JP5718011B2 - プラズマ処理装置及びその処理ガス供給構造 - Google Patents
プラズマ処理装置及びその処理ガス供給構造 Download PDFInfo
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- JP5718011B2 JP5718011B2 JP2010230679A JP2010230679A JP5718011B2 JP 5718011 B2 JP5718011 B2 JP 5718011B2 JP 2010230679 A JP2010230679 A JP 2010230679A JP 2010230679 A JP2010230679 A JP 2010230679A JP 5718011 B2 JP5718011 B2 JP 5718011B2
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- 239000000758 substrate Substances 0.000 claims description 35
- 230000002093 peripheral effect Effects 0.000 claims description 24
- 238000000034 method Methods 0.000 claims description 21
- 230000008569 process Effects 0.000 claims description 18
- 230000007246 mechanism Effects 0.000 claims description 17
- 238000009616 inductively coupled plasma Methods 0.000 claims description 8
- 229910052751 metal Inorganic materials 0.000 claims description 3
- 239000002184 metal Substances 0.000 claims description 3
- 239000010453 quartz Substances 0.000 claims description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 3
- 239000000919 ceramic Substances 0.000 claims description 2
- 239000010409 thin film Substances 0.000 claims 1
- 238000001020 plasma etching Methods 0.000 description 11
- 238000005530 etching Methods 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 238000009792 diffusion process Methods 0.000 description 3
- 230000005672 electromagnetic field Effects 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 238000003825 pressing Methods 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67063—Apparatus for fluid treatment for etching
- H01L21/67069—Apparatus for fluid treatment for etching for drying etching
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/3244—Gas supply means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
- H01L21/3065—Plasma etching; Reactive-ion etching
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T137/00—Fluid handling
- Y10T137/8593—Systems
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Drying Of Semiconductors (AREA)
- Plasma Technology (AREA)
Description
Claims (8)
- 処理チャンバー内に誘導結合プラズマを発生させて前記処理チャンバー内に収容された基板の処理を行うプラズマ処理装置であって、
前記処理チャンバーの上部開口を覆うように設けられ、誘電体窓を備えた上蓋と、
前記上蓋に配設され、前記処理チャンバー内に処理ガスを供給するための複数のガス導入口と、
前記処理チャンバー外の前記誘電体窓の上部に配設された高周波コイルと、
前記誘電体窓の内側に位置するように前記上蓋に支持され、複数の透孔を有する1枚の板体と、前記板体の下側周縁部と当接され、前記板体との間に複数の環状ガス流路を形成する環状部材とを具備し、前記板体と前記誘電体窓との間に設けられ一端が前記透孔の縁部に開口するとともに、他端が前記環状ガス流路と連通し、前記環状ガス流路を介して前記ガス導入口と連通された複数の溝状のガス流路を介して、前記処理チャンバー内に複数の部位から水平方向に向けて処理ガスを供給するガス供給機構と、
を具備したことを特徴とするプラズマ処理装置。 - 請求項1記載のプラズマ処理装置であって、
前記板体が、誘電体から構成されていることを特徴とするプラズマ処理装置。 - 請求項2記載のプラズマ処理装置であって、
前記板体が、石英又はセラミックスから構成されていることを特徴とするプラズマ処理装置。 - 請求項1〜3いずれか1項記載のプラズマ処理装置であって、
前記板体が環状とされていることを特徴とするプラズマ処理装置。 - 請求項1〜4いずれか1項記載のプラズマ処理装置であって、
前記溝状のガス流路は、前記高周波コイルと直交するように配設されていることを特徴とするプラズマ処理装置。 - 請求項1〜5いずれか1項記載のプラズマ処理装置であって、
前記溝状のガス流路の部分に金属薄膜が形成されていることを特徴とするプラズマ処理装置。 - 請求項1〜5いずれか1項記載のプラズマ処理装置であって、
前記処理チャンバー内における前記板体と前記基板との間隔が10mm〜40mmの範囲とされていることを特徴とするプラズマ処理装置。 - 処理チャンバーの上部開口を覆うように設けられ、誘電体窓を備えた上蓋と、前記上蓋に配設され、前記処理チャンバー内に処理ガスを供給するための複数のガス導入口と、前記処理チャンバー外の前記誘電体窓の上部に配設された高周波コイルとを具備し、前記高周波コイルに高周波電力を印加することにより、前記処理チャンバー内に誘導結合プラズマを発生させて前記処理チャンバー内に収容された基板の処理を行うプラズマ処理装置の処理ガス供給構造であって、
前記誘電体窓の内側に位置するように前記上蓋に支持され、複数の透孔を有する1枚の板体と、前記板体の下側周縁部と当接され、前記板体との間に複数の環状ガス流路を形成する環状部材とを具備し、前記板体と前記誘電体窓との間に設けられ一端が前記透孔の縁部に開口するとともに、他端が前記環状ガス流路と連通し、前記環状ガス流路を介して前記ガス導入口と連通された複数の溝状のガス流路を介して、前記処理チャンバー内に複数の部位から水平方向に向けて処理ガスを供給することを特徴とするプラズマ処理装置の処理ガス供給構造。
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2010230679A JP5718011B2 (ja) | 2010-10-13 | 2010-10-13 | プラズマ処理装置及びその処理ガス供給構造 |
US13/271,399 US9117633B2 (en) | 2010-10-13 | 2011-10-12 | Plasma processing apparatus and processing gas supply structure thereof |
TW100136860A TWI538048B (zh) | 2010-10-13 | 2011-10-12 | A plasma processing apparatus and a processing gas supply structure thereof |
KR1020110104401A KR101777729B1 (ko) | 2010-10-13 | 2011-10-13 | 플라즈마 처리 장치 및 그 처리 가스 공급 구조체 |
CN201110348617.9A CN102573263B (zh) | 2010-10-13 | 2011-10-13 | 等离子体处理装置及其处理气体供给结构 |
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JP2010230679A JP5718011B2 (ja) | 2010-10-13 | 2010-10-13 | プラズマ処理装置及びその処理ガス供給構造 |
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JP2012084734A JP2012084734A (ja) | 2012-04-26 |
JP5718011B2 true JP5718011B2 (ja) | 2015-05-13 |
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US (1) | US9117633B2 (ja) |
JP (1) | JP5718011B2 (ja) |
KR (1) | KR101777729B1 (ja) |
CN (1) | CN102573263B (ja) |
TW (1) | TWI538048B (ja) |
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US11145532B2 (en) * | 2018-12-21 | 2021-10-12 | Toto Ltd. | Electrostatic chuck |
CN116864415A (zh) * | 2023-07-07 | 2023-10-10 | 北京屹唐半导体科技股份有限公司 | 工艺平台 |
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JP3243125B2 (ja) * | 1994-06-27 | 2002-01-07 | 東京エレクトロン株式会社 | 処理装置 |
US5522934A (en) * | 1994-04-26 | 1996-06-04 | Tokyo Electron Limited | Plasma processing apparatus using vertical gas inlets one on top of another |
US5746875A (en) | 1994-09-16 | 1998-05-05 | Applied Materials, Inc. | Gas injection slit nozzle for a plasma process reactor |
US6209480B1 (en) * | 1996-07-10 | 2001-04-03 | Mehrdad M. Moslehi | Hermetically-sealed inductively-coupled plasma source structure and method of use |
US6033585A (en) * | 1996-12-20 | 2000-03-07 | Lam Research Corporation | Method and apparatus for preventing lightup of gas distribution holes |
JP3501930B2 (ja) * | 1997-12-01 | 2004-03-02 | 株式会社ルネサステクノロジ | プラズマ処理方法 |
JP3485505B2 (ja) | 1999-09-17 | 2004-01-13 | 松下電器産業株式会社 | 処理装置 |
JP3599619B2 (ja) * | 1999-11-09 | 2004-12-08 | シャープ株式会社 | プラズマプロセス装置 |
US6444040B1 (en) | 2000-05-05 | 2002-09-03 | Applied Materials Inc. | Gas distribution plate |
US6716303B1 (en) * | 2000-10-13 | 2004-04-06 | Lam Research Corporation | Vacuum plasma processor having a chamber with electrodes and a coil for plasma excitation and method of operating same |
JP4382505B2 (ja) * | 2004-01-22 | 2009-12-16 | パナソニック株式会社 | プラズマエッチング装置の誘電板の製造方法 |
JP4572100B2 (ja) * | 2004-09-28 | 2010-10-27 | 日本エー・エス・エム株式会社 | プラズマ処理装置 |
JP5308664B2 (ja) | 2005-09-01 | 2013-10-09 | パナソニック株式会社 | プラズマ処理装置 |
CN101322225B (zh) * | 2006-03-06 | 2012-06-27 | 东京毅力科创株式会社 | 等离子体处理装置 |
JP5010234B2 (ja) | 2006-10-23 | 2012-08-29 | 北陸成型工業株式会社 | ガス放出孔部材を一体焼結したシャワープレートおよびその製造方法 |
CN201313934Y (zh) * | 2008-09-10 | 2009-09-23 | 李刚 | 一种用于化学气相淀积的气体导入装置 |
JP5740203B2 (ja) * | 2010-05-26 | 2015-06-24 | 東京エレクトロン株式会社 | プラズマ処理装置及びその処理ガス供給構造 |
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- 2011-10-12 US US13/271,399 patent/US9117633B2/en active Active
- 2011-10-12 TW TW100136860A patent/TWI538048B/zh active
- 2011-10-13 CN CN201110348617.9A patent/CN102573263B/zh active Active
- 2011-10-13 KR KR1020110104401A patent/KR101777729B1/ko active IP Right Grant
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Publication number | Publication date |
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TWI538048B (zh) | 2016-06-11 |
JP2012084734A (ja) | 2012-04-26 |
TW201234476A (en) | 2012-08-16 |
KR20120038381A (ko) | 2012-04-23 |
KR101777729B1 (ko) | 2017-09-12 |
US20120090783A1 (en) | 2012-04-19 |
CN102573263A (zh) | 2012-07-11 |
US9117633B2 (en) | 2015-08-25 |
CN102573263B (zh) | 2015-04-15 |
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