JP5829446B2 - Substrate processing apparatus and liquid exchange method thereof - Google Patents

Description

  The present invention relates to a semiconductor wafer, a liquid crystal display substrate, a plasma display substrate, an organic EL substrate, an FED (Field Emission Display) substrate, an optical display substrate, a magnetic disk substrate, a magneto-optical disk substrate, and a photomask substrate. The present invention relates to a substrate processing apparatus that performs processing on a substrate by immersing a substrate and a substrate for a solar cell (hereinafter simply referred to as a substrate) in a processing liquid, and a liquid replacement method thereof.

  Conventionally, as this type of apparatus, an inner tank for storing a processing liquid, an ejection pipe for supplying the processing liquid to the inner tank, an outer tank for collecting the processing liquid overflowing from the inner tank, an ejection pipe and an outer tank A circulation pipe connected in communication, a pump for circulating the processing liquid in the circulation pipe, a bottom outlet for discharging the processing liquid stored in the inner tank, and an upstream side and a bottom outlet of the pump in the circulation pipe And a drain pipe for draining the processing liquid by branching on the downstream side of the pump in the circulation pipe (see, for example, Patent Document 1).

In the substrate processing apparatus configured as described above, for example, a phosphoric acid solution containing phosphoric acid (H ₃ PO ₄ ) may be used as the processing liquid. In order to use the phosphoric acid solution as the treatment liquid, the phosphoric acid solution is supplied to the inner tank, the phosphoric acid solution overflowing from the inner tank is circulated from the outer tank to the circulation pipe, and the phosphoric acid solution is again returned from the ejection pipe to the inner tank. At this time, the temperature of the phosphoric acid solution is adjusted to a high processing temperature of about 160 ° C. in the circulation pipe.

  By the way, in the phosphoric acid solution, a use limit (also called life) is generally set as a reference for judging that the solution has become old. For example, when the predefined number of uses (also called life count) is reached, or when the predefined usage time (also called lifetime) is reached, the phosphoric acid solution is discharged and replaced with a new phosphoric acid solution. Yes. In that case, drain from the outer tank through the circulation pipe and drainage pipe, and then drain from the inner tank through the bottom outlet, inner tank drain pipe, circulation pipe, and drainage pipe. Yes. After draining, a new phosphoric acid solution is supplied, a new phosphoric acid solution is supplied as described above, and the temperature is adjusted. Then, after the temperature adjustment is completed, the next substrate is treated with the phosphoric acid solution until the use limit is reached.

JP 2010-86982 A (FIG. 1)

However, the conventional example having such a configuration has the following problems.
In other words, the phosphoric acid solution obtained by treating the substrate containing silicon contains siloxy acid (SiO ₂ component) close to the saturation concentration. When the temperature of the old phosphoric acid solution decreases, crystals of siloxy acid precipitate and solidify. Tend to. In the conventional apparatus, since the phosphoric acid solution is circulated through the inner tank drain pipe only when the old phosphoric acid solution is discharged, solidification may occur particularly in the inner tank drain pipe. In particular, at the time of discharge, the temperature of the phosphoric acid solution is close to the processing temperature, but while the temperature of the new phosphoric acid solution is being adjusted, the temperature in the inner tank drain pipe is lowered, and siloxy acid solidifies easily. .

  If the phosphoric acid solution is discharged at the time of the next liquid exchange in the state where such solidification has occurred, the siloxy acid lump flows into the waste liquid facility, which may cause a problem in the waste liquid facility. In addition, there may be a residue of siloxy acid in the circulation pipe when the liquid is replaced. In such a case, siloxane is mixed with a new phosphoric acid solution and the flow resistance in the circulation pipe is high. There is a problem that an adverse effect on an apparatus such as that siloxane is likely to accumulate on a filter (for example, a filter) or a process failure occurs due to adhesion to a substrate immersed in a phosphoric acid solution.

  The present invention has been made in view of such circumstances, and prevents liquid waste from being adversely affected by performing liquid flow to the inner tank drain pipe during temperature control after liquid replacement. An object of the present invention is to provide a substrate processing apparatus and a liquid exchange method thereof that can prevent adverse effects on the apparatus and process defects.

In order to achieve such an object, the present invention has the following configuration.
That is, in the substrate processing apparatus for processing a substrate with a processing liquid, the invention according to claim 1 stores the processing liquid, stores the substrate, and performs a predetermined process on the substrate from the inner tank and the inner tank. A treatment tank provided with an outer tank for recovering an overflowing treatment liquid; a circulation pipe for connecting the inner tank and the outer tank to each other; a circulation pipe disposed in the circulation pipe; A pump for sending to the tank side, an upstream side of the pump among the circulation pipes, an inner tank drain pipe communicating with the inner tank, and a downstream side of the pump among the circulation pipes. A drainage pipe for discharging the treatment liquid, and after the treatment liquid stored in the treatment tank is discharged through the circulation pipe, the inner tank drain pipe, and the drainage pipe, a new treatment liquid is supplied. The processing liquid is supplied to the outer tank and the circulation pipe by the pump. When performing the temperature control of the processing solution while circulating in the normal circulation path into said chamber, with at least once before temperature adjustment is complete circulating the processing solution to the temporary route passes through the inner tub drain pipe, wherein Control means for alternately switching between the normal circulation path and the temporary path is provided.

[Operation / Effect] According to the invention described in claim 1, the control means discharges the processing liquid stored in the processing tank through the circulation pipe, the inner tank drain pipe, and the drainage pipe, and then newly adds the processing liquid to the processing tank. Supply a suitable treatment solution. Next, the temperature of the processing liquid is controlled while circulating the processing liquid through a normal circulation path extending from the outer tank, the circulation pipe, and the inner tank using a pump. The processing liquid is circulated through a temporary path passing through the tank drain pipe. Therefore, even if the old processing liquid remains in the inner tank drain pipe, it can be replaced with a new processing liquid. As a result, it is possible to prevent the waste liquid equipment from being adversely affected due to the old processing liquid remaining in the inner tank drain pipe. In addition, since the inside of the inner tank drain pipe is cleaned with a new processing liquid before the old processing liquid solidifies, it is possible to prevent an adverse effect on the apparatus due to the solidification of the old processing liquid and to adversely affect the process. Can be prevented. Moreover, it can suppress that the temperature of the process liquid in an outer tank falls by switching a normal circulation path | route and a temporary path | route alternately. Accordingly, it is possible to prevent the adverse effect that the time until the temperature adjustment is completed becomes long.

According to a second aspect of the present invention, there is provided a substrate processing apparatus for processing a substrate with a processing liquid. An inner tank for storing a processing liquid, storing the substrate and performing a predetermined process on the substrate, and the inner tank A treatment tank provided with an outer tank for recovering an overflowing treatment liquid; a circulation pipe for connecting the inner tank and the outer tank to each other; a circulation pipe disposed in the circulation pipe; A pump for sending to the tank side, an upstream side of the pump among the circulation pipes, an inner tank drain pipe communicating with the inner tank, and a downstream side of the pump among the circulation pipes. A drainage pipe for discharging the treatment liquid, and after the treatment liquid stored in the treatment tank is discharged through the circulation pipe, the inner tank drain pipe, and the drainage pipe, a new treatment liquid is supplied. The treatment liquid is pumped by the outer tank, the circulation pipe, and the front When the temperature of the processing liquid is controlled while circulating through the normal circulation path to the inner tank, the processing liquid is circulated through the temporary path passing through the inner tank drain pipe at least once before the temperature adjustment is completed. And a control means for causing the processing liquid to flow through the temporary path after the temperature is raised to a predetermined temperature.

[Operation / Effect] According to the invention described in claim 2, the control means discharges the processing liquid stored in the processing tank through the circulation pipe, the inner tank drain pipe, and the drainage pipe, and then newly adds the processing liquid to the processing tank. Supply a suitable treatment solution. Next, the temperature of the processing liquid is controlled while circulating the processing liquid through a normal circulation path extending from the outer tank, the circulation pipe, and the inner tank using a pump. The processing liquid is circulated through a temporary path passing through the tank drain pipe. Therefore, even if the old processing liquid remains in the inner tank drain pipe, it can be replaced with a new processing liquid. As a result, it is possible to prevent the waste liquid equipment from being adversely affected due to the old processing liquid remaining in the inner tank drain pipe. In addition, since the inside of the inner tank drain pipe is cleaned with a new processing liquid before the old processing liquid solidifies, it is possible to prevent an adverse effect on the apparatus due to the solidification of the old processing liquid and to adversely affect the process. Can be prevented. In addition, since the processing liquid is circulated through the temporary path after the temperature of the processing liquid is raised to a predetermined temperature, even if a processing liquid having a high viscosity is used, the replacement in the inner tank drain pipe is smoothly performed. Can be done.

In the present invention, it is preferable that the control means makes the flow time of the treatment liquid to the temporary path shorter than the flow time of the treatment liquid to the normal circulation path (Claim 3 ). Since the circulation time to the temporary path is made shorter than that of the normal circulation path, it is possible to suppress a decrease in the temperature of the processing liquid stored in the outer tank. Accordingly, it is possible to prevent the adverse effect that the time until the temperature adjustment is completed becomes long.

In the present invention, it is preferable that the control means causes the treatment liquid to flow through the temporary path until the temperature of the treatment liquid reaches the boiling point of the treatment liquid (claim 4 ). If the treatment liquid is circulated through the temporary path after the treatment liquid reaches the boiling point, bumping may occur at that time, and the inner tank drain pipe may vibrate vigorously. However, such inconvenience can be prevented by allowing the processing liquid to flow through temporary accounting until the temperature of the processing liquid reaches the boiling point.

Further, in the present invention, it further comprises a flow rate adjusting means for adjusting a flow path cross-sectional area of the inner tank drain pipe, and the control means performs processing in the inner tank when discharging the processing liquid in the inner tank drain pipe. When the remaining amount of liquid decreases, it is preferable to operate the flow rate adjusting means to reduce the flow rate of the inner tank drain pipe (Claim 5 ). By reducing the flow rate by the flow rate adjusting means, the processing liquid can be efficiently discharged even when the processing liquid in the inner tank is reduced. Accordingly, the amount of the old processing liquid remaining can be extremely reduced, and the degree of replacement can be increased when a new processing liquid is circulated through the temporary path.

Moreover, in this invention, it is arrange | positioned by the outer peripheral surface of the said inner tank drain piping, and further provides the vibration provision means which provides a vibration to the said inner tank drain piping, The said control means is a process liquid of the said inner tank drain piping. It is preferable to operate the vibration applying means after discharging (claim 6 ). Since vibration is applied to the inner tank drain pipe by the vibration applying means, it is possible to suppress the old treatment liquid from remaining in the inner tank drain pipe. Therefore, when a new processing liquid is circulated through the temporary path, it is possible to prevent the old processing liquid from being mixed.

In the present invention, the control means further comprises pure water supply means for supplying pure water from the upstream side of the inner tank drain pipe, and gas supply means for supplying gas from the upstream side of the inner tank drain pipe. after draining the treatment liquid in the tank drain pipe, said by flowing pure water to the inner tub drain pipe from the pure water supply means, it is preferable to supply the gas from the gas supply means (claim 7) . By supplying pure water to the inner tank drain pipe by the pure water supply means, the old treatment liquid can be washed away. By supplying gas to the inner tank drain pipe by the gas supply means, the pure water in the delivery drain pipe can be discharged. Therefore, when a new processing liquid is supplied to a temporary path | route, it can suppress that an old processing liquid mixes.

The invention according to claim 8 is a processing tank comprising an inner tank that stores the processing liquid, immerses the substrate and performs processing on the substrate, and an outer tank that recovers the processing liquid overflowing from the inner tank. Among them, in the liquid exchange method of the substrate processing apparatus, which includes a circulation pipe in which the inner tank and the outer tank are connected in communication with each other, and the substrate is treated with the treatment liquid, the outside of the treatment liquid in the outer tank is discharged from the circulation pipe A tank drain process, an inner tank drain process for discharging the processing liquid of the inner tank from an inner tank drain pipe that connects the upstream side of the circulation pipe and the inner tank, and a new processing liquid is supplied to the processing tank A new liquid supply process, a normal circulation path temperature adjustment process for adjusting the temperature while circulating the new treatment liquid through a normal circulation path reaching the outer tank, the circulation pipe, and the inner tank, and the temperature adjustment process. At least once before the temperature adjustment of the treatment liquid is completed. And a one o'clock path flow temperature control process you temperature control while circulating the processing solution to the temporary route passes through the inner tub drain pipe, the one o'clock path flow temperature control process, alternating with the normal circulation path temperature control process It is characterized by being implemented.

[Operation / Effect] According to the invention described in claim 8, after the processing liquid in the outer tank is discharged from the circulation pipe and the processing liquid in the inner tank is discharged from the inner tank drain pipe, a new processing liquid is added to the processing tank. The temperature is controlled while circulating the treatment liquid through a normal circulation path. At that time, the processing liquid is circulated through a temporary path passing through the inner tank drain pipe at least once before the temperature control of the processing liquid is completed. Therefore, even if the old processing liquid remains in the inner tank drain pipe, it can be replaced with a new processing liquid. As a result, it is possible to prevent the waste liquid equipment from being adversely affected due to the old processing liquid remaining in the inner tank drain pipe. In addition, since the inside of the inner tank drain pipe is cleaned with a new processing liquid before the old processing liquid solidifies, it is possible to prevent an adverse effect on the apparatus due to the solidification of the old processing liquid and to adversely affect the process. Can be prevented. Moreover, it can suppress that the temperature of the process liquid in an outer tank falls by switching a normal circulation path | route and a temporary path | route alternately. Accordingly, it is possible to prevent the adverse effect that the time until the temperature adjustment is completed becomes long.

The invention according to claim 9 is a processing tank comprising an inner tank that stores the processing liquid, immerses the substrate and performs processing on the substrate, and an outer tank that recovers the processing liquid overflowing from the inner tank. Among them, in the liquid exchange method of the substrate processing apparatus, which includes a circulation pipe in which the inner tank and the outer tank are connected in communication with each other, and the substrate is treated with the treatment liquid, the outside of the treatment liquid in the outer tank is discharged from the circulation pipe A tank drain process, an inner tank drain process for discharging the processing liquid of the inner tank from an inner tank drain pipe that connects the upstream side of the circulation pipe and the inner tank, and a new processing liquid is supplied to the processing tank A new liquid supply process, a normal circulation path temperature adjustment process for adjusting the temperature while circulating the new treatment liquid through a normal circulation path reaching the outer tank, the circulation pipe, and the inner tank, and the temperature adjustment process. At least once before the temperature adjustment of the treatment liquid is completed. And a temporary path circulation temperature adjustment process for adjusting the temperature while circulating the treatment liquid in a temporary path passing through the inner tank drain pipe, wherein the temperature of the new treatment liquid is the normal circulation path. It is performed after the temperature is raised to a predetermined temperature in the temperature adjustment process.

[Operation / Effect] According to the invention described in claim 9, after the treatment liquid in the outer tank is discharged from the circulation pipe and the treatment liquid in the inner tank is discharged from the inner tank drain pipe, a new treatment liquid is added to the treatment tank. The temperature is controlled while circulating the treatment liquid through a normal circulation path. At that time, the processing liquid is circulated through a temporary path passing through the inner tank drain pipe at least once before the temperature control of the processing liquid is completed. Therefore, even if the old processing liquid remains in the inner tank drain pipe, it can be replaced with a new processing liquid. As a result, it is possible to prevent the waste liquid equipment from being adversely affected due to the old processing liquid remaining in the inner tank drain pipe. In addition, since the inside of the inner tank drain pipe is cleaned with a new processing liquid before the old processing liquid solidifies, it is possible to prevent an adverse effect on the apparatus due to the solidification of the old processing liquid and to adversely affect the process. Can be prevented. In addition, since the processing liquid is circulated through the temporary path after the temperature of the processing liquid is raised to a predetermined temperature, even if a processing liquid having a high viscosity is used, the replacement in the inner tank drain pipe is smoothly performed. Can be done.

Further, in the present invention, the one o'clock path flow temperature control process, the usually preferred to be performed for a short time than the circulation path temperature control process (claim 1 0). Since the circulation time to the temporary path is made shorter than that of the normal circulation path, it is possible to suppress a decrease in the temperature of the processing liquid stored in the outer tank. Accordingly, it is possible to prevent the adverse effect that the time until the temperature adjustment is completed becomes long.

In the present invention, it is preferable that the temporary path circulation temperature adjustment process is performed until the temperature of the treatment liquid reaches the boiling point of the treatment liquid in the normal circulation path temperature adjustment process (Claim 1 1 ). If the treatment liquid is circulated through the temporary path after the treatment liquid reaches the boiling point, bumping may occur at that time, and the inner tank drain pipe may vibrate vigorously. However, as the temperature of the processing solution to perform processing liquid distribution to the temporary route until reaching the boiling point, it is possible to prevent such inconvenience.

According to the substrate processing apparatus of the present invention, the control means supplies the new processing liquid to the processing tank after discharging the processing liquid stored in the processing tank through the circulation pipe, the inner tank drain pipe, and the drainage pipe. To do. Next, the temperature of the processing liquid is controlled while circulating the processing liquid through a normal circulation path extending from the outer tank, the circulation pipe, and the inner tank using a pump. The processing liquid is circulated through a temporary path passing through the tank drain pipe. Therefore, even if the old processing liquid remains in the inner tank drain pipe, it can be replaced with a new processing liquid. As a result, it is possible to prevent the waste liquid equipment from being adversely affected due to the old processing liquid remaining in the inner tank drain pipe. In addition, since the inside of the inner tank drain pipe is cleaned with a new processing liquid before the old processing liquid solidifies, it is possible to prevent an adverse effect on the apparatus due to the solidification of the old processing liquid and to adversely affect the process. Can be prevented. Moreover, it can suppress that the temperature of the process liquid in an outer tank falls by switching a normal circulation path | route and a temporary path | route alternately. Accordingly, it is possible to prevent the adverse effect that the time until the temperature adjustment is completed becomes long.

It is a block diagram which shows schematic structure of the substrate processing apparatus which concerns on an Example. It is a flowchart which shows the operation | movement at the time of the liquid replacement | exchange of an apparatus. It is a flowchart which shows the operation | movement at the time of the liquid replacement | exchange of an apparatus. It is a time chart at the time of liquid exchange. (A) is a time chart at the time of liquid replacement, (b) is a graph which shows the temperature change of the process liquid at the time of liquid replacement. It is a schematic block diagram which shows a 1st modification. It is a schematic block diagram which shows the 2nd modification. It is a schematic block diagram which shows a 3rd modification.

An embodiment of the present invention will be described below with reference to the drawings.
FIG. 1 is a block diagram illustrating a schematic configuration of a substrate processing apparatus according to an embodiment.

In this substrate processing apparatus, a plurality of substrates W are immersed in a processing solution to perform a predetermined process on the substrate W. Here, a phosphoric acid solution (H ₃ PO ₄ ) will be described as an example of the processing liquid.

  The processing tank 1 includes an inner tank 3 and an outer tank 5. The inner tank 3 stores the processing liquid and performs a predetermined processing by bringing the substrate W into contact with the processing liquid. The outer tank 5 is disposed around the inner tank 3 and collects the processing liquid overflowing from the inner tank 3. Moreover, the inner tank 3 is equipped with the tank heater HE2 which heats the process liquid currently stored in the outer peripheral surface.

  One end side of the circulation pipe 7 is connected to the outer tub 5 in communication. Specifically, one end side of the circulation pipe 7 is disposed from the top of the outer tub 5 and is disposed so as to open near the bottom. The other end side of the circulation pipe 7 is connected to the bottom of the inner tank 3.

  The circulation pipe 7 includes an on-off valve CH1, a pump AP, an on-off valve CH3, an in-line heater HE1, and a filter 9 in order from the upstream side corresponding to the outer tub 5 side. The on-off valve CH <b> 1 controls the flow of the processing liquid from the outer tub 5 to the circulation pipe 7. The pump AP feeds and circulates the processing liquid in the circulation pipe 7. The on-off valve CH3 controls the flow of the processing liquid to the in-line heater HE1 side in the circulation pipe 7. The inline heater HE1 heats the processing liquid flowing through the circulation pipe 7. The filter 9 adsorbs and removes foreign matters such as particles contained in the processing liquid flowing through the circulation pipe 7.

  The inner tank 3 includes an inner tank drain pipe 11. One end side of the inner tank drain pipe 11 is arranged from the upper part of the inner tank 3, and is arranged so as to open near the bottom. The other end side of the inner tank drain pipe 11 is connected to the upstream side of the pump AP in the circulation pipe 7 and the downstream side of the on-off valve CH1. The inner tank drain pipe 11 includes an on-off valve CH <b> 2 that controls the flow of the processing liquid in the inner tank drain pipe 11.

  One end side of the recovery pipe 13 is connected to the upstream side of the on-off valve CH3 of the circulation pipe 7 in communication. The other end of the recovery pipe 13 is connected to a recovery unit (not shown). The recovery pipe 13 includes an on-off valve CH5 that controls the flow of the processing liquid. One end side of the waste liquid pipe 15 is connected in communication with the upstream side of the on-off valve CH5 in the recovery pipe 13. The other end of the waste liquid pipe 15 is connected to a waste liquid unit (not shown). The waste liquid pipe 15 includes an on-off valve CH4 that controls the flow of the processing liquid.

  The recovery pipe 13 corresponds to the “drainage pipe” in the present invention.

  Further, the circulation pipe 7 includes a bypass pipe 17 that bypasses between the downstream side of the in-line heater HE1 and the downstream side of the filter 9 and the upstream side of the inner tank 3. The bypass pipe 17 includes an on-off valve DR2 that controls the flow of the processing liquid. In addition, the circulation pipe 7 includes a filter drain pipe 19 that connects the inside of the filter 9 and the downstream side of the pump AP and the upstream side of the on-off valve CH3. The filter drain pipe 19 includes an on-off valve DR3 that controls the flow.

The inner tank 3 is provided with three supply pipes. The supply pipe 21 is arranged so that one end side thereof is connected to the processing liquid supply source 23 and the other end side is opened near the bottom surface of the inner tank 3. The supply pipe 21 includes a flow rate adjustment valve SU4 that can adjust the supply amount of the processing liquid. The supply pipe 25 is arranged so that one end side thereof is connected to the treatment liquid supply source 27 and the other end side is opened near the bottom surface of the inner tank 3. The supply pipe 25 includes a flow rate adjustment valve SU5 that can adjust the supply amount of the processing liquid. The supply pipe 29 is arranged so that one end side thereof is connected to the pure water supply source 31 and the other end side is opened near the bottom surface of the inner tank 3. The supply pipe 29 includes a flow rate adjustment valve SU6 that can adjust the supply amount of pure water. The treatment liquid supply sources 23 and 27 described above supply, for example, a phosphoric acid solution (H ₃ PO ₄ ).

  The above-described opening / closing operations of the on-off valves CH1 to CH5, DR2 and DR3, the temperature control of the tank heater HE2, the operation / stop of the pump AP, the temperature control of the inline heater HE1, and the flow rate adjustment of the flow rate adjusting valves SU4 to 6 are controlled. This is performed in an integrated manner by the unit 33. The control unit 33 includes a CPU, a memory, and the like (not shown).

  The control unit 33 described above corresponds to a “control unit” in the present invention.

  Next, the operation of the above-described apparatus will be described with reference to FIGS. 2 and 3 are flowcharts showing the operation of the apparatus at the time of liquid replacement, and FIG. 4 is a time chart at the time of liquid replacement. FIG. 5A is a time chart at the time of liquid replacement, and FIG. 5B is a graph showing a temperature change of the processing liquid at the time of liquid replacement.

  In the following description, the old phosphoric acid solution is stored as the processing liquid in the processing tank 1 and the circulation pipe 7, and the description will be made from the point in time when the life is increased and the processing liquid needs to be replaced. The state at that time is assumed to be shown from time 0 to time t1 in FIG. Specifically, the on-off valves CH1 to CH5 are closed, the DR2 and DR3 are closed, the pump AP is stopped, the tank heater HE1 and the inline heater HE2 are turned off, and the flow rate adjustment valves SU4 to SU6 are closed. It is.

Step S1 (outer tank drainage)
The phosphoric acid solution stored in the outer tub 5 is discharged. Specifically, the control unit 33 opens the on-off valve CH1 from time t1 to time t5. Further, the pump AP is operated from the time point t1 to the time point t6. Further, the on-off valve CH3 is opened from the time t1 to the time t4, and the on-off valve CH5 is opened from the time t3 to the time t8. Further, the tank heater HE1 and the in-line heater HE2 are operated from the time point t1 to the time point t2.

  Thus, the old phosphoric acid solution is circulated through the circulation pipe 7 until the on-off valve CH3 is closed at time t4. Further, the temperature of the phosphoric acid solution is adjusted to the treatment temperature until time t2. Then, from the time t4 when the on-off valve CH3 is closed to the time t5 at which the on-off valve CH1 is closed, the old phosphoric acid solution stored in the outer tub 5 is recovered to the recovery unit (not shown) through the recovery pipe 13. Is done. The reason why the temperature of the old phosphoric acid solution to be discharged is controlled is that the viscosity of the phosphoric acid solution is high, so that the flow efficiency is increased and the discharging efficiency is increased. When the viscosity of the treatment liquid is low, it is not necessary to adjust the temperature.

  Step S1 corresponds to the “outer tank drain process” in the present invention.

Step S2 (drainage of inner tank)
The phosphoric acid solution stored in the inner tank 3 is discharged. The controller 33 opens the on-off valve CH2 from time t5 to time t6, and discharges the phosphoric acid solution stored in the inner tank 3 from the recovery pipe 13 by the pump AP.

  Step S2 corresponds to the “inner tank drain process” in the present invention.

Step S3 (pipe drainage)
The phosphoric acid solution stored in the circulation pipe 7 is discharged. The controller 33 stops the pump AP at time t6, opens the on-off valves DR2 and DR3, and discharges the phosphoric acid solution from the recovery pipe 13. From the connection part of the circulation piping 7 and the inner tank 3, and from the bypass piping 17 to the collection | recovery piping 13, it is provided so that height may become low gradually. Thereby, the old phosphoric acid solution staying in the filter 9 and the old phosphoric acid solution convection upstream or downstream of the in-line heater HE1 are discharged by its own weight.

Step S4 (injection of washing water)
Wash water is added to the treatment tank 1. The control unit 33 closes the on-off valves DR2 and DR3 at time t7, opens the flow rate control valve SU6 at a predetermined flow rate, and supplies pure water from the pure water supply source 31 to the inner tank 3.

Step S5 (filter cleaning)
The filter 9 is washed. The control unit 33 operates the pump AP at time t9 to circulate pure water in the circulation pipe 7 and the treatment tank 1. Accordingly, pure water is circulated through the filter 9 for cleaning.

Steps S6 and S7 (outer tank drain, inner tank drain)
The outer tank 5 is drained, and then the inner tank 3 is drained. The controller 33 closes the on-off valve CH3 at time t11 and discharges pure water from the outer tub 5 through the waste liquid pipe 15. Next, the control unit 33 opens the on-off valve CH2 from time t12 to time t13, and discharges the pure water in the inner tank 3 through the waste liquid piping 15.

Step S8 (drainage of piping)
Following the drainage of the treatment tank 1, the circulation pipe 7 is drained. The controller 33 opens the on-off valves DR2 and DR3 and stops the pump AP at time t13. Further, the on-off valve CH3 is opened. Thereby, the pure water of the circulation pipe 7 is discharged from the waste liquid pipe 15 using gravity.

Steps S9 and S10 (treatment solution is charged and charged)
A new processing solution is introduced into the processing tank 1. The control unit 33 opens the flow rate adjusting valves SU4 and SU5 at a predetermined flow rate at time t15, and supplies a new phosphoric acid solution to the inner tank 3. At this time, the on-off valve CH4 is closed. The control unit 33 operates the pump AP at time t16 to circulate a new phosphoric acid solution overflowing from the inner tank 3 to the outer tank 5 through the circulation pipe 7. After the treatment tank 1 and the circulation pipe 7 are filled with a new phosphoric acid solution, the flow rate adjustment valves SU4 and SU5 are closed at time t17 to stop the supply of the phosphoric acid solution.

  Steps S9 and S10 correspond to the “new liquid supply process” in the present invention.

Steps S11 and S12 (temperature adjustment start)
Start temperature control of a new phosphoric acid solution. The controller 33 operates the tank heater HE2 and the in-line heater HE1 at time t18 to start increasing the temperature toward the target temperature TT. At this time, the phosphoric acid solution is circulated through the normal circulation path from the outer tank 5 through the circulation pipe 7. And the control part 33 maintains this state until the temperature from the temperature sensor which is not shown in figure reaches predetermined temperature T1. Assuming that the temperature of the phosphoric acid solution reaches the predetermined temperature T1 at time t20, the process proceeds to the next process. The predetermined temperature T1 here is a temperature lower than the target temperature TT and the boiling point TB of the phosphoric acid solution, and is a temperature at which the fluidity of the phosphoric acid solution having a high viscosity is increased to some extent.

Note that Step S11 to Step S19 described later excluding Step S13 correspond to the “ normal circulation path temperature adjustment process” in the present invention.

Steps S13 and S14 (circulation of the primary path)
The control unit 33 switches from the normal circulation path to the temporary path. For this purpose, the control unit 33 closes the on-off valve CH1 and opens the on-off valve CH2 at time t20. As a result, the phosphoric acid solution that has passed through the circulation pipe 7 from the outer tank 5 circulates from the inner tank 3 through the inner tank drain pipe 11 and the circulation pipe 7. The circulation by this temporary route is continued for a predetermined circulation time. When the circulation time is reached, the next process is started.

  Since the switching to the temporary path is performed after the temperature of the phosphoric acid solution rises to the predetermined temperature T1, even in a phosphoric acid solution having a high viscosity, the replacement in the inner tank drain pipe 11 can be performed smoothly. Moreover, it is because it is easy to wash away the phosphoric acid solution in a state where the temperature is raised to some extent even if the siloxy acid of the phosphoric acid solution is solidified in the inner tank drain pipe 11. The predetermined temperature T1 is set lower than the target temperature TT and the boiling point TB of the phosphoric acid solution. This is to prevent the phosphoric acid solution from flowing into the temporary path after reaching the boiling point, since bumping may occur at that time and the inner tank drain pipe 11 may vibrate vigorously.

Step S13 corresponds to the “temporary route circulation temperature adjustment process” in the present invention.

Steps S15 and S16 (normal circulation path circulation)
When the circulation time is reached, the control unit 33 returns from the temporary route to the normal circulation route. That is, at the time t21, the on-off valve CH2 is closed and the on-off valve CH1 is opened. As a result, the phosphoric acid solution is circulated from the outer tub 5 through the circulation pipe 7. This state is maintained until the circulation time elapses, and when the circulation time is reached, the next processing is started.

Step S17 (temporary route circulation count)
The control unit 33 determines whether or not the circulation through the temporary route has been performed a predetermined number of times, and branches the process based on the result. That is, when the circulation by the temporary route is less than the predetermined number, the process returns to step S13 and the circulation of the temporary route and the normal route circulation is performed. On the other hand, if the predetermined number of times has been reached, the process proceeds to the next process. In this embodiment, it is assumed that the predetermined number of times is two, and the processing is shifted to the next processing when the number of times of processing is finished.

  In the temperature control described above, the total time of the circulation times TN1, TN2 in the temporary route is set to be shorter than the total time of the circulation times TG1, TG2, TG3 in the normal circulation route. This is to avoid the disadvantage that the temperature of the phosphoric acid solution stored in the outer tub 5 decreases when the time for circulation through the temporary path is long, and as a result, it takes a long time to complete the temperature control.

Steps S18 and S19 (filtering, temperature control continued, completed)
The controller 33 continues the temperature control of the phosphoric acid solution while performing the circulation in the normal circulation path (from the time t24 to the time t27), and closes the on-off valve DR2 at the time t27 when the target temperature TT is stabilized. The phosphoric acid solution adjusted to TT is passed through the filter 9. By performing this for a predetermined time, the substrate W can be processed after removing particles and the like in the phosphoric acid solution.

  As described above, in this embodiment, the control unit 33 discharges the old phosphoric acid solution stored in the processing tank 1 through the circulation pipe 7, the inner tank drain pipe 11, and the recovery pipe 13, and then newly adds to the processing tank 1. A simple phosphoric acid solution. Next, the temperature of the phosphoric acid solution is controlled while circulating the phosphoric acid solution through a normal circulation path extending from the outer tank 5, the circulation pipe 7, and the inner tank 3 with the pump AP. At least once, the processing liquid is circulated through a temporary path passing through the inner tank drain pipe 11. Therefore, even if the old phosphoric acid solution remains in the inner tank drain pipe 11, it can be replaced with a new phosphoric acid solution. As a result, it is possible to prevent the waste liquid equipment from being adversely affected due to the old phosphoric acid solution remaining in the inner tank drain pipe 11. Moreover, since the inside of the inner tank drain pipe 11 is cleaned with a new phosphoric acid solution before the old phosphoric acid solution is solidified, it is possible to prevent an adverse effect on the apparatus due to the solidification of the old phosphoric acid solution. It can prevent adverse effects.

  Moreover, since the normal circulation path and the temporary path are alternately switched, it is possible to suppress the temperature of the phosphoric acid solution in the outer tub 5 from being lowered. Accordingly, it is possible to prevent the adverse effect that the time until the temperature adjustment is completed becomes long.

  In addition, since the phosphoric acid solution is circulated through the temporary path after the temperature of the phosphoric acid solution is raised to the predetermined temperature T1, even if the phosphoric acid solution has a high viscosity, the replacement in the inner tank drain pipe 11 can be performed smoothly. it can.

  The distribution time to the temporary route (TN1 from time t20 to time t21, TN2 from time t22 to t23) is the distribution time to the normal circulation route (TG1 from time t18 to time t20, TG2 from time t21 to time t22, time t23) Since it is shorter than TG3) at time t27, the temperature of the phosphoric acid solution stored in the outer tub 5 can be suppressed from decreasing. Accordingly, it is possible to prevent the adverse effect that the time until the temperature adjustment is completed becomes long.

  Moreover, the control part 33 distribute | circulates the phosphoric acid solution to a temporary path | route until the temperature of a phosphoric acid solution reaches the boiling point TB. When the phosphoric acid solution reaches the boiling point TB and then flows through the temporary path, bumping may occur at that time, and the inner tank drain pipe 11 may vibrate vigorously. However, since the control unit 33 is distributed at the timing as described above, such inconvenience can be prevented.

<First Modification>
The substrate processing apparatus described above may be configured as shown in FIG. FIG. 6 is a schematic configuration diagram showing a first modification. FIG. 6 shows only a part of the configuration of FIG.

  This apparatus includes an upstream bypass pipe 41 that connects the upstream side and the downstream side of the on-off valve CH2 of the inner tank drain pipe 11 in communication. The upstream bypass pipe 41 includes an on-off valve CH11 on the upstream side and a flow rate adjustment valve FR11 on the downstream side thereof. The flow rate adjusting valve FR11 corresponds to the “flow rate adjusting means” in the present invention.

  In step S2 described above, when the remaining amount of the phosphoric acid solution in the inner tank 3 is reduced, the control unit 33 closes the on-off valve CH2 and opens the on-off valve CH11. And it sets to the state which made the flow volume of the flow regulating valve FR11 small. Thereby, the remaining phosphoric acid solution in the inner tank 3 can be efficiently discharged. Therefore, the amount of the old phosphoric acid solution remaining can be extremely reduced, and the degree of substitution can be increased when a new phosphoric acid solution is passed through the temporary path.

<Second Modification>
The substrate processing apparatus described above may be configured as shown in FIG. FIG. 7 is a schematic configuration diagram showing a second modification.

  This apparatus includes an ultrasonic vibration applying unit 43 in the inner tank drain pipe 11. The ultrasonic vibration applying unit 43 has a function of generating ultrasonic vibration and is attached to the outer peripheral surface of the inner tank drain pipe 11.

  In the case where such a configuration is provided, after discharging the phosphoric acid solution in the inner tank 3 in step S2 described above, the control unit 33 operates the ultrasonic vibration applying unit 43 to perform ultrasonic vibration for a predetermined time. Is granted. Thereby, the droplet of the phosphoric acid solution adhering to the inner surface of the inner tank drain pipe 11 is caused to flow downstream by vibration. Therefore, it is possible to suppress the old phosphoric acid solution from remaining in the inner tank drain pipe 11. As a result, it is possible to prevent the old phosphoric acid solution from being mixed when a new phosphoric acid solution is circulated through the temporary path.

<Third Modification>
The substrate processing apparatus described above may be configured as shown in FIG. FIG. 8 is a schematic configuration diagram showing a third modification.

  In this apparatus, the on-off valve CH2 is provided at a position as close as possible to the inner tank 3 side in the inner tank drain pipe 11. Near the downstream side of the on-off valve CH2, one end side of the injection pipe 45 is connected in communication. A pure water supply source 47 is connected to the other end of the injection pipe 45 in communication. The injection pipe 45 includes an on-off valve CH13. Further, in the injection pipe 45, one end side of the branch pipe 49 is connected to the downstream side of the on-off valve CH13. The other end side of the branch pipe 49 is connected in communication with the gas supply source 51. The branch pipe 49 includes an on-off valve CH15. The gas supply source 51 supplies dry air or nitrogen gas, and here, dry air is supplied.

  The injection pipe 45, the pure water supply source 47, and the on-off valve CH13 correspond to the “pure water supply means” in the present invention. The injection pipe 45, the branch pipe 49, the gas supply source 51, and the on-off valve CH15 correspond to the “gas supply means” in the present invention.

  In such a configuration, after discharging the phosphoric acid solution in the inner tank 3 in step S <b> 2 described above, the open / close valve CH <b> 13 is opened and pure water is supplied from the pure water supply source 47 to the inner tank drain pipe 11. Next, after closing the on-off valve CH 13, the on-off valve CH 15 is opened and dry air is supplied from the gas supply source 51 to the inner tank drain pipe 11. By doing in this way, the old phosphoric acid solution in the inner tank drain piping 11 can be poured away with pure water, and the pure water in the inner tank drain piping 11 can be discharged with dry air. Therefore, when a new phosphoric acid solution is supplied to the temporary path, it is possible to prevent the old phosphoric acid solution from being mixed.

  The present invention is not limited to the above embodiment, and can be modified as follows.

  (1) In the above-described embodiments, the phosphoric acid solution is taken as an example of the treatment liquid, but the present invention is not limited to this. For example, the present invention can be applied to any processing liquid as long as it is easy to solidify inside the inner tank drain pipe 11. For example, the present invention can be applied even when buffered hydrogen fluoride (BHF), which is a mixed liquid of ammonium fluoride and hydrofluoric acid, is used as a treatment liquid.

  (2) In the above-described embodiment, the processing liquid is circulated through the temporary path after reaching the predetermined temperature T1 after the temperature control is started. However, the present invention does not require such control.

  (3) In the embodiment described above, the treatment liquid is circulated twice to the temporary path, but the present invention is not limited to this. For example, the distribution may be performed once or may be performed three or more times.

  (4) In the embodiment described above, one end side of the circulation pipe 7 is arranged from the upper part of the outer tank 5, and one end side of the inner tank drain pipe 11 is arranged from the upper part of the inner tank 3. However, the present invention is not limited to such a configuration. For example, one end side of the circulation pipe 7 may be connected to the bottom of the outer tank 5, and one end side of the inner tank drain pipe 11 may be connected to the bottom of the inner tank 3.

W ... Substrate 1 ... Processing tank 3 ... Inner tank 5 ... Outer tank 7 ... Circulating piping CH1-5 ... Open / close valve DR2, 3 ... Open / close valve AP ... Pump 11 ... Inner tank drain pipe 13 ... Recovery pipe 15 ... Waste liquid pipe 17 ... Bypass piping 19… Filter drain piping 33… Control section

Claims (11)

In a substrate processing apparatus for processing a substrate with a processing liquid,
A processing tank comprising an inner tank for storing the processing liquid, containing the substrate and performing a predetermined process on the substrate, and an outer tank for recovering the processing liquid overflowing from the inner tank;
A circulation pipe connecting the inner tank and the outer tank in communication with each other;
A pump disposed in the circulation pipe for sending the processing liquid from the outer tank side to the inner tank side;
Among the circulation pipes, an upstream side of the pump, and an inner tank drain pipe that connects the inner tank to each other,
Of the circulation pipe, provided on the downstream side of the pump, a drain pipe for discharging the processing liquid,
After discharging the processing liquid stored in the processing tank through the circulation pipe, the inner tank drain pipe, and the drainage pipe, a new processing liquid is supplied, and the processing liquid is supplied to the outer tank by the pump. When adjusting the temperature of the processing liquid while circulating through the normal circulation path leading to the circulation pipe and the inner tank, the processing liquid is circulated through the temporary path passing through the inner tank drain pipe at least once before the temperature adjustment is completed. And a control means for alternately switching the normal circulation path and the temporary path ,
A substrate processing apparatus comprising: In a substrate processing apparatus for processing a substrate with a processing liquid,
A processing tank comprising an inner tank for storing the processing liquid, containing the substrate and performing a predetermined process on the substrate, and an outer tank for recovering the processing liquid overflowing from the inner tank;
A circulation pipe connecting the inner tank and the outer tank in communication with each other;
A pump disposed in the circulation pipe for sending the processing liquid from the outer tank side to the inner tank side;
Among the circulation pipes, an upstream side of the pump, and an inner tank drain pipe that connects the inner tank to each other,
Of the circulation pipe, provided on the downstream side of the pump, a drain pipe for discharging the processing liquid,
After discharging the processing liquid stored in the processing tank through the circulation pipe, the inner tank drain pipe, and the drainage pipe, a new processing liquid is supplied, and the processing liquid is supplied to the outer tank by the pump. When adjusting the temperature of the processing liquid while circulating through the normal circulation path leading to the circulation pipe and the inner tank, the processing liquid is circulated through the temporary path passing through the inner tank drain pipe at least once before the temperature adjustment is completed. In this case, after the temperature of the processing liquid is raised to a predetermined temperature, control means for circulating the processing liquid to the temporary path;
A substrate processing apparatus comprising: The substrate processing apparatus according to claim 1 or 2 ,
The substrate processing apparatus, wherein the control means makes the processing liquid flow time to the temporary path shorter than the processing liquid flow time to the normal circulation path. The substrate processing apparatus according to claim 2 ,
The substrate processing apparatus, wherein the control means causes the processing liquid to flow through the temporary path until the temperature of the processing liquid reaches the boiling point of the processing liquid. The apparatus according to any one of claims 1 to 4,
A flow rate adjusting means for adjusting a cross-sectional area of the inner tank drain pipe;
The control means operates the flow rate adjusting means to control the flow rate of the inner tank drain pipe when the remaining amount of the processing liquid in the inner tank decreases when discharging the processing liquid of the inner tank drain pipe. A substrate processing apparatus characterized by being made small. In the substrate processing apparatus in any one of Claim 1 to 5 ,
Further provided with vibration imparting means disposed on the outer peripheral surface of the inner tank drain pipe and imparting vibration to the inner tank drain pipe;
The substrate processing apparatus, wherein the control means operates the vibration applying means after discharging the processing liquid in the inner tank drain pipe. In the substrate processing apparatus according to any one of claims 1 to 6 ,
Pure water supply means for supplying pure water from the upstream side of the inner tank drain pipe;
Gas supply means for supplying gas from the upstream side of the inner tank drain pipe,
The control means, after discharging the processing liquid in the inner tank drain pipe, causes pure water to flow from the pure water supply means to the inner tank drain pipe and supplies gas from the gas supply means. Substrate processing equipment. Among the processing tanks that include an inner tank that stores the processing liquid, immerses the substrate and processes the substrate, and an outer tank that recovers the processing liquid overflowing from the inner tank, the inner tank and the outer tank In a liquid exchange method for a substrate processing apparatus that includes a circulation pipe connected in communication and processes a substrate with a processing liquid,
An outer tank draining process for discharging the processing liquid of the outer tank from the circulation pipe;
An inner tank drain process for discharging the processing liquid of the inner tank from an inner tank drain pipe communicating with the upstream side of the circulation pipe and the inner tank;
A new liquid supply process for supplying a new processing liquid to the processing tank;
A normal circulation path temperature adjustment process for adjusting the temperature while circulating the new treatment liquid in a normal circulation path leading to the outer tank, the circulation pipe, and the inner tank;
Wherein before temperature control of the processing solution by temperature control process is completed, and at least once the tank drain pipe to a temporary path through was passed through a processing solution while you temperature control one o'clock path distribution temperature control process,
Equipped with a,
The liquid exchange method for a substrate processing apparatus, wherein the temporary path circulation temperature adjustment process is performed alternately with the normal circulation path temperature adjustment process. Among the processing tanks that include an inner tank that stores the processing liquid, immerses the substrate and processes the substrate, and an outer tank that recovers the processing liquid overflowing from the inner tank, the inner tank and the outer tank In a liquid exchange method for a substrate processing apparatus that includes a circulation pipe connected in communication and processes a substrate with a processing liquid,
An outer tank draining process for discharging the processing liquid of the outer tank from the circulation pipe;
An inner tank drain process for discharging the processing liquid of the inner tank from an inner tank drain pipe communicating with the upstream side of the circulation pipe and the inner tank;
A new liquid supply process for supplying a new processing liquid to the processing tank;
A normal circulation path temperature adjustment process for adjusting the temperature while circulating the new treatment liquid in a normal circulation path leading to the outer tank, the circulation pipe, and the inner tank;
Temporary path circulation temperature adjustment process of adjusting the temperature while circulating the treatment liquid to the temporary path passing through the inner tank drain pipe at least once before the temperature adjustment of the treatment liquid is completed by the temperature adjustment process,
With
The temporary path circulation temperature adjustment process is performed after the temperature of a new process liquid is raised to a predetermined temperature in the normal circulation path temperature adjustment process. In the liquid exchange method of the substrate processing apparatus according to claim 8 or 9 ,
The liquid exchange method for a substrate processing apparatus, wherein the temporary path circulation temperature adjustment process is performed for a shorter time than the normal circulation path temperature adjustment process. The liquid exchange method for a substrate processing apparatus according to claim 9 ,
The liquid exchange method for a substrate processing apparatus, wherein the temporary path circulation temperature adjustment process is performed until the temperature of the treatment liquid reaches the boiling point of the treatment liquid in the normal circulation path temperature adjustment process.

Images