JP5716149B2 - Acceleration sensor - Google Patents

Acceleration sensor Download PDF

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JP5716149B2
JP5716149B2 JP2009266581A JP2009266581A JP5716149B2 JP 5716149 B2 JP5716149 B2 JP 5716149B2 JP 2009266581 A JP2009266581 A JP 2009266581A JP 2009266581 A JP2009266581 A JP 2009266581A JP 5716149 B2 JP5716149 B2 JP 5716149B2
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acceleration sensor
sensor according
acceleration
electrode
weight
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JP2011112388A (en
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吉田 仁
仁 吉田
伸行 茨
伸行 茨
英喜 上田
英喜 上田
全史 岡田
全史 岡田
岳志 森
岳志 森
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Panasonic Intellectual Property Management Co Ltd
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Panasonic Intellectual Property Management Co Ltd
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Priority to JP2009266581A priority Critical patent/JP5716149B2/en
Application filed by Panasonic Intellectual Property Management Co Ltd filed Critical Panasonic Intellectual Property Management Co Ltd
Priority to US13/511,178 priority patent/US9261530B2/en
Priority to EP10832714.9A priority patent/EP2506018A4/en
Priority to CN201080052810.1A priority patent/CN102667497B/en
Priority to PCT/IB2010/002975 priority patent/WO2011064642A2/en
Publication of JP2011112388A publication Critical patent/JP2011112388A/en
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Priority to US14/718,493 priority patent/US9244094B2/en
Priority to US14/874,845 priority patent/US9702895B2/en
Priority to US15/617,777 priority patent/US10126322B2/en
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Description

本発明は、静電容量型の加速度センサに関する。   The present invention relates to a capacitance type acceleration sensor.

従来、図5(a)に示すように、可動電極を有する直方体形状の重り部100と、重り部100の長手方向における略中央において重り部100を回動自在に支持する1対のビーム部101と、1対のビーム部101を結ぶ直線を境界線とした重り部100の表面のそれぞれ一方側及び他方側に対して所定距離を空けて対向配置された1対の固定電極102,103とを備えた加速度センサが知られている(例えば、特許文献1参照)。この加速度センサは、前記境界線を回動軸とした重り部100の回動に伴う可動電極(重り部100における固定電極102,103との対向部位)と、固定電極102,103との間の静電容量の変化を差動検出することにより、重り部100に印加された加速度を検出する。このような加速度センサでは、重り部100の裏面の前記境界線を挟んだ一方側(図5(a)における右側)に凹部104を形成することにより、重り部100は前記境界線を挟んだ一方側(右側)と他方側(左側)とで重量が異なるように構成している。而して、加速度が印加された際に前記境界線を回動軸としたモーメントが重り部100に発生するようになっている。ここで、重り部100の凹部104が形成された部位が周囲からの応力によって変形してしまうのを防ぐために、凹部104内を2分割するような補強壁105を前記境界線と平行な向きに沿って重り部100と一体に形成している。   Conventionally, as shown in FIG. 5A, a rectangular parallelepiped weight portion 100 having a movable electrode, and a pair of beam portions 101 that rotatably support the weight portion 100 at a substantially center in the longitudinal direction of the weight portion 100. And a pair of fixed electrodes 102 and 103 arranged to face each other on the one side and the other side of the surface of the weight portion 100 with a straight line connecting the pair of beam portions 101 as a boundary line. An acceleration sensor provided is known (for example, see Patent Document 1). This acceleration sensor includes a movable electrode (a portion facing the fixed electrodes 102 and 103 in the weight portion 100) and the fixed electrodes 102 and 103 that accompany the rotation of the weight portion 100 with the boundary line as a rotation axis. The acceleration applied to the weight part 100 is detected by differentially detecting the change in capacitance. In such an acceleration sensor, by forming the recess 104 on one side (right side in FIG. 5A) of the back surface of the weight part 100 with the boundary line interposed therebetween, the weight part 100 has one side of the boundary line interposed therebetween. The side (right side) and the other side (left side) are configured to have different weights. Thus, when the acceleration is applied, a moment with the boundary line as the rotation axis is generated in the weight portion 100. Here, in order to prevent the portion of the weight portion 100 where the concave portion 104 is formed from being deformed by stress from the surroundings, the reinforcing wall 105 that divides the concave portion 104 into two is arranged in a direction parallel to the boundary line. It is formed integrally with the weight part 100 along.

特表2008−544243号公報Special table 2008-544243 gazette

ところで、上記の加速度センサでは、回動軸に直交する2方向の加速度を検出することができるが、重り部100の重心位置から回動軸に下ろした垂線と重り部100の表面とが成す角度θを略45度に設定することによって、これら2方向の検出感度を等価にしている。ここで、加速度センサの検出感度を向上させる手段の一つとして、可動電極の面積を大きくする方法があるが、この方法を採用する場合には上記の角度θを略45度に維持するために重り部100の厚み寸法を大きくしなければならない。重り部100の厚み寸法を大きくすると、重り部100を形成するエッチング工程の時間が長くなるため、現実的ではないという問題があった。   By the way, although the acceleration sensor described above can detect acceleration in two directions orthogonal to the rotation axis, an angle formed by a perpendicular line drawn from the center of gravity of the weight portion 100 to the rotation axis and the surface of the weight portion 100. By setting θ to approximately 45 degrees, the detection sensitivities in these two directions are made equivalent. Here, as one of the means for improving the detection sensitivity of the acceleration sensor, there is a method of increasing the area of the movable electrode. When this method is adopted, in order to maintain the above angle θ at about 45 degrees. The thickness dimension of the weight part 100 must be increased. When the thickness of the weight part 100 is increased, the etching process for forming the weight part 100 takes a long time, which is not practical.

そこで、重り部100の厚み寸法を大きくすることなく上記の角度θを略45度に維持させるために、図5(b)に示すように、重り部100におけるビーム部101の同図における直下を刳り貫く事で重り部100を軽量化する方法がある。しかしながら、この方法を採用する場合には、重り部100において軽量化された薄肉部の強度が不足するために好ましくないという問題があった。   Therefore, in order to maintain the above angle θ at about 45 degrees without increasing the thickness dimension of the weight portion 100, as shown in FIG. There is a method of reducing the weight of the weight part 100 by punching. However, when this method is adopted, there is a problem in that the strength of the thin portion reduced in weight in the weight portion 100 is insufficient, which is not preferable.

本発明は、上記の点に鑑みて為されたもので、重り部の厚み寸法の大型化や軽量化をすることなく検出感度を向上させることのできる加速度センサを提供することを目的とする。   The present invention has been made in view of the above points, and an object of the present invention is to provide an acceleration sensor capable of improving detection sensitivity without increasing the thickness or weight of the weight portion.

請求項1の発明は、上記目的を達成するために、一面に開口する凹部と充実部が一体に形成された重り部と、凹部と充実部とが回動方向に沿って並ぶように重り部を回動自在に支持する1対のビーム部と、凹部が開口する前記一面と異なる他の一面において凹部と充実部とに跨って設けられた可動電極と、可動電極における凹部側と対向する位置に配設された第1の固定電極とを有するセンサ部を備え、1対のビーム部を結ぶ直線を回動軸とした重り部の回動に伴う可動電極と固定電極との間の静電容量の変化から加速度を検出する加速度センサであって、ビーム部を重り部の長手方向における略中心から凹部側にずらして配置したことを特徴とする。 The invention of claim 1, in order to achieve the above object, the weight as the weight portions a recess and the charge real part is formed integrally to open on one side, and the concave portion and the solid portion are arranged along the rotational direction A pair of beam portions that rotatably support the portion, a movable electrode provided across the concave portion and the solid portion on the other surface different from the one surface where the concave portion opens, and the concave portion side of the movable electrode. A sensor portion having a first fixed electrode disposed at a position, and a static portion between the movable electrode and the fixed electrode associated with the rotation of the weight portion with a straight line connecting the pair of beam portions as a rotation axis. a acceleration sensor for detecting acceleration from a change in capacitance, characterized by being staggered on the concave side of the bi over beam portion from substantially the center in the longitudinal direction of the weight portion.

請求項2の発明は、請求項1の発明において、重り部に印加された第1の方向の加速度と、第1の方向と直交する第2の方向の加速度とを検出することを特徴とする。   The invention of claim 2 is characterized in that, in the invention of claim 1, the acceleration in the first direction applied to the weight portion and the acceleration in the second direction orthogonal to the first direction are detected. .

請求項3の発明は、請求項2の発明において、センサ部は、同一のチップに複数形成されることを特徴とする。   According to a third aspect of the present invention, in the second aspect of the present invention, a plurality of sensor portions are formed on the same chip.

請求項4の発明は、請求項3の発明において、センサ部が同一のチップに2つ形成され、一方のセンサ部が他方のセンサ部に対して同一平面において180度回転して配置されたことを特徴とする。   According to a fourth aspect of the present invention, in the third aspect of the present invention, two sensor portions are formed on the same chip, and one sensor portion is rotated 180 degrees in the same plane with respect to the other sensor portion. It is characterized by.

請求項5の発明は、請求項4の発明において、2つのセンサ部が隣接して配置されたことを特徴とする。   The invention of claim 5 is characterized in that, in the invention of claim 4, two sensor portions are arranged adjacent to each other.

請求項6の発明は、請求項3の発明において、センサ部は同一のチップに3つ形成され、2つのセンサ部は、それぞれ残りの1つのセンサ部に対して同一平面において90度及び180度回転して配置されたことを特徴とする。   According to a sixth aspect of the present invention, in the third aspect of the present invention, three sensor portions are formed on the same chip, and the two sensor portions are respectively 90 degrees and 180 degrees in the same plane with respect to the remaining one sensor portion. It is characterized by being rotated.

請求項の発明は、請求項1乃至の何れか1項の発明において、固定電極の可動電極との対向面、又は可動電極の固定電極との対向面には突起部が形成されたことを特徴とする。 The invention of claim 7 is the invention of any one of claims 1 to 6, the protrusion is formed on the surface facing the fixed electrode of the solid-facing surface of the movable electrode of the constant electrode or the movable electrode It is characterized by that.

請求項の発明は、請求項の発明において、突起部は、シリコン又はシリコン酸化膜から形成されたことを特徴とする。 The invention according to claim 8 is the invention according to claim 7 , wherein the protrusion is formed of silicon or a silicon oxide film.

請求項の発明は、請求項の発明において、突起部は、その表層がカーボン材料から形成されたことを特徴とする。 The invention according to claim 9 is the invention according to claim 7 , characterized in that the projection has a surface layer formed of a carbon material.

請求項10の発明は、請求項の発明において、カーボン材料はカーボンナノチューブであることを特徴とする。 The invention of claim 10 is characterized in that, in the invention of claim 9 , the carbon material is a carbon nanotube.

請求項11の発明は、請求項1乃至10の何れか1項の発明において、重り部の固定電極が対向する側と反対側の面と所定の間隔を空けて配置される固定板を有し、固定板の重り部と対向する面には、重り部の付着を防止するための付着防止膜が設けられたことを特徴とする。 An eleventh aspect of the invention is the invention according to any one of the first to tenth aspects, further comprising a fixing plate arranged with a predetermined distance from a surface opposite to a side where the fixed electrode of the weight portion faces. The surface of the fixing plate facing the weight portion is provided with an adhesion preventing film for preventing the weight portion from adhering.

請求項12の発明は、請求項11の発明において、付着防止膜は、固定電極と同じ材料から形成されたことを特徴とする。 The invention of claim 12 is characterized in that, in the invention of claim 11 , the adhesion preventing film is formed of the same material as the fixed electrode.

請求項13の発明は、請求項11又は12の発明において、付着防止膜は、固定電極と同時に形成されることを特徴とする。 The invention of claim 13 is characterized in that, in the invention of claim 11 or 12 , the adhesion preventing film is formed simultaneously with the fixed electrode.

請求項14の発明は、請求項11乃至13の何れか1項の発明において、付着防止膜は、半導体製造プロセスを利用して成膜されることを特徴とする。 According to a fourteenth aspect of the present invention, in the invention according to any one of the eleventh to thirteenth aspects, the adhesion preventing film is formed using a semiconductor manufacturing process.

請求項15の発明は、請求項11乃至14の何れか1項の発明において、付着防止膜は、アルミニウム系合金から形成されたことを特徴とする。 A fifteenth aspect of the invention is characterized in that, in the invention of any one of the eleventh to fourteenth aspects, the adhesion preventing film is formed of an aluminum alloy.

請求項16の発明は、請求項11乃至15の何れか1項の発明において、固定電極と可動電極との間に吸引力を発生させることにより、固定電極と可動電極との間の静電容量の変化を検出することを特徴とする。 The invention of claim 16 is the invention of any one of claims 11 to 15, by generating a suction force between the fixed electrode and the movable electrode, electrostatic between the fixed electrode and the movable electrode It is characterized by detecting a change in capacitance.

請求項17の発明は、請求項16の発明において、付着防止膜の表面には、有機材料から成る薄膜が設けられたことを特徴とする。 The invention of claim 17 is characterized in that, in the invention of claim 16, a thin film made of an organic material is provided on the surface of the adhesion preventing film.

請求項18の発明は、請求項17の発明において、薄膜は、ポリイミド薄膜であることを特徴とする。
請求項19の発明は、請求項1乃至18の何れか1項の発明において、センサ部は、可動電極における充実部側と対向する位置に配設された第2の固定電極を備えることを特徴とする。
請求項20の発明は、請求項19の発明において、重り部を内包する枠部と、枠部に形成されて各固定電極に電気的に接続される1対の検出電極とを有し、各検出電極の間、及び各検出電極と枠部との間、及び各検出電極と重り部との間に隙間が設けられたことを特徴とする。
請求項21の発明は、請求項1乃至20の何れか1項の発明において、重り部の重心位置から前記回動軸に下ろした垂線と可動電極の表面とが成す角度が略45度となることを特徴とする。
The invention of claim 18 is the invention of claim 17 , characterized in that the thin film is a polyimide thin film.
The invention of claim 19 is the invention according to any one of claims 1 to 18, wherein the sensor portion includes a second fixed electrode disposed at a position facing the solid portion side of the movable electrode. And
The invention of claim 20 comprises, in the invention of claim 19, a frame part including the weight part, and a pair of detection electrodes formed on the frame part and electrically connected to each fixed electrode, A gap is provided between the detection electrodes, between each detection electrode and the frame portion, and between each detection electrode and the weight portion.
The invention according to claim 21 is the invention according to any one of claims 1 to 20, wherein the angle formed by the perpendicular line drawn from the center of gravity of the weight portion to the rotation shaft and the surface of the movable electrode is approximately 45 degrees. It is characterized by that.

本発明によれば、可動電極の面積を大きくして検出感度を向上させる際に、ビーム部をずらして配置するだけで対応できるため、重り部の厚み寸法を大きくする、或いは重り部を軽量化することなく検出感度を向上させることができる。 According to the present invention, when improving the detection sensitivity by increasing the area of the movable electrode, because it can cope with only staggered bicycloalkyl over arm portions, increasing the thickness of the weight portion, or the weight section Detection sensitivity can be improved without reducing the weight.

本発明に係る加速度センサの実施形態を示す要部断面図である。It is principal part sectional drawing which shows embodiment of the acceleration sensor which concerns on this invention. 同上の分解斜視図である。It is an exploded perspective view same as the above. (a)は同上の上部固定板及び導電パターンを省略した上面図で、(b)は(a)のA−A’線断面矢視図である。(A) is the top view which abbreviate | omitted the upper fixing board and conductive pattern same as the above, (b) is the A-A 'sectional view taken on the line A-A' of (a). 同上のセンサチップの下面図である。It is a bottom view of a sensor chip same as the above. (a)は従来の加速度センサを示す要部断面図で、(b)は(a)のビーム部直下を刳り貫いた場合の要部断面図である。(A) is principal part sectional drawing which shows the conventional acceleration sensor, (b) is principal part sectional drawing at the time of penetrating directly under the beam part of (a).

以下、本発明に係る加速度センサの実施形態について図面を用いて説明する。尚、以下の説明では、図1における上下を上下方向、センサチップ1の短手方向と平行な方向をx方向、センサチップ1の長手方向と平行な方向をy方向、x方向及びy方向に互いに直交する方向をz方向と定めるものとする。本実施形態は、図1,2に示すように、外形が矩形板状であるセンサチップ1と、センサチップ1の上面側に固定される上部固定板2aと、センサチップ1の下面側に固定される下部固定板2bとを備える。   Hereinafter, embodiments of an acceleration sensor according to the present invention will be described with reference to the drawings. In the following description, the vertical direction in FIG. 1 is the vertical direction, the direction parallel to the short direction of the sensor chip 1 is the x direction, and the direction parallel to the longitudinal direction of the sensor chip 1 is the y direction, x direction, and y direction. The directions orthogonal to each other are defined as the z direction. In the present embodiment, as shown in FIGS. 1 and 2, the sensor chip 1 whose outer shape is a rectangular plate, the upper fixing plate 2 a fixed to the upper surface side of the sensor chip 1, and the lower surface side of the sensor chip 1 are fixed. And a lower fixing plate 2b.

センサチップ1は、上下方向から見て矩形状の2つの枠部3a,3bが長手方向に並設されたフレーム部3と、枠部3a,3bの内周面に対して隙間を空けた状態で枠部3a,3b内に配置された直方体形状の重り部4,5と、枠部3a,3bの内周面と重り部4,5の側面とを連結してフレーム部3に対して重り部4,5を回動自在に支持する各1対のビーム部6a,6b及び7a,7bと、重り部4,5の上面に形成される可動電極4a,5aとを備える。   The sensor chip 1 has a state in which a gap is formed between a frame portion 3 in which two rectangular frame portions 3a and 3b as viewed in the vertical direction are arranged in parallel in the longitudinal direction and an inner peripheral surface of the frame portions 3a and 3b. The weights 4 and 5 having a rectangular parallelepiped shape arranged in the frame portions 3a and 3b and the inner peripheral surface of the frame portions 3a and 3b and the side surfaces of the weight portions 4 and 5 are connected to the frame portion 3 to be weighted. A pair of beam portions 6a, 6b and 7a, 7b for rotatably supporting the portions 4, 5 and movable electrodes 4a, 5a formed on the upper surfaces of the weight portions 4, 5 are provided.

重り部4,5は、図1,3(b)に示すように、一面(下面)に開口する凹部41,51と、凹部41,51を除く充実部40,50とが一体に形成されている。凹部41,51は、開口面の法線方向(上下方向)から見て平面視四角形状に形成され、また、凹部41,51内を4分割する補強壁42,52が重り部4,5と一体に形成されている。   As shown in FIGS. 1 and 3 (b), the weight portions 4 and 5 are formed integrally with concave portions 41 and 51 that open on one surface (lower surface) and solid portions 40 and 50 excluding the concave portions 41 and 51, respectively. Yes. The concave portions 41 and 51 are formed in a square shape in plan view when viewed from the normal direction (vertical direction) of the opening surface, and the reinforcing walls 42 and 52 that divide the concave portions 41 and 51 into four parts are formed with the weight portions 4 and 5. It is integrally formed.

ここで、本実施形態では、図4に示すように、平面視く字形の1対の補強壁42,52と各補強壁42,52の中央部が平坦な補強壁42’、52’で連結された構成、即ち、複数の補強壁42,52が凹部41,51の頂角と交わらない位置で内壁面と結合される構成を採用している。而して、凹部41,51の四隅において補強壁42,52と内壁面との成す角度が鈍角となるため、重り部4,5に凹部41,51を形成(エッチング)するのが容易となっている。   Here, in this embodiment, as shown in FIG. 4, a pair of reinforcing walls 42, 52 having a square shape in plan view and the central portions of the reinforcing walls 42, 52 are connected by flat reinforcing walls 42 ', 52'. In other words, a configuration is adopted in which the plurality of reinforcing walls 42 and 52 are coupled to the inner wall surface at positions where they do not intersect with the apex angles of the recesses 41 and 51. Thus, since the angles formed by the reinforcing walls 42 and 52 and the inner wall surface at the four corners of the recesses 41 and 51 are obtuse, it is easy to form (etch) the recesses 41 and 51 in the weights 4 and 5. ing.

1対のビーム部6a,6bは、重り部4の枠部3aと対向する側面のx方向における略中央部と枠部3aとを連結している。同様に、1対のビーム部7a,7bは、重り部5の枠部3bと対向する側面のx方向における略中央部と枠部3bとを連結している。而して、1対のビーム部6a,6bを結ぶ直線、並びに1対のビーム部7a,7bを結ぶ直線が回動軸となり、回動軸の回りに各重り部4,5が回動するようになっている。   The pair of beam portions 6a and 6b connects the frame portion 3a and the substantially central portion in the x direction of the side surface facing the frame portion 3a of the weight portion 4. Similarly, the pair of beam portions 7a and 7b connects the frame portion 3b and the substantially central portion in the x direction of the side surface facing the frame portion 3b of the weight portion 5. Thus, a straight line connecting the pair of beam portions 6a and 6b and a straight line connecting the pair of beam portions 7a and 7b serve as a rotation axis, and the weight portions 4 and 5 rotate around the rotation axis. It is like that.

センサチップ1は、半導体の微細加工技術によりSOI(Silicon on Insulator)基板を加工して形成され、重り部4,5の上面を含む部位が可動電極4a,5aとなる。また、重り部4,5の上面及び下面には、重り部4,5が上部固定板2a及び下部固定板2bに直接衝突するのを防止するための突起部43a,43b,53a,53bが突設されている。   The sensor chip 1 is formed by processing an SOI (Silicon on Insulator) substrate by a semiconductor microfabrication technique, and the portions including the upper surfaces of the weight portions 4 and 5 become the movable electrodes 4a and 5a. Further, protrusions 43a, 43b, 53a, 53b for preventing the weights 4, 5 from directly colliding with the upper fixing plate 2a and the lower fixing plate 2b protrude from the upper and lower surfaces of the weights 4, 5, respectively. It is installed.

ここで、突起部43a,43b,53a,53bをシリコン又はシリコン酸化膜といったセンサチップの主材料により形成した場合には、突起部43a,43b,53a,53bを容易に製造することができる。尚、突起部43a,43b,53a,53bの表層をカーボン材料でコーティングしてもよい。この場合、突起部43a,43b,53a,53bの機械的強度が増し、上部固定板2a及び下部固定板2bとの衝突によって突起部43a,43b,53a,53bが破損するのを防止することができる。更に、カーボン材料としてカーボンナノチューブを採用すれば、コーティングの厚み寸法を小さくできるので、突起部43a,43b,53a,53bを所望の高さ寸法に容易に調整することができる。   Here, when the protrusions 43a, 43b, 53a, and 53b are formed of the main material of the sensor chip such as silicon or silicon oxide film, the protrusions 43a, 43b, 53a, and 53b can be easily manufactured. The surface layers of the protrusions 43a, 43b, 53a, 53b may be coated with a carbon material. In this case, the mechanical strength of the protrusions 43a, 43b, 53a, 53b is increased, and the protrusions 43a, 43b, 53a, 53b can be prevented from being damaged by the collision with the upper fixing plate 2a and the lower fixing plate 2b. it can. Furthermore, if carbon nanotubes are used as the carbon material, the thickness of the coating can be reduced, so that the protrusions 43a, 43b, 53a, 53b can be easily adjusted to the desired height.

上部固定板2aは、例えばガラス等の絶縁材料から形成され、その下面には、上下方向に沿ってセンサチップ1の重り部4(可動電極4a)と対向する位置に第1の固定電極20aと第2の固定電極20bとがx方向に並設されるととともに、上下方向に沿ってセンサチップ1の重り部5(可動電極5a)と対向する位置に第1の固定電極21aと第2の固定電極21bとがx方向に並設されている。また、上部固定板2aのx方向一端側には、5つの貫通孔22a〜22eがy方向に並べて貫設されている。更に、上部固定板2aの下面には、各固定電極20a,20b及び21a,21bと電気的に接続された複数の導電パターン(図示せず)が形成されている。   The upper fixed plate 2a is made of an insulating material such as glass, for example, and the lower surface thereof has the first fixed electrode 20a and the first fixed electrode 20a at a position facing the weight portion 4 (movable electrode 4a) of the sensor chip 1 along the vertical direction. The second fixed electrode 20b and the second fixed electrode 20b are arranged side by side in the x direction, and the first fixed electrode 21a and the second fixed electrode 20a are arranged at positions facing the weight portion 5 (movable electrode 5a) of the sensor chip 1 along the vertical direction. The fixed electrode 21b is juxtaposed in the x direction. Further, five through holes 22a to 22e are arranged side by side in the y direction on one end side in the x direction of the upper fixing plate 2a. Further, a plurality of conductive patterns (not shown) electrically connected to the fixed electrodes 20a, 20b and 21a, 21b are formed on the lower surface of the upper fixed plate 2a.

一方、センサチップ1のx方向一端側には、フレーム部3から離間された計4つの電極部8a,8b,9a,9bが並設されている。これら4つの電極部8a,8b,9a,9bは、上面における略中央に金属膜から成る検出電極80a,80b,90a,90bがそれぞれ形成されるとともに、枠部3a,3bに臨む端部の上面に金属膜から成る圧接電極81a,81b,91a,91b(圧接電極91aのみ図示)がそれぞれ形成されている。尚、フレーム部3上面の電極部8b,9aの間には接地電極10が形成されている。そして、センサチップ1の上面に上部固定板2aが接合されると、上部固定板2aの下面に形成されている導電パターンと圧接電極81a,81b,91a,91bとが圧接接続されることで、各検出電極80a,80b,90a,90bが各固定電極20a,20b,21a,21bと電気的に接続されるとともに、上部固定板2aの貫通孔22a〜22dを介して各検出電極80a,80b,90a,90bが外部に露出する。尚、接地電極10も貫通孔22eを介して外部に露出する。   On the other hand, a total of four electrode portions 8 a, 8 b, 9 a, 9 b separated from the frame portion 3 are juxtaposed on one end side in the x direction of the sensor chip 1. The four electrode portions 8a, 8b, 9a, and 9b are formed with detection electrodes 80a, 80b, 90a, and 90b made of a metal film substantially at the center on the upper surface, and upper surfaces of end portions facing the frame portions 3a and 3b. Further, press contact electrodes 81a, 81b, 91a, 91b (only the press contact electrode 91a are shown) made of a metal film are formed respectively. A ground electrode 10 is formed between the electrode portions 8b and 9a on the upper surface of the frame portion 3. Then, when the upper fixing plate 2a is joined to the upper surface of the sensor chip 1, the conductive pattern formed on the lower surface of the upper fixing plate 2a and the press contact electrodes 81a, 81b, 91a, 91b are press contact connected. Each detection electrode 80a, 80b, 90a, 90b is electrically connected to each fixed electrode 20a, 20b, 21a, 21b, and each detection electrode 80a, 80b, through the through holes 22a-22d of the upper fixed plate 2a. 90a and 90b are exposed to the outside. The ground electrode 10 is also exposed to the outside through the through hole 22e.

尚、本実施形態では、図2に示すように、電極部8aと電極部8bとの間、電極部9aと電極部9bとの間、各電極部8a,8b,9a,9bとフレーム部3との間、各電極部8a,8b,9a,9bと各重り部4,5との間に各々隙間が設けられている。このように構成することで、各検出電極80a,80b,90a,90bが互いに電気的に絶縁されるので、各検出電極80a,80b,90a,90bの寄生容量や電極間のクロストークを低減し、高精度な静電容量の検出を行うことができる。   In this embodiment, as shown in FIG. 2, between the electrode portion 8 a and the electrode portion 8 b, between the electrode portion 9 a and the electrode portion 9 b, each electrode portion 8 a, 8 b, 9 a, 9 b and the frame portion 3. Between the electrode portions 8a, 8b, 9a, 9b and the weight portions 4, 5, gaps are provided. With this configuration, the detection electrodes 80a, 80b, 90a, and 90b are electrically insulated from each other, thereby reducing parasitic capacitance of the detection electrodes 80a, 80b, 90a, and 90b and crosstalk between the electrodes. Highly accurate capacitance detection can be performed.

下部固定板2bは、上部固定板2aと同様にガラス等の絶縁材料から形成され、その上面には上下方向に沿ってセンサチップ1の重り部4,5と対向する位置にそれぞれ付着防止膜23a,23bが形成されている。この付着防止膜23a,23bは、アルミニウム系合金等の固定電極20a,…と同じ材料で形成されており、回動した重り部4,5の下面が下部固定板2bに付着するのを防止している。このように、付着防止膜23a,23bを固定電極20a,…と同一材料で形成することにより、付着防止膜23a,23bを容易に形成することができる。このとき、付着防止膜23a,23bを固定電極20a,…と同時に形成すれば、重り部4,5と固定電極20a,…との間、及び重り部4,5と下部固定板2bとの間の距離の精度を高めることができる。   The lower fixing plate 2b is made of an insulating material such as glass like the upper fixing plate 2a, and the upper surface of the lower fixing plate 2b is respectively attached to the sensor chip 1 at positions facing the weight portions 4 and 5 along the vertical direction. , 23b are formed. These adhesion preventing films 23a, 23b are made of the same material as the fixed electrodes 20a,... Such as an aluminum alloy, and prevent the lower surfaces of the rotated weight parts 4, 5 from adhering to the lower fixed plate 2b. ing. In this way, the adhesion preventing films 23a, 23b can be easily formed by forming the adhesion preventing films 23a, 23b from the same material as the fixed electrodes 20a,. At this time, if the adhesion preventing films 23a, 23b are formed simultaneously with the fixed electrodes 20a,..., Between the weight portions 4, 5 and the fixed electrodes 20a,... And between the weight portions 4, 5 and the lower fixed plate 2b. The accuracy of the distance can be increased.

尚、付着防止膜23a,23bを半導体製造プロセスにより成膜した場合、付着防止膜23a,23bの表面に微小な凹凸が形成されるため、重り部4,5が下部固定板2bに付着するのをより好適に防止することができる。ここで、付着防止膜23a,23bをアルミニウム系合金により形成した場合、エッチング加工が容易になる。また、付着防止膜23a,23bの表面上に半導体製造プロセスとの整合性が良く、且つ加工がし易いポリイミド薄膜等の有機材料薄膜を形成することにより、付着防止膜23a,23bと重り部4,5との間の短絡を防止するようにしてもよい。   When the adhesion preventing films 23a and 23b are formed by a semiconductor manufacturing process, minute irregularities are formed on the surfaces of the adhesion preventing films 23a and 23b, so that the weight portions 4 and 5 adhere to the lower fixing plate 2b. Can be more suitably prevented. Here, when the adhesion preventing films 23a and 23b are formed of an aluminum alloy, the etching process becomes easy. Further, by forming an organic material thin film such as a polyimide thin film having good consistency with the semiconductor manufacturing process and easy to process on the surface of the adhesion preventing films 23a and 23b, the adhesion preventing films 23a and 23b and the weight part 4 are formed. , 5 may be prevented from being short-circuited.

ここで、本実施形態では、枠部3a、重り部4、ビーム部6a,6b、可動電極4a、第1及び第2の固定電極20a,20b、検出電極80a,80bと、枠部3b、重り部5、ビーム部7a,7b、可動電極5a、第1及び第2の固定電極21a,21b、検出電極90a,90bとで各々センサ部が構成され、重り部4,5の向き(充実部40,50と凹部41,51の配置)を180度反転させた状態で2つのセンサ部が一体に形成されている。   Here, in this embodiment, the frame portion 3a, the weight portion 4, the beam portions 6a and 6b, the movable electrode 4a, the first and second fixed electrodes 20a and 20b, the detection electrodes 80a and 80b, the frame portion 3b and the weight. The sensor unit is composed of the unit 5, the beam units 7a and 7b, the movable electrode 5a, the first and second fixed electrodes 21a and 21b, and the detection electrodes 90a and 90b. , 50 and recesses 41, 51) are inverted by 180 degrees, and the two sensor parts are formed integrally.

次に、本実施形態の検出動作について説明する。先ず、一方の重り部4にx方向の加速度が印加された場合を考える。x方向に加速度が印加されると、重り部4が回動軸の回りに回動して可動電極4aと第1の固定電極20a並びに第2の固定電極20bとの間の距離が変化し、その結果、可動電極4aと各固定電極20a,20bとの間の静電容量C1,C2も変化する。ここで、x方向の加速度が印加されていないときの可動電極4aと各固定電極20a,20bとの間の静電容量をC0とし、加速度の印加によって生じる静電容量の変化分をΔCとすれば、x方向の加速度が印加されたときの静電容量C1,C2は、
C1=C0−ΔC …(1)
C2=C0+ΔC …(2)
と表すことができる。
Next, the detection operation of this embodiment will be described. First, consider a case where an acceleration in the x direction is applied to one weight portion 4. When acceleration is applied in the x direction, the weight 4 rotates about the rotation axis, and the distance between the movable electrode 4a and the first fixed electrode 20a and the second fixed electrode 20b changes. As a result, the capacitances C1 and C2 between the movable electrode 4a and the fixed electrodes 20a and 20b also change. Here, the capacitance between the movable electrode 4a and each fixed electrode 20a, 20b when no acceleration in the x direction is applied is C0, and the change in capacitance caused by the application of acceleration is ΔC. For example, the capacitances C1 and C2 when the acceleration in the x direction is applied are:
C1 = C0−ΔC (1)
C2 = C0 + ΔC (2)
It can be expressed as.

同様に、他方の重り部5にx方向の加速度が印加された場合、可動電極5aと各固定電極21a,21bとの間の静電容量C3,C4は、
C3=C0−ΔC …(3)
C4=C0+ΔC …(4)
と表すことができる。
Similarly, when an acceleration in the x direction is applied to the other weight portion 5, the capacitances C3 and C4 between the movable electrode 5a and the fixed electrodes 21a and 21b are:
C3 = C0−ΔC (3)
C4 = C0 + ΔC (4)
It can be expressed as.

ここで、静電容量C1〜C4の値は、検出電極80a,80b及び90a,90bから取出す電圧信号を演算処理することで検出することができる。そして、一方のセンサ部から得られる静電容量C1,C2の差分値CA(=C1−C2)と、他方のセンサ部から得られる静電容量C3,C4の差分値CB(=C3−C4)との和(±4ΔC)を算出すれば、この差分値CA,CBの和に基づいてx方向に印加された加速度の向きと大きさを演算することができる。   Here, the values of the capacitances C1 to C4 can be detected by performing arithmetic processing on voltage signals taken from the detection electrodes 80a and 80b and 90a and 90b. Then, the difference value CA (= C1-C2) between the capacitances C1, C2 obtained from one sensor unit and the difference value CB (= C3-C4) between the capacitances C3, C4 obtained from the other sensor unit. Is calculated (± 4ΔC), the direction and magnitude of the acceleration applied in the x direction can be calculated based on the sum of the difference values CA and CB.

次に、一方の重り部4にz方向の加速度が印加された場合を考える。z方向に加速度が印加されると重り部4が回動軸の回りに回動して可動電極4aと第1の固定電極20a並びに第2の固定電極20bとの間の距離が変化し、その結果、可動電極4aと各固定電極20a,20bとの間の静電容量C1,C2も変化する。ここで、z方向の加速度が印加されていないときの可動電極4aと各固定電極20a,20bとの間の静電容量をC0とし、加速度の印加によって生じる静電容量の変化分をΔCとすれば、z方向の加速度が印加されたときの静電容量C1,C2は、
C1=C0+ΔC …(5)
C2=C0−ΔC …(6)
と表すことができる。
Next, consider a case where an acceleration in the z direction is applied to one weight portion 4. When acceleration is applied in the z direction, the weight portion 4 rotates around the rotation axis, and the distance between the movable electrode 4a and the first fixed electrode 20a and the second fixed electrode 20b changes. As a result, the capacitances C1 and C2 between the movable electrode 4a and the fixed electrodes 20a and 20b also change. Here, the capacitance between the movable electrode 4a and the fixed electrodes 20a and 20b when no acceleration in the z direction is applied is C0, and the change in capacitance caused by the application of acceleration is ΔC. For example, the capacitances C1 and C2 when the acceleration in the z direction is applied are:
C1 = C0 + ΔC (5)
C2 = C0−ΔC (6)
It can be expressed as.

同様に、他方の重り部5にz方向の加速度が印加された場合、可動電極5aと各固定電極21,21bとの間の静電容量C3,C4は、
C3=C0−ΔC …(7)
C4=C0+ΔC …(8)
と表すことができる。
Similarly, when acceleration in the z direction is applied to the other weight portion 5, the capacitances C3 and C4 between the movable electrode 5a and the fixed electrodes 21 and 21b are:
C3 = C0−ΔC (7)
C4 = C0 + ΔC (8)
It can be expressed as.

そして、一方のセンサ部から得られる静電容量C1,C2の差分値CA(=C1−C2)と、他方のセンサ部から得られる静電容量C3,C4の差分値CB(=C3−C4)との差(±4ΔC)を算出すれば、この差分値CA,CBの差に基づいてz方向に印加された加速度の向きと大きさを演算することができる。尚、差分値CA,CBの和と差とに基づいてx方向及びz方向の加速度の向きと大きさを求める演算処理については従来周知であるので、ここでは詳細な説明を省略する。   Then, the difference value CA (= C1-C2) between the capacitances C1, C2 obtained from one sensor unit and the difference value CB (= C3-C4) between the capacitances C3, C4 obtained from the other sensor unit. Is calculated (± 4ΔC), the direction and magnitude of the acceleration applied in the z direction can be calculated based on the difference between the difference values CA and CB. Note that calculation processing for obtaining the direction and magnitude of the acceleration in the x direction and the z direction based on the sum and difference of the difference values CA and CB is well known in the art, and detailed description thereof is omitted here.

ところで、前述のように、加速度センサの検出感度を高めるべく可動電極4a,5aの面積を大きくする場合、重り部4,5の重心位置から回動軸に下ろした垂線と可動電極4a,5aの表面とが成す角度を略45度に維持するために、重り部4,5の厚み寸法を大きくする、或いは重り部4,5のビーム部6a,6b,7a,7bの直下を刳り貫いて軽量化する方法は望ましくない。そこで、本実施形態では、図1に示すように、ビーム部6a,6b,7a,7b(同図ではビーム部6bのみ図示)を重り部4,5の長手方向における略中央から凹部41,51側(右側)にずらして配置することで、重り部4,5の重心位置から回動軸に下ろした垂線と可動電極4a,5aの表面とが成す角度θを略45度となるようにしている。而して、ビーム部6a,6b,7a,7bをずらして配置するだけで角度θを略45度に維持することができるため、重り部4,5の厚み寸法を大きくする、或いは重り部4,5を軽量化することなく検出感度を向上させることができる。   By the way, as described above, when the area of the movable electrodes 4a and 5a is increased in order to increase the detection sensitivity of the acceleration sensor, the perpendicular line drawn from the center of gravity of the weights 4 and 5 to the rotation axis and the movable electrodes 4a and 5a. In order to maintain the angle formed with the surface at about 45 degrees, the thickness of the weight portions 4 and 5 is increased, or the weight portions 4 and 5 are lightly penetrated directly under the beam portions 6a, 6b, 7a and 7b. It is not desirable to change the method. Therefore, in this embodiment, as shown in FIG. 1, the beam portions 6a, 6b, 7a, 7b (only the beam portion 6b is shown in the figure) are recessed from the approximate center in the longitudinal direction of the weight portions 4, 5. By shifting to the side (right side), the angle θ formed by the perpendicular line drawn from the center of gravity of the weights 4 and 5 to the rotation axis and the surfaces of the movable electrodes 4a and 5a is approximately 45 degrees. Yes. Thus, the angle θ can be maintained at about 45 degrees simply by shifting the beam portions 6a, 6b, 7a, 7b, so that the thickness dimensions of the weight portions 4, 5 are increased, or the weight portion 4 , 5 can be improved without reducing the weight.

尚、本実施形態では、以下の手順を踏むことで加速度センサの動作確認を行うことができる。即ち、第1の固定電極20a又は第2の固定電極20bと可動電極4aとの間、若しくは第1の固定電極21a又は第2の固定電極21bと可動電極5aとの間に吸引力を発生させることで、重り部4,5を回動させる。そして、重り部4,5の回動に伴って生じる各固定電極20a,…と重り部4,5との間の静電容量の変化を検出することで、加速度センサが正常に動作しているか否かを確認することができる。尚、付着防止膜23a,23bと可動電極4a,5aとの間に吸引力を発生させることで同様の動作確認を行ってもよい。   In the present embodiment, the operation of the acceleration sensor can be confirmed by following the following procedure. That is, an attractive force is generated between the first fixed electrode 20a or the second fixed electrode 20b and the movable electrode 4a, or between the first fixed electrode 21a or the second fixed electrode 21b and the movable electrode 5a. Thus, the weight parts 4 and 5 are rotated. Whether the acceleration sensor is operating normally by detecting a change in capacitance between the fixed electrodes 20a,... And the weights 4 and 5 that occur as the weights 4 and 5 rotate. You can check whether or not. The same operation confirmation may be performed by generating a suction force between the adhesion preventing films 23a and 23b and the movable electrodes 4a and 5a.

また、本実施形態では、x方向とz方向の2方向の加速度を検出する加速度センサを例示したが、上述のセンサ部の1つをxy平面内で90度回転対称に配置すれば、y方向を加えた3方向の加速度を検出する加速度センサを実現することができる。また、3つのセンサ部を同一チップに配置し、2つのセンサ部を、それぞれ残りの1つのセンサ部に対してxy平面において90度及び180度回転対称に配置しても、上記と同様に3方向の加速度を検出する加速度センサを実現することができる。   In the present embodiment, an acceleration sensor that detects acceleration in two directions, the x direction and the z direction, is illustrated. However, if one of the above-described sensor units is arranged 90 degrees rotationally symmetrical in the xy plane, the y direction Thus, it is possible to realize an acceleration sensor that detects acceleration in three directions with the addition of. Further, even if three sensor units are arranged on the same chip and two sensor units are arranged symmetrically by 90 degrees and 180 degrees on the xy plane with respect to the remaining one sensor part, 3 An acceleration sensor that detects the acceleration in the direction can be realized.

20a,21a 第1の固定電極
20b,21b 第2の固定電極
4,5 重り部
40,50 充実部
41,51 凹部
4a,5a 可動電極
6a,6b ビーム部
7a,7b ビーム部
20a, 21a 1st fixed electrode 20b, 21b 2nd fixed electrode 4, 5 Weight part 40, 50 Solid part 41, 51 Recessed part 4a, 5a Movable electrode 6a, 6b Beam part 7a, 7b Beam part

Claims (19)

一面に開口する凹部と充実部が一体に形成された重り部と、
凹部と充実部とが回動方向に沿って並ぶように重り部を回動自在に支持する1対のビーム部と、
凹部が開口する前記一面と異なる他の一面において凹部と充実部とに跨って設けられた可動電極と、
可動電極における凹部側と対向する位置に配設された第1の固定電極とを有するセンサ部を備え、
1対のビーム部を結ぶ直線を回動軸とした重り部の回動に伴う可動電極と固定電極との間の静電容量の変化から加速度を検出する加速度センサであって、
ビーム部を重り部の長手方向における略中心から凹部側にずらして配置しており、
前記重り部の固定電極が対向する側と反対側の面と所定の間隔を空けて配置される固定板を有し、固定板の重り部と対向する面には、重り部の付着を防止するための付着防止膜が設けられており、
前記付着防止膜は、固定電極と同時に成形されることを特徴とする加速度センサ。
A weight part formed integrally with a concave part and a solid part opening on one surface;
A pair of beam portions that rotatably support the weight portion so that the concave portion and the solid portion are aligned along the rotation direction;
A movable electrode provided across the recess and the solid portion on the other surface different from the one surface where the recess opens,
A sensor unit having a first fixed electrode disposed at a position facing the concave side of the movable electrode;
An acceleration sensor that detects acceleration from a change in capacitance between a movable electrode and a fixed electrode that accompanies rotation of a weight portion with a straight line connecting a pair of beam portions as a rotation axis,
The beam part is shifted from the approximate center in the longitudinal direction of the weight part to the concave part side ,
A fixing plate disposed at a predetermined distance from a surface opposite to a surface of the weight portion opposite to the fixed electrode; and preventing the weight portion from adhering to the surface of the fixing plate facing the weight portion. An anti-adhesion film is provided for
The acceleration sensor , wherein the adhesion preventing film is formed simultaneously with the fixed electrode .
前記重り部に印加された第1の方向の加速度と、第1の方向と直交する第2の方向の加速度とを検出することを特徴とする請求項1記載の加速度センサ。   2. The acceleration sensor according to claim 1, wherein an acceleration in a first direction applied to the weight part and an acceleration in a second direction orthogonal to the first direction are detected. 前記センサ部は、同一のチップに複数形成されることを特徴とする請求項2記載の加速度センサ。   The acceleration sensor according to claim 2, wherein a plurality of the sensor units are formed on the same chip. 前記センサ部が同一のチップに2つ形成され、一方のセンサ部が他方のセンサ部に対して同一平面において180度回転して配置されたことを特徴とする請求項3記載の加速度センサ。   4. The acceleration sensor according to claim 3, wherein two sensor parts are formed on the same chip, and one sensor part is rotated 180 degrees in the same plane with respect to the other sensor part. 前記2つのセンサ部が隣接して配置されたことを特徴とする請求項4記載の加速度センサ。   The acceleration sensor according to claim 4, wherein the two sensor units are arranged adjacent to each other. 前記センサ部は同一のチップに3つ形成され、2つのセンサ部は、それぞれ残りの1つのセンサ部に対して同一平面において90度及び180度回転して配置されたことを特徴とする請求項3記載の加速度センサ。   3. The sensor unit according to claim 1, wherein three sensor units are formed on the same chip, and the two sensor units are respectively rotated by 90 degrees and 180 degrees on the same plane with respect to the remaining one sensor unit. 3. The acceleration sensor according to 3. 前記各固定電極の可動電極との対向面、又は可動電極の各固定電極との対向面には突起部が形成されたことを特徴とする請求項1乃至6の何れか1項に記載の加速度センサ。   The acceleration according to any one of claims 1 to 6, wherein a protrusion is formed on a surface of each fixed electrode facing the movable electrode or on a surface facing each fixed electrode of the movable electrode. Sensor. 前記突起部は、シリコン又はシリコン酸化膜から形成されたことを特徴とする請求項7記載の加速度センサ。   The acceleration sensor according to claim 7, wherein the protrusion is formed of silicon or a silicon oxide film. 前記突起部は、その表層がカーボン材料から形成されたことを特徴とする請求項7記載の加速度センサ。   The acceleration sensor according to claim 7, wherein a surface layer of the protrusion is made of a carbon material. 前記カーボン材料はカーボンナノチューブであることを特徴とする請求項9記載の加速度センサ。   The acceleration sensor according to claim 9, wherein the carbon material is a carbon nanotube. 前記付着防止膜は、固定電極と同じ材料から形成されたことを特徴とする請求項記載の加速度センサ。 It said anti-adhesion film, an acceleration sensor according to claim 1, characterized in that it is formed of the same material as the fixed electrode. 前記付着防止膜は、半導体製造プロセスを利用して成膜されることを特徴とする請求項1又は11の何れか1項に記載の加速度センサ。 It said anti-adhesion film, an acceleration sensor according to any one of claims 1 or 11, characterized in that it is formed by using a semiconductor manufacturing process. 前記付着防止膜は、アルミニウム系合金から形成されたことを特徴とする請求項1、11又は12の何れか1項に記載の加速度センサ。 It said anti-adhesion film, an acceleration sensor according to any one of claims 1, 11 or 12, characterized in that it is formed of an aluminum-based alloy. 前記固定電極と可動電極との間に吸引力を発生させることにより、固定電極と可動電極との間の静電容量の変化を検出することを特徴とする請求項1、11、12又は13の何れか1項に記載の加速度センサ。 14. The change in capacitance between the fixed electrode and the movable electrode is detected by generating an attractive force between the fixed electrode and the movable electrode . The acceleration sensor according to any one of the above. 前記付着防止膜の表面には、有機材料から成る薄膜が設けられたことを特徴とする請求項14記載の加速度センサ。 The acceleration sensor according to claim 14 , wherein a thin film made of an organic material is provided on a surface of the adhesion preventing film . 前記薄膜は、ポリイミド薄膜であることを特徴とする請求項15記載の加速度センサ。 The acceleration sensor according to claim 15 , wherein the thin film is a polyimide thin film . 前記センサ部は、可動電極における充実部側と対向する位置に配設された第2の固定電極を備えることを特徴とする請求項1乃至16の何れか1項に記載の加速度センサ。 17. The acceleration sensor according to claim 1 , wherein the sensor unit includes a second fixed electrode disposed at a position facing the solid portion side of the movable electrode . 前記重り部を内包する枠部と、枠部に形成されて各固定電極に電気的に接続される1対の検出電極とを有し、各検出電極の間、及び各検出電極と枠部との間、及び各検出電極と重り部との間に隙間が設けられたことを特徴とする請求項17記載の加速度センサ。 A frame part including the weight part, and a pair of detection electrodes formed on the frame part and electrically connected to the fixed electrodes, and between the detection electrodes and between the detection electrodes and the frame part 18. The acceleration sensor according to claim 17 , wherein a gap is provided between each of the electrodes and between each of the detection electrodes and the weight portion . 前記重り部の重心位置から前記回動軸に下ろした垂線と可動電極の表面とが成す角度が略45度となることを特徴とする請求項1乃至18の何れか1項に記載の加速度センサ The acceleration sensor according to any one of claims 1 to 18, wherein an angle formed by a perpendicular drawn from the center of gravity of the weight portion to the rotation shaft and the surface of the movable electrode is approximately 45 degrees. .
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