JP5838691B2 - Frequency adjustment method for vibrator - Google Patents

Description

  The present invention relates to a frequency adjustment method for a vibrator.

  For example, as a method for adjusting the resonance frequency of the vibrator, a method of changing the mass of the vibrator is known. Such a method is provided, for example, between an oscillator, an ion gun that removes part of the oscillator by irradiating the ion beam to the oscillator to reduce the mass of the oscillator, and the oscillator and the ion gun. This is performed using an apparatus having a shutter (see Patent Document 1).

  In the apparatus described in Patent Document 1, a plurality of shutter plates are pivotally supported on an iron core, and each shutter plate is rotatable about the iron core. Each shutter plate is configured to rotate by driving a corresponding solenoid. In the apparatus described in Patent Document 1, the shutter can be opened or closed by using such rotation of the shutter plate.

  In such an apparatus, the shutter is opened while the ion beam is emitted from the ion gun. As a result, the ion beam passes through the shutter and is irradiated on the vibrator, and a part of the vibrator is removed, whereby the resonance frequency of the vibrator changes. Then, by closing the shutter when the frequency of the vibrator reaches a predetermined frequency, irradiation of the ion beam to the vibrator is prevented. By such a method, the resonance frequency of the vibrator is adjusted.

However, in such a shutter, the shutter plates rub against each other due to the rotation of the shutter plates, and the slidability of the shutter plates deteriorates due to wear caused by the rubs. In addition, wear of the shutter plate due to contact with the ion beam occurs, and this wear also deteriorates the slidability of the shutter plate.
The deterioration of the slidability decreases the moving speed of the shutter plate, so that it takes a long time to change the shutter from the open state to the closed state. When this time becomes long, the mass of the vibrator is excessively reduced by that time, and the resonance frequency of the vibrator after the frequency adjustment greatly deviates from the target resonance frequency.

Further, the time taken to change the shutter from the open state to the closed state varies depending on the degree of wear of the shutter plate. As described above, when the time required to change the shutter from the open state to the closed state changes, the resonance frequency of the vibrator after the frequency adjustment greatly deviates from the target resonance frequency. It varies from one vibrator to another.
That is, the apparatus described in Patent Document 1 cannot perform highly accurate frequency adjustment of the vibrator.

JP 2008-118156 A

  An object of the present invention is to provide a method of adjusting the frequency of a vibrator that can adjust the frequency of the vibrator with high accuracy.

SUMMARY An advantage of some aspects of the invention is to solve at least a part of the problems described above, and the invention can be implemented as the following forms or application examples.
[Application Example 1]
The frequency adjustment method of the vibrator of the present invention is a frequency adjustment method for adjusting the resonance frequency of the vibrator,
A shutter part capable of switching between an open state allowing mass change of the vibrator by a mass changing means and a closed state preventing the mass change;
A step of preparing a shutter device comprising: a control unit that controls the switching of the shutter unit;
Arranging the shutter portion between the vibrator and the mass changing means;
A first frequency adjustment step in which the shutter unit is in the closed state after the shutter unit is in the open state and the mass change of the vibrator is started;
In the first frequency adjustment step, a time difference between a first time at which a command to close the shutter unit in the closed state is output and a second time at which the shutter unit is in the closed state in response to the command is obtained. 1 delay time detection step;
A second frequency adjusting step of setting the shutter unit in the open state and starting mass change of the vibrator at a higher rate than the first frequency adjusting step, and then setting the shutter unit in the closed state;
In the second frequency adjustment step, a time difference between a third time at which a command for closing the shutter unit is output and a fourth time at which the shutter unit is in the closed state in response to the command is obtained. 2 delay time detection step;
A third frequency adjusting step of setting the shutter portion in the open state and starting mass change of the vibrator at a rate lower than that of the second frequency adjusting step, and then setting the shutter portion in the closed state;
In the second frequency adjustment step, the control unit corrects a time for outputting a command to set the shutter unit in the closed state based on a time difference between the first time and the second time, and In the frequency adjustment step, the time for outputting a command to set the shutter unit in the closed state is corrected based on a time difference between the third time and the fourth time .
Thereby, the resonance frequency of the vibrator can be adjusted to the target resonance frequency with high accuracy.

[Application Example 2]
In the vibrator frequency adjusting method according to the present invention, in the first delay time detecting step , the resonance frequency of the vibrator at the first time is changed in a state where the mass of the vibrator is changed by the mass changing means. Obtaining the time difference based on the difference in the resonance frequency of the vibrator at the second time and the amount of change in the resonance frequency per unit time of the vibrator ;
In the second delay time detecting step, in a state where the mass of the vibrator is changed by the mass changing means, the resonance frequency of the vibrator at the third time and the resonance frequency of the vibrator at the fourth time It is preferable to obtain the time difference based on the difference and the amount of change in resonance frequency per unit time of the vibrator .
Thereby, the time difference can be easily obtained.

It is the schematic of the frequency adjustment apparatus for enforcing the frequency adjustment method of the vibrator | oscillator concerning 1st Embodiment of this invention. It is a side view of the shutter apparatus which the frequency adjustment apparatus shown in FIG. 1 has. It is a figure for demonstrating the frequency adjustment method of the vibrator | oscillator concerning 1st Embodiment of this invention. It is a figure for demonstrating the frequency adjustment method of the vibrator | oscillator concerning 2nd Embodiment of this invention. It is a figure for demonstrating the frequency adjustment method of the vibrator | oscillator concerning 3rd Embodiment of this invention. It is a figure for demonstrating the frequency adjustment method of the vibrator | oscillator concerning 4th Embodiment of this invention. It is a figure for demonstrating the frequency adjustment method of the vibrator | oscillator concerning 5th Embodiment of this invention.

Hereinafter, a method for adjusting a frequency of a vibrator according to the present invention will be described in detail based on a preferred embodiment shown in the accompanying drawings.
<First Embodiment>
FIG. 1 is a schematic diagram of a frequency adjusting device for carrying out the vibrator frequency adjusting method according to the first embodiment of the present invention. FIG. 2 is a side view of a shutter device included in the frequency adjusting device shown in FIG. FIG. 3 is a diagram for explaining a method of adjusting the frequency of the vibrator according to the first embodiment of the invention. In the following description, for convenience of explanation, the upper side in FIGS. 1 and 2 will be described as “upper”, the lower side as “lower”, the right side as “right”, and the left side as “left”. Also, as shown in FIG. 1, the three axes orthogonal to each other are the x-axis, y-axis, and z-axis, the direction parallel to the x-axis is called the “x-axis direction”, and the direction parallel to the y-axis is the “y-axis” A direction parallel to the z-axis is referred to as a “z-axis direction”.

1. Frequency Adjustment Device A frequency adjustment device 100 shown in FIG. 1 is a device that can adjust the resonance frequency of a vibrator 200 such as a crystal vibrator.
Such a frequency adjustment device 100 is a frequency measurement that measures the resonance frequency of the chamber 110 in which the inside can be set as a desired environment, the plurality of shutter devices 120, the ion gun 130, the shielding plate 140, and the vibrator 200. Means 150 and control means 160 for independently controlling driving of the plurality of shutter devices 120 are provided. The number of shutter devices 120 is not particularly limited, and can be about 1 to 50, for example.

  As the ion gun 130, a known ion gun can be used. For example, the ion gun 130 emits an ion beam by accelerating it by applying an electric field to an inert gas such as Ar or Ne. Such an ion gun 130 constitutes mass changing means for changing the mass of the vibrator 200. The ion gun 130 is positioned below the shutter device 120 in the chamber 110 and emits an ion beam IB upward.

Further, the shielding plate 140 is positioned above the shutter device 120 in the chamber 110 and blocks the ion beam IB leaking upward from the gap between the adjacent shutter devices 120. That is, the shielding plate 140 prevents the vibrator 200 from being irradiated with the ion beam IB leaking upward from the gap.
Each of the plurality of shutter devices 120 is independently controlled by the control unit 160, and can switch between an open state that allows the passage of the ion beam IB and a closed state that blocks the ion beam IB. .
Specifically, as illustrated in FIG. 2, the shutter device 120 includes a shutter unit 121, a drive unit 122, a connection unit 123 that couples the shutter unit 121 and the drive unit 122, and a support unit 124 that supports them. And have.

The shutter unit 121 has a plate shape with a thickness in the z-axis direction, and extends in the x-axis direction. The width (length in the y-axis direction) of the shutter unit 121 is not particularly limited, and varies depending on the size of the vibrator 200, but is preferably about 1 mm or more and 2 mm or less, for example. By setting it as such a width | variety, the shutter part 121 can be made small enough.
Such a shutter part 121 is made of, for example, carbon, titanium or the like having excellent ion etching resistance as a constituent material. Thereby, the damage of the shutter part 121 by the ion beam IB can be suppressed effectively. Further, the weight of the shutter unit 121 can be reduced, and the reactivity and moving speed of the shutter unit 121 can be improved.

  The drive unit 122 is a drive source for reciprocating the shutter unit 121 in the x-axis direction. Although it will not specifically limit as the drive part 122 if the shutter part 121 can be moved, In this embodiment, the well-known solenoid which the shaft 122b moves to a x-axis direction with respect to the main body 122a is used. The driving of the driving unit 122 is controlled by the control unit 160.

The connecting unit 123 has a function of connecting the driving unit 122 and the shutter unit 121 and transmitting the driving force of the driving unit 122 to the shutter unit 121. In addition, it is preferable that the connection part 123 is supporting the shutter part 121 so that attachment or detachment is possible. As a result, the shutter 121, which is a consumable item, can be easily replaced.
In such a shutter device 120, when the shaft 122b of the driving unit 122 moves to the right side in FIG. 2 so as to protrude from the main body 122a, the shutter unit 121 moves to the right side in FIG. As a result, as shown in FIG. 2A, the shutter device 120 is in a closed state in which the shutter unit 121 blocks the ion beam IB.

On the contrary, when the shaft 122b of the drive unit 122 moves to the left side in FIG. 2 so as to be retracted into the main body 122a, the shutter unit 121 moves to the left side in FIG. As a result, as shown in FIG. 2B, the shutter device 120 is in an open state that allows passage of the ion beam IB.
Such switching between the open state and the closed state of the shutter device 120 can be performed by the control means 160.

The frequency measurement unit 150 is not particularly limited as long as the resonance frequency of the vibrator 200 can be measured. For example, the frequency measurement unit 150 brings the measurement terminal (probe) of the frequency measurement device into direct or indirect contact with the electrode of the vibrator 200 and drives the vibrator 200 to thereby set the resonance frequency of the vibrator 200. You may measure.
In the frequency adjusting device 100 having such a configuration, as will be described later, by irradiating the vibrator 200 with the ion beam IB with the shutter device 120 in an open state, a part of the vibrator 200 is removed and its mass is reduced. The resonance frequency of the vibrator 200 is adjusted by increasing the resonance frequency of the vibrator 200 and closing the shutter device 120 when the resonance frequency of the vibrator 200 reaches a target value.

Here, when the shutter device 120 is closed, the control means 160 outputs a command (driving signal) for opening the shutter device 120 from the open state to the closed state, and the shutter device 120 is opened in response to this command. Switch from state to closed state. However, in the shutter device 120, there is a time difference between the time when the command is output and the time when the shutter device 120 is closed in response to the command. That is, the time when the shutter device 120 is closed is delayed with respect to the time when the command is output.
When such a delay time occurs, the mass of the vibrator 200 is excessively reduced by that time, and the resonance frequency of the vibrator 200 after frequency adjustment is greatly deviated from the target resonance frequency. .

Further, the delay time is different between the plurality of shutter devices 120, and also varies irregularly depending on the state and the like in each shutter device 120. Specifically, for example, the shutter unit 121 included in the shutter device 120 is worn by contact with the ion beam IB. As described above, when the shutter 121 is worn, the mass of the shutter 121 changes or the slidability with the support 124 changes, so that the moving speed of the shutter 121 changes. As a result, the time until the shutter device 120 changes from the open state to the closed state changes, and as a result, the delay time changes.
As described above, when the delay time changes, in addition to the problem that the resonance frequency of the vibrator 200 greatly deviates from the target resonance frequency, there is a problem that the deviation amount (deviation width) becomes irregular.
Therefore, in the vibrator frequency adjustment method of the present invention, the vibrator 200 is corrected by correcting the output timing of a command for closing the shutter device 120 from the control unit 160 based on such a shift in delay time. The resonance frequency can be adjusted to the target value with high accuracy.

2. Frequency Adjustment Method Next, a method for adjusting the resonance frequency of the vibrator 200 using the frequency adjustment device 100 (frequency adjustment method for the vibrator of the present invention) will be described in detail. In the following, for convenience of explanation, the vibrator 200 corresponding to one shutter device 120 will be described as a representative.
The frequency adjustment method of the present embodiment includes a frequency adjustment step [A] and a delay time detection step [B] performed in the middle of the frequency adjustment step [A].

  Specifically, the frequency adjustment step [A] includes a first low mode step [A1], a high mode step (first step) [A2], and a second low mode step (second step) [A3. The delay time detection step [B] includes a first delay time detection step [B1] performed between the first low mode step [A1] and the high mode step [A2]. A second delay time detection step [B2] performed between the high mode step [A2] and the second low mode step [A3].

That is, in the frequency adjustment method of the present embodiment, as shown in FIG. 3, the first low mode step [A1], the first delay time detection step [B1], the high mode step [A2], the second delay The time detection step [B2] and the second low mode step [A3] are performed in this order.
The high mode step [A2] and the low mode steps [A1] and [A3] have different frequency adjustment rates (etching rates), and the high mode step [A2] has a lower mode steps [A1] and [A3]. The adjustment rate is set higher than. The low mode steps [A1] and [A2] are set to the same adjustment rate. As described above, by providing the steps with different adjustment rates, the resonance frequency f can be coarsely and finely adjusted. Therefore, the resonance frequency f of the vibrator 200 can be more efficiently (short time) and highly accurate. Can be adjusted to the resonance frequency f0.

  Hereinafter, for convenience of explanation, the adjustment rate in the high mode process [A2] is “adjustment rate H”, and the adjustment rate in the low mode processes [A1] and [A3] is “adjustment rate L”. The adjustment rates H and L are not particularly limited. For example, the adjustment rate H can be about 1000 to 2000 ppm / sec, and the adjustment rate L can be about 10 to 200 ppm / sec. By setting such a rate, coarse adjustment and fine adjustment of the resonance frequency of the vibrator 200 can be performed more effectively.

  In addition, the frequency adjustment method of the present embodiment is performed while constantly measuring the resonance frequency of the vibrator 200 by the frequency measurement unit 150 (or every predetermined time interval), and information (data) regarding the measured resonance frequency is Are transmitted to the control means 160 in real time. However, in a situation where the measurement of the resonance frequency is not necessary (for example, a situation where the ion beam IB is stabilized as described later), the measurement of the resonance frequency of the vibrator 200 by the frequency measurement unit 150 may be stopped. .

Hereinafter, these steps will be described in order.
[A1] First Low Mode Step First, the vibrator 200 is arranged at a predetermined position in the chamber 110 of the frequency adjusting device 100. Note that the resonance frequency (Hz) of the vibrator 200 is somewhat lower than the target resonance frequency f0 (Hz) when the frequency is not adjusted.

Next, the pressure inside the chamber 110 is reduced to, for example, about 10 ⁻³ Pa. Next, the shutter device 120 is closed. Note that this step can be omitted when the shutter device 120 is already closed. Next, the ion gun 130 is driven to emit the ion beam IB. Then, the shutter device 120 is left in a closed state until the ion beam IB is stabilized. At this time, the energy of the ion beam IB is adjusted so as to achieve the adjustment rate L in the first low mode step [B1] as the next step.

Next, the shutter device 120 is changed from the closed state to the open state. As a result, the ion beam IB is irradiated onto a predetermined portion of the vibrator 200, and a part of the vibrator 200 is removed, whereby the mass of the vibrator 200 is reduced, and the vibrator 200 is moved at a speed corresponding to the adjustment rate L. The resonance frequency f becomes higher.
Next, for example, after a predetermined time has elapsed since the shutter device 120 was opened, the control unit 160 outputs a command (drive signal for driving the shutter device 120) S to close the shutter device 120, and the shutter device 120 is Closed. Thus, the first low mode process is completed.

[B1] First Delay Time Detection Step First, the control unit 160 detects the resonance frequency f1 of the vibrator 200 at the time (first time) T1 when the command S is output based on the information from the frequency measurement unit 150. To do.
Further, the control means 160 detects the resonance frequency f2 of the vibrator 200 at the time (second time) T2 when the shutter device 120 is in the closed state in response to the command S. Specifically, when the shutter device 120 is closed, the change in the resonance frequency f of the vibrator 200 is stopped. Therefore, the control unit 160 detects a state in which the resonance frequency f of the vibrator 200 does not change for a predetermined time (for example, a sufficiently long time of about 1 to 5 seconds) based on the information transmitted from the frequency measurement unit 150. The resonance frequency f in this state is detected as the resonance frequency f2 of the vibrator 200 at time T2.

  That is, the “resonance frequency f2 at time T2” means that after the shutter device 120 is closed and the first low mode step [A1] is completed, the next high mode step [B2] is started. The resonance frequency f of the vibrator 200 within the time period until the time is within this period, and any resonance frequency f at any time will be the “resonance frequency f2 at time T2”.

  The method of detecting the resonance frequency f2 is not limited to the above method. For example, from the time T1, it is longer than a time sufficient for the shutter device 120 to be in the closed state from the open state even if various factors are taken into account. The resonance frequency f of the vibrator 200 at the time when time (for example, about 1 to 5 seconds) has elapsed may be detected, and this resonance frequency f may be detected as the resonance frequency f2. Since it can be reliably determined that the shutter device 120 is in the closed state at such a time, the resonance frequency f of the vibrator 200 at the time can be set to the resonance frequency f2. Alternatively, the resonance frequency f at the time immediately before the start of the next high-mode step [B2] may be detected as the resonance frequency f2.

  Next, the control unit 160 obtains a difference Δf (Δf = f2−f1) between the resonance frequency f1 detected as described above and the resonance frequency f2. The magnitude of Δf increases as the time difference ΔT between times T1 and T2 increases. This is because the mass of the vibrator 200 continues to decrease due to the irradiation of the ion beam IB until the time T2 even after the time T1.

Next, the control means 160 obtains ΔT based on Δf and the adjustment rate L of the first low mode step [A1]. Specifically, the amount of change Q (Hz / sec) per unit time of the resonance frequency f is determined from the set adjustment rate L. Note that the change amount Q may be stored in the control unit 160 in advance, or may be calculated and obtained when necessary. Then, ΔT is calculated based on Δf and the change amount Q. Note that ΔT can be expressed by the equation: ΔT = Δf / Q, and can be easily obtained by substituting Δf and the change amount Q into the above equation.
As described above, the time difference ΔT between the times T1 and T2, that is, the delay time at the time T2 with respect to the time T1 is obtained. According to such a method, ΔT can be easily obtained.

[A2] High mode process (coarse adjustment)
First, the driving state of the ion gun 130 is switched so that the adjustment rate becomes H, and the ion beam IB is left until it is stabilized. In this state, since the shutter device 120 is in the closed state, the mass of the vibrator 200 does not decrease.
Next, the shutter device 120 is changed from the closed state to the open state. As a result, the ion beam IB is irradiated onto the vibrator 200, and the resonance frequency f of the vibrator 200 increases at a speed corresponding to the adjustment rate H. Next, when the resonance frequency f of the vibrator 200 approaches the resonance frequency f0, the control unit 160 outputs a command S ′ for closing the shutter device 120, and the shutter device 120 is closed. Thereby, the high mode step [A2], that is, the rough adjustment of the resonance frequency f of the vibrator 200 is completed. By including this step with such a relatively high adjustment rate, the coarse adjustment of the resonance frequency f of the vibrator 200 can be performed in a short time, and the efficiency of the frequency adjustment is improved.

  Here, this step is preferably continued until the resonance frequency f of the vibrator 200 becomes closer to the resonance frequency f0 in order to further improve the efficiency of frequency adjustment. However, as described above, the time T2 ′ at which the shutter device 120 is closed in response to the command S ′ may be delayed with respect to the time T1 ′ at which the command S ′ is output. The “time difference ΔT” also changes depending on the state of the shutter device 120 (such as the moving speed of the shutter unit 121).

For this reason, if this process is performed longer in an attempt to bring the resonance frequency f of the vibrator 200 closer to the resonance frequency f0, the mass of the vibrator 200 is excessively reduced when the shutter device 120 is closed. The resonance frequency f of the vibrator 200 may be higher than the resonance frequency f0.
Therefore, the frequency adjustment method of the present embodiment corrects the output timing of the command S ′ (drive timing of the shutter device 120) based on the time difference ΔT obtained in the immediately preceding delay time detection step [B]. The occurrence of the problems as described above is prevented.

  Specifically, for example, when a resonance frequency f0 ′ (for example, about f0−10 ppm) closer to the resonance frequency f0 is set as a target value in this step, first, the control unit 160 first sets the resonance frequency of the vibrator 200. Time T3 at which f coincides with the resonance frequency f0 ′ is obtained. Since this step is performed at a predetermined adjustment rate H, a change amount Q ′ (Hz / sec) of the resonance frequency f per unit time is determined. Therefore, for example, the time T3 can be obtained based on the arbitrary time T4 in the present process, the resonance frequency f4 of the vibrator 200 at the time T4, and the change amount Q ′. The time T3 can be expressed as a time delayed by (f0′−f4) / Q ′ (sec) from the time T4.

  Next, the control unit 160 obtains a time T5 that is earlier than the time T3 by ΔT obtained in the above-described delay time detection step [B]. Then, the control means 160 outputs an instruction S ′ at time T5. Then, the shutter device 120 is closed at a time delayed by ΔT from the time T5 when the command S ′ is output. Since this time is substantially the same as time T3, the resonance frequency f of the vibrator 200 can be adjusted to the resonance frequency f0 'with higher accuracy.

  In this way, by correcting the output timing of the command S ′ based on the time difference ΔT, the resonance frequency f of the vibrator 200 can be adjusted to the resonance frequency f0 ′ with higher accuracy. Therefore, according to this process, the resonance frequency f can be made closer to the resonance frequency f0 while effectively preventing the resonance frequency f from becoming higher than the resonance frequency f0. Thereby, this process can be performed for a longer time, and the frequency adjustment of the vibrator 200 can be performed more efficiently and in a short time.

  As described above, the time difference between the time when the control unit 160 outputs a command to close the shutter device 120 and the time when the shutter device 120 is closed when the command is received is the state of the shutter device 120. It depends on. For this reason, in this process, the output timing of the command S ′ is corrected based on ΔT obtained from the drive of the shutter device 120 immediately before (one time before) from the open state to the closed state. As a result, the resonance frequency f can be adjusted to the resonance frequency f0 'with higher accuracy.

  Specifically, the difference between the time T5 at which the command S ′ is output and the time T1 at which the command S is output is small, and almost no change in the state of the shutter device 120 (change in the moving speed of the shutter unit 121) occurs during this time. Absent. That is, the driving conditions of the shutter device 120 are substantially equal at time T5 and time T1. Therefore, ΔT is substantially equal to ΔT ′, and by correcting the output timing of the command S ′ using such ΔT, the resonance frequency f of the vibrator 200 is changed to the resonance frequency f0 ′ with higher accuracy. Can be combined.

[B2] Second Delay Time Detection Step As described above, in the high mode step [A2] which is the immediately preceding step, the shutter device 120 is closed to finish the step. An instruction S ′ is output from 160. The control unit 160 detects the resonance frequency f1 ′ of the vibrator 200 at the time (first time) T1 ′ (= time T5) when the command S ′ is output based on the information transmitted from the frequency measurement unit 150.

  Further, the control means 160 detects the resonance frequency f2 'of the vibrator 200 at the time (second time) T2' when the shutter device 120 is closed in response to the command S '. In calculation, the time T2 'is the same time as the time T3, and the resonance frequency f2' of the vibrator 200 at the time T2 'is equal to the resonance frequency F0'. However, in order to perform more accurate control, it is preferable to actually measure the resonance frequency 2 ′ of the vibrator 200 at the time T <b> 2 ′ based on information from the frequency measuring unit 150. The detection of the resonance frequency f2 'can be performed by the same method as the detection of the resonance frequency f2 described above.

Next, the control means 160 obtains a difference Δf ′ (Δf ′ = f2′−f1 ′) between the resonance frequency f1 ′ and the resonance frequency f2 ′. Next, the control means 160 obtains ΔT ′ based on Δf ′ and the adjustment rate H in the high mode step [A2]. Specifically, a change amount Q ′ (Hz / sec) per unit time of the resonance frequency f of the vibrator 200 is obtained from the adjustment rate H, and ΔT ′ is calculated based on Δf ′ and the change amount Q ′. To do. Since ΔT ′ can be expressed by the equation ΔT ′ = Δf ′ / Q ′, it can be easily obtained by substituting Δf ′ and the change amount Q ′ into the above equation.
As described above, the time difference ΔT ′ between the times T1 ′ and T2 ′, that is, the delay time at the time T2 ′ with respect to the time T1 ′ is obtained.

[A3] Second low mode process (fine adjustment)
First, the driving state of the ion gun 130 is switched so that the adjustment rate L is achieved, and the ion beam IB is left until it is stabilized. In this state, since the shutter device 120 is in the closed state, the mass of the vibrator 200 does not decrease.
Next, the shutter device 120 is opened. Thereby, the ion beam IB is irradiated to a predetermined portion of the vibrator 200, and the resonance frequency f of the vibrator 200 is increased at a speed corresponding to the adjustment rate L. Next, a command S ″ for closing the shutter device 120 is output from the control unit 160 so that the resonance frequency f of the vibrator 200 becomes the resonance frequency f0, and the shutter device 120 is closed.

  Here, as described above, the time T2 ″ when the shutter device 120 is closed in response to the command S ″ may be delayed with respect to the time T1 ″ when the command S ″ is output. , T2 ″ also varies depending on the state of the shutter device 120. Therefore, in this embodiment, based on ΔT ′ obtained in the immediately preceding second delay time detection step [B2], the instruction S ″ Correct the output timing. Thereby, the resonance frequency f of the vibrator 200 can be adjusted to the resonance frequency f0 with high accuracy.

The correction of the output timing of the command S ″ based on the time difference ΔT ′ in this step is the same as the correction of the output timing of the command S ′ based on ΔT in the high mode step [A2] described above.
That is, first, the control means 160 obtains a time T6 when the resonance frequency f of the vibrator 200 matches the resonance frequency f0. The time T6 is obtained based on the change amount Q (Hz / sec) of the resonance frequency f per unit time in this process, the arbitrary time T7 in this process, and the resonance frequency f7 of the vibrator 200 at the time T7. be able to. In this case, the time T6 can be expressed as a time delayed by (f0−f7) / Q (sec) from the time T7.

Next, the control means 160 obtains a time T8 that is earlier by ΔT ′ than the time T6. Then, the control means 160 outputs a command S ″ at time T8. Then, the shutter device 120 is closed at a time delayed by ΔT ′ from time T8. This time is substantially the same as time T6. Therefore, the resonance frequency f of the vibrator 200 can be adjusted to the resonance frequency f0 with high accuracy.
In this way, by correcting the output timing of the command S ″ based on ΔT ′, the resonance frequency f of the vibrator 200 can be adjusted to the target resonance frequency f0 with certainty and high accuracy.

  In this step, the output timing of the command S ″ is corrected based on ΔT ′ obtained from the drive from the open state to the closed state of the shutter device 120 immediately before (one time before). The difference between the time T8 at which the command S ″ is output and the time T3 at which the command S ′ is output is small, and the state of the shutter device 120 hardly changes during this time. Therefore, ΔT ′ can be considered to be substantially equal to ΔT ″, and by correcting the output timing of the command S ″ using such ΔT ′, the resonance frequency f can be more accurately determined. It can be adjusted to f0.

  Through the steps as described above, the resonance frequency f of the vibrator 200 can be adjusted to the target resonance frequency F0 with high accuracy. Specifically, for example, the resonance frequency f of the vibrator 200 can be set within the range of the resonance frequency f0 ± 1 ppm. In particular, since the resonance frequency f of the vibrator 200 can be adjusted to the target resonance frequency F0 with high accuracy without being affected by the state change of the shutter device 120, the frequency adjustment method of this embodiment is excellent. The frequency adjustment characteristics can continue to be exhibited over time.

In the frequency adjustment method of the present embodiment, the resonance frequency f is roughly adjusted in the high mode step [A2], and finally, the resonance frequency f is finely adjusted in the second low mode step [A3]. Yes. Therefore, the resonance frequency f of the vibrator 200 can be adjusted to the target resonance frequency f0 efficiently and with high accuracy.
In this embodiment, the delay time detection steps [B1] and [B2] are provided between the steps [A1], [A2] and [A3] of the frequency adjustment step. Therefore, it is not necessary to interrupt the steps [A1], [A2], and [A3] of the frequency adjustment step, and the frequency adjustment of the vibrator 200 can be performed efficiently.

  Further, in the present embodiment, when switching the mode of the frequency adjustment step [A], the time difference ΔT, ΔT ′ is utilized by making the shutter device 120 from the open state to the closed state in order to stabilize the ion beam IB. Seeking. In other words, the time differences ΔT and ΔT ′ are obtained by using the driving of the shutter device 120 performed to end the steps [A1] and [A2]. Accordingly, it is possible to prevent unnecessary driving of the shutter device 120 (for example, driving only for obtaining the time differences ΔT and ΔT ′), and thus the frequency of the vibrator 200 can be adjusted efficiently.

  Further, in the frequency adjustment method of the present embodiment, it is obtained from the drive from the open state to the closed state of the shutter device 120 immediately before the high mode step [A2] and the second low mode step [A3]. The output timing of the command (S ′, S ″) for closing the shutter device 120 is corrected based on the time difference (ΔT, ΔT ′). Therefore, more accurate correction can be performed. The resonance frequency f of the vibrator 200 can be adjusted to the target resonance frequency f0 with high accuracy.

  In the present embodiment, the second delay time detection step [B2] is provided, and the output timing of the instruction S ″ is corrected based on the time difference ΔT ′ obtained in this step. The delay time detection step [B2] of FIG. 2 may be omitted, and instead, the output timing of the instruction S ″ may be corrected based on the time difference ΔT obtained in the first delay time detection step [B1]. In such a case, there is a possibility that the accuracy of frequency adjustment is inferior to that of the present embodiment, but still excellent frequency adjustment characteristics can be exhibited compared to the conventional case. Moreover, according to such a method, the process can be simplified as compared with the present embodiment. Whether or not to omit the second delay time detection step [B2] may be appropriately determined based on the accuracy (allowable error) required for the vibrator 200, cost, and the like.

Second Embodiment
Next, a second embodiment of the vibrator frequency adjusting method of the present invention will be described.
FIG. 4 is a diagram for explaining a frequency adjustment method for a vibrator according to the second embodiment of the present invention.
Hereinafter, the frequency adjustment method of the second embodiment will be described with a focus on differences from the above-described embodiment, and description of similar matters will be omitted.

The frequency adjustment method according to the second embodiment of the present invention is the same as that of the first embodiment described above except that the steps are different. In addition, the same code | symbol is attached | subjected to the structure similar to 1st Embodiment mentioned above. In the following, for convenience of explanation, the vibrator 200 corresponding to one shutter device 120 will be described as a representative.
The frequency adjustment method of the present embodiment includes a frequency adjustment step [A] and a delay time detection step [B] performed in the middle of the frequency adjustment step [A]. Specifically, the frequency adjustment step [A] includes a high mode step [A1] and a low mode step [A2], and the delay time detection step [B] is the high mode step [A1]. On the way.

Hereinafter, the frequency adjustment method of this embodiment will be described in detail.
[A1] High mode process (first half)
First, similarly to the first embodiment described above, the vibrator 200 is arranged in the chamber 110, the chamber 110 is placed in a predetermined environment, and the shutter device 120 is closed, and then the energy of the ion beam IB becomes the adjustment rate H. Adjust as follows. Next, the shutter device 120 is changed from the closed state to the open state. As a result, the ion beam IB is irradiated onto the vibrator 200, and the resonance frequency f of the vibrator 200 increases at a speed corresponding to the adjustment rate H.

[B] Delay Time Detection Step First, after a predetermined time has elapsed since the shutter device 120 was opened to start the step [A1], the control unit 160 outputs a command S for closing the shutter device 120, and The shutter device 120 is closed. Based on the information from the frequency measuring means 150, the control means 160 detects the resonance frequency f1 of the vibrator 200 at the time (first time) T1 when the command S is output. In addition, the control unit 160 detects the resonance frequency f2 of the vibrator 200 at the time (second time) T1 when the shutter device 120 is closed in response to the command S. Next, the control unit 160 obtains a difference Δf (Δf = f2−f1) between the resonance frequencies f1 and f2, and further obtains a time difference ΔT between the times T1 and T2 based on Δf and the adjustment rate H.
In addition, it is preferable to maintain the adjustment rate H during this process. Thereby, the next process can be performed rapidly.

[A1] High mode process (second half)
First, the shutter device 120 is changed from the closed state to the open state. Thereby, irradiation of the vibrator 200 with the ion beam IB is resumed, and the resonance frequency f of the vibrator 200 increases at a speed corresponding to the adjustment rate H.
Next, a command S ′ for closing the shutter device 120 from the control means 160 is issued so that the resonance frequency f of the vibrator 200 becomes the resonance frequency f0 ′ (for example, about f0−10 ppm) which is the target value in this step. Is output and the shutter device 120 is closed. At this time, the control unit 160 corrects the output timing of the instruction S ′ based on ΔT obtained in the delay time detection step [B].

[A2] Low Mode Step First, the driving state of the ion gun 130 is switched so that the adjustment rate L is reached, and the ion beam IB is left until it is stabilized. Next, the shutter device 120 is opened. As a result, the ion beam IB is irradiated onto the vibrator 200, and the resonance frequency f of the vibrator 200 increases at a speed corresponding to the adjustment rate L. Next, a command S ″ for closing the shutter device 120 is output from the control means 160 so that the resonance frequency f of the vibrator 200 becomes the resonance frequency f0, and the shutter device 120 is closed. The means 160 corrects the output timing of the instruction S ″ based on ΔT obtained in the delay time detection step [B].
Thus, the adjustment of the resonance frequency of the vibrator 200 is completed.

  In this way, by correcting the output timing of the commands S ′ and S ″ based on ΔT, the resonance frequency f of the vibrator 200 can be adjusted to the target resonance frequency f0 with high accuracy. By using ΔT obtained in the delay time detection step [B] for both the correction of the output timing of the instruction S and the correction of the output timing of the instruction S ′, the frequency adjustment method steps can be reduced.

It should be noted that since the time at which the commands S ′ and S ″ are output is close to the time at which the command S is output, the state of the shutter device 120 hardly changes during that time. Therefore, also by the frequency adjustment method of this embodiment. The resonance frequency f of the vibrator 200 can be adjusted to the target resonance frequency f0 with high accuracy.
In the second embodiment, the same effect as that of the first embodiment described above can be exhibited.

<Third Embodiment>
Next, a third embodiment of the vibrator frequency adjusting method according to the present invention will be described.
FIG. 5 is a diagram for explaining a frequency adjustment method for a vibrator according to the third embodiment of the present invention.
Hereinafter, the frequency adjustment method of the second embodiment will be described with a focus on differences from the above-described embodiment, and description of similar matters will be omitted.

The frequency adjustment method according to the third embodiment of the present invention is the same as that of the first embodiment described above except that the steps are different. In addition, the same code | symbol is attached | subjected to the structure similar to 1st Embodiment mentioned above. In the following, for convenience of explanation, the vibrator 200 corresponding to one shutter device 120 will be described as a representative.
The frequency adjustment method of the present embodiment includes a frequency adjustment step [A] and a delay time detection step [B] performed in the middle of the frequency adjustment step [A].

  The frequency adjustment step [A] is performed at a constant adjustment rate during the process. The adjustment rate in this step is not particularly limited. For example, it may be the same adjustment rate as the high mode step [A2] of the first embodiment described above, or the low mode step [A1 (A3)]. The adjustment rate may be the same. The higher the adjustment rate, the shorter the time required for frequency adjustment of the vibrator 200. The lower the adjustment rate, the more accurate frequency adjustment can be performed. Therefore, the adjustment rate may be appropriately set depending on the accuracy (allowable error) required for the vibrator 200, productivity, and the like. In the following, for convenience of explanation, the case where the adjustment rate similar to the high mode step [A2] of the first embodiment described above is used will be described as a representative.

Hereinafter, the frequency adjustment method of this embodiment will be described in detail.
[A] Frequency adjustment process (first half)
First, similarly to the first embodiment described above, the vibrator 200 is arranged in the chamber 110, the chamber 110 is placed in a predetermined environment, and the shutter device 120 is closed, and then the energy of the ion beam IB becomes the adjustment rate H. Adjust as follows. Next, the shutter device 120 is changed from the closed state to the open state. As a result, the ion beam IB is irradiated onto the vibrator 200, and the resonance frequency f of the vibrator 200 increases at a speed corresponding to the adjustment rate H.

[B] Delay Time Detection Step After a predetermined time has elapsed since the shutter device 120 was opened, the control unit 160 outputs a command S for closing the shutter device 120, and the shutter device 120 is closed. Based on the information from the frequency measuring means 150, the control means 160 detects the resonance frequency f1 of the vibrator 200 at the time (first time) T1 when the command S is output. Further, the control means 160 detects the resonance frequency f2 of the vibrator 200 at the time (second time) T1 when the shutter device 120 is in the closed state in response to the command S.

Next, the control unit 160 obtains a difference Δf (Δf = f2−f1) between the resonance frequencies f1 and f2, and obtains a time difference ΔT between the times T1 and T2 based on the obtained Δf and the adjustment rate H.
In addition, it is preferable to maintain the adjustment rate H during this process. Thereby, the next process can be performed rapidly.

[A] Frequency adjustment process (second half)
First, the shutter device 120 is changed from the closed state to the open state. Thereby, irradiation of the vibrator 200 with the ion beam IB is resumed, and the resonance frequency f of the vibrator 200 increases at a speed corresponding to the adjustment rate H. Next, a command S ′ for closing the shutter device 120 is output from the control unit 160 so that the resonance frequency f of the vibrator 200 becomes the resonance frequency f0, and the shutter device 120 is closed. At this time, the control unit 160 corrects the output timing of the instruction S ′ based on ΔT obtained in the delay time detection step [B].
Thus, the adjustment of the resonance frequency of the vibrator 200 is completed.
As described above, by correcting the output timing of the command S ′ based on ΔT, the resonance frequency f of the vibrator 200 can be adjusted to the target resonance frequency f0 reliably and with high accuracy.

Here, in the frequency adjustment method of the present embodiment, the delay time detection step [B] is preferably performed as late as possible in the frequency adjustment step [A]. Thereby, the time difference between the time at which the instruction S is output in the delay time detection step [B] and the time at which the instruction S ′ is output to end the frequency adjustment step [A] can be further shortened. Therefore, the state of the shutter device 120 at these times can be made more equal, and the resonance frequency f of the vibrator 200 can be adjusted to the target resonance frequency f0 with higher accuracy.
In the third embodiment, the same effect as that of the first embodiment described above can be exhibited.

<Fourth embodiment>
Next, a fourth embodiment of the vibrator frequency adjusting method according to the present invention will be described.
FIG. 6 is a diagram for explaining a frequency adjustment method for a vibrator according to the fourth embodiment of the present invention.
Hereinafter, the frequency adjustment method of the fourth embodiment will be described with a focus on differences from the above-described embodiment, and description of similar matters will be omitted.

The frequency adjustment method according to the fourth embodiment of the present invention is the same as that of the third embodiment described above except that the steps are different. In addition, the same code | symbol is attached | subjected to the structure similar to 1st Embodiment mentioned above. In the following, for convenience of explanation, the vibrator 200 corresponding to one shutter device 120 will be described as a representative.
The frequency adjustment method of this embodiment includes a frequency adjustment step [A] and a delay time detection step [B] performed prior to the frequency adjustment step [A].

Specifically, when the resonance frequency of the n-th (where n is a natural number of 2 or more) vibrator 200 is adjusted using a predetermined shutter device 120, the delay time detection step [B] It is performed between a frequency adjustment process [C] for adjusting the resonance frequency of the −1st vibrator 200 ′ and a frequency adjustment process [A] for adjusting the resonance frequency of the nth vibrator 200 ′.
The frequency adjustment steps [A] and [C] may be different from each other or the same. Hereinafter, for convenience of explanation, a case where the frequency adjustment steps [A] and [C] are the same will be described. These steps [A] and [C] are performed at a constant adjustment rate during the process. Although the adjustment rate is not particularly limited, a case where the adjustment rate H is used will be described below for convenience of explanation.

Hereinafter, the frequency adjustment method of this embodiment will be described in detail.
[C] Frequency Adjustment Step of Vibrator 200 ′ First, as in the first embodiment described above, the vibrator 200 ′ is disposed in the chamber 110, the chamber 110 is placed in a predetermined environment, and the shutter device 120 is closed. To adjust the energy of the ion beam IB to the adjustment rate H.

Next, the shutter device 120 is changed from the closed state to the open state. Thereby, the ion beam IB is irradiated onto the vibrator 200 ′, and the resonance frequency f of the vibrator 200 ′ increases at a speed corresponding to the adjustment rate H. Next, a command S for closing the shutter device 120 is output from the control unit 160 so that the resonance frequency f of the vibrator 200 ′ becomes the resonance frequency f0, and the shutter device 120 is closed.
Thus, the adjustment of the resonance frequency of the vibrator 200 ′ is completed.

[B] Delay Time Detection Step Based on information from the frequency measurement unit 150, the control unit 160 detects the resonance frequency f1 of the vibrator 200 at the time (first time) T1 when the command S is output. Further, the control means 160 detects the resonance frequency f2 of the vibrator 200 at the time (second time) T1 when the shutter device 120 is in the closed state in response to the command S. Next, the control unit 160 obtains a difference Δf (Δf = f2−f1) between the resonance frequencies f1 and f2, and obtains a time difference ΔT between the times T1 and T2 based on Δf and the adjustment rate H.

[A] Frequency Adjustment Step of the Vibrator 200 First, the vibrator 200 ′ is taken out from the chamber 110, and a new vibrator 200 is disposed. Next, after the chamber 110 is placed in a predetermined environment and the shutter device 120 is closed, the energy of the ion beam IB is adjusted to the adjustment rate H.
Next, the shutter device 120 is changed from the closed state to the open state. As a result, the ion beam IB is irradiated onto the vibrator 200, and the resonance frequency f of the vibrator 200 increases at a speed corresponding to the adjustment rate H. Next, a command S ′ for closing the shutter device 120 is output from the control unit 160 so that the resonance frequency f of the vibrator 200 becomes the resonance frequency f0, and the shutter device 120 is closed. At this time, the control unit 160 corrects the output timing of the instruction S ′ based on ΔT obtained in the delay time detection step [B]. The correction method is the same as that in the first embodiment described above.
Thus, the adjustment of the resonance frequency of the vibrator 200 is completed.

As described above, by correcting the output timing of the command S ′ based on ΔT, the resonance frequency f of the vibrator 200 can be adjusted to the target resonance frequency f0 reliably and with high accuracy.
In particular, in the present embodiment, the time difference ΔT is obtained by using the driving of the shutter device 120 performed to finish the frequency adjustment of the immediately preceding vibrator 200 ′. Accordingly, it is possible to prevent unnecessary driving of the shutter device 120 (for example, driving only for obtaining the time difference ΔT), so that the frequency of the vibrator 200 can be adjusted efficiently.
Also in the fourth embodiment, the same effect as that of the first embodiment described above can be exhibited.

<Fifth Embodiment>
Next, a fifth embodiment of the vibrator frequency adjusting method of the present invention will be described.
FIG. 7 is a diagram for explaining a frequency adjustment method for a vibrator according to the fifth embodiment of the invention.
Hereinafter, the frequency adjustment method of the fifth embodiment will be described focusing on the differences from the above-described embodiment, and description of similar matters will be omitted.

The frequency adjustment method according to the fifth embodiment of the present invention is the same as that of the third embodiment described above except that the steps are different. In addition, the same code | symbol is attached | subjected to the structure similar to 1st Embodiment mentioned above. In the following, for convenience of explanation, the vibrator 200 corresponding to one shutter device 120 will be described as a representative.
The frequency adjustment method of the present embodiment includes a frequency adjustment process [A] and a delay time detection process [B].

The frequency adjustment step [A] includes a high mode step [A1] and a low mode step [A2].
The delay time detection step [B] includes a first delay time detection step [B1] performed prior to the frequency adjustment step [A] and a second delay time performed in the middle of the frequency adjustment step [A]. Detection step [B2].

  Specifically, this is a step of adjusting the resonance frequency of m vibrators 200 (where m is a natural number of 2 or more) in order in time series, and the nth (however, , N is a natural number equal to or greater than 2), the first delay time detection step [B1] adjusts the resonance frequency of the (n−1) th transducer 200 ′. This is performed between the frequency adjustment step [C] and the frequency adjustment step [A] for adjusting the resonance frequency of the n-th vibrator 200, and the second delay time detection step includes the high mode step [A1] and the low frequency step [A1]. It is performed during the mode process [A2].

[C] Frequency Adjustment Step of Vibrator 200 ′ First, as in the first embodiment described above, the vibrator 200 ′ is disposed in the chamber 110, the chamber 110 is placed in a predetermined environment, and the shutter device 120 is closed. To adjust the energy of the ion beam IB to the adjustment rate H.
Next, the shutter device 120 is changed from the closed state to the open state. Thereby, the ion beam IB is irradiated onto the vibrator 200 ′, and the resonance frequency f of the vibrator 200 ′ increases at a speed corresponding to the adjustment rate H. Next, a command S for closing the shutter device 120 is output from the control unit 160 so that the resonance frequency f of the vibrator 200 ′ becomes the resonance frequency f0, and the shutter device 120 is closed.
Thus, the adjustment of the resonance frequency of the vibrator 200 ′ is completed.

[B1] First Delay Time Detection Step Based on the information from the frequency measurement means 150, the control means 160 detects the resonance frequency f1 of the vibrator 200 at the time (first time) T1 when the command S is output. Further, the control means 160 detects the resonance frequency f2 of the vibrator 200 at the time (second time) T1 when the shutter device 120 is in the closed state in response to the command S. Next, the control unit 160 obtains a difference Δf (Δf = f2−f1) between the resonance frequencies f1 and f2, and obtains a time difference ΔT between the times T1 and T2 based on Δf and the adjustment rate H.

[A1] High Mode Step First, the vibrator 200 ′ is taken out from the chamber 110, and a new vibrator 200 is disposed. Next, after the chamber 110 is placed in a predetermined environment and the shutter device 120 is closed, the energy of the ion beam IB is adjusted to the adjustment rate H.
Next, the shutter device 120 is changed from the closed state to the open state. As a result, the ion beam IB is irradiated onto the vibrator 200, and the resonance frequency f of the vibrator 200 increases at a speed corresponding to the adjustment rate H. Next, a command S ′ for closing the shutter device 120 is output from the control means 160 so that the resonance frequency f of the vibrator 200 becomes the resonance frequency f0 ′ that is a target value in this step, and the shutter device 120 is Closed. At this time, the control unit 160 corrects the output timing of the instruction S ′ based on ΔT obtained in the first delay time detection step [B1].

[B2] Second Delay Time Detection Step Based on the information from the frequency measuring means 150, the control means 160 determines the resonance frequency f1 ′ of the vibrator 200 at the time (first time) T1 ′ when the command S ′ is output. To detect. Further, the control means 160 detects the resonance frequency f2 ′ of the vibrator 200 at the time (second time) T1 ′ when the shutter device 120 is closed in response to the command S ′. Next, the control unit 160 obtains a difference Δf ′ (Δf ′ = f2′−f1 ′) between the resonance frequencies f1 ′ and f2 ′, and based on Δf ′ and the adjustment rate H, the times T1 ′ and T2 ′. Find the time difference ΔT ′.

[A2] Low Mode Step First, the driving state of the ion gun 130 is switched so that the adjustment rate L is reached, and the ion beam IB is left until it is stabilized.
Next, the shutter device 120 is opened. Thereby, the ion beam IB is irradiated to a predetermined portion of the vibrator 200, and the resonance frequency f of the vibrator 200 is increased at a speed corresponding to the adjustment rate L. Next, a command S ″ for closing the shutter device 120 is output from the control means 160 so that the resonance frequency f of the vibrator 200 becomes the resonance frequency f0, and the shutter device 120 is closed. The means 160 corrects the output timing of the instruction S ″ based on ΔT ′ obtained in the second delay time detection step [B2].
Thus, the adjustment of the resonance frequency of the vibrator 200 is completed.
Even in the fifth embodiment, the same effects as those of the first embodiment described above can be exhibited.

As mentioned above, although the frequency adjustment method of the vibrator | oscillator of this invention was demonstrated based on embodiment of illustration, this invention is not limited to this. Moreover, other arbitrary components (processes) may be added to the present invention. Moreover, you may combine each embodiment suitably.
In the above-described embodiment, the method of changing the resonance frequency of the vibrator by reducing the mass of the vibrator by the ion beam has been described. However, the present invention is not limited to this. For example, metal particles are attached to the vibrator by vapor deposition. The resonance frequency of the vibrator may be changed by increasing the mass of the vibrator.

DESCRIPTION OF SYMBOLS 100 ... Frequency adjustment device 110 ... Chamber 120 ... Shutter device 121 ... Shutter part 122 ... Drive part 122a ... Main body 122b ... Shaft 123 ... Connection part 124 ... Vibrator 130 ... Ion gun 140 ... Shielding plate 150 ... Frequency measuring means 160 ... Control means 200, 200 '... Vibrator

Claims (2)

A frequency adjustment method for adjusting a resonance frequency of a vibrator,
A shutter part capable of switching between an open state allowing mass change of the vibrator by a mass changing means and a closed state preventing the mass change;
A step of preparing a shutter device comprising: a control unit that controls the switching of the shutter unit;
Arranging the shutter portion between the vibrator and the mass changing means;
A first frequency adjustment step in which the shutter unit is in the closed state after the shutter unit is in the open state and the mass change of the vibrator is started;
In the first frequency adjustment step, a time difference between a first time at which a command to close the shutter unit in the closed state is output and a second time at which the shutter unit is in the closed state in response to the command is obtained. 1 delay time detection step;
A second frequency adjusting step of setting the shutter unit in the open state and starting mass change of the vibrator at a higher rate than the first frequency adjusting step, and then setting the shutter unit in the closed state;
In the second frequency adjustment step, a time difference between a third time at which a command for closing the shutter unit is output and a fourth time at which the shutter unit is in the closed state in response to the command is obtained. 2 delay time detection step;
A third frequency adjusting step of setting the shutter portion in the open state and starting mass change of the vibrator at a rate lower than that of the second frequency adjusting step, and then setting the shutter portion in the closed state;
In the second frequency adjustment step, the control unit corrects a time for outputting a command to set the shutter unit in the closed state based on a time difference between the first time and the second time, and In the frequency adjustment step, the frequency adjustment method for the vibrator is characterized in that the time for outputting the command to set the shutter unit in the closed state is corrected based on the time difference between the third time and the fourth time . In the first delay time detecting step , the resonance frequency of the vibrator at the first time and the resonance frequency of the vibrator at the second time in a state where the mass of the vibrator is changed by the mass changing unit. Obtaining the time difference based on the difference and the amount of change in resonance frequency per unit time of the vibrator ;
In the second delay time detecting step, in a state where the mass of the vibrator is changed by the mass changing means, the resonance frequency of the vibrator at the third time and the resonance frequency of the vibrator at the fourth time The method for adjusting a frequency of a vibrator according to claim 1, wherein the time difference is obtained based on the difference and the amount of change in resonance frequency per unit time of the vibrator.

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