JP5857960B2 - Optical element manufacturing method - Google Patents

Optical element manufacturing method Download PDF

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JP5857960B2
JP5857960B2 JP2012526455A JP2012526455A JP5857960B2 JP 5857960 B2 JP5857960 B2 JP 5857960B2 JP 2012526455 A JP2012526455 A JP 2012526455A JP 2012526455 A JP2012526455 A JP 2012526455A JP 5857960 B2 JP5857960 B2 JP 5857960B2
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optical element
resin
magnetic recording
manufacturing
base material
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JPWO2012014764A1 (en
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久典 川島
久典 川島
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Konica Minolta Inc
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    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127Structure or manufacture of heads, e.g. inductive
    • G11B5/31Structure or manufacture of heads, e.g. inductive using thin films
    • G11B5/3109Details
    • G11B5/313Disposition of layers
    • G11B5/3133Disposition of layers including layers not usually being a part of the electromagnetic transducer structure and providing additional features, e.g. for improving heat radiation, reduction of power dissipation, adaptations for measurement or indication of gap depth or other properties of the structure
    • G11B5/314Disposition of layers including layers not usually being a part of the electromagnetic transducer structure and providing additional features, e.g. for improving heat radiation, reduction of power dissipation, adaptations for measurement or indication of gap depth or other properties of the structure where the layers are extra layers normally not provided in the transducing structure, e.g. optical layers
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B2005/0002Special dispositions or recording techniques
    • G11B2005/0005Arrangements, methods or circuits
    • G11B2005/001Controlling recording characteristics of record carriers or transducing characteristics of transducers by means not being part of their structure
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B2005/0002Special dispositions or recording techniques
    • G11B2005/0005Arrangements, methods or circuits
    • G11B2005/0021Thermally assisted recording using an auxiliary energy source for heating the recording layer locally to assist the magnetization reversal

Description

本発明は微少な光学面を有する光学素子の製造方法及び光学素子に関し、特に光アシスト式の磁気記録装置の記録ヘッドに好適な光学素子及び該光学素子の製造方法に関するものである。   The present invention relates to a method for manufacturing an optical element having a minute optical surface and an optical element, and more particularly to an optical element suitable for a recording head of an optically assisted magnetic recording apparatus and a method for manufacturing the optical element.

従来より、光学素子の製造法としては、金型による成形や研磨による方法が知られている。   Conventionally, as a method for manufacturing an optical element, a method using molding or polishing using a mold is known.

一方、光通信、光情報処理の分野において用いられる微小な光学素子の製造法として以下のようなものが知られている。例えば、微小な反射面を有する光路変換ミラーの製造法として、ドライエッチングでミラー溝を掘り込み、ミラー溝の壁面及び底面に表面処理剤を塗布した後、ミラー溝にインクジェットノズルより液状硬化樹脂を供給してミラー支持体斜面を形成し、硬化後に該斜面に反射膜を形成するものが知られている(例えば、特許文献1参照)。   On the other hand, the following is known as a manufacturing method of a minute optical element used in the fields of optical communication and optical information processing. For example, as a method of manufacturing an optical path conversion mirror having a minute reflecting surface, a mirror groove is dug by dry etching, a surface treatment agent is applied to the wall surface and bottom surface of the mirror groove, and then a liquid curable resin is applied to the mirror groove from an inkjet nozzle. It is known to supply a mirror support slope to form a reflective film on the slope after curing (see, for example, Patent Document 1).

特開2009−265275号公報JP 2009-265275 A

しかしながら、上記特許文献1に記載の光路変換ミラーの製造法は、ミラー溝の形成に微細加工を必要とするなど、加工が複雑で量産性に乏しく、高コストとなる問題がある。   However, the manufacturing method of the optical path conversion mirror described in the above-mentioned Patent Document 1 has a problem that the machining is complicated, the mass productivity is poor, and the cost is high.

本願発明は上記問題に鑑み、簡便な工程により製造が容易で量産性に富んだ微小な光学素子の製造方法、低コストの微小な光学素子、及び、当該光学素子を有する光アシスト磁気記録ヘッド、並びに、当該光磁気記録ヘッドを有する磁気記録装置を提供することを目的とするものである。   In view of the above problems, the present invention is a method for manufacturing a micro optical element that is easy to manufacture and rich in mass productivity by a simple process, a low cost micro optical element, and an optically assisted magnetic recording head having the optical element, It is another object of the present invention to provide a magnetic recording apparatus having the magneto-optical recording head.

上記の目的は、下記の構成(1)〜(9)により達成される。
具体的に本願発明によれば、構成(1)において、樹脂を硬化させる工程の後、フィレット形状の凹面部に反射膜を形成する工程を有することを特徴とする光学素子の製造方法が提供される。
The above object is achieved by the following configurations (1) to (9).
Specifically, according to the present invention, there is provided an optical element manufacturing method characterized in that, in the configuration (1), the method includes a step of forming a reflective film on a fillet-shaped concave surface portion after the step of curing the resin. The

(1)平坦面上に液状の樹脂を延在させる工程と、前記樹脂が延在された平坦面上に板状又はフィルム状の基材を載置し、前記基材の壁面と前記平坦面との間に前記樹脂によるフィレット形状を形成させる工程と、前記樹脂を硬化させる工程と、を有することを特徴とする光学素子の製造方法。   (1) A step of extending a liquid resin on a flat surface, a plate-like or film-like substrate is placed on the flat surface on which the resin is extended, and the wall surface of the substrate and the flat surface A method of forming a fillet shape of the resin and a step of curing the resin.

(2)前記樹脂を硬化させる工程の後、前記フィレット形状の凹面部に反射膜を形成する工程、を有することを特徴とする前記(1)に記載の光学素子の製造方法。   (2) The method for manufacturing an optical element according to (1), further comprising a step of forming a reflective film on the concave surface portion of the fillet shape after the step of curing the resin.

(3)前記フィレット形状の凹面部に反射膜を形成する工程の後、前記基材を短冊状に切断する工程、を有することを特徴とする前記(2)に記載の光学素子の製造方法。   (3) The method of manufacturing an optical element according to (2), further including a step of cutting the base material into a strip shape after the step of forming a reflective film on the concave surface portion of the fillet shape.

(4)板状又はフィルム状の基材の一方の平面側に、前記基材とは異なる樹脂による面が形成され、前記樹脂による面に繋がって前記基材の少なくとも一壁面部に前記樹脂によるフィレット形状が形成されていることを特徴とする光学素子。   (4) A surface made of a resin different from the base material is formed on one plane side of the plate-like or film-like base material, connected to the surface made of the resin, and made of the resin on at least one wall surface portion of the base material An optical element having a fillet shape.

(5)前記フィレット形状の凹面部に反射膜が形成され、該凹面部を反射面として用いることを特徴とする前記(4)に記載の光学素子。   (5) The optical element according to (4), wherein a reflective film is formed on the fillet-shaped concave surface portion, and the concave surface portion is used as a reflective surface.

(6)前記凹面部はシリンドリカル形状であることを特徴とする前記(4)又は(5)に記載の光学素子。   (6) The optical element according to (4) or (5), wherein the concave surface portion has a cylindrical shape.

(7)前記樹脂が、紫外線硬化型樹脂、熱硬化型樹脂、電子線硬化型樹脂のいずれかであることを特徴とする前記(4)から(6)のいずれかに記載の光学素子。   (7) The optical element according to any one of (4) to (6), wherein the resin is any one of an ultraviolet curable resin, a thermosetting resin, and an electron beam curable resin.

(8)光源と、前記光源からの光束を反射させる前記(5)から(7)のいずれかに記載の光学素子と、前記光学素子により反射された光束をディスクに導く導波路と、磁気記録部と、を有することを特徴とする光アシスト磁気記録ヘッド。   (8) A light source, an optical element according to any one of (5) to (7) that reflects a light beam from the light source, a waveguide that guides the light beam reflected by the optical element to a disk, and magnetic recording And an optically assisted magnetic recording head.

(9)前記(8)に記載の光アシスト磁気記録ヘッドと、該光アシスト磁気記録ヘッドを支持する支持部材と、磁気記録媒体と、を有することを特徴とする磁気記録装置。   (9) A magnetic recording apparatus comprising: the optically assisted magnetic recording head according to (8); a support member that supports the optically assisted magnetic recording head; and a magnetic recording medium.

すなわち、本願発明者は、液状の樹脂を延在させた平坦面上に基材を載置することで、基材の壁面と平坦面との間に形成される液状樹脂のフィレット形状が光学面として利用できることを見いだし、なした発明である。   That is, the inventor of the present application places the base material on a flat surface in which the liquid resin is extended, so that the fillet shape of the liquid resin formed between the wall surface and the flat surface of the base material is an optical surface. It is an invention that was found to be usable as

本発明によれば、簡便な工程により製造が容易で量産性に富んだ微小な光学素子の製造方法の提供が可能となり、低コストの微小な光学素子、当該光学素子を有する光アシスト磁気記録ヘッド、当該光磁気記録ヘッドを有する磁気記録装置を提供することが可能となる。   According to the present invention, it is possible to provide a manufacturing method of a micro optical element that is easy to manufacture and rich in mass productivity by a simple process, and is a low cost micro optical element, and an optically assisted magnetic recording head having the optical element It is possible to provide a magnetic recording apparatus having the magneto-optical recording head.

本実施の形態に係る光学素子の製造方法の概略工程を示すフローチャートである。It is a flowchart which shows the schematic process of the manufacturing method of the optical element which concerns on this Embodiment. 本実施の形態に係る光学素子の製造方法の概略工程を示す模式図である。It is a schematic diagram which shows the schematic process of the manufacturing method of the optical element which concerns on this Embodiment. 本実施の形態に係る光学素子の製造方法の概略工程を示す模式図である。It is a schematic diagram which shows the schematic process of the manufacturing method of the optical element which concerns on this Embodiment. 本実施の形態に係る光学素子の製造方法の概略工程を示す模式図である。It is a schematic diagram which shows the schematic process of the manufacturing method of the optical element which concerns on this Embodiment. 本実施の形態に係る光学素子の製造方法の概略工程を示す模式図である。It is a schematic diagram which shows the schematic process of the manufacturing method of the optical element which concerns on this Embodiment. 本実施の形態に係る光学素子の製造方法の概略工程を示す模式図である。It is a schematic diagram which shows the schematic process of the manufacturing method of the optical element which concerns on this Embodiment. 本実施の形態に係る光学素子の製造方法の概略工程を示す模式図である。It is a schematic diagram which shows the schematic process of the manufacturing method of the optical element which concerns on this Embodiment. 本実施の形態に係る光学素子の製造方法の概略工程を示す模式図である。It is a schematic diagram which shows the schematic process of the manufacturing method of the optical element which concerns on this Embodiment. 本実施の形態に係る光学素子を示す斜視図である。It is a perspective view which shows the optical element which concerns on this Embodiment. 本実施の形態に係る光学素子を光アシスト磁気記録ヘッドに適用した概略断面図である。1 is a schematic cross-sectional view in which an optical element according to an embodiment is applied to an optically assisted magnetic recording head. 図5に示す光アシスト磁気記録ヘッドを備えた磁気記録装置の概略構成例を示す斜視図である。FIG. 6 is a perspective view illustrating a schematic configuration example of a magnetic recording apparatus including the optically assisted magnetic recording head illustrated in FIG. 5.

以下、実施の形態により本発明を説明するが、本発明はこれに限定されるものではない。   Hereinafter, the present invention will be described with reference to embodiments, but the present invention is not limited thereto.

図1は、本実施の形態に係る光学素子の製造方法の概略工程を示すフローチャートである。図2及び図3は、本実施の形態に係る光学素子の製造方法の概略工程を示す模式図である。以下、図1の光学素子の製造方法のフローに従い、図2、図3を用いて説明する。   FIG. 1 is a flowchart showing schematic steps of a method for manufacturing an optical element according to the present embodiment. 2 and 3 are schematic views showing schematic steps of the method of manufacturing an optical element according to the present embodiment. Hereafter, it demonstrates using the flow of the manufacturing method of the optical element of FIG. 1 using FIG. 2, FIG.

本実施の形態に係る光学素子の製造方法は、まず、平坦面に液状の硬化性の樹脂を延在させる(ステップS101)。この工程は、図2Aに示すように、ガラス板あるいは金属板等の平坦面を有する台座15上に液状の樹脂20を滴下し、略均等な厚みに延在させる。スピンコート、塗布等により略均等な厚みとすることができる。   In the method of manufacturing an optical element according to the present embodiment, first, a liquid curable resin is extended on a flat surface (step S101). In this step, as shown in FIG. 2A, a liquid resin 20 is dropped on a pedestal 15 having a flat surface such as a glass plate or a metal plate, and extended to a substantially uniform thickness. A substantially uniform thickness can be obtained by spin coating, coating, or the like.

硬化性の樹脂としては、熱硬化型、活性エネルギー線硬化型が有り、透光性樹脂として熱硬化型のシリコーン系樹脂やエポキシ系樹脂、アクリル系樹脂が挙げられ、また活性エネルギー線硬化型樹脂として紫外線硬化型、電子線硬化型を用いることが出来るが、取扱性や照射装置のコスト、安全性の面から活性エネルギー線硬化型樹脂としては紫外線硬化型が好ましい。紫外線線硬化性樹脂組成物としては、カチオン重合によるエポキシ系、ラジカル重合によるアクリル系、ポリチオール/ポリアリル系などが挙げられ、好ましくはエポキシ系である。エポキシ系としては、エポキシ基を1分子内に2個以上含むプレポリマーとカチオン重合開始剤からなる組成物が好ましく、このようなプレポリマーの例としては、脂環式ポリエポキシド類、多塩基酸のポリグリシジルエステル類、多価アルコールのポリグリシジルエーテル類、芳香族ポリオールのポリグリシジルエーテル類、芳香族ポリオールのポリグリシジルエーテルの水素添加化合物類、ポリオキシアルキレングリコールのポリグリシジルエーテル類、ウレタンポリエポキシ化合物類、エポキシ化ポリブタジエン類等が挙げられる。カチオン重合開始剤としては、芳香族オニウム塩等が有る。   The curable resin includes a thermosetting type and an active energy ray curable type. Examples of the translucent resin include a thermosetting silicone resin, an epoxy resin, and an acrylic resin, and an active energy ray curable resin. As the active energy ray curable resin, an ultraviolet curable type is preferable from the viewpoints of handleability, irradiation device cost, and safety. Examples of the ultraviolet ray curable resin composition include an epoxy system by cationic polymerization, an acrylic system by radical polymerization, a polythiol / polyallyl system, and the like, preferably an epoxy system. As the epoxy system, a composition comprising a prepolymer containing two or more epoxy groups in one molecule and a cationic polymerization initiator is preferable. Examples of such a prepolymer include alicyclic polyepoxides and polybasic acids. Polyglycidyl esters, polyglycidyl ethers of polyhydric alcohols, polyglycidyl ethers of aromatic polyols, hydrogenated compounds of polyglycidyl ethers of aromatic polyols, polyglycidyl ethers of polyoxyalkylene glycols, urethane polyepoxy compounds And epoxidized polybutadienes. Examples of the cationic polymerization initiator include aromatic onium salts.

また、台座15の樹脂を延在させる平坦面の表面は、硬化性の樹脂が硬化した際に容易に剥がすことができるように形成されている。平坦面の表面に、例えば離型性のコーティング層を付与してもよい。   The surface of the flat surface on which the resin of the pedestal 15 extends is formed so that it can be easily peeled off when the curable resin is cured. For example, a releasable coating layer may be provided on the flat surface.

次いで、図2Bに示すように、板状又はフィルム状の基材30を、液状の樹脂20の領域内に載置する(ステップS102)。基材30は、不図示であるが吸引等により持ち上げられて、上方から液状の樹脂20の領域内に静かに載置されることが好ましい。   Next, as shown in FIG. 2B, the plate-like or film-like substrate 30 is placed in the region of the liquid resin 20 (step S102). Although not shown, the base material 30 is preferably lifted by suction or the like and is gently placed in the region of the liquid resin 20 from above.

基材30の材質は、ガラスもしくは樹脂であって、板状又はフィルム状のものが好ましく用いられるが、これに限るものでない。また、基材30の厚みは任意であるが、1/50(mm)〜1/2(mm)程度が好ましい。   The material of the substrate 30 is glass or resin, and a plate or film is preferably used, but is not limited thereto. Moreover, although the thickness of the base material 30 is arbitrary, about 1/50 (mm)-1/2 (mm) are preferable.

ステップS102において、基材30を、液状の硬化性の樹脂20の領域内に載置すると、基材30の壁面と台座15の平坦面との間には、図2Cに示すA−A断面図のように、液状の硬化性の樹脂20によるフィレット形状Fが形成される。   When the base material 30 is placed in the region of the liquid curable resin 20 in step S102, the cross section AA shown in FIG. 2C is provided between the wall surface of the base material 30 and the flat surface of the pedestal 15. Thus, the fillet shape F is formed by the liquid curable resin 20.

このフィレット形状Fは、基材30の材料、壁面の平坦面に対する角度、壁面の表面粗さ、樹脂20の量や、粘性、表面張力等の材料特性により異なる。すなわち、樹脂20の選択及び基材30の材料、壁面の角度、表面粗さ等を変化させ、予め実験によりこれらの条件を決めておくことで、所望のフィレット形状Fを安定して得ることができる。   The fillet shape F differs depending on the material characteristics such as the material of the base material 30, the angle of the wall surface with respect to the flat surface, the surface roughness of the wall surface, the amount of the resin 20, viscosity, and surface tension. That is, the desired fillet shape F can be stably obtained by selecting the resin 20 and changing the material of the base material 30, the angle of the wall surface, the surface roughness, etc., and determining these conditions in advance through experiments. it can.

また、この工程では、基材30を載置した後、基材30を押圧してもよい。   In this step, the substrate 30 may be pressed after the substrate 30 is placed.

次いで、図2Bに示す状態で、液状の硬化性の樹脂を硬化させる(ステップS103)。樹脂が紫外線硬化型樹脂の場合には紫外光の照射、熱硬化型樹脂の場合には高温環境内に所定時間放置、電子線硬化型樹脂の場合には所定の電子線の照射を行って硬化させることができる。   Next, in the state shown in FIG. 2B, the liquid curable resin is cured (step S103). When the resin is an ultraviolet curable resin, it is irradiated with ultraviolet light, when it is a thermosetting resin, it is left in a high temperature environment for a predetermined time, and when it is an electron beam curable resin, it is cured by irradiation with a predetermined electron beam. Can be made.

樹脂の硬化が終わると、図3Aに示すように硬化した樹脂25及び基材30を一体的に台座15の平坦面から剥がして分離する(ステップS104)。   When the curing of the resin is completed, the cured resin 25 and the base material 30 are integrally peeled off from the flat surface of the base 15 as shown in FIG. 3A (step S104).

次いで、図3Bに示すように、余剰の樹脂部分を削除(ステップS105)し、図3Cに示すB−B断面図のように、フィレット形状F上の凹面部に反射膜を形成し反射面Rを形成する(ステップS106)。反射膜は、金、銀、アルミニウム等の蒸着や、所定の下地層を形成した後、メッキ等で形成することができるが、これに限るものでない。   Next, as shown in FIG. 3B, the excess resin portion is deleted (step S105), and a reflective film is formed on the concave surface portion on the fillet shape F as shown in the cross-sectional view along the line BB in FIG. Is formed (step S106). The reflective film can be formed by vapor deposition of gold, silver, aluminum, or the like, or plating after forming a predetermined underlayer, but is not limited thereto.

次いで、図3Dに示す破線に沿って短冊状に切断(ステップS107)することで、フィレット形状F上に反射面Rが形成された光学素子40が完成する。すなわち、上述の一連の工程により、多数の同一形状の微少な光学素子を、一度に製造することができる。   Next, the optical element 40 in which the reflecting surface R is formed on the fillet shape F is completed by cutting into strips along the broken line shown in FIG. 3D (step S107). In other words, a large number of minute optical elements having the same shape can be manufactured at a time by the series of steps described above.

以上説明したように、本実施の形態に係る光学素子の製造方法は、樹脂を延在させた平坦面に基材を載置し、基材の壁面と平坦面との間に樹脂によるフィレット形状を形成させて硬化させ、該フィレット形状を光学素子とするものであり、複雑な加工を要せず、簡便な工程により製造が容易で低コストの量産性に富んだ製造方法とすることができる。また、短冊状に切断することで1つあたりのコストを低下させた微小な光学素子を得ることが可能となる。   As described above, in the method of manufacturing an optical element according to the present embodiment, a base material is placed on a flat surface in which a resin is extended, and a fillet shape is formed between the wall surface of the base material and the flat surface. Is formed and cured, and the fillet shape is used as an optical element, which does not require complicated processing, can be easily manufactured by a simple process, and can be a low-cost mass-productive manufacturing method. . Further, by cutting into strips, it becomes possible to obtain a minute optical element with reduced cost per one.

更に、上述のように、本製造方法によって形成されるフィレット形状は、基材の材料、壁面の平坦面に対する角度、壁面の表面粗さ、樹脂の量、粘性、表面張力等の材料特性により異なることから、これら条件選択の自由度が大きく、適宜選択することで任意の所望の形状を容易に得ることができるようになる効果も有している。   Furthermore, as described above, the fillet shape formed by this manufacturing method varies depending on the material characteristics such as the material of the base material, the angle of the wall surface with respect to the flat surface, the surface roughness of the wall surface, the amount of resin, the viscosity, and the surface tension. Therefore, the degree of freedom of selection of these conditions is large, and there is an effect that an arbitrary desired shape can be easily obtained by selecting as appropriate.

なお、上述のフローのうち、ステップS104〜ステップS106については、この順序に限るものでなく、入れ替えてもよい。また、上述のフローでは、台座15から硬化した樹脂25及び基材30を分離する例で説明したが、これに限るものでなく、ステップS104の工程を省略し、台座15、硬化した樹脂25及び基材30を一体で光学素子として製造するような構成でもよい。   In addition, among the above-mentioned flows, step S104 to step S106 are not limited to this order, and may be interchanged. Further, in the above-described flow, the example in which the cured resin 25 and the base material 30 are separated from the pedestal 15 has been described. However, the present invention is not limited to this, and the step S104 is omitted, and the pedestal 15, the cured resin 25, and The structure which manufactures the base material 30 integrally as an optical element may be sufficient.

図4は、本実施の形態に係る光学素子40を示す斜視図である。   FIG. 4 is a perspective view showing the optical element 40 according to the present embodiment.

上述のような製造方法によって製造された光学素子40は、短冊状の基材30の一方の平面側に硬化した樹脂25による層状の面25pが形成されると共に、この面に繋がって基材30の壁面部30hに硬化した樹脂25によるフィレット形状Fが形成される。このフィレット形状Fの凹面部には反射面Rが形成されている。また、反射面Rの形成された凹面部は、図示X方向には曲率を有さず、図示Z方向には曲率を有するシリンドリカル状となっている。このため、図示YZ面内では光束を収束させるパワーを有した一次元集光素子として機能する。   In the optical element 40 manufactured by the manufacturing method as described above, a layered surface 25p of the cured resin 25 is formed on one plane side of the strip-shaped substrate 30, and the substrate 30 is connected to this surface. A fillet shape F made of the cured resin 25 is formed on the wall surface portion 30h. A reflective surface R is formed on the concave surface portion of the fillet shape F. Further, the concave surface portion on which the reflection surface R is formed has a cylindrical shape having no curvature in the X direction in the drawing and having a curvature in the Z direction in the drawing. For this reason, it functions as a one-dimensional condensing element having power for converging the light beam in the YZ plane shown in the figure.

図5は、本実施の形態に係る光学素子を光アシスト磁気記録ヘッドに適用した概略断面図である。   FIG. 5 is a schematic sectional view in which the optical element according to the present embodiment is applied to an optically assisted magnetic recording head.

図5に示す、光アシスト磁気記録ヘッド3は、ディスク2に対する情報記録に光を利用する微小光記録ヘッドであって、光源部9A、スライダ10、1次元集光素子としての機能を有した本実施の形態に係る光学素子40等を備えている。   An optically assisted magnetic recording head 3 shown in FIG. 5 is a minute optical recording head that uses light for information recording on the disk 2 and has a light source unit 9A, a slider 10, and a function as a one-dimensional condensing element. The optical element 40 etc. which concern on embodiment are provided.

光源部9Aは半導体レーザを有する。光源部9Aは半導体レーザと、光ファイバ、光導波路、コリメートレンズ等の光学素子との組み合わせであってもよい。   The light source unit 9A has a semiconductor laser. The light source unit 9A may be a combination of a semiconductor laser and an optical element such as an optical fiber, an optical waveguide, or a collimating lens.

スライダ10は基板で構成されており、ディスク2の被記録部分の流入側から流出側にかけて順に(矢印mC方向)、磁気再生部8C、光アシスト部8A及び磁気記録部8Bが、基板内部に積層状態で形成されている。   The slider 10 is formed of a substrate, and a magnetic reproducing unit 8C, an optical assist unit 8A, and a magnetic recording unit 8B are stacked inside the substrate in order from the inflow side to the outflow side of the recording portion of the disk 2 (in the direction of arrow mC). It is formed in a state.

光アシスト部8Aは平面導波路を有しており、その平面導波路はディスク2の被記録部分を近赤外レーザ光でスポット加熱するための集光機能を有している。   The optical assist unit 8A has a planar waveguide, and the planar waveguide has a condensing function for spot heating the recording portion of the disk 2 with near-infrared laser light.

光学素子40は、反射面Rが光源部9Aから出射されるレーザ光を折り曲げ、光アシスト部8Aへ導くように配置される。このとき、反射面Rによりレーザ光は図示YZ面内では光束を収束させられながら光アシスト部8Aへ導かれるようになっている。   The optical element 40 is arranged such that the reflection surface R bends the laser light emitted from the light source unit 9A and guides it to the light assist unit 8A. At this time, the laser beam is guided to the light assist unit 8A by the reflecting surface R while converging the light beam in the YZ plane shown in the drawing.

なお、図5では、図4に示す光学素子40を光源部9Aに接着固定したものを示しているが、これに限るものでない。例えば、上述の台座15、硬化した樹脂25及び基材30を一体で光学素子40として形成した場合、台座15とスライダ10を接着固定してもよい。   5 shows the optical element 40 shown in FIG. 4 bonded and fixed to the light source unit 9A, but the present invention is not limited to this. For example, when the pedestal 15, the cured resin 25, and the base material 30 are integrally formed as the optical element 40, the pedestal 15 and the slider 10 may be bonded and fixed.

本実施の形態に係る低コストの微小な光学素子40を用いることにより、光アシスト磁気記録ヘッドを低コストで形成することができる。   By using the low-cost micro optical element 40 according to the present embodiment, the optically assisted magnetic recording head can be formed at low cost.

図6は、図5に示す光アシスト磁気記録ヘッド3を備えた磁気記録装置1の概略構成例を示す斜視図である。   FIG. 6 is a perspective view showing a schematic configuration example of the magnetic recording apparatus 1 including the optically assisted magnetic recording head 3 shown in FIG.

図6に示す磁気記録装置1は、記録用のディスク(磁気記録媒体)2と、支軸5を支点として矢印mA方向(トラッキング方向)に回転可能に設けられたサスペンション4と、サスペンション4に取り付けられたトラッキング用のアクチュエータ6と、サスペンション4の先端部に取り付けられた光アシスト磁気記録ヘッド3と、ディスク2を矢印mB方向に回転させるモータ(不図示)と、を筐体7内に備えており、光アシスト磁気記録ヘッド3がディスク2上で浮上しながら相対的に移動しうるように構成されている(図5中の矢印mC方向にディスク2が移動する)ものである。   A magnetic recording apparatus 1 shown in FIG. 6 includes a recording disk (magnetic recording medium) 2, a suspension 4 that is rotatable about a support shaft 5 in an arrow mA direction (tracking direction), and is attached to the suspension 4. A housing 7 is provided with the tracking actuator 6, the optically assisted magnetic recording head 3 attached to the tip of the suspension 4, and a motor (not shown) that rotates the disk 2 in the arrow mB direction. Thus, the optically assisted magnetic recording head 3 is configured to be relatively movable while flying over the disk 2 (the disk 2 moves in the direction of arrow mC in FIG. 5).

本実施の形態に係る光アシスト磁気記録ヘッドを用いることにより、光アシスト式の磁気記録装置を低コストで形成することができる。   By using the optically assisted magnetic recording head according to the present embodiment, an optically assisted magnetic recording apparatus can be formed at low cost.

なお、明細書、請求の範囲、図面および要約を含む2010年7月26日に出願された日本特許出願No.2010−166880号の全ての開示は、そのまま本出願の一部に組み込まれる。   It should be noted that the Japanese Patent Application No. 1993 filed on July 26, 2010, including the specification, claims, drawings and abstract. The entire disclosure of 2010-166880 is incorporated in its entirety into this application.

以上のように、本発明は、微少な光学面を有する光学素子の製造方法、光学素子及び光アシスト磁気記録ヘッド並びに磁気記録装置に適している。   As described above, the present invention is suitable for a method of manufacturing an optical element having a minute optical surface, an optical element, an optically assisted magnetic recording head, and a magnetic recording apparatus.

1 磁気記録装置
2 ディスク(磁気記録媒体)
3 光アシスト磁気記録ヘッド
4 サスペンション
5 支軸
6 アクチュエータ
7 筐体
8A 光アシスト部
8B 磁気記録部
8C 磁気再生部
9A 光源部
10 スライダ
15 台座
20 樹脂(液状)
25 樹脂(硬化後)
30 基材
30h 壁面部(基材)
40 光学素子
F フィレット形状
R 反射面
1 Magnetic recording device 2 Disk (magnetic recording medium)
DESCRIPTION OF SYMBOLS 3 Optical assist magnetic recording head 4 Suspension 5 Support shaft 6 Actuator 7 Case 8A Optical assist part 8B Magnetic recording part 8C Magnetic reproduction part 9A Light source part 10 Slider 15 Base 20 Resin (liquid)
25 Resin (after curing)
30 base material 30h wall surface part (base material)
40 Optical element F Fillet shape R Reflective surface

Claims (2)

平坦面上に液状の樹脂を延在させる工程と、
前記樹脂が延在された平坦面上に板状又はフィルム状の基材を載置し、前記基材の壁面と前記平坦面との間に前記樹脂によるフィレット形状を形成させる工程と、
前記樹脂を硬化させる工程と、
前記樹脂を硬化させる工程の後、前記フィレット形状の凹面部に反射膜を形成する工程と、
を有することを特徴とする光学素子の製造方法。
Extending a liquid resin on a flat surface;
Placing a plate-like or film-like substrate on the flat surface from which the resin extends, and forming a fillet shape by the resin between the wall surface of the substrate and the flat surface;
Curing the resin;
After the step of curing the resin, forming a reflective film on the fillet-shaped concave surface portion;
A method for producing an optical element, comprising:
前記フィレット形状の凹面部に反射膜を形成する工程の後、
前記基材を短冊状に切断する工程、を有することを特徴とする請求項1に記載の光学素子の製造方法。
After the step of forming a reflective film on the concave portion of the fillet shape,
The method for producing an optical element according to claim 1 , further comprising a step of cutting the substrate into a strip shape.
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Citations (3)

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JP2010282091A (en) * 2009-06-05 2010-12-16 Fujikura Ltd Optical coupling structure and method of manufacturing the same

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