JP5825601B2 - Input device - Google Patents

Description

  The present invention relates to an input device provided on the front surface of an image display device, such as a touch panel and an electromagnetic wave shield of a plasma display.

In a touch panel, an input device having a conductive substrate in which a transparent conductive layer (transparent conductive film) is formed on the surface of a transparent insulating substrate is installed as an electrode sheet on the front surface of an image display device such as a liquid crystal display.
As a material constituting the transparent conductive layer of the conductive substrate of the input device, π-conjugated conductive polymer (organic conductor) represented by tin-doped indium oxide (ITO) or polyethylenedioxythiophene-polystyrenesulfonic acid is used. Widely known.

By the way, in the conductive substrate used for the input device for touch panels, a circuit pattern or an antenna array pattern may be formed.
As a pattern forming method, for example, in Patent Document 1, a transparent conductive layer is formed on the entire surface of a transparent substrate by coating, and then a pulse width of about 100 nsec using a CO ₂ laser or a Q switch is used. A method is disclosed in which a transparent conductive layer to be insulated is irradiated by YAG laser to be removed by ablation.
Patent Documents 2 and 3 disclose a method of forming a conductive portion in a predetermined pattern on the surface of a transparent substrate by printing such as a screen printing method or a gravure printing method.
Patent Document 4 discloses a method of forming a transparent conductive layer on the entire surface of a transparent substrate by coating, and then removing the portion of the transparent conductive layer to be insulated by plasma etching.
Patent Document 5 discloses a technique for forming a conductive pattern by irradiating a transparent conductive film obtained by dispersing and curing metal nanowires (metal ultrafine fibers) in a binder (resin) and curing the transparent conductive film. . Note that the metal nanowires protruding from the transparent conductive film to the outside are removed by a laser.
In Patent Document 6, an ultraviolet laser is used for an ITO vapor deposition substrate for a touch panel, the beam diameter and the focal length of the lens are controlled, and the processing width in the light condensing area is controlled, thereby performing fine ablation of about 10 μm. A technique for forming a fine pattern is disclosed.

JP 2004-118381 A JP 2005-527048 A JP 2008-300063 A JP 2009-26639 A JP 2010-44968 A JP 2008-91116 A

By the way, when a transparent conductive layer is irradiated with laser light to form an insulating portion and a conductive pattern, the energy density of the laser light with respect to the insulating substrate that supports the transparent conductive layer is also relatively high. Could be damaged. When the insulating substrate is damaged, the conductive pattern is visually recognized, which is not preferable in appearance.
Thus, for example, it is conceivable to irradiate the transparent conductive layer while reducing the energy density of the laser beam. However, in this case, there is a possibility that sufficient insulation of the insulating portion cannot be ensured.

  In Patent Document 6, it is necessary to use an ultraviolet laser using high-order harmonics for processing, and in order to adjust the width of the ablation region, the laser beam diameter and zoom lens focal length are adjusted. However, there is a problem that it is difficult to cope with commercially available general laser processing machines.

  The present invention has been made in view of such circumstances, and provides an input device that can be easily manufactured using a general laser processing machine, the conductive pattern is hardly visible, and has stable electrical characteristics. The purpose is to do.

In order to achieve the above object, the present invention proposes the following means.
That is, an input device according to the present invention includes an insulating substrate and a conductive layer provided on at least one surface of the insulating substrate and including a transparent conductive layer including a conductive inorganic network member in an insulating transparent base. an input member comprising a patterned substrate, electrically connected to the transparent conductive layer, and a detection means for detecting an input signal, wherein the transparent conductive layer, by Les laser light is irradiated, wherein at least a portion of the network member is formed an insulating portion formed by removing the insulating portion, by the network element by the irradiation of the laser beam is evaporated to remove from the transparent substrate was removed A gap formed in the transparent substrate corresponding to a corresponding position of the network member is provided, the network member is provided with a mesh member having conductivity, and the mesh member is Have a metal ultrafine fibers, the gap is characterized in that it is formed by being replaced with the metal ultrafine fibers removed.

  In the input device according to the present invention, the metal microfiber may be at least one of a metal nanowire or a metal nanotube.

  In the input device according to the present invention, the mesh member includes a fibrous member other than the metal microfiber, and the fibrous member includes a silicon nanowire, a silicon nanotube, a metal oxide nanotube, a carbon nanotube, and a carbon nanofiber. It may be at least one of a fiber and a graphite fibril.

  In the input device according to the present invention, the mesh member may include a metal covering member of the fibrous member.

  Moreover, in the input device according to the present invention, the input member faces the transparent conductive layer of the pair of conductive pattern forming substrates provided so as to be laminated in the thickness direction toward one side along the thickness direction. Each of the detection means may be a capacitance type.

  Further, in the input device according to the present invention, the input member is disposed so as to face each other with the transparent conductive layers of the pair of conductive pattern forming substrates provided so as to be laminated in the thickness direction being close to each other. Further, a part of the transparent conductive layers may be brought into direct contact with each other by an input operation.

  The input device according to the present invention can be easily manufactured using a general laser processing machine, the conductive pattern is hardly visible, and has stable electrical characteristics.

It is a sectional side view which simplifies and shows the input member of the input device which concerns on 1st Embodiment of this invention. It is an enlarged photograph explaining the net-like member (conductive part) as a network member of the transparent conductive layer of the input member used for the input device concerning a 1st embodiment of the present invention, and a transparent conductive layer before laser processing. It is an enlarged photograph explaining the space | gap (insulating part) formed by removing the net-like member as a network member in the transparent conductive layer of the input member used for the input device which concerns on 1st Embodiment of this invention. It is a side view which simplifies and shows the manufacturing apparatus (laser processing machine) which manufactures the conductive pattern formation board | substrate of the input member of the input device which concerns on 1st Embodiment of this invention. It is a side view which shows the modification of the conductive pattern formation board | substrate of FIG. 4, and a manufacturing apparatus. It is a reference example of a conductive substrate (conductive pattern forming substrate) (a network member of a transparent conductive layer is formed by silver vapor deposition), and is an enlarged photograph explaining the conductive portion of the transparent conductive layer and the transparent conductive layer before laser processing is there. It is an enlarged photograph explaining the irradiation area | region (insulation part) which irradiated the laser beam to the transparent conductive layer of the conductive substrate of FIG. 6, and the non-irradiation area | region (conductive part) which has not irradiated the laser beam. It is a side view explaining the Example (manufacturing example) which manufactures the input member (a transparent conductive layer and a conductive pattern formation board | substrate) of the input device which concerns on this invention. It is a side view explaining the Example (manufacturing example) which manufactures the input member (a transparent conductive layer and a conductive pattern formation board | substrate) of the input device which concerns on this invention. It is a perspective view explaining the Example (manufacturing example) which manufactures the input member (a transparent conductive layer and a conductive pattern formation board | substrate) of the input device which concerns on this invention. It is a circuit diagram explaining the Example (manufacturing example) which manufactures the input device which concerns on this invention. It is a top view which shows the input member of the input device which concerns on 2nd Embodiment of this invention. It is a top view which shows the X side electrode sheet (conductive pattern formation board | substrate) of the input member of FIG. It is a top view which shows the Y side electrode sheet (conductive pattern formation board | substrate) of the input member of FIG. It is a sectional side view which expands and shows the AA arrow of FIG. It is a sectional side view which expands and shows the BB arrow of FIG.

(First embodiment)
The input device according to the present invention can be applied to a product in which a wiring pattern is formed in a transparent portion, such as a transparent input device such as a transparent antenna, a transparent electromagnetic wave shield, a capacitance type or a membrane type transparent touch panel. it can. Further, the input device of the present invention is an electrode necessary for a capacitance sensor or the like provided on the surface of a three-dimensional molded product or a three-dimensional decorative molded product, such as a capacitive input device attached to a steering wheel of an automobile. Can be used for the purpose of forming. In the present embodiment, “transparent” refers to a material having a light transmittance of 50% or more.

1 and 10 show an input member 1 for a membrane touch panel (input device) according to a first embodiment of the present invention. 1 to 3, this membrane type touch panel is provided on at least one surface of the insulating substrates 11 and 21 and the insulating substrates 11 and 21, and is made of an inorganic material having conductivity in the transparent base 2 having insulation properties. The conductive pattern forming substrates 10 and 20 including the transparent conductive layers 12 and 22 including the network member 3 are electrically connected to the input member 1 and the transparent conductive layers 12 and 22 provided in pairs so as to be laminated in the thickness direction. And a detecting means for detecting an input signal.
The input member 1 is installed on the input side of an image display device (not shown) such as an LCD. In FIG. 10, the input member 1 includes, for example, a conductive pattern forming substrate 10 in which electrodes 100 (corresponding to conductive portions C described later of the transparent conductive layer 12) along the row (X) direction are arranged in parallel, and this conductive pattern formation. Conductive pattern in which electrodes (corresponding to the conductive portion C of the transparent conductive layer 22) are arranged in parallel so as to face the substrate 10 and are arranged on the image display device side and along the column (Y) direction orthogonal to the row (X) direction. A forming substrate 20 and a transparent dot spacer 30 provided therebetween are provided. The input member 1 is configured such that the electrode 100 of the conductive pattern forming substrate 10 and the electrode of the conductive pattern forming substrate 20 are contacted and conducted in a DC manner by an input operation.

The conductive pattern forming substrate 10 includes a transparent insulating substrate 11 and a transparent conductive layer 12 provided on the surface of the insulating substrate 11 facing at least the image display device side.
The conductive pattern forming substrate 20 includes a transparent insulating substrate 21 and a transparent conductive layer 22 provided on a surface of the insulating substrate 21 facing at least the input side.

  As the insulating substrates 11 and 21, those having insulating properties and capable of forming the transparent conductive layers 12 and 22 on the surface and being less likely to change in appearance under predetermined irradiation conditions with respect to laser processing described later are used. Is preferred. Specific examples include insulating materials such as glass, polycarbonate, polyester typified by polyethylene terephthalate (PET), and acrylonitrile / butadiene / styrene copolymer resin (ABS resin). As the shape of the insulating substrates 11 and 21, a plate shape, a flexible film shape, a three-dimensional (three-dimensional) molded product, or the like can be used.

  When this input member 1 is used for a transparent touch panel, a glass plate, a PET film, or the like is used for the insulating substrates 11 and 21. Further, when the input member 1 is used as an electrode necessary for a capacitance sensor or the like such as a capacitance input device attached to a steering wheel of an automobile, the insulating substrates 11 and 21 are molded products made of ABS resin or the like. Alternatively, a decorative molded product provided with a decorative layer by laminating or transferring the film is used.

  For example, when the present invention is used as a transparent touch panel such as a membrane type in which the upper and lower electrode films (transparent conductive layers) 12 and 22 are brought into contact with each other by pressing or the like, the input person-side insulating substrate 11 may be an input person. It is preferable to use a material that is flexible with respect to external force from the side (for example, a transparent resin film), and as the insulating substrate 21 on the image display device side, the conductive pattern forming substrate 10 is easily supported via the dot spacer 30. It is preferable to use a material having a predetermined hardness or higher (for example, equal to or higher than that of the insulating substrate 11). Further, in such a touch panel, it is essential to use a certain potential difference between adjacent electrodes 100. In the transparent conductive layers 12 and 22 using a metal such as copper, zinc, tin, and particularly silver, In order to prevent migration, it is required to secure the width of the insulating portion that divides the conductive pattern (width dimension perpendicular to the extending direction of the insulating portion).

  In addition, the transparent conductive layers 12 and 22 of the pair of conductive pattern forming substrates 10 and 20 are opposed to each other with a space by a dot spacer 30 while being close to each other. When the conductive pattern forming substrate 10 is pressed from the input side toward the image display device side, the insulating substrate 11 and the transparent conductive layer 12 of the conductive pattern forming substrate 10 are bent and the transparent conductive layer 12 is It is possible to contact the transparent conductive layer 22 of the conductive pattern forming substrate 20. An electrical signal is generated by this contact. That is, the input member 1 is configured such that a part of the transparent conductive layers 12 and 22 can be in direct contact with each other by an input operation of the input person.

  As shown in FIG. 2, the transparent conductive layers 12 and 22 include an inorganic network member having conductivity in the transparent base 2 having insulation properties. That is, the transparent conductive layers 12 and 22 are formed by holding the network member in the transparent substrate 2. Specifically, the transparent conductive layers 12 and 22 include a net-like member 3 made of a conductive metal as the network member. The transparent substrate 2 can be filled (impregnated) between the strands (fibers) of the mesh member 3 described later in a liquid state, for example, a curable resin having a property of being cured by heat, ultraviolet rays, electron beams, radiation, or the like. Consists of.

  The mesh member 3 is composed of a plurality of metal ultrafine fibers 4 dispersed in the transparent substrate 2 and electrically connected to each other. In the net member 3, for example, the metal microfibers 4 are dispersedly arranged on the insulating substrate 11 (21) through a process of applying ink (liquid) containing the metal microfibers 4 on the insulating substrate 11 (21). Is formed. The transparent substrate 2 is formed by filling a liquid transparent substrate 2 (liquid member) between the metal microfibers 4 distributed on the insulating substrate 11 (21) and then curing it. The mesh member 3 is fixedly disposed in the transparent conductive layer 12 (22).

  Specifically, the metal microfibers 4 extend irregularly in different directions along the surface direction of the surfaces of the insulating substrates 11 and 21 (surfaces on which the transparent conductive layers 12 and 22 are formed). The at least a part of them are arranged densely so as to overlap (contact with) each other, and are electrically connected (connected) to each other by such an arrangement.

  Thereby, the mesh member 3 forms a conductive two-dimensional network on the surfaces of the insulating substrates 11 and 21, and the area where the mesh member 3 is disposed in the transparent base 2 of the transparent conductive layers 12 and 22. Is a conductive part C. The metal microfibers 4 of the mesh member 3 are basically disposed under the surfaces of the transparent conductive layers 12 and 22 (surfaces facing away from the insulating substrates 11 and 21). A portion embedded in the transparent substrate 2 and a portion protruding from the surface of the transparent substrate 2 may be included.

  Specifically, examples of such metal microfibers 4 include metal nanowires and metal nanotubes made of copper, platinum, gold, silver, nickel, and the like. In the present embodiment, metal nanowires (silver nanowires) mainly composed of silver are used as the metal microfibers 4. The metal ultrafine fibers 4 are formed, for example, with a diameter of about 0.3 to 100 nm and a length of about 1 μm to 100 μm.

  In addition, as the mesh member 3, a fibrous member such as a silicon nanowire, a silicon nanotube, a metal oxide nanotube, a carbon nanotube, a carbon nanofiber, and a graphite fibril other than the metal microfiber 4 described above and a metal-coated member thereof are used. These may be configured to be dispersed and connected.

  Further, in the transparent base 2 of the transparent conductive layers 12 and 22, at least a part of the mesh member 3 is removed to form the insulating portion I. That is, as shown in FIG. 3, a plurality of voids 5 are formed in the transparent substrate 2 by removing the metal ultrafine fibers 4 of the mesh member 3, and the regions are arranged so that these voids 5 are densely packed. Is the insulating part I. Specifically, these voids 5 are formed by irradiating a region of the mesh member 3 where the metal microfibers 4 are disposed with a pulsed laser having a short pulse as laser light, and evaporating and removing the metal microfibers 4. ing. The short pulse means that the pulse width is set to 200 nsec or less, preferably the pulse width is set to 20 nsec or less, more preferably the pulse width is set to 1 psec or less.

As this pulsed laser, for example, a so-called femtosecond laser which is an ultrashort pulse laser with a pulse width of less than 1 psec can be used to obtain the conductive pattern forming substrates 10 and 20 where the conductive pattern is not visually observed. Further, a YAG laser or YVO ₄ laser other than the femtosecond laser may be used as the pulsed laser. When using a YAG laser or a YVO ₄ laser, a widely used processing machine having a pulse width of about 5 to 300 nsec can be used. In this case, the conductive pattern is visually observed to the extent that there is no practical problem. The difficult conductive pattern forming substrates 10 and 20 can be mass-produced at low cost.

  These voids 5 are elongated holes (oblong holes) or holes (round holes) that irregularly extend or are scattered in different directions along the surface direction of the surface (exposed surface) of the transparent substrate 2. Each of which has a portion opening on the surface. Specifically, the gap 5 is disposed so as to correspond to the position where the evaporated and removed metal microfibers 4 are disposed, and has a diameter (inner diameter) substantially equal to the diameter of the metal microfibers 4. In addition, the length is less than the length of the metal microfiber 4.

  More specifically, one metal microfiber 4 is completely evaporated / removed, or at least a part thereof is evaporated / removed so that the metal microfiber 4 is divided in the extending direction, A plurality of gaps 5 are formed at intervals. That is, a plurality of gaps 5 that are separated from each other are formed so as to extend or be scattered so as to form a linear shape as a whole, corresponding to the corresponding positions of the metal microfibers 4. Incidentally, only one gap 5 may be formed so as to form a linear shape corresponding to the corresponding position of one metal fine fiber 4.

In the insulating part I, by forming these voids 5, the metal microfibers 4 that are conductors are removed, and the conductive two-dimensional network is removed (disappeared).
Thus, in the insulating part I, since the metal microfibers 4 are removed from the transparent base 2, the conductive part C and the insulating part I in the transparent base 2 (transparent conductive layers 12, 22) are mutually connected. The chemical composition is different.

Next, a manufacturing apparatus and a manufacturing method for manufacturing the transparent conductive layer and the conductive pattern forming substrate of the input member 1 of the input device according to this embodiment will be described.
In the manufacturing method of the conductive pattern formation board | substrate demonstrated in this embodiment, in the transparent conductive layer (transparent conductive layer before conductive pattern formation) a containing the said network member formed in one surface of the insulated substrate 11 (21), A method of irradiating a laser beam L, which is a short pulse laser beam, in a predetermined pattern is used.
In the following description, a laminate having an insulating substrate 11 (21) before laser processing and a transparent conductive layer a formed on one surface of the insulating substrate 11 (21) is referred to as a conductive substrate A. That's it.

First, the manufacturing apparatus 40 used with the manufacturing method of the conductive pattern formation board | substrate of this embodiment is demonstrated. As shown in FIG. 4, the manufacturing apparatus 40 includes a laser light generating unit 41 that generates laser light L, a condensing lens 42 such as a convex lens that is a condensing unit that condenses the laser light L, and a conductive substrate. And a stage 43 on which A is placed.
Then, the laser light L is irradiated from the laser light generating means 41 to the transparent conductive layer a through the condenser lens 42 to form the insulating portion I and the conductive pattern on the transparent conductive layer a.

  As the laser light generating means 41 in the manufacturing apparatus 40, one that generates laser light (visible light or infrared laser light) having a wavelength of less than 2 μm and a pulse width of less than 200 nsec is used. When a so-called femtosecond laser having a pulse width of the laser beam L of less than 1 psec is used, it is preferable that the insulating portion I formed by processing is not visually recognized, but other than that, for example, the pulse width is 1 to 200 nsec. However, depending on the setting of conditions, it is possible to obtain a visibility close to that of a femtosecond laser, that is, an insulating portion I that is not visually recognized.

  The focal point F of the condenser lens 42 is set at a position away from the transparent conductive layer a. Specifically, the condenser lens 42 is disposed so that the focal point F of the laser light L is located between the transparent conductive layer a and the condenser lens 42. That is, in the manufacturing method of the conductive pattern formation substrate of this embodiment, the focal point F of the condensing lens 42 (laser light L) is disposed between the transparent conductive layer a and the condensing lens 42.

  The condensing lens 42 preferably has a low numerical aperture (NA <0.1). That is, by setting the numerical aperture of the condensing lens 42 to NA <0.1, it becomes easy to set the irradiation condition of the laser light L. In particular, the focal point F of the laser light L is the transparent conductive layer a and the condensing lens 42. Therefore, it is possible to prevent energy loss and diffusion of the laser light L due to air plasma at the focal point F.

  Further, the transparent conductive layer a is formed by filling (impregnating) the transparent base 2 made of resin between the fibers (element wires) of the net-like member 3 made of, for example, the metal ultrafine fibers 4, and made of a transparent resin film. When provided on the insulating substrate 11 (21), the metal microfibers 4 embedded in the transparent substrate 2 of the transparent conductive layer a are reliably removed by being ejected from the surface of the transparent substrate 2 according to the above-described setting. be able to. Accordingly, the gap 5 is surely formed corresponding to the desired shape of the insulating portion I. For example, a pattern that cannot be insulated unless it is set to a large R, such as a corner portion of a linear pattern. However, the insulation process can be reliably and easily realized with a small R setting (or without providing R).

The stage 43 can be moved two-dimensionally in the horizontal direction. The stage 43 is preferably composed of a member having at least a transparent upper surface or a member having light absorption.
When the insulating substrate 11 (21) is transparent and the output of the laser beam L exceeds 1 W, the stage 43 is preferably made of a nylon-based or fluorine-based resin material or a silicone rubber-based polymer material.

Next, the manufacturing method of the conductive pattern formation board | substrate of the input member 1 of the input device using the manufacturing apparatus 40 mentioned above is demonstrated.
First, the conductive substrate A is placed on the upper surface of the stage 43 so that the transparent conductive layer a is disposed above the insulating substrate 11 (21). Here, as the conductive substrate A, it is preferable to use a substrate in which the insulating substrate 11 (21) and the transparent substrate 2 of the transparent conductive layer a are made of the same material or the same resin material. Specifically, for example, when the insulating substrate 11 (21) is a polyethylene terephthalate film, it is preferable to use a polyester-based resin for the transparent substrate 2.
Note that the conductive substrate A (conductive pattern forming substrates 10 and 20) in the present embodiment is transparent.

  Next, the laser beam L is emitted from the laser beam generator 41, and the laser beam L is collected by the condenser lens 42. A portion of the condensed laser light L where the spot diameter has passed past the focal point F is irradiated onto the transparent conductive layer a. At that time, the stage 43 is moved so that the irradiation of the laser beam L has a predetermined pattern.

The energy density of the laser beam L and the irradiation energy per unit area irradiated to the transparent conductive layer a differ depending on the pulse width of the laser.
In a laser having a pulse width of less than 1 psec (for example, a femtosecond laser), the energy density is 1 × 10 ^{16 to} 7 × 10 ¹⁷ W / m ² , and the irradiation energy per unit area is 1 × 10 ⁵ to 1 × 10 ⁶ J / m ² is preferred.
In a laser having a pulse width of 1 to 100 nsec (YAG laser or YVO ₄ laser), the energy density is 1 × 10 ^{17 to} 7 × 10 ¹⁸ W / m ² , and the irradiation energy per unit area is 1 × 10 ⁶ to 1 × 10. ⁷ J / m ² is preferred.
That is, when the energy density / irradiation energy is set to a value smaller than the above numerical range, the insulation of the insulating portion I may be insufficient. Further, when the value is set to be larger than the above numerical range, the processing trace becomes conspicuous, which is inappropriate for applications such as a transparent touch panel and a transparent electromagnetic wave shield.

These values are defined by dividing the output value of the laser beam in the processing area by the condensing spot area of the processing area. For convenience, the output is converted into the output value from the laser oscillator by the optical system. It is obtained by multiplying by the loss factor.
The spot diameter area S is defined by the following formula.
S = S ₀ × D / FL
S ₀ : Laser beam area focused by the lens FL: Lens focal length D: Distance between the surface (upper surface) of the transparent conductive layer a and the focal point

  The above-described focal point F has been described by taking as an example a case where the light converging means 42 such as a lens has sufficiently small aberration. However, for example, a spherical lens having a short focal length or an element that increases aberration such as protective glass. When present, the focal point F is defined as the position where the energy density of the focal point is the highest.

  Here, the distance D is set within a range of 0.2% to 3% of the focal length FL. Preferably, the distance D is set within a range of 0.5% to 2% of the focal length FL. More preferably, the distance D is set within a range of 0.7% to 1.5% of the focal length FL. By setting the distance D within the above numerical range, it is possible to reliably remove the metal microfibers 4 (formation of the gap 5) in the insulating portion I and to form an insulating pattern (conductive pattern) having high electrical reliability. In addition, it is possible to reliably prevent processing traces resulting from damage to the insulating substrate 11 (21).

  In addition, in terms of forming a highly accurate conductive pattern, adjacent spot positions overlap each other by irradiating pulsed laser light L intermittently multiple times while moving the spot position on the transparent conductive layer a. It is preferable to form a portion to be used. Specifically, it is preferable to irradiate intermittently 3 to 500 times, and more preferably 20 to 200 times. If the irradiation is performed three times or more, the insulation can be more reliably performed. If the irradiation is performed 500 times or less, the transparent substrate 2 irradiated with the laser beam L can be prevented from being removed by dissolution or evaporation.

  In this way, by irradiating the transparent conductive layer a with the laser light L, the insulating portion I is formed by removing at least a part of the net-like member 3 in the transparent substrate 2, and the insulating portion I and the transparent substrate are formed. And a conductive portion C in which a net-like member 3 is arranged in the conductive pattern C. That is, the transparent conductive layer a is patterned to form a transparent conductive layer 12 (22) having a conductive pattern composed of a conductive portion C and an insulating portion I, and the conductive substrate A is a conductive pattern forming substrate. 10 (20).

  In the above description, the conductive substrate A is placed on the movable stage 43 such as an XY stage to perform patterning. However, the present invention is not limited to this. That is, for example, a method in which the conductive substrate A is fixed and the condensing system member is relatively moved, a method in which the laser light L is scanned and scanned using a galvanometer mirror, or the like is combined. Patterning can be performed.

The electroconductive board | substrate A used for the said manufacturing method is shown below.
In the transparent conductive layer a of the conductive substrate A, examples of the inorganic conductor constituting the mesh member 3 include metal nanowires such as silver, gold, and nickel. Moreover, as an insulator which comprises the transparent base | substrate 2 among the transparent conductive layers a, as a transparent thermoplastic resin (polyvinyl chloride, vinyl chloride-vinyl acetate copolymer, polymethyl methacrylate, nitrocellulose, chlorinated polyethylene, Chlorinated polypropylene, vinylidene fluoride), and transparent curable resins (silicone resins such as melamine acrylate, urethane acrylate, epoxy resin, polyimide resin, and acrylic-modified silicate) that are cured by heat, ultraviolet rays, electron beams, or radiation.

FIG. 5 shows a modification of the present embodiment. In the illustrated example, a pair of transparent conductive layers a are provided on the upper and lower surfaces of the insulating substrate 11 (21) in the conductive substrate A. In this case, when the condensing lens 42 having a focal length FL of 50 mm or more and a numerical aperture of less than 0.2 is used, the spread of the laser light L can be reduced. Therefore, it is easy to adjust the position of the lens, the difference in spot diameter between the both surfaces of the insulating substrate 11 (21) is reduced, and the energy density corresponding to both transparent conductive layers a is substantially equal. It is possible to form the same insulating pattern on a.
Further, when only the transparent conductive layer a on one side of the transparent conductive layer a formed on both surfaces of the insulating substrate 11 (21) is insulated, the numerical aperture of the condenser lens 42 is larger than 0.5. It is good also as using a thing.

  As described above, according to the input device according to the present embodiment, when the conductive pattern is formed on the transparent conductive layer a, the focal point F of the condenser lens 42 (laser light L) is separated from the transparent conductive layer a. More specifically, the focal point F is provided between the transparent conductive layer a and the condenser lens 42, and the conductive substrate A is irradiated with the laser light L. Therefore, the laser light L that strikes the insulating substrate 11 (21) is provided. Is larger than the spot diameter of the laser beam L that hits the transparent conductive layer a. As a result, the energy density of the laser beam L is ensured in the transparent conductive layer a to reliably form the insulating portion I, while the energy density of the laser beam L is reduced in the insulating substrate 11 (21). Damage to the substrate 11 (21) can be prevented.

  Further, since the irradiation spot irradiated with the laser beam L on the transparent conductive layer a is formed in a planar shape instead of a spot shape, the insulating substrate 11 (21) is not affected while the transparent conductive layer a is processed. Such control of the irradiation energy density is easier than in the conventional method. Furthermore, it is possible to draw an insulating pattern with a large line width on the transparent conductive layer a at once, so that the so-called painting process is facilitated and the width of the insulating pattern can be increased. The insulation of the part I is improved.

  In addition, the conductive pattern forming substrate 10 (20) of this input device has a conductive pattern formed by the conductive portion C formed of the mesh member 3 which is a network member of an inorganic substance (inorganic conductor) having conductivity and the insulating portion I. Therefore, compared with a conductive pattern forming substrate having a conductive portion C (conductive pattern) made of, for example, an organic conductor, it is less likely to be altered by light (ultraviolet rays) and the like, and has stable electrical characteristics over a long period of time. Can be obtained.

According to the present embodiment, as the laser light L, for example, a pulsed laser of a general laser processing machine such as a YAG laser or a YVO ₄ laser is used. Therefore, it is possible to easily manufacture an input device including the conductive pattern forming substrate 10 (20) having a stable electrical characteristic on which a conductive pattern is formed.

  More specifically, in the conductive pattern forming substrate 10 (20) of the input device manufactured as described above, in the transparent base 2 of the transparent conductive layer 12 (22), the arrangement region of the conductive mesh member 3 is a conductive portion. A region where the gap 5 is formed by removing the mesh member 3 is defined as an insulating portion I. That is, in the conductive part C, conduction is ensured by the mesh member 3 made of metal, and in the insulating part I, an electrical insulation state is reliably obtained by the gap 5 formed by removing the mesh member 3. It is supposed to be.

  In the conventional transparent conductive layer, the mesh member 3 made of metal nanowires dispersed in the transparent substrate 2 and electrically connected to each other remains not only in the conductive part C but also in the insulating part I. It has been difficult to reliably insulate the insulating portion I. On the other hand, according to the configuration of the present embodiment, the mesh member 3 (metal microfiber 4) of the insulating portion I is removed so as to replace the gap 5, and the insulating portion I is reliably insulated. The electrical characteristics (performance) in the layer 12 (22) are stabilized, and the reliability as a product (input device) is enhanced.

  Further, in the insulating portion I, the mesh member 3 is removed to form a void 5 having a shape corresponding to (corresponding to) the mesh member 3 (metal microfiber 4). That is, since the gap 5 is formed, the conductive portion C and the insulating portion I are similar in color tone and transparency to each other and are not discriminated (viewed) from each other by the naked eye. . Therefore, even if the width of the insulating portion I is increased, the wiring pattern is not visually recognized.

  Further, since the mesh member 3 is composed of metal ultrafine fibers 4 dispersed in the transparent substrate 2 and electrically connected to each other, the mesh member 3 is made of metal ultrafine fibers 4 such as commercially available metal nanowires and metal nanotubes. And can be formed relatively easily.

  Further, as in this embodiment, when the metal fine fiber 4 having silver as a main component is used, the metal fine fiber 4 can be obtained relatively easily and used as the mesh member 3. Moreover, when removing the mesh member 3 (metal fine fiber 4) of the insulating part I by laser processing, a commercially available general laser processing machine can be used. Further, the metal microfiber 4 mainly composed of silver is more preferable because it can form a colorless and transparent conductive pattern having a high light transmittance and a low surface resistivity.

  Further, when an extremely short pulse laser (femtosecond laser) having a pulse width of less than 1 psec is used as the laser processing machine (manufacturing apparatus) 40, the conductive pattern (on the conductive pattern forming substrate 10 (20) after laser processing ( It is more desirable because the insulating pattern) can be surely made inconspicuous.

  As described above, according to the input device described in the present embodiment, the conductive pattern of the conductive pattern forming substrate 10 (20) is hardly visible, and the conductive portion C in the conductive pattern has a low resistance, but the insulating portion I. Then, it can be surely insulated and stable electric performance can be obtained.

  In the input device according to the present embodiment, the transparent substrate 2 of the transparent conductive layer a and the insulating substrate 11 (21) of the conductive substrate A are made of the same material or the same resin material. The effect of. That is, since the absorbance of the laser beam L in the transparent substrate 2 of the transparent conductive layer a and the absorbance of the laser beam L in the insulating substrate 11 (21) are substantially the same, the energy of the laser beam L in the transparent conductive layer a. While ensuring a sufficient density, the energy density of the laser light L in the insulating substrate 11 (21) can be reduced, and the above-described effects can be obtained with certainty. In addition, the transparent conductive layer a (transparent conductive layer 12 (22)) is easily firmly bonded onto the insulating substrate 11 (21).

  Further, after the net-like member 3 applies the ink (liquid) containing the metal microfibers 4 on the insulating substrate 11 (21), the metal microfibers 4 are dispersedly arranged on the insulating substrate 11 (21). It is formed by. Further, by filling the liquid transparent substrate 2 (liquid member) between the metal ultrafine fibers 4 dispersedly arranged on the insulating substrate 11 (21) in this way and then curing, the mesh member 3 becomes a transparent substrate. 2 holds the following effects. That is, the mesh member 3 can be easily provided in the transparent conductive layer a on the insulating substrate 11 (21), and the metal microfibers 4 constituting the mesh member 3 are electrically and reliably connected to each other. The electrical characteristics of the conductive part C are stabilized. In addition, since the mesh member 3 is stably held by the transparent substrate 2, the above-described electrical characteristics extend the life.

  In addition, the laser beam L is intermittently irradiated a plurality of times while moving the position of the spot on the transparent conductive layer a, and the insulating portion I is formed by overlapping the positions of the adjacent spots. An input device including a conductive pattern having excellent electrical characteristics and a good appearance and the conductive pattern forming substrate 10 (20) can be obtained.

In addition, this invention is not limited to the above-mentioned embodiment, A various change can be added in the range which does not deviate from the meaning of this invention.
For example, in the above-described embodiment, both the insulating substrates 11 and 21 are transparent, but either or both of these insulating substrates 11 and 21 may be colored with a certain degree of transparency. Absent.

Further, the mesh member 3 is composed of a plurality of metal ultrafine fibers 4 dispersed in the transparent substrate 2 and electrically connected to each other. However, the reference example of the present invention is not limited thereto. . That is, the net member 3 may be a wire grid formed by forming a conductive metal film in a grid pattern by etching or the like.
In the reference example of the present invention, a network member made of, for example, a film-like member may be used as the inorganic network member having conductivity instead of the above-described mesh member 3. Specifically, a network member as shown in a reference example (manufacturing example 2) described later can be employed.

Further, functional layers such as adhesive, antireflection, hard coat, and dot spacer may be optionally added to the conductive pattern forming substrates 10 and 20.
In particular, when using a laser having a wavelength of around 1000 nm, such as a fundamental wave of a YAG laser or a YVO ₄ laser, and using an acrylic polymer material as the functional layer, the functional layer after laser irradiation is used from the viewpoint of appearance characteristics. Is preferably provided.

  In the above-described embodiment, the input member 1 is provided with a pair of conductive pattern formation substrates 10 and 20 stacked in the thickness direction. However, the conductive pattern formation substrate provided on the input member 1 is not provided. The number and arrangement are not limited to the above-described embodiments. Specifically, one or more conductive pattern forming substrates of the input member 1 may be provided.

(Second Embodiment)
Next, an input device according to a second embodiment of the present invention will be described with reference to FIGS. In addition, the same code | symbol is attached | subjected to the same member as above-mentioned embodiment, and the description is abbreviate | omitted.

  The input device according to the present embodiment is a capacitive touch panel. FIG. 12 shows an input member 200 for a capacitive touch panel (input device). This capacitive touch panel includes upper and lower electrodes (transparent conductive layers 212 and 222) that are capacitively coupled to a human body portion H such as a finger through an insulating layer 240 disposed on a surface facing the input user side. An AC signal is applied to and the other electrode is measured to detect the contact state of the finger.

  As shown in FIGS. 15 and 16, the input member 200 of the capacitive touch panel has transparent conductive layers 212 and 222 of a pair of electrode sheets 210 and 220 (conductive pattern forming substrate) arranged in the thickness direction (vertical direction in the figure). ) Along one side (input person side).

  As shown in FIGS. 12 to 14, the input member 200 includes an X-side electrode sheet on which electrodes 201 a having a checkered pattern (a state in which square corners having the same shape are connected to each other, a so-called check pattern) are formed. 210 (conductive pattern forming substrate) and a Y side electrode sheet 220 (conductive pattern forming substrate) on which electrodes 201b having a checkered pattern complementary to the X side electrode sheet 210 are formed.

  As shown in FIG. 13, the electrode 201a is formed such that corners of a plurality of squares arranged along the X direction are electrically connected to each other, and the squares adjacent to each other in the Y direction are They are arranged in parallel in the Y direction while being electrically insulated from each other. Further, as shown in FIG. 14, the electrode 201b is formed such that corners of a plurality of squares arranged along the Y direction are connected to each other and extend, while the squares adjacent to each other in the X direction. They are arranged in parallel in the X direction while being electrically insulated from each other.

As shown in FIG. 12, the X-side electrode sheet 210 and the Y-side electrode sheet 220 are combined in a state where the electrodes 201 a and 201 b face each other without facing each other in the thickness direction.
Specifically, as shown in FIGS. 15 and 16, the X-side electrode sheet 210 is fixed to the upper surface (the surface on the input side) of the Y-side electrode sheet 220 so as to be laminated via a transparent adhesive material 250. In this state, both electrodes 201a and 201b are not overlapped in the thickness direction.

13 and 16, in the transparent conductive layer 212 of the X-side electrode sheet 210, a square-shaped isolated electrode 202a is formed in a region facing the square portion of the electrode 201b of the Y-side electrode sheet 220. Each is formed. On the outer periphery of the isolated electrode 202a, the insulating portions I having a square ring shape are formed by irradiating the laser beam L, respectively.
Further, in the transparent conductive layer 212 of the X-side electrode sheet 210, between the opposing corners of the square of the electrode 201a adjacent in the Y direction, a small isolated electrode having a square shape with a smaller outer shape than the isolated electrode 202a. 203a is formed. On the outer periphery of the small isolated electrode 203a, the insulating portions I having a square ring shape are formed by irradiating the laser beam L, respectively. That is, the adjacent isolated electrode 202a and the small isolated electrode 203a share a part of the insulating part I of each other.

As shown in FIGS. 14 and 16, in the transparent conductive layer 222 of the Y-side electrode sheet 220, a square-shaped isolated electrode 202 b is formed in a region facing the square portion of the electrode 201 a of the X-side electrode sheet 210. Each is formed. On the outer periphery of the isolated electrode 202b, insulating portions I having a square ring shape are formed by irradiating the laser beam L, respectively.
Further, in the transparent conductive layer 222 of the Y-side electrode sheet 220, a small isolated electrode having a square shape with a smaller outer shape than the isolated electrode 202b is formed between the opposing corners of the square of the electrode 201b adjacent in the X direction. 203b is formed. On the outer periphery of the small isolated electrode 203b, the insulating portions I having a square ring shape are formed by irradiating the laser beam L, respectively. That is, the adjacent isolated electrode 202b and the small isolated electrode 203b share a part of the insulating portion I of each other.

  In the input member 200 configured as described above, the mesh member 3 is disposed on the electrodes 201a and 201b and the isolated electrodes 202a and 202b to form a conductive portion C. In this embodiment, the small isolated electrodes 203a and 203b are also the conductive portion C. However, the small isolated electrodes 203a and 203b are irradiated with the laser beam L so as to be filled in, so that the square insulation is formed. It does not matter as part I.

Next, the operation of the capacitive touch panel using the input member 200 will be described with reference to FIG.
When the human body portion H (contact object) such as a finger comes into contact with the input member 200 via an insulating layer 240 formed on the surface (surface on the input side), capacitive coupling is established between the contact object H and each electrode. Is formed. In this state, a voltage is applied to one of the electrodes 201b of the Y-side electrode sheet 220 by using the signal source 260, and the signal (input signal) of the electrode 201a of the X-side electrode sheet 210 is detected by the detection means 270. Thus, the contact state between the contact object H and the input member 200 can be detected.

According to the input member 200 of the input device according to the present embodiment, since the insulation of the insulating portion I is sufficiently ensured, the above-described special configuration can be adopted and the following excellent operational effects can be achieved. It becomes.
That is, when the contact object H comes into contact as described above, the electrode 201b of the Y-side electrode sheet 220 and the contact object H pass through the isolated electrode 202a of the X-side electrode sheet 210 positioned on the electrode 201b. Capacitive coupling will be formed. Thereby, the electrode 201a of the X-side electrode sheet 210 and the electrode 201b of the Y-side electrode sheet 220 are in a state of being disposed in substantially the same layer (transparent conductive layer 212). Therefore, the position of the contact object H can be detected with high accuracy.

  Specifically, in the input member of the conventional capacitive touch panel, in the transparent conductive layer 212 of the X-side electrode sheet 210, an isolated electrode (conductive portion C) is not present in the region facing the electrode 201b of the Y-side electrode sheet 220. It was not provided. Further, in the transparent conductive layer 222 of the Y-side electrode sheet 220, no isolated electrode (conductive portion C) was provided in the region facing the electrode 201 a of the X-side electrode sheet 210. In the case of such a configuration, the electrodes 201a and 201b are not only maintained in an insulated state but also strictly controlled with a certain width between each other. That is, in the conventional configuration, the accuracy of the distance between the upper and lower electrodes 201a and 201b tends to affect the detection result, and the area for performing the insulation process is relatively large.

On the other hand, according to the present embodiment, since the electrodes 201a and 201b are disposed in substantially the same layer (plane), the conventional distance accuracy between the upper and lower electrodes 201a and 201b is required. The detection accuracy is improved.
In addition, the area of the region (insulating part I) where the insulating process is performed is greatly reduced, and the productivity is improved.
Furthermore, since the chemical compositions of the electrodes 201a and 201b and the isolated electrodes 202a and 202b are the same, the conductive pattern is less likely to be recognized and the appearance is good.
Further, since the small isolated electrodes 203a and 203b are formed, it is possible to further reduce the influence on the detection accuracy due to the contact of the contact object H and the assembly tolerance.

  Hereinafter, the present invention will be specifically described by way of examples. However, the present invention is not limited to this embodiment.

[Production Example 1] Production of silver nanowire conductive film (conductive pattern forming substrate) used for input member of input device (Example of the present invention)
A transparent polyester (PET) film (insulating substrates 11, 21) having a thickness of 100 μm is coated with Ohm (trade name) ink (mixed liquid containing metal microfibers 4) manufactured by Cambrios, and then UV-cured polyester resin. Conductive two-dimensional network consisting of silver fibers (metal ultrafine fibers 4) with a wire diameter of about 50 nm and a length of about 15 μm on a PET film by overcoating with ink (transparent substrate 2), drying and UV treatment. A friction-resistant transparent conductive layer a having (mesh member 3) was formed (FIG. 2).

The surface resistance of the transparent conductive layer a of this silver nanowire conductive film (conductive substrates 10 and 20) was 230Ω / □, and the light transmittance was 95%.
Next, this silver nanowire conductive film was cut into a rectangle having a length of 210 mm and a width of 148 mm to obtain a silver nanowire conductive film test piece.

[Example 1]
Using a femtosecond laser (manufacturing apparatus 40) having a wavelength of 750 nm, an output of 10 mW, a pulse width of 130 fsec, a repetition frequency of 1 kHz, and a beam diameter of 5 mm, using a condenser lens 42 having a focal length FL = 100 mm and a galvanometer mirror, a test piece Is placed on a glass plate having a thickness of 5 mm so that the transparent conductive layer faces away from the glass plate, and 1. from the surface of the transparent conductive layer in the test piece toward the condenser lens 42 side. After adjusting so that the focal point F of the condensing lens 42 (laser light L) is set at a position 5 mm apart, the condensing point is moved at 1 mm / second so as to cross the width direction of the test piece, Drawing (formation of an insulating pattern) was performed.

[Example 2]
Using a YVO ₄ laser (manufacturing apparatus 40) having a wavelength of 1064 nm, an output of 12 W, a pulse width of 20 ns, a repetition frequency of 100 kHz, and a beam diameter of 6.7 mm, using a condensing lens with a focal length FL = 300 mm and a galvanometer mirror, The test piece was placed on a Duracon (Polyplastics Co., Ltd., registered trademark) plate having a thickness of 5 mm so that the transparent conductive layer faced the opposite side of the Duracon (registered trademark) plate. After adjusting the focal point F of the condensing lens 42 (laser light L) to a position 3 mm away from the surface of the transparent conductive layer toward the condensing lens 42 side, the condensing point was tested at 100 mm / sec. A straight line was drawn by moving across the width of the piece.

[Example 3]
Except that the moving speed of the condensing point was set to 300 mm / second, the same conditions as in Example 2 were repeated, and the straight line drawing was repeated 5 times at the same location.

[Comparative Example 1]
A straight line was drawn under the same conditions as in Example 1 except that the focal point F of the condensing lens 42 (laser light L) was set on the surface of the transparent conductive layer.

[Comparative Example 2]
A straight line was drawn under the same conditions as in Example 2 except that the moving speed of the condensing point was 300 mm / second and the focal point F of the condensing lens 42 (laser light L) was on the surface of the transparent conductive layer. .

About the conductive pattern formation board | substrate obtained by the said experiment, the electrical resistance value was measured on both sides of the part irradiated with the laser beam L using the tester. Moreover, the visibility (processed trace) of the conductive pattern was evaluated visually. The evaluation results are shown in Table 1.
The evaluation criteria (A, B, C, D) were as follows.
A: Excellent. The electrical resistance value exceeds 10 MΩ and insulation is ensured, and the conductive pattern is not visible at all.
B: Good. The electrical resistance value exceeds 10 MΩ and insulation is ensured, and the conductive pattern is almost invisible (when the processing mark is assembled on the touch panel, the processing traces are virtually invisible).
C: Yes. The electrical resistance value exceeds 10 MΩ and insulation is ensured, but the conductive pattern is visible (a level that can be used as a product when assembled on a touch panel).
D: Impossible. Those with an electrical resistance of 10 MΩ or less and insufficient insulation, or those with scorch or perforation to the extent that they can be visually confirmed. That is, it cannot be used as a product.

As shown in Table 1, in Examples 1 to 3 using Production Example 1, changes in transparency and color tone of the irradiated region could not be confirmed with an optical microscope (Evaluation A or B). And when the irradiation area | region was observed with the electron microscope, it has confirmed that only the silver nanowire evaporated from the transparent base | substrate 2, and the space | gap 5 was formed (FIG. 3). In particular, in Example 1, evaluation A was obtained, and no change in the irradiation region was observed, and good results were obtained.
On the other hand, when the irradiated region was observed in Comparative Examples 1 and 2 using Production Example 1, it was confirmed that the transparent conductive layer itself was removed from the PET film by ablation. And evaluation was set to C and the conductive pattern was visually recognized.

[Production Example 2] Production of a silver-deposited conductive film (conductive pattern forming substrate) used for an input member of an input device (reference example of the present invention)
A transparent PET film with a thickness of 100 μm was prepared by providing a hard coat layer of silicone acrylic on one side, and a zinc oxide film with a thickness of 60 nm was formed on the opposite side of the hard coat layer by a magnetron sputtering apparatus. . Next, a silver film having a thickness of 27 nm was formed on the surface of the zinc oxide film using a magnetron sputtering apparatus. Further, a zinc oxide film having a thickness of 60 nm was formed on the surface of the silver film in the same manner as the zinc oxide film (FIG. 6). Thereby, the transparent conductive layer which has the electroconductive two-dimensional network (network member which consists of a film-like member) which consists of a zinc oxide film | membrane and a silver film was formed on PET film. In detail, as shown in FIG. 6, the silver vapor deposition layer (silver film) is formed so as to provide a slight gap while a plurality of granular bodies are densely connected.

The surface resistance of the transparent conductive layer of this silver vapor-deposited conductive film was 95Ω / □, and the light transmittance was 85%.
Subsequently, this silver vapor-deposited conductive film was cut into a rectangle having a length of 210 mm and a width of 148 mm to obtain a silver vapor-deposited conductive film test piece.
And when the straight line drawing was performed on the said test piece on the conditions of above-mentioned Example 2, 3 and the comparative example 2, it became the following result.

In the reference example using the production example 2 (conditions of the examples 2 and 3), the evaluations A and B were not obtained, but the evaluation C was obtained and the product could be used as a product. In the irradiated region (irradiated area indicated by reference numeral LI in FIG. 7), the silver deposited layer on the surface of the PET film is removed in a wide range, and the non-irradiated region having conductivity (unirradiated indicated by reference numeral UI in FIG. 7). Contrary to (area), it was confirmed that insulation was secured.
On the other hand, in Comparative Example 2 using Production Example 2, scorching was confirmed visually, and the product could not be used (Evaluation D).

[Production Example 3] Production of input member 1 of touch panel (input device) (Example of the present invention)
Next, a manufacturing example of the input member 1 of the membrane touch panel (wiring board) using the conductive pattern forming substrate 10 (20) described above will be described.

  First, on the transparent conductive layer a of the conductive substrate A, a commercially available silver paste was printed in a band shape by screen printing to form a connector pattern. Then, as shown in FIGS. 8 and 10, under the conditions of Comparative Example 1, “+” marks as marks on the transparent conductive layer a are arranged in a row of 5 mm pitches and 1 mm lengths in a row of 25 mm intervals. Two rows were marked with a gap between them, which served as a mark for the input area.

Next, as shown in FIG. 9 and FIG. 10, six lines (laser light L) having a length of 35 mm are irradiated with the “+” mark as a base point under the irradiation conditions of the first embodiment. did.
Next, with the “+” mark as a base point, an insulating pattern was formed so as to cross the connector pattern under the conditions of Comparative Example 1, and a touch panel wiring board having a 25 mm square input area was obtained. A pair of the touch panel wiring boards were prepared and confirmed by a tester. As a result, the wiring patterns for the touch panel were insulative between the wiring patterns at the end of the input area.

  Next, as shown in FIG. 10, after forming an Ag paste (Dotite (registered trademark) FA301CA: manufactured by Fujikura Kasei Co., Ltd.) as a drawing pattern 101 by screen printing, the screen printing is used to form these touch panel wiring boards. A plurality of dot spacers 30 made of an acrylic resin having a diameter of 30 μm and a height of 8 μm with a “+” mark as a mark (see FIG. 1).

  Next, the touch panel wiring board on which the dot spacers 30 are formed and the touch panel wiring board on which the dot spacers 30 are not formed are cut into predetermined shapes, and the transparent conductive layers 12 (22) are arranged to face each other. Then, using a commercially available double-sided adhesive tape, the four sides were bonded to form an input member 1 of a transparent membrane-type touch panel (input device) (see FIG. 1).

[Evaluation]
It was confirmed that the input member 1 of the touch panel manufactured in this way is invisible with neither the dot spacers 30 nor the wiring pattern, and functions as a key matrix.

[Production Example 4] Production of touch panel input member (comparative example)
When patterning was performed on the conductive substrate A on which the dot spacers 30 were printed in advance under the same conditions as in Production Example 3, it was visually confirmed that the dot spacers 30 had turned black.

[Production Example 5] Fabrication of membrane type touch panel (input device) (Example of the present invention)
As shown in FIG. 11, the input member 1 for the membrane type touch panel of 5 rows and 5 columns obtained in Production Example 3 is connected to the 5-side port 121 on the row side and the column side using an interface circuit (detection means). It connected to 122 and it confirmed that the output corresponding to a press location was obtained.
At this time, the power supply voltage was 5V, the current limiting resistor 102 was 3 kΩ, the pull-up / pull-down resistor 103 was 200Ω, and the hfe of the transistors 104a and 104b in the row and column directions was about 200.

[Production Example 6] Fabrication of capacitive touch panel (input device) (Example of the present invention)
Two silver nanowire conductive films of Production Example 1 were prepared. As shown in FIGS. 13 and 14, a guide pin hole 280 for positioning was provided in each silver nanowire conductive film. In addition, Ag paste (Dotite (registered trademark) FA301CA: manufactured by Fujikura Kasei Co., Ltd.) is printed on these silver nanowire conductive films by screen printing, and dried to form a drawing pattern 281 by drying at 100 ° C. for 15 minutes. did.

Next, the silver nanowire conductive film was fixed to the stage of the irradiator using the guide pin hole 280, and the outer shape mark 282 and the printing positioning mark 283 were marked under the irradiation conditions of Comparative Example 1.
Further, the Ag wiring pattern portion 284 was insulated by being irradiated under the irradiation conditions of Comparative Example 1 between and outside the lead patterns 281 in parallel with the pattern extending direction (0.1 mm interval).

Next, pattern irradiation was performed in the input area under the irradiation conditions of Example 1, and the insulating portion I was formed.
Specifically, by forming the insulating portion I, the silver nanowire conductive film that becomes the X-side electrode sheet 210 in FIG. 13 is surrounded by the electrode 201a extending in the X direction and the electrodes 201a adjacent in the Y direction. An isolated electrode 202a and a small isolated electrode 203a sandwiched between opposing corners of a square of the electrode 201a adjacent in the Y direction were formed.
Further, the silver nanowire conductive film to be the Y-side electrode sheet 220 in FIG. 14 includes an electrode 201b extending along the Y direction, an isolated electrode 202b surrounded by electrodes 201b adjacent in the X direction, and an electrode adjacent in the X direction. A small isolated electrode 203b sandwiched between opposing corners of a square 201b was formed.

  Next, in order to provide the insulating layer 240 on the surface of the silver nanowire conductive film to be the X-side electrode sheet 210, an ultraviolet curable polyester resin ink made of pentaerythritol triacrylate was applied to coat and harden the input area.

Subsequently, these silver nanowire conductive films were cut out to obtain X side / Y side electrode sheets 210 and 220.
Next, the X-side electrode sheet 210 and the Y-side electrode sheet 220 are transparently adhered so that the electrodes 201a and 201b are projected onto the surface of the input member 200 in a checkered pattern through the isolated electrodes 202a and 202b. A sheet (adhesive material 250) was attached to obtain an input member 200 of a capacitive touch panel (input device).

The input member 200 thus manufactured could not visually confirm the wiring pattern in the input area, and thus the appearance was excellent.
Next, a capacitive touch panel interface (CY8C24094: manufactured by Cypress) was electrically connected to the input member 200 as the detecting means 270, and it was confirmed that the operation with the finger H could be performed satisfactorily.

DESCRIPTION OF SYMBOLS 1,200 Input member 2 Transparent base | substrate 3 Net-like member (network member of the inorganic substance which has electroconductivity)
4 Metal extra fine fiber 5 Gap 10, 20 Conductive pattern forming substrate 11, 21 Insulating substrate 12, 22, 212, 222 Transparent conductive layer 42 Condensing lens (condensing means)
210 X side electrode sheet (conductive pattern forming substrate)
220 Y-side electrode sheet (conductive pattern forming substrate)
270 Detection means a Transparent conductive layer (transparent conductive layer before forming conductive pattern)
F Focus I Insulator L Laser light

Claims (6)

An input member including an insulating substrate, and a conductive pattern forming substrate provided on at least one surface of the insulating substrate and including a transparent conductive layer including a conductive inorganic network member in an insulating transparent substrate; ,
Detecting means that is electrically connected to the transparent conductive layer and detects an input signal;
Wherein the transparent conductive layer, by Les laser light is irradiated, at least partially formed by removing the insulating portion is formed of the network member,
The insulating portion, by the network element by the irradiation of the laser beam is evaporated to remove from said transparent substrate comprises a gap formed in the transparent substrate in correspondence with the corresponding position of the removed the network member ,
It said network element comprises a mesh member having conductivity, net-like member is to have a metal ultrafine fibers,
The input device is characterized in that the void is formed by being replaced by the removed metal microfiber . The input device according to claim 1,
The input device, wherein the metal microfiber is at least one of a metal nanowire or a metal nanotube. The input device according to claim 1 or 2,
The mesh member has a fibrous member other than the metal microfiber,
The input device, wherein the fibrous member is at least one of silicon nanowires, silicon nanotubes, metal oxide nanotubes, carbon nanotubes, carbon nanofibers, and graphite fibrils. The input device according to claim 3,
The input device according to claim 1, wherein the mesh member includes a metal-coated member of the fibrous member. The input device according to any one of claims 1 to 4,
The input member is arranged such that the transparent conductive layer of the pair of conductive pattern forming substrates provided to be laminated in the thickness direction is directed toward one side along the thickness direction, respectively.
The input device is characterized in that the detection means is a capacitance type. The input device according to any one of claims 1 to 4,
The input member is arranged to face each other with a gap in a state where the transparent conductive layers of the pair of conductive pattern forming substrates provided so as to be laminated in the thickness direction are close to each other,
An input device characterized in that a part of the transparent conductive layers can be brought into direct contact with each other by an input operation.