

  Next, the CPU 101 controls the rotation controller 98 to drive and control the stepping motor 51, and as shown in FIG. 7K, performs the first operation of rotating the inspection chip 2 to the rotation angle of 90 degrees (S12). As a result, the centrifugal force X acts on the test chip 2 from the upper side portion 81 toward the lower side portion 84. Due to the action of the centrifugal force X, the cleaning liquid 933 moves to the bead holding unit 410. The beads 31 are washed a third time with the washing solution 933. In addition, the cleaning liquid 932 moves to the measurement unit 430. The reaction stop solution 91 and the substrate solution 92 are held in the cleaning liquid injection unit 350 and the test liquid injection unit 370, respectively.

  Next, the CPU 101 controls the rotation controller 98 to drive and control the stepping motor 51, and as shown in FIG. 7 (L), the inspection chip 2 is rotated to a rotation angle of 0 degree (S13). As shown in FIG. 14, in the process in which the CPU 101 rotates the inspection chip to the rotation angle of 90 degrees, the cleaning liquid 93 is applied when the centrifugal force X acts in the direction perpendicular to the direction in which the supply flow path 24 on the most forming direction side extends. Flows into the supply section 400 from the supply flow path 24. At this time, the cleaning liquid 93 flows along the exit virtual line 249. The exit wall surface 244 is inclined to the left side, which is the receiving portion 20 side, with respect to the exit virtual line 249. For this reason, compared with the case where the outlet wall surface 244 is inclined to the right side opposite to the receiving portion 20 side from the outlet virtual line 249, the cleaning liquid 93 flowing from the supply flow path 24 to the bead holding portion 410 side is It is difficult to travel along the wall surface 244. Further, since R4 and R20 and R41 shown in FIG. 2 have the same angle, the reaction stop solution 91 and the substrate solution 92 flow from the cleaning liquid injection unit 350 and the test liquid injection unit 370 to the supply units 360 and 380, respectively. In the following description, the cleaning liquid 93 that has moved from the supply channel 24 to the supply unit 400 is referred to as a cleaning liquid 934.

  As shown in FIG. 7L, when the inspection chip 2 rotates to a rotation angle of 90 degrees, the reaction stop solution 91 and the substrate solution 92 are held in the supply units 360 and 380, respectively. Since the angle R <b> 23 is smaller than the angle R <b> 4, the cleaning liquid 933 moves to the supply unit 420 through the extraction flow path 412 before the cleaning liquid 93 flows from the supply flow path 23 to the supply unit 400. The cleaning liquid 932 moves from the measurement unit 430 to the waste liquid unit 440. In S13, the CPU 101 may rotate the inspection chip 2 to a position where the centrifugal force X acts in a direction perpendicular to the direction in which the supply flow path 24 extends.

  Next, the CPU 101 controls the rotation controller 98 to drive and control the stepping motor 51 to rotate the inspection chip 2 to a rotation angle of 90 degrees as shown in FIG. 7M (S14). As a result, the centrifugal force X acts on the test chip 2 from the upper side portion 81 toward the lower side portion 84. The cleaning liquid 934 moves to the bead holding unit 410 by the action of the centrifugal force X. A fourth cleaning of the beads 31 is performed by the cleaning liquid 934. The cleaning liquid 933 moves to the measurement unit 430. The reaction stop solution 91 and the substrate solution 92 flow into the test liquid injection unit 370 and the receiving unit 20 from the supply units 360 and 380, respectively. As described above, the CPU 101 performs multi-stage washing of the beads 31 without stopping the action of the centrifugal force X on the inspection chip 2.

  Next, the CPU 101 controls the rotation controller 98 to drive and control the stepping motor 51, and as shown in FIG. 7N, rotates the inspection chip 2 to the rotation angle of 0 degree (S13). As a result, the centrifugal force X acts on the test chip 2 from the left side portion 83 toward the right side portion 82 shown in FIG. Due to the action of the centrifugal force X, the reaction stop solution 91 and the substrate solution 92 move from the test liquid injection unit 370 and the receiving unit 20 to the supply units 380 and 400, respectively. In addition, the cleaning liquid 934 is taken out from the bead holding unit 410 and moved to the supply unit 420 via the flow path 412. The cleaning liquid 933 moves from the measurement unit 430 to the waste liquid unit 440.

  Next, the CPU 101 controls the rotation controller 98 to drive and control the stepping motor 51, and rotates the inspection chip 2 to a rotation angle of 90 degrees as shown in FIG. 7O (S14). As a result, the centrifugal force X acts on the test chip 2 from the upper side portion 81 toward the lower side portion 84. Due to the action of the centrifugal force X, the substrate solution 92 moves from the supply unit 400 to the bead holding unit 410. The substrate solution 92 comes into contact with the beads 31 after being washed with the washing liquid 93 and reacts with the enzyme-labeled antibody. In addition, the reaction stop solution 91 and the cleaning solution 934 move from the supply units 380 and 420 to the receiving unit 20 and the measurement unit 430, respectively.

  Next, the CPU 101 controls the rotation controller 98 to drive and control the stepping motor 51, and as shown in FIG. 8 (P), the inspection chip 2 is rotated to a rotation angle of 0 degrees (S15). As a result, the centrifugal force X acts on the test chip 2 from the left side portion 83 toward the right side portion 82 shown in FIG. Due to the action of the centrifugal force X, the reaction stop solution 91 moves from the receiving unit 20 to the supply unit 400. The substrate solution 92 moves to the supply unit 420 through the take-out channel 412. The cleaning liquid 934 moves from the measurement unit 430 to the waste liquid unit 440.

  Next, the CPU 101 controls the rotation controller 98 to drive and control the stepping motor 51, and as shown in FIG. 8 (Q), the inspection chip 2 is rotated up to a rotation angle of 90 degrees (S16). As a result, the centrifugal force X acts on the test chip 2 from the upper side portion 81 toward the lower side portion 84. The reaction stopping liquid 91 moves from the supply unit 400 to the bead holding unit 410. The substrate solution 92 moves from the supply unit 420 to the measurement unit 430.

  Next, the CPU 101 controls the rotation controller 98 to drive and control the stepping motor 51 to rotate the inspection chip 2 to a rotation angle of 40 degrees as shown in FIG. 8R (S17). As a result, the centrifugal force X in the direction perpendicular to the direction in which the take-out flow path 412 extends acts on the test chip 2. The reaction stop solution 91 is removed from the bead holding unit 410 and moved to the supply unit 420 via the flow path 412. Since the angle R24 is larger than the angle R23, the substrate solution 92 is held in the measurement unit 430.

  Next, the CPU 101 controls the rotation controller 98 to drive and control the stepping motor 51, and as shown in FIG. 7S, rotates the inspection chip 2 to a rotation angle of 90 degrees (S18). As a result, the centrifugal force X acts on the test chip 2 from the upper side portion 81 toward the lower side portion 84. The reaction stop solution 91 moves from the supply unit 420 to the measurement unit 430. In the measurement unit 430, the reaction stop solution 91 is mixed with the substrate solution 92, and the progress of the enzyme reaction of the substrate solution 92 is stopped. In the following description, the substrate solution 92 mixed with the reaction stop solution 91 is referred to as a measurement solution 921.

  Although not shown in FIG. 8, after S18 is executed, the CPU 101 controls the rotation controller 98 to drive the stepping motor 51. The CPU 101 rotates the inspection chip 2 until the rotation angle is 0 degree (S19). The CPU 101 controls the revolution controller 97 to stop the rotation of the spindle motor 35 (S19). Therefore, the revolution of the inspection chip 2 is completed. Centrifugation is terminated.

  After executing the centrifugal process, the CPU 101 controls the revolution controller 97 to rotate and move the inspection chip 2 to the angle of the measurement position. A measurement solution 921 using the test liquid 94 is held in the measurement unit 430 of the measurement channel 251. Although not shown, the measurement solution 921 using the reference test liquids 941 to 943 is held in the measurement unit 430 of the measurement flow paths 252 to 254. The measurement controller 99 shown in FIG. 1 causes the light source 71 to emit light and sequentially transmits the measurement light to the measurement solution 921 stored in the measurement unit 430 of the measurement flow paths 251 to 254. The CPU 101 performs optical measurement of the measurement solution 921 stored in the measurement unit 430 of the measurement flow paths 251 to 254 based on the change amount of the measurement light received by the optical sensor 72, and acquires measurement data. The CPU 101 compares the measurement data acquired using the measurement solution 921 of the measurement flow paths 252 to 254 with the measurement data acquired using the measurement solution 921 of the measurement flow path 251 and uses the test liquid 94. The measurement result of the measurement solution 921 thus generated is calculated. The CPU 101 displays the inspection result on the display 106 shown in FIG.

  For example, when the measurement result is calculated using only the measurement solution 921 in which the test liquid 94 is used, the measurement result may be due to variations in the external environment such as temperature, or variations in the movement mode of the reagent 9 in the centrifugation process. May vary. In the present embodiment, the measurement result is calculated by comparing the measurement data based on the measurement solution 921 using the test liquid 94 and the measurement data based on the measurement solution 921 using the reference test liquids 941 to 943. Variations in measurement results can be reduced. In the present embodiment, the measurement solution 921 stored in the four measurement units 430 is measured. In this case, the light source 71 and the optical sensor 72 shown in FIG. 1 may move in the left-right direction, and the measurement light may be sequentially transmitted through the four measurement units 430, or the measurement light may be transmitted to the four measurement units 430. Each of the four light sources 71 and the optical sensor 72 may be provided side by side in the left-right direction so that the light can be transmitted. Further, the measurement method of the measurement solution 921 is not limited to optical measurement, and other methods may be used.

<7. Main actions and effects of this embodiment>
As described above, the measurement in the present embodiment is performed. In the present embodiment, the cleaning liquid 93 flows into the receiving portion 20. The plurality of supply flow paths 200 extend at a larger angle with respect to the formation direction as the supply flow path 200 on the formation direction side. When performing the n-th second operation, the CPU 101 applies centrifugal force in a direction perpendicular to the direction in which the nth supply channel 200 extends from the direction opposite to the formation direction, The cleaning liquid 93 is supplied to the bead holding unit 410 in order from the supply channel 200. At this time, as shown in S7, S9, S11, and S12 of FIG. 4, the deflection width that is the rotation angle of the test chip 2 gradually increases between the formation direction and the vertical direction perpendicular to the formation direction. That is, by gradually increasing the swing width between the forming direction and the vertical direction perpendicular to the forming direction while applying a centrifugal force to the inspection chip 2, the supply flow path 200 on the opposite side to the forming direction side is sequentially increased. In addition, the cleaning liquid 93 can be supplied to the bead holder 410. Therefore, the beads 31 can be washed in multiple stages without stopping the action of the centrifugal force. Therefore, the action of the centrifugal force is stopped and the reagent 9 does not diffuse, and the possibility that the inspection accuracy is lowered can be reduced.

  Further, as shown in FIG. 11, since the angle R23 is smaller than the angle R2, the second cleaning liquid 93 is supplied from the second supply flow path 22 from the opposite side to the forming direction to the bead holding unit 410 side. In addition, the cleaning liquid 931 remaining in the bead holding unit 410 is discharged to the measurement unit 430 side through the take-out flow path 412. In addition, the plurality of supply channels 200 extend at a larger angle with respect to the formation direction as the supply channel 200 on the formation direction side. For this reason, when the angle R23 is smaller than the angle R2, the angle R23 is smaller than the angles R3, R4 formed by the third and subsequent supply channels 23, 24 from the direction opposite to the formation direction and the formation direction. For this reason, before the cleaning liquid 93 is supplied to the bead holding unit 410 from each of the third and subsequent supply channels, the cleaning liquid 93 remaining in the bead holding unit 410 passes through the extraction channel 412 and the measurement unit. It is discharged to 430. Therefore, after the cleaning liquid 93 in the bead holding unit 410 is discharged, the cleaning liquid 93 is newly supplied to the bead holding unit 410, and the beads 31 can be cleaned in multiple stages. Therefore, the possibility that the cleaning liquid 93 used for cleaning the beads 31 and the cleaning liquid 93 newly supplied to the bead holding unit 410 may be reduced. Therefore, compared with the case where the cleaning liquid 93 used for cleaning the beads 31 and the cleaning liquid 93 newly supplied to the bead holding unit 410 are mixed, it is possible to reduce the possibility that the inspection accuracy is lowered.

  As shown in FIG. 13, since the angle R20 is larger than the angle R3, the substrate solution 92 is held in the test liquid injection unit 370 until the cleaning liquid 93 flows from the second supply flow path 23 from the formation direction side. Therefore, the possibility that the cleaning solution 93 and the substrate solution 92 are mixed can be reduced. Then, as shown in FIG. 14, the substrate solution 92 moves from the test liquid injection part 370 when the cleaning liquid 93 flows from the supply flow path 24 on the most forming direction side. For this reason, as shown in FIGS. 7M to 7O, the substrate solution 92 can be brought into contact with the beads 31 immediately after the beads 31 have been washed with the washing solution 93. Therefore, the substrate solution 92 contacts the beads 31 before the beads 31 are dried after washing. Therefore, the possibility that the beads 31 are dried after washing and the reaction accuracy with the substrate solution 92 is lowered can be reduced, and the possibility that the inspection accuracy is lowered can be reduced.

  Further, as shown in FIG. 10, when the centrifugal force X acts in a direction perpendicular to the direction in which the first supply channel 21 on the opposite side of the formation direction extends, the cleaning liquid 93 is discharged from the first supply channel 21. It begins to flow out. At this time, the liquid level 93 </ b> D of the cleaning liquid 93 in the receiving unit 20 is inclined in parallel with the first supply flow path 21. For this reason, the angle R25 formed by the liquid surface 93D of the cleaning liquid 93 and the forming direction is the same as the angle R1. Since the angle R21 is larger than the angle R1, the liquid level 93D is positioned closer to the formation direction than the first end 411 even if the liquid level 93D of the cleaning liquid 93 is inclined in parallel to the angle R1. For this reason, it is possible to reduce the possibility that the cleaning liquid 93 with the inclined liquid surface flows backward from the first end 411 to the upstream side. Accordingly, it is possible to reduce the possibility that the cleaning liquid 93 flows backward and mixes with other reagents 9 and the inspection accuracy is lowered.

  Further, as shown in FIG. 9, when the centrifugal force X is applied in a direction perpendicular to the first guide surface 41, the cleaning liquid flows into the receiving unit 20. Since the angle R22 is smaller than the angle R1, as compared with the case where the angle R22 is equal to or larger than the angle R1, when the cleaning liquid 93 flows into the receiving portion 20, the cleaning liquid 93 is supplied from the first supply channel 21 on the opposite side to the formation direction. Can be reduced to the downstream side. Therefore, the possibility that the cleaning liquid 93 is mixed with the inspection liquid 94 can be reduced, and the possibility that the inspection accuracy is lowered can be reduced.

  In addition, as shown in FIGS. 10, 12, and 13, centrifugal force X is applied in a direction perpendicular to the direction in which the (n-1) th supply channels 21, 22, and 23 extend from the direction opposite to the forming direction. In this case, the cleaning liquid 93 flows from the (n-1) th supply channels 21, 22, and 23 toward the bead holding unit 410. At this time, the liquid surfaces 93A, 93B, and 93C of the cleaning liquid 93 flowing into the nth supply flow paths 22, 23, and 24 are respectively supplied to the first supply wall surfaces 221, 231, Crosses 241. Therefore, compared with the case where the inlet virtual lines 228, 238, 248 do not intersect the first supply wall surfaces 221, 231, 241, the cleaning liquid 93 flows from the nth supply flow path 22, 23, 24 to the bead holding unit 410 side. hard. Therefore, when the cleaning liquid 93 flows from the nth supply flow path 22, 23, 24 to the bead holding unit 410 side, the possibility that the cleaning liquid 93 is insufficient can be reduced. Therefore, possibility that inspection accuracy will fall can be reduced.

  Further, as shown in FIGS. 10 and 12 to 14, the cleaning liquid 93 that has passed through the supply flow path 200 has a virtual exit line when a centrifugal force X acts in a direction orthogonal to the direction in which the supply flow path 200 extends. It flows to the bead holding part 410 side along 219,229,239,249. The outlet wall surfaces 214, 224, 234, and 244 are inclined to the receiving portion 20 side from the outlet virtual lines 219, 229, 239, and 249. For this reason, compared with the case where the outlet wall surfaces 214, 224, 234, 244 are inclined to the right side opposite to the receiving portion 20 side from the outlet virtual lines 219, 229, 239, 249, from the supply flow path 200. It is difficult for the cleaning liquid 93 flowing to the bead holding unit 410 side to travel along the outlet wall surfaces 214, 224, 234, and 244. Therefore, it is possible to reduce the possibility that the cleaning liquid 93 flows along the outlet wall surfaces 214, 224, and 234 and flows into the supply flow path 200 on the forming direction side, and the cleaning liquid 93 flows backward. Therefore, the beads 31 can be more reliably washed without running out of the washing solution 93. Therefore, possibility that inspection accuracy will fall can be reduced.

  Moreover, compared with the case where the 1st supply wall surface 221,231,241 cross | intersects the exit virtual lines 219,229,239, respectively, the exit virtual line 219, n from the n-1th supply flow path 21,22,23. The cleaning liquid 93 flowing along the 229 and 239 hardly hits the first supply wall surfaces 221, 231, and 241 in the n-th supply flow paths 22, 23, and 24. For this reason, it is possible to reduce the possibility that the cleaning liquid 93 flows back through the first supply wall surfaces 221, 231, 241 in the nth supply flow paths 22, 23, 24. Therefore, the beads 31 can be more reliably washed without running out of the washing solution 93. Therefore, possibility that inspection accuracy will fall can be reduced.

  In the said embodiment, angle R23 is an example of the 1st angle of this invention. The angle R2 is an example of the second angle of the present invention. The angle R20 is an example of the third angle of the present invention. The angle R3 is an example of the fourth angle of the present invention. The angle R24 is an example of the fifth angle of the present invention. The angle R21 is an example of the hexagonal degree according to the present invention. The angle R1 is an example of the seventh angle of the present invention. The angle R22 is an example of the eighth angle of the present invention. The measurement solution 921 is an example of the reaction solution of the present invention.

  In addition, this invention is not limited to said embodiment, A various change is possible. For example, the first supply wall surfaces 221, 231, and 241 may intersect the exit virtual lines 219, 229, and 239, respectively. The outlet wall surfaces 214, 224, 234, and 244 may be inclined to the right side opposite to the receiving portion 20 side with respect to the outlet virtual lines 219, 229, 239, and 249. The angle R22 may be greater than or equal to the angle R1. The angle R21 may be equal to or less than the angle R1. The angle R20 may be equal to or less than the angle R3. The angle R23 may be greater than or equal to the angle R2.

  Further, when the substrate solution 92 is a substrate solution that undergoes a color reaction, the reaction stop solution 91 may not be disposed on the test chip 2. In this case, the reaction stop liquid injection part 310 may not be provided in the inspection chip 2. In addition, although the enzyme-labeled antibody is contained in the test liquid 94, the test liquid 94 may not include the enzyme-labeled antibody, and a labeled specimen solution containing the enzyme-labeled antibody may be used. In this case, a labeled specimen liquid injection section for injecting a labeled specimen liquid may be provided between the cleaning liquid injection section 350 and the test liquid injection section 370. Further, as shown in FIGS. 8R and 8S, the reaction stop solution 91 is mixed with the substrate solution 92 in the measurement unit 430. However, the reaction stop solution 91 is mixed upstream of the measurement unit 430. May be.

  Further, the angle R24 may be equal to or less than the angle R23. As shown in FIG. 5 to FIG. 8, the cleaning liquid 93 flows from the supply channel 200 to the bead holding unit 410 in multiple stages, passes through the extraction channel 412 and flows to the measurement unit 430 in multiple stages, and passes through the waste liquid channel surface 431. It passes through the waste liquid section 440 in multiple stages. In this process, the measuring unit 430 is cleaned in multiple stages by the cleaning liquid 93. When the angle R <b> 24 is equal to or less than the angle R <b> 23, the cleaning liquid 93 flows out from the take-out flow path 412 at the same time or after the cleaning liquid 93 that has cleaned the measuring unit 430 flows into the waste liquid section 440. For this reason, compared with the case where the angle R24 is larger than the angle R23, the possibility that the cleaning liquid 93 in each stage is mixed in the measurement unit 430 can be reduced. Therefore, compared with the case where the cleaning liquid 93 in each stage is mixed in the measurement unit 430, the measurement unit 430 is easily cleaned, and the possibility that the inspection accuracy is lowered can be reduced.

  Further, the second operation is not limited to an operation in which a centrifugal force is applied in a direction perpendicular to the direction in which the supply flow path 200 extends. When the CPU 101 performs the n-th second operation, the angle formed by the direction in which the centrifugal force is applied and the forming direction are equal to or larger than the angle formed by the direction perpendicular to the direction in which the nth supply channel extends and the forming direction. In addition, the centrifugal force may be applied in a direction that is smaller than the angle formed by the direction perpendicular to the direction in which the (n + 1) th supply channel extends and the forming direction. For example, FIG. 6F shows the state of the test chip 2 and the centrifugal force X when the second operation is performed for the first time. The direction 701 is a direction perpendicular to the direction in which the first supply channel 21 extends. The direction 701 is parallel to the direction of the centrifugal force X shown in FIG. The direction 702 is a direction perpendicular to the direction in which the second supply channel 22 extends. The direction 702 is parallel to the direction of the centrifugal force X shown in FIG. When the second operation is performed for the first time, if the centrifugal force X is applied in a direction that is greater than or equal to an angle R31 formed by the direction 701 and the forming direction and smaller than an angle R32 formed by the direction 702 and the forming direction. Good. In this case, the cleaning liquid 93 moves from the supply channel 21 to the supply unit 400, but does not move from the supply channels 22 to 24. Also in the case of the present modification, the cleaning liquid can be supplied to the bead holding unit in order from the supply channel on the opposite side to the formation direction. Therefore, the beads can be washed in multiple stages without stopping the action of the centrifugal force. Therefore, the action of the centrifugal force is stopped, the reagent does not diffuse, and the possibility that the inspection accuracy is lowered can be reduced.

DESCRIPTION OF SYMBOLS 1 Inspection apparatus 2 Inspection chip 3 Inspection system 9 Reagent 21,22,23,24,200 Supply flow path 31 Bead 41 First guide surface 42 Second guide surface 92 Substrate solution 93,931,932,933,934 Cleaning solution 94 Inspection Liquid 95, 951 Bead dispersion 211, 221, 231, 241 First supply wall surface 212, 222, 232, 242 Second supply wall surface 213, 223, 233, 243 Inlet end 213, 223, 233, 243 First end 214, 224, 234, 244 Outlet wall surfaces 215, 225, 235, 245 Outlet end portions 219, 229, 239, 249 Outlet virtual lines 228, 238, 248 Inlet virtual line 330 Substrate solution injection unit 350 Cleaning liquid injection unit 370 Inspection liquid injection Part 371 formation surface 390 surplus part 410 bead holding part 411 first end part 412 take-out flow path 421 Second end 430 Measuring unit 431 Waste liquid flow path surface 440 Waste liquid part

Claims (10)

A substrate solution injection part into which a substrate solution for an enzyme reaction is injected;
A cleaning liquid injection unit disposed downstream of the substrate solution injection unit and into which a cleaning liquid is injected;
A test liquid injection part that is arranged downstream of the cleaning liquid injection part and into which a test liquid containing a test target substance is injected,
The substrate solution disposed downstream of the inspection liquid injection unit and injected into the substrate solution injection unit, the cleaning liquid injected into the cleaning liquid injection unit, and the inspection liquid injected into the inspection liquid injection unit And a receiving part into which
A bead holding portion that is arranged downstream of the receiving portion and holds beads for antigen-antibody reaction;
A measurement unit that is arranged downstream of the bead holding unit and that measures a reaction solution containing the substrate solution that has reacted with the test liquid and the beads;
A waste liquid part disposed downstream of the measurement part,
The substrate solution injection part, the cleaning liquid injection part, the inspection liquid injection part, the receiving part, and the measurement part are recessed in the same forming direction,
The receiving portion is connected to the bead holding portion, and includes a plurality of supply channels arranged in the forming direction,
The inspection chip, wherein the plurality of supply channels extend at a larger angle with respect to the formation direction as the supply channel on the formation direction side. The bead holding unit includes a take-out flow channel connected to the measurement unit on the formation direction side,
The first angle formed by the direction in which the take-out flow channel extends and the formation direction is the direction in which the second supply flow channel extends from the opposite side of the formation direction and the formation direction among the plurality of supply flow channels. The inspection chip according to claim 1, wherein the inspection chip is smaller than a second angle formed by.   A third angle formed by a direction in which a forming surface that forms a flow channel connected to the receiving portion and a forming direction among the surfaces that form the test liquid injection portion is formed is the formation angle of the plurality of supply flow channels. The inspection chip according to claim 2, wherein the inspection chip is larger than a fourth angle formed by a direction in which the second supply channel extends from a direction side and the forming direction.   A fifth angle formed by a direction in which a waste liquid flow channel surface that forms a flow channel connected to the waste liquid portion extends and the formation direction among the surfaces forming the measurement unit is equal to or less than the first angle. The inspection chip according to claim 2 or 3. An excess portion provided on the opposite side of the supply flow channel side with respect to the receiving portion;
A first guide surface which is provided between the test liquid injection part and the receiving part and is connected to the receiving part;
A second guide surface extending from the receiving part toward the surplus part,
A first end portion on the receiving portion side of the first guide surface;
A second end portion on the receiving portion side of the second guide surface,
The hexagonal degree formed by the direction from the second end portion toward the first end portion and the forming direction is determined by the direction in which the first supply channel on the opposite side of the forming direction extends and the forming direction. The inspection chip according to claim 1, wherein the inspection chip is larger than a seventh angle formed.   The inspection chip according to claim 5, wherein an eighth angle formed by the first guide surface and the forming direction is smaller than the seventh angle. Each of the plurality of supply channels is
A first supply wall surface on the forming direction side;
A second supply wall surface on the opposite side of the forming direction,
Among the plurality of supply channels, from the inlet end on the upstream side of the second supply wall surface of the nth supply channel from the direction opposite to the formation direction, n−1 from the direction opposite to the formation direction. The inlet imaginary line drawn in parallel with the direction in which the th supply flow channel extends intersects the first supply wall surface in the n th supply flow channel. Inspection chip. An outlet wall connected to the downstream outlet end of the first supply wall;
The inspection chip according to claim 7, wherein the outlet wall surface is inclined toward the receiving portion with respect to an outlet imaginary line drawn from the outlet end portion in a direction orthogonal to a direction in which the supply flow path extends. .   The first supply wall surface in the nth supply channel from the opposite side of the forming direction is closer to the receiving unit than the virtual imaginary line drawn from the outlet end in the (n-1) th supply channel. The inspection chip according to claim 8, wherein the inspection chip is located. A centrifugal force is applied to the inspection chip by rotating the inspection chip and the inspection chip about a predetermined first axis, and the inspection chip is rotated about a second axis different from the first axis. An inspection system comprising an inspection device that changes the direction of the centrifugal force by allowing
The inspection chip is
A substrate solution injection part into which a substrate solution for an enzyme reaction is injected;
A cleaning liquid injection unit disposed downstream of the substrate solution injection unit and into which a cleaning liquid is injected;
A test liquid injection part that is arranged downstream of the cleaning liquid injection part and into which a test liquid containing a test target substance is injected,
The substrate solution disposed downstream of the inspection liquid injection unit and injected into the substrate solution injection unit, the cleaning liquid injected into the cleaning liquid injection unit, and the inspection liquid injected into the inspection liquid injection unit And a receiving part into which
A bead holding portion that is arranged downstream of the receiving portion and holds beads for antigen-antibody reaction;
A measurement unit that is arranged downstream of the bead holding unit and that measures a reaction solution containing the substrate solution that has reacted with the test liquid and the beads;
A waste liquid part disposed downstream of the measurement part,
The substrate solution injection part, the cleaning liquid injection part, the inspection liquid injection part, the receiving part, and the measurement part are recessed in the same forming direction,
The receiving portion is connected to the bead holding portion, and includes a plurality of supply channels arranged in the forming direction,
The plurality of supply channels extend at a larger angle with respect to the formation direction as the supply channel on the formation direction side,
The inspection device includes:
A first operation for applying the centrifugal force to the test chip in the forming direction when supplying the cleaning liquid from the receiving unit to the bead holding unit via any of the plurality of supply channels; An action means for repeatedly executing a second operation for causing the centrifugal force to act on the test chip in a direction different from the formation direction;
When the second operation of the n-th time is performed, the action means is configured such that an angle formed by the direction in which the centrifugal force is applied and the formation direction is the nth supply channel from the opposite side of the formation direction. The centrifuge is in a direction that is equal to or larger than an angle formed by the direction perpendicular to the extending direction and the forming direction and smaller than an angle formed by the direction perpendicular to the extending direction of the (n + 1) th supply channel and the forming direction. Inspection system characterized by applying force.

Images